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JPH04132293A - Polyimide resin multilayer wiring board - Google Patents

Polyimide resin multilayer wiring board

Info

Publication number
JPH04132293A
JPH04132293A JP25336390A JP25336390A JPH04132293A JP H04132293 A JPH04132293 A JP H04132293A JP 25336390 A JP25336390 A JP 25336390A JP 25336390 A JP25336390 A JP 25336390A JP H04132293 A JPH04132293 A JP H04132293A
Authority
JP
Japan
Prior art keywords
layer
polyimide resin
polyimide
insulating layer
wiring board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP25336390A
Other languages
Japanese (ja)
Inventor
Shinichi Hasegawa
真一 長谷川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP25336390A priority Critical patent/JPH04132293A/en
Publication of JPH04132293A publication Critical patent/JPH04132293A/en
Pending legal-status Critical Current

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  • Production Of Multi-Layered Print Wiring Board (AREA)

Abstract

PURPOSE:To realize a high speed propagating speed without weakening a close contact by composing an insulting layer between a signal layer and a ground layer of polyimide resin having low permittivity. CONSTITUTION:A power source layer 3 and a normal insulating layer 5 having a viahole 4 of polyimide resin are formed on a board l. A GND interconnection layer 6 is formed thereon. An insulating layer 7 having the viahole 4 is formed of the polyimide having low permittivity thereon. A signal interconnection layer 8 and the normal insulating layer 5 are formed thereon. Thereafter, an interconnection layer 8, a low permittivity polyimide insulting layer 7, a GND layer 6, a normal polyimide resin insulating layer 5, a power source.signal transfer layer 9, a normal polyimide resin insulating layer 5, and an electric component placing layer 10 are sequentially formed in this order. Since the layer 7 has lower permittivity by about 2.7 to 3.0 than that of the insulating layer composed of general polyimide resin insulating film to increase its signal propagating speed and the layers 7, 5 are alternately deposited, deterioration of close contact in the case of using only the low permittivity polyimide can be improved.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は電子機器で用いられるポリイミド樹脂多層配線
基板に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a polyimide resin multilayer wiring board used in electronic equipment.

〔従来の技術〕[Conventional technology]

従来、ポリイミド樹脂多層配線基板は、セラミック多層
配線基板上に導体配線層とポリイミド樹脂絶縁層を交互
に積層してなっており、このポリイミド樹脂の絶縁層は
一般的に誘電率が約3,4から3.8のポリイミド樹脂
を使用して構成していた。
Conventionally, polyimide resin multilayer wiring boards are made by alternately laminating conductor wiring layers and polyimide resin insulating layers on a ceramic multilayer wiring board, and the polyimide resin insulating layers generally have a dielectric constant of about 3.4. It was constructed using a polyimide resin of 3.8 to 3.8.

即ち、第2図に示すように、セラミックまたはガラスセ
ラミック多層配線基板21上において、導体配線22が
電源層23を形成している上に、ヴイアホール24を有
する絶縁層25、グラウンド(以下、GND)配線層2
6、絶縁層25、信号配線層28、絶縁層25と順次に
積層し、最後に電源・信号乗せかえ層29、絶縁層25
、電気部品搭載層30を形成して多層配線基板を構成し
ていた。
That is, as shown in FIG. 2, on a ceramic or glass ceramic multilayer wiring board 21, a conductor wiring 22 forms a power supply layer 23, an insulating layer 25 having a via hole 24, and a ground (hereinafter referred to as GND). Wiring layer 2
6. The insulating layer 25, the signal wiring layer 28, and the insulating layer 25 are laminated in order, and finally the power supply/signal transfer layer 29 and the insulating layer 25
, an electrical component mounting layer 30 was formed to constitute a multilayer wiring board.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

上述した従来のポリイミド樹脂多層配線基板は、セラミ
ック多層配線基板上に導体配線層とポリイミド樹脂の絶
縁層を交互に積層してなっておリ、ポリイミド樹脂の絶
縁層には、非感光性なら日立化成のPIQ、デュポンの
PYRALYN、東しのセミコファイン等、感光性なら
日立化成のPL−1200、デュポンのPI−2702
D、東しのフォトニース、旭化成のPIMEL等を使用
した絶縁層で構成していた。
The conventional polyimide resin multilayer wiring board described above has conductor wiring layers and polyimide resin insulating layers alternately laminated on a ceramic multilayer wiring board. Kasei's PIQ, DuPont's PYRALYN, Toshi's Semicofine, etc. For photosensitivity, Hitachi Chemical's PL-1200, DuPont's PI-2702
D. It was composed of an insulating layer using Toshin's Photoneese, Asahi Kasei's PIMEL, etc.

配線の信号の伝播速度に影響する誘電率は、電子材料と
して好材料と言われている一般的なポリイミド樹脂では
、3.4から3.8程度であり、さらに誘電率の下げる
ことにより高速の伝播速度を実現しようとすると、さら
に低誘電率のポリイミドを使用するということになる。
The dielectric constant, which affects the propagation speed of signals in wiring, is about 3.4 to 3.8 in general polyimide resin, which is said to be a good material for electronic materials. In order to achieve higher propagation speeds, polyimide with an even lower dielectric constant must be used.

現在上記各社から誘電率が2.7から3.0程度のポリ
イミドがだされている。しかしこの低誘電率の材料を用
いて多層に配線しようとすると、ポリイミド−ポリイミ
ド間の密着が弱いという問題がある。これはポリマーに
F(フッ素)が添加されているため反応性が弱かったり
、ポリマーの構造が剛直なロッドライク構造なため、こ
の材料のみで多層化するとポリイミド−ポリイミド間の
密着が弱くなるためであり、このため多層配線基板の絶
縁材F4として不向きである。
Currently, the above-mentioned companies are producing polyimides having a dielectric constant of about 2.7 to 3.0. However, when wiring in multiple layers using this low dielectric constant material, there is a problem in that the adhesion between polyimide and polyimide is weak. This is because the reactivity is weak due to F (fluorine) added to the polymer, and because the polymer structure is a rigid rod-like structure, the adhesion between polyimide and polyimide becomes weak when multilayered using only this material. Therefore, it is not suitable as the insulating material F4 of a multilayer wiring board.

〔課題を解決するための手段〕[Means to solve the problem]

本発明は導体配線層とポリイミド樹脂の絶縁層を交互に
積層してなるポリイミド樹脂多層配線基板において、信
号層とグラウンド層間の絶縁層が低誘電率のポリイミド
樹脂によって構成されている。
The present invention is a polyimide resin multilayer wiring board formed by alternately laminating conductor wiring layers and insulating layers of polyimide resin, in which the insulating layer between the signal layer and the ground layer is made of a polyimide resin with a low dielectric constant.

また本発明のポリイミド樹脂多層配線基板は、前記低誘
電率のポリイミド樹脂の絶縁層と通常の誘電率のポリイ
ミド樹脂の絶縁層とが交互に積層される。
Further, in the polyimide resin multilayer wiring board of the present invention, insulating layers made of the polyimide resin having a low dielectric constant and insulating layers made of a polyimide resin having a normal dielectric constant are alternately laminated.

〔実施例〕〔Example〕

次に、本発明について図面を参照して説明する。 Next, the present invention will be explained with reference to the drawings.

第1図は本発明の一実施例の縦断面図である。FIG. 1 is a longitudinal sectional view of an embodiment of the present invention.

第1図において、セラミックまたはガラスセラミック多
層配線基板1上に銅又は金等の導体配線2がめつき法等
で厚さ5ミクロンから10ミクロン、線幅15ミクロン
から30ミクロンで電源層3を形成し、この基板上にポ
リイミド樹脂のヴイアホール4を有する通常の絶縁層5
(非感光性なら日立化成のPIQ、デュポンのP Y 
RA L YN、東しのセミコファイン等、感光性なら
日立化成のPL−1200デユポンのP4−2702D
、東れのフォトニース、旭化成のPIMEL等)を15
ミクロンから25ミクロンの厚さで形成する。そしてこ
の上に前記と同様にめっき法等でGND配線層6を形成
する。そしてこの上に低誘電率ポリイミド(非感光性な
ら日立化成のPIQ−900、PIQ−1800X−5
、デュポンのPI−2566、PI−2610D、PI
−2611D、旭化成のTLSA (A)等、感光性な
ら旭化成のTL (E)等)を使用し、ヴイアホール4
を有する絶縁層7を15ミクロンから25ミクロンの厚
さで形成する。そしてこの上に前記と同様にめっき法等
で信号配線層8を形成し、ポリイミド樹脂のヴイアホー
ル4を有する通常の絶縁層5(非感光性なら日立化成の
PIQ、デュポンのPYRALYN、東しのセミコファ
イン等、感光性なら日立化成のPL−1200、デュポ
ンのPI−2702D、東しのフォトニース、旭化成の
PIMEL等)を15ミクロンから25ミクロンの厚さ
に形成する。そしてこの後、前記のプロセスで信号配線
層8、低誘電率ポリイミド絶縁層7、GND層6、通常
のポリイミド樹脂絶縁層5、電源・信号乗せかえ層9、
通常のポリイミド樹脂絶縁層5、電気部品搭載層10の
順でさらに形成し、多層配線基板を得る。
In FIG. 1, a power supply layer 3 is formed on a ceramic or glass-ceramic multilayer wiring board 1 by a conductor wiring 2 made of copper or gold, etc., with a thickness of 5 to 10 microns and a line width of 15 to 30 microns, using a plating method or the like. , an ordinary insulating layer 5 having polyimide resin via holes 4 on this substrate.
(If it is non-photosensitive, Hitachi Chemical's PIQ, DuPont's PY
RALYN, Toshin's Semico Fine, etc. For photosensitive materials, Hitachi Chemical's PL-1200, Dupont's P4-2702D
, Tore's Photonice, Asahi Kasei's PIMEL, etc.) 15
It is formed with a thickness of 1 to 25 microns. Then, the GND wiring layer 6 is formed thereon by plating or the like in the same manner as described above. And on top of this, low dielectric constant polyimide (for non-photosensitive, Hitachi Chemical's PIQ-900, PIQ-1800X-5
, DuPont PI-2566, PI-2610D, PI
-2611D, Asahi Kasei's TLSA (A), etc., if photosensitive, use Asahi Kasei's TL (E), etc.), and use Viahole 4.
An insulating layer 7 having a thickness of 15 to 25 microns is formed. On top of this, a signal wiring layer 8 is formed by plating or the like in the same manner as described above, and a normal insulating layer 5 having via holes 4 made of polyimide resin (if non-photosensitive, Hitachi Chemical's PIQ, DuPont's PYRALYN, Toshin's Semiconductor) If the film is photosensitive, a fine film (such as Hitachi Chemical's PL-1200, DuPont's PI-2702D, Toshi's Photonice, Asahi Kasei's PIMEL, etc.) is formed to a thickness of 15 to 25 microns. After that, in the above process, a signal wiring layer 8, a low dielectric constant polyimide insulating layer 7, a GND layer 6, a normal polyimide resin insulating layer 5, a power/signal transfer layer 9,
A normal polyimide resin insulating layer 5 and an electrical component mounting layer 10 are further formed in this order to obtain a multilayer wiring board.

本実施例の構造をとると、低誘電率ポリイミド絶縁層7
と、通常のポリイミド絶縁層5が交互に積層されるため
、低誘電率ポリイミドのみを用いた場合のポリイミド間
の密着が悪いという問題点が改善される。しかも信号の
配線遅延は、グラウンド層との間の絶縁層の誘電率でで
きるため、この部分に低誘電率材料を用いることにより
、配線基板としての電気的特性も改善できる。
With the structure of this embodiment, the low dielectric constant polyimide insulating layer 7
Since the normal polyimide insulating layers 5 and 5 are alternately laminated, the problem of poor adhesion between polyimides when only low dielectric constant polyimide is used is improved. Moreover, since the signal wiring delay is caused by the dielectric constant of the insulating layer between the ground layer and the ground layer, by using a low dielectric constant material in this part, the electrical characteristics of the wiring board can also be improved.

〔発明の効果〕〔Effect of the invention〕

以上説明したように本発明によれば、導体配線層と有機
樹脂の絶縁層を交互に積層したボリイミド樹脂多層配線
基板において、信号層とGND層間の絶縁層を低誘電率
のポリイミド樹脂によって構成することにより、誘電率
が3.4から3,8程度の一般的なポリイミド樹脂絶縁
膜で構成している絶縁層に比べ、誘電率を2.7から3
.0程度に下げることにより信号伝播速度を上げること
が出来る。又、低誘電率のポリイミドを信号層とGND
層間にだけ使用することにより、この材料の欠点である
、多層に配線しようとするとポリイミド−ポリイミド間
の密着が弱く多層配線基板の絶縁材料として不向きであ
るという問題が解決できる。
As explained above, according to the present invention, in a polyimide resin multilayer wiring board in which conductive wiring layers and organic resin insulating layers are alternately laminated, the insulating layer between the signal layer and the GND layer is made of a low dielectric constant polyimide resin. This results in a dielectric constant of 2.7 to 3 compared to an insulating layer made of a general polyimide resin insulation film, which has a dielectric constant of about 3.4 to 3.8.
.. By lowering it to about 0, the signal propagation speed can be increased. Also, low dielectric constant polyimide is used as a signal layer and GND.
By using this material only between layers, it is possible to solve the problem of this material, which is unsuitable as an insulating material for multilayer wiring boards because the adhesion between polyimide and polyimide is weak when wiring is attempted in multiple layers.

線層、6.26・・・GND配線層、7・・・低誘電率
ポリイミドを使用した絶縁層、8..28・・・信号配
線層、9,29・・・電源・信号乗せがえ層、1o、3
0・・・電気部品搭載層。
Line layer, 6.26... GND wiring layer, 7... Insulating layer using low dielectric constant polyimide, 8. .. 28... Signal wiring layer, 9, 29... Power supply/signal replacement layer, 1o, 3
0: Electrical component mounting layer.

Claims (2)

【特許請求の範囲】[Claims] 1.導体配線層とポリイミド樹脂の絶縁層を交互に積層
してなるポリイミド樹脂多層配線基板において、信号層
とグラウンド層間の絶縁層が低誘電率のポリイミド樹脂
によって構成されていることを特徴とするポリイミド樹
脂多層配線基板。
1. A polyimide resin multilayer wiring board formed by alternately laminating conductor wiring layers and insulating layers of polyimide resin, characterized in that the insulating layer between the signal layer and the ground layer is composed of a polyimide resin with a low dielectric constant. Multilayer wiring board.
2.前記低誘電率のポリイミド樹脂の絶縁層と通常の誘
電率のポリイミド樹脂の絶縁層とが交互に積層されてな
ることを特徴とする請求項1記載のポリイミド樹脂多層
配線基板。
2. 2. The polyimide resin multilayer wiring board according to claim 1, wherein the insulating layers made of polyimide resin having a low dielectric constant and the insulating layers made of polyimide resin having a normal dielectric constant are alternately laminated.
JP25336390A 1990-09-21 1990-09-21 Polyimide resin multilayer wiring board Pending JPH04132293A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25336390A JPH04132293A (en) 1990-09-21 1990-09-21 Polyimide resin multilayer wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25336390A JPH04132293A (en) 1990-09-21 1990-09-21 Polyimide resin multilayer wiring board

Publications (1)

Publication Number Publication Date
JPH04132293A true JPH04132293A (en) 1992-05-06

Family

ID=17250309

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25336390A Pending JPH04132293A (en) 1990-09-21 1990-09-21 Polyimide resin multilayer wiring board

Country Status (1)

Country Link
JP (1) JPH04132293A (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6252468A (en) * 1985-08-30 1987-03-07 Shimadzu Corp Centrifugal type automatic chemical analyser
JPH01189998A (en) * 1988-01-26 1989-07-31 Matsushita Electric Works Ltd Lcr multilayer board

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6252468A (en) * 1985-08-30 1987-03-07 Shimadzu Corp Centrifugal type automatic chemical analyser
JPH01189998A (en) * 1988-01-26 1989-07-31 Matsushita Electric Works Ltd Lcr multilayer board

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