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JPH0716097B2 - Method for manufacturing multilayer printed wiring board - Google Patents

Method for manufacturing multilayer printed wiring board

Info

Publication number
JPH0716097B2
JPH0716097B2 JP29855888A JP29855888A JPH0716097B2 JP H0716097 B2 JPH0716097 B2 JP H0716097B2 JP 29855888 A JP29855888 A JP 29855888A JP 29855888 A JP29855888 A JP 29855888A JP H0716097 B2 JPH0716097 B2 JP H0716097B2
Authority
JP
Japan
Prior art keywords
catalyst
hole
wiring board
printed wiring
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP29855888A
Other languages
Japanese (ja)
Other versions
JPH02143588A (en
Inventor
圭祐 岡田
智明 浅野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP29855888A priority Critical patent/JPH0716097B2/en
Publication of JPH02143588A publication Critical patent/JPH02143588A/en
Publication of JPH0716097B2 publication Critical patent/JPH0716097B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Production Of Multi-Layered Print Wiring Board (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は多層印刷配線板の製造方法に関し、特に高密度
実装のために導体層が分割して設けられたスルホールを
一部に有する多層印刷配線板の製造方法に関する。
Description: TECHNICAL FIELD The present invention relates to a method for manufacturing a multilayer printed wiring board, and in particular, multilayer printing partially having through holes formed by dividing conductor layers for high-density mounting. The present invention relates to a method for manufacturing a wiring board.

〔従来の技術〕[Conventional technology]

LSI,IC等の高集積化電子機器の高性能化と経済性向上の
ために多層印刷配線板(以下、多層板と記す)の高密度
化が進展している。
In order to improve the performance and economical efficiency of highly integrated electronic devices such as LSI and IC, the density of multilayer printed wiring boards (hereinafter referred to as “multilayer boards”) is increasing.

多層板の高密度化に対して主に2つの対応が図られてい
る。第1に導体層数の増加、すなわち高多層化であり、
第2の対応が基本格子間への多配線化である。しかしな
がら、第1の対応では、層間の導体層を接続するバイア
ホールの増加になり、第2の対応の多配線化、しいて
は、配線の収容性を著しく制限する。そのため、特に、
このバイア・ホールを多層板に貫通孔として設けた場
合、バイアホールを小径化する事で対応しているが、板
厚/孔径比(アスペクト比)が増加し多層板の製造性を
著しく阻害している。
Two main measures are taken to increase the density of multilayer boards. First, there is an increase in the number of conductor layers, that is, a higher number of layers,
The second measure is to increase the number of wiring lines between basic grids. However, in the first measure, the number of via holes connecting the conductor layers between the layers is increased, and the second measure increases the number of wirings, and the wiring accommodability is significantly limited. So, in particular,
When this via hole is provided as a through hole in the multilayer board, it is dealt with by reducing the diameter of the via hole, but the plate thickness / hole diameter ratio (aspect ratio) increases and the productivity of the multilayer board is significantly hindered. ing.

このため、上述した欠点を解消する手段として第3図
(A)に示す様に、導体回路パターン1を形成した触媒
入り絶縁基板3の2枚1組をそれぞれ最外層に配置し、
その内側に多層板の貫通孔の直径より大なる同心円にく
り抜いた孔部16を設けた触媒なしの絶縁基板4と触媒入
りプリプレグ5とを介挿させて、第3図(B)に示す様
に、加熱,加圧して多層化基板7を形成する工程と、第
3図(C)に示す様に、多層化基板7の所定の位置に貫
通孔8を穿設する工程と、第3図(D)に示す様に、多
層化基板7の貫通孔8内壁の触媒入り絶縁基板3端面に
導体回路パターン1の端面と導通接続する導体層11を無
電解めっきにより形成する工程を経て、分割されたバイ
アホール12と通常のスルホール13とを選択的に形成する
事により高密度化を達成した例がある(特願昭61-02936
1)。
Therefore, as a means for solving the above-mentioned drawbacks, as shown in FIG. 3 (A), two sets of the catalyst-containing insulating substrates 3 on which the conductor circuit patterns 1 are formed are arranged in the outermost layers, respectively.
As shown in FIG. 3 (B), an insulating substrate 4 without a catalyst and a prepreg 5 with a catalyst provided with a hole portion 16 hollowed out in a concentric circle having a diameter larger than the diameter of the through hole of the multilayer plate are inserted therein. 3, a step of forming a multilayer substrate 7 by heating and pressurizing, a step of forming a through hole 8 at a predetermined position of the multilayer substrate 7 as shown in FIG. As shown in (D), the conductor layer 11 that is electrically connected to the end face of the conductor circuit pattern 1 is formed on the end face of the insulating substrate 3 containing catalyst on the inner wall of the through hole 8 of the multi-layer substrate 7 by electroless plating, and then divided. There is an example of achieving high density by selectively forming the via hole 12 and the normal through hole 13 (Japanese Patent Application No. 61-02936).
1).

〔発明が解決しようとする課題〕[Problems to be Solved by the Invention]

しかしながら、上述した従来の製造方法では、通常のス
ルーホール形成用の貫通孔の穿孔位置に貫通孔の直径よ
り大なる同心円にくり抜いた孔部を多層化基板の内側の
触媒なしの絶縁基板に設けるため、貫通孔と前記孔部間
にクリアランスを必要とし、平面方向の基本格子を小さ
くできず、平面方向の高密度化の阻害要因になるという
欠点がある。
However, in the above-described conventional manufacturing method, a hole formed in a concentric circle having a diameter larger than the diameter of the through hole is provided in the through hole for forming the normal through hole in the insulating substrate without a catalyst inside the multilayer substrate. Therefore, there is a drawback that a clearance is required between the through hole and the hole portion, the basic lattice in the plane direction cannot be made small, and it becomes a factor that hinders high density in the plane direction.

又、先の孔部を触媒入りプリプレグに含浸された触媒入
りレジンだけで充填する必要があるため、触媒なしの絶
縁基板の厚みが厚すぎるとボイドが発生するために、厚
みの制約が起こり、多層板の電気特性とりわけインピー
ダンス特性に対する制約要因となる欠点がある。
Further, since it is necessary to fill the above-mentioned holes only with the resin containing the catalyst impregnated in the prepreg containing the catalyst, a void is generated when the thickness of the insulating substrate without the catalyst is too large, and thus the thickness is restricted, There is a drawback that it becomes a limiting factor for the electrical characteristics, especially the impedance characteristics, of the multilayer board.

さらに、孔部の穴数に応じて触媒入りプリプレグ層の樹
脂量を調整する必要が生じ、又、孔部の平面方向での集
中度に依って多層板の平滑性や層間厚コントロールが困
難となるという欠点がある。
Furthermore, it is necessary to adjust the amount of resin in the catalyst-containing prepreg layer according to the number of holes, and it is difficult to control the smoothness of the multilayer plate and the interlayer thickness depending on the degree of concentration of the holes in the plane direction. There is a drawback that

本発明の目的は、高密度で、インピーダンス特性に対す
る制約がなく、平滑性や層間厚のコントロールが可能な
多層印刷配線板の製造方法を提供することにある。
An object of the present invention is to provide a method of manufacturing a multilayer printed wiring board which has a high density, has no restriction on impedance characteristics, and can control smoothness and interlayer thickness.

〔課題を解決するための手段〕[Means for Solving the Problems]

本発明の多層印刷配線板の製造方法は、予め導体回路パ
ターンを片面に設け、且つ、他の片面全体に導体を有す
る触媒入り絶縁基板の2枚1組をそれぞれ前記導体回路
パターンを内側にしてそれぞれ最外層に配置しその内側
に触媒なしの絶縁基板と触媒入りプリプレグとを介挿さ
せて加熱加圧して多層化基板を成型する工程と、前記多
層化基板の所定の位置に貫通孔を穿孔する工程と、前記
貫通孔の一部をマスクした後マスクされていない前記貫
通孔内壁に触媒を吸着させる工程と、前記マスクを除去
する工程と、前記貫通孔内壁の前記触媒入り絶縁基板と
前記触媒入りプリプレグとで形成された触媒入り絶縁層
及び触媒を吸着させた部分を含めて無電解めっきで導体
層を形成する工程とを含んで構成されている。
The method for manufacturing a multilayer printed wiring board according to the present invention is such that a conductor circuit pattern is provided on one side in advance, and two sets of catalyst-containing insulating substrates each having a conductor on the entire other side are provided with the conductor circuit pattern inside. A step of forming an insulating substrate without catalyst and a prepreg containing a catalyst inside the outermost layer, heating and pressurizing to form a multi-layered substrate, and forming a through hole at a predetermined position of the multi-layered substrate. A step of masking a part of the through hole, adsorbing a catalyst on the inner wall of the through hole that is not masked, a step of removing the mask, the insulating substrate containing the catalyst on the inner wall of the through hole, and And a step of forming a conductor layer by electroless plating including a catalyst-containing insulating layer formed of the catalyst-containing prepreg and a portion where the catalyst is adsorbed.

〔実施例〕〔Example〕

次に、本発明の実施例について図面を参照して説明す
る。
Next, embodiments of the present invention will be described with reference to the drawings.

第1図(A)〜(F)は本発明の第1の実施例の製造方
法を説明する工程順に示し縦断面図である。
FIGS. 1A to 1F are vertical cross-sectional views showing the order of steps for explaining the manufacturing method according to the first embodiment of the present invention.

第1の実施例は、まず、第1図(A)に示すように、予
め導体回路パターン1をホト印刷法により片面に設け、
且つ、他の片面全体に銅箔2を有する触媒入り絶縁基板
3の2枚1組をそれぞれ導体回路パターン1を内側にし
て最外層に配置し、その内側に触媒なしの絶縁基板4と
触媒入りプリプレグ5とを介挿させてセットする。
In the first embodiment, first, as shown in FIG. 1 (A), the conductor circuit pattern 1 is previously provided on one side by a photo printing method,
In addition, one set of two catalyst-containing insulating substrates 3 each having a copper foil 2 on the entire other surface is placed in the outermost layer with the conductor circuit pattern 1 inside, and the insulating substrate 4 without catalyst and the catalyst are placed inside thereof. Insert it with the prepreg 5 and set it.

次に、第1図(B)に示すように、加熱,加圧して触媒
入り絶縁層6及び触媒なしの絶縁基板4とを含む多層化
基板7を得る。
Next, as shown in FIG. 1 (B), heating and pressurization are performed to obtain a multilayer substrate 7 including the catalyst-containing insulating layer 6 and the catalyst-free insulating substrate 4.

次に、第1図(C)に示すように、所定の位置にN/Cド
リリング装置により貫通孔8a,8bを穿孔する。
Next, as shown in FIG. 1 (C), through holes 8a and 8b are drilled at predetermined positions by an N / C drilling device.

次に、第1図(D)に示すように、分割されたバイアホ
ールを形成する貫通孔8aをホト印刷法により、例えば、
デュポン社製ドライフィルムリストン1220 を用いて、
マスク9を形成した後、塩化パラジウムをベースにした
触媒液に浸漬して、マスク9が施されいない貫通孔8bの
内壁全体に触媒10を吸着させる。
Next, as shown in FIG.
The through holes 8a forming the rule by a photo printing method, for example,
DuPont Dry Film Liston 1220 Using,
After forming the mask 9, based on palladium chloride
The through hole 8b without mask 9 is immersed in the catalyst solution.
The catalyst 10 is adsorbed on the entire inner wall.

次に、第1図(E)に示す様に、マスク9を有機溶剤で
除去した後(図示略)、無電解銅めっきを施すと多層化
基板7の表裏両面及び貫通孔8a,8bの内壁に導体層11が
形成される。この場合、貫通孔8aに於いては、触媒入絶
縁層6にのみ導体層11が形成され、触媒なしの絶縁基板
4には形成されないため、貫通孔8a内壁で導体層11の分
離が起こり、且つ、導体回路パターン1と外層の銅箔2
が接続され、一方、貫通孔8bに於いては、先に吸着させ
た触媒10により、内壁全体に導体層11が形成される。
Next, as shown in FIG. 1 (E), after removing the mask 9 with an organic solvent (not shown), electroless copper plating is applied to both surfaces of the multilayer substrate 7 and the inner walls of the through holes 8a, 8b. A conductor layer 11 is formed on the. In this case, in the through hole 8a, the conductor layer 11 is formed only on the catalyst-containing insulating layer 6 and not on the insulating substrate 4 without a catalyst, so that the conductor layer 11 is separated at the inner wall of the through hole 8a, Moreover, the conductor circuit pattern 1 and the outer copper foil 2
On the other hand, in the through hole 8b, the conductor layer 11 is formed on the entire inner wall by the catalyst 10 previously adsorbed.

次に、第1図(F)に示すように、ホト印刷法によっ
て、最外層の回路形成を行う事により、分割されたバイ
アホール12と通常のスルホール13と含む多層印刷配線板
14が得られる。
Next, as shown in FIG. 1 (F), a multilayer printed wiring board including divided via holes 12 and normal through holes 13 is formed by forming a circuit of the outermost layer by a photo printing method.
You get 14.

第2図(A),(B)は本発明の第2の実施例の製造方
法を説明する工程順に示した縦断面図である。
2 (A) and 2 (B) are vertical cross-sectional views showing the manufacturing process of the second embodiment of the present invention in the order of steps.

第1図の実施例に於いては、第1図(F)に示すよう
に、導体層11を無電解めっきのみで形成したが、第2の
実施例に於いては、まず第2図(A)に示すように、無
電解めっきによる導体層11を数μm程度の薄付めっきで
形成し後、例えば、ピロリン酸銅浴のような無電解めっ
きによる導体層15を厚付めっきで形成する。
In the embodiment shown in FIG. 1, the conductor layer 11 was formed only by electroless plating as shown in FIG. 1 (F), but in the second embodiment, first, as shown in FIG. As shown in A), after forming the conductor layer 11 by electroless plating by thin plating of about several μm, the conductor layer 15 is formed by thick plating by electroless plating such as copper pyrophosphate bath. .

次に、第2図(B)に示すように、ホト印刷法により、
分割されたバイアホール12と通常スルーホール13とを有
する多層印刷配線板14を得る。
Next, as shown in FIG. 2 (B), by the photo printing method,
A multilayer printed wiring board (14) having divided via holes (12) and normal through holes (13) is obtained.

上述した導体層11の形成方法以外の製造方法は、第1の
実施例と同様である。
The manufacturing method other than the method of forming the conductor layer 11 described above is the same as that of the first embodiment.

一般に、印刷配線板に使用される絶縁樹脂は耐アルカリ
性に乏しいのに反し、無電解めっき浴は、高温高アルカ
リ性であり、且つ、析出速度が遅く長時間のめっきが必
要である。そのため、めっき速度が早く、高アルカリ浴
が不要な無電解めっき浴を使用する事により、分割され
たバイアホール12の導体層11の分離部に対する材料劣化
を防止できることにより高密度な基本格子設計を可能と
する利点がある。
In general, an insulating resin used for a printed wiring board has poor alkali resistance, whereas an electroless plating bath has high temperature and high alkalinity, has a low deposition rate, and requires long-time plating. Therefore, by using an electroless plating bath that has a high plating rate and does not require a highly alkaline bath, it is possible to prevent material deterioration in the separated portion of the conductor layer 11 of the divided via hole 12, thereby enabling a high-density basic grid design. There is an advantage that makes it possible.

〔発明の効果〕〔The invention's effect〕

以上説明したように本発明は、分割されたバイアホール
を選択的に多層印刷配線板に形成する場合に、従来技術
の様な基本格子配置,層間厚,特性インピーダンス設計
等の種々設計的制約要素がなく、配線収容性が大幅に向
上した高密度な多層印刷配線板が得られる効果がある。
As described above, according to the present invention, when selectively forming divided via holes in a multilayer printed wiring board, various design constraint elements such as the basic lattice arrangement, the interlayer thickness, and the characteristic impedance design as in the prior art are used. There is no effect, and there is an effect that a high-density multilayer printed wiring board having a significantly improved wiring accommodation property can be obtained.

【図面の簡単な説明】[Brief description of drawings]

第1図(A)〜(F)は本発明の第1の実施例の製造方
法を説明する工程順に示した縦断面図、第2図(A),
(B)は本発明の第2の実施例の製造方法を説明する工
程順に示した縦断面図、第3図(A)〜(D)は従来の
多層印刷配線板の製造方法の一例を説明する工程順に示
した縦断面図である。 1……導体回路パターン、2……銅箔、3……触媒入り
絶縁基板、4……触媒なしの絶縁基板、5……触媒入り
プリプレグ、6……触媒入り絶縁層、7……多層化基
板、8,8a,8b……貫通孔、9……マスク、10……触媒、1
1……導体層、12……分割されたバイアホール、13……
通常のスルホール、14……多層印刷配線板、15……無電
解めっきによる導体層、16……孔部。
1 (A) to 1 (F) are longitudinal sectional views showing the manufacturing method of the first embodiment of the present invention in the order of steps, FIG. 2 (A),
(B) is a longitudinal sectional view showing the manufacturing method of the second embodiment of the present invention in the order of steps, and FIGS. 3 (A) to (D) are examples of the conventional method for manufacturing a multilayer printed wiring board. FIG. 6 is a vertical cross-sectional view showing in the order of steps to be performed. 1 ... Conductor circuit pattern, 2 ... Copper foil, 3 ... Insulating substrate with catalyst, 4 ... Insulating substrate without catalyst, 5 ... Prepreg with catalyst, 6 ... Insulating layer with catalyst, 7 ... Multilayer Substrate, 8,8a, 8b ... Through hole, 9 ... Mask, 10 ... Catalyst, 1
1 …… Conductor layer, 12 …… Separated via holes, 13 ……
Ordinary through hole, 14 ... Multi-layer printed wiring board, 15 ... Electrolytic plating conductor layer, 16 ... Hole part.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】予め導体回路パターンを片面に設け、且
つ、他の片面全体に導体を有する触媒入り絶縁基板の2
枚1組をそれぞれ前記導体回路パターンを内側にしてそ
れぞれ最外層に配置しその内側に触媒なしの絶縁基板と
触媒入りプリプレグとを介挿させて加熱加圧して多層化
基板を成型する工程と、前記多層化基板の所定の位置に
貫通孔を穿孔する工程と、前記貫通孔の一部をマスクし
た後マスクされていない前記貫通孔内壁に触媒を吸着さ
せる工程と、前記マスクを除去する工程と、前記貫通孔
内壁の前記触媒入り絶縁基板と前記触媒入りプリプレグ
とで形成された触媒入り絶縁層及び触媒を吸着させた部
分を含めて無電解めっきで導体層を形成する工程とを含
む事を特徴とする多層印刷配線板の製造方法。
1. A catalyst-containing insulating substrate having a conductor circuit pattern provided on one surface in advance and a conductor provided on the other surface entirely.
A step of forming a multi-layered substrate by placing one set of each in the outermost layer with the conductor circuit pattern inside and inserting an insulating substrate without a catalyst and a prepreg containing a catalyst inside and heating and pressurizing it. A step of forming a through hole at a predetermined position of the multilayer substrate; a step of masking a part of the through hole and then adsorbing a catalyst on the inner wall of the through hole that is not masked; and a step of removing the mask. A step of forming a conductor layer by electroless plating including a catalyst-containing insulating layer formed of the catalyst-containing insulating substrate and the catalyst-containing prepreg on the inner wall of the through hole and a portion where the catalyst is adsorbed. A method for manufacturing a multi-layer printed wiring board, which is characterized.
JP29855888A 1988-11-25 1988-11-25 Method for manufacturing multilayer printed wiring board Expired - Lifetime JPH0716097B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP29855888A JPH0716097B2 (en) 1988-11-25 1988-11-25 Method for manufacturing multilayer printed wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29855888A JPH0716097B2 (en) 1988-11-25 1988-11-25 Method for manufacturing multilayer printed wiring board

Publications (2)

Publication Number Publication Date
JPH02143588A JPH02143588A (en) 1990-06-01
JPH0716097B2 true JPH0716097B2 (en) 1995-02-22

Family

ID=17861297

Family Applications (1)

Application Number Title Priority Date Filing Date
JP29855888A Expired - Lifetime JPH0716097B2 (en) 1988-11-25 1988-11-25 Method for manufacturing multilayer printed wiring board

Country Status (1)

Country Link
JP (1) JPH0716097B2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2707903B2 (en) * 1992-01-28 1998-02-04 日本電気株式会社 Manufacturing method of multilayer printed wiring board
US6729023B2 (en) * 2000-05-26 2004-05-04 Visteon Global Technologies, Inc. Method for making a multi-layer circuit board assembly having air bridges supported by polymeric material
JP2003204157A (en) * 2001-12-28 2003-07-18 Toshiba Corp Multylayer printed-wiring board, manufacturing method thereof and electronic equipment mounting the same
JP5023738B2 (en) 2007-02-28 2012-09-12 富士通株式会社 Method for manufacturing printed wiring board

Also Published As

Publication number Publication date
JPH02143588A (en) 1990-06-01

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