JPH07165889A - Resin composition for sealing - Google Patents
Resin composition for sealingInfo
- Publication number
- JPH07165889A JPH07165889A JP31631793A JP31631793A JPH07165889A JP H07165889 A JPH07165889 A JP H07165889A JP 31631793 A JP31631793 A JP 31631793A JP 31631793 A JP31631793 A JP 31631793A JP H07165889 A JPH07165889 A JP H07165889A
- Authority
- JP
- Japan
- Prior art keywords
- resin
- phenol
- modified
- weight
- prepolymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011342 resin composition Substances 0.000 title claims description 9
- 238000007789 sealing Methods 0.000 title description 4
- 229920005989 resin Polymers 0.000 claims abstract description 37
- 239000011347 resin Substances 0.000 claims abstract description 37
- 239000003822 epoxy resin Substances 0.000 claims abstract description 13
- 239000003208 petroleum Substances 0.000 claims abstract description 13
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 13
- 239000005062 Polybutadiene Substances 0.000 claims abstract description 11
- 229920002857 polybutadiene Polymers 0.000 claims abstract description 11
- 239000003245 coal Substances 0.000 claims abstract description 9
- QHMDKGRWJVOUFU-UHFFFAOYSA-N 3-amino-4-chlorobenzamide Chemical compound NC(=O)C1=CC=C(Cl)C(N)=C1 QHMDKGRWJVOUFU-UHFFFAOYSA-N 0.000 claims abstract description 6
- 150000002148 esters Chemical class 0.000 claims description 13
- 238000005538 encapsulation Methods 0.000 claims description 9
- 239000011256 inorganic filler Substances 0.000 claims description 5
- 229910003475 inorganic filler Inorganic materials 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims description 2
- 229920000642 polymer Polymers 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 abstract description 9
- 230000001070 adhesive effect Effects 0.000 abstract 1
- 239000003795 chemical substances by application Substances 0.000 abstract 1
- 239000000945 filler Substances 0.000 abstract 1
- 238000005476 soldering Methods 0.000 abstract 1
- 238000010521 absorption reaction Methods 0.000 description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 10
- 150000002989 phenols Chemical class 0.000 description 10
- 229910000679 solder Inorganic materials 0.000 description 8
- 239000000203 mixture Substances 0.000 description 7
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- 239000012778 molding material Substances 0.000 description 6
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 5
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 4
- -1 benzotriazole compound Chemical class 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000004643 cyanate ester Substances 0.000 description 3
- 125000004185 ester group Chemical group 0.000 description 3
- IANQTJSKSUMEQM-UHFFFAOYSA-N 1-benzofuran Chemical compound C1=CC=C2OC=CC2=C1 IANQTJSKSUMEQM-UHFFFAOYSA-N 0.000 description 2
- YBYIRNPNPLQARY-UHFFFAOYSA-N 1H-indene Chemical compound C1=CC=C2CC=CC2=C1 YBYIRNPNPLQARY-UHFFFAOYSA-N 0.000 description 2
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- ZSWFCLXCOIISFI-UHFFFAOYSA-N cyclopentadiene Chemical compound C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 238000004898 kneading Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- GEMHFKXPOCTAIP-UHFFFAOYSA-N n,n-dimethyl-n'-phenylcarbamimidoyl chloride Chemical compound CN(C)C(Cl)=NC1=CC=CC=C1 GEMHFKXPOCTAIP-UHFFFAOYSA-N 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 description 1
- ZBBLRPRYYSJUCZ-GRHBHMESSA-L (z)-but-2-enedioate;dibutyltin(2+) Chemical compound [O-]C(=O)\C=C/C([O-])=O.CCCC[Sn+2]CCCC ZBBLRPRYYSJUCZ-GRHBHMESSA-L 0.000 description 1
- NSGXIBWMJZWTPY-UHFFFAOYSA-N 1,1,1,3,3,3-hexafluoropropane Chemical compound FC(F)(F)CC(F)(F)F NSGXIBWMJZWTPY-UHFFFAOYSA-N 0.000 description 1
- JIHQDMXYYFUGFV-UHFFFAOYSA-N 1,3,5-triazine Chemical group C1=NC=NC=N1 JIHQDMXYYFUGFV-UHFFFAOYSA-N 0.000 description 1
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- SYEWHONLFGZGLK-UHFFFAOYSA-N 2-[1,3-bis(oxiran-2-ylmethoxy)propan-2-yloxymethyl]oxirane Chemical compound C1OC1COCC(OCC1OC1)COCC1CO1 SYEWHONLFGZGLK-UHFFFAOYSA-N 0.000 description 1
- CVZJDKNXPSQHOG-UHFFFAOYSA-N 2-[2,3-bis(oxiran-2-yl)phenyl]oxirane Chemical compound O1C(C1)C=1C(=C(C=CC1)C1CO1)C1CO1 CVZJDKNXPSQHOG-UHFFFAOYSA-N 0.000 description 1
- RBGDLYUEXLWQBZ-UHFFFAOYSA-N 2-chlorobenzamide Chemical compound NC(=O)C1=CC=CC=C1Cl RBGDLYUEXLWQBZ-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- MECNWXGGNCJFQJ-UHFFFAOYSA-N 3-piperidin-1-ylpropane-1,2-diol Chemical compound OCC(O)CN1CCCCC1 MECNWXGGNCJFQJ-UHFFFAOYSA-N 0.000 description 1
- NBMYIUZXRBUQDY-UHFFFAOYSA-N CCC.C1(C2C(CC1)O2)OC2C1C(CC2)O1 Chemical compound CCC.C1(C2C(CC1)O2)OC2C1C(CC2)O1 NBMYIUZXRBUQDY-UHFFFAOYSA-N 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229940024545 aluminum hydroxide Drugs 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 239000012964 benzotriazole Substances 0.000 description 1
- 230000001588 bifunctional effect Effects 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229940120693 copper naphthenate Drugs 0.000 description 1
- SEVNKWFHTNVOLD-UHFFFAOYSA-L copper;3-(4-ethylcyclohexyl)propanoate;3-(3-ethylcyclopentyl)propanoate Chemical compound [Cu+2].CCC1CCC(CCC([O-])=O)C1.CCC1CCC(CCC([O-])=O)CC1 SEVNKWFHTNVOLD-UHFFFAOYSA-L 0.000 description 1
- ZKXWKVVCCTZOLD-UHFFFAOYSA-N copper;4-hydroxypent-3-en-2-one Chemical compound [Cu].CC(O)=CC(C)=O.CC(O)=CC(C)=O ZKXWKVVCCTZOLD-UHFFFAOYSA-N 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 150000001993 dienes Chemical class 0.000 description 1
- 230000000447 dimerizing effect Effects 0.000 description 1
- 239000008393 encapsulating agent Substances 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- SLGWESQGEUXWJQ-UHFFFAOYSA-N formaldehyde;phenol Chemical compound O=C.OC1=CC=CC=C1 SLGWESQGEUXWJQ-UHFFFAOYSA-N 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- GIWKOZXJDKMGQC-UHFFFAOYSA-L lead(2+);naphthalene-2-carboxylate Chemical compound [Pb+2].C1=CC=CC2=CC(C(=O)[O-])=CC=C21.C1=CC=CC2=CC(C(=O)[O-])=CC=C21 GIWKOZXJDKMGQC-UHFFFAOYSA-L 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 150000005673 monoalkenes Chemical class 0.000 description 1
- WWZKQHOCKIZLMA-UHFFFAOYSA-M octanoate Chemical compound CCCCCCCC([O-])=O WWZKQHOCKIZLMA-UHFFFAOYSA-M 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 1
- 229960001755 resorcinol Drugs 0.000 description 1
- WSFQLUVWDKCYSW-UHFFFAOYSA-M sodium;2-hydroxy-3-morpholin-4-ylpropane-1-sulfonate Chemical compound [Na+].[O-]S(=O)(=O)CC(O)CN1CCOCC1 WSFQLUVWDKCYSW-UHFFFAOYSA-M 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
- 238000005829 trimerization reaction Methods 0.000 description 1
- 150000003739 xylenols Chemical class 0.000 description 1
- CHJMFFKHPHCQIJ-UHFFFAOYSA-L zinc;octanoate Chemical compound [Zn+2].CCCCCCCC([O-])=O.CCCCCCCC([O-])=O CHJMFFKHPHCQIJ-UHFFFAOYSA-L 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、金型取り出し時の離型
性に優れ、ガラス転移点(以下Tgという)が高く、低
吸水性、高接着性で靭性に優れた半導体封止用熱硬化性
樹脂組成物に関するものである。BACKGROUND OF THE INVENTION The present invention relates to a heat for semiconductor encapsulation which has excellent releasability at the time of taking out a mold, a high glass transition point (hereinafter referred to as Tg), low water absorption, high adhesiveness and excellent toughness. The present invention relates to a curable resin composition.
【0002】[0002]
【従来の技術】近年IC、LSI、トランジスター、ダ
イオードなどの半導体素子や電子回路等の封止には、特
性、コスト等の点からエポキシ樹脂組成物が一般的に用
いられている。しかし、電子部品の量産性指向、高集積
化や表面実装化の方向に進んで来ており、これに伴い封
止樹脂に対する要求は厳しくなってきている。特に高集
積化に伴うチップの大型化、パッケージの薄肉化や表面
実装時における半田浸漬(200〜300℃)によって
装置にクラックが発生し易くなっており、信頼性向上の
ために半導体封止用樹脂としては耐熱性、高靭性と低吸
水性が強く望まれている。2. Description of the Related Art In recent years, epoxy resin compositions have been generally used for sealing semiconductor elements such as ICs, LSIs, transistors and diodes, electronic circuits, etc. in terms of characteristics, cost, and the like. However, with the trend toward mass production of electronic components, high integration and surface mounting, the demands for the sealing resin have become stricter accordingly. In particular, cracks are likely to occur in the device due to chip size increase due to higher integration, thinner package, and solder dipping (200 to 300 ° C) during surface mounting, and for semiconductor encapsulation to improve reliability. As a resin, heat resistance, high toughness, and low water absorption are strongly desired.
【0003】半導体封止用樹脂としては現在エポキシ樹
脂が主流である。しかし、エポキシ樹脂は、耐熱性と低
吸水性の点で改良に限界があり、表面実装時の半田浸漬
後の信頼性の高いものが得られていない。エポキシ樹脂
に代わる高耐熱性を有する樹脂としては、マレイミド樹
脂が注目されてきているが、吸水率が大きく、吸湿時の
半田浸漬でクラックを発生し、信頼性に乏しい欠点があ
る。Epoxy resins are currently the mainstream resin for semiconductor encapsulation. However, there is a limit to the improvement of the epoxy resin in terms of heat resistance and low water absorption, and a highly reliable epoxy resin after solder dipping during surface mounting has not been obtained. As a resin having a high heat resistance, which is an alternative to an epoxy resin, a maleimide resin has been attracting attention, but it has a drawback that it has a large water absorption rate, cracks are generated when solder is dipped during moisture absorption, and reliability is poor.
【0004】[0004]
【発明が解決しようとする課題】本発明の目的とすると
ころは、金型取り出し時の離型性に優れ、高耐熱性、低
吸水性、高接着性で、かつ高靭性を有し、半田浸漬後の
信頼性に非常に優れた半導体封止用樹脂組成物を提供す
ることにある。The object of the present invention is to provide excellent releasability at the time of taking out a mold, high heat resistance, low water absorption, high adhesiveness, high toughness, and solderability. An object of the present invention is to provide a resin composition for semiconductor encapsulation which is very excellent in reliability after immersion.
【0005】[0005]
【課題を解決するための手段】本発明は、式(1)で示
されるジシアネートエステル及び/又はそのプレポリマ
ーと、フェノール変性石油樹脂、フェノール変性石炭樹
脂及びフェノール変性ポリブタジエン樹脂からなる群よ
り選ばれた1種又は2種以上の変性樹脂を、エポキシ樹
脂と3−アミノ−4−クロロベンズアミドと無機充填剤
からなる封止用樹脂組成物において、3−アミノ−4−
クロロベンズアミドの割合が、ジシアネートエステル及
び/又はそのプレポリマー100重量部に対して1重量
部以上、20重量部未満であることを特徴とする封止用
樹脂組成物である。The present invention is selected from the group consisting of a dicyanate ester represented by the formula (1) and / or a prepolymer thereof, a phenol-modified petroleum resin, a phenol-modified coal resin and a phenol-modified polybutadiene resin. In the resin composition for encapsulation, which comprises an epoxy resin, 3-amino-4-chlorobenzamide, and an inorganic filler, one or two or more modified resins
The encapsulating resin composition is characterized in that the proportion of chlorobenzamide is 1 part by weight or more and less than 20 parts by weight with respect to 100 parts by weight of the dicyanate ester and / or its prepolymer.
【0006】[0006]
【化2】 [Chemical 2]
【0007】本発明に用いられる一般式(1)で示され
るジシアネートエステル及び/又はそのプレポリマー
は、分子内に2個以上のシアネートエステル基を有する
有機化合物を意味する。本発明においては、このジシア
ネートエステル類そのもの、またはこれから誘導される
プレポリマーを用いることができる。これらの化合物
は、必要に応じて、ナフテン酸亜鉛、ナフテン酸コバル
ト、ナフテン酸銅、ナフテン酸鉛、オクチル酸亜鉛、オ
クチル酸錫、鉛アセチルアセトナート、銅アセチルアセ
トナート、ジブチル錫マレエート等の触媒を用いること
によって、シアネートエステル基を三量化し、適当に反
応を調整してプレポリマー化することができる。シアネ
ートエステル基は、三量化することによってsym−ト
リアジン環を分子内に形成し、最終的に加熱硬化するこ
とが可能である。このジシアネートエステル及び/又は
そのプレポリマーの単独の硬化物は、それ自体耐熱性に
優れ、かつ比較的低吸水率性を有するが、靭性及び接着
性の点では未だ不充分であり、フェノール変性石油樹
脂、フェノール変性石炭樹脂、フェノール変性ポリブタ
ジエン樹脂やベンゾトリアゾール化合物とを配合して加
熱硬化することによってはじめて硬化性、接着性、靭性
に優れた封止用組成物を提供できるものである。The dicyanate ester represented by the general formula (1) and / or its prepolymer used in the present invention means an organic compound having two or more cyanate ester groups in the molecule. In the present invention, the dicyanate ester itself or a prepolymer derived therefrom can be used. These compounds are, if necessary, catalysts such as zinc naphthenate, cobalt naphthenate, copper naphthenate, lead naphthenate, zinc octylate, tin octylate, lead acetylacetonate, copper acetylacetonate, and dibutyltin maleate. By using, the cyanate ester group can be trimerized, and the reaction can be appropriately adjusted to form a prepolymer. The cyanate ester group can form a sym-triazine ring in the molecule by trimerization and can be finally heat-cured. The cured product of the dicyanate ester and / or its prepolymer alone has excellent heat resistance and relatively low water absorption, but is still insufficient in terms of toughness and adhesiveness, and phenol-modified A sealing composition having excellent curability, adhesiveness, and toughness can be provided only by blending a petroleum resin, a phenol-modified coal resin, a phenol-modified polybutadiene resin, or a benzotriazole compound and heating and curing.
【0008】本発明において用いられるジシアネートエ
ステル及び/又はそのプレポリマーは、式(1)で示さ
れるものである。式(1)の好ましいジシアネートエス
テル化合物の例としては、ビス(4-シアネートフェニ
ル)メタン、ビス(3-メチル-4-シアネートフェニル)メ
タン、ビス(3-エチル-4-シアネートフェニル)メタ
ン、ビス(3,5-ジメチル-4-シアネートフェニル)メタ
ン、1,1-ビス(4-シアネートフェニル)エタン、2,2
-ビス(4-シアネートフェニル)プロパン、2,2-ビス
(4-シアネートフェニル)-1,1,1,3,3,3-ヘキサフ
ルオロプロパン、ジ(4-シアネートフェニル)エーテ
ル、ジ(4-シアネートフェニル)チオエーテル、4,4-
ジシアネート-ジフェニルなどが挙げられる。The dicyanate ester and / or its prepolymer used in the present invention is represented by the formula (1). Examples of preferred dicyanate ester compounds of formula (1) include bis (4-cyanatephenyl) methane, bis (3-methyl-4-cyanatephenyl) methane, bis (3-ethyl-4-cyanatephenyl) methane, Bis (3,5-dimethyl-4-cyanatephenyl) methane, 1,1-bis (4-cyanatephenyl) ethane, 2,2
-Bis (4-cyanatephenyl) propane, 2,2-bis
(4-Cyanatephenyl) -1,1,1,1,3,3,3-hexafluoropropane, di (4-cyanatephenyl) ether, di (4-cyanatephenyl) thioether, 4,4-
Examples include dicyanate-diphenyl and the like.
【0009】本発明で用いられるフェノール変性石油樹
脂は、石油の分解油留分に含まれるジオレフィン及びモ
ノオレフィン類をフェノール類と共重合させたものであ
る。更に詳しくは、分解油留分のうち、C5留分を原料
にしたC5系(脂肪族系)石油樹脂、C9留分を原料にし
たC9系(芳香族系)石油樹脂、C5C9共重合石油樹
脂、又はC5留分に含まれるシクロペンタジエンを熱二
量化して得られるジシクロペンタジエンを原料にしたジ
シクロペンタジエン樹脂などに、フェノール類を付加さ
せた石油樹脂である。The phenol-modified petroleum resin used in the present invention is obtained by copolymerizing diolefins and monoolefins contained in a cracked oil fraction of petroleum with phenols. More specifically, among the cracked oil fraction, C 5 system in which the C 5 fraction in material (aliphatic) petroleum resins, C 9 system in which a C 9 fraction to the raw material (aromatic) petroleum resin, C A petroleum resin obtained by adding phenols to a 5 C 9 copolymerized petroleum resin or a dicyclopentadiene resin obtained by dimerizing cyclopentadiene contained in a C 5 fraction as a raw material. .
【0010】本発明で用いられるフェノール変性石炭樹
脂は、石炭の分解油留分に含まれるスチレン、ビニルト
ルエン、クマロン、インデンなどをフェノール類と付加
重合させたものである。また、フェノール変性ポリブタ
ジエン樹脂は、分子量300〜2000のポリブタジエ
ンをフェノール類と付加重合させたものである。ポリブ
タジエンの分子量が300より低いと良好な靭性が得ら
れず、2000より高いと耐熱性が低下する。The phenol-modified coal resin used in the present invention is obtained by addition-polymerizing styrene, vinyltoluene, coumarone, indene and the like contained in the cracked oil fraction of coal with phenols. Further, the phenol-modified polybutadiene resin is obtained by addition-polymerizing polybutadiene having a molecular weight of 300 to 2000 with phenols. When the molecular weight of polybutadiene is lower than 300, good toughness cannot be obtained, and when it is higher than 2000, heat resistance is lowered.
【0011】フェノール類としては、フェノール、クレ
ゾール、キシレノールなどが使用される。フェノール類
の含有量は、フェノール変性樹脂中の5重量%以上、5
0重量%以下で、かつ分子当り平均1〜3個付加したも
のが好ましい。フェノール類の含有量が5重量%未満で
は、硬化性が悪く、Tgも低く、良好な靭性が得られな
い。また50重量%を越えると、成形品の吸水率が大き
くなる。As the phenols, phenol, cresol, xylenol and the like are used. The content of phenols is 5% by weight or more in the phenol-modified resin, 5
It is preferably 0% by weight or less and an average of 1 to 3 added per molecule. If the content of the phenols is less than 5% by weight, the curability is poor and the Tg is low, so that good toughness cannot be obtained. On the other hand, if it exceeds 50% by weight, the water absorption rate of the molded product increases.
【0012】フェノール変性石油樹脂、フェノール変性
石炭樹脂又はフェノール変性ポリブタジエン樹脂は、ジ
シアネートエステル及び/又はそのプレポリマー100
重量部に対し、5重量部以上50重量部以下が好まし
い。5重量部未満では、硬化性が悪く、成形品の吸水率
も大きくなる。また50重量部を越えると、耐熱性が低
下し、良好な靭性が得られない。Phenol-modified petroleum resin, phenol-modified coal resin or phenol-modified polybutadiene resin is a dicyanate ester and / or its prepolymer 100.
It is preferably 5 parts by weight or more and 50 parts by weight or less with respect to parts by weight. If it is less than 5 parts by weight, the curability will be poor and the water absorption of the molded article will be large. On the other hand, if it exceeds 50 parts by weight, the heat resistance is lowered and good toughness cannot be obtained.
【0013】ジシアネートエステル及び/又はそのプレ
ポリマーとフェノール変性石油樹脂、フェノール変性石
炭樹脂又はフェノール変性ポリブタジエン樹脂とは、1
00〜200℃に加熱して、融点が50℃以上100℃
以下になるよう、予め反応させておくこともできる。The dicyanate ester and / or its prepolymer and the phenol-modified petroleum resin, phenol-modified coal resin or phenol-modified polybutadiene resin are 1
When heated to 00 to 200 ° C, the melting point is 50 ° C or higher and 100 ° C.
The reaction may be performed in advance so that it becomes as follows.
【0014】エポキシ樹脂としては、特に限定されるも
のではないが、例を挙げると、ビスフェノールAのジグ
リシジルエーテル、4,4'-ジ(1,2-エポキシエチル)
ジフェニルエーテル、4,4'-(1,2-エポキシエチル)
ジフェニルエーテル、レゾルシンのグリシジルエーテ
ル、ブタジエンエポキシサイド、ビス-(2,3-エポキシ
シクロペンチル)エーテルプロパン、フロログリシンの
ジグリシジルエーテル、メチルフロログリシンのジグリ
シジルエーテル、3,3',5,5'-テトラメチル-ビフェ
ニル-4,4'-ジグリシジルエーテル、ビフェニル-4,
4'-ジグリシジルエーテル、ナフタレン-1,6-ジグリ
シジルエーテルなどの2官能エポキシ化合物、フェノー
ル-ホルムアルデヒドノボラックのポリグリシジルエー
テル、トリメチロールプロパンのトリグリシジルエーテ
ル、グリセリンのトリグリシジルエーテル、1,3,5-
トリ(1,2-エポキシエチル)ベンゼン、ポリアリルグリ
シジルエーテル、パラアミノフェノールのトリグリシジ
ルエーテルなどの3官能以上のエポキシ化合物が用いら
れる。また分子内にCl、Br等のハロゲン原子を有す
るエポキシ樹脂を用いることも可能である。これらの化
合物は単独もしくは併用して用いることができる。The epoxy resin is not particularly limited, but examples thereof include diglycidyl ether of bisphenol A, 4,4'-di (1,2-epoxyethyl).
Diphenyl ether, 4,4 '-(1,2-epoxyethyl)
Diphenyl ether, resorcin glycidyl ether, butadiene epoxyside, bis- (2,3-epoxycyclopentyl) ether propane, phloroglysin diglycidyl ether, methyl phloroglysin diglycidyl ether 3,3 ', 5,5'-tetra Methyl-biphenyl-4,4'-diglycidyl ether, biphenyl-4,
Bifunctional epoxy compounds such as 4'-diglycidyl ether and naphthalene-1,6-diglycidyl ether, phenol-formaldehyde novolac polyglycidyl ether, trimethylolpropane triglycidyl ether, glycerin triglycidyl ether 1,3,3, 5-
Trifunctional or higher functional epoxy compounds such as tri (1,2-epoxyethyl) benzene, polyallyl glycidyl ether, and triglycidyl ether of para-aminophenol are used. It is also possible to use an epoxy resin having a halogen atom such as Cl or Br in the molecule. These compounds can be used alone or in combination.
【0015】エポキシ樹脂は、ジシアネートエステル及
び/又はそのプレポリマー100重量部に対して3〜3
0重量部が好ましい。3重量部未満では、接着性が低下
し、30重量部を越えるとTgが低下する。The epoxy resin is 3 to 3 parts by weight based on 100 parts by weight of the dicyanate ester and / or its prepolymer.
0 parts by weight is preferred. If it is less than 3 parts by weight, the adhesiveness will be lowered, and if it exceeds 30 parts by weight, Tg will be lowered.
【0016】3−アミノ−4−クロロベンズアミドの添
加量はジシアネートエステル及び/又はそのプレポリマ
ー100重量部に対して、1重量部以上、20重量部以
下が好ましい。1重量部未満では金型取り出し時の離型
性が悪く、20重量部以上では、吸水率が大きくなり、
接着性が低下する。The amount of 3-amino-4-chlorobenzamide added is preferably 1 part by weight or more and 20 parts by weight or less with respect to 100 parts by weight of the dicyanate ester and / or its prepolymer. If it is less than 1 part by weight, the releasability at the time of taking out the mold is poor, and if it is 20 parts by weight or more, the water absorption becomes large.
Adhesion is reduced.
【0017】無機充填剤としては、シリカ粉末、アルミ
ナ、三酸化アンチモン、水酸化アルミニウム水和物、酸
化チタン等が挙げられ、これらを単独又は2種以上混合
して用いることができる。これらの無機充填剤のうち、
半導体封止材料組成物としてはシリカ粉末が好んで用い
られる。尚、無機充填剤の配合量は、ジシアネートエス
テル及び/又はそのプレポリマー100重量部に対して
100〜1000重量部が好ましい。100重量部未満
では、成形品の線膨張係数が大きくなり、1000重量
部を越えると、成形性が低下し、実用に適さない。Examples of the inorganic filler include silica powder, alumina, antimony trioxide, aluminum hydroxide hydrate, titanium oxide and the like, and these may be used alone or in combination of two or more. Of these inorganic fillers,
Silica powder is preferably used as the semiconductor encapsulating material composition. The amount of the inorganic filler compounded is preferably 100 to 1000 parts by weight with respect to 100 parts by weight of the dicyanate ester and / or its prepolymer. If it is less than 100 parts by weight, the linear expansion coefficient of the molded product will be large, and if it exceeds 1000 parts by weight, the moldability will be reduced and it will not be suitable for practical use.
【0018】また、これらの必須成分以外のものとし
て、成形材料化に際して、硬化触媒、滑剤、難燃化剤、
着色剤、シランカップリング剤等を適宜配合添加するこ
とができる。In addition to these essential components, a curing catalyst, a lubricant, a flame retardant,
A colorant, a silane coupling agent, and the like can be appropriately added and added.
【0019】本発明の封止用組成物を成形材料として製
造する場合の一般的な方法としては、これらの必須成分
に各種添加剤を加えて均一に混合した組成物をニーダ
ー、熱ロール等により混練処理を行い、冷却後粉砕して
成形材料とする。As a general method for producing the encapsulating composition of the present invention as a molding material, a composition in which various additives are added to these essential components and uniformly mixed is prepared by a kneader, a heat roll or the like. A kneading process is performed, and after cooling, pulverization is performed to obtain a molding material.
【0020】[0020]
(実施例1〜3)表1に示す配合に従って、熱ロールで
混練し、成形材料を得た。得られた成形材料を、トラン
スファー成形により、175℃、90秒成形した。金型
取り出し時の離型性が良く、外観も良好な成形品が得ら
れた。この成形品をさらに175℃、8時間後硬化を行
い、特性を評価した。その結果を表1に示す。実施例1
〜3の成形材料は、Tgが高く、靭性(破壊エネルギ
ー)が大きく、高接着性でしかも吸水率が小さい。65
℃95%RH72時間の吸湿処理での耐半田クラック性
も良好であった。(Examples 1 to 3) According to the formulation shown in Table 1, kneading was performed with a hot roll to obtain a molding material. The obtained molding material was molded by transfer molding at 175 ° C. for 90 seconds. A molded product having good releasability at the time of taking out the mold and a good appearance was obtained. The molded product was further post-cured at 175 ° C. for 8 hours to evaluate the characteristics. The results are shown in Table 1. Example 1
The molding materials Nos. 3 to 3 have high Tg, high toughness (breaking energy), high adhesiveness, and low water absorption. 65
Solder crack resistance was also good in the moisture absorption treatment at a temperature of 95% RH for 72 hours.
【0021】(比較例1〜3)表1の配合に従って、実
施例1〜3と同様に成形材料を得た。比較例1、比較例
2は、金型取り出し時の離型性があまり良くなかった。
比較例3は、吸水率が大きく、吸湿処理後の耐半田クラ
ック性が悪かった。(Comparative Examples 1 to 3) According to the formulations shown in Table 1, molding materials were obtained in the same manner as in Examples 1 to 3. In Comparative Examples 1 and 2, the releasability at the time of taking out the mold was not so good.
In Comparative Example 3, the water absorption rate was high and the solder crack resistance after the moisture absorption treatment was poor.
【0022】[0022]
【表1】 [Table 1]
【0023】(注) *1:フェノール変性C5系石油樹脂;フェノール含有量
23%、1分子当りフェノール2.2個 *2:フェノール変性石炭樹脂;フェノール含有量23
%、1分子当りフェノール2.2個 *3:フェノール変性ポリブタジエン樹脂;ポリブタジ
エン分子量700、フェノール含有量23%、1分子当り
フェノール2.2個 *4:油化シェルエポキシ(株)製 ビスフェノールA型
エポキシ樹脂 *5:日本化薬(株)製 オルソクレゾールノボラック型
エポキシ樹脂 *6:ビス(3,5-ジメチル-4-シアネートフェニル)メ
タン *7:ナフテン酸コバルト *8:曲げ強度試験の応力-歪み曲線から算出 *9:吸湿処理:85℃、85%RH、72時間 *10:フラットパッケージ(厚さ2.7mm)のリードフ
レーム上に6mm角の素子をマウント合成、トランスファ
ー成形した成形体10個を、吸湿処理(65℃、95%R
H、72時間)後直ちに260℃の半田浴に10秒浸漬
後の成形体表面のクラック発生個数を示す。 *11:耐半田クラック性試験終了後の成形体(良品)を
切断し、断面を走査電子顕微鏡で観察した。(Note) * 1: Phenol-modified C 5 petroleum resin; phenol content 23%, 2.2 phenols per molecule * 2: Phenol-modified coal resin; phenol content 23
%, 2.2 phenols per molecule * 3: Phenol-modified polybutadiene resin; polybutadiene molecular weight 700, phenol content 23%, 2.2 phenols per molecule * 4: Bisphenol A type manufactured by Yuka Shell Epoxy Co., Ltd. Epoxy resin * 5: Orthocresol novolac type epoxy resin manufactured by Nippon Kayaku Co., Ltd. * 6: Bis (3,5-dimethyl-4-cyanatephenyl) methane * 7: Cobalt naphthenate * 8: Stress in bending strength test- Calculated from strain curve * 9: Moisture absorption treatment: 85 ° C, 85% RH, 72 hours * 10: Molded body 10 in which a 6 mm square element is mounted on a lead frame of a flat package (thickness 2.7 mm) and transfer molded. Moisture absorption (65 ℃, 95% R)
Immediately after (H, 72 hours), the number of cracks on the surface of the molded product after immersion in a solder bath at 260 ° C. for 10 seconds is shown. * 11: The molded body (good product) after the solder crack resistance test was cut, and the cross section was observed with a scanning electron microscope.
【0024】[0024]
【発明の効果】本発明による封止用樹脂組成物は、金型
取り出し時の離型性が良好で、硬化物は高Tgであり、
吸水率が小さく、高接着性でしかも靭性に優れている。
これを半導体封止に用いた場合、封止体の耐半田クラッ
ク性も良好であり、半導体封止用樹脂組成物として非常
に信頼性の高い優れたものである。The encapsulating resin composition according to the present invention has a good releasability when the mold is taken out, and the cured product has a high Tg.
It has a low water absorption rate, high adhesion, and excellent toughness.
When this is used for semiconductor encapsulation, the solder crack resistance of the encapsulant is also good, and it is a highly reliable and excellent resin composition for semiconductor encapsulation.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 C08L 63/00 NKA H01L 23/29 23/31 ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Internal reference number FI technical display location C08L 63/00 NKA H01L 23/29 23/31
Claims (1)
ル及び/又はそのプレポリマーと、フェノール変性石油
樹脂、フェノール変性石炭樹脂及びフェノール変性ポリ
ブタジエン樹脂からなる群より選ばれた1種又は2種以
上の変性樹脂を、エポキシ樹脂と3−アミノ−4−クロ
ロベンズアミドと無機充填剤からなる封止用樹脂組成物
において、3−アミノ−4−クロロベンズアミドの割合
が、ジシアネートエステル及び/又はそのプレポリマー
100重量部に対して1重量部以上、20重量部未満で
あることを特徴とする封止用樹脂組成物。 【化1】 1. A dicyanate ester represented by the formula (1) and / or a prepolymer thereof, and one or more selected from the group consisting of a phenol-modified petroleum resin, a phenol-modified coal resin and a phenol-modified polybutadiene resin. In the resin composition for encapsulation, which comprises an epoxy resin, 3-amino-4-chlorobenzamide, and an inorganic filler, the ratio of 3-amino-4-chlorobenzamide is dicyanate ester and / or its prepolymer. A resin composition for encapsulation, which is 1 part by weight or more and less than 20 parts by weight with respect to 100 parts by weight of a polymer. [Chemical 1]
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP31631793A JPH07165889A (en) | 1993-12-16 | 1993-12-16 | Resin composition for sealing |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP31631793A JPH07165889A (en) | 1993-12-16 | 1993-12-16 | Resin composition for sealing |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH07165889A true JPH07165889A (en) | 1995-06-27 |
Family
ID=18075791
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP31631793A Pending JPH07165889A (en) | 1993-12-16 | 1993-12-16 | Resin composition for sealing |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH07165889A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20000045210A (en) * | 1998-12-30 | 2000-07-15 | 유현식 | Epoxy resin composition for semiconductor encapsulation |
US6276725B1 (en) | 1999-04-09 | 2001-08-21 | The Standard Register Company | Automation friendly security labels for specimen container |
JP2008141052A (en) * | 2006-12-04 | 2008-06-19 | Denso Corp | Electronic package |
-
1993
- 1993-12-16 JP JP31631793A patent/JPH07165889A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20000045210A (en) * | 1998-12-30 | 2000-07-15 | 유현식 | Epoxy resin composition for semiconductor encapsulation |
US6276725B1 (en) | 1999-04-09 | 2001-08-21 | The Standard Register Company | Automation friendly security labels for specimen container |
JP2008141052A (en) * | 2006-12-04 | 2008-06-19 | Denso Corp | Electronic package |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPH04342719A (en) | Epoxy resin composition and semiconductor device | |
WO2004074344A1 (en) | Epoxy resin composition and semiconductor device | |
JP2005320446A (en) | Epoxy resin composition for sealing semiconductor and semiconductor device | |
JP3714399B2 (en) | Epoxy resin composition for semiconductor encapsulation and semiconductor device | |
JP3233370B2 (en) | Resin composition for sealing | |
JPH0770317A (en) | Thermosetting resin composition for semiconductor sealing | |
JPH07165889A (en) | Resin composition for sealing | |
JP3317745B2 (en) | Resin composition for sealing | |
JPH0211654A (en) | Epoxy resin composition for semiconductor sealing | |
JP3003887B2 (en) | Resin composition for semiconductor encapsulation | |
JP2002293885A (en) | Epoxy resin composition and semiconductor device | |
JPH06256625A (en) | Sealing resin composition | |
JP2001240726A (en) | Epoxy resin composition and semiconductor device | |
JPH07196793A (en) | Resin composition for sealing | |
JPS63275626A (en) | epoxy resin composition | |
JP2002206021A (en) | Epoxy resin composition and semiconductor device | |
JPH05310673A (en) | Thermosetting resin composition | |
JPH0770315A (en) | Thermosetting resin composition for semiconductor sealing | |
JPH07173253A (en) | Epoxy resin composition | |
JP2653606B2 (en) | Thermosetting resin composition | |
JP2680351B2 (en) | Resin composition for sealing | |
JP2653598B2 (en) | Thermosetting resin composition | |
JP3568654B2 (en) | Epoxy resin composition | |
JPS63275625A (en) | Epoxy resin composition for semiconductor encapsulation | |
JPH0770316A (en) | Thermosetting resin composition for semiconductor sealing |