JPH07312468A - Flexible circuit board - Google Patents
Flexible circuit boardInfo
- Publication number
- JPH07312468A JPH07312468A JP12829394A JP12829394A JPH07312468A JP H07312468 A JPH07312468 A JP H07312468A JP 12829394 A JP12829394 A JP 12829394A JP 12829394 A JP12829394 A JP 12829394A JP H07312468 A JPH07312468 A JP H07312468A
- Authority
- JP
- Japan
- Prior art keywords
- resin film
- thermoplastic resin
- thermoplastic
- wiring pattern
- polyimide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920001721 polyimide Polymers 0.000 claims abstract description 48
- 229920005992 thermoplastic resin Polymers 0.000 claims abstract description 48
- 239000009719 polyimide resin Substances 0.000 claims abstract description 40
- 239000000758 substrate Substances 0.000 claims abstract description 25
- 239000000463 material Substances 0.000 claims abstract description 20
- 229920001169 thermoplastic Polymers 0.000 claims description 13
- 239000004416 thermosoftening plastic Substances 0.000 claims description 13
- 229920006259 thermoplastic polyimide Polymers 0.000 claims description 10
- 239000004696 Poly ether ether ketone Substances 0.000 claims description 9
- 229920002530 polyetherether ketone Polymers 0.000 claims description 9
- 239000002344 surface layer Substances 0.000 claims description 8
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 claims description 5
- 229920002492 poly(sulfone) Polymers 0.000 claims description 5
- 239000012815 thermoplastic material Substances 0.000 claims 2
- 230000015572 biosynthetic process Effects 0.000 abstract description 4
- 239000010410 layer Substances 0.000 description 20
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 12
- 239000011889 copper foil Substances 0.000 description 12
- 239000000126 substance Substances 0.000 description 12
- 239000000853 adhesive Substances 0.000 description 10
- 230000001070 adhesive effect Effects 0.000 description 9
- 229920001187 thermosetting polymer Polymers 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 239000004642 Polyimide Substances 0.000 description 5
- 238000005530 etching Methods 0.000 description 5
- 230000004927 fusion Effects 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 206010040844 Skin exfoliation Diseases 0.000 description 4
- 239000011162 core material Substances 0.000 description 4
- 239000002356 single layer Substances 0.000 description 4
- 239000004809 Teflon Substances 0.000 description 3
- 229920006362 Teflon® Polymers 0.000 description 3
- 239000012790 adhesive layer Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- WKDNYTOXBCRNPV-UHFFFAOYSA-N bpda Chemical compound C1=C2C(=O)OC(=O)C2=CC(C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 WKDNYTOXBCRNPV-UHFFFAOYSA-N 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000007731 hot pressing Methods 0.000 description 2
- 230000001771 impaired effect Effects 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 238000002788 crimping Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- MSNOMDLPLDYDME-UHFFFAOYSA-N gold nickel Chemical compound [Ni].[Au] MSNOMDLPLDYDME-UHFFFAOYSA-N 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000011344 liquid material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/0353—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
- H05K1/036—Multilayers with layers of different types
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
Landscapes
- Laminated Bodies (AREA)
- Structure Of Printed Boards (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
(57)【要約】
【目的】この発明は殊に多層配線基板において良好なフ
レキシブル性を有し、配線パターンを熱圧着により配線
できる、コスト安廉なるフレキシブル配線基板を提供す
る。
【構成】ポリイミド樹脂フィルム1の片面又は両面に熱
可塑性樹脂フィルム2を該熱可塑性樹脂フィルム2の熱
可塑性により母材融着して回路形成用絶縁基板を形成
し、少なくとも上記熱可塑性樹脂フィルム2の表面に熱
可塑性樹脂フィルム2の熱可塑性により配線パターン3
を母材融着したフレキシブル回路基板。
(57) [Abstract] [PROBLEMS] To provide a flexible wiring board, which has good flexibility, particularly in a multilayer wiring board, and which allows wiring patterns to be wired by thermocompression bonding, at low cost. [Structure] A thermoplastic resin film 2 is fused on one side or both sides of a polyimide resin film 1 by a thermoplasticity of the thermoplastic resin film 2 to form an insulating substrate for circuit formation, and at least the thermoplastic resin film 2 is formed. The wiring pattern 3 is formed on the surface of the wiring pattern by the thermoplasticity of the thermoplastic resin film 2.
Flexible circuit board in which the base material is fused.
Description
【0001】[0001]
【産業上の利用分野】この発明は転写法等により配線パ
ターンを有利に形成できるフレキシブル配線基板に関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a flexible wiring board on which a wiring pattern can be advantageously formed by a transfer method or the like.
【0002】[0002]
【従来の技術】従来の一層のフレキシブル配線基板は一
般に単層の熱硬化性ポリイミドフィルムを回路形成用絶
縁基板とし、その表面に銅箔を接着剤を介して貼り付
け、この銅箔にエッチング処理を施して配線パターンを
形成していた。2. Description of the Related Art A conventional single-layer flexible wiring board is generally a single-layer thermosetting polyimide film used as an insulating substrate for circuit formation, and a copper foil is attached to the surface of the circuit board with an adhesive, and the copper foil is etched. To form the wiring pattern.
【0003】つまり配線パターンは接着剤を介して単層
のポリイミドフィルム表面に貼り付けられていた。この
接着剤としてはその接着性からエポキシ系又はアクリル
系が多用されている。That is, the wiring pattern was attached to the surface of the single-layer polyimide film via an adhesive. Epoxy-based or acrylic-based adhesives are often used as the adhesive due to its adhesiveness.
【0004】又2層のフレキシブル配線基板ではポリイ
ミド樹脂フィルムの両面に同様に配線パターンを形成
し、これらをスルーホールにより層間接続している。こ
れらの配線パターンを導電ペーストの印刷により形成す
る方法も知られている。In a two-layer flexible wiring board, wiring patterns are similarly formed on both sides of a polyimide resin film, and these are interconnected by through holes. A method of forming these wiring patterns by printing a conductive paste is also known.
【0005】又3層以上の多層配線基板は上記の構造の
配線基板を複数枚接着剤を介して重ね付けし形成してい
る。この場合、(層数−1)枚のポリイミド樹脂フィル
ムが必要となり、ポリイミド樹脂フィルムが高価である
ことと、2枚以上の貼り合せではフレキシブル性が極端
に損なわれるため、一般に3層以上ではフレキシブル基
板として存在しない。又ポリミドフィルムが高価である
ことからも3層以上の基板ではガラスエポキシ樹脂等を
用いるリジット基板となっている。A multilayer wiring board having three or more layers is formed by stacking a plurality of wiring boards having the above structure with an adhesive. In this case, (number of layers-1) sheets of polyimide resin film are required, the polyimide resin film is expensive, and the flexibility of bonding two or more sheets is extremely impaired. Does not exist as a substrate. Further, since the polyimide film is expensive, a substrate having three or more layers is a rigid substrate using glass epoxy resin or the like.
【0006】[0006]
【発明が解決しようとする問題点】従来の配線基板の表
面層は絶縁基板の表面に配線パターンが形成されている
ために、自ずとこの配線パターンは絶縁基板表面より出
張っており張り合せ強度(配線パターン保持強度)には
限界があり外力により剥離と損傷の恐れを有している。
特に、導電ペーストの印刷による配線パターンでは、そ
の配線パターンの保持強度が問題になる。上記保持強度
を得るものとして、配線パターン保護用のカバーコート
の効果が考えられる。しかし、強力なカバーコートは本
来のフレキシブル性を損ない、薄く柔らかいカバーコー
トは保持強度の向上を期待できない。一方、銅箔エッチ
ングによる配線パターンの形成や多層配線基板に用いる
接着剤は硬化によって配線基板に剛性を付加し、絶縁基
板を形成するポリイミド樹脂のフレキシブル性を損なう
欠点を有している。3層以上の基板では上記のごとく、
ポリイミドフィルムを2枚以上用いるため、所期のフレ
キシブル性を著しく損ない、加えて高価である。Since the surface layer of the conventional wiring board has a wiring pattern formed on the surface of the insulating substrate, this wiring pattern naturally travels from the surface of the insulating substrate and the bonding strength (wiring strength) There is a limit to the pattern holding strength) and there is a risk of peeling and damage due to external force.
In particular, in a wiring pattern formed by printing a conductive paste, the holding strength of the wiring pattern becomes a problem. The effect of the cover coat for protecting the wiring pattern can be considered as a material for obtaining the above holding strength. However, a strong cover coat impairs the original flexibility, and a thin and soft cover coat cannot be expected to improve the holding strength. On the other hand, an adhesive used for forming a wiring pattern by etching copper foil and for a multilayer wiring board has a drawback that it adds rigidity to the wiring board by curing and impairs the flexibility of the polyimide resin forming the insulating board. As mentioned above for substrates with three or more layers,
Since two or more polyimide films are used, the desired flexibility is significantly impaired and, in addition, it is expensive.
【0007】[0007]
【問題点を解決するための手段】この発明は上記問題点
を解決する手段として、ポリイミド樹脂フィルムに熱可
塑性樹脂フィルムを母材融着して回路形成用絶縁基板を
形成し、この熱可塑性フィルムの表面を配線パターンの
密着面として供する構成としたものである。即ち層間に
接着層のない構成である。As a means for solving the above problems, the present invention forms a circuit forming insulating substrate by fusing a thermoplastic resin film to a polyimide resin film as a base material. The surface of is used as a contact surface of the wiring pattern. That is, there is no adhesive layer between layers.
【0008】又この発明は上記ポリイミド樹脂フィルム
又は熱可塑性樹脂フィルムの表面に配線パターンを形成
し、この配線パターンを上記熱可塑性樹脂フィルムの表
層に埋め込む構成としたフレキシブル回路基板を提供す
るものである。即ち、フレキシブル性に多少難点がある
が、寸法精度と強度をもつポリイミド樹脂フィルムとフ
レキシブル性に優れるが、寸法精度や強度に問題がある
熱可塑性樹脂フィルムを組み合わせることにより、一定
の硬さと寸法精度、強度をもちフレキシブル性を富有す
る回路基板を得たものである。このフレキシブル性は多
層配線基板において顕著である。The present invention also provides a flexible circuit board in which a wiring pattern is formed on the surface of the polyimide resin film or the thermoplastic resin film and the wiring pattern is embedded in the surface layer of the thermoplastic resin film. . That is, there is some difficulty in flexibility, but a combination of a polyimide resin film having dimensional accuracy and strength and a thermoplastic resin film that is excellent in flexibility but has problems in dimensional accuracy and strength provides a certain level of hardness and dimensional accuracy. Thus, a circuit board having strength and flexibility is obtained. This flexibility is remarkable in the multilayer wiring board.
【0009】上記熱可塑性樹脂フィルムの適材として熱
可塑性ポリエーテルエーテルケトン又は熱可塑性ポリサ
ルホン又は熱可塑性ポリイミドを用いた。As a suitable material for the thermoplastic resin film, thermoplastic polyether ether ketone, thermoplastic polysulfone, or thermoplastic polyimide was used.
【0010】又上記熱硬化性ポリイミド樹脂フィルムの
両面に上記熱可塑性樹脂フィルムを母材融着して回路形
成用絶縁基板を形成し、上記配線パターンを形成した。Further, the thermoplastic resin film is fused on both sides of the thermosetting polyimide resin film as a base material to form an insulating substrate for circuit formation, and the wiring pattern is formed.
【0011】又上記配線パターンの表面に熱可塑性ポリ
イミド樹脂等の熱可塑性樹脂から成るカバーコートを施
した。A cover coat made of a thermoplastic resin such as a thermoplastic polyimide resin is applied to the surface of the wiring pattern.
【0012】[0012]
【作用】上記フレキシブル配線基板においては、配線パ
ターンをポリイミド樹脂フィルムの表面に母材融着した
熱可塑性樹脂フィルムの熱可塑化を利用し容易に且つ強
固に母材融着できる。又この融着の態様として熱可塑性
樹脂フィルムの熱可塑化によってその表層に配線パター
ンを埋め込みパターン表面のみが露出する配線構造とす
ることができるから、密着強度が著しく増加し衝撃や外
力によるパターン剥離や損傷の問題を有効に解決する。In the above flexible wiring board, the base material can be easily and firmly fused by utilizing the thermoplasticization of the thermoplastic resin film in which the wiring pattern is fused on the surface of the polyimide resin film. Further, as a mode of this fusion, a wiring pattern can be formed by embedding a wiring pattern in the surface layer by thermoplasticization of the thermoplastic resin film, so that the adhesion strength is remarkably increased and pattern peeling due to impact or external force is caused. And effectively solve the problem of damage.
【0013】総じて配線パターンを熱可塑性フィルムに
表面融着した場合でも又同パターンを埋め込み融着した
場合もフレキシブル性を損なわずに所要の密着強度を付
加でき、曲げに対するパターン剥離の問題も解決する。Generally, even when the wiring pattern is surface-fused to the thermoplastic film or the same pattern is embedded and fused, a required adhesion strength can be added without impairing the flexibility and the problem of pattern peeling due to bending can be solved. .
【0014】又熱可塑性樹脂フィルムをポリイミド樹脂
フィルムに融着する工程と、配線パターン又はエッチン
グ用銅箔を上記熱可塑性樹脂フィルムに融着する工程と
が熱プレス法により加熱圧着する一工程で完成するか
ら、作業の省力化とコストダウンを達成できる。Further, the step of fusing the thermoplastic resin film to the polyimide resin film and the step of fusing the wiring pattern or the copper foil for etching to the thermoplastic resin film are completed in one step of thermocompression bonding by a hot pressing method. Therefore, labor saving and cost reduction can be achieved.
【0015】又3層以上の多層配線基板は一枚のポリイ
ミド樹脂フィルムの両面に熱可塑性樹脂フィルムを母材
融着した基板を用いることにより、4層までは一枚のポ
リイミド樹脂フィルムで容易に形成でき、フレキシブル
性を富有させることができると共に、基板コストを低減
できる。For a multi-layer wiring board having three or more layers, by using a substrate in which thermoplastic resin films are fused on both sides of one polyimide resin film as a base material, up to four layers can be easily formed by one polyimide resin film. It can be formed, the flexibility can be enhanced, and the substrate cost can be reduced.
【0016】又熱可塑性フィルムとして熱可塑性ポリエ
ーテルエーテルケトン、熱可塑性ポリサルホン、熱可塑
性ポリイミドを用いることにより、上記芯材となるポリ
イミド及び配線パターンとの密着性(融着性)、埋め込
み配線形態が良好に得られる。Further, by using thermoplastic polyetheretherketone, thermoplastic polysulfone, or thermoplastic polyimide as the thermoplastic film, the adhesiveness (fusing property) with the polyimide serving as the core material and the wiring pattern, and the embedded wiring form It can be obtained well.
【0017】[0017]
【実施例】以下この発明を図1乃至図7に基いて説明す
る。DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below with reference to FIGS.
【0018】ガラスエポキシ樹脂板を回路形成用絶縁基
板として用いた場合には折れ易い欠点があり、この欠点
を解消する基板素材として耐熱性、強度、寸法精度上か
ら主にポリイミド樹脂フィルムが用いられている。When a glass epoxy resin plate is used as an insulating substrate for forming a circuit, it has a drawback that it is easily broken. As a substrate material for solving this drawback, a polyimide resin film is mainly used in view of heat resistance, strength and dimensional accuracy. ing.
【0019】ポリイミド樹脂フィルムは比較的硬い材料
なため一層の回路基板では良好なフレキシブル性が得ら
れるが、2層以上の基板、すなわちポリイミド樹脂フィ
ルムが2枚以上重なる場合は、そのフレキシブル性が極
端に損なわれる。したがって、2層以上のポリイミド樹
脂フィルムの基板素材の回路基板では上記フィルムの折
り曲げ個所にスリット状の穴を設けることもしばしば行
われる。また従来の配線基板はこのポリイミド樹脂フィ
ルム単体を芯材とし、その表面に銅箔を接着剤を介し張
り合せたものを基板として準備し、この銅箔にエッチン
グ処理を施して配線パターンを形成している。一般に上
記接着剤も硬く、上記フレキシブル性を損なうものとな
っている。Since the polyimide resin film is a relatively hard material, good flexibility can be obtained with a single-layer circuit board. However, when two or more layers of boards, that is, two or more polyimide resin films overlap, the flexibility is extremely high. Be damaged by. Therefore, in a circuit board made of a substrate material of two or more layers of polyimide resin film, a slit-like hole is often provided at a bent portion of the film. In addition, a conventional wiring board is prepared by using this polyimide resin film alone as a core material, and laminating copper foil on its surface with an adhesive agent as a board, and forming a wiring pattern by etching the copper foil. ing. Generally, the adhesive is also hard and impairs the flexibility.
【0020】ここではポリイミド樹脂フィルム、好まし
くは熱硬化性ポリイミド樹脂フィルム1を芯材として用
い、これに熱可塑性樹脂フィルム2を熱圧着にて融着し
絶縁基板を形成したものであり、これを回路形成用の基
板として供するようにした。Here, a polyimide resin film, preferably a thermosetting polyimide resin film 1 is used as a core material, and a thermoplastic resin film 2 is fused thereto by thermocompression bonding to form an insulating substrate. It served as a substrate for circuit formation.
【0021】上記熱可塑性樹脂フィルムとしては熱可塑
性ポリエーテルエーテルケトンが最適であり、他に熱可
塑性ポリサルホン又は熱可塑性ポリイミドが適当であ
る。As the thermoplastic resin film, thermoplastic polyetheretherketone is most suitable, and thermoplastic polysulfone or thermoplastic polyimide is also suitable.
【0022】図1,図2に示すように、熱硬化性ポリイ
ミド樹脂フィルム1の一方又は双方の表面にポリエーテ
ルエーテルケトンフィルムから成る熱可塑性樹脂フィル
ム2を熱圧着にて加熱融着し、この熱可塑性樹脂フィル
ム2(ポリエーテルエーテルケトンフィルム)の外表面
に配線パターン3を密着し、この配線パターン3をフィ
ルム2の熱可塑性を利用し、母材表層部に埋め込み状態
に融着し、又は埋め込まずに表面融着し、片面配線基板
(図1)又は両面配線基板(図2)を形成する。As shown in FIGS. 1 and 2, a thermoplastic resin film 2 made of a polyetheretherketone film is heat-bonded by thermocompression bonding to one or both surfaces of the thermosetting polyimide resin film 1, The wiring pattern 3 is adhered to the outer surface of the thermoplastic resin film 2 (polyether ether ketone film), and the wiring pattern 3 is fused to the base material surface layer portion in an embedded state by utilizing the thermoplasticity of the film 2, or Surface fusion is performed without embedding to form a single-sided wiring board (FIG. 1) or a double-sided wiring board (FIG. 2).
【0023】上記配線パターン3は図1A,図2Aに等
に示すように熱可塑性フィルム2に熱圧着し、フィルム
2を可塑化しつつ、母材表層に同パターン3を埋め込み
フィルム2の可塑化にて母材融着するか、又は図1B,
図2Bに示すように母材表面に同フィルム2の可塑化に
より表面融着する。The wiring pattern 3 is thermocompression-bonded to the thermoplastic film 2 as shown in FIGS. 1A and 2A, and the film 2 is plasticized while the pattern 3 is embedded in the base material surface layer to plasticize the film 2. Fusion of the base metal, or Fig. 1B,
As shown in FIG. 2B, the surface of the base material is fused by plasticizing the film 2 on the surface of the base material.
【0024】而して上記フレキシブル配線基板はポリイ
ミド樹脂フィルム1に熱可塑性樹脂フィルム2を母材融
着した基板を予め準備し、爾後的に配線パターン3を熱
圧着し形成する。又はフィルム1にフィルム2を熱圧着
すると同時に配線パターン3を熱圧着して一工程で上記
フレキシブル配線基板が形成できる。Thus, the flexible wiring board is formed by preparing in advance a board in which the thermoplastic resin film 2 is fused to the polyimide resin film 1 as the base material, and then the wiring pattern 3 is thermocompression bonded. Alternatively, the flexible wiring board can be formed in one step by thermocompression bonding the film 2 to the film 1 and thermocompression bonding the wiring pattern 3.
【0025】又図3においては、上記配線パターン3を
熱硬化性ポリイミド樹脂フィルム1の一方の表面又は双
方の表面に印刷等の手法により形成し、この配線パター
ン3の表面に熱可塑性樹脂フィルム2を熱圧着し母材融
着した。In FIG. 3, the wiring pattern 3 is formed on one surface or both surfaces of the thermosetting polyimide resin film 1 by a method such as printing, and the thermoplastic resin film 2 is formed on the surface of the wiring pattern 3. Was heat-pressed and the base material was fused.
【0026】この場合、上記配線パターン3は配線基板
の端縁において露出させ端子として用いるか、又は次に
述べる方法で熱可塑性樹脂フィルム2の外表面に別の配
線パターンを熱圧着し、内表面側の上記配線パターン3
と短絡し外部との接続を可能とする。In this case, the wiring pattern 3 is exposed at the edge of the wiring substrate and used as a terminal, or another wiring pattern is thermocompression-bonded to the outer surface of the thermoplastic resin film 2 by the method described below to form an inner surface. Wiring pattern 3 on the side
It is possible to connect to the outside by short-circuiting with.
【0027】殊に、上記ポリイミド樹脂フィルムとして
(株)東レデュポン社製カプトンを用い、熱可塑性樹脂
フィルムとしてポリエーテルエーテルケトンを用いた場
合が最も親和性が良く密着性を向上できた。Particularly, when Kapton manufactured by Toray DuPont Co., Ltd. was used as the polyimide resin film and polyether ether ketone was used as the thermoplastic resin film, the affinity was the best and the adhesion could be improved.
【0028】別紙化学式1はPMDA型ポリイミドの化
学構造を、化学式2はBPDA型ポリイミドの化学構造
を夫々示しており、化学式2のものが上記カプトンに相
当する。Attachment Chemical formula 1 shows the chemical structure of PMDA type polyimide, and chemical formula 2 shows the chemical structure of BPDA type polyimide, and the chemical formula 2 corresponds to the above Kapton.
【0029】[0029]
【化1】 [Chemical 1]
【0030】[0030]
【化2】 次に図4,図5に基き、図2で示した両面配線基板の製
法と併せ、両面配線パターンを互いに接続した基板構造
とその製法について説明する。[Chemical 2] Next, based on FIGS. 4 and 5, together with the manufacturing method of the double-sided wiring board shown in FIG. 2, the board structure in which the double-sided wiring patterns are connected to each other and the manufacturing method thereof will be described.
【0031】図4Aに示すように、金属板4、適材とし
てステンレス板を用い、この表面にテフロン(フッ素樹
脂)コートを施し、このテフロンコートの表面に印刷等
の方法により配線パターン3aを施し、更にこの配線パ
ターン3aの表面の所要位置に導電材から成るバンプ5
を印刷等により施し、これを転写板6aとして準備す
る。As shown in FIG. 4A, a metal plate 4 and a stainless steel plate are used as a suitable material, a Teflon (fluorine resin) coat is applied to the surface, and a wiring pattern 3a is applied to the surface of the Teflon coat by a method such as printing. Further, the bumps 5 made of a conductive material are provided at required positions on the surface of the wiring pattern 3a.
Is prepared by printing or the like to prepare the transfer plate 6a.
【0032】他方テフロンコートを施した金属板4例え
ばステンレス板の表面に配線パターン3bを印刷等した
ものを転写板6bとして準備する。On the other hand, a transfer plate 6b is prepared by printing a wiring pattern 3b on the surface of a Teflon-coated metal plate 4, for example, a stainless plate.
【0033】又熱硬化性ポリイミド樹脂フィルム1には
上記バンプ5と対応する位置に貫通孔7を設け、このフ
ィルム1の両表面に熱可塑性樹脂フィルム2a,2bを
重ね、更にこのフィルム2a,2bの外表面に転写板6
a,6bを重ね、この重ね合せ体を一セットにして熱プ
レス機内に設置し、所要の加熱時間を経てフィルム2の
溶融を促し、所要のタイミングでプレス機を作動させ熱
圧着を行ない、熱圧着後、金属板4を除去する。Further, the thermosetting polyimide resin film 1 is provided with through holes 7 at positions corresponding to the bumps 5, the thermoplastic resin films 2a and 2b are superposed on both surfaces of the film 1, and the films 2a and 2b are further laminated. Transfer plate 6 on the outer surface of
A and 6b are superposed, and the superposed body is set as one set and installed in a heat press machine. After a required heating time, melting of the film 2 is promoted, and the press machine is operated at a required timing to perform thermocompression bonding, After crimping, the metal plate 4 is removed.
【0034】この結果、図4Bに示すように配線パター
ン3a,3bは熱可塑性フィルム2a,2bが熱可塑化
によって融着された状態で溶融層の表層に埋め込まれる
と共に、前記バンプ5がフィルム2a,2bを貫き、更
にフィルム1の貫通孔7を通して配線パターン3bの表
面に強く押し付けられ、先端が押しつぶされて同パター
ン3b表面に接続する。斯くしてパターン3a,3bが
バンプ5を介して短絡された二層配線基板が形成され
る。As a result, as shown in FIG. 4B, the wiring patterns 3a and 3b are embedded in the surface layer of the molten layer while the thermoplastic films 2a and 2b are fused by thermoplasticization, and the bumps 5 are formed on the film 2a. , 2b, and further strongly pressed against the surface of the wiring pattern 3b through the through hole 7 of the film 1, the tip is crushed and connected to the surface of the pattern 3b. Thus, the two-layer wiring board in which the patterns 3a and 3b are short-circuited via the bumps 5 is formed.
【0035】図2に示した両面配線基板の場合には上記
バンプ5を用いないで熱圧着する。更に図4Cに示すよ
うに、上記フレキシブル配線基板の配線パターン3a,
3bの表面を熱可塑性樹脂によるカバーコート8で覆
う。このカバーコート用熱可塑性樹脂としては熱可塑性
ポリイミドが適当である。In the case of the double-sided wiring board shown in FIG. 2, the bumps 5 are not used and thermocompression bonding is performed. Further, as shown in FIG. 4C, the wiring pattern 3a of the flexible wiring board,
The surface of 3b is covered with a cover coat 8 made of a thermoplastic resin. Thermoplastic polyimide is suitable as the thermoplastic resin for the cover coat.
【0036】このカバーコート8は熱可塑性ポリイミド
フィルムを熱圧着により配線パターン3a,3bの表面
に融着するか、適例としては熱可塑性ポリイミドを溶剤
により溶解した液状物(ワニス)を配線パターン3a,
3bの表面に印刷等により塗布し、次で加熱炉内に取り
込んで熱処理しパターン表面に密着させる。The cover coat 8 is formed by fusing a thermoplastic polyimide film to the surfaces of the wiring patterns 3a and 3b by thermocompression bonding, or as a suitable example, a liquid material (varnish) obtained by dissolving thermoplastic polyimide in a solvent is used as the wiring pattern 3a. ,
The surface of 3b is applied by printing or the like, and then taken in a heating furnace and heat-treated to be brought into close contact with the pattern surface.
【0037】従来はこのカバーコート8として接着剤を
介して熱硬化性ポリイミドフィルムを接着しており、こ
の発明はこの接着剤による貼り付けを排した。Conventionally, a thermosetting polyimide film is adhered as the cover coat 8 through an adhesive, and the present invention eliminates the sticking by the adhesive.
【0038】上記カバーコート8は配線パターン3aの
端部を露出するように施し、この露出端にニッケル―金
メッキ9を施し、これを外部との接続用端子とする。The cover coat 8 is applied so as to expose the end of the wiring pattern 3a, and nickel-gold plating 9 is applied to the exposed end, which is used as a terminal for external connection.
【0039】又図6は四層配線基板の製造法と構造を例
示する。FIG. 6 exemplifies the manufacturing method and structure of the four-layer wiring board.
【0040】図6Aに示すように、芯材となる熱硬化性
樹脂フィルム1の両表面に印刷等により配線パターン3
c,3dを施し、両配線パターン3c,3dを貫通孔7
に充填された金属により相互に接続する。又図4の転写
板6aと同じ構造の配線パターン3aとバンプ5を形成
した一対の転写板6c,6dを準備し、前記と同様、こ
れを一セットとして重ねたものを熱プレス機に取り込
み、熱可塑性樹脂フィルム2a,2bを溶融しつつ、熱
圧着する。As shown in FIG. 6A, the wiring pattern 3 is formed on both surfaces of the thermosetting resin film 1 as a core material by printing or the like.
c, 3d are applied, and both wiring patterns 3c, 3d are provided with through holes 7
Interconnected by a metal filled in. In addition, a pair of transfer plates 6c and 6d having wiring patterns 3a and bumps 5 having the same structure as the transfer plate 6a of FIG. 4 are prepared, and as described above, a set of the transfer plates 6c and 6d are stacked and taken into a heat press machine. The thermoplastic resin films 2a and 2b are melted and thermocompression bonded.
【0041】熱圧着後、転写板6c,6dの金属板4を
除去し図6Bに示すフレキシブル配線基板を得る。After thermocompression bonding, the metal plates 4 of the transfer plates 6c and 6d are removed to obtain the flexible wiring board shown in FIG. 6B.
【0042】斯くして転写板6cから転写された配線パ
ターン3aと配線パターン3cとがバンプ5を介して接
続され、且つ転写板6dから転写された配線パターン3
aと配線パターン3dとがバンプ5を介して接続された
四層配線基板が得られる。Thus, the wiring pattern 3a transferred from the transfer plate 6c and the wiring pattern 3c are connected via the bump 5, and the wiring pattern 3 transferred from the transfer plate 6d.
A four-layer wiring board in which a and the wiring pattern 3d are connected via the bumps 5 is obtained.
【0043】次いで図6Cに示すように、図4Cと同様
の熱可塑性ポリイミド樹脂によるカバーコート8を施
す。Next, as shown in FIG. 6C, a cover coat 8 of thermoplastic polyimide resin similar to that of FIG. 4C is applied.
【0044】又図6は転写板6c,6d上,および3
c,3dの配線パターンの組合せで二層配線基板を製造
する場合をも示唆している。FIG. 6 shows the transfer plates 6c, 6d, and 3
It also suggests the case of manufacturing a two-layer wiring board with a combination of wiring patterns c and 3d.
【0045】上記実施例では導体ペーストの印刷による
配線パターン形成について述べたが、図7に示すよう
に、銅箔のエッチングによる配線パターン形成の場合
も、同様に配線基板を製造することができる。In the above embodiment, the wiring pattern formation by printing the conductor paste has been described. However, as shown in FIG. 7, the wiring board can be manufactured in the same manner when the wiring pattern is formed by etching the copper foil.
【0046】即ち、図7Aに示すように、表面の所定位
置にバンプ5を形成した銅箔10bとバンプ5を形成し
ない銅箔10aを準備し、両銅箔10a,10b間にポ
リイミド樹脂フィルム(前記カプトン)の両面に熱可塑
性樹脂フィルム(ポリエーテルエーテルケトン2a,2
bを配置した重ね合せ体を一セットにして熱プレス機内
に配置し、所要の加熱時間を経て、所要のタイミングで
プレス機を作動させて熱圧着を行なう。That is, as shown in FIG. 7A, a copper foil 10b having bumps 5 formed at predetermined positions on the surface and a copper foil 10a having no bumps 5 are prepared, and a polyimide resin film ( A thermoplastic resin film (polyether ether ketone 2a, 2a, 2) is formed on both sides of the Kapton.
The superposed body in which b is arranged is set as one set and arranged in a hot press machine, and after a required heating time, the press machine is operated at a required timing to perform thermocompression bonding.
【0047】この結果、図7Bに示すように、銅箔10
a,10bが熱可塑性フィルム2a,2bの外表面に同
フィルムの溶融により母材融着され、更に熱可塑性樹脂
フィルム2a,2bがポリイミド樹脂フィルムの両面に
母材融着すると共に、バンプ5がポリイミド樹脂フィル
ム1に設けた貫通孔7を通してフィルム2a,2bを貫
き、銅箔10aの表面に強く押し付けられ銅箔10a,
10b間を接続した積層体が形成される。As a result, as shown in FIG. 7B, the copper foil 10
a and 10b are fused to the outer surfaces of the thermoplastic films 2a and 2b by the base material fusion by the fusion of the films, and further the thermoplastic resin films 2a and 2b are fused on both sides of the polyimide resin film and the bumps 5 are formed. The films 2a and 2b are pierced through the through holes 7 provided in the polyimide resin film 1 and strongly pressed against the surface of the copper foil 10a.
A laminated body in which 10b are connected is formed.
【0048】次に図7Cに示すように、上記銅箔10
a,10bにエッチング処理を施して、所要の配線パタ
ーンを形成する。この結果、配線パターン3a,3bを
熱可塑性樹脂フィルム2a,2bに該フィルム2a,2
bの熱可塑性により表面融着した両面配線基板が形成さ
れる。Next, as shown in FIG. 7C, the copper foil 10 is
Etching processing is performed on a and 10b to form a required wiring pattern. As a result, the wiring patterns 3a and 3b are attached to the thermoplastic resin films 2a and 2b.
Due to the thermoplasticity of b, a double-sided wiring board having the surface fused is formed.
【0049】[0049]
【発明の効果】この発明においてはポリイミド樹脂フィ
ルムの表面に熱可塑性樹脂フィルムを融着して絶縁基板
を形成しており、この熱可塑性樹脂フィルムを配線パタ
ーンの密着手段として供する。According to the present invention, a thermoplastic resin film is fused on the surface of a polyimide resin film to form an insulating substrate, and this thermoplastic resin film is used as a means for adhering a wiring pattern.
【0050】この絶縁基板はポリイミド樹脂フィルムと
熱可塑性樹脂フィルムの熱可塑性を利用し融着されたも
のであり、密着強度が大で、良好なフレキシブル性を示
す健全な基板が形成できる。Since this insulating substrate is fused by utilizing the thermoplasticity of the polyimide resin film and the thermoplastic resin film, a strong substrate having a high adhesion strength and exhibiting good flexibility can be formed.
【0051】即ち、1〜2層の配線基板では接着層がな
く、柔軟性あるカバーコートを用いることによりよりフ
レキシブルな基板が得られる。3〜4層の配線基板でも
一層の配線基板と同様、接着層がなくポリイミド樹脂フ
ィルムは一層のみであるため、十分なフレキシブル性を
有する。更に、これらを重ねることによって得られる5
〜8層の配線基板でもポリイミド樹脂フィルムは2枚で
あるので、従来にないフレキシブルな多層配線基板が得
られる。That is, a wiring board having one or two layers does not have an adhesive layer, and a more flexible board can be obtained by using a flexible cover coat. Similar to the one-layer wiring board, the wiring board having three to four layers has no adhesive layer and has only one polyimide resin film, and thus has sufficient flexibility. Furthermore, 5 obtained by stacking these
Even with a wiring board of up to 8 layers, since the number of polyimide resin films is two, it is possible to obtain a flexible multilayer wiring board that has never been seen.
【0052】熱可塑性樹脂フィルムがポリエーテルエー
テルケトンである場合にはポリイミド樹脂フィルムに対
しより高い密着性を示す。ポリサルホンフィルム、熱可
塑性ポリイミドフィルムにおいても同様の効果を確認し
た。When the thermoplastic resin film is polyetheretherketone, it exhibits higher adhesion to the polyimide resin film. The same effect was confirmed for polysulfone film and thermoplastic polyimide film.
【0053】又上記絶縁基板は上記熱可塑性樹脂フィル
ムの熱可塑性を利用して配線パターンを融着でき、又そ
の熱可塑化により配線パターンをフィルム表層部に容易
に埋め込むことができ、配線パターンを極めて強固に密
着できることに加え、パターンが表面に突出しないので
外力による損傷、剥離を有効に防止できる。Further, the insulating substrate can fuse the wiring pattern by utilizing the thermoplasticity of the thermoplastic resin film, and the thermoplasticization can easily embed the wiring pattern in the surface layer of the film. In addition to being able to adhere extremely strongly, the pattern does not project on the surface, so damage and peeling due to external force can be effectively prevented.
【0054】又上記絶縁基板は熱可塑性樹脂フィルムの
熱可塑性を利用して熱プレス法を用い一工程で片面、両
面、多層配線基板が極めて容易に形成でき、省力化とコ
ストダウンを達成できる。Further, the insulating substrate can form a single-sided, double-sided, multi-layered wiring board very easily in one step by utilizing the thermoplasticity of the thermoplastic resin film by using the hot pressing method, thereby achieving labor saving and cost reduction.
【図1】A,Bはこの発明の実施例を示すフレキシブル
配線基板(片面配線状態を以って示す基板)の断面図。1A and 1B are cross-sectional views of a flexible wiring board (a board shown in a single-sided wiring state) showing an embodiment of the present invention.
【図2】A,Bはこの発明の実施例を示すフレキシブル
配線基板(両面配線状態を以って示す基板)の断面図。2A and 2B are cross-sectional views of a flexible wiring board (a board shown in a double-sided wiring state) showing an embodiment of the present invention.
【図3】この発明の他例を示すフレキシブル配線基板の
断面図。FIG. 3 is a sectional view of a flexible wiring board showing another example of the present invention.
【図4】A,B,Cはこの発明による両面配線基板の製
造法と構造例を工程を追って示す断面図。4A, 4B and 4C are cross-sectional views showing a method of manufacturing the double-sided wiring board according to the present invention and a structural example in order of steps.
【図5】上記両面配線基板の概要(要部)を切欠して示
す斜視図。FIG. 5 is a perspective view showing an outline (main part) of the double-sided wiring board by cutting out.
【図6】A,B,Cはこの発明による多層配線基板(四
層を例とする)の製造法と構造例を工程を追って示す断
面図。6A, 6B, 6C, 6D, 6E, 6F, 6G, and 6G are cross-sectional views showing, step by step, a manufacturing method and a structural example of a multilayer wiring board (four layers are taken as an example) according to this invention.
【図7】A,B,Cはこの発明を用いた多層配線基板の
他の製法と構造例を工程を追って示す断面図。7A, 7B, 7C and 7D are cross-sectional views showing steps of another manufacturing method and a structure example of the multilayer wiring board using the present invention, step by step.
【化1】PMDA型ポリイミドの化学構造を示す化学
式。Embedded image A chemical formula showing the chemical structure of PMDA-type polyimide.
【化2】BPDA型ポリイミドの化学構造(カプトン)
を示す化学式。[Chemical formula 2] Chemical structure of BPDA type polyimide (Kapton)
A chemical formula that indicates.
1 熱硬化性ポリイミド樹脂フィルム 2 熱可塑性樹脂フィルム 3 配線パターン 1 thermosetting polyimide resin film 2 thermoplastic resin film 3 wiring pattern
Claims (4)
熱可塑性樹脂フィルムを該熱可塑性樹脂フィルムの熱可
塑性により母材融着して回路形成用絶縁基板を形成し、
少なくとも上記熱可塑性樹脂フィルムの表面に熱可塑性
樹脂フィルムの熱可塑性により配線パターンを母材融着
したことを特徴とするフレキシブル回路基板。1. A thermoplastic resin film is fused on one or both sides of a polyimide resin film by a thermoplastic material of the thermoplastic resin film to form a circuit-forming insulating substrate.
A flexible circuit board having a base material fused to at least the surface of the thermoplastic resin film by the thermoplasticity of the thermoplastic resin film.
デュポン社製のカプトンであることを特徴とする請求項
1記載のフレキシブル回路基板。2. The flexible circuit board according to claim 1, wherein the polyimide resin film is Kapton manufactured by Toray DuPont Co., Ltd.
テルエーテルケトン又は熱可塑性ポリサルホン又は熱可
塑性ポリイミドであることを特徴とする請求項1記載の
フレキシブル回路基板。3. The flexible circuit board according to claim 1, wherein the thermoplastic resin film is thermoplastic polyetheretherketone, thermoplastic polysulfone, or thermoplastic polyimide.
ィルムを該熱可塑性樹脂フィルムの熱可塑性により母材
融着して回路形成用絶縁基板が形成され、上記ポリイミ
ド樹脂フィルム又は熱可塑性樹脂フィルムの表面に配線
パターンが形成され、この配線パターンが上記熱可塑性
樹脂フィルムの表層に埋め込まれ該熱可塑性樹脂フィル
ムの熱可塑性により母材融着していることを特徴とする
フレキシブル回路基板。4. A thermoplastic resin film is fused on a polyimide resin film by a thermoplastic material of the thermoplastic resin film to form an insulating substrate for forming a circuit, and a polyimide resin film or a thermoplastic resin film is provided on the surface thereof. A flexible circuit board in which a wiring pattern is formed, the wiring pattern is embedded in a surface layer of the thermoplastic resin film, and the base material is fused by the thermoplasticity of the thermoplastic resin film.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12829394A JPH07312468A (en) | 1994-05-18 | 1994-05-18 | Flexible circuit board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12829394A JPH07312468A (en) | 1994-05-18 | 1994-05-18 | Flexible circuit board |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7205281A Division JP2768918B2 (en) | 1995-07-18 | 1995-07-18 | Connection structure between wiring patterns on wiring board |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH07312468A true JPH07312468A (en) | 1995-11-28 |
Family
ID=14981228
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12829394A Pending JPH07312468A (en) | 1994-05-18 | 1994-05-18 | Flexible circuit board |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH07312468A (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10275967A (en) * | 1997-03-28 | 1998-10-13 | Nec Corp | Electronic-component assembly and its manufacture |
US6208022B1 (en) | 1997-03-27 | 2001-03-27 | Nec Corporation | Electronic-circuit assembly |
WO2001056340A1 (en) * | 2000-01-28 | 2001-08-02 | Sony Chemicals Corp. | Substrate material piece, flexible circuit board, and method of manufacturing the flexible circuit board |
JP2002204050A (en) * | 2000-12-27 | 2002-07-19 | Toray Eng Co Ltd | Metal wiring circuit board and method of manufacturing the same |
JP2003053921A (en) * | 2001-08-17 | 2003-02-26 | Mitsubishi Plastics Ind Ltd | Polyimide-based laminated film, metal laminate using the same, and method for producing metal laminate |
JP2006108236A (en) * | 2004-10-01 | 2006-04-20 | Shinko Electric Ind Co Ltd | Method for manufacturing substrate with through electrode |
JP2016152331A (en) * | 2015-02-18 | 2016-08-22 | パナソニックIpマネジメント株式会社 | Print wiring board and manufacturing method thereof |
JP2016187052A (en) * | 2016-07-12 | 2016-10-27 | パナソニックIpマネジメント株式会社 | Printed wiring board |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60175478A (en) * | 1984-02-21 | 1985-09-09 | 昭和電工株式会社 | Flexible printed board |
JPH05251844A (en) * | 1991-12-27 | 1993-09-28 | Southwall Technol Inc | Flexible circuit board manufacturing method |
JPH05327208A (en) * | 1992-05-20 | 1993-12-10 | Nitto Denko Corp | Composition of bonding agent for flexible printed circuit board |
JPH05343822A (en) * | 1992-06-08 | 1993-12-24 | Nitto Denko Corp | Double-sided circuit board and its manufacture |
JPH0636672A (en) * | 1992-07-16 | 1994-02-10 | Sumitomo Wiring Syst Ltd | Card type fuse and manufacture thereof |
JPH0685107A (en) * | 1992-03-10 | 1994-03-25 | Internatl Business Mach Corp <Ibm> | Electronic circuit package and its manufacture |
-
1994
- 1994-05-18 JP JP12829394A patent/JPH07312468A/en active Pending
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60175478A (en) * | 1984-02-21 | 1985-09-09 | 昭和電工株式会社 | Flexible printed board |
JPH05251844A (en) * | 1991-12-27 | 1993-09-28 | Southwall Technol Inc | Flexible circuit board manufacturing method |
JPH0685107A (en) * | 1992-03-10 | 1994-03-25 | Internatl Business Mach Corp <Ibm> | Electronic circuit package and its manufacture |
JPH05327208A (en) * | 1992-05-20 | 1993-12-10 | Nitto Denko Corp | Composition of bonding agent for flexible printed circuit board |
JPH05343822A (en) * | 1992-06-08 | 1993-12-24 | Nitto Denko Corp | Double-sided circuit board and its manufacture |
JPH0636672A (en) * | 1992-07-16 | 1994-02-10 | Sumitomo Wiring Syst Ltd | Card type fuse and manufacture thereof |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6208022B1 (en) | 1997-03-27 | 2001-03-27 | Nec Corporation | Electronic-circuit assembly |
JPH10275967A (en) * | 1997-03-28 | 1998-10-13 | Nec Corp | Electronic-component assembly and its manufacture |
WO2001056340A1 (en) * | 2000-01-28 | 2001-08-02 | Sony Chemicals Corp. | Substrate material piece, flexible circuit board, and method of manufacturing the flexible circuit board |
US6596947B1 (en) | 2000-01-28 | 2003-07-22 | Sony Chemicals Corp. | Board pieces, flexible wiring boards, and processes for manufacturing flexible wiring boards |
JP2002204050A (en) * | 2000-12-27 | 2002-07-19 | Toray Eng Co Ltd | Metal wiring circuit board and method of manufacturing the same |
JP2003053921A (en) * | 2001-08-17 | 2003-02-26 | Mitsubishi Plastics Ind Ltd | Polyimide-based laminated film, metal laminate using the same, and method for producing metal laminate |
JP2006108236A (en) * | 2004-10-01 | 2006-04-20 | Shinko Electric Ind Co Ltd | Method for manufacturing substrate with through electrode |
JP2016152331A (en) * | 2015-02-18 | 2016-08-22 | パナソニックIpマネジメント株式会社 | Print wiring board and manufacturing method thereof |
CN105898983A (en) * | 2015-02-18 | 2016-08-24 | 松下知识产权经营株式会社 | Printed Wiring Boards And Manufacturing Method Thereof |
KR20160101867A (en) * | 2015-02-18 | 2016-08-26 | 파나소닉 아이피 매니지먼트 가부시키가이샤 | Printed wiring boards and manufacturing method thereof |
JP2016187052A (en) * | 2016-07-12 | 2016-10-27 | パナソニックIpマネジメント株式会社 | Printed wiring board |
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