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JPH0653603A - Semiconductor laser device - Google Patents

Semiconductor laser device

Info

Publication number
JPH0653603A
JPH0653603A JP4205327A JP20532792A JPH0653603A JP H0653603 A JPH0653603 A JP H0653603A JP 4205327 A JP4205327 A JP 4205327A JP 20532792 A JP20532792 A JP 20532792A JP H0653603 A JPH0653603 A JP H0653603A
Authority
JP
Japan
Prior art keywords
semiconductor laser
light
lead
laser device
light receiving
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4205327A
Other languages
Japanese (ja)
Other versions
JP3059831B2 (en
Inventor
Yoshio Noisshiki
慶夫 野一色
Yoshimasa Kishimoto
吉正 岸本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Sanyo Electric Co Ltd
Sanyo Electric Co Ltd
Original Assignee
Tokyo Sanyo Electric Co Ltd
Tottori Sanyo Electric Co Ltd
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Sanyo Electric Co Ltd, Tottori Sanyo Electric Co Ltd, Sanyo Electric Co Ltd filed Critical Tokyo Sanyo Electric Co Ltd
Priority to JP4205327A priority Critical patent/JP3059831B2/en
Publication of JPH0653603A publication Critical patent/JPH0653603A/en
Priority to US08/216,508 priority patent/US5367530A/en
Application granted granted Critical
Publication of JP3059831B2 publication Critical patent/JP3059831B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Semiconductor Lasers (AREA)

Abstract

PURPOSE:To obtain a semiconductor laser device which does not generate noise by providing an external wall having a down-grade ahead under a main outgoing beam, and preventing the return light from penetrating into an optical component. CONSTITUTION:This device is provided with a photodetector 7, which is placed on the lead 1 having a positioning means, a semiconductor laser element 12, which is placed on the photodetector 7 or on the lead 1 in front of it and is provided to emit a main outgoing beam 13, and an insulating frame 21, which is formed around the lead 1. And, the insulating 21 has an inclined external wall 22 with a down-grade ahead under the main outgoing beam of the semiconductor laser element 12.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はノイズを発生しない半導
体レーザ装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor laser device which does not generate noise.

【0002】[0002]

【従来の技術】近年、半導体レーザ装置の改良が数多く
なされているが、その中で例えば本出願人が特願平4−
138696号にて出願した半導体レーザ装置を図4に
示す。この図に於て、リード31上に受光素子32が載
置され、その上に半導体レーザ素子33が載置されてい
る。半導体レーザ素子33の後面と受光素子32のP型
拡散領域34を透光性樹脂35が覆っている。他のリー
ド36がリード31と離れて設けられている。半導体レ
ーザ素子33と他のリード36との間に、金属細線37
が配線されている。絶縁枠38がリード31と他のリー
ド36を一体的に保持する様に設けられている。この半
導体レーザ装置が支持具39に固定され、その上に光学
部品40が固定されている。
2. Description of the Related Art In recent years, many improvements have been made to semiconductor laser devices.
A semiconductor laser device filed in No. 138696 is shown in FIG. In this figure, the light receiving element 32 is mounted on the lead 31, and the semiconductor laser element 33 is mounted thereon. A transparent resin 35 covers the rear surface of the semiconductor laser element 33 and the P-type diffusion region 34 of the light receiving element 32. The other lead 36 is provided separately from the lead 31. A thin metal wire 37 is provided between the semiconductor laser element 33 and the other lead 36.
Is wired. An insulating frame 38 is provided so as to integrally hold the lead 31 and the other lead 36. This semiconductor laser device is fixed to a support 39, and an optical component 40 is fixed thereon.

【0003】[0003]

【発明が解決しようとする課題】しかして上述の半導体
レーザ装置に於ては、主出射光41が回折格子等からな
る光学部品40へ進入した後、1部は光学部品40で反
射され戻り光42となって再び半導体レーザ素子33へ
帰る。そして戻り光42は半導体レーザ素子33の端面
で反射され再び光学部品40へ進入し、主出射光41の
邪魔をするのでノイズを発生させる。故に、本発明はか
かる従来の欠点に鑑みてなされたものであり、戻り光が
光学部品へ進入する事を防止する事によりノイズを発生
しない半導体レーザ装置を提供するものである。
In the above-described semiconductor laser device, however, after the main emission light 41 enters the optical component 40 composed of a diffraction grating or the like, a part thereof is reflected by the optical component 40 and returns light. It becomes 42 and returns to the semiconductor laser element 33 again. Then, the return light 42 is reflected by the end surface of the semiconductor laser element 33, enters the optical component 40 again, and interferes with the main emission light 41, so that noise is generated. Therefore, the present invention has been made in view of the above-mentioned conventional drawbacks, and provides a semiconductor laser device which does not generate noise by preventing return light from entering an optical component.

【0004】[0004]

【課題を解決するための手段】本発明は上述の課題を解
決するために、位置決め手段を有するリード上に載置さ
れた受光素子と、受光素子上に又はその前方のリード上
に載置されかつ前方に主出射光を発射する様に設けられ
た半導体レーザ素子と、リードの周辺に形成された絶縁
枠を設ける。そして絶縁枠が半導体レーザ素子の主出射
光の下に於て前方に下り勾配の傾斜した外壁を有する様
に設けるものである。
In order to solve the above-mentioned problems, the present invention mounts a light receiving element mounted on a lead having a positioning means, and a light receiving element mounted on or in front of the light receiving element. Further, a semiconductor laser element provided so as to emit the main emitted light forward and an insulating frame formed around the lead are provided. Then, the insulating frame is provided so as to have an outer wall that is inclined downward in the forward direction under the main emitted light of the semiconductor laser device.

【0005】[0005]

【作用】本発明は上述の様に、半導体レーザ素子の主出
射光の下に於て前方に下り勾配の傾斜した絶縁枠の外壁
を設けている。故に半導体レーザ素子の主出射光が光学
部品で反射され、その戻り光が傾斜した外壁により上方
に反射されるので、光学部品に再進入しない。
According to the present invention, as described above, the outer wall of the insulating frame is provided below the main emitted light of the semiconductor laser element and is inclined forward with a downward slope. Therefore, the main emitted light of the semiconductor laser device is reflected by the optical component, and the return light thereof is reflected upward by the inclined outer wall, so that it does not re-enter the optical component.

【0006】[0006]

【実施例】以下、本発明の第1実施例を図1と図2に従
い説明する。図1は本実施例に係る半導体レーザ装置の
側面断面図であり、図2はその半導体レーザ装置の平面
断面図である。これらの図に於て、リード1は厚みが
0.2乃至1.0mmの銅等の金属材料からなり矩形部
2と切欠部3と端子部4からできている。リード1は端
面5に形成されたV字状溝の様な位置決め手段6を有し
ている。その他に位置決め手段6はU字状溝でも、断面
略コ字状の凹部に形成しても良く、またはV字状、U字
状、断面略コ字状の凸部に形成しても良い。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A first embodiment of the present invention will be described below with reference to FIGS. 1 is a side sectional view of a semiconductor laser device according to this embodiment, and FIG. 2 is a plan sectional view of the semiconductor laser device. In these figures, the lead 1 is made of a metal material such as copper having a thickness of 0.2 to 1.0 mm and is composed of a rectangular portion 2, a notch portion 3 and a terminal portion 4. The lead 1 has a positioning means 6 such as a V-shaped groove formed on the end face 5. In addition, the positioning means 6 may be a U-shaped groove, a concave portion having a substantially U-shaped cross section, or a convex portion having a V-shaped, U-shaped or substantially U-shaped cross section.

【0007】受光素子7は例えばP−I−N構造からな
るシリコン系結晶に表面電極8、9と裏面電極10を設
けられたものである。表面電極9はP型拡散領域からな
る受光面11とオーミック接触して形成されている。受
光素子7は銀ペースト等の導電性接着剤を介してリード
1上に固着されている。
The light-receiving element 7 is, for example, a silicon crystal having a P-I-N structure provided with front electrodes 8 and 9 and a back electrode 10. The surface electrode 9 is formed in ohmic contact with the light receiving surface 11 formed of a P type diffusion region. The light receiving element 7 is fixed onto the lead 1 via a conductive adhesive such as silver paste.

【0008】半導体レーザ素子12は例えば、活性層と
それを挟むクラッド層からなるGaAlAsの発光層か
らできている。半導体レーザ素子12の両端は劈開され
その上に反射膜が形成されている。半導体レーザ素子1
2は前方に主出射光13を発射する様に、受光素子7の
表面電極8上に銀ペースト又は半田を介して固着されて
いる。半導体レーザ素子12は後方にモニター用の副出
射が行われる様に、後面の反射膜の反射率が前面のそれ
よりも高い様に形成されている。上述の様に半導体レー
ザ素子12の光軸中心線14は、受光素子7の受光面1
1より高い位置にある様に設けられている。
The semiconductor laser device 12 is made of, for example, a GaAlAs light emitting layer composed of an active layer and a clad layer sandwiching the active layer. Both ends of the semiconductor laser element 12 are cleaved and a reflective film is formed on the cleaved surface. Semiconductor laser device 1
2 is fixed on the surface electrode 8 of the light receiving element 7 via silver paste or solder so that the main emitted light 13 is emitted forward. The semiconductor laser element 12 is formed so that the reflectance of the reflective film on the rear surface is higher than that on the front surface so that the secondary emission for monitoring is performed rearward. As described above, the optical axis center line 14 of the semiconductor laser element 12 is the light receiving surface 1 of the light receiving element 7.
It is installed so that it is higher than 1.

【0009】他のリード15、16は銅等の金属材料か
らなり、リード1の切欠き部3に位置し、半導体レーザ
素子12の主出射光13の方向と逆に延びている。金属
細線17と他の金属細線18は共に金等からなり、それ
ぞれ半導体レーザ素子12と他のリード15との間、お
よび受光素子7の表面電極9と他のリード16との間を
接続する様に配線されている。他の金属細線19は受光
素子7の表面電極8とリード1との間を接続する様に配
線されている。透光性樹脂20は例えばエポキシ樹脂か
らなり、半導体レーザ素子12の後面近傍から受光素子
7の受光面11を一体に覆う様に形成されている。
The other leads 15 and 16 are made of a metal material such as copper, are located in the notch 3 of the lead 1, and extend in the direction opposite to the direction of the main emission light 13 of the semiconductor laser element 12. The thin metal wire 17 and the other thin metal wire 18 are both made of gold or the like, and are configured to connect the semiconductor laser element 12 and the other lead 15 and the surface electrode 9 of the light receiving element 7 and the other lead 16, respectively. Is wired to. The other thin metal wire 19 is wired so as to connect the surface electrode 8 of the light receiving element 7 and the lead 1. The translucent resin 20 is made of, for example, an epoxy resin, and is formed so as to integrally cover the light receiving surface 11 of the light receiving element 7 from the vicinity of the rear surface of the semiconductor laser element 12.

【0010】絶縁枠21は例えばポリカーボネート樹脂
又はエポキシ樹脂等からなり、半導体レーザ素子12の
主出射光13が発射する付近を露出する様に平面略コ字
状にかつリード1と、他のリード15と16の各表面と
裏面を挟む様にトランスファーモールドによって形成さ
れている。絶縁枠21は半導体レーザ素子12の主出射
光13の下に於て、前方に下り勾配の傾斜した外壁22
を形成されている。半導体レーザ素子12の前方に位置
する絶縁枠21の開口部23は、前方に行く程広がる様
に傾斜した面を有している。半導体レーザ素子12を保
護するために、開口部23はできるだけ小さい方が良
い。また主出射光13は円錐状に放射されるので、円錐
状のビームに当らない様にする必要がある。これらの2
つの条件を満たすために、開口部23は傾斜した面を有
する様に形成されている。
The insulating frame 21 is made of, for example, a polycarbonate resin or an epoxy resin and has a substantially U-shaped plan view so as to expose the vicinity of the main emitted light 13 of the semiconductor laser device 12, and the lead 1 and the other leads 15 are formed. And 16 are formed by transfer molding so as to sandwich the front surface and the back surface. The insulating frame 21 is located below the main emitted light 13 of the semiconductor laser device 12 and has an outer wall 22 inclined forward and downward.
Has been formed. The opening 23 of the insulating frame 21 located in front of the semiconductor laser device 12 has a surface that is inclined so as to expand toward the front. In order to protect the semiconductor laser device 12, the opening 23 is preferably as small as possible. Further, since the main emission light 13 is radiated in a conical shape, it is necessary to prevent it from hitting the conical beam. These two
In order to satisfy one of the two conditions, the opening 23 is formed to have an inclined surface.

【0011】また絶縁枠21の前方の肉厚Aは比較的、
薄く、例えば0.3mmに形成されている。これは半導
体レーザ素子12の出射ビームが開口部23に当らない
様にするため、できるだけ半導体レーザ素子12と光学
部品24を近づけるためである。絶縁枠21の側方の肉
厚Bは比較的、薄く、例えば0.6mmに形成されてい
る。これはできるだけ半導体装置の外形を小さくするた
めである。絶縁枠21の後方の肉厚Cは比較的、厚く、
例えば1.5mmに形成されている。これはリード1と
他のリード15と16を一体的に保持し強度を確保する
ためである。そして、受光素子7の前方に絶縁枠21の
張り出し部Dを形成する事により、取りつけ時や梱包時
に受光素子7と半導体レーザ素子12が損傷される事が
防止される。これらの部品により半導体レーザ装置25
は構成されている。
The front wall thickness A of the insulating frame 21 is relatively
The thickness is thin, for example, 0.3 mm. This is to prevent the emitted beam of the semiconductor laser device 12 from hitting the opening 23, and to bring the semiconductor laser device 12 and the optical component 24 as close as possible. The side wall thickness B of the insulating frame 21 is relatively thin, for example, 0.6 mm. This is to make the outer shape of the semiconductor device as small as possible. The rear wall thickness C of the insulating frame 21 is relatively large,
For example, it is formed to 1.5 mm. This is to secure the strength by integrally holding the lead 1 and the other leads 15 and 16. By forming the protruding portion D of the insulating frame 21 in front of the light receiving element 7, it is possible to prevent the light receiving element 7 and the semiconductor laser element 12 from being damaged during mounting or packaging. With these components, the semiconductor laser device 25
Is configured.

【0012】そして支持具26に形成された凸部又は凹
部とリード1の端面5に形成された位置決め手段6、す
なわち凹部又は凸部をはめ合う様に、半導体レーザ装置
25が支持具26に固定されている。回折格子やハーフ
ミラーや対物レンズ等の光学部品26が半導体レーザ素
子12の主出射光13の方向に設けられている。また光
学部品24は支持具26の開口部27に直接に固定され
ても良い。
Then, the semiconductor laser device 25 is fixed to the support 26 so that the projection or the recess formed on the support 26 and the positioning means 6 formed on the end face 5 of the lead 1, that is, the recess or the projection are fitted to each other. Has been done. Optical components 26 such as a diffraction grating, a half mirror, and an objective lens are provided in the direction of the main emitted light 13 of the semiconductor laser element 12. The optical component 24 may be directly fixed to the opening 27 of the support 26.

【0013】この半導体レーザ装置25に於て、主出射
光13が回折格子等からなる光学部品24へ進入した
後、1部は光学部品24で反射され戻り光28となって
再び半導体レーザ素子12の方向へ帰る。そして主出射
光13の下に於て前方に下り勾配の傾斜した外壁22で
反射された戻り光28は上方に進行する。故に戻り光2
8は再び光学部品24へ進入しない。
In the semiconductor laser device 25, after the main emission light 13 enters the optical component 24 composed of a diffraction grating or the like, a part of the light is reflected by the optical component 24 to become the return light 28 and the semiconductor laser device 12 again. Return in the direction of. The return light 28 reflected by the outer wall 22 having a downward slope below the main emitted light 13 travels upward. Therefore return light 2
8 does not enter the optical component 24 again.

【0014】次に、第1実施例より受光素子の温度上昇
が低くなる第2実施例を図3の断面図に従い説明する。
受光素子7aは例えばP−I−N構造からなるシリコン
系結晶に表面電極9aと裏面電極10aを設けられたも
のである。表面電極9aはP型拡散領域からなる受光面
11aとオーミック接触して形成されている。受光素子
7aは導電性接着剤を介してリード1a上に固着されて
いる。
Next, a second embodiment in which the temperature rise of the light receiving element is lower than that of the first embodiment will be described with reference to the sectional view of FIG.
The light receiving element 7a is, for example, a silicon-based crystal having a P-I-N structure provided with a front surface electrode 9a and a back surface electrode 10a. The surface electrode 9a is formed in ohmic contact with the light receiving surface 11a formed of a P type diffusion region. The light receiving element 7a is fixed on the lead 1a via a conductive adhesive.

【0015】サブマウント29は例えばシリコン等から
なり表面電極8aと裏面電極(図示せず)を設けられた
ものであり、導電性接着剤によりリード1a上に固着さ
れている。半導体レーザ素子12はサブマウント29の
表面電極8aと合金化することにより固定されている。
この様に、半導体レーザ素子12は受光素子7aの前方
のリード1a上にサブマウント29を介して載置され、
その光軸中心線14は受光面11aより高い位置にあり
かつ前方に主出射面を有している。
The submount 29 is made of, for example, silicon and provided with a front surface electrode 8a and a back surface electrode (not shown), and is fixed on the lead 1a with a conductive adhesive. The semiconductor laser device 12 is fixed by being alloyed with the surface electrode 8a of the submount 29.
Thus, the semiconductor laser device 12 is mounted on the lead 1a in front of the light receiving device 7a via the submount 29,
The optical axis center line 14 is at a position higher than the light receiving surface 11a and has a main emission surface in the front.

【0016】透光性樹脂20aは半導体レーザ素子12
の後面近傍から受光面11aまで覆う様に形成されてい
る。図3の番号と図1、図2の番号と同じものは同じ部
品である事を示す。上述の様に、半導体レーザ素子12
と受光素子7aを離してリード1a上に載置するので、
半導体レーザ素子12の温度上昇により受光素子7aの
温度が余り上がらない。故に受光素子7aの受光特性
(受光量に対するモニタ電流値)が安定するのでモニタ
電流も安定する。
The transparent resin 20a is used for the semiconductor laser device 12
It is formed so as to cover from the vicinity of the rear surface to the light receiving surface 11a. The numbers in FIG. 3 and the same numbers in FIGS. 1 and 2 indicate the same parts. As described above, the semiconductor laser device 12
Since the light receiving element 7a and the light receiving element 7a are placed on the lead 1a,
Due to the temperature rise of the semiconductor laser element 12, the temperature of the light receiving element 7a does not rise so much. Therefore, the light receiving characteristic of the light receiving element 7a (the monitor current value with respect to the amount of received light) is stable, and the monitor current is also stable.

【0017】本実施例の半導体レーザ装置では、第1実
施例と同じ様に戻り光28は絶縁枠21aの外壁22a
により上方に反射され、光学部品24へ進入しない。
In the semiconductor laser device of this embodiment, the return light 28 is reflected by the outer wall 22a of the insulating frame 21a as in the first embodiment.
Is reflected upward by the optical axis and does not enter the optical component 24.

【0018】本実施例の他に、リードに凹部を形成しそ
の凹部上に受光素子を載置し、その前方のリード上に直
接に半導体レーザ素子を載置し、光軸中心線が受光面よ
り高い位置にある様に設けても良い。
In addition to the present embodiment, a recess is formed in the lead, a light receiving element is placed on the recess, and the semiconductor laser element is directly placed on the lead in front of it. The center line of the optical axis is the light receiving surface. You may provide so that it may be in a higher position.

【0019】[0019]

【発明の効果】本発明は上述の様に、半導体レーザ素子
の主出射光の下に於て前方に下り勾配の傾斜した絶縁枠
の外壁を設けている。故に主出射光が回折格子等からな
る光学部品へ進入した後、1部は光学部品で反射され戻
り光となって再び半導体レーザ素子の方向へ帰る。そし
て主出射光の下に於て前方に下り勾配の傾斜した外壁で
反射された戻り光は上方に進行する。故に戻り光は再び
光学部品へ進入しない。従って主出射光のみが光学部品
に進入するので、所定の出射光を光学部品に正確に供給
でき、戻り光によるノイズが発生しない。
As described above, according to the present invention, the outer wall of the insulating frame is provided below the main emitted light of the semiconductor laser element and is inclined forward with a downward slope. Therefore, after the main emitted light enters the optical component composed of the diffraction grating and the like, a part of the light is reflected by the optical component to become return light and returns to the semiconductor laser device again. Then, under the main emitted light, the return light reflected by the outer wall that is inclined downward in the forward direction travels upward. Therefore, the returning light does not enter the optical component again. Therefore, since only the main emitted light enters the optical component, a predetermined emitted light can be accurately supplied to the optical component, and noise due to the returning light does not occur.

【0020】本発明は更に、半導体レーザ素子の前方に
位置する絶縁枠の開口部を前方に行くに従って広がる様
に形成する。故に主出射光の円錐状ビームが開口部に当
ることを防止し、開口部を小さくして半導体レーザ素子
を保護することができる。
Further, according to the present invention, the opening of the insulating frame located in front of the semiconductor laser device is formed so as to widen toward the front. Therefore, it is possible to prevent the conical beam of the main emitted light from hitting the opening, and to make the opening small to protect the semiconductor laser device.

【0021】更に、本発明は半導体レーザ装置のリード
に設けられた位置決め手段と支持具の凸部又は凹部をは
め合わす事により、半導体レーザ装置の位置ずれを防止
し、出射ビームと光学部品の関係位置を正確に保持する
ことができる。
Further, according to the present invention, by positioning the positioning means provided on the lead of the semiconductor laser device and the convex portion or the concave portion of the supporting member, the positional deviation of the semiconductor laser device is prevented, and the relationship between the emitted beam and the optical parts. The position can be held accurately.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の第1実施例に係る半導体レーザの側面
断面図である。
FIG. 1 is a side sectional view of a semiconductor laser according to a first embodiment of the present invention.

【図2】本発明の第1実施例に係る半導体レーザの平面
断面図である。
FIG. 2 is a plan sectional view of a semiconductor laser according to a first embodiment of the present invention.

【図3】本発明の第2実施例に係る半導体レーザ装置の
側面断面図である。
FIG. 3 is a side sectional view of a semiconductor laser device according to a second embodiment of the present invention.

【図4】従来の半導体レーザ装置の側面断面図である。FIG. 4 is a side sectional view of a conventional semiconductor laser device.

【符号の説明】[Explanation of symbols]

1、1a リード 6 位置決め手段 7、7a 受光素子 11、11a 受光面 12 半導体レーザ素子 13 主出射光 21、21a 絶縁枠 22、22a 外壁 1, 1a Lead 6 Positioning means 7, 7a Light receiving element 11, 11a Light receiving surface 12 Semiconductor laser element 13 Main emission light 21, 21a Insulating frame 22, 22a Outer wall

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 位置決め手段を有するリード上に載置さ
れた受光素子と、その受光素子上に又はその前方の前記
リード上に載置されかつ前方に主出射光を発射する様に
設けられた半導体レーザ素子と、前記リードの周辺に形
成された絶縁枠とを具備し、その絶縁枠が前記半導体レ
ーザ素子の主出射光の下に於て前方に下り勾配の傾斜し
た外壁を有する事を特徴とする半導体レーザ装置。
1. A light-receiving element mounted on a lead having positioning means, and a light-receiving element mounted on the light-receiving element or on the lead in front of the light-receiving element so as to emit main emission light to the front. A semiconductor laser element and an insulating frame formed around the lead are provided, and the insulating frame has an outer wall that is inclined downward in a forward direction under the main emission light of the semiconductor laser element. Semiconductor laser device.
JP4205327A 1992-05-29 1992-07-31 Semiconductor laser device Expired - Fee Related JP3059831B2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP4205327A JP3059831B2 (en) 1992-07-31 1992-07-31 Semiconductor laser device
US08/216,508 US5367530A (en) 1992-05-29 1994-03-22 Semiconductor laser apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4205327A JP3059831B2 (en) 1992-07-31 1992-07-31 Semiconductor laser device

Publications (2)

Publication Number Publication Date
JPH0653603A true JPH0653603A (en) 1994-02-25
JP3059831B2 JP3059831B2 (en) 2000-07-04

Family

ID=16505097

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4205327A Expired - Fee Related JP3059831B2 (en) 1992-05-29 1992-07-31 Semiconductor laser device

Country Status (1)

Country Link
JP (1) JP3059831B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6885076B2 (en) 2000-07-17 2005-04-26 Sanyo Electric Co., Ltd. Semiconductor laser device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6885076B2 (en) 2000-07-17 2005-04-26 Sanyo Electric Co., Ltd. Semiconductor laser device

Also Published As

Publication number Publication date
JP3059831B2 (en) 2000-07-04

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