JPH09291389A - Electrolytic bath for wet copper electrolysis - Google Patents

Abstract

PROBLEM TO BE SOLVED: To suppress the bulging of the peripheral edge of a product cathode plate due to the electrolytic edge effect and to increase the number of cathode and anode plated to be loaded in one electrolytic cell by setting a guide having a fixed width on both side walls of the electrolytic bath to be used, inserting the side end of a starting sheet to be used as a cathode and conducting electrolysis. SOLUTION: A starting sheet 1 to be used as a cathode in electrolysis is arranged along a guide 4 having a U-shaped section and previously provided at least on both side walls of an electrolytic bath 3. In this case, the width of the guide 4 covers 90-110% of the thickness of the product cathode, and the height covers at least 1-3cm of the edges of side faces of the cathode. Consequently, since the bulging of the deposited copper on the peripheral edge of the product cathode plate is suppressed, the arrangement of the anode and cathode plates supposing the bulging is not needed.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electrolytic bath used in wet copper electrolysis.

[0002]

2. Description of the Related Art FIG. 2 is a view showing an arrangement of a cathode plate and an anode plate in a conventional wet copper electrolysis, wherein 1 is a cathode plate, 2 is an anode plate, and 3 is an electrolytic bath filled with an electrolytic solution. In a general wet copper electrolysis, a seed plate 1 serving as a cathode and an anode plate 2 are alternately hung from a cross beam 4 via a hanging ribbon 5 in an electrolytic bath 3 and arranged. The components are configured to be purified and deposited on the cathode plate 1 by direct current electrolysis.

[0003]

As the electrolysis progresses, purified metal is deposited on the cathode plate 1. At this time, the peripheral edge of the cathode plate 1 is left behind by the edge effect of electrolysis. The metal deposition rate tends to be faster than the portion (central portion). As a result, the product cathode plate 1'is in a state in which the peripheral edge of the cathode plate is raised from the central portion as shown in FIG. 3, and this raised portion is closer to the anode plate 2 than the other central portions, so that the electric In order to prevent a physical short circuit, it is necessary to keep a wide space between the cathode plate 1 and the anode plate 2 installed in the electrolytic bath 3 in advance. The width of this interval is the same as the electrolytic bath 3
This limits the number of cathode plates 1 and anode plates 2 that can be installed inside and limits the production amount per electrolytic bath.

As described above, in the wet copper electrolysis process, the factor that determines the distance between the cathode plate and the anode plate is the swelling of the peripheral portion of the cathode plate. Since the ridges must be spaced at the intervals assumed in advance, they cannot be simply narrowed. In order to make the space between the cathode plate and the anode plate as narrow as possible and to increase the production capacity per electrolytic bath, it was necessary to study an improvement measure for suppressing the swell.

Therefore, an object of the present invention is to preliminarily form a guide for installing the cathode plate in the electrolytic bath, and to prevent the peripheral edge of the cathode plate from rising in the wet copper electrolysis process by the guide. An object of the present invention is to provide an electrolytic bath for wet copper electrolysis that facilitates installation of a cathode plate in the electrolytic bath.

[0006]

In order to solve the above problems, as a result of various studies by the present inventor, as a result, in order to suppress the rising of the peripheral portion of the cathode plate, the cathode plate is installed in the electrolytic bath. The present invention has been completed by finding that a guide is provided. That is, according to the present invention, a seed plate serving as a cathode is installed along a guide provided on at least both side walls of the electrolytic bath, and the width of the guide is 90% of the thickness of the product cathode at the end of electrolysis. In the range of 110%,
And 1 cm to 3 at the edge of at least both sides of the cathode
It is characterized by an electrolytic bath for wet copper electrolysis covering a range of cm.

[0007]

BEST MODE FOR CARRYING OUT THE INVENTION The present inventor investigated the swelling of the cathode plate at various guide widths and guide positions, and found that the width of the guide was 90% of the thickness of the central portion of the product cathode plate after electrolysis. ˜110% range, and the guide is 1c at least at the edges of both sides of the cathode plate.
It has been found that the bulge can be suppressed by installing so as to cover the width portion in the range of m to 3 cm. The width of the guide is 90% of the thickness of the central portion of the product cathode plate.
If it is less than the above range, the peripheral portion of the cathode plate becomes too thin as compared with other portions. On the other hand, if it exceeds 110% of the thickness of the central portion of the product cathode plate, the effect of suppressing the swelling will decrease. Furthermore, by covering at least the range of 1 cm to 3 cm at the edges of both side surfaces of the cathode, the effect of suppressing swelling is sufficiently realized.

According to the present invention, it is possible to sufficiently suppress the swelling of the peripheral portion of the cathode plate that occurs during the wet copper electrolysis process, and therefore it is not necessary to install the anode plate and the cathode plate at an interval which is assumed in advance. As a result, it is possible to increase the number of cathode plates and anode plates to be installed per electrolysis bath, and to improve the production capacity per electrolysis bath.

Referring to the drawings, the present invention will be described with reference to FIG.
In the electrolytic bath of the present invention shown in FIG. 1, the electrolytic bath 3 for wet copper electrolysis is provided with a guide 4 having a U-shaped cross section over both side walls 3'or both side walls 3'and a bottom surface 3 "(not shown). A plurality of guides 4 are provided in parallel with each other, and the guides 4 are made of an electrically insulating material such as vinyl chloride resin, etc. Then, the anode plates 2 and the cathode plates 1 are alternately arranged.
At this time, the cathode plate 1 is inserted along the guide 4 and arranged at a predetermined position. On the other hand, the anode plate 2 is supported in a hanging manner as in the conventional case. As described above, the guide 4 facilitates the installation of the cathode plate 1 in the electrolytic bath 3, and the anode plate 2 and the cathode plate 1 can be arranged at a narrower interval than in the prior art.

The guide 4 has a width in the range of 90% to 110% of the thickness of the central portion of the product cathode plate after electrolysis, and has a width of 1 at least at the edges of both sides of the cathode plate 1.
Since the width portion in the range of 3 cm to 3 cm is covered, the rise of the peripheral portion of the product cathode plate can be suppressed as described above, and the number of loaded anode plates 2 and cathode plates 1 in the electrolytic bath 3 can be increased.

In order to further suppress the rising of the peripheral edge of the cathode plate, after connecting the cathode plate 1 to the cross beam via the ribbon, a cover made of the same material and having the same shape as the guide 4 is attached to the cathode plate. It is preferable to adhere to the upper edge and electrolyze.

[0012]

EXAMPLE Next, an example of the present invention will be described with reference to FIG. 1. The general dimensions of the cathode plate 1 before wet copper electrolysis are 1 mm in thickness and 1000 mm in width × 1000 mm in height, The weight of the anode plate 2 is 8 kg, and the anode plate 2 has a thickness of 150 mm and a width x height of 1000 mm x.
It is 1000 mm. The guide 4 has a width of 80 m.
m, length 1100 mm, depth 175 mm, 260 m
They were provided on both side walls 3'in the electrolytic bath 3 at intervals of m.
These dimensions were set from the average dimensions of the product cathode plate.

By adopting the above electrolytic bath, the anode plate and the cathode plate can be arranged at a narrower interval than before, and the number of cathode plates and anode plates loaded in the electrolytic bath 3 having a size of 2600 mm × 1300 mm × 1300 mm is increased by 8%. did.

[0014]

As described above, according to the present invention, the number of anode plates and cathode plates loaded in the copper electrolytic bath during wet copper electrolysis can be increased by 8%, so that the production capacity per unit electrolytic bath capacity can be increased. Was improved by 8%.

[Brief description of drawings]

FIG. 1 is a schematic plan view of a wet copper electrolytic bath of the present invention.

FIG. 2 is a schematic view of a conventional copper electrolytic bath, (a) is a side view and (b) is a front view.

FIG. 3 is a shape explanatory view of a product cathode plate obtained by conventional copper electrolysis, (a) is a front view and (b) is a side view.

[Explanation of symbols]

 1 cathode plate 1'product cathode plate 2 anode plate 3 electrolysis bath 3'side wall 3 "bottom surface 4 guide

Claims (1)

[Claims] 1. A seed plate serving as a cathode is installed along a guide provided in advance on at least both side walls of an electrolytic bath, and the width of the guide is 90% to 90% of the thickness of the product cathode at the end of electrolysis. An electrolytic bath for wet copper electrolysis, characterized in that it covers 110% of the cathode and covers at least 1 cm to 3 cm of the edges of both sides of the cathode.