JPH04369822A - Equipment with turbulent air preventing attachment - Google Patents
Equipment with turbulent air preventing attachmentInfo
- Publication number
- JPH04369822A JPH04369822A JP14720691A JP14720691A JPH04369822A JP H04369822 A JPH04369822 A JP H04369822A JP 14720691 A JP14720691 A JP 14720691A JP 14720691 A JP14720691 A JP 14720691A JP H04369822 A JPH04369822 A JP H04369822A
- Authority
- JP
- Japan
- Prior art keywords
- dryer
- equipment
- turbulence
- clean room
- turbulent air
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000002265 prevention Effects 0.000 claims description 7
- 230000001154 acute effect Effects 0.000 claims description 6
- 238000001035 drying Methods 0.000 abstract 3
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 description 13
- 239000010419 fine particle Substances 0.000 description 10
- 239000000428 dust Substances 0.000 description 8
- 238000000034 method Methods 0.000 description 6
- 229920002120 photoresistant polymer Polymers 0.000 description 6
- 238000000206 photolithography Methods 0.000 description 4
- 230000003749 cleanliness Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Landscapes
- Ventilation (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】この発明は、気流を一定方向に流
すクリーンルーム内で使用される機器に関するものであ
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to equipment used in a clean room that allows air to flow in a fixed direction.
【0002】0002
【従来の技術】図2は従来の乾燥機の一例を模式的に示
す正面図であり、図において1はクリーンルーム内で使
用される乾燥機であり、この乾燥機1はその辺および隅
がほぼ直角に形成されている。2はクリーンルーム内の
空気の気流、2aは気流2の乱気流である渦である。2. Description of the Related Art FIG. 2 is a front view schematically showing an example of a conventional dryer. In the figure, 1 is a dryer used in a clean room, and the sides and corners of this dryer 1 are approximately formed at right angles. 2 is the airflow in the clean room, and 2a is a vortex which is the turbulence of the airflow 2.
【0003】つぎに、クリーンルーム内での上記従来の
乾燥機1の使用状態について説明する。クリーンルーム
(図示せず)は、温度、湿度の調整された空気を天井か
ら室内に強制的に送り込み、床から回収して循環させる
もので(全面ダウンフロー方式)、この気流中に含まれ
る塵埃をフィルターを通して除去し、室内の清浄度を高
めており、作業者は防塵着を着用して室内の清浄度を維
持している。乾燥機1はクリーンルーム内に配置され、
半導体素子のフォトリソ工程において、フォトレジスト
が塗布された半導体素子を収納し、このフォトレジスト
をプレベークする。プレベークされた半導体素子は、露
光工程に送られる。Next, the usage condition of the conventional dryer 1 in a clean room will be explained. In a clean room (not shown), air whose temperature and humidity have been adjusted is forced into the room from the ceiling, collected from the floor, and circulated (full-scale downflow system), which removes dust contained in this airflow. The dust is removed through a filter to improve the cleanliness of the room, and workers wear dust-proof clothing to maintain the cleanliness of the room. Dryer 1 is placed in a clean room,
In a photolithography process for semiconductor devices, a semiconductor device coated with a photoresist is stored, and the photoresist is prebaked. The prebaked semiconductor device is sent to an exposure process.
【0004】ここで、クリーンルームの天井から強制的
に送り込まれた空気の気流2は、乾燥機1に当たり、乾
燥機1の壁面に沿って流れ、鋭角部分で渦2aを発生し
ている。この気流2の渦2aにより、ゴミ等の微粒子が
浮遊され、乾燥機1への半導体素子の出し入れの際に、
微粒子が半導体素子上のフォトレジストに付着してしま
い、このフォトレジストに付着した微粒子は露光工程に
おいて欠陥の発生の原因となる。[0004] Here, the airflow 2 forcibly introduced from the ceiling of the clean room hits the dryer 1, flows along the wall surface of the dryer 1, and generates a vortex 2a at an acute angle portion. The vortex 2a of this airflow 2 suspends fine particles such as dust, and when semiconductor devices are put in and taken out of the dryer 1,
The fine particles adhere to the photoresist on the semiconductor element, and the fine particles attached to the photoresist cause defects in the exposure process.
【0005】[0005]
【発明が解決しようとする課題】従来の乾燥機1は以上
のように、辺および隅が鋭角に形成されていたので、一
定方向に流れる気流2が乾燥機1の周辺で渦2aを発生
し、ゴミ等の微粒子を浮遊させ、半導体素子上に付着し
、半導体素子の歩留まりを低下させるという課題があっ
た。[Problems to be Solved by the Invention] As described above, since the sides and corners of the conventional dryer 1 are formed at acute angles, the airflow 2 flowing in a certain direction generates a vortex 2a around the dryer 1. There is a problem in that fine particles such as dust are suspended and adhere to semiconductor devices, reducing the yield of semiconductor devices.
【0006】この発明は、上記のような課題を解決する
ためになされたもので、一定方向に流れる気流中で使用
しても機器周辺の気流の渦をなくし、ゴミ等の微粒子の
浮遊を低減し、製品の歩留まりを向上させる機器を得る
ことを目的とする。[0006] This invention was made in order to solve the above-mentioned problems, and even when the device is used in an air current flowing in a fixed direction, it eliminates the vortex of the air current around the device and reduces the floating of fine particles such as dust. The aim is to obtain equipment that improves product yield.
【0007】[0007]
【課題を解決するための手段】この発明に係る乱気流防
止具付設機器は、機器の鋭角部分で発生する乱気流を防
止する乱気流防止具を具備したものである。[Means for Solving the Problems] A device equipped with a turbulence prevention device according to the present invention is equipped with a turbulence prevention device that prevents turbulence generated at an acute angle portion of the device.
【0008】[0008]
【作用】この発明においては、機器に取り付けられた乱
気流防止具が、機器周辺の気流の流れをスムーズな流れ
とし、機器の鋭角部分での乱気流の発生を防止し、微粒
子の浮遊を低減する。[Operation] In this invention, the turbulence prevention device attached to the equipment smoothes the flow of air around the equipment, prevents the occurrence of turbulence at acute angle parts of the equipment, and reduces the suspension of fine particles.
【0009】[0009]
【実施例】以下、この発明の実施例を図について説明す
る。
実施例1.図1はこの発明の一実施例を模式的に示す正
面図であり、図において3は乱気流防止具としての乱気
流除去キャップである。DESCRIPTION OF THE PREFERRED EMBODIMENTS Examples of the present invention will be described below with reference to the drawings. Example 1. FIG. 1 is a front view schematically showing an embodiment of the present invention, and in the figure, reference numeral 3 indicates a turbulence removing cap as a turbulence prevention device.
【0010】つぎに、図1に示したこの発明の一実施例
の動作について説明する。乾燥機1には、乱気流除去キ
ャップ3が取り付けられ、乾燥機1の辺および隅の鋭角
部分にまるみをもたせている。クリーンルーム内に設置
した乾燥機1に当たった気流2は、乱気流除去キャップ
3でスムーズに流れ、乾燥機1の周囲で渦2aの発生を
防止している。このように、上記実施例では、乾燥機1
の周辺で渦2aの発生を防止しているので、ゴミ等の微
粒子の浮遊が低減でき、乾燥機1への半導体素子の出し
入れの際に半導体素子上に微粒子が付着せず、フォトリ
ソ工程における歩留まりを大きく向上できる。Next, the operation of the embodiment of the present invention shown in FIG. 1 will be explained. A turbulence removing cap 3 is attached to the dryer 1, and the sides and acute corners of the dryer 1 are rounded off. The airflow 2 hitting the dryer 1 installed in the clean room flows smoothly through the turbulence removal cap 3, thereby preventing the generation of vortices 2a around the dryer 1. In this way, in the above embodiment, the dryer 1
Since the generation of vortices 2a around the dryer 1 is prevented, the floating of fine particles such as dust can be reduced, and fine particles do not adhere to the semiconductor elements when they are taken in and out of the dryer 1, thereby increasing the yield in the photolithography process. can be greatly improved.
【0011】実施例2.上記実施例1では、フォトリソ
工程において、半導体素子に塗布されたフォトレジスト
をプレベークする乾燥機1に乱気流除去キャップ3を取
り付けているが、この実施例2では、半導体素子上に薄
膜を形成する縦型のCVD装置に乱気流除去キャップ3
を取り付けるものとし、乱気流除去キャップ3により気
流2の渦2aの発生を防止し、CVD装置への半導体素
子の出し入れの際に、半導体素子上へのゴミ等の微粒子
の付着を防止し、半導体素子上に形成される薄膜の膜欠
陥を低減している。Example 2. In the first embodiment, the turbulence removal cap 3 is attached to the dryer 1 that pre-bakes the photoresist applied to the semiconductor element in the photolithography process, but in the second embodiment, the turbulence removal cap 3 is attached to the dryer 1 that pre-bakes the photoresist applied to the semiconductor element in the photolithography process. Turbulence removal cap 3 for type CVD equipment
The turbulence removal cap 3 prevents the generation of vortices 2a in the airflow 2, prevents the adhesion of fine particles such as dust to the semiconductor elements when loading and unloading the semiconductor elements into the CVD apparatus, and prevents the semiconductor elements from being attached. This reduces film defects in the thin film formed on top.
【0012】なお、上記各実施例では、クリーンルーム
内で使用される乱気流防止具付設機器として、乾燥機1
およびCVD装置を用いて説明しているが、この発明は
これらに限定されるものではない。[0012] In each of the above embodiments, the dryer 1 is used as a device equipped with a turbulence prevention device used in a clean room.
Although the present invention is explained using a CVD apparatus and a CVD apparatus, the present invention is not limited thereto.
【0013】[0013]
【発明の効果】以上のようにこの発明によれば、機器に
乱気流防止具を取り付けたので、一定方向に流れる気流
中で使用しても機器周辺の気流の渦をなくし、ゴミ等の
微粒子の浮遊を低減し、製品の歩留まりを向上させる機
器が得られる効果がある。As described above, according to the present invention, since the turbulence prevention device is attached to the device, even when the device is used in an airflow flowing in a certain direction, the vortex of the airflow around the device can be eliminated, and fine particles such as dust can be prevented. This has the effect of providing equipment that reduces floating and improves product yield.
【図1】この発明の一実施例を模式的に示す正面図であ
る。FIG. 1 is a front view schematically showing an embodiment of the present invention.
【図2】従来の乾燥機を模式的に示す正面図である。FIG. 2 is a front view schematically showing a conventional dryer.
【符号の説明】 1 乾燥機 2 気流 2a 渦[Explanation of symbols] 1 Dryer 2 Airflow 2a vortex
Claims (1)
内で使用される機器において、前記機器の鋭角部分で発
生する乱気流を防止するために乱気流防止具を具備した
ことを特徴とする定方向気流中で使用される乱気流防止
具付設機器。1. A device used in a clean room where airflow flows in a fixed direction, characterized in that the device is equipped with a turbulence preventer to prevent turbulence occurring at an acute angle portion of the device. Turbulence prevention equipment used.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14720691A JPH04369822A (en) | 1991-06-19 | 1991-06-19 | Equipment with turbulent air preventing attachment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14720691A JPH04369822A (en) | 1991-06-19 | 1991-06-19 | Equipment with turbulent air preventing attachment |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04369822A true JPH04369822A (en) | 1992-12-22 |
Family
ID=15424967
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14720691A Pending JPH04369822A (en) | 1991-06-19 | 1991-06-19 | Equipment with turbulent air preventing attachment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04369822A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0972587A (en) * | 1995-09-08 | 1997-03-18 | Shin Nippon Kucho Kk | Air stream control structure in clean room |
JP2021058714A (en) * | 2014-09-08 | 2021-04-15 | ベクトン・ディキンソン・アンド・カンパニーBecton, Dickinson And Company | Enclosure aerodynamically made to be in streamline shape for input device of medicine preparation system |
-
1991
- 1991-06-19 JP JP14720691A patent/JPH04369822A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0972587A (en) * | 1995-09-08 | 1997-03-18 | Shin Nippon Kucho Kk | Air stream control structure in clean room |
JP2021058714A (en) * | 2014-09-08 | 2021-04-15 | ベクトン・ディキンソン・アンド・カンパニーBecton, Dickinson And Company | Enclosure aerodynamically made to be in streamline shape for input device of medicine preparation system |
US11341641B2 (en) | 2014-09-08 | 2022-05-24 | Becton, Dickinson And Company | Aerodynamically streamlined enclosure for input devices of a medication preparation system |
JP2022107051A (en) * | 2014-09-08 | 2022-07-20 | ベクトン・ディキンソン・アンド・カンパニー | Aerodynamically streamlined enclosure for input devices in drug formulation systems |
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