JPH05320379A - Polyimide film and its production - Google Patents
Polyimide film and its productionInfo
- Publication number
- JPH05320379A JPH05320379A JP15594992A JP15594992A JPH05320379A JP H05320379 A JPH05320379 A JP H05320379A JP 15594992 A JP15594992 A JP 15594992A JP 15594992 A JP15594992 A JP 15594992A JP H05320379 A JPH05320379 A JP H05320379A
- Authority
- JP
- Japan
- Prior art keywords
- polyimide film
- acid dianhydride
- diamine
- polyamic acid
- added
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Manufacture Of Macromolecular Shaped Articles (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、耐熱性、機械的特性に
優れるとともに、適度な線膨張係数、低吸湿性を持つポ
リイミドフィルム及びその製造方法に関するものであ
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a polyimide film having excellent heat resistance and mechanical properties, an appropriate coefficient of linear expansion and low hygroscopicity, and a method for producing the same.
【0002】[0002]
【従来の技術】ポリイミド樹脂は優れた耐熱性、電気絶
縁性を有しており、従来より電気機器を初めとして、広
く工業材料として用いられている。ポリイミド樹脂は、
このように他のポリマーに比べ種々の優れた特性を持つ
が、技術の進歩とともに、ポリイミド樹脂に求められる
要求特性も高度なものとなり、用途に応じて種々の性能
を合わせ持つことが望まれている。2. Description of the Related Art Polyimide resins have excellent heat resistance and electrical insulation properties, and have been widely used as industrial materials such as electrical equipment. The polyimide resin is
As described above, it has various excellent properties as compared with other polymers, but with the progress of technology, the required properties required for polyimide resins will also become higher, and it is desired to have various performances depending on the application. There is.
【0003】特に近年、より小型化・精密化の傾向が顕
著になっている電気・電子材料用途に用いられることが
多くなり、このため用いられるポリイミドの寸法安定性
が強く望まれるようになっている。なかでもフィルム用
途では加工工程において応力を受ける工程、温度変化を
受ける工程を数多く含み、このため応力や温度変化によ
る寸法の変化が小さいことが望まれる。In particular, in recent years, it has been increasingly used in electric and electronic materials for which the tendency of miniaturization and refinement has become remarkable, so that the dimensional stability of the polyimide used is strongly desired. There is. Among them, film applications include many processes in which stress is applied and processes in which temperature is changed, and therefore, it is desired that dimensional changes due to stress and temperature changes are small.
【0004】応力による寸法変化を小さくするには、フ
ィルムが高弾性率を有することが有効であり、また温度
変化による寸法変化を小さくするにはフィルムの線膨張
係数が小さいことが有効である。ただし、ポリイミドが
フィルムで用いられる用途は、フレキシブルプリント基
板用途、TAB用ベースフィルム用途、銅線被覆用途な
どが主であり、これらは何れも銅などの金属あるいはガ
ラスと複合化される用途であるため、線膨張係数が銅な
どの金属あるいはガラスなどに比較し極端に小さくなる
ことは実用上好ましくない。また、ポリイミドフィルム
が空気中の水分を吸湿すると電気特性が低下するため
に、低吸湿性であることが望まれる。To reduce the dimensional change due to stress, it is effective that the film has a high elastic modulus, and to reduce the dimensional change due to temperature change, it is effective that the film has a small linear expansion coefficient. However, polyimide is mainly used for films such as flexible printed circuit board, TAB base film, and copper wire coating, and these are all composites with metal such as copper or glass. Therefore, it is not preferable for practical use that the coefficient of linear expansion is extremely smaller than that of metal such as copper or glass. Further, when the polyimide film absorbs moisture in the air, the electrical characteristics are deteriorated, so that the polyimide film is desired to have low hygroscopicity.
【0005】従来より、高弾性ポリイミドフィルムを得
るためには、直線性の高いモノマーを用いることが有効
であることが知られている。例えばピロメリット酸無水
物とパラフェニレンジアミンといった剛直鎖のみを用い
れば、高弾性ポリイミドを合成することができる。しか
し、このような構造では、非常に脆く、また線膨張係数
が極端に小さくなりすぎ、また吸湿率も大きくなってし
まう。It has been conventionally known that it is effective to use a highly linear monomer in order to obtain a highly elastic polyimide film. For example, a highly elastic polyimide can be synthesized by using only a rigid straight chain such as pyromellitic anhydride and paraphenylenediamine. However, such a structure is very brittle, the coefficient of linear expansion becomes too small, and the moisture absorption rate becomes large.
【0006】[0006]
【発明が解決しようとする課題】本発明は、耐熱性、機
械的特性に優れ、適度な線膨張係数、低吸湿性を持つポ
リイミドフィルム及びその製造方法を提供することを目
的とする。SUMMARY OF THE INVENTION It is an object of the present invention to provide a polyimide film having excellent heat resistance and mechanical properties, having an appropriate linear expansion coefficient and low hygroscopicity, and a method for producing the same.
【0007】[0007]
【問題を解決するための手段】上記の問題を解決するた
めに、本発明者らはポリイミドの分子構造について鋭意
検討の結果、特定構造の繰り返し単位を有する芳香族ポ
リイミドフィルムが優れた耐熱性、優れた機械的特性、
適度な線膨張係数、低吸湿性を持つことを見いだし本発
明を完成した。In order to solve the above problems, the inventors of the present invention have diligently studied the molecular structure of polyimide, and as a result, an aromatic polyimide film having a repeating unit of a specific structure has excellent heat resistance, Excellent mechanical properties,
The present invention was completed by finding out that it has an appropriate linear expansion coefficient and low hygroscopicity.
【0008】即ち、本発明の第1は、下記式That is, the first aspect of the present invention is that
【0009】[0009]
【化9】 [Chemical 9]
【0010】(ただし、R1 は少なくとも1種の直線性
ジアミン残基、R2 は下記(Wherein R 1 is at least one linear diamine residue, and R 2 is
【0011】[0011]
【化10】 [Chemical 10]
【0012】から選ばれる少なくとも1種の酸二無水物
残基であり、nは1以上の整数を表す。)で表される構
造単位を有することを特徴とするポリイミドフィルムを
内容とする。It is at least one acid dianhydride residue selected from, and n represents an integer of 1 or more. ] The polyimide film characterized by having the structural unit represented by these.
【0013】本発明の第2は、少なくとも1種の直線性
ジアミンに、4,4′−オキシジフタル酸無水物を加
え、次いで、下記A second aspect of the invention is the addition of 4,4'-oxydiphthalic anhydride to at least one linear diamine, and then the following:
【0014】[0014]
【化11】 [Chemical 11]
【0015】から選ばれる少なくとも1種の酸二無水物
を酸二無水物類とジアミン類の各々の総モル量が実質的
に等モル量になるように添加してポリアミド酸共重合体
を得、更に該ポリアミド酸共重合体を脱水閉環し、下記
構造単位を有するポリイミドフィルムを得ることを特徴
とするポリイミドフィルムの製造方法を内容とする。At least one acid dianhydride selected from the above is added so that the total molar amounts of the acid dianhydrides and the diamines are substantially equimolar amounts to obtain a polyamic acid copolymer. And a method for producing a polyimide film, which comprises subjecting the polyamic acid copolymer to dehydration ring closure to obtain a polyimide film having the following structural unit.
【0016】[0016]
【化12】 [Chemical 12]
【0017】(ただし、R1 は少なくとも1種の直線性
ジアミン残基、R2 は下記(Wherein R 1 is at least one linear diamine residue and R 2 is
【0018】[0018]
【化13】 [Chemical 13]
【0019】から選ばれる少なくとも1種の酸二無水物
残基であり、nは1以上の整数を表す。)It is at least one acid dianhydride residue selected from, and n represents an integer of 1 or more. )
【0020】本発明の第3は、少なくとも1種の直線性
ジアミンに、下記A third aspect of the present invention is the addition of at least one linear diamine to:
【0021】[0021]
【化14】 [Chemical 14]
【0022】から選ばれる少なくとも1種の酸二無水物
を加え、次いで、4,4′−オキシジフタル酸無水物を
酸二無水物類とジアミン類の各々の総モル量が実質的に
等モル量になるように添加してポリアミド酸共重合体を
得、更に該ポリアミド酸共重合体を脱水閉環し、下記構
造単位を有するポリイミドフィルムを得ることを特徴と
するポリイミドフィルムの製造方法を内容とする。At least one acid dianhydride selected from the following is added, and then 4,4'-oxydiphthalic anhydride is added so that the total molar amount of each of the acid dianhydride and the diamine is substantially equimolar. To obtain a polyamic acid copolymer, further dehydration ring closure of the polyamic acid copolymer, to obtain a polyimide film having the following structural unit .
【0023】[0023]
【化15】 [Chemical 15]
【0024】(ただし、R1 は少なくとも1種の直線性
ジアミン残基、R2 は下記(Wherein R 1 is at least one linear diamine residue, and R 2 is
【0025】[0025]
【化16】 [Chemical 16]
【0026】から選ばれる少なくとも1種の酸二無水物
残基であり、nは1以上の整数を表す。)It is at least one acid dianhydride residue selected from, and n represents an integer of 1 or more. )
【0027】以下、本発明を詳細に説明する。本発明の
ポリイミドフィルムは、その前駆体であるポリアミド酸
共重合体溶液から得られるが、このポリアミド酸共重合
体溶液は、公知の方法で製造することができる。即ち、
テトラカルボン酸二無水物成分とジアミン成分を実質等
モル使用し、有機極性溶媒中で重合して得られる。The present invention will be described in detail below. The polyimide film of the present invention can be obtained from a polyamic acid copolymer solution which is its precursor, and this polyamic acid copolymer solution can be produced by a known method. That is,
It is obtained by polymerizing in a polar organic solvent using substantially equimolar amounts of the tetracarboxylic dianhydride component and the diamine component.
【0028】本発明の中で用いる直線性ジアミンとは、
エーテル基、メチレン基、イソプロピリデン基、ヘキサ
フルオロイソプロピリデン基、カルボニル基等の屈曲基
を主鎖中に含まず、2個のアミノ基の窒素原子とそれら
が結合している炭素原子が一直線に並ぶ構造を持つジア
ミン化合物をさす。例えば、The linear diamine used in the present invention is
The main chain does not include a bending group such as an ether group, a methylene group, an isopropylidene group, a hexafluoroisopropylidene group, and a carbonyl group, and the nitrogen atoms of two amino groups and the carbon atom to which they are bound are aligned. A diamine compound having a lined structure. For example,
【0029】[0029]
【化17】 [Chemical 17]
【0030】(ただし、XはF,Cl,Br,CH3 ,
CH3 O又はCF3 を示す。)等のジアミンを例示する
ことができる。(However, X is F, Cl, Br, CH 3 ,
Indicates CH 3 O or CF 3 . ) Etc. can be illustrated.
【0031】本発明の目的を達成するために、4,4′
−オキシジフタル酸無水物を用いることが必要であり、
この酸二無水物を用いることにより得られるポリイミド
フィルムの吸水率を低く抑えることができ、例えば2%
以下とすることも可能である。これは、4,4′−オキ
シジフタル酸無水物残基に含まれる電子供与性のエーテ
ル基がイミド基の分極率を低く抑え、その結果、水分子
のイミド基への吸着量が少なくなることが原因であると
考えられる。本発明では、4,4′−オキシジフタル酸
無水物を下記式In order to achieve the object of the present invention, 4,4 '
-It is necessary to use oxydiphthalic anhydride,
The water absorption of the polyimide film obtained by using this acid dianhydride can be suppressed to a low level, for example, 2%.
The following is also possible. This is because the electron-donating ether group contained in the 4,4'-oxydiphthalic anhydride residue suppresses the polarizability of the imide group to a low level, and as a result, the amount of water molecules adsorbed on the imide group is reduced. Probably the cause. In the present invention, 4,4'-oxydiphthalic anhydride is represented by the following formula
【0032】[0032]
【化18】 [Chemical 18]
【0033】より選ばれる1種以上のテトラカルボン酸
二無水物と組み合わせて、任意の比で用いることができ
るが、好ましくは4,4′−オキシジフタル酸無水物が
全酸二無水物成分の50〜99mol %、上記より選ばれ
る少なくとも1種のテトラカルボン酸二無水物が全酸二
無水物成分の1〜50mol %、より好ましくは4,4′
−オキシジフタル酸無水物が全酸二無水物成分の75〜
95mol %、上記より選ばれる少なくとも1種のテトラ
カルボン酸二無水物が全酸二無水物成分の5〜25mol
%用いる。4,4′−オキシジフタル酸無水物の比率が
これより大きいと、ポリイミドフィルムとした時に脆く
なり、また、4,4′−オキシジフタル酸無水物の比率
がこれより小さいと吸水率が大きくなる。直線性ジアミ
ンとしては、パラフェニレンジアミンを用いることがよ
り好ましい。パラフェニレンジアミンは脂肪族の置換基
などを有さず、従って耐熱性に優れている。It may be used in any ratio in combination with one or more tetracarboxylic dianhydrides selected from the above, but preferably 4,4'-oxydiphthalic anhydride is 50% of the total acid dianhydride component. ˜99 mol%, at least one tetracarboxylic acid dianhydride selected from the above is 1 to 50 mol% of the total acid dianhydride component, and more preferably 4,4 ′.
-Oxydiphthalic anhydride is a total acid dianhydride component of 75 ~
95 mol%, at least one tetracarboxylic dianhydride selected from the above is 5 to 25 mol of the total acid dianhydride component
% Used. If the ratio of 4,4'-oxydiphthalic anhydride is larger than this, the polyimide film becomes brittle, and if the ratio of 4,4'-oxydiphthalic anhydride is smaller than this, the water absorption becomes large. It is more preferable to use para-phenylenediamine as the linear diamine. Paraphenylenediamine does not have an aliphatic substituent, etc., and is therefore excellent in heat resistance.
【0034】このポリアミド酸の平均分子量は、100
00〜1000000であることが望ましい。平均分子
量が10000未満では得られたフィルムが脆くなり、
一方、1000000を越えるとポリイミド前駆体であ
るポリアミド酸ワニスの粘度が高くなりすぎ取扱いが難
しくなるので好ましくない。また、このポリイミドフィ
ルムに各種の有機添加剤、或いは無機のフィラー類、或
いは各種の強化材を複合することも可能である。The average molecular weight of this polyamic acid is 100.
It is desirable that it is from 0 to 1,000,000. If the average molecular weight is less than 10,000, the obtained film becomes brittle,
On the other hand, if it exceeds 1,000,000, the viscosity of the polyamic acid varnish, which is the polyimide precursor, becomes too high, and the handling becomes difficult. It is also possible to combine various organic additives, inorganic fillers, or various reinforcing materials with this polyimide film.
【0035】ポリアミド酸共重合体の生成反応に使用さ
れる有機極性溶媒としては、例えば、ジメチルスルホキ
シド、ジエチルスルホキシドなどのスルホキシド系溶
媒;N,N−ジメチルホルムアミド、N,N−ジエチル
ホルムアミドなどのホルムアミド系溶媒;N,N−ジメ
チルアセトアミド、N,N−ジエチルアセトアミドなど
のアセトアミド系溶媒;N−メチル−2−ピロリドン、
N−ビニル−2−ピロリドンなどのピロリドン系溶媒;
フェノール、o−、m−、またはp−クレゾール、キシ
レノール、ハロゲン化フェノール、カテコールなどのフ
ェノール系溶媒;あるいはヘキサメチルホスホルアミ
ド、γ−ブチロラクトンなどを挙げることができ、これ
らを単独または2種以上の混合物として用いるのが望ま
しいが、更にはキシレン、トルエンのような芳香族炭化
水素の一部使用も可能である。Examples of the organic polar solvent used in the reaction for producing the polyamic acid copolymer include sulfoxide solvents such as dimethyl sulfoxide and diethyl sulfoxide; formamide such as N, N-dimethylformamide and N, N-diethylformamide. System solvent; acetamide system solvent such as N, N-dimethylacetamide, N, N-diethylacetamide; N-methyl-2-pyrrolidone,
Pyrrolidone-based solvents such as N-vinyl-2-pyrrolidone;
Phenol-based solvents such as phenol, o-, m-, or p-cresol, xylenol, halogenated phenol, and catechol; or hexamethylphosphoramide, γ-butyrolactone, and the like, which may be used alone or in combination of two or more. However, it is also possible to use a part of an aromatic hydrocarbon such as xylene or toluene.
【0036】ポリアミド酸共重合体溶液の合成法を具体
的に例示する。 容器に有機極性溶媒と1種以上の直線性ジアミンを採
り、冷却攪拌する。 4,4′−オキシジフタル酸無水物を上記反応溶液に
加え、好ましくは20分以上冷却攪拌する。 直線性ジアミンのモル量と全酸二無水物成分のモル量
が等しくなるように不足分の酸二無水物成分として、下
記式A method for synthesizing a polyamic acid copolymer solution will be specifically exemplified. An organic polar solvent and at least one linear diamine are placed in a container, and the mixture is cooled and stirred. 4,4'-oxydiphthalic anhydride is added to the above reaction solution, and the mixture is preferably cooled and stirred for 20 minutes or more. As the acid dianhydride component of the shortage so that the molar amount of the linear diamine and the molar amount of all acid dianhydride components are equal, the following formula
【0037】[0037]
【化19】 [Chemical 19]
【0038】より選ばれる少なくとも1種の酸二無水物
を徐々に冷却攪拌しながら加え、該ポリアミド酸共重合
体溶液を得ることができる。また、このポリアミド酸共
重合体は前記の有機極性溶媒中に5〜40重量%、好ま
しくは10〜30重量%溶解されているのが取扱いの面
からも望ましい。At least one acid dianhydride selected from the above can be slowly added with cooling and stirring to obtain the polyamic acid copolymer solution. It is also desirable from the viewpoint of handling that the polyamic acid copolymer is dissolved in the organic polar solvent in an amount of 5 to 40% by weight, preferably 10 to 30% by weight.
【0039】この芳香族ポリアミド酸共重合体溶液から
本発明のポリイミドフィルムを得るためには熱的に脱水
する熱的方法、脱水剤を用いる化学的方法のいずれを用
いてもよいが、化学的方法によると生成するポリイミド
フィルムの伸びや引張強度などの機械特性がすぐれたも
のになるので好ましい。In order to obtain the polyimide film of the present invention from this aromatic polyamic acid copolymer solution, either a thermal method of thermally dehydrating or a chemical method using a dehydrating agent may be used. According to the method, the resulting polyimide film has excellent mechanical properties such as elongation and tensile strength, which is preferable.
【0040】以下に、ポリイミドフィルムの作製例を説
明する。上記ポリアミド酸重合体又はその溶液に、化学
量論以上の脱水剤と触媒量の第3級アミンを加えた溶液
をドラム或いはエンドレスベルト上に流延又は塗布して
膜状とし、その膜を150℃以下の温度で約5〜90分
間乾燥し、自己支持性のポリアミド酸の膜を得る。次い
で、これを支持体より引き剥がし端部を固定する。その
後、約100〜500℃まで徐々に加熱することにより
イミド化し、冷却後ドラム又はエンドレスベルトより取
り外し、本発明のポリイミドフィルムを得る。An example of producing a polyimide film will be described below. A solution obtained by adding a stoichiometric or more stoichiometric dehydrating agent and a catalytic amount of a tertiary amine to the above polyamic acid polymer or a solution thereof is cast or coated on a drum or an endless belt to form a film. It is dried at a temperature of not higher than 0 ° C for about 5 to 90 minutes to obtain a self-supporting polyamic acid film. Then, this is peeled off from the support and the end is fixed. Then, it is imidized by gradually heating to about 100 to 500 ° C., cooled, and then removed from the drum or endless belt to obtain the polyimide film of the present invention.
【0041】ここで言う脱水剤としては、例えば無水酢
酸などの脂肪族酸無水物、無水安息香酸などの芳香族酸
無水物などが挙げられる。また触媒としては、例えばト
リエチルアミンなどの脂肪族第3級アミン類、ジメチル
アニリンなどの芳香族第3級アミン類、ピリジン、ピコ
リン、イソキノリンなどの複素環式第3級アミン類など
が挙げられる。これらは単独又は2種以上組み合わせて
用いられる。Examples of the dehydrating agent here include aliphatic acid anhydrides such as acetic anhydride and aromatic acid anhydrides such as benzoic anhydride. Examples of the catalyst include aliphatic tertiary amines such as triethylamine, aromatic tertiary amines such as dimethylaniline, and heterocyclic tertiary amines such as pyridine, picoline, and isoquinoline. These are used alone or in combination of two or more.
【0042】[0042]
【実施例】以下、実施例により本発明を具体的に説明す
るが、本発明はこれら実施例のみに限定されるものでは
ない。以下の記載において、ODAは4,4′−ジアミ
ノジフェニルエーテル、p−PDAはパラフェニレンジ
アミン、PMDAはピロメリット酸二無水物、ODPA
は4,4′−オキシジフタル酸無水物、BTDAは3,
3′,4,4′−ベンゾフェノンテトラカルボン酸二無
水物、DMFはN,N−ジメチルホルムアミドを表す。EXAMPLES The present invention will be specifically described below with reference to examples, but the present invention is not limited to these examples. In the following description, ODA is 4,4'-diaminodiphenyl ether, p-PDA is paraphenylenediamine, PMDA is pyromellitic dianhydride, ODPA.
Is 4,4'-oxydiphthalic anhydride, BTDA is 3,
3 ', 4,4'-benzophenone tetracarboxylic acid dianhydride, DMF represents N, N-dimethylformamide.
【0043】実施例1 セパラブルフラスコにDMFとp−PDAを4当量と
り、ジアミノ化合物が完全に溶解するまで室温でよく攪
拌しその後、氷で冷却した。次に、ODPA3当量を加
え、40分冷却攪拌した。そして、BTDA1当量をD
MFに溶かし、徐々に加え、このあと1時間冷却攪拌
し、ポリアミド酸のDMF溶液を得た。なお、DMFの
使用量は、ジアミノ化合物および芳香族テトラカルボン
酸化合物のモノマー仕込濃度が18重量%となるように
した。ポリアミド酸溶液をガラス板上に流延塗布し、約
100℃に約30分間乾燥後、ポリアミド酸塗膜をガラ
ス板より剥し、その塗膜を支持枠に固定し、その後約1
00℃で約30分間、約200℃で約60分間、約30
0℃で約60分間加熱し、脱水閉環乾燥し、約25ミク
ロンのポリイミドフィルムを得た。得られたポリイミド
フィルムの物性を表1に示した。Example 1 DMF and p-PDA (4 equivalents) were placed in a separable flask, stirred well at room temperature until the diamino compound was completely dissolved, and then cooled with ice. Next, 3 equivalents of ODPA were added, and the mixture was cooled and stirred for 40 minutes. Then, 1 equivalent of BTDA is D
It was dissolved in MF, gradually added, and then cooled and stirred for 1 hour to obtain a DMF solution of polyamic acid. The amount of DMF used was such that the monomer charge concentration of the diamino compound and the aromatic tetracarboxylic acid compound was 18% by weight. The polyamic acid solution is cast on a glass plate, dried at about 100 ° C. for about 30 minutes, the polyamic acid coating film is peeled off from the glass plate, the coating film is fixed to a supporting frame, and then about 1
About 30 minutes at 00 ° C, about 60 minutes at about 200 ° C, about 30 minutes
It was heated at 0 ° C. for about 60 minutes and dehydrated and ring-closed dried to obtain a polyimide film of about 25 μm. The physical properties of the obtained polyimide film are shown in Table 1.
【0044】実施例2 セパラブルフラスコにDMFとp−PDAを8当量と
り、ジアミノ化合物が完全に溶解するまで室温でよく攪
拌しその後、氷で冷却した。次に、ODPA7当量を加
え、40分冷却攪拌した。そして、BTDA1当量をD
MFに溶かし、徐々に加え、このあと1時間冷却攪拌
し、ポリアミド酸のDMF溶液を得た。次に、該ポリア
ミド酸溶液を用い実施例1と同様の方法で焼成し、ポリ
イミドフィルムを得た。得られたポリイミドフィルムの
物性を表1に示した。Example 2 Eight equivalents of DMF and p-PDA were placed in a separable flask, well stirred at room temperature until the diamino compound was completely dissolved, and then cooled with ice. Next, 7 equivalents of ODPA was added, and the mixture was cooled and stirred for 40 minutes. Then, 1 equivalent of BTDA is D
It was dissolved in MF, gradually added, and then cooled and stirred for 1 hour to obtain a DMF solution of polyamic acid. Next, this polyamic acid solution was baked in the same manner as in Example 1 to obtain a polyimide film. The physical properties of the obtained polyimide film are shown in Table 1.
【0045】実施例3 セパラブルフラスコにDMFとp−PDAを4当量と
り、ジアミノ化合物が完全に溶解するまで室温でよく攪
拌しその後、氷で冷却した。次に、ODPA3当量を加
え、40分冷却攪拌した。そして、PMDA1当量をD
MFに溶かし、徐々に加え、このあと1時間冷却攪拌
し、ポリアミド酸のDMF溶液を得た。次に、該ポリア
ミド酸溶液を用い実施例1と同様の方法で焼成し、ポリ
イミドフィルムを得た。得られたポリイミドフィルムの
物性を表1に示した。Example 3 4 equivalents of DMF and p-PDA were placed in a separable flask, stirred well at room temperature until the diamino compound was completely dissolved, and then cooled with ice. Next, 3 equivalents of ODPA were added, and the mixture was cooled and stirred for 40 minutes. And PMDA1 equivalent is D
It was dissolved in MF, gradually added, and then cooled and stirred for 1 hour to obtain a DMF solution of polyamic acid. Next, this polyamic acid solution was baked in the same manner as in Example 1 to obtain a polyimide film. The physical properties of the obtained polyimide film are shown in Table 1.
【0046】実施例4 セパラブルフラスコにDMFとp−PDAを8当量と
り、ジアミノ化合物が完全に溶解するまで室温でよく攪
拌しその後、氷で冷却した。次に、ODPA7当量を加
え、40分冷却攪拌した。そして、PMDA1当量をD
MFに溶かし、徐々に加え、このあと1時間冷却攪拌
し、ポリアミド酸のDMF溶液を得た。次に、該ポリア
ミド酸溶液を用い実施例1と同様の方法で焼成し、ポリ
イミドフィルムを得た。得られたポリイミドフィルムの
物性を表1に示した。Example 4 Eight equivalents of DMF and p-PDA were placed in a separable flask, well stirred at room temperature until the diamino compound was completely dissolved, and then cooled with ice. Next, 7 equivalents of ODPA was added, and the mixture was cooled and stirred for 40 minutes. And PMDA1 equivalent is D
It was dissolved in MF, gradually added, and then cooled and stirred for 1 hour to obtain a DMF solution of polyamic acid. Next, this polyamic acid solution was baked in the same manner as in Example 1 to obtain a polyimide film. The physical properties of the obtained polyimide film are shown in Table 1.
【0047】比較例1 実施例1と同様の方法により、PMDAとODAを等モ
ルずつ用いて、ポリイミドフィルムを得た。得られたポ
リイミドフィルムの物性を表1に示した。Comparative Example 1 In the same manner as in Example 1, a polyimide film was obtained using PMDA and ODA in equimolar amounts. The physical properties of the obtained polyimide film are shown in Table 1.
【0048】比較例2 セパラブルフラスコにDMFとp−PDAを1当量と
り、ジアミノ化合物が完全に溶解するまで室温でよく攪
拌しその後、氷で冷却した。次に、PMDA2当量を加
え、40分冷却攪拌した。そして、ODA1当量をDM
Fに溶かし、徐々に加え、このあと1時間冷却攪拌し、
ポリアミド酸のDMF溶液を得た。次に、該ポリアミド
酸溶液を用い実施例1と同様の方法で焼成し、ポリイミ
ドフィルムを得た。得られたポリイミドフィルムの物性
を表1に示した。Comparative Example 2 DMF and p-PDA (1 equivalent) were placed in a separable flask, stirred well at room temperature until the diamino compound was completely dissolved, and then cooled with ice. Next, 2 equivalents of PMDA were added, and the mixture was cooled and stirred for 40 minutes. Then, 1 equivalent of ODA is DM
Dissolve in F, add slowly, then stir for 1 hour with cooling,
A DMF solution of polyamic acid was obtained. Next, this polyamic acid solution was baked in the same manner as in Example 1 to obtain a polyimide film. The physical properties of the obtained polyimide film are shown in Table 1.
【0049】[0049]
【表1】 1)理学電機製TMA 8140により測定した100
〜200℃の熱膨張係数[Table 1] 1) 100 measured by Rigaku Denki TMA 8140
Thermal expansion coefficient of ~ 200 ℃
【0050】[0050]
【発明の効果】以上のように、4,4′−オキシジフタ
ル酸無水物を直線性ジアミンと特定の酸二無水物と共重
合することにより、高弾性、適度な線膨張係数、適度な
柔軟性、低吸湿性を有するポリイミドフィルムを得るこ
とができる。As described above, by copolymerizing 4,4'-oxydiphthalic anhydride with a linear diamine and a specific acid dianhydride, high elasticity, an appropriate linear expansion coefficient, and an appropriate flexibility are obtained. A polyimide film having low hygroscopicity can be obtained.
【化20】 [Chemical 20]
Claims (4)
基、R2 は下記 【化2】 から選ばれる少なくとも1種の酸二無水物残基であり、
nは1以上の整数を表す。)で表される構造単位を有す
ることを特徴とするポリイミドフィルム。1. The following formula: (However, R 1 is at least one linear diamine residue, and R 2 is At least one acid dianhydride residue selected from
n represents an integer of 1 or more. ) A polyimide film having a structural unit represented by:
ポリイミドフィルム。2. The polyimide film according to claim 1, which has a water absorption of 2% or less.
4,4′−オキシジフタル酸無水物を加え、次いで、下
記 【化3】 から選ばれる少なくとも1種の酸二無水物を酸二無水物
類とジアミン類の各々の総モル量が実質的に等モル量に
なるように添加してポリアミド酸共重合体を得、更に該
ポリアミド酸共重合体を脱水閉環し、下記構造単位を有
するポリイミドフィルムを得ることを特徴とするポリイ
ミドフィルムの製造方法。 【化4】 (ただし、R1 は少なくとも1種の直線性ジアミン残
基、R2 は下記 【化5】 から選ばれる少なくとも1種の酸二無水物残基であり、
nは1以上の整数を表す。)3. At least one linear diamine,
4,4'-oxydiphthalic anhydride was added and then: At least one acid dianhydride selected from the above is added so that the total molar amount of each of the acid dianhydrides and the diamines becomes substantially equimolar amount to obtain a polyamic acid copolymer. A process for producing a polyimide film, which comprises subjecting a polyamic acid copolymer to dehydration ring closure to obtain a polyimide film having the following structural unit. [Chemical 4] (However, R 1 is at least one linear diamine residue, and R 2 is At least one acid dianhydride residue selected from
n represents an integer of 1 or more. )
記 【化6】 から選ばれる少なくとも1種の酸二無水物を加え、次い
で、4,4′−オキシジフタル酸無水物を酸二無水物類
とジアミン類の各々の総モル量が実質的に等モル量にな
るように添加してポリアミド酸共重合体を得、更に該ポ
リアミド酸共重合体を脱水閉環し、下記構造単位を有す
るポリイミドフィルムを得ることを特徴とするポリイミ
ドフィルムの製造方法。 【化7】 (ただし、R1 は少なくとも1種の直線性ジアミン残
基、R2 は下記 【化8】 から選ばれる少なくとも1種の酸二無水物残基であり、
nは1以上の整数を表す。)4. At least one linear diamine, wherein: At least one acid dianhydride is added, and then 4,4'-oxydiphthalic anhydride is added so that the total molar amount of each of the acid dianhydride and the diamine is substantially equimolar. To obtain a polyamic acid copolymer, which is further dehydrated and cyclized to obtain a polyimide film having the following structural unit. [Chemical 7] (However, R 1 is at least one linear diamine residue, and R 2 is At least one acid dianhydride residue selected from
n represents an integer of 1 or more. )
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11152331A (en) * | 1997-11-20 | 1999-06-08 | Kanegafuchi Chem Ind Co Ltd | Production of polyamic acid and polyimide film |
JP2014139302A (en) * | 2012-12-20 | 2014-07-31 | Asahi Kasei E-Materials Corp | Polyimide precursor and resin composition containing the same, polyimide film and its manufacturing method, laminate and its manufacturing method |
US9161440B2 (en) | 2006-06-26 | 2015-10-13 | Sabic Global Technologies B.V. | Articles comprising a polyimide solvent cast film having a low coefficient of thermal expansion and method of manufacture thereof |
-
1992
- 1992-05-21 JP JP15594992A patent/JP3299777B2/en not_active Expired - Fee Related
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11152331A (en) * | 1997-11-20 | 1999-06-08 | Kanegafuchi Chem Ind Co Ltd | Production of polyamic acid and polyimide film |
US9161440B2 (en) | 2006-06-26 | 2015-10-13 | Sabic Global Technologies B.V. | Articles comprising a polyimide solvent cast film having a low coefficient of thermal expansion and method of manufacture thereof |
JP2014139302A (en) * | 2012-12-20 | 2014-07-31 | Asahi Kasei E-Materials Corp | Polyimide precursor and resin composition containing the same, polyimide film and its manufacturing method, laminate and its manufacturing method |
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JP3299777B2 (en) | 2002-07-08 |
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