JPH06136537A - Vacuum vapor deposition device for continuous band-shaped material - Google Patents
Vacuum vapor deposition device for continuous band-shaped materialInfo
- Publication number
- JPH06136537A JPH06136537A JP29061792A JP29061792A JPH06136537A JP H06136537 A JPH06136537 A JP H06136537A JP 29061792 A JP29061792 A JP 29061792A JP 29061792 A JP29061792 A JP 29061792A JP H06136537 A JPH06136537 A JP H06136537A
- Authority
- JP
- Japan
- Prior art keywords
- crucible
- strip
- vapor deposition
- film
- evaporation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 title claims abstract description 25
- 238000007740 vapor deposition Methods 0.000 title claims abstract description 16
- 238000010438 heat treatment Methods 0.000 claims abstract description 9
- 230000008016 vaporization Effects 0.000 claims abstract 2
- 238000001704 evaporation Methods 0.000 claims description 42
- 230000008020 evaporation Effects 0.000 claims description 36
- 238000001771 vacuum deposition Methods 0.000 claims description 7
- 238000007796 conventional method Methods 0.000 description 13
- 239000000956 alloy Substances 0.000 description 7
- 229910045601 alloy Inorganic materials 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 230000006698 induction Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229910001069 Ti alloy Inorganic materials 0.000 description 1
- UQZIWOQVLUASCR-UHFFFAOYSA-N alumane;titanium Chemical compound [AlH3].[Ti] UQZIWOQVLUASCR-UHFFFAOYSA-N 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
(57)【要約】
【目的】 帯状物の幅方向に均一に分布した膜が形成さ
れ、かつ、膜質の点でも、優れた蒸着膜を得ることがで
きる連続帯状物用真空蒸着装置を提供することにある。
【構成】 真空槽内に配置されたるつぼの上方に連続的
に移動する帯状物が設置され、加熱手段によりるつぼ内
に充てんされている蒸発材を蒸発させて帯状物表面上に
蒸着を行なう真空蒸着装置において、前記るつぼの長手
方向の中心線が前記帯状物の移動方向に対して斜めにな
るように該るつぼが配置されている。
(57) [Abstract] [PROBLEMS] To provide a vacuum vapor deposition apparatus for continuous strips in which a film uniformly formed in the width direction of the strip is formed and which is also excellent in film quality. Especially. [Structure] A strip that moves continuously is installed above a crucible placed in a vacuum chamber, and a vaporizing material filled in the crucible is evaporated by a heating means to perform vapor deposition on the surface of the strip. In the vapor deposition device, the crucible is arranged so that the center line in the longitudinal direction of the crucible is oblique to the moving direction of the strip.
Description
【０００１】[0001]
【産業上の利用分野】本発明は、連続帯状物用真空蒸着
装置に関するもので、詳しくは、電子銃を利用した連続
式帯状物用真空蒸着装置、その他、連続式イオンプレ−
テイング装置あるいはるつぼを利用する抵抗加熱式およ
び誘導加熱式連続蒸着装置などの真空蒸着装置に関する
ものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vacuum deposition apparatus for continuous strips, and more particularly to a continuous vacuum deposition apparatus for strips using an electron gun, and other continuous ion plates.
The present invention relates to a vacuum vapor deposition apparatus such as a resistance heating type and induction heating type continuous vapor deposition apparatus utilizing a towing apparatus or a crucible.
【０００２】[0002]
【従来の技術】図２は従来の技術の１つの例を示した平
面図であり、図３は同じくもう１つの例を示した平面図
である。図２および図３において、１は真空槽、２は該
真空槽１の内部に据え付けられたるつぼ、３は該るつぼ
２に充てんされた蒸発材、４は該るつぼ２の上方で矢印
の方向にＶの速度で連続的に移動する帯状物、５は電子
銃、６は該電子銃５から放射されて蒸発材３を蒸発させ
る電子ビ−ム、７は該るつぼ２の長手方向の中心線であ
る。2. Description of the Related Art FIG. 2 is a plan view showing an example of a conventional technique, and FIG. 3 is a plan view showing another example thereof. 2 and 3, 1 is a vacuum chamber, 2 is a crucible installed inside the vacuum chamber 1, 3 is an evaporation material filled in the crucible 2, 4 is above the crucible 2 in the direction of the arrow. A strip moving continuously at a velocity of V, 5 is an electron gun, 6 is an electron beam for evaporating the evaporation material 3 by being emitted from the electron gun 5, and 7 is a longitudinal centerline of the crucible 2. is there.
【０００３】すなわち、図２に示した従来の技術におい
ては、帯状物４の移動方向に対して平行にるつぼ２を設
置し、電子銃５により、るつぼ２内の蒸発材３を溶解、
蒸発させ、帯状物４の表面に金属膜を形成する。また図
３に示した従来の技術においては、帯状物４の移動方向
に対してるつぼ２の長手方向の中心線７とのなす角が９
０度になるようにるつぼ２を設置し、電子銃５により、
るつぼ２内の蒸発材３を溶解、蒸発させ、帯状物４の表
面に金属膜を形成する。That is, in the conventional technique shown in FIG. 2, the crucible 2 is installed in parallel with the moving direction of the strip 4, and the evaporation material 3 in the crucible 2 is melted by the electron gun 5.
Evaporate to form a metal film on the surface of the strip 4. Further, in the conventional technique shown in FIG. 3, the angle formed by the center line 7 in the longitudinal direction of the crucible 2 with respect to the moving direction of the strip 4 is 9
The crucible 2 is installed so that it becomes 0 degree, and the electron gun 5
The evaporation material 3 in the crucible 2 is melted and evaporated to form a metal film on the surface of the strip 4.
【０００４】[0004]
【発明が解決しようとする課題】しかしながら、図２に
示した従来の技術においては、図４に示すように、つま
り、図４では、帯状物４が紙面に直角方向に移動する場
合を示しているが、２個のるつぼ２，２内に異種金属、
たとえば、一方のるつぼにアルミニウム（Ａｌ）を充て
んし、他方のるつぼ２にチタン（Ｔｉ）を充てんし、同
時に蒸発させ、帯状物４の表面に合金膜を形成する場
合、アルミニウムだけの層８、アルミニウムとチタンの
合金層９、チタンだけの層１０となって、アルミニウム
とチタンの分布が帯状物４の表面上で均一にならず、合
金膜を全面に形成することは不可能であるという問題点
があった。However, in the conventional technique shown in FIG. 2, as shown in FIG. 4, that is, in FIG. 4, the case where the strip 4 moves in the direction perpendicular to the paper surface is shown. There are different metals in the two crucibles 2, 2.
For example, when one crucible is filled with aluminum (Al) and the other crucible 2 is filled with titanium (Ti) and evaporated at the same time to form an alloy film on the surface of the strip 4, a layer 8 containing only aluminum, The aluminum-titanium alloy layer 9 and the titanium-only layer 10 are not formed, and the distribution of aluminum and titanium is not uniform on the surface of the strip 4, and it is impossible to form an alloy film on the entire surface. There was a point.
【０００５】また図３に示した従来の技術においては、
図２の場合とは異なり、合金膜を形成することは可能で
あるが、後述する図１と前述した図３とからわかるよう
に、帯状物４がるつぼ２の上面を通過する時間が短くな
る（距離Ｌ1 ＞Ｌ2 ）ため、目標の厚みの膜を形成する
ためには、速い成膜速度で膜を形成しなければならない
ので、膜質（密着性、密度、耐蝕性等）が低下するとい
う問題点があった。Further, in the conventional technique shown in FIG. 3,
Unlike the case of FIG. 2, it is possible to form an alloy film, but as can be seen from FIG. 1 described later and FIG. 3 described above, the time for the strip 4 to pass over the upper surface of the crucible 2 becomes shorter. (Distance L1> L2) Therefore, in order to form a film having a target thickness, it is necessary to form the film at a high film formation rate, so that the film quality (adhesion, density, corrosion resistance, etc.) deteriorates. There was a point.
【０００６】本発明は、上記のような問題点を解決しよ
うとするものである。すなわち、本発明は、帯状物の幅
方向に均一に分布した膜が形成され、かつ、膜質の点で
も、優れた蒸着膜を得ることができる連続帯状物用真空
蒸着装置を提供することを目的とするものである。The present invention is intended to solve the above problems. That is, an object of the present invention is to provide a vacuum deposition apparatus for continuous strips in which a film uniformly distributed in the width direction of the strip is formed, and also in terms of film quality, an excellent deposited film can be obtained. It is what
【０００７】[0007]
【課題を解決するための手段】上記目的を達成するため
に、本発明は、真空槽内に配置されたるつぼの上方に連
続的に移動する帯状物が設置され加熱手段によりるつぼ
内に充てんされている蒸発材を蒸発させて帯状物表面上
に蒸着を行なう真空蒸着装置において、前記るつぼの長
手方向の中心線が前記帯状物の移動方向に対して斜めに
なるように該るつぼが配置されているものとした。In order to achieve the above-mentioned object, the present invention is to install a continuously moving strip above a crucible arranged in a vacuum chamber and fill the crucible by heating means. In a vacuum vapor deposition apparatus for evaporating an evaporating material to vapor deposit on a surface of a strip, the crucible is arranged so that a longitudinal centerline of the crucible is oblique to a moving direction of the strip. I was supposed to.
【０００８】[0008]
【作用】本発明によれば、真空槽内に配置されたるつぼ
の上方に連続的に移動する帯状物が設置され、加熱手段
によりるつぼ内に充てんされている蒸発材を蒸発させて
帯状物表面上に蒸着を行なう真空蒸着装置において、前
記るつぼの長手方向の中心線が前記帯状物の移動方向に
対して斜めになるように該るつぼが配置されているの
で、帯状物の移動方向における見かけ上のるつぼの幅が
大きくなり、遅い蒸発速度で目標の厚みを持つ膜を形成
することができる。またるつぼが斜めに配置されている
ため、該るつぼからの蒸発材の利用度、つまり、歩留ま
りがよくなり、帯状物の幅方向に対して均一に分布した
膜が形成される。According to the present invention, a strip that moves continuously is installed above the crucible arranged in the vacuum chamber, and the evaporation material filled in the crucible is evaporated by the heating means to cause the surface of the strip to move. In a vacuum vapor deposition apparatus for performing vapor deposition on the crucible, since the crucible is arranged so that the center line in the longitudinal direction of the crucible is oblique to the moving direction of the band-shaped material, the apparent appearance in the moving direction of the band-shaped material is The crucible has a large width, and a film having a target thickness can be formed at a low evaporation rate. Further, since the crucibles are arranged obliquely, the utilization rate of the evaporation material from the crucibles, that is, the yield is improved, and a film uniformly distributed in the width direction of the strip is formed.
【０００９】[0009]
【実施例】図１は本発明の一実施例を示した平面図であ
る。図１において、符号１ないし７は、図２および図３
に示したものと同じであるが、図１では、るつぼ２の長
手方向の中心線７が帯状物４の移動方向に対して角度θ
だけ斜めになるように該るつぼ２が配置されている。FIG. 1 is a plan view showing an embodiment of the present invention. In FIG. 1, reference numerals 1 to 7 denote the same as in FIGS.
1, but in FIG. 1, the longitudinal centerline 7 of the crucible 2 forms an angle θ with respect to the moving direction of the strip 4.
The crucible 2 is arranged so as to be oblique only.
【００１０】なお図１の実施例では、前記θを約５０度
にしてある。すなわち、図１に示した連続帯状物用真空
蒸着装置においては、真空槽１内の上方に帯状物４が速
度Ｖで連続的に移動しており、その帯状物４の表面に金
属または合金等の膜を形成するようになっている。膜の
形成は、真空槽４に取付けられた電子銃５により、真空
槽１内に据え付けられたるつぼ２内の充てん蒸発材３を
溶解、蒸発させ、移動する帯状物４の表面上に蒸着さ
せ、金属または合金膜等を形成する。In the embodiment shown in FIG. 1, θ is set to about 50 degrees. That is, in the vacuum vapor deposition apparatus for continuous strips shown in FIG. 1, the strip 4 is continuously moving upward in the vacuum chamber 1 at a velocity V, and the surface of the strip 4 is made of metal, alloy, or the like. Film is formed. The film is formed by melting and evaporating the filling evaporating material 3 in the crucible 2 installed in the vacuum chamber 1 with an electron gun 5 attached to the vacuum chamber 4 and depositing it on the surface of the moving strip 4. , A metal or alloy film or the like is formed.
【００１１】ただし、合金膜等の多元系膜を形成する場
合は、図１に示すように、２個以上のるつぼ２内に異種
蒸発材をそれぞれ単独に充てんし、それらを同時に蒸発
させ、帯状物４の表面上で多元系膜を形成させる。However, in the case of forming a multi-component film such as an alloy film, as shown in FIG. 1, two or more crucibles 2 are individually filled with different kinds of evaporating materials, respectively, and they are simultaneously evaporated to form a strip shape. A multi-component film is formed on the surface of the object 4.
【００１２】図１に示すように、るつぼ２を斜めに設置
することにより、見かけ上の帯状物４の幅がＷ1 （実際
の帯状物４の幅）からＷ2 に長くなる。図１では、前記
Ｗ2がＷ1 の約１．３倍になる。一般に、図５に示すよ
うに、帯状物４の幅が狭い場合と、図６に示すように、
帯状物４の幅が広い場合とでは、るつぼ２から蒸発する
蒸発全量Ｑと無効蒸発量ｑ（帯状物４上への成膜に使わ
れなかった蒸発物の量）の割合いの関係は、たとえば、
図５の場合の前記ＱをＱ1 、ｑをｑ1 とし、図６の場合
の前記ＱをＱ2 、ｑをｑ2 とすると、（ｑ1 ／Ｑ1 ）＞
＞（ｑ2 ／Ｑ2 ）となり、帯状物幅の広いほう（長いほ
う）が、無効蒸発量の割合いが小さくなる。As shown in FIG. 1, when the crucible 2 is installed obliquely, the apparent width of the strip 4 is increased from W1 (actual width of the strip 4) to W2. In FIG. 1, W2 is about 1.3 times W1. Generally, as shown in FIG. 5, when the width of the strip 4 is narrow, and as shown in FIG.
When the width of the strip 4 is wide, the relationship between the ratio of the total amount of evaporation Q evaporated from the crucible 2 and the amount of ineffective evaporation q (the amount of evaporated material not used for film formation on the band 4) is as follows. For example,
When Q in the case of FIG. 5 is Q1, q is q1, and Q in the case of FIG. 6 is Q2 and q is q2, (q1 / Q1)>
> (Q2 / Q2), and the wider (longer) the width of the strip is, the smaller the proportion of ineffective evaporation is.
【００１３】したがって、本発明の一実施例を示した図
１のものは、従来の技術の例を示した図３のものに比べ
ると、るつぼ２からの蒸発物を有効に利用できる。ちな
みに、一般的にいわれる蒸発材の利用度は、帯状物幅が
約２０００ｍｍの場合で８０％、これに対し、帯状物の
幅が約１０００ｍｍの場合は６０〜７０％、該幅が３０
０ｍｍの場合は３０〜４０％である。Therefore, the one shown in FIG. 1 showing one embodiment of the present invention can effectively utilize the evaporation material from the crucible 2 as compared with the one shown in FIG. 3 showing the example of the conventional technique. By the way, the utilization rate of the evaporation material that is generally called is 80% when the width of the strip is about 2000 mm, whereas it is 60 to 70% when the width of the strip is about 1000 mm, and the width is 30%.
In the case of 0 mm, it is 30 to 40%.
【００１４】いま、図３に示した従来の技術を簡単な図
にして図７に示し、図１に示した本発明の一実施例の技
術を簡単な図にして図８に示し、この両者の場合に具体
的な数値をあげて比較してみる。図７では、るつぼ２が
帯状物４の移動方向に対して直角であるため、るつぼ２
の長さが１００ｃｍ、幅が１０ｃｍとする。これに対し
て図８では、るつぼ２が帯状物４の移動方向に対して斜
めになっているので、るつぼ２の幅は同じ１０ｃｍであ
るが、見かけ上の幅、つまり、帯状物４の移動方向の幅
は１５ｃｍ、そして、長さは１５０ｃｍを必要とする。
また図示していない電子銃の出力を、ともに、１００Ｋ
Ｗとする。Now, the conventional technique shown in FIG. 3 is shown in a simplified diagram in FIG. 7, and the technique of one embodiment of the present invention shown in FIG. 1 is shown in a simplified diagram in FIG. In the case of, give a concrete numerical value and compare. In FIG. 7, since the crucible 2 is at right angles to the moving direction of the strip 4, the crucible 2
Has a length of 100 cm and a width of 10 cm. On the other hand, in FIG. 8, since the crucible 2 is inclined with respect to the moving direction of the strip 4, the crucible 2 has the same width of 10 cm, but the apparent width, that is, the movement of the strip 4. The width in the direction requires 15 cm and the length requires 150 cm.
The output of an electron gun (not shown) is 100K
W.
【００１５】したがって、図７では、蒸発面積が１００
０ｃｍ2 、蒸発面単位当りの電子銃出力は１／１０ＫＷ
／ｃｍ2 となり、図８では、蒸発面積が１５００ｃｍ2
、蒸発面単位当りの電子銃出力は１／１５ＫＷ／ｃｍ2
となる。ここで、図７の場合の、単位時間・単位面積
当りの蒸発量をＱ1 ｇ／ｃｍ2 ・ｓとし、図８の場合の
それをＱ2 ｇ／ｃｍ2 ・ｓとすると、電子銃出力密度と
蒸発量は、ほぼ比例するため、Ｑ2 はＱ1 ／１．５とな
る。Therefore, in FIG. 7, the evaporation area is 100
0 cm2, electron gun output per unit of evaporation surface is 1/10 kW
/ Cm2, and in Figure 8, the evaporation area is 1500 cm2
, Electron gun output per unit of evaporation surface is 1/15 kW / cm2
Becomes Here, assuming that the amount of evaporation per unit time and unit area in the case of FIG. 7 is Q1 g / cm2.s and that in FIG. 8 is Q2 g / cm2.s, the electron gun output density and the amount of evaporation Are approximately proportional to each other, so Q2 becomes Q1 / 1.5.
【００１６】このように、従来の技術を示した図７の場
合と、本発明の一実施例の技術を示した図８の場合とを
比較してみると、両者とも、同じ電子銃出力１００ＫＷ
を投入した場合、それぞれのケ−スの単位時間・単位面
積当りの蒸発量は、図７の場合をＱ1 ｇ／ｃｍ2 ・ｓと
すると、図８の場合は、蒸発面積が図７の場合に比べ、
１．５倍になることにより、蒸発面単位当りの電子銃出
力が図７の場合に比べ、１／１．５倍になるため、電子
銃出力密度と蒸発量は、ほぼ比例することにより図８の
場合の単位時間・単位面積当りの蒸発量Ｑ2 はＱ1 ／
１．５になる。Thus, comparing the case of FIG. 7 showing the conventional technique with the case of FIG. 8 showing the technique of one embodiment of the present invention, both have the same electron gun output of 100 KW.
When the amount of evaporation per unit time and unit area of each case is Q1 g / cm2 · s in the case of FIG. 7, in the case of FIG. compared,
Since the electron gun output per unit of evaporation surface becomes 1.5 times higher than that in the case of FIG. 7 by increasing 1.5 times, the electron gun output density and the evaporation amount are almost proportional to each other. In case of 8, the evaporation amount Q2 per unit time and unit area is Q1 /
It becomes 1.5.
【００１７】すなわち、図８の場合では、図７の場合に
比べ、１／１．５倍の蒸発速度で、帯状物に成膜される
ことになり、密着性、密度、耐蝕性等に優れた良質な膜
の形成が可能（一般的に、ゆっくり形成する程、良質な
膜ができることが知られている。）である。また１／
１．５倍の蒸発速度ではあるが、帯状物４の移動方向に
対してるつぼ２の幅が見かけ上、１．５倍になってい
る。すなわち、成膜時間が１．５倍になるため、最終的
には図７の場合も、図８の場合も、同じ膜厚になる。That is, in the case of FIG. 8, as compared with the case of FIG. 7, the film is formed on the strip at an evaporation rate of 1 / 1.5 times, and thus the adhesiveness, density, corrosion resistance and the like are excellent. It is possible to form a good quality film (generally, it is known that the slower the film, the better the quality of the film). Also 1 /
Although the evaporation rate is 1.5 times, the width of the crucible 2 is apparently 1.5 times that of the moving direction of the strip 4. That is, since the film formation time is 1.5 times, the film thickness finally becomes the same in both FIG. 7 and FIG.
【００１８】したがって、本発明によれば、従来の技術
に比べ、同じ速度で移動する帯状物４の表面上に、同膜
厚で、しかも、良質な膜の形成が可能になった。Therefore, according to the present invention, it is possible to form a film having the same film thickness and good quality on the surface of the strip 4 moving at the same speed as compared with the conventional technique.
【００１９】前記図７および図８では、それぞれ、るつ
ぼ１個の場合について説明したが、るつぼが２個以上で
多元系の膜を形成する場合も、全く同じ結果が得られ
る。また図１では、るつぼ２の数を２個にしてあるが、
るつぼの数は、これに限るものではなく、１個以上であ
れば応用可能である。そして、３個以上のるつぼを使用
すれば、２元系の膜に限らず、多元系の膜の形成も可能
である。In each of FIGS. 7 and 8, the case of one crucible has been described, but the same result can be obtained when a multi-element film is formed with two or more crucibles. Further, in FIG. 1, the number of crucibles 2 is two, but
The number of crucibles is not limited to this, and one or more crucibles can be applied. If three or more crucibles are used, not only a binary film but also a multi-component film can be formed.
【００２０】さらに、図１では、電子銃５を利用した連
続式真空蒸着装置について説明したが、たとえば、連続
式イオンプレ−テイング装置、抵抗加熱式および誘導加
熱式連続真空蒸着装置等の、るつぼを使用するあらゆる
連続式蒸着装置について適用可能である。Further, in FIG. 1, the continuous type vacuum deposition apparatus utilizing the electron gun 5 has been described. For example, a crucible such as a continuous type ion plating apparatus, a resistance heating type and an induction heating type continuous vacuum deposition apparatus is used. It is applicable to any continuous vapor deposition equipment used.
【００２１】[0021]
【発明の効果】以上説明したように、本発明によれば、
真空槽内に配置されたるつぼの上方に連続的に移動する
帯状物が設置され、加熱手段によりるつぼ内に充てんさ
れている蒸発材を蒸発させて帯状物表面上に蒸着を行な
う真空蒸着装置において、前記るつぼの長手方向の中心
線が前記帯状物の移動方向に対して斜めになるように該
るつぼが配置されているので、従来の技術に比べ、見か
け上の帯状物幅が長くなり、蒸発材の利用度、つまり、
歩留まりがよくなり、また蒸発面積が大きくなるため、
従来の技術に比べ、単位時間・単位面積当りの蒸発量が
少なくなり、遅い蒸発速度で帯状物に成膜されることか
らして、良質な膜が形成される。しかも、るつぼ幅が長
くなっているため、成膜時間が長くなり、膜厚も充分な
膜が得られる。また２個以上のるつぼを使用した場合に
は、帯状物幅方向に均一な合金膜等の多元系膜の形成が
可能となる。As described above, according to the present invention,
In a vacuum vapor deposition apparatus in which a strip that moves continuously is installed above a crucible placed in a vacuum chamber, and the evaporation material filled in the crucible is evaporated by a heating means to perform vapor deposition on the surface of the strip. Since the crucible is arranged so that the center line in the longitudinal direction of the crucible is oblique with respect to the moving direction of the band-shaped material, the apparent width of the band-shaped material becomes longer than that in the conventional technique, and evaporation is increased. Utilization of material, that is,
Yield improves, and the evaporation area increases, so
Compared with the conventional technique, the amount of evaporation per unit time and unit area is smaller, and since a film is formed on the strip at a slow evaporation rate, a good quality film is formed. Moreover, since the crucible width is long, the film formation time is long and a film having a sufficient film thickness can be obtained. Further, when two or more crucibles are used, it is possible to form a multi-component film such as an alloy film that is uniform in the width direction of the strip.
【図１】本発明の一実施例を示した平面図である。FIG. 1 is a plan view showing an embodiment of the present invention.
【図２】従来の技術の１つの例を示した平面図である。FIG. 2 is a plan view showing an example of a conventional technique.
【図３】従来の技術のもう１つの例を示した平面図であ
る。FIG. 3 is a plan view showing another example of the conventional technique.
【図４】図３の装置の作用を説明するための立面断面図
である。FIG. 4 is an elevational sectional view for explaining the operation of the apparatus of FIG.
【図５】帯状物幅が短い場合の蒸発全量と無効蒸発量の
割合いを説明するための立面断面図である。FIG. 5 is a vertical cross-sectional view for explaining the ratio between the total evaporation amount and the ineffective evaporation amount when the width of the strip is short.
【図６】帯状物幅が長い場合の同様な説明をするための
立面断面図である。FIG. 6 is an elevational sectional view for explaining the same description when the width of the strip is long.
【図７】図３の装置の単位時間・単位面積当りの蒸発量
を説明するための平面図である。FIG. 7 is a plan view for explaining an evaporation amount per unit time / unit area of the apparatus of FIG.
【図８】図１の装置の同様な説明をするための平面図で
ある。FIG. 8 is a plan view for explaining the device of FIG. 1 in the same manner.
１ 真空槽 ２ るつぼ ３ 蒸発材 ４ 帯状物 ５ 電子銃 ６ 電子ビ−ム ７ るつぼの長手方向の中心線 1 vacuum tank 2 crucible 3 evaporation material 4 strip 5 electron gun 6 electron beam 7 center line of crucible in longitudinal direction
Claims (4)
続的に移動する帯状物が設置され、加熱手段によりるつ
ぼ内に充てんされている蒸発材を蒸発させて帯状物表面
上に蒸着を行なう真空蒸着装置において、前記るつぼの
長手方向の中心線が前記帯状物の移動方向に対して斜め
になるように該るつぼが配置されていることを特徴とす
る、連続帯状物用真空蒸着装置。1. A continuously moving strip is installed above a crucible arranged in a vacuum chamber, and a vaporizing material filled in the crucible is evaporated by a heating means to deposit vapor on the surface of the strip. The vacuum vapor deposition apparatus for continuous vapor deposition, wherein the crucible is arranged such that the center line of the crucible in the longitudinal direction is oblique to the moving direction of the web.
いる蒸発材の長手方向の長さが移動する帯状物の幅より
大きくなっている請求項１に記載の連続帯状物用真空蒸
着装置。2. The vacuum vapor deposition apparatus for continuous strips according to claim 1, wherein the length of the evaporation material filled in the crucibles arranged obliquely is longer than the width of the moving strips.
方向の中心線の帯状物に対応する長さが該帯状物の幅の
１．０〜２．０倍である請求項２に記載の連続帯状物用
真空蒸着装置。3. The length corresponding to the strip of the center line in the longitudinal direction of the evaporation material filled in the crucible is 1.0 to 2.0 times the width of the strip. Vacuum deposition equipment for continuous strips.
ている２つ以上のるつぼが帯状物の移動方向に接近して
設けられている請求項１、２または３に記載の連続帯状
物用真空蒸着装置。4. The vacuum deposition for continuous strips according to claim 1, 2 or 3, wherein two or more crucibles respectively filled with different evaporation materials are provided close to each other in the moving direction of the strips. apparatus.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29061792A JP3463693B2 (en) | 1992-10-29 | 1992-10-29 | Vacuum evaporation equipment for continuous strips |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29061792A JP3463693B2 (en) | 1992-10-29 | 1992-10-29 | Vacuum evaporation equipment for continuous strips |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH06136537A true JPH06136537A (en) | 1994-05-17 |
| JP3463693B2 JP3463693B2 (en) | 2003-11-05 |
Family
ID=17758314
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP29061792A Expired - Fee Related JP3463693B2 (en) | 1992-10-29 | 1992-10-29 | Vacuum evaporation equipment for continuous strips |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3463693B2 (en) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1998026108A1 (en) * | 1996-12-10 | 1998-06-18 | Recherches Et Developpement Du Groupe Cockerill Sambre | Process and device for forming a coating on a substrate by cathode sputtering |
| US7429300B2 (en) * | 2001-05-23 | 2008-09-30 | Junji Kido | Successive vapour deposition system, vapour deposition system, and vapour deposition process |
| WO2012066080A1 (en) * | 2010-11-17 | 2012-05-24 | Bekaert Advanced Coatings | Sputtering apparatus and method |
| JP2012512959A (en) * | 2008-12-18 | 2012-06-07 | アルセロールミタル フランス | Industrial steam generator for depositing alloy coatings on metal strips. |
| KR20210008071A (en) * | 2018-06-13 | 2021-01-20 | 아르셀러미탈 | Vacuum deposition equipment and method of coating substrate |
| CN112272713A (en) * | 2018-06-13 | 2021-01-26 | 安赛乐米塔尔公司 | Vacuum deposition apparatus and method for coating a substrate |
| KR20210009354A (en) * | 2018-06-13 | 2021-01-26 | 아르셀러미탈 | Vacuum deposition equipment and method of coating substrate |
| US11434560B2 (en) * | 2007-10-12 | 2022-09-06 | Arcelormittal France | Industrial vapour generator for the deposition of an alloy coating onto a metal strip |
| DE102022110019A1 (en) | 2022-04-26 | 2023-10-26 | VON ARDENNE Asset GmbH & Co. KG | Method and coating arrangement |
-
1992
- 1992-10-29 JP JP29061792A patent/JP3463693B2/en not_active Expired - Fee Related
Cited By (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1998026108A1 (en) * | 1996-12-10 | 1998-06-18 | Recherches Et Developpement Du Groupe Cockerill Sambre | Process and device for forming a coating on a substrate by cathode sputtering |
| BE1010797A3 (en) * | 1996-12-10 | 1999-02-02 | Cockerill Rech & Dev | Method and device for forming a coating on a substrate, by sputtering. |
| US7429300B2 (en) * | 2001-05-23 | 2008-09-30 | Junji Kido | Successive vapour deposition system, vapour deposition system, and vapour deposition process |
| US11434560B2 (en) * | 2007-10-12 | 2022-09-06 | Arcelormittal France | Industrial vapour generator for the deposition of an alloy coating onto a metal strip |
| JP2012512959A (en) * | 2008-12-18 | 2012-06-07 | アルセロールミタル フランス | Industrial steam generator for depositing alloy coatings on metal strips. |
| WO2012066080A1 (en) * | 2010-11-17 | 2012-05-24 | Bekaert Advanced Coatings | Sputtering apparatus and method |
| JP2021526590A (en) * | 2018-06-13 | 2021-10-07 | アルセロールミタル | Vacuum deposition equipment and methods for substrate coating |
| KR20210009354A (en) * | 2018-06-13 | 2021-01-26 | 아르셀러미탈 | Vacuum deposition equipment and method of coating substrate |
| CN112272713A (en) * | 2018-06-13 | 2021-01-26 | 安赛乐米塔尔公司 | Vacuum deposition apparatus and method for coating a substrate |
| KR20210008071A (en) * | 2018-06-13 | 2021-01-20 | 아르셀러미탈 | Vacuum deposition equipment and method of coating substrate |
| US11492695B2 (en) | 2018-06-13 | 2022-11-08 | Arcelormittal | Vacuum deposition facility and method for coating a substrate |
| KR20230093348A (en) * | 2018-06-13 | 2023-06-27 | 아르셀러미탈 | Vacuum deposition facility and method for coating a substrate |
| CN112272713B (en) * | 2018-06-13 | 2023-09-19 | 安赛乐米塔尔公司 | Vacuum deposition apparatus and method for coating a substrate |
| US12091739B2 (en) | 2018-06-13 | 2024-09-17 | Arcelormittal | Vacuum deposition facility and method for coating a substrate |
| US12091744B2 (en) | 2018-06-13 | 2024-09-17 | Arcelormittal | Vacuum deposition facility and method for coating a substrate |
| DE102022110019A1 (en) | 2022-04-26 | 2023-10-26 | VON ARDENNE Asset GmbH & Co. KG | Method and coating arrangement |
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