JPH04353406A - Mold for plastics - Google Patents
Mold for plasticsInfo
- Publication number
- JPH04353406A JPH04353406A JP12747291A JP12747291A JPH04353406A JP H04353406 A JPH04353406 A JP H04353406A JP 12747291 A JP12747291 A JP 12747291A JP 12747291 A JP12747291 A JP 12747291A JP H04353406 A JPH04353406 A JP H04353406A
- Authority
- JP
- Japan
- Prior art keywords
- mold
- fluorine
- group
- graft polymer
- weight
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 229920003023 plastic Polymers 0.000 title claims abstract description 12
- 239000004033 plastic Substances 0.000 title claims abstract description 12
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims abstract description 22
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 22
- 239000011737 fluorine Substances 0.000 claims abstract description 22
- 229920000578 graft copolymer Polymers 0.000 claims abstract description 17
- 125000003709 fluoroalkyl group Chemical group 0.000 claims abstract description 9
- 125000000524 functional group Chemical group 0.000 claims abstract description 9
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 claims abstract description 9
- 125000005843 halogen group Chemical group 0.000 claims abstract description 6
- 238000010137 moulding (plastic) Methods 0.000 claims description 3
- 239000010409 thin film Substances 0.000 abstract description 5
- 230000007062 hydrolysis Effects 0.000 abstract 1
- 238000006460 hydrolysis reaction Methods 0.000 abstract 1
- 239000000126 substance Substances 0.000 description 16
- 239000000178 monomer Substances 0.000 description 13
- 239000010408 film Substances 0.000 description 12
- 238000000034 method Methods 0.000 description 12
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 230000003287 optical effect Effects 0.000 description 9
- 229920000642 polymer Polymers 0.000 description 9
- 239000006082 mold release agent Substances 0.000 description 8
- 238000000465 moulding Methods 0.000 description 8
- 239000011248 coating agent Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 238000004528 spin coating Methods 0.000 description 6
- 238000000576 coating method Methods 0.000 description 5
- -1 fatty acid ester Chemical class 0.000 description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical group CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- 229920002545 silicone oil Polymers 0.000 description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 230000002411 adverse Effects 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- ZYMKZMDQUPCXRP-UHFFFAOYSA-N fluoro prop-2-enoate Chemical compound FOC(=O)C=C ZYMKZMDQUPCXRP-UHFFFAOYSA-N 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 238000005507 spraying Methods 0.000 description 3
- 229920003002 synthetic resin Polymers 0.000 description 3
- 239000000057 synthetic resin Substances 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- GETTZEONDQJALK-UHFFFAOYSA-N (trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=CC=C1 GETTZEONDQJALK-UHFFFAOYSA-N 0.000 description 2
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 2
- HGINCPLSRVDWNT-UHFFFAOYSA-N Acrolein Chemical compound C=CC=O HGINCPLSRVDWNT-UHFFFAOYSA-N 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000007334 copolymerization reaction Methods 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 2
- 239000011259 mixed solution Substances 0.000 description 2
- 230000005693 optoelectronics Effects 0.000 description 2
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 2
- 239000002861 polymer material Substances 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- PNBJNKCBTJHXEO-UHFFFAOYSA-N (4-ethenylphenyl)-methoxy-dimethylsilane Chemical compound CO[Si](C)(C)C1=CC=C(C=C)C=C1 PNBJNKCBTJHXEO-UHFFFAOYSA-N 0.000 description 1
- LTQBNYCMVZQRSD-UHFFFAOYSA-N (4-ethenylphenyl)-trimethoxysilane Chemical compound CO[Si](OC)(OC)C1=CC=C(C=C)C=C1 LTQBNYCMVZQRSD-UHFFFAOYSA-N 0.000 description 1
- ZBBLRPRYYSJUCZ-GRHBHMESSA-L (z)-but-2-enedioate;dibutyltin(2+) Chemical compound [O-]C(=O)\C=C/C([O-])=O.CCCC[Sn+2]CCCC ZBBLRPRYYSJUCZ-GRHBHMESSA-L 0.000 description 1
- IGGDKDTUCAWDAN-UHFFFAOYSA-N 1-vinylnaphthalene Chemical compound C1=CC=C2C(C=C)=CC=CC2=C1 IGGDKDTUCAWDAN-UHFFFAOYSA-N 0.000 description 1
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 description 1
- MXRGSJAOLKBZLU-UHFFFAOYSA-N 3-ethenylazepan-2-one Chemical compound C=CC1CCCCNC1=O MXRGSJAOLKBZLU-UHFFFAOYSA-N 0.000 description 1
- OZAIFHULBGXAKX-VAWYXSNFSA-N AIBN Substances N#CC(C)(C)\N=N\C(C)(C)C#N OZAIFHULBGXAKX-VAWYXSNFSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- AJTVQQFMXNOEIE-UHFFFAOYSA-N CO[SiH](OC)CC1=CC=C(C=C)C=C1 Chemical compound CO[SiH](OC)CC1=CC=C(C=C)C=C1 AJTVQQFMXNOEIE-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- AHGFXGSMYLFWEC-UHFFFAOYSA-N [SiH4].CC(=C)C(O)=O Chemical compound [SiH4].CC(=C)C(O)=O AHGFXGSMYLFWEC-UHFFFAOYSA-N 0.000 description 1
- MWGMEGAYPPQWFG-UHFFFAOYSA-N [SiH4].OC(=O)C=C Chemical compound [SiH4].OC(=O)C=C MWGMEGAYPPQWFG-UHFFFAOYSA-N 0.000 description 1
- XRHCJXZMVUSFQP-UHFFFAOYSA-K [butan-2-yl-di(dodecanoyloxy)stannyl] dodecanoate Chemical compound C(CCCCCCCCCCC)(=O)[O-].C(CCCCCCCCCCC)(=O)[O-].C(CCCCCCCCCCC)(=O)[O-].CC(CC)[Sn+3] XRHCJXZMVUSFQP-UHFFFAOYSA-K 0.000 description 1
- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 description 1
- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 description 1
- 239000000443 aerosol Substances 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 125000005250 alkyl acrylate group Chemical group 0.000 description 1
- 125000005336 allyloxy group Chemical group 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000002738 chelating agent Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- SUAJWTBTMNHVBZ-UHFFFAOYSA-N clonitrate Chemical compound [O-][N+](=O)OCC(CCl)O[N+]([O-])=O SUAJWTBTMNHVBZ-UHFFFAOYSA-N 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- UNDUWLPONQBXSZ-UHFFFAOYSA-N dimethoxy-methyl-pentylsilane Chemical compound CCCCC[Si](C)(OC)OC UNDUWLPONQBXSZ-UHFFFAOYSA-N 0.000 description 1
- 238000007590 electrostatic spraying Methods 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- XUCNUKMRBVNAPB-UHFFFAOYSA-N fluoroethene Chemical compound FC=C XUCNUKMRBVNAPB-UHFFFAOYSA-N 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- NCHMPORHGFKNSI-UHFFFAOYSA-N methoxy-dimethyl-propylsilane Chemical compound CCC[Si](C)(C)OC NCHMPORHGFKNSI-UHFFFAOYSA-N 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 239000002480 mineral oil Substances 0.000 description 1
- 235000010446 mineral oil Nutrition 0.000 description 1
- DRRZZMBHJXLZRS-UHFFFAOYSA-N n-[3-[dimethoxy(methyl)silyl]propyl]cyclohexanamine Chemical compound CO[Si](C)(OC)CCCNC1CCCCC1 DRRZZMBHJXLZRS-UHFFFAOYSA-N 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 230000001151 other effect Effects 0.000 description 1
- 239000012188 paraffin wax Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 150000003014 phosphoric acid esters Chemical class 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 238000007665 sagging Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- HILHCDFHSDUYNX-UHFFFAOYSA-N trimethoxy(pentyl)silane Chemical compound CCCCC[Si](OC)(OC)OC HILHCDFHSDUYNX-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- 229930195735 unsaturated hydrocarbon Natural products 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- DGVVWUTYPXICAM-UHFFFAOYSA-N β‐Mercaptoethanol Chemical group OCCS DGVVWUTYPXICAM-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Moulds For Moulding Plastics Or The Like (AREA)
- Manufacturing Optical Record Carriers (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は、電気・電子部品、光学
部品等における高分子物質の成型の際に用いられるプラ
スチック成形型に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a plastic mold used for molding polymeric materials for electrical/electronic parts, optical parts, etc.
【0002】0002
【従来の技術】近年、軽量化,高精度化及び生産性等を
向上する上でプラスチックの成型技術はめざましく、特
にオプトエレクトロニクス分野におけるプラスチック成
形技術への要求は多大である。BACKGROUND OF THE INVENTION In recent years, plastic molding technology has made remarkable progress in reducing weight, increasing precision, and improving productivity, and there are particularly great demands for plastic molding technology in the field of optoelectronics.
【0003】その一つとして、成型加工時における離型
剤の開発が進められている。離型剤の利用方法としては
、成型する高分子物質内への内添法、あるいは金型のキ
ャビティ表面へ離型剤をコ−ティングする方法とがある
。離型剤としては、シリコ−ンオイル,鉱物油,パラフ
ィンワックス脂肪酸エステル等の誘導体,グリコ−ル,
タルク,マイカ等が使用されている。また、近年では、
パ−フルオロアルキル基含有リン酸エステル又はその塩
とシリコンオイルとの混合物(特公昭53−23270
号,特公昭53−23271号)、特公昭57−480
35号等、パ−フルオロアルキル基含有ポリエ−テル化
合物とシリコンオイル物との混合物(特公昭59−32
513号)をはじめ、シリコ−ンオイル系(特開昭63
−153510 号,特開昭62−130807 号)
、フッ素化合物(特開昭61−35910号,特開昭6
2−21512号,特開昭62−25914号、特開平
1−157808号,特開昭63−104804 号,
特開平1−291908号,特開平2−125708号
,特開平2−141210号)が主流となっている。更
に、上記離型剤は他の高分子物質と混合して溶媒系で希
釈し、ディッピング法,エアレス・スプレ−法,静電ス
プレ−塗装法及びエアゾ−ルスプレ−法等によって金型
表面に形成したり、スパッタリング法等ドライ法で金型
表面に被覆形成する方法(特開平1−166914号)
も提案されている。[0003] As one of these efforts, the development of mold release agents during molding processing is progressing. Methods of using the mold release agent include adding it internally into the polymer material to be molded, or coating the surface of the mold cavity with the mold release agent. As a mold release agent, silicone oil, mineral oil, derivatives such as paraffin wax fatty acid ester, glycol,
Talc, mica, etc. are used. Also, in recent years,
Mixture of perfluoroalkyl group-containing phosphoric acid ester or its salt and silicone oil (Japanese Patent Publication No. 53-23270
Special Publication No. 53-23271), Special Publication No. 57-480
No. 35, etc., mixtures of perfluoroalkyl group-containing polyether compounds and silicone oils (Japanese Patent Publication No. 59-32
No. 513), silicone oil-based products (Unexamined Japanese Patent Publication No. 63
-153510, JP-A-62-130807)
, fluorine compounds (JP-A-61-35910, JP-A-6
2-21512, JP 62-25914, JP 1-157808, JP 63-104804,
JP-A No. 1-291908, JP-A No. 2-125708, and JP-A No. 2-141210) are the mainstream. Furthermore, the above-mentioned mold release agent is mixed with other polymeric substances, diluted with a solvent system, and formed on the mold surface by dipping, airless spraying, electrostatic spraying, aerosol spraying, etc. A method of forming a coating on the mold surface using a dry method such as a sputtering method (Japanese Patent Application Laid-open No. 1-166914)
has also been proposed.
【0004】0004
【発明が解決しようとする課題】しかしながら、従来の
プラスチック成形型は、次に述べる問題点があった。
(1) 金型に対する離型剤の密着性が悪く、離型効果
が初期はあるが、徐々に低下するため、数回したらその
都度塗布しなければならない。[Problems to be Solved by the Invention] However, conventional plastic molds have the following problems. (1) The adhesion of the mold release agent to the mold is poor, and although the mold release effect is initially effective, it gradually decreases, so it must be applied each time after several times.
【0005】(2) 離型剤を金型にコ−ティングする
際、ハジキ,タレ等が発生しやすい。しかるに、今後オ
プトエレクトニクス等において形状が複雑で高度な精度
成型を要求される傾向にある。また、プラスチックレン
ズをはじめ、光メモリ用基板等における光学的性及び精
度成形においては、金型等への密着性,離型繰り返し性
,成型温度に対する耐久性,成型高分子物質の性質(光
学的性質等)等においていまだ十分な離型コ−ティング
剤が現状では見当たらない。(2) When coating a mold with a mold release agent, cissing, sagging, etc. are likely to occur. However, in the future, optoelectronics and the like will require complex shapes and highly precise molding. In addition, regarding the optical properties and precision molding of plastic lenses, optical memory substrates, etc., we also consider adhesion to molds, repeatability of mold release, durability against molding temperatures, properties of molded polymer materials (optical properties), etc. etc.), etc., there is still no sufficient mold release coating agent available at present.
【0006】本発明は上記事情に鑑みてなされたもので
、フッ素系グラフトポリマ−層、あるいはフルオロアル
キル基及び加水分解性官能基を持つか又はハロゲン原子
を持つシリル基を有するフッ素グラフトポリマ−からな
る硬化層を金型のキャビティ表面に設けることにより、
被覆表面の均一性・ぬれ性、密着性、離型性、耐久性、
合成樹脂との非貼付き性、生産性等に優れ、かつ転写に
よる成形物への悪影響を回避しえるプラスチック成形型
を提供することを目的とする。The present invention was made in view of the above circumstances, and consists of a fluorine-based graft polymer layer, or a fluorine-based graft polymer layer having a fluoroalkyl group and a hydrolyzable functional group, or a silyl group having a halogen atom. By providing a hardened layer on the surface of the mold cavity,
Coated surface uniformity, wettability, adhesion, releasability, durability,
The object of the present invention is to provide a plastic mold that has excellent non-stick properties with synthetic resins, productivity, etc., and can avoid adverse effects on molded products due to transfer.
【0007】[0007]
【課題を解決するための手段】本願第1の発明は、金型
のキャビティ表面に、離型膜としてフッ素系グラフトポ
リマ−層を設けたことを特徴とするプラスチック成形型
である。[Means for Solving the Problems] The first invention of the present application is a plastic mold characterized in that a fluorine-based graft polymer layer is provided as a mold release film on the cavity surface of the mold.
【0008】本願第2の発明、金型のキャビティ表面に
、フルオロアルキル基及び加水分解性官能基を持つか又
はハロゲン原子を持つシリル基を有するフッ素グラフト
ポリマ−からなる硬化層を、離型膜として設けたことを
特徴とするプラスチック成形型である。In the second invention of the present application, a cured layer made of a fluorine graft polymer having a fluoroalkyl group and a hydrolyzable functional group or a silyl group having a halogen atom is applied to the surface of the mold cavity as a mold release film. This is a plastic mold characterized by being provided as a.
【0009】本願第1の発明において、フッ素系グラフ
トポリマ−としては、マクロモノマ−法即ち分子鎖の片
末端に重合性の官能基を持つオリゴマ−を少なくても一
つの原料成分として製造されるものが好適である。この
オリゴマ−の末端重合性官能基の例としては、(メタ)
アクロイルオキシ,アリルオキシ,スチリル基等のビニ
ル重合タイプ、ジカルボキシル,ジヒドロキシ等の重縮
合付加タイプのものが挙げられ、例えば(メタ)アルキ
ルアクリレ−ト,ポリエチレングリコ−ルメタアクリレ
−ト,フルオロアルキルアクリレ−ト等を挙げることが
できる。[0009] In the first invention of the present application, the fluorine-based graft polymer is produced by the macromonomer method, that is, an oligomer having a polymerizable functional group at one end of the molecular chain as at least one raw material component. is suitable. An example of the terminal polymerizable functional group of this oligomer is (meta)
Examples include vinyl polymerization types such as acroyloxy, allyloxy, and styryl groups, and polycondensation addition types such as dicarboxyl and dihydroxy groups, such as (meth)alkyl acrylate, polyethylene glycol methacrylate, and fluoroalkyl acrylate. Examples include rate.
【0010】前記オリゴマ−は、ラジカル重合により分
子量1000〜10000 の片末端カルボン酸プレポ
リマ−を得、これをメタクリル酸グリシジルとの反応さ
せることにより得られるメタクリル酸エステル型末端基
を有したオリゴマ−である。このオリゴマ−に共重合成
分としてフルオロアクリレ−ト(下記[化1])を使用
して幹がフッ素成分であるフッ素系グラフトポリマ−(
モノマ−(A))が得られる。The oligomer is an oligomer having a methacrylic acid ester type terminal group obtained by radical polymerization to obtain a carboxylic acid prepolymer at one end with a molecular weight of 1,000 to 10,000, and reacting this with glycidyl methacrylate. be. Fluoroacrylate (Chemical formula 1 below) is used as a copolymerization component in this oligomer to create a fluorine-based graft polymer (
Monomer (A)) is obtained.
【0011】[0011]
【化1】[Chemical formula 1]
【0012】ここで、前記フルオロアクリレ−トの含有
量は5〜90wt%が好ましく、10〜60wt%が更
に好ましい。この理由は、この範囲内が一番金属等の表
面への均一な膜が得られるとともに、離型性が10wt
%未満の場合良好な離型効果が得られなにくいからであ
る。[0012] The content of the fluoroacrylate is preferably 5 to 90 wt%, more preferably 10 to 60 wt%. The reason for this is that within this range, the most uniform film can be obtained on the surface of metal etc., and the mold releasability is 10wt.
This is because if it is less than %, it is difficult to obtain a good mold release effect.
【0013】前記フッ素グラフトポリマ−は、単独でも
表面に密着性,離型性等が所期の目的通りに十分に達成
できる。また、ジブチルラウリレ−トを始め、シランカ
ップリング剤,反応基金属キレ−ト剤及び他ポリマ−を
併用してもよい。[0013] Even when the fluorine graft polymer is used alone, it is possible to sufficiently achieve surface adhesion, mold releasability, etc. as intended. In addition, dibutyl laurylate, a silane coupling agent, a reactive group metal chelating agent, and other polymers may be used in combination.
【0014】また、前記フッ素グラフトポリマ−自身の
離型及び耐久性を向上させることを目的にフルオロアル
キル基とともに、シリル基を有するフッ素グラフトポリ
マ−を金型のキャビティ表面に形成することにより、離
型剤としての性能を向上することができる。Furthermore, in order to improve the mold release and durability of the fluorine graft polymer itself, a fluorine graft polymer having a silyl group as well as a fluoroalkyl group is formed on the surface of the mold cavity. The performance as a molding agent can be improved.
【0015】本願第2の発明において、フルオロアルキ
ル基のアルキル基の炭素数は離型性,耐熱性を発現でき
る目的で、1〜25wt% ,好ましくは4〜20wt
%の範囲にすることが望ましい。ここで、アルキル基の
炭素数が20wt%を越えると、前記性能の向上は認め
られなくなり易い。In the second invention of the present application, the number of carbon atoms in the alkyl group of the fluoroalkyl group is 1 to 25 wt%, preferably 4 to 20 wt%, for the purpose of exhibiting mold releasability and heat resistance.
% range is desirable. Here, if the number of carbon atoms in the alkyl group exceeds 20 wt%, the above-mentioned improvement in performance is likely not to be observed.
【0016】本願第2の発明において、ポリマ−中の加
水分解性官能基とは、アルコキシ基,アセトキシ基及び
(OC2 H4 )p OR4 である。また、ハロゲ
ン原子としてはCI(塩素)が最も好ましい。こうした
ポリマ−としては、フルオロアルキル基を有するラジカ
ル重合性モノマ−、例えば下記[化2],[化3],[
化4],[化5],[化6]、及びフッ素系マクロモノ
マ−等が挙げられる。In the second invention of the present application, the hydrolyzable functional groups in the polymer are an alkoxy group, an acetoxy group, and (OC2 H4)p OR4. Moreover, CI (chlorine) is the most preferable halogen atom. Examples of such polymers include radically polymerizable monomers having a fluoroalkyl group, such as the following [Chemical formula 2], [Chemical formula 3], and [Chemical formula 3].
Chemical formula 4], [Chemical formula 5], [Chemical formula 6], and fluorine-based macromonomers.
【0017】[0017]
【化2】[Case 2]
【0018】[0018]
【化3】[Chemical formula 3]
【0019】[0019]
【化4】[C4]
【0020】[0020]
【化5】[C5]
【0021】[0021]
【化6】
なお、上記フルオロアルキル基のアルキル基数は、前記
と同様1〜25wt%,より好ましくは4〜20wt%
のものよい。[Image Omitted] Note that the number of alkyl groups in the fluoroalkyl group is 1 to 25 wt%, more preferably 4 to 20 wt%, as described above.
It's good.
【0022】更に、上記フッ素系マクロモノマ−につい
て述べれば、例えば上記フルオロモノマ−をチオグリコ
−ル基共存下にラジカル重合して分子量1000〜10
000 の片末端カルボン酸プレポリマ−を得、これを
メタクリル酸グリシジルとの反応により得られるメタク
リル酸エステル型末端基を有するフッ素系マクロモノマ
−が得られる。Furthermore, regarding the above-mentioned fluorine-based macromonomer, for example, the above-mentioned fluoromonomer can be radically polymerized in the coexistence of a thioglycol group to obtain a molecular weight of 1000 to 10.
A fluorine-based macromonomer having a methacrylic acid ester type terminal group is obtained by reacting this with glycidyl methacrylate.
【0023】本願第2の発明において、シリル基を有す
るラジカル重合性モノマ−(モノマ−(B))としては
、例えば下記[化7]で示されるアクリレ−ト系シラン
、メタクリレ−ト系シランが挙げられる。In the second invention of the present application, as the radically polymerizable monomer (monomer (B)) having a silyl group, for example, an acrylate silane or a methacrylate silane shown in [Chemical formula 7] below can be used. Can be mentioned.
【0024】[0024]
【化7】[C7]
【0025】なお、[化7]でR1 は水素原子あるい
はCH3 、R2 ,R3 はメチル基,フェニル基で
あり、n=1〜3の整数、m=0又は1、I(エル)は
m=0の場合0〜2,m=1の場合2である。また、x
はアルコキシ基,アセトン基,一般式(OC2 H4
)p OR2 の基(R4 :H,CH3 ,C2 H
5 、n=1〜5の整数)である。具体的には、γ−(
メタ)アクリロイルオキシプロピルトリメトキシシラン
、γ−(メタ)アクリロイルオキシプロピルメチルジメ
トキシシラン、γ−(メタ)アクリロイルオキシプロピ
ルジメトキシシラン、3−(2−(メタ)アクリロイル
オキシエトキシ)プロピルトリメトキシシラン、3−
(2−(メタ)アクリロイルオキシエトキシ)プロピ
ルメチルジメトキシシラン、3−(2−(メタ)アクリ
ロイルオキシエトキシ)プロピルジメチルメトキシシラ
ン、5−((メタ)アクリロイルオキシ)ペンチルトリ
メトキシシラン、5−((メタ)アクリロイルオキシ)
ペンチルメチルジメトキシシラン、5−((メタ)アク
リロイルオキシ)ペンチルジメチルジメトキシシラン、
p−ビニルフェニルトリメトキシシラン、p−ビニルフ
ェニルメチルジメトキシシラン、p−ビニルフェニルジ
メチルメトキシシラン、γ−(メタ)アクリロイルオキ
シプロピルトリ(β−メトキシエトキシ)シラン等が挙
げられる。これらのうち、γ−メタクリロキシプロピル
トリメトキシシランが最も好ましい。[0025] In [Chemical formula 7], R1 is a hydrogen atom or CH3, R2 and R3 are a methyl group or a phenyl group, n = an integer of 1 to 3, m = 0 or 1, I (L) is m = In the case of 0, the value is 0 to 2, and in the case of m=1, the value is 2. Also, x
is an alkoxy group, an acetone group, the general formula (OC2 H4
)p OR2 group (R4: H, CH3, C2 H
5, n=an integer of 1 to 5). Specifically, γ−(
meth)acryloyloxypropyltrimethoxysilane, γ-(meth)acryloyloxypropylmethyldimethoxysilane, γ-(meth)acryloyloxypropyldimethoxysilane, 3-(2-(meth)acryloyloxyethoxy)propyltrimethoxysilane, 3 −
(2-(meth)acryloyloxyethoxy)propylmethyldimethoxysilane, 3-(2-(meth)acryloyloxyethoxy)propyldimethylmethoxysilane, 5-((meth)acryloyloxy)pentyltrimethoxysilane, 5-(( (meth)acryloyloxy)
Pentylmethyldimethoxysilane, 5-((meth)acryloyloxy)pentyldimethyldimethoxysilane,
Examples include p-vinylphenyltrimethoxysilane, p-vinylphenylmethyldimethoxysilane, p-vinylphenyldimethylmethoxysilane, γ-(meth)acryloyloxypropyltri(β-methoxyethoxy)silane, and the like. Among these, γ-methacryloxypropyltrimethoxysilane is most preferred.
【0026】更に、本発明で使用される前記モノマ−(
A),(B)以外のラジカル重合性モノマ−であっても
もよく、例えば次のものが挙げられる。オレフィン系化
合物として、エチレン,プロピレン等の低分子不飽和炭
化水素、塩化ビニル及びフッ化ビニルの如きハロゲン化
ビニル、酢酸ビニルの如き有機酸のビニルエステル、ス
チレン,スチレン置換体並びにビニルピリジン及びビニ
ルナフタレンの如きビニル芳香族化合物、アクリル酸及
び/又はメタアクリル酸(以後、(メタ)アクリル酸と
略する)、(メタ)アクリル酸のエステル、アクロレイ
ン,アクリロニトリル,N−ビニルピロリドン及びN−
ビニルカプロラクタムの如きN−ビニル化合物、また無
水マレイン酸,マレイン酸及びフマル酸のエステル,フ
ッ素以外のラジカル重合性マクロモノマ−等を挙げる事
ができる。これらのモノマ−は単独あるいは組み合わせ
ても使用することができる。ラジカル共重合性は、従来
公知の方法を使用することができる。フルオロモノマ−
の使用量は、前記モノマ−混合物100重量部中5〜8
0重量部が好ましく、10〜70重量部が更に好ましい
。Furthermore, the monomer (
Radical polymerizable monomers other than A) and (B) may also be used, such as the following. Examples of olefinic compounds include low-molecular unsaturated hydrocarbons such as ethylene and propylene, vinyl halides such as vinyl chloride and vinyl fluoride, vinyl esters of organic acids such as vinyl acetate, styrene, styrene substitutes, vinylpyridine and vinylnaphthalene. vinyl aromatic compounds such as acrylic acid and/or methacrylic acid (hereinafter abbreviated as (meth)acrylic acid), esters of (meth)acrylic acid, acrolein, acrylonitrile, N-vinylpyrrolidone and N-
Examples include N-vinyl compounds such as vinyl caprolactam, esters of maleic anhydride, maleic acid and fumaric acid, and radically polymerizable macromonomers other than fluorine. These monomers can be used alone or in combination. For radical copolymerization, conventionally known methods can be used. Fluoromonomer
The amount used is 5 to 8 in 100 parts by weight of the monomer mixture.
It is preferably 0 parts by weight, and more preferably 10 to 70 parts by weight.
【0027】シリルモノマ−の添加量は、前記モノマ−
混合物100重量部中0.01〜50重量部が好ましく
、0.5〜35重量部が更に好ましい。ここで、シリル
モノマ−が0.01重量部以下では本発明ポリマ−の硬
化性が悪いとともに、金型等への密着性がよくなく、5
0重量部を越えると離型性が低下する。The amount of silyl monomer added is determined by
It is preferably 0.01 to 50 parts by weight, more preferably 0.5 to 35 parts by weight, based on 100 parts by weight of the mixture. Here, if the silyl monomer is less than 0.01 part by weight, the curability of the polymer of the present invention is poor, and the adhesion to molds etc. is poor.
If it exceeds 0 parts by weight, the mold releasability will deteriorate.
【0028】以上のように得られた本発明のポリマ−系
は単独でも他のモノマ−,オリゴマ−及びポリマ−と併
用してもよく、このポリマ−系を均一な平面な得るため
に粘度低下及びコ−ティング適性を得るために、フロン
系溶剤、メタノ−ル,IPA等のアルコ−ル系溶剤、ト
ルエン,キシレン等の溶剤、酢酸エチル,酢酸ブチル系
等エステル系溶剤、アセトン,MIBK等のケトン系溶
剤等各種の溶剤のうち一種又は二種以上に混合すること
が好ましい。The polymer system of the present invention obtained as described above may be used alone or in combination with other monomers, oligomers, and polymers. In order to obtain coating suitability, fluorocarbon solvents, alcohol solvents such as methanol and IPA, solvents such as toluene and xylene, ester solvents such as ethyl acetate and butyl acetate, acetone and MIBK, etc. It is preferable to mix one or more of various solvents such as ketone solvents.
【0029】本発明において、離型層を金型のキャビテ
ィ表面に形成する方法としては、スプレ−法、ハケ塗り
法、ディップ法及びスピンコ−ト法等が挙げられる。し
かるに、レンズ(プレ−ネルレンズ)や光ディスク等の
凹凸形状への均一な膜形成においては、スピンコ−ト法
が最も均一な離型層を形成することができる。この離型
層は、空気中又は基材表面に存在する水分の触媒作用に
よって常温又は加熱によって架橋硬化する方法も可能で
あるが、ジブチルスズラウレ−ト,ジブチルスズマレエ
−ト等の架橋硬化する方法がより好ましい。In the present invention, methods for forming the mold release layer on the surface of the mold cavity include spraying, brushing, dipping, and spin coating. However, in forming a uniform film on the uneven shape of a lens (planet lens), optical disk, etc., the spin coating method can form the most uniform release layer. This release layer can be cured by crosslinking at room temperature or by heating through the catalytic action of moisture present in the air or on the surface of the base material, but it is also possible to cure the release layer by crosslinking with dibutyltin laurate, dibutyltin maleate, etc. The method is more preferred.
【0030】図1はスピンコ−ト機の概略図を示すもの
で、1は回転テ−ブル2を支持する回転軸、3は前記回
転テ−ブル2の上面に例えば両面テ−プにより接着され
たワ−ク、4はカバ−、5は滴下ロ−トを示す。FIG. 1 shows a schematic diagram of a spin coating machine, in which 1 is a rotating shaft that supports a rotary table 2, and 3 is a rotary shaft that is attached to the upper surface of the rotary table 2 with, for example, double-sided tape. 4 is a cover, and 5 is a dropping funnel.
【0031】[0031]
【作用】本発明によれば、従来の欠点を解消し、高い離
型膜で金型のキャビティ表面に均一な連続膜を形成し、
光学素子等の精度成形に優れ、かつ耐久性に優れた離型
膜が得られる。この他、ぬれ性、密着性、離型性、合成
樹脂との非貼付き性、生産性等に優れ、かつ転写による
成形物への悪影響を回避しえる等の種々の利点を有する
。[Operation] According to the present invention, the conventional drawbacks are eliminated, and a uniform continuous film is formed on the mold cavity surface with a high mold release film.
A mold release film that is excellent in precision molding of optical elements and the like and has excellent durability can be obtained. In addition, it has various advantages such as excellent wettability, adhesion, mold releasability, non-stick property with synthetic resins, productivity, etc., and avoids adverse effects on molded products due to transfer.
【0032】[0032]
【実施例】以下、本発明の実施例について製造方法を併
記して説明する。
(実施例1)[Examples] Examples of the present invention will be described below along with manufacturing methods. (Example 1)
【0033】まず、公知のマクロモノマ−法で得られた
分子鎖の片末端に重合性の官能基を持つオリゴマ−とフ
ルオロアクリレ−ト(既述した[化1])の混合物を、
約7:3でトリフルオロトルエン溶媒中に溶解し、AI
BN0.5重量部を加えた。次に、N2 気流中で約1
00℃の還流下で約6時間反応して得られたフッ素グラ
フトポリマ−(平均分子量数15000 )とγ−ブチ
ルスズラウレ−トをポリマ−100重量部に対して3重
量部加え、酢酸エチル/トルエン/IPA(混合比率=
5:3:2)で溶解した。ひきつづき、この混合溶液を
スピンコ−ト法により1.6μmのディスクのスタンパ
−上に塗布して、膜厚約300オングストロ−ム(30
nm)の薄膜を形成した。更に、約160℃で30分焼
付け後、離型膜を有した成形型を得た。First, a mixture of an oligomer having a polymerizable functional group at one end of the molecular chain obtained by a known macromonomer method and fluoroacrylate (previously described [Chemical formula 1]),
Dissolved in trifluorotoluene solvent at approximately 7:3, AI
0.5 parts by weight of BN was added. Next, approximately 1
A fluorine graft polymer (average molecular weight 15,000) obtained by reacting for about 6 hours under reflux at 00°C and 3 parts by weight of γ-butyltin laurate were added to 100 parts by weight of the polymer, and ethyl acetate/ Toluene/IPA (mixing ratio =
5:3:2). Subsequently, this mixed solution was applied onto a 1.6 μm disk stamper using a spin coating method to obtain a film thickness of about 300 angstroms (300 angstroms).
A thin film of 100 nm) was formed. Furthermore, after baking at about 160° C. for 30 minutes, a mold having a release film was obtained.
【0034】上記のようにして得られるプラスチック成
形型は、スタンパ−表面に、フッ素グラフトポリマ−等
からなる混合物を塗布して得られる離型膜を形成して構
成されている。上記発明によれば、高離型性を有し、ス
タンパ−への密着性が良好で、形状を維持する均一な薄
膜が得られ、耐熱性に優れ、更に耐久性に優れる等の効
果を有する成形型が得られた。The plastic mold obtained as described above is constructed by forming a release film obtained by applying a mixture of a fluorine graft polymer or the like on the surface of the stamper. According to the above invention, it is possible to obtain a uniform thin film that has high mold releasability, good adhesion to the stamper, maintains its shape, has excellent heat resistance, and has other effects such as excellent durability. A mold was obtained.
【0035】事実、本発明の成形型は、本発明の離型層
を形成しない成形型に比べ、50%以上の成形回数を向
上できるとともに、光学的精密転写法及びスタンパ−へ
の密着性,離型剤としての効果が確認できた。
(実施例2)In fact, the mold of the present invention can increase the number of moldings by 50% or more compared to the mold of the present invention that does not form a mold release layer, and also has improved adhesion to the stamper using the optical precision transfer method. The effect as a mold release agent was confirmed. (Example 2)
【0036】[0036]
【化8】[Chemical formula 8]
【0037】フルオロモノマ−として上記[化8]を5
0重量部、シランモノマ−としてγ−メタクリルオキシ
プロピルトリメトキシシラン25重量部、第3モノマ−
としてスチアリルメタクリレ−ト25重量部、触媒とし
てMEK200重量部、ラジカル開始剤としてAIBN
2重量部を用い、N2 中で約100℃の温度で約5時
間反応させ、本発明ポリマ−を合成した。[0037] As a fluoromonomer, the above [Chemical formula 8] is used as 5
0 parts by weight, 25 parts by weight of γ-methacryloxypropyltrimethoxysilane as silane monomer, third monomer
25 parts by weight of stialyl methacrylate, 200 parts by weight of MEK as a catalyst, and AIBN as a radical initiator.
Using 2 parts by weight, the polymer of the present invention was synthesized by reacting in N2 at a temperature of about 100 DEG C. for about 5 hours.
【0038】次に、このポリマ−を主成分として、酢酸
エチル/トルエン/IPA(混合比率=5:3:2)の
溶剤中にジブチルジルレ−ト(硬化剤)を、3重量部滴
下した。ひきつづき、この混合溶液をスピンコ−ト法に
より(回転数1300rpmの振り切り)、プレ−ネル
光学レンズ用金型のキャビティ表面に均一に塗布して、
膜厚約40nmの薄膜を形成した。更に、約100℃で
30分焼付け後、離型膜を有した成形型を得た。Next, using this polymer as the main component, 3 parts by weight of dibutyl dylate (curing agent) was dropped into a solvent of ethyl acetate/toluene/IPA (mixing ratio = 5:3:2). Subsequently, this mixed solution was uniformly applied to the cavity surface of the planel optical lens mold by a spin coating method (splitting at a rotation speed of 1300 rpm).
A thin film with a thickness of about 40 nm was formed. Furthermore, after baking at about 100° C. for 30 minutes, a mold having a release film was obtained.
【0039】その結果、金型への密着性に優れ、プレ−
ネル形状を金型に沿った均一な膜を得ることができた。
こうして得られた金型を用いて三菱ガス化学製の光学レ
ンズ用PMMAレジンを用いところ、転写性に優れ、か
つ耐久性,回数も3倍以上の効果を得ることができた。As a result, it has excellent adhesion to the mold, and the plate
It was possible to obtain a uniform film with a flannel shape along the mold. Using the mold obtained in this way and using PMMA resin for optical lenses made by Mitsubishi Gas Chemical, it was possible to obtain excellent transferability, and more than three times the durability and number of times.
【0040】[0040]
【発明の効果】以上詳述した如く本発明によれば、フッ
素系グラフトポリマ−層、あるいはフルオロアルキル基
及び加水分解性官能基を持つか又はハロゲン原子を持つ
シリル基を有するフッ素グラフトポリマ−からなる硬化
層を金型の表面に設けることにより、被覆表面の均一性
・ぬれ性、密着性、離型性、耐久性、合成樹脂との非貼
付き性、生産性等に優れ、かつ転写による成形物への悪
影響を回避しえるプラスチック成形型を提供できる。As described in detail above, according to the present invention, a fluorine-based graft polymer layer or a fluorine-based graft polymer layer having a fluoroalkyl group and a hydrolyzable functional group or a silyl group having a halogen atom can be used. By providing a hardened layer on the surface of the mold, the coating surface has excellent uniformity, wettability, adhesion, releasability, durability, non-stick property with synthetic resin, productivity, etc. It is possible to provide a plastic mold that can avoid adverse effects on molded products.
【図1】本発明に係る金型本体にフッ素含有離型薄膜を
形成する際に用いられるスピンコ−ト機の説明図。FIG. 1 is an explanatory diagram of a spin coating machine used when forming a fluorine-containing mold release thin film on a mold body according to the present invention.
1…回転軸、2…回転テ−ブル、3…ワ−ク、4…カバ
−。1... Rotating shaft, 2... Rotating table, 3... Work, 4... Cover.
Claims (2)
てフッ素系グラフトポリマ−層を設けたことを特徴とす
るプラスチック成形型。1. A plastic molding mold characterized in that a fluorine-based graft polymer layer is provided as a mold release film on the surface of a cavity of the mold.
ルキル基及び加水分解性官能基を持つか、又はハロゲン
原子を持つシリル基を有するフッ素グラフトポリマ−か
らなる硬化層を、離型膜として設けたことを特徴とする
プラスチック成形型。2. A cured layer made of a fluorine graft polymer having a fluoroalkyl group and a hydrolyzable functional group or a silyl group having a halogen atom is provided as a mold release film on the surface of the mold cavity. A plastic mold that is characterized by:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12747291A JPH04353406A (en) | 1991-05-30 | 1991-05-30 | Mold for plastics |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12747291A JPH04353406A (en) | 1991-05-30 | 1991-05-30 | Mold for plastics |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04353406A true JPH04353406A (en) | 1992-12-08 |
Family
ID=14960774
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12747291A Withdrawn JPH04353406A (en) | 1991-05-30 | 1991-05-30 | Mold for plastics |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04353406A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008137306A (en) * | 2006-12-04 | 2008-06-19 | Kazufumi Ogawa | Mold, its manufacturing method and molding produced with it |
US8029262B2 (en) | 2005-04-28 | 2011-10-04 | Sony Corporation | Lubricant composition and article, disk molding stamper, disk molding apparatus, disk forming method, method of forming lubrication coating |
JP2013049287A (en) * | 2012-11-29 | 2013-03-14 | Kazufumi Ogawa | Mold and method for manufacturing molding using the same |
JP2017176460A (en) * | 2016-03-30 | 2017-10-05 | 富士フイルム株式会社 | Method of manufacturing sheet with needle-like protrusion part |
-
1991
- 1991-05-30 JP JP12747291A patent/JPH04353406A/en not_active Withdrawn
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8029262B2 (en) | 2005-04-28 | 2011-10-04 | Sony Corporation | Lubricant composition and article, disk molding stamper, disk molding apparatus, disk forming method, method of forming lubrication coating |
JP2008137306A (en) * | 2006-12-04 | 2008-06-19 | Kazufumi Ogawa | Mold, its manufacturing method and molding produced with it |
JP2013049287A (en) * | 2012-11-29 | 2013-03-14 | Kazufumi Ogawa | Mold and method for manufacturing molding using the same |
JP2017176460A (en) * | 2016-03-30 | 2017-10-05 | 富士フイルム株式会社 | Method of manufacturing sheet with needle-like protrusion part |
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A300 | Application deemed to be withdrawn because no request for examination was validly filed |
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