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JPH0653597A - Semiconductor laser device - Google Patents

Semiconductor laser device

Info

Publication number
JPH0653597A
JPH0653597A JP4202378A JP20237892A JPH0653597A JP H0653597 A JPH0653597 A JP H0653597A JP 4202378 A JP4202378 A JP 4202378A JP 20237892 A JP20237892 A JP 20237892A JP H0653597 A JPH0653597 A JP H0653597A
Authority
JP
Japan
Prior art keywords
semiconductor laser
lead
light receiving
laser element
receiving element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4202378A
Other languages
Japanese (ja)
Inventor
Yoshio Noisshiki
慶夫 野一色
Hirofumi Yoneyama
裕文 米山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Sanyo Electric Co Ltd
Sanyo Electric Co Ltd
Original Assignee
Tokyo Sanyo Electric Co Ltd
Tottori Sanyo Electric Co Ltd
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Sanyo Electric Co Ltd, Tottori Sanyo Electric Co Ltd, Sanyo Electric Co Ltd filed Critical Tokyo Sanyo Electric Co Ltd
Priority to JP4202378A priority Critical patent/JPH0653597A/en
Publication of JPH0653597A publication Critical patent/JPH0653597A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32245Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors

Landscapes

  • Semiconductor Lasers (AREA)

Abstract

PURPOSE:To secure an appropriate strength of bonding for the implementation of the long life, and at the same time, reduce the variation of the amount of received light by making the height of the leads, to which fine metal wires are connected, substantially equal to that of a semiconductor laser element, and by arranging the leads on the left-or right-side of the center line of the optical axis. CONSTITUTION:In a semiconductor laser device, a light receiving element 7 has surface electrodes 8 and 9 and a reverse side electrode 10, which are made of silicon crystal. These electrodes are fixed on a first lead 1 through a conductive bonding agent. Also, both ends of a semiconductor laser element 12 are cut open, and reflection films are formed on them. This element is fixed by soldering or the like on the surface electrode 8 of the light receiving element 7 so that the main surface of emission is positioned in front. A second lead 13 is provided in such a manner that it extends in the direction opposite to the direction of the main emission of the semiconductor laser element 12. In this case, however, the leading end of the second lead 13 is configured in the form of a crank. The surface of the leading end is substantially at the same height as the surface of the semiconductor laser element 12. Further, the surface is biased to the left or the right with respect to the center line of the optical axis.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は寿命の長いかつ安定した
光出力モニタ電流を確保し易い半導体レーザ装置に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor laser device which has a long life and can easily secure a stable optical output monitor current.

【0002】[0002]

【従来の技術】近年、半導体レーザ装置の改良が数多く
なされているが、その中で例えば本出願人が特願平4−
138696号にて出願した半導体レーザ装置を図6に
示す。この図に於て、第1のリード41上に受光素子4
2が載置され、その上に半導体レーザ素子43が載置さ
れている。半導体レーザ素子43の後面と受光素子42
のP型拡散領域44を透光性樹脂45が覆っている。第
2のリード46が第1のリード41と離れて設けられて
いる。半導体レーザ素子43と第2のリード46との間
に、金属細線47が配線されている。
2. Description of the Related Art In recent years, many improvements have been made to semiconductor laser devices.
A semiconductor laser device filed in Japanese Patent No. 138696 is shown in FIG. In this figure, the light receiving element 4 is placed on the first lead 41.
2 is mounted, and the semiconductor laser element 43 is mounted thereon. The rear surface of the semiconductor laser element 43 and the light receiving element 42
The P type diffusion region 44 is covered with the transparent resin 45. The second lead 46 is provided separately from the first lead 41. A thin metal wire 47 is wired between the semiconductor laser element 43 and the second lead 46.

【0003】[0003]

【発明が解決しようとする課題】しかして上述の半導体
レーザ装置に於ては、半導体レーザ素子43の寿命が短
くなるという第1の欠点がある。本発明者が究明した原
因を説明する。半導体レーザ素子43の位置が第2のリ
ード46の位置よりも高いため、ワイヤボンダーでボン
ディングする場合は通常、ボンダーのストロークが長く
なり圧縮強度が小さくなる第2のリード46の位置でボ
ンダーの圧縮強度が設定されている。そのため第2のリ
ード46では必要かつ十分なボンディング強度が確保さ
れる。しかし、半導体レーザ素子43とのボンディング
では、ボンダーのストロークが短くなるために、半導体
レーザ素子43が過度に圧縮される。故に半導体レーザ
素子43がボンディング時に損傷されるので寿命が短く
なる。
However, the above-mentioned semiconductor laser device has the first drawback that the life of the semiconductor laser element 43 is shortened. The cause that the present inventor has investigated will be described. Since the position of the semiconductor laser element 43 is higher than the position of the second lead 46, when bonding with a wire bonder, the bonder is normally compressed at the position of the second lead 46 where the stroke of the bonder becomes long and the compression strength becomes small. The strength is set. Therefore, the second lead 46 secures a necessary and sufficient bonding strength. However, in the bonding with the semiconductor laser element 43, the stroke of the bonder is shortened, so that the semiconductor laser element 43 is excessively compressed. Therefore, the semiconductor laser element 43 is damaged at the time of bonding and the life is shortened.

【0004】そして本装置の第2の欠点は第2のリード
46が光軸中心線48の真下に位置しているため、半導
体レーザ素子43の後面からの副出射光が金属細線47
に干渉し1部、P型拡散領域44に入るので、受光量が
ばらつく事である。従って、本発明はかかる従来の欠点
に鑑みてなされたものであり、適正なボンディング強度
を確保して寿命の長い、かつ副出射光による受光量のば
らつきの少ない半導体レーザ装置を提供するものであ
る。
The second drawback of this device is that since the second lead 46 is located directly below the optical axis center line 48, the sub-emitted light from the rear surface of the semiconductor laser device 43 is a thin metal wire 47.
Since the light enters the P-type diffusion region 44 in part, the amount of received light varies. Therefore, the present invention has been made in view of the above-mentioned conventional drawbacks, and provides a semiconductor laser device that secures an appropriate bonding strength, has a long life, and has a small variation in the amount of light received by the sub-emitted light. .

【0005】[0005]

【課題を解決するための手段】本発明は上述の課題を解
決するために、位置決め手段を有する第1のリード上に
載置された受光素子と、受光素子上に又はその前方の第
1のリード上に載置されかつ受光素子の受光面より高い
位置にある光軸中心線を有しかつ前方に主出射面を有す
る半導体レーザ素子を設ける。半導体レーザ素子の後面
近傍から受光素子の表面に形成された受光面までを覆う
透光性樹脂と、第1のリードと離れて配置された第2の
リードを設ける。第1、第2のリードの周辺に形成され
た絶縁枠と、半導体レーザ素子と第2のリードを接続す
る金属細線を設ける。そして金属細線が接続される第2
のリードの高さと半導体レーザ素子の高さを略同じに設
けかつ第2のリードを光軸中心線に対して左又は右に配
置するものである。
In order to solve the above-mentioned problems, the present invention provides a light-receiving element mounted on a first lead having a positioning means, and a first light-receiving element on or in front of the light-receiving element. Provided is a semiconductor laser element which is mounted on a lead and which has an optical axis center line located at a position higher than the light receiving surface of the light receiving element and has a main emitting surface in the front. A transparent resin that covers the vicinity of the rear surface of the semiconductor laser element to the light receiving surface formed on the surface of the light receiving element, and a second lead that is arranged apart from the first lead are provided. An insulating frame formed around the first and second leads and a thin metal wire that connects the semiconductor laser element and the second lead are provided. And the second metal wire is connected
The height of the lead and the height of the semiconductor laser element are set to be substantially the same, and the second lead is arranged left or right with respect to the center line of the optical axis.

【0006】[0006]

【作用】本発明は上述の様に、半導体レーザ素子の位置
と第2のリードの位置を略同じ高さに設けることによ
り、ワイヤボンダーでボンディングする場合、この2個
所に於けるボンダーのストロークが略同じになる。故
に、第2のリードと半導体レーザ素子のそれぞれに於け
るボンディングの圧縮強度を略同じくかつ適正な値に設
定することができる。更に本発明は光軸中心線を受光面
より高い位置に設けているので、副出射光が十分に受光
面に入る。そして第2のリードを光軸中心線に対して左
又は右に配置する事により、金属細線や第2のリードの
端面で反射された副出射光が受光面に入る事を防止でき
る。
According to the present invention, as described above, when the position of the semiconductor laser element and the position of the second lead are provided at substantially the same height, when bonding with a wire bonder, the strokes of the bonder at these two positions are It will be almost the same. Therefore, it is possible to set the compressive strength of bonding in each of the second lead and the semiconductor laser element to substantially the same and appropriate values. Further, according to the present invention, since the center line of the optical axis is provided at a position higher than the light receiving surface, the sub-emitted light sufficiently enters the light receiving surface. By arranging the second lead left or right with respect to the center line of the optical axis, it is possible to prevent the sub-emission light reflected by the metal thin wire or the end face of the second lead from entering the light receiving surface.

【0007】[0007]

【実施例】以下、本発明の第1実施例を図1と図2に従
い説明する。図1は本実施例に係る半導体レーザ装置の
側面断面図であり、図2はその半導体レーザ装置の平面
断面図である。これらの図に於て、第1のリード1は厚
みが0.2乃至1.0mmの銅等の金属材料からなり矩
形部2と切欠部3と端子部4からできている。第1のリ
ード1は端面5に形成されたV字状溝の様な位置決め手
段6を有している。その他に位置決め手段6はU字状溝
でも、断面略コ字状の凹部に形成しても良く又はV字
状、U字状、断面略コ字状の凸部に形成しても良い。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A first embodiment of the present invention will be described below with reference to FIGS. 1 is a side sectional view of a semiconductor laser device according to this embodiment, and FIG. 2 is a plan sectional view of the semiconductor laser device. In these figures, the first lead 1 is made of a metal material such as copper having a thickness of 0.2 to 1.0 mm and is composed of a rectangular portion 2, a notch portion 3 and a terminal portion 4. The first lead 1 has a positioning means 6 such as a V-shaped groove formed on the end face 5. In addition, the positioning means 6 may be a U-shaped groove, a concave portion having a substantially U-shaped cross section, or a convex portion having a V-shaped, U-shaped or substantially U-shaped cross section.

【0008】受光素子7は例えばP−I−N構造からな
るシリコン系結晶に表面電極8、9と裏面電極10を設
けられたものである。表面電極9はP型拡散領域からな
る受光面11とオーミック接触して形成されている。受
光素子7は銀ペースト等の導電性接着剤を介して第1の
リード1上に固着されている。
The light-receiving element 7 is, for example, a silicon crystal having a P-I-N structure provided with front electrodes 8 and 9 and a back electrode 10. The surface electrode 9 is formed in ohmic contact with the light receiving surface 11 formed of a P type diffusion region. The light receiving element 7 is fixed on the first lead 1 via a conductive adhesive such as silver paste.

【0009】半導体レーザ素子12は例えば、活性層と
それを挟むクラッド層からなるGaAlAsの発光層か
らできている。半導体レーザ素子12の両端は劈開され
その上に反射膜が形成されている。半導体レーザ素子1
2は前方に主出射面が位置する様に、受光素子7の表面
電極8上に銀ペースト又は半田を介して固着されてい
る。半導体レーザ素子12は後方にモニター用の副出射
が行われる様に、後面の反射膜の反射率が前面のそれよ
りも高い様に形成されている。半導体レーザ素子12の
光軸中心線12aは受光素子7の受光面11より高い位
置にある様に設けられている。
The semiconductor laser device 12 is made of, for example, a GaAlAs light emitting layer including an active layer and a clad layer sandwiching the active layer. Both ends of the semiconductor laser element 12 are cleaved and a reflective film is formed on the cleaved surface. Semiconductor laser device 1
Reference numeral 2 is fixed on the surface electrode 8 of the light receiving element 7 via silver paste or solder so that the main emission surface is located in front. The semiconductor laser element 12 is formed so that the reflectance of the reflective film on the rear surface is higher than that on the front surface so that the secondary emission for monitoring is performed rearward. The optical axis center line 12a of the semiconductor laser element 12 is provided at a position higher than the light receiving surface 11 of the light receiving element 7.

【0010】第2、第3のリード13、14は銅等の金
属材料からなり、第1のリード1の切欠き部3に位置
し、半導体レーザ素子12の主出射方向と逆に延びてい
る。第2、第3のリード13、14は光軸中心線12a
に対して、それぞれ右と左に振り分けられて配置されて
いる。また必要に応じて、第2、第3のリード13、1
4はそれぞれ左と右に配置されても良い。第2のリード
13はプレス加工により先端をクランク状に形成され、
その先端の表面は半導体レーザ素子12の表面と略同じ
高さになる様な位置にある。
The second and third leads 13 and 14 are made of a metal material such as copper, are located in the notch 3 of the first lead 1, and extend in the direction opposite to the main emission direction of the semiconductor laser device 12. . The second and third leads 13 and 14 are the optical axis center line 12a.
On the other hand, they are arranged so as to be divided into right and left respectively. Also, if necessary, the second and third leads 13, 1
4 may be arranged on the left and right respectively. The second lead 13 is formed into a crank shape by pressing,
The surface of the tip is positioned so as to be substantially the same height as the surface of the semiconductor laser device 12.

【0011】金属細線15と他の金属細線16は共に金
等からなり、それぞれ半導体レーザ素子12と第2のリ
ード13との間、および受光素子7の表面電極9と第3
のリード14との間を接続する様に配線されている。金
属細線15と他の金属細線16は光軸中心線12aに対
して、右と左に振り分けられている。他の金属細線17
は受光素子7の表面電極8と第1のリード1との間を接
続する様に配線されている。
The thin metal wires 15 and the other thin metal wires 16 are both made of gold or the like, and are respectively between the semiconductor laser element 12 and the second lead 13 and between the surface electrode 9 and the third electrode of the light receiving element 7.
It is wired so as to connect to the lead 14 of the. The thin metal wires 15 and the other thin metal wires 16 are distributed to the right and left with respect to the optical axis center line 12a. Other thin metal wires 17
Are wired so as to connect between the surface electrode 8 of the light receiving element 7 and the first lead 1.

【0012】透光性樹脂18は例えばエポキシ樹脂から
なり、半導体レーザ素子12の後面近傍から受光素子7
の受光面11を一体に覆う様に形成されている。絶縁枠
19は例えばポリカーボネート樹脂又はエポキシ樹脂等
からなり、半導体レーザ素子12の出射面を露出する様
に平面略コ字状に、かつ第1、第2、第3のリード1と
13と14の各表面と裏面を挟む様にトランスファーモ
ールドによって形成されている。絶縁枠19は第2のリ
ード13のクランク状の先端の下にも位置する様に形成
されている。これはワイヤボンディング時に第2のリー
ド13の基台となって、第2のリード13が変形するの
を防止するためである。これらの部品により半導体レー
ザ装置20は構成されている。
The transparent resin 18 is made of, for example, an epoxy resin, and the light receiving element 7 is provided from the vicinity of the rear surface of the semiconductor laser element 12.
Is formed so as to integrally cover the light receiving surface 11 of. The insulating frame 19 is made of, for example, a polycarbonate resin or an epoxy resin and has a substantially U-shaped plan view so as to expose the emission surface of the semiconductor laser element 12, and the first, second and third leads 1, 13 and 14 are formed. It is formed by transfer molding so as to sandwich each front surface and back surface. The insulating frame 19 is also formed below the crank-shaped tip of the second lead 13. This is to prevent the second lead 13 from deforming as a base of the second lead 13 during wire bonding. The semiconductor laser device 20 is composed of these components.

【0013】そして支持具21に形成された凸部又は凹
部と第1のリード1の端面5に形成された位置決め手段
6、すなわち凹部又は凸部をはめ合う様に、半導体レー
ザ装置20が支持具21に固定されている。回折格子や
ハーフミラーや対物レンズ等の光学部品22が半導体レ
ーザ素子12の主出射方向に設けられている。
Then, the semiconductor laser device 20 supports the semiconductor laser device 20 so that the convex portion or the concave portion formed on the support 21 and the positioning means 6 formed on the end surface 5 of the first lead 1, that is, the concave portion or the convex portion are fitted to each other. It is fixed at 21. Optical components 22 such as a diffraction grating, a half mirror, and an objective lens are provided in the main emission direction of the semiconductor laser device 12.

【0014】次に本発明の第2実施例を図3の断面図に
従い説明する。第1のリード23はプレス加工により、
部分的にクランク状に形成され、その上に受光素子7が
固着されている。受光素子7上に半導体レーザ素子12
が固着されている。第2のリード24はその表面が半導
体レーザ素子12の表面と略同じ高さとなる位置にあ
り、平板の形状をしている。金属細線25が半導体レー
ザ素子12と第2のリード24を接続する様に配線され
ている。絶縁枠26が第1、第2のリード23と24を
一体的に覆う様に設けられている。図3の番号と図1、
図2の番号と同じものは同一部品である事を示す。上述
の様に第1実施例では、第2のリードの先端が部分的に
位置を上げた形状にされているが、第2実施例では、第
1のリードが部分的に位置を下げた形状にされている。
Next, a second embodiment of the present invention will be described with reference to the sectional view of FIG. The first lead 23 is pressed,
It is partially formed in a crank shape, and the light receiving element 7 is fixed thereon. A semiconductor laser element 12 is provided on the light receiving element 7.
Is stuck. The surface of the second lead 24 is substantially flush with the surface of the semiconductor laser device 12, and has a flat plate shape. A thin metal wire 25 is wired so as to connect the semiconductor laser device 12 and the second lead 24. An insulating frame 26 is provided so as to integrally cover the first and second leads 23 and 24. The numbers in FIG. 3 and FIG.
The same parts as those in FIG. 2 indicate the same parts. As described above, in the first embodiment, the tips of the second leads are partially raised, but in the second embodiment, the first leads are partially lowered. Has been

【0015】次に本発明の第3実施例を図4の断面図に
従い説明する。第1のリード1は平板状に形成され、そ
の上に順次、受光素子7と半導体レーザ素子12が載置
されている。平板状の第2のリード27が第1のリード
1と略同一な高さに配置されている。サブマウント28
はボロン等を添加されたシリコンならなり、第2のリー
ド27上に固着されている。そしてサブマウント28の
表面は半導体レーザ素子12の表面と略同じ高さにある
様に設けられている。金属細線29がサブマウント28
の表面と半導体レーザ素子12の表面を接続する様に配
線されている。絶縁枠30が第1、第2のリード1と2
7を一体的に覆う様に設けられている。本実施例の半導
体レーザ装置は第1、第2実施例の半導体レーザ装置の
様にリードに段差を設けるプレス加工が不必要だが、サ
ブマウントを載置する必要がありコスト的には高くな
る。
Next, a third embodiment of the present invention will be described with reference to the sectional view of FIG. The first lead 1 is formed in a flat plate shape, and the light receiving element 7 and the semiconductor laser element 12 are sequentially mounted thereon. The flat plate-shaped second lead 27 is arranged at substantially the same height as the first lead 1. Submount 28
Is made of silicon to which boron or the like is added, and is fixed on the second lead 27. The surface of the submount 28 is provided so as to be substantially at the same height as the surface of the semiconductor laser device 12. Metal wire 29 is submount 28
The surface of the semiconductor laser device 12 and the surface of the semiconductor laser device 12 are connected to each other. The insulating frame 30 has the first and second leads 1 and 2.
It is provided so as to cover 7 integrally. Unlike the semiconductor laser devices of the first and second embodiments, the semiconductor laser device of the present embodiment does not require press work for forming a step on the lead, but it requires a submount to be mounted, which increases the cost.

【0016】更に本発明の第4実施例を図5の断面図に
従い説明する。受光素子31は例えばP−I−N構造か
らなるシリコン系結晶に表面電極32と裏面電極33を
設けられたものである。表面電極32はP型拡散領域か
らなる受光面34とオーミック接触して形成されてい
る。受光素子31は導電性接着剤を介して第1のリード
1上に固着されている。
A fourth embodiment of the present invention will be described with reference to the sectional view of FIG. The light receiving element 31 is, for example, a silicon crystal having a P-I-N structure provided with a front electrode 32 and a back electrode 33. The surface electrode 32 is formed in ohmic contact with the light receiving surface 34 formed of a P type diffusion region. The light receiving element 31 is fixed onto the first lead 1 via a conductive adhesive.

【0017】サブマウント35はシリコン等からなり表
面電極36と裏面電極(図示せず)を設けられたもので
あり、導電性接着剤により第1のリード1上に固着され
ている。半導体レーザ素子12はサブマウント35の表
面電極36と合金化することにより固定されている。こ
の様に、半導体レーザ素子12は受光素子31の前方の
第1のリード1上にサブマウント35を介して載置さ
れ、その光軸中心線12aは受光面34より高い位置に
ありかつ前方に主出射面を有している。
The submount 35 is made of silicon or the like and provided with a front surface electrode 36 and a back surface electrode (not shown), and is fixed on the first lead 1 by a conductive adhesive. The semiconductor laser device 12 is fixed by being alloyed with the surface electrode 36 of the submount 35. In this way, the semiconductor laser element 12 is mounted on the first lead 1 in front of the light receiving element 31 via the submount 35, and the optical axis center line 12 a thereof is located higher than the light receiving surface 34 and in front of the light receiving surface 34. It has a main exit surface.

【0018】透光性樹脂37は半導体レーザ素子12の
後面近傍から受光面34まで覆う様に形成されている。
上述の様に、半導体レーザ素子12と受光素子31を離
して第1のリード1上に載置するので、半導体レーザ素
子12の温度上昇により受光素子31の温度が余り上が
らない。故に受光素子31の受光特性(受光量に対する
モニタ電流値)が安定するのでモニタ電流も安定する。
The transparent resin 37 is formed so as to cover the vicinity of the rear surface of the semiconductor laser element 12 to the light receiving surface 34.
As described above, since the semiconductor laser device 12 and the light receiving device 31 are placed on the first lead 1 while being separated from each other, the temperature of the semiconductor laser device 12 does not rise so much. Therefore, the light receiving characteristic of the light receiving element 31 (the monitor current value with respect to the amount of received light) is stable, and the monitor current is also stable.

【0019】本実施例の他に、リードに凹部を形成しそ
の凹部上に受光素子を載置し、その前方の第1のリード
上に直接に半導体レーザ素子を載置し、光軸中心線が受
光面より高い位置にある様に設けても良い。
In addition to the present embodiment, a recess is formed in the lead, the light receiving element is placed on the recess, and the semiconductor laser element is placed directly on the first lead in front of the recess. May be provided at a position higher than the light receiving surface.

【0020】[0020]

【発明の効果】本発明は上述の様に、光軸中心線を受光
面より高い位置に設け、そして半導体レーザ素子の後面
から受光面まで透光性樹脂で覆う事により、受光面への
受光量を十分に確保できる。
According to the present invention, as described above, the center line of the optical axis is provided at a position higher than the light receiving surface, and the light receiving surface is covered with the transparent resin from the rear surface of the semiconductor laser element to the light receiving surface. A sufficient amount can be secured.

【0021】本発明は更に、半導体レーザ素子の位置と
第2のリードの配線位置を略同じ高さに設けることによ
り、ワイヤーボンダーでボンディングする場合、この2
個所に於けるボンダーのストロークを略同じにすること
ができる。故に、この第2のリードと半導体レーザ素子
のそれぞれに於けるボンディングの圧縮強度を略同じく
かつ適正な値に設定することができる。従って、第2の
リードおよび半導体レーザ素子へのボンディング強度を
必要かつ十分に確保できるので、第2のリードおよび半
導体レーザ素子に於て、金属細線が外れる恐れがない。
そして、表面近くに損傷し易い活性層を有する半導体レ
ーザ素子に対して従来の様に過度な圧縮強度が加わらな
いので、半導体レーザ素子は損傷されないから寿命が長
くなる。
Further, according to the present invention, when bonding is performed by a wire bonder by arranging the position of the semiconductor laser element and the wiring position of the second lead at substantially the same height,
The stroke of the bonder at each point can be made approximately the same. Therefore, it is possible to set the compressive strength of bonding in each of the second lead and the semiconductor laser element to substantially the same value and to an appropriate value. Therefore, the bonding strength to the second lead and the semiconductor laser element can be ensured as necessary and sufficient, so that there is no fear that the thin metal wire will come off in the second lead and the semiconductor laser element.
Further, unlike the conventional case, excessive compressive strength is not applied to the semiconductor laser device having the active layer which is easily damaged near the surface, so that the semiconductor laser device is not damaged and the life is extended.

【0022】そして本発明は第2のリードを光軸中心線
に対して左又は右に配置する事により、透光性樹脂を貫
いて進行する副出射光が金属細線や第2のリードの端部
で反射される事がないので、その反射光が再び透光性樹
脂を貫いて受光面に入る事がない。故に受光面への受光
量が安定し、受光素子による安定したモニタ電流が得ら
れるので、半導体レーザ素子の出力制御が正確となる。
According to the present invention, the second lead is arranged to the left or right of the center line of the optical axis so that the sub-emitted light that propagates through the light-transmissive resin is thin metal wire or the end of the second lead. Since it is not reflected by the part, the reflected light does not penetrate the translucent resin again and enter the light receiving surface. Therefore, the amount of light received on the light receiving surface is stable and a stable monitor current can be obtained by the light receiving element, so that the output control of the semiconductor laser element becomes accurate.

【0023】更に、本発明は半導体レーザ装置の第1の
リードに設けられた位置決め手段と支持具の凸部又は凹
部をはめ合わす事により、半導体レーザ装置の位置ずれ
を防止し出射ビームと光学部品の関係位置を正確に保持
することができる。
Further, according to the present invention, by positioning the positioning means provided on the first lead of the semiconductor laser device and the convex portion or the concave portion of the supporting member, the positional deviation of the semiconductor laser device can be prevented, and the emitted beam and the optical component can be prevented. The relative position of can be held accurately.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の第1実施例に係る半導体レーザの側面
断面図である。
FIG. 1 is a side sectional view of a semiconductor laser according to a first embodiment of the present invention.

【図2】本発明の第1実施例に係る半導体レーザの平面
断面図である。
FIG. 2 is a plan sectional view of a semiconductor laser according to a first embodiment of the present invention.

【図3】本発明の第2実施例に係る半導体レーザの側面
断面図である。
FIG. 3 is a side sectional view of a semiconductor laser according to a second embodiment of the present invention.

【図4】本発明の第3実施例に係る半導体レーザの側面
断面図である。
FIG. 4 is a side sectional view of a semiconductor laser according to a third embodiment of the present invention.

【図5】本発明の第4実施例に係る半導体レーザの側面
断面図である。
FIG. 5 is a side sectional view of a semiconductor laser according to a fourth embodiment of the present invention.

【図6】従来の半導体レーザ装置の側面断面図である。FIG. 6 is a side sectional view of a conventional semiconductor laser device.

【符号の説明】[Explanation of symbols]

1、23 第1のリード 6 位置決め手段 7、31 受光素子 11、34 受光面 12 半導体レーザ素子 12a 光軸中心線 13、24、27 第2のリード 15、25、29 金属細線 18、37 透光性樹脂 19、26、30 絶縁枠 1, 23 First lead 6 Positioning means 7, 31 Light receiving element 11, 34 Light receiving surface 12 Semiconductor laser element 12a Optical axis center line 13, 24, 27 Second lead 15, 25, 29 Thin metal wire 18, 37 Light transmission Resin 19, 26, 30 Insulation frame

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 位置決め手段を有する第1のリード上に
載置された受光素子と、その受光素子上に又はその前方
の前記第1のリード上に載置されかつ前記受光素子の受
光面より高い位置にある光軸中心線を有しかつ前方に主
出射面を有する半導体レーザ素子と、その半導体レーザ
素子の後面近傍から前記受光素子の表面に形成された受
光面までを覆う透光性樹脂と、前記第1のリードと離れ
て配置された第2のリードと、前記第1、第2のリード
の周辺に形成された絶縁枠と、前記半導体レーザ素子と
前記第2のリードを接続する金属細線とを具備し、前記
金属細線が接続される前記第2のリードの高さと前記半
導体レーザ素子の高さが略同じであり、かつ前記第2の
リードが前記光軸中心線に対して左又は右に配置されて
いる事を特徴とする半導体レーザ装置。
1. A light receiving element mounted on a first lead having a positioning means, and a light receiving surface of the light receiving element mounted on the light receiving element or on the first lead in front of the light receiving element. A semiconductor laser element having an optical axis center line at a high position and having a main emission surface in the front, and a translucent resin covering from the vicinity of the rear surface of the semiconductor laser element to the light receiving surface formed on the surface of the light receiving element. A second lead arranged apart from the first lead, an insulating frame formed around the first and second leads, the semiconductor laser device and the second lead are connected to each other. A height of the second lead to which the metal thin wire is connected and a height of the semiconductor laser element are substantially the same, and the second lead is located with respect to the optical axis center line. Characterized by being placed on the left or right Semiconductor laser device.
JP4202378A 1992-07-29 1992-07-29 Semiconductor laser device Pending JPH0653597A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4202378A JPH0653597A (en) 1992-07-29 1992-07-29 Semiconductor laser device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4202378A JPH0653597A (en) 1992-07-29 1992-07-29 Semiconductor laser device

Publications (1)

Publication Number Publication Date
JPH0653597A true JPH0653597A (en) 1994-02-25

Family

ID=16456509

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4202378A Pending JPH0653597A (en) 1992-07-29 1992-07-29 Semiconductor laser device

Country Status (1)

Country Link
JP (1) JPH0653597A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006237285A (en) * 2005-02-25 2006-09-07 Rohm Co Ltd Semiconductor light emitting device
US7729402B2 (en) 2002-10-29 2010-06-01 Sharp Kabushiki Kaisha Semiconductor laser assembly

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7729402B2 (en) 2002-10-29 2010-06-01 Sharp Kabushiki Kaisha Semiconductor laser assembly
JP2006237285A (en) * 2005-02-25 2006-09-07 Rohm Co Ltd Semiconductor light emitting device

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