JPH0722899B2 - Abrasive material for precision polishing - Google Patents
Abrasive material for precision polishingInfo
- Publication number
- JPH0722899B2 JPH0722899B2 JP286487A JP286487A JPH0722899B2 JP H0722899 B2 JPH0722899 B2 JP H0722899B2 JP 286487 A JP286487 A JP 286487A JP 286487 A JP286487 A JP 286487A JP H0722899 B2 JPH0722899 B2 JP H0722899B2
- Authority
- JP
- Japan
- Prior art keywords
- abrasive
- polishing
- layer
- sheet
- porous
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000005498 polishing Methods 0.000 title claims description 48
- 239000003082 abrasive agent Substances 0.000 title claims description 9
- 239000006061 abrasive grain Substances 0.000 claims description 30
- 239000011148 porous material Substances 0.000 claims description 22
- 239000000853 adhesive Substances 0.000 claims description 15
- 230000001070 adhesive effect Effects 0.000 claims description 15
- 229920002635 polyurethane Polymers 0.000 claims description 14
- 239000004814 polyurethane Substances 0.000 claims description 14
- 239000002245 particle Substances 0.000 claims description 11
- 239000000203 mixture Substances 0.000 claims description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 6
- 229920000642 polymer Polymers 0.000 claims description 6
- 229920003225 polyurethane elastomer Polymers 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 3
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 3
- 235000012239 silicon dioxide Nutrition 0.000 claims description 3
- 239000000377 silicon dioxide Substances 0.000 claims description 3
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 2
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 claims description 2
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 claims description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 35
- 239000000463 material Substances 0.000 description 11
- 239000000758 substrate Substances 0.000 description 8
- 239000004744 fabric Substances 0.000 description 7
- 239000007788 liquid Substances 0.000 description 7
- 238000000576 coating method Methods 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 4
- 239000004745 nonwoven fabric Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- -1 polyoxytetramethylene Polymers 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000002344 surface layer Substances 0.000 description 3
- 229920003051 synthetic elastomer Polymers 0.000 description 3
- 239000005061 synthetic rubber Substances 0.000 description 3
- 239000003513 alkali Substances 0.000 description 2
- 229910010293 ceramic material Inorganic materials 0.000 description 2
- 230000015271 coagulation Effects 0.000 description 2
- 238000005345 coagulation Methods 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 238000004898 kneading Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920001228 polyisocyanate Polymers 0.000 description 2
- 239000005056 polyisocyanate Substances 0.000 description 2
- 239000002861 polymer material Substances 0.000 description 2
- 229920005862 polyol Polymers 0.000 description 2
- 150000003077 polyols Chemical class 0.000 description 2
- 229920001451 polypropylene glycol Polymers 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000002759 woven fabric Substances 0.000 description 2
- JTXMVXSTHSMVQF-UHFFFAOYSA-N 2-acetyloxyethyl acetate Chemical compound CC(=O)OCCOC(C)=O JTXMVXSTHSMVQF-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- YBMRDBCBODYGJE-UHFFFAOYSA-N germanium oxide Inorganic materials O=[Ge]=O YBMRDBCBODYGJE-UHFFFAOYSA-N 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000002386 leaching Methods 0.000 description 1
- 239000010985 leather Substances 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- PVADDRMAFCOOPC-UHFFFAOYSA-N oxogermanium Chemical compound [Ge]=O PVADDRMAFCOOPC-UHFFFAOYSA-N 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
Landscapes
- Polishing Bodies And Polishing Tools (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は光学レンズ、プリズム、半導体部品、セラミッ
ク材料等の精密研磨に使用するに適した研磨材に関する
ものである。The present invention relates to an abrasive suitable for use in precision polishing of optical lenses, prisms, semiconductor parts, ceramic materials and the like.
従来、光学レンズ、ガラス、半導体部品、金属等の研磨
材として不織布に合成ゴムを含浸固化した硬質シート、
合成ゴムの多孔質シート、皮革、金属繊維束等が使用さ
れている。更に、ガラスや半導体部品の研磨材として、
既に実公昭52−45918号公報に多孔高分子物質よりなる
表面層をもつたシート状物を研磨布として使用し、その
多孔空間に酸化ゲルマニウムなどの砥粒を強アルカリに
懸濁させたものを水と共に供給しながら研磨する研磨
布。特公昭54−30158号公報、特公昭54−43234号公報お
よび特公昭60−55264号公報に繊維絡合不織布織布にポ
リウレタンエラストマーなどの高分子物質を微細な連続
気泡状に含有せしめたシート状物に砥粒を含浸させて研
磨布とすることを提案した。Conventionally, a hard sheet in which synthetic rubber is impregnated and solidified in a non-woven fabric as an abrasive material for optical lenses, glass, semiconductor parts, metals, etc.
Synthetic rubber porous sheets, leather, metal fiber bundles, etc. are used. Furthermore, as an abrasive for glass and semiconductor parts,
In Japanese Utility Model Publication No. 52-45918, a sheet-like material having a surface layer made of a porous polymer material is used as a polishing cloth, and abrasive powder such as germanium oxide is suspended in a strong alkali in the porous space. Polishing cloth that polishes while supplying it with water. Sheets in which a polymer material such as a polyurethane elastomer is contained in fine continuous cells in a fiber entangled non-woven fabric in Japanese Patent Publication No. 54-30158, Japanese Patent Publication No. 54-43234 and Japanese Patent Publication No. 60-55264. It was proposed that the object be impregnated with abrasive grains to form a polishing cloth.
従来の研磨材は、砥粒と一体成型した比較的硬度の高い
シート状物であつたり、多孔質空間に砥粒懸濁液を含浸
して使用するものであつた。このような研磨材では粗研
磨には使用できるが、仕上研磨や精密研磨に使用すると
被研磨物を傷つけたり、研磨精度が得られなかつたり、
研磨むらが生じたりして、高い精度を要求する研磨、小
面積の被研磨物の研磨は難しいものであつた。The conventional abrasive is a sheet having a relatively high hardness integrally molded with abrasive grains, or is used by impregnating a porous space with an abrasive grain suspension. Such abrasives can be used for rough polishing, but when used for finish polishing or precision polishing, the object to be polished may be damaged or the accuracy of polishing may not be obtained.
Due to uneven polishing, it is difficult to perform polishing that requires high precision and polishing of a small-area workpiece.
本発明は従来の研磨材では難かしい高い精度を要求する
研磨、仕上用研磨に適した研磨材を提供するにある。The present invention is to provide an abrasive material suitable for polishing and finishing polishing, which requires high accuracy, which is difficult with conventional abrasive materials.
本発明は基体の一面にポリウレタンエラストマーを主体
とする重合体からなり、シートの厚み方向に蜂の巣状ま
たは縦割れ状の気孔構造を主体に構成された多孔質層が
付与されてなるシート状物であつて、該シート状物の多
孔質層気孔の表面または気孔上層部に、ポリウレタン系
接着剤と粒子の大きさ0.01〜10μの範囲で選ばれた砥粒
からなる組成物が厚さ1.5mm以下の層として形成されて
いることを特徴とする精密研磨用研磨材である。The present invention is a sheet-like material comprising a polymer mainly composed of a polyurethane elastomer on one surface of a substrate, and a porous layer mainly composed of a honeycomb-like or vertical crack-like pore structure is provided in the thickness direction of the sheet. Then, on the surface of the porous layer pores or the pore upper layer portion of the sheet-like material, a composition comprising a polyurethane adhesive and abrasive grains selected in a particle size range of 0.01 to 10 μm has a thickness of 1.5 mm or less. It is an abrasive material for precision polishing, characterized in that it is formed as a layer.
すなわち、本発明は、基体上にポリウレタンエラストマ
ーを主体とする重合体からなり、シートの厚み方向に蜂
の巣状または縦割れ状の気孔構造の多孔質層を介して砥
粒をポリウレタン接着剤で固定した層を設けたことによ
り、被研磨面にかかる押圧が多孔質層のクッション作用
により均等に作用し、研磨面への型沿い性が良く、かつ
研磨砥粒の不均一な脱落、すなわち粒子の小さい砥粒が
早く脱落し、粒子の大きい砥粒が残る、その結果研磨面
に傷を発生させるというようなことも防止できる。更
に、研磨時に研磨助剤、例えば水、アルカリ研磨液、酸
研磨液、あるいは活性剤研磨液、油状物等を付与する場
合、多孔質層がそれらの保留作用をするので長時間の作
業にも円滑に浸出して研磨むらの発生を防止することが
できる。That is, the present invention comprises a polymer mainly composed of a polyurethane elastomer on a substrate, and the abrasive grains are fixed with a polyurethane adhesive through a porous layer having a honeycomb structure or vertical crack-like pore structure in the thickness direction of the sheet. By providing the layer, the pressure applied to the surface to be polished acts uniformly due to the cushioning effect of the porous layer, the mold conformability to the polishing surface is good, and the abrasive grains are nonuniformly removed, that is, the particles are small. It is also possible to prevent the abrasive grains from falling off quickly and leaving large abrasive grains, resulting in scratches on the polished surface. Furthermore, when a polishing aid, such as water, an alkaline polishing liquid, an acid polishing liquid, an activator polishing liquid, or an oily substance, is applied during polishing, the porous layer retains them, so that it can be used for a long time. It is possible to prevent the occurrence of uneven polishing by smooth leaching.
本発明の基体と多孔質層からなるシート状物は繊維質基
体、例えば不織布、織布、編布、起毛した織布、起毛し
た編布またはこれらの布帛にポリウレタンエラストマー
または合成ゴムなどの弾性重合体が含有してなる可撓性
柔軟な基体、プラスチツクスシートまたは多孔質プラス
チツクスシートなどの可撓性基体の一面に、ポリウレタ
ンエラストマーを主体とする重合体の溶液または分散
液、あるいはそれらの溶液または分散液には必要に応じ
て気孔形成を支配する凝固調節剤を添加した組成液とし
て塗布し、重合体の非溶剤中で処理して多孔質構造に凝
固し、水洗し、乾燥し、多孔質層表面のスキン層をサン
ドペーパーなどで研削して除去し、多孔質層内部の多孔
質気孔を露出して露出気孔を有するシート状物とするも
ので、本発明で使用するに適したシート状物の製造法
は、例えば特公昭45−39634号公報、特公昭47−30624号
公報、特公昭52−45762号公報に開示した方法で作るこ
とができる。The sheet-like material comprising the substrate and the porous layer of the present invention is a fibrous substrate such as a non-woven fabric, a woven fabric, a knitted fabric, a raised woven fabric, a raised knitted fabric or an elastic weight of polyurethane elastomer or synthetic rubber on these fabrics. A solution or dispersion of a polymer mainly composed of a polyurethane elastomer, or a solution thereof on one surface of a flexible substrate such as a flexible and flexible substrate, a plastics sheet or a porous plastics sheet containing the polymer. Alternatively, the dispersion is applied as a composition liquid to which a coagulation regulator that governs pore formation is added if necessary, treated in a non-solvent of the polymer to coagulate into a porous structure, washed with water, dried, and porous. The skin layer on the surface of the porous layer is removed by grinding with sandpaper or the like to expose the porous pores inside the porous layer to form a sheet having exposed pores, which is used in the present invention. Preparation of sheet material suitable for that can be made for example Japanese Patent Publication 45-39634, JP-B-47-30624 and JP-in method disclosed in JP-B-52-45762.
次に、多孔質層の気孔表面に塗布して形成する砥粒層は
砥粒として二酸化ケイ素、二酸化ジルコニウム、酸化ア
ルミニウム、二酸化セリウムから選ばれた少なくとも１
種類で、その粒子の大きさは被研磨物の硬さ、材質、被
研磨物の平滑面の要求度、精度に応じて選択されるが、
一般には0.01〜10μの範囲で選ばれる。また、砥粒を保
持するポリウレタン系接着剤は一液型のポリウレタン溶
液または分散液であっても、二液型のポリウレタン溶液
であってもよいが、ポリウレタン系接着剤の硬さを任意
に選択することができ、砥粒の分散性および多孔質シー
ト面との接着性などから二液型のポリウレタン系接着剤
が好ましい。そして接着剤中に占める砥粒の量は接着剤
固形分に対して砥粒の配合量が30〜85重量％の範囲で配
合する。粗研磨では砥粒の粒子は大きいものを多量に配
合した組成とするが、仕上げ、精密研磨では砥粒の粒子
ま小さいものを少量配合した組成とすることによって、
一層精度よく研磨仕上げをすることができる。Next, the abrasive grain layer formed by coating on the pore surface of the porous layer has at least one abrasive grain selected from silicon dioxide, zirconium dioxide, aluminum oxide and cerium dioxide.
Depending on the type, the size of the particles is selected according to the hardness and material of the object to be polished, the degree of demand for the smooth surface of the object to be polished, and the accuracy.
Generally, it is selected in the range of 0.01 to 10μ. The polyurethane-based adhesive that holds the abrasive grains may be a one-component polyurethane solution or dispersion, or a two-component polyurethane solution, but the hardness of the polyurethane-based adhesive is arbitrarily selected. A two-component polyurethane adhesive is preferable from the viewpoint of dispersibility of abrasive grains and adhesion to the surface of the porous sheet. The amount of abrasive grains in the adhesive is such that the amount of abrasive grains is 30 to 85% by weight based on the solid content of the adhesive. In rough polishing, the particles of the abrasive grains are mixed with a large amount of particles, but in finishing and precision polishing, the particles of the abrasive grains are mixed with a small amount of the composition.
The polishing finish can be performed more accurately.
そして、砥粒を配合したポリウレタン系接着剤は多孔質
層気孔表面に最終厚さ1.5mm以下の層になる量を塗布す
る。この砥粒層は好ましくは多孔質層全体に充填して形
成するのではなく、表面部分ないし気孔上層部にとどめ
ることが、被研磨部への押圧の均一性を高めるうえで好
ましい。Then, the polyurethane adhesive containing abrasive grains is applied to the surface of the pores of the porous layer in an amount to form a layer having a final thickness of 1.5 mm or less. It is preferable that the abrasive grain layer is not formed by filling the entire porous layer, but is limited to the surface portion or the pore upper layer portion in order to enhance the uniformity of pressing to the portion to be polished.
本発明の研磨材断面構造の模式図を第１図および第２図
に示した。第１図は蜂の巣状気孔構造を主体に構成され
た多孔質層２の表面部分に砥粒層３が付与されてなる研
磨材、１は基体である。第２図は縦割れ状の気孔構造を
主体に構成された多孔質層４の表面部分に砥粒層３が付
与されてなる研磨、１は基体である。Schematic views of the cross-sectional structure of the abrasive material of the present invention are shown in FIG. 1 and FIG. FIG. 1 shows an abrasive 1 in which an abrasive grain layer 3 is provided on the surface of a porous layer 2 mainly composed of a honeycomb-shaped pore structure. FIG. 2 shows polishing 1 in which an abrasive grain layer 3 is provided on the surface portion of a porous layer 4 mainly composed of a vertically cracked pore structure, and 1 is a substrate.
本発明の研磨材は光学レンズ、ガラス、金属、半導体部
品、セラミックス材料等の精密研磨あるいは仕上げ研磨
に使用するに適したものである。The abrasive of the present invention is suitable for use in precision polishing or finish polishing of optical lenses, glass, metals, semiconductor parts, ceramic materials and the like.
以下に本発明の実施態様を実施例で具体的に説明する。
なお、実施例中部および％はことわりのない限り重量に
関するものである。The embodiments of the present invention will be specifically described below with reference to examples.
In the examples, "parts" and "%" relate to weight unless otherwise specified.
実施例１ ナイロン繊維の絡合不織布にポリウレタンを含有した基
体の一面に、ポリオキシテトラメチレン系ポリウレタン
溶液の層を湿式凝固法で凝固して、縦長気孔でなる蜂の
巣状の気孔構造の多孔質層を有するシート状物を得、多
孔質表面のスキン層をサイドペーパーでバフイングして
内部気泡を露出せしめ、蜂の巣状表面外観を有する多孔
質層のシート状物〔Ｉ〕を得た。次いで、ポリオキシプ
ロピレンポリオールとポリイソシアネートと架橋促進剤
からなる二液型ポリウレタン接着剤の酢酸エチレン溶液
に固形分100部に対し、平均粒度0.02μの二酸化ケイ素
砥粒粉末40部を添加して十分に混練した後、上記シート
状物〔Ｉ〕の多孔質表面にロールコート法で塗膜厚さ約
0.5mmになる量を塗布し、乾燥し、キユアーして多孔質
層の気孔の表層部に約0.1mm浸入した厚さ約0.27mmの砥
粒層を形成した第１図の模式図に類似の研磨材を得た。Example 1 A layer of a polyoxytetramethylene-based polyurethane solution was coagulated by a wet coagulation method on one surface of a substrate containing polyurethane in an entangled non-woven fabric of nylon fibers to form a honeycomb-shaped porous structure having longitudinal pores. Was obtained, and the skin layer on the porous surface was buffed with side paper to expose the internal bubbles, and a sheet-like material [I] having a honeycomb-like surface appearance was obtained. Next, 100 parts of solid content in an ethylene acetate solution of a two-component polyurethane adhesive consisting of polyoxypropylene polyol, polyisocyanate and a crosslinking accelerator, 40 parts of silicon dioxide abrasive powder having an average particle size of 0.02μ is sufficiently added. After kneading, the thickness of the coating film on the porous surface of the above-mentioned sheet [I] was measured by roll coating.
An amount of 0.5 mm was applied, dried, and cured to form an abrasive grain layer having a thickness of about 0.27 mm that penetrated about 0.1 mm into the surface layer of the pores of the porous layer. Similar to the schematic diagram of FIG. An abrasive was obtained.
この研磨材をデイスクに張り付けて回転数700rpm、研磨
圧力0.3kg/cm2で注水しながらシリコンウエフアーの仕
上研磨を行つた。仕上げ後の研磨面を顕微鏡観察した結
果マイクロスクラッチのない極めて精度の高い良質なウ
エフアーが得られた。しかも研磨布の寿命は従来の研磨
用粒子を強アルカリに懸濁させたものに比較して２〜2.
5倍も長くなつた。This polishing material was attached to a disk, and a silicon wafer was subjected to finish polishing while pouring water at a rotation speed of 700 rpm and a polishing pressure of 0.3 kg / cm 2 . As a result of observing the polished surface after finishing with a microscope, a very high quality wafer without micro scratches was obtained. Moreover, the life of the polishing cloth is 2 to 2 compared to the conventional polishing particles suspended in a strong alkali.
It was 5 times longer.
実施例２ 実施例１で得たシート状物〔Ｉ〕の表面に、ポリオキシ
プロピレンポリオールとポリイソシアネートと架橋促進
剤からなる二液型ポリウレタン接着剤の酢酸エチル溶液
に、固形分100部に対し、平均粒度0.5μの酸化アルミニ
ウム砥粒粉末80部を添加して十分に混練した後、ロール
コート法で塗膜厚さ約0.5mmになる量を塗布し、乾燥
し、キユアーして多孔質層の気孔の表層部に約0.08mm浸
入した厚さ約0.29mmの砥粒層を形成した研磨材を得た。Example 2 On the surface of the sheet-like material [I] obtained in Example 1, an ethyl acetate solution of a two-component polyurethane adhesive consisting of polyoxypropylene polyol, polyisocyanate and a crosslinking accelerator was added to a solid content of 100 parts. After adding 80 parts of aluminum oxide abrasive powder having an average particle size of 0.5μ and sufficiently kneading, an amount of a coating film thickness of about 0.5 mm is applied by a roll coating method, dried, and cured to form a porous layer. An abrasive having an abrasive grain layer having a thickness of about 0.29 mm infiltrated into the surface layer of the pores of about 0.08 mm was obtained.
この研磨材を研磨テーブルに張り付けて、、回転数400r
pm、研磨圧力0.3kg/cm2で注水しながらメガネレンズの
仕上研磨を行つた。仕上げ後の研磨面、クラツチ、クラ
ツク、うねり、くもり等のない極めて精度の高い良質な
レンズが得られた。Stick this abrasive on the polishing table and rotate at 400r
Finishing polishing of the eyeglass lens was performed while pouring water at pm and a polishing pressure of 0.3 kg / cm 2 . A highly accurate and high-quality lens having no polished surface after finishing, no cracks, cracks, undulations, and cloudiness was obtained.
比較のために、シート状物〔Ｉ〕の表面に塗布する砥粒
を含むポリウレタン接着剤組成液を溶剤量を多くして組
成液粘度を低下させ、十分に多孔質層の気孔内部に浸入
させ、乾燥後、再度組成液を塗布し、乾燥し、キユアー
して多孔質層の気孔を砥粒組成物で充填固化した研磨材
とした。For comparison, a polyurethane adhesive composition liquid containing abrasive particles applied to the surface of the sheet-like material [I] is used to increase the amount of the solvent to reduce the viscosity of the composition liquid and sufficiently penetrate into the pores of the porous layer. After drying, the composition liquid was applied again, dried, and cured to obtain an abrasive in which the pores of the porous layer were filled with the abrasive composition and solidified.
この研磨材を研磨テーブルに張り付けて、上記と同じ条
件でメガネレンズの仕上研磨を行つた結果、研磨面には
傷が発生し、仕上げ用には使用できなかつた。As a result of sticking this polishing material to a polishing table and finishing polishing a spectacle lens under the same conditions as described above, scratches were generated on the polishing surface and it could not be used for finishing.
本発明の研磨材は被研磨部への押圧の均一性が高く、研
磨面の研磨精度を高めることができるばかりではなく、
砥粒が弾性接着剤により接着されているため、研磨途中
での砥粒分布のかたよりが生じない。更に、砥粒と弾性
接着剤の比率、弾性接着剤の硬さを調節することができ
るため、被研磨物の硬さが硬いものから軟らかいものま
で広範囲の研磨に使用できると共に、研磨面の精度の高
いものが得られる。The abrasive of the present invention has a high uniformity of pressing to the portion to be polished, and not only can improve the polishing accuracy of the polishing surface,
Since the abrasive grains are adhered by the elastic adhesive, the distribution of the abrasive grains during polishing does not occur. Furthermore, since the ratio of the abrasive grains to the elastic adhesive and the hardness of the elastic adhesive can be adjusted, it can be used for a wide range of polishing from hard objects to soft objects and the accuracy of the polishing surface. You can get high quality.
第１図および第２図は本発明の研磨材断面構造の模式図
であり、第１図は蜂の巣状気孔構造を主体に構成された
多孔質層の表面部分に砥粒層が付与されている研磨材、
第２図は縦割れ状の気孔構造を主体に構成された多孔質
層の表面部分に砥粒層が付与されてなる研磨材である。1 and 2 are schematic views of a cross-sectional structure of an abrasive material of the present invention, and FIG. 1 shows an abrasive grain layer provided on a surface portion of a porous layer mainly composed of a honeycomb-shaped pore structure. Abrasive,
FIG. 2 shows an abrasive in which an abrasive grain layer is applied to the surface portion of a porous layer mainly composed of a vertically cracked pore structure.
Claims (3)
主体とする重合体からなり、シートの厚み方向に蜂の巣
状または縦割れ状の気孔構造を主体に構成された多孔質
層が付与されてなるシート状物であって、該シート状物
の多孔質層気孔の表面または気孔上層部に、ポリウレタ
ン系接着剤と粒子の大きさ0.01〜10μの範囲で選ばれた
砥粒からなる組成物が厚さ1.5mm以下の層として形成さ
れていることを特徴とする精密研磨用研磨材。1. A sheet-like structure having a porous layer mainly composed of a polymer mainly composed of a polyurethane elastomer and having a honeycomb structure or a vertically-cracked pore structure in the thickness direction of the sheet. In the sheet-like porous layer on the surface of the pores or the upper layer of the pores, a composition comprising a polyurethane adhesive and abrasive grains selected in a particle size range of 0.01 to 10 μ has a thickness of 1.5. An abrasive material for precision polishing, which is formed as a layer having a thickness of not more than mm.
求の範囲第１項記載の精密研磨用研磨材。2. The abrasive for precision polishing according to claim 1, wherein the content of the abrasive grains is 30 to 85% by weight.
ム、酸化アルミニウム、二酸化セリウムから選ばれた少
なくとも１種類である特許請求の範囲第１項または第２
項記載の精密研磨用研磨材。3. The method according to claim 1 or 2, wherein the abrasive grains are at least one selected from silicon dioxide, zirconium dioxide, aluminum oxide and cerium dioxide.
An abrasive for precision polishing according to the item.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP286487A JPH0722899B2 (en) | 1987-01-08 | 1987-01-08 | Abrasive material for precision polishing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP286487A JPH0722899B2 (en) | 1987-01-08 | 1987-01-08 | Abrasive material for precision polishing |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63174878A JPS63174878A (en) | 1988-07-19 |
| JPH0722899B2 true JPH0722899B2 (en) | 1995-03-15 |
Family
ID=11541234
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP286487A Expired - Lifetime JPH0722899B2 (en) | 1987-01-08 | 1987-01-08 | Abrasive material for precision polishing |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0722899B2 (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06114748A (en) * | 1992-10-01 | 1994-04-26 | Riken Korandamu Kk | Abrasive cloth |
| DE20013377U1 (en) * | 2000-08-01 | 2000-10-05 | Jöst, Peter, 69518 Abtsteinach | Sanding belt for a belt sanding machine |
| US6575821B2 (en) | 2000-08-01 | 2003-06-10 | Joest Peter | Abrasive belt for a belt grinding machine |
| JP3731522B2 (en) * | 2001-10-09 | 2006-01-05 | 日本ミクロコーティング株式会社 | Cleaning sheet |
-
1987
- 1987-01-08 JP JP286487A patent/JPH0722899B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63174878A (en) | 1988-07-19 |
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| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |