JPH0649491A - Solvent composition used for deterging - Google Patents

Abstract

PURPOSE:To provide a solvent composition comprising a specific hydrofluorocarbon, never affecting the ozone layer, excellent in its detergency for fats, oils, fluxes, etc., and useful for IC-composing parts, etc. CONSTITUTION:The solvent composition comprises (A) a hydrofluorocarbon of the formula (R1 is CnHmF2n+1-m; when n is 1, 2<=m<=3, when n is 2-4, 0<=m<=5; R is H, F, CaHbF2a+1-b; when a is 1, 0<=b<=3; when a is 2-3, 0<=b<=5; but n+a is 2-4, m+b is 0-5), such as 1,1,1,2,2,3,4-heptafluorobutane preferably in an amount of >=70wt.%, (B) one kind or more of surfactants such as a nonionic surfactant preferably in an amount of 0.001-10wt.%, and (C) an organic solvent such as a hydrocarbon preferably in an amount of <=30wt.%.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a solvent composition used for cleaning, and more particularly to a cleaning composition suitable for removing fluxes, oils and fats, etc. adhering to IC components, precision machine components, etc. It relates to a solvent composition to be used.

[0002]

2. Description of the Related Art Conventionally, in the manufacture of IC components and precision mechanical components, cleaning with an organic solvent has been performed in order to remove the flux, dust and the like adhering to the components during assembly. For such washing, 1,1,2-trichloro-1,2,2-trifluoroethane (R113) has been widely used as an organic solvent. R113 is nonflammable, has little toxicity, and is excellent in stability. Further, R113 has an excellent feature that it selectively dissolves only dirt without damaging the base material such as metal, plastic, and elastomer. A printed circuit board that is cleaned by removing flux is a good example of a product made of a base material such as metal, plastic, or elastomer. From this point as well, R113 is useful.

However, since R113 may cause the destruction of the ozone layer in the stratosphere, its use has been restricted.

[0004]

SUMMARY OF THE INVENTION An object of the present invention is to provide a cleaning solvent composition which does not destroy the ozone layer and has the ability to effectively clean flux, oil and the like.

A further object of the present invention is to provide a cleaning solvent composition having a characteristic of selectively dissolving only dirt without damaging a substrate such as metal, plastic or elastomer.

[0006]

Means for Solving the Problems As a result of extensive research and search for achieving the above-mentioned objects, the present inventors have obtained the following new findings. That is, some hydrofluorocarbons (1) do not destroy the ozone layer because they do not contain chlorine in the molecule; (2) their ability to clean flux, oils, dust, etc. is remarkable; and (3) like R113. In addition, it has a characteristic that it selectively dissolves only dirt without damaging the base material such as metal, plastic, and elastomer. The present invention has been completed based on these new findings.

According to the present invention, R1 --CHR2 --CH2 F (wherein R1 is Cn Hm F2n + 1-m, and when n = 1, 0≤
m ≦ 3, and 0 ≦ m ≦ 5 when 2 ≦ n ≦ 4. R
2 is H, F, or Ca Hb F2a + 1-b, and a = 1
When 0 ≦ b ≦ 3, and when 2 ≦ a ≦ 3, 0 ≦ b ≦ 5
Is. However, 2 ≦ n + a ≦ 4 and 0 ≦ m + b ≦
It is 5. ) Hydrofluorocarbon (A)
And a solvent composition for use in cleaning.

The solvent composition used for cleaning of the present invention comprises the above-mentioned hydrofluorocarbon (A), but such a compound has never been used as a cleaning agent for removing flux, fats and oils.

An example of the hydrofluorocarbon (A) (hereinafter referred to as a specific HFC) in the present invention is C
4 H3 F7, C4 H4 F6, C4 H5 F5, C4 H6 F
4, C4 H7 F3, C4 H8 F2, C5 H3 F9, C5
H4 F8, C5 H5 F7, C5 H6 F6, C5 H7 F5
, C5 H8 F4, C6 H3 F11, C6 H4 F10, C6 H
5 F9, C6 H6 F8, C6 H7 F7, or C6 H8
Examples thereof include compounds represented by F6.

As a preferred example of the specific HFC, 1,
1,1,2,2,3,4-heptafluorobutane, 1,
1,1,3,3,3-hexafluoro-2- (fluoromethyl) propane, 1,1,1,3,3-pentafluoro-2- (fluoromethyl) propane, 1,1,2,
2,3,4-hexafluorobutane, 1,1,1,2,
3,4-hexafluorobutane, 1,2,2,3,4-
Pentafluorobutane, 1,1,3,3-tetrafluoro-2- (fluoromethyl) propane, 1,1,2,
3,4-pentafluorobutane, 1,1,1,2,2
3,3,4,5-nonafluoropentane or 1,2,
3,3,4,5-hexafluoropentane and the like can be mentioned.

The specific HFCs can be used alone or in combination of two or more.

The solvent composition used for cleaning in the present invention may contain at least one surfactant.

The surfactant is not particularly limited, but a nonionic surfactant is preferred. Examples of nonionic surfactants include alkyl and alkylallyl polyoxyethylene ethers, alkylallyl formaldehyde condensed polyoxyethylene ethers, glycerin ethers and polyoxyethylene ethers thereof,
Block polymer having polyoxypropylene as lipophilic group, ether type such as alkylthiopolyoxyethylene ether, propylene glycol ester polyoxyethylene ether, glycerin ester polyoxyethylene ether, sorbitan ester polyoxyethylene ether and other ether ester Examples thereof include ester type such as polyoxyethylene fatty acid ester, glycerin ester, and sorbitan ester, nitrogen-containing type such as fatty acid alkanolamide, polyoxyethylene fatty acid amide, and the like.

The solvent composition used for cleaning in the present invention includes hydrocarbons, alcohols, ethers, esters, ketones, halocarbons or hydrochlorofluorocarbons for increasing the solubility of oils and fats and fluxes. At least one organic solvent selected from the group can be included.

The hydrocarbons are not particularly limited, but preferably, for example, pentane, 2-methylbutane, 2,2-dimethylpropane, hexane, 2-methylpentane, 3-methylpentane, 2,2-. Dimethylbutane, 2,3-dimethylbutane, heptane, 2-methylhexane, 3-methylhexane, 2,3-dimethylpentane, 2,4-dimethylpentane, octane, 2,2,3
-Trimethylpentane, 2,2,4-trimethylpentane, cyclopentane, methylcyclopentane, cyclohexane, methylcyclohexane, ethylcyclohexane and the like can be mentioned.

The alcohols are not particularly limited, but are preferably chain saturated alcohols having 1 to 5 carbon atoms, such as methanol, ethanol, i-propanol, n-propanol, n-butanol, i. -Butanol, s-butanol, t-butanol and the like can be mentioned.

The ethers are not particularly limited, but preferred examples include diethyl ether, methyl cellosolve, tetrahydrofuran, methyl-t-butyl ether, and 1,4-dioxane.

The esters are not particularly limited, but are preferably esters containing a fatty acid having 1 to 5 carbon atoms and a lower alcohol having 1 to 6 carbon atoms as active ingredients, such as methyl ester. Examples thereof include acetate, ethyl acetate, propyl acetate, isopropyl acetate, butyl acetate, isobutyl acetate, methyl propionate, ethyl propionate, propyl propionate, methyl butyrate, and ethyl butyrate.

The ketones are not particularly limited, but are preferably those represented by R-CO-R ', where R and R'are saturated hydrocarbons each having 1 to 4 carbon atoms. Examples include acetone, methyl ethyl ketone, methyl butyl ketone, and methyl isobutyl ketone.

Halocarbons include dichloromethane, cis-1,2-dichloroethylene, trans-
Examples thereof include 1,2-dichloroethylene, trichloroethylene, perchloroethylene, and 2-bromopropane, but are not limited thereto.

Hydrochlorofluorocarbons include 2,2-dichloro-1,1,1-trifluoroethane, 1,1-dichloro-1-fluoroethane and 3,3-
Dichloro-1,1,1,2,2-pentafluoropropane, 1,3-dichloro-1,1,2,2,3-pentafluoropropane, 1,1-dichloro-1,2,2,3
3-pentafluoropropane, 1,2-dichloro-1,
1,3,3,3-pentafluoropropane, 1,2-dichloro-1,1,2,3,3-pentafluoropropane, 2,3-dichloro-1,1,1,2,3-pentafluoro Propane or 2,2-dichloro-1,1,
Examples thereof include 1,3,3-pentafluoropropane, but are not limited thereto.

The specific HFC content in the solvent composition used for cleaning in the present invention is not particularly limited,
It is usually about 70% by weight or more, preferably about 80% by weight or more.

The content of the surfactant in the solvent composition used for washing is not particularly limited, but is preferably 0.001% by weight to 10% by weight.

The content of the organic solvent in the solvent composition used for washing is not particularly limited, but is usually about 30% by weight or less, preferably about 0.5 to about 10% by weight, more preferably about 1%. Is about 8% by weight. Specific HFC of the present invention
It is more preferable that the mixture of the organic solvent and the organic solvent is an azeotropic composition.

Hydrofluorocarbons other than the specific HFC that do not destroy the ozone layer can be added to the solvent composition used in the cleaning of the present invention. Such hydrofluorocarbons include 1,2-difluoroethane,
1,1,1,2,3-pentafluoropropane, 1,
1,2,2,3-pentafluoropropane, 1,1,
Examples thereof include 1,3-tetrafluoropropane and 1,3-difluoropropane, but are not limited thereto.

The solvent composition used in the cleaning of the present invention may contain the components that have been appropriately added to the solvent compositions conventionally used in this type of cleaning according to the intended use. Examples of such components are auxiliaries and stabilizers of solvent compositions used for cleaning.

Examples of the above components include nitro compounds such as nitromethane, nitroethane, nitropropane and nitrobenzene, amines such as diethylamine, triethylamine, i-propylamine, butylamine and i-butylamine, phenol, o-cresol and m. −
Cresol, p-cresol, thymol, p-t-butylphenol, t-butylcatechol, catechol, isoeugenol, o-methoxyphenol, 4,4'-
Dihydroxyphenyl-2,2-propane, isoamyl salicylate, benzyl salicylate, methyl salicylate,
Phenols such as 2,6-di-t-butyl-p-cresol, 2- (2′-hydroxy-5′-methylphenyl) benzotriazole, 2- (2′-hydroxy-).
Of 3'-t-butyl-5'-methylphenyl) -5-chlorobenzotriazole, 1,2,3-benzotriazole, or 1-[(N, N-bis-2-ethylhexyl) aminomethyl] benzotriazole Examples thereof include triazoles.

Conventional cleaning methods can be applied to the removal of flux, fats and oils, dust, etc. using the solvent composition for cleaning of the present invention. Such cleaning methods include hand-wiping, dipping, spraying, rocking, ultrasonic cleaning, steam cleaning and the like.

[0029]

EXAMPLES In Examples 1-44, SUS-304
Test piece (25 mm × 30 mm × 2 mm) was immersed in a machine oil (CQ-30 manufactured by Nippon Oil Co., Ltd.) and then immersed in the solvent composition used for cleaning of the present invention for 5 minutes to remove the machine oil. It was judged. The results are shown in the following Tables 1 and 2 as ⊚: good removal possible, ∘: almost good, Δ: very small amount remaining, ×: considerably remaining.

In Examples 45 to 88, a glass epoxy printed circuit board (50 mm × 100 mm × 1.6) was used.
mm) The entire surface was coated with flux (Speedy Flux AGF-J-1 manufactured by Asahi Chemical Laboratory) and soldered at a soldering temperature of 260 ° C. using a wave solder machine. Then, it was immersed in the solvent composition used for cleaning of the present invention for 3 minutes for cleaning, and the degree of flux removal was determined.
The results are shown in Tables 3 to 4 as the degree of removal, which are evaluated as ⊚: good removal is possible, ∘: almost good, Δ: trace amount remains, and x: considerably remains.

Specific HFCs used in the following examples include 1,1,1,2,2,3,4-heptafluorobutane (hereinafter referred to as R347), 1,1,1,3, and
3,3-hexafluoro-2- (fluoromethyl) propane, 1,1,1,3,3-pentafluoro-2- (fluoromethyl) propane, 1,1,2,2,3,4-hexafluoro Butane, 1,1,1,2,3,4-hexafluorobutane, 1,2,2,3,4-pentafluorobutane, 1,1,3,3-tetrafluoro-2- (fluoromethyl) propane , 1,1,2,3,4-pentafluorobutane, 1,1,1,2,2,3,3,4,5-
Nonafluoropentane, and 1,2,3,3,4,5
-Selected from the group of hexafluoropentanes.

The organic solvent soluble in the specific HFC used in the following examples is n-pentane (n-Pe).
t), cyclopentane (c-Pet), n-hexane (n-Hex), cyclohexane (c-Hex), n-
Heptane (n-Hep), methanol (MeOH), ethanol (EtOH), n-propanol (n-P)
A), 2-propanol (IPA), acetone (Ace
t), methyl ethyl ketone (MEK), ethyl acetate (EtAc), dichloromethane (DCM), 2,2-
Dichloro-1,1,1-trifluoroethane (R12
3), 1,1-dichloro-1-fluoroethane (R14
1b), 1,3-dichloro-1,1,2,2,3-pentafluoropropane (R225A), and 3,3-dichloro-1,1,1,2,2-pentafluoropropane (R225B). Selected from the group.

As the surfactant used in the following examples, alkyl polyoxyethylene ether (APO
EE), glycerin ester polyethoxyethylene ether (GEPEE), polyoxyethylene fatty acid ester (POEFE), ester of glycerin ether (G
RETES), alkyl polyoxyethylene ether ester (APOEES), sorbitan ester (SO
RES), glycerin ester (GRES), fatty acid alkanolamide (FAAD), and glycerin ether (GRET).

[0034]

[Table 1]

[0035]

[Table 2]

In Examples 1 to 44, R3 having a solvent composition was used.
47 to 1,1,1,3,3,3-hexafluoro-2
-(Fluoromethyl) propane, 1,1,1,3,3-
Pentafluoro-2- (fluoromethyl) propane,
1,1,2,2,3,4-hexafluorobutane, 1,
1,1,2,3,4-hexafluorobutane, 1,2,
2,3,4-pentafluorobutane, 1,1,3,3-
Tetrafluoro-2- (fluoromethyl) propane,
1,1,2,3,4-pentafluorobutane, 1,1,
1,2,2,3,3,4,5-nonafluoropentane,
Alternatively, the same result was obtained when the evaluation was carried out in place of 1,2,3,3,4,5-hexafluoropentane.

[0037]

[Table 3]

[0038]

[Table 4]

In Examples 45 to 88, R of the solvent composition was used.
347 to 1,1,1,3,3,3-hexafluoro-
2- (fluoromethyl) propane, 1,1,1,3,3
-Pentafluoro-2- (fluoromethyl) propane,
1,1,2,2,3,4-hexafluorobutane, 1,
1,1,2,3,4-hexafluorobutane, 1,2,
2,3,4-pentafluorobutane, 1,1,3,3-
Tetrafluoro-2- (fluoromethyl) propane,
1,1,2,3,4-pentafluorobutane, 1,1,
1,2,2,3,3,4,5-nonafluoropentane,
Alternatively, the same result was obtained when the evaluation was carried out in place of 1,2,3,3,4,5-hexafluoropentane.

[0040]

R1 --CHR2 --CH2 in the present invention
F (where R1 is Cn Hm F2n + 1-m, 0≤m≤3 when n = 1, 0≤m≤5 when 2≤n≤4. R2 is H, F , Or Ca Hb F2a + 1-b,
When a = 1, 0 ≦ b ≦ 3, and when 2 ≦ a ≦ 3, 0 ≦
b ≦ 5. However, 2 ≦ n + a ≦ 4 and 0 ≦ m
+ B ≦ 5. The solvent composition used for cleaning composed of the hydrofluorocarbon represented by (4) does not destroy the ozone layer, satisfies the excellent characteristics of the conventional R113, and is effective for stains such as oil and flux. It has the advantage that it can be washed.

─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. ⁵ Identification number Reference number within the agency FI technical display location (C11D 7/60 7:30 7:26) (72) Inventor Keiichi Onishi Kanagawa-ku, Yokohama-shi, Kanagawa 1160 Matsubara, Hazawa-machi, AG Technology Co., Ltd. (72) Inventor Yoko Usami, 1160 Matsubara, Hazawa-machi, Kanagawa-ku, Yokohama, Kanagawa Prefecture

Claims (9)

[Claims] 1. R1 --CHR2 --CH2 F (wherein R1 is Cn Hm F2n + 1-m, 0≤m≤3 when n = 1, and 0≤m when 2≤n≤4). ≦ 5, R2 is H,
F, or Ca Hb F2a + 1-b, 0 when a = 1
≦ b ≦ 3, and when 2 ≦ a ≦ 3, 0 ≦ b ≦ 5.
However, 2 ≦ n + a ≦ 4 and 0 ≦ m + b ≦ 5. ] The solvent composition used for washing | cleaning which consists of hydrofluorocarbon (A) represented by these. 2. The hydrofluorocarbon (A) is C4
H3 F7, C4 H4 F6, C4 H5 F5, C4 H6 F4
, C4 H7 F3, C4 H8 F2, C5 H3 F9, C5
H4 F8, C5 H5 F7, C5 H6 F6, C5 H7 F5
, C5 H8 F4, C6 H3 F11, C6 H4 F10, C6
H5 F9, C6 H6 F8, C6 H7 F7, and C6 H
8. At least one selected from the group of 8F6.
A solvent composition used for cleaning. 3. The hydrofluorocarbon (A) is
1,1,1,2,2,3,4-heptafluorobutane,
1,1,1,3,3,3-hexafluoro-2- (fluoromethyl) propane, 1,1,1,3,3-pentafluoro-2- (fluoromethyl) propane, 1,1,
2,2,3,4-hexafluorobutane, 1,1,1,
2,3,4-hexafluorobutane, 1,2,2,3
4-pentafluorobutane, 1,1,3,3-tetrafluoro-2- (fluoromethyl) propane, 1,1,
2,3,4-pentafluorobutane, 1,1,1,2,
2,3,3,4,5-nonafluoropentane and 1,
The solvent composition used for cleaning according to claim 1, which is at least one selected from the group of 2,3,3,4,5-hexafluoropentane. 4. The solvent composition for cleaning according to claim 1, which contains at least one surfactant. 5. Hydrocarbons, alcohols, ethers,
The solvent composition for cleaning according to claim 1 or 4, containing at least one organic solvent selected from esters, ketones, halocarbons, or hydrochlorofluorocarbons. 6. The solvent composition for cleaning according to claim 4, wherein the surfactant is a nonionic surfactant. 7. The solvent composition for cleaning according to claim 1, 4 or 5, wherein the hydrofluorocarbon (A) in the solvent composition for cleaning is at least 70% by weight. 8. The surfactant in the solvent composition used for cleaning is 0.001% by weight to 10% by weight.
A solvent composition used for cleaning. 9. The organic solvent in the solvent composition used for cleaning is 3
The solvent composition used for cleaning according to claim 5, which is 0% by weight or less.