JPH05223521A - Macro inspection apparatus capable of reading out position - Google Patents
Macro inspection apparatus capable of reading out positionInfo
- Publication number
- JPH05223521A JPH05223521A JP3106192A JP3106192A JPH05223521A JP H05223521 A JPH05223521 A JP H05223521A JP 3106192 A JP3106192 A JP 3106192A JP 3106192 A JP3106192 A JP 3106192A JP H05223521 A JPH05223521 A JP H05223521A
- Authority
- JP
- Japan
- Prior art keywords
- sample
- stage
- defect
- projection unit
- macro inspection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1306—Details
- G02F1/1309—Repairing; Testing
Landscapes
- Length Measuring Devices By Optical Means (AREA)
- Details Of Measuring And Other Instruments (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、 LCD基板などの表面の
欠陥位置を読取り可能としたマクロ検査装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a macro inspection device capable of reading a defect position on a surface of an LCD substrate or the like.
【0002】[0002]
【従来の技術】従来、石英ウエハや LCDなどの透明な基
板に光を照射して試料表面の傷や膜厚むら等をマクロ検
査装置を用いて裸眼で検出した場合、その試料が製品と
して使用可能か、あるいは品質、機能がどの程度損なわ
れたか等につき、更に他の顕微鏡等の検査機で再びその
欠陥部を拡大し、その欠陥を解析する必要がある。この
場合、最初の検査で発見した欠陥位置を作業者が記憶し
ておくか、 LCD基板のように透明な試料であれば、基板
の裏面にマーク付けをしてから、つぎの検査に移し、そ
の欠陥部の解析を行っていた。ところが、顕微鏡ステー
ジに設置した試料の欠陥部を対物の真下に持って来るに
は試料を前後左右に移動させなければならず、どうして
もレボルバなどが邪魔になって、欠陥位置を真下に持っ
て来にくく、作業者をいらただせてた。2. Description of the Related Art Conventionally, when a transparent substrate such as a quartz wafer or LCD is irradiated with light to detect scratches and film thickness unevenness on the sample surface with a macro inspection device with the naked eye, the sample is used as a product. It is necessary to analyze the defect again by enlarging the defective portion again with another inspection machine such as a microscope to determine whether the defect is possible or how much the quality and function are deteriorated. In this case, the operator should remember the defect position found in the first inspection, or if it is a transparent sample such as an LCD substrate, mark it on the back surface of the substrate and then move on to the next inspection. The defect part was analyzed. However, in order to bring the defective part of the sample placed on the microscope stage directly under the objective, the sample had to be moved back and forth, left and right, and the revolver and the like inevitably hindered, bringing the defect position directly below. It was difficult and annoying to the worker.
【0003】更に、 LCD基板のように試料が大きいと、
同一試料中に欠陥部が数個存在する場合もあり、作業者
がこれら欠陥位置を覚え切れず、また、マーキングする
にしても多くの時間を要していた。このマーキング作業
自体がコンタミ上良くないものであった。Further, if the sample is large like an LCD substrate,
In some cases, there are several defective parts in the same sample, the operator cannot remember these defective positions, and much time is required for marking. This marking operation itself was not good in terms of contamination.
【0004】従来のIC用マクロ装置の概略機構を図6に
示す。光源Aからの光をレンズBを経て試料Sに投光し
て、揺動、回動自在な試料台D上の試料Sの欠陥を検査
するのであるが、欠陥位置の座標を読取る装置は、機構
上や障害から揺動する試料台Dに取付けることができな
かった。そこで試料台Dに取付けた試料S全体をTVモニ
ター(図示せず)に写し,先ず、試料面上の欠陥部を指
示棒などで差し、その像がモニター上の何処に写るかそ
の大体の位置を読取るものがあった。この場合、TVモニ
ターが大きく場所を占めると云う問題や、作業者が試料
自体とTVモニターとを同時に見る必要があると云う煩雑
さがあり、当然のことながら精度も悪るかった。FIG. 6 shows a schematic mechanism of a conventional IC macro device. The light from the light source A is projected onto the sample S via the lens B to inspect a defect of the sample S on the sample table D which can be swung and rotated. The device for reading the coordinates of the defect position is It could not be mounted on the sample table D which swings due to the mechanism and obstacles. Therefore, the entire sample S mounted on the sample table D is copied on a TV monitor (not shown), and first, the defective portion on the sample surface is inserted with an indicator stick or the like, and the position where the image is reflected on the monitor is roughly estimated. There was something to read. In this case, there is a problem that the TV monitor occupies a large space, and there is a complexity that an operator needs to see the sample itself and the TV monitor at the same time, and the accuracy is naturally poor.
【0005】それでも、図7に示したようにICウエハE
の検査の場合、チップCとなるパターンが間隔を置いて
焼付けられているので、「上から何列目の左から何番目
のチップの右上」などと作業者が欠陥位置を覚え易いの
で、このような記憶しておく方法であっても何とか間に
合った。然し、 LCD基板の場合には、対角10インチ以上
の画面全体が同一の細かいパターンで埋められているの
で、位置特定が極めて困難である。Even so, as shown in FIG. 7, the IC wafer E
In the case of the inspection, since the pattern to be the chip C is printed at intervals, it is easy for the operator to remember the defect position, such as "in what column from the left, in what upper right of the chip from the left". Even with such a memory method, I managed to make it. However, in the case of an LCD substrate, it is extremely difficult to specify the position because the entire screen with a diagonal of 10 inches or more is filled with the same fine pattern.
【0006】このように LCD基板では欠陥部が多いこ
と、欠陥部を覚えるための目印がないこと、また、単位
時間当たりの処理数、即ちスルーブットがICより数倍多
く必要とされていることなどから、欠陥座標を読取った
後に他の装置で更に、その座標を指定して試料を動かし
欠陥部を呼び出した後、検査する装置が必要とされてい
る。As described above, the LCD substrate has many defective portions, there is no mark for memorizing the defective portions, and the number of processings per unit time, that is, the through butt is required to be several times larger than that of the IC. Therefore, there is a need for an apparatus for inspecting the defect coordinates after reading the defect coordinates with another apparatus and moving the sample by instructing the coordinates to call the defect portion.
【0007】[0007]
【発明が解決しようとする課題】上述のように、作業者
が欠陥位置を覚えておくか、 LCD基板の裏面にマークし
たり、TVでモニターしておき試料欠陥部を指す指示棒の
先端をモニター上で読取ったりする煩雑にして不便な作
業があり、然も欠陥部が多数あれば、益々困窮する問題
が増え、欠陥位置が覚え切れないことた、或いはマーク
した為にコンタミ、工数の問題が生じ、更に精度が悪い
などの欠点があった。As described above, the operator must remember the defect position, mark it on the back surface of the LCD substrate, or monitor it on the TV and set the tip of the indicator rod pointing to the sample defect part. There is a complicated and inconvenient work such as reading on the monitor, and if there are many defective parts, the problem becomes more and more difficult, the defect position can not be remembered, or the mark is a problem of contamination and man-hours. However, there are drawbacks such as poor accuracy.
【0008】本発明は上述の通り、 LCD基板等の欠陥位
置を、能率良く、精度良く検査できることを目的とし、
さらにはその自動化を実現するものである。As described above, the present invention aims to be able to inspect defect positions of an LCD substrate or the like efficiently and accurately,
Furthermore, it realizes the automation.
【0009】[0009]
【課題を解決するための手段】試料を保持する枢動自在
な傾斜試料台と、該傾斜試料台の底部に設けられ試料に
対向して X,Y軸方向にそれぞれ移動可能なステージと、
該ステージの X,Y軸方向それぞれの移動量を読取る読取
器と、ステージに一体的取り付けられ試料面を照射する
スポット投影ユニットとからなり、前記ステージを X,Y
軸方向に移動せしめて試料の欠陥部にスポットを合致せ
しめことで、前記ステージの移動量を前記欠陥部の座標
位置として表示することを特徴とするものである。[Means for Solving the Problems] A tiltable sample holder that holds a sample and a stage that is provided at the bottom of the sample sample and that can move in the X and Y axis directions facing the sample.
The stage consists of a reader that reads the amount of movement in each of the X and Y axis directions, and a spot projection unit that is integrally attached to the stage and illuminates the sample surface.
It is characterized in that the amount of movement of the stage is displayed as a coordinate position of the defective portion by moving the stage in the axial direction to match the spot with the defective portion of the sample.
【0010】[0010]
【作用】本発明は、以上の構成であるから、試料の欠陥
を見つけたら、その位置にスポット投影ユニットを合致
させるだけの簡単な作業でステージの欠陥部の位置座標
を正確に能率良く読取りできるようになった。しかも自
動化を実現可能にした。Since the present invention has the above-mentioned structure, when a defect of the sample is found, the position coordinates of the defective portion of the stage can be accurately and efficiently read by a simple operation of matching the spot projection unit to the position. It became so. Moreover, automation has become possible.
【0011】[0011]
【実施例】図1、図2は本発明の基本概念図である。1
は試料Sを上方から照射するための光源1aとレンズ1bか
らなる検査投光ユニットで、試料Sを保持する傾斜試料
台2は、1方向にのみ傾斜するようになっている。ステ
ージ3には x,y軸それぞれの方向に移動するテーブル 3
a,3bと、その移動量を夫々読取る読取器 3x,3yが備えら
れている。4はレンズ4aと LED光源4bからなるスポット
投光ユニットであって、前記ステージ3に取り付けられ
ており、試料Sの下方からスポット光が当てられるよう
に構成されている。1 and 2 are basic conceptual diagrams of the present invention. 1
Is an inspection light projecting unit including a light source 1a and a lens 1b for irradiating the sample S from above, and the tilted sample base 2 holding the sample S is tilted only in one direction. The stage 3 has a table 3 that moves in each of the x and y axes.
It is provided with a and 3b and readers 3x and 3y for reading the movement amounts thereof, respectively. Reference numeral 4 denotes a spot light projecting unit including a lens 4a and an LED light source 4b, which is attached to the stage 3 and is configured so that spot light is applied from below the sample S.
【0012】図において、観察者は検査光を試料Sに照
射し、欠陥部を探し、見つかった場合はステージ3を動
かして、スポット投影ユニット4を欠陥部と合致させ
る。その時の x,y軸の座標を読む。ここで、試料Sの透
明硝子の右下隅部の原点Pは、X,Y軸の座標中心に合わ
せてあるので、原点Pからの欠陥部座標を読むことがで
きる。この場合、読取りの精度は±0.5 mm程度であれば
よい。何故ならば、顕微鏡で検査する場合は、5倍対物
の視野数20の接眼の場合で4mm径程度であるため、この
視野中に欠陥部を入れることができれば良い。よって±
1mmでも良いが、±0.5mm 位が好ましい。10倍対物使用
で、最初の欠陥探しをする場合もあるからである。よっ
て、1mm径程度のスポット光を試料に照射できるスポッ
ト投影ユニット4を選ぶのがよい。In the figure, an observer irradiates the sample S with inspection light to search for a defective portion, and if found, moves the stage 3 to align the spot projection unit 4 with the defective portion. Read the coordinates of the x and y axes at that time. Since the origin P of the lower right corner of the transparent glass of the sample S is aligned with the coordinate center of the X and Y axes, the defect coordinates from the origin P can be read. In this case, the reading accuracy may be about ± 0.5 mm. The reason for this is that in the case of inspecting with a microscope, the diameter is about 4 mm in the case of an eyepiece with 20 times the field of view of a 5 × objective, so it is sufficient if a defect can be inserted in this field of view. Therefore ±
It may be 1 mm, but preferably ± 0.5 mm. This is because the first defect may be searched for when using a 10x objective. Therefore, it is preferable to select the spot projection unit 4 capable of irradiating the sample with the spot light having a diameter of about 1 mm.
【0013】図3は本発明の具体的な実施例を示す。検
査光投光ユニット1から出射される光即ち、放物反射面
をもった光源1aからの光は一度集光した後に、大きな2
枚のフレネルレンズ1bによって、平行光、あるいは収束
光となって傾斜試料台2の上に保持された試料Sに検査
光を照射する。この傾斜試料台2には、試料Sを保持す
る試料保持具2a、傾斜試料台2を傾斜昇降させるモータ
2bが備えられており、傾斜試料台2は、後述するよう
に、このモータ2bの駆動で支軸2cを支点として観察者側
に対向して 0°〜45°傾斜するようになっており、試料
Sの取り付け、取り外しの際は、降下せしめて、その先
端がストッパ2d上に降りて停止するようになっている。
また、傾斜試料台2の底部には x,y軸方向に移動可能な
ステージ3が設けられており、 x,y軸方向に移動するス
テージ3のテーブル 3a,3bのそれぞれの移動量を読み取
る読取器 3x,3yが備えられている。また、このステージ
3の座標面上方にはステージ3にスポット投影ユニット
4が数列かつ数行、固設されており、ステージ3の x,y
軸方向への移動と共に一体的に移動するようになってい
る。FIG. 3 shows a specific embodiment of the present invention. The light emitted from the inspection light projecting unit 1, that is, the light from the light source 1a having a parabolic reflection surface, is condensed once and then converted into a large light beam.
The Fresnel lens 1b, which is a sheet, converts the light into parallel light or convergent light onto the sample S held on the tilted sample table 2 with the inspection light. On this tilted sample table 2, a sample holder 2a for holding a sample S, and a motor for tilting the tilted sample table 2 up and down.
2b is provided, and the tilted sample table 2 is tilted 0 ° to 45 ° facing the observer side with the spindle 2c as a fulcrum by the drive of the motor 2b, as described later. At the time of attaching and detaching the sample S, the sample S is lowered so that its tip is lowered onto the stopper 2d and stopped.
In addition, a stage 3 that is movable in the x and y axis directions is provided at the bottom of the tilted sample table 2, and reading is performed to read the amount of movement of each of the tables 3a and 3b of the stage 3 that moves in the x and y axis directions. 3x and 3y are provided. Further, above the coordinate plane of the stage 3, spot projection units 4 are fixedly mounted on the stage 3 in several columns and several rows.
It moves together with the movement in the axial direction.
【0014】図4は複数のスポット投影ユニット4の設
置の1例を示す。図において、 x,y軸方向をそれぞれm,
n 等分し、それぞれの範囲単位毎に1個のスポット投影
ユニット4(ここでは6個、4A1,4A2,4A3,4B1,4B2,4B3
が図示されている)がそれぞれ検査範囲(A1,A2,A3,B1,B
2,B3) を受持つように設定されている。即ち、 m=3n
=2であるので、 x,y方向の検査可能範囲をそれぞれK
X,KY、ステージ3の x,y方向ストロークを夫々kx,
kyとすると、kx=KX(1/m) 、即ち、kx=KX(1/3) と
なり、また、ky=KY(1/n) 即ち、ky=KY(1/2) とな
る。5はコントローラ、6はコンピュータ、6aは座標の
表示器である。ロボットユニット7は、上下に昇降する
機能を有する昇降機台7aと、その機台7aの上に回転自在
に設けられた回転盤7bと、更に回転盤7bの上で水平に往
復スライドする試料授受アーム7cとからなる。そしてこ
れらはコントローラ5からの指示でそれぞれ可動するよ
うに連絡している。試料収納カセット8は、基台8aと、
その基台8aの上に設けられた複数の試料収納棚8bとから
なる。FIG. 4 shows an example of installation of a plurality of spot projection units 4. In the figure, the x and y axis directions are m,
It is divided into n equal parts and one spot projection unit 4 (6 in this case, 4A 1 , 4A 2 , 4A 3 , 4B 1 , 4, 4B 2 , 4B 3 for each range unit).
Indicates the inspection range (A 1 , A 2 , A 3 , B 1 , B
2 , B 3 ). That is, m = 3n
= 2, so the inspectable range in the x and y directions is K
X, KY, strokes of the stage 3 in the x and y directions are kx,
If ky, kx = KX (1 / m), that is, kx = KX (1/3), and ky = KY (1 / n), that is, ky = KY (1/2). 5 is a controller, 6 is a computer, and 6a is a coordinate display. The robot unit 7 includes an elevator base 7a having a function of moving up and down, a rotary plate 7b rotatably provided on the base 7a, and a sample transfer arm that horizontally slides back and forth on the rotary plate 7b. It consists of 7c. These are in contact with each other so as to be movable according to an instruction from the controller 5. The sample storage cassette 8 includes a base 8a,
It is composed of a plurality of sample storage shelves 8b provided on the base 8a.
【0015】図5は、コントローラ5と各機器部材との
制御連絡系を示す。先ず、コントローラ5を操作して、
昇降機台7aを昇降して適宜高さに位置させ、ロボットユ
ニット7の回転盤7bを回転させて、試料授受アーム7cを
試料収納カセット8に収納されている所望の試料Sの位
置に向かってスライド前進させ、目的の試料Sを掴ま
せ、今度は試料授受アーム7cをスライド後進させて回転
盤7bを回転させ、その試料Sを傾斜試料台2の試料保持
具2aへ渡す。試料保持具2aが確実に試料Sを保持する
と、観察者の所望の角度になるまでモータ2bを駆動させ
傾斜試料台2を停止させる。以上の一連の作動は、コン
トローラ5を手動にて操作して行なっても良く、またコ
ンピユ ータ6に記憶せしめて、試料Sの置き場所のみを
キー指示をすれば、当然、総てを全自動化することも可
能である。FIG. 5 shows a control communication system between the controller 5 and each device member. First, operate the controller 5,
The elevator table 7a is moved up and down to an appropriate height, the rotary plate 7b of the robot unit 7 is rotated, and the sample transfer arm 7c is slid toward the position of the desired sample S stored in the sample storage cassette 8. The target sample S is moved forward, the sample transfer arm 7c is slid backward to rotate the turntable 7b, and the sample S is transferred to the sample holder 2a of the tilted sample table 2. When the sample holder 2a securely holds the sample S, the motor 2b is driven until the angle desired by the observer is reached, and the tilted sample table 2 is stopped. The above-described series of operations may be performed by manually operating the controller 5, or if all of them are stored in the computer 6 and only the place where the sample S is placed is designated by a key, naturally all the operations are performed. It can also be automated.
【0016】この時、検査投光ユニット1の光源1aとス
ポット投影ユニット4の LED光源4bがONとなる。ここで
観察者が試料Sの欠陥部を発見すると、傾斜試料台2の
ステージ3に設けられている6個のスポット投影ユニッ
ト4の内、欠陥部に最も近いスポット投影ユニット(例
えば4A1 )を、コントローラ5の押ボタン、またはキー
(図示せず)を操作して欠陥部に合わせる。このスポッ
ト投影ユニット 4A1のステージ3の座標における移動量
は、それぞれ読取器 3x,3yで読取りが出来ると共に、コ
ンピユ ータ6に入力され、欠陥部が x,y座標として記録
される。この操作の繰り返しで複数の欠陥部を読み取る
ことができる。検査完了後は,傾斜試料台2をスットパ
2dに接触停止する原位置まで戻し、試料Sを試料授受ア
ーム7cにて試料収納カセット8に収納させ、次の精密検
査に移る。ここでは試料収納カセット8を対象として試
料Sの授受を行うようにしてあるが、勿論、図示しない
顕微鏡ステージに直接渡し、その後、試料収納カセット
に収納するようにしても良い。この場合、次工程の精密
検査機の側にも、本発明のステージと同じ目盛を有する
ステージを備えれば、直ちに欠陥部を出現させることが
でき、極めて効果的である。At this time, the light source 1a of the inspection projection unit 1 and the LED light source 4b of the spot projection unit 4 are turned on. When the observer finds a defective portion of the sample S, the spot projection unit (for example, 4A 1 ) closest to the defective portion is selected from the six spot projection units 4 provided on the stage 3 of the tilted sample stage 2. , A push button of the controller 5 or a key (not shown) is operated to align with the defective portion. The amount of movement of the spot projection unit 4A 1 on the coordinates of the stage 3 can be read by the readers 3x and 3y, respectively, and is input to the computer 6 so that the defective portion is recorded as x and y coordinates. By repeating this operation, a plurality of defective portions can be read. After the inspection is completed, tilt the sample table 2 to the stop
After returning to the original position where it stops contacting 2d, the sample S is stored in the sample storage cassette 8 by the sample transfer arm 7c, and the next detailed inspection is carried out. Here, the sample S is transferred to and from the sample storage cassette 8, but it goes without saying that the sample S may be directly transferred to a microscope stage (not shown) and then stored in the sample storage cassette. In this case, if a stage having the same scale as that of the stage of the present invention is also provided on the side of the precision inspection machine in the next step, the defective portion can immediately appear, which is extremely effective.
【0017】[0017]
【発明の効果】本発明による位置読取り可能なマクロ検
査装置は、試料基板上の欠陥部の位置座標が簡単に読み
取れることとなり、マーク付けしたり、記憶したりする
煩雑さから開放され、作業の簡易容易化と作業能率の増
進に寄与することが大きい。更にまた、他の検査機で精
密に再検査する場合にも、その欠陥部の座標位置を直ぐ
出現することができるので、一連の検査作業の自動化も
可能とするものである。The position readable macro inspection apparatus according to the present invention can easily read the position coordinates of the defective portion on the sample substrate, and is free from the complexity of marking and storing. It greatly contributes to simplification and enhancement of work efficiency. Furthermore, even when re-inspecting precisely with another inspection machine, the coordinate position of the defective portion can immediately appear, so that a series of inspection operations can be automated.
【図1】本発明の基本概念を示す側面図である。FIG. 1 is a side view showing the basic concept of the present invention.
【図2】本発明の基本概念を示す斜視図である。FIG. 2 is a perspective view showing the basic concept of the present invention.
【図3】本発明の実施例を示す構成の側面図である。FIG. 3 is a side view of a configuration showing an embodiment of the present invention.
【図4】本発明によるスポット投影ユニットの配置例を
示す。FIG. 4 shows an arrangement example of a spot projection unit according to the present invention.
【図5】本発明によるコントローラと他機器部材との制
御連絡系を示す。FIG. 5 shows a control communication system between the controller according to the present invention and other device members.
【図6】従来のマクロ検査装置の概略機構図である。FIG. 6 is a schematic mechanism diagram of a conventional macro inspection device.
【図7】ICウエハのチップ配列の1例を示す。FIG. 7 shows an example of an IC wafer chip arrangement.
1 検査投光ユニット 2 傾斜試料台 3 ステージ 3x,3y 読取器 4,4a スポット投影ユニット 5 コントローラ 6 コンピユ ータ 6a 表示器 7 ロボットユニット 8 試料収納カセット S 試料 1 Inspection / projection unit 2 Inclined sample stage 3 Stage 3x, 3y Reader 4, 4a Spot projection unit 5 Controller 6 Computer 6a Display 7 Robot unit 8 Sample storage cassette S Sample
Claims (2)
に光を照射し、裸眼で試料表面の傷、ごみ、膜厚むら等
を検出するマクロ検査装置において、試料を保持する枢
動自在な傾斜試料台と、該傾斜試料台の底部に設けられ
試料に対向して X,Y軸方向にそれぞれ移動可能なステー
ジと、該ステージの X,Y軸方向それぞれの移動量を読取
る読取器と、ステージに一体的取り付けられ試料面を照
射するスポット投影ユニットとからなり、前記ステージ
を X,Y軸方向に移動せしめて試料の欠陥部にスポットを
合致せしめことで、前記ステージの移動量を前記欠陥部
の座標位置として表示することを特徴とする位置読取り
可能なマクロ検査装置。1. A macro inspection apparatus for irradiating a transparent sample substrate such as a quartz wafer or LCD with light to detect scratches, dust, film thickness unevenness, etc. on the sample surface with the naked eye, and is capable of pivoting to hold the sample. An inclined sample stage, a stage provided at the bottom of the inclined sample stage and movable in the X and Y axis directions facing the sample, and a reader for reading the movement amount of each of the X and Y axis directions of the stage, It consists of a spot projection unit that is integrally attached to the stage and illuminates the sample surface.By moving the stage in the X and Y axis directions to match the spot to the defective portion of the sample, the movement amount of the stage A position readable macro inspection device characterized by displaying as a coordinate position of a part.
ージを縦横にそれぞれ複数に均等分割された単位範囲毎
に設置され、前記ステージのストロークはスポット投影
ユニットの数にそれぞれ反比例することを特徴とする請
求項1記載の位置読取り可能なマクロ検査装置。2. The spot projection unit is installed for each unit range in which the stage is vertically and horizontally divided into a plurality of units, and the stroke of the stage is inversely proportional to the number of the spot projection units. A position readable macro inspection device according to item 1.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP03106192A JP3190406B2 (en) | 1992-02-18 | 1992-02-18 | Defect inspection equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP03106192A JP3190406B2 (en) | 1992-02-18 | 1992-02-18 | Defect inspection equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH05223521A true JPH05223521A (en) | 1993-08-31 |
JP3190406B2 JP3190406B2 (en) | 2001-07-23 |
Family
ID=12320962
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP03106192A Expired - Fee Related JP3190406B2 (en) | 1992-02-18 | 1992-02-18 | Defect inspection equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3190406B2 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6362884B1 (en) | 1997-09-24 | 2002-03-26 | Olympus Optical Co., Ltd. | Apparatus for inspecting a substrate |
US6671041B2 (en) | 1997-09-24 | 2003-12-30 | Olympus Optical Co., Ltd. | Apparatus for inspecting a substrate |
JP2006200917A (en) * | 2005-01-18 | 2006-08-03 | Olympus Corp | Coordinates detecting device and test object inspecting device |
JP2008292494A (en) * | 1997-09-24 | 2008-12-04 | Olympus Corp | Substrate-inspecting device |
-
1992
- 1992-02-18 JP JP03106192A patent/JP3190406B2/en not_active Expired - Fee Related
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6362884B1 (en) | 1997-09-24 | 2002-03-26 | Olympus Optical Co., Ltd. | Apparatus for inspecting a substrate |
US6671041B2 (en) | 1997-09-24 | 2003-12-30 | Olympus Optical Co., Ltd. | Apparatus for inspecting a substrate |
US6707546B2 (en) | 1997-09-24 | 2004-03-16 | Olympus Optical Co., Ltd. | Apparatus for inspecting a substrate |
JP2008292494A (en) * | 1997-09-24 | 2008-12-04 | Olympus Corp | Substrate-inspecting device |
JP2006200917A (en) * | 2005-01-18 | 2006-08-03 | Olympus Corp | Coordinates detecting device and test object inspecting device |
JP4653500B2 (en) * | 2005-01-18 | 2011-03-16 | オリンパス株式会社 | Coordinate detection apparatus and subject inspection apparatus |
Also Published As
Publication number | Publication date |
---|---|
JP3190406B2 (en) | 2001-07-23 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5204912A (en) | Defect verification and marking system for use with printed circuit boards | |
US4938654A (en) | Automated wafer inspection system | |
US5105147A (en) | Wafer inspection system | |
US5777485A (en) | Probe method and apparatus with improved probe contact | |
JP4166340B2 (en) | Board inspection equipment | |
JPH0150844B2 (en) | ||
KR101033855B1 (en) | Thickness Measurement and Two-Dimensional Code Detection System of Glass Substrate | |
JPH0318708A (en) | Method and device for inspecting surface | |
JP2002082067A (en) | Substrate inspecting device | |
KR20010077543A (en) | Apparatus for inspecting the defects on the wafer periphery and method of inspection | |
KR20060083890A (en) | Coordinate Detection Device and Subject Inspection Device | |
TW201207382A (en) | Processing device, processing system, and method for correcting coordinates | |
US6671041B2 (en) | Apparatus for inspecting a substrate | |
JP3333148B2 (en) | Appearance inspection device | |
JPH10111253A (en) | Board inspection apparatus | |
JP3190406B2 (en) | Defect inspection equipment | |
JP3944285B2 (en) | Board inspection equipment | |
JP4755673B2 (en) | Board inspection equipment | |
JP4256974B2 (en) | Board inspection equipment | |
KR20210021911A (en) | Measurement apparatus, inspection method of workpiece, displaying method of image data | |
JP2000275594A (en) | Substrate inspecting device | |
CN109829455B (en) | Method and system for identifying micron-sized ID image | |
JPH04151547A (en) | Visual/microscope observing apparatus | |
US5376804A (en) | Optical analysis system and positioning apparatus thereof | |
JP3183811B2 (en) | Inspection support device |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20010501 |
|
LAPS | Cancellation because of no payment of annual fees |