JPH0541624B2 - - Google Patents
Info
- Publication number
- JPH0541624B2 JPH0541624B2 JP61158672A JP15867286A JPH0541624B2 JP H0541624 B2 JPH0541624 B2 JP H0541624B2 JP 61158672 A JP61158672 A JP 61158672A JP 15867286 A JP15867286 A JP 15867286A JP H0541624 B2 JPH0541624 B2 JP H0541624B2
- Authority
- JP
- Japan
- Prior art keywords
- substituted phenyl
- reaction
- acid chloride
- chloromethyl
- phenyl ether
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- -1 methyl-substituted phenyl ethers Chemical class 0.000 claims description 34
- 238000006243 chemical reaction Methods 0.000 claims description 26
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 claims description 18
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 claims description 16
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 14
- 239000002904 solvent Substances 0.000 claims description 11
- 238000004519 manufacturing process Methods 0.000 claims description 10
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 8
- LXEJRKJRKIFVNY-UHFFFAOYSA-N terephthaloyl chloride Chemical compound ClC(=O)C1=CC=C(C(Cl)=O)C=C1 LXEJRKJRKIFVNY-UHFFFAOYSA-N 0.000 claims description 8
- FDQSRULYDNDXQB-UHFFFAOYSA-N benzene-1,3-dicarbonyl chloride Chemical compound ClC(=O)C1=CC=CC(C(Cl)=O)=C1 FDQSRULYDNDXQB-UHFFFAOYSA-N 0.000 claims description 7
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 6
- 239000003054 catalyst Substances 0.000 claims description 5
- 239000011541 reaction mixture Substances 0.000 claims description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 4
- 238000005727 Friedel-Crafts reaction Methods 0.000 claims description 3
- 238000005660 chlorination reaction Methods 0.000 claims description 3
- 229910052742 iron Inorganic materials 0.000 claims description 2
- 238000000265 homogenisation Methods 0.000 claims 3
- 238000000034 method Methods 0.000 description 15
- 229910052801 chlorine Inorganic materials 0.000 description 12
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 11
- 125000003118 aryl group Chemical group 0.000 description 11
- 239000000460 chlorine Substances 0.000 description 11
- 150000001491 aromatic compounds Chemical class 0.000 description 8
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 8
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 7
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 7
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 6
- 239000002994 raw material Substances 0.000 description 6
- 125000001424 substituent group Chemical group 0.000 description 6
- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 description 5
- 238000007086 side reaction Methods 0.000 description 5
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 4
- 150000008280 chlorinated hydrocarbons Chemical class 0.000 description 4
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 4
- 229910052753 mercury Inorganic materials 0.000 description 4
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 4
- 150000001805 chlorine compounds Chemical class 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 230000035484 reaction time Effects 0.000 description 3
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 3
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 2
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 2
- OTEKOJQFKOIXMU-UHFFFAOYSA-N 1,4-bis(trichloromethyl)benzene Chemical group ClC(Cl)(Cl)C1=CC=C(C(Cl)(Cl)Cl)C=C1 OTEKOJQFKOIXMU-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 2
- 238000007323 disproportionation reaction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 2
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 2
- FBAFATDZDUQKNH-UHFFFAOYSA-M iron chloride Chemical compound [Cl-].[Fe] FBAFATDZDUQKNH-UHFFFAOYSA-M 0.000 description 2
- 125000004430 oxygen atom Chemical group O* 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 239000012261 resinous substance Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 description 2
- PPKPKFIWDXDAGC-IHWYPQMZSA-N (z)-1,2-dichloroprop-1-ene Chemical class C\C(Cl)=C\Cl PPKPKFIWDXDAGC-IHWYPQMZSA-N 0.000 description 1
- WEWXCIOGPKAVFO-UHFFFAOYSA-N 1,2-bis(trichloromethyl)benzene Chemical class ClC(Cl)(Cl)C1=CC=CC=C1C(Cl)(Cl)Cl WEWXCIOGPKAVFO-UHFFFAOYSA-N 0.000 description 1
- DBKWISXILXVKEW-UHFFFAOYSA-N 1-methyl-3-(4-methylphenoxy)benzene Chemical compound C1=CC(C)=CC=C1OC1=CC=CC(C)=C1 DBKWISXILXVKEW-UHFFFAOYSA-N 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- CYTYCFOTNPOANT-UHFFFAOYSA-N Perchloroethylene Chemical class ClC(Cl)=C(Cl)Cl CYTYCFOTNPOANT-UHFFFAOYSA-N 0.000 description 1
- YGYAWVDWMABLBF-UHFFFAOYSA-N Phosgene Chemical compound ClC(Cl)=O YGYAWVDWMABLBF-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 235000002597 Solanum melongena Nutrition 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical class ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 235000013877 carbamide Nutrition 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000012320 chlorinating reagent Substances 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical class C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
- 150000003951 lactams Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 150000008039 phosphoramides Chemical class 0.000 description 1
- UHZYTMXLRWXGPK-UHFFFAOYSA-N phosphorus pentachloride Chemical compound ClP(Cl)(Cl)(Cl)Cl UHZYTMXLRWXGPK-UHFFFAOYSA-N 0.000 description 1
- FAIAAWCVCHQXDN-UHFFFAOYSA-N phosphorus trichloride Chemical compound ClP(Cl)Cl FAIAAWCVCHQXDN-UHFFFAOYSA-N 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
- 150000003672 ureas Chemical class 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/52—Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Catalysts (AREA)
Description
【発明の詳細な説明】
[発明の分野]
本発明は、芳香族ジカルボン酸クロライドの製
造法に関する。更に具体的に言えば、メチル置換
フエニルエーテル類を光塩素化することによつて
トリクロロメチル置換フエニルエーテルを製造
し、次いで該トリクロロメチル基とカルボキシル
基とを反応せしめることによつてカルボン酸クロ
ライドを製造する方法に関する発明である。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a method for producing aromatic dicarboxylic acid chlorides. More specifically, a trichloromethyl-substituted phenyl ether is produced by photochlorinating a methyl-substituted phenyl ether, and then a carboxylic acid is produced by reacting the trichloromethyl group with a carboxyl group. This invention relates to a method for producing chloride.
[産業上の利用分野]
芳香族ジカルボン酸クロライド類は主にポリマ
ー原料として利用される。誘導されるポリマーと
して、ポリエステル、ポリアミド、ポリイミドな
どが挙げられるが、殊にアリレートや全芳香族ポ
リアミド、全芳香族ポリイミドなど強度、耐熱性
などに優れた特性をもつポリマーの原料として利
用される。特に共重合ポリマーにおいて複数のカ
ルボン酸成分を使用する場合には必要とする芳香
族ジカルボン酸クロライド全てを同時に製造する
方法である。[Industrial Application Fields] Aromatic dicarboxylic acid chlorides are mainly used as polymer raw materials. Examples of derived polymers include polyester, polyamide, polyimide, etc., but it is especially used as a raw material for polymers with excellent properties such as strength and heat resistance, such as arylate, wholly aromatic polyamide, and wholly aromatic polyimide. Particularly when a plurality of carboxylic acid components are used in a copolymer, this method simultaneously produces all the necessary aromatic dicarboxylic acid chlorides.
[従来技術]
芳香族炭化水素類の光塩素化反応によつてトリ
クロロメチル置換芳香族炭化水素を製造する方
法、特にヘキサクロロキシレン類の製造方法につ
いては数多くの提案がなされている。通常紫外線
照射下遊離塩素を用いて塩素化する場合、次の二
つの副反応が起こる。一つの樹脂状物の発生であ
り、もう一つは核置換塩素化物の発生である。こ
れらの副反応生成物は収率を下げるのみならず、
反応液の着色による反応の停止、製品純度の低下
等、工業的製造を困難ならしめるものである。樹
脂状物の発生を抑制するために光塩素化安定剤と
して尿素類(特開昭50−129525号公報)、ホスホ
ルアミド類(特開昭51−8221号公報)、ラクタム
(特開昭57−98225号公報)、カルバミン酸エステ
ル誘導体(特開昭58−135826号公報)等が提案さ
れている。又、核置換塩素化物の発生を抑制する
ために塩化鉄(特開昭53−77022号公報)が有効
であることが示されている。[Prior Art] Many proposals have been made regarding methods for producing trichloromethyl-substituted aromatic hydrocarbons by photochlorination reactions of aromatic hydrocarbons, particularly methods for producing hexachloroxylenes. When chlorinating using free chlorine under UV irradiation, the following two side reactions occur. One is the generation of resinous substances, and the other is the generation of nuclear substituted chlorides. These side reaction products not only reduce the yield, but also
This makes industrial production difficult, such as stopping the reaction due to coloring of the reaction solution and reducing product purity. Ureas (Japanese Unexamined Patent Publication No. 129525/1982), phosphoramides (Japanese Unexamined Patent Publication No. 8221/1982), and lactams (Unexamined Japanese Patent Application No. 98225/1982) are used as photochlorination stabilizers to suppress the generation of resinous substances. JP-A-58-135826), carbamate ester derivatives (JP-A-58-135826), etc. have been proposed. It has also been shown that iron chloride (Japanese Unexamined Patent Publication No. 77022/1983) is effective in suppressing the generation of nuclear-substituted chlorides.
芳香族ジカルボン酸クロライドの製造方法とし
ては、大別して2つの方法が工業的に行なわれて
いる。1つは、芳香族ジカルボン酸とビストリク
ロロメチル置換芳香族化合物とを反応させる方法
であり、他の1つは、芳香族ジカルボン酸と五塩
化リン,三塩化リン,チオニルクロライド,或に
はホスゲン等の塩素化剤とを反応させる方法であ
る。特に同一の位置に置換基のある芳香族ジカル
ボン酸とビストリクロロメチル置換芳香族化合物
を使用すれば経済的及び技術的に極めて有効な方
法である。テレフタル酸とヘキサクロロパラキシ
レン,イソフタル酸とヘキサクロロメタキシレン
からテレフタル酸クロライドやイソフタル酸クロ
ライドを製造する方法については、特開昭51−
105027号公報や特開昭53−53636号公報に提案さ
れている。更にテレフタル酸クロライドとイソフ
タル酸クロライドの等モル混合物を製造する方法
として、テレフタル酸とヘキサクロロメタキシレ
ン又はイソフタル酸とヘキサクロロパラキシレン
とを反応させることが特開昭53−121733号公報に
提案されている。この方法は、置換基の位置のみ
が異なる原料を用いるものであるから、同じ位置
に置換基のある芳香族ジカルボン酸とビストリク
ロロメチル置換芳香族化合物を用いる場合と全く
同じ反応条件を採用することができる。 As methods for producing aromatic dicarboxylic acid chlorides, two methods are generally used industrially. One is a method in which an aromatic dicarboxylic acid is reacted with a bistrichloromethyl-substituted aromatic compound, and the other is a method in which an aromatic dicarboxylic acid is reacted with phosphorus pentachloride, phosphorus trichloride, thionyl chloride, or phosgene. This method involves reacting with a chlorinating agent such as In particular, if an aromatic dicarboxylic acid and a bistrichloromethyl-substituted aromatic compound having substituents at the same position are used, this method is economically and technically very effective. A method for producing terephthalic acid chloride and isophthalic acid chloride from terephthalic acid and hexachloroparaxylene, and from isophthalic acid and hexachloromethacylene is described in JP-A-51-
This method has been proposed in Publication No. 105027 and Japanese Patent Application Laid-open No. 53-53636. Furthermore, as a method for producing an equimolar mixture of terephthalic acid chloride and isophthalic acid chloride, JP-A-53-121733 proposes reacting terephthalic acid and hexachloromethaxylene or isophthalic acid and hexachloroparaxylene. . Since this method uses raw materials that differ only in the position of the substituent, it is possible to adopt exactly the same reaction conditions as when using an aromatic dicarboxylic acid and a bistrichloromethyl-substituted aromatic compound that have substituents in the same position. I can do it.
[発明の目的]
本発明者は芳香族側鎖メチル基の光塩素化にお
いて、或る種の含酸素置換基を持つ芳香族側鎖メ
チル基が或る条件下において極めて容易に光塩素
化されることを見出した。遊離塩素は紫外線照射
によつてクロルラデイカルを発生する。クロルラ
デイカルは芳香族側鎖メチル基を改撃し、水素原
子が塩素原子に置換されクロロメチル置換芳香族
化合物に変換される。フエノキシ基のような酸素
原子をもち、且つその酸素原子が共役系に隣接す
るような化合物がこのような光塩素化反応を容易
に行なうことは極めて興味深い。更に本発明者は
芳香族ジカルボン酸クロライドを製造するにあた
り、全く構造の異なる芳香族ジカルボン酸とビス
トリクロロメチル置換芳香族化合物を原料に用い
て、全く構造の異なる芳香族ジカルボン酸クロラ
イドを容易に且つ収率良く同時に得る方法を鋭意
検討した結果本発明に到達したものである。特に
フエノキシ基のようにカルボキシル基やトリクロ
ロメチル基とは異なる電子的な置換基効果を持つ
芳香族化合物でも容易に且つ収率良く反応が起こ
り、フエノキシ基の分解,脱離が殆ど起こらない
ことを見出したものである。[Object of the Invention] In the photochlorination of aromatic side chain methyl groups, the present inventor discovered that aromatic side chain methyl groups having certain oxygen-containing substituents are extremely easily photochlorinated under certain conditions. I discovered that. Free chlorine generates chlorradical when exposed to ultraviolet rays. Chlorradical modifies the aromatic side chain methyl group, replacing the hydrogen atom with a chlorine atom and converting it into a chloromethyl-substituted aromatic compound. It is extremely interesting that a compound such as a phenoxy group that has an oxygen atom and the oxygen atom is adjacent to a conjugated system easily undergoes such a photochlorination reaction. Furthermore, in producing aromatic dicarboxylic acid chloride, the present inventor uses an aromatic dicarboxylic acid and a bistrichloromethyl-substituted aromatic compound, which have completely different structures, as raw materials to easily and easily produce aromatic dicarboxylic acid chloride, which has completely different structures. The present invention was arrived at as a result of extensive research into a method for simultaneously obtaining both in good yield and at the same time. In particular, even with aromatic compounds such as phenoxy groups, which have electronic substituent effects different from those of carboxyl groups and trichloromethyl groups, the reaction occurs easily and in good yields, and decomposition and elimination of phenoxy groups hardly occur. This is what I found.
[発明の構成]
本発明は、(A)下記一般式[]
〔但し式中nは0または1を示し、0のときは結
合手を表わす。またそれぞれのベンゼン環におけ
る2つの結合手はベンゼン環において互いにオル
ソ位に位置することはない。〕
で表わされるメチル置換フエニルエーテル類を光
塩素化せしめて、下記一般式[]
〔但し式中、nおよび各ベンゼン環における結合
手の位置の定義は前記一般式[]と同じであ
る。〕
で表わされるクロロメチル置換フエニルエーテル
類を含む反応混合物を得、
(B) 次いで前記反応混合物に、テレフタル酸およ
び/またはイソフタル酸を添加し、フリーデル
クラフツ触媒の存在下、前記一般式[]のク
ロロメチル置換フエニルエーテル類と反応せし
めることを特徴とする一般式[]
〔但し式中、nおよび各ベンゼン環における結合
手の位置の定義は前記一般式[]と同じであ
る。〕
で表わされるフエニルエーテルカルボン酸クロ
ライドとテレフタル酸クロライドおよび/また
はイソフタル酸クロライドよりなるカルボン酸
クロライドの製造法である。[Structure of the Invention] The present invention comprises (A) the following general formula [] [However, in the formula, n represents 0 or 1, and when it is 0, it represents a bond. Furthermore, the two bonds in each benzene ring are not located at ortho positions to each other in the benzene ring. ] The methyl-substituted phenyl ethers represented by are photochlorinated to form the following general formula [] [However, in the formula, the definitions of n and the position of the bond in each benzene ring are the same as in the above general formula []. ] A reaction mixture containing a chloromethyl-substituted phenyl ether represented by the formula [ ] is reacted with a chloromethyl-substituted phenyl ether of the general formula [ ] [However, in the formula, the definitions of n and the position of the bond in each benzene ring are the same as in the above general formula []. ] This is a method for producing a carboxylic acid chloride consisting of phenyl ether carboxylic acid chloride represented by the following and terephthalic acid chloride and/or isophthalic acid chloride.
以下、本発明について更に詳細に説明する。 The present invention will be explained in more detail below.
本発明の方法は上記一般式[]で表わされる
メチル置換フエニルエーテルを液体即ち溶融状態
もしくは溶液状態で紫外線含有光照射下に塩素ガ
スを導入することにより行われる。用いられる溶
媒は光塩素化反応に不活性な塩素化炭化水素で、
例えばクロロホルム、四塩化炭素、ジクロロエタ
ン,トリクロロエタン,テトラクロロエタンなど
の塩素化パラフイン類や、クロルベンゼンのよう
な塩素化芳香族化合物が好ましい。メチル置換フ
エニルエーテルの濃度は重量で5%以上が好まし
い。 The method of the present invention is carried out by introducing chlorine gas into the methyl-substituted phenyl ether represented by the above general formula [] in a liquid state, ie, a molten state or a solution state, under irradiation with ultraviolet-containing light. The solvent used is a chlorinated hydrocarbon that is inert to the photochlorination reaction.
For example, chlorinated paraffins such as chloroform, carbon tetrachloride, dichloroethane, trichloroethane, and tetrachloroethane, and chlorinated aromatic compounds such as chlorobenzene are preferred. The concentration of methyl-substituted phenyl ether is preferably 5% or more by weight.
紫外線含有光は塩素を活性化する波長の光であ
れば良く、例えば日光,放電灯,白熱灯などが使
用でき、特にインジウム灯,低圧水銀灯,高圧水
銀炉,超高圧水銀炉などは工業的に有利である。 The ultraviolet-containing light may be light with a wavelength that activates chlorine, such as sunlight, discharge lamps, and incandescent lamps. In particular, indium lamps, low-pressure mercury lamps, high-pressure mercury furnaces, and ultra-high-pressure mercury furnaces are suitable for industrial use. It's advantageous.
反応温度は、50℃以上溶媒の沸点以下が好まし
い。50℃以下の温度では反応速度が非常に遅く、
又塩素の溶存量が多くなるため一旦反応が始まる
と突沸する場合がある。溶媒の沸点以下であつて
も150℃以上では副反応が増加し著しい収率の低
下が見られる。 The reaction temperature is preferably 50°C or higher and lower than the boiling point of the solvent. At temperatures below 50℃, the reaction rate is very slow.
Additionally, since the amount of dissolved chlorine increases, bumping may occur once the reaction starts. Even if the temperature is below the boiling point of the solvent, if the temperature is above 150°C, side reactions will increase and the yield will drop significantly.
反応時間は10分ないし100時間、通常は1ない
し8時間程度である。反応開始と同時に原料は減
少しだすが、モノクロル誘導体が先ず生成する。
次いでジクロル誘導体,トリクロル誘導体が順次
生成し消滅して、目的とするパークロル誘導体即
ちトリクロロメチル置換フエニルエーテル類が最
後に生成する。置換された水素が塩素と結合して
発生した塩化水素の発生が止むまで反応は進行す
る。 The reaction time is 10 minutes to 100 hours, usually about 1 to 8 hours. At the same time as the reaction starts, the raw materials begin to decrease, but monochloro derivatives are produced first.
Next, dichlor derivatives and trichlor derivatives are sequentially produced and disappear, and the desired perchlor derivative, that is, trichloromethyl-substituted phenyl ethers, is finally produced. The reaction proceeds until hydrogen chloride, which is generated when the substituted hydrogen combines with chlorine, stops being generated.
副反応を抑制するために前記の光塩素化安定剤
や核塩素化防止剤を用いることは、しばしば好ま
しい結果をもたらすことがある。 Use of the photochlorination stabilizers and nuclear chlorination inhibitors described above to suppress side reactions often brings about favorable results.
使用する塩素ガスはボンベに充填した液化塩素
ガス及び電解工場で発生した塩素を直接反応器に
導入して使用することもできるが、通常工業的に
用いられている塩素ガスを使用することができ
る。塩素ガスを導入する量は、当量以上であれば
良いが当量量の2倍を越えると経済的に不利にな
るだけでなく、副反応が増加して収率の低下と目
的とするクロロメチル置換フエニルエーテル類の
純度の低下をもたらすので、当量の1.05倍ないし
1.5倍の範囲が好ましい。 The chlorine gas used can be liquefied chlorine gas filled in a cylinder or chlorine generated at an electrolytic factory and directly introduced into the reactor, but chlorine gas that is normally used industrially can also be used. . The amount of chlorine gas to be introduced should be equivalent or more, but if it exceeds twice the equivalent amount, it will not only be economically disadvantageous, but also side reactions will increase, resulting in a decrease in yield and the desired chloromethyl substitution. 1.05 times the equivalent amount or
A range of 1.5 times is preferred.
次いで本発明方法で得られたクロロメチル置換
フエニルエーテル類とテレフタル酸及び/又はイ
ソフタル酸を後述するごときフリーデル・クラフ
ツ触媒の存在下で反応させる。また、光塩素化反
応に溶媒として用いられた塩素化炭化水素は、蒸
溜によつて溜去されるか、またはその溶媒として
留去することなく本不均化反応の溶媒として用い
ることも可能である。このような溶媒としては、
該光塩素化反応と該不均化反応に対して不活性な
塩素化炭化水素が挙げられ、例えば四塩化炭素,
ジクロロエタン,トリクロロエタン,テトラクロ
ロエタンなどの塩素化パラフイン類やクロルベン
ゼンなどの塩素化芳香族化合物類が好ましい。溶
媒に対するクロロメチル置換フエニルエーテルと
テレフタル酸,イソフタル酸の合計の量は、20%
以上が好ましい。 The chloromethyl-substituted phenyl ether obtained by the method of the present invention is then reacted with terephthalic acid and/or isophthalic acid in the presence of a Friedel-Crafts catalyst as described below. In addition, the chlorinated hydrocarbon used as a solvent in the photochlorination reaction can be distilled off, or it can be used as a solvent in the disproportionation reaction without being distilled off. be. Such solvents include
Examples include chlorinated hydrocarbons that are inert to the photochlorination reaction and the disproportionation reaction, such as carbon tetrachloride,
Chlorinated paraffins such as dichloroethane, trichloroethane, and tetrachloroethane and chlorinated aromatic compounds such as chlorobenzene are preferred. The total amount of chloromethyl-substituted phenyl ether, terephthalic acid, and isophthalic acid relative to the solvent is 20%.
The above is preferable.
フリーデル・クラフツ触媒としてはアルミニウ
ム,アンチモン,鉄,チタン,スズ,亜鉛の塩化
物が用いられるが、特に塩化第二鉄が好ましく用
いられる。触媒量は、クロロメチル置換フエニル
エーテルとテレフタル酸,イソフタル酸の合計の
量に対して重量で0.005%ないし5%で、好まし
くは0.1%ないし2.50%である。 As the Friedel-Crafts catalyst, chlorides of aluminum, antimony, iron, titanium, tin, and zinc are used, and ferric chloride is particularly preferably used. The amount of catalyst is 0.005% to 5% by weight, preferably 0.1% to 2.50%, based on the total amount of chloromethyl-substituted phenyl ether, terephthalic acid, and isophthalic acid.
トリクロロメチル置換フエニルエーテルとテレ
フタル酸及び/又はイソフタル酸の割合は、クロ
ロメチル基の数とカルボキシル基の数がほぼ等し
くなるようにとることが必要であり、1:0.95な
いし1:1.05の割合であれば充分である。 The ratio of trichloromethyl-substituted phenyl ether to terephthalic acid and/or isophthalic acid must be set so that the number of chloromethyl groups and the number of carboxyl groups are approximately equal, and the ratio is 1:0.95 to 1:1.05. If so, it is sufficient.
反応温度は100〜250℃が採用される。100℃よ
り低い温度ではテレフタル酸やイソフタル酸の溶
解度が低い為に反応速度が遅過ぎて工業的には現
実的ではない。250℃より高いと塩素の脱離やタ
ール状物の生成が起こり収率の低下をもたらす。
好ましい反応温度は150℃〜230℃である。 The reaction temperature is 100 to 250°C. At temperatures lower than 100°C, the reaction rate is too slow due to the low solubility of terephthalic acid and isophthalic acid, making it industrially impractical. If the temperature is higher than 250°C, desorption of chlorine and generation of tar-like substances occur, resulting in a decrease in yield.
The preferred reaction temperature is 150°C to 230°C.
反応時間は10分ないし100時間、通常は1ない
し8時間程度である。トリクロロメチル基とカル
ボキシル基との反応では2分子のクロロカルボニ
ル基と1分子の塩素水素が発生する。従つて塩化
水素の発生が停止するまで反応は継続しなければ
ならない。 The reaction time is 10 minutes to 100 hours, usually about 1 to 8 hours. The reaction between a trichloromethyl group and a carboxyl group generates two molecules of chlorocarbonyl group and one molecule of chlorine hydrogen. Therefore, the reaction must continue until the evolution of hydrogen chloride has ceased.
上記のように反応を終了した後、必要に応じて
溶媒溜去,蒸溜,晶析して目的物を回収,生成す
る。フエニルエーテルカルボン酸クロライドとテ
レフタル酸クロライド及び/又はイソフタル酸ク
ロライドを混合物として回収するか、もしくはテ
レフタル酸クロライド及び/又はイソフタル酸ク
ロライドを先ず分離してからフエニルエーテルカ
ルボン酸クロライドを回収することもできる。フ
エニルエーテルカルボン酸類の晶析精製にはヘキ
サン類やヘプタン類のようなパラフイン類を含む
炭化水素類,四塩化炭素またはクロルベンゼンの
ような塩素化炭化水素類が用いられる。 After the reaction is completed as described above, the target product is recovered and produced by removing the solvent, distilling, and crystallizing as necessary. The phenyl ether carboxylic acid chloride and the terephthalic acid chloride and/or the isophthalic acid chloride can be recovered as a mixture, or the terephthalic acid chloride and/or the isophthalic acid chloride can be first separated and then the phenyl ether carboxylic acid chloride can be recovered. can. Hydrocarbons containing paraffins such as hexane and heptane, and chlorinated hydrocarbons such as carbon tetrachloride or chlorobenzene are used for crystallization and purification of phenyl ether carboxylic acids.
[発明の効果]
本発明の方法によれば、フエノキシ基のような
置換基を持つメタル置換フエニルエーテル類を光
塩素化して得たクロロメチル置換フエニルエーテ
ル類を原料としてフエニルエーテルカルボン酸ク
ロライドとテレフタル酸クロライド及び/又はイ
ソフタル酸クロライドの等モル混合物を容易に且
つ収率良く得ることができる。[Effects of the Invention] According to the method of the present invention, phenyl ether carboxylic acid is produced using chloromethyl-substituted phenyl ethers obtained by photochlorinating metal-substituted phenyl ethers having a substituent such as a phenoxy group as a raw material. An equimolar mixture of chloride and terephthalic acid chloride and/or isophthalic acid chloride can be easily obtained with good yield.
以下実施例を掲げて本発明を詳述する。 The present invention will be described in detail below with reference to Examples.
[実施例]
光反応用500ml玉径フラスコに3,4′−ジメチ
ルジフエニルエーテル100g(0.504モル),1,
1,2,2−テトラクロルエタン250mlを入れ、
冷却器,撹拌器,塩素吹込管,温度計,高圧水銀
炉(ウシオ電機(株)製UM−102型)及びランプ冷
却器を付しオイルバスにて内温70℃に昇温し光を
照射して塩素を吹き込んだ。塩素ガスの吹き込み
速度は300ml/minで反応時間は4時間30分であ
つた。反応終了後窒素ガスを100ml/minで10分
間導入し、未反応の塩素ガスと副生した塩素水素
の溶存分をパージした。反応混合物を500ml容ナ
ス形フラスコへ移し、ここへテレフタル酸85g
(0.506モル)と無水塩化鉄2.5g(0.015モル)を
投入し、マグネテイツクスターラーで撹拌しなが
ら、オイルバスで昇温した。4時間溶媒を環流せ
しめて反応を完了した。反応終了後50〜60℃/15
〜20mmHgで溶媒を留去し、更に105〜115℃/1
〜2mmHgでテレフタル酸クロライド95g(0.468
モル)を得た。この蒸溜残液に四塩化炭素を150
ml加え加熱して、不溶物を別し、冷却して3,
4′−ジフエニルエーテルカルボン酸クロライド
115g(0.390モル)を得た。収率77%であつた。
更にこれを185〜190℃/0.5mmHgで蒸留して109
gを得た。収率は73%であつた。[Example] 100 g (0.504 mol) of 3,4'-dimethyl diphenyl ether, 1,
Add 250ml of 1,2,2-tetrachloroethane,
Equipped with a cooler, stirrer, chlorine injection tube, thermometer, high-pressure mercury furnace (UM-102 model manufactured by Ushio Inc.), and lamp cooler, the internal temperature was raised to 70℃ in an oil bath and irradiated with light. Then I blew chlorine into it. The chlorine gas blowing rate was 300 ml/min, and the reaction time was 4 hours and 30 minutes. After the reaction was completed, nitrogen gas was introduced at 100 ml/min for 10 minutes to purge unreacted chlorine gas and dissolved by-produced chlorine hydrogen. Transfer the reaction mixture to a 500ml eggplant flask and add 85g of terephthalic acid thereto.
(0.506 mol) and 2.5 g (0.015 mol) of anhydrous iron chloride were added, and the temperature was raised in an oil bath while stirring with a magnetic stirrer. The reaction was completed by refluxing the solvent for 4 hours. 50-60℃/15 after reaction completion
Distill the solvent at ~20 mmHg and further heat at 105-115℃/1
Terephthalic acid chloride 95g (0.468
mole) was obtained. Add 150% carbon tetrachloride to this distillation residue.
Add ml, heat, separate insoluble matter, cool, and 3.
4'-Diphenyl ether carboxylic acid chloride
115 g (0.390 mol) was obtained. The yield was 77%.
Furthermore, this was distilled at 185-190℃/0.5mmHg and 109
I got g. The yield was 73%.
Claims (1)
結合手を表わす。またそれぞれのベンゼン環に
おける2つの結合手はベンゼン環において互い
にオルソ位に位置することはない。〕 で表わされるメチル置換フエニルエーテル類を
光塩素化せしめて、 下記一般式[] 〔但し式中nおよび各ベンゼン環における結合
手の位置の定義は前記一般式[]と同じであ
る。〕 で表わされるクロロメチル置換フエニルエーテ
ル類を含む反応混合物を得、 (B) 次いで前記反応混合物に、テレフタル酸およ
び/またはイソフタル酸を添加し、フリーデル
クラフツ触媒の存在下前記一般式[]のクロ
ロメチル置換フエニルエーテル類と均一化反応
せしめることを特徴とする下記一般式[] 〔但し式中nおよび各ベンゼン環における結合手
の位置の定義は前記一般式[]と同じである。〕 で表わされるフエニルエーテルカルボン酸クロ
ライドとテレフタル酸クロライドおよび/また
はイソフタル酸クロライドよりなるカルボン酸
クロライドの製造法。 2 該塩素化と均一化反応を同一の溶媒中で行な
う第1項記載の製造法。 3 該塩素化を50℃以上150℃以下の範囲の温度
で行なう第1項記載のクロロメチル置換フエニル
エーテル類の製造法。 4 カルボン酸類とクロロメチル置換フエニルエ
ーテル類を100℃ないし250℃の範囲の温度で接触
せしめる第1項記載のカルボン酸クロライドの製
造法。 5 該均一化反応を、鉄触媒の存在下で行なう第
1項記載の製造法。[Claims] 1 (A) The following general formula [] [However, in the formula, n represents 0 or 1, and when it is 0, it represents a bond. Furthermore, the two bonds in each benzene ring are not located at ortho positions to each other in the benzene ring. ] The methyl-substituted phenyl ethers represented by are photochlorinated to form the following general formula [] [However, the definitions of n in the formula and the position of the bond in each benzene ring are the same as in the above general formula []. ] Obtain a reaction mixture containing a chloromethyl-substituted phenyl ether represented by (B) Then, terephthalic acid and/or isophthalic acid is added to the reaction mixture, and in the presence of a Friedel-Crafts catalyst, a reaction mixture containing a chloromethyl-substituted phenyl ether is obtained. The following general formula [] is characterized by a homogenization reaction with a chloromethyl-substituted phenyl ether of [However, the definitions of n in the formula and the position of the bond in each benzene ring are the same as in the above general formula []. ] A method for producing a carboxylic acid chloride consisting of phenyl ether carboxylic acid chloride represented by the following and terephthalic acid chloride and/or isophthalic acid chloride. 2. The production method according to item 1, wherein the chlorination and homogenization reactions are carried out in the same solvent. 3. The method for producing chloromethyl-substituted phenyl ethers according to item 1, wherein the chlorination is carried out at a temperature in the range of 50°C or higher and 150°C or lower. 4. The method for producing a carboxylic acid chloride according to item 1, wherein the carboxylic acid and the chloromethyl-substituted phenyl ether are brought into contact at a temperature in the range of 100°C to 250°C. 5. The production method according to item 1, wherein the homogenization reaction is carried out in the presence of an iron catalyst.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61158672A JPS6314754A (en) | 1986-07-08 | 1986-07-08 | Production of carboxylic acid chloride |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61158672A JPS6314754A (en) | 1986-07-08 | 1986-07-08 | Production of carboxylic acid chloride |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6314754A JPS6314754A (en) | 1988-01-21 |
JPH0541624B2 true JPH0541624B2 (en) | 1993-06-24 |
Family
ID=15676841
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61158672A Granted JPS6314754A (en) | 1986-07-08 | 1986-07-08 | Production of carboxylic acid chloride |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6314754A (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3100450B2 (en) * | 1991-01-11 | 2000-10-16 | 株式会社リコー | Image recording method and apparatus used therefor |
US6177383B1 (en) | 1998-03-23 | 2001-01-23 | Ricoh Company, Ltd. | Reversible thermosensitive recording medium, and image forming and erasing method |
-
1986
- 1986-07-08 JP JP61158672A patent/JPS6314754A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6314754A (en) | 1988-01-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US3547960A (en) | Catalysts for the preparation of acid halides | |
US11434188B2 (en) | Method for manufacturing 1,4-bis (4-phenoxybenzoyl)benzene at an elevated temperature | |
JPH0541624B2 (en) | ||
US3706794A (en) | Production of sulphonyl chlorides | |
EP0024286B1 (en) | Process for the preparation of aromatic dicarboxylic acid dichlorides and their use in the preparation of polycondensates | |
JPS6340176B2 (en) | ||
JP4171627B2 (en) | Method for producing p-dichlorobenzene | |
CN1067371C (en) | Method for making acyl substituted resorcinols | |
JPS63316753A (en) | Manufacture of carboxylic acid halogenide having more thane seven carbon atoms | |
JPH0541623B2 (en) | ||
JP2927023B2 (en) | Method for producing aromatic tetracarboxylic acid | |
JPS62286944A (en) | Production of trichloromethyl-substituted phenyl ether compound | |
JP2011046664A (en) | Method for producing aromatic polycarboxylic acid polychloride | |
US5493054A (en) | Process for the synthesis of acid halides and reactants useful for its implementation | |
JP3808908B2 (en) | Process for producing α, α'-dichloroadipic acid diester | |
CN102414161B (en) | Process for producing phthalic acid compound including chlorinated aromatic ring | |
EP0495350B1 (en) | Process for the preparation of 4,4'-bis(4-chlorobenzoyl)benzophenone | |
US3639470A (en) | Process for the production of mixed carboxylic-sulfonic acid chloride derivatives of benzene | |
JPS61155350A (en) | Production of fatty acid chloride and aromatic acid chloride | |
JPH07330663A (en) | Method for producing 2-chloroterephthalic acid chloride | |
JPH04273845A (en) | Production of high-purity 2-chloroterephthaloyl chloride | |
JPS6313976B2 (en) | ||
WO2006009678A1 (en) | Catalyst compositions and their use for chlorinating aromatic compounds | |
JPH04327557A (en) | Production of high-purity aromatic dicarboxylic acid dichloride mononucleus chloride | |
JPH04312551A (en) | Production of nucleus-monochlorinated aromatic dicarboxylic acid dichloride |