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JPH08246196A - Insoluble electrode and manufacturing method thereof - Google Patents

Insoluble electrode and manufacturing method thereof

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Publication number
JPH08246196A
JPH08246196A JP7846195A JP7846195A JPH08246196A JP H08246196 A JPH08246196 A JP H08246196A JP 7846195 A JP7846195 A JP 7846195A JP 7846195 A JP7846195 A JP 7846195A JP H08246196 A JPH08246196 A JP H08246196A
Authority
JP
Japan
Prior art keywords
electrode
layer
base material
conductive
valve metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP7846195A
Other languages
Japanese (ja)
Inventor
Yasushi Kurisu
泰 栗栖
Tatsuji Aso
辰二 阿蘇
Shingo Katayama
真吾 片山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Corp
Original Assignee
Nippon Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Steel Corp filed Critical Nippon Steel Corp
Priority to JP7846195A priority Critical patent/JPH08246196A/en
Publication of JPH08246196A publication Critical patent/JPH08246196A/en
Withdrawn legal-status Critical Current

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Abstract

(57)【要約】 【目的】 本発明は、100A/dm2 以上の高電流密
度で電解を行っても耐食性に優れ、長時間の使用に耐え
る不溶性電極及びその製造方法を提供する。 【構成】 電極母材を導電性金属で構成し、電極最表層
をIrO2 を主成分とする導電層とした不溶性電極にお
いて、前記電極母材と電極最表層の間に、表面が多孔質
絶縁性酸化物層で覆われ、かつ電極母材に対して平行な
層状構造を持つバルブ金属の多孔質被膜からなり、その
空孔に導電性材料で充填した中間層を設ける。 【効果】 電極母材の腐食、絶縁性被膜の形成を防止で
き、高電流密度下での耐用性に優れている。
(57) [Summary] [Object] The present invention provides an insoluble electrode having excellent corrosion resistance even when electrolysis is performed at a high current density of 100 A / dm 2 or more, and capable of withstanding long-term use, and a method for producing the same. [Constitution] In an insoluble electrode in which the electrode base material is made of a conductive metal and the outermost surface layer of the electrode is a conductive layer containing IrO 2 as a main component, a porous insulating surface is provided between the electrode base material and the outermost surface layer of the electrode. A porous coating of valve metal covered with a conductive oxide layer and having a layered structure parallel to the electrode base material, the pores of which are provided with an intermediate layer filled with a conductive material. [Effect] Corrosion of the electrode base material and formation of the insulating coating can be prevented, and the durability is excellent under high current density.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明は、例えば金属材の電気
メッキや金属の電気精錬等に用いる不溶性電極及びその
製造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an insoluble electrode used for electroplating a metal material or electrorefining a metal, and a method for producing the same.

【0002】[0002]

【従来の技術】一般に金属材の電気メッキに際しては、
電気メッキ浴中にて不溶性電極を使用し、陰極たる被メ
ッキ金属材の表面にZn,Sn,Ni,Crなどの金属
を電気メッキすることが行われている。また金属の電気
精錬に際しても、精錬浴中にて不溶性電極を使用し、M
n、Zn等の金属を電気精錬することが行われている。
2. Description of the Related Art Generally, when electroplating a metal material,
Insoluble electrodes are used in an electroplating bath, and metals such as Zn, Sn, Ni and Cr are electroplated on the surface of a metal material to be plated which is a cathode. Also, when electrorefining metals, use an insoluble electrode in the refining bath
Electrorefining of metals such as n and Zn is performed.

【0003】このとき不溶性電極として最も一般的に使
用されているものに、Pb系合金製不溶性電極がある。
この不溶性電極は、電気メッキ浴中や電気精錬浴中、特
に硫酸溶液中で、通電処理時にその表面にPbO2が生
成する。このPbO2は、不溶性電極としての機能は発
揮するが、生成したPbO2 とPb金属との付着力が弱
く、電気メッキ浴の硫酸溶液中に混入してメッキ不良、
あるいは電気精錬浴中に混入して不純物としてPbO2
の含まれた精錬金属を生じる。
The most commonly used insoluble electrode at this time is a Pb-based alloy insoluble electrode.
PbO 2 is produced on the surface of the insoluble electrode in an electroplating bath or an electrorefining bath, particularly in a sulfuric acid solution, during electric current treatment. This PbO 2 functions as an insoluble electrode, but the adhesion between the PbO 2 and Pb metal produced is weak, and it mixes in the sulfuric acid solution of the electroplating bath to cause plating failure.
Alternatively, PbO 2 was mixed as an impurity in the electric refining bath.
Produces refining metal containing.

【0004】その対策として、電気メッキ浴中や電気精
錬浴中、特に硫酸溶液中で最も電気化学的に安定である
白金族酸化物のIrO2 を、導電性金属から成る電極母
材上に被膜化した不溶性電極が特公昭48−3954号
公報に示されている。
As a countermeasure, a platinum group oxide, IrO 2 , which is the most electrochemically stable in an electroplating bath or an electrorefining bath, especially in a sulfuric acid solution, is coated on an electrode base material made of a conductive metal. The converted insoluble electrode is disclosed in Japanese Patent Publication No. 48-3954.

【0005】さらに、電極母材金属の酸化を抑制し、あ
るいは電極母材金属へのIrO2 の密着性を向上させる
ために、中間層として主成分がTa金属である被膜を形
成し、この上にIrO2 を主成分とする層を形成した不
溶性電極を使用する方法が特開平6−146047号公
報に示されている。
Further, in order to suppress the oxidation of the electrode base metal or to improve the adhesion of IrO 2 to the electrode base metal, a film whose main component is Ta metal is formed as an intermediate layer, Japanese Unexamined Patent Publication No. 6-146047 discloses a method of using an insoluble electrode having a layer containing IrO 2 as a main component.

【0006】図3にその電極構造を示す。1は電極母
材、2はTa−SiO2 層、3はIrO2を主成分とす
る層である。Ta−SiO2層2は、PVD法により、
IrO2が主成分である層3は、Ir化合物の溶液を電
極母材金属上に塗布し、それが酸化物となる温度で焼成
することを繰り返す、いわゆる塗布焼付法により作製す
る。
FIG. 3 shows the electrode structure. Reference numeral 1 is an electrode base material, 2 is a Ta-SiO 2 layer, and 3 is a layer containing IrO 2 as a main component. The Ta-SiO 2 layer 2 is formed by the PVD method.
The layer 3 containing IrO 2 as a main component is prepared by a so-called coating baking method in which a solution of an Ir compound is applied on the electrode base metal and firing is performed at a temperature at which it becomes an oxide.

【0007】[0007]

【発明が解決しようとする課題】特開平6−14604
7号公報に提示されているような塗布焼付法によりIr
2を主成分とする層を形成した不溶性電極は、硫酸溶
液中で200A/dm2の通電酸化試験を行うと、10
00〜1400時間で急激な電圧上昇が起こり、電極が
使用不可能となる。
[Patent Document 1] Japanese Patent Application Laid-Open No. 6-14604
Ir by the coating and baking method as presented in Japanese Patent Publication No.
The insoluble electrode on which the layer containing O 2 as a main component was formed was 10 A when subjected to a current oxidation test of 200 A / dm 2 in a sulfuric acid solution.
A sharp voltage rise occurs at 00 to 1400 hours, and the electrode becomes unusable.

【0008】この電極の酸化メカニズムを図4により説
明する。IrO2 を主成分とする層3はIr化合物の溶
液を塗布して熱処理することにより作製されるため、溶
液成分の揮発により生成する気孔と、電極母材1とIr
2 を主成分とする層3との熱膨張差によって生成する
亀甲状クラックとが被膜中に存在している。
The oxidation mechanism of this electrode will be described with reference to FIG. Since the layer 3 containing IrO 2 as a main component is prepared by applying a solution of an Ir compound and heat-treating it, pores generated by volatilization of the solution component, the electrode base material 1 and Ir.
There is a hexagonal crack generated in the coating due to the difference in thermal expansion from the layer 3 containing O 2 as a main component.

【0009】このため、被膜の空孔率は10〜30%と
大きく、気孔及びクラック4が原因となって電極使用時
に電極母材1との直接通電が生じ、電極母材1の表面に
絶縁性酸化物被膜5が形成されるとともに、更に電極母
材1とTa−SiO2 層2との界面方向に電極母材1の
酸化が進み、電圧上昇を引き起こして電極としての機能
を失ってしまう。
Therefore, the porosity of the coating is as large as 10 to 30%, and direct current is applied to the electrode base material 1 when the electrode is used due to pores and cracks 4, and the surface of the electrode base material 1 is insulated. Of the conductive oxide film 5, the electrode base material 1 is further oxidized in the direction of the interface between the electrode base material 1 and the Ta-SiO 2 layer 2, causing a voltage increase and losing the function as an electrode. .

【0010】この対策としては、塗布焼付被膜中の気孔
及びクラック4により電極母材1が露出しないようにす
ること、並びに電極母材1とTa−SiO2 層2との界
面方向への酸化を抑制することが必要である。本発明
は、100A/dm2 以上の高電流密度で電解を行って
も耐食性に優れ、長時間の使用に耐える不溶性電極及び
その製造方法を提供するものである。
As measures against this, it is necessary to prevent the electrode base material 1 from being exposed due to pores and cracks 4 in the coating and baking coating, and to oxidize the electrode base material 1 and the Ta-SiO 2 layer 2 in the direction of the interface. It is necessary to suppress it. The present invention provides an insoluble electrode having excellent corrosion resistance even when electrolysis is performed at a high current density of 100 A / dm 2 or more, and capable of withstanding long-term use, and a method for producing the same.

【0011】[0011]

【課題を解決するための手段】本発明は、電極母材を導
電性金属で構成し、電極最表層をIrO2 を主成分とす
る導電層とした不溶性電極において、前記電極母材と電
極最表層の間に、表面が多孔質絶縁性酸化物層で覆わ
れ、かつ電極母材に対して平行な層状構造を持つバルブ
金属の多孔質被膜からなり、その空孔を導電性材料で充
填した中間層を設けた不溶性電極及びその製造方法に関
するものである。
The present invention relates to an insoluble electrode in which the electrode base material is made of a conductive metal and the outermost surface layer of the electrode is a conductive layer containing IrO 2 as a main component. Between the surface layers, the surface was covered with a porous insulating oxide layer and consisted of a valve metal porous film having a layered structure parallel to the electrode base material, and the pores were filled with a conductive material. The present invention relates to an insoluble electrode provided with an intermediate layer and a method for manufacturing the same.

【0012】すなわち、本発明の第1は、電極母材を導
電性金属で構成し、電極最表層をIrO2 を主成分とす
る導電層とした不溶性電極において、前記電極母材と電
極最表層の間に、電極最表層側表面及び空孔表面が多孔
質絶縁性酸化物層で覆われ、かつ電極母材に対して平行
な層状構造を持つバルブ金属の多孔質被膜からなり、そ
の空孔をIrO2 を主成分とする導電性酸化物で充填し
た中間層を設けた不溶性電極である。
That is, the first aspect of the present invention is an insoluble electrode in which the electrode base material is made of a conductive metal and the electrode outermost layer is a conductive layer containing IrO 2 as a main component. The outermost surface of the electrode and the surface of the pores are covered with a porous insulating oxide layer, and are composed of a valve metal porous coating having a layered structure parallel to the electrode base material. Is an insoluble electrode provided with an intermediate layer filled with a conductive oxide containing IrO 2 as a main component.

【0013】特に、中間層を構成するバルブ金属とIr
2 を主成分とする導電性酸化物との体積比が60:4
0ないし95:5の範囲にあること、並びに中間層の厚
みが5〜100μmの範囲にあることを特徴とする。
In particular, the valve metal and Ir forming the intermediate layer
The volume ratio to the conductive oxide containing O 2 as a main component is 60: 4.
It is characterized in that it is in the range of 0 to 95: 5 and that the thickness of the intermediate layer is in the range of 5 to 100 μm.

【0014】また、この第1の発明において、電極母材
と中間層と電極最表層の3層からなる不溶性電極の製造
方法は以下の通りである。
In the first aspect of the invention, the method for producing an insoluble electrode consisting of the electrode base material, the intermediate layer and the outermost layer of the electrode is as follows.

【0015】すなわち、本発明の不溶性電極は、電極母
材を導電性金属層で構成し、その電極母材上に、電極最
表層側表面及び空孔表面が多孔質の絶縁性酸化物層で覆
われ、かつ電極母材に対して平行な層状構造を持つバル
ブ金属の多孔質被膜からなり、その空孔をIrO2 を主
成分とする導電性酸化物で充填した中間層を設け、電極
最表層を塗布焼付法により成膜してIrO2 を主成分と
する導電層としたものである。
That is, in the insoluble electrode of the present invention, the electrode base material is composed of a conductive metal layer, and on the electrode base material, the surface of the electrode outermost layer side and the surface of the pores are porous insulating oxide layers. An intermediate layer, which is covered with a porous coating film of a valve metal having a layered structure parallel to the electrode base material and whose pores are filled with a conductive oxide whose main component is IrO 2 , is provided. The surface layer is formed by a coating and baking method to form a conductive layer containing IrO 2 as a main component.

【0016】その製造方法の特徴は、電極母材上にバル
ブ金属を溶射して空孔率5〜40%の範囲にあるバルブ
金属の多孔質被膜を形成し、次にバルブ金属の多孔質被
膜表面に、絶縁性化合物前駆体を含有する溶液を塗布し
酸化性雰囲気中で熱処理を行なう操作を繰り返して、バ
ルブ金属の多孔質被膜の電極最表層側表面及び空孔表面
に多孔質の絶縁性酸化物層を形成したのち、更に、その
上に、Ir化合物を主成分とする溶液を塗布し酸化性雰
囲気中で熱処理を行なう操作を繰り返して、バルブ金属
の多孔質被膜の空孔にIrO2 を主成分とする導電性酸
化物を充填し、前記の中間層を形成する点にある。
The manufacturing method is characterized in that the valve metal is sprayed on the electrode base material to form a porous coating of valve metal having a porosity of 5 to 40%, and then a porous coating of valve metal. By repeating the operation of applying a solution containing an insulating compound precursor to the surface and performing heat treatment in an oxidizing atmosphere, the surface of the electrode and the pore surface of the porous coating of the valve metal are porous insulating After the oxide layer is formed, the operation of applying a solution containing an Ir compound as a main component on the oxide layer and performing a heat treatment in an oxidizing atmosphere is repeated to form IrO 2 in the pores of the valve metal porous film. The point is to fill the conductive oxide containing as a main component to form the intermediate layer.

【0017】次に、本発明の第2は、電極母材を導電性
金属で構成し、電極最表層をIrO2 を主成分とする導
電層とした不溶性電極において、前記電極母材と電極最
表層の間に、電極最表層側表面及び空孔表面が多孔質絶
縁性酸化物層で覆われ、かつ電極母材に対して平行な層
状構造を持つバルブ金属の多孔質被膜からなり、その空
孔のうち電極最表層側の被膜表面から5〜95μmの深
さまでをIrO2 を主成分とする導電性酸化物で充填
し、電極母材側の残部を導電性金属で充填した中間層を
設けた不溶性電極である。
A second aspect of the present invention is an insoluble electrode in which the electrode base material is made of a conductive metal and the outermost layer of the electrode is a conductive layer containing IrO 2 as a main component. Between the surface layers, the outermost surface of the electrode and the surface of the pores are covered with a porous insulating oxide layer, and are composed of a valve metal porous coating having a layered structure parallel to the electrode base material. An intermediate layer in which the conductive oxide containing IrO 2 as a main component is filled up to a depth of 5 to 95 μm from the coating surface on the electrode outermost layer side of the pores and the remainder on the electrode base material side is filled with a conductive metal is provided. Insoluble electrode.

【0018】特に、中間層を構成するバルブ金属と、導
電性金属及びIrO2 を主成分とする導電性酸化物の合
計との体積比が60:40ないし95:5の範囲にある
こと、並びに中間層の厚みが10〜100μmの範囲に
あることを特徴とする。
In particular, the volume ratio of the valve metal forming the intermediate layer to the total of the conductive metal and the conductive oxide containing IrO 2 as a main component is in the range of 60:40 to 95: 5, and The thickness of the intermediate layer is in the range of 10 to 100 μm.

【0019】また、この第2の発明において、電極母材
と中間層と電極最表層の3層からなる不溶性電極の製造
方法は以下の通りである。
In the second aspect of the invention, the method for producing an insoluble electrode consisting of three layers of the electrode base material, the intermediate layer and the electrode outermost layer is as follows.

【0020】すなわち、本発明の不溶性電極は、電極母
材を導電性金属層で構成し、その電極母材上に、電極最
表層側表面及び空孔表面が多孔質の絶縁性酸化物層で覆
われ、かつ電極母材に対して平行な層状構造を持つバル
ブ金属の多孔質被膜からなり、その空孔のうち電極最表
層側の被膜表面から5〜95μmの深さまでをIrO2
を主成分とする導電性酸化物で充填し、電極母材側の残
部を導電性金属で充填した中間層を設け、電極最表層を
塗布焼付法により成膜してIrO2 を主成分とする導電
層としたものである。
That is, in the insoluble electrode of the present invention, the electrode base material is composed of a conductive metal layer, and on the electrode base material, the surface of the outermost layer of the electrode and the surface of pores are porous insulating oxide layers. It is composed of a porous coating film of a valve metal which is covered and has a layered structure parallel to the electrode base material. IrO 2 is formed in the pores from the coating surface on the electrode outermost surface side to a depth of 5 to 95 μm.
Is provided as the main component, and an intermediate layer is provided in which the remaining portion on the electrode base material side is filled with the conductive metal, and the outermost layer of the electrode is formed by a coating baking method to contain IrO 2 as the main component. It is a conductive layer.

【0021】その製造方法の特徴は、電極母材上にバル
ブ金属を溶射して空孔率5〜40%の範囲にあるバルブ
金属の多孔質被膜を形成し、次に、バルブ金属の多孔質
被膜表面に、絶縁性化合物前駆体を含有する溶液を塗布
し酸化性雰囲気中で熱処理を行なう操作を繰り返して、
バルブ金属の多孔質被膜の電極最表層側表面及び空孔表
面に多孔質の絶縁性酸化物層を形成したのち、電極母材
を陰極にして導電性金属を電気メッキして、バルブ金属
の多孔質被膜の空孔のうち電極最表層側の被膜表面から
5〜95μmの深さまでを除いた該被膜の下層を導電性
金属で充填し、更に、その上に、Ir化合物を主成分と
する溶液を塗布し酸化性雰囲気中で熱処理を行なう操作
を繰り返して、バルブ金属の多孔質被膜上層の空孔にI
rO2 を主成分とする導電性酸化物を充填し、前記の中
間層を形成する点にある。
The feature of the manufacturing method is that the valve metal is sprayed on the electrode base material to form a porous coating film of the valve metal having a porosity of 5 to 40%. By repeating the operation of applying a solution containing an insulating compound precursor to the surface of the film and performing heat treatment in an oxidizing atmosphere,
After forming a porous insulating oxide layer on the outermost surface of the electrode of the valve metal porous film and on the surface of the pores, electroplating conductive metal with the electrode base material as the cathode to form the porous metal of the valve metal. The lower layer of the porous film except for the depth of 5 to 95 μm from the surface of the electrode on the outermost surface side of the electrode is filled with a conductive metal, and a solution containing an Ir compound as a main component is further provided on the lower layer. Is repeated and the heat treatment is repeated in an oxidizing atmosphere to form I in the holes in the upper layer of the porous coating of the valve metal.
The point is to fill the conductive oxide containing rO 2 as a main component to form the intermediate layer.

【0022】なお、本発明の不溶性電極では、バルブ金
属の多孔質被膜の電極最表層側表面及び空孔表面を覆っ
ている多孔質の絶縁性酸化物層の厚みが0.05〜5μ
mの範囲にあること、また、その製造方法では、バルブ
金属の多孔質被膜の電極最表層側表面及び空孔表面に多
孔質の絶縁性酸化物層を形成する際の熱処理温度を20
0〜600℃の範囲とすることを特徴としている。
In the insoluble electrode of the present invention, the thickness of the porous insulating oxide layer covering the electrode outermost layer side surface and the pore surface of the valve metal porous coating is 0.05 to 5 μm.
m, and in the manufacturing method thereof, the heat treatment temperature at the time of forming the porous insulating oxide layer on the surface of the electrode metal outermost layer side and the pore surface of the porous coating of the valve metal is 20.
It is characterized in that it is in the range of 0 to 600 ° C.

【0023】本発明で用いる電極母材は、導電性金属で
あれば良いが、硫酸溶液中での耐用性に優れたバルブ金
属(Ti,Ta,Zr,Nb)とすることが好ましい。
その理由は、硫酸溶液中では耐食性に優れており、その
破壊電圧が高いからである。
The electrode base material used in the present invention may be a conductive metal, but is preferably a valve metal (Ti, Ta, Zr, Nb) having excellent durability in a sulfuric acid solution.
The reason is that it has excellent corrosion resistance in a sulfuric acid solution and its breakdown voltage is high.

【0024】また、本発明の不溶性電極において、中間
層を構成する多孔質被膜の材質としては、硫酸溶液中で
安定なバルブ金属(Ti,Ta,Zr,Nb)であるこ
とが必要である。バルブ金属の多孔質被膜は、粒径20
〜40μmのバルブ金属粉末を通常のプラズマ溶射で溶
射することで形成できる。原料粉末は溶射により変形
し、厚み2μm程度、直径数10μmの円盤型薄膜とな
り、これが堆積して多孔質多層被膜が形成される。
Further, in the insoluble electrode of the present invention, the material of the porous coating film forming the intermediate layer is required to be a valve metal (Ti, Ta, Zr, Nb) which is stable in a sulfuric acid solution. The valve metal porous coating has a particle size of 20.
It can be formed by spraying a valve metal powder of ˜40 μm by ordinary plasma spraying. The raw material powder is deformed by thermal spraying to form a disk-shaped thin film having a thickness of about 2 μm and a diameter of several 10 μm, which is deposited to form a porous multilayer coating film.

【0025】溶射により形成するバルブ金属の多孔質被
膜の厚みは、100μm以下にすると、特に密着性に優
れる。
If the thickness of the valve metal porous coating formed by thermal spraying is 100 μm or less, the adhesion is particularly excellent.

【0026】一方、電極母材、あるいはバルブ金属の多
孔質被膜空孔の充填材として用いられている導電性金属
が露出するのを防止するためには、電極最表層の塗布焼
付被膜に対してアンカー効果による密着性向上を図る必
要がある。それには、バルブ金属の多孔質被膜空孔を電
極最表層側から少なくとも5μm以上の厚みについてI
rO2 を主成分とする導電性酸化物により充填する。す
なわち、溶射により形成するバルブ金属の多孔質被膜の
厚みは、本発明の第1では少なくとも5μm以上とす
る。
On the other hand, in order to prevent the conductive metal used as the base material of the electrode or the filling material for the pores of the porous coating of the valve metal from being exposed, the coating and baking coating of the outermost layer of the electrode should be applied. It is necessary to improve the adhesion by the anchor effect. For this purpose, the porous coating film pores of the valve metal should be formed at a thickness of at least 5 μm from the outermost surface of the electrode.
It is filled with a conductive oxide whose main component is rO 2 . That is, in the first aspect of the present invention, the thickness of the valve metal porous coating formed by thermal spraying is at least 5 μm or more.

【0027】また、本発明の第2では、多孔質被膜空孔
に対する導電性金属の充填厚み5〜95μmに応じて、
少なくとも10μm以上とする。従って、多孔質被膜の
厚みは、本発明の第1では5〜100μmの範囲に、本
発明の第2では10μm〜100μmの範囲にあること
が好ましい。
In the second aspect of the present invention, the filling thickness of the conductive metal into the pores of the porous coating is 5 to 95 μm.
At least 10 μm or more. Therefore, the thickness of the porous coating is preferably in the range of 5 to 100 μm in the first aspect of the present invention and in the range of 10 μm to 100 μm in the second aspect of the present invention.

【0028】溶射条件として、本発明の第1ではバルブ
金属とIrO2 を主成分とする導電性酸化物との体積
比、本発明の第2ではバルブ金属と導電性金属及びIr
2 を主成分とする導電性酸化物の合計との体積比が6
0:40ないし95:5の範囲にあること、すなわち空
孔率が5〜40%の範囲にある場合に耐用性に優れてい
る。
As the thermal spraying conditions, in the first aspect of the present invention, the volume ratio of the valve metal to the conductive oxide containing IrO 2 as a main component is used, and in the second aspect of the present invention, the valve metal, the conductive metal and Ir.
The volume ratio to the total of the conductive oxides containing O 2 as the main component is 6
The durability is excellent when it is in the range of 0:40 to 95: 5, that is, when the porosity is in the range of 5 to 40%.

【0029】なぜならば、バルブ金属の体積比を60%
以上とすること、バルブ金属による電極母材の露出面積
低減効果が発揮され、また体積比を95%以下とするこ
とで通電に充分な量の導電性金属、またはIrO2 を主
成分とする導電性酸化物、あるいは、IrO2 を主成分
とする導電性酸化物と導電性金属と被膜中の空孔へ充填
される。なお、バルブ金属の多孔質被膜の空孔率は、例
えば被膜の縦断面または横断面を観察し、その面積率か
ら算出することができる。
This is because the volume ratio of the valve metal is 60%.
By the above, the effect of reducing the exposed area of the electrode base material by the valve metal is exerted, and by setting the volume ratio to 95% or less, a sufficient amount of conductive metal for conducting electricity or conductivity containing IrO 2 as a main component is used. Oxide, or a conductive oxide containing IrO 2 as a main component, a conductive metal, and pores in the coating film. The porosity of the valve metal porous coating can be calculated, for example, by observing the longitudinal section or the transverse section of the coating and calculating the area ratio thereof.

【0030】本発明の不溶性電極において、バルブ金属
の多孔質被膜の電極最表層側表面及び空孔表面に施工す
る、多孔質の絶縁性酸化物層の材質としては、メッキ液
中で安定な酸化物、例えばSiO2、Al23、ZrO2
等が好ましい。また、多孔質の絶縁性酸化物層は、厚み
が5μm以下で密着性に優れ、0.05μm以上である
と電極母材の酸化抑制効果に優れる。
In the insoluble electrode of the present invention, the material of the porous insulating oxide layer applied to the surface of the electrode metal outermost layer side and the surface of the pores of the porous coating of the valve metal is stable oxidation in the plating solution. Such as SiO 2 , Al 2 O 3 , ZrO 2
Etc. are preferred. The porous insulating oxide layer has a thickness of 5 μm or less and excellent adhesion, and a thickness of 0.05 μm or more has an excellent effect of suppressing oxidation of the electrode base material.

【0031】絶縁性酸化物層の成膜方法としては、絶縁
性化合物前駆体、例えば、金属アルコキシド、β−ジケ
トンキレート体、β−ケトエステルキレート体、カルボ
ン酸塩等の溶液を塗布して熱処理する、いわゆるゾルー
ゲル法を採用できる。
As a method for forming the insulating oxide layer, a solution of an insulating compound precursor such as a metal alkoxide, a β-diketone chelate, a β-ketoester chelate, or a carboxylate is applied and heat treated. The so-called sol-gel method can be adopted.

【0032】絶縁性酸化物層内にバルブ金属の多孔質被
膜まで貫通するクラックを生成させること、すなわち、
多孔化するには、高温、例えば300℃から急冷すれば
良い。
Producing cracks in the insulating oxide layer that penetrate through the porous coating of the valve metal, ie,
To make it porous, rapid cooling from a high temperature, for example, 300 ° C. may be performed.

【0033】あるいは、前記の溶液に有機高分子、例え
ばセルロース、ポリエチレングリコール、ウレタンを添
加して塗布し、熱処理することにより、熱処理時に有機
高分子が分解してガスが発生するため、被膜を多孔化で
きる。
Alternatively, when an organic polymer such as cellulose, polyethylene glycol or urethane is added to the above solution and applied and heat-treated, the organic polymer is decomposed and gas is generated during the heat treatment, so that the coating is porous. Can be converted.

【0034】本発明第2の不溶性電極の場合には、前述
したように、バルブ金属の多孔質被膜の表面に多孔質の
絶縁性酸化物層を作製した後に、メッキによりその空孔
に導電性金属を充填する。
In the case of the second insoluble electrode of the present invention, as described above, after forming the porous insulating oxide layer on the surface of the porous coating of the valve metal, the holes are made electrically conductive by plating. Fill with metal.

【0035】その方法は、電極母材を陰極として通常の
電解メッキ法を行なう。それによって、バルブ金属の多
孔質被膜の空孔に導電性金属を電極母材表面から必要と
される厚さだけ充填することができる。
As the method, an ordinary electrolytic plating method is performed using the electrode base material as a cathode. Thereby, the holes in the porous coating of the valve metal can be filled with the conductive metal in the required thickness from the surface of the electrode base material.

【0036】この導電性金属による空孔の充填は、バル
ブ金属の多孔質被膜の空孔のうち被膜表面から5〜95
μmの深さまでを除いた多孔質被膜の下層に電極母材側
から充填することが必要である。
The filling of the pores with the conductive metal is carried out in the pores of the porous coating of the valve metal from 5 to 95 from the coating surface.
It is necessary to fill the lower layer of the porous film excluding the depth of μm from the electrode base material side.

【0037】これは、バルブ金属の多孔質被膜の空孔の
うち電極母材側から5μmよりも薄い厚みでしか導電性
金属を充填できなかった場合には、その充填による金属
母材との密着性向上効果が得られないこと、また、電極
最表層側に5μmよりも薄い厚みでしか空孔を残すこと
ができなかった場合には、電極最表層の塗布焼付被膜に
対してアンカー効果による密着性向上を図ることができ
ないことによる。
This is because when the conductive metal can be filled only in a thickness of less than 5 μm from the electrode base material side among the pores of the porous coating of the valve metal, the adhesion with the metal base material due to the filling. When the voids can be left only on the outermost layer of the electrode with a thickness of less than 5 μm, adhesion by the anchor effect to the coating and baking coating on the outermost layer of the electrode Because it is not possible to improve

【0038】なお、ここで用いる導電性金属としては、
メッキ浴の硫酸溶液中での耐食性に優れた白金族系金属
が好ましい。
As the conductive metal used here,
A platinum group metal having excellent corrosion resistance in the sulfuric acid solution of the plating bath is preferable.

【0039】また、前述したように本発明第2の不溶性
電極では、IrO2 を主成分とする導電性酸化物のアン
カー効果による電極最表層の密着性向上、及び導電性金
属の充填による金属母材との密着性向上効果を得るた
め、中間層の厚みは少なくとも10μm以上であること
が好ましい。
As described above, in the second insoluble electrode of the present invention, the adhesion of the outermost layer of the electrode is improved by the anchor effect of the conductive oxide containing IrO 2 as a main component, and the metal matrix is filled with the conductive metal. In order to obtain the effect of improving the adhesiveness with the material, the thickness of the intermediate layer is preferably at least 10 μm or more.

【0040】本発明で多孔質バルブ金属被膜の空孔を充
填する際に用いるIr化合物を主成分とする溶液の例
が、例えば特開昭62−240780号公報、特開昭6
3−235493号公報、特開平3−193889号公
報、あるいは特開昭59−150091号公報に示され
ている。具体的には、塩化イリジウム酸を主成分とし、
タンタルアルコキド、塩化白金酸等の化合物を含むアル
コール溶液である。
Examples of the solution containing Ir compound as a main component used for filling the pores of the porous valve metal coating in the present invention are described in, for example, JP-A-62-240780 and JP-A-6-240780.
It is disclosed in JP-A-3-235493, JP-A-3-193889, or JP-A-59-150091. Specifically, iridium chloride is the main component,
It is an alcohol solution containing compounds such as tantalum alkoxide and chloroplatinic acid.

【0041】このような溶液をバルブ金属の多孔質被膜
の表面に、例えばハケ塗り、スプレー法、あるいは浸漬
法等の手段で塗布した後、溶媒を蒸発させるために10
0〜200℃で数十分間乾燥し、酸化性雰囲気中、例え
ば大気中において300〜700℃で熱処理する。こう
した操作により、IrO2 を主成分とする導電性酸化物
が形成される。この一連の操作を複数回繰り返すこと
で、バルブ金属の多孔質被膜の空孔にIrO2 を主成分
とする導電性酸化物を充填することができ、中間層が形
成される。更に、中間層を形成した後に同様な操作を繰
り返すことで、電極最表層としてのIrO2を主成分と
する導電層が形成される。
Such a solution is applied to the surface of the valve metal porous coating film by means such as brush coating, spraying, dipping or the like, and then 10 to evaporate the solvent.
It is dried at 0 to 200 ° C. for several tens of minutes and heat-treated at 300 to 700 ° C. in an oxidizing atmosphere, for example, in the air. By such an operation, a conductive oxide containing IrO 2 as a main component is formed. By repeating this series of operations a plurality of times, it is possible to fill the pores of the valve metal porous coating with a conductive oxide containing IrO 2 as a main component, thereby forming an intermediate layer. Further, by repeating the same operation after forming the intermediate layer, a conductive layer containing IrO 2 as a main component as the outermost layer of the electrode is formed.

【0042】[0042]

【作用】本発明第1の不溶性電極の構造を図1に、第2
の不溶性電極の構造を図2に示す。以下これらの図に基
づいて作用を説明する。
The structure of the first insoluble electrode of the present invention is shown in FIG.
The structure of the insoluble electrode is shown in FIG. The operation will be described below with reference to these drawings.

【0043】本発明第1の不溶性電極では、電極最表層
であるIrO2 を主成分とする導電層3に気孔及びクラ
ック4が多数存在する場合にも、バルブ金属の多孔質被
膜とIrO2 を主成分とする導電性酸化物とで構成され
た中間層6、本発明第2の電極では、中間層6と更に、
バルブ金属の多孔質被膜と導電性金属とで構成された中
間層7が存在するため、電極最表層3に存在する気孔及
びクラック4が電極母材1へ貫通することはなく、従っ
て、電極母材1の露出面積が少ない。
In the first insoluble electrode of the present invention, even when a large number of pores and cracks 4 are present in the conductive layer 3 containing IrO 2 as the outermost layer of the electrode, the porous coating film of the valve metal and IrO 2 are removed. An intermediate layer 6 composed of a conductive oxide as a main component, in the second electrode of the present invention, the intermediate layer 6 and further,
Since the intermediate layer 7 composed of the porous coating of the valve metal and the conductive metal is present, the pores and cracks 4 present in the outermost layer 3 of the electrode do not penetrate into the electrode base material 1, and therefore the electrode base material 1 is not formed. The exposed area of the material 1 is small.

【0044】更に中間層6,7を構成するバルブ金属の
多孔質被膜は電極母材1と同材質で熱膨張係数に差がな
いため、導着性に優れている。
Further, the porous coating film of the valve metal forming the intermediate layers 6 and 7 is the same material as the electrode base material 1 and there is no difference in the coefficient of thermal expansion, so that it has excellent conductivity.

【0045】また、この多孔質被膜の電極最表層側表面
及び空孔表面に多孔質絶縁性酸化物層8がコーティング
されているため、バルブ金属の多孔質被膜表面でその界
面方向への酸化が進行することはなく、電極最表層のI
rO2 を主成分とする導電性酸化物の塗布焼付被膜が剥
離することはない。
Further, since the porous insulating oxide layer 8 is coated on the surface of the electrode on the outermost layer side and on the surface of the pores of this porous coating, the oxidation of the valve metal in the interface direction is caused on the surface of the porous coating. It does not proceed, and I on the outermost layer of the electrode
The coating bake coating of the conductive oxide containing rO 2 as a main component does not peel off.

【0046】このように本発明の不溶性電極は、電極母
材の露出面積が少なく、バルブ金属の多孔質被膜表面で
の界面方向への酸化進展も抑制できるため、100A/
dm2以上の高電流密度でも長時間の使用に耐えること
ができる。
As described above, the insoluble electrode of the present invention has a small exposed area of the electrode base material and can suppress the progress of oxidation of the valve metal toward the interface on the surface of the porous coating film.
It can withstand long-term use even at a high current density of dm 2 or more.

【0047】先に出願した特願平4−279315号の
発明では、中間層を多孔質非導電性材料で構成するとし
ているが、本発明では、それに代わって電極母材と同材
質のバルブ金属を中間層に用いており、母材との密着性
に優れている。
In the invention of Japanese Patent Application No. 4-279315 filed earlier, it is stated that the intermediate layer is made of a porous non-conductive material. However, in the present invention, instead of this, a valve metal of the same material as the electrode base material is used. Is used for the intermediate layer and has excellent adhesion to the base material.

【0048】[0048]

【実施例】まず、(1)本発明第1の不溶性電極、すな
わち、電極母材を導電性金属で構成し、電極最表層をI
rO2 を主成分とする導電層とした不溶性電極におい
て、前記電極母材と電極最表層の間に、電極最表層側表
面及び空孔表面が多孔質絶縁性酸化物層で覆われ、かつ
電極母材に対して平行な層状構造を持つバルブ金属の多
孔質被膜からなり、その空孔にIrO2 を主成分とする
導電性酸化物を充填した中間層を設けたことを特徴とす
る不溶性電極、
EXAMPLES First, (1) the first insoluble electrode of the present invention, that is, the electrode base material is made of a conductive metal, and the electrode outermost layer is I.
In an insoluble electrode having a conductive layer containing rO 2 as a main component, a surface of the electrode outermost layer and a surface of pores are covered with a porous insulating oxide layer between the electrode base material and the electrode outermost layer, and the electrode An insoluble electrode comprising a porous coating film of a valve metal having a layered structure parallel to the base material, the pores of which are provided with an intermediate layer filled with a conductive oxide containing IrO 2 as a main component. ,

【0049】及び(2)本発明第2の不溶性電極、すな
わち、電極母材を導電性金属で構成し、電極最表層をI
rO2 を主成分とする導電層とした不溶性電極におい
て、前記電極母材と電極最表層の間に、電極最表層側表
面及び空孔表面が多孔質絶縁性酸化物層で覆われ、かつ
電極母材に対して平行な層状構造を持つバルブ金属の多
孔質被膜からなり、その空孔のうち電極最表層側の被膜
表面から5〜95μmの深さまでをIrO2 を主成分と
する導電性酸化物で充填し、電極母材側の残部を導電性
金属で充填した中間層を設けたことを特徴とする不溶性
電極、のそれぞれについてその作製方法の一例を述べ
る。なお、図5にその製造フローチャートを示す。
And (2) The second insoluble electrode of the present invention, that is, the electrode base material is made of a conductive metal, and the outermost layer of the electrode is I.
In an insoluble electrode having a conductive layer containing rO 2 as a main component, a surface of the electrode outermost layer and a surface of pores are covered with a porous insulating oxide layer between the electrode base material and the electrode outermost layer, and the electrode It is composed of a porous coating film of a valve metal having a layered structure parallel to the base material, and the conductive oxide containing IrO 2 as a main component is present in the pores from the coating surface on the electrode outermost surface side to a depth of 5 to 95 μm. An example of the method for producing each of the insoluble electrodes, which is characterized in that an intermediate layer is provided in which the intermediate layer is filled with the material and the rest of the electrode base material side is filled with the conductive metal. The manufacturing flowchart is shown in FIG.

【0050】不溶性電極の作製方法: (1)電極母材の処理;電極母材としてTi板を使用
し、100×100×20mm厚の電極母材表面を蓚酸
を用いて洗浄後、プラストにより粗面化した。
Manufacturing method of insoluble electrode: (1) Treatment of electrode base material; using a Ti plate as the electrode base material, the surface of the electrode base material having a thickness of 100 × 100 × 20 mm was washed with oxalic acid, and then roughened with a plast. I got faced.

【0051】(2)中間層の形成; (2−1)バルブ金属の多孔質被膜の形成 まず、バルブ金属としてTi,Ta,Zr,Nbの4種
類を選択し、それぞれについて通常のプラズマ溶射法に
より電極母材に対して溶射を行ない、電極母材上にバル
ブ金属の多孔質被膜を形成した。 被膜厚み:5〜100μm 空孔率:5〜40%
(2) Formation of intermediate layer; (2-1) Formation of porous coating of valve metal First, four types of valve metals, Ti, Ta, Zr, and Nb, are selected, and a normal plasma spraying method is applied to each of them. Thus, the electrode base material was sprayed to form a porous coating of valve metal on the electrode base material. Coating thickness: 5-100 μm Porosity: 5-40%

【0052】(2−2)多孔質絶縁性酸化物層の形成 シリコンアルコキシドを加水分解したアルコール溶液
を、バルブ金属の多孔質被膜上に、浸漬法で塗布し、大
気中で熱処理する操作を1回または複数回繰り返して、
非導電性被膜を形成した後、300℃から急冷した。 熱処理温度:200〜600℃ 被膜厚み:0.05〜5μm
(2-2) Formation of Porous Insulating Oxide Layer An alcohol solution obtained by hydrolyzing a silicon alkoxide is applied on the porous coating film of the valve metal by the dipping method, and heat treatment is performed in the atmosphere. One or more times,
After forming the non-conductive coating, it was rapidly cooled from 300 ° C. Heat treatment temperature: 200 to 600 ° C. Coating thickness: 0.05 to 5 μm

【0053】(2−3)メッキによる充填 本発明の第2の不溶性電極については、上記(2−2)
で電極母材に施工したバルブ金属の多孔質被膜表面に多
孔質絶縁性酸化物層を形成した後、メッキ液中に浸し、
この電極母材を陰極としてPtをメッキした。この方法
で、バルブ金属の多孔質被膜の空孔を所定の厚さまで充
填した。 メッキ方法:電解メッキ 電流密度:1A/dm2 メッキ成分:Pt
(2-3) Filling by plating Regarding the second insoluble electrode of the present invention, the above (2-2)
After forming a porous insulating oxide layer on the surface of the porous coating of the valve metal applied to the electrode base material with, soak it in the plating solution,
Pt was plated using this electrode base material as a cathode. By this method, the pores of the valve metal porous coating were filled to a predetermined thickness. Plating method: Electrolytic plating Current density: 1 A / dm 2 Plating component: Pt

【0054】(2−4)IrO2を主成分とする導電性
酸化物による充填 熱分解によりIrO2となるH2IrCl690部に、熱
分解によりTa25 となるTa(OC253 を10
部添加混合して、ブタノールに溶解させた溶液を、表面
に多孔質絶縁性酸化物層を形成したバルブ金属の多孔質
被膜表面に筆で塗布し、120℃で20分乾燥した後、
電気炉に入れ、450℃で焼き付ける操作を複数回行な
った。この方法で、バルブ金属の多孔質被膜の空孔にI
rO2 を主成分とする導電性酸化物を充填し、目標とす
る中間層を形成した。更に、これと同じ操作を繰り返
し、電極最表層を形成した。
(2-4) Filling with a conductive oxide containing IrO 2 as a main component 90 parts of H 2 IrCl 6 which becomes IrO 2 by thermal decomposition and Ta (OC 2 H 5 which becomes Ta 2 O 5 by thermal decomposition) 5 ) 3 to 10
Partly mixed and dissolved in butanol, the solution was applied on the surface of the porous coating film of the valve metal having a porous insulating oxide layer formed thereon with a brush, and after drying at 120 ° C. for 20 minutes,
The operation of placing in an electric furnace and baking at 450 ° C. was repeated several times. In this way, the holes in the porous coating of the valve metal are
A conductive oxide containing rO 2 as a main component was filled to form a target intermediate layer. Further, the same operation as this was repeated to form the outermost surface layer of the electrode.

【0055】表1に、こうして得られた本発明第1及び
第2の不溶性電極について耐用性試験結果を従来品、比
較品と共に示した。
Table 1 shows the durability test results of the first and second insoluble electrodes of the present invention thus obtained, together with the conventional product and the comparative product.

【0056】なお、作製した不溶性電極の耐用性評価は
以下の方法により行った。すなわち、陽極に従来品、比
較品、及び本発明の不溶性電極を陰極に白金板を使用
し、60℃、5wt%硫酸溶液中で、電流密度200A
/dm2 の通電試験を行ない、電圧が10V上昇するま
での時間を測定した。表1において、○は寿命4000
hr以上の耐用性を示し、×は寿命4000hr未満で
あった不溶性電極である。表1から本発明の不溶性電極
はいずれも4000hr以上の寿命があり、耐用性に優
れていることがわかる。
The durability of the produced insoluble electrode was evaluated by the following method. That is, a conventional product, a comparative product, and the insoluble electrode of the present invention were used as the anode, and a platinum plate was used as the cathode, and the current density was 200 A in a 5 wt% sulfuric acid solution at 60 ° C.
A current test of / dm 2 was performed, and the time until the voltage increased by 10 V was measured. In Table 1, ○ indicates a life of 4000
An insoluble electrode having a durability of not less than hr and a life of less than 4000 hr was insoluble. It can be seen from Table 1 that each of the insoluble electrodes of the present invention has a life of 4000 hours or more and is excellent in durability.

【0057】[0057]

【表1】 [Table 1]

【0058】尚、表1において、11は比較のために従
来の塗布焼付法により体製した電極、また、12は、比
較のために、本発明と異なる条件で作製した電極であ
る。比較品12は電極最表層であるIrO2 を主成分と
する導電層のアンカー効果が得られず短寿命であった。
In Table 1, 11 is an electrode manufactured by a conventional coating and baking method for comparison, and 12 is an electrode manufactured under conditions different from those of the present invention for comparison. Comparative product 12 had a short life because the anchor effect of the conductive layer containing IrO 2 as the outermost layer of the electrode was not obtained.

【0059】[0059]

【発明の効果】本発明の不溶性電極は、高電流密度で電
解を行なっても耐食性に優れていて、長時間の使用に耐
えるものであり、電気メッキ用電極に限らず、電極精錬
等の他の用途の電極としても極めて有用である。
INDUSTRIAL APPLICABILITY The insoluble electrode of the present invention has excellent corrosion resistance even when electrolysis is carried out at a high current density and can withstand long-term use. It is also extremely useful as an electrode for use in.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明第1の不溶性電極の構造を示す。FIG. 1 shows a structure of a first insoluble electrode of the present invention.

【図2】本発明第2の不溶性電極の構造を示す。FIG. 2 shows a structure of a second insoluble electrode of the present invention.

【図3】従来の電極の構造を示す。FIG. 3 shows a structure of a conventional electrode.

【図4】従来の電極における酸化メカニズムの説明図で
ある。
FIG. 4 is an explanatory diagram of an oxidation mechanism in a conventional electrode.

【図5】本発明の不溶性電極製造フローチャートを示
す。
FIG. 5 shows a flowchart for manufacturing an insoluble electrode according to the present invention.

【符号の説明】[Explanation of symbols]

1 電極母材 2 Ta−SiO2層(クロス斜線部) 3 IrO2を主成分とする導電層(密斜線部) 4 気孔とクラック 5 絶縁性酸化物被膜(黒色部) 6 表面に多孔質絶縁性酸化物層8を有するバルブ金属
の多孔質被膜とIrO2を主成分とする導電性酸化物と
で構成される層 7 表面に多孔質絶縁性酸化物層8を有するバルブ金属
の多孔質被膜と導電性金属とで構成される層(粗斜線
部) 8 多孔質絶縁性酸化物層(黒色部)
Porous insulation first electrode base material 2 Ta-SiO 2 layer conductive layer mainly composed of (cross-hatched portion) 3 IrO 2 (densely hatched portion) 4 pores and cracks 5 insulating oxide film (black portion) 6 surface Of a valve metal having a porous oxide layer 8 and a conductive oxide containing IrO 2 as a main component 7 A porous film of a valve metal having a porous insulating oxide layer 8 on the surface And a conductive metal layer (coarse hatched portion) 8 Porous insulating oxide layer (black portion)

【手続補正書】[Procedure amendment]

【提出日】平成7年6月2日[Submission date] June 2, 1995

【手続補正1】[Procedure Amendment 1]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】0026[Correction target item name] 0026

【補正方法】変更[Correction method] Change

【補正内容】[Correction content]

【0026】一方、電極母材、あるいはバルブ金属の多
孔質被膜空孔の充填材として用いられている導電性金属
が露出するのを防止するため、また、電極最表層の塗布
焼付被膜に対してアンカー効果による密着性向上を図る
ため、バルブ金属の多孔質被膜空孔を電極最表層側から
少なくとも5μm以上の厚みについてIrOを主成分
とする導電性酸化物により充墳する。すなわち、溶射に
より形成するバルブ金属の多孔質被膜の厚みは、本発明
の第1では少なくとも5μm以上とする。
On the other hand, in order to prevent the conductive metal used as the base material of the electrode or the filling material for the pores of the porous coating of the valve metal from being exposed, and for the coating and baking coating of the outermost layer of the electrode. Improve adhesion by anchor effect
Therefore, the porous coating film pores of the valve metal are filled with a conductive oxide containing IrO 2 as a main component for a thickness of at least 5 μm or more from the electrode outermost surface side. That is, in the first aspect of the present invention, the thickness of the valve metal porous coating formed by thermal spraying is at least 5 μm or more.

【手続補正2】[Procedure Amendment 2]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】0029[Name of item to be corrected] 0029

【補正方法】変更[Correction method] Change

【補正内容】[Correction content]

【0029】なぜならば、バルブ金属の体積比を60%
以上とすること、バルブ金属による電極母材の露出面
積低減効果が発揮され、また体積比を95%以下とする
ことで通電に充分な量の導電性金属、またはIrO
主成分とする導電性酸化物、あるいは、IrOを主成
分とする導電性酸化物と導電性金属と被膜中の空孔へ
充填される。なお、バルブ金属の多孔質被膜の空孔率
は、例えば被膜の縦断面または横断面を観察し、その面
積率から算出することができる。
This is because the volume ratio of the valve metal is 60%.
With more, exposed area reduction effect of the electrode base material by the valve metal is exhibited and the main component sufficient of the conductive metal to the conduction by the volume ratio of 95% or less, or IrO 2 The conductive oxide or the conductive oxide containing IrO 2 as a main component and the conductive metal are filled in the pores in the film. The porosity of the valve metal porous coating can be calculated, for example, by observing the longitudinal section or the transverse section of the coating and calculating the area ratio thereof.

【手続補正3】[Procedure 3]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】0044[Correction target item name] 0044

【補正方法】変更[Correction method] Change

【補正内容】[Correction content]

【0044】更に中間層6,7を構成するバルブ金属の
多孔質被膜は電極母材1と同材質で熱膨張係数に差がな
いため、着性に優れている。
[0044] For further there is no difference in the thermal expansion coefficient of a porous coating same material as the electrode base material 1 of the valve metal constituting the intermediate layer 6, it is excellent in tight adhesion.

【手続補正4】[Procedure amendment 4]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】0058[Name of item to be corrected] 0058

【補正方法】変更[Correction method] Change

【補正内容】[Correction content]

【0058】尚、表1において、11は比較のために従
来の塗布焼付法により製した電極、また、12は、比
較のために、本発明と異なる条件で作製した電極であ
る。比較品12は電極最表層であるIrOを主成分と
する導電層のアンカー効果が得られず短寿命であった。
[0058] In Table 1, 11 The electrodes were made created by conventional coating baking method for comparison, 12, for comparison, an electrode was fabricated under different conditions as the present invention. Comparative product 12 had a short life because the anchor effect of the conductive layer containing IrO 2 which is the outermost layer of the electrode as a main component was not obtained.

Claims (10)

【特許請求の範囲】[Claims] 【請求項1】 電極母材を導電性金属で構成し、電極最
表層をIrO2 を主成分とする導電層とした不溶性電極
において、前記電極母材と電極最表層との間に、電極最
表層側表面及び空孔表面が多孔質絶縁性酸化物層で覆わ
れ、かつ電極母材に対して平行な層状構造を持つバルブ
金属の多孔質被膜からなり、その空孔にIrO2 を主成
分とする導電性酸化物を充填した中間層を設けたことを
特徴とする不溶性電極。
1. An insoluble electrode in which the electrode base material is made of a conductive metal and the outermost layer of the electrode is a conductive layer containing IrO 2 as a main component, and an electrode outermost layer is provided between the electrode base material and the outermost layer of the electrode. The surface of the surface layer and the surface of the pores are covered with a porous insulating oxide layer, and are composed of a porous valve metal film having a layered structure parallel to the electrode base material, and the pores contain IrO 2 as a main component. An insoluble electrode, characterized in that an intermediate layer filled with a conductive oxide is provided.
【請求項2】 バルブ金属とIrO2 を主成分とする導
電性酸化物との体積比が60:40ないし95:5の範
囲にある中間層を設けたことを特徴とする請求項第1項
記載の不溶性電極。
2. The intermediate layer having a volume ratio of the valve metal to the conductive oxide containing IrO 2 as a main component in the range of 60:40 to 95: 5. The insoluble electrode described.
【請求項3】 中間層の厚みが5〜100μmの範囲に
あることを特徴とする請求項第1項、または第2項記載
の不溶性電極。
3. The insoluble electrode according to claim 1, wherein the thickness of the intermediate layer is in the range of 5 to 100 μm.
【請求項4】 電極母材を導電性金属で構成し、電極最
表層をIrO2 を主成分とする導電層とした不溶性電極
において、前記電極母材と電極最表層との間に、電極最
表層側表面及び空孔表面が多孔質絶縁性酸化物層で覆わ
れ、かつ電極母材に対して平行な層状構造を持つバルブ
金属の多孔質被膜からなり、その空孔のうち電極最表層
側の被膜表面から5〜95μmの深さまでをIrO2
主成分とする導電性酸化物で充填し、電極母材側の残部
を導電性金属で充填した中間層を設けたことを特徴とす
る不溶性電極。
4. An insoluble electrode in which the electrode base material is made of a conductive metal and the outermost surface layer of the electrode is a conductive layer containing IrO 2 as a main component, and an electrode outermost layer is provided between the electrode base material and the outermost surface layer of the electrode. The surface of the surface layer and the surface of the pores are covered with a porous insulating oxide layer and consist of a valve metal porous coating having a layered structure parallel to the electrode base material. An insoluble layer characterized by being provided with an intermediate layer in which a conductive oxide containing IrO 2 as a main component is filled up to a depth of 5 to 95 μm from the surface of the film, and the remainder on the electrode base material side is filled with a conductive metal. electrode.
【請求項5】 バルブ金属と、導電性金属及びIrO2
を主成分とする導電性酸化物の合計との体積比が60:
40ないし95:5の範囲にある中間層を設けたことを
特徴とする請求項第4項記載の不溶性電極。
5. A valve metal, a conductive metal and IrO 2
The volume ratio with respect to the total of the conductive oxides containing as a main component is 60:
The insoluble electrode according to claim 4, further comprising an intermediate layer in the range of 40 to 95: 5.
【請求項6】 中間層の厚みが10〜100μmの範囲
にあることを特徴とする請求項第4項、または第5項記
載の不溶性電極。
6. The insoluble electrode according to claim 4, wherein the thickness of the intermediate layer is in the range of 10 to 100 μm.
【請求項7】 バルブ金属の多孔質被膜の電極最表層側
表面及び空孔表面を覆っている多孔質絶縁性酸化物層の
厚みが0.05〜5μmの範囲にあることを特徴とする
請求項第1〜6項のいずれかに記載の不溶性電極。
7. The porous insulating oxide layer covering the surface of the electrode metal outermost layer and the surface of the pores of the porous coating of the valve metal is in the range of 0.05 to 5 μm. Item 7. The insoluble electrode according to any one of items 1 to 6.
【請求項8】 電極母材と中間層と電極最表層の3層か
らなる不溶性電極であって、電極母材を導電性金属層で
構成し、その電極母材上に、電極最表層側表面及び空孔
表面が多孔質絶縁性酸化物層で覆われ、かつ電極母材に
対して平行な層状構造を持つバルブ金属の多孔質被膜か
らなり、その空孔にIrO2 を主成分とする導電性酸化
物を充填した中間層を設け、電極最表層を塗布焼付法に
より成膜してIrO2 を主成分とする導電層とした不溶
性電極の製造方法において、電極母材上にバルブ金属を
溶射して空孔率5〜40%の範囲にあるバルブ金属の多
孔質被膜を形成し、次に、バルブ金属の多孔質被膜表面
に、絶縁性化合物前駆体を含有する溶液を塗布し酸化性
雰囲気中で熱処理を行なう操作を繰り返して、バルブ金
属の多孔質被膜の電極最表層側表面及び空孔表面に多孔
質絶縁性酸化物層を形成したのち、更に、その上に、I
r化合物を主成分とする溶液を塗布し酸化性雰囲気中で
熱処理を行なう操作を繰り返して、バルブ金属の多孔質
被膜の空孔にIrO2 を主成分とする導電性酸化物を充
填し、前記の中間層を形成することを特徴とする不溶性
電極の製造方法。
8. An insoluble electrode comprising three layers of an electrode base material, an intermediate layer and an electrode outermost layer, wherein the electrode base material is composed of a conductive metal layer, and the electrode outermost surface side surface is formed on the electrode base material. And the surface of the pores is covered with a porous insulating oxide layer, and is composed of a valve metal porous coating having a layered structure parallel to the electrode base material, and the pores are electrically conductive with IrO 2 as a main component. In a method for producing an insoluble electrode in which an intermediate layer filled with a conductive oxide is provided and an outermost layer of the electrode is formed by a coating baking method to form a conductive layer containing IrO 2 as a main component, a valve metal is sprayed on an electrode base material. To form a porous coating of valve metal having a porosity in the range of 5 to 40%, and then applying a solution containing an insulating compound precursor to the surface of the porous coating of valve metal to form an oxidizing atmosphere. The procedure of heat treatment in the chamber is repeated to charge the porous metal film of the valve metal. After forming the porous insulating oxide layer on the outermost layer side surface and pore surface, further thereon, I
The operation of applying a solution containing the r compound as the main component and performing heat treatment in an oxidizing atmosphere is repeated to fill the pores of the porous coating of the valve metal with a conductive oxide containing IrO 2 as the main component. A method for producing an insoluble electrode, which comprises forming an intermediate layer of
【請求項9】 電極母材と中間層と電極最表層の3層か
らなる不溶性電極であって、電極母材を導電性金属層で
構成し、その電極母材上に、電極最表層側表面及び空孔
表面が多孔質絶縁性酸化物層で覆われ、かつ電極母材に
対して平行な層状構造を持つバルブ金属の多孔質被膜か
らなり、その空孔のうち電極最表層側の被膜表面から5
〜95μmの深さまでをIrO2 を主成分とする導電性
酸化物で充填し、電極母材側の残部を導電性金属で充填
した中間層を設け、電極最表層を塗布焼付法により成膜
してIrO2 を主成分とする導電層とした不溶性電極の
製造方法において、電極母材上にバルブ金属を溶射して
空孔率5〜40%の範囲にあるバルブ金属の多孔質被膜
を形成し、次に、バルブ金属の多孔質被膜表面に、絶縁
性化合物前駆体を含有する溶液を塗布し酸化性雰囲気中
で熱処理を行なう操作を繰り返して、バルブ金属の多孔
質被膜の電極最表層側表面及び空孔表面に多孔質絶縁性
酸化物層を形成したのち、電極母材を陰極にして導電性
金属を電気メッキして、バルブ金属の多孔質被膜の空孔
のうち電極最表層側の被膜表面から5〜95μmの深さ
までを除いた該被膜の下層を導電性金属で充填し、更
に、その上に、Ir化合物を主成分とする溶液を塗布し
酸化性雰囲気中で熱処理を行なう操作を繰り返して、バ
ルブ金属の多孔質被膜上層の空孔にIrO2 を主成分と
する導電性酸化物を充填し、前記の中間層を形成するこ
とを特徴とする不溶性電極の製造方法。
9. An insoluble electrode comprising three layers of an electrode base material, an intermediate layer and an electrode outermost layer, wherein the electrode base material is composed of a conductive metal layer, and the electrode outermost surface side surface is formed on the electrode base material. And the surface of the pores is covered with a porous insulating oxide layer and is made of a valve metal porous coating having a layered structure parallel to the electrode base material. From 5
A conductive oxide containing IrO 2 as a main component is filled up to a depth of up to 95 μm, and an intermediate layer is formed by filling the remainder on the electrode base material side with a conductive metal, and the outermost layer of the electrode is formed by coating and baking. In a method of manufacturing an insoluble electrode having a conductive layer containing IrO 2 as a main component, a valve metal is sprayed on an electrode base material to form a porous coating film of the valve metal having a porosity of 5 to 40%. Next, the operation of applying the solution containing the insulating compound precursor to the surface of the porous coating of the valve metal and performing the heat treatment in an oxidizing atmosphere is repeated, and the surface of the valve metal porous coating on the outermost layer side of the electrode. And after forming a porous insulating oxide layer on the surface of the pores, electroplating a conductive metal using the electrode base material as a cathode, and coating the outermost layer of the electrode among the pores of the porous coating of the valve metal. The coating excluding a depth of 5 to 95 μm from the surface The lower layer is filled with a conductive metal, and a solution containing an Ir compound as a main component is further applied on the lower layer, and heat treatment is performed in an oxidizing atmosphere. A method for producing an insoluble electrode, which comprises filling the conductive oxide containing IrO 2 as a main component to form the intermediate layer.
【請求項10】 バルブ金属の多孔質被膜の電極最表層
側表面及び空孔表面に多孔質の絶縁性酸化物層を形成す
る際の熱処理温度を200〜600℃の範囲とすること
を特徴とする請求項第8項または第9項記載の不溶性電
極の製造方法。
10. The heat treatment temperature for forming the porous insulating oxide layer on the surface of the electrode metal outermost layer and the surface of the pores of the porous coating of the valve metal is in the range of 200 to 600 ° C. 10. The method for producing an insoluble electrode according to claim 8 or 9.
JP7846195A 1995-03-10 1995-03-10 Insoluble electrode and manufacturing method thereof Withdrawn JPH08246196A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7846195A JPH08246196A (en) 1995-03-10 1995-03-10 Insoluble electrode and manufacturing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7846195A JPH08246196A (en) 1995-03-10 1995-03-10 Insoluble electrode and manufacturing method thereof

Publications (1)

Publication Number Publication Date
JPH08246196A true JPH08246196A (en) 1996-09-24

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JP7846195A Withdrawn JPH08246196A (en) 1995-03-10 1995-03-10 Insoluble electrode and manufacturing method thereof

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JP (1) JPH08246196A (en)

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