[go: up one dir, main page]

JPH0572094A - Continuous measurement system for polution gas - Google Patents

Continuous measurement system for polution gas

Info

Publication number
JPH0572094A
JPH0572094A JP30728991A JP30728991A JPH0572094A JP H0572094 A JPH0572094 A JP H0572094A JP 30728991 A JP30728991 A JP 30728991A JP 30728991 A JP30728991 A JP 30728991A JP H0572094 A JPH0572094 A JP H0572094A
Authority
JP
Japan
Prior art keywords
gas
air
measurement
tank
humidity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP30728991A
Other languages
Japanese (ja)
Inventor
Yoshiyuki Kato
喜之 加藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AMENITEC KK
Original Assignee
AMENITEC KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by AMENITEC KK filed Critical AMENITEC KK
Priority to JP30728991A priority Critical patent/JPH0572094A/en
Publication of JPH0572094A publication Critical patent/JPH0572094A/en
Pending legal-status Critical Current

Links

Landscapes

  • Automatic Analysis And Handling Materials Therefor (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)

Abstract

PURPOSE:To realize a continuous measurement of values corresponding to odor concentration measured in sensual tests and a continuous measurement of polution gas which automatically corrects water content in the measured gas. CONSTITUTION:The title system is constituted of a preprocessor part 1 and a measuring part 2. The preprocessor part 1 is constituted of a silica gel charger tank 3, a humidifier tank 4, a constant temperature tank 5, a flow controller 6 to control the mixing fraction of dry air and saturated air and a mixing tank 7 to mix uniformly the dry air and the saturated air. The measuring part 2 is constituted of a gas concentration detection sensor 8. By this, automatic correction of humidity in the measured gas and continuous measurement of gas concentration become possible. Also, by using a sensor for detecting gas concentration which has an organic film of bimolecular structure attached to a crystal oscillator, a continuous measurement of values corresponding to the odor concentration measured in sensual tests by the human sense of smell becomes possible.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は公害ガス、臭気ガスなど
の連続測定、監視に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to continuous measurement and monitoring of pollution gas, odorous gas and the like.

【0002】[0002]

【従来の技術】従来、官能試験で測定される臭気濃度に
対応する値の機器による連続測定は実現されていない。
また半導体センサーを用いて公害ガスを機器により連続
測定する場合、測定ガス中の水分の影響が全く無視され
ているか測定後計算により水分量の補正をおこなってい
る。
2. Description of the Related Art Conventionally, continuous measurement by a device of a value corresponding to the odor concentration measured by a sensory test has not been realized.
In addition, when continuously measuring pollution gas with a device using a semiconductor sensor, the amount of water is corrected by calculation after measurement whether the influence of water in the measurement gas is completely ignored.

【0003】[0003]

【発明が解決しようとする課題】現在ガスセンサーある
いはニオイセンサーとして一般に半導体センサーあるい
は脂質二分子膜センサーなどが利用されている。水晶発
振子に二分子構造の有機膜を添着したいわゆる脂質二分
子膜センサーにおいては、ナノグラム単位のニオイを重
量として測定可能であり、かつ人間の嗅細胞が二分子構
造であることから人間の嗅覚で測定する官能試験の臭気
濃度に対応する値が測定できる利点がある。しかし、測
定ガス中の数十ppm(ppmは百万分の一の単位)の
ニオイの量を測定する場合にもその測定ガス中には温度
にもよるが数千から数万ppmの水分が含まれ水分補正
なしでニオイを測定することは困難であり、現実にはニ
オイを測定しているというより水分重量を測定している
といっても過言でない。同様に半導体センサーでも公知
の事実として水分の影響が測定値に及ぼす影響が極めて
大きく、ゼロ値を設定する標準空気の絶対湿度が測定ガ
スの絶対湿度と異なればその分誤差となってあらわれ
る。しかし、測定ガス中の水分の影響を考慮した連続測
定方法は実現されておらずゼロ値の設定に用いるべき標
準空気すら使用されていない現実である。本発明は、測
定ガス中に含まれる水分の量を自動的に補正することに
より公害ガスの連続測定、監視を目的とするものであ
る。
Currently, a semiconductor sensor or a lipid bilayer sensor is generally used as a gas sensor or an odor sensor. In a so-called lipid bilayer sensor in which a bilayer-structured organic film is attached to a crystal oscillator, it is possible to measure odors in nanogram units as weight, and human olfactory cells have a bilayer structure. There is an advantage that the value corresponding to the odor concentration of the sensory test measured in 1. can be measured. However, even when measuring the amount of tens of ppm (ppm is a unit of one millionth) in the measurement gas, the measurement gas contains water of several thousands to several tens of thousands ppm depending on the temperature. It is difficult to measure the odor without water content correction, and it is no exaggeration to say that the water weight is actually measured rather than the odor is actually measured. Similarly, in semiconductor sensors, it is a well-known fact that the influence of water on the measured value is extremely large, and if the absolute humidity of the standard air for setting the zero value is different from the absolute humidity of the measurement gas, an error will appear accordingly. However, a continuous measurement method that considers the influence of water in the measurement gas has not been realized, and even standard air that should be used for setting a zero value is not actually used. An object of the present invention is to continuously measure and monitor pollution gas by automatically correcting the amount of moisture contained in the measurement gas.

【0004】[0004]

【課題を解決するための手段】上記目的を達成するため
には、測定ガス中の水分量すなわち測定ガスの絶対湿度
と等しい絶対湿度の空気を製造し、それを標準空気とし
てゼロ値の設定に用いれば測定値より水分の影響は自動
的に補正できる。本発明では、上記目的を達成するため
二つの方法を提案するものである。
In order to achieve the above object, air having an absolute humidity equal to the amount of water in the measurement gas, that is, the absolute humidity of the measurement gas, is manufactured, and it is set as a standard air to a zero value. If used, the effect of water content can be automatically corrected from the measured value. The present invention proposes two methods for achieving the above object.

【0005】第1の方法は、任意の温度・湿度の測定ガ
ス並びに標準空気の温度を恒温槽によってある特定の一
定の温度、本発明では15℃又は25℃に変換し、測定
ガスの絶対湿度と等しい絶対湿度をもった標準空気を造
る方法である。温度が15℃又は25℃のガスあるいは
空気を造るには、15℃又は25℃に制御された恒温槽
へガス又は空気を通すことによって達成できる。する
と、その温度における測定ガスの相対湿度・絶対湿度は
定まる。一方、同じ絶対湿度をもった標準空気を造るに
は、測定ガスの相対湿度がその温度でψ%のとき、同じ
温度の全く水分を含まない乾燥空気の量とこれ以上水分
を含めない飽和空気の量をそれぞれ(1−ψ/100)
とψ/100の割合で混合すれば達成できる。乾燥空気
の量と飽和空気の量を制御するには流量制御器によって
達成できる。また、乾燥空気を造るには十分なシリカゲ
ル充填槽に空気を通すことによって得られる。また、十
分な接触時間のある水中に空気を通すと湿度の飽和した
飽和空気が得られる。このようにして造られた測定ガス
の絶対湿度と等しい絶対湿度の標準空気を用い、水晶発
振子に二分子構造の有機膜を添着したガス濃度検知セン
サーのゼロ値設定を行なうことによって官能試験で測定
される臭気濃度に対応する値を連続測定することが可能
となる。測定部にガス濃度検知センサーとリファレンス
センサーを設置すれば常時連続測定が可能になり、リフ
ァレンスセンーを設置しない場合は測定プログラムにし
たがった間欠連続測定となる。測定ガスの温度を15℃
又は25℃に設定する意義は亜硫酸ガスの測定値が15
℃換算の測定値が規定されていること、さらに人間の嗅
覚は25℃近辺で最も鋭敏であることから25℃の測定
値は大きな意味をもっている。さらに、二分子構造の有
機膜を水晶発振子に添着したいわゆる脂質2分子膜セン
サーは30℃付近に温度変異点があるものもあり、30
℃以下での適用が望ましいからである。
The first method is to convert the temperature of the measurement gas of any temperature and humidity and the temperature of the standard air into a certain constant temperature, 15 ° C. or 25 ° C. in the present invention, by means of a thermostatic chamber, and measure the absolute humidity of the measurement gas. It is a method to create standard air with absolute humidity equal to. The gas or air having a temperature of 15 ° C. or 25 ° C. can be produced by passing the gas or air through a thermostat controlled at 15 ° C. or 25 ° C. Then, the relative humidity and absolute humidity of the measurement gas at that temperature are determined. On the other hand, to create standard air with the same absolute humidity, when the relative humidity of the measured gas is ψ% at that temperature, the amount of dry air containing no moisture and saturated air containing no more moisture at the same temperature are used. The amount of each (1-ψ / 100)
It can be achieved by mixing with ψ / 100. Controlling the amount of dry air and the amount of saturated air can be accomplished by a flow controller. It can also be obtained by passing air through a silica gel-filled tank sufficient to produce dry air. Further, when air is passed through water having a sufficient contact time, saturated air with saturated humidity is obtained. By using standard air with an absolute humidity equal to the absolute humidity of the measurement gas produced in this way, a sensor for the sensory test was performed by setting the zero value of the gas concentration detection sensor in which the organic film of the bimolecular structure was attached to the crystal oscillator. It is possible to continuously measure the value corresponding to the measured odor concentration. If a gas concentration detection sensor and a reference sensor are installed in the measurement unit, continuous measurement is possible at all times, and if a reference sensor is not installed, intermittent continuous measurement according to the measurement program will be performed. Measure the gas temperature at 15 ℃
Or, the significance of setting to 25 ° C is that the measured value of sulfurous acid gas is 15
The measured value at 25 ° C. has a significant meaning because the measured value in terms of ° C. is specified and the human sense of smell is the most sensitive around 25 ° C. Furthermore, some so-called lipid bilayer membrane sensors in which an organic membrane having a bimolecular structure is attached to a crystal oscillator have a temperature variation point near 30 ° C.
This is because it is desirable to apply the temperature below ° C.

【0006】第2の方法は、任意の温度・湿度をもった
測定ガスの絶対湿度と等しい標準空気を造る方法であ
る。半導体センサーを用いる場合は特に温度制限がな
い。したがって、この場合は測定ガスをなんら変化させ
ることなく、標準空気の温度・湿度を測定ガスの温度・
湿度に変換する方法である。標準空気を造る方法は第1
の方法と全く同じであり、異なる点は恒温槽の温度を測
定ガスの温度に等しく制御することである。また、第1
の方法では測定ガスを恒温槽に導き、恒温槽の温度にお
ける相対湿度の測定が必要であったが、第2の方法で
は、測定ガスを直接測定部に導くことである。したがっ
て、測定ガスの温度・湿度の測定は測定部において測定
してもよく、また全く別の場所例えばガスの発生源で測
定してもよい。第2の方法においても、リファレンスセ
ンサーを設ける場合は常時連続測定が可能であり、リフ
ァレンスセンサーを設置しない場合はプログラムにした
がった間欠連続測定となる。
The second method is a method of producing standard air having an absolute humidity equal to that of a measurement gas having an arbitrary temperature and humidity. There is no particular temperature limit when using a semiconductor sensor. Therefore, in this case, the temperature / humidity of the standard air is not changed and the temperature / humidity of the standard gas is
It is a method of converting to humidity. The first method to create standard air
The method is exactly the same as that of the above method except that the temperature of the constant temperature bath is controlled to be equal to the temperature of the measurement gas. Also, the first
In the method (1), the measurement gas was introduced into the constant temperature bath, and the relative humidity at the temperature of the constant temperature bath had to be measured. Therefore, the temperature / humidity of the measurement gas may be measured at the measurement unit or at a completely different place, for example, at the gas generation source. Also in the second method, continuous measurement is always possible when the reference sensor is provided, and intermittent continuous measurement according to the program is performed when the reference sensor is not installed.

【0007】[0007]

【実施例】本発明の実施例を図によって説明すると、1
図はガス濃度検出センサーが水晶発振子に二分子構造の
有機膜を添着したセンサーで構成され、かつガス濃度が
官能試験で測定される臭気濃度に対応する値を測定する
公害ガスの連続測定システムを示す。
Embodiments of the present invention will be described with reference to the drawings.
The figure shows a gas concentration detection sensor consisting of a crystal oscillator with an organic film of bimolecular structure attached, and a continuous measurement system for pollution gas that measures the gas concentration corresponding to the odor concentration measured by sensory test. Indicates.

【0008】2図は恒温槽5の温度を測定ガスの温度と
等しく制御する場合の公害ガスの連続測定方システムを
示す。
FIG. 2 shows a pollution gas continuous measuring system for controlling the temperature of the thermostatic chamber 5 to be equal to the temperature of the measuring gas.

【0009】1図において、測定ガスはガス吸引ポンプ
11によって前処理部1の測定ガス接続口20より系内
に流入し、15℃又は25℃の一定の温度に保持された
恒温槽5を通過する間に15℃又は25℃に調整され、
温湿度センサー10によって相対湿度ψ%が測定され
る。一方、原料空気はエアポンプ14によって空気取入
接続口21より系内に流入しエアフィルター13を通過
したのち恒温槽5に設けられたシリカゲル充填槽3及び
増湿槽4に送られる。シリカゲル充填槽では乾燥空気が
造られ、増湿槽では飽和空気がつくられる。乾燥空気と
飽和付空気の割合は流量制御器6によって(1−ψ/1
00)とψ/100の割合で制御され、混合槽7で均一
に混合され測定ガスの絶対湿度と常に等しい絶対湿度の
標準空気がつくられ測定部2に送られる。
In FIG. 1, the measurement gas is introduced into the system through the measurement gas connection port 20 of the pretreatment unit 1 by the gas suction pump 11 and passes through the constant temperature bath 5 maintained at a constant temperature of 15 ° C. or 25 ° C. Is adjusted to 15 ℃ or 25 ℃ during
The relative humidity ψ% is measured by the temperature / humidity sensor 10. On the other hand, the raw material air flows into the system from the air intake connection port 21 by the air pump 14, passes through the air filter 13, and is then sent to the silica gel filling tank 3 and the humidity increasing tank 4 provided in the constant temperature tank 5. Dry air is produced in the silica gel filled tank, and saturated air is produced in the humidification tank. The ratio of the dry air and the saturated air is calculated by the flow controller 6 (1-ψ / 1
00) and ψ / 100, mixed uniformly in the mixing tank 7 and standard air having an absolute humidity which is always equal to the absolute humidity of the measurement gas is created and sent to the measuring unit 2.

【0010】測定部2においては、ゼロ値設定・洗浄工
程と測定工程の2工程に分けられる。
The measuring unit 2 is divided into two processes, a zero value setting / cleaning process and a measuring process.

【0011】ゼロ値設定・洗浄工程ではガス吸引ポンプ
11及び12が作動すると、電磁弁15、17及び19
が開き電磁弁16及び18は閉じた状態になる。前処理
部1でつくられた測定ガスと絶対湿度の等しい標準空気
はガス濃度検出センサー8及びリファレンスセンサー9
に送られ各センサーを洗浄したのち、ガス吸引ポンプ1
2によって系外に排出される。
In the zero value setting / cleaning process, when the gas suction pumps 11 and 12 are operated, the solenoid valves 15, 17 and 19 are operated.
Is opened and the solenoid valves 16 and 18 are closed. The standard air having the same absolute humidity as the measurement gas produced by the pretreatment unit 1 is the gas concentration detection sensor 8 and the reference sensor 9.
To the gas suction pump 1 after cleaning each sensor.
It is discharged out of the system by 2.

【0012】測定工程ではカス吸引ポンプ11は停止、
ガス吸引ポンプ12が作動している。電磁弁15、17
及び19は閉じ、電磁弁16及び18が開く。測定ガス
の絶対湿度と等しい標準空気はエアポンプ14によって
リファレンスセンサー9、電磁弁18を経由して系外に
排出される。測定ガスはガス吸引ポンプ12によって電
磁弁16、ガス濃度検出センサー8を経由して系外に排
出される。
In the measuring process, the dust suction pump 11 is stopped,
The gas suction pump 12 is operating. Solenoid valve 15, 17
And 19 are closed and solenoid valves 16 and 18 are open. The standard air having the same absolute humidity as the measurement gas is discharged from the system by the air pump 14 via the reference sensor 9 and the solenoid valve 18. The measurement gas is discharged to the outside of the system by the gas suction pump 12 via the electromagnetic valve 16 and the gas concentration detection sensor 8.

【0013】第1の方法を用いて測定した結果を表1に
示す。
Table 1 shows the results measured by the first method.

【0014】[0014]

【表1】 [Table 1]

【0015】第2図において半導体センサーを用いる場
合、測定部2はゼロ値設定工程、測定工程及びパージ工
程の3工程に分かれる。
When a semiconductor sensor is used in FIG. 2, the measuring section 2 is divided into three steps, a zero value setting step, a measuring step and a purging step.

【0016】ゼロ値設定工程では、電磁弁16、17及
び19が開き、電磁弁15及び18は閉じた状態とな
る。ガス吸引ポンプ11及び12が作動する。測定ガス
はガス吸引ポンプ11によって測定ガス接続口20より
系内に流入し、電磁弁17を経由して温湿度センサー1
0によって温度・湿度が測定されたのち系外に排出され
る。なお温湿度センサーは必ずしも測定部2に設置され
る必要はなく、全く別の場所ガス発生源等に設置されて
いてもよい。測定された温度・湿度は電気信号として前
処理部1に伝達される。前処理部1では 測定ガスの温
度と等しくなるよう恒温槽5の温度が制御され、同時に
測定ガスの相対湿度ψ%にしたがって乾燥空気と飽和空
気の量が(1−ψ/100)とψ/100の割合で流量
制御器6によって制御され混合槽7で均一に混合されて
測定ガスの絶対湿度と等しい標準空気が造られ 測定部
2へ送られ、電磁弁16、ガス濃度検知センサー8、電
磁弁19を経由して系外に排出される。
In the zero value setting step, the solenoid valves 16, 17 and 19 are opened and the solenoid valves 15 and 18 are closed. The gas suction pumps 11 and 12 operate. The measurement gas flows into the system from the measurement gas connection port 20 by the gas suction pump 11, and passes through the electromagnetic valve 17 to detect the temperature / humidity sensor 1.
The temperature and humidity are measured by 0 and then discharged to the outside of the system. The temperature / humidity sensor does not necessarily have to be installed in the measurement unit 2, and may be installed in a completely different place such as a gas generation source. The measured temperature and humidity are transmitted to the preprocessing unit 1 as an electric signal. In the pretreatment unit 1, the temperature of the constant temperature bath 5 is controlled to be equal to the temperature of the measurement gas, and at the same time, the amounts of dry air and saturated air are (1-ψ / 100) and ψ / according to the relative humidity ψ% of the measurement gas. The standard air, which is controlled by the flow rate controller 6 at a ratio of 100, is uniformly mixed in the mixing tank 7 and is equal to the absolute humidity of the measurement gas, and is sent to the measurement unit 2. It is discharged to the outside of the system via the valve 19.

【0017】測定工程では ガス吸引ポンプ11及びエ
アポンプ14は停止し、ガス吸引ポンプ12が作動す
る。電磁弁16、17及び18は閉じ、電磁弁15及び
19は開いた状態となる。測定ガスはガス吸引ポンプ1
2によって、電磁弁15、19を経由して系外に排出さ
れる。
In the measuring process, the gas suction pump 11 and the air pump 14 are stopped and the gas suction pump 12 is operated. The solenoid valves 16, 17 and 18 are closed, and the solenoid valves 15 and 19 are open. The measurement gas is a gas suction pump 1
2 is discharged to the outside of the system via the solenoid valves 15 and 19.

【0018】パージ工程ではガス吸引ポンプ11及び1
2は停止し、エアポンプ14が作動する。電磁弁15、
17及び19が閉じ、電磁弁16及び18が開いた状態
となる。前処理部1では飽和空気の流量が流量制御器6
によりゼロとなり、すべての流量が乾燥空気として製造
され、測定部2に送られ、電磁弁16、ガス濃度検知セ
ンサー8、電磁弁18を経由して系外に排出される。リ
ファレンスセンサー9を設置する場合は常時連続測定が
可能であり、リファレンスセンサーを設置しない場合は
測定プログラムによる間欠連続測定となる。
In the purging process, the gas suction pumps 11 and 1
2 is stopped and the air pump 14 is activated. Solenoid valve 15,
17 and 19 are closed, and the solenoid valves 16 and 18 are open. In the pretreatment unit 1, the saturated air flow rate is controlled by the flow rate controller 6
Becomes zero, all the flow rates are manufactured as dry air, sent to the measurement unit 2, and discharged to the outside of the system via the solenoid valve 16, the gas concentration detection sensor 8, and the solenoid valve 18. When the reference sensor 9 is installed, continuous measurement is possible at all times, and when the reference sensor is not installed, intermittent continuous measurement by the measurement program is performed.

【0019】[0019]

【作用】前処理部1を設けることにより常に測定ガスの
絶対湿度と等しい標準空気が製造でき、測定ガス中の水
分を自動補正できる。前処理部におけるシリカゲル充填
槽は湿度ゼロの乾燥空気をつくる作用し、増湿槽は飽和
湿度の空気をつくる作用をする。恒温槽は取入空気を測
定ガスの温度と等しくする作用があり、流量制御器は測
定ガスの絶対湿度と等しい標準空気を製造するための混
合割合を決める作用があり、混合槽は測定ガスの絶対湿
度と等しい標準空気をつくる作用がある。また、恒温槽
の温度を15℃の一定の温度に制御し測定ガスの温度を
15℃にすることは亜硫酸ガスの測定値が常に15℃に
換算した値を求める規定に対応できる作用がある。また
恒温槽の温度を25℃の一定の温度に制御し、測定ガス
の温度を25℃にすることは官能試験で臭気を最も鋭敏
に感じる温度であり、かつガス濃度検出センサーとして
水晶発振子に二分子構造の有機膜を添着したセンサーを
用いることは、官能試験で測定される臭気濃度に対応す
る値が得られる作用をする。
By providing the pretreatment section 1, standard air having the same absolute humidity as the measuring gas can always be produced, and the water content in the measuring gas can be automatically corrected. The silica gel-filled tank in the pretreatment section acts to create dry air with zero humidity, and the humidification tank acts to create air with saturated humidity. The constant temperature tank has the function of making the intake air equal to the temperature of the measurement gas, the flow rate controller has the function of determining the mixing ratio for producing standard air that is equal to the absolute humidity of the measurement gas, and the mixing tank has the function of mixing the measurement gas. It has the effect of creating standard air equal to absolute humidity. Further, controlling the temperature of the constant temperature bath to be a constant temperature of 15 ° C. and setting the temperature of the measuring gas to 15 ° C. has an effect of being able to comply with the regulation for obtaining a value in which the measured value of sulfurous acid gas is always converted to 15 ° C. In addition, controlling the temperature of the constant temperature bath at a constant temperature of 25 ° C and setting the temperature of the measurement gas to 25 ° C is the temperature at which the odor is most sensitively detected in the sensory test, and the crystal oscillator is used as a gas concentration detection sensor. The use of the sensor attached with the bilayer organic film serves to obtain a value corresponding to the odor concentration measured by the sensory test.

【0020】[0020]

【効果】測定ガスの水分に影響されない公害ガスの連続
測定が可能となる。
[Effect] The pollution gas can be continuously measured without being affected by the moisture content of the measurement gas.

【0021】[0021]

【図面の簡単な説明】[Brief description of drawings]

【図1】水晶発振子に二分子構造の有機膜を添着したセ
ンサーを用い、官能試験で測定される臭気濃度に対応す
る値を測定する公害ガスの連続測定方システムである。
FIG. 1 is a pollution gas continuous measurement system for measuring a value corresponding to an odor concentration measured by a sensory test using a sensor in which a bilayer organic film is attached to a crystal oscillator.

【図2】半導体センサを利用し測定ガスの水分に影響さ
れない公害ガスの連続測定システムである。
FIG. 2 is a pollution gas continuous measurement system that uses a semiconductor sensor and is not affected by moisture in the measurement gas.

【符号の説明】[Explanation of symbols]

1 前処理部 2 測定部 3 シリカゲル充填槽 4 増湿槽 5 恒温槽 6 流量制御器 7 混合槽 8 ガス濃度検知センサー 9 リファレンスセンサー 10 温湿度センサー 11 12 ガス吸引ポンプ 13 エアフィルター 14 エアポンプ 15 16、17、18、19 電磁弁 20 測定ガス接続口 21 空気取入接続口 22 連絡配管 1 Pretreatment part 2 Measuring part 3 Silica gel filling tank 4 Humidification tank 5 Constant temperature tank 6 Flow controller 7 Mixing tank 8 Gas concentration detection sensor 9 Reference sensor 10 Temperature / humidity sensor 11 12 Gas suction pump 13 Air filter 14 Air pump 15 16, 17, 18, 19 Solenoid valve 20 Measurement gas connection port 21 Air intake connection port 22 Communication pipe

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 測定ガスの絶対湿度と等しい絶対湿度を
もった空気を製造するための前処理部1と測定ガスのガ
ス濃度を検出する測定部2で構成されることを特徴とし
た公害ガスの連続測定システム。
1. A pollution gas comprising a pretreatment unit 1 for producing air having an absolute humidity equal to the absolute humidity of the measurement gas and a measurement unit 2 for detecting the gas concentration of the measurement gas. Continuous measurement system.
【請求項2】 前処理部1は乾燥空気を製造するシリカ
ゲル充填槽3、飽和湿度の空気を製造する増湿槽4、温
度を一定に保つための恒温槽5、乾燥空気と飽和湿度の
空気の量を制御する流量制御器6ならびに乾燥空気と飽
和湿度の空気を均一に混合する混合槽7で構成され、シ
リカゲル充填槽3で造られる乾燥空気の量と増湿槽4で
造られる飽和湿度の空気の量の混合割合が測定ガスの相
対湿度をψ%とするとき流量制御器6によって(1−ψ
/100)とψ/100の割合で自動制御され、混合槽
7で均一に混合されたのち、測定部2に設けられたガス
濃度検知センサー8に送られることを特徴とした請求項
1記載の公害ガスの連続測定システム。
2. The pretreatment unit 1 comprises a silica gel filling tank 3 for producing dry air, a humidification tank 4 for producing air of saturated humidity, a constant temperature bath 5 for keeping a constant temperature, dry air and air of saturated humidity. Flow rate controller 6 for controlling the amount of dry air and a mixing tank 7 for uniformly mixing dry air and air of saturated humidity, and the amount of dry air created in the silica gel filling tank 3 and the saturated humidity created in the humidification tank 4. When the mixing ratio of the amount of the air is set to ψ% as the relative humidity of the measurement gas, the flow rate controller 6 determines (1-ψ
/ 100) and ψ / 100 are automatically controlled, and after being uniformly mixed in the mixing tank 7, the gas is sent to the gas concentration detection sensor 8 provided in the measuring unit 2. Continuous pollution gas measurement system.
【請求項3】 前処理部1の恒温槽5の温度が15℃又
は25℃の一定の温度に制御されることを特徴とした請
求項2記載の公害ガスの連続測定システム。
3. The pollution gas continuous measuring system according to claim 2, wherein the temperature of the constant temperature bath 5 of the pretreatment section 1 is controlled to a constant temperature of 15 ° C. or 25 ° C.
【請求項4】 測定部2のガス濃度検知センサー8が水
晶発振子に二分子構造の有機膜を添着したセンサーで構
成され、かつガス濃度が官能試験で測定される臭気濃度
に対応する値を測定することを特徴とした請求項3記載
の公害ガスの連続測定システム。
4. The gas concentration detection sensor 8 of the measuring unit 2 is constituted by a sensor in which a bimolecular organic film is attached to a crystal oscillator, and the gas concentration has a value corresponding to the odor concentration measured by a sensory test. The continuous measurement system for pollutant gas according to claim 3, wherein the measurement is performed.
【請求項5】 前処理部1の恒温槽5の温度が測定ガス
の温度と等しく制御されることを特徴とした請求項2記
載の公害ガスの連続測定システム。
5. The pollution gas continuous measuring system according to claim 2, wherein the temperature of the constant temperature bath 5 of the pretreatment unit 1 is controlled to be equal to the temperature of the measuring gas.
JP30728991A 1991-09-10 1991-09-10 Continuous measurement system for polution gas Pending JPH0572094A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30728991A JPH0572094A (en) 1991-09-10 1991-09-10 Continuous measurement system for polution gas

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30728991A JPH0572094A (en) 1991-09-10 1991-09-10 Continuous measurement system for polution gas

Publications (1)

Publication Number Publication Date
JPH0572094A true JPH0572094A (en) 1993-03-23

Family

ID=17967344

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30728991A Pending JPH0572094A (en) 1991-09-10 1991-09-10 Continuous measurement system for polution gas

Country Status (1)

Country Link
JP (1) JPH0572094A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07198641A (en) * 1993-12-27 1995-08-01 Agency Of Ind Science & Technol Method of identifying chemical/physical value and device therefor
WO2003106975A1 (en) * 2002-05-28 2003-12-24 ソニー株式会社 Gas detection device
JP2006030167A (en) * 2004-06-15 2006-02-02 Seiko Instruments Inc Microchip system
CN104267018A (en) * 2014-10-27 2015-01-07 武汉四方光电科技有限公司 Method for processing gas concentration signal in Raman gas analyzer
CN108627413A (en) * 2017-03-17 2018-10-09 太阳诱电株式会社 Detecting element and detection device
WO2020065982A1 (en) * 2018-09-28 2020-04-02 日本電気株式会社 Measurement apparatus and measurement method
WO2021172504A1 (en) * 2020-02-27 2021-09-02 パナソニックIpマネジメント株式会社 Gas detection system and control method for gas detection system
WO2021241244A1 (en) * 2020-05-29 2021-12-02 I-Pex株式会社 Odor detection device, odor detection method, and program

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07198641A (en) * 1993-12-27 1995-08-01 Agency Of Ind Science & Technol Method of identifying chemical/physical value and device therefor
WO2003106975A1 (en) * 2002-05-28 2003-12-24 ソニー株式会社 Gas detection device
US7216527B2 (en) 2002-05-28 2007-05-15 Sony Corporation Gas detection device
JP2006030167A (en) * 2004-06-15 2006-02-02 Seiko Instruments Inc Microchip system
CN104267018A (en) * 2014-10-27 2015-01-07 武汉四方光电科技有限公司 Method for processing gas concentration signal in Raman gas analyzer
CN108627413A (en) * 2017-03-17 2018-10-09 太阳诱电株式会社 Detecting element and detection device
WO2020065982A1 (en) * 2018-09-28 2020-04-02 日本電気株式会社 Measurement apparatus and measurement method
JPWO2020065982A1 (en) * 2018-09-28 2021-09-24 日本電気株式会社 Measuring device and measuring method
WO2021172504A1 (en) * 2020-02-27 2021-09-02 パナソニックIpマネジメント株式会社 Gas detection system and control method for gas detection system
WO2021241244A1 (en) * 2020-05-29 2021-12-02 I-Pex株式会社 Odor detection device, odor detection method, and program
JP2021189170A (en) * 2020-05-29 2021-12-13 I−Pex株式会社 Smell detection device, smell detection method, and program
JP2021189162A (en) * 2020-05-29 2021-12-13 I−Pex株式会社 Smell detection device, smell detection method, and program

Similar Documents

Publication Publication Date Title
US5024756A (en) Dialysis system and method therefor
EP2217919B1 (en) Method and device for detecting the composition of gas mixtures
JPH03115840A (en) Method and apparatus for determining speed at which sample consumes of makes selected component of fluid medium
JPS6291861A (en) On-line calibrating apparatus for chemical monitor
JPH0572094A (en) Continuous measurement system for polution gas
JP2005189146A (en) Volatile sulfide sensor and detection method
JP2002350299A (en) Odor measurement method and device
JPH07174674A (en) Apparatus for generating standard gas for calibration
JPH05107167A (en) System and device for measuring odorous gas
JPH0599868A (en) Measurement system and device of organoleptic value
EP1099949B1 (en) Device for measuring gases with odors
EP0698778B1 (en) A small gas component addition apparatus
CN108414687A (en) The device and monitoring water environment method of real time on-line monitoring aquatile CO2 excretion rates
JPH0545260A (en) System and device for manufacture of standard air for odor gas analysis
JPH02115743A (en) Odor gas measuring device
JPH04329337A (en) Measuring method for gas permeability of film
JPH11125613A (en) Odor-measuring device
JP2542604B2 (en) Alcohol concentration measuring device
JPH10153562A (en) Odor detecting apparatus
JPH0249654B2 (en)
JPH0116049Y2 (en)
JPS5924989Y2 (en) plant testing equipment
CN85106179A (en) Measure the steam breathability of material
US4469439A (en) Process and apparatus for plotting the oxygen equilibrium curves of blood or hemoglobin solutions
JPH0521505B2 (en)