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JPH05508744A - A method for moving a product having a plurality of pores during its wet chemical treatment, for example during electroplating, and an apparatus for carrying out the method - Google Patents

A method for moving a product having a plurality of pores during its wet chemical treatment, for example during electroplating, and an apparatus for carrying out the method

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Publication number
JPH05508744A
JPH05508744A JP91511324A JP51132491A JPH05508744A JP H05508744 A JPH05508744 A JP H05508744A JP 91511324 A JP91511324 A JP 91511324A JP 51132491 A JP51132491 A JP 51132491A JP H05508744 A JPH05508744 A JP H05508744A
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Prior art keywords
product
vibration
processing
motion
frequency
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Japanese (ja)
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ヴァン ケムペン,ジョス
プレール,カール―ハインツ
Original Assignee
アトテク ドイチュラント ゲゼルシャフト ミット ベシュレンクテル ハフツング
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Publication of JPH05508744A publication Critical patent/JPH05508744A/en
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Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0085Apparatus for treatments of printed circuits with liquids not provided for in groups H05K3/02 - H05K3/46; conveyors and holding means therefor
    • H05K3/0088Apparatus for treatments of printed circuits with liquids not provided for in groups H05K3/02 - H05K3/46; conveyors and holding means therefor for treatment of holes
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00Processes for servicing or operating cells for electrolytic coating
    • C25D21/10Agitating of electrolytes; Moving of racks
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/20Electroplating using ultrasonics, vibrations

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Coating With Molten Metal (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるため要約のデータは記録されません。 (57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 複数の孔を有する被処理製品をその湿式化学地理時、例えば電気メツキ時に運動 させる方法並びに該方法を実施する装置 [技術分野] 本発明は先ず第1に、請求の範囲の請求項1に上位概念として記載した形式の方 法に関するものである。[Detailed description of the invention] A workpiece with multiple pores is moved during its wet chemical process, e.g. during electroplating. method and apparatus for carrying out the method [Technical field] First of all, the present invention is directed to the form described as a generic concept in claim 1 of the claims. It is about law.

[背景技術] 従来は、処理ステーション(処理浴)内に被処理製品が滞在している間に、処理 浴槽に沿ってガイドされたロッドによって製品支持体を介して被処理製品を製品 平面に対して垂直に2X10〜2x40mmのストローク長及び毎分当り約20 ダブルストロークで往復運動させるようにして処理が施されていた。この「製品 運動」によって被処理製品、特にプリント配線板のようなプレート状製品の複数 の孔から残滓を洗浄除去し、かつ特に、化学処理に基づいて前記孔内で生成した 気泡を除去することが講じられてきた。[Background technology] Conventionally, processing was performed while the product remained in the processing station (processing bath). The product to be processed is transferred through the product support by a rod guided along the bath. Stroke length perpendicular to the plane from 2x10 to 2x40mm and about 20 per minute The processing was done by making it reciprocate with a double stroke. This product Multiple products to be processed, especially plate-like products such as printed wiring boards, by "motion" cleaning the pores of the residues and, in particular, the residues formed in said pores based on chemical treatment. Efforts have been made to remove air bubbles.

しかしながら前記公知の方法上の手段によっては往々にして不充分であり、かつ 、プレート肉厚(特にプリント配線板の肉厚)と孔径との比が8:1の値を上回 る(いわゆる縦横比が8+1より大である)場合には特に不充分であることが判 った。However, the known methodological measures mentioned above are often insufficient and , the ratio of plate thickness (especially printed wiring board thickness) to hole diameter exceeds a value of 8:1. It has been found that this is particularly insufficient when the so-called aspect ratio is greater than 8+1. It was.

直流電源と接続されていて鋼層でコーティングされたプレートをその平面の方向 で上下運動させることは米国特許第4875982号明細書に基づいて公知であ る。しかしながら前記の運動は、プリント配線板の孔をサクションスリットの前 にもたらして、ポンプによって被処理製品の孔を通して電解液を通流させるため に役立つにすぎない。この公知の手段は従って、請求項1に記載した本発明の手 段及びその他の特徴、特に請求項8に記載した方法上の手段と、いかなる接触点 も有していない、また米国特許第3461045号明細書には、複数の穴を有す るワックスから成る鋳型の運動法が記載されており、該鋳型は電解液内で毎分当 り約5振動で往復運動を行なう、この振動は前記公知の製品運動に関するものに すぎないばかりでなく、先行技術として前に説明したものよりも更に低い周波数 を有している。従ってこの第2の公知文献に基づいても本発明は容易に推考する ことができない、ドイツ連邦共和国特許出願公開第3195313号明細書には 、電気メッキを施すべきプレートの表面に付着している気泡を遊離するための揺 振運動法が記載されている。しかしながらこの公知文献では、被処理プレートの 複数の孔の縦軸線の方向に揺振運動させることによって後述の本発明の意味合い で孔を通して電解液を適正に通流させるようにするための示唆は全く開示されて いない。A plate coated with a steel layer connected with a DC power source in the direction of its plane It is known from U.S. Pat. No. 4,875,982 to move up and down with Ru. However, the above movement causes the hole in the printed wiring board to to flow the electrolyte through the pores of the product to be treated by a pump. It is only useful. This known measure therefore provides the means of the invention as defined in claim 1. Any points of contact with the steps and other features, in particular the method measures defined in claim 8. Also, U.S. Pat. No. 3,461,045 describes A method of moving a mold made of wax is described, in which the mold is moved every minute in an electrolyte. This vibration is similar to that related to the known product movement mentioned above. Not only is the frequency even lower than that previously discussed as prior art. have. Therefore, the present invention can be easily deduced based on this second known document. According to German Patent Application No. 3195313, it is not possible to do so. , shaking to release air bubbles adhering to the surface of the plate to be electroplated. The shaking motion method is described. However, in this known document, the plate to be processed is The meaning of the present invention, which will be described later, is achieved by making an oscillating movement in the direction of the longitudinal axis of the plurality of holes. No suggestions are disclosed for allowing proper flow of electrolyte through the holes. not present.

[発明の開示] 本発明が解決しようとする第1の課題もしくは設定問題点は、請求項1に上位概 念として記載した形式の方法上の手段を改良して、孔から残滓及び気泡を除去す るためにはプレート肉厚と孔径の比が好ましくない場合(例えば縦横比8:1の 場合)でも特に、なお残存している残滓及び/又は気泡を確実に除去できるよう にすることである。この場合特に、HARB (高縦横比ボード)という略語で 公知になっているような、複数の孔を有するプリント配線板の処理が考慮されて いる。更に課題としては、孔内部における処理液の交替の改善が挙げられる。[Disclosure of invention] The first problem or set problem to be solved by the present invention is summarized in claim 1. As a precaution, methodological measures of the type described may be modified to remove debris and air bubbles from the pores. In order to ), in particular to ensure that any remaining residue and/or air bubbles are removed. It is to do so. In this case, especially the abbreviation HARB (high aspect ratio board) The processing of printed wiring boards with multiple holes, as is known, is taken into consideration. There is. Another challenge is to improve the exchange of processing liquid inside the pores.

請求項1に記載の上位概念を出発点とする本発明はまず前記課題を、請求項1に 特徴部分として記載した構成手段によって解決する。縦横比が8:lよりも大で あっても前記課題が被処理製品の揺振運動によって解決されるのは明らかである 。揺振周波数は少なくとも請求項1に記載した値を有していなければならない。The present invention, starting from the generic concept set forth in claim 1, first solves the above problem in claim 1. This problem is solved by the configuration means described as the characteristic part. The aspect ratio is greater than 8:l Even if there is, it is clear that the above problem can be solved by shaking the product to be processed. . The oscillation frequency must have at least the value stated in claim 1.

これに対比して揺振周波数は著しく高くてもよい0本発明の有利な実施態様では 揺振周波数は50Hzである。この揺振運動の振幅は比較的小さい、該振幅の大 きさは原則として最大2mmであるが、場合によっては、もっと大きく、すなわ ち最大的3mmであってもよい、この場合被処理製品の孔内では処理液の強力な 交替が行われる。電気−化学的な処理工程から生じた気泡は孔の通路から除去さ れる。揺振運動は被処理製品と、該製品を支持する部材とにのみ作用して、装置 の定置常設構成部分には作用しないようにするのが有利である。In contrast, the oscillation frequency may be significantly higher. The oscillation frequency is 50Hz. The amplitude of this oscillating motion is relatively small; In principle, the maximum size is 2 mm, but in some cases it may be larger, i.e. The maximum diameter may be 3 mm. In this case, the processing liquid is powerful inside the pores of the product A change will take place. Air bubbles resulting from the electro-chemical process are removed from the pore passages. It will be done. The shaking motion acts only on the product to be processed and the members supporting the product, and the device Advantageously, no permanent components of the device are affected.

本発明の作用効果を助成するために、請求項2乃至9に記載した1つ又は複数の 方法上の手段を組合せることが可能である。In order to enhance the effects of the present invention, one or more of the It is possible to combine methodological measures.

請求項2に記載したように被処理製品を回動又は旋回することによって、該被処 理製品の孔の縦軸線と揺振運動方向との間の角度が変化される。この角度変化に よって孔からの気泡の除去が促進される。更に又これによって、相互間隔をおい て配置されたプレート状の被処理製品部分間における処理液の交替が促進され、 その結果孔内における処理液の交替も一層促進される。By rotating or rotating the product to be treated as described in claim 2, the product to be treated can be The angle between the longitudinal axis of the hole in the product and the direction of the rocking motion is changed. This angle change This facilitates the removal of air bubbles from the pores. Furthermore, this also allows for mutual spacing. The exchange of the processing liquid between the plate-shaped parts of the product to be processed is promoted. As a result, replacement of the processing liquid within the hole is further promoted.

前記の利点又は効果は、請求項3に記載した方法上の手段によっても得られる。The aforementioned advantages or effects are also obtained by the method measures defined in claim 3.

この場合傾斜位置は、所期の結果に応じて種々異なった角度で選ぶことができる 。In this case, the tilt position can be chosen at different angles depending on the desired result. .

例えば孔の縦軸線がほぼ垂直に凰びていてほぼ該縦軸線の方向に揺振運動を発生 させる場合には、処理液内における気泡の浮力が最大限に活用され、これによっ て孔壁から気泡は特に容易に分離される。For example, the vertical axis of the hole extends almost vertically, and the oscillating motion occurs approximately in the direction of the vertical axis. In this case, the buoyancy of air bubbles in the processing liquid is utilized to the maximum extent Air bubbles are particularly easily separated from the pore walls.

請求項4に記載した手段も同様に、被処理製品の当該表面又は孔壁からの気泡の 剥離を容易にする。同等のことは請求項5及び6に記載した方法上の手段につい ても該当する。異なった周波数帯域を通過させることは、気泡の分離のために特 に有利と判った。Similarly, the means described in claim 4 also eliminates air bubbles from the surface or pore walls of the product to be treated. Makes peeling easier. Equivalents apply to the methodological means recited in claims 5 and 6. This also applies. Passing different frequency bands is especially useful for bubble separation. It was found to be advantageous.

請求項8及び9に記載した方法上の手段は、本発明の新規な揺振運動と、背景技 術の説明において述べたそれ自体公知の例えば毎分当り20ダブルストローク及 び例えば2XIQ〜2x40mmの適当な振幅値の緩慢な往復運動(「製品運動 」)との組合せを含んでいる。The method measures as set forth in claims 8 and 9 are based on the novel oscillating movement of the present invention and the background art. For example, 20 double strokes per minute and and slow reciprocating motion (“product movement”) with suitable amplitude values, e.g. 2XIQ to 2x40mm. ”).

本発明が解決しようとする第2の課題又は設定問題点は、すでに述べた請求項1 〜9に記載した方法を実施するための装置を提供することであり、しかも背景技 術の説明で述べた欠点を排除すると共に、本発明の揺振運動が処理装置の定置常 設部分、特に処理浴槽、に伝達するのを充分に回避することである。The second problem or set problem to be solved by the present invention is the above-mentioned claim 1. The object of the present invention is to provide an apparatus for carrying out the method described in 9. to 9. In addition to eliminating the drawbacks mentioned in the description of the technique, the oscillating motion of the present invention allows the processing device to remain stationary. The aim is to sufficiently avoid transmission to the equipment, especially the processing bath.

請求項1Oに記載の上位概念を出発点とする本発明はまず前記課題を、請求項1 0に特徴部分として記載した構成手段によって解決する。先に述べた方法に相応 して振動発生器の位置を規定することによって、該振動発生器の振動は殆ど専ら 被処理製品にだけ到達し、しかも処理装置の定置常設部分、特に処理浴槽、には 全く又は僅かしか伝達されない、請求JJ!!1に記載した思想に相応して、振 動発生器によって惹起される振動の主たる方向は、被処理製品の孔の方向に延び 、すなわち振動発生器は被処理製品の取付は機構又は支持機構に対して、被処理 製品の孔の縦軸線の方向に振動するように配置される。この場合例えば処理ケー ジなどを用いて、すでに説明したように被処理製品を回動することにより、孔の 位置を絶えず変化させるような方法上の適当な手段を採用することによって、振 動方向を、孔の縦軸線に対して成る所定の角度を占めさせるようにすることも可 能である。後述の実施例の説明から一層明らかになるように、振動発生器は、製 品支持体と被処理製品との間の種々異なった部位に、例えば被処理製品部分を収 容する処理ケージの支持バー、支持架、製品支持レール及び被処理製品のその他 の保持部材又は支持部材に装着することができる。振動発生器の前記のすべての 装着態様にあっては、該振動発生器は、被処理製品の位置している構成部材に設 けられているので、該被処理製品に対して、振動を直接伝達する機械的な接点が 存在している。The present invention, starting from the generic concept set forth in claim 1O, first solves the above problem by solving the problem described in claim 1. This problem is solved by the configuration means described as a characteristic part in 0. Corresponding to the method mentioned above By defining the position of the vibration generator in such a manner that the vibration of the vibration generator is almost exclusively It reaches only the product to be treated, and does not reach the fixed and permanent parts of the treatment equipment, especially the treatment bath. Claims JJ not communicated at all or only a little! ! Corresponding to the idea described in 1. The main direction of the vibrations induced by the vibration generator extends in the direction of the holes in the product to be treated. , in other words, the vibration generator is used to attach the product to be processed to the mechanism or support mechanism. It is arranged to vibrate in the direction of the longitudinal axis of the hole in the product. In this case, for example, By rotating the product to be treated using a screwdriver, etc., as explained above, the holes are By adopting suitable methodological means such as constantly changing the position, the shaking It is also possible that the direction of movement occupies a predetermined angle with respect to the longitudinal axis of the hole. It is Noh. As will become clearer from the description of the embodiments below, the vibration generator is For example, parts of the product to be treated can be accommodated at different locations between the product support and the product to be treated. Support bars for processing cages, support racks, product support rails, and other parts for processed products It can be attached to a holding member or a supporting member. All of the above of vibration generator In the mounting mode, the vibration generator is installed on the component where the product to be treated is located. There are no mechanical contacts that directly transmit vibrations to the product being processed. Existing.

[図面の簡単な説明] 図1は一部断面して示した本発明の第1実施例の側面図である。[Brief explanation of the drawing] FIG. 1 is a side view, partially in section, of a first embodiment of the present invention.

図2は図1の矢印IIの方向に見て示した部分図である。FIG. 2 is a partial view taken in the direction of arrow II in FIG.

図3は図2の矢印IIIの方向に見て示した図である。FIG. 3 is a view taken in the direction of arrow III in FIG.

図4は図2の矢印Ivの方向に見て示した平面図である。FIG. 4 is a plan view taken in the direction of arrow Iv in FIG.

図5は付加的な接点部材を有し製品支持体の降下前の状態で示したほぼ図2に相 当する部分図である。Figure 5 is approximately similar to Figure 2 with additional contact elements and shown in the state before lowering of the product support. FIG.

図6は図5に示した製品支持体を降下させた後の状態で示した図である。FIG. 6 is a view showing the product support shown in FIG. 5 in a state after being lowered.

図7は本発明の第2実施例の側面図である。FIG. 7 is a side view of a second embodiment of the invention.

図8はプリント配線板を傾斜姿勢で装着する手段を有する支持材又は支持架材と して構成された本発明の別の実施例を示す図である。Figure 8 shows a support member or support frame member having means for mounting a printed wiring board in an inclined position. It is a figure which shows another Example of this invention comprised.

図9はプリント配線板を取外して示した図8の詳細斜視図である。FIG. 9 is a detailed perspective view of FIG. 8 with the printed wiring board removed.

図10は本発明の別の実施態様の概略的な平面図である。FIG. 10 is a schematic plan view of another embodiment of the invention.

図11は本発明の更に異なった実施態様の概略的な正面図である。FIG. 11 is a schematic front view of a further embodiment of the invention.

C発明を実施するための最良の形態コ 次に図面に基づいて本発明の実施例を詳説する。C Best Mode for Carrying Out the Invention Next, embodiments of the present invention will be explained in detail based on the drawings.

但し、著しく概略的に示した図面では本発明を説明する上で必要とする構成部分 だけが図示されているに過ぎず、本形式の湿式化学処理装置を稼働するために必 要なその他の公知の構成部分及び装置の図示は省がれている。However, the drawings shown in a highly schematic manner do not show the constituent parts necessary for explaining the present invention. These are only shown in the diagram, and are necessary to operate this type of wet chemical processing equipment. Other necessary known components and devices have been omitted from illustration.

図1には処理ステーション2の処理浴槽lが図示されており、該処理浴槽を通っ て、被処理製品3(本例では複数の孔を有するプリント配線板)が搬送方向4に 通過させられる。前記孔の図示は作図上の理由がら省かれている。該孔の縦軸線 は符号5で示したように延びている。プリント配線板3の肉厚と孔径との比は、 殊に有利には8:lよりも大である。搬送・加工方向4で原則として複数の処理 ステーション2が順次相前後して配置されている。処理液(該処理液は洗浄液で ある場合もある)は符号6で略示されている。FIG. 1 shows a processing bath l of a processing station 2, through which a The product to be processed 3 (in this example, a printed wiring board with a plurality of holes) is transported in the transport direction 4. be allowed to pass. The illustration of the holes has been omitted for drawing reasons. longitudinal axis of the hole extends as indicated by reference numeral 5. The ratio of the wall thickness of the printed wiring board 3 to the hole diameter is Particularly preferably greater than 8:l. As a general rule, multiple processing is possible in 4 transport/processing directions. Stations 2 are arranged one after the other. Processing liquid (the processing liquid is a cleaning liquid) ) is indicated schematically by the reference numeral 6.

ここに設けられている製品支持体7(図2乃至図4も参照のこと)は、製品支持 レール8と、該製品支持レールを保持する支持腕9とから成っている。該支持腕 9の上部屈曲部9′には(図面では鎖線で示したにすぎない)リフト装置lOが 係合し、該リフト装置は支持腕9のフォーク状端部9′を処理浴槽の所謂ガイド 部11から離間させ、更に被処理製品を処理浴から引出し、次の処理ステーショ ンへ移送してそこで降下させる等々の働きを有している。被処理製品が地理浴内 に位置している間(図1乃至図5並びに図8及び図9参照)、符号12で示した 振動発生器が作用する。The product support 7 provided here (see also Figures 2 to 4) is a product support It consists of a rail 8 and a support arm 9 that holds the product support rail. The support arm At the upper bending part 9' of 9, there is a lifting device lO (only shown as a chain line in the drawing). engaged, the lifting device moves the forked end 9' of the support arm 9 into a so-called guide of the treatment bath. 11, and then the product to be treated is pulled out of the treatment bath and transferred to the next treatment station. It has the function of transporting it to the station and lowering it there. The product to be processed is in a geobath (see Figures 1 to 5 and Figures 8 and 9), the A vibration generator comes into play.

図1乃至図4に示した実施例では該振動発生器12は、二重矢印13で示した方 向の#s振運動を発生する。In the embodiment shown in FIGS. 1 to 4, the vibration generator 12 is located in the direction indicated by the double arrow 13. Generates #s vibration motion in the direction.

この揺振方向は実質的に水平方向である。振動発生器12は本実施例では製品支 持レール8に装着されている。また本実施例では図2及び図4から判るように複 数基の振動発生器、本例では2基の振動発生器12が相互間隔をおいて各製品支 持レール8に設けられている。これによって各製品支持レール8の全長にわたっ て均等な揺振作用を得ることが可能である。必要とあらば、2基よりも多くの振 動発生器を製品支持レールに、場合によっては異なった相互間隔をおいて、かっ 又、製品】持し・−)+−8の1ili端に対して適当に遥A、だ間隔をおいて 配置して、振動を一緒に行なう製品支持レールにおいて所謂「振動の腹」及び[ 振動の節」が発生するのを避けるようにすることも可能であるや各製品支持レー ル8からm振運動は、略示したプリント配線板などのような被処理製品3をクラ ンプ15などによって取付けている各支持架14に伝達される。因みに振動発生 器12の型式に応じて、二重矢印13の方向に平行に延びる振動のみならず、ま た被処理製品にも伝達する振動を発生させることが可能である。This oscillation direction is substantially horizontal. The vibration generator 12 is a product support in this embodiment. It is attached to the holding rail 8. In addition, in this embodiment, as can be seen from FIGS. 2 and 4, Several vibration generators, in this example two vibration generators 12, are mounted on each product support at mutual intervals. It is provided on the holding rail 8. This extends the entire length of each product support rail 8. It is possible to obtain a uniform shaking action. If necessary, use more than two Place the dynamic generators on the product support rails, possibly at different distances from each other. Also, keep an appropriate distance from the 1ili end of the product] +-)+-8. The so-called "vibration antinode" and [ It is also possible to avoid the occurrence of "nodes of vibration" and to adjust each product support rail. 8 to m oscillatory motion is applied to a product 3 to be processed, such as a printed wiring board shown schematically. The signal is transmitted to each support frame 14 attached by a pump 15 or the like. Incidentally, vibration occurs Depending on the type of device 12, not only vibrations extending parallel to the direction of the double arrow 13 but also It is possible to generate vibrations that are also transmitted to the processed product.

本発明によって発生される揺振運動が完全に又は少な(とも大体において処理装 置の定置常設部分には伝達されないようにするために、適正な手段が講じられて いる。これは例えば、二重矢印13で示した揺振運動方向では著しく弾性的であ り、例えば特に図1から判るような薄肉横断面を有するように製品支持レール8 を構成することによって得られる。従って前記揺振運動方向に対して垂直に長辺 の延在するこの薄肉の横断面は揺振運動方向では容易にばね弾性的に撓むことが できる。これに基づいて製品支持レールの使用材料の弾性率と相俟って、振動発 生器12の振動が専ら、又はほぼ専ら、製品支持レールへ伝達され、ひいては該 製品支持レールから、これによって保持された被処理製品へ伝達されることにな る。処理装置の定置常設部分から前記のように振動を遮断するための別の寅施態 様によれば、以下に詳説する棒材17上に前記ガイド部11を弾性支承部27を 介して支承することも可能である。The oscillating motion generated by the present invention is completely or minimally (but mostly) Appropriate measures have been taken to ensure that transmission is not transmitted to fixed and permanently installed parts of the equipment. There is. This is, for example, extremely elastic in the direction of the oscillating movement indicated by the double arrow 13. For example, the product support rail 8 may have a thin cross-section as can be seen in particular from FIG. obtained by configuring. Therefore, the long side is perpendicular to the direction of the oscillating motion. This thin-walled cross-section extending through can easily be elastically deflected in the direction of the oscillating motion. can. Based on this, together with the elastic modulus of the material used for the product support rail, vibration generation The vibrations of the generator 12 are transmitted exclusively, or almost exclusively, to the product support rail, and thus to the product support rail. from the product support rail to the processed product held by it. Ru. Alternative measures for isolating vibrations as described above from fixed and permanently installed parts of the processing equipment According to the above, the guide part 11 is mounted on a bar 17 with an elastic support part 27, which will be explained in detail below. It is also possible to support it via a

振動発生器は、略示した電動モータ16によって駆動されるのが殊に有利である 。電流の伝達は、図5及び図6に示した接点によって行なわれ、該接点は、フォ ーク状層部9′が各ガイド部11の上に被さって係合する際に閉じられる。この ために製品支持体7は図5に矢印27で示したように処理ステーション2内へ降 下される。製品支持体7の支持[9には上部接点部分28が、また地理ステーシ ョン2には対応した下部接点部分29が設けられている。前記の降下動作が終了 すると、すなわち被処理製品が処理浴6内に位置することになる図6に示した降 下終端位置に達すると直ちに、上下接点部分28.29は互いに接触する。鎖線 30で示したように、この場合、振動発生器の電動モータ16へ電流が給電され ている。要するに接点の閉じ、ひいては振動発生器12の始動は、被処理製品が 処理浴6内へ装入されると自動的に行なわれる。また処理浴から被処理製品が取 出されると前記接点はやはり自動的に再び開かれる。電動モータの代りに電磁式 振動発生器を採用する場合にも同様の接点装置を設けることが可能である。しか しながら振動発生は非電気式に2例えば圧縮空気によっても可能である。The vibration generator is particularly advantageously driven by an electric motor 16, which is shown schematically. . The transmission of current is carried out by the contacts shown in Figures 5 and 6, which It is closed when the arc-like layer 9' overlies and engages each guide portion 11. this For this purpose, the product support 7 is lowered into the processing station 2 as indicated by the arrow 27 in FIG. It will be lowered. The support of the product support 7 [9 has an upper contact part 28 and also a geostationary The version 2 is provided with a corresponding lower contact portion 29. The above descending operation is completed. This means that the product to be treated is located in the treatment bath 6 as shown in FIG. As soon as the lower end position is reached, the upper and lower contact parts 28, 29 come into contact with each other. chain line In this case, as shown at 30, current is supplied to the electric motor 16 of the vibration generator. ing. In short, the closing of the contacts and, in turn, the starting of the vibration generator 12 is performed when the product to be treated is This is done automatically when the treatment bath 6 is loaded. Also, the product to be treated is removed from the treatment bath. Once released, the contacts are again automatically reopened. Electromagnetic instead of electric motor A similar contact device can also be provided when a vibration generator is employed. deer However, it is also possible to generate vibrations non-electrically2, for example by compressed air.

更に又、それぞれ異なった強さの加速値を得かつ種々異なった方向に交互に作用 する振動発生器(図示せず)を設けることも可能である。例えば一方の方向では 電磁石が製品支持レール8を引き付けるのに対して、該電磁石が遮断されると、 ばねによって製品支持レールが再び戻され、次いで再び電磁石が作動される等々 である。両振動発生器を適当に調和させることによって、被処理製品の孔内にポ ンプ作用を発生させ、気泡を成る程度孔から押出すことが可能である。Furthermore, each of them obtains acceleration values of different strengths and acts alternately in various different directions. It is also possible to provide a vibration generator (not shown). For example in one direction The electromagnet attracts the product support rail 8, whereas when the electromagnet is interrupted, The product support rail is moved back again by the spring, then the electromagnet is activated again, and so on. It is. By properly harmonizing both vibration generators, it is possible to place a point in the hole of the product being treated. It is possible to generate a pumping action and force the air bubbles out of the pores to a certain extent.

振動発生器の不釣合体の大きさ及びその振動数は、その都度の事情もしくは要求 に適合される。すでに述べたように振動周波数を連続的又は非連続的に変化させ ることも可能であり、該振動周波数の変化は振動発生器のオン・オフの反復によ っても可能である。The size of the unbalanced body of the vibration generator and its frequency will depend on the circumstances or requirements of each case. is adapted to. As already mentioned, the vibration frequency can be changed continuously or discontinuously. It is also possible to change the vibration frequency by repeatedly turning the vibration generator on and off. It is also possible.

被処理製品の毎分当り約20ダブルストロークの極めて僅かな周波数による緩慢 な往復運動と相俟って揺振運動を行なわせようとする場合には(FIA細書冒頭 の往復運動の説明も参照のこと)、このためにllI整用棒材17が設けられて おり、該棒材は、図示をは省いた装置によって前記のように二重矢印13の方向 でその長手方向に、しかもも理浴槽1に対して相対的に、往復運動させられる。Slowness due to the extremely low frequency of approximately 20 double strokes per minute of the product to be treated When attempting to perform a rocking motion in conjunction with a reciprocating motion (see the beginning of the FIA specifications), (See also the explanation of the reciprocating motion of The bar is moved in the direction of the double arrow 13 as described above by a device not shown. It is caused to reciprocate in its longitudinal direction and relative to the barber bath 1.

該棒材17にはガイドg11が固定的に結合されているので、その運動を被処理 製品3に伝達する。Since the guide g11 is fixedly connected to the bar 17, its movement is controlled by the processed object. Communicate to product 3.

図7の実施例では支持腕9を有する製品支持レール8と支持バー18が図示され ており、該支持バーは製品支持レール8に懸架されかつ支持体19を介して、重 ね合わされたプレート状の被処理製品3を収容するための処理ケージ20を保持 している。プレート状の処理製品例えばプリント配線板は、処理液がプレート間 を貫流できるようにするために成る所定の相互間隔を有している。振動発生器1 2は運動装置16と共に支持バー18に装着されている。因みに図1乃至図4に おいて説明した構成及び変化態様を本実施例でも適宜採用することも可能である 。要するに前述の諸実施例の中の1つにおいて説明した構造、適用手段及び処理 手段を他の1つの実施例においても同じく設けることが原則として可能である。In the embodiment of FIG. 7, a product support rail 8 with support arms 9 and a support bar 18 are shown. The support bar is suspended from the product support rail 8 and is supported by a support 19. Holds a processing cage 20 for accommodating a plate-shaped processed product 3 that has been folded together. are doing. For plate-shaped processed products such as printed wiring boards, the processing liquid is applied between the plates. They have a predetermined mutual spacing to allow flow through. Vibration generator 1 2 is attached to the support bar 18 together with the exercise device 16. By the way, Figures 1 to 4 It is also possible to appropriately adopt the configuration and variation described in this example. . In short, the structure, application means and processing described in one of the aforementioned embodiments It is in principle possible to provide the means in another embodiment as well.

前記のように本発明の高周波数mm運動と、棒材17による前記揺振運動よりも 低い周波数の往復運動とを組合せる場合1両方の振動の重畳によって適当な効果 (高脚波)が生じる。As described above, the high frequency mm motion of the present invention and the oscillating motion by the bar 17 are When combining low frequency reciprocating motion 1. Appropriate effect can be obtained by superimposing both vibrations. (high leg wave) occurs.

処理ケージ20は1本の回転軸線、本例では水平方向に延びる回転軸線21を中 心として一方又は両方の矢印22.23の方向に回動又は往復旋回可能である。The processing cage 20 has one rotational axis, in this example, a rotational axis 21 extending in the horizontal direction. It is pivotable or pivotable in the direction of one or both arrows 22,23.

これによって得られるプレート状被迩埋製品3の運動は、この場合上として二重 矢印13の方向に行なわれる振動発生器12による揺振運動に重畳される。これ に基づいて個々のプレート間の間隙において処理液の強力な交替作用、ひいては 又、プレートの孔の強力な貫流洗浄と気泡の分離又は遊離が結果として生じる。In this case, the movement of the plate-shaped buried product 3 obtained by this is double as above. This is superimposed on the oscillating motion by the vibration generator 12 performed in the direction of the arrow 13. this Based on the strong alternating action of the treatment liquid in the interstices between the individual plates, and thus Also, a strong flow-through cleaning of the pores of the plate and separation or release of air bubbles results.

これは特に、前記の回動又は旋回によってプレートの孔が常時水平方向に延びる のではなくて、水平線に対して周期的に斜向したり垂直方向に延びたりすること によって達成される。This is especially true if the aforementioned rotation or pivoting causes the holes in the plate to always extend horizontally. Periodically diagonal or perpendicular to the horizon, rather than achieved by.

図8には、支持架14のホルダー25の、垂線に対して適当に斜向して延びるス ロット24によって保持される被処理製品3(この場合もプレート)の可能傾斜 位置が図示されている。このためにプレートの両側縁が前記スロット24内に差 込まれ、必要に応じてクランプねじなどによって確保される9図8、特に図9に 示した実施例から判るように、支持架14の縦軸線に対して斜め方向に延びるス ロット24.24’及び24′を有する互いに上下に位置する3つのホルダー2 5が設けられており、かつ、前記の各スロットは、互いに同一の傾斜線上に整列 して1枚のプレート状被処理製品3の側縁を収容できるように各ホルダー25で 互いにずらして設けられている9本例では被処理製品3としてのプレートは、垂 線に対して斜向して延びているが、これによって被洗浄孔の縦軸線も水平線に対 してそれ相応に傾斜するように配置されており、この場合プレート3は揺振運動 方向13に対して垂直に配置されている。FIG. 8 shows that the holder 25 of the support frame 14 has a holder 25 that extends obliquely with respect to the perpendicular line. Possible tilting of the processed product 3 (also a plate) held by the lot 24 The location is illustrated. For this purpose, both edges of the plate are inserted into the slot 24. 9, secured by clamp screws etc. as required, as shown in Figure 8, especially Figure 9. As can be seen from the embodiment shown, the struts extend obliquely to the longitudinal axis of the support frame 14. Three holders 2 located one above the other with lots 24.24' and 24' 5, and each of said slots are aligned on the same slope line with each other. Each holder 25 is designed to accommodate the side edge of one plate-shaped product 3. In the nine examples in which the plates are staggered from each other, the plates as the product to be processed 3 are placed vertically. The vertical axis of the hole to be cleaned is also parallel to the horizontal line. and are arranged so as to be inclined accordingly, in which case the plate 3 undergoes an oscillating movement. It is arranged perpendicular to direction 13.

図10には、前記実施例とは異なってプレート状被処理製品3が揺振運動方向1 3に対して鋭角αを形成する傾斜位置を占めるような変化態様が原理図で図示さ れている。この構成手段によって、プレート間の間隙26における処理液の通流 、ひいては処理液の交替が容易になる。図8と図9に示した斜向位置及び図10 に示した斜向位置を組合せて設けることも可能である。In FIG. 10, unlike the previous embodiment, the plate-shaped processed product 3 is moved in the direction of oscillating motion 1. The principle diagram shows a change mode that occupies an inclined position forming an acute angle α with respect to 3. It is. This configuration means allows the flow of the processing liquid in the gap 26 between the plates. This also makes it easier to replace the processing liquid. Oblique positions shown in Figures 8 and 9 and Figure 10 It is also possible to provide a combination of the oblique positions shown in .

図11には、製品支持レール8に懸架された2つの支持架14間に振動発生器1 2を装着する方式の異なった態様が図示されている。振動発生器12は、その主 振動が図11の図平面に対して垂直な方向に延びるように構成されている。符号 3はやはリブレート状の被処理製品を示している。In FIG. 11, a vibration generator 1 is placed between two support racks 14 suspended on product support rails 8. 2 are illustrated. The vibration generator 12 is mainly The arrangement is such that the vibrations extend in a direction perpendicular to the drawing plane of FIG. sign 3 indicates a ribbed-like processed product.

以上説明した図示のすべての構成手段は、公知として明記されていない限り、本 発明の思想の範囲内に属している。All configuration means illustrated above are included in this document unless clearly stated as publicly known. It falls within the scope of the idea of the invention.

たLヱ ト( 5と1 LL互 公ヨL ■しU 要 約 書 本発明はまず第1に、複数の孔を有する被処理製品をその湿式化学地理時に往復 運動させる方法に関するものである。特に製品肉厚と孔径との比が不都合な場合 でも孔内になお残存する残滓及び/又は気泡を除(ことができるようにするため に、本発明では、被処理製品(3)を少なくとも4〜5Hzの周波数の振動で揺 振させ、振動方向を少なくとも部分的にかっ/又は一時的に孔の縦軸線(5)の 方向に延びるようにし、かつ揺振運動を被処理製品の支持部分に対してだけ、或 いは少なくとも主として該支持部分に対して及ぼすようにした0本発明は第2に 、複数の処理ステーションを順次相前後して設けた形式の前記方法の実施装置に 関し、この装置上の課題は、公知の構成の欠点を排除すると共に、このような処 理装置の定置常設部分に前記のような揺振運動が伝達するのを充分に回避するこ とである。このために本発明では、少なくとも4〜5Hzの周波数の揺振運動を 発生する振動発生11(12)が搬送部材及び/又は支持部材に装着されており 、該部材によって、前記被処理製品がその搬送時、処理浴内への装入中及び想瑠 浴滞在中に保持されており、かつ、前記振動発生器と処理装置の定置常設部分と の間には、振動伝達を遮断し少なくとも充分に減衰する手段が設けられている。Ta L ヱ to( 5 and 1 LL mutual Public Yo L ■ShiU Summary book The present invention firstly provides a method for reciprocating a product having a plurality of pores during its wet chemical process. It is about how to exercise. Especially when the ratio of product wall thickness to hole diameter is unfavorable. However, in order to be able to remove any residue and/or air bubbles that may still remain in the hole, Furthermore, in the present invention, the product to be treated (3) is shaken with vibrations having a frequency of at least 4 to 5 Hz. the direction of vibration is at least partially and/or temporarily aligned with the longitudinal axis (5) of the hole. direction, and the oscillating motion is applied only to the supporting part of the product to be treated, or or at least primarily on the supporting portion. , an apparatus for carrying out the method in the form of a plurality of processing stations arranged one after the other; The problem with this device is to eliminate the shortcomings of known configurations and to The transmission of the above-mentioned oscillating motion to the fixed and permanently installed parts of the control equipment should be sufficiently avoided. That is. For this purpose, in the present invention, a vibration motion with a frequency of at least 4 to 5 Hz is used. The vibration generator 11 (12) to be generated is attached to the conveying member and/or the supporting member. , the member allows the product to be treated to be protected during transportation, during charging into a processing bath, and during is retained during the bath stay and is a fixed and permanent part of said vibration generator and treatment equipment. In between, means are provided for interrupting and at least sufficiently damping vibration transmission.

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Claims (30)

【特許請求の範囲】[Claims] 1.複数の処理ステーションに沿って、複数の孔を有する被処理製品、特に板厚 と孔径との比=8:1のプリント配線板をリフト状態で搬送し、各処理ステーシ ョンに滞在中に湿式化学処理、例えば電気メッキを施す際に前記被処理製品を往 復運動させる方法において、被処理製品(3)を少なくとも4〜5Hzの周波数 の振動で揺振させ、振動方向を少なくとも部分的にかつ/又は一時的に孔の縦軸 線(5)の方向に延びるようにし、かつ揺振運動を被処理製品の支持部分に対し てだけ、或いは少なくとも主として該支持部分に対して及ぼすことを特徴とする 、湿式化学処理時に被処理製品を運動させる方法。1. Processed products with multiple holes, especially plate thickness, along multiple processing stations A printed wiring board with a ratio of 8:1 to the hole diameter is transported in a lifted state and placed at each processing station. During your stay at the In the method of backward motion, the product to be treated (3) is moved at a frequency of at least 4 to 5 Hz. the direction of vibration is at least partially and/or temporarily aligned with the longitudinal axis of the hole. line (5), and the shaking motion is applied to the supporting part of the product to be processed. or at least mainly on the supporting portion. , a method of mobilizing the processed product during wet chemical processing. 2.処理浴(1)内での揺振運動中に複処理製品(3)を回動又は旋回させる、 請求項1記載の方法。2. rotating or swirling the multi-processed product (3) during a rocking movement in the processing bath (1); The method according to claim 1. 3.揺振運動中に孔の縦軸線(5)が揺振運動方向(13)に対して角度を成し て延びるような傾斜位置に彼処珪製品(3)を維持する、請求項1又は2記載の 方法。3. During the oscillating movement, the longitudinal axis (5) of the hole forms an angle with the direction of the oscillating movement (13). 3. The silicon product according to claim 1 or 2, wherein the silicon product (3) is maintained in an inclined position such that it extends. Method. 4.揺振運動中に被処理製品(3)に対して打繋又は突発的な衝繋を加える、請 求項1から3までのいずれか1項記載の方法。4. Applying a hit or sudden impact to the product to be processed (3) during the shaking motion, The method described in any one of claims 1 to 3. 5.揺振運動の周波数を同一処理中に連続的又は非連続的に変化する、請求項1 から4までのいずれか1項記載の方法。5. Claim 1: The frequency of the shaking motion is changed continuously or discontinuously during the same process. The method according to any one of 4 to 4. 6.同一処理中に揺振運動を複数回遮断しかつ再接続する、請求項5記載の方法 。6. 6. The method of claim 5, wherein the rocking motion is interrupted and reconnected several times during the same process. . 7.揺振周波数が50Hzの回路周波数に等しい、請求項1から6までのいずれ か1項記載の方法。7. Any of claims 1 to 6, wherein the oscillation frequency is equal to a circuit frequency of 50Hz. or the method described in paragraph 1. 8.被処理製品に対する揺振運動以外に更に付加的に、揺振周波数よりも著しく 低い周波数、例えば毎分当リ20ダブルストロークの周波数で被処理製品を往復 運動させ、しかも該低周波数の運動を揺振運動と同一の方向に経過させる、請求 項1から7までのいずれか1項記載の方法。8. In addition to the oscillating motion on the product to be processed, in addition, the oscillating frequency is The workpiece is reciprocated at a low frequency, e.g. 20 double strokes per minute. motion, and furthermore, the low frequency motion is caused to progress in the same direction as the oscillating motion. The method described in any one of Items 1 to 7. 9.高周波数の揺振運動の振幅が約0.5〜3.0mmの範囲であり、かつ低周 波数の往復運動の振幅が2×10〜2×40mmの範囲である、請求項8記載の 方法。9. The amplitude of high-frequency oscillating motion is in the range of approximately 0.5 to 3.0 mm, and the frequency is low. Claim 8, wherein the amplitude of the reciprocating motion of the wave number is in the range of 2 x 10 to 2 x 40 mm. Method. 10.それぞれ処理液又は洗浄液を収容するための複数の処理浴槽又は処理ステ ーションが処理搬送方向(4)で順次相前後して設けられており、かつ、被処理 製品(3)が製品支持体(7,8)によって各処理浴槽内へ装入され処理後ふた たび該処理浴槽から引出されて移送される形式の請求項1記載の方法を実施する 装置において、少なくとも4〜5Hzの周波数の揺振運動を発生させる振動発生 器(12)が搬送部材及び/又は支持部材に装着されており、該部材によって、 前記被処理製品がその搬送時、処理浴内への装入中及び処理溶滞在中に保持され ており、かつ、前記振動発生器と処理装置の定置常設部分との間には、振動伝達 を遮断し少なくとも充分に減衰する手段が設けられていることを特徴とする、実 施装置。10. A plurality of processing baths or processing stations each containing a processing liquid or a cleaning liquid. tion is provided one after the other in the processing conveyance direction (4), and The product (3) is loaded into each treatment bath by the product support (7, 8) and the lid is closed after treatment. Carrying out the method according to claim 1, in which the treatment bath is repeatedly drawn out and transported. In the device, vibration generation that generates an oscillating motion with a frequency of at least 4 to 5 Hz. A container (12) is attached to a conveying member and/or a supporting member, by which The product to be treated is retained during transportation, during charging into the treatment bath, and during treatment solution. and a vibration transmission mechanism is provided between the vibration generator and a fixed and permanently installed part of the processing device. , characterized in that means are provided for blocking and at least sufficiently attenuating the Application equipment. 11.少なくとも1つの振動発生器が製品支持体、特に製品支持レール(8)に 装着されている、請求項10記載の装置。11. At least one vibration generator is located on the product support, in particular on the product support rail (8). 11. The device of claim 10, wherein the device is mounted. 12.振動方向(13)に小さな抵抗モーメントを有する、比較的薄肉横断面の 製品支持レールが設けられている、請求項11記載の装置。12. of relatively thin cross-section with a small moment of resistance in the vibration direction (13). 12. The apparatus of claim 11, wherein a product support rail is provided. 13.単数又は複数の振動発生器を支持する支持部材と処理装置の定置常設部分 との間に弾性的な振動減衰器(27)が設けられている、請求項10から12ま でのいずれか1項記載の装置。13. A support member supporting one or more vibration generators and a fixed permanent part of the processing device Claims 10 to 12, wherein an elastic vibration damper (27) is provided between the The device according to any one of . 14.少なくとも2つの振動発生器(12)が、相互間隔をおいて、製品支持レ ール(8)に装着されている、請求項11から13までのいずれか1項記載の装 置。14. At least two vibration generators (12) are spaced apart from each other on the product support rail. The device according to any one of claims 11 to 13, which is attached to the tool (8). Place. 15.単数又は複数の振動発生器が、一方では製品支持レール(8)によって保 持されていて他方では被処理製品(3)を支持している支持部材に装着されてい る、請求項10から14までのいずれか1項記載の装置。15. The vibration generator or vibration generators are supported on the one hand by the product support rail (8). on the other hand, and attached to a support member that supports the product to be processed (3) on the other hand. 15. A device according to any one of claims 10 to 14. 16.単数又は複数の振動発生器(12)が単数又は複数の支持バー(18)に 装着されている、請求項15記載の装置。16. One or more vibration generators (12) are connected to one or more support bars (18). 16. The device of claim 15, wherein the device is mounted. 17.単数又は複数の振動発生器(12)が支持架(14)に装着されている、 請求項15記載の装置。17. one or more vibration generators (12) are mounted on the support rack (14); 16. Apparatus according to claim 15. 18.単数又は複数の振動発生器が、一方では製品支持レール(8)に係合し他 方では被処理製品(3)に係合しているクランプ部材に装着されている、請求項 15記載の装置。18. One or more vibration generators engage the product support rail (8) on the one hand and the other In one case, the claim is attached to a clamp member that engages with the product to be treated (3). 15. The device according to 15. 19.各振動発生器(12)が、その揺振運動の振幅を主として揺振運動方向( 13)に経過させるように構成・配置されている、請求項10から18までのい ずれか1項記載の装置。19. Each vibration generator (12) mainly controls the amplitude of its vibration movement in the vibration movement direction ( 13). The device according to any one of the above. 20.振動発生器が、その揺振周波数があらゆる方向の振幅を有するように構成 ・配置されている、請求項10から18までのいずれか1項記載の装置。20. The vibration generator is configured such that its vibration frequency has amplitude in all directions. - A device according to any one of claims 10 to 18, wherein the device is arranged. 21.揺振運動の振幅が製品支持レール(12)の全長にわたってほぼ等しく、 該製品支持レールにおいて揺振振幅の「振動の腹」及び「振動の範」が実質的に 避けられるように、複数の振動発生器が配置されている、請求項10から20ま でのいずれか1項記載の装置。21. The amplitude of the oscillating motion is approximately equal over the entire length of the product support rail (12); In the product support rail, the “vibration antinode” and “vibration range” of the vibration amplitude are substantially Claims 10 to 20, wherein a plurality of vibration generators are arranged to avoid The device according to any one of . 22.振動発生器(12)が電気的に駆動される、請求項10から21までのい ずれか1項記載の装置。22. 22. The method according to claim 10, wherein the vibration generator (12) is electrically driven. The device according to any one of the above. 23.単数又は複数の振動発生器(12)の電気的駆動装置への給電のために、 製品支持腕(9,9′′)のための定置ガイド部(11)にか又はその近くに、 並びに前記製品支持腕(9,9′′)に、それぞれ所属の給電線の接点(28, 29)が設けられており、前記製品支持腕(9,9′′)が前記の定置ガイド部 の上に載ると前記接点が閉じて前記振動発生器の電気的な駆動装置(16)への 給電(30)が行なわれる、請求項22記載の装置。23. For powering the electrical drive of the vibration generator(s) (12), at or near the stationary guide part (11) for the product support arm (9, 9''); The product support arms (9, 9'') are also provided with contacts (28, 9'') of the respective feeder lines. 29) is provided, and the product support arm (9, 9'') is connected to the stationary guide part. When placed on top, the contacts close and connect the electrical drive (16) of the vibration generator. 23. The device according to claim 22, wherein a power supply (30) is provided. 24.単数又は複数の振動発生器(12)の揺振周波数を変化するための周波数 変換器を設けた、請求項10から23までのいずれか1項記載の装置。24. Frequency for changing the vibration frequency of one or more vibration generators (12) 24. Device according to any one of claims 10 to 23, characterized in that it is provided with a transducer. 25.処理中に孔の縦軸線(5)が揺振運動方向(13)に対して鋭角を成して 延びるように被処理製品(3)に傾斜位置をとらせる手段が設けられている、請 求項10から24までのいずれか1項記載の装置。25. During processing, the longitudinal axis (5) of the hole forms an acute angle to the direction of oscillating movement (13). Means are provided for causing the product to be treated (3) to assume an inclined position so as to extend. 25. The device according to any one of claims 10 to 24. 26.1枚のプレート状被処理製品(3)の側縁を収容して保持するために、互 いにずらして斜向配置されたスロット(24,24′,24′′)を夫々有する 複数のホルダー(25)が設けられている、請求項25記載の装置。26. In order to accommodate and hold the side edges of one plate-shaped workpiece (3), have slots (24, 24', 24'') arranged diagonally and offset from each other. 26. Device according to claim 25, characterized in that a plurality of holders (25) are provided. 27.被処理製品(3)が、支持部材(18,19)を介して製品支持レール( 7)に懸架された処理ケージ(20)内に位置している、請求項25記載の装置 。27. The product to be processed (3) is placed on the product support rail ( 26. The apparatus according to claim 25, located in a processing cage (20) suspended in 7). . 28.処理ケージ(20)が1本の軸線、殊に有利には水平軸線(21)を中心 として支持部材(19)に回動可能又は旋回可能に支承され、前記処理ケージ( 20)の回動又は旋回運動を発生させる手段が設けられており、かつ前記処理ケ ージ内で被処理製品が落下を防止されている、請求項27記載の装置。28. The processing cage (20) is centered on one axis, particularly preferably a horizontal axis (21). is rotatably or pivotably supported on the support member (19) as a 20) is provided with means for generating the rotating or pivoting motion, and the processing case is 28. The apparatus of claim 27, wherein the product to be processed is prevented from falling within the cage. 29.彼処理製品(3)又はその保持部材に対して打繋又は衝繋を発生させる装 置、例えば空圧作動式ラム又はハンマが設けられている、請求項10から28ま でのいずれか1項記載の装置。29. A device that generates a hitch or collision against the treated product (3) or its holding member. Claims 10 to 28, wherein a pneumatically actuated ram or hammer is provided. The device according to any one of . 30.異なった強さの加速値の複数の振動発生器が設けられており、しかも被処 理製品に対しては、一方の加速値の振動発生器が順方向で作用し、また他方の加 速値の振動発生器が逆方向で作用するように設けられている、請求項10から2 9までのいずれか1項記載の装置。30. A plurality of vibration generators with acceleration values of different strengths are provided, and The vibration generator with one acceleration value acts in the forward direction on the product, and the vibration generator with the other acceleration value acts in the forward direction. Claims 10 to 2, characterized in that the speed-valued vibration generators are arranged to act in opposite directions. 9. The device according to any one of items 9 to 9.
JP91511324A 1990-07-06 1991-07-04 A method for moving a product having a plurality of pores during its wet chemical treatment, for example during electroplating, and an apparatus for carrying out the method Pending JPH05508744A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE4021581A DE4021581A1 (en) 1990-07-06 1990-07-06 METHOD FOR MOVING A GOOD-HOLE GOOD WHILE HAVING WET CHEMICAL TREATMENT, E.g. GALVANIZATION, AND DEVICE FOR IMPLEMENTING THE PROCESS
DE4021581,4 1990-07-06
PCT/DE1991/000557 WO1992001088A1 (en) 1990-07-06 1991-07-04 Process for moving an item with drillings during its wet chemical treatment, e.g. galvanisation, and device for implementing the process

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JP2013174016A (en) * 2007-06-06 2013-09-05 Atotech Deutschland Gmbh Apparatus and method for wet chemical treatment of plate-like product and method for mounting flow rate member in the apparatus

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WO1992001088A1 (en) 1992-01-23
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