JPH085899B2 - Method for producing alkoxysilane - Google Patents
Method for producing alkoxysilaneInfo
- Publication number
- JPH085899B2 JPH085899B2 JP63039794A JP3979488A JPH085899B2 JP H085899 B2 JPH085899 B2 JP H085899B2 JP 63039794 A JP63039794 A JP 63039794A JP 3979488 A JP3979488 A JP 3979488A JP H085899 B2 JPH085899 B2 JP H085899B2
- Authority
- JP
- Japan
- Prior art keywords
- reaction
- alcohol
- catalyst
- silicon
- copper
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- 239000003054 catalyst Substances 0.000 claims description 17
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 11
- 229910052802 copper Inorganic materials 0.000 claims description 11
- 239000010949 copper Substances 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 11
- 229910052710 silicon Inorganic materials 0.000 claims description 9
- 239000010703 silicon Substances 0.000 claims description 9
- 229910052751 metal Inorganic materials 0.000 claims description 7
- 239000002184 metal Substances 0.000 claims description 7
- 239000002904 solvent Substances 0.000 claims description 7
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 4
- DNIAPMSPPWPWGF-GSVOUGTGSA-N (R)-(-)-Propylene glycol Chemical compound C[C@@H](O)CO DNIAPMSPPWPWGF-GSVOUGTGSA-N 0.000 claims description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 2
- 229910052736 halogen Inorganic materials 0.000 claims description 2
- 150000002367 halogens Chemical class 0.000 claims description 2
- 229910017604 nitric acid Inorganic materials 0.000 claims description 2
- 230000000737 periodic effect Effects 0.000 claims description 2
- 150000003839 salts Chemical class 0.000 claims description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims 1
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 24
- 238000006243 chemical reaction Methods 0.000 description 17
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 14
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 12
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 10
- 235000019441 ethanol Nutrition 0.000 description 10
- 239000011780 sodium chloride Substances 0.000 description 6
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 5
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 5
- 229940045803 cuprous chloride Drugs 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 229910019142 PO4 Inorganic materials 0.000 description 4
- -1 and among them Chemical compound 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000007791 liquid phase Substances 0.000 description 4
- 235000021317 phosphate Nutrition 0.000 description 4
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 4
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 4
- 150000002823 nitrates Chemical class 0.000 description 3
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 3
- 239000005046 Chlorosilane Substances 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 2
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 2
- OPQARKPSCNTWTJ-UHFFFAOYSA-L copper(ii) acetate Chemical compound [Cu+2].CC([O-])=O.CC([O-])=O OPQARKPSCNTWTJ-UHFFFAOYSA-L 0.000 description 2
- QTMDXZNDVAMKGV-UHFFFAOYSA-L copper(ii) bromide Chemical compound [Cu+2].[Br-].[Br-] QTMDXZNDVAMKGV-UHFFFAOYSA-L 0.000 description 2
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- FGDZQCVHDSGLHJ-UHFFFAOYSA-M rubidium chloride Chemical compound [Cl-].[Rb+] FGDZQCVHDSGLHJ-UHFFFAOYSA-M 0.000 description 2
- JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical compound [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 description 2
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 2
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 2
- YJTKZCDBKVTVBY-UHFFFAOYSA-N 1,3-Diphenylbenzene Chemical group C1=CC=CC=C1C1=CC=CC(C=2C=CC=CC=2)=C1 YJTKZCDBKVTVBY-UHFFFAOYSA-N 0.000 description 1
- 239000005749 Copper compound Substances 0.000 description 1
- 229910021589 Copper(I) bromide Inorganic materials 0.000 description 1
- 229910021595 Copper(I) iodide Inorganic materials 0.000 description 1
- 229910021590 Copper(II) bromide Inorganic materials 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000003426 co-catalyst Substances 0.000 description 1
- 229940108928 copper Drugs 0.000 description 1
- 150000001880 copper compounds Chemical class 0.000 description 1
- RFKZUAOAYVHBOY-UHFFFAOYSA-M copper(1+);acetate Chemical compound [Cu+].CC([O-])=O RFKZUAOAYVHBOY-UHFFFAOYSA-M 0.000 description 1
- BERDEBHAJNAUOM-UHFFFAOYSA-N copper(I) oxide Inorganic materials [Cu]O[Cu] BERDEBHAJNAUOM-UHFFFAOYSA-N 0.000 description 1
- NKNDPYCGAZPOFS-UHFFFAOYSA-M copper(i) bromide Chemical compound Br[Cu] NKNDPYCGAZPOFS-UHFFFAOYSA-M 0.000 description 1
- LSXDOTMGLUJQCM-UHFFFAOYSA-M copper(i) iodide Chemical compound I[Cu] LSXDOTMGLUJQCM-UHFFFAOYSA-M 0.000 description 1
- ZKXWKVVCCTZOLD-UHFFFAOYSA-N copper;4-hydroxypent-3-en-2-one Chemical compound [Cu].CC(O)=CC(C)=O.CC(O)=CC(C)=O ZKXWKVVCCTZOLD-UHFFFAOYSA-N 0.000 description 1
- HFDWIMBEIXDNQS-UHFFFAOYSA-L copper;diformate Chemical compound [Cu+2].[O-]C=O.[O-]C=O HFDWIMBEIXDNQS-UHFFFAOYSA-L 0.000 description 1
- GBRBMTNGQBKBQE-UHFFFAOYSA-L copper;diiodide Chemical compound I[Cu]I GBRBMTNGQBKBQE-UHFFFAOYSA-L 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 229940076286 cupric acetate Drugs 0.000 description 1
- 229960003280 cupric chloride Drugs 0.000 description 1
- KRFJLUBVMFXRPN-UHFFFAOYSA-N cuprous oxide Chemical compound [O-2].[Cu+].[Cu+] KRFJLUBVMFXRPN-UHFFFAOYSA-N 0.000 description 1
- 229940112669 cuprous oxide Drugs 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- WJKVFIFBAASZJX-UHFFFAOYSA-N dimethyl(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](C)(C)C1=CC=CC=C1 WJKVFIFBAASZJX-UHFFFAOYSA-N 0.000 description 1
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Natural products C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 1
- KWKXNDCHNDYVRT-UHFFFAOYSA-N dodecylbenzene Chemical compound CCCCCCCCCCCCC1=CC=CC=C1 KWKXNDCHNDYVRT-UHFFFAOYSA-N 0.000 description 1
- 238000010574 gas phase reaction Methods 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 125000005575 polycyclic aromatic hydrocarbon group Chemical group 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/52—Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts
Landscapes
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Description
【発明の詳細な説明】 (1)産業上の利用分野 本発明は、トリアルコキシシランの製造法に関し、更
に詳しくはけい素と脂肪族アルコールとを溶媒中で反応
させトリアルコキシシランを高収率で製造する方法に関
するものである。DETAILED DESCRIPTION OF THE INVENTION (1) Field of Industrial Application The present invention relates to a method for producing a trialkoxysilane, and more specifically, a reaction of silicon and an aliphatic alcohol in a solvent to give a high yield of trialkoxysilane. The present invention relates to a manufacturing method.
(3)従来の技術 アルコキシシランの製造方法については、1)クロル
シランとアルコールとから合成する方法 SiH4-xClx+xROH→ SiH4-x(OR)x+xHCl(x=1,2,3,4) 2)けい素とアルコールを銅触媒の存在下に反応させる
方法 Si+ROH→SiH3(OR)+ SiH2(OR)2+SiH(OR)3+ Si(OR)4+H2 が知られているが、この1)の方法では副生する塩酸が
腐蝕性であるため高価な耐蝕材料を必要とし更に原料の
クロルシランは容易に加水分解し塩酸を遊離するので取
扱いも難しい。2)の方法では気相及び液相で反応する
事が可能であるが、気相系では生成する各種アルコキシ
シランの中でSi(OR)4の生成が優先されるために有用と
されるSiH(OR)3の収率が低くなるという不利がある。一
方液相系では、SiH(OR)3の選択率は向上するが、けい素
の反応率が低く、反応速度も遅いという欠点がある。(3) Prior art Regarding the production method of alkoxysilane, 1) a method of synthesizing from chlorosilane and alcohol SiH 4-x Cl x + x ROH → SiH 4-x (OR) x + xHCl (x = 1,2,3, 4) 2) Method of reacting silicon and alcohol in the presence of copper catalyst Si + ROH → SiH 3 (OR) + SiH 2 (OR) 2 + SiH (OR) 3 + Si (OR) 4 + H 2 is known. However, in the method 1), the by-product hydrochloric acid is corrosive, so that an expensive corrosion-resistant material is required, and chlorosilane as a raw material is easily hydrolyzed to liberate hydrochloric acid, which makes handling difficult. The method 2) allows reaction in the gas phase and liquid phase, but in the gas phase, SiH is considered to be useful because Si (OR) 4 is preferentially produced among the various alkoxysilanes produced. It has the disadvantage that the yield of (OR) 3 is low. On the other hand, in the liquid phase system, the selectivity of SiH (OR) 3 is improved, but there is a drawback that the reaction rate of silicon is low and the reaction rate is slow.
(3)発明が解決しようとする課題 液相系でのアルコキシシランの製造は、そのほとんど
が銅、特に塩化第一銅を触媒として使用しているが、触
媒単独では活性及びトリアルコキシシランの選択率が低
いという問題点がある。活性及びトリアルコキシシラン
の選択率を上げるべく助触媒も検討されているがその例
は少なくごく限られたものである。助触媒の例としては
気相反応で亜鉛、アルミニウム、鉄の金属を使用する方
法(特公昭37-17967号公報)が知られているが、この場
合0価の金属が気相反応という限定された条件で開示さ
れているにすぎない。一方液相反応で場合により触媒と
して亜族元素の金属又は金属化合物を使用する方法(特
公昭44-25768号公報)が示されているが、原則的に反応
は触媒を添加する必要の無い系であり、更に触媒の単独
使用が開示されているだけであり、触媒と助触媒の組み
合わせは開示されていない。(3) Problems to be Solved by the Invention Almost all of the production of alkoxysilanes in a liquid phase system uses copper, especially cuprous chloride as a catalyst, but the catalyst alone is active and the trialkoxysilane is selected. There is a problem that the rate is low. Co-catalysts have also been investigated in order to increase the activity and the selectivity of trialkoxysilane, but the examples are few and very limited. As an example of the cocatalyst, there is known a method of using a metal of zinc, aluminum or iron in a gas phase reaction (Japanese Patent Publication No. Sho 37-17967). It is only disclosed under the conditions described below. On the other hand, a method of using a metal or a metal compound of a subgroup element as a catalyst in a liquid phase reaction in some cases (Japanese Patent Publication No. 44-25768) is disclosed, but in principle, the reaction does not require addition of a catalyst And only the use of the catalyst alone is disclosed, not the combination of catalyst and cocatalyst.
この発明は、けい素とアルコールとを溶媒中、銅触媒
の存在下に反応させて、トリアルコキシシランを製造す
る方法において、触媒単独では活性及びトリアルコキシ
シランの選択率が低いという問題点を解決するのが目的
である。This invention solves the problem that the catalyst alone has low activity and low selectivity to trialkoxysilane in a method for producing trialkoxysilane by reacting silicon and alcohol in a solvent in the presence of a copper catalyst. The purpose is to do.
(4)課題を解決するための手段 本発明者らは、トリアルコキシシランを高活性、高選
択率で得る方法について種々検討した結果、けい素とア
ルコールとを溶媒中、銅触媒の存在下で反応させる方法
において銅触媒と、周期律表第1族、第2族、及び第3
族から選ばれる金属のハロゲン、硫酸、硝酸及びリン酸
塩の1種又はそれ以上を存在させる事により、触媒単独
での反応に比べ、著しく活性及びトリアルコキシシラン
の選択率を向上させることを見出し本発明を完成させ
た。本発明の方法における始発材料としてのけい素は純
度が80%以上で平均粒径が1,000μ以下好ましくは500μ
以下の平均粒度に粉砕したものであれば特別の制約も無
く一般市販品で良い。(4) Means for Solving the Problems As a result of various studies on methods for obtaining trialkoxysilane with high activity and high selectivity, the present inventors have found that silicon and alcohol in a solvent in the presence of a copper catalyst. In the method of reacting, a copper catalyst, a periodic table, a first group, a second group, and a third group are used.
It was found that the presence of one or more of halogens, sulfuric acid, nitric acid, and phosphates of metals selected from the group greatly improves the activity and the selectivity of trialkoxysilane as compared with the reaction using the catalyst alone. The present invention has been completed. Silicon as a starting material in the method of the present invention has a purity of 80% or more and an average particle size of 1,000μ or less, preferably 500μ.
There is no particular limitation as long as it is crushed to the following average particle size, and a commercially available product may be used.
また脂肪族アルコールはメチルアルコール、エチルア
ルコール、プロピルアルコール、ブチルアルコールなど
のように炭素数1〜5のアルキル基を含むものが好まし
く、中でもメチルアルコール、エチルアルコールが好適
である。The aliphatic alcohol preferably contains an alkyl group having 1 to 5 carbon atoms, such as methyl alcohol, ethyl alcohol, propyl alcohol and butyl alcohol, and among them, methyl alcohol and ethyl alcohol are preferable.
この反応を行なわせるために使用される銅触媒は公知
のものでよくこれには金属銅、塩化第1銅、塩化第2
銅、臭化第1銅、臭化第2銅、ヨウ化第1銅、ヨウ化第
2銅、ギ酸銅、銅アセチルアセトナート、酢酸第1銅、
酢酸第2銅、酸化第1銅などの銅化合物が例示される。
銅触媒は、けい素1モルに対し0.001〜0.5倍モルの範囲
で使用される。The copper catalyst used to carry out this reaction may be of the known type and may include metallic copper, cuprous chloride, cupric chloride.
Copper, cuprous bromide, cupric bromide, cuprous iodide, cupric iodide, copper formate, copper acetylacetonate, cuprous acetate,
Examples include copper compounds such as cupric acetate and cuprous oxide.
The copper catalyst is used in the range of 0.001 to 0.5 times mol per mol of silicon.
一方、溶媒として、重要なことは、熱安定性が高い事
と、細分されたけい素が溶媒中に分散されていることで
あり、かかる目的で、多環状芳香族炭化水素、アリール
メタン化合物、水素化トリフェニル、環状又は鎖状ポリ
エーテル、ドデシルベンゼン、ジフェニルエーテル有機
けい素化合物などが適宜使用され、その使用量は、けい
素金属1gに対して1ml〜10lの範囲である。On the other hand, as a solvent, what is important is that it has high thermal stability and that finely divided silicon is dispersed in the solvent. For this purpose, polycyclic aromatic hydrocarbons, aryl methane compounds, Hydrogenated triphenyl, cyclic or chain polyether, dodecylbenzene, diphenyl ether organosilicon compound and the like are used as appropriate, and the amount used is in the range of 1 ml to 10 l per 1 g of silicon metal.
銅触媒と共存させる一種またはそれ以上の金属のハロ
ゲン化物、硫酸塩、硝酸塩、リン酸塩としてはハロゲン
化物としてLiCl,NaCl,KCl,RbCl,NaBr,Nal,CaCl2,AlCl3
等が、硫酸塩として、K2SO4,Na2SO4,CaSO4等が、硝酸塩
として、Al(NO3)3等がリン酸塩としてNaH2PO4,KH2PO4等
が例示されるが、これに限定されるものではない。これ
ら金属のハロゲン化物、硫酸塩、硝酸塩、リン酸塩は、
あらかじめ反応系内に存在させておいても良いし、又フ
ィードアルコールに同伴させるなどの方法で添加され
る。更にその使用量は触媒1molに対して0.0001〜0.2mol
好ましくは0.001〜0.03molの範囲から適宜決定される。LiCl, NaCl, KCl, RbCl, NaBr, Nal, CaCl 2 , AlCl 3 as one or more metal halides, sulfates, nitrates, and phosphates that coexist with the copper catalyst.
Etc., sulfates such as K 2 SO 4 , Na 2 SO 4 , CaSO 4 etc., nitrates such as Al (NO 3 ) 3 etc. as phosphates NaH 2 PO 4 , KH 2 PO 4 etc. However, the present invention is not limited to this. The halides, sulfates, nitrates and phosphates of these metals are
It may be allowed to be present in the reaction system in advance, or it is added by a method of being accompanied by feed alcohol. Furthermore, the amount used is 0.0001 to 0.2 mol per 1 mol of catalyst.
Preferably, it is appropriately determined from the range of 0.001 to 0.03 mol.
反応は100〜300℃の温度範囲で減圧又は常圧又は加圧
の条件下で実施される。The reaction is carried out in the temperature range of 100 to 300 ° C. under reduced pressure, normal pressure or increased pressure.
次に本発明を実施例により具体的に説明するが本発明
は以下の実施例に限定されるものではない。Next, the present invention will be specifically described with reference to examples, but the present invention is not limited to the following examples.
(5)実施例 実施例 1 冷却器を有する留出管、アルコール導入管、撹拌機及
び温度計を有する100ml反応器にけい素金属粉末(純度9
8%)20.0g、塩化第1銅1.0g及び溶媒としてジメチルジ
フェニルシラン40mlを仕込み、続いて反応器を加温して
内液温が230℃に達した時、15ml/hrの速度でメチルアル
コールを導入し、同時に塩化ナトリウムをメタノールに
同伴させ、反応温度228〜232℃で反応させた。5hr反応
させた所、69.30gの留出物が得られ、分析結果からこれ
はメタノール28.56g、トリメトキシシラン37.00g(53.4
wt%)、テトラメトキシシラン3.74g(5.4wt%)を含む
ものであった。トリメトキシシランの選択率92.5%、生
成速度は0.18g/ml・hrであった。尚、5時間後の塩化ナ
トリウムの総添加量は、塩化第一銅1molに対して0.015m
olであった。(5) Examples Example 1 A 100 ml reactor equipped with a distilling pipe having a condenser, an alcohol introducing pipe, a stirrer and a thermometer was used to obtain silicon metal powder (purity: 9
8%) 20.0 g, cuprous chloride 1.0 g, and 40 ml of dimethyldiphenylsilane as a solvent were charged, and then when the internal liquid temperature reached 230 ° C by heating the reactor, methyl alcohol was added at a rate of 15 ml / hr. Was introduced at the same time, sodium chloride was simultaneously entrained in methanol, and the reaction was carried out at a reaction temperature of 228 to 232 ° C. After reacting for 5 hours, 69.30 g of distillate was obtained. From the analysis results, this was 28.56 g of methanol and 37.00 g of trimethoxysilane (53.4 g).
wt%) and 3.74 g (5.4 wt%) of tetramethoxysilane. The selectivity of trimethoxysilane was 92.5%, and the production rate was 0.18 g / ml · hr. The total amount of sodium chloride added after 5 hours was 0.015m per 1mol of cuprous chloride.
was ol.
比較例 1 実施例1と全く同様の装置を用い、塩化ナトリウムの
添加を除き同一条件下で5hr反応させた所62.7gの留出物
が得られた。分析結果からこれはメタノール42.90g、ト
リメトキシシラン13.41g(21.36wt%)、テトラメトキ
シシラン6.48g(10.32wt%)を含むものでありトリメト
キシシランの選択率は66.9%、生成速度は0.07g/ml・hr
であった。Comparative Example 1 62.7 g of a distillate was obtained when the same apparatus as in Example 1 was used and the reaction was carried out for 5 hours under the same conditions except for the addition of sodium chloride. Based on the analysis results, this contained 42.90 g of methanol, 13.41 g (21.36 wt%) of trimethoxysilane, and 6.48 g (10.32 wt%) of tetramethoxysilane. The selectivity of trimethoxysilane was 66.9% and the production rate was 0.07 g. / ml ・ hr
Met.
実施例 2 実施例1のメチルアルコールをエチルアルコールに変
更した以外は実施例1と全く同様の反応を実施した。5h
r後の反応結果は、トリエトキシシランの選択率は94.5
%、生成速度は0.18g/ml・hrであった。Example 2 Except for changing the methyl alcohol of Example 1 to ethyl alcohol, the same reaction as in Example 1 was carried out. 5h
The reaction result after r shows that the selectivity of triethoxysilane is 94.5.
%, The production rate was 0.18 g / ml · hr.
比較例 2 実施例1のメチルアルコールをエチルアルコールに変
更し、塩化ナトリウムの添加を省略した以外は実施例1
と同様に5hr反応させた所、トリエトキシシランの選択
率は63.2%、生成速度は0.07g/ml・hrであった。Comparative Example 2 Example 1 except that the methyl alcohol of Example 1 was changed to ethyl alcohol and the addition of sodium chloride was omitted.
After reacting for 5 hours in the same manner as above, the selectivity of triethoxysilane was 63.2%, and the production rate was 0.07 g / ml · hr.
実施例 3〜13 実施例1の塩化ナトリウムを第1表に示す各種の金属
塩に変更した以外は装置反応条件とも実施例1と全く同
様にして実施した。助触媒の使用量は実施例1と同様塩
化第1銅1molに対して0.015molとし、反応5hr経過後の
結果を第1表に示す。Examples 3 to 13 The same reaction conditions as in Example 1 were carried out except that the sodium chloride of Example 1 was changed to various metal salts shown in Table 1. The amount of the cocatalyst used was 0.015 mol per 1 mol of cuprous chloride as in Example 1, and the results after 5 hours of reaction are shown in Table 1.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 C07B 61/00 300 ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Internal reference number FI technical display location C07B 61/00 300
Claims (1)
応させる方法において、銅触媒とハロゲン、硫酸、硝酸
及びリン酸から選ばれる一種又は二種以上の周期律表第
1族、第2族及び第3族から選ばれる金属の金属塩の存
在下で反応させることを特徴とするトリアルコキシシラ
ンの製造法。1. A method of reacting silicon with an aliphatic alcohol in a solvent, wherein a copper catalyst and one or more selected from halogen, sulfuric acid, nitric acid and phosphoric acid are selected from the groups 1 and 2 of the periodic table. A method for producing a trialkoxysilane, which comprises reacting in the presence of a metal salt of a metal selected from Group 3 and Group 3.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63039794A JPH085899B2 (en) | 1988-02-23 | 1988-02-23 | Method for producing alkoxysilane |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63039794A JPH085899B2 (en) | 1988-02-23 | 1988-02-23 | Method for producing alkoxysilane |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH01213287A JPH01213287A (en) | 1989-08-28 |
JPH085899B2 true JPH085899B2 (en) | 1996-01-24 |
Family
ID=12562862
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63039794A Expired - Lifetime JPH085899B2 (en) | 1988-02-23 | 1988-02-23 | Method for producing alkoxysilane |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH085899B2 (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2848908B2 (en) * | 1990-03-23 | 1999-01-20 | 多摩化学工業株式会社 | Production method of alkoxysilanes |
FR2665446B1 (en) * | 1990-07-31 | 1992-11-27 | Rhone Poulenc Chimie | PROCESS AND CATALYST COMPRISING A LANTHANIDE COMPOUND AS A PROMOTING ADDITIVE FOR THE DIRECT SYNTHESIS OF DIMETHYLDICHLOROSILANE. |
US5391797A (en) * | 1993-04-02 | 1995-02-21 | Kanegafuchi Chemical Industry Co., Ltd. | Process for preparing alkoxysilane |
US7652164B2 (en) * | 2005-09-13 | 2010-01-26 | Momentive Performance Materials Inc. | Process for the direct synthesis of trialkoxysilane |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
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JPS5745758B2 (en) * | 1973-04-21 | 1982-09-29 |
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1988
- 1988-02-23 JP JP63039794A patent/JPH085899B2/en not_active Expired - Lifetime
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JPH01213287A (en) | 1989-08-28 |
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