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JPH0553057B2 - - Google Patents

Info

Publication number
JPH0553057B2
JPH0553057B2 JP27759785A JP27759785A JPH0553057B2 JP H0553057 B2 JPH0553057 B2 JP H0553057B2 JP 27759785 A JP27759785 A JP 27759785A JP 27759785 A JP27759785 A JP 27759785A JP H0553057 B2 JPH0553057 B2 JP H0553057B2
Authority
JP
Japan
Prior art keywords
wafer
polishing
cutting
back surface
mirror
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP27759785A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62136032A (ja
Inventor
Takaaki Negoro
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohm Co Ltd
Original Assignee
Rohm Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm Co Ltd filed Critical Rohm Co Ltd
Priority to JP27759785A priority Critical patent/JPS62136032A/ja
Publication of JPS62136032A publication Critical patent/JPS62136032A/ja
Publication of JPH0553057B2 publication Critical patent/JPH0553057B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Weting (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
JP27759785A 1985-12-09 1985-12-09 半導体ウエハ−の裏面加工方法 Granted JPS62136032A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27759785A JPS62136032A (ja) 1985-12-09 1985-12-09 半導体ウエハ−の裏面加工方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27759785A JPS62136032A (ja) 1985-12-09 1985-12-09 半導体ウエハ−の裏面加工方法

Publications (2)

Publication Number Publication Date
JPS62136032A JPS62136032A (ja) 1987-06-19
JPH0553057B2 true JPH0553057B2 (fr) 1993-08-09

Family

ID=17585663

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27759785A Granted JPS62136032A (ja) 1985-12-09 1985-12-09 半導体ウエハ−の裏面加工方法

Country Status (1)

Country Link
JP (1) JPS62136032A (fr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01235699A (ja) * 1988-03-17 1989-09-20 Oki Electric Ind Co Ltd Icカード及びicチップの製造方法
JP2766417B2 (ja) * 1992-02-10 1998-06-18 三菱マテリアル株式会社 貼り合わせ誘電体分離ウェーハの製造方法
US6582281B2 (en) * 2000-03-23 2003-06-24 Micron Technology, Inc. Semiconductor processing methods of removing conductive material
JP4935212B2 (ja) * 2006-07-13 2012-05-23 セイコーエプソン株式会社 腕時計
JP5743800B2 (ja) * 2011-08-15 2015-07-01 新日鉄住金マテリアルズ株式会社 SiCウェハの製造方法

Also Published As

Publication number Publication date
JPS62136032A (ja) 1987-06-19

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees