JPH09120087A - Ec element - Google Patents
Ec elementInfo
- Publication number
- JPH09120087A JPH09120087A JP7299005A JP29900595A JPH09120087A JP H09120087 A JPH09120087 A JP H09120087A JP 7299005 A JP7299005 A JP 7299005A JP 29900595 A JP29900595 A JP 29900595A JP H09120087 A JPH09120087 A JP H09120087A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- electrode
- ito transparent
- electrode layer
- ito
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011521 glass Substances 0.000 claims abstract description 23
- 239000000758 substrate Substances 0.000 claims abstract description 20
- 239000008151 electrolyte solution Substances 0.000 claims description 18
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 14
- 239000010410 layer Substances 0.000 abstract description 73
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 10
- 239000003792 electrolyte Substances 0.000 abstract description 6
- 239000011241 protective layer Substances 0.000 abstract description 5
- 239000000377 silicon dioxide Substances 0.000 abstract description 5
- 238000004544 sputter deposition Methods 0.000 abstract description 5
- 238000003411 electrode reaction Methods 0.000 abstract description 4
- 125000006850 spacer group Chemical group 0.000 abstract description 4
- 229910052681 coesite Inorganic materials 0.000 abstract 4
- 229910052906 cristobalite Inorganic materials 0.000 abstract 4
- 235000012239 silicon dioxide Nutrition 0.000 abstract 4
- 229910052682 stishovite Inorganic materials 0.000 abstract 4
- 229910052905 tridymite Inorganic materials 0.000 abstract 4
- 238000000151 deposition Methods 0.000 abstract 3
- 239000012774 insulation material Substances 0.000 abstract 1
- 238000002834 transmittance Methods 0.000 description 13
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 8
- HSZCZNFXUDYRKD-UHFFFAOYSA-M lithium iodide Chemical compound [Li+].[I-] HSZCZNFXUDYRKD-UHFFFAOYSA-M 0.000 description 8
- 239000007788 liquid Substances 0.000 description 7
- 239000011800 void material Substances 0.000 description 5
- 239000003125 aqueous solvent Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- 239000011324 bead Substances 0.000 description 3
- 238000004040 coloring Methods 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 150000001450 anions Chemical class 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000003566 sealing material Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 229910000314 transition metal oxide Inorganic materials 0.000 description 2
- 229910013684 LiClO 4 Inorganic materials 0.000 description 1
- 229910019443 NaSi Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000004043 responsiveness Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 1
- HUAUNKAZQWMVFY-UHFFFAOYSA-M sodium;oxocalcium;hydroxide Chemical compound [OH-].[Na+].[Ca]=O HUAUNKAZQWMVFY-UHFFFAOYSA-M 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 150000003623 transition metal compounds Chemical class 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
Landscapes
- Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】この発明は、防眩ミラー、調
光窓等に利用されるＥＣ（Ｅｌｅｃｔｒｏｃｈｒｏｍｉ
ｃ）素子に関し、電解質に液体を用いた液体型ＥＣ素子
において、寿命を向上させつつ、消色時の光透過率を向
上させたものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an EC (Electrochromi) used for antiglare mirrors, dimming windows, and the like.
With regard to the element c), the liquid EC element using a liquid as the electrolyte has improved light transmittance at the time of erasing while improving the life.
【０００２】[0002]
【従来の技術】ＥＣ素子はその光透過率の可変制御性を
利用して、自動車の防眩ミラーや調光窓等に利用されて
いる。従来のＥＣ素子として、特開昭５８−３０７２９
号公報、特開昭６３−１０６７３０号公報、実開昭５８
−１２６４２４号のマイクロフィルムには、電解質に液
体を用いた液体型ＥＣ素子が開示されている。これらは
いずれも図２に示す基本構成を有している。すなわち、
ＥＣ素子１０は、透明ガラス基板１２にＩＴＯ透明電極
層１４およびＷＯ3 （酸化タングステン）等によるＥＣ
層１６を成膜して一方の電極部１８（ＥＣ電極部）を構
成している。また、透明ガラス基板２０にＩＴＯ透明電
極層２２を成膜して他方の電極部２４（対向電極部）を
構成している。そして、両電極部１８，２４を所定の空
隙２６を介して対向配置して、空隙２６内に電解液２８
を充填し、シール材３０で空隙２６の全周をシールして
構成されている。2. Description of the Related Art EC elements are used for antiglare mirrors, light control windows, etc. of automobiles by utilizing the variable controllability of their light transmittance. A conventional EC device is disclosed in Japanese Patent Laid-Open No. 58-30729.
Japanese Patent Laid-Open No. 63-106730, Japanese Utility Model Laid-Open No. 58
The microfilm of No. 126424 discloses a liquid EC element using a liquid as an electrolyte. Each of these has the basic configuration shown in FIG. That is,
The EC element 10 is an EC formed of an ITO transparent electrode layer 14 and WO 3 (tungsten oxide) on a transparent glass substrate 12.
The layer 16 is deposited to form one electrode portion 18 (EC electrode portion). Further, the ITO transparent electrode layer 22 is formed on the transparent glass substrate 20 to form the other electrode portion 24 (counter electrode portion). Then, the two electrode parts 18, 24 are arranged so as to face each other with a predetermined space 26 in between, and the electrolyte solution 28 is placed in the space 26.
And the entire circumference of the void 26 is sealed with a sealing material 30.
【０００３】このＥＣ素子１０は、ＩＴＯ透明電極層１
４，２２間に印加する電圧の極性および大きさによりＥ
Ｃ層１６の着色量が変化して光透過率が変化する。した
がって、この構成をそのまま用いれば調光窓や調光めが
ね等が構成され、透明ガラス基板２０（または透明ガラ
ス基板１２）の背面にアルミニウム等の反射層を成膜す
れば防眩ミラーが構成される。The EC element 10 is composed of an ITO transparent electrode layer 1
Depending on the polarity and magnitude of the voltage applied between 4 and 22, E
The amount of coloring of the C layer 16 changes and the light transmittance changes. Therefore, if this structure is used as it is, a light control window, light control glasses or the like is configured, and if a reflective layer such as aluminum is formed on the back surface of the transparent glass substrate 20 (or the transparent glass substrate 12), an antiglare mirror is configured. It
【０００４】以上の構成の液体型ＥＣ素子１０において
は、電解液２８とＩＴＯ透明電極層２２とが直接接触し
ているため、電解液２８とＩＴＯ透明電極層２２との電
極反応によりＩＴＯ透明電極層２２中のＳｎ（すず）成
分が溶出し、ＥＣ層１６に付着して部分的な色むらが発
生する問題があり、このため寿命が短かった。そこで、
このような問題を解決するために、ＩＴＯ透明電極層２
２の表面に保護膜をコーティングして、ＩＴＯ透明電極
層２２と電解液２８とが直接接触しないようにする構造
が提案されていた。例えば、前出の特開昭５８−３０７
２９号公報には、ＩＴＯ透明電極層２２の表面に遷移金
属酸化物薄膜としてＣｕ2 ＯやＮｂ2 Ｏ3 をオーバーコ
ートすることが記載されている。また、実開昭５８−１
２６４２４号のマイクロフィルムには、ＩＴＯ透明電極
層２２の表面にカーボンや遷移金属化合物を点状、線状
に形成することが記載されている。In the liquid type EC device 10 having the above-mentioned structure, since the electrolytic solution 28 and the ITO transparent electrode layer 22 are in direct contact with each other, an electrode reaction between the electrolytic solution 28 and the ITO transparent electrode layer 22 causes an ITO transparent electrode. There is a problem that the Sn (tin) component in the layer 22 elutes and adheres to the EC layer 16 to cause partial color unevenness, resulting in a short life. Therefore,
In order to solve such a problem, the ITO transparent electrode layer 2
There has been proposed a structure in which the surface of No. 2 is coated with a protective film so that the ITO transparent electrode layer 22 and the electrolytic solution 28 do not come into direct contact with each other. For example, JP-A-58-307 mentioned above.
Japanese Patent Publication No. 29 discloses that the surface of the ITO transparent electrode layer 22 is overcoated with Cu 2 O or Nb 2 O 3 as a transition metal oxide thin film. In addition, actual development Sho-1
The microfilm of No. 26424 describes that carbon or a transition metal compound is formed in a dot shape or a linear shape on the surface of the ITO transparent electrode layer 22.
【０００５】[0005]
【発明が解決しようとする課題】前述のＩＴＯ透明電極
層２２の表面に遷移金属酸化物やカーボンをコーティン
グするものでは、消色時に無色透明の外観が得られず、
光透過率が低くなる欠点があった。In the case where the surface of the ITO transparent electrode layer 22 described above is coated with a transition metal oxide or carbon, a colorless and transparent appearance cannot be obtained at the time of erasing,
There was a drawback that the light transmittance was low.
【０００６】この発明は、前記従来の技術における問題
点を解決して、ＩＴＯ電極層と電解液との反応を防止し
て寿命を向上させるとともに、消色時の光透過率の低下
を防止した液体型ＥＣ素子を提供しようとするものであ
る。The present invention solves the above-mentioned problems in the prior art, prevents the reaction between the ITO electrode layer and the electrolytic solution to improve the life, and prevents the reduction of the light transmittance at the time of erasing. It is intended to provide a liquid type EC device.
【０００７】[0007]
【課題を解決するための手段】この発明は、ＩＴＯ電極
層の表面にＳｉＯ2 層を成膜して、電解液とＩＴＯ電極
層とを非接触にしたものである。これによれば、電解液
とＩＴＯ透明電極層とが直接接触しないので、電解液と
ＩＴＯ透明電極層との電極反応を防止して寿命を長く保
つことができる。また、ＳｉＯ2 層はほぼ無色透明なの
で、光透過率の低下を防止することができる。尚、Ｓｉ
Ｏ2 層の膜厚は１００オグストローム以上９００オング
ストローム以下が望ましい。According to the present invention, a SiO 2 layer is formed on the surface of an ITO electrode layer so that the electrolytic solution and the ITO electrode layer are not in contact with each other. According to this, since the electrolytic solution and the ITO transparent electrode layer do not come into direct contact with each other, it is possible to prevent an electrode reaction between the electrolytic solution and the ITO transparent electrode layer and to maintain a long life. Further, since the SiO 2 layer is almost colorless and transparent, it is possible to prevent a decrease in light transmittance. In addition, Si
The thickness of the O 2 layer is preferably 100 angstroms or more and 900 angstroms or less.
【０００８】[0008]
【発明の実施の形態】この発明の実施の形態を図１に示
す。これは防眩ミラーとして構成したものである。ＥＣ
素子３２は、無色透明のガラス基板３４の表面にＩＴＯ
透明電極層３６を蒸着、スパッタリング等で成膜し、さ
らにその表面にＷＯ3 によるＥＣ層３８を蒸着、スパッ
タリング等で成膜して一方の電極部４０（ＥＣ電極部）
を構成している。また、無色透明のガラス基板４２の表
面にＩＴＯ透明電極層４４を蒸着、スパッタリング等で
成膜し、さらにその表面にＳｉＯ2 層４６を均一に成膜
して、他方の電極部４８（対向電極部）を構成してい
る。ＳｉＯ2 層４６をＩＴＯ透明電極層４４の表面に均
一の厚さにオーバーコートする方法としては、ゾル‐ゲ
ル法等を用いた湿式法あるいは蒸着、スパッタリング等
による乾式法のどちらでもよい。また、ＳｉＯ2 層の膜
厚は、１００オングストローム以上９００オングストロ
ーム以下が望ましい。すなわち、１００オングストロー
ムより薄いとＩＴＯ透明電極層４４の表面を均一に覆う
のが難しくなる。また、９００オングストロームより厚
いとＳｉＯ2 本来の絶縁体としての性質が強くなり、透
過率レンジ（消色透過率と着色透過率の幅すなわち透過
率の変化幅）が狭くなるとともに応答性が悪くなる。こ
れに対し、１００〜９００オングストロームの範囲で
は、ＳｉＯ2 は電子導電性を持つと考えられ、透過率レ
ンジが広く得られ、しかも応答性が良好となる。FIG. 1 shows an embodiment of the present invention. This is configured as an antiglare mirror. EC
The element 32 has ITO on the surface of a colorless and transparent glass substrate 34.
The transparent electrode layer 36 is formed by vapor deposition, sputtering or the like, and the EC layer 38 of WO 3 is further formed on the surface by vapor deposition, sputtering or the like to form one electrode portion 40 (EC electrode portion).
Is composed. Further, an ITO transparent electrode layer 44 is formed on the surface of the colorless and transparent glass substrate 42 by vapor deposition, sputtering, etc., and a SiO 2 layer 46 is evenly formed on the surface of the ITO transparent electrode layer 44. Section). As a method for overcoating the surface of the ITO transparent electrode layer 44 with the SiO 2 layer 46 to a uniform thickness, either a wet method using a sol-gel method or a dry method such as vapor deposition or sputtering may be used. Further, the film thickness of the SiO 2 layer is preferably 100 angstroms or more and 900 angstroms or less. That is, if the thickness is less than 100 Å, it becomes difficult to uniformly cover the surface of the ITO transparent electrode layer 44. On the other hand, if the thickness is more than 900 angstroms, the property of SiO 2 as an original insulator becomes strong, the transmittance range (width of decoloring transmittance and coloring transmittance, that is, change width of transmittance) becomes narrow, and the response becomes poor. . On the other hand, in the range of 100 to 900 angstroms, SiO 2 is considered to have electronic conductivity, a wide transmittance range can be obtained, and responsiveness becomes good.
【０００９】ガラス基板４２の背面にはアルミニウム薄
膜等の反射層６２が成膜され、反射層６２の背面は保護
層６４で覆われている。一方の電極部４０にはクリップ
電極５８が装着され、他方の電極部４８および反射層６
２、保護層６４の積層体にはクリップ電極６０が装着さ
れている。A reflective layer 62 such as an aluminum thin film is formed on the back surface of the glass substrate 42, and the back surface of the reflective layer 62 is covered with a protective layer 64. A clip electrode 58 is attached to one electrode portion 40, and the other electrode portion 48 and the reflection layer 6 are provided.
2. The clip electrode 60 is attached to the laminated body of the protective layer 64.
【００１０】一方の電極部４０と、他方の電極部４８お
よび反射層６２、保護層６４の積層体とは、ＥＣ層３８
とＳｉＯ2 層４６を対向させて、それらの間に絶縁体で
構成されたスペーサ５０を挟み込んで所定の空隙５２を
形成した状態に配置される。スペーサ５０は通常ガラス
ビースが用いられ、組成はソーダライム（ＮａＳｉ
Ｏ2 ）である。スペーサ５０としては、電解液５４に侵
されない材料であればよく、シリカビースでもよい。Ｌ
ＣＤ（液晶表示装置）で使用されるプラスチックビース
でもよいが、非水溶媒または非水溶媒中の陽イオン（カ
チオン）、陰イオン（アニオン）に溶出しない材料が好
ましい。The electrode portion 40 on one side and the laminated body of the electrode portion 48, the reflection layer 62 and the protective layer 64 on the other side are the EC layer 38.
And the SiO 2 layer 46 are opposed to each other, and a spacer 50 made of an insulator is sandwiched between them to form a predetermined space 52. As the spacer 50, glass beads are usually used, and the composition is soda lime (NaSi).
O 2 ). The spacer 50 may be any material that is not attacked by the electrolytic solution 54, and may be silica beads. L
A plastic bead used in a CD (liquid crystal display device) may be used, but a material that does not elute into a non-aqueous solvent or a cation (cation) or an anion (anion) in the non-aqueous solvent is preferable.
【００１１】空隙５２内には電解液５４が充填され、シ
ール材５６で空隙５２の全周をシールすることにより電
解液５４が空隙５２内に封入される。電解液５４は、例
えば、非水溶媒であるγ‐ブチロラクトンにＬｉＩ（よ
う化リチウム）を０．１モル／リットルの比率で溶解し
たものが用いられる。An electrolytic solution 54 is filled in the void 52, and the electrolytic solution 54 is sealed in the void 52 by sealing the entire circumference of the void 52 with a sealing material 56. As the electrolytic solution 54, for example, a solution obtained by dissolving LiI (lithium iodide) in a non-aqueous solvent γ-butyrolactone at a ratio of 0.1 mol / liter is used.
【００１２】以上の構成のＥＣ素子３２（防眩ミラー）
によれば、クリップ電極５８，６０間に印加する電圧を
制御することにより、下式で示されるＥＣ現象が得られ
る。The EC element 32 (anti-glare mirror) having the above structure
According to the method, by controlling the voltage applied between the clip electrodes 58 and 60, the EC phenomenon represented by the following equation can be obtained.
【００１３】[0013]
【化１】 これにより、ＥＣ層３８の着色量が変化して、矢印Ａ方
向から見てミラー反射率が可変制御される。そして、Ｉ
ＴＯ透明電極層４４の表面にはＳｉＯ2 層４６が形成さ
れているので、ＩＴＯ透明電極層４４のＳｎが電解液５
４中に溶出するのが防止され（ＳｉＯ2 層４６も溶出し
ない。）、長期間使用しても部分的な色むらが生じるの
が防止されて寿命を長く保つことができる。また、Ｓｉ
Ｏ2 層４６は無色透明なので、消色時に無色透明の外観
を保つことができる。したがって、ガラス基板３４から
ガラス基板４２まで高い透過率を得ることができ、ミラ
ー反射率が消色反射率７０％以上、着色反射率６％以下
の防眩ミラーを実現することができる。Embedded image As a result, the coloring amount of the EC layer 38 changes, and the mirror reflectance is variably controlled when viewed from the direction of arrow A. And I
Since the SiO 2 layer 46 is formed on the surface of the TO transparent electrode layer 44, Sn of the ITO transparent electrode layer 44 changes to the electrolytic solution 5
4 is prevented (the SiO 2 layer 46 does not elute), partial color unevenness is prevented even after long-term use, and the life can be kept long. In addition, Si
Since the O 2 layer 46 is colorless and transparent, the colorless and transparent appearance can be maintained when the color is erased. Therefore, a high transmittance can be obtained from the glass substrate 34 to the glass substrate 42, and an anti-glare mirror having a mirror reflectance of 70% or more and a color reflectance of 6% or less can be realized.
【００１４】尚、以上の実施の形態では、電解液として
γ‐ブチロラクトンにＬｉＩを溶解したものを用いた
が、これに限らず、ＩＴＯ透明電解層４４を溶解させて
部分的な色むらを生じさせるおそれのあるその他の電解
液（例えば、非水溶媒をγ‐ブチロラクトンに代えてプ
ロピレンカーボネート、スルホラン等にしたもの。ま
た、ＬｉＩに代えてＬｉＣｌＯ4 ，ＮａＣｌＯ4 ，Ｌｉ
ＢＦ4 等にしたもの）を用いた液体型ＥＣ素子にもこの
発明を適用することができる。また、ＥＣ層３８がＷＯ
3 以外の場合にもこの発明を適用することができる。In the above embodiment, γ-butyrolactone in which LiI is dissolved is used as the electrolytic solution, but not limited to this, the ITO transparent electrolytic layer 44 is dissolved to cause partial color unevenness. Other electrolytes that may cause (for example, γ-butyrolactone instead of γ-butyrolactone as the non-aqueous solvent. LiClO 4 , NaClO 4 , Li in place of LiI.
The present invention can also be applied to a liquid type EC element using a BF 4 or the like). Further, the EC layer 38 is WO
The present invention can be applied to cases other than 3 .
【００１５】また、この発明は一方の電極部のガラス基
板と電極層間、電極層とＥＣ層間、他方の電極部のガラ
ス基板とＩＴＯ透明電極層間にその他の層が介在するこ
とを妨げるものではない。また、矢印Ａ側に代えて矢印
Ｂ側から見るように構成する場合は、反射膜６２を、図
１に示された位置に配置するのに代えて、ガラス基板３
４の背面（ＩＴＯ透明電極層３６が形成されている面と
反対側の面）に配置する。Further, the present invention does not prevent the interposition of other layers between the glass substrate and the electrode layer of one electrode portion, between the electrode layer and the EC layer, and between the glass substrate of the other electrode portion and the ITO transparent electrode layer. . Further, in the case of being configured to be viewed from the arrow B side instead of the arrow A side, instead of disposing the reflection film 62 at the position shown in FIG.
4 (the surface opposite to the surface on which the ITO transparent electrode layer 36 is formed).
【００１６】また、以上は防眩ミラーとして構成する場
合について説明したが、調光窓や調光めがね等の透光体
として構成する場合は、図１において反射層６２および
保護層６４を取り除いた構成とすればよい。In the above description, the case of forming the antiglare mirror has been described. However, in the case of forming a light transmitting body such as a light control window or light control glasses, the reflective layer 62 and the protective layer 64 are removed in FIG. It may be configured.
【００１７】[0017]
【発明の効果】以上説明したように、この発明によれ
ば、ＩＴＯ透明電極層と電解液との間にＳｉＯ2 層が介
在しているので、ＩＴＯ透明電極層と電解液との電極反
応が防止され、寿命を長く保つことができる。またＳｉ
Ｏ2 層はほぼ無色透明なので、消色時の透過率を高く保
つことができる。As described above, according to the present invention, since the SiO 2 layer is interposed between the ITO transparent electrode layer and the electrolytic solution, the electrode reaction between the ITO transparent electrode layer and the electrolytic solution is prevented. It is prevented and the life can be kept long. Also Si
Since the O 2 layer is almost colorless and transparent, the transmittance at the time of erasing can be kept high.
【図１】 この発明の一実施例を示す断面図である。FIG. 1 is a sectional view showing an embodiment of the present invention.
【図２】 従来装置を示す断面図である。FIG. 2 is a cross-sectional view showing a conventional device.
３２ ＥＣ素子 ３４ ガラス基板（第１のガラス基板） ３６ ＩＴＯ透明電極層（一方の電極部の電極層） ３８ ＥＣ層 ４０ 一方の電極部 ４２ ガラス基板（第２のガラス基板） ４４ ＩＴＯ透明電極層 ４６ ＳｉＯ2 層 ４８ 他方の電極部 ５２ 空隙 ５４ 電解液32 EC element 34 Glass substrate (first glass substrate) 36 ITO transparent electrode layer (electrode layer of one electrode portion) 38 EC layer 40 One electrode portion 42 Glass substrate (second glass substrate) 44 ITO transparent electrode layer 46 SiO 2 layer 48 Other electrode part 52 Void 54 Electrolyte
Claims (2)
にＥＣ層を成膜して一方の電極部を構成し、第２のガラ
ス基板上にＩＴＯ透明電極層を成膜して他方の電極部を
構成し、前記ＥＣ層と前記ＩＴＯ電極層とを空隙を介し
て対向させて、当該空隙内に電解液を封入してなるＥＣ
素子において、 前記第２のガラス基板上のＩＴＯ電極層の表面にＳｉＯ
2 層を成膜して、前記電解液と前記ＩＴＯ電極層とを非
接触にしてなるＥＣ素子。1. An electrode layer and an EC layer formed on the first glass substrate to form one electrode portion, and an ITO transparent electrode layer formed on the second glass substrate and the other. An EC in which the electrode portion of the EC layer and the ITO electrode layer are opposed to each other through a gap, and an electrolytic solution is enclosed in the gap.
In the device, SiO 2 is formed on the surface of the ITO electrode layer on the second glass substrate.
An EC device in which two layers are formed and the electrolyte solution and the ITO electrode layer are not in contact with each other.
ローム以上９００オングストローム以下に形成してなる
請求項１記載のＥＣ素子。2. The EC device according to claim 1, wherein the SiO 2 layer is formed to have a film thickness of 100 angstroms or more and 900 angstroms or less.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7299005A JPH09120087A (en) | 1995-10-24 | 1995-10-24 | Ec element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7299005A JPH09120087A (en) | 1995-10-24 | 1995-10-24 | Ec element |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH09120087A true JPH09120087A (en) | 1997-05-06 |
Family
ID=17867010
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7299005A Pending JPH09120087A (en) | 1995-10-24 | 1995-10-24 | Ec element |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH09120087A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005309307A (en) * | 2004-04-26 | 2005-11-04 | Tokai Rika Co Ltd | Electrochromic mirror |
| US7940450B2 (en) | 2008-10-08 | 2011-05-10 | Samsung Electronics Co., Ltd. | Electro-optic display apparatus |
-
1995
- 1995-10-24 JP JP7299005A patent/JPH09120087A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005309307A (en) * | 2004-04-26 | 2005-11-04 | Tokai Rika Co Ltd | Electrochromic mirror |
| US7940450B2 (en) | 2008-10-08 | 2011-05-10 | Samsung Electronics Co., Ltd. | Electro-optic display apparatus |
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