JPH09510686A - 沈降シリカの濃厚懸濁液、その製造法及びこの懸濁液の使用 - Google Patents
沈降シリカの濃厚懸濁液、その製造法及びこの懸濁液の使用Info
- Publication number
- JPH09510686A JPH09510686A JP8504152A JP50415296A JPH09510686A JP H09510686 A JPH09510686 A JP H09510686A JP 8504152 A JP8504152 A JP 8504152A JP 50415296 A JP50415296 A JP 50415296A JP H09510686 A JPH09510686 A JP H09510686A
- Authority
- JP
- Japan
- Prior art keywords
- suspension
- silica
- cake
- amount
- silicate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 197
- 239000000725 suspension Substances 0.000 title claims abstract description 117
- 239000000377 silicon dioxide Substances 0.000 title claims abstract description 97
- 238000000034 method Methods 0.000 title claims description 26
- 238000002360 preparation method Methods 0.000 title claims description 6
- 239000007787 solid Substances 0.000 claims abstract description 44
- 239000002245 particle Substances 0.000 claims abstract description 28
- 239000006228 supernatant Substances 0.000 claims abstract description 15
- 239000007900 aqueous suspension Substances 0.000 claims abstract description 11
- 238000009826 distribution Methods 0.000 claims abstract description 5
- 238000000576 coating method Methods 0.000 claims abstract description 4
- 230000007797 corrosion Effects 0.000 claims abstract description 4
- 238000005260 corrosion Methods 0.000 claims abstract description 4
- 239000002585 base Substances 0.000 claims description 51
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 claims description 44
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 42
- 238000006243 chemical reaction Methods 0.000 claims description 39
- 239000002535 acidifier Substances 0.000 claims description 33
- 239000000463 material Substances 0.000 claims description 32
- 238000001556 precipitation Methods 0.000 claims description 26
- 239000011541 reaction mixture Substances 0.000 claims description 23
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 18
- 239000003792 electrolyte Substances 0.000 claims description 15
- 239000000843 powder Substances 0.000 claims description 15
- 238000005119 centrifugation Methods 0.000 claims description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 13
- 238000003801 milling Methods 0.000 claims description 11
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 10
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical group CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 10
- 229910052783 alkali metal Inorganic materials 0.000 claims description 10
- 150000001340 alkali metals Chemical class 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims description 9
- 229910052910 alkali metal silicate Inorganic materials 0.000 claims description 8
- ANBBXQWFNXMHLD-UHFFFAOYSA-N aluminum;sodium;oxygen(2-) Chemical compound [O-2].[O-2].[Na+].[Al+3] ANBBXQWFNXMHLD-UHFFFAOYSA-N 0.000 claims description 8
- 229910001388 sodium aluminate Inorganic materials 0.000 claims description 8
- 239000000126 substance Substances 0.000 claims description 8
- 239000000203 mixture Substances 0.000 claims description 6
- 239000003795 chemical substances by application Substances 0.000 claims description 5
- 239000003960 organic solvent Substances 0.000 claims description 5
- 239000002244 precipitate Substances 0.000 claims description 5
- 229910052782 aluminium Inorganic materials 0.000 claims description 4
- 238000003701 mechanical milling Methods 0.000 claims description 4
- 230000020477 pH reduction Effects 0.000 claims description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- 239000011248 coating agent Substances 0.000 claims description 3
- 239000012065 filter cake Substances 0.000 claims description 3
- 239000002904 solvent Substances 0.000 claims description 2
- 238000001238 wet grinding Methods 0.000 claims description 2
- 238000002525 ultrasonication Methods 0.000 claims 1
- 239000000853 adhesive Substances 0.000 abstract description 2
- 230000001070 adhesive effect Effects 0.000 abstract description 2
- 238000007792 addition Methods 0.000 description 20
- 239000002253 acid Substances 0.000 description 12
- PMZURENOXWZQFD-UHFFFAOYSA-L sodium sulphate Substances [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 12
- 239000004115 Sodium Silicate Substances 0.000 description 11
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 11
- 229910052911 sodium silicate Inorganic materials 0.000 description 11
- 230000032683 aging Effects 0.000 description 9
- 238000006386 neutralization reaction Methods 0.000 description 9
- 238000002604 ultrasonography Methods 0.000 description 8
- 238000001035 drying Methods 0.000 description 7
- 239000011734 sodium Substances 0.000 description 7
- 238000005406 washing Methods 0.000 description 7
- 238000001914 filtration Methods 0.000 description 6
- 238000000227 grinding Methods 0.000 description 6
- 239000000523 sample Substances 0.000 description 6
- 238000004062 sedimentation Methods 0.000 description 6
- 239000002002 slurry Substances 0.000 description 6
- 229910052938 sodium sulfate Inorganic materials 0.000 description 6
- 235000011152 sodium sulphate Nutrition 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- 230000008719 thickening Effects 0.000 description 6
- 238000003828 vacuum filtration Methods 0.000 description 6
- 238000001694 spray drying Methods 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 4
- -1 alkaline earth metal salts Chemical class 0.000 description 4
- 230000009286 beneficial effect Effects 0.000 description 4
- 239000000123 paper Substances 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 238000000926 separation method Methods 0.000 description 4
- 229910052708 sodium Inorganic materials 0.000 description 4
- 238000007711 solidification Methods 0.000 description 4
- 230000008023 solidification Effects 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 238000005345 coagulation Methods 0.000 description 3
- 230000015271 coagulation Effects 0.000 description 3
- 238000006073 displacement reaction Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000011017 operating method Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 150000004760 silicates Chemical class 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000008367 deionised water Substances 0.000 description 2
- 229910021641 deionized water Inorganic materials 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000003760 magnetic stirring Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 102200150779 rs200154873 Human genes 0.000 description 2
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- 238000004438 BET method Methods 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical group C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical group [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 238000002459 porosimetry Methods 0.000 description 1
- 229910052700 potassium Chemical group 0.000 description 1
- 239000011591 potassium Chemical group 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 238000000518 rheometry Methods 0.000 description 1
- KKCBUQHMOMHUOY-UHFFFAOYSA-N sodium oxide Chemical compound [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 1
- 229910001948 sodium oxide Inorganic materials 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 239000007966 viscous suspension Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
- C01B33/141—Preparation of hydrosols or aqueous dispersions
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09B—EDUCATIONAL OR DEMONSTRATION APPLIANCES; APPLIANCES FOR TEACHING, OR COMMUNICATING WITH, THE BLIND, DEAF OR MUTE; MODELS; PLANETARIA; GLOBES; MAPS; DIAGRAMS
- G09B9/00—Simulators for teaching or training purposes
- G09B9/02—Simulators for teaching or training purposes for teaching control of vehicles or other craft
- G09B9/04—Simulators for teaching or training purposes for teaching control of vehicles or other craft for teaching control of land vehicles
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
- C01B33/141—Preparation of hydrosols or aqueous dispersions
- C01B33/1415—Preparation of hydrosols or aqueous dispersions by suspending finely divided silica in water
- C01B33/1417—Preparation of hydrosols or aqueous dispersions by suspending finely divided silica in water an aqueous dispersion being obtained
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C01B33/187—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates
- C01B33/193—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates of aqueous solutions of silicates
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B14/00—Use of inorganic materials as fillers, e.g. pigments, for mortars, concrete or artificial stone; Treatment of inorganic materials specially adapted to enhance their filling properties in mortars, concrete or artificial stone
- C04B14/02—Granular materials, e.g. microballoons
- C04B14/04—Silica-rich materials; Silicates
- C04B14/06—Quartz; Sand
- C04B14/062—Microsilica, e.g. colloïdal silica
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/08—Anti-corrosive paints
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09B—EDUCATIONAL OR DEMONSTRATION APPLIANCES; APPLIANCES FOR TEACHING, OR COMMUNICATING WITH, THE BLIND, DEAF OR MUTE; MODELS; PLANETARIA; GLOBES; MAPS; DIAGRAMS
- G09B9/00—Simulators for teaching or training purposes
- G09B9/02—Simulators for teaching or training purposes for teaching control of vehicles or other craft
- G09B9/04—Simulators for teaching or training purposes for teaching control of vehicles or other craft for teaching control of land vehicles
- G09B9/05—Simulators for teaching or training purposes for teaching control of vehicles or other craft for teaching control of land vehicles the view from a vehicle being simulated
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/50—Agglomerated particles
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/51—Particles with a specific particle size distribution
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/22—Rheological behaviour as dispersion, e.g. viscosity, sedimentation stability
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Theoretical Computer Science (AREA)
- Inorganic Chemistry (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- Educational Administration (AREA)
- Educational Technology (AREA)
- General Physics & Mathematics (AREA)
- Business, Economics & Management (AREA)
- Aviation & Aerospace Engineering (AREA)
- Ceramic Engineering (AREA)
- Dispersion Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Civil Engineering (AREA)
- Wood Science & Technology (AREA)
- Structural Engineering (AREA)
- Silicon Compounds (AREA)
- Paper (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Curing Cements, Concrete, And Artificial Stone (AREA)
- Paints Or Removers (AREA)
- Medicines Containing Plant Substances (AREA)
- Cosmetics (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
- Silicates, Zeolites, And Molecular Sieves (AREA)
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1.沈降シリカの水性懸濁液において、その固形分含量が10〜40重量%で あり、粘度が50s-1のせん断速度において4×10-2Pa.sよりも低く、そし て該懸濁液を7,500回転/分において30分間遠心分離した後に得られる上 澄み液中に存在するシリカの量が懸濁液中に存在するシリカの重量の50%より も多くを占めることを特徴とする沈降シリカの水性懸濁液。 2.固形物含量が15〜35重量%であることを特徴とする請求項1記載の懸 濁液。 3.粘度が50s-1のせん断速度において2×10-2Pa.sよりも低くいこと を特徴とする請求項1又は2記載の懸濁液。 4.懸濁液を7,500回転/分において30分間遠心分離した後に得られる 上澄み液中に存在するシリカの量が懸濁液中に存在するシリカの重量の60%以 上好ましくは70%以上を占めることを特徴とする請求項1〜3のいずれか一項 記載の懸濁液。 5.懸濁液を7,500回転/分において30分間遠心分離した後に得られる 上澄み液中に存在するシリカの量が懸濁液中に存在するシリカの重量の60%以 上好ましくは90%以上を占めることを特徴とする請求項1〜4のいずれか一項 記載の懸濁液。 6.懸濁液中の凝集体の粒度分布は、それらのメジアン直径D50が5μmより も小さく且つ解凝集ファクターFDが3mlよりも大きいことを特徴とする請求 項1〜5のいずれか一項記載の懸濁液。 7.シリカの沈降反応から生じそして粉砕された濾過ケーキを含む請求項1〜 6のいずれか一項記載の懸濁液。 8.Al/SiO2重量比が1,000〜3,300ppmになるような量で アルミニウムを含む請求項1〜7のいずれか一項記載の懸濁液。 9.(A)酸性化剤をアルカリ金属(M)ケイ酸塩に作用させることによって シリカの沈殿反応を行ない、この場合に、 (i)反応に導入されるアルカリ金属ケイ酸塩の全量のうちの一部分を含む初 期ベース原料(SO2として表わされる該初期ベース原料中のケイ酸塩濃度は 20g/lよりも低い)を形成し、 (ii)初期ベース原料に酸性化剤を、該初期ベース原料中に存在するM2Oの 量の少なくとも5%が中和されるまで添加し、 (iii)(添加したシリカの量)/(初期ベース原料中に存在するシリカの量) 比が10〜100になるように反応混合物に酸性化剤を残りの量のアルカリ金属 ケイ酸塩と同時に添加し、 (B)反応混合物から10〜40%の固形分含量を有する沈殿ケーキを分離し 、 (C)該ケーキを解凝集して低粘度の懸濁液を得る、 ことを包含する請求項1〜8のいずれか一項記載の懸濁液の製造法。 10.(A)酸性化剤をアルカリ金属(M)ケイ酸塩に作用させることによって シリカの沈殿反応を行ない、この場合に、 (i)反応に導入されるアルカリ金属ケイ酸塩及び電解質の総量の少なくとも 一部分を含む初期ベース原料(SiO2として表わされる該初期ベース原料中の ケイ酸塩濃度は100g/lよりも低くそして該初期ベース原料中の電解質濃度 は17g/lよりも低い)を形成し、 (ii)ベース原料に酸性化剤を、反応混合物中に少なくとも約7のpH値が得 られるまで添加し、 (iii)反応混合物に酸性化剤そして必要ならば残りの量のケイ酸塩を同時に 添加し、 (B)反応混合物から10〜40%の固形分含量を有する沈殿ケーキを分離し 、 (C)該ケーキを解凝集して低粘度の懸濁液を得る、 ことを包含する請求項1〜8のいずれか一項記載の懸濁液の製造法。 11.工程(B)の後に、シリカに富むケーキの固形分含量が10〜40%にな る程の量のシリカ粉末が沈殿ケーキに添加される請求項9又は10記載の方法。 12.工程(C)において、沈殿ケーキが水で希釈される請求項9〜11のいず れか一項記載の方法。 13.工程(C)において、沈殿ケーキが湿式粉砕によって又は超音波処理によ って機械的に粉砕される請求項9〜12のいずれか一項記載の方法。 14.工程(C)において、シリカ懸濁液を酸性化してそのpHが4よりも下に なるようにすることによって化学的粉砕が機械的粉砕と同時に実施される請求項 9〜13のいずれか一項記載の方法。 15.工程(C)において、硫酸及びアルミン酸ナトリウムを同時に導入して懸 濁液のpHが6〜7にとどまりそしてAl/SiO2重量比が1,000〜3, 300ppmになるようにすることによって、化学的粉砕が機械的粉砕と同時に 実施される請求項9〜13のいずれか一項記載の方法。 16.工程A(iii)の後に、工程(B)に先立って硫酸及びアルミン酸ナトリウ ムを同時に反応混合物に添加して混合物のpHが6〜7にとどまりそしてAl/ SiO2重量比が1,000〜3,300ppmになるようにすることによって 化学的粉砕が機械的粉砕と同時に実施される請求9〜13のいずれか一項記載の 方法。 17.工程(C)において、 (i)沈殿ケーキを1種以上の有機溶剤で洗浄し、かくして洗浄したケーキを 乾燥してシリカ粉末を得、そして (ii)最終懸濁液の固形物含量が10〜40%になるような量のシリカ粉末を 水中に懸濁させる、 請求項9〜11のいずれか一項記載の方法。 18.溶剤がエタノール、エーテル又はエタノール/エーテル混合物から選択さ れる請求項17記載の方法。 19.請求項1〜8のいずれか一項記載の懸濁液を使用して、耐腐食性被覆を形 成する方法。 20.請求項1〜8のいずれか一項記載の懸濁液を使用してコンクリートを製造 する方法。 21.請求項1〜8のいずれか一項記載の懸濁液を使用して紙を製造する方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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FR9408430A FR2722185B1 (fr) | 1994-07-07 | 1994-07-07 | Suspension concentree de silice de precipitation, procedes pour sa preparation et utilisations de cette suspension |
FR94/08430 | 1994-07-07 | ||
PCT/FR1995/000901 WO1996001787A1 (fr) | 1994-07-07 | 1995-07-05 | Suspension concentree de silice de precipitation, procedes pour sa preparation et utilisations de cette suspension |
Publications (2)
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JPH09510686A true JPH09510686A (ja) | 1997-10-28 |
JP3553076B2 JP3553076B2 (ja) | 2004-08-11 |
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JP50415296A Expired - Lifetime JP3553076B2 (ja) | 1994-07-07 | 1995-07-05 | 沈降シリカの濃厚懸濁液、その製造法及びこの懸濁液の使用 |
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US (1) | US6761867B1 (ja) |
EP (1) | EP0768986B1 (ja) |
JP (1) | JP3553076B2 (ja) |
KR (1) | KR100197149B1 (ja) |
CN (1) | CN1052958C (ja) |
AT (1) | ATE250006T1 (ja) |
AU (1) | AU696633B2 (ja) |
BR (1) | BR9508239A (ja) |
CA (1) | CA2193002C (ja) |
DE (1) | DE69531785T2 (ja) |
DK (1) | DK0768986T3 (ja) |
ES (1) | ES2206514T3 (ja) |
FR (1) | FR2722185B1 (ja) |
MX (1) | MX9606612A (ja) |
NO (1) | NO321829B1 (ja) |
NZ (1) | NZ289450A (ja) |
PT (1) | PT768986E (ja) |
RU (1) | RU2137711C1 (ja) |
TW (1) | TW298587B (ja) |
WO (1) | WO1996001787A1 (ja) |
ZA (1) | ZA955622B (ja) |
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JP2015510867A (ja) * | 2012-03-22 | 2015-04-13 | ローディア オペレーションズ | 膜濃縮工程を含む沈殿シリカの製造方法 |
JP2015514053A (ja) * | 2012-03-22 | 2015-05-18 | ローディア オペレーションズ | 高温分解工程を含む沈殿シリカの製造方法 |
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FR2766849B1 (fr) * | 1997-08-01 | 1999-12-24 | Rhodia Chimie Sa | Procede de fabrication de papier utilisant un nouveau systeme de retention comprenant une silice precipitee et un polymere cationique |
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FR2804952B1 (fr) | 2000-02-11 | 2002-07-26 | Rhodia Chimie Sa | Composition de beton ultra haute performance resistant au feu |
FR2819246B1 (fr) * | 2000-12-27 | 2003-10-03 | Rhodia Chimie Sa | Suspensions de silice precipitee, dopee et de faible granulometrie et leur application comme charge pour papier |
FR2879631B1 (fr) * | 2004-12-16 | 2007-02-23 | Snf Sas Soc Par Actions Simpli | Procede pour la fabrication de papier |
DE102006049524A1 (de) | 2006-10-20 | 2008-04-24 | Evonik Degussa Gmbh | Wässrige Dispersionen gefällter Kieselsäuren und Silikate zur Steigerung der Frühfestigkeit in zementartigen Zubereitungen |
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1994
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2015509480A (ja) * | 2012-03-09 | 2015-03-30 | ヘレーウス クヴァルツグラース ゲゼルシャフト ミット ベシュレンクテル ハフツング ウント コンパニー コマンディートゲゼルシャフトHeraeus Quarzglas GmbH & Co. KG | ペースト状SiO2材料を製造および加工するための方法、ならびにその使用 |
JP2015510867A (ja) * | 2012-03-22 | 2015-04-13 | ローディア オペレーションズ | 膜濃縮工程を含む沈殿シリカの製造方法 |
JP2015514053A (ja) * | 2012-03-22 | 2015-05-18 | ローディア オペレーションズ | 高温分解工程を含む沈殿シリカの製造方法 |
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EP0768986B1 (fr) | 2003-09-17 |
NO321829B1 (no) | 2006-07-10 |
CN1052958C (zh) | 2000-05-31 |
AU2929995A (en) | 1996-02-09 |
ZA955622B (en) | 1997-06-01 |
US6761867B1 (en) | 2004-07-13 |
CA2193002A1 (fr) | 1996-01-25 |
TW298587B (ja) | 1997-02-21 |
ATE250006T1 (de) | 2003-10-15 |
DE69531785T2 (de) | 2004-08-05 |
PT768986E (pt) | 2004-02-27 |
AU696633B2 (en) | 1998-09-17 |
KR100197149B1 (ko) | 1999-06-15 |
DE69531785D1 (de) | 2003-10-23 |
EP0768986A1 (fr) | 1997-04-23 |
JP3553076B2 (ja) | 2004-08-11 |
NO970033D0 (no) | 1997-01-06 |
CN1152292A (zh) | 1997-06-18 |
MX9606612A (es) | 1997-03-29 |
RU2137711C1 (ru) | 1999-09-20 |
NZ289450A (en) | 1998-02-26 |
FR2722185B1 (fr) | 1996-09-27 |
CA2193002C (fr) | 2001-06-12 |
ES2206514T3 (es) | 2004-05-16 |
FR2722185A1 (fr) | 1996-01-12 |
DK0768986T3 (da) | 2004-01-26 |
KR970704631A (ko) | 1997-09-06 |
NO970033L (no) | 1997-03-07 |
BR9508239A (pt) | 1997-12-23 |
WO1996001787A1 (fr) | 1996-01-25 |
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