JPH01176235A - Production of silica glass - Google Patents
Production of silica glassInfo
- Publication number
- JPH01176235A JPH01176235A JP33421787A JP33421787A JPH01176235A JP H01176235 A JPH01176235 A JP H01176235A JP 33421787 A JP33421787 A JP 33421787A JP 33421787 A JP33421787 A JP 33421787A JP H01176235 A JPH01176235 A JP H01176235A
- Authority
- JP
- Japan
- Prior art keywords
- added
- sol
- solution
- gel
- monomer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 21
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 11
- 238000001035 drying Methods 0.000 claims abstract description 15
- 239000000178 monomer Substances 0.000 claims abstract description 14
- 238000000034 method Methods 0.000 claims abstract description 11
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 10
- 239000010703 silicon Substances 0.000 claims abstract description 10
- -1 silicon alkoxide Chemical class 0.000 claims abstract description 10
- 238000003980 solgel method Methods 0.000 claims abstract description 8
- 230000000379 polymerizing effect Effects 0.000 claims abstract description 3
- 239000005368 silicate glass Substances 0.000 claims description 7
- 238000010304 firing Methods 0.000 claims description 3
- 230000003301 hydrolyzing effect Effects 0.000 claims 1
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 abstract description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 9
- 239000002904 solvent Substances 0.000 abstract description 7
- 238000006116 polymerization reaction Methods 0.000 abstract description 5
- 239000000203 mixture Substances 0.000 abstract description 4
- 239000002253 acid Substances 0.000 abstract description 3
- 239000003054 catalyst Substances 0.000 abstract description 3
- 239000011521 glass Substances 0.000 abstract description 3
- 238000010438 heat treatment Methods 0.000 abstract description 3
- CRNJBCMSTRNIOX-UHFFFAOYSA-N methanolate silicon(4+) Chemical compound [Si+4].[O-]C.[O-]C.[O-]C.[O-]C CRNJBCMSTRNIOX-UHFFFAOYSA-N 0.000 abstract description 3
- 239000003505 polymerization initiator Substances 0.000 abstract description 3
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 abstract description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 abstract description 2
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 abstract description 2
- 230000000694 effects Effects 0.000 abstract description 2
- 229910052500 inorganic mineral Inorganic materials 0.000 abstract description 2
- 239000011707 mineral Substances 0.000 abstract description 2
- 150000007530 organic bases Chemical class 0.000 abstract description 2
- 229920000642 polymer Polymers 0.000 abstract description 2
- 150000007513 acids Chemical class 0.000 abstract 1
- 150000004703 alkoxides Chemical class 0.000 abstract 1
- 150000007524 organic acids Chemical class 0.000 abstract 1
- 235000005985 organic acids Nutrition 0.000 abstract 1
- 239000000499 gel Substances 0.000 description 22
- 239000000243 solution Substances 0.000 description 10
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- 238000001879 gelation Methods 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 238000005245 sintering Methods 0.000 description 3
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 235000011114 ammonium hydroxide Nutrition 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- 238000004031 devitrification Methods 0.000 description 2
- 238000005187 foaming Methods 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 238000012015 optical character recognition Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- HSOOVEKLGOIEFF-UHFFFAOYSA-N ethenyl nitrate Chemical compound [O-][N+](=O)OC=C HSOOVEKLGOIEFF-UHFFFAOYSA-N 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 239000003349 gelling agent Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 230000003606 oligomerizing effect Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 239000004071 soot Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/12—Other methods of shaping glass by liquid-phase reaction processes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
- C03C1/006—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing & Machinery (AREA)
- Glass Melting And Manufacturing (AREA)
- Silicon Compounds (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、光学用、半導体工業用、電子工業用、理化学
用等に使用されるケイ酸塩ガラスの製造法に関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a method for producing silicate glass used for optical applications, semiconductor industry, electronic industry, physics and chemistry, and the like.
(従来の技術)
近年、ケイ酸塩ガラスの新たな製造法として注目をあび
ているのが、ゾル−ゲル法である。(Prior Art) In recent years, the sol-gel method has been attracting attention as a new method for producing silicate glass.
ゾル−ゲル法によるケイ酸塩ガラスの製造法は次の通り
である。The method for producing silicate glass by the sol-gel method is as follows.
一般式Si (OR) *(但しRはアルキル基を表す
)で示されるシリコンアルコキシド及び/又はその重縮
合物、例えば
(RO)sSi(OSi(OR))、1O5i(OR)
s (n = O〜8 )に水(あらかじめ触媒として
酸、アルカリを加えておいてもよい)を加え、加水分解
しシリカヒドロシルとする。この時、シリコンアルコキ
シドと水とが均一な系となるように溶媒として適当なア
ルコールを加えてもよい。Silicon alkoxide and/or its polycondensate represented by the general formula Si (OR) * (where R represents an alkyl group), such as (RO)sSi(OSi(OR)), 1O5i(OR)
Water (an acid or alkali may be added as a catalyst in advance) is added to s (n = O~8) to hydrolyze it into silica hydrosil. At this time, a suitable alcohol may be added as a solvent so that the silicon alkoxide and water form a homogeneous system.
このシリカヒドロシル溶液を静置、昇温、ゲル化剤添加
等によりゲル化させる。その後、ゲルを乾燥することに
よりシリカゲルとする。This silica hydrosil solution is gelled by standing still, raising the temperature, adding a gelling agent, etc. Thereafter, the gel is dried to obtain silica gel.
この乾燥ゲルを適当な雰囲気中で焼結することによりシ
リカガラスを得る。Silica glass is obtained by sintering this dried gel in a suitable atmosphere.
このゾル−ゲル法には以下の特長がある。This sol-gel method has the following features.
(115iC1a等を原料とする火炎加水分解等により
生成するスートを焼結してガラス化する従来の気相化学
蒸着法よりも低温で製造できるため、省エネルギーで低
コスト化できる。(Since it can be produced at a lower temperature than the conventional vapor phase chemical vapor deposition method in which the soot produced by flame hydrolysis etc. using 115iC1a etc. as a raw material is sintered and vitrified, it can save energy and reduce costs.
(2)原料として液体状態で使用可能のため、精製が容
易に行え高純度化できる。(2) Since it can be used as a raw material in a liquid state, it can be easily purified and highly purified.
(3)室温で液相混合できるため、他成分と混合した場
合も均質なガラスができる。(3) Since liquid phase mixing is possible at room temperature, homogeneous glass can be produced even when mixed with other components.
(発明が解決しようとする問題点)
このように種々の特長をもつゾル−ゲル法によるケイ酸
塩ガラスの製造にもまだ未解決の問題が残されている。(Problems to be Solved by the Invention) There are still unresolved problems in the production of silicate glass by the sol-gel method, which has various advantages as described above.
特にゲルを乾燥する過程でゲルにクランクや割れが発生
し易く、モノリシックな大形の乾燥ゲルを歩留りよ(製
造することが困難であるという問題がある。In particular, there are problems in that the gel tends to crack or crack during the process of drying the gel, and it is difficult to produce a monolithic large-sized dried gel at a low yield.
クラックや割れの発生する原因の一つにゲル乾燥時に水
やアルコール等の蒸発に伴いゲル中に応力が発生し、こ
の応力がゲルの強度より大きいとゲルはクラックや割れ
が発生すると考えられている。One of the causes of cracks and cracks is that stress is generated in the gel as water, alcohol, etc. evaporate during gel drying, and if this stress is greater than the strength of the gel, it is thought that the gel will crack or break. There is.
この対策として、容器の開孔率を下げ、水やアルコール
等の蒸発速度を制御する方法がとられているが不充分で
ある。ゲル化、乾燥収縮過程でのクランクや割れはゲル
の内部構造と乾燥条件に負うところが大きい。As a countermeasure to this problem, methods have been taken to lower the porosity of the container and control the evaporation rate of water, alcohol, etc., but these methods are insufficient. Cracks and cracks during the gelation and drying shrinkage processes are largely due to the internal structure of the gel and the drying conditions.
本発明は、クランクや割れの発生しないケイ酸塩ガラス
の製造法を提供するものである。The present invention provides a method for producing silicate glass that does not cause cracking or cracking.
(問題点を解決するための手段)
本発明は、ゲル乾燥中、水やアルコール等の溶媒の蒸発
に伴って発生する応力がクランクや割れの一因となると
考え、このような大きな応力に耐えるようゲル強度を高
める目的でゾル溶液とする工程で有機物モノマー及び/
又はオリゴマーを添加し、ゲル化する工程及び/又は乾
燥する工程でこれを高分子化することで乾燥工程で生じ
る応力に耐えるゲル強度が得られることを見い出したこ
とに基づきなされたものである。(Means for Solving the Problems) The present invention considers that stress generated due to evaporation of solvents such as water and alcohol during gel drying is a cause of cracks and cracks, and the present invention is designed to withstand such large stress. Organic monomers and/or
Alternatively, this method was based on the discovery that gel strength capable of withstanding the stress generated in the drying process could be obtained by adding an oligomer and polymerizing it during the gelling and/or drying process.
本発明に用いるシリコンアルコキシドはシリコンアルコ
キシド単量体のみでな(重縮合物を用いてもよい、 例
えば、(CHsO) OSl (OSl(OCIIs)
x)、 OSl (OCRs)s (n −0〜B )
を挙げることができる。これらは一種でも複数でも使用
可能であるる。The silicon alkoxide used in the present invention is not only a silicon alkoxide monomer (polycondensates may also be used; for example, (CHsO) OSl (OSl(OCIIs)
x), OSl (OCRs)s (n −0 ~ B )
can be mentioned. One or more of these can be used.
加水分解のために加える水は予め触媒として塩酸、硫酸
などの鉱酸、ギ酸、酢酸などの有機物、また塩基として
アンモニアばかりでなくエチレンジアミンなどの有機塩
基を加えておいても良い。To the water added for hydrolysis, a mineral acid such as hydrochloric acid or sulfuric acid, or an organic substance such as formic acid or acetic acid may be added as a catalyst, and not only ammonia but also an organic base such as ethylenediamine may be added as a base.
ゾル溶液とする工程で添加する有機物はモノマーあるい
はオリゴマーは特に制限はないが、シリコンアルコキシ
ドと水に相溶性のあるものであるものが好ましいが、相
溶性のないものでも適当な溶媒を加えて相溶性をもたせ
ても良い。例えば、添加モノマーとしては酢酸ビニル、
アクリル酸、アクリルアミド、ビニルピロリドンなどを
挙げることができる。There is no particular restriction on the monomer or oligomer of the organic substance added in the step of forming a sol solution, but it is preferable that it is compatible with silicon alkoxide and water, but even if it is not compatible with silicon alkoxide, it can be made compatible by adding an appropriate solvent. It may also be made soluble. For example, vinyl acetate,
Acrylic acid, acrylamide, vinylpyrrolidone, etc. can be mentioned.
これらは一種でも複数でも使用可能である。One or more of these can be used.
この時に用いる溶媒はシリコンアルコキシド、添加する
モノマー及びオリゴマーの種類によって適宜選ぶことが
できる。The solvent used at this time can be appropriately selected depending on the silicon alkoxide and the types of monomers and oligomers to be added.
シリコンアルコキシド、水、溶媒、モノマーあるいはオ
リゴマーとは生成するゾルを出来るだけ均一なものとす
るためにスターラーなどを用いてよく混合する。又超音
波を照射してもよい、このゾルにシリカ微粉末を加えて
も良い、これらゾル溶液とする工程の雰囲気は特に限定
するものではなく、添加するモノマーあるいはオリゴマ
ーの種類によって適宜選ぶことができる。The silicon alkoxide, water, solvent, monomer, or oligomer are thoroughly mixed using a stirrer or the like to make the resulting sol as uniform as possible. In addition, ultrasonic waves may be irradiated, silica fine powder may be added to this sol, and the atmosphere in the process of forming a sol solution is not particularly limited and can be selected as appropriate depending on the type of monomer or oligomer to be added. can.
生成したゾル溶液は手速く他の容器に移してゲル化させ
る。ゲル化時には生成したゲルからアルコールなどの溶
媒の急激な蒸発を防ぐために容器を密封することが好ま
しい。The generated sol solution is quickly transferred to another container and allowed to gel. During gelation, it is preferable to seal the container in order to prevent rapid evaporation of the solvent such as alcohol from the generated gel.
このゲル化する工程、次いで乾燥する工程で、ゾル溶液
に添加したモノマーを高分子化する操作を加える必要が
ある。この高分子化の操作は次のようなものを挙げるこ
とができる。In this gelling step and then in the drying step, it is necessary to add an operation to polymerize the monomer added to the sol solution. The operations for this polymerization include the following.
■モノマー、オリゴマーを添加する時に同時に重合開始
剤を加えておく、■加熱する、■光を照射する、■放射
線を照射する等である。(2) adding a polymerization initiator at the same time as adding monomers and oligomers, (2) heating, (2) irradiating with light, (2) irradiating with radiation, etc.
この他にも、このような操作は添加する七ツマ−及びオ
リゴマーの種類によって適宜選ぶことができる。高分子
量化の程度は、乾燥する工程で発生する応力に耐えるに
足るポリマーが生成するように調整される。In addition, such operations can be selected as appropriate depending on the type of hexamer and oligomer to be added. The degree of polymerization is adjusted to produce a polymer sufficient to withstand the stress generated during the drying process.
乾燥する工程では穴のある蓋に代えて、適当な雰囲気下
で乾燥収縮固化させて乾燥ゲルとする。その後ゾル−ゲ
ル法で焼結することによりケイ酸塩ガラスを製造する。In the drying process, instead of using a lid with holes, the gel is dried and shrunk and solidified in an appropriate atmosphere to form a dry gel. A silicate glass is then produced by sintering using a sol-gel method.
ゲル化する工程、乾燥する工程、焼結する工程は一般に
用いられる条件が使用される。Generally used conditions are used for the gelling step, drying step, and sintering step.
例えばそれぞれ、室温〜100℃で数分〜数10日放置
、室温〜100℃で数時間〜数10日放置、10qO〜
1300℃に50〜b
る。For example, leave for several minutes to several tens of days at room temperature to 100°C, leave for several hours to several tens of days at room temperature to 100°C, and leave at 10qO to
Heat to 1300°C for 50~b.
実施例1
シリコンテトラメトキシド(St (OCH3) 者)
141m1にメタノール100mj!、0.01mol
/j!のアンモニア水72mlを加え、よく混合した。Example 1 Silicon tetramethoxide (St (OCH3))
100 mj of methanol in 141 m1! ,0.01mol
/j! 72 ml of ammonia water was added and mixed well.
さらにこの溶液にメタノールIQ Q m 1に![ビ
ニル七ツマ−14,7gを溶解させた溶液を加え充分に
均一になるように室温で混合する。充分混合した後、あ
らかじめアゾビスイソブチロニトリル0.1gをメタノ
ール10m1に溶解した重合開始剤溶液を加える。その
後直ちに、溶液を密閉容器に移し60℃に加熱し、ゲル
化及び重合反応を行う、その後穴のある蓋に代えて60
℃で10日間乾燥後、120℃で1日乾燥してクランク
や割れのない乾燥ゲルを得た。この乾燥ゲルを焼成炉中
1200℃で加熱してクラつりや発砲などのないシリカ
ガラスを得た。Furthermore, methanol IQ Q m 1 in this solution! [Add a solution in which 14.7 g of vinyl nitrate is dissolved and mix at room temperature until the mixture is sufficiently homogeneous. After thorough mixing, a polymerization initiator solution prepared by dissolving 0.1 g of azobisisobutyronitrile in 10 ml of methanol is added. Immediately thereafter, the solution was transferred to a sealed container and heated to 60°C to perform gelation and polymerization reactions.
After drying at 120° C. for 10 days, dry gel was dried at 120° C. for 1 day to obtain a dry gel without any cracks or cracks. This dried gel was heated at 1200° C. in a firing furnace to obtain silica glass free from crackling and foaming.
このシリカガラスには失透や気泡はなく品質の高いもの
である。又分析の結果、このシリカガラスは市販のシリ
カガラスとその特性が一致した。This silica glass has no devitrification or bubbles and is of high quality. Further, as a result of analysis, the properties of this silica glass matched those of commercially available silica glass.
実施例2
シリコンテトラメトキシド(St (OCRs) *)
141m1にメタノール160ml、0.01mol/
j!のアンモニア水72mJを加え、よく混合した。さ
らにこの溶解に60%のどロリドン水溶WL24.5
gを加え攪拌しながら1時間窒素ガスを通じる。充分混
合した後、ゾル溶液を密閉容器に移し、70℃に加熱し
ゲル−化及び重合反応を行う。その後穴のある蓋に代え
て70℃で7日間乾燥後、120℃で1日乾燥してクラ
ンクや割れのない乾燥ゲルを得た。この乾燥ゲルを焼成
炉中1200℃で加熱してクラっりや発砲などのないシ
リカガラスを得た。Example 2 Silicon tetramethoxide (St (OCRs) *)
160ml of methanol in 141ml, 0.01mol/
j! 72 mJ of aqueous ammonia was added and mixed well. In addition, 60% throat lolidon aqueous solution WL24.5 is added to this dissolution.
g and nitrogen gas was passed through the mixture for 1 hour while stirring. After thorough mixing, the sol solution is transferred to a closed container and heated to 70°C to perform gelation and polymerization reactions. Thereafter, the gel was dried at 70° C. for 7 days and then at 120° C. for 1 day in place of a lid with holes to obtain a dry gel without any cracks or cracks. This dried gel was heated at 1200° C. in a firing furnace to obtain silica glass free from crackling and foaming.
このシリカガラスには失透や気泡はなく品質の高いもの
である。又分析の結果、このシリカガラスは市販のシリ
カガラスとその特性が一致した。This silica glass has no devitrification or bubbles and is of high quality. Further, as a result of analysis, the properties of this silica glass matched those of commercially available silica glass.
(発明の効果)
本発明によれば、大型のシリカガラスをゾル−ゲル法に
よりクランクや割れを発生することな(、容易に製造が
可能となる。その大きさは基本的には制約がなく形状も
板状の物に限らず棒状、管状のものも製造可能となり従
来よりも安価に製造することができる。(Effects of the Invention) According to the present invention, it is possible to easily manufacture large silica glass by the sol-gel method without causing cracks or cracks.There is basically no restriction on the size. The shape is not limited to a plate-like shape, but also a rod-like or tubular shape, which can be manufactured at a lower cost than before.
又本発明によりシリカガラスは従来より安価に製造でき
る゛ため、従来から使用されてきたIC製造用フォトマ
スク基材等の分野はもちろんのこと、これまで高価格の
ため使用されていなかった分野での需要の拡大も可能と
なる。Furthermore, because the present invention allows silica glass to be produced at a lower cost than before, it can be used not only in fields such as photomask substrates for IC manufacturing, which have traditionally been used, but also in fields where it has not been used until now due to its high price. It will also be possible to expand demand for.
Claims (1)
る工程、ゾルをゲル化する工程、ゲルを乾燥する工程及
び焼成する工程とからなるゾル−ゲル法によるシリカガ
ラスの製造法において、ゾル溶液とする工程で有機物モ
ノマー及び/又はオリゴマーを添加し、次いでゲル化す
る工程及び/又は乾燥する工程で有機物モノマー及び/
又はオリゴマーを高分子化することを特徴とするケイ酸
塩ガラスの製造法。1. In a method for producing silica glass by the sol-gel method, which includes the steps of hydrolyzing silicon alkoxide to obtain a sol solution, gelling the sol, drying the gel, and firing the sol solution. Organic monomers and/or oligomers are added in the process, and then organic monomers and/or oligomers are added in the gelling process and/or drying process.
Or a method for producing silicate glass, characterized by polymerizing oligomers.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP33421787A JPH01176235A (en) | 1987-12-29 | 1987-12-29 | Production of silica glass |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP33421787A JPH01176235A (en) | 1987-12-29 | 1987-12-29 | Production of silica glass |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01176235A true JPH01176235A (en) | 1989-07-12 |
Family
ID=18274857
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP33421787A Pending JPH01176235A (en) | 1987-12-29 | 1987-12-29 | Production of silica glass |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01176235A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2767808A1 (en) * | 1997-08-29 | 1999-03-05 | Samsung Electronics Co Ltd | PROCESS FOR PRODUCING SILICA GLASS |
US6410631B1 (en) | 1999-01-29 | 2002-06-25 | Samsung Electronics Co., Ltd. | Composition for production of silica glass using sol-gel process |
WO2002085785A1 (en) * | 2001-04-17 | 2002-10-31 | Tokuyama Corporation | Method for producing inorganic porous material |
-
1987
- 1987-12-29 JP JP33421787A patent/JPH01176235A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2767808A1 (en) * | 1997-08-29 | 1999-03-05 | Samsung Electronics Co Ltd | PROCESS FOR PRODUCING SILICA GLASS |
US6410631B1 (en) | 1999-01-29 | 2002-06-25 | Samsung Electronics Co., Ltd. | Composition for production of silica glass using sol-gel process |
US6519976B2 (en) | 1999-01-29 | 2003-02-18 | Samsung Electronics Co., Ltd. | Method for production of silica glass using sol-gel process |
WO2002085785A1 (en) * | 2001-04-17 | 2002-10-31 | Tokuyama Corporation | Method for producing inorganic porous material |
US7045106B2 (en) | 2001-04-17 | 2006-05-16 | Tokuyama Corporation | Method for producing inorganic porous material |
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