JPH09246324A - Electronic component and bump forming method thereof - Google Patents
Electronic component and bump forming method thereofInfo
- Publication number
- JPH09246324A JPH09246324A JP8051315A JP5131596A JPH09246324A JP H09246324 A JPH09246324 A JP H09246324A JP 8051315 A JP8051315 A JP 8051315A JP 5131596 A JP5131596 A JP 5131596A JP H09246324 A JPH09246324 A JP H09246324A
- Authority
- JP
- Japan
- Prior art keywords
- electronic component
- bump
- hole
- forming method
- hole mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims description 84
- 238000010438 heat treatment Methods 0.000 claims description 47
- 239000000463 material Substances 0.000 claims description 27
- 230000008018 melting Effects 0.000 claims description 20
- 238000002844 melting Methods 0.000 claims description 20
- 229910052751 metal Inorganic materials 0.000 claims description 20
- 239000002184 metal Substances 0.000 claims description 20
- 239000002904 solvent Substances 0.000 claims description 9
- 229920001721 polyimide Polymers 0.000 claims description 5
- 239000004642 Polyimide Substances 0.000 claims description 4
- 238000009835 boiling Methods 0.000 claims description 3
- 239000004020 conductor Substances 0.000 claims 1
- 229910000679 solder Inorganic materials 0.000 description 64
- 230000004907 flux Effects 0.000 description 25
- 238000007639 printing Methods 0.000 description 15
- 125000006850 spacer group Chemical group 0.000 description 11
- 238000004519 manufacturing process Methods 0.000 description 9
- 239000011521 glass Substances 0.000 description 8
- 239000002585 base Substances 0.000 description 7
- 239000000919 ceramic Substances 0.000 description 6
- 239000000853 adhesive Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 230000005496 eutectics Effects 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000003825 pressing Methods 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 238000001179 sorption measurement Methods 0.000 description 3
- 101100269850 Caenorhabditis elegans mask-1 gene Proteins 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- 229910020220 Pb—Sn Inorganic materials 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005187 foaming Methods 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 229910052745 lead Inorganic materials 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229910001092 metal group alloy Inorganic materials 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229910020836 Sn-Ag Inorganic materials 0.000 description 1
- 229910020994 Sn-Zn Inorganic materials 0.000 description 1
- 229910020988 Sn—Ag Inorganic materials 0.000 description 1
- 229910009069 Sn—Zn Inorganic materials 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 230000000740 bleeding effect Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/81—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/35—Mechanical effects
- H01L2924/351—Thermal stress
- H01L2924/3511—Warping
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/34—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
- H05K3/341—Surface mounted components
- H05K3/3431—Leadless components
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/34—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
- H05K3/3457—Solder materials or compositions; Methods of application thereof
Landscapes
- Wire Bonding (AREA)
Abstract
(57)【要約】
【課題】高い接続信頼性を持つ電子部品を低コストに提
供する。
【解決手段】電子部品のバンプに平坦部を形成し,バン
プが加熱溶融球体化したときのバンプ頂点位置より,こ
の平坦部位置が低くなるように平坦部位置を制御し、電
子部品や回路基板に反りがある場合でも確実にバンプの
接続を得ることができる。
(57) Abstract: An electronic component having high connection reliability is provided at low cost. SOLUTION: A flat portion is formed on a bump of an electronic component, and the flat portion position is controlled so that the flat portion position is lower than a bump apex position when the bump is heated and melted into a sphere. Even if there is a warp in the bump, the bump connection can be reliably obtained.
Description
【0001】[0001]
【発明の属する技術分野】本発明は,回路基板に搭載,
接続される例えばフリップチップタイプの電子部品と,
電子部品と回路基板の接続に用いるバンプ,例えばはん
だバンプの形成方法に関するものである。TECHNICAL FIELD The present invention is mounted on a circuit board,
For example, a flip chip type electronic component to be connected,
The present invention relates to a method of forming bumps, for example, solder bumps used for connecting electronic components and a circuit board.
【0002】[0002]
【従来の技術】図2に示す通り,従来の電子部品1は端
子電極2上のバンプ3が,バンプ形成時の加熱溶融球体
化した状態そのまま,すなわちバンプ表面がバンプ球形
部10となっていた。この電子部品を回路基板に搭載接
続する工程を図3に示す。図3(a)で,電子部品1の
バンプ3のバンプ球形部10にフラックス7を付着させ
る。その後,図3(b)で,バンプ3と回路基板5上の
接続電極6とが相対するように位置決め,搭載し,フラ
ックス7で仮止めを行う。その後,図3(c)で,リフ
ロー炉106で加熱することにより,接続電極6と端子
電極2は接合バンプ9に接合され,その結果,電子部品
1と回路基板5は電気的に接続される。2. Description of the Related Art As shown in FIG. 2, in the conventional electronic component 1, the bumps 3 on the terminal electrodes 2 are in the state of being heated and melted into spheres during bump formation, that is, the bump surface is a bump spherical portion 10. . A process of mounting and connecting this electronic component on a circuit board is shown in FIG. In FIG. 3A, the flux 7 is attached to the bump spherical portion 10 of the bump 3 of the electronic component 1. After that, as shown in FIG. 3B, the bumps 3 are positioned and mounted so that the bumps 3 and the connection electrodes 6 on the circuit board 5 face each other, and are temporarily fixed by the flux 7. Then, in FIG. 3C, the connection electrode 6 and the terminal electrode 2 are bonded to the bonding bumps 9 by heating in the reflow furnace 106, and as a result, the electronic component 1 and the circuit board 5 are electrically connected. .
【0003】バンプ,特にはんだバンプの形成方法とし
ては従来,特開平5-129374号公報に示されるような,は
んだボールを用いたバンプ形成方法が知られている。こ
れは,電子部品のバンプ形成される端子電極と相対する
位置に吸着孔を持つ吸着治具にはんだボールを整列吸着
させ,このはんだボールをフラック等を介して端子電極
位置に転写,仮止めをし,その状態ではんだボールを加
熱溶融しバンプを形成するものである。As a method for forming bumps, particularly solder bumps, a bump forming method using solder balls is known as disclosed in Japanese Patent Laid-Open No. 5-129374. This is because solder balls are aligned and adsorbed by an adsorption jig having an adsorption hole at a position facing a bump-formed terminal electrode of an electronic component, and the solder ball is transferred to the terminal electrode position via a flack or the like and temporarily fixed. Then, the solder balls are heated and melted in that state to form bumps.
【0004】また,はんだペーストを用いた,従来のバ
ンプ形成方法としては,"日立テクノエンジニアリング
ファインピッチSMT実装技術セミナー資料”Dec/5-
6/1995のp6-6からp6ー11に示されるような,スクリーン
マスク印刷により端子電極上にペーストを転写し,この
ペーストを加熱溶融することによりバンプを形成する方
法や,(社)溶接学会主催の1st Symposium on "Microj
oining and AssemblyTechnology in Electronics"Feb/9
-10/1995,Tokyoの予稿集P187-192に示されるような,電
子部品上にマスクを置き,そのマスクに印刷によりはん
だペーストを充填し,マスク置いた状態のままはんだペ
ーストを加熱溶融しバンプを形成する方法や,特開平7-
245309号公報に示されるような端子電極と相対する位置
に凹部を持つ基材の凹部にはんだペーストを充填し,そ
の上に電子部品を搭載し加熱溶融する方法が知られてい
る。As a conventional bump forming method using solder paste, "Hitachi Techno Engineering Fine Pitch SMT Mounting Technology Seminar Material" Dec / 5-
As shown in p6-6 to p6-11 of 6/1995, a method of transferring a paste onto a terminal electrode by screen mask printing and forming a bump by heating and melting the paste, and the Welding Society of Japan Sponsored 1st Symposium on "Microj
oining and AssemblyTechnology in Electronics "Feb / 9
-10/1995, Tokyo Proceedings P187-192, place a mask on the electronic component, fill the mask with solder paste by printing, heat melt the solder paste with the mask placed, and bump Forming method, and Japanese Patent Laid-Open No. 7-
There is known a method of filling a solder paste in a concave portion of a base material having a concave portion at a position facing a terminal electrode as shown in Japanese Patent No. 245309, mounting an electronic component on the concave portion, and heating and melting.
【0005】[0005]
【発明が解決しようとする課題】図2のバンプ3の頂点
がバンプ球形部10である電子部品1を回路基板に搭載
する場合,図3(b)のようにバンプ球形部10と接続
電極6との接点は点接触となるため,搬送中の機械的振
動等でバンプ球形部10と接続電極6に位置ズレが発生
し,電子部品と回路基板の加熱溶融接合時にバンプの未
接続が発生するという問題があった。When the electronic component 1 in which the apex of the bump 3 of FIG. 2 is the bump spherical portion 10 is mounted on a circuit board, the bump spherical portion 10 and the connecting electrode 6 are formed as shown in FIG. 3B. Since the contact point with the point contact is a point contact, the bump spherical portion 10 and the connection electrode 6 are displaced due to mechanical vibration during transportation, and the bump is not connected when the electronic component and the circuit board are heated and melt-bonded. There was a problem.
【0006】また,反りのある電子部品や回路基板の場
合,図3(c)に示すように電子部品1と回路基板5の
加熱溶融接合後の接合間隔30に電子部品1,回路基板
5に反りがない場合より反りの分だけ接合間隔30が大
きい部分が発生してしまう。このため,接合間隔30の
最大値より電子部品1のバンプの高さの最小値が小さい
場合,未接続バンプ8が発生してしまう問題があった。
この対策のため,電子部品や回路基板の反り防止や,は
んだ供給量を高精度化しバンプの高さばらつきを低減さ
せるための技術開発や装置開発に多大な投資が必要であ
った。また,端子電極径,バンプの大きさを設計する際
にも,反りのために設計マージンを割かなければならな
くなり,設計の自由度が低下するという問題があったま
た上記従来のはんだボールを用いたバンプ形成方法にお
いては,はんだボールの製造コストが高いという問題が
あった。また,バンプ数が多くなった場合や,はんだボ
ール径やピッチが小さくなった場合に,はんだボール整
列吸着ミスや電子回路への転写ミスが多発し,吸着や転
写の再試行が必要となるため,生産タクトが増大,歩留
まりが低下するという問題があった。In the case of a warped electronic component or circuit board, as shown in FIG. 3 (c), the electronic component 1 and the circuit board 5 are arranged at a bonding interval 30 after the electronic component 1 and the circuit board 5 are melted by heating. A part in which the bonding interval 30 is larger than that in the case where there is no warp is generated. Therefore, when the minimum value of the bump height of the electronic component 1 is smaller than the maximum value of the bonding interval 30, the unconnected bump 8 is generated.
As a countermeasure for this, a large investment was required for technological development and device development to prevent warpage of electronic components and circuit boards and to improve the accuracy of solder supply and reduce variations in bump height. Also, when designing the terminal electrode diameter and the bump size, there is a problem that the design margin has to be divided due to the warpage, which reduces the degree of freedom in design. The conventional bump forming method has a problem that the manufacturing cost of the solder balls is high. In addition, when the number of bumps is large, or when the solder ball diameter or pitch is small, solder ball alignment and suction errors and transfer errors to electronic circuits occur frequently, and it is necessary to retry suction and transfer. However, there was a problem that the production tact increased and the yield decreased.
【0007】また,スクリーンマスク印刷により端子電
極上にはんだペーストを転写し,このはんだペーストを
加熱溶融することによりバンプを形成する方法では,端
子電極上にはんだペーストを転写する際,スクリーンマ
スクにはんだペーストが部分的に残ってしまい,このた
め転写されたはんだペースト量がばらつき,加熱溶融後
のバンプの大きさがばらつくという問題があった。ま
た,加熱溶融時に隣接したはんだペースト同士が流れ出
して接触し,バンプ間にブリッジが発生したり,大バン
プ,小バンプが発生したりする問題があった。Further, in the method of forming the bumps by transferring the solder paste onto the terminal electrodes by screen mask printing and heating and melting the solder paste, when the solder paste is transferred onto the terminal electrodes, the solder is applied to the screen mask. There was a problem that the paste remained partially, and thus the transferred solder paste amount varied and the bump size after heating and melting varied. In addition, there is a problem that adjacent solder pastes flow out and contact each other during heating and melting, which causes a bridge between the bumps and a large bump or a small bump.
【0008】また,電子部品上にマスクを置き,そこに
印刷によりはんだペーストを充填し,マスクを置いた状
態のままはんだペーストを加熱溶融しバンプを形成する
方法では,電子部品1個ずつバンプ形成をすることにな
り大量生産が困難であった。また,電子部品上の配線等
の凹凸によりマスクのはんだ充填量がばらついたり,は
んだペーストのにじみが発生するという問題もあった。In a method of placing a mask on an electronic component, filling the solder paste by printing on the electronic component, and heating and melting the solder paste while the mask is placed to form bumps, bumps are formed for each electronic component. Therefore, mass production was difficult. Further, there are problems that the solder filling amount of the mask varies due to the unevenness of the wiring on the electronic component, and the bleeding of the solder paste occurs.
【0009】端子電極と相対する位置に凹部を持つ基材
の凹部にはんだペーストを充填し,その上に電子部品を
搭載し加熱溶融する方法では,基材の凹部を形成するた
めに一般にエッチングを用いるが,凹部の深さ精度を出
すのが困難であり,また基材材質もエッチングが可能な
ものに限定されてしまう。凹部を機械加工で行う場合で
も,深さ精度を出すのが困難で,また凹部1カ所ずつの
加工となると基材の製作コストが高くなるという問題も
あった。更に,はんだペーストを加熱溶融後,凹部内に
できたバンプがフラックス残渣で基材に固定され,また
凹部のフラックス残渣の洗浄が困難なため,基材と電子
部品の分離が困難となり,無理に分離するとバンプに傷
がついたりバンプの脱落が発生するという問題があっ
た。In a method of filling a solder paste in a concave portion of a base material having a concave portion at a position facing a terminal electrode and mounting an electronic component thereon and heating and melting the same, etching is generally performed to form the concave portion of the base material. Although it is used, it is difficult to obtain the precision of the depth of the recess, and the material of the base material is limited to one that can be etched. Even when the recesses are machined, it is difficult to obtain the depth accuracy, and when the recesses are processed one by one, the manufacturing cost of the base material increases. Furthermore, after heating and melting the solder paste, the bumps formed in the recesses are fixed to the base material by the flux residue, and it is difficult to clean the flux residue in the recesses. When separated, there was a problem that the bump would be scratched or the bump might come off.
【0010】本発明の目的は,複数のバンプを持つ電子
部品において,回路基板との接続時に未接続を防ぎ,接
続信頼性及び製品歩留まりを向上させ,また,電子部品
の設計自由度を高め,より安価で高機能な電子部品を提
供することにある。An object of the present invention is to prevent non-connection in an electronic component having a plurality of bumps when it is connected to a circuit board, improve connection reliability and product yield, and increase the degree of freedom in designing electronic components. It is to provide cheaper and higher-performance electronic components.
【0011】更に,本発明の他の目的は、複数のバンプ
を持つ電子部品の製造方法において,低価格で簡便な方
法で,バンプの大きさ精度が良く,信頼性及び歩留まり
向上することが可能なバンプ形成方法を提供することに
ある。Still another object of the present invention is to provide a method of manufacturing an electronic component having a plurality of bumps, which is a low-priced and simple method, has a good bump size accuracy, and can improve reliability and yield. Another object is to provide a simple bump forming method.
【0012】[0012]
【課題を解決するための手段】上記課題を解決するため
に本発明の電子部品表面の端子電極にバンプを形成した
電子部品は,バンプの電子部品が実装される回路基板側
の部位が平坦でかつ,電子部品のバンプ形成面を上向き
とした場合のバンプを加熱球体化したときのバンプ頂点
位置が,最も電子部品から突出したバンプの平坦部位置
より同じ,あるいは高くするものである。In order to solve the above-mentioned problems, an electronic component having a bump formed on a terminal electrode on the surface of the electronic component of the present invention has a flat portion on the circuit board side where the electronic component of the bump is mounted. In addition, when the bump forming surface of the electronic component faces upward, the bump apex position when the bump is formed into a heating sphere is the same as or higher than the flat portion position of the bump most protruding from the electronic component.
【0013】また,バンプの電子部品が実装される回路
基板側の部位が平坦でかつ,該平坦部が同一平面内とな
るように平坦部位置を制御し,前記バンプを加熱球体化
したときのバンプ頂点位置を,バンプの平坦部位置より
高くするものである。In addition, when the flat portion of the bump on the side of the circuit board on which the electronic component is mounted is flat and the flat portion position is controlled so that the flat portion is in the same plane, the bump is formed into a heating sphere. The bump top position is set higher than the bump flat position.
【0014】また,バンプの加熱球体化したときのバン
プ頂点位置と,バンプの平坦部位置との差分を,電子部
品が実装される回路基板の電子部品搭載領域の最大のそ
りの大きさより大きくするものである。Further, the difference between the bump apex position when the bump is heated into a spherical shape and the flat portion position of the bump is made larger than the maximum warp size of the electronic component mounting area of the circuit board on which the electronic component is mounted. It is a thing.
【0015】また,前記バンプの体積をすべて等しくす
るものである。Further, the volumes of the bumps are all made equal.
【0016】更に,上記課題を解決するために本発明の
電子部品表面の端子電極上にバンプを形成した電子部品
のバンプ形成方法は,電子部品表面の端子電極に対応し
た位置に貫通穴を持つ貫通穴マスクを一枚以上重ねて平
板表面に固定し,前記貫通穴に金属ペーストまたは導電
性ペーストを充填し,端子電極と貫通穴が相対するよう
に位置決め搭載し,前記ペーストを加熱溶融して前記端
子電極に転写し,貫通穴マスクと平板を取り除くことに
よりバンプを形成するものである。Further, in order to solve the above problems, the bump forming method for an electronic component in which bumps are formed on the terminal electrodes on the surface of the electronic component according to the present invention has through holes at positions corresponding to the terminal electrodes on the surface of the electronic component. One or more through-hole masks are stacked and fixed on the flat plate surface, the through-hole is filled with a metal paste or a conductive paste, the terminal electrode and the through-hole are positioned and mounted so that the paste is heated and melted. The bumps are formed by transferring to the terminal electrodes and removing the through hole mask and the flat plate.
【0017】また,前記バンプ形成方法において,金属
ペースト内の金属あるいは導電性ペースト内の導電性物
質の融点より低くかつ,ペースト加熱溶融後の残渣の硬
化温度より高い温度に,電子部品,平板,貫通穴マスク
の少なくとも1つ以上を加熱し,その状態で電子部品か
ら貫通穴マスクと平板を取り除くことによりバンプを形
成するものである。In the bump forming method, the electronic component, the flat plate, the temperature lower than the melting point of the metal in the metal paste or the conductive substance in the conductive paste and higher than the curing temperature of the residue after the paste is heated and melted. The bumps are formed by heating at least one of the through-hole masks and removing the through-hole mask and the flat plate from the electronic component in that state.
【0018】更に,前記のバンプ形成方法において,ペ
ーストを加熱溶融して端子電極に転写する際に,貫通穴
マスクと電子部品との間に隙間を設け,その隙間と貫通
穴マスクの厚みの合計が,ペーストが加熱溶融球体化し
たときの平板からの高さよりも小さくし,更にペースト
が電子部品の端子電極に加熱溶融転写され球体化したと
きの電子部品からの高さより大きくすることによりバン
プを形成するものである。Further, in the above bump forming method, when the paste is heated and melted and transferred to the terminal electrode, a gap is provided between the through hole mask and the electronic component, and the total of the gap and the thickness of the through hole mask. However, the height of the bump is made smaller than the height from the flat plate when the paste is heated and melted into spheres, and is larger than the height from the electronic component when the paste is heated and melted and transferred to the terminal electrodes of the electronic component to become spherical. To form.
【0019】更に,前記のバンプ形成方法において端子
電極と貫通穴が相対するように位置決めする前に,重ね
た複数の貫通穴マスクの表面の貫通穴マスクをはがすこ
とによりバンプを形成するものである。Further, in the above bump forming method, the bumps are formed by removing the through hole masks on the surfaces of the plurality of stacked through hole masks before positioning so that the terminal electrodes and the through holes face each other. .
【0020】更に,貫通穴マスクの穴形状が正方形ある
いは長方形あるいは多角形であるものである。Furthermore, the hole shape of the through-hole mask is square, rectangular, or polygonal.
【0021】更に,貫通穴マスクの厚みが,ペーストが
加熱溶融球体化したときの平板からの高さよりも小さい
ものである。Further, the thickness of the through-hole mask is smaller than the height from the flat plate when the paste is heated and melted into spheres.
【0022】更に,貫通穴マスクの厚みが,ペーストが
加熱溶融球体化したときの平板からの高さよりも小さ
く,電子部品の端子電極に加熱溶融転写され球体化した
ときのバンプ高さより大きいものである。Further, the thickness of the through-hole mask is smaller than the height from the flat plate when the paste is heated and melted into spheres, and is larger than the bump height when the paste is heated and melted and transferred to the terminal electrodes of the electronic parts. is there.
【0023】更に,前記貫通穴マスクに可撓性をもたせ
た,例えばポリイミド材料で作成するものである。Further, the through-hole mask is made of, for example, a polyimide material having flexibility.
【0024】更に,前記平板を可撓性をもつ材料で作成
するものである。Further, the flat plate is made of a flexible material.
【0025】更に,前記のバンプ形成方法において,ペ
ーストを加熱溶融して端子電極に転写する前に,電子部
品の上に重りを乗せることによりバンプを形成するもの
である。Further, in the above bump forming method, the bump is formed by placing a weight on the electronic component before the paste is heated and melted and transferred to the terminal electrode.
【0026】更に,上記のバンプ形成方法において電子
部品の上に重りを乗せる前に,電子部品と貫通穴マスク
をペーストの溶剤の沸点以下の温度で加熱後冷却するこ
とによりバンプを形成するものである。Further, in the above bump forming method, the bump is formed by heating the electronic component and the through-hole mask at a temperature lower than the boiling point of the solvent of the paste and then cooling before placing a weight on the electronic component. is there.
【0027】上記手段による電子部品によれば,バンプ
の回路基板側の部位を平坦にすることにより,回路基板
上に電子部品を搭載した際の接触を面で行え,接触面積
を増加させることができる。更にこのバンプの平坦面を
同一平面内となるように平坦部位置を制御することによ
り更に接触面積を増加させることができ,これにより搭
載後の位置ズレを防止することができ,接続信頼性及び
歩留まりを向上させることができる。According to the electronic component according to the above means, by flattening the portion of the bump on the circuit board side, it is possible to make contact when mounting the electronic component on the circuit board and increase the contact area. it can. Furthermore, the contact area can be further increased by controlling the position of the flat part so that the flat surface of this bump is in the same plane, which can prevent the positional deviation after mounting and improve the connection reliability and The yield can be improved.
【0028】また,平坦部を持つバンプを加熱球体化し
たときのバンプ頂点位置が,最も電子部品から突出した
バンプの平坦部位置と同じあるいはより高くすることに
より,電子部品が反っている場合でもバンプ加熱溶融時
に全てのバンプが回路基板の接続電極に接触するため,
バンプの未接続を防ぐことができ,接続信頼性及び製品
歩留まりを向上させることができる。更に,平坦面を持
つバンプを加熱球体化したときのバンプ頂点位置が,バ
ンプの平坦部位置より高く,その差分が電子部品が実装
される回路基板の電子部品搭載領域の最大の反りの大き
さより大きくすることにより,回路基板が反っていた場
合でもバンプ加熱溶融時に全てのバンプが回路基板に接
触するため,バンプの未接続を防ぐことができ,さらな
る接続信頼性及び製品歩留まりを向上させることができ
る。またこれにより,電子部品の反り,回路基板の反り
を電子部品設計時に無視できるため,電子部品の端子電
極径やバンプの大きさを,電気的性能向上等の仕様に合
わせて自由に設計できるため高機能化が実現でき,また
設計マージンが大きくなるため,他の電子部品との共通
部材使用も可能となりその結果,高機能で安価な電子部
品とすることができる。Even if the electronic component is warped, the bump apex position when the bump having the flat portion is formed into a heating sphere is set to be the same as or higher than the flat portion position of the bump protruding most from the electronic component. Since all bumps come into contact with the connection electrodes of the circuit board when the bumps are heated and melted,
The bumps can be prevented from being unconnected, and the connection reliability and product yield can be improved. Furthermore, the bump apex position when a bump with a flat surface is made into a heating sphere is higher than the flat part position of the bump, and the difference is greater than the maximum warp size of the electronic component mounting area of the circuit board on which the electronic component is mounted. By increasing the size, even if the circuit board is warped, all the bumps come into contact with the circuit board during heating and melting of the bumps, so that it is possible to prevent unconnection of the bumps and further improve the connection reliability and the product yield. it can. In addition, since the warp of the electronic component and the warp of the circuit board can be ignored when designing the electronic component, the terminal electrode diameter and the bump size of the electronic component can be freely designed according to specifications such as electrical performance improvement. Since high functionality can be realized and the design margin is large, it is possible to use a common member with other electronic components, and as a result, a high-performance and inexpensive electronic component can be obtained.
【0029】更に,前記のバンプの体積を全て同じとす
ることにより,例えばはんだバンプ形成のためのはんだ
供給量が全バンプで等しくなり,同一径のはんだボール
や同一穴径のペースト印刷マスクを使用することができ
るため装置及び治具が簡略化でき製造コストを低減する
ことができる。Further, by making all the bumps have the same volume, for example, the solder supply amount for forming the solder bumps becomes the same for all the bumps, and the solder balls having the same diameter and the paste printing mask having the same hole diameter are used. Therefore, the device and the jig can be simplified and the manufacturing cost can be reduced.
【0030】更に前記手段の電子回路のバンプ形成方法
によれば,例えばはんだバンプの場合,電子部品表面の
端子電極に対応した位置に貫通穴を持つ貫通穴マスクを
一枚以上重ねて平板表面に固定し,貫通穴にはんだペー
ストを充填し,端子電極と貫通穴が相対するように位置
決めし,はんだペーストを加熱溶融して端子電極に転写
し,貫通穴マスクと平板を取り除くことによりバンプを
形成するため,はんだボールより安価なはんだペースト
を使用するため電子部品を低価格で提供することができ
る。また,電子回路上でなく平板の上にマスクを乗せペ
ースト充填するために例えばペースト印刷を行うため,
電子回路上の凹凸や反り等に影響されず充填ペースト量
が均一な高精度なはんだ印刷が可能となる。更にマスク
の大きさを電子回路複数個分の大きさとすれば複数の電
子回路に同時にバンプを形成することができ,製造工数
が低減できる。また,ペーストを充填する部分を貫通穴
マスクと平板で構成することにより,ペーストが充填さ
れる部分の精度がマスク厚と貫通穴径で制御できるよう
になる。一般に厚みと穴径は安価な方法で高精度に維持
することができるため,精度を維持することが困難な基
材に凹部を形成する場合と比較して,低コストで高精度
にペーストを充填する部分を作ることができる。Further, according to the electronic circuit bump forming method of the above means, for example, in the case of solder bumps, one or more through-hole masks having through-holes at positions corresponding to the terminal electrodes on the surface of the electronic component are overlaid on the flat plate surface. Fix, fill the through hole with solder paste, position so that the terminal electrode and the through hole face each other, heat and melt the solder paste to transfer to the terminal electrode, and form the bump by removing the through hole mask and flat plate Therefore, since the solder paste, which is cheaper than the solder ball, is used, the electronic component can be provided at a low price. Also, in order to put the mask on the flat plate instead of on the electronic circuit to fill the paste, for example, to perform paste printing,
It is possible to perform highly accurate solder printing in which the amount of the filling paste is uniform without being affected by unevenness or warpage on the electronic circuit. Further, if the size of the mask is set to a size corresponding to a plurality of electronic circuits, bumps can be simultaneously formed on a plurality of electronic circuits, and the number of manufacturing steps can be reduced. Further, by forming the paste filling portion with the through hole mask and the flat plate, the accuracy of the paste filling portion can be controlled by the mask thickness and the through hole diameter. Generally, the thickness and hole diameter can be maintained with high accuracy by an inexpensive method, so filling paste with high accuracy at low cost compared to the case of forming a recess in a base material whose accuracy is difficult to maintain. You can make a part to do.
【0031】また,電子部品から貫通穴マスクと平板を
取り除く際に,はんだの融点より低く,フラックス等の
ペースト残渣の硬化温度より高い温度に電子部品,貫通
穴マスク,平板の少なくとも一つ以上を加熱することに
より,フラックス残渣の硬化によるバンプの固定がなく
なり,はんだバンプを傷つけること無く容易に分離する
ことができるようになる。When removing the through-hole mask and the flat plate from the electronic component, at least one of the electronic component, the through-hole mask, and the flat plate is placed at a temperature lower than the melting point of the solder and higher than the curing temperature of the paste residue such as flux. By heating, the bumps are not fixed due to the hardening of the flux residue, and the solder bumps can be easily separated without damaging them.
【0032】更に,電子部品と貫通穴マスクの間に隙間
をあける,あるいは複数の貫通穴マスクを重ねた状態で
ペースト充填のために例えばペースト印刷した後,表面
の貫通穴マスクをはがすことにより電子部品の端子電極
部分以外の箇所と貫通穴マスクとがフラックス等のペー
スト溶媒により密着してしまうことを防止することがで
きる。また,貫通穴マスク,平板を可撓性のある材料で
作成することにより,電子部品の端から容易に徐々に引
きはがすことが可能となる。また,貫通穴の形状を正方
形または長方形あるいは多角形とすることによりバンプ
と貫通穴マスクの接触面積が低減でき密着力を低下させ
ることができる。更に,貫通穴マスクの厚みが,ペース
トが加熱溶融球体化したときの平板からの高さよりも小
さく,電子部品の端子電極に加熱溶融転写され球体化し
たときの電子部品からの高さより大きいものにすること
により,バンプと平板の接触がなくなり,密着力を低下
させることができる。上記の効果により,電子部品と貫
通穴マスクと平板の分離が容易に行えるようになりバン
プ形成工数を低減することができ,その結果電子回路を
安価に供給することが可能となる。Further, a gap is provided between the electronic component and the through-hole mask, or after a plurality of through-hole masks are stacked, for example, paste printing is performed to fill the paste, and then the through-hole mask on the surface is peeled to remove the electrons. It is possible to prevent the parts other than the terminal electrode part of the component and the through-hole mask from coming into close contact with each other by a paste solvent such as flux. In addition, by forming the through-hole mask and the flat plate with a flexible material, it becomes possible to easily and gradually peel the electronic component from the edge. Further, by making the shape of the through hole square, rectangular or polygonal, the contact area between the bump and the through hole mask can be reduced and the adhesion can be reduced. Further, the thickness of the through-hole mask is smaller than the height from the flat plate when the paste is heated and melted into a sphere, and is larger than the height from the electronic component when the paste is heated and melt-transferred to the terminal electrodes of the electronic component and spheroidized. By doing so, the contact between the bump and the flat plate is eliminated, and the adhesion can be reduced. Due to the above effects, the electronic component, the through-hole mask, and the flat plate can be easily separated, the number of bump formation steps can be reduced, and as a result, the electronic circuit can be supplied at a low cost.
【0033】更に,ペーストを加熱溶融して端子電極に
転写する前に,電子部品の上に重りを乗せることによ
り,ペースト加熱溶融時に溶媒の気化等で発生する発泡
現象による電子部品のズレを防ぐことができる。また,
電子部品の上に重りを乗せる前に,電子部品と回路基板
をペーストの溶剤の沸点以下の温度で加熱後冷却するこ
とにより電子部品と貫通穴マスクを仮固定することがで
き,重りを乗せる際の電子部品のズレを防止することが
でき,接続信頼性及び歩留まりを向上させることができ
る。Further, by placing a weight on the electronic component before the paste is heated and melted and transferred to the terminal electrode, the displacement of the electronic component due to the foaming phenomenon generated by the evaporation of the solvent during the heating and melting of the paste is prevented. be able to. Also,
Before placing a weight on the electronic component, the electronic component and the circuit board can be heated at a temperature below the boiling point of the paste solvent and then cooled to temporarily fix the electronic component and the through-hole mask. It is possible to prevent the deviation of the electronic parts, and to improve the connection reliability and the yield.
【0034】[0034]
【発明の実施の形態】以下,本発明の実施例を図により
詳細に説明する。BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described in detail below with reference to the drawings.
【0035】図1は本発明の第1の実施例である電子部
品の側面図である。図5は図1の電子部品において平坦
部位置と加熱球体化したときのバンプ頂点位置との関係
を説明する側面図である。図4は本発明の第2の実施例
である電子部品の側面図である。図6は図4の電子部品
において平坦部位置と加熱球球体化したときのバンプ頂
点位置との関係を説明する側面図である。図7に本発明
の電子部品を反りの無い回路基板に搭載接続する工程図
を示す。図8に本発明の電子部品を反った回路基板に搭
載接続する工程図を示す。FIG. 1 is a side view of an electronic component according to a first embodiment of the present invention. FIG. 5 is a side view for explaining the relationship between the flat portion position and the bump apex position when the electronic component of FIG. 1 is made into a heating sphere. FIG. 4 is a side view of the electronic component according to the second embodiment of the present invention. FIG. 6 is a side view for explaining the relationship between the flat portion position and the bump apex position when the electronic component of FIG. 4 is made into a heating sphere. FIG. 7 shows a process diagram for mounting and connecting the electronic component of the present invention on a circuit board having no warp. FIG. 8 shows a process diagram for mounting and connecting the electronic component of the present invention on a warped circuit board.
【0036】第1の実施例である図1は,電子部品1の
端子電極2上のバンプ3の回路基板接続側の部位にバン
プ平坦部4を設け,個の平坦部が同一平面内となるよう
にしたものである。電子部品1は例えばLSI,プリン
ト基板,セラミックス基板等で構成されている。端子電
極2は例えばAu,Al,Cu,W等の導電性金属にC
r,Ni,Au等を蒸着して構成されている。バンプ3
は,例えばPb−Sn,Sn−Ag,Bi−Pb,Sn
−Zn等の2種類以上の金属合金や単体金属,場合によ
っては複数の添加物で構成されている。バンプ平坦部位
置は,図5に示すように,バンプ平坦部位置22が加熱
球体化した球体化バンプ20のバンプ頂点位置21より
高くなるように制御されている。バンプ平坦部4の形成
方法としては,バンプの組成の軟化温度,例えばバンプ
組成がSn63%Pb37%の共晶はんだの場合183
度より高温に加熱した板にバンプ頂点を同時に押しつけ
ることにより形成することができる。押しつける板は例
えばセラミックス,ガラス,テフロン等のはんだに濡れ
ない材質で加熱温度に耐えられるものであればなんでも
よい。またこのバンプ平坦部4は本発明のバンプ形成方
法でも形成することができる。In FIG. 1, which is the first embodiment, bump flat portions 4 are provided on the terminal electrodes 2 of the electronic component 1 at the portions of the bumps 3 on the circuit board connection side, and the flat portions are in the same plane. It was done like this. The electronic component 1 is composed of, for example, an LSI, a printed board, a ceramics board, or the like. The terminal electrode 2 is made of, for example, a conductive metal such as Au, Al, Cu, W, and C.
It is formed by vapor deposition of r, Ni, Au and the like. Bump 3
Is, for example, Pb-Sn, Sn-Ag, Bi-Pb, Sn
It is composed of two or more kinds of metal alloys such as -Zn or a simple metal, and in some cases, a plurality of additives. As shown in FIG. 5, the bump flat portion position is controlled such that the bump flat portion position 22 is higher than the bump apex position 21 of the spheroidized bump 20 that is heated into a spherical shape. As a method of forming the bump flat portion 4, a softening temperature of the bump composition, for example, 183 in the case of eutectic solder having a bump composition of Sn63% Pb37%
It can be formed by pressing the bump vertices simultaneously on a plate heated to a temperature higher than 100 degrees. The pressing plate may be made of any material, such as ceramics, glass, or Teflon, which does not get wet with solder and can withstand the heating temperature. The bump flat portion 4 can also be formed by the bump forming method of the present invention.
【0037】第2の実施例である図4は,電子部品1の
端子電極2上のバンプ3の回路基板接続側の部位にバン
プ平坦部4を設けたものである。複数のバンプ平坦部4
の位置はさまざまである。このバンプ平坦部4の形成方
法としては,バンプ一つずつの頂点に加熱したはんだに
濡れないこてを押し当て平坦部を形成することができ
る。このバンプ平坦部位置は,図6に示すように最も電
子部品から突出したバンプ平坦部位置22が,他の加熱
球体化した球体化バンプ20のバンプ頂点位置21より
高くなるように制御されている。As a second embodiment, FIG. 4 shows a bump flat portion 4 provided on the terminal electrode 2 of the electronic component 1 at a portion of the bump 3 on the circuit board connection side. Flat bumps 4
There are various positions. As a method of forming the bump flat portion 4, it is possible to form a flat portion by pressing a trowel that is not wet with the heated solder onto each apex of each bump. The bump flat portion position is controlled so that the bump flat portion position 22 most protruding from the electronic component is higher than the bump apex position 21 of the other spheroidized bump 20 that is heated into a spherical shape, as shown in FIG. .
【0038】図1,図4のバンプ3は,現状はんだボー
ルによるバンプ形成や,マスク穴径が全て等しいスクリ
ーンマスク印刷により形成する場合がほとんであるた
め,バンプ3の体積は概略等しくなる。例えばはんだボ
ールを用いる場合,直径0.76mmのはんだボール径
ばらつきは+−20μm程度となり体積ばらつきは少な
い。Since the bumps 3 shown in FIGS. 1 and 4 are formed by the current solder bump formation or screen mask printing with the same mask hole diameters, the bumps 3 have substantially the same volume. For example, when a solder ball is used, the diameter variation of the solder ball having a diameter of 0.76 mm is about + -20 μm, and the volume variation is small.
【0039】本発明の電子部品を反りの無い回路基板に
搭載接続する工程を図7で説明する。ここで回路基板は
ガラスエポキシプリント基板,フレキシブルプリント基
板,ガラス基板,セラミックス基板等の基板である。A process of mounting and connecting the electronic component of the present invention on a circuit board having no warp will be described with reference to FIG. Here, the circuit board is a board such as a glass epoxy printed board, a flexible printed board, a glass board, or a ceramic board.
【0040】図7(a)で電子部品1の端子電極2上の
バンプ3のバンプ平坦部4にフラックス7を塗布する。
このフラックス7の塗布方法としてはフラックスたまり
にバンプ平坦部4を接触させ転写する方法や,はけで塗
る方法,ディスペンサで塗布する方法等がある。図7
(b)で電子部品1のバンプ3と回路基板5の接続電極
6とを相対するように位置決め搭載する。位置決め搭載
は市販のフリップチップボンダで可能である。なお,図
7(a)でバンプ平坦部4に塗布したフラックスはバン
プ平坦部4の代わりに,図7(b)の回路基板5の接続
電極6に塗布してもかまわない。この時のフラックス塗
布方法としてはマスク印刷が簡便な方法としてあげられ
る。またフラックスの代わりにはんだペーストや,還元
性のある液体を用いることもできる。In FIG. 7A, the flux 7 is applied to the bump flat portion 4 of the bump 3 on the terminal electrode 2 of the electronic component 1.
As a method of applying the flux 7, there are a method of contacting and transferring the bump flat portion 4 to the flux pool, a method of applying with a brush, a method of applying with a dispenser, and the like. Figure 7
In (b), the bumps 3 of the electronic component 1 and the connection electrodes 6 of the circuit board 5 are positioned and mounted so as to face each other. Positioning mounting is possible with a commercially available flip chip bonder. The flux applied to the bump flat portion 4 in FIG. 7A may be applied to the connection electrode 6 of the circuit board 5 in FIG. 7B instead of the bump flat portion 4. As a flux applying method at this time, mask printing is a simple method. Also, solder paste or a reducing liquid may be used instead of the flux.
【0041】図7(b)から分かるように,第1の実施
例の電子部品の場合,バンプ平坦部3が同一平面内にあ
るため接続電極6とは全て接触する。また接触が面接触
となるため搬送中の位置ズレが発生しにくい。図7
(c)で電子部品1及び回路基板5の全体をリフロー炉
106で加熱することにより,全ての端子電極2,接続
電極6を接続する接続バンプ9が形成されるため,信頼
性及び歩留まりの高い接続が可能となる。また,第2の
実施例の電子部品を使用した場合でも,図6に示すよう
に,最も電子部品から突出したバンプ平坦部位置22
が,他の加熱球体化した球体化バンプ20のバンプ頂点
位置21より高くなるように制御されているため,接触
していないバンプ平坦部が溶融球体化した際に接続電極
に接触するため,全ての端子電極,接続電極を接続する
接続バンプが形成される。As can be seen from FIG. 7B, in the case of the electronic component of the first embodiment, since the bump flat portion 3 is in the same plane, the bump flat portion 3 is all in contact with the connection electrode 6. Further, since the contact is a surface contact, it is unlikely that the positional deviation occurs during transportation. Figure 7
By heating the entire electronic component 1 and the circuit board 5 in the reflow furnace 106 in (c), the connection bumps 9 that connect all the terminal electrodes 2 and the connection electrodes 6 are formed, so that the reliability and the yield are high. Connection is possible. Even when the electronic component of the second embodiment is used, as shown in FIG. 6, the bump flat portion position 22 that is most protruded from the electronic component is 22.
However, since it is controlled to be higher than the bump apex position 21 of the other spheroidized bump 20 that has been heated into a sphere, the bump flat portion that is not in contact comes into contact with the connection electrode when the spheroidized bump is melted into a sphere. A connection bump for connecting the terminal electrode and the connection electrode of is formed.
【0042】更に電子部品を反りのある回路基板に搭載
接続する工程を図8で説明する。図7(a)と同じバン
プ平坦部4にフラックス7を塗布した電子部品1を,図
8(a)で反りのある回路基板5の接続電極上に位置決
め搭載する。この時,回路基板5の反りのため部分的に
バンプ平坦部4と接続電極6が接しない箇所が発生す
る。しかし,本発明の電子部品は図5に示すように,加
熱球体化した球体化バンプ20のバンプ頂点位置21よ
り高くなるように制御されているため,図8(b)で電
子部品1と回路基板5をリフロー炉106で加熱した
時,接触していないバンプ平坦部が溶融球体化した際に
接続電極6に接触するため,全ての端子電極2,接続電
極6を接続する接続バンプ9が形成される。回路基板5
の反りが大きい場合は,図5において加熱球体化した球
体化バンプ20のバンプ頂点位置21とバンプ平坦部位
置22の位置差分23,図6においては最も突出してい
るバンプ平坦部位置22と加熱球体化した球体化バンプ
20のバンプ頂点位置21との位置差分23が,接続電
極領域の反り31より大きくなるように平坦部位置を制
御することにより,反りがあってもバンプ加熱溶融球体
化時に確実に接続電極に接触し,接続バンプが形成さ
れ,製品の信頼性及び歩留まり向上が実現できる。な
お,バンプ平坦部を形成する場合,平坦部を形成したバ
ンプは横に膨らんでいくため,隣接したバンプ同士が接
触しない範囲内でバンプ平坦部位置は決定する必要があ
るのはいうまでもない。A process of mounting and connecting electronic parts on a warped circuit board will be described with reference to FIG. The electronic component 1 in which the flux 7 is applied to the same bump flat portion 4 as in FIG. 7A is positioned and mounted on the connection electrode of the warped circuit board 5 in FIG. 8A. At this time, due to the warp of the circuit board 5, a portion where the bump flat portion 4 and the connection electrode 6 are not in contact with each other occurs. However, as shown in FIG. 5, the electronic component of the present invention is controlled so as to be higher than the bump apex position 21 of the spheroidized bump 20 that has been spheroidized by heating. Therefore, in FIG. When the substrate 5 is heated in the reflow furnace 106, the bump flat portions that are not in contact with each other contact the connecting electrodes 6 when the bumps are melted into spheres, so that the connecting bumps 9 that connect all the terminal electrodes 2 and the connecting electrodes 6 are formed. To be done. Circuit board 5
If the warp is large, the position difference 23 between the bump apex position 21 and the bump flat portion position 22 of the sphered bump 20 that has been made into a heated sphere in FIG. 5, and the most protruding bump flat portion position 22 and the heating sphere in FIG. By controlling the flat portion position so that the positional difference 23 between the bumped sphered bump 20 and the bump apex position 21 is larger than the warp 31 of the connection electrode area, even if there is a warp, it is possible to ensure that the bump is heated and melted into a sphere. The contact bumps are formed by contacting the connection electrodes, and product reliability and yield can be improved. When forming the bump flat portion, it goes without saying that the bump flat portion position needs to be determined within a range in which adjacent bumps do not contact each other because the bump on which the flat portion is formed expands laterally. .
【0043】次に,本発明の第3の実施例として,図9
を用いて電子部品への共晶はんだバンプ形成方法につい
て詳細に説明する。Next, as a third embodiment of the present invention, FIG.
A method of forming a eutectic solder bump on an electronic component will be described in detail with reference to.
【0044】図9は本発明の電子部品へのバンプ形成を
行う場合の工程図である。FIG. 9 is a process drawing for forming bumps on the electronic component of the present invention.
【0045】図9(a)において,貫通穴マスク101
の材料としては半透明のポリイミド材料でできたフィル
ムを使用しており,400度程度の耐熱性を有してい
る。平板100はガラス材料でできている。貫通穴10
2はエキシマレーザにより穴加工を行ってあるものであ
る。貫通穴102の形状は図13に示すように円形貫通
穴300である。まず,貫通穴マスク101を平板10
0に耐熱性のテープで固定する。In FIG. 9A, the through hole mask 101
A film made of a semi-transparent polyimide material is used as the material of, and has a heat resistance of about 400 degrees. The flat plate 100 is made of a glass material. Through hole 10
2 is a hole processed by an excimer laser. The shape of the through hole 102 is a circular through hole 300 as shown in FIG. First, the through-hole mask 101 is applied to the flat plate 10
Fix to 0 with heat resistant tape.
【0046】次に図9(b)において,貫通穴マスク1
01の貫通穴102に共晶はんだペースト104をスキ
ージ103を用いて印刷充填する。必要であれば,平板
100の貫通穴マスク101の固定面とは反対の面から
充填状態を観察し,未充填部があれば再度スキージ10
3で印刷を行う。Next, referring to FIG. 9B, the through-hole mask 1
The through hole 102 of No. 01 is printed and filled with the eutectic solder paste 104 using a squeegee 103. If necessary, the filling state is observed from the surface of the flat plate 100 opposite to the fixing surface of the through-hole mask 101, and if there is an unfilled portion, the squeegee 10 is again used.
Print at 3.
【0047】次に図9(c)においてセラミックス基板
からなる電子部品1のAuメッキされた端子電極2と貫
通穴102が相対するように位置決めし,貫通穴マスク
101上に電子部品1を搭載する。この位置決め搭載は
市販のフリップチップボンダで手動または自動で行うこ
とができる。搭載の際は,電子部品1及び貫通穴マスク
101,平板100にダメージが発生しない程度に電子
部品1に圧力をかける。必要であれば,平板100の貫
通穴マスク101の固定面とは反対の面から位置決め状
態を観察し,貫通穴102の位置と端子電極2の位置が
ずれていれば位置決め搭載をやり直す。Next, in FIG. 9C, the electronic component 1 made of a ceramic substrate is positioned so that the Au-plated terminal electrode 2 and the through hole 102 face each other, and the electronic component 1 is mounted on the through hole mask 101. . This positioning and mounting can be performed manually or automatically with a commercially available flip chip bonder. At the time of mounting, pressure is applied to the electronic component 1 to the extent that the electronic component 1, the through-hole mask 101, and the flat plate 100 are not damaged. If necessary, the positioning state is observed from the surface of the flat plate 100 opposite to the fixing surface of the through hole mask 101, and if the position of the through hole 102 and the position of the terminal electrode 2 are deviated, the positioning mounting is performed again.
【0048】次に図9(d)において,リフロー炉で電
子部品を搭載した平板100ごと200度程度に加熱し
充填ペースト105を溶融させ,端子電極2に転写す
る。ここで,貫通穴マスク101と平板100は両者と
もはんだに濡れない材料であるため端子電極2以外の部
位には転写されない。Next, in FIG. 9D, the filling paste 105 is melted by being heated to about 200 degrees together with the flat plate 100 on which the electronic component is mounted in the reflow furnace, and transferred to the terminal electrode 2. Here, since the through-hole mask 101 and the flat plate 100 are both materials that do not get wet with solder, they are not transferred to a portion other than the terminal electrode 2.
【0049】次に図9(e)において電子部品1から貫
通穴マスク101と平板100を分離する。分離は電子
部品1,貫通穴マスク101,平板100をフラックス
残渣洗浄液に浸すことにより行う。Next, in FIG. 9E, the through hole mask 101 and the flat plate 100 are separated from the electronic component 1. The separation is performed by immersing the electronic component 1, the through-hole mask 101, and the flat plate 100 in the flux residue cleaning liquid.
【0050】最後に,必要であれば再度,フラックス残
渣等を洗浄により電子部品1から落とし電子部品のバン
プ形成が完了する。また,バンプは貫通穴マスクの厚み
によっては図1に示すようなバンプ平坦部4を持つた
め,必要に応じて電子部品の最リフローを行う場合もあ
る。Finally, if necessary, the flux residue or the like is again washed off the electronic component 1 to complete the bump formation of the electronic component. Further, since the bump has the bump flat portion 4 as shown in FIG. 1 depending on the thickness of the through hole mask, the reflow of the electronic component may be performed as needed.
【0051】なお,上記実施例において,ペーストとし
て共晶はんだペーストの例を示したが,これにペースト
が限定される訳ではなく,例えばPb−Sn,Sn−A
g,Bi−Pb,Sn−Zn等の2種類以上の金属合金
や単体金属,場合によっては複数の添加物で構成されて
いて加熱溶融により電極に転写されるペーストであれば
どのようなものでもよい。また,電子部品としてはセラ
ミックス基板からなる電子部品1を例に示したが,例え
ばガラスエポキシプリント基板,フレキシブルプリント
基板,ガラス基板等からなる電子部品やパッケージされ
ていないLSIなど他の回路基板との接続のためにバン
プが必要な電子部品であればどのようなものでもよい。In the above embodiment, the example of the eutectic solder paste is shown as the paste, but the paste is not limited to this, and for example, Pb-Sn, Sn-A.
g, Bi-Pb, Sn-Zn, etc., two or more kinds of metal alloys or simple metals, and in some cases, any paste as long as it is composed of a plurality of additives and is transferred to the electrode by heating and melting. Good. Also, as the electronic component, the electronic component 1 made of a ceramic substrate is shown as an example, but the electronic component made of, for example, a glass epoxy printed circuit board, a flexible printed circuit board, a glass substrate, etc., or another circuit board such as an unpackaged LSI Any electronic component that needs bumps for connection may be used.
【0052】また,貫通穴マスク101としてポリイミ
ドフィルムにレーザで穴明け加工をした例を示したが,
アルカリエッチング等の手法で貫通穴をあけても良く,
また貫通穴マスクの材質自体もはんだに濡れない材料で
あればどのようなものでもよく,例えばステンレス板や
ガラス板に機械加工やエッチングで貫通穴をあけてもか
まわない。ただし,はんだを加熱溶融する際の加熱温度
に使用上耐え,また反りが発生しにくいことが材料選定
の条件となる。また,貫通穴マスクは複数枚重ねて使用
してもなんら問題はない。Also, an example was shown in which a polyimide film was used as the through-hole mask 101 to make holes with a laser.
Through holes may be formed by a method such as alkali etching,
Further, the material of the through hole mask itself may be any material as long as it does not wet the solder, and for example, a through hole may be formed in a stainless plate or a glass plate by machining or etching. However, the conditions for material selection are that it withstands the heating temperature when solder is heated and melted, and that warpage is unlikely to occur. Moreover, there is no problem even if a plurality of through-hole masks are used by stacking them.
【0053】また,貫通穴102の形状として円形貫通
穴300を例に示したが,図14に示すように正方形貫
通穴301あるいは図15に示すように長方形貫通穴3
02,あるいは多角形の形状でもかまわない。貫通穴マ
スク101と電子部品が若干ずれていた場合,加熱溶融
したバンプと貫通穴102の壁面が接触するが,円形貫
通穴300の場合,円形貫通穴300の壁面にバンプ3
がならってしまい線接触となり電子部品と貫通穴マスク
との分離が困難になる。このような場合は,正方形貫通
穴301あるいは長方形貫通穴302を用いることによ
り,バンプ3と貫通穴壁面の接触を点接触とすること
で,分離を容易にすることができる。Although the circular through hole 300 is shown as an example of the shape of the through hole 102, the square through hole 301 as shown in FIG. 14 or the rectangular through hole 3 as shown in FIG.
It may be 02 or a polygonal shape. When the through hole mask 101 and the electronic component are slightly displaced, the heated and melted bumps come into contact with the wall surface of the through hole 102. In the case of the circular through hole 300, the bump 3 is formed on the wall surface of the circular through hole 300.
It becomes difficult to separate the electronic component and the through-hole mask from each other because of the line contact. In such a case, by using the square through hole 301 or the rectangular through hole 302, the contact between the bump 3 and the wall surface of the through hole is made a point contact, so that the separation can be facilitated.
【0054】また,平板100としてガラス板を使用し
た例を示したが,はんだに濡れない材質で平坦な面が形
成できる材料であればどのようなものでもよく,例えば
セラミックス板やステンレス板等でもかまわない。更
に,平板100をシリコーンゴムのような可撓性のある
材料で形成することにより,貫通穴マスク101から平
板100を分離する際に,図17で示すように,平板を
端からたわませながら引きはがすことができ,その結
果,電子部品1と貫通穴マスク101も端から引きはが
すことができるため,電子部品1と貫通穴マスク101
と平板100の分離が容易に行える。Although an example using a glass plate as the flat plate 100 has been shown, any material can be used as long as it is a material that does not wet the solder and can form a flat surface, such as a ceramic plate or a stainless plate. I don't care. Further, by forming the flat plate 100 with a flexible material such as silicone rubber, when the flat plate 100 is separated from the through-hole mask 101, the flat plate is bent from the end as shown in FIG. Since the electronic component 1 and the through-hole mask 101 can be peeled off from the end as a result, the electronic component 1 and the through-hole mask 101 can be peeled off from the end.
The flat plate 100 can be easily separated.
【0055】更に,貫通穴マスク101と平板100の
固定方法として耐熱性のテープでの固定の例を示した
が,貫通穴マスク101と平板100の間に接着面を持
つ熱剥離シートや熱剥離接着剤での固定や,貫通穴マス
クと平板100の間に例えばフラックスのような溶剤を
塗り,その粘着力および表面張力を利用した固定や,平
板100に穴をあけるか,あるいは平板100に多孔質
材料を使用して,真空吸着により貫通穴マスク101を
固定する方法等,貫通穴マスク101と平板100が固
定できればどのような方法でもかまわない。平板100
を多孔質材料とする場合は,加熱溶融時のペーストに接
する雰囲気を循環させることができるため,フラックス
残渣の低減,バンプ内ボイド発生の低減を期待すること
ができる。Further, as an example of fixing the through-hole mask 101 and the flat plate 100 with a heat-resistant tape, a heat-peelable sheet having an adhesive surface between the through-hole mask 101 and the flat plate 100 or a heat-peelable sheet is used. Fixing with an adhesive, applying a solvent such as flux between the through-hole mask and the flat plate 100, and fixing using the adhesive force and surface tension of the through hole, or making a hole in the flat plate 100 or perforating the flat plate 100. Any method may be used as long as the through-hole mask 101 and the flat plate 100 can be fixed, such as a method of fixing the through-hole mask 101 by vacuum suction using a quality material. Flat plate 100
When a porous material is used, the atmosphere in contact with the paste at the time of heating and melting can be circulated, so that reduction of flux residue and reduction of voids in bumps can be expected.
【0056】更に,はんだを加熱溶融させるための加熱
方法として,リフロー炉106による全体加熱の例を示
したが,ホットプレートや熱風,赤外線,レーザを用い
た全体,あるいは電子部品1,貫通穴マスク101,平
板100,バンプ3の局所的な加熱でもかまわない。加
熱雰囲気としては大気やN2やH2等使用するペースト
の特性に合わせた加熱雰囲気とする。Further, as the heating method for heating and melting the solder, an example of whole heating by the reflow furnace 106 is shown, but the whole using a hot plate, hot air, infrared rays, laser, or electronic component 1, through hole mask Local heating of 101, the flat plate 100, and the bumps 3 may be used. The heating atmosphere is an atmosphere or a heating atmosphere such as N2 or H2 that matches the characteristics of the paste used.
【0057】更に,本実施例では電子部品1のバンプ形
成面が下向きの状態での例を示したが,工程によっては
電子部品1のバンプ形成面が上向きであってもかまわな
い。この場合,バンプ3内のボイドがバンプ3から抜け
やすいという効果が期待できる。Further, in the present embodiment, the example in which the bump forming surface of the electronic component 1 faces downward is shown, but the bump forming surface of the electronic component 1 may face upward depending on the process. In this case, the effect that the voids in the bumps 3 are likely to come off the bumps 3 can be expected.
【0058】更に,ペーストを加熱溶融させる際に,図
16で示すように電子部品1の上に重り303をのせる
場合もある。この場合,ペースト加熱溶融時に溶媒の気
化等で発生する発泡のために発生する場合がある電子部
品1のずれを防止するのに効果がある。なお,この電子
部品1に重り303をのせる前に,ホットプレート20
2で数分間120度程度の温度で加熱し,室温まで冷却
することにより,電子部品1と貫通穴マスク101を仮
止めすることができるため,重り303をのせる際の電
子部品1の位置ズレを防ぐことができる。Furthermore, when the paste is heated and melted, a weight 303 may be placed on the electronic component 1 as shown in FIG. In this case, it is effective to prevent the shift of the electronic component 1 which may occur due to foaming caused by vaporization of the solvent when the paste is heated and melted. Before placing the weight 303 on the electronic component 1, the hot plate 20
Since the electronic component 1 and the through-hole mask 101 can be temporarily fixed by heating at a temperature of about 120 ° C. for 2 minutes and cooling to room temperature, the electronic component 1 is displaced when the weight 303 is placed. Can be prevented.
【0059】次に,本発明の第4の実施例として,図1
0を用いて電子部品へのはんだバンプ形成方法について
説明する。Next, as a fourth embodiment of the present invention, FIG.
A method for forming solder bumps on electronic components will be described using 0.
【0060】図10は本発明の電子部品へのバンプ形成
を行う場合の工程図であり,図10(a)のスペーサ1
50は貫通穴マスク101と電子部品1との間に隙間を
設け,貫通穴マスク101と電子部品1とが接触しない
ようにするものである。スペーサ150の厚みは,充填
ペースト105が加熱溶融球体化したときの平板100
からの高さから貫通穴マスク101の厚み分を引いた値
より小さくする必要がある。FIG. 10 is a process chart for forming bumps on the electronic component of the present invention. The spacer 1 shown in FIG.
Reference numeral 50 is for providing a gap between the through hole mask 101 and the electronic component 1 so that the through hole mask 101 and the electronic component 1 do not come into contact with each other. The thickness of the spacer 150 is the same as that of the flat plate 100 when the filling paste 105 is heated and melted into spheres.
It is necessary to make the height smaller than the value obtained by subtracting the thickness of the through hole mask 101 from the height.
【0061】図10(a)において,貫通穴マスク10
1の貫通穴102にはんだ印刷した後,貫通穴マスク1
01上にスペーサ150をのせる。ここで,スペーサ1
50は貫通穴102の上にこないように位置を調整して
おく。次に,電子部品1を端子電極2と貫通穴102が
相対するように位置決めし,スペーサ150の上に電子
部品1を搭載する。この時,電子部品1と貫通穴マスク
101の隙間がスペーサの厚みとなるように,電子部品
1とスペーサ150と貫通穴マスク101は十分に密着
させておく必要がある。In FIG. 10A, the through hole mask 10
After solder printing on the through hole 102 of No. 1, through hole mask 1
The spacer 150 is placed on 01. Where spacer 1
The position of 50 is adjusted so that it does not come over the through hole 102. Next, the electronic component 1 is positioned so that the terminal electrode 2 and the through hole 102 face each other, and the electronic component 1 is mounted on the spacer 150. At this time, the electronic component 1, the spacer 150, and the through-hole mask 101 must be sufficiently adhered so that the gap between the electronic component 1 and the through-hole mask 101 becomes the thickness of the spacer.
【0062】図10(b)において,リフロー炉106
により加熱を行い,充填ペースト105を加熱溶融させ
端子電極2に転写する。In FIG. 10B, the reflow furnace 106
To heat and melt the filling paste 105 and transfer it to the terminal electrode 2.
【0063】図10(c)で電子部品1と貫通穴マスク
101とスペーサ150と平板100を分離する。ここ
で,貫通穴マスク101と電子部品1との間にスペーサ
150による隙間があるため,貫通穴マスク101と電
子部品1がフラックス残渣等によって表面が接着される
ことがなくなるため,分離は非常に容易におこなえ,バ
ンプ3を傷つけない。また,電子部品1が貫通穴マスク
101と分離できれば,可撓性のあるポリイミド材料で
製作された貫通穴マスク101を平板100から端から
引っ張りあげてひきはがすことができ,分離は容易であ
る。In FIG. 10C, the electronic component 1, the through hole mask 101, the spacer 150 and the flat plate 100 are separated. Here, since there is a gap between the through hole mask 101 and the electronic component 1 due to the spacer 150, the surface of the through hole mask 101 and the electronic component 1 will not be adhered by flux residue, etc. It can be done easily and does not damage the bumps 3. Also, if the electronic component 1 can be separated from the through-hole mask 101, the through-hole mask 101 made of a flexible polyimide material can be pulled up from the flat plate 100 from the end and peeled off, and the separation is easy.
【0064】ここで,更にスペーサ150の厚みを,充
填ペースト105が加熱溶融球体化したときの平板10
0からの高さから貫通穴マスク101の厚み分を引いた
値より小さくかつ,端子電極2にバンプ3が球体化形状
で形成されたときの電子部品1からバンプ3の頂点まで
の高さより大きくすることにより,図10(b)におい
て,バンプ3の頂点と平板100とが接触しなくなり,
図10(c)でより電子部品1の分離が容易に行えるよ
うになる。Here, further, the thickness of the spacer 150 is set to the flat plate 10 when the filling paste 105 is heated and melted into spheres.
It is smaller than the value obtained by subtracting the thickness of the through-hole mask 101 from the height from 0, and is larger than the height from the electronic component 1 to the apex of the bump 3 when the bump 3 is formed in a spherical shape on the terminal electrode 2. By doing so, in FIG. 10B, the apex of the bump 3 and the flat plate 100 are no longer in contact with each other,
In FIG. 10C, the electronic component 1 can be separated more easily.
【0065】なお,上記実施例において,電子部品1と
貫通穴マスク101との間に隙間をあけるためにスペー
サ150を使用した例を示したが,この隙間の設け方は
どのような方法でもよく,例えば電子部品を上からつり
下げ,そのつり下げ高さを制御することにより電子部品
1と貫通穴マスク101の隙間を設けてもよい。Although the spacer 150 is used to form a gap between the electronic component 1 and the through-hole mask 101 in the above embodiment, any method may be used to form this gap. Alternatively, for example, the gap between the electronic component 1 and the through-hole mask 101 may be provided by suspending the electronic component from above and controlling the suspension height.
【0066】次に,本発明の第5の実施例として,図1
1を用いて電子部品へのはんだバンプ形成方法について
説明する。Next, as a fifth embodiment of the present invention, FIG.
A method of forming solder bumps on an electronic component will be described with reference to FIG.
【0067】図11は貫通穴マスクにはんだペーストを
充填する工程図である。図11(a)で平板100の上
に貫通穴マスク101Aと貫通穴マスク101Bを重ね
て固定する。次に,図11(b)で貫通穴102A,1
02Bにペースト印刷によりはんだペースト104を充
填する。ここで貫通穴マスク101Bの表面にはフラッ
クス等のペースト溶剤や,印刷むらによるはんだ粒子残
りが存在する。次に,図11(c)で貫通穴マスクBを
取り除く。次に図11(d)で電子部品1を貫通穴マス
ク101Aに位置決め搭載し,この後は,実施例3に示
す工程と同様にバンプを形成する。FIG. 11 is a process drawing of filling a through hole mask with solder paste. In FIG. 11A, the through-hole mask 101A and the through-hole mask 101B are superposed and fixed on the flat plate 100. Next, in FIG. 11B, the through holes 102A, 1A
02B is filled with the solder paste 104 by paste printing. Here, on the surface of the through-hole mask 101B, paste solvent such as flux and solder particle residue due to printing unevenness exist. Next, the through-hole mask B is removed in FIG. Next, as shown in FIG. 11D, the electronic component 1 is positioned and mounted on the through-hole mask 101A, and thereafter, bumps are formed in the same manner as the process shown in the third embodiment.
【0068】貫通穴マスク101Bを取り除くことによ
り,ペースト印刷時に貫通穴マスク表面に付着するフラ
ックス等のはんだ溶剤及び印刷むらによるはんだ粒子残
りを貫通穴マスク101Bと共に取り除くことができる
ため,電子部品1の表面と貫通穴マスク101Aの表面
が接触しても接着力が働かず,加熱溶融後の電子部品と
貫通穴マスクとの分離が容易となる。By removing the through-hole mask 101B, the solder solvent such as flux adhered to the surface of the through-hole mask during paste printing and the solder particle residue due to printing unevenness can be removed together with the through-hole mask 101B. Even if the surface and the surface of the through-hole mask 101A come into contact with each other, the adhesive force does not work, and the electronic component after heating and melting and the through-hole mask are easily separated.
【0069】なお,上記実施例において貫通穴マスクは
貫通穴マスク101A,101Bの2枚で説明したが,
更に複数枚の貫通穴マスクを重ねてもかまわず,また取
り除く貫通穴マスクも表面から1枚以上はがしてもかま
わない。In the above embodiment, the through-hole mask has been described as the two through-hole masks 101A and 101B.
Further, a plurality of through-hole masks may be stacked, and one or more through-hole masks to be removed may be removed from the surface.
【0070】次に,本発明の第6の実施例として,図1
2を用いて電子部品へのはんだバンプ形成方法について
説明する。Next, as a sixth embodiment of the present invention, FIG.
A method of forming solder bumps on an electronic component will be described with reference to 2.
【0071】図12はバンプが端子電極に転写された電
子部品を貫通穴マスクから分離する工程図である。図1
2(a)において,ホットプレート202により平板1
を介して全体を120度程度に加熱する。この加熱によ
りフラックス残渣が軟化する。図12(b)において吸
着治具201を電子部品1に接触させ,真空吸引201
により吸着治具201に電子部品1を吸着させる。図1
2(c)で電子部品1を吸着治具201に吸着したまま
貫通穴マスクより上方に引き上げることにより,電子部
品1と貫通穴マスク101を分離する。フラックス残渣
が軟化しているため,分離は容易に行うことができる。FIG. 12 is a process diagram for separating the electronic component having the bumps transferred to the terminal electrodes from the through-hole mask. FIG.
2 (a), the flat plate 1 is formed by the hot plate 202.
The whole is heated to about 120 degrees via. This heating softens the flux residue. In FIG. 12B, the suction jig 201 is brought into contact with the electronic component 1 and the vacuum suction 201
Thus, the electronic component 1 is adsorbed to the adsorption jig 201. FIG.
The electronic component 1 and the through-hole mask 101 are separated by pulling up the electronic component 1 above the through-hole mask while adsorbing the electronic component 1 to the suction jig 201 in 2 (c). Since the flux residue is softened, it can be easily separated.
【0072】上記実施例においてフラックス残渣の軟化
をホットプレート202により行ったが,吸着治具20
0に装着したパルスヒータ203を加熱させることによ
り,電子部品を介した加熱を行ってもかまわない。ま
た,他のレーザや熱風や赤外線等の加熱方法でもかまわ
ない。In the above embodiment, the flux residue was softened by the hot plate 202.
By heating the pulse heater 203 attached to 0, heating via electronic components may be performed. Further, other laser, hot air, infrared ray, or other heating method may be used.
【0073】また,上記実施例の構成は,ペーストを加
熱溶融させ端子電極2にバンプ3を形成する工程でもそ
のまま使用することができ,その際はホットプレート2
02またはパルスヒータ203による加熱温度はバンプ
3の融点である183度以上とする。Further, the structure of the above embodiment can be used as it is even in the step of heating and melting the paste to form the bumps 3 on the terminal electrodes 2. In that case, the hot plate 2 is used.
02 or the heating temperature of the pulse heater 203 is set to 183 ° C. or higher, which is the melting point of the bump 3.
【0074】なお,上記加熱温度は使用するはんだ組成
やフラックス種類によって変化することはいうまでもな
い。Needless to say, the heating temperature varies depending on the solder composition used and the type of flux.
【0075】[0075]
【発明の効果】以上のように本発明によれば,電子部品
の表面の端子電極にバンプが形成された電子部品におい
てバンプに平坦部を設けることにより,回路基板との接
続時に未接続を防ぎ,接続信頼性及び製品歩留まりを向
上させ,また,電子部品の設計自由度を高めることがで
きるため,より安価で高機能な電子部品を提供すること
ができる。As described above, according to the present invention, by providing a flat portion on a bump in an electronic component in which a bump is formed on a terminal electrode on the surface of the electronic component, it is possible to prevent unconnection at the time of connection with a circuit board. Since the connection reliability and the product yield can be improved and the degree of freedom in designing the electronic component can be increased, it is possible to provide a more inexpensive and highly functional electronic component.
【0076】更に,本発明によれば,電子部品表面の端
子電極に対応した位置に貫通穴を持つ一枚以上の貫通穴
マスクを重ねて平板表面に固定し,貫通穴にペーストを
充填し,端子電極と貫通穴が相対するように貫通穴マス
ク上に電子部品を位置決め搭載し,ペーストを加熱溶融
して端子電極に転写し,電子部品から貫通穴マスクと平
板を取り除くことによりバンプを形成するため,今まで
知られているバンプ形成方法よりもはるかにバンプの大
きさ精度が良く,バンプの傷や脱落がなく電気的接続信
頼性が高い電子部品を,より簡単な製造工程で低価格で
大量に,更に歩留りよく製造することができる。このた
め,本発明はバンプの大きさやピッチが微細化する電子
部品の製造にきわめて有利となるものである。Further, according to the present invention, one or more through-hole masks having through-holes at positions corresponding to the terminal electrodes on the surface of the electronic component are stacked and fixed on the flat plate surface, and the through-holes are filled with paste. The electronic component is positioned and mounted on the through-hole mask so that the terminal electrode and the through-hole face each other, the paste is heated and melted and transferred to the terminal electrode, and the bump is formed by removing the through-hole mask and the flat plate from the electronic component. For this reason, the bump size accuracy is far better than the bump forming methods known up to now, and electronic components with high electrical connection reliability without scratches or dropping of the bumps can be manufactured with a simpler manufacturing process at a lower price. It can be manufactured in large quantities and with high yield. Therefore, the present invention is extremely advantageous for manufacturing electronic components in which the size and pitch of bumps are miniaturized.
【図1】本発明に係わる第1の実施例の電子部品の側面
図である。FIG. 1 is a side view of an electronic component according to a first embodiment of the present invention.
【図2】従来の電子部品の側面図である。FIG. 2 is a side view of a conventional electronic component.
【図3】従来の電子部品を回路基板へ搭載接続する工程
側面図である。FIG. 3 is a side view of a process of mounting and connecting a conventional electronic component on a circuit board.
【図4】本発明に係わる第2の実施例の電子部品の側面
図である。FIG. 4 is a side view of an electronic component according to a second embodiment of the present invention.
【図5】第1の実施例の電子部品のバンプ頂点位置と平
坦部位置の関係を示す側面図である。FIG. 5 is a side view showing the relationship between the bump apex position and the flat portion position of the electronic component of the first embodiment.
【図6】第2の実施例の電子部品のバンプ頂点位置と平
坦部位置の関係を示す側面図である。FIG. 6 is a side view showing a relationship between a bump apex position and a flat portion position of the electronic component of the second embodiment.
【図7】本発明に係わる電子部品を反りのない回路基板
に搭載接続する工程側面図である。FIG. 7 is a process side view of mounting and connecting the electronic component according to the present invention on a circuit board without warpage.
【図8】本発明に係わる電子部品を反りのある回路基板
に搭載接続する工程側面図である。FIG. 8 is a process side view of mounting and connecting the electronic component according to the present invention on a warped circuit board.
【図9】本発明に係わる第3の実施例の電子部品のバン
プ形成方法を示す工程側面図である。FIG. 9 is a process side view showing a bump forming method for an electronic component according to a third embodiment of the present invention.
【図10】本発明に係わる第4の実施例の電子部品のバ
ンプ形成方法を示す工程側面図である。FIG. 10 is a process side view showing a bump forming method of an electronic component according to a fourth embodiment of the present invention.
【図11】本発明に係わる第5の実施例の電子部品のバ
ンプ形成方法の貫通穴マスクにはんだペーストを充填す
る工程側面図である。FIG. 11 is a side view of the step of filling the through-hole mask with solder paste in the bump forming method for electronic components according to the fifth embodiment of the present invention.
【図12】本発明に係わる第6の実施例の電子部品のバ
ンプ形成方法の電子部品を貫通穴マスクから分離する工
程側面図である。FIG. 12 is a process side view for separating an electronic component from a through hole mask in a bump forming method for an electronic component according to a sixth embodiment of the present invention.
【図13】円形貫通穴を持つ貫通穴マスクの平面図であ
る。FIG. 13 is a plan view of a through hole mask having circular through holes.
【図14】正方形貫通穴を持つ貫通穴マスクの平面図で
ある。FIG. 14 is a plan view of a through hole mask having square through holes.
【図15】長方形貫通穴を持つ貫通穴マスクの平面図で
ある。FIG. 15 is a plan view of a through hole mask having a rectangular through hole.
【図16】電子部品の上に重りをのせた側面図である。FIG. 16 is a side view in which a weight is placed on the electronic component.
【図17】貫通穴マスクと平板を引きはがす際の側面図
である。FIG. 17 is a side view when the through-hole mask and the flat plate are peeled off.
1……電子部品,2……端子電極,3……バンプ,4…
…バンプ平坦部,5……回路基板,6……接続電極,1
0……バンプ球形部,20……球体化バンプ,21……
バンプ頂点位置,22……バンプ平坦部位置,23……
位置差分,24……最突出バンプ平坦部位置,31……
回路基板反り,100……平板, 101……貫通穴マ
スク,102……貫通穴,103……スキージ, 10
4……はんだペースト,105……充填ペースト, 1
06……リフロー炉1 ... Electronic parts, 2 ... Terminal electrodes, 3 ... Bumps, 4 ...
… Bump flat area, 5 …… Circuit board, 6 …… Connecting electrode, 1
0 ... Bump spherical part, 20 ... Spherical bump, 21 ...
Bump apex position, 22 ... Bump flat position, 23 ...
Positional difference, 24 …… Position of most protruding bump flat part, 31 ……
Circuit board warp, 100 ... Flat plate, 101 ... Through hole mask, 102 ... Through hole, 103 ... Squeegee, 10
4 ... Solder paste, 105 ... Filling paste, 1
06: Reflow furnace
───────────────────────────────────────────────────── フロントページの続き (72)発明者 和井 伸一 神奈川県秦野市掘山下1番地株式会社日立 製作所汎用コンピュータ事業部内 (72)発明者 片山 薫 神奈川県秦野市掘山下1番地株式会社日立 製作所汎用コンピュータ事業部内 (72)発明者 高岡 勇 神奈川県秦野市掘山下1番地株式会社日立 製作所汎用コンピュータ事業部内 (72)発明者 井上 康介 神奈川県横浜市戸塚区吉田町292番地株式 会社日立製作所生産技術研究所内 (72)発明者 小田島 均 神奈川県横浜市戸塚区吉田町292番地株式 会社日立製作所生産技術研究所内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Shinichi Wai, No. 1 Horiyamashita, Hadano-shi, Kanagawa Hitachi, Ltd. General-purpose computer division (72) Inventor Kaoru Katayama No. 1, Horiyamashita, Hadano-shi, Kanagawa Hitachi, Ltd. General-purpose computer division (72) Inventor Isamu Takaoka No. 1 Horiyamashita, Hadano-shi, Kanagawa Hitachi Ltd. General-purpose computer division (72) Inventor Kosuke Inoue 292 Yoshida-cho, Totsuka-ku, Yokohama-shi, Kanagawa Hitachi, Ltd. In-house (72) Inventor Hitoshi Odajima 292 Yoshida-cho, Totsuka-ku, Yokohama-shi, Kanagawa Stock Company Hitachi, Ltd.
Claims (19)
れた電子部品において,前記バンプの電子部品が実装さ
れる回路基板側の部位が平坦でかつバンプを加熱球体化
したときの電子部品のバンプ形成面を上向きとした場合
のバンプ頂点位置が、最も電子部品から突出したバンプ
の平坦部位置と同じか又は高いことを特徴とする電子部
品。1. An electronic component having a bump formed on a terminal electrode on the surface of the electronic component, wherein the portion of the bump on the side of a circuit board on which the electronic component is mounted is flat and the bump is formed into a heating sphere. An electronic component, wherein a bump apex position when the bump forming surface is directed upward is the same as or higher than a flat portion position of the bump most protruding from the electronic component.
が加熱球体化したときのバンプ頂点位置と、最も高いバ
ンプの平坦部位置との差分が、電子部品が実装される回
路基板の電子部品搭載領域の最大のそりの大きさより大
きいことを特徴とする電子部品。2. The electronic component according to claim 1, wherein a difference between a bump apex position when the bump is heated into a sphere and a highest flat portion position of the bump is an electronic component of a circuit board on which the electronic component is mounted. An electronic component characterized by being larger than the maximum warp size of the mounting area.
れた電子部品において、 前記バンプの電子部品が実装される回路基板側の部位が
平坦でかつ,該平坦部が同一平面内となるように平坦部
位置が制御され,前記バンプが加熱球体化したときの電
子部品のバンプ形成面を上向きとした場合の最も低いバ
ンプ頂点位置が,バンプの平坦部位置より高いことを特
徴とする電子部品。3. An electronic component having a bump formed on a terminal electrode on the surface of the electronic component, wherein a portion of the bump on the circuit board side on which the electronic component is mounted is flat and the flat portion is in the same plane. The electronic part is characterized in that the position of the flat part is controlled in such a way that the lowest bump apex position when the bump forming surface of the electronic part when the bump is heated into a sphere is upward is higher than the position of the flat part of the bump. .
の加熱球体化したときのバンプ頂点位置と,バンプの平
坦部位置との差分が,電子部品が実装される回路基板の
電子部品搭載領域の最大のそりの大きさより大きいこと
を特徴とする電子部品。4. The electronic component mounting area of a circuit board on which the electronic component is mounted, wherein the difference between the bump apex position and the flat portion position of the bump when the bump is heated into a spherical shape. An electronic component characterized by being larger than the maximum sled size of.
において,バンプの体積が概略すべて等しいことを特徴
とする電子部品。5. The electronic component according to claim 1, wherein the bumps have substantially the same volume.
貫通穴を持つ一枚以上の貫通穴マスクを重ねて平板表面
に固定し,前記貫通穴に金属ペーストまたは導電性ペー
ストを充填し,前記端子電極と前記金属ペーストまたは
導電性ペーストを充填した貫通穴が相対するように前記
貫通穴マスク上に前記電子部品を位置決め搭載し,前記
金属ペーストまたは導電性ペーストを加熱溶融して前記
端子電極に転写し,電子部品から貫通穴マスクと平板を
取り除くことによりバンプを形成することを特徴とする
電子部品のバンプ形成方法。6. One or more through-hole masks having through-holes at positions corresponding to the terminal electrodes on the surface of the electronic component are stacked and fixed on the flat plate surface, and the through-holes are filled with a metal paste or a conductive paste. The electronic component is positioned and mounted on the through-hole mask so that the terminal electrode and the through-hole filled with the metal paste or the conductive paste face each other, and the metal paste or the conductive paste is heated and melted to form the terminal electrode. A bump forming method for an electronic component, which comprises: forming a bump by removing the through hole mask and the flat plate from the electronic component.
金属ペースト内の金属あるいは導電性ペースト内の導電
性物質の融点より低くかつ,金属ペーストあるいは導電
性ペーストの加熱溶融後の残渣の硬化温度より高い温度
に,電子部品,平板,貫通穴マスクの少なくとも1つ以
上を加熱し,その状態で電子部品から貫通穴マスクと平
板を取り除くことを特徴とする電子部品のバンプ形成方
法。7. The bump forming method according to claim 6,
At least the melting point of the metal in the metal paste or the conductive material in the conductive paste and the temperature higher than the curing temperature of the residue of the metal paste or the conductive paste after heating and melting of the metal paste, the flat plate, and the through-hole mask. A method for forming bumps for an electronic component, comprising heating one or more and removing a through-hole mask and a flat plate from the electronic component in that state.
金属ペーストあるいは導電性ペーストを加熱溶融して端
子電極に転写する際,貫通穴マスクと電子部品との間に
隙間を設けたことを特徴とする電子部品のバンプ形成方
法。8. The bump forming method according to claim 6,
A bump forming method for an electronic component, wherein a gap is provided between the through-hole mask and the electronic component when the metal paste or the conductive paste is heated and melted and transferred to the terminal electrode.
貫通穴マスクの厚みと,貫通穴マスクと電子部品の隙間
の合計値が,金属ペーストあるいは導電性ペーストが加
熱溶融球体化したときの平板からの高さよりも小さいこ
とを特徴とする電子部品のバンプ形成方法。9. The bump forming method according to claim 8,
The bump of the electronic component, wherein the thickness of the through-hole mask and the total value of the gap between the through-hole mask and the electronic component are smaller than the height from the flat plate when the metal paste or the conductive paste is heated and melted into a sphere. Forming method.
て,貫通穴マスクの厚みと,貫通穴マスクと電子部品の
隙間の合計値が,金属ペーストあるいは導電性ペースト
が電子部品の端子電極に加熱溶融転写され球体化したと
きの電子部品からの高さより大きいことを特徴とする電
子部品のバンプ形成方法。10. The bump forming method according to claim 9, wherein the thickness of the through-hole mask and the total value of the gap between the through-hole mask and the electronic component are such that the metal paste or the conductive paste is heated and melted on the terminal electrode of the electronic component. A bump forming method for an electronic component, wherein the height is greater than the height from the electronic component when transferred and made into a sphere.
て、 端子電極と貫通穴が相対するように貫通穴マスク上に電
子部品を位置決め搭載する前に,複数の重ねた貫通穴マ
スクの表面の貫通穴マスクをはがすことを特徴とする電
子部品のバンプ形成方法。11. The bump forming method according to claim 6, wherein before the electronic component is positioned and mounted on the through-hole mask such that the terminal electrode and the through-hole face each other, the surface of the plurality of through-hole masks is penetrated. A method of forming a bump for an electronic component, which comprises removing a hole mask.
で作成されたことを特徴とする電子部品のバンプ形成方
法。12. A bump forming method for an electronic component, wherein the flat plate according to claim 6 is made of a flexible material.
もつことを特徴とする電子部品のバンプ形成方法。13. A bump forming method for an electronic component, wherein the through-hole mask according to claim 6 has flexibility.
ミド材料で作成されたことを特徴とする電子部品のバン
プ形成方法。14. A bump forming method for an electronic component, wherein the through-hole mask according to claim 13 is made of a polyimide material.
状が正方形あるいは長方形あるいは多角形であることを
特徴とする電子部品のバンプ形成方法。15. A bump forming method for an electronic component, wherein the through-hole shape of the through-hole mask according to claim 6 is a square, a rectangle or a polygon.
金属ペーストあるいは導電性ペーストが加熱溶融球体化
したときの平板からの高さよりも小さいことを特徴とす
る電子部品のバンプ形成方法。16. The through-hole mask according to claim 6, wherein
A bump forming method for an electronic component, characterized in that the height of the metal paste or the conductive paste from the flat plate when heated and melted into spheres is smaller.
金属ペーストあるいは導電性ペーストが加熱溶融球体化
したときの平板からの高さよりも小さく,電子部品の端
子電極に加熱溶融転写され球体化したときの電子部品か
らの高さより大きいことを特徴とする電子部品のバンプ
形成方法。17. The thickness of the through-hole mask according to claim 6,
An electron characterized in that the height of the metal paste or the conductive paste is smaller than the height from the flat plate when it is spheroidized by heating, and is larger than the height from the electronic component when it is spheroidized by being heat-melted and transferred to the terminal electrode of the electronic component. Bump forming method for components.
て、 金属ペーストあるいは導電性ペーストを加熱溶融して端
子電極に転写する前に,電子部品の上に重りを乗せるこ
とを特徴とする電子部品のバンプ形成方法。18. The bump forming method according to claim 6, wherein a weight is placed on the electronic component before the metal paste or the conductive paste is heated and melted and transferred to the terminal electrode. Bump forming method.
て、 電子部品の上に重りを乗せる前に,電子部品と貫通穴マ
スクを金属ペーストあるいは導電性ペーストの溶剤の沸
点以下の温度で加熱後冷却することを特徴とする電子部
品のバンプ形成方法。19. The bump forming method according to claim 18, wherein the electronic component and the through-hole mask are heated and cooled at a temperature lower than the boiling point of the solvent of the metal paste or the conductive paste before the weight is placed on the electronic component. A method of forming a bump for an electronic component, comprising:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8051315A JPH09246324A (en) | 1996-03-08 | 1996-03-08 | Electronic component and bump forming method thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8051315A JPH09246324A (en) | 1996-03-08 | 1996-03-08 | Electronic component and bump forming method thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH09246324A true JPH09246324A (en) | 1997-09-19 |
Family
ID=12883495
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8051315A Pending JPH09246324A (en) | 1996-03-08 | 1996-03-08 | Electronic component and bump forming method thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH09246324A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000299551A (en) * | 1999-04-16 | 2000-10-24 | Mitsubishi Electric Corp | Method for forming bump |
WO2003063232A1 (en) * | 2002-01-23 | 2003-07-31 | Fujitsu Media Devices Limited | Module device |
WO2008101099A1 (en) * | 2007-02-15 | 2008-08-21 | Cufer Asset Ltd. L.L.C. | Bowed wafer hybridization compensation |
WO2008114465A1 (en) * | 2007-03-20 | 2008-09-25 | Senju Metal Industry Co., Ltd. | Method of forming solder bumps and solder bump-forming assembly |
WO2011020038A3 (en) * | 2009-08-13 | 2011-04-14 | Qualcomm Incorporated | Interconnect structure with elements of varying height or different materials that allows a balanced stress to prevent thin die warpage |
WO2023277085A1 (en) * | 2021-06-30 | 2023-01-05 | 昭和電工マテリアルズ株式会社 | Member for forming solder bump |
WO2023277083A1 (en) * | 2021-06-30 | 2023-01-05 | 昭和電工マテリアルズ株式会社 | Solder bump formation method |
-
1996
- 1996-03-08 JP JP8051315A patent/JPH09246324A/en active Pending
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000299551A (en) * | 1999-04-16 | 2000-10-24 | Mitsubishi Electric Corp | Method for forming bump |
WO2003063232A1 (en) * | 2002-01-23 | 2003-07-31 | Fujitsu Media Devices Limited | Module device |
WO2008101099A1 (en) * | 2007-02-15 | 2008-08-21 | Cufer Asset Ltd. L.L.C. | Bowed wafer hybridization compensation |
US7803693B2 (en) | 2007-02-15 | 2010-09-28 | John Trezza | Bowed wafer hybridization compensation |
WO2008114465A1 (en) * | 2007-03-20 | 2008-09-25 | Senju Metal Industry Co., Ltd. | Method of forming solder bumps and solder bump-forming assembly |
WO2011020038A3 (en) * | 2009-08-13 | 2011-04-14 | Qualcomm Incorporated | Interconnect structure with elements of varying height or different materials that allows a balanced stress to prevent thin die warpage |
US8076762B2 (en) | 2009-08-13 | 2011-12-13 | Qualcomm Incorporated | Variable feature interface that induces a balanced stress to prevent thin die warpage |
WO2023277085A1 (en) * | 2021-06-30 | 2023-01-05 | 昭和電工マテリアルズ株式会社 | Member for forming solder bump |
WO2023277083A1 (en) * | 2021-06-30 | 2023-01-05 | 昭和電工マテリアルズ株式会社 | Solder bump formation method |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP3202903B2 (en) | Method of forming solder balls on a substrate | |
JP3480826B2 (en) | Electronic module manufacturing method, board-to-board bonding method, conical solder forming method, and board | |
EP0586243B1 (en) | Method and apparatus for assembling multichip modules | |
EP0263222B1 (en) | Method of forming solder terminals for a pinless ceramic module | |
US6528346B2 (en) | Bump-forming method using two plates and electronic device | |
KR100370525B1 (en) | A method for forming the bump | |
US6271110B1 (en) | Bump-forming method using two plates and electronic device | |
JPH10256315A (en) | Semiconductor chip bonding pad and its formation | |
KR970012964A (en) | A system interconnected by bond material bumps | |
JPH0945805A (en) | Wiring board, semiconductor device, method for removing semiconductor device from wiring board, and method for manufacturing semiconductor device | |
JPH09246324A (en) | Electronic component and bump forming method thereof | |
JPH06267964A (en) | Bump forming method | |
JPH08111578A (en) | Method for manufacturing substrate for mounting ball grid array package | |
JPH0888463A (en) | Soldering and mounting method for electronic parts | |
JP3395609B2 (en) | Solder bump formation method | |
JPH09186162A (en) | Method of forming metal bump | |
JP2827965B2 (en) | Ball grid array mounting method | |
KR100221654B1 (en) | Method for manufacturing metal bump used screen printing | |
JP2001085558A (en) | Semiconductor device and mounting method thereof | |
JP3013682B2 (en) | Solder bump and connection structure and method for electronic component using the same | |
JPH08316619A (en) | Printed wiring board and its manufacture | |
JPH09326412A (en) | How to attach the solder balls | |
JP4092707B2 (en) | Method and apparatus for mounting conductive ball | |
JP4478954B2 (en) | Conductive ball mounting device | |
JP5067107B2 (en) | Circuit board and semiconductor device |