JPH0641590A - Solvent composition and cleaning - Google Patents

Abstract

PURPOSE:To provide the solvent composition, composed of a specific hydrofluorocarbon and capable of maintaining excellent characteristics of conventional trichlorofluoroethane and effectively removing fats and oils, etc., sticking to IC constituent parts, etc. CONSTITUTION:The solvent composition for cleaning is composed of a hydrofluorocarbon(HFC) of the formula R1-CFR2-CH3 {R1 is CmF2n+1-m [0<=(m)<=3 when (n) is 1; 0<=(m)<=5 when 2<=(n)<=4]; R2 is F or CaHbF2a+1-b [0<=(b)<=3 when (a) is 1; 0<=(b)<=5 when 2<=(a)<=3, with the proviso that (n), (a), (m) and (b) are 2<=(n+a)<=4 and 0<=[(m+b)<=5]}. 1,1,2,2,3,3-Hexafluoroethane, 1,1,1,2,3,3- hexafluorobutane, etc., are preferred as the HFC. The content of the HFC in the composition is preferably 80wt.% or more.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning solvent composition, and more particularly to a cleaning solvent suitable for removing fluxes, oils and fats, etc. adhering to IC components, precision machine components and the like. It relates to a composition.

[0002]

2. Description of the Related Art Conventionally, in the manufacture of IC components and precision mechanical components, cleaning with an organic solvent has been performed in order to remove the flux, dust and the like adhering to the components during assembly. For such washing, 1,1,2-trichloro-1,2,2-trifluoroethane (R113) has been widely used as an organic solvent. R113 is nonflammable, has little toxicity, and is excellent in stability. Further, R113 has an excellent feature that it selectively dissolves only dirt without damaging the base material such as metal, plastic, and elastomer. A printed circuit board that is cleaned by removing flux is a good example of a product made of a base material such as metal, plastic, or elastomer. From this point as well, R113 is useful.

However, since R113 may cause the destruction of the ozone layer in the stratosphere, its use has been restricted.

[0004]

SUMMARY OF THE INVENTION It is an object of the present invention to provide a cleaning solvent composition which does not destroy the ozone layer and has the ability to effectively clean flux, oil and the like. .

A further object of the present invention is to provide a cleaning solvent composition having a characteristic that it selectively dissolves only dirt without damaging a substrate such as metal, plastic and elastomer.

[0006]

Means for Solving the Problems As a result of extensive research and search for achieving the above-mentioned objects, the present inventors have obtained the following new findings. That is, some hydrofluorocarbons (1) do not destroy the ozone layer because they do not contain chlorine in the molecule; (2) their ability to clean flux, oils, dust, etc. is remarkable; and (3) like R113. In addition, it has a characteristic that it selectively dissolves only dirt without damaging the base material such as metal, plastic, and elastomer. The present invention has been completed based on these new findings.

According to the present invention, R1 --CFR2 --CH3 (wherein R1 is Cn Hm F2n + 1-m, and when n = 1, 0≤
m ≦ 3, and 0 ≦ m ≦ 5 when 2 ≦ n ≦ 4. R
2 is F or Ca Hb F2a + 1-b, 0 ≦ b ≦ 3 when a = 1, and 0 ≦ b ≦ 5 when 2 ≦ a ≦ 3. However, 2 ≦ n + a ≦ 4 and 0 ≦ m + b ≦ 5. The present invention provides a cleaning solvent composition comprising a hydrofluorocarbon (A) represented by the formula (1).

Although the cleaning solvent composition of the present invention comprises the above-mentioned hydrofluorocarbon (A), such a compound has never been used as a cleaning agent for removing flux, fats and oils.

An example of the hydrofluorocarbon (A) (hereinafter referred to as a specific HFC) in the present invention is C
4 H3 F7, C4 H4 F6, C4 H5 F5, C4 H6 F
4, C4 H7 F3, C4 H8 F2, C5 H3 F9, C5
H4 F8, C5 H5 F7, C5 H6 F6, C5 H7 F5
, C5 H8 F4, C6 H3 F11, C6 H4 F10, C6 H
5 F9, C6 H6 F8, C6 H7 F7, or C6 H8
Examples thereof include compounds represented by F6.

As a preferred example of the specific HFC, 1,
1,2,2,3,3-hexafluorobutane, 1,1,
1,2,3,3-hexafluorobutane, 1,2,2
3,3-pentafluorobutane, 1,1,2,3,3-
Pentafluorobutane, 1,1,1,2,3,3,4
4-octafluoropentane, 1,1,2,2,3
3,4,4-octafluoropentane, or 1,1,
1,2,3,3-hexafluoro-2-methylbutane and the like can be mentioned.

The specific HFCs can be used alone or in combination of two or more.

The cleaning solvent composition of the present invention may contain at least one surfactant.

The surfactant is not particularly limited, but a nonionic surfactant is preferred. Examples of nonionic surfactants include alkyl and alkylallyl polyoxyethylene ethers, alkylallyl formaldehyde condensed polyoxyethylene ethers, glycerin ethers and polyoxyethylene ethers thereof,
Block polymer having polyoxypropylene as lipophilic group, ether type such as alkylthiopolyoxyethylene ether, propylene glycol ester polyoxyethylene ether, glycerin ester polyoxyethylene ether, sorbitan ester polyoxyethylene ether and other ether ester Examples thereof include ester type such as polyoxyethylene fatty acid ester, glycerin ester, and sorbitan ester, nitrogen-containing type such as fatty acid alkanolamide, polyoxyethylene fatty acid amide, and the like.

The cleaning solvent composition of the present invention contains hydrocarbons, alcohols, ethers, esters, ketones, halocarbons, or hydrochlorofluorocarbons in order to increase the solubility of oils and fats and fluxes. At least one organic solvent selected from the above can be included.

The hydrocarbons are not particularly limited, but preferably, for example, pentane, 2-methylbutane, 2,2-dimethylpropane, hexane, 2-methylpentane, 3-methylpentane, 2,2-. Dimethylbutane, 2,3-dimethylbutane, heptane, 2-methylhexane, 3-methylhexane, 2,3-dimethylpentane, 2,4-dimethylpentane, octane, 2,2,3
-Trimethylpentane, 2,2,4-trimethylpentane, cyclopentane, methylcyclopentane, cyclohexane, methylcyclohexane, ethylcyclohexane and the like can be mentioned.

The alcohols are not particularly limited, but are preferably chain saturated alcohols having 1 to 5 carbon atoms, such as methanol, ethanol, i-propanol, n-propanol, n-butanol, i. -Butanol, s-butanol, t-butanol and the like can be mentioned.

The ethers are not particularly limited, but preferred examples include diethyl ether, methyl cellosolve, tetrahydrofuran, methyl-t-butyl ether, and 1,4-dioxane.

The esters are not particularly limited, but are preferably esters containing a fatty acid having 1 to 5 carbon atoms and a lower alcohol having 1 to 6 carbon atoms as active ingredients, such as methyl ester. Examples thereof include acetate, ethyl acetate, propyl acetate, isopropyl acetate, butyl acetate, isobutyl acetate, methyl propionate, ethyl propionate, propyl propionate, methyl butyrate, and ethyl butyrate.

The ketones are not particularly limited, but are preferably those represented by R-CO-R ', where R and R'are saturated hydrocarbons each having 1 to 4 carbon atoms. Examples include acetone, methyl ethyl ketone, methyl butyl ketone, and methyl isobutyl ketone.

Halocarbons include dichloromethane, cis-1,2-dichloroethylene, trans-
Examples thereof include 1,2-dichloroethylene, trichloroethylene, perchloroethylene, and 2-bromopropane, but are not limited thereto.

Hydrochlorofluorocarbons include 2,2-dichloro-1,1,1-trifluoroethane, 1,1-dichloro-1-fluoroethane and 3,3-
Dichloro-1,1,1,2,2-pentafluoropropane, 1,3-dichloro-1,1,2,2,3-pentafluoropropane, 1,1-dichloro-1,2,2,3
3-pentafluoropropane, 1,2-dichloro-1,
1,3,3,3-pentafluoropropane, 1,2-dichloro-1,1,2,3,3-pentafluoropropane, 2,3-dichloro-1,1,1,2,3-pentafluoro Propane or 2,2-dichloro-1,1,
Examples thereof include 1,3,3-pentafluoropropane, but are not limited thereto.

The specific HFC content in the cleaning solvent composition of the present invention is not particularly limited, but is usually about 70% by weight or more, preferably about 80% by weight or more.

The content of the surfactant in the cleaning solvent composition is not particularly limited, but is preferably 0.00.
It is 1% by weight to 10% by weight.

The content of the organic solvent in the cleaning solvent composition is not particularly limited, but is usually about 30% by weight or less, preferably about 0.5 to about 10% by weight, more preferably about 1 to about 10% by weight. It is about 8% by weight. More preferably, the mixture of the specific HFC of the present invention and the organic solvent is an azeotropic composition.

The cleaning solvent composition of the present invention contains a specific HF.
Hydrofluorocarbons other than C that do not destroy the ozone layer can be blended. Such hydrofluorocarbons include 1,2-difluoroethane, 1,1,
1,2,3-pentafluoropropane, 1,1,2,
Examples thereof include 2,3-pentafluoropropane, 1,1,1,3-tetrafluoropropane, 1,3-difluoropropane, etc., but are not limited thereto.

Into the cleaning solvent composition of the present invention, the components which have been appropriately added to this type of cleaning solvent composition in accordance with its use can be added. Examples of such components are auxiliaries and stabilizers for cleaning solvent compositions.

Examples of the above components include nitro compounds such as nitromethane, nitroethane, nitropropane and nitrobenzene, amines such as diethylamine, triethylamine, i-propylamine, butylamine and i-butylamine, phenol, o-cresol and m. −
Cresol, p-cresol, thymol, p-t-butylphenol, t-butylcatechol, catechol, isoeugenol, o-methoxyphenol, 4,4'-
Dihydroxyphenyl-2,2-propane, isoamyl salicylate, benzyl salicylate, methyl salicylate,
Phenols such as 2,6-di-t-butyl-p-cresol, 2- (2′-hydroxy-5′-methylphenyl) benzotriazole, 2- (2′-hydroxy-).
Of 3'-t-butyl-5'-methylphenyl) -5-chlorobenzotriazole, 1,2,3-benzotriazole, or 1-[(N, N-bis-2-ethylhexyl) aminomethyl] benzotriazole Examples thereof include triazoles.

Conventional cleaning methods can be applied for removing flux, fats and oils, dust and the like using the cleaning solvent composition of the present invention. Such cleaning methods include hand-wiping, dipping, spraying, rocking, ultrasonic cleaning, steam cleaning and the like.

[0029]

EXAMPLES In Examples 1-44, SUS-304
Test piece (25 mm x 30 mm x 2 mm) was immersed in machine oil (CQ-30 manufactured by Nippon Oil Co., Ltd.), and then immersed in the cleaning solvent composition of the present invention for 5 minutes to determine the degree of removal of machine oil. did. The result is taken as the degree of removal, ⊚: good removal is possible, ∘: almost good, Δ: a small amount remains, ×: considerably remains,
The results are shown in Tables 1 and 2 below.

In Examples 45 to 88, a glass epoxy printed circuit board (50 mm × 100 mm × 1.6) was used.
mm) The entire surface was coated with flux (Speedy Flux AGF-J-1 manufactured by Asahi Chemical Laboratory) and soldered at a soldering temperature of 260 ° C. using a wave solder machine. Then, it was immersed in the cleaning solvent composition of the present invention for 3 minutes for cleaning, and the degree of flux removal was determined. The result is taken as the degree of removal, ◎: good removal possible, ○: almost good,
Table 3 to Table 4 below show the evaluations of Δ: small amount remaining, x: considerable remaining.

Specific HFCs used in the following examples are 1,1,2,2,3,3-hexafluorobutane (hereinafter referred to as R356), 1,1,1,2,3,3.
-Hexafluorobutane, 1,2,2,3,3-pentafluorobutane, 1,1,2,3,3-pentafluorobutane, 1,1,1,2,3,3,4,4-octa Fluoropentane, 1,1,2,2,3,3,4,4-octafluoropentane, and 1,1,1,2,3,3-
It was selected from the group of hexafluoro-2-methylbutane.

The organic solvent soluble in the specific HFC used in the following examples is n-pentane (n-Pe).
t), cyclopentane (c-Pet), n-hexane (n-Hex), cyclohexane (c-Hex), n-
Heptane (n-Hep), methanol (MeOH), ethanol (EtOH), n-propanol (n-P)
A), 2-propanol (IPA), acetone (Ace
t), methyl ethyl ketone (MEK), ethyl acetate (EtAc), dichloromethane (DCM), 2,2-
Dichloro-1,1,1-trifluoroethane (R12
3), 1,1-dichloro-1-fluoroethane (R14
1b), 1,3-dichloro-1,1,2,2,3-pentafluoropropane (R225A), and 3,3-dichloro-1,1,1,2,2-pentafluoropropane (R225B). Selected from the group.

As the surfactant used in the following examples, alkyl polyoxyethylene ether (APO
EE), glycerin ester polyethoxyethylene ether (GEPEE), polyoxyethylene fatty acid ester (POEFE), ester of glycerin ether (G
RETES), alkyl polyoxyethylene ether ester (APOEES), sorbitan ester (SO
RES), glycerin ester (GRES), fatty acid alkanolamide (FAAD), and glycerin ether (GRET).

[0034]

[Table 1]

[0035]

[Table 2]

In Examples 1 to 44, R3 having a solvent composition was used.
56 is 1,1,1,2,3,3-hexafluorobutane, 1,2,2,3,3-pentafluorobutane, 1,
1,2,3,3-pentafluorobutane, 1,1,1,
2,3,3,4,4-octafluoropentane, 1,
1,2,2,3,3,4,4-octafluoropentane, or 1,1,1,2,3,3-hexafluoro-
When the evaluation was performed in place of 2-methylbutane, similar results were obtained.

[0037]

[Table 3]

[0038]

[Table 4]

In Examples 45 to 88, R of the solvent composition was used.
356 is 1,1,1,2,3,3-hexafluorobutane, 1,2,2,3,3-pentafluorobutane,
1,1,2,3,3-pentafluorobutane, 1,1,
1,2,3,3,4,4-octafluoropentane,
When 1,1,2,2,3,3,4,4-octafluoropentane or 1,1,1,2,3,3-hexafluoro-2-methylbutane was used for evaluation, the same result was obtained. I got the result.

[0040]

R1 --CFR2 --CH3 in the present invention
(In the formula, R1 is Cn Hm F2n + 1-m, 0 ≦ m ≦ 3 when n = 1, and 0 ≦ m ≦ 5 when 2 ≦ n ≦ 4. R2 is F or Ca Hb F2a + 1-b and a =
When 1 is 0 ≦ b ≦ 3, when 2 ≦ a ≦ 3 0 ≦ b ≦
It is 5. However, 2 ≦ n + a ≦ 4 and 0 ≦ m + b
≦ 5. The solvent composition for cleaning comprising a hydrofluorocarbon represented by) does not destroy the ozone layer, and
It has the advantages of satisfying the excellent properties of the conventional R113 and being able to effectively clean dirt such as fats and oils and flux.

─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. ⁵ Identification number Reference number within the agency FI technical display location (C11D 7/60 7:30 7:26) (72) Inventor Keiichi Onishi Kanagawa-ku, Yokohama-shi, Kanagawa 1160 Matsubara, Hazawa-machi, AG Technology Co., Ltd. (72) Inventor Yoko Usami, 1160 Matsubara, Hazawa-machi, Kanagawa-ku, Yokohama, Kanagawa Prefecture

Claims (9)

[Claims] 1. R1 --CFR2 --CH3 (wherein R1 is C
n Hm F2n + 1-m, 0 ≦ m ≦ 3 when n = 1, and 0 ≦ m ≦ 5 when 2 ≦ n ≦ 4. R2 is F or Ca Hb F2a + 1-b, and when a = 1, 0 ≦ b ≦
3 and 0 ≦ b ≦ 5 when 2 ≦ a ≦ 3. However, 2 ≦ n + a ≦ 4 and 0 ≦ m + b ≦ 5. )
A cleaning solvent composition comprising a hydrofluorocarbon (A) represented by: 2. The hydrofluorocarbon (A) is C4
H3 F7, C4 H4 F6, C4 H5 F5, C4 H6 F4
, C4 H7 F3, C4 H8 F2, C5 H3 F9, C5
H4 F8, C5 H5 F7, C5 H6 F6, C5 H7 F5
, C5 H8 F4, C6 H3 F11, C6 H4 F10, C6
H5 F9, C6 H6 F8, C6 H7 F7, and C6 H
8. At least one selected from the group of 8F6.
Cleaning solvent composition. 3. The hydrofluorocarbon (A) is
1,1,2,2,3,3-hexafluorobutane, 1,
1,1,2,3,3-hexafluorobutane, 1,2,
2,3,3-pentafluorobutane, 1,1,2,3
3-pentafluorobutane, 1,1,1,2,3,3,3
4,4-octafluoropentane, 1,1,2,2
3,3,4,4-octafluoropentane, and 1,
The cleaning solvent composition according to claim 1, which is at least one selected from the group of 1,1,2,3,3-hexafluoro-2-methylbutane. 4. The cleaning solvent composition according to claim 1, which contains at least one surfactant. 5. Hydrocarbons, alcohols, ethers,
The cleaning solvent composition according to claim 1 or 4, containing at least one organic solvent selected from esters, ketones, halocarbons, and hydrochlorofluorocarbons. 6. The cleaning solvent composition according to claim 4, wherein the surfactant is a nonionic surfactant. 7. The cleaning solvent composition according to claim 1, 4 or 5, wherein the hydrofluorocarbon (A) in the cleaning solvent composition is at least 70% by weight. 8. The surfactant in the cleaning solvent composition is 0.0.
The cleaning solvent composition according to claim 4 or 6, which is 01% by weight to 10% by weight. 9. The cleaning solvent composition according to claim 5, wherein the organic solvent in the cleaning solvent composition is 30% by weight or less.