JPH0652354B2 - Dimming mirror - Google Patents
Dimming mirrorInfo
- Publication number
- JPH0652354B2 JPH0652354B2 JP59101858A JP10185884A JPH0652354B2 JP H0652354 B2 JPH0652354 B2 JP H0652354B2 JP 59101858 A JP59101858 A JP 59101858A JP 10185884 A JP10185884 A JP 10185884A JP H0652354 B2 JPH0652354 B2 JP H0652354B2
- Authority
- JP
- Japan
- Prior art keywords
- reflective
- dimming mirror
- film
- electrode
- electrolyte
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/15—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on an electrochromic effect
- G02F1/153—Constructional details
- G02F1/1533—Constructional details structural features not otherwise provided for
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Elements Other Than Lenses (AREA)
- Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
Description
【発明の詳細な説明】 本発明は、エレクトロクロミック調光体（以下「ＥＣ調
光体という」と略記する）に反射層を設けた調光ミラー
に関する。The present invention relates to a dimming mirror in which a reflective layer is provided on an electrochromic dimmer (hereinafter abbreviated as “EC dimmer”).
従来、上述のタイプの調光ミラーとしては、例えば特公
昭57-7418号公報に開示されているように、透過型ＥＣ
調光体の背面に反射層を形成したものが用いられるが、
反射層が調光体の背面に外付けされている場合には、反
射層が傷つき易く、また、酸化，浸蝕され易く、コスト
も高くなり、さらに、透明電極と反射層との二重の反射
により像が重なり合うという欠点を有していた。このた
め、例えば特開昭57-208530号公報に開示されているよ
うに、透明電極の一方と一体的に反射膜を形成し透明基
板の中に封入するようにしたものも用いられているが、
この場合には、反射膜が、電解質に接するため、浸蝕さ
れ易いという欠点があった。Conventionally, as a dimming mirror of the above-mentioned type, as disclosed in Japanese Patent Publication No. 57-7418, a transmission type EC
A dimmer with a reflective layer formed on the back is used.
When the reflective layer is externally attached to the back surface of the dimmer, the reflective layer is easily scratched, and is easily oxidized and eroded, resulting in high cost. Furthermore, double reflection between the transparent electrode and the reflective layer is required. Had the drawback of overlapping images. Therefore, as disclosed in, for example, Japanese Patent Laid-Open No. 57-208530, there is also used one in which a reflective film is integrally formed with one of the transparent electrodes and is enclosed in a transparent substrate. ,
In this case, since the reflective film is in contact with the electrolyte, it has a drawback that it is easily corroded.
本発明は、このような従来の調光ミラーの欠点を解消す
るためになされたものであり、反射層が浸蝕され難く、
耐久性が良く、２重像の問題の生じない調光ミラーを提
供することを目的とする。The present invention has been made in order to eliminate the drawbacks of such a conventional light control mirror, the reflective layer is difficult to be eroded,
It is an object of the present invention to provide a photochromic mirror having good durability and free from the problem of double images.
即ち、本発明の調光ミラーは、透明電極を形成した透明
な表基板と、反射性電極を形成した裏基板とを電解質を
挟持し透明電極と反射性電極とを内側にして対向させ、
反射性電極の上にエレクトロクロミック物質層を電解質
に接して形成して成る調光ミラーにおいて、前記反射性
電極として第IV族Ｂの元素の窒化物を用い、前記反射性
電極の膜厚が２００Åないし５０００Åであり、かつ、
電解質がレドックス剤を含んでいることを特徴とする。That is, the dimming mirror of the present invention, a transparent front substrate having a transparent electrode formed, and a back substrate having a reflective electrode sandwiched with an electrolyte, the transparent electrode and the reflective electrode are opposed to each other,
In a dimming mirror formed by forming an electrochromic material layer on a reflective electrode in contact with an electrolyte, a nitride of a group IV element B is used as the reflective electrode, and the film thickness of the reflective electrode is 200Å. Or 5000 Å, and
It is characterized in that the electrolyte contains a redox agent.
以下、本発明になる調光ミラーを図面を参照しつつ説明
する。第１図は、本発明の代表的調光ミラーの断面図で
ある。The dimming mirror according to the present invention will be described below with reference to the drawings. FIG. 1 is a sectional view of a typical dimming mirror of the present invention.
第１図において、透明な表基板１の上には透明電極２が
形成され、裏基板３の上には反射層と電極との双方の作
用を果す反射性電極４と、ＥＣ物質層５とが形成され
る。表基板１と裏基板３とは電解質６を挟持し透明電極
２と反射性電極４とを内側にして、必要に応じてシール
材７により電解質６をシールし、相対向して構成され調
光ミラー８を形成する。In FIG. 1, a transparent electrode 2 is formed on a transparent front substrate 1, a reflective electrode 4 serving as both a reflective layer and an electrode is provided on a back substrate 3, and an EC material layer 5 is provided. Is formed. An electrolyte 6 is sandwiched between the front substrate 1 and the back substrate 3, the transparent electrode 2 and the reflective electrode 4 are placed inside, and the electrolyte 6 is sealed by a sealing material 7 as necessary, and the two substrates are opposed to each other. The mirror 8 is formed.
表基板１の素材としてはガラスやプラスチック等の透明
な物質を用いる。該表基板１上に形成する透明電極２と
しては酸化インジウム・酸化錫(ITO)や酸化錫（SnO2）
等を用いる。この透明電極２は、例えばITOを材質とし
て用いた場合には、蒸着法やスパッター法により表基板
１上に面抵抗値が20Ω以下程度に形成することが望まし
い。As the material of the front substrate 1, a transparent substance such as glass or plastic is used. The transparent electrode 2 formed on the front substrate 1 includes indium oxide / tin oxide (ITO) and tin oxide (SnO 2 ).
Etc. are used. For example, when ITO is used as a material, the transparent electrode 2 is preferably formed on the front substrate 1 by a vapor deposition method or a sputtering method so that the surface resistance value is about 20Ω or less.
裏基板３の素材としては、ガラス，プラスチック、セラ
ミック又はアルミニウム等の金属などを用い、反射性電
極４の素材としては、チタン(Ti)，ジルコニウム(Zr)，
ハフニウム(Hf)の第IV族Ｂの元素の窒化物である窒化チ
タン(TiN)，窒化ジルコニウム(ZrN)，窒化ハフニウム(H
fN)のうちいずれか一種を用いる。この反射性電極４
は、例えば窒素ガス雰囲気下で上記第IV族Ｂの元素をイ
オンプレーティング又はスパッタリングして、前記裏基
板３上に膜厚200Åないしは5000Åに形成すればよい。
なお、膜厚は、反射性能，抵抗特性，強度等の面より、
500Åないしは1000Åに形成するのが一層望ましい。イ
オンプレーティングで被膜させる場合には、例えば３〜
５×10-4Torrのアルゴンと窒素の混合ガス中で上記第IV
族Ｂの元素を200Ｗの出力で高周波励起して裏基板３上
に被膜させる。また、スパッタリング法による場合には
例えば５〜７×10-4Torrのアルゴンと窒素の混合ガス中
で第IV族Ｂの元素を100Ｗの出力で高周波加熱して裏基
板３上に被膜させる。As the material of the back substrate 3, glass, plastic, ceramic or metal such as aluminum is used, and as the material of the reflective electrode 4, titanium (Ti), zirconium (Zr),
Hafnium (Hf) is a nitride of Group IV element B such as titanium nitride (TiN), zirconium nitride (ZrN), hafnium nitride (Hf)
Use one of fN). This reflective electrode 4
Can be formed on the back substrate 3 to a film thickness of 200 Å or 5000 Å by ion-plating or sputtering the group IV element B in a nitrogen gas atmosphere.
In addition, the film thickness, from the aspects of reflection performance, resistance characteristics, strength, etc.
It is more desirable to form it at 500Å or 1000Å. When coating with ion plating, for example, 3 to
The above IV in a mixed gas of 5 × 10 -4 Torr of argon and nitrogen.
The element of group B is excited at a high frequency with an output of 200 W to form a film on the back substrate 3. Further, in the case of using the sputtering method, the group IV element B is subjected to high-frequency heating at a power of 100 W in a mixed gas of argon and nitrogen of 5 to 7 × 10 −4 Torr to form a film on the back substrate 3.
ＥＣ物質としては、酸化タングステン（WO3）又は酸化
モリブデン（MoO3）等の電圧の印加により可逆的に可視
光域で着消色する遷移金属化合物を用い、反射性電極４
上に蒸着しＥＣ物質層５を形成する。As the EC substance, a transition metal compound, such as tungsten oxide (WO 3 ) or molybdenum oxide (MoO 3 ), which is reversibly colored and erased in the visible light range by applying a voltage, is used.
An EC material layer 5 is formed by vapor deposition.
電解質６としては、公知の溶媒に沃化リチウム（Ｌｉ
Ｉ）等の応答性、耐久性向上のためのレドックス剤を加
え着色助剤としての陽イオン（Ｈ＋，Li+等）を安定に
存在させる溶液型のものに必要に応じて、増粘剤や樹脂
等を加えゲル化したゲル状のもの等が用いられる。電解
質６の厚さとしては、十分な着消色反応を得るために、
溶液型のものでは100μｍ以上の厚み、ゲル状のもので
は50μｍ以上の厚みがあることが望ましい。As the electrolyte 6, lithium iodide (Li
I) and other redox agents for improving responsiveness and durability, and solution type ones in which cations (H + , Li + etc.) as coloring aids are stably present, and if necessary, thickeners A gel-like material obtained by adding a resin or the like to a gel and the like is used. The thickness of the electrolyte 6 is, in order to obtain a sufficient color fading reaction,
It is desirable that the solution type has a thickness of 100 μm or more, and the gel type has a thickness of 50 μm or more.
シール材７としては、エポキシ，シリコン，ポリアミド
等が必要に応じて用いられる。As the sealing material 7, epoxy, silicon, polyamide or the like is used as necessary.
なお、反射性電極４上に膜厚500Åないし2000ÅのITO膜
を塗布すれば、反射性電極４の酸化が完全に防止され、
耐久性は更に向上する。If an ITO film with a film thickness of 500Å or 2000Å is applied on the reflective electrode 4, oxidation of the reflective electrode 4 is completely prevented,
Durability is further improved.
更に、表基板１には透明電極２の他に、該透明基板２上
に正負のいずれの電圧印加によっても着色しないＥＣ物
質層や、裏基板３側のＥＣ物質層５が着色すると同時に
着色する（即ち、ＥＣ物質層５に印加される電圧と反対
の極性の電圧の印加で着消色する）ＥＣ物質層を形成し
ても良い。Further, in addition to the transparent electrode 2, the front substrate 1 is colored at the same time as the EC substance layer which is not colored by the application of any positive or negative voltage on the transparent substrate 2 or the EC substance layer 5 on the back substrate 3 side is colored. It is also possible to form an EC material layer (that is, the color of the material is changed by applying a voltage having a polarity opposite to that of the voltage applied to the EC material layer 5).
次に具体的実施例につき更に説明する。Next, specific examples will be further described.
実施例１ 10cm角のガラス製裏基板上にイオンプレーティング法に
よりTiN膜を膜厚1000Åにコートし反射性電極を形成す
る。更に、該反射性電極上に膜厚5000ÅのWO3膜を蒸着
しＥＣ物質層を形成する。Example 1 A TiN film having a thickness of 1000 Å was coated on a 10 cm square glass back substrate by an ion plating method to form a reflective electrode. Further, a WO 3 film having a thickness of 5000 Å is vapor-deposited on the reflective electrode to form an EC substance layer.
一方、10cm角のガラス製の表基板上にITO膜を膜厚1500
Åに蒸着し透明電極を形成する。On the other hand, an ITO film with a film thickness of 1500
Form a transparent electrode by vapor deposition on Å.
該ITO膜と前記WO3膜との間隔が200μｍとなるように前
記表基板と裏基板とを対向させセルを形成させ、該セル
中に、γ−ブチロラクトン（γ−ＢＬ）に0.5Mol／の
LiIを溶解した電解液を注入しシール材で封止し調光ミ
ラーを作成した。A cell was formed by facing the front substrate and the back substrate so that the distance between the ITO film and the WO 3 film was 200 μm, and 0.5 mol / g of γ-butyrolactone (γ-BL) was added to the cell.
A dimming mirror was prepared by injecting an electrolyte solution in which LiI was dissolved and sealing it with a sealing material.
この調光ミラーに±１Ｖの電圧を印加することにより、
第２図ａ（破線）に示すような反射率変化特性を有する
耐久性の良い調光ミラーが得られた。By applying a voltage of ± 1V to this dimming mirror,
A highly durable photochromic mirror having reflectance change characteristics as shown in FIG. 2a (broken line) was obtained.
実施例２ 10cm角のガラス製の裏基板上にスパッタリング法により
ZrN膜を膜厚1000Åにコートし反射性電極を形成する。
更に、該反射性電極上に膜厚5000ÅのWO3膜を蒸着しＥ
Ｃ物質層を形成する。Example 2 A 10 cm square glass back substrate was formed by sputtering.
A ZrN film is coated to a thickness of 1000Å to form a reflective electrode.
Furthermore, a WO 3 film having a film thickness of 5000 Å is vapor-deposited on the reflective electrode, and E
A C material layer is formed.
一方、10cm角のガラス製の表基板上にITO膜を膜厚1500
Åに蒸着し透明電極を形成する。On the other hand, an ITO film with a film thickness of 1500
Form a transparent electrode by vapor deposition on Å.
電解質としてγ−ＢＬに0.7Mol／のLiIを溶解しポリ
ビニルブチラール（PVB）重量パーセンティジで50％と
なるように混合したゲル状物質を用い、該電解質層の厚
さが50μｍとなるように、前記ＥＣ物質層と透明電極と
の間に挿入し圧着固定する。As the electrolyte, 0.7 mol / LiI was dissolved in γ-BL, and a gel-like substance was mixed so that polyvinyl butyral (PVB) weight percentage was 50%, and the thickness of the electrolyte layer was 50 μm. It is inserted between the EC substance layer and the transparent electrode and fixed by pressure.
このようにして作成した調光ミラーでは第２図ｂ（実
線）に示すような反射率変化特性が得られた。The dimming mirror thus prepared has the reflectance change characteristic as shown in FIG. 2b (solid line).
実施例３ 実施例２と同様に裏基板上にZrN膜を形成し、該ZrN膜上
にITO膜を膜厚1000Åに蒸着した上で該ITO膜上に膜厚50
00ÅのWO3膜を蒸着しＥＣ物質層を形成した。Example 3 As in Example 2, a ZrN film was formed on the back substrate, an ITO film was deposited on the ZrN film to a film thickness of 1000Å, and a film thickness of 50 was formed on the ITO film.
A WO 3 film of 00Å was deposited to form an EC material layer.
以下実施例２と同様にして調光ミラーを作成した。A dimming mirror was prepared in the same manner as in Example 2 below.
この調光ミラーは、反射率変化特性は実施例２と同一の
特性（第２図ｂ）が得られ、耐久性としては着消色のサ
イクルテストを105回以上行なっても応答性の低下が認
められない優れた性能が得られた。This dimming mirror has the same reflectance change characteristic as that of the second embodiment (FIG. 2b), and the durability is deteriorated in response even after 10 5 or more cycles of coloration / decoloration cycle test. Excellent performance was obtained in which no
なお、本発明の調光ミラーは以上の構成に限られるもの
ではなく、ＥＣ調光体の裏基板の一部のみに反射性電極
を形成し、その部分のみを調光ミラーとしても良いし、
該調光ミラー部分で何らかの形状又はセグメントを形成
し、商標、サービスマーク、イニシャル、カレンダー表
示等として利用しても良い。The dimming mirror of the present invention is not limited to the above configuration, and the reflective electrode may be formed only on a part of the back substrate of the EC dimmer, and only that part may be the dimming mirror.
The dimming mirror portion may be used as a trademark, service mark, initials, calendar display, etc. by forming some shape or segment.
以上述べたように、本発明になる調光ミラーにおいて
は、電極と反射層とを共用し、該反射性電極として耐蝕
性の高い第IV族Ｂの元素の窒化物を用い、かつ、電解質
と反射性電極の間にＥＣ物質層が介在するために、反射
性電極が電解質により浸蝕され難く、耐久性に優れ、ま
た２重像等も生じることがない。As described above, in the dimming mirror according to the present invention, the electrode and the reflective layer are shared, the nitride of the group IV B element having high corrosion resistance is used as the reflective electrode, and Since the EC material layer is interposed between the reflective electrodes, the reflective electrodes are less likely to be corroded by the electrolyte, have excellent durability, and do not have a double image.
第１図は本発明の代表的調光ミラーの断面図、第２図は
本発明の実施例の反射率変化特性を示すグラフである。 １；表基板、２；透明電極、 ３；裏基板、４；反射性電極、 ５；ＥＣ物質層、６；電解質、 ７；シール材FIG. 1 is a sectional view of a typical dimming mirror of the present invention, and FIG. 2 is a graph showing reflectance change characteristics of an embodiment of the present invention. 1; Front substrate, 2; Transparent electrode, 3; Back substrate, 4; Reflective electrode, 5; EC substance layer, 6; Electrolyte, 7; Sealing material
───────────────────────────────────────────────────── フロントページの続き (72)発明者 水橋 衛 神奈川県横浜市旭区白根町1219―47 (56)参考文献 特開 昭58−68020（ＪＰ，Ａ) 特開 昭58−142319（ＪＰ，Ａ) 特開 昭58−30729（ＪＰ，Ａ) 実開 昭58−21120（ＪＰ，Ｕ) ─────────────────────────────────────────────────── ─── Continuation of front page (72) Inventor Mamoru Mizuhashi 1219-47 Shirane-cho, Asahi-ku, Yokohama-shi, Kanagawa (56) Reference JP-A-58-68020 (JP, A) JP-A-58-142319 (JP, A) JP 58-30729 (JP, A) Actual development S58-21120 (JP, U)
Claims (1)
性電極を形成した裏基板とを電解質を挟持し透明電極と
反射性電極とを内側にして対向させ、反射性電極の上に
エレクトロクロミック物質層を電解質に接して形成して
成る調光ミラーにおいて、前記反射性電極として第IV族
Ｂの元素の窒化物を用い、前記反射性電極の膜厚が２０
０Åないし５０００Åであり、かつ、電解質がレドック
ス剤を含んでいることを特徴とする調光ミラー。1. A transparent front substrate on which a transparent electrode is formed and a back substrate on which a reflective electrode is formed are sandwiched with an electrolyte so that the transparent electrode and the reflective electrode face each other and face each other. In a dimming mirror having an electrochromic material layer formed in contact with an electrolyte, a nitride of a group IV element B is used as the reflective electrode, and the reflective electrode has a thickness of 20.
A dimming mirror, characterized in that it is 0Å to 5000Å and the electrolyte contains a redox agent.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59101858A JPH0652354B2 (en) | 1984-05-22 | 1984-05-22 | Dimming mirror |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59101858A JPH0652354B2 (en) | 1984-05-22 | 1984-05-22 | Dimming mirror |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60247226A JPS60247226A (en) | 1985-12-06 |
| JPH0652354B2 true JPH0652354B2 (en) | 1994-07-06 |
Family
ID=14311713
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59101858A Expired - Lifetime JPH0652354B2 (en) | 1984-05-22 | 1984-05-22 | Dimming mirror |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0652354B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2020518025A (en) * | 2017-04-27 | 2020-06-18 | エルジー・ケム・リミテッド | Electrochromic element |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0511538Y2 (en) * | 1985-10-28 | 1993-03-23 | ||
| US4902108A (en) † | 1986-03-31 | 1990-02-20 | Gentex Corporation | Single-compartment, self-erasing, solution-phase electrochromic devices, solutions for use therein, and uses thereof |
| JP4098736B2 (en) * | 2003-06-18 | 2008-06-11 | 株式会社東海理化電機製作所 | Electrochromic mirror |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3138705A1 (en) * | 1981-09-29 | 1983-04-07 | Siemens AG, 1000 Berlin und 8000 München | "ELECTROCHROMIC DISPLAY" |
-
1984
- 1984-05-22 JP JP59101858A patent/JPH0652354B2/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2020518025A (en) * | 2017-04-27 | 2020-06-18 | エルジー・ケム・リミテッド | Electrochromic element |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60247226A (en) | 1985-12-06 |
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