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JPH0518906B2 - - Google Patents

Info

Publication number
JPH0518906B2
JPH0518906B2 JP8458384A JP8458384A JPH0518906B2 JP H0518906 B2 JPH0518906 B2 JP H0518906B2 JP 8458384 A JP8458384 A JP 8458384A JP 8458384 A JP8458384 A JP 8458384A JP H0518906 B2 JPH0518906 B2 JP H0518906B2
Authority
JP
Japan
Prior art keywords
sample
tungsten
argon
present
ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP8458384A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60228675A (ja
Inventor
Eiji Igawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP8458384A priority Critical patent/JPS60228675A/ja
Publication of JPS60228675A publication Critical patent/JPS60228675A/ja
Publication of JPH0518906B2 publication Critical patent/JPH0518906B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/08—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metal halides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/047—Coating on selected surface areas, e.g. using masks using irradiation by energy or particles

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
JP8458384A 1984-04-26 1984-04-26 タングステンのデポジシヨン方法 Granted JPS60228675A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8458384A JPS60228675A (ja) 1984-04-26 1984-04-26 タングステンのデポジシヨン方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8458384A JPS60228675A (ja) 1984-04-26 1984-04-26 タングステンのデポジシヨン方法

Publications (2)

Publication Number Publication Date
JPS60228675A JPS60228675A (ja) 1985-11-13
JPH0518906B2 true JPH0518906B2 (fr) 1993-03-15

Family

ID=13834692

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8458384A Granted JPS60228675A (ja) 1984-04-26 1984-04-26 タングステンのデポジシヨン方法

Country Status (1)

Country Link
JP (1) JPS60228675A (fr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6324033A (ja) * 1986-07-16 1988-02-01 Nippon Kokan Kk <Nkk> 化学気相蒸着処理を利用した金属材の製造方法
JP2527292B2 (ja) * 1993-03-26 1996-08-21 株式会社日立製作所 Ｉｃ素子およびｉｃ素子における配線接続方法
JPH06302603A (ja) * 1993-03-26 1994-10-28 Hitachi Ltd Ｉｃ素子
JP2527293B2 (ja) * 1993-03-26 1996-08-21 株式会社日立製作所 Ｉｃ素子における配線接続方法
JPH06283534A (ja) * 1993-03-26 1994-10-07 Hitachi Ltd Ｉｃ素子における配線接続装置

Also Published As

Publication number Publication date
JPS60228675A (ja) 1985-11-13

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