JPH0533466U - Airtight terminal - Google Patents
Airtight terminalInfo
- Publication number
- JPH0533466U JPH0533466U JP090604U JP9060491U JPH0533466U JP H0533466 U JPH0533466 U JP H0533466U JP 090604 U JP090604 U JP 090604U JP 9060491 U JP9060491 U JP 9060491U JP H0533466 U JPH0533466 U JP H0533466U
- Authority
- JP
- Japan
- Prior art keywords
- terminal
- thermal expansion
- substrate
- coefficient
- insulating material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002184 metal Substances 0.000 claims abstract description 38
- 239000000758 substrate Substances 0.000 claims abstract description 25
- 239000011810 insulating material Substances 0.000 claims abstract description 14
- 238000007789 sealing Methods 0.000 claims abstract description 14
- 238000010030 laminating Methods 0.000 claims description 3
- 239000011521 glass Substances 0.000 abstract description 16
- 239000000203 mixture Substances 0.000 abstract description 4
- 239000005394 sealing glass Substances 0.000 abstract description 3
- 239000000945 filler Substances 0.000 description 12
- 229910000833 kovar Inorganic materials 0.000 description 4
- 238000005452 bending Methods 0.000 description 3
- 238000009863 impact test Methods 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000002241 glass-ceramic Substances 0.000 description 1
- XZWYZXLIPXDOLR-UHFFFAOYSA-N metformin Chemical compound CN(C)C(=N)NC(N)=N XZWYZXLIPXDOLR-UHFFFAOYSA-N 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
Landscapes
- Connections Arranged To Contact A Plurality Of Conductors (AREA)
Abstract
(57)【要約】
【目的】 従来のガラス封止型気密端子に比較して、耐
熱強度、機械的強度が良好で、信頼性があり、かつ安価
な気密端子を提供する。
【構成】 絶縁材基板1に金属枠2を立設して気密空間
3を形成すると共に、前記絶縁材基板1に金属リード端
子4を前記気密空間と外部とに貫通するように封着した
気密端子において、前記絶縁材基板1は底面11より順
次熱膨張率が小さくなる層を複数積層し、その最上層1
3は前記金属枠の熱膨張率と同一か近似した絶縁材とし
たことを特徴とする。
【効果】 基板として最上層より順次熱膨張率が大きく
なる複数の層を積層して構成してあるため、前記気密端
子の底部となる最下層は高強度、高軟化点のガラスとな
る。したがって、従来のように封着ガラス一種を使用し
た場合に比較して、良好な強度を有するという利点を生
じる。一方、最上面は熱膨張率が金属枠、金属リード端
子と同一又は類似した封着用のガラスであるため、金属
枠と基板との封着強度に影響を生じることはない。
(57) [Summary] [Object] To provide a reliable and inexpensive hermetic terminal having excellent heat resistance and mechanical strength as compared with a conventional glass-sealed hermetic terminal. [Composition] A metal frame 2 is erected on an insulating material substrate 1 to form an airtight space 3, and a metal lead terminal 4 is sealed on the insulating material substrate 1 so as to penetrate the airtight space and the outside. In the terminal, the insulating material substrate 1 is formed by stacking a plurality of layers having a coefficient of thermal expansion sequentially lower than the bottom surface 11,
3 is an insulating material having the same or similar thermal expansion coefficient as that of the metal frame. As a substrate, a plurality of layers having a coefficient of thermal expansion sequentially higher than that of the uppermost layer are laminated, so that the lowermost layer, which is the bottom of the airtight terminal, is glass having high strength and high softening point. Therefore, as compared with the case where one kind of sealing glass is used as in the related art, there is an advantage that it has good strength. On the other hand, since the uppermost surface is the glass for sealing which has the same or similar coefficient of thermal expansion as the metal frame and the metal lead terminal, it does not affect the sealing strength between the metal frame and the substrate.
Description
【0001】[0001]
本考案は気密端子、さらに詳細には強度が良好で、信頼性の優れた気密端子に 関する。 The present invention relates to a hermetic terminal, and more particularly to a hermetic terminal having good strength and excellent reliability.
【0002】[0002]
気密端子は、図5、図6に示すように絶縁材よりなる基板1に金属枠2を立設 し、これによって形成された気密空間3に金属リード端子4を、前記気密空間3 と外部に貫通するように封着した構造になっている。 As shown in FIGS. 5 and 6, the airtight terminal comprises a metal frame 2 erected on a substrate 1 made of an insulating material, and a metal lead terminal 4 in an airtight space 3 formed by the metal frame 2 and an airtight space 3 and the outside. The structure is sealed so that it penetrates.
【0003】 このような気密端子は、前記気密空間3に回路部品などを装着すると共に、前 記金属リード端子4に電気的に接続せしめ、その後金属製の蓋(図示せず)を被 せて、金属枠2と蓋を接着させ、前記回路部品などを気密に封入するようになっ ている。Such an airtight terminal has circuit parts and the like mounted in the airtight space 3 and is electrically connected to the metal lead terminal 4 described above, and then covered with a metal lid (not shown). The metal frame 2 and the lid are adhered to hermetically seal the circuit parts and the like.
【0004】 上述のような図5、図6に示す気密端子を構成する絶縁材としては、ガラスが 使用されている。これは、ガラスが金属との封着が容易であり、リード端子およ び金属枠を封着ないし接着させ易いからである。しかしながら、ガラスで封着す る気密端子においては、機械的強度、耐熱強度に問題があり、特に表面実装型の 上述のような気密端子においてはガラス底面に直接外的物理応力が加わることに なるためクラック、しいてはパッケージ破損という自体を生じる恐れがあった。Glass is used as an insulating material forming the airtight terminal shown in FIGS. 5 and 6 as described above. This is because the glass is easily sealed to the metal, and the lead terminals and the metal frame are easily sealed or bonded. However, glass-sealed airtight terminals have problems in mechanical strength and heat resistance, and especially in surface-mounted airtight terminals as described above, external physical stress is directly applied to the glass bottom surface. Therefore, there is a possibility that cracks and eventually package damage may occur.
【0005】[0005]
本考案は上述の点に鑑みなされたものであり、従来のガラス封止型気密端子に 比較して、耐熱強度、機械的強度が良好で、信頼性があり、かつ安価な気密端子 を提供することを目的とする。 The present invention has been made in view of the above points, and provides a reliable and inexpensive airtight terminal that has better heat resistance and mechanical strength than conventional glass-sealed airtight terminals. The purpose is to
【0006】[0006]
【問題点を解決するための手段】 上記目的を達成するため、本考案による気密端子は、絶縁材基板に金属枠を立 設して気密空間を形成すると共に、前記絶縁材基板に金属リード端子を前記気密 空間と外部とに貫通するように封着した気密端子において、前記絶縁材基板は底 面より順次熱膨張率が小さくなる層を複数積層し、その最上層は前記金属枠の熱 膨張率と同一か近似した絶縁材としたことを特徴とする。[Means for Solving the Problems] To achieve the above object, an airtight terminal according to the present invention comprises a metal frame standing on an insulating material substrate to form an airtight space, and a metal lead terminal on the insulating material substrate. In an airtight terminal that is sealed so as to penetrate the airtight space and the outside, the insulating material substrate is formed by stacking a plurality of layers whose thermal expansion coefficients are successively smaller than the bottom surface, and the uppermost layer is the thermal expansion of the metal frame. It is characterized in that the insulating material is the same as or close to the rate.
【0007】 本考案によれば、基板として最上層より順次熱膨張率が大きくなる複数の層を 積層して構成してあるため、前記気密端子の底部となる最下層は熱膨張率が大き い、高強度、高軟化点のセラミックス粉末などをフィラーとして多く添加された 、いわゆるガラスセラミックスの採用ができる。したがって、従来のように封着 ガラス一種を使用した場合に比較して、良好な強度を有するという利点を生じる 。一方、最上面は熱膨張率が金属枠と類似した封着用のガラスであるため、金属 枠と基板との封着強度に影響を生じることはない。According to the present invention, since the substrate is formed by laminating a plurality of layers having a coefficient of thermal expansion higher than that of the uppermost layer, the bottom layer of the bottom of the hermetic terminal has a large coefficient of thermal expansion. It is possible to employ so-called glass ceramics to which a large amount of high strength, high softening point ceramic powder or the like is added as a filler. Therefore, compared with the case where one kind of sealing glass is used as in the conventional case, there is an advantage that it has good strength. On the other hand, since the uppermost surface is glass for sealing, which has a coefficient of thermal expansion similar to that of a metal frame, it does not affect the sealing strength between the metal frame and the substrate.
【0008】[0008]
図1は本考案の気密端子の一実施例の断面図であるが、この実施例より明らか なように、本考案による気密端子は、基板1上に金属枠2を立設すると共に、金 属リード端子4を気密空間3の内外に貫通するように封着している。前記金属リ ード端子4は図5、図6に示すものと同様に断面クランク状となっており、気密 端子底面(基板底面)を伸長し、気密空間3に垂直に突出するように封着されて いる。 FIG. 1 is a sectional view of an embodiment of the airtight terminal of the present invention. As is apparent from this embodiment, the airtight terminal according to the present invention has a metal frame 2 erected on a substrate 1 and a metal structure. The lead terminals 4 are sealed so as to penetrate the inside and outside of the airtight space 3. The metal lead terminal 4 has a crank-shaped cross-section similar to that shown in FIGS. 5 and 6, and is sealed so that the bottom of the airtight terminal (bottom of the substrate) extends and projects vertically to the airtight space 3. Has been done.
【0009】 本考案においては、図1より明らかなように、最下層11より最上層13にか けて熱膨張率が順次小さくなるように、ガラスを積層している。この実施例にお いては中間層12は一層示しているが、これが複数層であってもよく、省略して もよい。In the present invention, as is apparent from FIG. 1, glass is laminated so that the coefficient of thermal expansion gradually decreases from the lowermost layer 11 to the uppermost layer 13. Although one intermediate layer 12 is shown in this embodiment, it may have a plurality of layers or may be omitted.
【0010】 最上層13は金属枠2を封着する必要があることから、この金属枠2の材料と 同一の熱膨張率か類似した熱膨張率である必要がある。Since the uppermost layer 13 needs to seal the metal frame 2, it needs to have the same or similar thermal expansion coefficient as the material of the metal frame 2.
【0011】 この実施例においては、前記金属リード端子4は最上層13によって封着され た構造になっている。すなわち前記基板1を製造するに際し、図2aに示すよう に、最下層11より中間層12、最上層13を積層するにあたり、ガラスブロッ クのそれぞれのリード端子を封着する部分に穴部14を設けると共に、前記穴部 14を最下層11より最上層13にかけて順次小さくなるように構成する。次い で、最上層13方向よりポンチ5などによりこのリード端子封着穴14を押し込 むと、図2bに示すような表面が最上層13で覆われたリード端子封着穴15が 形成される。In this embodiment, the metal lead terminals 4 are sealed by the uppermost layer 13. That is, when the substrate 1 is manufactured, as shown in FIG. 2a, when the lowermost layer 11 to the intermediate layer 12 and the uppermost layer 13 are laminated, holes 14 are formed at the portions where the respective lead terminals of the glass block are sealed. The holes 14 are provided, and the holes 14 are formed so as to become gradually smaller from the lowermost layer 11 to the uppermost layer 13. Next, when the lead terminal sealing hole 14 is pushed in from the direction of the uppermost layer 13 with the punch 5 or the like, the lead terminal sealing hole 15 whose surface is covered with the uppermost layer 13 is formed as shown in FIG. 2B. ..
【0012】 上述のような金属枠2及び金属リード端子4としては、一般にこの種の気密端 子に使用する材料を有効に使用することができる。たとえば、コバール、42ア ローイなどを使用することができる。As the metal frame 2 and the metal lead terminal 4 as described above, a material generally used for an airtight terminal of this type can be effectively used. For example, Kovar, 42 Arrow, etc. can be used.
【0013】 上述のようなコバール金属(熱膨張率45×10-7/℃)を使用するとき、最 上層13としてはコバール封止用ガラスのSiO2−B2O3系ガラスに対しフィ ラーとしてAl2O3、ZrO2等の一種以上を0〜30重量%添加したガラスを 使用することができる。前記フィラーを添加しない場合、熱膨張率は45×10 -7 /℃とコバールと同様であり、一方フィラーを添加するにつれて熱膨張率は大 きくなる傾向がある。30重量%を越えると金属枠、リード端子と接着性あるい は熱膨張率差に問題を生じる。Kovar metal as described above (coefficient of thermal expansion 45 × 10-7/ ° C.) is used, the uppermost layer 13 is made of SiO for sealing Kovar.2-B2O3Al as filler for glass2O3, ZrO2It is possible to use glass to which 0 to 30% by weight of one or more of the above is added. When the filler is not added, the coefficient of thermal expansion is 45 × 10. -7 / ° C and similar to Kovar, while the coefficient of thermal expansion tends to increase as the filler is added. If it exceeds 30% by weight, there is a problem with the adhesiveness to the metal frame or the lead terminal or the difference in the coefficient of thermal expansion.
【0014】 上記最上層13より最下層11にかけて順次前記フィラーの添加量を増加する ことによって、熱膨張率が徐々に大きくなる。この場合、相互に隣接する層の熱 膨張率の差は好ましくは小さいほうがよいのは明らかである。差の上限としては 好ましくは、2×10-7/℃以下であるのがよい。このため、相互に隣接する層 のフィラーの添加量の差としては10重量%以下であるのがよい。The thermal expansion coefficient is gradually increased by sequentially increasing the amount of the filler added from the uppermost layer 13 to the lowermost layer 11. In this case, it is clear that the difference in the coefficient of thermal expansion between the layers adjacent to each other should preferably be small. The upper limit of the difference is preferably 2 × 10 −7 / ° C. or less. Therefore, the difference in the addition amount of the filler in the layers adjacent to each other is preferably 10% by weight or less.
【0015】 SiO2−B2O3系ガラスを使用したときのフィラーの添加量の例を以下に示 す。An example of the amount of filler added when SiO 2 —B 2 O 3 based glass is used is shown below.
【0016】 組成例1 フィラー量(重量%) 熱膨張係数(×10-7/℃) 最上層 0 45 中間層 10 47 最下層 20 49Composition Example 1 Amount of filler (% by weight) Thermal expansion coefficient (× 10 −7 / ° C.) Uppermost layer 0 45 Intermediate layer 10 47 Lowermost layer 20 49
【0017】 組成例2 フィラー量(重量%) 熱膨張係数(×10-7/℃) 最上層 10 47 中間層 20 49 最下層 30 51Composition Example 2 Filler amount (% by weight) Thermal expansion coefficient (× 10 −7 / ° C.) Top layer 10 47 Intermediate layer 20 49 Bottom layer 30 51
【0018】 組成例3 フィラー量(重量%) 熱膨張係数(×10-7/℃) 最上層 20 49 中間層 30 51 最下層 40 53Composition Example 3 Amount of filler (% by weight) Thermal expansion coefficient (× 10 −7 / ° C.) Uppermost layer 20 49 Intermediate layer 30 51 Lowermost layer 40 53
【0019】 上記は三層構造の基板について示したが、例えば五層構造に形成する場合、最 上層より、添加量0、5、10、15、20重量%の5重量%間隔で層を構成す ることもできる。The above shows a substrate having a three-layer structure, but in the case of forming a five-layer structure, for example, the layers are formed at 5 wt% intervals from the uppermost layer with an addition amount of 0, 5, 10, 15, 20 wt%. You can also do it.
【0020】 上述のようなSiO2−B2O3系ガラスのフィラー(Al2O3)添加量とガラ ス荷重試験の結果を図3に、落下衝撃テストの結果を図4に示す。The amount of the filler (Al 2 O 3 ) added to the SiO 2 —B 2 O 3 based glass and the result of the glass load test are shown in FIG. 3, and the result of the drop impact test is shown in FIG.
【0021】 ガラス荷重試験(抗折試験)は島津オートグラフを使用し、サンプルがおれた 荷重で評価した。In the glass load test (bending test), Shimadzu Autograph was used, and the load on which the sample was placed was evaluated.
【0022】 落下衝撃試験は0.9gの鋼球を所定高さよりサンプル上に落下させてサンプ ルが破壊した高さで測定した。In the drop impact test, a 0.9 g steel ball was dropped onto a sample from a predetermined height and the height at which the sample broke was measured.
【0023】 上記の図3及び図4より明らかなように抗折強度及び落下衝撃強度はフィラー の添加量が多くなるにしたがって向上する傾向があることがわかる。したがって 、本考案のように基板を構成することによって、電気的特性および環境的特性を 損なうことなく、機械的特性に優れたガラス封着気密端子を提供できる。As is clear from FIGS. 3 and 4, the bending strength and the drop impact strength tend to improve as the amount of filler added increases. Therefore, by constructing the substrate as in the present invention, it is possible to provide a glass-sealed hermetic terminal having excellent mechanical properties without impairing the electrical and environmental properties.
【0024】[0024]
本考案によれば、基板として最上層より順次熱膨張率が大きくなる複数の層を 積層して構成してあるため、前記気密端子の底部となる最下層は高強度、高軟化 点のガラスとなる。したがって、従来のように封着ガラス一種を使用した場合に 比較して、良好な強度を有するという利点を生じる。一方、最上面は熱膨張率が 金属枠、金属リード端子と同一又は類似した封着用のガラスであるため、金属枠 と基板との封着強度に影響を生じることはない。 According to the present invention, since the substrate is formed by laminating a plurality of layers whose coefficient of thermal expansion is sequentially higher than that of the uppermost layer, the lowermost layer which is the bottom of the hermetic terminal is made of glass having high strength and high softening point. Become. Therefore, as compared with the case where one kind of sealing glass is used as in the related art, there is an advantage that it has good strength. On the other hand, since the uppermost surface is a glass for sealing, which has the same or similar coefficient of thermal expansion as the metal frame and the metal lead terminals, it does not affect the sealing strength between the metal frame and the substrate.
【図1】本考案の気密端子の一実施例の断面図。FIG. 1 is a sectional view of an embodiment of the airtight terminal of the present invention.
【図2a】リード端子封着穴を形成する方法の断面図。FIG. 2a is a sectional view of a method for forming a lead terminal sealing hole.
【図2b】リード端子封着穴の構造を示す断面図。FIG. 2b is a sectional view showing the structure of a lead terminal sealing hole.
【図3】抗折試験の結果を示す図。FIG. 3 is a view showing a result of a bending test.
【図4】落下衝撃試験の結果を示す図。FIG. 4 is a diagram showing the results of a drop impact test.
【図5】従来の気密端子の斜視図。FIG. 5 is a perspective view of a conventional airtight terminal.
【図6】前記従来の気密端子の断面図。FIG. 6 is a sectional view of the conventional airtight terminal.
1 基板 2 金属枠 3 気密空間 4 金属リード端子 11 最下層 12 中間層 13 最上層 15 リード端子封着穴 1 Substrate 2 Metal Frame 3 Airtight Space 4 Metal Lead Terminal 11 Bottom Layer 12 Middle Layer 13 Top Layer 15 Lead Terminal Sealing Hole
Claims (2)
形成すると共に、前記絶縁材基板に金属リード端子を前
記気密空間と外部とに貫通するように封着した気密端子
において、前記絶縁材基板は底面より順次熱膨張率が小
さくなる層を複数積層し、その最上層は前記金属枠の熱
膨張率と同一か近似した絶縁材としたことを特徴とする
気密端子。1. An airtight terminal in which a metal frame is erected on an insulating material substrate to form an airtight space, and a metal lead terminal is sealed on the insulating material substrate so as to penetrate the airtight space and the outside, The airtight terminal, wherein the insulating material substrate is formed by laminating a plurality of layers having a coefficient of thermal expansion smaller than that of the bottom surface, and the uppermost layer thereof is an insulating material having a coefficient of thermal expansion that is the same as or close to that of the metal frame.
最上層が前記封着穴の表面となるように折曲するように
形成されており、金属リード端子は少なくとも一部が前
記基板の最上層で封着されていることを特徴とする請求
項1記載の気密端子。2. The lead terminal sealing hole of the substrate is formed so as to be bent so that the uppermost layer of the substrate is the surface of the sealing hole, and at least a part of the metal lead terminal is formed on the substrate. The airtight terminal according to claim 1, wherein the airtight terminal is sealed with the uppermost layer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP090604U JPH0533466U (en) | 1991-10-08 | 1991-10-08 | Airtight terminal |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP090604U JPH0533466U (en) | 1991-10-08 | 1991-10-08 | Airtight terminal |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0533466U true JPH0533466U (en) | 1993-04-30 |
Family
ID=14003081
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP090604U Pending JPH0533466U (en) | 1991-10-08 | 1991-10-08 | Airtight terminal |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0533466U (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10454127B2 (en) | 2016-09-28 | 2019-10-22 | Toshiba Energy Systems & Solutions Corporation | Fuel cell module |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59203779A (en) * | 1983-04-28 | 1984-11-17 | 株式会社東芝 | Method of bonding ceramic sintered bodies having different thermal expansion coefficients or ceramic sintered body to metal member |
JPH0256360B2 (en) * | 1982-11-06 | 1990-11-29 | Rikagaku Kenkyusho | |
JPH03157989A (en) * | 1989-11-15 | 1991-07-05 | Murata Mfg Co Ltd | Bonding structure of ceramic board and metal plate |
-
1991
- 1991-10-08 JP JP090604U patent/JPH0533466U/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0256360B2 (en) * | 1982-11-06 | 1990-11-29 | Rikagaku Kenkyusho | |
JPS59203779A (en) * | 1983-04-28 | 1984-11-17 | 株式会社東芝 | Method of bonding ceramic sintered bodies having different thermal expansion coefficients or ceramic sintered body to metal member |
JPH03157989A (en) * | 1989-11-15 | 1991-07-05 | Murata Mfg Co Ltd | Bonding structure of ceramic board and metal plate |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10454127B2 (en) | 2016-09-28 | 2019-10-22 | Toshiba Energy Systems & Solutions Corporation | Fuel cell module |
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