JPH05117552A - Coating for forming high refractive index antistatic film and transparent material laminate having high refractive index antistatic film - Google Patents
Coating for forming high refractive index antistatic film and transparent material laminate having high refractive index antistatic filmInfo
- Publication number
- JPH05117552A JPH05117552A JP4088702A JP8870292A JPH05117552A JP H05117552 A JPH05117552 A JP H05117552A JP 4088702 A JP4088702 A JP 4088702A JP 8870292 A JP8870292 A JP 8870292A JP H05117552 A JPH05117552 A JP H05117552A
- Authority
- JP
- Japan
- Prior art keywords
- refractive index
- film layer
- index film
- antistatic
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011248 coating agent Substances 0.000 title claims abstract description 43
- 238000000576 coating method Methods 0.000 title claims abstract description 43
- 239000012780 transparent material Substances 0.000 title claims description 17
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims abstract description 32
- 229910001887 tin oxide Inorganic materials 0.000 claims abstract description 32
- 239000000843 powder Substances 0.000 claims abstract description 31
- 229920002545 silicone oil Polymers 0.000 claims abstract description 25
- 239000000203 mixture Substances 0.000 claims abstract description 15
- 239000006185 dispersion Substances 0.000 claims abstract description 12
- 239000000463 material Substances 0.000 claims description 37
- -1 silicon alkoxide Chemical class 0.000 claims description 23
- 229910052710 silicon Inorganic materials 0.000 claims description 20
- 239000010703 silicon Substances 0.000 claims description 20
- 239000002245 particle Substances 0.000 claims description 13
- 239000003973 paint Substances 0.000 claims description 12
- 239000003086 colorant Substances 0.000 claims description 10
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 claims description 9
- 229910001635 magnesium fluoride Inorganic materials 0.000 claims description 9
- 239000000758 substrate Substances 0.000 claims description 9
- 239000003125 aqueous solvent Substances 0.000 claims description 8
- 239000010419 fine particle Substances 0.000 claims description 8
- 239000008199 coating composition Substances 0.000 claims description 7
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 6
- 238000001035 drying Methods 0.000 claims description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 3
- 239000004721 Polyphenylene oxide Substances 0.000 claims description 2
- 125000003545 alkoxy group Chemical group 0.000 claims description 2
- 125000003277 amino group Chemical group 0.000 claims description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 2
- 125000003700 epoxy group Chemical group 0.000 claims description 2
- 125000004185 ester group Chemical group 0.000 claims description 2
- 229920000570 polyether Polymers 0.000 claims description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- 125000005375 organosiloxane group Chemical group 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 11
- 239000002904 solvent Substances 0.000 abstract description 10
- 239000000377 silicon dioxide Substances 0.000 abstract description 9
- 239000011230 binding agent Substances 0.000 abstract description 4
- 229910052787 antimony Inorganic materials 0.000 abstract description 3
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 abstract description 3
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 70
- 238000000034 method Methods 0.000 description 11
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 10
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 8
- 150000001875 compounds Chemical class 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 235000019441 ethanol Nutrition 0.000 description 6
- 230000007062 hydrolysis Effects 0.000 description 6
- 238000006460 hydrolysis reaction Methods 0.000 description 6
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 3
- 238000001027 hydrothermal synthesis Methods 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 239000012071 phase Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 230000003068 static effect Effects 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 239000005357 flat glass Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- DGOBMKYRQHEFGQ-UHFFFAOYSA-L acid green 5 Chemical compound [Na+].[Na+].C=1C=C(C(=C2C=CC(C=C2)=[N+](CC)CC=2C=C(C=CC=2)S([O-])(=O)=O)C=2C=CC(=CC=2)S([O-])(=O)=O)C=CC=1N(CC)CC1=CC=CC(S([O-])(=O)=O)=C1 DGOBMKYRQHEFGQ-UHFFFAOYSA-L 0.000 description 1
- 125000003158 alcohol group Chemical group 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 150000007514 bases Chemical class 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 239000006059 cover glass Substances 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical class OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000011882 ultra-fine particle Substances 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
Landscapes
- Application Of Or Painting With Fluid Materials (AREA)
- Processes Of Treating Macromolecular Substances (AREA)
- Surface Treatment Of Glass (AREA)
- Paints Or Removers (AREA)
- Transforming Electric Information Into Light Information (AREA)
- Surface Treatment Of Optical Elements (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、帯電防止・高屈折率膜
形成用塗料および、それを用いて得られる帯電防止・高
屈折率膜付き透明材料積層体に関するものである。更に
詳しく述べるならば、本発明は、ディスプレー装置の表
示面、その表面カバー材料、窓ガラス、ショーウィンド
ー用ガラス、TVブラウン管の表示面、液晶装置の表示
面、計器のカバーガラス、時計のカバーガラス、および
CRTの前面映像面などのように、静電気帯電防止およ
び映り込みの防止を必要とする透明材料表面の塗装に有
用な帯電防止・高屈折率膜形成用塗料および、それを用
いて得られる帯電防止・高屈折率膜付き透明材料積層体
に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an antistatic / high refractive index film-forming coating material and an antistatic / high refractive index film-attached transparent material laminate obtained by using the same. More specifically, the present invention relates to the display surface of a display device, its surface cover material, window glass, show window glass, TV cathode ray tube display surface, liquid crystal device display surface, instrument cover glass, watch cover. Antistatic / high refractive index film forming paint useful for coating the surface of transparent materials such as glass and the front image surface of CRT which are required to prevent static electrification and reflection, and to obtain using it The present invention relates to an antistatic / high refractive index film-attached transparent material laminate.
【0002】[0002]
【従来の技術】一般に画像表示用透明材料、例えばTV
ブラウン管の画像表示部には静電気が帯電しやすく、こ
の静電気によって塵埃が表示面に付着するという問題点
が知られている。また、上記画像表示面に、外部の光が
反射し、或は外部映像がうつり、表示面の画像を不明瞭
にするなどの問題点も知られている。2. Description of the Related Art Generally, transparent materials for displaying images, such as TVs.
It is known that static electricity is easily charged in the image display portion of the cathode ray tube, and that the static electricity causes dust to adhere to the display surface. In addition, there are known problems such that external light is reflected on the image display surface or an external image is transferred, and the image on the display surface is unclear.
【0003】上記の問題点を解消するために、従来、透
明基材の表面に、アンチモンをドープした酸化錫の微粒
子と、シリコンアルコキシドの加水分解生成物との非水
性溶媒分散液を塗布し、乾燥して、帯電防止膜層を形成
し、前記帯電防止膜上に、それよりも屈折率の低い膜層
を形成することが行われている。この低屈折率膜層は、
通常シリコンアルコキシドの加水分解生成物すなわちシ
リカによって形成されている。しかしながら、従来の帯
電防止膜層と低屈折率膜層との接着性が不良であって、
これら両層の間に層間剥離を生じ易いという問題があっ
た。In order to solve the above problems, conventionally, a non-aqueous solvent dispersion of fine particles of antimony-doped tin oxide and a hydrolysis product of silicon alkoxide is applied to the surface of a transparent substrate, Drying is performed to form an antistatic film layer, and a film layer having a lower refractive index than that is formed on the antistatic film. This low refractive index film layer is
It is usually formed by the hydrolysis product of silicon alkoxide, namely silica. However, the adhesion between the conventional antistatic film layer and the low refractive index film layer is poor,
There is a problem that delamination easily occurs between these two layers.
【0004】また、前記従来の帯電防止膜層の屈折率
は、n=1.50〜1.54程度であって、前述のよう
に、シリコンアルコキシドの加水分解生成物(シリカ)
により形成される低屈折率膜層の屈折率との差が小さ
く、従って、従来の帯電防止膜層と低屈折率膜層との組
み合わせによる反射防止性が不十分であった。更に、前
記従来の帯電防止膜層は、アンチモンドープ酸化錫微粉
末のバインダーとしてシリコンアルコキシドが用いられ
ており、このシリコンアルコキシドは、多量の水と接触
すると、加水分解および縮重合が促進され、不溶性のシ
リカを生成し、塗料としての機能を早期に失うので、帯
電防止膜層形成用塗料は、非水溶媒(一般にエチルアル
コール)を用いる必要がある。しかしながら塗料のコス
トを低減し、環境汚染を防止し、かつ取り扱いを容易に
するためは、水を塗料溶媒として使用することが望まし
い。Further, the refractive index of the conventional antistatic film layer is about n = 1.50 to 1.54, and as described above, a hydrolysis product (silica) of silicon alkoxide.
The difference from the refractive index of the low refractive index film layer formed by the above is small, and therefore, the antireflection property of the conventional combination of the antistatic film layer and the low refractive index film layer was insufficient. Furthermore, in the conventional antistatic film layer, a silicon alkoxide is used as a binder of antimony-doped tin oxide fine powder, and when this silicon alkoxide is brought into contact with a large amount of water, hydrolysis and polycondensation are promoted and insoluble Since it produces silica and loses its function as a coating material at an early stage, it is necessary to use a non-aqueous solvent (generally ethyl alcohol) for the coating material for forming an antistatic film layer. However, in order to reduce the cost of the paint, prevent environmental pollution, and facilitate handling, it is desirable to use water as the paint solvent.
【0005】上記の問題点を解決するために、前述のよ
うにアンチモンドープ酸化錫微粉末と、シリコンアルコ
キシドの加水分解生成物(シリカ)との混合物を含む非
水溶媒分散液からなる塗料から帯電防止膜層を形成し、
その上に、シリコンアルコキシドの加水分解生成物(シ
リカ)の水性分散液からなる塗料を塗布して、低屈折率
膜層を形成する試みもなされたが、得られた両層間の密
着性が不十分であり、かつ反射防止効果も不十分なもの
であり、塗料としての寿命も短かく、実用化し得るもの
ではなかった。In order to solve the above-mentioned problems, as described above, charging is carried out from a paint comprising a non-aqueous solvent dispersion liquid containing a mixture of antimony-doped tin oxide fine powder and a hydrolysis product (silica) of silicon alkoxide. Forming a barrier layer,
Attempts were also made to form a low-refractive index film layer by applying a paint consisting of an aqueous dispersion of a hydrolyzate of silicon alkoxide (silica) on it, but the adhesion between the two layers obtained was not satisfactory. It was sufficient, the antireflection effect was insufficient, and the life of the paint was short, so that it could not be put to practical use.
【0006】[0006]
【発明が解決しようとする課題】本発明は、透明材料面
上に、帯電防止性にすぐれ、かつ低屈折率膜層に対し、
密着性の良好な膜層を、水を溶媒に用いて容易に、かつ
安価に形成するのに有用な帯電防止・高屈折率膜形成用
塗料、およびそれを用いて得られる帯電防止・高屈折率
膜付き透明材料積層体、特に帯電防止・高屈折率膜層
と、その上に形成された低屈折率膜層とを有する透明材
料積層体を提供しようとするものである。SUMMARY OF THE INVENTION The present invention provides a low refractive index film layer having excellent antistatic properties on a transparent material surface.
Antistatic / high-refractive-index film-forming coating that is useful for easily and inexpensively forming a film layer with good adhesion using water as a solvent, and antistatic / high-refractive index obtained using it An object of the present invention is to provide a transparent material laminate having an index film, particularly a transparent material laminate having an antistatic / high refractive index film layer and a low refractive index film layer formed thereon.
【0007】[0007]
【課題を解決するための手段】本発明は、アンチモンド
ープ酸化錫微粉末用結着剤として、シリコンアルコキシ
ドを用いることなく、その代りにシリコーンオイルを用
いることによって、上記課題を解決し得ることを見出
し、それに基いて完成されたものである。The present invention can solve the above problems by using silicone oil instead of silicon alkoxide as a binder for antimony-doped tin oxide fine powder, instead of using silicon alkoxide. It was completed based on the headline.
【0008】すなわち、本発明に係る帯電防止・高屈折
率膜形成用塗料は、アンチモンをドープした酸化錫の微
粉末と、シリコーンオイルとの混合物を含む水性分散液
からなることを特徴とするものである。That is, the coating composition for forming an antistatic / high refractive index film according to the present invention is characterized by comprising an aqueous dispersion containing a mixture of antimony-doped tin oxide fine powder and silicone oil. Is.
【0009】本発明の塗料には、600nm付近に吸収中
心波長を有する着色剤が更に含まれていてもよい。塗料
中の着色剤の含有量は、塗料固形分重量に対し、3〜2
0%であることが望ましい。The coating composition of the present invention may further contain a colorant having an absorption center wavelength near 600 nm. The content of the colorant in the paint is 3 to 2 relative to the weight of the solid content of the paint.
It is preferably 0%.
【0010】また、本発明に係る帯電防止・高屈折率膜
付き透明材料積層体は、透明基材と、この透明基材の表
面上に、アンチモンドープ酸化錫の微粉末と、シリコー
ンオイルとの混合物を含む水性分散液からなる塗料を塗
布、乾燥して形成された帯電防止・高屈折率膜層と、こ
の帯電防止・高屈折率膜層の上に形成され、かつその屈
折率よりも0.1以上低い屈折率を有する、低屈折率膜
層とを含んでなることを特徴とするものである。The antistatic / high refractive index film-attached transparent material laminate according to the present invention comprises a transparent base material, and a fine powder of antimony-doped tin oxide and a silicone oil on the surface of the transparent base material. An antistatic / high-refractive-index film layer formed by applying and drying a paint composed of an aqueous dispersion containing a mixture, and a layer formed on the antistatic / high-refractive-index film layer and having a refractive index of 0 or more And a low refractive index film layer having a low refractive index of 1 or more.
【0011】本発明の透明材料積層体は、600nm付近
に吸収中心波長を有する着色剤により着色されていても
よく、それによって、フィルター機能が付与される。こ
の着色剤は、前記高屈折率膜層、および低屈折率膜層の
少なくとも1層中に添加される。高屈折率膜層中の着色
剤含有率は3〜20重量%であることが好ましく、低屈
折率膜層中の着色剤含有率は適宜に定めることができ
る。The transparent material laminate of the present invention may be colored with a coloring agent having an absorption center wavelength in the vicinity of 600 nm, whereby a filter function is imparted. This colorant is added to at least one of the high refractive index film layer and the low refractive index film layer. The colorant content in the high refractive index film layer is preferably 3 to 20% by weight, and the colorant content in the low refractive index film layer can be appropriately determined.
【0012】[0012]
【作用】本発明の帯電防止・高屈折率膜形成用塗料に、
用いられるアンチモンドープ酸化錫微粉末−シリコーン
オイル混合物において、アンチモンドープ酸化錫微粉末
の含有量と、シリコーンオイルの含有量(SiO2 換
算)の割合は、80〜99.99:20〜0.01であ
ることが好ましい。アンチモンドープ酸化錫微粉末の含
有量の前記混合物全重量(シリコーンオイルの量はSi
O2 に換算)に対する割合が80/20未満になると、
シリコーンオイルの含有量が過度となり、得られる膜層
の機械的強度が不十分になる。また、それが、99.9
9/0.01より大きくなると、シリコーンオイルの含
有量が過少になり、得られる帯電防止・高屈折率膜層の
他の材料、すなわち透明基材との又は低屈折率膜層との
接着性が不十分になる。[Function] The antistatic / high refractive index film-forming coating material of the present invention,
In the antimony-doped tin oxide fine powder-silicone oil mixture used, the ratio of the content of the antimony-doped tin oxide fine powder to the content of the silicone oil (converted to SiO 2 ) is 80 to 99.99: 20 to 0.01. Is preferred. The total weight of the mixture with the content of antimony-doped tin oxide fine powder (the amount of silicone oil is Si
When the ratio to O 2 is less than 80/20,
The content of silicone oil becomes excessive, and the mechanical strength of the obtained membrane layer becomes insufficient. Moreover, it is 99.9.
When it is more than 9 / 0.01, the content of silicone oil becomes too small, and the adhesiveness with other materials of the obtained antistatic / high refractive index film layer, that is, with the transparent substrate or with the low refractive index film layer. Becomes insufficient.
【0013】シリコンアルコキシドを含む従来の帯電防
止膜形成用塗料においては、アンチモンドープ酸化錫微
粉末の含有量は、それとシリコンアルコキシド(SiO
2 換算)との合計重量に対し、80重量%未満であるこ
とが一般であった。これは、アンチモンドープ酸化錫微
粉末の含有量を、それとシリコンアルコキシド(SiO
2 換算)との混合物の全重量に対し80重量%以上にす
ると、アンチモンドープ酸化錫微粉末の分散度が低下
し、均一な塗布層を形成し得なくなるからである。In the conventional antistatic coating composition containing silicon alkoxide, the content of the antimony-doped tin oxide fine powder is the same as that of silicon alkoxide (SiO 2).
It was generally less than 80% by weight based on the total weight (converted to 2 ). This is because the content of antimony-doped tin oxide fine powder and that of silicon alkoxide (SiO 2
This is because if the amount is 80% by weight or more based on the total weight of the mixture with ( 2 conversion), the dispersibility of the antimony-doped tin oxide fine powder is reduced and a uniform coating layer cannot be formed.
【0014】しかし、本発明においては、シリコーンオ
イルを用いることによって、塗料中に80重量%以上の
含有率でアンチモンドープ酸化錫微粉末を含有させるこ
とが可能になった。このため、本発明の塗料を用いて得
られる帯電防止・高屈折率膜層は、極めてすぐれた帯電
防止効果、および電磁波遮蔽効果を示すばかりでなく、
n=1.55〜2.0という高い屈折率を具有すること
が可能になったのである。従って、その上に形成される
低屈折率膜層の屈折率(一般にn=1.45以下)と、
この帯電防止・高屈折率膜層の屈折率との差を0.1以
上、好ましくは0.15以上にすることが可能になり、
このため、本発明により得られる帯電防止・高屈折率膜
層と低屈折率膜層との組み合せは、すぐれた反射防止性
を示すのである。However, in the present invention, the use of silicone oil has made it possible to incorporate antimony-doped tin oxide fine powder into the coating material at a content of 80% by weight or more. Therefore, the antistatic / high refractive index film layer obtained using the coating composition of the present invention not only exhibits extremely excellent antistatic effect and electromagnetic wave shielding effect,
It is possible to have a high refractive index of n = 1.55 to 2.0. Therefore, the refractive index (generally n = 1.45 or less) of the low refractive index film layer formed thereon,
It is possible to make the difference from the refractive index of the antistatic / high refractive index film layer 0.1 or more, preferably 0.15 or more,
Therefore, the combination of the antistatic / high refractive index film layer and the low refractive index film layer obtained by the present invention exhibits excellent antireflection property.
【0015】すなわち、低屈折率膜層表面からの反射光
を、高屈折率を有する帯電防止・高屈折率膜層と、低屈
折率膜層との界面からの反射光の干渉によって打ち消す
ことができ、それによって、反射防止効果を従来以上に
高めることができる。本発明に用いられるアンチモンド
ープ酸化錫微粉末において、酸化錫は、気相法、CVD
法、水熱法および炭酸塩法などのいづれの既知方法によ
って製造されたものであってもよい。また、その微粒子
の形状にも格別の制限はなく、球状、針状、板状、およ
び鎖状などのいづれであってもよい。That is, the reflected light from the surface of the low refractive index film layer can be canceled by the interference of the reflected light from the interface between the antistatic / high refractive index film layer having a high refractive index and the low refractive index film layer. Therefore, the antireflection effect can be enhanced more than ever before. In the antimony-doped tin oxide fine powder used in the present invention, tin oxide can be obtained by vapor phase method, CVD
Method, hydrothermal method, carbonate method and the like may be used. The shape of the fine particles is not particularly limited, and may be spherical, needle-like, plate-like, chain-like or the like.
【0016】また、酸化錫に対するアンチモンのドープ
方法および、ドープされているアンチモンの量には、格
別の制限はないが、一般に酸化錫の重量に対して1〜5
%であることが好ましい。これによって、酸化錫微粉末
は、その帯電防止効果、電磁波遮蔽効果などを一層増進
させることができる。本発明に用いられるアンチモンド
ープ酸化錫微粉末は、1〜100nmの平均粒径を有する
ものであることが好ましい。この平均粒径が1nm未満で
あると、その通電性が低下し、かつ粒子が凝集しやすく
なり、塗料中において、その均一な分散が困難になり、
塗料の粘度が増大し、この粘度を下げるために多量の分
散溶媒の添加が必要になり、このために塗料中のアンチ
モンドープ酸化錫微粉末の濃度が過度に低くなることが
ある。The method of doping antimony with respect to tin oxide and the amount of antimony doped are not particularly limited, but generally 1 to 5 relative to the weight of tin oxide.
% Is preferable. As a result, the tin oxide fine powder can further enhance its antistatic effect, electromagnetic wave shielding effect, and the like. The antimony-doped tin oxide fine powder used in the present invention preferably has an average particle diameter of 1 to 100 nm. If the average particle size is less than 1 nm, the electrical conductivity is reduced and the particles are easily aggregated, making it difficult to uniformly disperse the particles in the coating.
The viscosity of the coating increases, and it is necessary to add a large amount of a dispersion solvent to reduce the viscosity, which may result in an excessively low concentration of antimony-doped tin oxide fine powder in the coating.
【0017】また、アンチモンドープ酸化錫微粉末の平
均粒径が100nmより大きくなると、得られる帯電防止
・高屈折率膜層において、レイリー散乱によって光が著
しく乱反射され、白く見えるようになって透明度が低下
する。本発明に用いられるシリコーンオイルについて
も、格別の制限はないが、アミノ基、カルボキシル基、
エポキシ基、水酸基、ポリエーテル基、エステル基、お
よびアルコキシ基などから選ばれた少なくとも1種の親
水性基を有し、かつ、水性溶媒によって加水分解しない
オルガノシロキサン化合物から選ばれることが望まし
い。このようなオルガノシロキサン化合物としてはアミ
ノ変性シリコーンオイル、カルボキシ変性シリコーンオ
イル、エポキシ変性シリコーンオイル、水酸基性シリコ
ーンオイル、ポリエーテル変性シリコーンオイル、エス
テル変性シリコーンオイル、およびアルコキシ変性シリ
コーンオイルなどを用いることができる。When the average particle size of the antimony-doped tin oxide fine powder is larger than 100 nm, in the obtained antistatic / high refractive index film layer, light is remarkably diffused due to Rayleigh scattering to make it appear white and its transparency is high. descend. The silicone oil used in the present invention is also not particularly limited, but amino group, carboxyl group,
It is desirable that the organosiloxane compound has at least one hydrophilic group selected from an epoxy group, a hydroxyl group, a polyether group, an ester group, an alkoxy group and the like, and is not hydrolyzed by an aqueous solvent. As such an organosiloxane compound, amino-modified silicone oil, carboxy-modified silicone oil, epoxy-modified silicone oil, hydroxyl group silicone oil, polyether-modified silicone oil, ester-modified silicone oil, and alkoxy-modified silicone oil can be used. ..
【0018】また、溶媒としては、水を用いることが好
ましいが、水と相溶する溶媒が、溶媒全重量に対し、6
0重量以下の添加量で、水に混合されていてもよい。It is preferable to use water as the solvent, but the solvent compatible with water is 6% based on the total weight of the solvent.
It may be mixed with water in an addition amount of 0 weight or less.
【0019】本発明の積層体において、透明基体上に形
成される帯電防止・高屈折率膜層の厚さ又は重量に格別
の制限はないが、一般に0.05〜0.2μmの厚さを
有することが好ましい。本発明の塗料を用いて形成され
た帯電防止・高屈折率膜層の上には、低屈折率膜層が形
成される。低屈折率膜層は、帯電防止・高屈折率膜層表
面における空隙が充填し、乱反射を抑制し、その耐摩擦
性を向上させるのに有効なものである。In the laminate of the present invention, the thickness or weight of the antistatic / high refractive index film layer formed on the transparent substrate is not particularly limited, but is generally 0.05 to 0.2 μm. It is preferable to have. A low refractive index film layer is formed on the antistatic / high refractive index film layer formed using the coating material of the present invention. The low refractive index film layer is effective for filling voids on the surface of the antistatic / high refractive index film layer, suppressing irregular reflection, and improving its abrasion resistance.
【0020】低屈折率膜層は、シリコンアルコキシドを
含む非水溶媒溶液からなる塗料を、帯電防止・高屈折率
膜層上に塗布乾燥し、これに焼付処理を施して形成する
ことができる。上記低屈折率膜層形成用塗料に用いられ
るシリコンアルコキシドは、テトラアルコキシシラン系
化合物、アルキルトリアルコキシシラン系化合物、ジア
ルキルジアルコキシシラン系化合物などから選ぶことが
でき、また非水溶媒は、アルコール系化合物、グリコー
ルエーテル系化合物、エステル系化合物、およびケトン
化合物などから選ぶことができる。これらは単一種で用
いてもよく、2種以上の混合物として用いてもよい。The low-refractive index film layer can be formed by coating and drying a coating material composed of a non-aqueous solvent solution containing a silicon alkoxide on the antistatic / high-refractive index film layer and subjecting it to baking treatment. The silicon alkoxide used in the low refractive index film layer-forming coating material can be selected from tetraalkoxysilane-based compounds, alkyltrialkoxysilane-based compounds, dialkyldialkoxysilane-based compounds, and the non-aqueous solvent is alcohol-based. It can be selected from compounds, glycol ether compounds, ester compounds, ketone compounds and the like. These may be used alone or as a mixture of two or more.
【0021】上記塗料を、帯電防止・高屈折率膜層上に
塗布、乾燥し、これを焼付け処理すると、シリコンアル
コキシド加水分解生成物はシリカとなる。シリカの屈折
率は、n=1.46であり、アンチモンドープ酸化錫の
屈折率よりも低いが、帯電防止・高屈折率膜層と低屈折
率膜層との屈折率差を大きくするためには、シリカより
も屈折率が低く、かつ透明性の高い物質の併用が好まし
い。When the above coating material is applied onto the antistatic / high refractive index film layer, dried and baked, the silicon alkoxide hydrolysis product becomes silica. The refractive index of silica is n = 1.46, which is lower than that of antimony-doped tin oxide, but to increase the difference in refractive index between the antistatic / high refractive index film layer and the low refractive index film layer. Is preferably used in combination with a substance having a lower refractive index than silica and high transparency.
【0022】本発明においては、シリコンアルコキシド
含有塗料中に、フッ化マグネシウム(n=1.38)微
粉末が更に含まれていることが好ましい。低屈折率膜層
中のフッ化マグネシウム微粉末の含有率には、格別の制
限はなく、対応する帯電防止・高屈折率膜層の組成に応
じて適宜に対応することができるが、一般にはシリコン
アルコキシドの重量(SiO2 換算)に対し0.01〜
50%の範囲内にあることが好ましい。In the present invention, it is preferable that the coating composition containing silicon alkoxide further contains fine powder of magnesium fluoride (n = 1.38). There is no particular limitation on the content of the magnesium fluoride fine powder in the low refractive index film layer, and it can be appropriately handled depending on the composition of the corresponding antistatic / high refractive index film layer, but in general, 0.01 to the weight of silicon alkoxide (converted to SiO 2 )
It is preferably in the range of 50%.
【0023】低屈折率膜層の形成に用いられるフッ化マ
グネシウム微粉末は、1〜100nmの平均粒径を有して
いることが好ましい。この平均粒径が100nmより大き
くなると、得られる低屈折率膜層において、レイリー数
乱によって光が乱反射され、低屈折率膜層が白っぽく見
え、その透明性が低下することがあり、また、それが1
nm未満であると微粉子が凝集しやすく、従って塗料中に
おける微粉子の均一分散が困難になり、塗料の粘度が過
大になるなどの問題を生ずる。また、塗料の粘度を低下
させるために、溶媒の使用量を増大すると、塗料中のフ
ッ化マグネシウム微粉末およびシリコンアルコキシドの
濃度が低下するという問題を生ずる。The magnesium fluoride fine powder used for forming the low refractive index film layer preferably has an average particle diameter of 1 to 100 nm. If the average particle size is larger than 100 nm, in the resulting low refractive index film layer, light may be diffusely reflected by Rayleigh number scattering, the low refractive index film layer may appear whitish, and its transparency may deteriorate. Is 1
If it is less than nm, the fine particles are likely to coagulate, so that it becomes difficult to uniformly disperse the fine particles in the coating material, resulting in problems such as an excessive viscosity of the coating material. In addition, when the amount of the solvent used is increased in order to reduce the viscosity of the coating material, there arises a problem that the concentrations of the magnesium fluoride fine powder and the silicon alkoxide in the coating material are reduced.
【0024】本発明に使用されるフッ化マグネシウム微
粉末は、気相法(当該化合物をガス化し、これを気相で
冷却し固化する)、CVD法(成分元素をガス化し、気
相においてこれらを反応させ、生成物を冷却固化す
る)、炭酸塩(又はシュウ酸塩)法(当該金属元素の炭
酸塩、又はシュウ酸塩から気相中で変成し、冷却固化す
る)などの既知方法によって製造することができる。ま
た、成分元素の弗化物の水溶液と塩基性化合物の水溶液
とを混合反応させ、目的化合物の超微粒子ゾルを製造す
る酸アルカリ法、又は、それから溶媒を除去する水熱法
などもフッ化マグネシウム微粉末の製造に用いることが
できる。上記水熱法において、微粒子の成長、球状化、
又は表面改質をすることができる。また、その微粒子の
形状は、球状、針状、板状、および鎖状などのいづれで
あってもよい。The magnesium fluoride fine powder used in the present invention can be produced by a gas phase method (gasifying the compound, cooling this in the gas phase to solidify), a CVD method (gasifying the component elements, and And the product is cooled and solidified), a carbonate (or oxalate) method (a carbonate of the metal element or an oxalate is transformed in a gas phase, and solidified by cooling) by a known method. It can be manufactured. In addition, an acid-alkali method of producing an ultrafine particle sol of a target compound by mixing and reacting an aqueous solution of a fluoride of a component element with an aqueous solution of a basic compound, or a hydrothermal method of removing a solvent therefrom is a method of producing magnesium fluoride fine particles. It can be used for the production of powders. In the above hydrothermal method, growth of fine particles, spheroidization,
Alternatively, the surface can be modified. The shape of the fine particles may be any of spherical, needle-like, plate-like, chain-like and the like.
【0025】本発明において、低屈折率膜層の厚さに格
別の制限はないが、0.05〜0.2nmの厚さを有する
ことが好ましい。上記の範囲の厚さを有する低屈折率膜
層は、比較的薄いものであるので、これが帯電防止・高
屈折率膜層上を被覆していても、帯電防止・高屈折率膜
層の導電性により、全体として実用上十分な帯電防止性
および電磁波遮蔽性を示すことができる。In the present invention, the thickness of the low refractive index film layer is not particularly limited, but it is preferably 0.05 to 0.2 nm. Since the low refractive index film layer having a thickness in the above range is relatively thin, even if it covers the antistatic / high refractive index film layer, the conductivity of the antistatic / high refractive index film layer is reduced. Due to the property, it is possible to exhibit a practically sufficient antistatic property and electromagnetic wave shielding property as a whole.
【0026】本発明に用いられる透明基体は、ガラス材
料、およびプラスチック材料などから選ぶことができ
る。また、本発明に用いられる着色料は、従来当該材料
および塗料に用いられているものから適宜に選択するこ
とができる。The transparent substrate used in the present invention can be selected from glass materials, plastic materials and the like. Further, the colorant used in the present invention can be appropriately selected from those conventionally used for the material and the coating material.
【0027】[0027]
【実施例】下記実施例により本発明を更に説明する。The present invention will be further described with reference to the following examples.
【0028】実施例1 (1)帯電防止・高屈折率膜層形成用塗料(A)を、下
記のようにして調製した。すわなち2.8gのアンチモ
ンドープ酸化錫微粉末(住友セメント社製、粒径:5〜
10nm)と、0.3g(SiO2 換算)のポリエーテル
変成シリコーンオイル(シリコーン界面活性剤、商標:
L−77、日本ユニカー社製)とを、196.4gの水
に混合し、この混合物を攪拌して、均一な分散液とし
た。 Example 1 (1) A coating material (A) for forming an antistatic / high refractive index film layer was prepared as follows. That is, 2.8 g of antimony-doped tin oxide fine powder (Sumitomo Cement Co., Ltd., particle size: 5
10 nm) and 0.3 g (converted to SiO 2 ) of polyether-modified silicone oil (silicone surfactant, trademark:
L-77, manufactured by Nippon Unicar Co., Ltd.) was mixed with 196.4 g of water, and the mixture was stirred to form a uniform dispersion liquid.
【0029】(2)低屈折率膜層形成用塗料(a)を下
記の操作によって調製した。すなわち、0.8gのテト
ラエトキシシランと、0.8gの0.1N塩酸と、9
9.2gのエチルアルコールとを混合して、均一な溶液
とした。 (3)積層体の製造 ガラス基板の1面上に40℃の温度において、前記塗料
(A)をスピンコート法により塗布し、50℃の温風に
より3分間乾燥した。0.1μmの厚さを有する帯電防
止・高屈折率膜層が形成された。次に、このガラス基板
の帯電防止・高屈折率膜層上に、40℃の温度におい
て、塗料(a)をスピンコート法により塗布し、50℃
の温風により乾燥し、これに150℃、20分間の焼付
処理を施して、厚さ0.1μmの低屈折率膜層を形成し
た。(2) A coating material (a) for forming a low refractive index film layer was prepared by the following procedure. That is, 0.8 g of tetraethoxysilane, 0.8 g of 0.1N hydrochloric acid, and 9
A uniform solution was prepared by mixing with 9.2 g of ethyl alcohol. (3) Manufacture of Laminated Body The above coating material (A) was applied onto one surface of a glass substrate at a temperature of 40 ° C. by a spin coating method, and dried with warm air of 50 ° C. for 3 minutes. An antistatic high refractive index film layer having a thickness of 0.1 μm was formed. Next, the coating material (a) was applied on the antistatic / high-refractive index film layer of this glass substrate at a temperature of 40 ° C. by a spin coating method, and the temperature was increased to 50 ° C.
Was dried with warm air and baked at 150 ° C. for 20 minutes to form a low refractive index film layer having a thickness of 0.1 μm.
【0030】(4)テスト 上記のようにして得られた透明材料積層体の表面抵抗率
(表面抵抗計による)、表面反射率(入射角5度の正反
射治具を用い分光光度計により波長550nmの光反射率
の片面値を測定した。)および、帯電防止・高屈折率膜
層と、低屈折率膜層との密着性(消しゴムテスト、荷重
1kg、50回往復)を測定した。テスト結果を表1に示
す。(4) Test Surface resistivity (by surface resistance meter) and surface reflectance (wavelength by spectrophotometer using specular reflection jig with incident angle of 5 degrees) of the transparent material laminate obtained as described above. The single-sided value of the light reflectance at 550 nm was measured.) And the adhesion between the antistatic / high refractive index film layer and the low refractive index film layer (eraser test, load 1 kg, 50 times reciprocation) was measured. The test results are shown in Table 1.
【0031】実施例2 実施例1と同じ操作を行った。但し、低屈折率膜層形成
用塗料(a)の代りに下記のようにして調製した塗料
(b)を用いた。すなわち0.4gのフッ化マグネシウ
ム微粉末(住友セメント社製、粒径:10〜20nm)を
0.6gのテトラエトキシシラン、10gの水、0.6
gの0.1N塩酸、および89gのエチルアルコールに
混合し、均一に分散した。テスト結果を表1に示す。 Example 2 The same operation as in Example 1 was performed. However, instead of the low refractive index film layer-forming coating material (a), the coating material (b) prepared as described below was used. That is, 0.4 g of magnesium fluoride fine powder (Sumitomo Cement Co., Ltd., particle size: 10 to 20 nm) was added to 0.6 g of tetraethoxysilane, 10 g of water, 0.6
g 0.1 N hydrochloric acid and 89 g ethyl alcohol were mixed and uniformly dispersed. The test results are shown in Table 1.
【0032】実施例3 実施例1と同じ操作を行なった。但し、前記低屈折率膜
形成用塗料(a)の代りに下記のようにして調製した塗
料(c)を用いた。すなわち、特定波長選択吸収・低屈
折率膜層形成用塗料(c)を下記の様に調整した。0.
8gのテトラエトキシシランと0.8gの0.1N塩酸
とを98.9gのエチルアルコールに混合した後、着色
剤(中外化成社製、Chganol Violet3BN 33%と、Acid
Green V conc.5%と、日本化薬社製、Kayanol Millin
g Red 6BW 52%と、中央合成化学社製、Neo Super Bl
ue C-551 10%との混合物)0.3gを添加し、これ
に攪拌を施して均一な溶液とした。 テスト結果を表1
に示す。 Example 3 The same operation as in Example 1 was performed. However, instead of the low refractive index film-forming coating material (a), the coating material (c) prepared as described below was used. That is, the specific wavelength selective absorption / low refractive index film layer forming coating material (c) was prepared as follows. 0.
After mixing 8 g of tetraethoxysilane and 0.8 g of 0.1N hydrochloric acid with 98.9 g of ethyl alcohol, a coloring agent (Chganol Violet3BN 33% manufactured by Chugai Kasei Co., Ltd., Acid
Green V conc. 5% and Kayanol Millin manufactured by Nippon Kayaku Co., Ltd.
g Red 6BW 52% and Neo Super Bl manufactured by Chuo Gosei Kagaku KK
ue C-551 10% mixture) 0.3 g was added and stirred to give a uniform solution. Table 1 shows the test results
Shown in.
【0033】比較例1 実施例1と同一の操作を行った。但し、前記帯電防止・
高屈折率膜層形成用塗料(A)の代りに、下記のように
調製した塗料(B)を用いた。すなわち1gのアンチモ
ンドープ酸化錫(粒径5〜10nm)を、1.68gのテ
トラエトキシシラン、4.1gの0.1N塩酸、および
143gのエチルアルコールに混合し、均一に分散し
た。テスト結果を表1に示す。 Comparative Example 1 The same operation as in Example 1 was performed. However, the antistatic
Instead of the high refractive index film layer-forming coating material (A), the coating material (B) prepared as described below was used. That is, 1 g of antimony-doped tin oxide (particle size 5 to 10 nm) was mixed with 1.68 g of tetraethoxysilane, 4.1 g of 0.1N hydrochloric acid, and 143 g of ethyl alcohol, and uniformly dispersed. The test results are shown in Table 1.
【0034】比較例2 実施例1と同一の操作を行なった。但し、前記帯電防止
・高屈折率膜層形成用塗料(A)の代りに、下記のよう
にして調整した塗料(C)を用いた。すなわち、2gの
アンチモンドープ酸化錫(粒径5〜10nm)を、1.1
gのシリコーンオイルおよび196.4gの水に混合
し、均一に分散した。テスト結果を表1に示す。 Comparative Example 2 The same operation as in Example 1 was performed. However, instead of the antistatic / high refractive index film layer-forming coating material (A), a coating material (C) prepared as follows was used. That is, 2 g of antimony-doped tin oxide (particle size 5 to 10 nm) was added to 1.1
g of silicone oil and 196.4 g of water were mixed and uniformly dispersed. The test results are shown in Table 1.
【0035】[0035]
【表1】 [Table 1]
【0036】[0036]
【発明の効果】本発明に係る帯電防止・高屈折率膜形成
用塗料は透明基体上に、帯電防止性にすぐれ屈折率が高
く、かつ低屈折率膜層に対して密着性のすぐれた膜層
を、水を溶媒として用いて、容易に、かつ安価に形成す
ることを可能にするものであって、特に、これを用いて
得られた帯電防止・高屈折率膜層に低屈折率膜層を組み
合わせることによって、実用的性能のすぐれた帯電防止
・高屈折率膜付き透明材料積層体の提供が可能になっ
た。The coating composition for forming an antistatic / high refractive index film according to the present invention is a film having excellent antistatic property, high refractive index, and excellent adhesion to a low refractive index film layer on a transparent substrate. A layer that can be easily and inexpensively formed by using water as a solvent, and in particular, an antistatic / high refractive index film layer obtained by using the low refractive index film is obtained. By combining the layers, it is possible to provide a transparent material laminate with an antistatic and high refractive index film, which has excellent practical performance.
フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 FI 技術表示箇所 C09D 5/00 PPT PSD 6904−4J 183/04 PMT 8319−4J // C08L 83:00 Continuation of the front page (51) Int.Cl. 5 Identification number Office reference number FI technical display location C09D 5/00 PPT PSD 6904-4J 183/04 PMT 8319-4J // C08L 83:00
Claims (10)
とシリコーンオイルとの混合物を含む水性分散液からな
る帯電防止・高屈折率膜形成用塗料。1. An antistatic coating for forming a high refractive index film, which comprises an aqueous dispersion containing a mixture of antimony-doped tin oxide fine powder and silicone oil.
アンチモンドープ酸化錫微粉末と、SiO2 に換算して
0.01〜20重量部のシリコーンオイルとからなる、
請求項1に記載の塗料。2. The mixture is composed of 80 to 99.99 parts by weight of antimony-doped tin oxide fine powder and 0.01 to 20 parts by weight of silicone oil in terms of SiO 2 .
The paint according to claim 1.
〜100nmの平均粒径を有する、請求項1に記載の塗
料。3. The antimony-doped tin oxide fine powder is 1
The coating composition of claim 1 having an average particle size of -100 nm.
ルボキシル基、エポキシ基、水酸基、ポリエーテル基、
エステル基、およびアルコキシ基から選ばれた少なくと
も1種を有するオルガノシロキサン化合物から選ばれ
る、請求項1に記載の塗料。4. The silicone oil comprises an amino group, a carboxyl group, an epoxy group, a hydroxyl group, a polyether group,
The coating material according to claim 1, which is selected from organosiloxane compounds having at least one selected from an ester group and an alkoxy group.
色剤が、更に含まれている、請求項、1,2,3および
4のいづれか1項に記載の塗料。5. The paint according to claim 1, further comprising a colorant having an absorption center wavelength near 600 nm.
アンチモンドープ酸化錫の微粉末と、シリコーンオイル
との混合物を含む水性分散液からなる塗料を塗布し乾燥
して形成された帯電防止・高屈折率膜層と、この帯電防
止・高屈折率膜層の上に形成され、かつその屈折率より
も0.1以上低い屈折率を有する低屈折率膜層とを含ん
でなる帯電防止・反射防止膜付き透明材料積層体。6. A transparent substrate and a surface of the transparent substrate,
Antistatic / high refractive index film layer formed by applying and drying a paint consisting of an aqueous dispersion containing a mixture of antimony-doped tin oxide fine powder and silicone oil, and this antistatic / high refractive index film layer A transparent material laminated body with an antistatic / antireflection film, which comprises a low refractive index film layer formed on the above and having a refractive index lower than the refractive index by 0.1 or more.
シドと非水溶媒とを含む塗料を前記帯電防止・高屈折率
膜層上に塗布乾燥し、これに焼付処理を施して形成され
たものである、請求項5に記載の透明材料積層体。7. The low-refractive index film layer is formed by applying a coating material containing a silicon alkoxide and a non-aqueous solvent on the antistatic / high-refractive index film layer, drying the coating, and baking the coating. The transparent material laminate according to claim 5, wherein
有塗料が更にフッ化マグネシウム微粉末を分散含有して
いる、請求項6に記載の透明材料積層体。8. The transparent material laminate according to claim 6, wherein the coating material containing a silicon alkoxide-non-aqueous solvent further contains fine particles of magnesium fluoride dispersed therein.
00nmの平均粒径を有する、請求項7に記載の透明材料
積層体。9. The magnesium fluoride fine powder is 1 to 1
The transparent material laminate according to claim 7, which has an average particle diameter of 00 nm.
着色剤により着色されて、それによってフィルター機能
を有する、請求項6,7,8および9のいづれか1項に
記載の透明材料積層体。10. The transparent material laminate according to any one of claims 6, 7, 8 and 9, which is colored with a coloring agent having an absorption center wavelength near 600 nm and thereby has a filter function.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4088702A JP2865474B2 (en) | 1991-07-11 | 1992-04-09 | Paint for forming antistatic / high refractive index film, transparent material laminate with antistatic / antireflective film, and display device |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17129491 | 1991-07-11 | ||
JP3-171294 | 1991-07-11 | ||
JP4088702A JP2865474B2 (en) | 1991-07-11 | 1992-04-09 | Paint for forming antistatic / high refractive index film, transparent material laminate with antistatic / antireflective film, and display device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH05117552A true JPH05117552A (en) | 1993-05-14 |
JP2865474B2 JP2865474B2 (en) | 1999-03-08 |
Family
ID=26430049
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4088702A Expired - Fee Related JP2865474B2 (en) | 1991-07-11 | 1992-04-09 | Paint for forming antistatic / high refractive index film, transparent material laminate with antistatic / antireflective film, and display device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2865474B2 (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2000034396A1 (en) * | 1998-12-09 | 2000-06-15 | Nippon Kayaku Kabushiki Kaisha | Hard coating material and film obtained with the same |
JP2001021701A (en) * | 1999-07-09 | 2001-01-26 | Sumitomo Osaka Cement Co Ltd | Transparent film with electrification and reflection prevention film |
US6208389B1 (en) * | 1993-10-18 | 2001-03-27 | U.S. Philips Corporation | Display device comprising a display screen having an antistatic and light-absorbing coating |
JP2005338549A (en) * | 2004-05-28 | 2005-12-08 | Konica Minolta Opto Inc | Antireflection film, polarizing plate, and image display device |
JP2012001723A (en) * | 2011-07-26 | 2012-01-05 | Ishihara Sangyo Kaisha Ltd | Method for producing conductive coating material and method for forming conductive coating using the conductive coating material |
CN106366732A (en) * | 2016-08-31 | 2017-02-01 | 江苏联创人造草坪股份有限公司 | Anti-icing artificial turf and production method thereof |
-
1992
- 1992-04-09 JP JP4088702A patent/JP2865474B2/en not_active Expired - Fee Related
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6208389B1 (en) * | 1993-10-18 | 2001-03-27 | U.S. Philips Corporation | Display device comprising a display screen having an antistatic and light-absorbing coating |
WO2000034396A1 (en) * | 1998-12-09 | 2000-06-15 | Nippon Kayaku Kabushiki Kaisha | Hard coating material and film obtained with the same |
US6713170B1 (en) | 1998-12-09 | 2004-03-30 | Nippon Kayaku Kabushiki Kaisha | Hard coating material and film comprising the same |
JP2001021701A (en) * | 1999-07-09 | 2001-01-26 | Sumitomo Osaka Cement Co Ltd | Transparent film with electrification and reflection prevention film |
JP2005338549A (en) * | 2004-05-28 | 2005-12-08 | Konica Minolta Opto Inc | Antireflection film, polarizing plate, and image display device |
JP2012001723A (en) * | 2011-07-26 | 2012-01-05 | Ishihara Sangyo Kaisha Ltd | Method for producing conductive coating material and method for forming conductive coating using the conductive coating material |
CN106366732A (en) * | 2016-08-31 | 2017-02-01 | 江苏联创人造草坪股份有限公司 | Anti-icing artificial turf and production method thereof |
Also Published As
Publication number | Publication date |
---|---|
JP2865474B2 (en) | 1999-03-08 |
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