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JPH05331655A - Substitution type electroless gold plating solution - Google Patents

Substitution type electroless gold plating solution

Info

Publication number
JPH05331655A
JPH05331655A JP13504592A JP13504592A JPH05331655A JP H05331655 A JPH05331655 A JP H05331655A JP 13504592 A JP13504592 A JP 13504592A JP 13504592 A JP13504592 A JP 13504592A JP H05331655 A JPH05331655 A JP H05331655A
Authority
JP
Japan
Prior art keywords
plating solution
gold
electroless gold
substitution type
gold plating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13504592A
Other languages
Japanese (ja)
Inventor
Kayoko Kojima
佳世子 児島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Original Assignee
Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Priority to JP13504592A priority Critical patent/JPH05331655A/en
Publication of JPH05331655A publication Critical patent/JPH05331655A/en
Pending legal-status Critical Current

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  • Chemically Coating (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

(57)【要約】 【目的】 リンの共析を抑えた安定性に優れた置換型無
電解金めっき液を提供することを目的とする。 【構成】 シアン化金塩と、亜リン酸ナトリウムなどの
還元剤としての亜リン酸塩と、各種の有機酸もしくはそ
の塩並びに無機塩から成るpH調整剤とを含んでなる置
換型無電解金めっき液を提供する。
(57) [Summary] [Purpose] It is an object to provide a substitution type electroless gold plating solution which suppresses the eutectoid of phosphorus and is excellent in stability. A substitutional electroless gold containing a gold cyanide salt, a phosphite as a reducing agent such as sodium phosphite, and a pH adjusting agent comprising various organic acids or salts thereof and inorganic salts Provide a plating solution.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、目的金属に無電解で金
めっきする場合の置換型無電解金めっき液に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substitution type electroless gold plating solution for electrolessly plating a target metal with gold.

【0002】[0002]

【従来の技術】エレクトロニクス分野では表面処理技術
の重要性が増しており、その一つとしてめっきが行われ
ている。
2. Description of the Related Art In the field of electronics, surface treatment technology is becoming more important and plating is one of them.

【0003】めっきは、電気分解による電着を利用して
陰極物体の表面を金属薄膜で覆う電解めっきと、材料表
面の接触作用による還元を利用した無電解めっき(化学
めっき)に大別されるが、電解めっきは電源を必要とす
るととともに、複雑な形状の品物に実施する場合に電流
分布を均一にすることが困難なため、近年は無電解めっ
きが利用されている。
Plating is roughly classified into electrolytic plating in which the surface of a cathode object is covered with a metal thin film by utilizing electrodeposition by electrolysis, and electroless plating (chemical plating) in which reduction is caused by the contact action of the material surface. However, since electroplating requires a power source and it is difficult to make the current distribution uniform when it is applied to an article having a complicated shape, electroless plating has been used in recent years.

【0004】無電解めっきの中でも、金めっきは印刷回
路へのめっきや、装飾に利用されており、無電解金めっ
き液としては、例えば、シアン化金カリウムを金塩とし
て、還元剤として次亜リン酸ナトリウムもしくはヒドラ
ジン、並びにpH調整剤としての有機酸もしくはその塩
並びに無機塩から成る置換型無電解金めっき液が知られ
ている。
Among electroless plating, gold plating is used for plating on printed circuits and decoration. As an electroless gold plating solution, for example, potassium gold cyanide is used as a gold salt, and a reducing agent is used as hypoxia. A substitution type electroless gold plating solution comprising sodium phosphate or hydrazine and an organic acid or its salt as a pH adjusting agent and an inorganic salt is known.

【0005】この置換型無電解金めっき液は、ニッケル
などの卑金属を下地として使用したとき、安定な皮膜と
なるため使用頻度が高い(S.D.Swan and E.L.Gostin;Me
talFinishing,59,4(1961))。
This substitution type electroless gold plating solution is frequently used because it forms a stable film when a base metal such as nickel is used as a base (SDSwan and ELGostin; Me).
talFinishing, 59 , 4 (1961)).

【0006】[0006]

【発明が解決しようとする課題】しかしながら、上記置
換型無電解金めっき液で還元剤として次亜リン酸塩を用
いたとき H2 PO2 +H2 O→H2 PO3 +2H [Au(CN)2 +H→Au+HCN+CN2 PO2 +H→P+OH+H2 O の反応が進行して、金の析出と共にリンが共析した。
However, when hypophosphite is used as a reducing agent in the substitutional electroless gold plating solution, H 2 PO 2 + H 2 O → H 2 PO 3 + 2H [Au ( CN) 2] - + H → Au + HCN + CN - H 2 PO 2 - + H → P + OH - + H 2 O reaction progresses, phosphorus codeposited with gold deposition.

【0007】なお、自己触媒型金めっき液としてホウ水
素化物やボラン系化合物を還元剤として用いたものも多
数開発されているが、めっき液が不安定であった(Y.Ok
inaka,Plating 57,914(1970) L.A.D' Asaro,S.Nakahara
and Y.Okinaka;J.Electrochem.Soc, 127 ,1935(1980)
)。
Although many self-catalytic gold plating solutions using borohydrides or borane compounds as reducing agents have been developed, the plating solutions were unstable (Y.Ok
inaka, Plating 57 , 914 (1970) LAD 'Asaro, S.Nakahara
and Y.Okinaka; J.Electrochem.Soc, 127 , 1935 (1980)
).

【0008】そこで、本発明は、リンの共析を抑えた安
定性に優れた置換型無電解金めっき液を提供することを
目的とする。
[0008] Therefore, an object of the present invention is to provide a substitution type electroless gold plating solution which suppresses the eutectoid of phosphorus and is excellent in stability.

【0009】[0009]

【課題を解決するための手段】本件発明者は、鋭意検討
した結果、還元剤として亜リン酸塩を用いれば、上記目
的を達成することを見出だし、本発明をなすに至った。
As a result of intensive studies, the present inventor has found that the use of phosphite as a reducing agent achieves the above object, and has accomplished the present invention.

【0010】すなわち、本発明は、シアン化金塩と、還
元剤としての亜リン酸塩と、pH調整剤とを含んでなる
置換型無電解金めっき液を提供する。
That is, the present invention provides a substitutional electroless gold plating solution containing a gold cyanide salt, a phosphite as a reducing agent, and a pH adjusting agent.

【0011】ここで、シアン化金塩としては、例えばシ
アン化金ナトリウム、シアン化金カリウムを挙げること
ができるが、これらに限定されず析出金属を含むものな
らば何でも良い。シアン化金塩の濃度は、皮膜厚さ、還
元剤の量に依存するのは勿論であるが、1〜10g/L
の範囲が好ましい。
Examples of the gold cyanide salt include sodium gold cyanide and potassium gold cyanide. However, the gold cyanide salt is not limited to these, and any salt containing a precipitated metal may be used. The concentration of the gold cyanide salt depends on the thickness of the film and the amount of the reducing agent, but it is 1 to 10 g / L.
Is preferred.

【0012】亜リン酸塩としては、例えば亜リン酸ナト
リウム、亜リン酸カリウムを挙げることができ、その濃
度は、金塩の濃度に相関するのは勿論であるが、2〜5
0g/Lの範囲が好ましい。
Examples of the phosphite include sodium phosphite and potassium phosphite, and the concentration of the phosphite correlates with the concentration of the gold salt, but it is 2-5.
The range of 0 g / L is preferable.

【0013】また、pH調整剤は、各種の有機酸もしく
はその塩並びに無機塩から成り、有機酸としては、例え
ば、クエン酸、シュウ酸、酢酸などを、その塩として
は、前記有機酸のナトリウム塩、カリウム塩などを挙げ
ることができるが、これらに限定されない。有機酸もし
くはその塩の濃度は、所望のpHになるように適宜加え
るが、10〜200g/Lの範囲が好ましい。更に無機
塩としては、例えば、塩化アンモニウムなどを用いるこ
とができ、その濃度は、20〜100g/Lの範囲が好
ましい。なお、pH調整剤によりめっき液のpHは、3
〜8の範囲に調整される。
The pH adjusting agent comprises various organic acids or salts thereof and inorganic salts. Examples of the organic acid include citric acid, oxalic acid, acetic acid and the like, and salts thereof include sodium of the above organic acids. Salts, potassium salts and the like can be mentioned, but not limited to these. The concentration of the organic acid or its salt is appropriately added so as to obtain a desired pH, but a range of 10 to 200 g / L is preferable. Further, as the inorganic salt, for example, ammonium chloride can be used, and the concentration thereof is preferably in the range of 20 to 100 g / L. The pH of the plating solution is adjusted to 3 by the pH adjuster.
Adjusted to a range of ~ 8.

【0014】上記のシアン化金塩、亜リン酸塩、pH調
整剤は、上記濃度範囲になるように水に溶解させて使用
するが、溶解の手法は特に限定されず、例えば、ビーカ
ーなどで攪拌、加熱しながら溶解しても良い。
The above-mentioned gold cyanide salt, phosphite, and pH adjusting agent are used by dissolving them in water so as to be in the above concentration range, but the dissolving method is not particularly limited, and for example, in a beaker or the like. It may be dissolved while stirring and heating.

【0015】水に溶解させた後は、そのままめっき液と
して使用でき、めっきは、被めっき金属をめっき液に浸
漬することにより行う。ここで、本発明でめっきされる
ものとしては、特に限定されないが、電子工業における
複雑な回路(設計などへの使用)が挙げられる。
After being dissolved in water, it can be used as it is as a plating solution, and plating is performed by immersing the metal to be plated in the plating solution. Here, the material to be plated in the present invention is not particularly limited, but may be a complicated circuit (use for design etc.) in the electronic industry.

【0016】[0016]

【作用】還元剤として亜リン酸塩を用いるときは、 H2 PO3 +H2 O→H2 PO4 +2H [Au(CN)2 +H→Au+HCN+CN の反応が進行する。When a phosphite is used as the reducing agent, the reaction of H 2 PO 3 + H 2 O → H 2 PO 4 + 2H [Au (CN) 2 ] + H → Au + HCN + CN proceeds.

【0017】なお H2 PO3 +H→P+3OH は、ほとんど起きないため(H2 PO2 +H→P+O
+H2 Oの数十分の1)、得られる金めっき皮膜の
リン含有率が低く抑えられる。
Since H 2 PO 3 + H → P + 3OH hardly occurs (H 2 PO 2 + H → P + O
The number of H + H 2 O is 1/10, and the phosphorus content of the obtained gold plating film can be suppressed low.

【0018】[0018]

【実施例】表1に示した組成からなるめっき液を調整し
た。
Example A plating solution having the composition shown in Table 1 was prepared.

【0019】[0019]

【表1】 なお、単位は全てg/Lである。[Table 1] All units are g / L.

【0020】実験の結果、本発明のめっき液(1)
(2)では、皮膜中のリンの共析は比較例の1/10以
下に抑えられる。
As a result of the experiment, the plating solution (1) of the present invention
In (2), the codeposition of phosphorus in the film is suppressed to 1/10 or less of that in the comparative example.

【0021】また、無電解ニッケルめっき皮膜を下地と
した上に92〜95℃で金を析出させたが、このときの
析出はいずれも4〜5μm/hrとなった。
Further, gold was deposited at 92 to 95 ° C. on the electroless nickel plating film as a base, and the deposition at this time was 4 to 5 μm / hr.

【0022】[0022]

【発明の効果】本発明の置換型金めっき液は浴が安定な
上に、得られた皮膜の純度が高くなる。従って、金純度
の高い皮膜が必要なときに有効である。
EFFECTS OF THE INVENTION The displacement type gold plating solution of the present invention has a stable bath and a high purity of the obtained film. Therefore, it is effective when a film with high gold purity is required.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 シアン化金塩と、還元剤としての亜リン
酸塩と、pH調整剤とを含んでなる置換型無電解金めっ
き液。
1. A substitution type electroless gold plating solution comprising a gold cyanide salt, a phosphite as a reducing agent, and a pH adjuster.
JP13504592A 1992-05-27 1992-05-27 Substitution type electroless gold plating solution Pending JPH05331655A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13504592A JPH05331655A (en) 1992-05-27 1992-05-27 Substitution type electroless gold plating solution

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13504592A JPH05331655A (en) 1992-05-27 1992-05-27 Substitution type electroless gold plating solution

Publications (1)

Publication Number Publication Date
JPH05331655A true JPH05331655A (en) 1993-12-14

Family

ID=15142649

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13504592A Pending JPH05331655A (en) 1992-05-27 1992-05-27 Substitution type electroless gold plating solution

Country Status (1)

Country Link
JP (1) JPH05331655A (en)

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