JPH0766196B2 - Light receiving member - Google Patents

Description

Description: TECHNICAL FIELD The present invention relates to a light receiving member having a photoconductive layer composed of amorphous silicon having a silicon atom as a matrix, and a surface protective layer having particularly excellent characteristics. The present invention relates to a light-receiving member suitable for an electrophotographic photoreceptor provided on a conductive layer.

[Description of Prior Art]

Conventionally, as a light-receiving member used for an electrophotographic photoreceptor or the like, in addition to excellent matching in the light-sensitive region as compared with other types of light-receiving members, it has a high Vickers hardness and is free from pollution. From the viewpoint of few problems, for example, JP-A-54-
An amorphous material containing a silicon atom as a base and containing at least one of a hydrogen atom and a halogen atom (hereinafter referred to as "a-Si (H, X ) ”) The light receiving member is drawing attention.

By the way, such a light receiving member is formed on the support by a-Si.
A photoconductive layer composed of (H, X) prevents the injection of charges from the free surface side into the photoconductive layer when the photoconductive layer is subjected to a charging treatment. ,
A surface protective layer is provided on the photoconductive layer in order to improve moisture resistance, continuous repeated use characteristics, electrical pressure resistance, use environment characteristics, durability, etc. of the photoconductive layer and obtain stable image quality for a long period of time. It is known to provide.

For the surface protective layer, where it is required to efficiently exhibit the above-mentioned various functions, a diamond-like carbon thin film is used as one of various materials having high resistance and sufficient light transmittance. It is known. (See JP-A-60-61761) However, when the diamond-like carbon thin film is used as a surface protective layer, various mechanical damages such as contact with a cleaning blade are prevented and the corona during charging is further prevented. It is particularly effective for preventing alteration of the surface of the light-receiving member due to ozone or ions generated by discharge, but the light-receiving member using the surface protective layer has insufficient electrophotographic properties such as charging ability and dark decay. Therefore, when an image is formed using such a light receiving member, there is a problem that it may appear as a deterioration in image quality such as a ghost on the image.

[Object of the Invention]

The present invention solves the above-mentioned problems relating to the surface protective layer in the light receiving member used for the electrophotographic photoreceptor and the like, and provides a light having an improved surface protective layer that exhibits desired functions over a long period of time. The main purpose is to provide a receiving member.

Another object of the present invention is to provide a light receiving member used for an electrophotographic photoreceptor or the like that has a stable charging ability at all times and can obtain an image of excellent quality for a long period of time.

[Structure of Invention]

The present inventors have solved the above-mentioned problems relating to the surface protective layer in the light-receiving member used for the electrophotographic photoreceptor and the like, and have conducted extensive studies to achieve the above-mentioned object of the present invention. It was found that the above problems can be solved by using a diamond-like carbon thin film containing at least one of atoms and halogen atoms as the surface protective layer.

That is, when a diamond-like carbon thin film containing at least one of a hydrogen atom and a halogen atom is used as a surface protective layer of a receiving member for an electrophotographic photoreceptor, a hydrogen atom (H) or a halogen atom contained in the diamond-like carbon thin film is used. At least one of (X) compensates for dangling bonds of diamond-like carbon, and a surface protective layer having very few defects can be obtained. Furthermore, by containing at least one of a hydrogen atom or a halogen atom in the diamond thin film, the substantial coordination number of each atom constituting the diamond thin film is reduced, and defects of the thin film are reduced, and The adhesion with other layers provided under the layer will also be improved.

Therefore, the light receiving member for an electrophotographic photoreceptor having a surface protective layer formed of a diamond-like carbon thin film containing at least one of a hydrogen atom and a halogen atom has high charging ability, low dark decay, and high It is possible to obtain a photosensitive material that is excellent in various characteristics that an electrophotographic photosensitive member should have, such as having no image deletion, has a high mechanical strength, and has excellent resistance to environmental damage.

The present invention has been completed on the basis of the above findings, and the gist of the invention is a support and a silicon atom as a host material on the support, and at least one of a hydrogen atom and a halogen atom. A photoconductive layer composed of an amorphous material containing one of the two, an amorphous silicon or polycrystalline silicon intermediate layer containing carbon atoms on the photoconductive layer, and at least one of a hydrogen atom or a halogen atom on the intermediate layer. And a light-receiving layer provided with a surface protective layer of a diamond-like carbon thin film containing the light-receiving layer.

The light receiving member provided by the present invention is characterized by its surface protective layer, and not only the support,
Other constituent layers including the photoconductive layer can be arbitrarily selected according to the purpose of use. Therefore, a typical example of the layer structure of the light-receiving member of the present invention will be described below for electrophotography, but the light-receiving member of the present invention is not limited thereto.

FIGS. 1 (A) to 1 (I) are diagrams schematically showing typical examples of the layer structure of the light receiving member of the present invention used for electrophotography.

In the example shown in FIG. 1 (A), the photoconductive layer 102 is formed on the support 101.
And the surface protective layer 103 are provided in this order, and the surface protective layer 103 has a free surface 107.

In the example shown in FIG. 1 (B), a charge injection blocking layer 104, a photoconductive layer 102, and a surface protective layer 103 are provided in this order on a support 101.

In the example shown in FIG. 1 (C), a long-wavelength light absorption layer 105, a photoconductive layer 102, and a surface protective layer 103 are provided in this order on a support 101.

In the example shown in FIG. 1 (D), the adhesion layer 106,
The photoconductive layer 102 and the surface protective layer 103 are provided in this order.

The example shown in FIG. 1 (E) is the charge injection blocking layer 104 and the adhesion layer 10.
6, the photoconductive layer 102 and the surface protection layer 103 are provided in this order. The example shown in the first (F) is a long wavelength light absorption layer 105,
The adhesion layer 106, the photoconductive layer 102, and the surface protective layer 103 are provided in this order.

In the example shown in FIG. 1 (G), a long-wavelength light absorption layer 105, a charge injection blocking layer 104, a photoconductive layer 102, and a surface protective layer 103 are provided in this order on a support 101. In the above, the order of the long wavelength light absorption layer 105 and the charge injection blocking layer 104 can be changed.

In the example shown in FIG. 1 (H), the long wavelength light absorption layer 105, the charge injection blocking layer 104, the adhesion layer 106, and the photoconductive layer 102 are provided on the support 101.
And the surface protective layer 103 are provided in this order.

In the example shown in FIG. 1 (I), a charge injection blocking layer 104, a photoconductive layer 102, an intermediate layer 108, and a surface protective layer 103 are provided in this order on a support 101.

The support 101 used in the light receiving member of the present invention may be either conductive or electrically insulating.
As the conductive support, for example, NiCr, stainless steel, A
Examples thereof include metals such as l, Cr, Mo, Au, Nb, Ta, V, Ti, Pt and Pb, and alloys thereof.

Examples of the electrically insulating support include films or sheets of synthetic resin such as polyester, polyethylene, polycarbonate, cellulose acetate, polypropylene, polyvinyl chloride, polyvinylidene chloride, polystyrene and polyamide, glass, ceramic, paper and the like. It is preferable that at least one surface of these electrically insulating supports is subjected to a conductive treatment, and a light receiving layer is provided on the surface side subjected to the conductive treatment.

For example, glass is NiCr, Al, Cr, M on the surface.
o, Au, Ir, Nb, Ta, V, Ti, Pt, Pd, InO ₃ , ITO (In ₂ O
₃ + Sn) to provide conductivity, or synthetic resin film such as polyester film, NiCr, Al, Ag, Pb, Zn, Ni, Au, Cr, M
A thin film of a metal such as o, Ir, Nb, Ta, V, Tl, or Pt is provided on the surface by vacuum evaporation, electron beam evaporation, sputtering or the like, or the surface is laminated with the above metal to conduct electricity to the surface. Imparts sex. The shape of the support may be a plate-shaped endless belt having a smooth surface or an uneven surface, a cylindrical shape, or the like, and the thickness thereof is appropriately determined so that a desired light-receiving member can be formed. When flexibility as a member is required, it can be made as thin as possible within a range in which the function as a support is sufficiently exhibited. However, from the viewpoint of mechanical strength and the like in terms of production and handling of the support, it is usually 10 μm or more.

In the light receiving member of the present invention shown in FIG. 1 (B), the charge injection blocking layer 10 provided between the support 101 and the photoconductive layer 102.
4 is a layer provided to prevent electrons from being injected into the photoconductive layer 102 from the support side when the photoconductive layer 102 is subjected to a charging treatment, and the charge injection blocking layer 104 is hydrogen. , Or polycrystalline silicon (hereinafter “poly-Si (H, X)”)
I call it. ), Or so-called non-single crystal silicon containing both (hereinafter referred to as “Non-Si (H, X)”).
[Note that what is commonly called microcrystalline silicon is classified into a-Si. ], An atom belonging to Group III of the periodic table (hereinafter simply referred to as "Group III atom") or an atom belonging to Group V of the periodic table (hereinafter simply referred to as "Group V atom"). It is made up of those containing.

The Group III atoms contained in the charge injection blocking layer 104 are specifically B (boron), Al (aluminum), Ga
(Gallium), In (indium), Tl (thallium) and the like can be used, but B and Ga are particularly preferable. Further, as the group V atom, specifically, P
(Phosphorus), As (arsenic), Sb (antimony), Bi (bismuth) and the like can be used, but P and As are particularly preferable. The charge injection blocking layer 104 contains 3 to 5 × 10 ⁴ atomic amounts of group III atoms or group V atoms.
ppm, preferably 50 to 1 × 10 ⁴ atomic ppm, more preferably 1 × 10 ^{2 to} 5 × 10 ³ atomic ppm.

The amount of halogen atoms or hydrogen atoms contained in the charge injection blocking layer 104 is set to 1 × 10 ^{3 to} 7 × 10 ⁵ atomic ppm, which is particularly preferable when it is composed of poly-Si (H, X). Is 1 × 10 ^{3 to} 2 × 10 ⁵ atomic ppm, and a-Si (H, X)
When it is composed of, it is desirable to set 1 × 10 ^{4 to} 6 × 10 ⁵ atomic ppm. Further, the layer thickness of the charge injection blocking layer 104 of the light receiving member of the present invention is 0.03 to 15μ, preferably 0.04 to 10 μm.
μ, optimally 0.05 to 8 μ is desirable.

In the light receiving member of the present invention shown in FIG. 1 (C), a long wavelength light absorbing layer provided between the support 101 and the photoconductive layer 102.
105 is a layer composed of Non-Si (H, X) containing at least one of germanium atom (Ge) and tin atom (Sn), and uses long-wavelength light such as laser light as an exposure light source. The long-wavelength light absorption layer 105 efficiently absorbs the long-wavelength light that could not be completely absorbed by the photoconductive layer 102, so that the interference phenomenon due to the reflection of the long-wavelength light on the surface of the support 101 is revealed. It has a function of remarkably preventing the discharge. And Ge contained in the long wavelength light absorption layer 105
The amount of atoms or the amount of Sn atoms or their sum is 1 to 10
⁶ atomic ppm, preferably 1 × 10 ^{2 to} 9 × 10 ⁵ atomic pp
m, and more preferably 5 × 10 ² to 8 × 10 ⁵ atomic ppm. The amount of hydrogen atoms or halogen atoms contained in the long wavelength light absorption layer 105 is preferably 1 ×.
It is desirable to set 10 ^{3 to} 3 × 10 ⁵ atomic ppm, especially po
In the case of ly-Si (Ge, Sn) (H, X), preferably 1 × 10 ³ to 2
× and ^{10 5 atomic ppm, a-Si} (Ge, Sn) (H, X) it is desirable that the case of the preferably at ^{1 × 10 4 ~6 × 10 5} atomic ppm.

Further, the layer thickness of the long wavelength light absorption layer 105 in the light receiving member of the present invention is 0.05 to 25 μ, preferably 0.07 to 20 μ, and most preferably 0.1 to 15 μ.

In the light receiving member of the present invention shown in FIG. 1 (D), the adhesion layer 106 provided between the support 101 and the photoconductive layer 102 is
A layer having a function of improving the adhesion between the support 101 and the photoconductive layer 102, which contains at least one selected from oxygen atom, carbon atom and nitrogen atom.
(H, X) (hereinafter referred to as "Non-Si (O, C, N) (H, X)"). The amount of oxygen atoms, carbon atoms and nitrogen atoms contained in the adhesive layer 106, or the sum of at least two of them is 100 to 9 × 10 ⁵ atoms.
ic ppm, preferably 100 to 4 × 10 ⁵ atomic ppm. The amount of hydrogen atoms or halogen atoms contained in the adhesion layer 106 or the sum thereof is preferably 10 to 7 × 10 ⁵ atomic ppm, and poly-Si (O, C, N) is particularly preferable.
In the case of (H, X), 10 to 2 × 10 ⁵ atomic ppm, a-Si (O,
In the case of C, N) (H, X), it is desirable to set the concentration to 1 × 10 ^{3 to} 7 × 10 ⁵ atomic ppm.

By the way, the charge injection blocking layer in the light receiving member of the present invention
104, the long wavelength light absorption layer 105 and the adhesion layer 106 can be used in combination, and typical examples thereof are shown in FIGS. 1 (E) to (H).

Further, in the light receiving member of the present invention, the charge injection blocking layer
By containing at least one selected from oxygen atoms, carbon atoms and nitrogen atoms in 104 or long wavelength light absorption layer 105, it is also possible to have these layers also function as an adhesion layer, Also, long-wavelength light absorption layer
By containing a group III atom or a group V atom in 105, or a germanium atom or a tin atom in the charge injection blocking layer 104, a layer having the functions of both layers can be obtained. it can.

By the way, the charge injection blocking layer in the light receiving member of the present invention
104, the long-wavelength light absorption layer 105 and the adhesion layer 106 are made of Non-Si (H,
X) is the base material, but poly-Si
There are various methods for forming the layer composed of (H, X), and the following method can be given as an example.

One of the methods is to raise the substrate temperature to a high temperature, specifically 400 to 4
This is a method of setting a temperature of 50 ° C. and depositing a film on the substrate by a plasma CVD method.

Another method is to first form an amorphous film on the surface of the substrate, that is, plasma C on the substrate whose substrate temperature is about 250 ° C.
In this method, a film is formed by the VD method, and the amorphous film is annealed to form a poly. The annealing treatment is carried out by heating the substrate to 400 to 450 ° C. for about 20 minutes or by irradiating it with laser light for about 20 minutes.

The photoconductive layer 102 of the light receiving member of the present invention is a layer composed of a-Si (H, X) or a-Si (Ge, Sn) (H, X) and having photoconductivity. The layer may further contain at least one selected from Group III atoms or Group V atoms and / or oxygen atoms, carbon atoms and nitrogen atoms.

Specific examples of the halogen atom (X) contained in the photoconductive layer 102 include fluorine, chlorine, bromine and iodine, with fluorine and chlorine being particularly preferable. The amount of hydrogen atoms (H) or the amount of halogen atoms (X) or the sum of the amounts of hydrogen atoms and halogen atoms (H + X) contained in the photoconductive layer 102 is preferably 1 to 40 atomic%, more preferably It is desirable to be 5 to 30 atomic%. Further, the purpose of incorporating a Group III atom or a Group V atom into the photoconductive layer 102 is to control the conductivity of the photoconductive layer 102. As the group III atom and the group V atom, the same ones as those contained in the charge injection blocking layer 104 can be used.
When contained in the photoconductive layer 102, the charge injection blocking layer 1
Incorporation of the opposite polarity to that contained in 04, or inclusion of the same polarity as that contained in the charge injection blocking layer 104 in an amount much smaller than that contained in the layer 104. It can be done.

The amount of the group III atom or the group V atom contained in the photoconductive layer 102 is preferably 1 × 10 ⁻³ to 1 × 10 ₃ atomic ppm,
More preferably, it is 5 × 10 ^{−2 to} 5 × 10 ² atomic ppm, and most preferably 1 × 10 ⁻¹ to 2 × 10 ² atomic ppm.

Further, in the photoconductive layer 102, the purpose of containing at least one selected from oxygen atom, carbon atom and nitrogen atom, while aiming at high dark resistance of the photoconductive layer 102, the film quality of the photoconductive layer 102. To improve. And
The amount of such atoms contained in the photoconductive layer 102 is preferably 1 × 10 ^{−3 to} 50 atomic%, more preferably 2 × 10 ^−3.
-40 atomic%, optimally 3 x ^{10-3 to} 30 atomic% is desirable.

Furthermore, in the photoconductive layer 102, at least one of germanium atom (Ge) and tin atom (Sn) can be contained. The purpose of containing such an atom is
The purpose is to improve sensitivity to long-wavelength light such as laser light, and in this case, the amount of these atoms to be contained in the photoconductive layer 102 is preferably 1 to 9.5 × 10 ⁵ atomic p.
pm is preferred.

Further, in the light receiving member of the present invention, the layer thickness of the photoconductive layer is one of the important factors for efficiently achieving the object of the present invention, and the light receiving member is provided with desired characteristics. As described above, it is necessary to pay sufficient attention when designing the light receiving member, and usually 1 to 100 μm, but preferably 3 to 80 μm.
μ, optimally 5 to 50 μ.

The surface protective layer 103, which is characterized in the light receiving member of the present invention, is provided so as to be located on the photoconductive layer 102 described above.
It has a free surface 107. And the surface protection layer 1
03 is various characteristics required for the light receiving member, that is, moisture resistance,
Continuous repeated use characteristics, electrical pressure resistance, usage environment characteristics,
It also has the function of improving the durability and the like, and in particular, has the function of preventing alteration by the ions and ozone generated by mechanical damage and corona discharge on the surface of the light receiving member, and has excellent electrophotographic characteristics such as charging ability and dark decay. The function of effectively preventing the image deletion and the generation of residual potential at the time of image formation is exhibited.

The surface protection layer 103 of the light-receiving member of the present invention which becomes fragile is composed of a diamond-like carbon thin film containing at least one of a hydrogen atom and a halogen atom, and a hydrogen atom to be contained in the surface protection layer 103 or The amount of halogen atoms or the sum of those amounts is 1 × 10 ² to 4 × 10 ⁵ atom
ic ppm.

In the light receiving member of the present invention, the layer thickness of the surface protective layer 103 is also one of the important factors for efficiently achieving the object of the present invention, and is appropriately determined according to the desired object. However, depending on the amount of constituent atoms contained in the surface protective layer or the characteristics required for the surface protective layer, it is necessary to determine the mutual and organic relationships. In addition, it is necessary to take into consideration the economical efficiency in consideration of productivity and mass productivity.

Therefore, the surface protective layer 10 of the light receiving member of the present invention is
The layer thickness of 3 is preferably 0.003 to 30μ, more preferably 0.
004 to 20μ, optimally 0.005 to 10μ.

Further, in the light receiving member of the present invention, the above-mentioned surface protective layer
An intermediate layer 108 may be formed between 103 and the photoconductive layer 102. The intermediate layer 108 includes a-Si (H,
X) or poly-Si (H, X), and the intermediate layer 10
The amount of carbon atoms contained in 8 is preferably 20 to 90a
tomic%, more preferably 30-85 atomic%, optimally 40
It is desirable to set it to 80 atomic%. Also, the intermediate layer 108
The amount of hydrogen atom (H), the amount of hasgen atom (X), and the amount of hydrogen atom + halogen atom (H + X) contained in the medium are preferably 1 to 70 atomic%, more preferably 2 to
It is preferably 65 atomic%, optimally 5 to 60 atomic%. Furthermore, the layer thickness of the intermediate layer 108 is preferably 0.003 to 30.
μm, more preferably 0.004 to 20 μ, optimally 0.005 to 10
It is preferable that the thickness is μm.

Next, a method for forming the constituent layers of the light receiving member of the present invention will be described.

The amorphous materials constituting the light receiving member of the present invention are all glow discharge methods (low frequency CVD, high frequency CVD or microwave CV
AC discharge CVD such as D, or DC discharge CVD, etc.), sputtering method, vacuum deposition method, ion plating method, light
It can be formed by various thin film deposition methods such as a CVD method and a thermal CVD method. These thin film deposition methods are appropriately selected and adopted depending on factors such as manufacturing conditions, a load level of capital investment, manufacturing scale, and characteristics desired for a light receiving member to be produced. The glow discharge method or the sputtering method is preferable because it is relatively easy to control the conditions for manufacturing the receiving member and the halogen atom and the hydrogen atom can be easily introduced together with the silicon atom. is there. Then, the glow discharge method and the sputtering method may be used together in the same apparatus system.

For example, in order to form a surface protection layer composed of a diamond-like carbon thin film containing at least one of hydrogen atom and halogen atom by glow discharge method, basically, carbon atom (C) which can supply carbon atom can be supplied. A raw material gas for supplying N, a raw material gas for supplying N capable of supplying a nitrogen atom (N), and a raw material gas for introducing a hydrogen atom (H) or / and a halogen atom (X), if necessary, It is introduced into a deposition chamber whose inside can be decompressed, and glow discharge is generated in the deposition chamber to form a deposited film.

As the raw material gas for supplying C, a saturated hydrocarbon compound (C _n H _{2n + 2} , n ≦ 10), an ethylene-based hydrocarbon compound (C
_n H _2n , n ≦ 10), acetylene hydrocarbon compound (C _n H _2n-2 ,
n ≦ 10), a cyclic hydrocarbon compound or a compound in a gas state or gasifiable such as a halogenated compound thereof. Specifically, as a saturated hydrocarbon compound or a halogenated saturated hydrocarbon compound, CH ₃ , C ₂ H ₆ , C ₃ H ₈ , CF ₄ ,
_{CH 3 F, C 2 H 5} F, CCl 4 , etc., C ₂ H ₄ as ethylene hydrocarbon compounds, CH ₂ = CH-CH _3, etc., benzene, toluene, xylene, adamantanone and the like mentioned as cyclic hydrocarbon compounds To be

Further, as the source gas for supplying H and the source gas for supplying X, hydrogen gas, fluorine, chlorine, bromine, halogen gas of iodine, hydrogen halide compound such as HF, HCl, HBr, HI, BrF, Examples thereof include gaseous compounds or gasifiable compounds such as interhalogen compounds such as ClF, ClF ₃ , BrF ₅ , BrF ₃ , IF ₇ , ICl, and IBr.

Further, in order to form the surface protective layer by the sputtering method, a C (graphite) target is used as a target, and the H supply source gas and / or the X supply source gas is introduced into the deposition chamber together with an inert gas such as Ar. Then, a plasma atmosphere is formed, and the C target is sputtered.

In order to form a layer composed of a-Si (H, X) by the glow discharge method, basically, silicon atoms (Si) are required.
Introducing a raw material gas for introducing hydrogen atoms (H) and / or introducing a halogen atom (X), together with a raw material gas for supplying Si, into a deposition chamber where the inside pressure can be reduced,
A glow discharge is generated in the deposition chamber to form a layer of a-Si (H, X) on the surface of a predetermined support placed in advance at a predetermined position.

As the gas for supplying Si, SiH ₄ , Si ₂ H ₆ , Si ₃ H ₈ , Si
₄ H _{10 and} other gas-state or gasifiable silicon hydrides (silanes) can be mentioned. In particular, SiH ₄ , Si ₂ H ₆ is preferable in terms of easiness of layer forming work and good Si supply efficiency. Is preferred.

Further, as the source gas for introducing the halogen atom, many halogen compounds can be mentioned, for example, a halogen gas,
Gaseous or gasifiable halogen compounds such as halides, interhalogen compounds, silane derivatives substituted with halogen are preferred. Specifically, fluorine, chlorine, bromine,
Iodine halogen gas, BrF, ClF, ClF ₃ , BrF ₅ , BrF ₃ ,
Interhalogen compounds such as IF ₇ , ICl, IBr, and SiF ₄ , Si ₂
Examples thereof include silicon halides such as F ₆ , SiCl ₄ , and SiBr ₄ . When the silicon halide in the gas state or gasifiable as described above is used, a layer composed of a-Si having a halogen atom can be formed without separately using a raw material gas for supplying Si. Therefore, it is particularly effective.

Further, as the raw material gas for supplying the hydrogen atoms, hydrogen gas, halides such as HF, HCl, HBr, HI, SiH ₄ , Si
_{2 H 6, Si 3 H 8} , Si 4 H 10 hydride such as silicon or SiH ₂ F _{2,,
SiH 2 I 2, SiH 2 Cl} 2, SiHCl 3, SiH 2 Br 2, SiHBr 3, shall be able to use that can or gasification of gaseous, such as a halogen-substituted silicon hydride etc., use these material gases In that case, it is effective because the content of hydrogen atoms (H), which is extremely effective in controlling the electrical or photoelectric characteristics, can be easily controlled. When the hydrogen halide or the halogen-substituted silicon hydride is used, a hydrogen atom (H) is introduced at the same time as the introduction of the halogen atom, which is particularly effective.

To form a layer of a-Si (H, X) by the reactive sputtering method or the ion plating method, for example, in the case of the sputtering method, for introducing a halogen atom, the halogen compound or the above is used. A silicon compound gas containing a halogen atom may be introduced into the deposition chamber to form a plasma atmosphere of the gas.

Further, when introducing hydrogen atoms, a raw material gas for introducing hydrogen atoms, for example, a gas such as H ₂ or the above-mentioned silanes is introduced into the deposition chamber for sputtering to form a plasma atmosphere of the gas. Good.

For example, in the case of the reactive sputtering method, a Si target is used, and a gas for introducing a halogen atom and an H ₂ gas are introduced into the deposition chamber, including an inert gas such as He and Ar as necessary, and a plasma atmosphere is obtained. And sputtering the Si target to form a-Si (H,
X) is formed.

In order to form a layer composed of a-SiGe (H, X) by the glow discharge method, a source gas for supplying Si, which can supply silicon atoms (Si), and a Ge, which can supply germanium atoms (Ge). A deposition chamber capable of reducing the pressure of the source gas for supply and the source gas for supplying hydrogen atom (H) and / or halogen atom (X) capable of supplying hydrogen atom (H) and / or halogen atom (X) Is introduced into the deposition chamber at a desired gas pressure, a glow discharge is caused to occur in the deposition chamber, and a layer composed of a-SiGe (H, X) is formed on the surface of a predetermined support previously installed at a predetermined position. To form.

Source gas for supplying Si, source gas for supplying halogen atoms,
As the substance that can be used as the raw material gas for supplying hydrogen atoms, those used when forming the layer composed of a-Si (H, X) described above are used as they are.

Further, as the substance that can be the raw material gas for supplying Ge, GeH ₄ , Ge ₂ H ₆ , Ge ₃ H ₈ , Ge ₄ H ₁₀ , Ge ₅ H ₁₂ , Ge ₆ H ₁₄ , Ge
It is possible to use germanium hydride in a gas state or gasifiable such as ₇ H ₁₆ , Ge ₈ H ₁₈ , and Ge ₉ H ₂₀ . In particular, in terms of ease of handling during layer creation work and good Ge supply efficiency, Ge
₄ H ₄ , Ge ₂ H ₆ , and Ge ₃ H ₈ are preferred.

To form a layer composed of a-SiGe (H, X) by the sputtering method, a target made of silicon and
This is carried out by using two targets of germanium or a target of silicon and germanium, and sputtering these in a desired gas atmosphere.

When the layer composed of a-SiGe (H, X) is formed by using the ion plating method, for example, polycrystalline silicon or single crystal silicon and polycrystalline germanium or also single crystal germanium are used as evaporation sources, respectively. It can be carried out by accommodating it in a vapor deposition boat, heating the evaporation source by a resistance heating method, an electron beam method (EB method), or the like, and allowing a flying evaporated material to pass through a desired gas plasma atmosphere.

In both cases of the sputtering method and the ion plating method, in order to make the halogen atom contained in the layer to be formed, a gas of the above-mentioned halide or a silicon compound containing the halogen atom is introduced into the deposition chamber, and the gas is introduced. The plasma atmosphere may be formed. Further, when hydrogen atoms are introduced, a raw material gas for supplying hydrogen atoms, for example, H ₂ or the above-mentioned hydrogenated silanes and / or gases such as germanium hydride are introduced into the deposition chamber for sputtering. It suffices to form a plasma atmosphere of gases such as. Further, as the source gas for supplying halogen atoms, the above-mentioned halides or silicon compounds containing halogen can be mentioned as effective ones, but in addition, hydrogen halides such as HF, HCl, HBr and HI, SiH ₂ F ₂ , SiH ₂ I ₂ , SiH ₂ Cl ₂ , SiHCl ₃ , SiH
₂ Br ₂ , SiHBr ₃ , halogen-substituted silicon hydride, and Ge
HF ₃ , GeH ₂ F ₂ , GeH ₃ F, GeHCl ₃ , GeH ₂ Cl ₂ , GeH ₃ Cl, GeHBr
₃ , GeH ₂ Br ₂ , GeH ₃ Br, GeHI ₃ , GeH ₂ I ₂ , GeH ₃ I, etc.Halogenated halogenated germanium, etc., GeF ₄ , GeBr ₄ , GeI ₄ , Ge
Gaseous or gasifiable substances such as germanium halides such as F ₂ , GeCl ₄ GeCl ₂ , GeBr ₂ , GeI _2, etc. can also be used as effective starting materials.

Amorphous silicon containing tin atoms (hereinafter, referred to as "a-SiSn (H, X)") using a glow discharge method, a sputtering method, or an ion plating method.
In order to form a light receiving layer composed of
When forming a layer composed of (H, X), the starting material for supplying germanium atoms is used in place of the starting material for supplying tin atoms (Sn), and the amount thereof in the layer to be formed is changed. This is done by controlling the content.

Examples of the substance that can be the source gas for supplying the tin atom (Sn) include tin hydride (SnH ₄ ), SnF ₂ , SnF ₄ , SnCl ₂ , and SnC.
l _4, SnBr _2, SnBr _4, SnI _2, those can be used which can be SnI or gasified gas state such as tin halide, such as _4,
The use of tin halide is particularly effective because a layer composed of a-Si containing halogen atoms can be formed on a predetermined support. Above all, from the viewpoint of ease of handling during layer creation work, good Sn supply efficiency, etc.,
SnCl ₄ is preferred.

When SnCl ₄ is used as a starting material for supplying tin atoms (Sn), solid SnCl ₄ can be used for gasification.
It is desirable to boil an inert gas such as Ar and He while heating and bubbling using the inert gas.The gas thus generated is introduced into the deposition chamber whose inside pressure is reduced in a desired gas pressure state. To do.

Amorphous material in which a-Si (H, X) contains a Group III atom or a Group V atom, a nitrogen atom, an oxygen atom or a carbon atom by using a glow discharge method, a sputtering method, or an ion plating method. To form a layer composed of a material, a starting material for introducing a group III atom or a group V atom and a starting material for introducing an oxygen atom at the time of forming a layer of a-Si (H, X) , A starting material for introducing a nitrogen atom, or a starting material for introducing a carbon atom together with the above-mentioned starting material for forming a-Si (H, X), and controlling their amounts in the layer to be formed. However, it is done by including it.

For example, in order to form a layer composed of a-Si (H, X) containing atoms (O, C, N) using the glow discharge method, the above-mentioned a-Si (H, X) is used. Amounts of the starting materials for introducing atoms (O, C, N) together with the starting materials for forming a-Si (H, X) in forming the layers to be formed Is carried out by controlling the content.

As a starting material for introducing such an atom (O, C, N),
Most substances can be used as long as they are gaseous substances or substances that can be gasified and have at least atoms (O, C, N) as constituent atoms.

Specifically, as a starting material for introducing an oxygen atom (O), for example, oxygen (O ₂ ), ozone (O ₃ ), nitric oxide (NO),
Nitrogen monoxide (N ₂ O), Trinitrogen dioxide (N ₂ O ₃ ), Nitrogen dioxide (N ₂ O ₄ ), Nitrogen pentaoxide (N ₂ O ₅ ), Nitric oxide (NO ₃ ), Silicon atom ( Si), oxygen atom (O), and hydrogen atom (H) as constituent atoms, such as disiloxane (H ₃
Examples thereof include lower siloxanes such as SiOSiH ₃ ) and trisiloxane (H ₃ SiOSiH ₂ OSiH ₃ ). Examples of the starting material for introducing a carbon atom (C) include methane (CH ₄ ), ethane (C ₂ H
_6), propane (C ₃ H _8), n- butane _{(n-C 4 H 10)} , pentane (C ₅ H ₁₂₎ saturated hydrocarbons having 1 to 5 carbon atoms such as ethylene (C ₂ H _4), Propylene (C ₃ H ₆ ), butene-1 (C ₄
H ₈ ), butene-2 (C ₄ H ₈ ), isobutylene (C ₄ H ₈ ), pentene (C ₅ H ₁₀ ), etc., an ethylene hydrocarbon having 2 to 5 carbon atoms, acetylene (C ₂ H ₂ ), Methylacetylene (C ₃ H ₄ ),
Examples include acetylene hydrocarbons having 2 to 4 carbon atoms such as butyne (C ₄ H ₆ ), and the starting materials for introducing the nitrogen atom (N) include, for example, nitrogen (N ₂ ) and ammonia (NH ₃ ). , Hydrazine (H ₂ NNH ₂ ), hydrogen azide (HN ₃ ), amonium azide (NH ₄ N ₃ ), nitrogen trifluoride (F ₃ N), nitrogen tetrafluoride (F
₄ N).

For example, when the glow discharge method is used to form a layer or a layer region containing an oxygen atom, one selected from the above-mentioned starting materials for forming the light receiving member layer as desired for introducing an oxygen atom is used. Starting material is added. As such a starting material for introducing an oxygen atom, almost any material can be used as long as it is a gaseous substance containing at least an oxygen atom as a constituent atom or a gasifiable substance.

For example, a raw material gas containing silicon atoms (Si) as constituent atoms, a raw material gas containing oxygen atoms (O) as constituent atoms, and, if necessary, hydrogen atoms (H) and / or halogen atoms (X).
Or a raw material gas having a constituent atom is used at a desired mixing ratio, or a raw material gas having a silicon atom (Si) as a constituent atom and an oxygen atom (O) and a hydrogen atom (H) are constituted. A raw material gas containing atoms is also mixed at a desired mixing ratio, or a raw material gas containing silicon atoms (Si) as constituent atoms, and silicon atoms (Si), oxygen atoms (O) and hydrogen atoms. It is possible to mix and use a raw material gas containing three of (H) as constituent atoms.

Alternatively, a raw material gas containing silicon atoms (Si) and hydrogen atoms (H) as constituent atoms may be mixed with a raw material gas containing oxygen atoms (O) as constituent atoms.

Specifically, for example, oxygen (O ₂ ), ozone (O ₃ ), nitric oxide (NO), nitrogen dioxide (NO ₂ ), nitrogen monoxide (N ₂ ).
₂ O), nitrogen trioxide (N ₂ O ₃ ), nitrogen tetraoxide (N ₂ O ₄ ) nitrogen dioxide (N ₂ O ₅ ), nitric oxide (NO ₃ ), silicon atom (Si) and oxygen atom ( Examples thereof include lower siloxanes having O) and a hydrogen atom (H) as constituent atoms such as disiloxane (H ₃ SiOSiH ₃ ), trisiloxane (H ₃ SiOSiH ₂ OSiH ₃ ), and the like.

To form a layer or layer region containing oxygen atoms by a sputtering method, a single crystal or Si wafer or Si is used.
This may be carried out by using an O ₂ wafer or a wafer containing Si and SiO ₂ as a mixture as a target and sputtering these in various gas atmospheres.

For example, if a Si wafer is used as a target, a raw material gas for introducing oxygen atoms and, if necessary, hydrogen atoms and / or halogen atoms is diluted with a diluent gas as needed, and then is placed in a deposition chamber for sputtering. The Si wafer may be sputtered by introducing it, forming gas plasma of these gases.

Also, as a separate target for Si and SiO ₂ , or
By using a single target in which Si and SiO ₂ are mixed, it contains at least a hydrogen atom (H) or / and a halogen atom (X) as a constituent atom in an atmosphere of a diluent gas for sputtering. It can be formed by sputtering in a gas atmosphere. As the raw material gas for introducing oxygen atoms, the raw material gas for introducing oxygen atoms among the raw material gases shown in the example of glow discharge described above can be used as an effective gas in the case of sputtering.

Further, for example, in order to form a layer composed of amorphous silicon containing carbon atoms by a glow discharge method, a raw material gas containing silicon atoms (Si) as a constituent atom and a raw material containing carbon atoms (C) as a constituent atom. A gas and a raw material gas containing hydrogen atoms (H) and / or halogen atoms (X) as constituent atoms are mixed at a desired mixing ratio and used, or silicon atoms (Si) are constituent atoms. And a raw material gas containing carbon atoms (C) and hydrogen atoms (H) as constituent atoms, which are also mixed at a desired mixing ratio, or silicon atoms (Si) are formed. A raw material gas having atoms and a raw material gas having silicon atoms (Si), carbon atoms (C) and hydrogen atoms (H) as constituent atoms are mixed or
Furthermore, raw material gases containing silicon atoms and hydrogen atoms as constituent atoms are mixed and used.

Effectively used as such a raw material gas is hydrogenation of silanes such as SiH ₄ , Si ₂ H ₆ , Si ₃ H ₈ Si ₄ H ₁₀ having Si and H as constituent atoms. Examples thereof include silicon gas, C and H as constituent atoms, for example, saturated hydrocarbons having 1 to 4 carbon atoms, ethylene hydrocarbons having 2 to 4 carbon atoms, and acetylene hydrocarbons having 2 to 3 carbon atoms.

Specifically, as the saturated hydrocarbon, for example, methane (CH
₄ ), ethane (C ₂ H ₆ ), propane (C ₃ H ₈ ), n-butane (n-C ₄ H ₁₀ ), pentane (C ₅ H ₁₂ ), ethylene-based hydrocarbons such as ethylene (C ₂ H ₆ ), propylene (C ₃ H ₆ ),
Butene-1 (C ₄ H ₈ ), butene-2 (C ₄ H ₈ ), isobutylene (C ₄ H ₈ ), pentene (C ₅ H ₁₀ ) acetylene hydrocarbons include acetylene (C ₂ H ₂ ), Methyl acetylene (C ₃
H ₄ ), butyne (C ₄ H ₆ ) and the like.

As a source gas containing Si, C and H as constituent atoms, Si (C
Mention may be made of alkyl silicides such as H ₃ ) ₄ and Si (C ₂ H ₅ ) ₄ . In addition to these raw material gases, H ₂ can of course be used as the raw material gas for introducing H.

In order to form a layer composed of a-SiC (H, X) by the sputtering method, a single crystal or polycrystal Si wafer or C (graphite) wafer or a wafer in which Si and C are mixed is used as a target. , And these are sputtered in a desired gas atmosphere.

For example, in the case of using a Si wafer as a target, a raw material gas for introducing carbon atoms, and / or hydrogen atoms and / or halogen atoms is diluted with a diluent gas such as Ar or He as necessary, and sputtering is performed. The Si wafer may be sputtered by introducing the gas plasma of these gases into the deposition chamber.

Separately, when Si and C are separately used as targets or when used as a single target in which Si and C are mixed, a raw material for introducing hydrogen atoms and / or halogen atoms as a gas for sputtering is used. The gas may be diluted with a diluent gas, if necessary, and introduced into a deposition chamber for sputtering to form a gas plasma for sputtering. As the raw material gas for introducing each atom used in the sputtering method, the raw material gas used in the glow discharge method can be used as it is.

For example, when the glow discharge method is used to form a layer or a layer region containing a nitrogen atom, a starting material for introducing a nitrogen atom is selected from the above-mentioned starting materials for forming the light-receiving layer as desired. Add substance. As such a starting material for introducing a nitrogen atom, almost any material can be used as long as it is a gaseous substance containing at least a nitrogen atom as a constituent atom or a substance that can be gasified.

For example, a raw material gas containing silicon atoms (Si) as constituent atoms, a raw material gas containing nitrogen atoms (N) as constituent atoms, and, if necessary, hydrogen atoms (H) and / or halogen atoms (X).
Or a raw material gas containing Si as a constituent atom is mixed at a desired mixing ratio, or a raw material gas containing a silicon atom (Si) as a constituent atom and a nitrogen atom (N) and a hydrogen atom (H) are composed. The atoms and the source gas can also be mixed or used in the desired mixing ratio.

Alternatively, a raw material gas containing silicon atoms (Si) and hydrogen atoms (H) as constituent atoms may be mixed with a raw material gas containing oxygen atoms (O) as constituent atoms.

A starting material effectively used as a raw material gas for introducing a nitrogen element (N) used when forming a layer or a layer region containing a nitrogen atom is N as a constituent atom or N and H.
With and as constituent atoms, such as nitrogen (N ₂ ), ammonia (NH
₃ ), hydrazine (H ₂ NNH ₂ ), gaseous or gasifiable nitrogen such as hydrogen azide (HN ₃ ), ammonium azide (NH ₄ N ₃ ), nitrogen compounds such as boron nitride and azide be able to. In addition to this, in addition to the introduction of nitrogen atoms,
Nitrogen halide compounds such as nitrogen trifluoride (F ₃ N) and nitrogen tetrafluoride (F ₄ N) can be mentioned from the viewpoint of introducing a halogen atom.

By a sputtering method, to form a layer or layer region containing a nitrogen atom, a single crystal or Si wafer or a polycrystalline Si wafer, or Si ₃ N ₄ wafer, or Si and Si ₃
This may be performed by using a wafer containing N ₄ mixed therein as a target and sputtering these in various gas atmospheres.

For example, when a Si wafer is used as a target, a raw material gas for introducing nitrogen atoms and, if necessary, hydrogen atoms and / or halogen atoms is diluted with a diluting gas, if necessary, and then deposited in a deposition chamber for sputtering. The Si wafer may be sputtered by introducing gas into them and forming gas plasma of these gases.

Alternatively, Si and Si ₃ N ₄ are used as separate targets, or by using a single target in which Si and Si ₃ N ₄ are mixed, in a diluting gas atmosphere as a gas for sputtering or It can be formed by sputtering in a gas atmosphere containing at least hydrogen atoms (H) and / or halogen atoms (X) as constituent atoms. As the source gas for introducing oxygen atoms, the source gas for introducing nitrogen atoms in the source gas shown in the example of the glow discharge described above,
It can also be used as an effective gas in the case of sputtering.

Further, when a layer composed of a-Si (H, X) containing a group III atom or a group V atom is formed by glow discharge method, sputtering method or ion plating method, Using a starting material for introducing a Group III atom or a Group V atom together with a starting material for forming a-Si (H, X),
It is carried out by controlling the amount of them to be contained in the layer to be formed.

Specifically as a starting material for introducing a group III atom, for introducing a boron atom, B ₂ H ₆ , B ₄ H ₁₀ , B ₅ H ₉ , B ₅ H ₁₁ , B
_{6 H 10, B 6 H 12} , B 6 H 14 borohydride such _{as, BF 3, BCl 3, BBr} 3
And the like. In addition to this, AlCl ₃ , G
Other examples include aCl ₃ , Ga (CH ₃ ) ₂ , InCl ₃ and TlCl ₃ .

As a starting material for introducing a Group V atom, specifically, for introducing a phosphorus atom, a hydrogenated phosphorus such as PH ₃ , P ₂ H ₆ or the like PH ₄ I, PF ₃ , PF ₅ , P
Examples thereof include phosphorus halides such as Cl ₃ , PCl ₅ , PBr ₃ , PBr ₅ , and PI ₃ . In addition, AsH ₃ , AsF ₃ , AsCl ₃ , AsBr ₃ , AsF ₅ , Sb
H ₃ , SbF ₃ , SbF ₅ , SbCl ₃ , SbCl ₅ , BiH ₃ , BiCl ₃ , BiBr _{5 and the} like can also be mentioned as effective starting materials for introducing a Group V atom.

As described above, the light-receiving layer of the light-receiving member of the present invention is formed by using the glow discharge method, the sputtering method, or the like.
And a tin atom, a group III atom or a group V atom, an oxygen atom, a carbon atom or a nitrogen atom, or a hydrogen atom or /
The content of each of the halogen atoms and the halogen atoms is controlled by controlling the gas flow rate of each atom supplying starting material or the gas flow rate ratio between each atom supplying starting material flowing into the deposition chamber.

The conditions such as the temperature of the support, the gas in the deposition chamber, and the discharge power at the time of forming each constituent layer such as the photoconductive layer and the surface protective layer are
This is an important factor for obtaining a light receiving member having desired characteristics, and is appropriately selected in consideration of the function of the layer to be formed. Further, these layer forming conditions may differ depending on the type and amount of each of the above-mentioned atoms contained in each constituent layer such as the photoconductive layer and the surface protective layer. It is also necessary to make a decision with due consideration.

Specifically, when the surface protective layer made of a diamond-like carbon thin film containing at least one of hydrogen atoms and halogen atoms is formed by a high frequency (13.56MHz) plasma CVD method, the gas pressure in the deposition chamber is usually 10 ^-3. ~ 100 Torr, more preferably 10 ^{-2 to} 50 Torr, optimally 10 ^{-1 to} 50 Torr
Let rr. The support temperature is usually 50 to 900 ° C, more preferably 100 to 600 ° C, most preferably 150 to 500 ° C. Furthermore discharge power is usually 0.05~100W / cm ^2, more preferably 0.1~70W / cm ^2, and optimally with 0.5~50W / cm ^2.

Further, when forming a surface protective layer consisting of a diamond-like carbon thin film containing at least one of hydrogen atoms or halogen atoms by microwave (2.45GHz) plasma CVD method, the gas pressure in the deposition chamber is usually 10 ^-4 ~ 100 Torr, More preferably, it is 10 ^{−3 to} 50 Torr, most preferably 2 × 10 ^{−3 to} 45 Torr,
The discharge power and the temperature of the support are the same as in the case of the above-mentioned high frequency plasma CVD method.

Furthermore, when forming a surface protective layer made of diamond-like carbon film containing at least one hydrogen atom or a halogen atom, sputtering gas pressure in the deposition chamber is usually 10 ^-4 to 10 Torr, more preferably 5 × 10 ^{- 4 ~5Tor}
r, optimally 10 ^{-3 to 1} Torr, and the discharge power and the temperature of the support are the same as in the case of the high frequency plasma CVD method described above.

When a layer made of a-Si (H, X) containing a nitrogen atom, an oxygen atom, a carbon atom, etc. is formed by the glow discharge method, the support temperature is usually 50 to 350 ° C. The temperature is preferably 50 to 250 ° C. Gas pressure in the deposition chamber is usually
The pressure is 0.01 to 1 Torr, and particularly preferably 0.1 to 0.5 Torr. The discharge power is usually 0.005 to 50 W / cm ² , but more preferably 0.01 to 30 W / cm ² . It is particularly preferably 0.01 to 20 W / cm ² .

When the a-SiGe (H, X) layer is formed by the glow discharge method, or when the layer formed of a-SiGe (H, X) containing a group III atom or a group V atom is formed, The temperature of the support is usually 50 to 350 ° C, more preferably 50 to 300 ° C, and particularly preferably 100 to 300 ° C. And the gas pressure in the deposition chamber is usually 0.01 to 5 Torr, preferably 0.001 to 3 Torr, particularly preferably 0.
01 to 1 Torr. Also, the discharge power is 0.005 to 50 W / cm ²
It is usually set to 0.01 to 30 W / cm ² . It is particularly preferably 0.01 to 20 W / cm ² .

However, the specific conditions of the temperature of the support, the discharge power, and the gas pressure in the deposition chamber for forming layers are usually difficult to determine individually.
Therefore, in order to form an amorphous material layer having desired characteristics,
It is desirable to determine the optimum conditions for layer formation based on mutual and organic relationships.

Next, a method for manufacturing a photoconductive member formed by the glow discharge decomposition method will be described.

FIG. 2 shows an apparatus for producing a light receiving member for electrophotography by the glow discharge decomposition method.

In the gas cylinders 202, 203, 204, 205, 206 in the figure,
Raw material gas for forming each layer of the present invention is sealed, and as an example, for example, 202 is a SiH ₄ gas (purity 99.999%) cylinder, and 203 is B ₂ H ₆ diluted with H _2. Gas (purity 99.999%, hereinafter abbreviated as B ₂ H ₆ / H ₂ ) cylinder, 204
Is an NO gas (purity 99.5%) cylinder, 205 is a CH ₄ gas (purity 99.5%)
9.999%) cylinder, 206 is H ₂ gas (purity 99.999%) cylinder.

A gas cylinder 2 is used to allow these gases to flow into the reaction chamber 201.
Check that the valves 02 to 206 and the leak valve 235 are closed, and check the inflow valves 212 to 216 and the outflow valve 21.
After confirming that 7 to 221, the auxiliary valves 232 and 233 are opened, the main valve 234 is first opened to exhaust the reaction chamber 201 and the gas pipe. Next, the reading of the vacuum gauge 236 is about 5 × 10 ^-6 Torr
Auxiliary valves 232, 233, outflow valve 217
Close ~ 221.

As an example of forming the first layer on the base cylinder 237, SiH ₄ gas from gas cylinder 202, gas cylinder, B ₂ H ₆ / H ₂ gas from 203, gas cylinder, NO gas from 204, valve 222, 223, 224 open and outlet pressure gauge 227, 22
Adjust the pressure of 8 and 229 to 1 kg / cm ^2, and adjust the inflow valves 212, 213 and 2
Gradually open 14 to open the mass flow controllers 207, 208, 20
Inflow into 9 Then the outflow valves 217, 218, 219,
The auxiliary valve 232 is gradually opened to allow each gas to flow into the reaction chamber. At this time, the outflow valve is adjusted so that the ratio of the SiH ₄ gas flow rate, the B ₂ H ₆ / H ₂ gas flow rate, and the NO gas flow rate becomes a desired value.
217, 218, 219 are adjusted, and the opening of the main valve 234 is adjusted while observing the reading of the vacuum gauge 236 so that the pressure in the reaction chamber becomes a desired value. Then, after confirming that the temperature of the base cylinder 237 is set to a temperature of 50 to 350 ° C. by the heater 238, the power supply 240 is set to a desired electric power to cause glow discharge in the reaction chamber 201 and the base. Form a first layer on the cylinder.

When the first layer contains halogen atoms, SiF ₄ gas, for example, is further added to the above-mentioned gas and fed into the reaction chamber 201.

When forming each layer, the layer formation rate can be further increased depending on the selection of gas species. For example, instead of SiH ₄ gas, Si
_If a layer is formed using ₂ H ₆ gas, it can be increased several times, and productivity is improved.

To form the second layer on the first layer created as described above, the outflow valves 217-221 are closed and the auxiliary valves 232,
After once evacuated to a high vacuum the inside of the system by fully opening the main valve 234 is opened 233, the reaction CH ₄ gas, H ₂ gas at a desired flow rate by the same valving and during the formation of the first layer Room 2
It is made by pouring into 10 and causing a glow discharge according to the desired conditions.

When changing the amount of hydrogen atoms contained in the second layer, for example, the flow rate of the H ₂ gas introduced into the reaction chamber 201 can be arbitrarily changed as desired to control it as desired. You can

When the second layer contains halogen atoms, CF ₄ gas, for example, is further added to the above gas and fed into the reaction chamber 210.

It goes without saying that all of the outflows other than the gas necessary for forming each layer are closed, and when forming each layer, the gas used for forming the previous layer is the reaction chamber 201 inside the outflow valve 217-. In order to avoid remaining in the pipe extending from 221 to the inside of the reaction chamber 201, the outflow valves 217 to 221 are closed, the auxiliary valves 232 and 233 are opened, the main valve 234 is fully opened, and the system is once evacuated to a high vacuum. Perform operations as needed.

Further, during the layer formation, in order to make the layer formation uniform, the basic cylinder 237 is constantly rotated by the motor 239 at a desired speed.

Next, a method for manufacturing a photoconductive member formed by the microwave discharge decomposition method will be described.

FIG. 3 shows an apparatus for manufacturing a light receiving member for electrophotography by the microwave discharge decomposition method.

In the gas cylinders 302, 303, 304, 305, 306 in the figure,
Raw material gases for forming the respective layers of the present invention are sealed, and as an example, for example, 302 is a SiH ₄ gas (purity 99.999%) cylinder, and 303 is B ₂ H ₆ diluted with H _2. Gas (purity 99.999%, hereinafter abbreviated as B ₂ H ₆ / H ₂ ) cylinder, 304
Is a NO gas cylinder (purity 99.5%), 305 is CH ₄ gas (purity 99.5%)
9.999%) cylinder, 306 is H ₂ gas (purity 99.999%) cylinder.

To allow these gases to flow into the reaction chamber 301, a gas cylinder 3
Check that the valves 02 to 306 and the leak valve 335 are closed, and check the inflow valves 312 to 316 and the outflow valve 317.
˜321 and the auxiliary valves 332 and 333 are confirmed to be open, the main valve 334 is first opened to exhaust the reaction chamber 301 and the gas pipe. Next, the reading of the vacuum gauge 336 is about 5 × 10 ^-6 Torr
Auxiliary valve 332, 333 Outflow valve 317-3
Close 21.

As an example of forming the first layer on the base cylinder 337, SiH ₄ gas from gas cylinder 302, gas cylinder, B ₂ H ₆ / H ₂ gas from 303, gas cylinder, NO gas from 304, valve 322, 323, 324 open and outlet pressure gauge 327, 32
Adjust the pressure of 8 and 329 to 1 kg / cm ² and inflow valves 312, 313 and 3
Gradually open 14 to remove the mass flow controller 307, 308, 30
Inflow into 9 Then the outflow valves 317, 318, 319,
The auxiliary valves 332 are gradually opened to flow into the respective gas reaction chambers. SiH ₄ gas flow rate, B ₂ H ₆ / H ₂ gas flow rate at this time,
Outflow valve 31 so that the ratio of NO gas flow rates becomes the desired value
Adjust 7, 318, 319, and while watching the reading of the vacuum gauge 336 so that the pressure in the reaction chamber becomes the desired value, main valve 3
Adjust 34 openings. Then, after confirming that the temperature of the base cylinder 337 is set to a temperature of 50 to 350 ° C. by the heater 338, the microwave power source 340 is set to a desired power, and the waveguide 341 and the dielectric window 342 are set. A micro-discharge is generated in the reaction chamber 301 to form a first layer on the substrate cylinder.

When the first layer contains halogen atoms, SiF ₄ gas, for example, is further added to the above-mentioned gas and fed into the reaction chamber 301.

When forming each layer, the layer formation rate can be further increased depending on the selection of gas species. For example, instead of SiH ₄ gas, Si
_If a layer is formed using ₂ H ₆ gas, it can be increased several times, and productivity is improved.

To form the second layer on the first layer produced as described above, the outflow valves 317-324 are closed and the auxiliary valve 33
After opening 2 and 333 and fully opening the main valve 334 to evacuate the system to a high vacuum, the same valve operation as in forming the first layer allows CH ₄ gas and H ₂ gas to have a desired flow rate ratio. In the reaction chamber 301 to generate a microwave discharge according to desired conditions.

When the amount of hydrogen atoms contained in the second layer is changed, it can be controlled as desired by arbitrarily changing the flow rate of H ₂ gas introduced into the reaction chamber 301. .

When the second layer contains halogen atoms, CF ₄ gas, for example, is further added to the above gas and fed into the reaction chamber 301.

It goes without saying that all the outflows other than the gas required for forming each layer are closed, and when forming each layer, the gas used for forming the previous layer is the same as that of the outflow valve 317 to the inside of the reaction chamber 301. In order to avoid remaining in the pipe from 321 to the inside of the reaction chamber 301, the outflow valves 317 to 321 are closed, the auxiliary valves 332 and 333 are opened, the main valve 334 is fully opened, and the system is once evacuated to a high vacuum. Perform operations as needed.

Further, during the layer formation, in order to make the layer formation uniform, the base cylinder 337 is rotated at a constant speed by the motor 339.

〔Example〕

Hereinafter, the present invention will be described in more detail with reference to Examples, but the present invention is not limited thereto.

Example 1 Using the manufacturing apparatus shown in FIG. 2, an electrophotographic light-receiving member was formed on an aluminum cylinder that was mirror-finished according to the preparation conditions shown in Table 1.

The light receiving member (hereinafter referred to as a drum) is set in an electrophotographic apparatus to check the electrophotographic characteristics such as initial charging ability, residual potential and ghost under various conditions.
We investigated the deterioration of charging ability, surface scraping, and increase in image defects after the endurance of 10,000 sheets. Furthermore, the image deletion of the drum in a high temperature and high humidity atmosphere of 35 ° C and 85% was also evaluated.

Further, the dielectric strength voltage was examined by applying a high DC voltage to the drum. Further, the scratch resistance was examined by applying a constant load to a needle having a spherical tip and scratching the drum surface. Table 2 shows the evaluation results.

As can be seen from Table 2, remarkable advantages were recognized particularly in the initial chargeability, ghost, image defects, surface abrasion, withstand voltage, and scratch resistance.

<Example 2> As in Example 1, the aluminum cylinder on which the photoconductive layer was formed was set in the manufacturing apparatus shown in FIG. 3 to form a surface layer on the photoconductive layer according to the preparation conditions shown in Table 3. The same evaluation as in Example 1 was performed.

The results are shown in Table 4.

As seen in Table 4, the same characteristics as in Example 1 were obtained.

<Example 3> When the surface layer was formed, the bias voltage of the cylinder was -150V.
In the same manner as in Example 1, a drum and a sample were prepared under the preparation conditions shown in Table 1 as described above, and the same evaluation was performed.

The results are shown in Table 5.

As shown in Table 5, the same characteristics as in Example 1 were obtained.

In addition, as a result of measuring the sample, it was found to be tetracoordinated.

Example 4 A drum was prepared in the same manner as in Example 1 except that the charge injection blocking layer, the photoconductive layer and the surface layer were prepared under the conditions shown in Table 6, and the same evaluation was performed.

The results are shown in Table 7.

As shown in Table 7, the same characteristics as in Example 1 were obtained.

Performing anodic oxidation treatment <Example 5> aluminum cylinder, to create an aluminum oxide layer on the cylinder surface (Al ₂ O _3), which, as a charge injection blocking layer, a photoconductive layer on this layer Drums were prepared in the same manner as in Example 4 for the surface layers, and the same evaluations as in Example 1 were performed.

The results are shown in Table 9.

As shown in Table 9, the same characteristics as in Example 1 were obtained.

Example 6 A drum was prepared in the same manner as in Example 1 under the preparation conditions shown in Table 10 for the IR absorbing layer, the photoconductive layer and the surface layer, and the same evaluation was performed.

Further, the drum was set in an electrophotographic apparatus using a semiconductor laser having a wavelength of 785 nm as a light source for image exposure, and it was checked whether interference fringes appeared on the image.

The results are shown in Table 11.

As shown in Table 11, the same characteristics as in Example 1 were obtained and no interference fringes appeared.

Example 7 A drum was produced in the same manner as in Example 1 under the production conditions shown in Table 12 for the adhesive layer, the photoconductive layer, and the surface layer, and the same evaluation was performed.

The results are shown in Table 13.

As shown in Table 13, the same characteristics as in Example 1 were obtained.

<Example 8> An IR absorption layer, a charge injection blocking layer, a photoconductive layer, and a surface layer were formed into a drum in the same manner as in Example 1 under the production conditions shown in Table 14, and evaluated in the same manner as in Example 6. I went.

The results are shown in Table 15.

As shown in Table 15, the same characteristics as in Example 1 were obtained.

Example 9 A drum was prepared in the same manner as in Example 1 except that the adhesion layer, the charge injection blocking layer, the photoconductive layer, and the surface layer were prepared under the preparation conditions shown in Table 16, and the same evaluation was performed.

The results are shown in Table 17.

As shown in Table 17, the same characteristics as in Example 1 were obtained.

<Example 10> A drum was prepared in the same manner as in Example 1 except that the adhesion layer, the IR absorption layer, the charge injection blocking layer, the photoconductive layer, and the surface layer were formed under the conditions shown in Table 18, respectively. The same evaluation as was done.

The results are shown in Table 19.

As shown in Table 19, the same characteristics as in Example 1 were obtained.

<Example 11> The conditions for forming the photoconductive layer were changed to several conditions shown in Table 20,
A plurality of drums were prepared under the same conditions as in Example 1 except for the above.

As a result of subjecting these drums to the same evaluation as in Example 1,
In each case, a drum sufficiently satisfying the electrophotographic characteristics was obtained as in Example 1.

<Example 12> The conditions for forming the photoconductive layer were changed to several conditions shown in Table 21,
A plurality of drums were prepared under the same conditions as in Example 2 except for the above.

As a result of subjecting these drums to the same evaluation as in Example 2,
In each case, a drum sufficiently satisfying the electrophotographic characteristics was obtained in the same manner as in Example 2.

<Example 13> The conditions for forming the photoconductive layer were changed to several conditions shown in Table 22,
A plurality of drums were prepared under the same conditions as in Example 3 except for the above.

As a result of subjecting these drums to the same evaluation as in Example 3,
In each case, similarly to Example 3, a drum sufficiently satisfying the electrophotographic characteristics was obtained.

Example 14 A plurality of drums were prepared under the same conditions as in Example 4 except that the conditions for forming the charge injection blocking layer were changed to several conditions shown in Table 23.

As a result of subjecting these drums to the same evaluation as in Example 4,
In each case, a drum sufficiently satisfying the electrophotographic characteristics was obtained as in Example 4.

<Example 15> The conditions for forming the charge injection blocking layer were changed to several conditions shown in Table 24, the conditions for forming the photoconductive layer were changed to several conditions shown in Table 25, and otherwise, Example 4 was used. A plurality of drums shown in Table 26 were prepared under the same conditions as in.

As a result of subjecting these drums to the same evaluation as in Example 4,
In each case, a drum sufficiently satisfying the electrophotographic characteristics was obtained as in Example 4.

<Example 16> The conditions for forming the charge injection blocking layer were changed to several conditions shown in Table 24, the conditions for forming the photoconductive layer were changed to several conditions shown in Table 27, and the conditions for forming the surface layer were changed. Under the conditions shown in Table 28,
A plurality of drums shown in the table were prepared.

As a result of subjecting these drums to the same evaluation as in Example 4,
In each case, a drum sufficiently satisfying the electrophotographic characteristics was obtained as in Example 4.

<Example 17> The conditions for forming the charge injection blocking layer were changed to several conditions shown in Table 24, the conditions for forming the photoconductive layer were changed to several conditions shown in Table 27, and the conditions for forming the surface layer were changed. Under the conditions shown in Table 30, 31st
A plurality of drums shown in the table were prepared.

As a result of subjecting these drums to the same evaluation as in Example 4,
In each case, a drum sufficiently satisfying the electrophotographic characteristics was obtained as in Example 4.

<Example 18> The conditions for forming the photoconductive layer were changed to several conditions shown in Table 25,
A plurality of drums shown in Table 32 were prepared under the same conditions as in Example 5 except for the difference.

As a result of subjecting these drums to the same evaluation as in Example 5,
In each case, a drum sufficiently satisfying the electrophotographic characteristics was obtained in the same manner as in Example 5.

<Example 19> The conditions for forming the surface layer were changed to those shown in Table 28, the conditions for forming the photoconductive layer were changed to several conditions shown in Table 27, and other conditions were the same as those in Example 5 A plurality of drums shown in Table 33 were prepared.

As a result of subjecting these drums to the same evaluation as in Example 5,
In each case, a drum sufficiently satisfying the electrophotographic characteristics was obtained in the same manner as in Example 5.

<Example 20> The conditions for producing the surface layer were changed to those shown in Table 30, the conditions for producing the photoconductive layer were changed to several conditions shown in Table 27, and other conditions were the same as those in Example 5. A plurality of drums shown in Table 34 were prepared.

As a result of subjecting these drums to the same evaluation as in Example 5,
In each case, a drum sufficiently satisfying the electrophotographic characteristics was obtained in the same manner as in Example 5.

<Example 21> A plurality of drums shown in Table 37 were prepared under the same conditions as in Example 6 except that the conditions for forming the IR absorbing layer were changed to several conditions shown in Tables 35 and 36. .

As a result of subjecting these drums to the same evaluation as in Example 6,
In each case, similarly to Example 6, a drum sufficiently satisfying the electrophotographic characteristics was obtained.

<Example 24> The conditions for forming the IR absorption layer were changed to several conditions shown in Tables 35 and 38, and the conditions for forming the photoconductive layer were changed to several conditions shown in Table 25. Under the same conditions as in No. 6, a plurality of drums shown in Table 39 were prepared.

As a result of subjecting these drums to the same evaluation as in Example 6,
In each case, similarly to Example 6, a drum sufficiently satisfying the electrophotographic characteristics was obtained.

<Example 23> The conditions for forming the IR absorbing layer were changed to several conditions shown in Tables 35 and 38, and the conditions for forming the photoconductive layer were changed to several conditions shown in Table 27 to prepare the surface layer. Under the conditions shown in Table 28, a plurality of drums shown in Table 40 were prepared.

As a result of subjecting these drums to the same evaluation as in Example 6,
In each case, similarly to Example 6, a drum sufficiently satisfying the electrophotographic characteristics was obtained.

<Example 24> The conditions for forming the IR absorbing layer were changed to several conditions shown in Tables 35 and 38, the conditions for forming the photoconductive layer were changed to several conditions shown in Table 27, and the conditions for forming the surface layer were changed. Under the conditions shown in Table 30, a plurality of drums shown in Table 41 were prepared.

As a result of subjecting these drums to the same evaluation as in Example 6,
In each case, similarly to Example 6, a drum sufficiently satisfying the electrophotographic characteristics was obtained.

<Example 25> A plurality of drums shown in Table 43 were prepared under the same conditions as in Example 7 except that the conditions for forming the adhesive layer were changed to several conditions shown in Table 42.

As a result of subjecting these drums to the same evaluation as in Example 7,
In each case, a drum sufficiently satisfying the electrophotographic characteristics was obtained as in Example 7.

<Example 26> The conditions for forming the adhesion layer were changed to several conditions shown in Table 44, the conditions for forming the photoconductive layer were changed to several conditions shown in Table 25, and otherwise the same as Example 7. Under the conditions described above, a plurality of drums shown in Table 45 were prepared.

As a result of subjecting these drums to the same evaluation as in Example 7,
In each case, a drum sufficiently satisfying the electrophotographic characteristics was obtained as in Example 7.

Example 27 The adhesion layer preparation conditions were changed to several conditions shown in Table 44, the photoconductive layer preparation conditions were changed to several conditions shown in Table 27, and the surface layer preparation conditions were changed to 28th. A plurality of drums shown in Table 46 were prepared under the conditions shown in the table.

As a result of subjecting these drums to the same evaluation as in Example 7,
In each case, a drum sufficiently satisfying the electrophotographic characteristics was obtained as in Example 7.

<Example 28> The conditions for producing the adhesion layer were changed to several conditions shown in Table 44, the conditions for producing the photoconductive layer were changed to several conditions shown in Table 27, and the conditions for producing the surface layer were changed to No. 30. A plurality of drums shown in Table 47 were prepared under the conditions shown in the table.

As a result of subjecting these drums to the same evaluation as in Example 7,
In each case, a drum sufficiently satisfying the electrophotographic characteristics was obtained as in Example 7.

Example 29 A plurality of drums shown in Table 48 were prepared under the same conditions as in Example 8 except that the conditions for forming the IR absorbing layer were changed to several conditions shown in Tables 35 and 36. .

As a result of subjecting these drums to the same evaluation as in Example 8,
In each case, similarly to Example 8, a drum sufficiently satisfying the electrophotographic characteristics was obtained.

<Example 30> The conditions for forming the charge injection blocking layer were changed to several conditions shown in Table 49, the conditions for forming the IR absorption layer were changed to several conditions shown in Tables 35 and 38, and other conditions were carried out. 50th under the same conditions as in Example 8
A plurality of drums shown in the table were prepared.

As a result of subjecting these drums to the same evaluation as in Example 8,
In each case, similarly to Example 8, a drum sufficiently satisfying the electrophotographic characteristics was obtained.

<Example 31> The conditions for producing the charge injection blocking layer were changed to several conditions shown in Table 51, the conditions for producing the IR absorption layer were changed to several conditions shown in Tables 35 and 38, and the surface layer was produced. Under the conditions shown in Table 28,
A plurality of drums shown in Table 52 were prepared.

As a result of subjecting these drums to the same evaluation as in Example 8,
In each case, similarly to Example 8, a drum sufficiently satisfying the electrophotographic characteristics was obtained.

<Example 32> The conditions for forming the charge injection blocking layer were changed to several conditions shown in Table 51, the conditions for forming the IR absorption layer were changed to several conditions shown in Tables 35 and 38, and the surface layer was formed. Under the conditions shown in Table 30,
A plurality of drums shown in Table 53 were prepared.

As a result of subjecting these drums to the same evaluation as in Example 8,
In each case, similarly to Example 8, a drum sufficiently satisfying the electrophotographic characteristics was obtained.

<Example 33> A plurality of drums shown in Table 55 were prepared under the same conditions as in Example 9 except that the conditions for forming the adhesive layer were changed to several conditions shown in Tables 44 and 54.

As a result of subjecting these drums to the same evaluation as in Example 9,
In each case, similarly to Example 9, a drum sufficiently satisfying the electrophotographic characteristics was obtained.

<Example 34> The conditions for forming the charge injection blocking layer were changed to several conditions shown in Table 56, and the conditions for forming the adhesion layer were changed to several conditions shown in Tables 44 and 57. A plurality of drums shown in Table 58 was prepared under the same conditions as in No. 9.

As a result of subjecting these drums to the same evaluation as in Example 9,
In each case, similarly to Example 9, a drum sufficiently satisfying the electrophotographic characteristics was obtained.

<Example 35> The conditions for forming the charge injection blocking layer were changed to several conditions shown in Table 24, the conditions for forming the adhesion layer were changed to several conditions shown in Tables 44 and 57, and the conditions for forming the surface layer were changed. Under the conditions shown in Table 28,
59 A plurality of drums shown in the table were prepared.

As a result of subjecting these drums to the same evaluation as in Example 9,
In each case, similarly to Example 9, a drum sufficiently satisfying the electrophotographic characteristics was obtained.

<Example 36> The conditions for forming the charge injection blocking layer were changed to several conditions shown in Table 24, and the conditions for forming the adhesion layer were changed to several conditions shown in Tables 44 and 57 to prepare the surface layer. Under the conditions shown in Table 30,
A plurality of drums shown in Table 60 were prepared.

As a result of subjecting these drums to the same evaluation as in Example 9,
In each case, similarly to Example 9, a drum sufficiently satisfying the electrophotographic characteristics was obtained.

<Example 37> A plurality of drums shown in Table 62 were prepared under the same conditions as in Example 10 except that the conditions for forming the charge injection blocking layer were changed to several conditions shown in Table 61.

As a result of subjecting these drums to the same evaluation as in Example 10,
In each case, a drum sufficiently satisfying the electrophotographic characteristics was obtained as in Example 10.

<Example 38> The conditions for forming the charge injection blocking layer were changed to several conditions shown in Table 64, the conditions for forming the photoconductive layer were changed to several conditions shown in Table 63, and otherwise, Example 10 was used. A plurality of drums shown in Table 65 were prepared under the same conditions as in.

As a result of subjecting these drums to the same evaluation as in Example 10,
In each case, a drum sufficiently satisfying the electrophotographic characteristics was obtained as in Example 10.

<Example 39> The conditions for producing the charge injection blocking layer were changed to several conditions shown in Table 64, the conditions for producing the photoconductive layer were changed to several conditions shown in Table 66, and the conditions for producing the surface layer were changed. Under the conditions shown in Table 28, 67th
A plurality of drums shown in the table were prepared.

As a result of subjecting these drums to the same evaluation as in Example 10,
In each case, a drum sufficiently satisfying the electrophotographic characteristics was obtained as in Example 10.

<Example 40> The conditions for forming the charge injection blocking layer were changed to several conditions shown in Table 64, the conditions for forming the photoconductive layer were changed to several conditions shown in Table 66, and the conditions for forming the surface layer were changed. 68th under the conditions shown in Table 30
A plurality of drums shown in the table were prepared.

As a result of subjecting these drums to the same evaluation as in Example 10,
In each case, a drum sufficiently satisfying the electrophotographic characteristics was obtained as in Example 10.

<Example 41> The conditions for forming the charge injection blocking layer were changed to several conditions shown in Table 51, the conditions for forming the IR absorption layer were changed to several conditions shown in Tables 35 and 38, and the photoconductive layer A plurality of drums shown in Table 71 were prepared under the conditions shown in Table 69, the conditions for forming the surface layer shown in Table 70, and the conditions shown in Table 69.

As a result of subjecting these drums to the same evaluation as in Example 8,
In each case, similarly to Example 8, a drum sufficiently satisfying the electrophotographic characteristics was obtained.

<Example 42> The conditions for forming the charge injection blocking layer were changed to several conditions shown in Table 51, the conditions for forming the IR absorption layer were changed to several conditions shown in Tables 35 and 38, and the photoconductive layer A plurality of drums shown in Table 73 were prepared under the conditions shown in Table 72 and the conditions shown in Table 70 for the preparation of the surface layer.

As a result of subjecting these drums to the same evaluation as in Example 8,
In each case, similarly to Example 8, a drum sufficiently satisfying the electrophotographic characteristics was obtained.

<Example 43> The conditions for forming the charge injection blocking layer were changed to several conditions shown in Table 51, the conditions for forming the IR absorption layer were changed to several conditions shown in Tables 35 and 38, and the photoconductive layer A plurality of drums shown in Table 74 were prepared under the conditions shown in Table 69, the conditions for forming the surface layer shown in Table 28, and the conditions shown in Table 69.

As a result of subjecting these drums to the same evaluation as in Example 8,
In each case, similarly to Example 8, a drum sufficiently satisfying the electrophotographic characteristics was obtained.

<Example 44> The conditions for forming the charge injection blocking layer were changed to several conditions shown in Table 51, the conditions for forming the IR absorption layer were changed to several conditions shown in Tables 35 and 38, and the photoconductive layer A plurality of drums shown in Table 75 were prepared under the conditions shown in Table 72 and the conditions for forming the surface layer shown in Table 28.

As a result of subjecting these drums to the same evaluation as in Example 8,
In each case, similarly to Example 8, a drum sufficiently satisfying the electrophotographic characteristics was obtained.

<Example 45> The conditions for forming the charge injection blocking layer were changed to several conditions shown in Table 51, the conditions for forming the IR absorption layer were changed to several conditions shown in Tables 35 and 38, and the photoconductive layer A plurality of drums shown in Table 76 were prepared under the conditions shown in Table 69 and the conditions shown in Table 30 for the preparation of the surface layer.

As a result of subjecting these drums to the same evaluation as in Example 8,
In each case, similarly to Example 8, a drum sufficiently satisfying the electrophotographic characteristics was obtained.

<Example 46> The conditions for forming the charge injection blocking layer were changed to several conditions shown in Table 51, the conditions for forming the IR absorption layer were changed to several conditions shown in Tables 35 and 38, and the photoconductive layer A plurality of drums shown in Table 77 were prepared under the conditions shown in Table 72 and the conditions for forming the surface layer shown in Table 30.

As a result of subjecting these drums to the same evaluation as in Example 8,
In each case, similarly to Example 8, a drum sufficiently satisfying the electrophotographic characteristics was obtained.

<Example 47> The conditions for forming the charge injection blocking layer and the photoconductive layer were set to those shown in Table 78, and a plurality of drums were prepared for forming the surface layer shown in Table 79.

As a result of subjecting these drums to the same evaluation as in Example 4,
In each case, a drum sufficiently satisfying the electrophotographic characteristics was obtained as in Example 4.

<Example 48> The conditions for forming the IR absorption layer, the charge injection blocking layer, and the photoconductive layer were set to 80th.
Under the conditions shown in the table, a plurality of drums whose surface layer preparation conditions are shown in Table 81 were prepared.

As a result of subjecting these drums to the same evaluation as in Example 8,
In each case, similarly to Example 8, a drum sufficiently satisfying the electrophotographic characteristics was obtained.

<Example 49> The adhesion layer, the IR absorption layer, the charge injection blocking layer, and the photoconductive layer were formed under the conditions shown in Table 82, and the surface layer was formed under the condition 83.
A plurality of drums shown in the table were prepared.

As a result of subjecting these drums to the same evaluation as in Example 10,
In each case, a drum sufficiently satisfying the electrophotographic characteristics was obtained as in Example 10.

<Example 50> A drum was produced in the same manner as in Example 1 under the production conditions shown in Table 84 for the charge injection blocking layer, the photoconductive layer, the intermediate layer and the surface layer, and the same evaluation was performed. As in Example 1, a drum with very good electrophotographic properties was obtained.

<Example 51> A cylinder subjected to mirror surface processing is further subjected to lathe processing with a sword bite having various angles, and a plurality of cylinders having a sectional shape as shown in Fig. 4 and various sectional patterns as shown in Table 85 are provided. I prepared a book. The cylinders were sequentially set in the manufacturing apparatus shown in FIG. 2 and subjected to drum making under the same making conditions as in Example 1. The produced drums were evaluated in the same manner as in Example 1, and as a result, the same drums as in Example 1 were obtained, which satisfied the electrophotographic characteristics.

<Example 52> The surface of a cylinder that has been mirror-finished is subjected to a so-called surface dimple treatment in which the surface of the cylinder is exposed to the dropping base of a large number of bearing balls to produce innumerable dents. A plurality of cylinders having a cross-sectional shape like this and various cross-sectional patterns as shown in Table 86 were prepared. The cylinders were sequentially set in the manufacturing apparatus shown in FIG. 2 and subjected to drum making under the same making conditions as in Example 1. The produced drums were evaluated in the same manner as in Example 1, and as a result, the same drums as in Example 1 were obtained, which satisfied the electrophotographic characteristics.

[Outline of Effects of the Invention] The light-receiving member of the present invention is provided with a surface protective layer composed of a diamond-like carbon thin film containing at least one of a hydrogen atom and a halogen atom, thereby providing a mechanical surface of the light-receiving member. It is possible to effectively prevent deterioration due to ions and ozone caused by damage and corona discharge, and it is possible to obtain an excellent electrophotographic property such as charging ability and dark decay. When applied as an image forming member, there is no effect of residual potential,
Its electrical characteristics are stable, and the image obtained using it is excellent without ghosts, image defects and the like.

[Brief description of drawings]

FIGS. 1 (A) to (I) are diagrams schematically showing some typical examples of the layer structure of the light receiving member of the present invention.
The figure is a typical example of an apparatus for producing the light-receiving member of the present invention, FIG. 2 is a schematic explanatory view of the production apparatus by the glow discharge method, and FIG. 3 is a schematic of the production apparatus by the microwave discharge method. FIG. FIG. 4 and FIG. 5 are views showing examples of the sectional shape of the support of the light receiving member of the present invention. 100 ... Photoreceptive member, 101 ... Support, 102 ... Photoconductive layer, 103 ... Surface protective layer, 104 ... Charge injection blocking layer, 105
…… Long wavelength light absorption layer, 106 …… Adhesion layer, 107 …… Free surface, 108 …… Intermediate layer, 210,301 …… Reaction chamber, 202-206, 3
02 to 306 …… Gas cylinder, 207 to 211, 307 to 311 …… Mass flow controller, 212 to 216, 312 to 316 …… Inflow valve, 217 to 221,317 to 321 …… Outflow valve, 222 to 226,32
2-326 …… Valve, 227-231, 327-331 …… Pressure regulator, 232,233,332,333 …… Auxiliary valve, 234,334 ……
Main valve, 235, 335 ... Leak valve, 236, 336 ...
… Vacuum gauge, 237, 337 …… Base cylinder, 238, 338 ……
Heater, 239, 339 …… Motor, 240, 340 …… High frequency power supply, 341 …… Waveguide, 342 …… Dielectric window

 ─────────────────────────────────────────────────── ─── Continuation of front page (72) Inventor Yasushi Fujioka 3-30-2 Shimomaruko, Ota-ku, Tokyo Canon Inc. (56) References JP-A-61-208056 (JP, A) JP-A-62 -23050 (JP, A) JP 62-43650 (JP, A) JP 62-226158 (JP, A)

Claims (4)

[Claims] 1. A photoconductive layer and a photoconductive layer comprising a support, an amorphous material having a silicon atom as a base material and at least one of a hydrogen atom and a halogen atom on the support. An intermediate layer of amorphous silicon or polycrystalline silicon containing carbon atoms and a light-receiving layer provided with a surface protective layer of a diamond-like carbon thin film containing at least one of hydrogen atoms or halogen atoms on the intermediate layer; A light-receiving member having. 2. The light receiving member according to claim 1, wherein the light receiving layer has a charge injection blocking layer. 3. The light receiving member according to claim 1, wherein the light receiving layer has a long wavelength light absorbing layer. 4. The light-receiving member according to claim 1, wherein the light-receiving layer has an adhesion layer having a function of improving adhesion.