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JPH10189819A - Semiconductor device and manufacturing method thereof - Google Patents

Semiconductor device and manufacturing method thereof

Info

Publication number
JPH10189819A
JPH10189819A JP8357894A JP35789496A JPH10189819A JP H10189819 A JPH10189819 A JP H10189819A JP 8357894 A JP8357894 A JP 8357894A JP 35789496 A JP35789496 A JP 35789496A JP H10189819 A JPH10189819 A JP H10189819A
Authority
JP
Japan
Prior art keywords
integrated circuit
circuit chip
pattern
barrier
insulating substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP8357894A
Other languages
Japanese (ja)
Inventor
Hiroyuki Yamamoto
博之 山本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Texas Instruments Japan Ltd
Original Assignee
Texas Instruments Japan Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Texas Instruments Japan Ltd filed Critical Texas Instruments Japan Ltd
Priority to JP8357894A priority Critical patent/JPH10189819A/en
Publication of JPH10189819A publication Critical patent/JPH10189819A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors

Landscapes

  • Wire Bonding (AREA)
  • Lead Frames For Integrated Circuits (AREA)

Abstract

(57)【要約】 【課題】 セラミック等の蓋(リッド)を用いることな
く、半導体集積回路チップを気密封止する。 【解決手段】 本発明は、気密封止型の半導体装置に関
するものである。本発明において、半導体集積回路チッ
プ2は、その回路形成面側を下に向けて、いわゆるフリ
ップチップの方法で絶縁基板3上に実装される。半導体
集積回路チップの回路形成面上に形成された電極パッド
2a上には、金、半田等の導電性のバンプ8が設けら
れ、これが絶縁基板上の導体パターン6に接合される。
更に、集積回路チップの回路形成面には、上記電極パッ
ドの列を囲んで金、半田等からなる障壁バンプ7が形成
される。障壁バンプ7は、基板に対する集積回路チップ
の実装時に、絶縁基板3の面に接合され、電極パッド2
aの列を含むチップと基板との間の空間を、外部雰囲気
から遮断する。
[PROBLEMS] To hermetically seal a semiconductor integrated circuit chip without using a lid made of ceramic or the like. The present invention relates to a hermetically sealed semiconductor device. In the present invention, the semiconductor integrated circuit chip 2 is mounted on the insulating substrate 3 by a so-called flip chip method with its circuit forming surface side facing downward. A conductive bump 8 made of gold, solder or the like is provided on the electrode pad 2a formed on the circuit forming surface of the semiconductor integrated circuit chip, and this is joined to the conductor pattern 6 on the insulating substrate.
Further, a barrier bump 7 made of gold, solder or the like is formed on the circuit forming surface of the integrated circuit chip so as to surround the row of the electrode pads. The barrier bump 7 is joined to the surface of the insulating substrate 3 when the integrated circuit chip is mounted on the substrate, and the electrode pad 2
The space between the chip including the row a and the substrate is isolated from the external atmosphere.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、気密封止型の半導
体集積回路パッケージ技術に関し、特に封止用の蓋(リ
ッド)を用いない自己封止型の集積回路パッケージに関
するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a hermetically sealed type semiconductor integrated circuit package technology, and more particularly to a self-sealing type integrated circuit package that does not use a sealing lid.

【0002】[0002]

【従来の技術】微細加工技術の進歩により、デザインル
ールは0.35〜0.18μmにまで達し、一つの半導体集積回
路チップ上に形成できる素子の数は益々増大し、これを
実装する電子通信機器に飛躍的な高速化、低コスト化を
もたらしている。その一方で、集積回路チップは外部雰
囲気からの影響を極めて敏感に受け易くなっている。気
密封止型の集積回路パッケージは、半導体集積回路チッ
プを密閉容器内に封入し、外部雰囲気からチップを完全
に遮断する。これは、集積回路チップの回路形成面に対
する不純物の付着や湿気からチップを保護し、その信頼
性を維持する上で重要な技術である。
2. Description of the Related Art Advances in microfabrication technology have resulted in design rules reaching 0.35 to 0.18 μm, and the number of elements that can be formed on a single semiconductor integrated circuit chip has been increasing. High speed and low cost. On the other hand, integrated circuit chips are very sensitive to the influence of the external atmosphere. A hermetically sealed integrated circuit package encloses a semiconductor integrated circuit chip in a closed container and completely shuts off the chip from the external atmosphere. This is an important technique for protecting the chip from the adhesion of impurities to the circuit forming surface of the integrated circuit chip and moisture and maintaining the reliability of the chip.

【0003】図10に従来のセラミック基板を用いた気
密封止型の集積回路パッケージを示す。半導体集積回路
チップ15は、多層セラミックの基板16の凹部16a
内に回路形成面を上側にして接着剤17により固定され
る。基板上の配線パターン16bとチップ15の電極パ
ッドとをワイヤボンドした後、凹部16aを覆うように
セラミック、金属等の蓋18を、ガラス、半田合金等の
封止材19で基板16上に取り付ける。
FIG. 10 shows a hermetically sealed integrated circuit package using a conventional ceramic substrate. The semiconductor integrated circuit chip 15 is provided with a concave portion 16 a of a multilayer ceramic substrate 16.
It is fixed with an adhesive 17 with the circuit forming surface facing upward. After wire-bonding the wiring pattern 16b on the substrate and the electrode pad of the chip 15, a lid 18 made of ceramic, metal, or the like is attached onto the substrate 16 with a sealing material 19 made of glass, a solder alloy, or the like so as to cover the recess 16a. .

【0004】しかしながら、上記従来の気密封止型の集
積回路パッケージにおいては、集積回路チップ15を気
密封止するために、セラミックや金属等の蓋18が必要
になると共に、その取付けのための工程が必要になる。
最終的に、これがパッケージの製造コストを引き上げる
一因となっている。また、基板上に蓋18を取り付ける
ことによって、パッケージ全体の高さは高くなる。さら
に、パッケージの平面寸法は、蓋18を取付けるだけの
スペースを基板の凹部の外周に確保する必要があるため
大きくなる。小型化を要求される機器へ集積回路パッケ
ージを搭載する上で、パッケージの小型化、薄型化は重
要であり、平面寸法が大きく背の高いパッケージはその
障壁となる。
However, in the above-mentioned conventional hermetically sealed type integrated circuit package, a lid 18 made of ceramic, metal or the like is required to hermetically seal the integrated circuit chip 15, and a process for mounting the same is required. Is required.
Ultimately, this contributes to increasing package manufacturing costs. Also, by attaching the lid 18 on the substrate, the height of the entire package is increased. Further, the planar dimension of the package becomes large because it is necessary to secure a space for mounting the lid 18 on the outer periphery of the concave portion of the substrate. In mounting an integrated circuit package on a device that requires miniaturization, it is important to reduce the size and thickness of the package, and a package having a large planar dimension and a height is an obstacle.

【0005】さらに、従来のパッケージにおいて集積回
路チップ15から発生する熱は、蓋18によって外部雰
囲気より完全に密閉された凹部16a内にこもり、外部
に発散し難くなる。発熱効率が低いことにより、集積回
路チップに誤動作が生じ、機器の信頼性を低下させる。
Further, in the conventional package, heat generated from the integrated circuit chip 15 is trapped in the recess 16a which is completely sealed by the lid 18 from the outside atmosphere, and hardly radiates to the outside. Due to the low heat generation efficiency, a malfunction occurs in the integrated circuit chip, and the reliability of the device is reduced.

【0006】[0006]

【発明が解決しようとする課題】本発明は上記セラミッ
ク等の蓋を用いることなく、半導体集積回路チップを気
密封止することによって、製造工数の削減、コストの低
下を実現する半導体装置を提供することを目的としてい
る。
SUMMARY OF THE INVENTION The present invention provides a semiconductor device which realizes a reduction in manufacturing man-hours and a reduction in cost by hermetically sealing a semiconductor integrated circuit chip without using the above-mentioned lid made of ceramic or the like. It is intended to be.

【0007】本発明はまた、小型化を実現するに適した
自己封止型の半導体装置を提供することを目的としてい
る。
Another object of the present invention is to provide a self-sealing type semiconductor device suitable for realizing miniaturization.

【0008】さらに本発明は、発熱効率の良い気密封止
型の半導体装置を提供することを目的としている。
Another object of the present invention is to provide a hermetically sealed semiconductor device having good heat generation efficiency.

【0009】また本発明は、外部基板上に直接集積回路
チップを搭載する、いわゆるベアチップ実装において、
チップの気密封止を実現することを目的としている。
Further, the present invention relates to a so-called bare chip mounting in which an integrated circuit chip is mounted directly on an external substrate,
It is intended to achieve hermetic sealing of the chip.

【0010】[0010]

【課題を解決するための手段】本発明は、気密封止型の
半導体装置に関するものである。本発明において、半導
体集積回路チップは、その回路形成面側を下に向けて、
いわゆるフリップチップの方法で絶縁基板上に実装され
る。半導体集積回路チップの回路形成面上に形成された
電極パッド上には、導電性のバンプが設けられ、これが
絶縁基板上の導体パターンに接合される。更に、集積回
路チップの回路形成面には、上記電極パッドの列を囲ん
で障壁が形成される。障壁は、基板に対する集積回路チ
ップの実装時に、基板面に接合され、電極パッドの列を
含むチップと基板との間の空間を、外部雰囲気から遮断
する。理想的には、チップの回路形成面のほぼ全域を外
部雰囲気から隔離するために、上記障壁をチップの周囲
に沿って形成することが好ましい。
SUMMARY OF THE INVENTION The present invention relates to a hermetically sealed semiconductor device. In the present invention, the semiconductor integrated circuit chip has its circuit forming surface side facing down,
It is mounted on an insulating substrate by a so-called flip chip method. A conductive bump is provided on an electrode pad formed on a circuit forming surface of a semiconductor integrated circuit chip, and this is bonded to a conductor pattern on an insulating substrate. Further, a barrier is formed on the circuit forming surface of the integrated circuit chip so as to surround the row of the electrode pads. The barrier is bonded to the substrate surface when the integrated circuit chip is mounted on the substrate, and blocks a space between the chip and the substrate including the row of electrode pads from the external atmosphere. Ideally, it is preferable that the barrier be formed along the periphery of the chip in order to isolate almost the entire circuit forming surface of the chip from the external atmosphere.

【0011】半導体装置の製造を容易にするために、障
壁は、電極パッドを基板上に接合するための導電性バン
プと同じ材質の、半田又は金のバンプで形成することが
好ましい。この場合、集積回路チップの回路形成面上に
金属のパターンを形成し、この上に障壁を接合する。絶
縁基板上にもその対応位置に金属のパターンを形成す
る。そして絶縁基板上に集積回路チップを搭載後、一括
リフロー又は熱圧着により上記導電性バンプ及び障壁を
溶融し、それぞれ絶縁基板上のパターンに接合する方法
が製造上有利である。もっとも、障壁及び導電性バンプ
をこのような半田又は金のバンプに依らず、導電性又は
非導電性の接着剤樹脂(例えばエポキシ等の樹脂)で形
成したような場合にも、本発明の目的は達成される。
In order to facilitate the manufacture of the semiconductor device, the barrier is preferably formed of a solder or gold bump made of the same material as the conductive bump for bonding the electrode pad to the substrate. In this case, a metal pattern is formed on the circuit forming surface of the integrated circuit chip, and a barrier is bonded thereon. A metal pattern is also formed on the insulating substrate at the corresponding position. Then, after mounting the integrated circuit chip on the insulating substrate, the above-mentioned conductive bumps and barriers are melted by batch reflow or thermocompression bonding, and each is joined to the pattern on the insulating substrate, which is advantageous in manufacturing. However, even when the barrier and the conductive bumps are formed of a conductive or non-conductive adhesive resin (for example, a resin such as epoxy) without depending on such a solder or gold bump, the object of the present invention is also provided. Is achieved.

【0012】本発明の範囲は、半導体装置の絶縁基板の
形状、材質等によって限定されない。絶縁基板の材質と
して、多層セラミック、ガラス、メタル、ガラス・エポ
キシ樹脂、その他を採用することができる。絶縁基板
は、集積回路チップを実装する位置に、凹部を形成して
も、またしなくとも良い。絶縁基板上の導体パターン
は、障壁の外側に外部基板への実装用の端子を位置させ
る目的のために、ビアホールを介してチップ実装面と反
対側にその実装用の端子と接続されるパッドを位置させ
た構造のものが良い。
The scope of the present invention is not limited by the shape and material of the insulating substrate of the semiconductor device. As the material of the insulating substrate, multilayer ceramic, glass, metal, glass / epoxy resin, and others can be adopted. The insulating substrate may or may not have a recess at the position where the integrated circuit chip is mounted. The conductor pattern on the insulating substrate has pads connected to the mounting terminals on the side opposite to the chip mounting surface via via holes for the purpose of positioning the terminals for mounting on the external substrate outside the barrier. A structure with a positioned structure is better.

【0013】本発明はまた、外部基板上に直接集積回路
チップを搭載する、いわゆるベアチップ実装においてチ
ップの気密封止を実現する。集積回路チップの各電極パ
ッドと外部基板の導体パターンとは、各電極パッド上に
形成した導電性バンプにより電気的に接続される。電極
パッドの列を囲んで集積回路チップの回路形成面側に障
壁が形成され、チップ実装時に外部基板上に接合され
る。電極パッドの列を含むチップと外部基板との間の空
間は、障壁によって外部雰囲気から遮断され、保護され
る。
The present invention also realizes hermetic sealing of a chip in a so-called bare chip mounting in which an integrated circuit chip is mounted directly on an external substrate. Each electrode pad of the integrated circuit chip is electrically connected to the conductor pattern of the external substrate by a conductive bump formed on each electrode pad. A barrier is formed on the circuit forming surface side of the integrated circuit chip so as to surround the row of the electrode pads, and is joined to an external substrate when the chip is mounted. The space between the chip including the row of electrode pads and the external substrate is shielded from the external atmosphere by a barrier and protected.

【0014】[0014]

【発明の実施の形態】以下、本発明の実施形態を図面に
沿って説明する。図1及び図2に示すように半導体装置
1は、多層セラミックからなる絶縁基板3を有してい
る。絶縁基板3に形成される各配線パターンの一端はバ
ンプ接合用パッド4aであり、絶縁基板3の上面に露出
される。後述する集積回路チップ2の電極パッド2aと
このバンプ接合用パッド4aが、チップ実装時に電気的
に接続される。各配線パターンの他端は実装用端子接続
パッド4bであり、絶縁基板3の下面側に露出される。
外部基板へ本半導体装置1を実装するための端子5が、
この実装用端子接続パッド4bに接続されている。上記
バンプ接合用パッド4aと実装用端子接続パッド4bと
は、多層セラミック基板3の層間に形成されたパターン
4c及びビアホール4dを介して電気的に接続される。
Embodiments of the present invention will be described below with reference to the drawings. As shown in FIGS. 1 and 2, the semiconductor device 1 has an insulating substrate 3 made of a multilayer ceramic. One end of each wiring pattern formed on the insulating substrate 3 is a bump bonding pad 4a, and is exposed on the upper surface of the insulating substrate 3. The electrode pads 2a of the integrated circuit chip 2 described later and the bump bonding pads 4a are electrically connected at the time of chip mounting. The other end of each wiring pattern is a mounting terminal connection pad 4b, which is exposed on the lower surface side of the insulating substrate 3.
A terminal 5 for mounting the semiconductor device 1 on an external substrate is
It is connected to this mounting terminal connection pad 4b. The bump bonding pad 4a and the mounting terminal connection pad 4b are electrically connected through a pattern 4c formed between layers of the multilayer ceramic substrate 3 and via holes 4d.

【0015】絶縁基板3の上面には、配線パターンのバ
ンプ接合用パッド4aの列を囲むように、金属製のパタ
ーン6が形成されている。金属製のパターン6は後述す
る障壁バンプ7を絶縁基板上に接合し易くするためのも
のであり、電気的には働かない。しかしながら、金属製
のパターン6は、絶縁基板上に配線パターンを形成する
工程で、この配線パターンと共に形成することができる
ので製造上有利である。
A metal pattern 6 is formed on the upper surface of the insulating substrate 3 so as to surround a row of bump bonding pads 4a of the wiring pattern. The metal pattern 6 is for facilitating the bonding of a barrier bump 7 described later on the insulating substrate, and does not work electrically. However, since the metal pattern 6 can be formed together with the wiring pattern in the step of forming the wiring pattern on the insulating substrate, it is advantageous in manufacturing.

【0016】集積回路チップ2は、その回路形成面を下
に向けて、すなわちフリップチップの方式で、絶縁基板
3上に搭載される。図3及び図4に、集積回路チップ2
の回路形成面上の様子が良く表わされている。集積回路
チップの四辺に沿ってアルミ等からなる電極パッド2a
の列が形成されている。各電極パッド2aのいくつかは
チップ内の回路に電源電位あるいは接地電位を供給する
ためのものであり、その他はチップ内回路と外部との信
号の受け渡し用のものである。集積回路チップの最終工
程で、電極パッド2a上に金又は半田からなる導電性バ
ンプ8が形成される。チップの実装時に導電性バンプ8
は、絶縁基板3のバンプ接合用パッド4a上に載り、こ
れに続く工程で溶融されて該バンプ接合用パッドと接合
する。なお、半田より形成された導電性バンプ8の表面
には、その電気的特性を良好にするために金等の電解メ
ッキを施すことができる。
The integrated circuit chip 2 is mounted on the insulating substrate 3 with its circuit forming surface facing down, that is, in a flip-chip manner. 3 and 4 show the integrated circuit chip 2
Of the circuit formation surface is well represented. Electrode pads 2a made of aluminum or the like along the four sides of the integrated circuit chip
Are formed. Some of the electrode pads 2a are for supplying a power supply potential or a ground potential to the circuits in the chip, and others are for transferring signals between the circuits in the chip and the outside. In the final step of the integrated circuit chip, conductive bumps 8 made of gold or solder are formed on the electrode pads 2a. Conductive bump 8 when mounting chip
Are placed on the bump bonding pads 4a of the insulating substrate 3 and are melted in the subsequent step to bond with the bump bonding pads. The surface of the conductive bump 8 formed of solder can be subjected to electrolytic plating of gold or the like in order to improve its electrical characteristics.

【0017】更に、集積回路チップ2の回路形成面に
は、上記電極パッド2aの列を囲むように、電極パッド
の列とチップの縁との間にアルミ等によるパターン9が
形成されている。電極パッド2aを形成する際に、集積
回路チップ2上の上記パターン9の対応箇所にも金属膜
を蒸着し、これによってパターン9を形成することがで
きる。上記電極パッドと障壁用パターンを形成した領域
を除き、回路形成面は窒化シリコン膜(あるいは酸化シ
リコン膜)の層10で覆われている。
Further, a pattern 9 made of aluminum or the like is formed between the row of the electrode pads and the edge of the chip so as to surround the row of the electrode pads 2a on the circuit forming surface of the integrated circuit chip 2. When the electrode pads 2a are formed, a metal film is also deposited on the integrated circuit chip 2 at a position corresponding to the pattern 9, whereby the pattern 9 can be formed. Except for the region where the electrode pad and the barrier pattern are formed, the circuit formation surface is covered with a layer 10 of a silicon nitride film (or a silicon oxide film).

【0018】図4に示すように、パターン9上には該パ
ターン9に沿って連続する障壁バンプ7が形成される。
実施例において、障壁バンプ7は電極パッド2a上の導
電性バンプ8と同じ金又は半田から形成される。回路形
成面からの障壁バンプ7の高さは導電性バンプ8と同じ
に形成され、集積回路チップ2を絶縁基板3上に搭載し
た際に、その先端が基板上のパターン6に接触する。一
つの実施例において、バンプ7及び8の高さは約20μ
mである。障壁バンプ7をパターン6上に接触させた状
態で、障壁バンプ7が溶融されパターン6に接合され
る。障壁バンプ7は、これがパターン6に接合されるこ
とによって、電極パッド2aの列を含むチップ2の回路
形成面と絶縁基板3との間の空間を外部雰囲気から遮断
する壁として機能する。従って、外部の水分や不純物は
障壁バンプ7に遮られ、チップの回路形成面、特に電極
パッド2a上の導電性バンプ8に到達することができな
い。
As shown in FIG. 4, a continuous barrier bump 7 is formed on the pattern 9 along the pattern 9.
In the embodiment, the barrier bump 7 is formed of the same gold or solder as the conductive bump 8 on the electrode pad 2a. The height of the barrier bump 7 from the circuit formation surface is the same as that of the conductive bump 8, and when the integrated circuit chip 2 is mounted on the insulating substrate 3, its tip contacts the pattern 6 on the substrate. In one embodiment, the height of bumps 7 and 8 is about 20 μm.
m. With the barrier bump 7 in contact with the pattern 6, the barrier bump 7 is melted and joined to the pattern 6. The barrier bumps 7 are joined to the pattern 6 to function as walls that block the space between the circuit forming surface of the chip 2 including the rows of the electrode pads 2a and the insulating substrate 3 from the external atmosphere. Therefore, external moisture and impurities are blocked by the barrier bumps 7 and cannot reach the circuit forming surface of the chip, especially the conductive bumps 8 on the electrode pads 2a.

【0019】図5は他の実施形態における半導体装置の
断面図を示している。この実施形態が先の実施形態と異
なる点は、セラミック基板からなる絶縁基板3’を集積
回路チップ2と平面寸法でほぼ同じとなるように構成し
たことである。他の構成に関しては、図1及び図2に示
した先の実施例と同じである。本実施例においては、チ
ップ封止用の構造として、障壁バンプ7のみにより達成
することができることにより集積回路チップを覆う何ら
かの封止用部材を必要としない。したがって、障壁バン
プ7をチップ2の外周近くに配置することにより、集積
回路チップのサイズとほぼ同じサイズでパッケージを形
成でき、いわゆるチップサイズ・パッケージを簡易な構
造で達成することができる。
FIG. 5 is a sectional view of a semiconductor device according to another embodiment. This embodiment is different from the previous embodiment in that an insulating substrate 3 ′ made of a ceramic substrate is configured to have substantially the same planar dimensions as the integrated circuit chip 2. Other configurations are the same as those of the previous embodiment shown in FIGS. In the present embodiment, the structure for chip sealing can be achieved only by the barrier bumps 7, so that no sealing member for covering the integrated circuit chip is required. Therefore, by arranging the barrier bumps 7 near the outer periphery of the chip 2, a package having almost the same size as the integrated circuit chip can be formed, and a so-called chip size package can be achieved with a simple structure.

【0020】図6は他の実施形態における半導体装置の
断面図を示している。この実施形態が先の実施形態と異
なる点は、絶縁基板3に凹部3aを形成し、この凹部3
a内に集積回路チップ2を納めた点である。集積回路チ
ップ2の基板に対する実装方法は、先の実施例と同じで
ある。すなわち、凹部3a内における基板表面に配線パ
ターンのバンプ接合用パッド4a及び金属パターン6が
形成される。集積回路チップ2の各電極パッド2a上に
形成された導電性バンプ8及びパターン9上に形成され
た障壁バンプ7は、チップの実装時にそれぞれバンプ接
合用パッド4a又は金属パターン6上に置かれる。チッ
プ実装後、導電性バンプ8及び障壁バンプ7は、溶融さ
れ、絶縁基板3側に接合される。
FIG. 6 is a sectional view of a semiconductor device according to another embodiment. This embodiment is different from the previous embodiment in that a concave portion 3a is formed in the insulating substrate 3 and this concave portion 3a is formed.
This is the point that the integrated circuit chip 2 is placed in a. The method of mounting the integrated circuit chip 2 on the substrate is the same as in the previous embodiment. That is, the bump bonding pad 4a of the wiring pattern and the metal pattern 6 are formed on the substrate surface in the recess 3a. The conductive bumps 8 formed on the respective electrode pads 2a of the integrated circuit chip 2 and the barrier bumps 7 formed on the patterns 9 are placed on the bump bonding pads 4a or the metal patterns 6 when the chip is mounted. After chip mounting, the conductive bumps 8 and the barrier bumps 7 are melted and bonded to the insulating substrate 3 side.

【0021】この構造のパッケージにおける優位性は、
比較的もろい集積回路チップ2を基板面から突出させな
いことによって、外部から保護することができる点にあ
る。もっとも集積回路チップ2の上部は完全に露出され
ているので、チップ2を覆うように保護部材を設けてチ
ップの物理的な損傷を回避するようにパッケージを構成
してもよい。このような場合でも保護部材の取り付けに
際し、その気密性を考慮する必要はないので、該部材の
選定及び取り付けは容易である。
The advantage of the package having this structure is as follows.
The point that the relatively fragile integrated circuit chip 2 is not protruded from the substrate surface can be protected from the outside. However, since the upper part of the integrated circuit chip 2 is completely exposed, a protective member may be provided so as to cover the chip 2 and the package may be configured to avoid physical damage to the chip. Even in such a case, it is not necessary to consider the airtightness when attaching the protection member, so that the selection and attachment of the member is easy.

【0022】図7は、図3及び図4に示した障壁バンプ
7を備えた集積回路チップ2を、外部基板に直接実装す
る、いわゆるベアチップ実装の場合における本発明の実
施形態を示している。先の実施形態における絶縁基板3
と同様に、外部基板11の上面側には、バンプ接合用パ
ッド4aとこれを囲むようにパターン6が形成されてい
る。バンプ接合用パッド4aはビアホール4dを介し
て、基板11の反対側の配線パターン4に接続されてい
る。先の実施形態における絶縁基板3に対する集積回路
チップ2の実装方法と同様に、外部基板11上に集積回
路チップ2が実装される。
FIG. 7 shows an embodiment of the present invention in the case of so-called bare chip mounting, in which the integrated circuit chip 2 provided with the barrier bumps 7 shown in FIGS. 3 and 4 is directly mounted on an external substrate. Insulating substrate 3 in previous embodiment
Similarly to the above, on the upper surface side of the external substrate 11, a bump bonding pad 4a and a pattern 6 are formed so as to surround the bump bonding pad 4a. The bump bonding pad 4a is connected to the wiring pattern 4 on the opposite side of the substrate 11 via a via hole 4d. The integrated circuit chip 2 is mounted on the external substrate 11 in the same manner as the mounting method of the integrated circuit chip 2 on the insulating substrate 3 in the previous embodiment.

【0023】図8は障壁バンプを備えた集積回路チップ
を絶縁基板上に実装する工程を示している。なお、図7
に示したベアチップ実装において外部基板11上に集積
回路チップを実装する工程も、実質的に本工程と同様の
ものであることが明らかであろう。絶縁基板3のバンプ
接合用パッド4a及びパターン6上に半田バンプ12を
融着する(工程(A))。半田バンプ12の上部を潰し
て平滑にし、集積回路チップ2が安定して搭載できるよ
うにする(工程(B))。別の工程で導電性バンプ8及
び障壁バンプ7を形成した集積回路チップ2を、フラッ
クスを塗布した絶縁基板3上に搭載する(工程
(C))。この時、チップ側の導電性バンプ8はバンプ
接合用パッド4a上に置かれ、障壁バンプ7はパターン
6上に置かれる。絶縁基板上にチップ2を搭載した状態
で、高温リフローにより導電性バンプ8、障壁バンプ7
及び半田バンプ12を溶融する(工程(D))。所定時
間経過後、これらのバンプは固化して集積回路チップ2
は絶縁基板3上に固定される。なお、上記絶縁基板3側
に設けた半田バンプ12は必ずしも必要はなく、パター
ン6及びバンプ接合用パッド4a上に直接、障壁バンプ
7及び導電性バンプ8を搭載しても良い。
FIG. 8 shows a step of mounting an integrated circuit chip having barrier bumps on an insulating substrate. FIG.
It will be apparent that the process of mounting the integrated circuit chip on the external substrate 11 in the bare chip mounting shown in (1) is substantially the same as this process. The solder bumps 12 are fused on the bump bonding pads 4a and the pattern 6 of the insulating substrate 3 (step (A)). The upper part of the solder bump 12 is crushed and smoothed so that the integrated circuit chip 2 can be mounted stably (step (B)). The integrated circuit chip 2 on which the conductive bumps 8 and the barrier bumps 7 are formed in another step is mounted on the flux-coated insulating substrate 3 (step (C)). At this time, the conductive bumps 8 on the chip side are placed on the bump bonding pads 4a, and the barrier bumps 7 are placed on the pattern 6. With the chip 2 mounted on the insulating substrate, the conductive bumps 8 and the barrier bumps 7 are formed by high-temperature reflow.
Then, the solder bumps 12 are melted (step (D)). After a predetermined time, these bumps are solidified and the integrated circuit chip 2
Is fixed on the insulating substrate 3. The solder bumps 12 provided on the insulating substrate 3 are not necessarily required, and the barrier bumps 7 and the conductive bumps 8 may be directly mounted on the patterns 6 and the bump bonding pads 4a.

【0024】図9は熱圧着により絶縁基板上に集積回路
チップを実装する方法を示している。基台13に固定し
た絶縁基板3上に集積回路チップ2を搭載し、その上方
より半田の溶融温度にまで熱したヒータ14を押圧す
る。ヒータ14の熱により障壁バンプ7及び導電性バン
プ8は溶融し、絶縁基板3上のパターン6及びバンプ接
合用パッド4aに接合する。ヒータ14を集積回路チッ
プ2上から除去し、絶縁基板3上へのチップの実装が完
了する。
FIG. 9 shows a method of mounting an integrated circuit chip on an insulating substrate by thermocompression bonding. The integrated circuit chip 2 is mounted on the insulating substrate 3 fixed to the base 13, and the heater 14 heated to the solder melting temperature from above is pressed. The barrier bumps 7 and the conductive bumps 8 are melted by the heat of the heater 14 and are bonded to the pattern 6 on the insulating substrate 3 and the bump bonding pads 4a. The heater 14 is removed from the integrated circuit chip 2 and the mounting of the chip on the insulating substrate 3 is completed.

【0025】以上、本発明に係る半導体装置のいくつか
の実施形態を図面に沿って説明した。本発明は上記実施
形態に示された範囲に限定されないことは明らかであ
る。実施形態では、絶縁基板の下面にピン型の接続端子
を備えたPGA(Pin Grid Array)型の半導体パッケージ
に本発明を適用した。しかし、半導体装置の外部接続端
子の形状、配置等に拘わらず種々のタイプの半導体装
置、例えばQFP(Quad Flat Package)、BGA(Ball G
rid Array)等のパッケージに本発明は適用可能である。
また、回路形成面の中央に電極パッドの列を有する集積
回路チップにおいても、本発明を適用することができ
る。
The embodiments of the semiconductor device according to the present invention have been described with reference to the drawings. Obviously, the present invention is not limited to the range shown in the above embodiment. In the embodiment, the present invention is applied to a PGA (Pin Grid Array) type semiconductor package having a pin type connection terminal on the lower surface of an insulating substrate. However, various types of semiconductor devices such as QFP (Quad Flat Package) and BGA (Ball G
The present invention is applicable to packages such as rid Array).
Further, the present invention can be applied to an integrated circuit chip having a row of electrode pads in the center of a circuit formation surface.

【0026】[0026]

【発明の効果】本発明によれば、セラミック等の蓋を用
いることなく半導体集積回路チップを気密封止すること
ができ、半導体装置の製造工数の削減、コストの低下を
図ることができる。
According to the present invention, a semiconductor integrated circuit chip can be hermetically sealed without using a lid made of ceramic or the like, so that the number of steps for manufacturing a semiconductor device and the cost can be reduced.

【0027】また本発明により製造される半導体装置
は、従来の半導体装置に比べて小型かつ薄型にすること
ができ、小型化が進んでいる電子通信機器に広く利用す
ることができる。
Further, the semiconductor device manufactured according to the present invention can be made smaller and thinner than a conventional semiconductor device, and can be widely used for electronic communication devices which are being miniaturized.

【0028】さらに本発明による半導体装置において、
集積回路チップの裏面側はパッケージに覆われることな
く露出されているので、集積回路チップから発生する熱
が効率的に放散され、装置の信頼性を高めることができ
る。
Further, in the semiconductor device according to the present invention,
Since the back surface of the integrated circuit chip is exposed without being covered by the package, heat generated from the integrated circuit chip is efficiently dissipated, and the reliability of the device can be improved.

【0029】また本発明は、外部基板上に直接集積回路
チップを搭載する、いわゆるベアチップ実装において、
チップの気密封止を実現することができる。
The present invention also relates to a so-called bare chip mounting in which an integrated circuit chip is directly mounted on an external substrate,
Hermetic sealing of the chip can be realized.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明をPGA型の半導体装置に適用した実施
形態を示す断面図である。
FIG. 1 is a sectional view showing an embodiment in which the present invention is applied to a PGA type semiconductor device.

【図2】図1の要部を拡大して示した図である。FIG. 2 is an enlarged view of a main part of FIG. 1;

【図3】導電性バンプ及び障壁バンプを実装前の集積回
路チップの回路形成面側の様子を示す平面図である。
FIG. 3 is a plan view showing a state on a circuit forming surface side of an integrated circuit chip before a conductive bump and a barrier bump are mounted.

【図4】導電性バンプ及び障壁バンプを実装した状態に
おける図3のA−A線における断面図である。
4 is a cross-sectional view taken along line AA of FIG. 3 in a state where a conductive bump and a barrier bump are mounted.

【図5】本発明をいわゆるチップ・サイズ・パッケージ
に適用した実施形態を示す断面図である。
FIG. 5 is a sectional view showing an embodiment in which the present invention is applied to a so-called chip size package.

【図6】凹部を備えた絶縁基板に集積回路チップを実装
した本発明の他の実施形態における断面図である。
FIG. 6 is a cross-sectional view of another embodiment of the present invention in which an integrated circuit chip is mounted on an insulating substrate having a recess.

【図7】外部基板上に本発明に係る集積回路チップを直
接実装した状態における断面図である。
FIG. 7 is a cross-sectional view in a state where the integrated circuit chip according to the present invention is directly mounted on an external substrate.

【図8】絶縁基板上に集積回路チップを実装する工程を
示した図である。
FIG. 8 is a view showing a step of mounting an integrated circuit chip on an insulating substrate.

【図9】熱圧着により絶縁基板上に集積回路チップを実
装するための方法を示した図である。
FIG. 9 is a diagram showing a method for mounting an integrated circuit chip on an insulating substrate by thermocompression bonding.

【図10】従来のセラミック基板を用いた気密封止型の
集積回路パッケージを示す断面図である。
FIG. 10 is a cross-sectional view showing a hermetically sealed integrated circuit package using a conventional ceramic substrate.

【符号の説明】[Explanation of symbols]

1 半導体装置 2 集積回路チップ 2a 電極パッド 3 絶縁基板 3a 凹部 4 配線パターン 4a バンプ接合用パッド 4b 実装用端子接続パッド 4c パターン 4d ビアホール 5 端子 6 金属製のパターン 7 障壁バンプ 8 導電性バンプ 9 パターン 10 酸化膜の層 11 外部基板 12 半田バンプ 13 基台 14 ヒータ REFERENCE SIGNS LIST 1 semiconductor device 2 integrated circuit chip 2 a electrode pad 3 insulating substrate 3 a recess 4 wiring pattern 4 a bump bonding pad 4 b mounting terminal connection pad 4 c pattern 4 d via hole 5 terminal 6 metal pattern 7 barrier bump 8 conductive bump 9 pattern 10 Oxide film layer 11 External substrate 12 Solder bump 13 Base 14 Heater

Claims (11)

【特許請求の範囲】[Claims] 【請求項1】 導体パターンを備えた絶縁基板と、 回路形成面上に電極パッドの列を有し、該回路形成面側
を上記絶縁基板側に向けて該絶縁基板上に実装される半
導体集積回路チップと、 上記半導体集積回路チップの各電極パッド上に設けら
れ、上記絶縁基板の導体パターン上に接合される導電性
のバンプと、 上記電極パッドの列を囲んで上記半導体集積回路チップ
の回路形成面側に設けられ、上記絶縁基板上に接合され
ることによって上記電極パッドの列を外気から封止する
障壁と、を備えた半導体装置。
1. An integrated circuit board comprising: an insulating substrate provided with a conductive pattern; and a row of electrode pads on a circuit forming surface, wherein the circuit forming surface is mounted on the insulating substrate with the circuit forming surface facing the insulating substrate. A circuit chip, a conductive bump provided on each electrode pad of the semiconductor integrated circuit chip, and bonded to a conductor pattern of the insulating substrate, and a circuit of the semiconductor integrated circuit chip surrounding the row of the electrode pads. And a barrier provided on the formation surface side and joined to the insulating substrate to seal the row of the electrode pads from the outside air.
【請求項2】 上記電極パッドの列を囲んで上記半導体
集積回路チップの回路形成面側に金属膜によるパターン
を形成し、該パターン上に上記障壁を接合した請求項1
記載の半導体装置。
2. A pattern formed of a metal film on a circuit forming surface side of the semiconductor integrated circuit chip so as to surround the row of the electrode pads, and the barrier is joined on the pattern.
13. The semiconductor device according to claim 1.
【請求項3】 上記絶縁基板上に、上記障壁を接合する
ための金属パターンを形成した請求項2記載の半導体装
置。
3. The semiconductor device according to claim 2, wherein a metal pattern for joining said barrier is formed on said insulating substrate.
【請求項4】 上記導電性バンプ及び上記障壁が半田又
は金のバンプである請求項3記載の半導体装置。
4. The semiconductor device according to claim 3, wherein said conductive bump and said barrier are solder or gold bumps.
【請求項5】 上記半導体集積回路チップは、その周囲
に沿って上記障壁を備えた請求項1、2、3又は4記載
の半導体装置。
5. The semiconductor device according to claim 1, wherein said semiconductor integrated circuit chip has said barrier along its periphery.
【請求項6】 上記絶縁基板は、上記半導体集積回路チ
ップの実装面と反対側の面に、上記導体パターンに接続
された実装用端子を配置した請求項1、2、3、4又は
5記載の半導体装置。
6. The mounting substrate according to claim 1, wherein the insulating substrate has mounting terminals connected to the conductor pattern on a surface opposite to a mounting surface of the semiconductor integrated circuit chip. Semiconductor device.
【請求項7】 回路形成面上に電極パッドの列を有する
半導体集積回路チップを、該回路形成面を下にして外部
基板上に実装する半導体装置の実装構造において、 上記半導体集積回路チップの各電極パッドと上記外部基
板の導体パターンとを、上記各電極パッド上に形成した
導電性バンプにより電気的に接続し、 上記電極パッドの列を囲んで上記半導体集積回路チップ
の回路形成面側に形成された障壁を上記外部基板上に接
合することによって、上記電極パッドの列を外気から封
止した半導体装置の実装構造。
7. A mounting structure of a semiconductor device in which a semiconductor integrated circuit chip having a row of electrode pads on a circuit forming surface is mounted on an external substrate with the circuit forming surface facing down, wherein each of the semiconductor integrated circuit chips The electrode pads and the conductor pattern of the external substrate are electrically connected by conductive bumps formed on each of the electrode pads, and are formed on the circuit forming surface side of the semiconductor integrated circuit chip so as to surround the rows of the electrode pads. The mounting structure of a semiconductor device in which the rows of the electrode pads are sealed from the outside air by joining the formed barrier to the external substrate.
【請求項8】 回路形成面上に電極パッドの列及び該電
極パッドの列を囲んで配置された金属膜によるパターン
を有した半導体集積回路チップを形成する工程と、 上記各電極パッド上に導電性バンプを形成すると共に、
上記パターン上に該パターンに沿って連続する障壁用の
バンプを形成する工程と、 上記各電極パッドを外部基板へ電気的に接続するための
導体パターンを備えると共に、上記障壁用のバンプの位
置に対応して形成された金属パターンを備える絶縁基板
を用意する工程と、 上記絶縁基板上に、上記半導体集積回路チップをその回
路形成面が上記絶縁基板に向くように搭載すると共に、
上記電極パッド上の導電性バンプを上記絶縁基板上の導
体パターンに接合し、上記障壁用のバンプを上記絶縁基
板上の金属パターンに接合する工程と、を含む半導体装
置の製造方法。
8. A step of forming a semiconductor integrated circuit chip having a row of electrode pads and a pattern of a metal film disposed around the row of electrode pads on a circuit forming surface; To form a conductive bump,
Forming a bump for a barrier continuous along the pattern on the pattern, and a conductor pattern for electrically connecting each of the electrode pads to an external substrate, and at a position of the bump for the barrier. Preparing an insulating substrate having a correspondingly formed metal pattern, and mounting the semiconductor integrated circuit chip on the insulating substrate so that the circuit forming surface faces the insulating substrate;
Bonding a conductive bump on the electrode pad to a conductor pattern on the insulating substrate and bonding the barrier bump to a metal pattern on the insulating substrate.
【請求項9】 上記導電性バンプ及び上記障壁用のバン
プは金又は半田よりなり、上記絶縁基板上に上記半導体
集積回路チップを搭載した後、一括リフロー又は熱圧着
により上記導電性バンプ及び上記障壁用のバンプを上記
絶縁基板上の導体パターン及び金属パターンに接合する
請求項8記載の半導体装置の製造方法。
9. The conductive bumps and the barrier bumps are made of gold or solder, and after mounting the semiconductor integrated circuit chip on the insulating substrate, the conductive bumps and the barriers are subjected to batch reflow or thermocompression bonding. 9. The method of manufacturing a semiconductor device according to claim 8, wherein a bump for bonding is bonded to the conductor pattern and the metal pattern on the insulating substrate.
【請求項10】 回路形成面上に電極パッドの列及び該
電極パッドの列を囲んで配置された金属膜によるパター
ンを有した半導体集積回路チップを形成する工程と、 上記各電極パッド上に導電性バンプを形成すると共に、
上記パターン上に該パターンに沿って連続する障壁用の
バンプを形成する工程と、 上記各電極パッドの位置に対応して形成された導体パタ
ーンを備えると共に、上記障壁用のバンプの位置に対応
して形成された金属パターンを備える上記半導体集積回
路チップが実装される外部基板を用意する工程と、 上記外部基板上に、上記半導体集積回路チップをその回
路形成面が上記外部基板に向くように搭載すると共に、
上記電極パッド上の導電性バンプを上記外部基板上の導
体パターンに接合し、上記障壁用のバンプを上記外部基
板上の金属パターンに接合する工程と、を含む半導体装
置の実装方法。
10. A step of forming a semiconductor integrated circuit chip having a row of electrode pads and a pattern of a metal film disposed around the row of electrode pads on a circuit forming surface; To form a conductive bump,
Forming a bump for a barrier continuous along the pattern on the pattern; and a conductor pattern formed corresponding to the position of each of the electrode pads, and corresponding to the position of the bump for the barrier. Preparing an external substrate on which the semiconductor integrated circuit chip having the metal pattern formed by mounting the semiconductor integrated circuit chip is mounted; and mounting the semiconductor integrated circuit chip on the external substrate so that the circuit formation surface faces the external substrate. Along with
Bonding a conductive bump on the electrode pad to a conductor pattern on the external substrate, and bonding the barrier bump to a metal pattern on the external substrate.
【請求項11】 上記導電性バンプ及び上記障壁用のバ
ンプは金又は半田よりなり、上記外部基板上に上記半導
体集積回路チップを搭載した後、一括リフロー又は熱圧
着により上記導電性バンプ及び上記障壁用のバンプを上
記外部基板上の導体パターン及び金属パターンに接合す
る請求項10記載の半導体装置の実装方法。
11. The conductive bumps and the barrier bumps are made of gold or solder. After the semiconductor integrated circuit chip is mounted on the external substrate, the conductive bumps and the barriers are subjected to collective reflow or thermocompression bonding. The method for mounting a semiconductor device according to claim 10, wherein a bump for bonding is bonded to the conductor pattern and the metal pattern on the external substrate.
JP8357894A 1996-12-27 1996-12-27 Semiconductor device and manufacturing method thereof Withdrawn JPH10189819A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8357894A JPH10189819A (en) 1996-12-27 1996-12-27 Semiconductor device and manufacturing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8357894A JPH10189819A (en) 1996-12-27 1996-12-27 Semiconductor device and manufacturing method thereof

Publications (1)

Publication Number Publication Date
JPH10189819A true JPH10189819A (en) 1998-07-21

Family

ID=18456488

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8357894A Withdrawn JPH10189819A (en) 1996-12-27 1996-12-27 Semiconductor device and manufacturing method thereof

Country Status (1)

Country Link
JP (1) JPH10189819A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7821131B2 (en) * 2007-06-21 2010-10-26 Intel Corporation Substrate including barrier solder bumps to control underfill transgression and microelectronic package including same
US7935573B2 (en) 2005-01-31 2011-05-03 Fujitsu Limited Electronic device and method for fabricating the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7935573B2 (en) 2005-01-31 2011-05-03 Fujitsu Limited Electronic device and method for fabricating the same
US7821131B2 (en) * 2007-06-21 2010-10-26 Intel Corporation Substrate including barrier solder bumps to control underfill transgression and microelectronic package including same

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