JPH0787899B2 - UV treatment device - Google Patents
UV treatment deviceInfo
- Publication number
- JPH0787899B2 JPH0787899B2 JP16340690A JP16340690A JPH0787899B2 JP H0787899 B2 JPH0787899 B2 JP H0787899B2 JP 16340690 A JP16340690 A JP 16340690A JP 16340690 A JP16340690 A JP 16340690A JP H0787899 B2 JPH0787899 B2 JP H0787899B2
- Authority
- JP
- Japan
- Prior art keywords
- lamp
- ozone
- water cooling
- ultraviolet
- output
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000001816 cooling Methods 0.000 claims description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 17
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 25
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 11
- 239000007789 gas Substances 0.000 description 10
- 229910052753 mercury Inorganic materials 0.000 description 10
- 230000000694 effects Effects 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 238000004381 surface treatment Methods 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000003213 activating effect Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 238000011086 high cleaning Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 102200110702 rs60261494 Human genes 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
Landscapes
- Coating Apparatus (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
- Surface Treatment Of Glass (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Description
【発明の詳細な説明】 産業上の利用分野 本発明は紫外線と紫外線により発生するオゾンとによ
り、ガラス，金属，プラスチック等の固体表面を処理す
る紫外線処理装置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an ultraviolet treatment apparatus for treating a solid surface such as glass, metal or plastic with ultraviolet rays and ozone generated by the ultraviolet rays.
従来の技術とその課題 近年、紫外線ランプを用いて有機汚染物を分解・除去す
る光洗浄や、ガラス・樹脂表面に紫外線を照射して、そ
の表面を改質してコーティングの際のぬれ性改善や、蒸
着膜の密着改善ができる技術が実用化されてきた。この
紫外線を利用した表面処理は洗浄効果が高いことから、
半導体や液晶表示装置の製造分野で有効な利用が期待さ
れている。Conventional technology and its problems In recent years, optical cleaning that decomposes and removes organic contaminants using an ultraviolet lamp, and irradiation of ultraviolet rays on the glass / resin surface to modify the surface to improve wettability during coating In addition, a technique that can improve the adhesion of the deposited film has been put into practical use. Since this surface treatment using ultraviolet rays has a high cleaning effect,
It is expected to be effectively used in the field of manufacturing semiconductors and liquid crystal display devices.
これらに用いられるランプは185nmと254nmを主とした波
長の紫外線を放射し、この185nm紫外線は空気中の酸素
をオゾンに変化させるため、多量のオゾンが発生する。
この185nm,254nmの紫外線とオゾンが被照射体表面に作
用して光洗浄や表面改質の効果をもたらすものである。The lamps used for these emit ultraviolet rays having wavelengths mainly at 185 nm and 254 nm, and the 185 nm ultraviolet rays change oxygen in the air into ozone, so a large amount of ozone is generated.
The 185 nm and 254 nm ultraviolet rays and ozone act on the surface of the irradiated object to bring about the effects of photocleaning and surface modification.
すなわち、185nmの紫外線が有機物の化学結合を切断
し、254nmの紫外線はオゾンに作用して活性化の酸素原
子を作り、切断された有機物と化学反応し、ガス状物質
に変化させたり、新規な表面層を形成したりするといわ
れている。That is, the 185 nm ultraviolet ray cuts the chemical bond of the organic substance, the 254 nm ultraviolet ray acts on ozone to make an activating oxygen atom, chemically reacts with the cut organic substance, and changes into a gaseous substance, It is said to form a surface layer.
紫外線を利用した表面処理は、紫外線照射により発生す
るオゾンを利用する。しかもオゾン濃度が高い方が処理
効率が上がる傾向にある。The surface treatment using ultraviolet rays uses ozone generated by irradiation with ultraviolet rays. Moreover, the treatment efficiency tends to increase as the ozone concentration increases.
一般にオゾンは波長185nmの紫外線の作用によって酸素
を酸化して発生させられ、熱によって分解して酸素に戻
る。したがって照射室内のオゾン濃度は次の３つに依存
する。Generally, ozone is generated by oxidizing oxygen by the action of ultraviolet rays having a wavelength of 185 nm, and is decomposed by heat to return to oxygen. Therefore, the ozone concentration in the irradiation chamber depends on the following three factors.
すなわち、 ランプから放射される紫外線出力が強いほど、 照射室内の雰囲気ガスの酸素濃度が高いほど、 雰囲気ガス中の温度が低いほど、 いずれもオゾン濃度は高くなる。In other words, the higher the UV output emitted from the lamp, the higher the oxygen concentration in the atmosphere gas in the irradiation chamber, and the lower the temperature in the atmosphere gas, the higher the ozone concentration.
紫外線出力は低圧水銀ランプの電力が大きいほど強くな
るが、単に電力を大きくするとランプ自身の発熱によ
り、水銀蒸気圧が高くなって低圧水銀ランプとして存在
しなくなり、185,254nmの紫外線は放射しにくくなる。The UV output becomes stronger as the power of the low-pressure mercury lamp is larger, but if the power is simply increased, the mercury vapor heat becomes higher and the mercury does not exist as a low-pressure mercury lamp. .
そこで発明者はランプの一部を水冷ボードに接触させて
水冷することで電力を大きくした低圧水銀ランプを実現
させることができた。すなわち、ランプアーク長あたり
の電力で示すと、通常の空冷式低圧水銀ランプは0.5W/c
m以下であるが、その４倍以上の2W/cm以上の高出力低圧
水銀ランプを実現することができたものである。Therefore, the inventor was able to realize a low-pressure mercury lamp in which electric power was increased by bringing a part of the lamp into contact with a water cooling board to perform water cooling. That is, in terms of electric power per lamp arc length, a normal air-cooled low-pressure mercury lamp is 0.5 W / c.
Although it is less than m, it is possible to realize a high-power low-pressure mercury lamp of 2 W / cm or more, which is four times that of m or less.
しかし、これらのランプを照射室内で点灯すると、ラン
プ電力が大きくて、照射室内の雰囲気ガス温度が高くな
るため、オゾンの分解によりオゾン濃度が低くなるとい
う問題があった。However, when these lamps are turned on in the irradiation chamber, there is a problem that the lamp power is large and the atmospheric gas temperature in the irradiation chamber is high, so that the ozone concentration is lowered due to the decomposition of ozone.
課題を解決するための手段 本発明は、ランプ管長あたりのランプ電力が2W/cm以上
の紫外線ランプを被処理物の両側に対向して設置した紫
外線処理装置において、ランプの電極部を冷却するため
の水冷ボードと照射室壁面を冷却するための水冷用配管
を備え、かつ、紫外線ランプは被照射物がランプ間の位
置に置かれているときは定格出力で、挿入されていない
ときは定格出力の約半分以下のランプ出力で点灯するこ
とを特徴とする。Means for Solving the Problem The present invention, in a UV treatment apparatus in which a lamp power per lamp tube length is 2 W / cm or more, and an ultraviolet lamp having two or more ultraviolet lamps installed facing each other on an object to be treated is for cooling the electrode part of the lamp. Equipped with a water cooling board and a water cooling pipe for cooling the wall surface of the irradiation chamber, and the UV lamp is the rated output when the irradiated object is placed between the lamps and the rated output when it is not inserted. It is characterized by lighting with a lamp output less than about half of the above.
作用 照射室内の壁面に適当な間隔で水冷用配管を設けてラン
プ水冷用水冷ボードと連通させ、水を通してランプ及び
壁面を冷却する。ランプで加熱される雰囲気ガスは壁面
および水冷用配管に触れて冷却されることでガス温度を
低い値にすることができる。また、被照射物が挿入され
ていない待機中ではランプは定格出力の約半分以下のラ
ンプ出力に切り替えることでランプからのガス加熱をで
きるだけ少なくすることができ、オゾンの加熱分解に起
因するオゾン濃度の低下を低く抑えることができる。Action Water cooling pipes are provided at appropriate intervals on the wall surface in the irradiation chamber to communicate with the lamp water cooling water cooling board, and water is used to cool the lamp and wall surface. The ambient gas heated by the lamp is brought into contact with the wall surface and the water cooling pipe to be cooled, so that the gas temperature can be lowered. In addition, by switching the lamp output to a lamp output that is less than about half of the rated output during standby when no irradiation target is inserted, the gas heating from the lamp can be reduced as much as possible, and the ozone concentration caused by the thermal decomposition of ozone can be reduced. It is possible to suppress the decrease of
実施例 以下、本発明を好適な実施例を用いて説明する。Examples Hereinafter, the present invention will be described using preferred examples.
第１図は本発明による表面処理装置の概略図である。装
置内には185nmと254nmを主として放射する合成石英製の
低圧水銀ランプ１が２本配置され、治具３で支えられた
被処理物２を両側から照射して処理する。FIG. 1 is a schematic view of a surface treatment apparatus according to the present invention. Two low-pressure mercury lamps 1 made of synthetic quartz, which mainly radiate 185 nm and 254 nm, are arranged in the apparatus, and an object to be processed 2 supported by a jig 3 is irradiated from both sides for processing.
ランプ１は高出力化するための電極部を金属ブロック４
で覆い、水冷されたボード５に接触させ冷却する。これ
によって、ランプアーク長1m,ランプ電力400Wの高出力
低圧水銀ランプが得られた。The lamp 1 has a metal block 4 with an electrode portion for high output.
Then, the board 5 is covered with water and cooled by bringing it into contact with the water-cooled board 5. As a result, a high-output low-pressure mercury lamp with a lamp arc length of 1 m and a lamp power of 400 W was obtained.
照射室壁面には、水冷用配管６が接触して設けられ水冷
ボード５とホース７によって直列に連通され、これに水
を通すことで照射室壁面を冷却して室内の雰囲気ガス温
度を低く維持できるようにしている。A water cooling pipe 6 is provided in contact with the wall surface of the irradiation chamber and is connected in series by a water cooling board 5 and a hose 7. By passing water through this, the wall surface of the irradiation chamber is cooled to keep the ambient gas temperature in the room low. I am able to do it.
ランプ１は被処理物２が挿入されているときは定格出力
の400Wとするが、挿入されていない待機中では定格出力
の約半分の200Wに切替えられるようにしている。The lamp 1 has a rated output of 400 W when the object to be processed 2 is inserted, but can be switched to 200 W, which is about half of the rated output, in the standby state when the object 2 is not inserted.
これにより、対向しているランプから相互に加熱されて
高温となり、ランプ寿命が短くなるのを防止できると共
に、照射中と待機中のサイクル条件にもよるが、照射室
内のガス温度も低下して、加熱によるオゾン分解を抑え
てオゾン濃度が低下するのを防止する効果もある。This prevents the lamps that are facing each other from being heated to high temperatures and shortening the lamp life, and also reduces the gas temperature in the irradiation chamber, depending on the cycle conditions during irradiation and standby. Also, it has an effect of suppressing ozone decomposition due to heating and preventing a decrease in ozone concentration.
なお、装置中のオゾンガスは排気口８から排気ダクト９
を介して、オゾンガス分解フィルタ10,排気ブロワ11よ
り構成された排気装置を通って安全基準以下のブロワ濃
度で排出される。In addition, the ozone gas in the apparatus is exhausted from the exhaust port 8 to the exhaust duct 9
Via the ozone gas decomposing filter 10 and the exhaust blower 11 to be discharged at a blower concentration below the safety standard.
第２図は第１図に示した装置において400W低圧水銀ラン
プ点灯後の照射室内のオゾン濃度の変化を示している。FIG. 2 shows changes in the ozone concentration in the irradiation chamber after lighting the 400 W low-pressure mercury lamp in the apparatus shown in FIG.
図中の曲線Ａは従来の装置を用いた場合であり、照射室
壁面を水冷せずランプ出力は切り替えず、待機中でも定
格出力で点灯させている。この場合、オゾン濃度は点灯
数分後t1に最大値がえられるが、照射室内の温度が高く
なる温度安定時t2では最大値の半分以下にまで低下して
いく。A curve A in the figure shows the case where the conventional apparatus is used, the wall surface of the irradiation chamber is not water-cooled, the lamp output is not switched, and the lamp is lit at the rated output even in the standby state. In this case, the ozone concentration reaches its maximum value at t 1 after a few minutes of lighting, but it decreases to less than half of the maximum value at t 2 when the temperature inside the irradiation chamber becomes stable.
一方、曲線Ｂは本発明に基づき壁面を水冷し、照射処理
時間１分，待機時間４分のサイクル条件でランプ出力を
切替えたときのオゾン濃度の変化を示している。この場
合、オゾン濃度が最大値を経過した後でも低下率は小さ
く、高いオゾン濃度が維持された。On the other hand, the curve B shows the change in ozone concentration when the lamp output is switched under the cycle condition of irradiation treatment time of 1 minute and standby time of 4 minutes according to the present invention with water cooling of the wall surface. In this case, the decrease rate was small even after the ozone concentration reached the maximum value, and the high ozone concentration was maintained.
発明の効果 以上説明したように、本発明の紫外線処理装置は高出力
低圧水銀ランプによって発生するオゾンを高濃度に維持
することができ処理効率を高めることができるという効
果を有する。EFFECTS OF THE INVENTION As described above, the ultraviolet treatment apparatus of the present invention has an effect that ozone generated by a high-power low-pressure mercury lamp can be maintained at a high concentration and treatment efficiency can be improved.
第１図は本発明実施例に係る紫外線処理装置の断面図で
ある。 １……ランプ,2……被処理物 ５……水冷ボード,6……水冷用配管 第２図は照射室内のオゾン濃度の変化を示した図であ
る。 Ａ……従来の装置を用いた場合 Ｂ……本発明による装置を用いた場合FIG. 1 is a sectional view of an ultraviolet processing apparatus according to an embodiment of the present invention. 1 ... Lamp, 2 ... Object to be treated 5 ... Water cooling board, 6 ... Piping for water cooling Fig. 2 shows changes in ozone concentration in the irradiation chamber. A: When the conventional device is used B: When the device according to the present invention is used
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 ＦＩ 技術表示箇所 Ｃ２３Ｇ 5/00 9352−4Ｋ Ｆ２５Ｄ 1/02 Ｂ ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Office reference number FI technical display location C23G 5/00 9352-4K F25D 1/02 B
Claims (1)
上の紫外線ランプを被処理物の両側に対向して設置した
紫外線処理装置において、 ランプの電極部を冷却するための水冷ボードと照射室壁
面を冷却するための水冷用配管を備え、 かつ、紫外線ランプは被照射物がランプ間の位置に置か
れているときは定格出力で、挿入されていないときは定
格出力の約半分以下のランプ出力で点灯することを特徴
とする紫外線処理装置。1. An ultraviolet treatment apparatus in which ultraviolet lamps having a lamp power per lamp tube length of 2 W / cm or more are installed facing each other on both sides of an object to be treated, a water cooling board and an irradiation chamber for cooling the electrode parts of the lamp. A water cooling pipe is provided to cool the wall surface, and the UV lamp has a rated output when the object to be irradiated is placed between the lamps, and a lamp that is less than about half the rated output when it is not inserted. An ultraviolet processing device characterized by being turned on at the output.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16340690A JPH0787899B2 (en) | 1990-06-21 | 1990-06-21 | UV treatment device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16340690A JPH0787899B2 (en) | 1990-06-21 | 1990-06-21 | UV treatment device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0459041A JPH0459041A (en) | 1992-02-25 |
| JPH0787899B2 true JPH0787899B2 (en) | 1995-09-27 |
Family
ID=15773290
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16340690A Expired - Lifetime JPH0787899B2 (en) | 1990-06-21 | 1990-06-21 | UV treatment device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0787899B2 (en) |
-
1990
- 1990-06-21 JP JP16340690A patent/JPH0787899B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0459041A (en) | 1992-02-25 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR100324850B1 (en) | Method of and apparatus for removing an organic film | |
| KR100882052B1 (en) | Nitrogen Enriched Cooling Air Module for UV Curing System | |
| US4741800A (en) | Etching method for the manufacture of a semiconductor integrated circuit | |
| JP4407252B2 (en) | Processing equipment | |
| JP3150509B2 (en) | Organic matter removal method and apparatus for using the method | |
| WO1991003075A1 (en) | Gas substrate processing module | |
| TW200306461A (en) | Method and device for decontaminating optical surfaces | |
| JP2001300451A (en) | Ultraviolet irradiation device | |
| JPH0787899B2 (en) | UV treatment device | |
| JP2948110B2 (en) | Method for oxidizing the surface of an object to be treated or a substance on the surface under reduced pressure | |
| JP2000066003A (en) | Method for cleaning optical parts | |
| JP3704965B2 (en) | Dry etching method and apparatus | |
| JPS6253190B2 (en) | ||
| JP3085128B2 (en) | Light cleaning method | |
| JPH0523581A (en) | UV irradiation device | |
| JP2978620B2 (en) | Ashing device for resist film | |
| JPH0611347U (en) | Resist film ashing device | |
| RU2195046C2 (en) | Surface cleaning method | |
| JPH01261831A (en) | Optical asher | |
| JPH0529291A (en) | Ozone treatment equipment | |
| JPH0684843A (en) | Surface treatment apparatus | |
| JP2004311542A (en) | Method of dehydrating optical element | |
| JPH11248902A (en) | Heat-treatment for optical equipment | |
| JPH0611343U (en) | Resist film ashing device | |
| JPH1190370A (en) | Surface treatment device and treatment method |