[go: up one dir, main page]

JPH0748410B2 - Method for forming electrode film in electronic component - Google Patents

Method for forming electrode film in electronic component

Info

Publication number
JPH0748410B2
JPH0748410B2 JP1027928A JP2792889A JPH0748410B2 JP H0748410 B2 JPH0748410 B2 JP H0748410B2 JP 1027928 A JP1027928 A JP 1027928A JP 2792889 A JP2792889 A JP 2792889A JP H0748410 B2 JPH0748410 B2 JP H0748410B2
Authority
JP
Japan
Prior art keywords
electrode film
groove
insulating material
material plate
conductive paste
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP1027928A
Other languages
Japanese (ja)
Other versions
JPH02207501A (en
Inventor
克典 渡辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohm Co Ltd
Original Assignee
Rohm Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm Co Ltd filed Critical Rohm Co Ltd
Priority to JP1027928A priority Critical patent/JPH0748410B2/en
Publication of JPH02207501A publication Critical patent/JPH02207501A/en
Publication of JPH0748410B2 publication Critical patent/JPH0748410B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Apparatuses And Processes For Manufacturing Resistors (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、例えば、チップ抵抗器やチップコンデンサ等
のように、接続用の電極を、絶縁基板に対して膜状に塗
着したものに構成した電子部品において、前記膜状の電
極、つまり電極膜を、前記絶縁基板に対して塗着形成す
るための方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Industrial field of application] The present invention relates to a film in which an electrode for connection is applied in a film form to an insulating substrate, such as a chip resistor and a chip capacitor. The present invention relates to a method for coating and forming the film-shaped electrode, that is, the electrode film, on the insulating substrate in the configured electronic component.

〔従来の技術〕[Conventional technology]

一般に、このように絶縁基板に設ける電極を膜状にする
場合、この膜状の電極、つまり、電極膜は、前記絶縁基
板の上面に、当該上面における抵抗膜等に導通するよう
に塗着形成した上面電極膜と、前記絶縁基板の下面に塗
着形成した下面電極膜と、前記絶縁基板の側面に、前記
上面電極膜と下面電極膜用とを互いに導通するように塗
着形成した側面電極膜とによって構成している。
Generally, when the electrode provided on the insulating substrate is formed into a film, the film-shaped electrode, that is, the electrode film is formed by coating on the upper surface of the insulating substrate so as to be electrically connected to the resistance film or the like on the upper surface. A top surface electrode film, a bottom surface electrode film formed by coating on the bottom surface of the insulating substrate, and a side surface electrode formed by coating the side surface of the insulating substrate so that the top surface electrode film and the bottom surface electrode film are electrically connected to each other. It is composed of a membrane.

しかし、これらの上面電極膜、下面電極膜及び側面電極
膜を、絶縁基板の各々について別々に塗着形成したので
は、生産性が著しく低くて、製造コストが大幅に増大す
ることになるから、従来は、以下に述べるような方法で
塗着形成している。
However, if these upper surface electrode film, lower surface electrode film and side surface electrode film are separately formed by coating on each of the insulating substrates, the productivity will be remarkably low and the manufacturing cost will increase significantly. Conventionally, coating is performed by the method described below.

すなわち、例えば、チップ抵抗器の場合には、先ず、第
14図及び第15図に示すように、多数個の絶縁基板11の縦
方向及び横方向に複数個並べた状態のセラミック製の絶
縁素材板aを、当該絶縁素材板aの上面及び下面に前記
各絶縁基板11ごとにブレイクするための断面V型の縦筋
目溝a1及び横筋目溝a2を設けて形成し、この絶縁素材板
aの下面における横筋目溝a2の箇所に、第16図及び第17
図に示すように、下面電極膜用の導電性ペーストをスク
リーン印刷によって前記横筋目溝a2を挟んで隣接する二
つの絶縁基板11の両方に跨って連続するように塗着して
乾燥することにより、下面電極膜12bを形成する一方、
前記絶縁素材板aの上面における横筋目溝a2の箇所に、
第18図及び第19図に示すように、前記と同様に、上面電
極膜用の導電性ペーストをスクリーン印刷によって前記
横筋目溝a2を挟んで隣接する二つの絶縁基板11の両方に
跨って連続するように塗着して乾燥することにより、上
面電極膜2aを形成したのち、前記絶縁素材板aの上面に
おける各絶縁基板11の箇所に、第20図及び第21図に示す
ように、抵抗膜13を塗着形成し、次いで、前記絶縁素材
板aを、第22図及び第23図に示すように、横筋目溝a2に
沿って折り曲げることによって棒状の絶縁素材板a3にブ
レイクし、この棒状絶縁素材板a3における各絶縁基板11
の左右両側面11aに、第25図に示すように、側面電極膜
用の導電性ペーストを塗着したのち乾燥して、側面電極
膜12cを形成することにより、各絶縁基板11の各々に電
極膜12を設け、その後において、この棒状絶縁素材板a3
を、縦筋目溝a1に沿って各絶縁基板11ごとにブレイクす
ることによって、チップ抵抗器を製造するようにしてい
る。
That is, for example, in the case of a chip resistor, first,
As shown in FIG. 14 and FIG. 15, the insulating material plates a made of ceramic are arranged on the upper surface and the lower surface of the insulating material plate a in a state where a plurality of insulating substrates 11 are arranged in the vertical and horizontal directions. Each insulating substrate 11 is formed by forming vertical streak grooves a1 and transverse streak grooves a2 having a V-shaped cross section for breaking, and at the locations of the horizontal streak grooves a2 on the lower surface of the insulating material plate a, as shown in FIG. 17
As shown in the figure, a conductive paste for the lower surface electrode film is applied by screen printing so as to be continuous across both of the two insulating substrates 11 adjacent to each other with the horizontal groove a2 interposed therebetween and then dried. While forming the lower surface electrode film 12b,
At the location of the horizontal streak grooves a2 on the upper surface of the insulating material plate a,
As shown in FIGS. 18 and 19, similarly to the above, the conductive paste for the upper surface electrode film is continuously spread over both of the two insulating substrates 11 adjacent to each other with the horizontal groove a2 interposed therebetween by screen printing. After the upper electrode film 2a is formed by applying and drying as described above, the upper surface of the insulating material plate a is coated with a resistor as shown in FIGS. A film 13 is formed by coating, and then the insulating material plate a is bent along a transverse groove a2 to break it into a rod-shaped insulating material plate a3 as shown in FIGS. 22 and 23. Each insulating substrate 11 on the rod-shaped insulating material plate a3
As shown in FIG. 25, the conductive paste for the side surface electrode film is applied to the left and right side surfaces 11a of the electrode 11 and dried to form the side surface electrode film 12c. A membrane 12 is provided, after which this rod-shaped insulating material plate a3
By breaking each of the insulating substrates 11 along the vertical groove a1, the chip resistor is manufactured.

〔発明が解決しようとする課題〕[Problems to be Solved by the Invention]

ところが、この従来における電極膜12の塗着形成する方
法では、上面電極膜12a及び下面電極膜12bの両方を、絶
縁素材板aにおける横筋目溝a2の箇所に、導電性ペース
トを当該横筋目溝a2を挟んで隣接する両絶縁基板11の両
方に跨って連続するようにして塗着することによって形
成するもので、このように、両絶縁基板11の両方に跨っ
て連続するように塗着した導電性ペーストは、縦筋目溝
a1における溝面a2′にも塗着されると共に、当該導電性
ペーストが乾燥するまでの間において横筋目溝a2内に流
れ込むことになるから、前記上面電極膜12a及び下面電
極膜12bのうち前記横筋目溝a2内の部分における膜厚さ
は、第19図に示すように、絶縁基板11の上面及び下面の
部分における膜厚さよりも可成り厚くなるのである。
However, in this conventional method of forming the electrode film 12 by coating, both the upper surface electrode film 12a and the lower surface electrode film 12b are placed in the horizontal groove groove a2 in the insulating material plate a, and the conductive paste is applied to the horizontal stripe groove. It is formed by coating so as to be continuous over both of the insulating substrates 11 adjacent to each other with a2 sandwiched therebetween, and thus, is formed so as to be continuous over both of the insulating substrates 11 as described above. Conductive paste is vertical groove
While being applied to the groove surface a2 'in a1 as well, since the conductive paste will flow into the horizontal groove a2 until it is dried, the upper electrode film 12a and the lower electrode film 12b of the upper electrode film 12a As shown in FIG. 19, the film thickness in the portion of the horizontal groove a2 is considerably thicker than the film thickness in the upper surface and the lower surface of the insulating substrate 11.

すなわち、縦筋目溝a1を挟んで隣接する二つの絶縁基板
11は、膜厚さが横筋目溝a2内の部分において混くなる上
面電極膜12a及び下面電極膜12bによって互いに連結され
た状態になり、上面電極膜12a及び下面電極膜12bにおけ
る膜厚さが、横筋目溝a2内において厚くなることは、こ
の絶縁素材板aを、第21図に矢印b,bで示す方向に外力
を加えて折り曲げることにより、横筋目溝a2に沿ってブ
レイクすることを著しく阻害するから、ブレイクの作業
性が低いのであり、しかも、ブレイクに際して、絶縁素
材板aが、前記横筋目溝a2の中心(最も深い部分)より
外れた箇所においてブレイクされ、各絶縁基板11に欠け
が発生することになるから、製品の歩留り率が低いので
ある。
That is, two insulating substrates adjacent to each other with the vertical groove a1 sandwiched therebetween.
11 is in a state of being connected to each other by the upper surface electrode film 12a and the lower surface electrode film 12b whose film thickness is mixed in the portion in the horizontal groove a2, and the film thickness in the upper surface electrode film 12a and the lower surface electrode film 12b is The thickening in the transverse groove a2 means that the insulating material plate a is bent along the transverse groove a2 by bending it by applying an external force in the directions shown by arrows b and b in FIG. Since the workability of the break is low because it remarkably hinders, moreover, at the time of breaking, the insulating material plate a is broken at a position deviated from the center (the deepest part) of the transverse groove a2, and each insulating substrate 11 is broken. The yield rate of the product is low because chipping occurs.

その上、絶縁素材板aに対して前記のように矢印b,bの
方向に外力を加えることによってブレイクするに際し
て、前記上面電極膜12a及び下面電極膜12bのうち矢印b,
bで示す折り曲げ方向に対して内側に位置する下面電極
膜2bは、圧縮力によってブレイクされるので、横筋目溝
a2の中心の箇所においてブレイクされることになるが、
前記上面電極膜12a及び下面電極膜12bのうち矢印b,bで
示す折り曲げ方向に対して外側に位置する上面電極膜2a
は、引張力によってブレイクされるものであるから、こ
の引張力によってブレイクされる上面電極膜12aにおけ
る膜厚さが、前記横筋目溝a2内において厚いことは、当
該上面電極膜12aは、第23図に示すように、前記横筋目
溝a2の中心より外れた部位においてブレイクされ、両絶
縁基板11のうち一方の絶縁基板11における上面電極膜12
aは、当該上面電極膜12aのうち前記横筋目溝a2における
溝面a2′の部分が禿げ落ちた形態になる一方、両絶縁基
板11のうち他方の絶縁基板11における上面電極膜12a
は、当該他方の絶縁基板11における側面11aより突出し
た形態になり、更に、この他方の絶縁基板11における上
面電極膜12aのうち側面11aより突出した部分は、絶縁素
材板の移送等の取扱中において、第24図に示すように、
絶縁基板11より欠け落ちることになるから、この他方の
絶縁基板11における上面電極膜12aも、横筋目溝a2にお
ける溝面a2′から禿げ落ちた形態になるのである。
In addition, when the insulating material plate a is broken by applying an external force in the directions of the arrows b, b as described above, the arrows b, b of the upper electrode film 12a and the lower electrode film 12b are
Since the lower surface electrode film 2b located on the inner side with respect to the bending direction shown by b is broken by the compressive force,
Although it will be broken at the center of a2,
Of the upper surface electrode film 12a and the lower surface electrode film 12b, the upper surface electrode film 2a located outside in the bending direction shown by arrows b, b.
Since the film is broken by the tensile force, the film thickness of the upper surface electrode film 12a that is broken by the tensile force is thick in the transverse groove a2 means that the upper surface electrode film 12a is As shown in the figure, the upper electrode film 12 on one insulating substrate 11 of the two insulating substrates 11 is broken at a position deviated from the center of the transverse groove a2.
a is a form in which the groove surface a2 ′ portion in the transverse groove a2 of the upper surface electrode film 12a is baldly dropped, while the upper surface electrode film 12a on the other insulating substrate 11 of both insulating substrates 11 is formed.
Is in a form projecting from the side surface 11a of the other insulating substrate 11, and further, a portion of the upper surface electrode film 12a of the other insulating substrate 11 projecting from the side surface 11a is under handling such as transfer of an insulating material plate. In, as shown in FIG.
Since it will be chipped off from the insulating substrate 11, the upper surface electrode film 12a on the other insulating substrate 11 also has a form that is baldly dropped from the groove surface a2 'in the horizontal groove a2.

従って、絶縁基板11における側面11aに対して、導電性
ペーストを塗着することによって側面電極膜12cを形成
した場合、この側面電極膜12cのうち前記上面電極膜12a
が禿げ落ちた溝面a1′の部分における膜厚さは、第25図
に示すように、極めて薄くなるから、チップ抵抗器をプ
リント基板等に対して実装するに際して、前記電極膜12
をプリント基板に対して半田付けする場合において、前
記電極膜12における側面電極膜12cのうち膜厚さが薄い
部分に、いわゆる、半田くわれ(側面電極膜12cが溶融
半田によって持ち去られること)が発生するのであり、
特に、この半田くわれは、上面電極膜12aにおける幅寸
法を、図示のように、絶縁基板11における幅寸法より狭
くした場合において、顕著に発生するのである。
Therefore, when the side surface electrode film 12c is formed by applying a conductive paste to the side surface 11a of the insulating substrate 11, the top surface electrode film 12a of the side surface electrode film 12c is formed.
As shown in FIG. 25, the film thickness at the groove surface a1 ′ where the baldness has fallen is extremely thin. Therefore, when mounting the chip resistor on a printed circuit board or the like, the electrode film 12
When soldering to a printed circuit board, so-called soldering (the side electrode film 12c is carried away by the molten solder) may occur in a thin film portion of the side electrode film 12c of the electrode film 12. Occurs,
In particular, this solder shaving occurs remarkably when the width dimension of the upper surface electrode film 12a is made narrower than the width dimension of the insulating substrate 11, as shown in the drawing.

また、前記の不具合は、前記絶縁素材板aを、前記矢印
b,bとは反対の方向に外力を加えてブレイクする場合に
も発生するのであった。
In addition, the above-mentioned inconvenience is
It also occurred when the external force was applied in the opposite direction to b and b to break.

本発明は、前記した従来における電極膜の形成方法が有
する不具合を解消した電極膜の形成方法を提供すること
を目的とするものである。
An object of the present invention is to provide a method for forming an electrode film, which solves the problems of the above-described conventional method for forming an electrode film.

〔課題を解決するための手段〕[Means for Solving the Problems]

この目的を達成するため本発明は、多数個の絶縁基板を
縦方向及び横方向に複数個並べた状態の絶縁素材板を、
当該絶縁素材板の上面及び下面に各絶縁基板ごとにブレ
イクするための断面V型の筋目溝を設けて形成し、該絶
縁素材板における各絶縁基板の上面及び下面に、上面電
極膜用の導電性ペースト及び下面電極膜用の導電性ペー
ストを各々塗着したのち乾燥し、次いで、前記絶縁素材
板を、筋目溝に沿って折り曲げることで棒状の絶縁素材
板にブレイクしたのち、この棒状絶縁素材における各絶
縁基板の側面に、前記上面電極膜と下面電極膜とを繋ぐ
側面電極膜用の導電性ペーストを塗着したのち乾燥する
ようにした電極膜の形成方法において、前記絶縁素材板
の上面に上面電極膜用の導電性ペーストを、絶縁素材板
の下面に下面電極膜用の導電性ペーストを各々塗着する
に際して、前記上面電極膜用の導電性ペースト及び前記
下面電極膜用の導電性ペーストのうち、少なくとも、前
記の折り曲げによるブレイクに際して折り曲げの外側と
なる面に対する一方の導電性ペーストを、前記筋目溝を
挟んで隣接する二つの絶縁基板の両方に跨って連続する
ように塗着することなく、前記筋目溝の箇所において分
断するようにして塗着することにした。
In order to achieve this object, the present invention provides an insulating material plate in which a plurality of insulating substrates are arranged in the vertical and horizontal directions.
The insulating material plate is formed by forming a groove having a V-shaped cross section for breaking each insulating substrate on the upper surface and the lower surface of the insulating material plate, and the conductive material for the upper surface electrode film is formed on the upper surface and the lower surface of each insulating substrate of the insulating material plate. Conductive paste and conductive paste for the lower surface electrode film are respectively applied and dried, and then the insulating material plate is bent along the crease grooves to break it into a rod-shaped insulating material plate. In the method for forming an electrode film, which comprises applying a conductive paste for a side surface electrode film connecting the upper surface electrode film and the lower surface electrode film to the side surface of each insulating substrate, and then drying the same, the upper surface of the insulating material plate When the conductive paste for the upper surface electrode film and the conductive paste for the lower surface electrode film are applied to the lower surface of the insulating material plate and the conductive paste for the upper surface electrode film and the lower surface electrode film, respectively. Of the conductive paste, at least one conductive paste for the surface that becomes the outside of the bending at the time of breaking by the bending is applied so as to be continuous across both of the two insulating substrates adjacent to each other with the line groove interposed therebetween. Without doing so, it was decided to apply it so as to be divided at the positions of the groove lines.

〔作 用〕[Work]

絶縁素材板の上面に上面電極膜用の導電性ペーストを、
絶縁素材板の下面に下面電極膜用の導電性ペーストを各
々塗着するに際して、この上面電極膜用の導電性ペース
ト及び下面電極膜用の導電性ペーストのうち、少なくと
も、前記の折り曲げることによるブレイクに際して折り
曲げの外側となる面に対する一方の導電性ペーストを、
筋目溝を挟んで隣接する二つの絶縁基板の両方に跨って
連続するように塗着することなく、前記筋目溝の箇所に
おいて分断するようにして塗着するように構成すると、
この一方の導電性ペーストは、筋目溝における溝面に塗
着されることなく、当該一方の導電性ペーストが乾燥す
るまでの間において、筋目溝内に向って垂れ込むことに
なるから、前記筋目溝における溝面に、前記一方の導電
性ペーストによって膜を形成することができると共に、
前記筋目溝内の最深部における部分における膜の厚さ
を、極めて薄くすることができるか、或いは、前記筋目
溝内の最深部に、電極膜が形成されることを皆無にする
ことができるのである。
Conductive paste for the upper surface electrode film on the upper surface of the insulating material plate,
When applying the conductive paste for the lower surface electrode film to the lower surface of the insulating material plate, at least one of the conductive paste for the upper surface electrode film and the conductive paste for the lower surface electrode film, which is formed by bending At that time, apply one conductive paste to the outside surface of the fold,
If it is configured to be applied so as to be divided at the position of the groove, without being applied so as to be continuous across both of the two insulating substrates that are adjacent to each other across the groove.
This one conductive paste, without being applied to the groove surface in the crease groove, will drip toward the crease groove until the one conductive paste dries, A film can be formed on the groove surface of the groove by the one conductive paste, and
Since the thickness of the film at the deepest portion in the groove line can be made extremely thin, or the electrode film can be prevented from being formed at the deepest portion in the groove line. is there.

〔発明の効果〕〔The invention's effect〕

従って本発明によると、絶縁素材板を、筋目溝に沿って
棒状の絶縁素材板にブレイクするに際して、その上面に
塗着形成した上面電極膜及び下面に塗着成形した下面電
極膜のうちいずれか一方が、前記筋目溝に沿ってのブレ
イクを阻害することを小さくできるから、絶縁素材板
を、前記筋目溝に沿ってブレイクすることの作業性を大
幅に向上できると共に、前記絶縁素材板が、前記筋目溝
の中心よりはずれた箇所においてブレイクすること、つ
まり、絶縁基板に欠けが発生することを低減できるか
ら、製品の歩留り率を大幅に向上にできるのである。
Therefore, according to the present invention, when the insulating material plate is broken along the groove lines into the rod-shaped insulating material plate, one of the upper surface electrode film formed by coating on the upper surface and the lower surface electrode film formed by coating on the lower surface is formed. On the other hand, since it is possible to reduce the inhibition of the break along the score groove, it is possible to significantly improve the workability of breaking the insulating material plate along the score groove, and the insulating material plate, Since it is possible to reduce breakage at a position deviated from the center of the groove line, that is, the occurrence of chipping in the insulating substrate, the yield rate of products can be significantly improved.

しかも、筋目溝における溝面に膜を形成した状態のもと
で、前記筋目溝内の最深部における部分における膜厚さ
を、極めて薄く、或いは、零にすることができるから、
上面電極膜又は下面電極膜のうち筋目溝における溝面の
箇所における部分が、前記のブレイクに際して、溝面か
ら禿げ落ちることを防止でき、従って、この溝面の部分
における膜を、上面電極膜用の導電性ペースト又は下面
電極膜用の導電性ペーストと、側面に塗着した側面電極
膜用の導電性ペーストとの二段重ねの膜にすることがで
き、換言すると、絶縁素材板を折り曲げてのブレイクに
際して、折り曲げの外側に位置する筋目溝の溝面に対す
る電極膜が薄くなることを防止できるから、半田付けに
際して、半田くわれが発生することを確実に低減できる
のである。
Moreover, under the condition that a film is formed on the groove surface of the groove line, the film thickness in the deepest part of the groove line can be made extremely thin or can be made zero.
It is possible to prevent the portion of the upper surface electrode film or the lower surface electrode film at the groove surface portion in the groove line from falling down from the groove surface at the time of the above-mentioned break. The conductive paste or the conductive paste for the lower surface electrode film and the conductive paste for the side surface electrode film coated on the side surface can be formed into a double-layered film, in other words, by bending the insulating material plate. At the time of breaking, it is possible to prevent the electrode film on the groove surface of the groove line located on the outer side of the bending from being thinned, so that it is possible to reliably reduce the occurrence of solder breakage at the time of soldering.

〔実施例〕〔Example〕

以下、本発明の実施例を、チップ型抵抗器のうち、第1
図及び第2図に示すように、絶縁基板1の上面に中心孔
2と同芯円状に抵抗膜3を形成する一方、前記絶縁基板
1の側面に突出するように造形した一対の電極用突起4
に、前記抵抗膜3の両端の各々に対する電極膜5を各々
形成し、前記抵抗膜3に摺接するロータ部材6を、前記
中心孔2を挿通した軸7に回転可能に取付けて成るチッ
プ型の可変抵抗器に対して適用した場合について説明す
る。この場合において、前記電極膜5は、絶縁基板1の
上面における上面電極膜5aと、絶縁基板1の下面におけ
る下面電極膜5bと、絶縁基板1の側面における側面電極
膜5cとによって構成されている。
Hereinafter, the embodiment of the present invention will be described with reference to the first of the chip resistors.
As shown in FIG. 2 and FIG. 2, for a pair of electrodes formed on the upper surface of the insulating substrate 1 so as to form a resistance film 3 concentrically with the central hole 2 and project on the side surface of the insulating substrate 1. Protrusion 4
And a rotor member 6 slidably contacting the resistance film 3 is rotatably attached to a shaft 7 inserted through the center hole 2 in a chip type. A case where the present invention is applied to a variable resistor will be described. In this case, the electrode film 5 is composed of an upper surface electrode film 5a on the upper surface of the insulating substrate 1, a lower surface electrode film 5b on the lower surface of the insulating substrate 1, and a side surface electrode film 5c on the side surface of the insulating substrate 1. .

第3図において、符号Aは、セラミック製の絶縁素材板
を示し、該絶縁素材板Aは、前記絶縁基板1の多数個を
当該絶縁基板1における電極用突起4が外向きとなるよ
うに二列に並べて成る棒状絶縁素材板A1の三枚を、これ
ら三枚の棒状絶縁素材板A1の各絶縁基板1における電極
用突起4の箇所において一体的に連接するようにして構
成され、その両端部には、位置決め用のノッチA4,A5を
備えた耳片A2,A3が一体的に連接され、且つ、前記各絶
絶基板1の相互間、及び各絶縁基板1と両耳片A2,A3と
の間には、第4図に示すように、断面をV型にした縦筋
目溝A6,A7が、絶縁素材板Aにおける上面及び下面の両
方について設けられている。
In FIG. 3, reference numeral A denotes a ceramic insulating material plate, and the insulating material plate A has a plurality of insulating substrates 1 so that the electrode projections 4 on the insulating substrate 1 face outward. The three rod-shaped insulating material plates A1 arranged in rows are integrally connected to each other at the electrode projections 4 of each insulating substrate 1 of these three rod-shaped insulating material plates A1. The ear pieces A2, A3 having notches A4, A5 for positioning are integrally connected to each other, and each of the isolation boards 1 and the insulating board 1 and the two ear pieces A2, A3 are connected to each other. Between them, as shown in FIG. 4, longitudinal groove grooves A6 and A7 having a V-shaped cross section are provided on both the upper surface and the lower surface of the insulating material plate A.

前記絶縁素材板Aを、その下面を上向きになるように裏
返した状態で、当該絶縁素材板Aの下面のうち、各絶縁
基板1における電極用突起4の箇所に、第5図及び第6
図に示すように、下面電極5b用の導電性ペーストをスク
リーン印刷により、横筋目溝A7を挟んで隣接する二つの
絶縁基板1の両方に電極用突起4に跨って連続するよう
にして塗着したのち乾燥することにより、下面電極膜5b
を形成する。
With the lower surface of the insulating material plate A turned upside down, on the lower surface of the insulating material plate A, at the locations of the electrode projections 4 on each insulating substrate 1, as shown in FIGS.
As shown in the figure, a conductive paste for the lower surface electrode 5b is screen-printed on both of the two insulating substrates 1 adjacent to each other across the horizontal groove A7 so as to be continuous over the electrode projections 4. Then, by drying, the bottom electrode film 5b
To form.

次いで、前記絶縁素材板Aを、その上面を上向きにした
状態で、当該絶縁素材板Aの上面のうち、各絶縁基板1
における電極用突起4の箇所に、上面電極膜5a用の導電
性ペーストを、スクリーン印刷によって塗着するに際し
て、この上面電極膜5a用の導電性ペーストを、前記横筋
目溝A7を挟んで隣接する二つの絶縁基板1の両方におけ
る電極用突起4に跨って連続するように塗着することな
く、第7図及び第8図に示すように、前記横筋目溝A7の
箇所において分断するように、換言すれば、各電極用突
起4に各々別に塗着して、乾燥することにより、上面電
極膜5aを形成する。この場合において、上面電極膜5a
は、各絶縁基板1における電極用突起4の幅一杯に形成
する。
Next, with the upper surface of the insulating material plate A facing upward, each insulating substrate 1 on the upper surface of the insulating material plate A.
When the conductive paste for the upper surface electrode film 5a is applied by screen printing to the place of the electrode projection 4 in the above, the conductive paste for the upper surface electrode film 5a is adjacent to the electrode projection 4 with the transverse groove A7 interposed therebetween. As shown in FIG. 7 and FIG. 8, without being continuously applied over the electrode projections 4 on both of the two insulating substrates 1, as shown in FIG. 7 and FIG. In other words, the upper surface electrode film 5a is formed by separately coating the electrode protrusions 4 and drying. In this case, the upper surface electrode film 5a
Is formed so as to fill the width of the electrode projection 4 on each insulating substrate 1.

これらが終わると、前記絶縁素材板Aの上面のうち、各
絶縁基板1の箇所に、第9図及び第10図に示すように、
抵抗膜3用のペーストを、スクリーン印刷にて塗着した
のち乾燥することによって、抵抗膜3を形成する。
When these are finished, on the upper surface of the insulating material plate A, at the location of each insulating substrate 1, as shown in FIGS. 9 and 10,
The resistance film 3 is formed by applying a paste for the resistance film 3 by screen printing and then drying.

その後において前記絶縁素材板Aを、第10図に矢印B,B
で示す方向に外力を加えて折り曲げることによって、第
11図及び第12図に示すように、横筋目溝A7に沿って各棒
状絶縁素材板A1ごとにブレイクし、次いで、この棒状絶
縁素材板A1の各絶縁基板1における電極用突起4の先端
部側面4aに、第13図に示すように、側面電極膜15c用の
導電性ペーストをスクリーン印刷等にて、当該電極用突
起4の幅一杯にわたって塗着して、乾燥することによ
り、側面電極膜5cを形成する。
After that, the insulating material plate A is shown in FIG.
By bending by applying an external force in the direction indicated by
As shown in FIG. 11 and FIG. 12, each rod-shaped insulating material plate A1 is broken along the transverse groove A7, and then the tip end portion of the electrode projection 4 on each insulating substrate 1 of this rod-shaped insulating material plate A1 is broken. As shown in FIG. 13, a conductive paste for the side surface electrode film 15c is applied to the side surface 4a over the width of the electrode projection 4 by screen printing or the like, and dried to form a side surface electrode film. Form 5c.

なお、前記各棒状絶縁素材板A1は、前記側面電極膜5cの
形成後において、縦筋目溝A6及び横筋目溝A7に沿って、
各絶縁基板1ごとにブレイクされる。
Incidentally, each of the rod-shaped insulating material plate A1, after forming the side surface electrode film 5c, along the longitudinal groove A6 and the horizontal groove A7,
Each insulating substrate 1 is broken.

そして、前記のように、絶縁素材板Aの上面のうち、各
絶縁基板1における電極用突起4の箇所に、上面電極膜
5a用の導電性ペーストをスクリーン印刷によって塗着す
るに際して、本発明は、前記絶縁素材板Aを、横筋目溝
A7に沿って折り曲げることによってブレイクするに際し
て、その折り曲げの外側となる面に対する上面電極膜5a
用の導電性ペーストを、前記横筋目溝A7を挟んで隣接す
る二つの絶縁基板1の両方における電極用突起4に跨っ
て連続するように塗着することなく、前記横筋目溝A7の
箇所において分断するようにして塗着するもので、横筋
目溝A7内には、各絶縁基板1における電極用突起4の上
面に塗着した導電性ペーストが垂れ込むことになるか
ら、前記横筋目溝A7における溝面A7′に塗着形成される
上面電極膜5aは、第8図に示すように、その膜厚さが横
筋目溝A7における最も深い部分に向って次第に薄くなる
形態になる。
Then, as described above, the upper surface electrode film is formed on the upper surface of the insulating material plate A at the position of the electrode projection 4 on each insulating substrate 1.
In applying the conductive paste for 5a by screen printing, the present invention is characterized in that the insulating material plate A is
When breaking by bending along A7, the upper surface electrode film 5a for the outer surface of the bending
At the location of the horizontal groove A7 without applying the conductive paste for use continuously over the electrode projections 4 on both of the two insulating substrates 1 adjacent to each other with the horizontal groove A7 interposed therebetween. The conductive paste applied to the upper surfaces of the electrode projections 4 on each insulating substrate 1 hangs down in the horizontal groove groove A7. The upper surface electrode film 5a formed by coating on the groove surface A7 'has a thickness gradually decreasing toward the deepest portion of the transverse groove A7, as shown in FIG.

すなわち、本発明によると、横筋目溝A7における溝面A
7′に上面電極膜5aを形成することができるものであり
ながら、当該溝面A7′における膜厚さを、横筋目溝A7に
おける最も深い部分に向って次第に薄くなる形態にする
ことができ、換言すると、横筋目溝A7における溝面A7′
に膜を成形した状態のもとで、前記横筋目溝A7内の最深
部における部分における膜の厚さを、極めて薄くするこ
とができるか、或いは、前記横筋目溝A7内の最深部に、
膜が形成されることを皆無にすることができる。
That is, according to the present invention, the groove surface A in the transverse groove A7
Although the upper surface electrode film 5a can be formed on 7 ', the thickness of the groove surface A7' can be gradually thinned toward the deepest part of the transverse groove A7, In other words, the groove surface A7 ′ in the transverse groove A7
Under the condition that the film is formed in, the thickness of the film in the deepest part in the transverse groove A7 can be made extremely thin, or in the deepest part in the transverse groove A7,
No film can be formed.

従って、前記横筋目溝A7に沿ってのブレイクに際して、
上面電極膜5aが、前記横筋目溝A7に沿ってのブレイクを
阻害することを小さくできるから、絶縁素材板Aを、前
記横筋目溝A7に沿ってブレイクすることの作業性を大幅
に向上できると共に、前記絶縁素材板Aが、前記横筋目
溝A7の中心からはずされた箇所においてブレイクするこ
とを防止できるのである。
Therefore, when breaking along the transverse groove A7,
Since the upper surface electrode film 5a can reduce the inhibition of the break along the transverse groove A7, the workability of breaking the insulating material plate A along the transverse groove A7 can be significantly improved. At the same time, it is possible to prevent the insulating material plate A from breaking at a position removed from the center of the transverse streak groove A7.

また、前記のように横筋目溝A7内の最深部における部分
における膜厚さを、極めて薄く、或いは、零にすること
ができるから、前記のブレイクに際して、上面電極膜5a
のうち横筋目溝A7における溝面A7′の箇所における部分
が、溝面A7′から禿げ落ちることを防止できる。
Further, as described above, since the film thickness at the deepest portion in the transverse groove A7 can be made extremely thin or can be made zero, the upper surface electrode film 5a at the time of the above break.
It is possible to prevent the portion of the transverse groove A7 at the groove surface A7 'from falling down from the groove surface A7'.

その結果、各絶縁基板1における電極用突起4の先端部
側面4aに、側面電極膜5c用の導電性ペーストを塗着した
場合に、横筋目溝A7における溝面A7′には、第13図に示
すように、上面に塗着した上面電極膜5a用の導電性ペー
ストと、側面に塗着した側面電極膜5c用の導電性ペース
トとの二段重ねの膜を形成することができるから、側面
電極膜5cが、溝面A7′の箇所において部分的に薄くなる
ことを防止できるのである。
As a result, when the conductive paste for the side surface electrode film 5c is applied to the tip end side surface 4a of the electrode projection 4 in each insulating substrate 1, the groove surface A7 'in the transverse groove A7 has a surface shown in FIG. As shown in, it is possible to form a two-stage film of the conductive paste for the upper surface electrode film 5a applied on the upper surface and the conductive paste for the side surface electrode film 5c applied on the side surface, It is possible to prevent the side surface electrode film 5c from being partially thinned at the position of the groove surface A7 '.

なお、前記実施例は、上面電極膜5a用の導電性ペースト
及び下面電極膜5b用の導電性ペーストのうち、上面電極
膜5a用の導電性ペーストのみを、横筋目溝A7の箇所で分
断するようにして塗着する場合を示したが、本発明に
は、これに限らず、絶縁素材板Aを、前記矢印B,Bの方
向とは逆の方向に外力を加えてブレイクする場合には、
下面電極膜5b用の導電性ペーストのみを、横筋目溝A7の
箇所で分断するようにして塗着すれば良いのであり、勿
論、上面電極膜5a用の導電性ペースト及び下面電極膜5b
用の導電性ペーストの両方を、横筋目溝A7の箇所で分断
するようにして塗着しても良いのである。
Incidentally, in the above-mentioned embodiment, of the conductive paste for the upper surface electrode film 5a and the conductive paste for the lower surface electrode film 5b, only the conductive paste for the upper surface electrode film 5a is divided at the position of the horizontal groove A7. Although the case of coating is shown as described above, the present invention is not limited to this, and in the case of breaking the insulating material plate A by applying an external force in a direction opposite to the direction of the arrows B, B, ,
Only the conductive paste for the lower surface electrode film 5b may be applied so as to be divided at the position of the horizontal groove A7, and of course, the conductive paste for the upper surface electrode film 5a and the lower surface electrode film 5b.
Both of the conductive pastes for use may be applied so as to be divided at the positions of the horizontal groove A7.

【図面の簡単な説明】[Brief description of drawings]

第1図はチップ型可変抵抗器の平面図、第2図は第1図
のII−II視断面図、第3図〜第13図は本発明の実施例を
示す図であり、第3図は絶縁素材板の平面図、第4図は
第3図のIV−IV視拡大断面図、第5図は下面電極膜用導
電性ペーストを塗着したときの平面図、第6図は第5図
のVI−VI視拡大断面図、第7図は上面電極膜用導電性ペ
ーストを塗着したときの平面図、第8図は第7図のVIII
−VIII視拡大断面図、第9図は抵抗膜を塗着したときの
平面図、第10図は第9図のX−X視拡大断面図、第11図
は棒状絶縁素材板ごとにブレイクしたときの平面図、第
12は第11図のXII−XII視拡大断面図、第13図は側面電極
膜用導電ペースを塗着したときの拡大断面図、第14図〜
第25図は従来の方法を示す図であり、第14図は絶縁素材
板の平面図、第15図は第14図のXV−XV視拡大断面図、第
16図は下面電極膜を塗着したときの平面図、第17図は第
16図のXVII−XVII視拡大断面図、第18図は上面電極膜を
塗着したときの平面図、第19図は第18図のXIX−XIX視拡
大断面図、第20図は抵抗膜を塗着したときの平面図、第
21図は第20図のXXI−XXI視拡大断面図、第22図は棒状絶
縁素材板ごとにブレイクしたときの平面図、第23図は第
22図のXXIII−XXIII視拡大断面図、第24図は第23図の別
の断面図、第25図は第22図のXXV−XXV視拡大断面図であ
る。 1……絶縁基板、3……抵抗膜、4……電極用突起、5
……電極膜、5a……上面電極膜、5b……下面電極膜、5c
……側面電極膜、6……ロータ部材、A……絶縁素材
板、A1……棒状絶縁素材板、A6,A7……筋目溝。
FIG. 1 is a plan view of a chip type variable resistor, FIG. 2 is a sectional view taken along line II-II of FIG. 1, and FIGS. 3 to 13 are views showing an embodiment of the present invention. Is a plan view of the insulating material plate, FIG. 4 is an enlarged sectional view taken along line IV-IV of FIG. 3, FIG. 5 is a plan view when the conductive paste for the lower surface electrode film is applied, and FIG. VI-VI enlarged cross-sectional view of FIG. 7, FIG. 7 is a plan view when the conductive paste for the upper surface electrode film is applied, and FIG. 8 is VIII of FIG.
-VIII enlarged cross-sectional view, FIG. 9 is a plan view when a resistance film is applied, FIG. 10 is an enlarged cross-sectional view taken along line XX of FIG. 9, and FIG. 11 is broken for each rod-shaped insulating material plate. When the plan view, No.
12 is an enlarged cross-sectional view taken along the line XII-XII in FIG. 11, FIG. 13 is an enlarged cross-sectional view when a conductive pace for a side electrode film is applied, and FIG.
FIG. 25 is a diagram showing a conventional method, FIG. 14 is a plan view of an insulating material plate, FIG. 15 is an enlarged sectional view taken along line XV-XV of FIG. 14,
Figure 16 is a plan view of the bottom electrode film applied, and Figure 17 is a plan view.
FIG. 16 is an enlarged cross-sectional view taken along line XVII-XVII, FIG. 18 is a plan view when the upper electrode film is applied, FIG. 19 is an enlarged cross-sectional view taken along line XIX-XIX of FIG. 18, and FIG. 20 is a resistance film. Top view of the painted
FIG. 21 is an enlarged sectional view taken along the line XXI-XXI of FIG. 20, FIG. 22 is a plan view when breaking each rod-shaped insulating material plate, and FIG.
22 is an enlarged sectional view taken along line XXIII-XXIII of FIG. 24, FIG. 24 is another sectional view of FIG. 23, and FIG. 25 is an enlarged sectional view taken along line XXV-XXV of FIG. 1 ... Insulating substrate, 3 ... Resistive film, 4 ... Electrode protrusion, 5
...... Electrode film, 5a …… Upper surface electrode film, 5b …… Lower surface electrode film, 5c
...... Side electrode film, 6 ...... Rotor member, A …… Insulation material plate, A1 …… Bar-shaped insulation material plate, A6, A7 …… Score groove.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】多数個の絶縁基板を縦方向及び横方向に複
数個並べた状態の絶縁素材板を、当該絶縁素材板の上面
及び下面に各絶縁基板ごとにブレイクするための断面V
型の筋目溝を設けて形成し、該絶縁素材板における各絶
縁基板の上面及び下面に、上面電極膜用の導電性ペース
ト及び下面電極膜用の導電性ペーストを各々塗着したの
ち乾燥し、次いで、前記絶縁素材板を、筋目溝に沿って
折り曲げることで棒状の絶縁素材板にブレイクしたの
ち、この棒状絶縁素材における各絶縁基板の側面に、前
記上面電極膜と下面電極膜とを繋ぐ側面電極膜用の導電
性ペーストを塗着したのち乾燥するようにした電極膜の
形成方法において、前記絶縁素材板の上面に上面電極膜
用の導電性ペーストを、絶縁素材板の下面に下面電極膜
用の導電性ペーストを各々塗着するに際して、前記上面
電極膜用の導電性ペースト及び前記下面電極膜用の導電
性ペーストのうち、少なくとも、前記の折り曲げによる
ブレイクに際して折り曲げの外側となる面に対する一方
の導電性ペーストを、前記筋目溝を挟んで隣接する二つ
の絶縁基板の両方に跨って連続するように塗着すること
なく、前記筋目溝の箇所において分断するようにして塗
着することを特徴とする電子部品における電極膜の形成
方法。
1. A cross-section V for breaking an insulating material plate in which a plurality of insulating substrates are arranged in the vertical and horizontal directions for each insulating substrate on the upper surface and the lower surface of the insulating material plate.
Formed by forming a groove line of the mold, the conductive paste for the upper surface electrode film and the conductive paste for the lower surface electrode film are respectively applied to the upper surface and the lower surface of each insulating substrate in the insulating material plate, and then dried. Then, the insulating material plate is bent along the grooves to break it into a rod-shaped insulating material plate, and the side surface of each insulating substrate in the rod-shaped insulating material is a side surface connecting the upper surface electrode film and the lower surface electrode film. In the method of forming an electrode film, which comprises applying a conductive paste for an electrode film and then drying it, a conductive paste for an upper surface electrode film is formed on an upper surface of the insulating material plate, and a lower surface electrode film is formed on a lower surface of the insulating material plate. When applying the conductive paste for each of the above, when at least one of the conductive paste for the upper surface electrode film and the conductive paste for the lower surface electrode film is folded at the time of break due to the bending. One conductive paste for the surface that is the outside of the bending is divided so as to be divided at the position of the groove groove without being applied so as to be continuous over both of the two insulating substrates adjacent to each other with the groove groove interposed therebetween. A method for forming an electrode film in an electronic component, which comprises applying the electrode film as described above.
JP1027928A 1989-02-07 1989-02-07 Method for forming electrode film in electronic component Expired - Fee Related JPH0748410B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1027928A JPH0748410B2 (en) 1989-02-07 1989-02-07 Method for forming electrode film in electronic component

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1027928A JPH0748410B2 (en) 1989-02-07 1989-02-07 Method for forming electrode film in electronic component

Publications (2)

Publication Number Publication Date
JPH02207501A JPH02207501A (en) 1990-08-17
JPH0748410B2 true JPH0748410B2 (en) 1995-05-24

Family

ID=12234550

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1027928A Expired - Fee Related JPH0748410B2 (en) 1989-02-07 1989-02-07 Method for forming electrode film in electronic component

Country Status (1)

Country Link
JP (1) JPH0748410B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017204500A (en) * 2016-05-09 2017-11-16 Koa株式会社 Chip component and manufacturing method of chip component

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52140857A (en) * 1976-05-19 1977-11-24 Matsushita Electric Ind Co Ltd Chip resistor element and method of making same
JPS5814505A (en) * 1981-07-17 1983-01-27 松下電器産業株式会社 Method of producing chip resistor
JPS6252917A (en) * 1985-08-30 1987-03-07 株式会社村田製作所 Manufacture of single-plate capacitor

Also Published As

Publication number Publication date
JPH02207501A (en) 1990-08-17

Similar Documents

Publication Publication Date Title
JPH08306503A (en) Chip-like electronic part
JP6688025B2 (en) Chip resistor and method of manufacturing chip resistor
JPH0748410B2 (en) Method for forming electrode film in electronic component
CN108140460B (en) Chip resistor
JPH04372101A (en) Square-shaped chip resistor and its manufacture
JPH0537271A (en) Electrode forming method for chip parts
JPH09306710A (en) Chip network electronic component
US5691690A (en) Chip type jumper
JPH0653004A (en) Rectangular chip resistor and its manufacture
KR19990014806A (en) Multi element type chip device and its manufacturing method
JP2559471B2 (en) Chip resistor manufacturing method
JPH11204313A (en) Electronic component and manufacture thereof
JPS6027101A (en) Multistage chip resistor
JPH0452002B2 (en)
JP2757948B2 (en) Manufacturing method of chip-type composite electronic component
JP3469227B2 (en) Manufacturing method of multiple chip electronic components
JPH10208901A (en) Chip type and production thereof
JP2694843B2 (en) Method for manufacturing substrate piece in chip variable resistor
JP2002231503A (en) Chip resistor and its manufacturing method
JPH062243Y2 (en) Chip resistance
JPH0325362Y2 (en)
JPH0626210U (en) Multiple resistors
JPH11191517A (en) Chip-type composite component
JP2002208506A (en) Shape of through-hole of multiple electronic part
JPH08330115A (en) Network electronic component

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees