JPH09208236A - Production of carbon-containing quartz glass - Google Patents
Production of carbon-containing quartz glassInfo
- Publication number
- JPH09208236A JPH09208236A JP2156696A JP2156696A JPH09208236A JP H09208236 A JPH09208236 A JP H09208236A JP 2156696 A JP2156696 A JP 2156696A JP 2156696 A JP2156696 A JP 2156696A JP H09208236 A JPH09208236 A JP H09208236A
- Authority
- JP
- Japan
- Prior art keywords
- carbon
- glass
- quartz glass
- gel
- oxygen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims abstract description 35
- 229910052799 carbon Inorganic materials 0.000 title claims abstract description 35
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 23
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 12
- 239000012298 atmosphere Substances 0.000 claims abstract description 18
- 239000011521 glass Substances 0.000 claims abstract description 17
- 239000005373 porous glass Substances 0.000 claims abstract description 17
- 239000011347 resin Substances 0.000 claims abstract description 15
- 229920005989 resin Polymers 0.000 claims abstract description 15
- 239000002904 solvent Substances 0.000 claims abstract description 10
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 8
- 239000010703 silicon Substances 0.000 claims abstract description 8
- -1 silicon alkoxide Chemical class 0.000 claims abstract description 8
- 150000003839 salts Chemical class 0.000 claims abstract description 7
- 239000003054 catalyst Substances 0.000 claims abstract description 6
- 229920000620 organic polymer Polymers 0.000 claims abstract description 6
- 238000001035 drying Methods 0.000 claims description 10
- 238000010438 heat treatment Methods 0.000 claims description 7
- 230000003301 hydrolyzing effect Effects 0.000 claims description 6
- 238000010304 firing Methods 0.000 claims description 5
- 238000000034 method Methods 0.000 abstract description 11
- 230000003647 oxidation Effects 0.000 abstract description 3
- 238000007254 oxidation reaction Methods 0.000 abstract description 3
- 239000004065 semiconductor Substances 0.000 abstract description 3
- 239000000758 substrate Substances 0.000 abstract description 3
- 238000006068 polycondensation reaction Methods 0.000 abstract 1
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- 239000000243 solution Substances 0.000 description 9
- 229920000642 polymer Polymers 0.000 description 7
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- 238000005470 impregnation Methods 0.000 description 5
- CRNJBCMSTRNIOX-UHFFFAOYSA-N methanolate silicon(4+) Chemical compound [Si+4].[O-]C.[O-]C.[O-]C.[O-]C CRNJBCMSTRNIOX-UHFFFAOYSA-N 0.000 description 5
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 4
- 238000009833 condensation Methods 0.000 description 3
- 230000005494 condensation Effects 0.000 description 3
- 239000001307 helium Substances 0.000 description 3
- 229910052734 helium Inorganic materials 0.000 description 3
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 3
- 239000012299 nitrogen atmosphere Substances 0.000 description 3
- LDWOOZOWGNCQRI-UHFFFAOYSA-N 2-hydroxyethyl(trimethyl)azanium;nitrate Chemical compound [O-][N+]([O-])=O.C[N+](C)(C)CCO LDWOOZOWGNCQRI-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 239000001089 [(2R)-oxolan-2-yl]methanol Substances 0.000 description 2
- OEYIOHPDSNJKLS-UHFFFAOYSA-N choline Chemical compound C[N+](C)(C)CCO OEYIOHPDSNJKLS-UHFFFAOYSA-N 0.000 description 2
- 229960001231 choline Drugs 0.000 description 2
- QVFPLSXXOOJNEK-UHFFFAOYSA-L ethyl(trimethyl)azanium 2-hydroxyethyl(trimethyl)azanium dihydroxide Chemical compound [OH-].[OH-].CC[N+](C)(C)C.C[N+](C)(C)CCO QVFPLSXXOOJNEK-UHFFFAOYSA-L 0.000 description 2
- 239000005416 organic matter Substances 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- 229920002689 polyvinyl acetate Polymers 0.000 description 2
- 239000011118 polyvinyl acetate Substances 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 2
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 2
- BSYVTEYKTMYBMK-UHFFFAOYSA-N tetrahydrofurfuryl alcohol Chemical compound OCC1CCCO1 BSYVTEYKTMYBMK-UHFFFAOYSA-N 0.000 description 2
- LPSKDVINWQNWFE-UHFFFAOYSA-M tetrapropylazanium;hydroxide Chemical compound [OH-].CCC[N+](CCC)(CCC)CCC LPSKDVINWQNWFE-UHFFFAOYSA-M 0.000 description 2
- 238000004017 vitrification Methods 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 229920002153 Hydroxypropyl cellulose Polymers 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 238000010000 carbonizing Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000007849 furan resin Substances 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000001863 hydroxypropyl cellulose Substances 0.000 description 1
- 235000010977 hydroxypropyl cellulose Nutrition 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000005191 phase separation Methods 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- ZQZCOBSUOFHDEE-UHFFFAOYSA-N tetrapropyl silicate Chemical compound CCCO[Si](OCCC)(OCCC)OCCC ZQZCOBSUOFHDEE-UHFFFAOYSA-N 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
- C03C1/006—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/045—Silicon oxycarbide, oxynitride or oxycarbonitride glasses
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Melting And Manufacturing (AREA)
- Glass Compositions (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、カーボン含有石英
ガラスの製造方法に関する。TECHNICAL FIELD The present invention relates to a method for producing carbon-containing quartz glass.
【0002】[0002]
【従来の技術】石英ガラスとカーボンを複合化すること
により、石英ガラスの有する優れた特長(高純度、低熱
膨張、耐熱衝撃性)及び耐酸化性を維持したままで、石
英ガラスの耐熱性向上(高温での変形抑制)、赤外線放
射率向上、導電性増加などの機能向上が実現できると考
えられ、近年、いくつかの検討がなされている。以下、
主なものを紹介する。2. Description of the Related Art By combining silica glass and carbon, the heat resistance of silica glass is improved while maintaining the excellent characteristics of silica glass (high purity, low thermal expansion, thermal shock resistance) and oxidation resistance. It is considered that functional improvement such as (suppression of deformation at high temperature), improvement of infrared emissivity, and increase of conductivity can be realized, and some studies have been made in recent years. Less than,
I will introduce the main ones.
【0003】ロナルド・ハワード・バニイ等は、オルガ
ノシルセスキオキサン、金属酸化物及び金属アルコキシ
ドから得られる安定なゲルを不活性雰囲気または真空中
で熱分解させることによりカーボン含有ガラスを得る方
法を提案している(特開昭59−97550号公報)。Ronald Howard Vanilly et al. Proposed a method for obtaining a carbon-containing glass by thermally decomposing a stable gel obtained from an organosilsesquioxane, a metal oxide and a metal alkoxide in an inert atmosphere or a vacuum. (Japanese Patent Laid-Open No. 59-97550).
【0004】高城等は、シリコンアルコキシドの加水分
解溶液(ゾル)をゲル化し、乾燥してゲル内の残留有機
物含有量を調製した後、無酸素雰囲気中で加熱し有機物
を炭化させることにより、カーボン含有ガラス(多孔
質)を得る方法を提案している(特開平2−23912
2号公報)。Takagi et al. Have reported that by hydrolyzing a hydrolyzed solution (sol) of silicon alkoxide into a gel and drying it to adjust the content of residual organic matter in the gel, heating the mixture in an oxygen-free atmosphere to carbonize the organic matter. A method for obtaining a contained glass (porous) has been proposed (JP-A-2-23912).
No. 2).
【0005】山田等は、四塩化炭素を含有するシリコン
アルコキシドの加水分解溶液をゲル化、乾燥し、無酸素
雰囲気中で焼成することにより、カーボンを均一に含有
するガラス(多孔質)を得る方法を提案している(特開
昭62−123029号公報、特開昭62−12303
0号公報)。Yamada et al. Described a method of obtaining a glass (porous) uniformly containing carbon by gelling a hydrolyzing solution of silicon alkoxide containing carbon tetrachloride, drying and firing in an oxygen-free atmosphere. (JP-A-62-123029 and JP-A-62-12303).
No. 0).
【0006】八馬等は、火炎加水分解法、ゾルーゲル
法、分相法などによって作製された多孔質ガラス体と水
酸基と反応する炭素を含む珪素化合物を反応させた後、
無酸素雰囲気中で焼成してカーボン含有ガラスを得る方
法を提案している(特開平3−126638号公報)。Hama et al., After reacting a porous glass body prepared by a flame hydrolysis method, a sol-gel method, a phase separation method, etc. with a silicon compound containing carbon which reacts with a hydroxyl group,
A method for obtaining a glass containing carbon by firing in an oxygen-free atmosphere has been proposed (JP-A-3-126638).
【0007】以上のカーボン含有石英ガラスの製法に
は、カーボン含有石英ガラスを半導体製造用治具や面ヒ
ーター用基板に適用する際に不可欠なガラスの大形化が
困難であったり、またガラス中のカーボン成分をわずか
に残留した揮発性物質の炭化によって得ているため、ガ
ラス中のカーボン含有量を大きく出来ないという問題が
あった。In the above-described method for producing carbon-containing quartz glass, it is difficult to increase the size of the glass, which is indispensable when the carbon-containing quartz glass is applied to a jig for semiconductor production or a substrate for a surface heater. However, there is a problem in that the carbon content in the glass cannot be increased because the carbon component (1) is obtained by carbonizing a slight residual volatile substance.
【0008】[0008]
【発明が解決しようとする課題】本発明は、カーボン含
有ガラスの大形化及びガラス中のカーボン含有量の増加
を実現するカーボン含有石英ガラスの製造方法を提供す
るものである。DISCLOSURE OF THE INVENTION The present invention provides a method for producing a carbon-containing quartz glass which realizes an increase in the size of the carbon-containing glass and an increase in the carbon content in the glass.
【0009】[0009]
【課題を解決するための手段】本発明は、半導体ウエハ
ーの熱処理用の容器や治具等、また面ヒーター用基板等
に好適に使用できる、機械的、熱的、電気的、赤外線放
射特性に優れ、また耐酸化性に優れるカーボン含有石英
ガラスの製造方法に関するもので、本願の第一の発明
は、シリコンアルコキシドの部分縮重合物を有機ポリマ
ー、溶媒及び塩の存在下、塩基触媒を用いて加水分解し
てゾルとし、ゲル化し、乾燥して得た乾燥ゲルを無酸素
雰囲気下で加熱、ガラス化して、ガラス中にカーボンを
含有させることを特徴とするカーボン含有石英ガラスの
製造方法であり、本願の第二の発明は、シリコンアルコ
キシドの部分縮重合物を有機ポリマー、溶媒及び塩の存
在下、塩基触媒を用いて加水分解してゾルとし、ゲル化
し、乾燥して得た乾燥ゲルを700―1300℃の温度
で焼成して多孔質ガラスとし、この多孔質ガラスに樹脂
溶液を含浸させ、乾燥した後、無酸素雰囲気中で加熱、
ガラス化することを特徴とするカーボン含有石英ガラス
の製造方法である。The present invention provides mechanical, thermal, electrical and infrared radiation characteristics which can be suitably used for containers and jigs for heat treatment of semiconductor wafers, substrates for surface heaters and the like. The present invention relates to a method for producing a carbon-containing quartz glass which is excellent and excellent in oxidation resistance. A method for producing a carbon-containing quartz glass, which comprises hydrolyzing a sol, gelling, and drying a dried gel obtained by heating in an oxygen-free atmosphere to vitrify and containing carbon in the glass. The second invention of the present application is to obtain a dried sol obtained by hydrolyzing a partially polycondensed product of a silicon alkoxide with a base catalyst in the presence of an organic polymer, a solvent and a salt to form a sol, gelling and drying. By firing the gel at a temperature of 700-1300 ℃ and porous glass, porous glass is impregnated with resin solution, dried, heated in an oxygen-free atmosphere,
A method for producing carbon-containing quartz glass, which comprises vitrifying.
【0009】本発明者らは、前記課題を解決する石英ガ
ラスの製造方法を検討した結果、シリコンアルコキシド
部分縮重合物を溶媒、有機ポリマー及び塩の存在下で塩
基触媒を用いて加水分解して調製したゾルをゲル化し、
乾燥して得た乾燥ゲルを無酸素雰囲気中で加熱、ガラス
化することにより、実用上十分な大きさのカーボン含有
石英ガラスを容易に作製できること、また上記の方法で
作製した乾燥ゲルを焼成して多孔質ガラスとし、この多
孔質ガラス体に樹脂溶液を含浸させ、乾燥した後、無酸
素雰囲気中で加熱、ガラス化することにより、ガラスの
大形化と同時にガラス中のカーボン含有率を大きくでき
ることを見出し、本発明を完成させた。The present inventors have studied a method for producing quartz glass that solves the above-mentioned problems, and as a result, hydrolyzed a partial condensation polymer of silicon alkoxide using a base catalyst in the presence of a solvent, an organic polymer and a salt. Gel the prepared sol,
By heating and vitrifying the dried gel obtained in an oxygen-free atmosphere, carbon-containing quartz glass of practically sufficient size can be easily produced, and the dried gel produced by the above method is calcined. To form porous glass, impregnate this porous glass body with a resin solution, dry it, and heat it in an oxygen-free atmosphere to vitrify it, thereby increasing the size of the glass and simultaneously increasing the carbon content in the glass. The inventors have found out what can be done and have completed the present invention.
【0010】[0010]
【発明の実施の形態】本発明で使用するシリコンアルコ
キシドの部分縮重合物としては、シリコンテトラメトキ
シド、シリコンテトラエトキシド、シリコンテトラプロ
ポキシドなどの部分縮重合物が使用できるが、原料コス
ト及び得られるガラスサイズの大形化が容易であるとい
う点から、シリコンテトラメトキシドの部分縮重合物の
使用が好ましい。BEST MODE FOR CARRYING OUT THE INVENTION As a partial condensation polymer of a silicon alkoxide used in the present invention, a partial condensation polymer such as silicon tetramethoxide, silicon tetraethoxide or silicon tetrapropoxide can be used. It is preferable to use a partially condensed polymer of silicon tetramethoxide from the viewpoint that the size of the glass obtained can be easily increased.
【0011】本発明で使用する溶媒としては、メタノー
ル、エタノール、プロパノールなどのアルコール類、ジ
メチルホルムアミド、ジメチルアセトアミド、テトラヒ
ドロフルフリルアルコール等の高沸点溶媒の混合溶媒の
使用がガラスを大形化する上で好適である。As the solvent used in the present invention, use of a mixed solvent of alcohols such as methanol, ethanol, propanol and the like, high boiling point solvents such as dimethylformamide, dimethylacetamide, tetrahydrofurfuryl alcohol and the like will increase the size of the glass. Is preferred.
【0012】本発明で使用する有機ポリマとしては、ポ
リ酢酸ビニル、ポリエチレングリコール及びその誘導
体、ヒドロキシプロピルセルロースなどが使用できる。As the organic polymer used in the present invention, polyvinyl acetate, polyethylene glycol and its derivatives, hydroxypropyl cellulose and the like can be used.
【0013】本発明で使用する塩としては、水酸化アン
モニウム、水酸化テトラメチルアンモニウム、水酸化テ
トラエチルアンモニウム、水酸化テトラプロピルアンモ
ニウム、水酸化トリメチルエチルアンモニウム(コリ
ン)などの塩基と硝酸、塩酸などの酸との塩が使用でき
る。The salts used in the present invention include bases such as ammonium hydroxide, tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydroxide, trimethylethylammonium hydroxide (choline) and nitric acid, hydrochloric acid and the like. Salts with acids can be used.
【0014】本発明で使用する塩基触媒としては、水酸
化テトラメチルアンモニウム、水酸化テトラエチルアン
モニウム、水酸化テトラプロピルアンモニウム、水酸化
トリメチルエチルアンモニウム(コリン)が使用でき
る。As the base catalyst used in the present invention, tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydroxide, trimethylethylammonium hydroxide (choline) can be used.
【0015】以上の成分を用いて調製したゾルを容器に
注入し、静置してゲル化し、乾燥して乾燥ゲルを作製す
る。ゲルの乾燥には、公知のガス透過性フイルムを用い
る方法、またピンホールを用いる方法いずれの方法も採
用できる。The sol prepared by using the above components is poured into a container, allowed to stand and gelated, and dried to prepare a dried gel. Any known method using a gas-permeable film or a method using a pinhole can be used for drying the gel.
【0016】作製した乾燥ゲルを無酸素雰囲気下で例え
ば1400―1500℃の温度で加熱、ガラス化するこ
とによってカーボン含有石英ガラスが得られる。使用す
る無酸素雰囲気としては、窒素、アルゴン、ヘリウム、
真空などが使用できる。Carbon-containing quartz glass is obtained by heating and vitrifying the produced dry gel in an oxygen-free atmosphere at a temperature of 1400-1500 ° C., for example. The oxygen-free atmosphere used is nitrogen, argon, helium,
Vacuum etc. can be used.
【0017】また、乾燥ゲルを700―1300℃の温
度で焼成して多孔質ガラス体とした後、これに樹脂溶液
を含浸させ、乾燥した後、無酸素雰囲気中で加熱、ガラ
ス化することにより、カーボン含有率の高いカーボン含
有石英ガラスを作製することが出来る。乾燥ゲルを多孔
質ガラス体にする温度は、700℃未満では多孔質ガラ
ス体強度が低く、樹脂溶液の含浸作業でゲルが破壊され
るので好ましくない。一方、1300℃を越えると多孔
質体の緻密化が進み、樹脂溶液の含浸が困難となるので
好ましくない。樹脂としては、熱分解後に残留する炭素
分が大きいものであれば基本的にはどのようなものでも
用いる事が出来るが、残留炭素分が大きなフエノール樹
脂、エポキシ樹脂、フラン樹脂等の樹脂の使用が好まし
い。これらの樹脂を溶解する溶媒は、樹脂を溶解できる
溶媒であれば基本的にはどのようなものでも使用でき
る。含浸の際には、真空・加圧含浸など公知の方法が使
用できるし、含浸作業は複数回繰り返してもよい。以上
のようにして作製した樹脂含有多孔質ガラス体を無酸素
雰囲気中で焼成することにより、カーボン含有率の高い
石英ガラスが得られる。The dried gel is fired at a temperature of 700-1300 ° C. to obtain a porous glass body, which is impregnated with a resin solution, dried, and then heated in an oxygen-free atmosphere to vitrify. It is possible to produce carbon-containing quartz glass having a high carbon content. If the temperature at which the dried gel is made into a porous glass body is lower than 700 ° C., the strength of the porous glass body is low, and the gel is destroyed during the impregnation work with the resin solution, which is not preferable. On the other hand, if the temperature exceeds 1300 ° C, the porous body is densified and impregnation with the resin solution becomes difficult, which is not preferable. As the resin, basically any resin can be used as long as it has a large carbon content remaining after thermal decomposition, but use of a resin such as a phenol resin, an epoxy resin or a furan resin having a large residual carbon content. Is preferred. As the solvent for dissolving these resins, any solvent can be basically used as long as it can dissolve the resin. At the time of impregnation, a known method such as vacuum / pressure impregnation can be used, and the impregnation operation may be repeated a plurality of times. By firing the resin-containing porous glass body produced as described above in an oxygen-free atmosphere, quartz glass having a high carbon content can be obtained.
【0018】[0018]
実施例1 シリコンテトラメトキシドの部分縮重合物100重量
部、メタノール500重量部、ジメチルホルムアミド3
60重量部、テトラヒドロフルフリルアルコール266
重量部、ポリ酢酸ビニル(重合度:1800)5重量部
を混合した。これに1M硝酸コリン水溶液をシリコンテ
トラメトキシドの部分縮重合物100g当たりの硝酸コ
リン濃度が5.0x10-4molとなるように添加し、
ついで1Mコリンメタノール溶液をシリコンテトラメト
キシドの部分縮重合物100g当たりのコリン濃度が
1.2x10-4molとなるように添加した。溶液を攪
拌しながら水390重量部を滴下し、さらに攪拌を行っ
てゾルを調製した。得られたゾル27kgをテフロンコ
ーテイングした1150mm角のステンレス製容器に注
入し、直径1mmのピンホールを8個開けた蓋をした。
ゾルの入った容器を静置してゲル化した後、50℃から
180℃の温度まで徐々に加熱してゲルを乾燥させた。
乾燥時間は約14日とした。得られた乾燥ゲルを窒素雰
囲気中で1000℃まで加熱し、ついで雰囲気をヘリウ
ムに変えて1420℃まで昇温し、1時間保持してガラ
ス化を完了した。こうして約530mm角、厚み8mm
の割れのない緻密なカーボン含有石英ガラスを得た。Example 1 100 parts by weight of a partially condensed polymer of silicon tetramethoxide, 500 parts by weight of methanol, dimethylformamide 3
60 parts by weight, tetrahydrofurfuryl alcohol 266
By weight, 5 parts by weight of polyvinyl acetate (degree of polymerization: 1800) were mixed. An aqueous solution of 1M choline nitrate was added to this so that the concentration of choline nitrate per 100 g of the partially condensed polymer of silicon tetramethoxide was 5.0 × 10 −4 mol,
Then, a 1 M choline methanol solution was added so that the choline concentration per 100 g of silicon tetramethoxide partially condensed polymer would be 1.2 × 10 −4 mol. While stirring the solution, 390 parts by weight of water was dropped, and further stirred to prepare a sol. 27 kg of the obtained sol was poured into a 1150 mm square stainless steel container coated with Teflon, and a lid having eight pin holes with a diameter of 1 mm was opened.
The sol-containing container was allowed to stand to gel, and then gradually heated from 50 ° C. to 180 ° C. to dry the gel.
The drying time was about 14 days. The obtained dried gel was heated to 1000 ° C. in a nitrogen atmosphere, the atmosphere was changed to helium, the temperature was raised to 1420 ° C., and the temperature was maintained for 1 hour to complete vitrification. Thus about 530mm square, thickness 8mm
A dense carbon-containing quartz glass having no cracks was obtained.
【0019】実施例2 実施例2と同様にして乾燥ゲルを作製した。得られた乾
燥ゲルから約450mm角のゲルを切り出し、窒素雰囲
気中で1000℃まで加熱し、1時間保持して多孔質ガ
ラス体を得た。多孔質ガラス体をパレット(約500m
m角)に入れ、真空デシケーター中で排気した後、ノボ
ラック型フエノール樹脂のメタノール溶液(濃度20
%)をパレットに注入し、多孔質ガラス体に樹脂を含浸
させた。溶媒を乾燥除去して得られた樹脂を含有する多
孔質ガラス体を窒素雰囲気中で1000℃まで加熱し、
ついで雰囲気をヘリウムに変えて1450℃まで昇温
し、1時間保持してガラス化を完了させた。こうして約
220mm角、厚み8mmの割れのないカーボン含有石
英ガラスを得た。Example 2 A dry gel was prepared in the same manner as in Example 2. A gel of about 450 mm square was cut out from the obtained dried gel, heated to 1000 ° C. in a nitrogen atmosphere and kept for 1 hour to obtain a porous glass body. Pallet made of porous glass (about 500 m
m square) and evacuated in a vacuum desiccator, then, a novolac-type phenol resin in methanol (concentration 20)
%) Was poured into a pallet to impregnate the porous glass body with resin. The porous glass body containing the resin obtained by drying and removing the solvent is heated to 1000 ° C. in a nitrogen atmosphere,
Then, the atmosphere was changed to helium, the temperature was raised to 1450 ° C., and the temperature was maintained for 1 hour to complete the vitrification. In this way, a carbon-containing quartz glass having a size of about 220 mm square and a thickness of 8 mm without cracks was obtained.
【0020】[0020]
【発明の効果】本発明によれば、様々な用途に適用可能
な大形かつカーボン含有量の大きなカーボン含有石英ガ
ラスを容易に作製することが出来る。According to the present invention, it is possible to easily produce a large-sized carbon-containing quartz glass having a large carbon content which can be applied to various uses.
フロントページの続き (72)発明者 寺崎 裕樹 茨城県つくば市和台48 日立化成工業株式 会社筑波開発研究所内Front page continuation (72) Inventor Hiroki Terasaki 48 Wadai, Tsukuba City, Ibaraki Prefecture Hitachi Chemical Co., Ltd. Tsukuba Research Laboratory
Claims (2)
有機ポリマー、溶媒及び塩の存在下、塩基触媒を用いて
加水分解してゾルとし、ゲル化し、乾燥して得た乾燥ゲ
ルを無酸素雰囲気下で加熱、ガラス化して、ガラス中に
カーボンを含有させることを特徴とするカーボン含有石
英ガラスの製造方法。1. A dried gel obtained by hydrolyzing a partially polycondensed product of a silicon alkoxide with a base catalyst in the presence of an organic polymer, a solvent and a salt to form a gel, and drying the gel under an oxygen-free atmosphere. A method for producing a carbon-containing quartz glass, which comprises heating and vitrifying the glass to contain carbon in the glass.
有機ポリマー、溶媒及び塩の存在下、塩基触媒を用いて
加水分解してゾルとし、ゲル化し、乾燥して得た乾燥ゲ
ルを700―1300℃の温度で焼成して多孔質ガラス
とし、この多孔質ガラスに樹脂溶液を含浸させ、乾燥し
た後、無酸素雰囲気中で加熱、ガラス化することを特徴
とするカーボン含有石英ガラスの製造方法。2. A dried gel obtained by hydrolyzing a partially polycondensed product of a silicon alkoxide with a base catalyst in the presence of an organic polymer, a solvent and a salt to give a sol, gelling and drying the resulting gel is 700-1300 ° C. A method for producing a carbon-containing quartz glass, which comprises firing at a temperature of 1 to obtain a porous glass, impregnating the porous glass with a resin solution, drying and then heating and vitrifying in an oxygen-free atmosphere.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2156696A JPH09208236A (en) | 1996-02-07 | 1996-02-07 | Production of carbon-containing quartz glass |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2156696A JPH09208236A (en) | 1996-02-07 | 1996-02-07 | Production of carbon-containing quartz glass |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH09208236A true JPH09208236A (en) | 1997-08-12 |
Family
ID=12058582
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2156696A Pending JPH09208236A (en) | 1996-02-07 | 1996-02-07 | Production of carbon-containing quartz glass |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH09208236A (en) |
-
1996
- 1996-02-07 JP JP2156696A patent/JPH09208236A/en active Pending
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