JPH0790594A - Coating solution for forming titanium based multiple oxide - Google Patents
Coating solution for forming titanium based multiple oxideInfo
- Publication number
- JPH0790594A JPH0790594A JP23829093A JP23829093A JPH0790594A JP H0790594 A JPH0790594 A JP H0790594A JP 23829093 A JP23829093 A JP 23829093A JP 23829093 A JP23829093 A JP 23829093A JP H0790594 A JPH0790594 A JP H0790594A
- Authority
- JP
- Japan
- Prior art keywords
- titanium
- coating solution
- coating
- film
- solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 103
- 239000011248 coating agent Substances 0.000 title claims abstract description 101
- 239000010936 titanium Substances 0.000 title claims abstract description 32
- 229910052719 titanium Inorganic materials 0.000 title claims abstract description 29
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 title claims abstract description 26
- 229910052751 metal Inorganic materials 0.000 claims abstract description 16
- 239000002184 metal Substances 0.000 claims abstract description 16
- 150000003839 salts Chemical class 0.000 claims abstract description 11
- 239000003960 organic solvent Substances 0.000 claims abstract description 9
- 229920000642 polymer Polymers 0.000 claims abstract description 8
- 239000007788 liquid Substances 0.000 claims description 23
- 239000002131 composite material Substances 0.000 claims description 15
- 150000001875 compounds Chemical class 0.000 claims description 13
- 239000007795 chemical reaction product Substances 0.000 claims description 8
- 229910052758 niobium Inorganic materials 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 6
- 229910052749 magnesium Inorganic materials 0.000 claims description 4
- 229910052712 strontium Inorganic materials 0.000 claims description 4
- 229910052788 barium Inorganic materials 0.000 claims description 3
- 229910052744 lithium Inorganic materials 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 229910052721 tungsten Inorganic materials 0.000 claims description 3
- 229910052746 lanthanum Inorganic materials 0.000 claims description 2
- 229910052718 tin Inorganic materials 0.000 claims description 2
- 229910052727 yttrium Inorganic materials 0.000 claims description 2
- 229910052725 zinc Inorganic materials 0.000 claims description 2
- 229910052745 lead Inorganic materials 0.000 claims 1
- 239000000758 substrate Substances 0.000 abstract description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 7
- 150000001261 hydroxy acids Chemical class 0.000 abstract 1
- 238000004321 preservation Methods 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 72
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 37
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 22
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 21
- 239000004310 lactic acid Substances 0.000 description 18
- 235000014655 lactic acid Nutrition 0.000 description 18
- 229910052760 oxygen Inorganic materials 0.000 description 14
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 11
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 11
- 239000010703 silicon Substances 0.000 description 11
- 229910052710 silicon Inorganic materials 0.000 description 11
- 238000010438 heat treatment Methods 0.000 description 10
- 238000000034 method Methods 0.000 description 9
- 229910002651 NO3 Inorganic materials 0.000 description 8
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 8
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 8
- FPCJKVGGYOAWIZ-UHFFFAOYSA-N butan-1-ol;titanium Chemical compound [Ti].CCCCO.CCCCO.CCCCO.CCCCO FPCJKVGGYOAWIZ-UHFFFAOYSA-N 0.000 description 8
- 238000003860 storage Methods 0.000 description 8
- -1 zirconium alkoxide Chemical class 0.000 description 8
- ITHZDDVSAWDQPZ-UHFFFAOYSA-L barium acetate Chemical compound [Ba+2].CC([O-])=O.CC([O-])=O ITHZDDVSAWDQPZ-UHFFFAOYSA-L 0.000 description 7
- 238000002360 preparation method Methods 0.000 description 7
- DOSGEBYQRMBTGS-UHFFFAOYSA-N 2-(3,6-dihydro-2h-pyran-4-yl)-4,4,5,5-tetramethyl-1,3,2-dioxaborolane Chemical compound O1C(C)(C)C(C)(C)OB1C1=CCOCC1 DOSGEBYQRMBTGS-UHFFFAOYSA-N 0.000 description 6
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 6
- SVTBMSDMJJWYQN-UHFFFAOYSA-N 2-methylpentane-2,4-diol Chemical compound CC(O)CC(C)(C)O SVTBMSDMJJWYQN-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000010304 firing Methods 0.000 description 3
- 150000002736 metal compounds Chemical class 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 229910052726 zirconium Inorganic materials 0.000 description 3
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 2
- 150000004703 alkoxides Chemical class 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- ULDHMXUKGWMISQ-UHFFFAOYSA-N carvone Chemical compound CC(=C)C1CC=C(C)C(=O)C1 ULDHMXUKGWMISQ-UHFFFAOYSA-N 0.000 description 2
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 2
- 235000019441 ethanol Nutrition 0.000 description 2
- XYIBRDXRRQCHLP-UHFFFAOYSA-N ethyl acetoacetate Chemical compound CCOC(=O)CC(C)=O XYIBRDXRRQCHLP-UHFFFAOYSA-N 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229940051250 hexylene glycol Drugs 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000011259 mixed solution Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- YPFDHNVEDLHUCE-UHFFFAOYSA-N propane-1,3-diol Chemical compound OCCCO YPFDHNVEDLHUCE-UHFFFAOYSA-N 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 150000003609 titanium compounds Chemical class 0.000 description 2
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 1
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- SHXHPUAKLCCLDV-UHFFFAOYSA-N 1,1,1-trifluoropentane-2,4-dione Chemical compound CC(=O)CC(=O)C(F)(F)F SHXHPUAKLCCLDV-UHFFFAOYSA-N 0.000 description 1
- LZDKZFUFMNSQCJ-UHFFFAOYSA-N 1,2-diethoxyethane Chemical compound CCOCCOCC LZDKZFUFMNSQCJ-UHFFFAOYSA-N 0.000 description 1
- VPBZZPOGZPKYKX-UHFFFAOYSA-N 1,2-diethoxypropane Chemical compound CCOCC(C)OCC VPBZZPOGZPKYKX-UHFFFAOYSA-N 0.000 description 1
- QWUWMCYKGHVNAV-UHFFFAOYSA-N 1,2-dihydrostilbene Chemical group C=1C=CC=CC=1CCC1=CC=CC=C1 QWUWMCYKGHVNAV-UHFFFAOYSA-N 0.000 description 1
- LEEANUDEDHYDTG-UHFFFAOYSA-N 1,2-dimethoxypropane Chemical compound COCC(C)OC LEEANUDEDHYDTG-UHFFFAOYSA-N 0.000 description 1
- GDXHBFHOEYVPED-UHFFFAOYSA-N 1-(2-butoxyethoxy)butane Chemical compound CCCCOCCOCCCC GDXHBFHOEYVPED-UHFFFAOYSA-N 0.000 description 1
- QMGJMGFZLXYHCR-UHFFFAOYSA-N 1-(2-butoxypropoxy)butane Chemical compound CCCCOCC(C)OCCCC QMGJMGFZLXYHCR-UHFFFAOYSA-N 0.000 description 1
- HQSLKNLISLWZQH-UHFFFAOYSA-N 1-(2-propoxyethoxy)propane Chemical compound CCCOCCOCCC HQSLKNLISLWZQH-UHFFFAOYSA-N 0.000 description 1
- KZVBBTZJMSWGTK-UHFFFAOYSA-N 1-[2-(2-butoxyethoxy)ethoxy]butane Chemical compound CCCCOCCOCCOCCCC KZVBBTZJMSWGTK-UHFFFAOYSA-N 0.000 description 1
- UOWSVNMPHMJCBZ-UHFFFAOYSA-N 1-[2-(2-butoxypropoxy)propoxy]butane Chemical compound CCCCOCC(C)OCC(C)OCCCC UOWSVNMPHMJCBZ-UHFFFAOYSA-N 0.000 description 1
- RWNUSVWFHDHRCJ-UHFFFAOYSA-N 1-butoxypropan-2-ol Chemical compound CCCCOCC(C)O RWNUSVWFHDHRCJ-UHFFFAOYSA-N 0.000 description 1
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
- ZIKLJUUTSQYGQI-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxypropoxy)propane Chemical compound CCOCC(C)OCC(C)OCC ZIKLJUUTSQYGQI-UHFFFAOYSA-N 0.000 description 1
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- CVBUKMMMRLOKQR-UHFFFAOYSA-N 1-phenylbutane-1,3-dione Chemical compound CC(=O)CC(=O)C1=CC=CC=C1 CVBUKMMMRLOKQR-UHFFFAOYSA-N 0.000 description 1
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 1
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 1
- ZUAURMBNZUCEAF-UHFFFAOYSA-N 2-(2-phenoxyethoxy)ethanol Chemical compound OCCOCCOC1=CC=CC=C1 ZUAURMBNZUCEAF-UHFFFAOYSA-N 0.000 description 1
- RWLALWYNXFYRGW-UHFFFAOYSA-N 2-Ethyl-1,3-hexanediol Chemical compound CCCC(O)C(CC)CO RWLALWYNXFYRGW-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- FEWFXBUNENSNBQ-UHFFFAOYSA-N 2-hydroxyacrylic acid Chemical compound OC(=C)C(O)=O FEWFXBUNENSNBQ-UHFFFAOYSA-N 0.000 description 1
- IEVADDDOVGMCSI-UHFFFAOYSA-N 2-hydroxybutyl 2-methylprop-2-enoate Chemical compound CCC(O)COC(=O)C(C)=C IEVADDDOVGMCSI-UHFFFAOYSA-N 0.000 description 1
- NJRHMGPRPPEGQL-UHFFFAOYSA-N 2-hydroxybutyl prop-2-enoate Chemical compound CCC(O)COC(=O)C=C NJRHMGPRPPEGQL-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- VHSHLMUCYSAUQU-UHFFFAOYSA-N 2-hydroxypropyl methacrylate Chemical group CC(O)COC(=O)C(C)=C VHSHLMUCYSAUQU-UHFFFAOYSA-N 0.000 description 1
- GWZMWHWAWHPNHN-UHFFFAOYSA-N 2-hydroxypropyl prop-2-enoate Chemical compound CC(O)COC(=O)C=C GWZMWHWAWHPNHN-UHFFFAOYSA-N 0.000 description 1
- QCDWFXQBSFUVSP-UHFFFAOYSA-N 2-phenoxyethanol Chemical compound OCCOC1=CC=CC=C1 QCDWFXQBSFUVSP-UHFFFAOYSA-N 0.000 description 1
- CUZKCNWZBXLAJX-UHFFFAOYSA-N 2-phenylmethoxyethanol Chemical compound OCCOCC1=CC=CC=C1 CUZKCNWZBXLAJX-UHFFFAOYSA-N 0.000 description 1
- YEYKMVJDLWJFOA-UHFFFAOYSA-N 2-propoxyethanol Chemical compound CCCOCCO YEYKMVJDLWJFOA-UHFFFAOYSA-N 0.000 description 1
- VATRWWPJWVCZTA-UHFFFAOYSA-N 3-oxo-n-[2-(trifluoromethyl)phenyl]butanamide Chemical compound CC(=O)CC(=O)NC1=CC=CC=C1C(F)(F)F VATRWWPJWVCZTA-UHFFFAOYSA-N 0.000 description 1
- VVXLFFIFNVKFBD-UHFFFAOYSA-N 4,4,4-trifluoro-1-phenylbutane-1,3-dione Chemical compound FC(F)(F)C(=O)CC(=O)C1=CC=CC=C1 VVXLFFIFNVKFBD-UHFFFAOYSA-N 0.000 description 1
- REVVFBIOIFGJRH-JTQLQIEISA-N 4-[[(2s)-1-hydroxybutan-2-yl]amino]benzaldehyde Chemical compound CC[C@@H](CO)NC1=CC=C(C=O)C=C1 REVVFBIOIFGJRH-JTQLQIEISA-N 0.000 description 1
- REIYHFWZISXFKU-UHFFFAOYSA-N Butyl acetoacetate Chemical compound CCCCOC(=O)CC(C)=O REIYHFWZISXFKU-UHFFFAOYSA-N 0.000 description 1
- IBCXDDIKVBOGMX-UHFFFAOYSA-N C(C)OC(CCCO[Ti])(OCC)OCC Chemical compound C(C)OC(CCCO[Ti])(OCC)OCC IBCXDDIKVBOGMX-UHFFFAOYSA-N 0.000 description 1
- KAMRBZZCNIVHGD-UHFFFAOYSA-N C(C)O[Ti](OCCC)OCCC Chemical compound C(C)O[Ti](OCCC)OCCC KAMRBZZCNIVHGD-UHFFFAOYSA-N 0.000 description 1
- UKNVWAWOCPJTRF-UHFFFAOYSA-N C(CC)O[Ti](OC)(OC)OCCC Chemical compound C(CC)O[Ti](OC)(OC)OCCC UKNVWAWOCPJTRF-UHFFFAOYSA-N 0.000 description 1
- NVJALIGNTUTVQO-UHFFFAOYSA-N CCCCO[Ti](OCC)(OCC)OCCCC Chemical compound CCCCO[Ti](OCC)(OCC)OCCCC NVJALIGNTUTVQO-UHFFFAOYSA-N 0.000 description 1
- AAMRFXMIAPIWAU-UHFFFAOYSA-N CCO[Ti](OC)(OC)OCC Chemical compound CCO[Ti](OC)(OC)OCC AAMRFXMIAPIWAU-UHFFFAOYSA-N 0.000 description 1
- AYUYBZLIBGLZFP-UHFFFAOYSA-N COC(CO[Ti])(OC)OC Chemical compound COC(CO[Ti])(OC)OC AYUYBZLIBGLZFP-UHFFFAOYSA-N 0.000 description 1
- 229910002971 CaTiO3 Inorganic materials 0.000 description 1
- 239000005973 Carvone Substances 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- WRQNANDWMGAFTP-UHFFFAOYSA-N Methylacetoacetic acid Chemical compound COC(=O)CC(C)=O WRQNANDWMGAFTP-UHFFFAOYSA-N 0.000 description 1
- 229910004243 O3-PbTiO3 Inorganic materials 0.000 description 1
- 229910004293 O3—PbTiO3 Inorganic materials 0.000 description 1
- 229910003781 PbTiO3 Inorganic materials 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N Tetraethylene glycol, Natural products OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 125000006267 biphenyl group Chemical group 0.000 description 1
- FBXVOTBTGXARNA-UHFFFAOYSA-N bismuth;trinitrate;pentahydrate Chemical compound O.O.O.O.O.[Bi+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O FBXVOTBTGXARNA-UHFFFAOYSA-N 0.000 description 1
- CDQSJQSWAWPGKG-UHFFFAOYSA-N butane-1,1-diol Chemical compound CCCC(O)O CDQSJQSWAWPGKG-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 150000007942 carboxylates Chemical class 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- NZZIMKJIVMHWJC-UHFFFAOYSA-N dibenzoylmethane Chemical compound C=1C=CC=CC=1C(=O)CC(=O)C1=CC=CC=C1 NZZIMKJIVMHWJC-UHFFFAOYSA-N 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- 125000005594 diketone group Chemical group 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- XGZNHFPFJRZBBT-UHFFFAOYSA-N ethanol;titanium Chemical compound [Ti].CCO.CCO.CCO.CCO XGZNHFPFJRZBBT-UHFFFAOYSA-N 0.000 description 1
- 229960005082 etohexadiol Drugs 0.000 description 1
- 239000000499 gel Substances 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- QAMFBRUWYYMMGJ-UHFFFAOYSA-N hexafluoroacetylacetone Chemical compound FC(F)(F)C(=O)CC(=O)C(F)(F)F QAMFBRUWYYMMGJ-UHFFFAOYSA-N 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 238000004093 laser heating Methods 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- ZEIWWVGGEOHESL-UHFFFAOYSA-N methanol;titanium Chemical compound [Ti].OC.OC.OC.OC ZEIWWVGGEOHESL-UHFFFAOYSA-N 0.000 description 1
- ZKWONARDNQWFKT-UHFFFAOYSA-N methanolate;titanium(2+) Chemical compound CO[Ti]OC ZKWONARDNQWFKT-UHFFFAOYSA-N 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- VLQDLYQOMLDQOW-UHFFFAOYSA-N pentan-1-ol;titanium Chemical compound [Ti].CCCCCO.CCCCCO.CCCCCO.CCCCCO VLQDLYQOMLDQOW-UHFFFAOYSA-N 0.000 description 1
- 229960005323 phenoxyethanol Drugs 0.000 description 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920002338 polyhydroxyethylmethacrylate Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- HKJYVRJHDIPMQB-UHFFFAOYSA-N propan-1-olate;titanium(4+) Chemical compound CCCO[Ti](OCCC)(OCCC)OCCC HKJYVRJHDIPMQB-UHFFFAOYSA-N 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- FKTOIHSPIPYAPE-UHFFFAOYSA-N samarium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Sm+3].[Sm+3] FKTOIHSPIPYAPE-UHFFFAOYSA-N 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- RXSHXLOMRZJCLB-UHFFFAOYSA-L strontium;diacetate Chemical compound [Sr+2].CC([O-])=O.CC([O-])=O RXSHXLOMRZJCLB-UHFFFAOYSA-L 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Inorganic Compounds Of Heavy Metals (AREA)
- Chemically Coating (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、チタン系複合酸化物を
形成するための、安定な塗布液に関するものである。さ
らに詳しくいえば、本発明は、ケイ素、ガラス、セラミ
ックス、金属などの基板上に、誘電性、圧電性、焦電
性、電歪、電気光学的性質を示すチタン系複合酸化物被
膜を形成するのに用いられる安定な塗布液に関するもの
である。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a stable coating liquid for forming a titanium-based composite oxide. More specifically, the present invention forms a titanium-based composite oxide film having dielectric, piezoelectric, pyroelectric, electrostrictive, and electro-optical properties on a substrate made of silicon, glass, ceramics, metal or the like. The present invention relates to a stable coating solution used for.
【0002】[0002]
【従来の技術】チタン系複合酸化物は、BaTiO
3系、Pb(Fe、W)O3−Pb(Fe、Nb)O
3系、Pb(Ni、Nb)O3−Pb(Mg、W)O3−
PbTiO3系、Pb(Mg、Nb)O3−Pb(Ni、
Nb)O3−PbTiO3系、Ba2、Ti 9O20系、(Z
r、Sn)TiO4系、MgTiO3−CaTiO3系、
MgO−TiO2−La2O3−CaO系、(Sr、C
a)[(Li、Nb)Ti]O3系、BaO・Sm2O3
・5TiO2系、BaO−PbO−Nd2O3−TiO2系
の誘電体として、BaTiO3系、PbTiO3−PbZ
rO3系、PbTiO3−PbZrO3−Pb(Mg、N
b)O3系の圧電体として、あるいはBaTiO3系、S
rTiO3系の誘電体、圧電体、バリスタなどとして広
く用いられている。それらに特有の物性を利用して、超
音波洗浄、蓄電器のピックアップ振動子、通信用フィル
ター、音波遅延回路、高電圧発生用トランス、赤外線セ
ンサーなどの電子素子や着火素子、各種の電気光学材
料、超電導材料などの用途に供されている。2. Description of the Related Art A titanium-based composite oxide is BaTiO 3.
3System, Pb (Fe, W) O3-Pb (Fe, Nb) O
3System, Pb (Ni, Nb) O3-Pb (Mg, W) O3−
PbTiO3System, Pb (Mg, Nb) O3-Pb (Ni,
Nb) O3-PbTiO3System, Ba2, Ti 9O20System, (Z
r, Sn) TiOFourSystem, MgTiO3-CaTiO3system,
MgO-TiO2-La2O3-CaO system, (Sr, C
a) [(Li, Nb) Ti] O3System, BaO / Sm2O3
・ 5TiO2System, BaO-PbO-Nd2O3-TiO2system
As a dielectric of3System, PbTiO3-PbZ
rO3System, PbTiO3-PbZrO3-Pb (Mg, N
b) O3As a piezoelectric material of the system, or BaTiO 33System, S
rTiO3Widely used as dielectrics, piezoelectrics, varistors, etc.
It is widely used. By utilizing the physical properties unique to them,
Sonic cleaning, condenser pick-up oscillator, communication fill
Switch, sound wave delay circuit, high voltage generating transformer, infrared sensor
Electronic elements such as sensors and ignition elements, various electro-optical materials
It is used for materials and superconducting materials.
【0003】ところで、基板上にチタン系複合酸化物を
形成するには、基板上に、チタン化合物とともに、P
b、Zr、Sr、Ba、Mgなど複合酸化物の成分とな
る金属の化合物を含む溶液を塗布し、乾燥及び焼成する
方法が、操作が容易で、複雑形状の表面への適用可能な
ことから推奨されている。By the way, in order to form a titanium-based composite oxide on a substrate, P and P on a substrate together with a titanium compound.
The method of applying a solution containing a metal compound that is a component of a complex oxide such as b, Zr, Sr, Ba, and Mg, and drying and baking is easy to operate and can be applied to a surface having a complicated shape. Recommended.
【0004】しかしながら、一般にこの方法で金属の化
合物として用いられている金属アルコキシドは、加水分
解しやすく、塗布液を調製し保存しているうちに分解し
て固形分を析出し、これを用いると生成する被膜が不均
一になるという欠点がある。However, the metal alkoxide generally used as the metal compound in this method is easily hydrolyzed, and decomposes during preparation and storage of the coating solution to precipitate a solid content, which is used. The disadvantage is that the resulting coating is non-uniform.
【0005】このような欠点を改善し、保存安定性を向
上させるために、官能基としてアルコキシル基及びβ‐
ジケトン基を有する有機金属化合物溶液を使用すること
や(特開昭61−97159号公報)、鉛アルコキシド
又は鉛塩、ジルコニウムアルコキシド、チタンアルコキ
シドを含む溶液について、エタノールアミンとアルコー
ルを配合すること(特開平2−6335号公報)が提案
されているが、いずれも十分な保存安定性を得ることが
できず、実用的ではない。In order to improve such defects and improve storage stability, an alkoxyl group and β-
Use of an organic metal compound solution having a diketone group (Japanese Patent Laid-Open No. 61-97159) or blending of ethanolamine and alcohol in a solution containing lead alkoxide or lead salt, zirconium alkoxide, titanium alkoxide (special (Kaihei 2-6335) is proposed, but none of them can obtain sufficient storage stability and is not practical.
【0006】他方、基板上に強誘電体膜のように、ある
程度の膜厚を必要とする複合酸化物被膜を形成させる場
合、これまでの塗布液では、必要な膜厚が得られるまで
何回も重ね塗りをしなければならず、操作が煩雑になる
のを避けられない。したがって、1回の塗布、焼成で所
望の膜厚が得られるような複合酸化物形成用塗布液が要
望されていた。On the other hand, in the case of forming a complex oxide film that requires a certain thickness, such as a ferroelectric film, on a substrate, the coating liquids used so far are required until the required thickness is obtained. However, it is inevitable that the operation becomes complicated because it is necessary to apply multiple layers. Therefore, there has been a demand for a coating solution for forming a complex oxide that can obtain a desired film thickness by one-time application and firing.
【0007】[0007]
【発明が解決しようとする課題】本発明は、このような
事情のもとで、十分に実用的な保存安定性を有し、しか
も1回の塗布、焼成によって十分に厚膜の被膜を得るこ
とができるチタン系複合酸化物形成用塗布液を提供する
ことを目的としてなされたものである。Under the circumstances described above, the present invention has sufficiently practical storage stability, and a sufficiently thick film can be obtained by one-time application and firing. The purpose of the present invention is to provide a coating liquid for forming a titanium-based composite oxide that can be obtained.
【0008】[0008]
【課題を解決するための手段】本発明者らは、保存安定
性が良好で、しかも厚膜の塗膜を得るのに適したチタン
系複合酸化物形成用塗布液を開発するために鋭意研究を
重ねた結果、チタンのアルコキシド又はその錯体化合物
をオキシ酸との反応生成物として、他の必要な金属の可
溶性塩とともに含有させることにより保存安定性を著し
く向上させること及びこの塗布液にさらに可溶性ポリマ
ーを配合させると1回の塗布で厚膜の塗膜が得られるこ
とを見出し、この知見に基づいて本発明をなすに至っ
た。[Means for Solving the Problems] The inventors of the present invention have earnestly studied to develop a coating liquid for forming a titanium-based complex oxide, which has good storage stability and is suitable for obtaining a thick coating film. As a result, by adding titanium alkoxide or its complex compound as a reaction product with an oxyacid together with a soluble salt of other necessary metal, the storage stability is remarkably improved and further soluble in this coating solution. It was found that when a polymer is blended, a thick coating film can be obtained by a single coating, and the present invention has been completed based on this finding.
【0009】すなわち、本発明は、(イ)テトラアルコ
キシチタン又はその錯体化合物と、オキシ酸との反応生
成物、(ロ)チタン系複合酸化物の成分となるチタン以
外の金属の可溶性塩、及び所望によりさらに(ハ)可溶
性ポリマーを含む有機溶剤性溶液から成るチタン系複合
酸化物形成用塗布液を提供するものである。That is, the present invention provides (a) a reaction product of tetraalkoxytitanium or a complex compound thereof with an oxyacid, (b) a soluble salt of a metal other than titanium as a component of a titanium-based composite oxide, and A coating liquid for forming a titanium-based composite oxide, which further comprises (c) an organic solvent-based solution containing a soluble polymer, is provided.
【0010】本発明の(イ)成分は、テトラアルコキシ
チタン又はその錯体化合物とオキシ酸との反応生成物で
あるが、このテトラアルコキシチタンは、一般式 Ti(OR)4 … I (式中のRはアルキル基であって、各Rは同一でも異な
っていてもよい)で表わされる化合物である。このよう
な化合物としては、例えばテトラメトキシチタン、テト
ラエトキシチタン、テトラプロポキシチタン、テトラブ
トキシチタン、テトラペントキシチタン、テトラヘキソ
キシチタン、トリメトキシエトキシチタン、ジメトキシ
ジエトキシチタン、ジメトキシジプロポキシチタン、ジ
エトキシジプロポキシチタン、トリエトキシブトキシチ
タン、ジエトキシジブトキシチタンなどを挙げることが
できる。これらのテトラアルコキシチタンは、単独で用
いてもよいし、また2種以上混合して用いてもよい。The component (a) of the present invention is a reaction product of tetraalkoxytitanium or a complex compound thereof and an oxyacid. The tetraalkoxytitanium has the general formula: Ti (OR) 4 ... I (wherein R is an alkyl group, and each R may be the same or different). Examples of such a compound include tetramethoxy titanium, tetraethoxy titanium, tetrapropoxy titanium, tetrabutoxy titanium, tetrapentoxy titanium, tetrahexoxy titanium, trimethoxyethoxy titanium, dimethoxydiethoxy titanium, dimethoxydipropoxy titanium, and dimethoxy titanium. Examples thereof include ethoxydipropoxytitanium, triethoxybutoxytitanium and diethoxydibutoxytitanium. These tetraalkoxy titaniums may be used alone or in combination of two or more.
【0011】本発明においては、上記のテトラアルコキ
シチタンの代りにその錯化合物を用いることもできる
が、この錯体化合物は、例えばテトラアルコキシチタン
にβ‐ジケトン化合物やグリコール化合物を付加させる
ことによって得られるものである。この際に用いられる
β‐ジケトンの例としては、アセチルアセトン、トリフ
ルオロアセチルアセトン、ヘキサフルオロアセチルアセ
トン、ベンンゾイルアセトン、ベンゾイルトリフルオロ
アセトン、ジベンゾイルメタン、アセト酢酸メチルエス
テル、アセト酢酸エチルエステル、アセト酢酸ブチルエ
ステルなどが、またグリコール化合物の例としては、エ
チレングリコール、ジエチレングリコール、トリエチレ
ングリコール、テトラエチレングリコール、プロピレン
グリコール、ジプロピレングリコール、トリメチレング
リコール、ブタンジオール、ヘキシレングリコールなど
がある。これらは単独で用いてもよいし、また2種以上
混合して用いてもよい。さらにテトラアルコキシチタン
と混合して用いてもよい。In the present invention, a complex compound thereof may be used in place of the above tetraalkoxytitanium, and this complex compound is obtained, for example, by adding a β-diketone compound or a glycol compound to tetraalkoxytitanium. It is a thing. Examples of β-diketones used in this case include acetylacetone, trifluoroacetylacetone, hexafluoroacetylacetone, benzoylacetone, benzoyltrifluoroacetone, dibenzoylmethane, acetoacetic acid methyl ester, acetoacetic acid ethyl ester, acetoacetic acid butyl ester. Esters and the like, and examples of glycol compounds include ethylene glycol, diethylene glycol, triethylene glycol, tetraethylene glycol, propylene glycol, dipropylene glycol, trimethylene glycol, butanediol, hexylene glycol and the like. These may be used alone or in combination of two or more. Further, it may be used as a mixture with tetraalkoxy titanium.
【0012】本発明の塗布液で用いられる(イ)成分
は、上記チタン化合物又はその錯体化合物をオキシ酸と
反応させて得られる反応生成物であるが、オキシ酸とし
ては、例えばグリコール酸、乳酸、ヒドロキシアクリル
酸、オキシ酪酸、リンゴ酸などを挙げることができる
が、特に好ましいのは乳酸である。これらのオキシ酸は
単独で用いてもよいし、また2種以上混合して用いても
よい。The component (a) used in the coating liquid of the present invention is a reaction product obtained by reacting the above titanium compound or its complex compound with an oxyacid. Examples of the oxyacid include glycolic acid and lactic acid. , Hydroxyacrylic acid, oxybutyric acid, malic acid and the like can be mentioned, with lactic acid being particularly preferred. These oxy acids may be used alone or in combination of two or more.
【0013】テトラアルコキシチタン又はその錯体化合
物とオキシ酸との反応は、例えばテトラアルコキシチタ
ン又はその錯体化合物を適当な有機溶剤に溶解し、これ
にオキシ酸を加え、かきまぜることによって行うことが
できる。この際、必要ならば加熱して反応を促進させる
こともできる。The reaction of tetraalkoxytitanium or its complex compound with an oxyacid can be carried out, for example, by dissolving tetraalkoxytitanium or its complex compound in a suitable organic solvent, adding an oxyacid thereto, and stirring. At this time, if necessary, the reaction can be promoted by heating.
【0014】オキシ酸の使用量は、テトラアルコキシチ
タン又はその錯体化合物1モルに対し、0.5〜2.0
モル、好ましくは0.7〜1.2モルの範囲内で選ばれ
る。反応生成物の存在は、例えば、テトラアルコキシチ
タンまたその錯体化合物はそれぞれ単独では、水に溶解
せず、析出したり、ゲル化したりするが、これらとオキ
シ酸を接触させることにより得られる生成物が水に可溶
となることから確認することができる。The amount of the oxy acid used is 0.5 to 2.0 with respect to 1 mol of tetraalkoxy titanium or its complex compound.
It is selected in the range of 0.7 mol to 1 mol, preferably 0.7 to 1.2 mol. The presence of the reaction product is, for example, tetraalkoxytitanium or its complex compound alone does not dissolve in water but precipitates or gels, but a product obtained by contacting these with an oxyacid It can be confirmed from the fact that is soluble in water.
【0015】本発明における(イ)成分は、あらかじめ
調製したものを用いてもよいが、テトラアルコキシチタ
ン又はその錯体化合物と(ロ)成分とを所定の割合で含
む有機溶剤中に所定量のオキシ酸を添加し、その場で生
成させるのが有利である。As the component (a) in the present invention, those prepared in advance may be used, but a predetermined amount of an oxy compound is added to an organic solvent containing tetraalkoxytitanium or its complex compound and the component (b) in a predetermined ratio. It is advantageous to add the acid and generate it in situ.
【0016】次に本発明において(ロ)成分として用い
る金属の可溶性塩は、チタンとともに所望のチタン系複
合酸化物を構成するのに必要な金属の可溶性塩であっ
て、上記の金属は、これまで知られているチタン系複合
酸化物の金属成分の中から任意に選ぶことができ、特に
制限はない。このような金属としては、例えば、Pb、
Sr、Ba、Mg、Zn、Sn、Ni、Nb、Zr、
W、La、Y、Liなどを挙げることができる。Next, the soluble salt of the metal used as the component (b) in the present invention is a soluble salt of the metal necessary to form a desired titanium-based composite oxide together with titanium. It is possible to arbitrarily select from the metal components of titanium-based composite oxides known up to now, and there is no particular limitation. Examples of such a metal include Pb,
Sr, Ba, Mg, Zn, Sn, Ni, Nb, Zr,
Examples thereof include W, La, Y and Li.
【0017】これらの金属の可溶性塩としては、例えば
Ba(CH3COO)2nH2O、La(CH3COO)3
nH2O、Pb(CH3COO)2nH2O、Li(CH3
COO)nH2O、Zn(CH3COO)2nH2O、Sr
(CH3COO)2nH2O、Y(CH3COO)3nH
2O、Mg(CH3COO)2nH2Oなどの有機カルボン
酸塩、これらの有機カルボン酸塩と乳酸との反応生成
物、Ba(NO3)2nH2O、La(NO3)3nH2O、
Pb(NO3)2nH2O、Li(NO3)nH2O、Mg
(NO3)2nH2O、Sr(NO3)2nH2O、Zn(N
O3)2nH2O、Y(NO3)3nH2Oなどの硝酸塩、S
r[OCOCH(CH3)OH]2・H2O、Ba[OC
OCH(CH3)OH]2・H2O、Li[OCOCH
(CH3)OH] 2・H2Oなどの乳酸塩を挙げることが
できるが、これらに限定されるものではなく、塗布液に
使用される有機溶剤に可溶な塩であれば、どのようなも
のでも用いることができる。これらの可溶性塩は、単独
で用いてもよいし、2種以上組み合わせて用いることも
できる。Examples of soluble salts of these metals include, for example,
Ba (CH3COO)2nH2O, La (CH3COO)3
nH2O, Pb (CH3COO)2nH2O, Li (CH3
COO) nH2O, Zn (CH3COO)2nH2O, Sr
(CH3COO)2nH2O, Y (CH3COO)3nH
2O, Mg (CH3COO)2nH2Organic carvone such as O
Acid salt, reaction formation of these organic carboxylates with lactic acid
Thing, Ba (NO3)2nH2O, La (NO3)3nH2O,
Pb (NO3)2nH2O, Li (NO3) NH2O, Mg
(NO3)2nH2O, Sr (NO3)2nH2O, Zn (N
O3)2nH2O, Y (NO3)3nH2Nitrate such as O, S
r [OCOCH (CH3) OH]2・ H2O, Ba [OC
OCH (CH3) OH]2・ H2O, Li [OCOCH
(CH3) OH] 2・ H2Lactate such as O
However, the coating liquid is not limited to these, and
Any salt that is soluble in the organic solvent used
Can also be used. These soluble salts are
May be used, or two or more kinds may be used in combination.
it can.
【0018】(イ)成分と(ロ)成分との使用割合は、
所望の複合酸化物中の各金属の原子比に応じて定められ
るが、通常、チタン1当量当り、それ以外の金属の合計
量0.1〜5当量好ましくは0.2〜3当量の範囲内で
選ばれる。The use ratio of the component (a) and the component (b) is
It is determined depending on the atomic ratio of each metal in the desired complex oxide, but is usually within the range of 0.1 to 5 equivalents, preferably 0.2 to 3 equivalents, per total of 1 equivalent of titanium. Is selected in.
【0019】本発明においては、(イ)成分と(ロ)成
分とをそれらを溶解しうる有機溶剤中に溶解させたもの
であるが、このような有機溶剤としては、例えばメチル
アルコール、エチルアルコール、イソプロピルアルコー
ル、n‐プロピルアルコール、n‐ブチルアルコール、
エチレングリコール、プロピレングリコール、ブチレン
グリコール、ヘキシレングリコール、オクチレングリコ
ール、ジエチレングリコール、ジプロピレングリコー
ル、ジヘキシレングリコール、エチレングリコールモノ
メチルエーテル、エチレングリコールモノエチルエーテ
ル、エチレングリコールモノブチルエーテル、エチレン
グリコールモノプロピルエーテル、エチレングリコール
モノフェニルエーテル、エチレングリコールモノベンジ
ルエーテル、プロピレングリコールモノメチルエーテ
ル、プロピレングリコールモノエチルエーテル、プロピ
レングリコールモノブチルエーテル、エチレングリコー
ルジメチルエーテル、エチレングリコールジエチルエー
テル、エチレングリコールジブチルエーテル、エチレン
グリコールジプロピルエーテル、エチレングリコールジ
ベンジルエーテル、エチレングリコールメチルエチルジ
エーテル、プロピレングリコールジメチルエーテル、プ
ロピレングリコールジエチルエーテル、プロピレングリ
コールジブチルエーテル、メチルカルビトール、エチル
カルビトール、ブチルカルビトール、フェニルカルビト
ール、ベンジルカルビトール、ジメチルカルビトール、
ジエチルカルビトール、ジブチルカルビトール、ジフェ
ニルカルビトール、ジベンジルカルビトール、メチルエ
チルカルビトール、ジプロピレングリコールジメチルエ
ーテル、ジプロピレングリコールジエチルエーテル、ジ
プロピレングリコールジブチルエーテル、乳酸などを挙
げることができる。これらの有機溶剤は単独で用いても
よいし、2種以上混合して用いてもよい。In the present invention, the component (a) and the component (b) are dissolved in an organic solvent capable of dissolving them. Examples of such an organic solvent include methyl alcohol and ethyl alcohol. , Isopropyl alcohol, n-propyl alcohol, n-butyl alcohol,
Ethylene glycol, propylene glycol, butylene glycol, hexylene glycol, octylene glycol, diethylene glycol, dipropylene glycol, dihexylene glycol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, ethylene glycol monopropyl ether, ethylene Glycol monophenyl ether, ethylene glycol monobenzyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, ethylene glycol dibutyl ether, ethylene glycol dipropyl Ether, ethylene glycol dibenzyl ether, ethylene glycol methyl ethyl diether, propylene glycol dimethyl ether, propylene glycol diethyl ether, propylene glycol dibutyl ether, methyl carbitol, ethyl carbitol, butyl carbitol, phenyl carbitol, benzyl carbitol, dimethyl Carbitol,
Examples thereof include diethyl carbitol, dibutyl carbitol, diphenyl carbitol, dibenzyl carbitol, methyl ethyl carbitol, dipropylene glycol dimethyl ether, dipropylene glycol diethyl ether, dipropylene glycol dibutyl ether, and lactic acid. These organic solvents may be used alone or in combination of two or more.
【0020】本発明においては、これらの成分に加え
て、厚膜性の塗膜の形成を容易にするために、所望に応
じ、さらに(ハ)成分として可溶性特にアルコール可溶
性のポリマーを配合することができる。このような可溶
性ポリマーとしては、その分子構造中に水酸基を有する
もの、例えば部分けん化したポリ酢酸ビニル、ポリビニ
ルアルコール、ホルマール樹脂、ブチラール樹脂、ポリ
グリセリンなど、あるいは2‐ヒドロキシメチルアクリ
レート、2‐ヒドロキシメチルメタクリレート、2‐ヒ
ドロキシエチルアクリレート、2‐ヒドロキシエチルメ
タクリレート、2‐ヒドロキシプロピルアクリレート、
2‐ヒドロキシプロピルメタクリレート、2‐ヒドロキ
シブチルアクリレート、2‐ヒドロキシブチルメタクリ
レートなどの水酸基をもつモノマーの単独重合体及び共
重合体を挙げることができる。そのほか、ポリビニルピ
ロリドンのような可溶性ポリマーも用いることができ
る。In the present invention, in addition to these components, in order to facilitate the formation of a thick film, a soluble (particularly) alcohol-soluble polymer may be added as the component (C), if desired. You can Such a soluble polymer has a hydroxyl group in its molecular structure, for example, partially saponified polyvinyl acetate, polyvinyl alcohol, formal resin, butyral resin, polyglycerin, etc., or 2-hydroxymethyl acrylate, 2-hydroxymethyl. Methacrylate, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl acrylate,
Mention may be made of homopolymers and copolymers of monomers having hydroxyl groups such as 2-hydroxypropyl methacrylate, 2-hydroxybutyl acrylate and 2-hydroxybutyl methacrylate. In addition, soluble polymers such as polyvinylpyrrolidone can also be used.
【0021】これらの可溶性ポリマーは、塗布液中に含
まれる(イ)成分と(ロ)成分の合計量100重量部当
り1〜100重量部好ましくは3〜40重量部の範囲内
で配合される。この量が1重量部未満のものでは、1回
の塗布で厚膜の塗膜を形成することが困難になるし、1
00重量部よりも多くなると、形成されるチタン系複合
酸化物の物性が低下する。These soluble polymers are added in an amount of 1 to 100 parts by weight, preferably 3 to 40 parts by weight, per 100 parts by weight of the total amount of the components (a) and (b) contained in the coating liquid. . If this amount is less than 1 part by weight, it becomes difficult to form a thick coating film by one-time application.
If the amount is more than 100 parts by weight, the physical properties of the titanium-based composite oxide formed will deteriorate.
【0022】本発明の塗布液は、所定の有機溶剤中に、
(イ)成分と(ロ)成分及び場合により(ハ)成分を、
全固形成分濃度が5〜50重量%の範囲になるように溶
解し、十分に分散させることによって調製される。The coating solution of the present invention is prepared by adding
(A) component and (b) component and (ha) component in some cases,
It is prepared by dissolving and fully dispersing so that the total solid component concentration is in the range of 5 to 50% by weight.
【0023】このようにして得られた本発明の塗布液
は、プラスチックス、ガラス、セラミックス、金属ナイ
トライドや金属カーボネートなどの粉末を焼成して得ら
れた基板、金属、半導体基板などに塗布され、加熱する
ことで均一性に優れた強誘電体膜である複合金属酸化物
被膜を形成することができる。この場合の塗布手段とし
ては浸漬引き上げ法、スプレー法、スピンコート法、刷
毛塗り法、ロールコート法、印刷法、減圧吹付け法(L
SCUD法)のいずれの方法でも用いることができる。
また加熱手段としてはホットプレート加熱、熱風加熱、
バーナー加熱、赤外線加熱、レーザー加熱、高周波加
熱、急速加熱法(RTA法)などを挙げることができ
る。加熱温度は250℃以上、好ましくは350℃以上
で化学的に安定した被膜を形成することができるが、基
板の材質などにより制限を受けるので、基板が耐えられ
る温度内で適宜選択する必要がある。The coating solution of the present invention thus obtained is applied to substrates, metals, semiconductor substrates, etc. obtained by firing powders of plastics, glass, ceramics, metal nitrides, metal carbonates and the like. By heating, it is possible to form a composite metal oxide film which is a ferroelectric film having excellent uniformity. As the coating means in this case, a dipping and pulling method, a spray method, a spin coating method, a brush coating method, a roll coating method, a printing method, a reduced pressure spraying method (L
Any of the SCUD method) can be used.
As heating means, hot plate heating, hot air heating,
Burner heating, infrared heating, laser heating, high frequency heating, rapid heating method (RTA method) and the like can be mentioned. A heating temperature of 250 ° C. or higher, preferably 350 ° C. or higher can form a chemically stable coating film, but it is limited by the material of the substrate, so it must be appropriately selected within a temperature that the substrate can withstand. .
【0024】[0024]
【発明の効果】本発明の塗布液は、従来の塗布液に比べ
て極めて優れた保存安定性を示し、長期間にわたって保
存してもその性能が低下することはないし、また、1回
の塗布により、容易に所望の膜厚の複合酸化物膜を基板
上に形成しうるという利点を有するので、基板上に強誘
電体膜のような特定の電気的特性をもつセラミックス膜
を形成させるための塗布液として好適である。The coating liquid of the present invention exhibits extremely excellent storage stability as compared with conventional coating liquids, and its performance does not deteriorate even after storage for a long period of time. Has an advantage that a complex oxide film having a desired film thickness can be easily formed on a substrate. Therefore, it is possible to form a ceramic film having specific electric characteristics such as a ferroelectric film on a substrate. It is suitable as a coating liquid.
【0025】[0025]
【実施例】次に実施例により本発明をさらに詳細に説明
する。EXAMPLES The present invention will be described in more detail with reference to examples.
【0026】実施例1 エチレングリコールモノメチルエーテル500gと乳酸
540gとを均一混合し、その中に酢酸ストロンチウム
半水塩107.36g(0.5モル)と酢酸バリウム1
29.7g(0.5モル)とを加え、1〜2時間反応さ
せて得られた溶液に、テトラブトキシチタン343.8
6g(1モル)をゆっくり加えて反応させて得られた溶
液168.9gに、エチレングリコールモノメチルエー
テル250gを加え、均一に希釈したものを0.45μ
mのフィルターにかけて塗布液を調製した。Example 1 500 g of ethylene glycol monomethyl ether and 540 g of lactic acid were uniformly mixed, and 107.36 g (0.5 mol) of strontium acetate hemihydrate and 1 barium acetate were mixed therein.
To the solution obtained by adding 29.7 g (0.5 mol) and reacting for 1 to 2 hours, tetrabutoxy titanium 343.8.
To 168.9 g of a solution obtained by slowly adding 6 g (1 mol) and adding 250 g of ethylene glycol monomethyl ether, and uniformly diluting 0.45 μm.
A coating solution was prepared by applying a filter of m.
【0027】次いで、3インチシリコウエーハ上に、塗
布液をスピンナーで、2000rpmの回転数で塗布
し、塗布膜を得た。そして140℃、300℃、500
℃、700℃と各々30分間焼成処理を行うことで透明
で均一な膜厚760Åの強誘電体膜を形成することがで
きた。Next, the coating solution was applied onto a 3-inch silicon wafer with a spinner at a rotation speed of 2000 rpm to obtain a coating film. And 140 ℃, 300 ℃, 500
A transparent and uniform ferroelectric film having a film thickness of 760 Å could be formed by carrying out a baking treatment at 30 ° C. and 700 ° C. for 30 minutes each.
【0028】また、調製した塗布液は室温で3か月間静
置しても、塗布液中に析出物などは全く認められなかっ
た。Further, even when the prepared coating solution was allowed to stand at room temperature for 3 months, no deposits and the like were found in the coating solution.
【0029】実施例2 エチレングリコールモノメチルエーテル500gと乳酸
360gとを均一に混合し、その中に酢酸ストロンチウ
ム半水塩64.4g(0.3モル)と酢酸バリウム17
8.8g(0.7モル)とを加え、1〜2時間反応させ
て得られた溶液に、テトラブトキシチタン343.86
g(1モル)をゆっくりと加えて反応させて得られた溶
液144.71gに、純水7.2gとエチレングリコー
ルモノメチルエーテル275gを加え、均一に希釈した
ものを0.45μmのフィルターにかけて塗布液を調製
した。Example 2 500 g of ethylene glycol monomethyl ether and 360 g of lactic acid were uniformly mixed, and 64.4 g (0.3 mol) of strontium acetate hemihydrate and 17 barium acetate were mixed therein.
To the solution obtained by adding 8.8 g (0.7 mol) and reacting for 1-2 hours, tetrabutoxy titanium 343.86.
g (1 mol) was slowly added and reacted to obtain 144.71 g of a solution, to which 7.2 g of pure water and 275 g of ethylene glycol monomethyl ether were added and uniformly diluted to obtain a coating solution with a 0.45 μm filter. Was prepared.
【0030】次いで、3インチシリコンウエーハ上に、
塗布液をスピンナーで、2000rpmの回転数で塗布
し、塗布膜を得た。そしてこの塗布膜に対して実施例1
と同様の操作で被膜を形成した結果、透明で均一な膜厚
750Åの強誘電体膜が形成された。また、この塗布液
は室温で3か月静置しても、塗布液中に析出物などは全
く認められなかった。Next, on a 3-inch silicon wafer,
The coating liquid was applied with a spinner at a rotation speed of 2000 rpm to obtain a coating film. Then, for this coating film, Example 1
As a result of forming a film by the same operation as above, a transparent and uniform ferroelectric film having a film thickness of 750Å was formed. Further, even when this coating solution was allowed to stand at room temperature for 3 months, no deposits and the like were observed in the coating solution.
【0031】実施例3 実施例2と同様にして反応させて得られた溶液144.
71gに、純水7.2gとエチレングリコールモノメチ
ルエーテル250gを加え、均一に希釈し、さらにアセ
ト酢酸エチルエステル175gを加えてかきまぜて反応
させた。次にこの反応溶液に、ポリヒドロキシエチルメ
タクリレートの26.3重量%エチレングリコールモノ
メチルエーテル溶液を44.47gを加えて、均一に混
合したものを0.45μmのフィルターにかけて塗布液
を調製した。Example 3 Solution 144 obtained by reacting in the same manner as in Example 144.
To 71 g, 7.2 g of pure water and 250 g of ethylene glycol monomethyl ether were added and uniformly diluted, and 175 g of acetoacetic acid ethyl ester was further added and stirred and reacted. Next, 44.47 g of a 26.3 wt% ethylene glycol monomethyl ether solution of polyhydroxyethyl methacrylate was added to this reaction solution, and the mixture was uniformly mixed and filtered through a 0.45 μm filter to prepare a coating solution.
【0032】次いで、3インチシリコウエーハ上に、塗
布液をスピンナーで、2000rpmの回転数で塗布
し、塗布膜を得た。そしてこの塗布膜に対して実施例1
と同様の操作で被膜を形成した結果、透明で均一な膜厚
930Åの強誘電体膜が形成された。また、この塗布液
は室温で3か月静置しても、塗布液中に析出物などは全
く認められなかった。Next, the coating liquid was applied onto a 3-inch silicon wafer with a spinner at a rotation speed of 2000 rpm to obtain a coating film. Then, for this coating film, Example 1
As a result of forming a film by the same operation as above, a transparent and uniform ferroelectric film having a film thickness of 930Å was formed. Further, even when this coating solution was allowed to stand at room temperature for 3 months, no deposits and the like were observed in the coating solution.
【0033】実施例4 エチレングリコールモノメチルエーテル300gとプロ
ピレングリコール152.2gと乳酸360.32gと
を均一に混合し、酢酸ストロンチウム半水塩214.7
2g(1モル)を加え、1〜2時間反応させて得られた
溶液に、テトラブトキシチタン343.86g(1モ
ル)とプロピレングリコール6.1gと乳酸90.08
gから成る溶液を加えて、均一に混合したのち、エチレ
ングリコールモノメチルエーテル500gとプロピレン
グリコール500gを加え、均一に希釈したものを0.
45μmのフィルターにかけて塗布液を調製した。Example 4 300 g of ethylene glycol monomethyl ether, 152.2 g of propylene glycol and 360.32 g of lactic acid were uniformly mixed to obtain 214.7 strontium acetate hemihydrate.
To the solution obtained by adding 2 g (1 mol) and reacting for 1 to 2 hours, 343.86 g (1 mol) of tetrabutoxy titanium, 6.1 g of propylene glycol and 90.08 of lactic acid were added.
After adding a solution consisting of 500 g and uniformly mixing, 500 g of ethylene glycol monomethyl ether and 500 g of propylene glycol were added and uniformly diluted to 0.
A coating solution was prepared by applying a 45 μm filter.
【0034】次いで、3インチシリコウエーハ上に、塗
布液をスピンナーで、6000rpmの回転数で塗布
し、塗布液を得た。そしてこの塗布膜に対して実施例1
と同様の操作で被膜を形成した結果、透明で均一な膜厚
750Åの強誘電体膜が形成された。また、この塗布液
は室温で3か月静置しても、塗布液中に析出物などは全
く認められなかった。Next, the coating solution was applied onto a 3-inch silicon wafer with a spinner at a rotation speed of 6000 rpm to obtain a coating solution. Then, for this coating film, Example 1
As a result of forming a film by the same operation as above, a transparent and uniform ferroelectric film having a film thickness of 750Å was formed. Further, even when this coating solution was allowed to stand at room temperature for 3 months, no deposits and the like were observed in the coating solution.
【0035】実施例5 エチレングリコールモノメチルエーテル500gと乳酸
360gとを均一に混合し、酢酸バリウム255.44
g(1モル)を加え、1〜2時間反応させて得られた溶
液に、テトラブトキシチタン343.86g(1モル)
をゆっくりと加えて反応させ、さらに純水72gとエチ
レングリコールモノメチルエーテル109.44gを加
えて希釈し、さらにポリヒドロキシプロピルメタクリレ
ートの19.5重量%エチレングリコールモノメチルエ
ーテル溶液600gを加え、混合したものを0.45μ
mのフィルターにかけて塗布液を調製した。Example 5 500 g of ethylene glycol monomethyl ether and 360 g of lactic acid were uniformly mixed, and barium acetate of 255.44 was mixed.
g (1 mol) was added, and the solution obtained by reacting for 1 to 2 hours was added with tetrabutoxy titanium 343.86 g (1 mol).
Was slowly added to cause a reaction, 72 g of pure water and 109.44 g of ethylene glycol monomethyl ether were added to dilute, 600 g of a 19.5 wt% ethylene glycol monomethyl ether solution of polyhydroxypropyl methacrylate was further added, and the mixture was mixed. 0.45μ
A coating solution was prepared by applying a filter of m.
【0036】次いで、3インチシリコウエーハ上に、塗
布液をスピンナーで、2000rpmの回転数で塗布
し、塗布膜を得た。そしてこの塗布膜に対して実施例1
と同様の操作で被膜を形成した結果、透明で均一な膜厚
2250Åの強誘電体膜が形成された。また、この塗布
液は室温で3か月静置しても、塗布液中に析出物などは
全く認められなかった。Next, the coating liquid was applied onto a 3-inch silicon wafer with a spinner at a rotation speed of 2000 rpm to obtain a coating film. Then, for this coating film, Example 1
As a result of forming a film by the same operation as above, a transparent and uniform ferroelectric film having a film thickness of 2250 Å was formed. Further, even when this coating solution was allowed to stand at room temperature for 3 months, no deposits and the like were observed in the coating solution.
【0037】実施例6 エチレングリコールモノメチルエーテル500gと乳酸
360gとを均一に混合し、酢酸バリウム76.63g
(0.3モル)と酢酸ストロンチウム半水塩150.3
g(0.7モル)とを加え、2〜3時間反応させて得ら
れた溶液に、テトラブトキシチタン343.86g(1
モル)中へアセチルアセトン100.12gを加えて得
られた溶液を加えて、均一に混合したのち、純水72g
とエチレングリコールモノメチルエーテル1750gを
加え、均一に希釈したものを0.45μmのフィルター
にかけて塗布液を調製した。Example 6 500 g of ethylene glycol monomethyl ether and 360 g of lactic acid were uniformly mixed, and 76.63 g of barium acetate was mixed.
(0.3 mol) and strontium acetate hemihydrate 150.3
g (0.7 mol), and the solution obtained by reacting for 2 to 3 hours had 343.86 g (1
(Mole), and then the solution obtained by adding 100.12 g of acetylacetone was added and uniformly mixed, and then 72 g of pure water
And 1750 g of ethylene glycol monomethyl ether were added, and the mixture was uniformly diluted and filtered through a 0.45 μm filter to prepare a coating solution.
【0038】次いで、3インチシリコウエーハ上に、塗
布液をスピンナーで、2000rpmの回転数で塗布
し、塗布膜を得た。そしてこの塗布膜に対して実施例1
と同様の操作で被膜を形成した結果、透明で膜厚750
Åの強誘電体膜が形成された。また、この塗布液は室温
で3か月静置しても、塗布液中に析出物などは全く認め
られなかった。Next, the coating solution was applied onto a 3-inch silicon wafer with a spinner at a rotation speed of 2000 rpm to obtain a coating film. Then, for this coating film, Example 1
As a result of forming a film by the same operation as above, the film is transparent and has a film thickness of 750.
A Å ferroelectric film was formed. Further, even when this coating solution was allowed to stand at room temperature for 3 months, no deposits and the like were observed in the coating solution.
【0039】実施例7 テトラブトキシチタン343.86g(1モル)に、エ
チレングリコールモノメチルエーテル750gを加え、
さらに乳酸180gを加えて得られた溶液に、アセチル
アセトン385gとエチレングリコールモノメチルエー
テル1500gと硝酸ビスマス5水塩646.75g
(1.3モル)との混合溶液を加えたものを、0.45
μmのフィルターにかけて塗布液を調製した。Example 7 To 343.86 g (1 mol) of tetrabutoxy titanium was added 750 g of ethylene glycol monomethyl ether,
To the solution obtained by further adding 180 g of lactic acid, 385 g of acetylacetone, 1500 g of ethylene glycol monomethyl ether, and 646.75 g of bismuth nitrate pentahydrate.
What added the mixed solution with (1.3 mol) was 0.45
A coating solution was prepared by applying a filter of μm.
【0040】次いで、3インチシリコンウエーハ上に、
塗布液をスピンナーで、2000rpmの回転数で塗布
し、塗布膜を得た。そしてこの塗布膜に対して実施例1
と同様の操作で被膜を形成した結果、透明で均一な膜厚
860Åの強誘電体膜が形成された。また、この塗布液
は室温で3か月静置しても、塗布液中に析出物などは全
く認められなかった。Then, on a 3 inch silicon wafer,
The coating liquid was applied with a spinner at a rotation speed of 2000 rpm to obtain a coating film. Then, for this coating film, Example 1
As a result of forming a film by the same operation as described above, a transparent and uniform ferroelectric film having a film thickness of 860Å was formed. Further, even when this coating solution was allowed to stand at room temperature for 3 months, no deposits and the like were observed in the coating solution.
【0041】実施例8 テトラブトキシチタン343.86g(1モル)に、プ
ロピレングリコール76.1gを加え、さらに乳酸9
0.08gを加えて得られた溶液に、プロピレングリコ
ール152.2gとエチレングリコールモノメチルエー
テル800gと乳酸360.32gと酢酸ストロンチウ
ム半水塩64.40g(0.3モル)と酢酸バリウム1
78.80gとの混合溶液を加えたものを、0.45μ
mのフィルターにかけて塗布液を調製した。Example 8 To 343.86 g (1 mol) of tetrabutoxytitanium was added 76.1 g of propylene glycol, and lactic acid 9 was added.
To the solution obtained by adding 0.08 g, 152.2 g of propylene glycol, 800 g of ethylene glycol monomethyl ether, 360.32 g of lactic acid, 64.40 g (0.3 mol) of strontium acetate hemihydrate and 1 barium acetate.
What added the mixed solution with 78.80g is 0.45μ
A coating solution was prepared by applying a filter of m.
【0042】次いで、3インチシリコウエーハ上に、塗
布液をスピンナーで、4000rpmの回転数で塗布
し、塗布膜を得た。そしてこの塗布膜に対して実施例1
と同様の操作で被膜を形成した結果、透明で均一な膜厚
750Åの強誘電体膜が形成された。また、この塗布液
は室温で3か月静置しても、塗布液中に析出物などは全
く認められなかった。Next, the coating liquid was applied onto a 3-inch silicon wafer with a spinner at a rotation speed of 4000 rpm to obtain a coating film. Then, for this coating film, Example 1
As a result of forming a film by the same operation as above, a transparent and uniform ferroelectric film having a film thickness of 750Å was formed. Further, even when this coating solution was allowed to stand at room temperature for 3 months, no deposits and the like were observed in the coating solution.
【0043】実施例9 テトラアルコキシチタンと乳酸との反応物として市販さ
れているTLA(商品名、日本曹達社製)340gをエ
チレングリコールモノメチルエーテル500gに加え、
さらに酢酸ストロンチウム半水塩107.36g(0.
5モル)と酢酸バリウム129.7g(0.5モル)を
加え、1〜2時間反応させて得られた溶液に、エチレン
グリコールモノメチルエーテル250gを加えたもの
を、0.45μmのフィルターにかけて塗布液を調製し
た。Example 9 340 g of TLA (trade name, manufactured by Nippon Soda Co., Ltd.) commercially available as a reaction product of tetraalkoxytitanium and lactic acid was added to 500 g of ethylene glycol monomethyl ether,
Further, 107.36 g of strontium acetate hemihydrate (0.
5 mol) and 129.7 g (0.5 mol) of barium acetate and reacted for 1-2 hours, 250 g of ethylene glycol monomethyl ether was added to the solution, and the solution was applied to a 0.45 μm filter. Was prepared.
【0044】次いで、3インチシリコウエーハ上に、塗
布液をスピンナーで、2000rpmの回転数で塗布
し、塗布膜を得た。そしてこの塗布膜に対して実施例1
と同様の操作で被膜を形成した結果、透明で均一な膜厚
750Åの強誘電体膜が形成された。また、この塗布液
は室温で3か月静置しても、塗布液中に析出物などは全
く認められなかった。Next, the coating liquid was applied onto a 3-inch silicon wafer with a spinner at a rotation speed of 2000 rpm to obtain a coating film. Then, for this coating film, Example 1
As a result of forming a film by the same operation as above, a transparent and uniform ferroelectric film having a film thickness of 750Å was formed. Further, even when this coating solution was allowed to stand at room temperature for 3 months, no deposits and the like were observed in the coating solution.
【0045】実施例10 テトラブトキシチタンとアセチルアセトンとの反応物と
して市販されているTAA(商品名、日本曹達社製)3
40gとエチレングリコールモノメチルエーテル500
gと乳酸540gとを均一混合し、さらに酢酸ストロン
チウム107.36g(0.5モル)と酢酸バリウム1
29.7g(0.5モル)を加え、1〜2時間反応させ
て得られた溶液に、エチレングリコールモノメチルエー
テル250gを加えたものを、0.45μmのフィルタ
ーにかけて塗布液を調製した。Example 10 TAA (trade name, manufactured by Nippon Soda Co., Ltd.) 3 which is commercially available as a reaction product of tetrabutoxytitanium and acetylacetone
40 g and ethylene glycol monomethyl ether 500
g and 540 g of lactic acid are uniformly mixed, and 107.36 g (0.5 mol) of strontium acetate and 1 barium acetate are further mixed.
To the solution obtained by adding 29.7 g (0.5 mol) and reacting for 1 to 2 hours, 250 g of ethylene glycol monomethyl ether was added, and the solution was filtered through a 0.45 μm filter to prepare a coating solution.
【0046】次いで、3インチシリコウエーハ上に、塗
布液をスピンナーで、2000rpmの回転数で塗布
し、塗布膜を得た。そしてこの塗布膜に対して実施例1
と同様の操作で被膜を形成した結果、透明で均一な膜厚
750Åの強誘電体膜が形成された。また、この塗布液
は室温で3か月静置しても、塗布液中に析出物などは全
く認められなかった。Then, the coating solution was applied onto a 3-inch silicon wafer with a spinner at a rotation speed of 2000 rpm to obtain a coating film. Then, for this coating film, Example 1
As a result of forming a film by the same operation as above, a transparent and uniform ferroelectric film having a film thickness of 750Å was formed. Further, even when this coating solution was allowed to stand at room temperature for 3 months, no deposits and the like were observed in the coating solution.
【0047】比較例1 実施例1の塗布液調製において、乳酸を除いた以外は実
施例1と同様の操作で塗布液を調製したが、その塗布液
は調製時に白濁し、ゲル化物が確認され、強誘電体膜の
形成塗布液として使用できるものではなかった。Comparative Example 1 A coating solution was prepared in the same manner as in Example 1 except that lactic acid was removed in the preparation of the coating solution of Example 1. The coating solution became cloudy at the time of preparation and a gelled substance was confirmed. However, it cannot be used as a coating liquid for forming a ferroelectric film.
【0048】比較例2 実施例7の塗布液調製において、乳酸を除いた以外は実
施例1と同様の操作で塗布液を調製したが、その塗布液
は調製時に白濁し、ゲル化物が確認され、強誘電体膜の
形成塗布液として使用できるものではなかった。Comparative Example 2 A coating solution was prepared in the same manner as in Example 1 except that lactic acid was removed in the preparation of the coating solution of Example 7, but the coating solution became cloudy at the time of preparation and a gelled substance was confirmed. However, it cannot be used as a coating liquid for forming a ferroelectric film.
【0049】比較例3 実施例8の塗布液調製において、乳酸を除いた以外は実
施例1と同様の操作で塗布液を調製したが、その塗布液
は調製時に白濁し、ゲル化物が確認され、強誘電体膜の
形成塗布液として使用できるものではなかった。Comparative Example 3 A coating solution was prepared in the same manner as in Example 1 except that lactic acid was removed in the preparation of the coating solution of Example 8. The coating solution became cloudy at the time of preparation and a gelled substance was confirmed. However, it cannot be used as a coating liquid for forming a ferroelectric film.
Claims (3)
錯体化合物と、オキシ酸との反応生成物、及び(ロ)チ
タン系複合酸化物の成分となるチタン以外の金属の可溶
性塩を含む有機溶剤性溶液から成るチタン系複合酸化物
形成用塗布液。1. An organic solvent-based material containing (a) a reaction product of tetraalkoxytitanium or a complex compound thereof and an oxyacid, and (b) a soluble salt of a metal other than titanium as a component of a titanium-based composite oxide. A coating liquid for forming a titanium-based composite oxide, which is a solution.
Pb、Sr、Ba、Mg、Zn、Sn、Ni、Nb、Z
r、W、La、Y及びLiの中から選ばれた少なくとも
1種である請求項1記載のチタン系複合酸化物形成用塗
布液。2. The metal as a component of the titanium-based composite oxide is Pb, Sr, Ba, Mg, Zn, Sn, Ni, Nb, Z.
The coating liquid for forming a titanium-based composite oxide according to claim 1, which is at least one selected from r, W, La, Y and Li.
0重量部当り、1〜100重量部の可溶性ポリマーを配
合した請求項1又は2記載のチタン系複合酸化物形成用
塗布液。3. The total amount of component (a) and component (b) is 10
The coating liquid for forming a titanium-based complex oxide according to claim 1 or 2, wherein 1 to 100 parts by weight of a soluble polymer is blended per 0 part by weight.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23829093A JPH0790594A (en) | 1993-09-24 | 1993-09-24 | Coating solution for forming titanium based multiple oxide |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23829093A JPH0790594A (en) | 1993-09-24 | 1993-09-24 | Coating solution for forming titanium based multiple oxide |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0790594A true JPH0790594A (en) | 1995-04-04 |
Family
ID=17027995
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP23829093A Pending JPH0790594A (en) | 1993-09-24 | 1993-09-24 | Coating solution for forming titanium based multiple oxide |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0790594A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000007336A (en) * | 1998-06-10 | 2000-01-11 | Industrial Research Ltd | Production of complex |
JP2003017663A (en) * | 2001-06-29 | 2003-01-17 | Rohm Co Ltd | Ferroelectric memory |
KR100444892B1 (en) * | 2001-06-01 | 2004-08-18 | 티오켐 주식회사 | Synthesis of highly active photocatalytic TiO2-sol containing active metals |
JP2006176385A (en) * | 2004-12-24 | 2006-07-06 | Seiko Epson Corp | Precursor composition, method for producing precursor composition, ink for ink jet coating, method for producing ferroelectric film, piezoelectric element, semiconductor device, piezoelectric actuator, ink jet recording head, and ink jet printer |
JP2008143735A (en) * | 2006-12-08 | 2008-06-26 | Showa Denko Kk | Coating agent for forming composite oxide film |
JP2008179521A (en) * | 2007-01-26 | 2008-08-07 | Showa Denko Kk | Coating material for forming complex oxide film |
-
1993
- 1993-09-24 JP JP23829093A patent/JPH0790594A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000007336A (en) * | 1998-06-10 | 2000-01-11 | Industrial Research Ltd | Production of complex |
KR100444892B1 (en) * | 2001-06-01 | 2004-08-18 | 티오켐 주식회사 | Synthesis of highly active photocatalytic TiO2-sol containing active metals |
JP2003017663A (en) * | 2001-06-29 | 2003-01-17 | Rohm Co Ltd | Ferroelectric memory |
JP2006176385A (en) * | 2004-12-24 | 2006-07-06 | Seiko Epson Corp | Precursor composition, method for producing precursor composition, ink for ink jet coating, method for producing ferroelectric film, piezoelectric element, semiconductor device, piezoelectric actuator, ink jet recording head, and ink jet printer |
JP2008143735A (en) * | 2006-12-08 | 2008-06-26 | Showa Denko Kk | Coating agent for forming composite oxide film |
JP2008179521A (en) * | 2007-01-26 | 2008-08-07 | Showa Denko Kk | Coating material for forming complex oxide film |
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