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JPH0341496B2 - - Google Patents

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Publication number
JPH0341496B2
JPH0341496B2 JP55084923A JP8492380A JPH0341496B2 JP H0341496 B2 JPH0341496 B2 JP H0341496B2 JP 55084923 A JP55084923 A JP 55084923A JP 8492380 A JP8492380 A JP 8492380A JP H0341496 B2 JPH0341496 B2 JP H0341496B2
Authority
JP
Japan
Prior art keywords
plasma processing
vacuum
plasma
continuous
processing apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP55084923A
Other languages
Japanese (ja)
Other versions
JPS5718737A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP8492380A priority Critical patent/JPS5718737A/en
Priority to GB8118765A priority patent/GB2080611B/en
Priority to NO812087A priority patent/NO155990C/en
Priority to DK270081A priority patent/DK270081A/en
Priority to NL8102964A priority patent/NL8102964A/en
Priority to BE0/205154A priority patent/BE889306A/en
Priority to DE19813124280 priority patent/DE3124280A1/en
Priority to FR8112155A priority patent/FR2485319A1/en
Priority to SU813306857A priority patent/SU1039438A3/en
Priority to KR1019810002254A priority patent/KR840000727B1/en
Priority to AU72046/81A priority patent/AU547901B2/en
Priority to IT22492/81A priority patent/IT1136887B/en
Publication of JPS5718737A publication Critical patent/JPS5718737A/en
Publication of JPH0341496B2 publication Critical patent/JPH0341496B2/ja
Granted legal-status Critical Current

Links

Classifications

    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M10/00—Physical treatment of fibres, threads, yarns, fabrics, or fibrous goods made from such materials, e.g. ultrasonic, corona discharge, irradiation, electric currents, or magnetic fields; Physical treatment combined with treatment with chemical compounds or elements
    • D06M10/02—Physical treatment of fibres, threads, yarns, fabrics, or fibrous goods made from such materials, e.g. ultrasonic, corona discharge, irradiation, electric currents, or magnetic fields; Physical treatment combined with treatment with chemical compounds or elements ultrasonic or sonic; Corona discharge
    • D06M10/025—Corona discharge or low temperature plasma
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/14—Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16J—PISTONS; CYLINDERS; SEALINGS
    • F16J15/00—Sealings
    • F16J15/002—Sealings comprising at least two sealings in succession
    • F16J15/006—Sealings comprising at least two sealings in succession with division of the pressure
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16J—PISTONS; CYLINDERS; SEALINGS
    • F16J15/00—Sealings
    • F16J15/16—Sealings between relatively-moving surfaces
    • F16J15/168—Sealings between relatively-moving surfaces which permits material to be continuously conveyed
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H01J37/185—Means for transferring objects between different enclosures of different pressure or atmosphere
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/14—Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment
    • B29C2059/147—Low pressure plasma; Glow discharge plasma
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2001/00—Use of cellulose, modified cellulose or cellulose derivatives, e.g. viscose, as moulding material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2001/00—Use of cellulose, modified cellulose or cellulose derivatives, e.g. viscose, as moulding material
    • B29K2001/08—Cellulose derivatives
    • B29K2001/12—Cellulose acetate
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2007/00—Use of natural rubber as moulding material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2027/00—Use of polyvinylhalogenides or derivatives thereof as moulding material
    • B29K2027/06—PVC, i.e. polyvinylchloride
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2313/00—Use of textile products or fabrics as reinforcement
    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M2101/00—Chemical constitution of the fibres, threads, yarns, fabrics or fibrous goods made from such materials, to be treated
    • D06M2101/16—Synthetic fibres, other than mineral fibres
    • D06M2101/18—Synthetic fibres consisting of macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
    • D06M2101/22—Polymers or copolymers of halogenated mono-olefins
    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M2200/00—Functionality of the treatment composition and/or properties imparted to the textile material
    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M2200/00—Functionality of the treatment composition and/or properties imparted to the textile material
    • D06M2200/35—Abrasion, pilling or fibrillation resistance

Landscapes

  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Textile Engineering (AREA)
  • Treatment Of Fiber Materials (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Physical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Chemical Vapour Deposition (AREA)

Description

【発明の詳細な説明】 本発明はプラスチツクフイルム、たとえば塩化
ビニル系樹脂フイルム等のシート状被処理物を連
続的にプラズマ処理する装置に関するものであ
る。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an apparatus for continuously plasma-treating a sheet-like object such as a plastic film, such as a vinyl chloride resin film.

プラスチツク、特に塩化ビニル系樹脂フイルム
のプラズマ処理については、それにより可塑剤移
行防止、表面ぬれ性、帯電防止、ブロツキング防
止、印刷特性の向上、耐摩耗性、耐候性、耐汚染
性等有用な特性が賦与されることから、バツチ処
理等小スケールの装置で従来より行なわれてきた
が、工業的規模で行う場合には、種々の問題があ
つた。 Plasma treatment of plastics, especially vinyl chloride resin films, has useful properties such as prevention of plasticizer migration, surface wettability, antistatic, antiblocking, improved printing properties, abrasion resistance, weather resistance, and stain resistance. Because of this, it has traditionally been carried out using small-scale equipment such as batch processing, but when carried out on an industrial scale, there were various problems.

たとえば、バツチ連続処理装置についても、二
三提案されているが、軟質塩化ビニル系樹脂フイ
ルムのように、可塑剤、安定剤、その他の内部添
剤を含有している場合には、フイルム巻物を装置
内部にセツトし、初期圧力設定時にこれらの内部
添加剤な揮発、逸散によるフイルムの変質が起る
と同時に、この揮発分およびフイルム巻物中に共
存するガスの逸散により初期圧力設定までかなり
長時間を要するというような本質的欠点を有す
る。 For example, several continuous batch processing devices have been proposed, but in cases where the film contains plasticizers, stabilizers, and other internal additives, such as soft vinyl chloride resin films, film rolls cannot be used. When the initial pressure is set inside the device, the quality of the film changes due to the volatilization and dissipation of these internal additives, and at the same time, due to the dissipation of the volatile matter and the gas coexisting in the film roll, the initial pressure is set considerably. It has an essential drawback that it takes a long time.

通常低温プラズマ処理に関しては、真空処理室
の圧力を0.1トル以下まで下げることが処理効果
の上から好ましいものであるが、空気等の混入が
処理効果に悪影響をおよぼす場合には、上記問題
は致命的欠点となつてしまう。 Normally, for low-temperature plasma processing, it is preferable to lower the pressure in the vacuum processing chamber to 0.1 torr or less from the viewpoint of processing effectiveness, but if air etc. enters the processing effect, the above problem may be fatal. It becomes a disadvantage.

しかして、一般に低温プラズマ処理は圧力0.01
〜10トルの範囲で数ＫHz〜数百ＫHzの高周波電力
を印加することにより行われ、プラズマ発生のた
めに供給されるガスは目的とする処理特性に対応
して選択されるのであるが、この際均一な処理を
行うためには圧力が一定に保持されること、選択
されたガス以外のガスたとえば空気等の混入は極
力回避させること等が重要である。 However, in general, low-temperature plasma treatment is performed at a pressure of 0.01
This is done by applying high frequency power of several KHz to several hundred KHz in the range of ~10 Torr, and the gas supplied for plasma generation is selected according to the desired processing characteristics. In order to carry out uniform processing, it is important to maintain the pressure constant and to avoid mixing of gases other than the selected gas, such as air, as much as possible.

本発明者らは以上の点を考慮した上でプラスチ
ツクフイルムのようなシート状被処理物を連続的
に低温プラズマ処理するための装置を開発すべく
鋭意研究の結果、本発明を完成した。 The present inventors took the above points into consideration and completed the present invention as a result of intensive research to develop an apparatus for continuous low-temperature plasma treatment of sheet-like objects such as plastic films.

すなわち、本発明は真空プラズマ処理槽に被処
理物導入用予備真空室と被処理物送り出し用予備
真空室とを接続したプラズマ連続処理装置におい
て、前記被処理物導入用予備真空室と被処理物送
り出し用予備真空室とのそれぞれを、シールロー
ルとこのシールロールを収納するハウジングとに
よつて形成し、前記真空プラズマ処理槽内に被処
理物の導入および送り出し方向と交差する方向に
陰電極と陽電極とをそれぞれ片持ち支持で設け、
その反対側の真空プラズマ処理槽の壁を開閉自在
な開閉扉としたことを特徴とするプラズマ連続処
理装置に関するものである。 That is, the present invention provides a plasma continuous processing apparatus in which a vacuum plasma processing tank is connected with a preliminary vacuum chamber for introducing a workpiece and a preliminary vacuum chamber for sending out a workpiece, in which the preliminary vacuum chamber for introducing a workpiece and a preliminary vacuum chamber for sending out a workpiece are connected to a vacuum plasma processing tank. A preliminary vacuum chamber for sending out is formed by a seal roll and a housing for storing the seal roll, and a negative electrode and a Each positive electrode is provided with cantilever support,
The present invention relates to a continuous plasma processing apparatus characterized in that the wall of the vacuum plasma processing tank on the opposite side has a door that can be opened and closed.

本発明が提案するプラズマ連続処理装置におい
ては、被処理フイルムはその導入用予備真空室を
経て真空プラズマ処理槽へ連続的に供給され、か
つ短時間に処理されるために可塑剤等内部添加剤
の揮発等による逸散もなく、また前に述べたよう
なフイルム中に共存する空気等ガスによる悪影響
も生じない。 In the plasma continuous processing apparatus proposed by the present invention, the film to be processed is continuously supplied to the vacuum plasma processing tank via the preliminary vacuum chamber for introduction, and internal additives such as plasticizers are added to the film to be processed in a short time. There is no dissipation due to volatilization, etc., and there is no adverse effect caused by gases such as air coexisting in the film as described above.

さらにまた、本発明が提案するプラズマ連続処
理装置はエアーツウエアー（Air to Air）方式
で連続的に処理されるために、フイルム、シート
等の一般的な連続製造装置であるカレンダー、押
出機等の製造ラインに直結可能であり、低コスト
での大量処理を可能にするものである。 Furthermore, since the continuous plasma processing apparatus proposed by the present invention performs continuous processing using an air-to-air method, it is possible to use a calendar, an extruder, etc., which are common continuous manufacturing apparatuses for films, sheets, etc. It can be directly connected to the production line, making it possible to process large quantities at low cost.

以下本発明にかかわるプラズマ連続処理装置を
図面に基づいて詳しく説明する。 DESCRIPTION OF THE PREFERRED EMBODIMENTS The plasma continuous processing apparatus according to the present invention will be explained in detail below based on the drawings.

第１図は本発明になるプラズマ連続処理装置の
概略縦断面図であり、第２図は概略平面図をそれ
ぞれ示したものである。 FIG. 1 is a schematic vertical sectional view of a continuous plasma processing apparatus according to the present invention, and FIG. 2 is a schematic plan view.

それら図面において、１はプラツスチツクフイ
ルム等のシート状被処理物を連続的にプラズマ処
理する真空プラズマ処理槽を示し、この真空プラ
ズマ処理槽は接続する真空ポンプ４により排気管
５を通じて真空排気される。 In these drawings, reference numeral 1 indicates a vacuum plasma processing tank for continuously plasma processing sheet-like processing objects such as plastic films, and this vacuum plasma processing tank is evacuated through an exhaust pipe 5 by a connected vacuum pump 4. Ru.

この真空プラズマ処理槽１はその前後に設置さ
れた被処理物導入用予備真空室２、および被処理
物送り出し用予備真空室３によつてシールされ、
目的とする0.01〜10トルの真空圧力に制御され
る。 This vacuum plasma processing tank 1 is sealed by a preliminary vacuum chamber 2 for introducing the processed material and a preliminary vacuum chamber 3 for sending out the processed material, which are installed before and after the tank.
The desired vacuum pressure is controlled between 0.01 and 10 torr.

上記被処理物の導入および送り出し用の予備真
空室はそれぞれ上下一対のロールおよびハウジン
グからなるシール室２ａ，２ｂ，２ｃおよび３
ａ，３ｂ，３ｃによつて構成されている。これら
の予備真空室におけるそれぞれのシール室は真空
プラズマ処理槽１から見て同一位置にある２ａ−
３ａ，２ｂ−３ｂおよび２ｃ−３ｃをそれぞれ一
対として独立の真空ポンプ６，８，１０による排
気管７，９，１１を通じて真空排気され、大気圧
より段階的に圧力を減じて真空プラズマ処理槽１
内の圧力を0.01〜10トルの所定圧力に保持するの
を助ける。 The preliminary vacuum chambers for introducing and sending out the objects to be processed are seal chambers 2a, 2b, 2c and 3 each consisting of an upper and lower pair of rolls and a housing.
It is composed of a, 3b, and 3c. Each of the seal chambers in these preliminary vacuum chambers is located at the same position as viewed from the vacuum plasma processing tank 1.
3a, 2b-3b and 2c-3c are each paired as a pair and are evacuated through exhaust pipes 7, 9, 11 by independent vacuum pumps 6, 8, 10, and the pressure is gradually reduced from atmospheric pressure to form a vacuum plasma processing tank 1.
Helps maintain the pressure inside at a predetermined pressure of 0.01 to 10 torr.

処理されるプラスチツクフイルムＦは巻出装置
１２より被処理物導入用予備真空室２を経て真空
プラズマ処理槽１へ送られ、そこでプラズマ処理
された後、被処理物送り出し用予備真空室３を経
て巻取装置１３で巻取られている。 The plastic film F to be processed is sent from the unwinding device 12 to the vacuum plasma processing tank 1 via the preliminary vacuum chamber 2 for introducing the workpiece, and after being plasma-treated there, it passes through the preliminary vacuum chamber 3 for sending out the workpiece. It is wound up by a winding device 13.

もちろん、当該連続装置をカレンダー、押出機
等の他の被処理物の製造加工ラインに直結する場
合は巻出装置１２を使用せずに直接被処理物導入
用予備真空室２に送り込まれる。 Of course, when the continuous device is directly connected to a production line for other processing objects such as a calender or an extruder, the unwinding device 12 is not used and the processing object is directly fed into the preliminary vacuum chamber 2 for introducing the processing object.

シールロール２−１〜２−４、および３−１〜
３−４、および真空プラズマ処理槽内のドラム陰
電極および巻取装置駆動のための動力は駆動モー
ター１４に直結するラインシヤフト１５を介して
伝達され、回転速度は変速機１６，１７，１８，
２２により調整される。 Seal rolls 2-1 to 2-4, and 3-1 to
3-4, and the power for driving the drum cathode and winding device in the vacuum plasma processing tank are transmitted via a line shaft 15 directly connected to a drive motor 14, and the rotational speed is controlled by transmissions 16, 17, 18,
22.

本発明の装置によるプラズマ処理はづぎのよう
に行われる。 Plasma treatment using the apparatus of the present invention is performed as follows.

すなわち、被処理物導入用予備真空室２を通じ
て真空プラズマ処理槽１内に導入されたプラスチ
ツクフイルムＦは、ガイドロール１９を介して陰
極としての処理ドラム２０へ導かれ、処理ロール
上に配列された複数本の陽電極２１との間で形成
されるプラズマによつて処理される。 That is, the plastic film F introduced into the vacuum plasma processing tank 1 through the preliminary vacuum chamber 2 for introducing the processed material is guided to the processing drum 20 as a cathode via the guide roll 19, and arranged on the processing roll. The treatment is performed by plasma formed between the plurality of positive electrodes 21.

本発明の特徴とするところは、第３図に示され
る如く処理ドラム２０、ガイドロール１９、陽電
極２１等の作動系部分をすべて一方の側板上に片
持で設置し、他方の側板を開閉扉としたことにあ
る。 The feature of the present invention is that the processing drum 20, guide roll 19, positive electrode 21, and other operating system parts are all cantilevered on one side plate, and the other side plate can be opened and closed. It's because it's a door.

このような構造による利点は次のとおりであ
る。第一の利点として作業性が著しくすぐれてい
ることである。すなわち、フイルム等の被処理物
を送給する場合、最初の段階では、手作業によつ
てフイルムをセツトする必要があるが、これらの
送膜作業が容易であること、さらに装置内面の洗
浄、掃除が容易に行える等の利点があげられる。 The advantages of such a structure are as follows. The first advantage is that it is extremely easy to work with. That is, when feeding an object to be processed such as a film, it is necessary to manually set the film at the first stage, but this film feeding operation is easy, and the inner surface of the device is cleaned and Advantages include ease of cleaning.

第二の利点としては、同一真空処理槽を用いて
フイルムの表面処理または裏面処理が可能となる
ことがあげられる。すなわち、第３図に示される
ように陰極ドラム２０、陽電極２１、ガイドロー
ル１９等の作動部分がすべて一方の側板２３上に
片持で設置されていために、側板を回転させる構
造とすることが可能となる。 A second advantage is that it is possible to perform surface treatment or back surface treatment of the film using the same vacuum treatment tank. That is, as shown in FIG. 3, the operating parts such as the cathode drum 20, anode 21, and guide roll 19 are all cantilevered on one side plate 23, so the structure is such that the side plate can be rotated. becomes possible.

第４図は、２つの真空処理槽を並べた例である
が、ここに示される真空プラズマ処理槽１は通常
の配置であり、真空プラズマ処理槽１′は側板を
180度回転させることによつて行われる作動部分
の配置を示す。このようにすることによつてフイ
ルムの両面をプラズマ処理することができる。も
ちろん、真空処理槽１と真空処理槽１′とを同様
な配置に設定して処理を行うことも可能であり、
この場合フイルムの同一面を２度にわたつて処理
することができるために、一槽の場合に比較して
処理速度を２倍にすることができる。 Figure 4 shows an example of two vacuum processing tanks arranged side by side.The vacuum plasma processing tank 1 shown here has a normal arrangement, and the vacuum plasma processing tank 1' has a side plate.
Figure 2 shows the positioning of the working part by rotating it by 180 degrees. By doing so, both sides of the film can be plasma-treated. Of course, it is also possible to perform the process by setting the vacuum processing tank 1 and the vacuum processing tank 1' in the same arrangement,
In this case, since the same side of the film can be processed twice, the processing speed can be doubled compared to the case of one tank.

このように、本発明が提供する真空プラズマ処
理槽の構造は、作動部分を保持した側面２３を回
転することにより、処理すべきフイルムのどちら
の面でも処理可能であり、装置に多様性を賦与す
ることができる。 As described above, the structure of the vacuum plasma processing tank provided by the present invention allows processing on either side of the film to be processed by rotating the side surface 23 holding the operating part, giving versatility to the apparatus. can do.

また第３図に示される陽電極２１および処理ド
ラム２０は冷却水を流すことによつて温調可能で
あり、目的とする処理に合せて所定の温度に設定
される。 Furthermore, the temperatures of the anode 21 and the processing drum 20 shown in FIG. 3 can be controlled by flowing cooling water, and are set at a predetermined temperature in accordance with the intended processing.

以上にのべた如く、当発明が提案する連続処理
装置は、プラズマ処理槽の真空度を当発明が目的
とするプラズマ処理を行うに必要な0.01〜10トル
に保持することを可能にすると共に、同一装置を
使用してフイルムのどちらの面でも処理すること
を可能にするものであり、Air to Air方式とし
ては画期的な連続処理装置である。 As described above, the continuous processing apparatus proposed by the present invention makes it possible to maintain the degree of vacuum in the plasma processing tank at 0.01 to 10 Torr, which is necessary for performing the plasma processing aimed at by the present invention. It is a revolutionary continuous processing device for air-to-air technology, making it possible to process either side of the film using the same device.

なお、図面に示した装置は本発明の一態様を例
示したものであり、本発明はこれに限定されるも
のではない。 Note that the apparatus shown in the drawings is an example of one embodiment of the present invention, and the present invention is not limited thereto.

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は本発明のプラズマ連続処理装置の概略
縦断面図、第２図は概略平面図をぞれぞれ示す。
また第３図は真空プラズマ処理槽の側断面図、第
４図は真空プラズマ処理槽を２つ並べた場合をそ
れぞれ示す。 １……真空プラズマ処理槽、２……被処理物導
入用予備真空室、３……被処理物送り出し用予備
真空室、４，６，８，１０……真空ポンプ、５，
７，９，１１……排気管、１２……巻出装置、１
３……巻取装置、１４……駆動モーター、１５…
…ラインシヤフト、１６，１７，１８……変速
機、１９……ガイドロール、２０……処理ドラ
ム、２１……陽電極、２３……側板、２−１〜２
−４および３−１〜３−４……シールロール。 FIG. 1 is a schematic vertical sectional view of a plasma continuous processing apparatus of the present invention, and FIG. 2 is a schematic plan view.
Further, FIG. 3 is a side sectional view of the vacuum plasma processing tank, and FIG. 4 shows a case where two vacuum plasma processing tanks are arranged side by side. DESCRIPTION OF SYMBOLS 1... Vacuum plasma processing tank, 2... Preliminary vacuum chamber for introducing the processed material, 3... Preliminary vacuum chamber for sending out the processed material, 4, 6, 8, 10... Vacuum pump, 5,
7,9,11...exhaust pipe, 12...unwinding device, 1
3... Winding device, 14... Drive motor, 15...
... Line shaft, 16, 17, 18 ... Transmission, 19 ... Guide roll, 20 ... Processing drum, 21 ... Positive electrode, 23 ... Side plate, 2-1 to 2
-4 and 3-1 to 3-4...Seal roll.

Claims (1)

【特許請求の範囲】 １ 真空プラズマ処理槽に被処理物導入用予備真
空室と被処理物送り出し用予備真空室とを接続し
たプラズマ連続処理装置において、前記被処理物
導入用予備真空室と被処理物送り出し用予備真空
室とのそれぞれを、シールロールとこのシールロ
ールを収納するハウジングとによつて形成し、前
記真空プラズマ処理槽内に被処理物の導入および
送り出し方向と交差する方向に陰電極と陽電極と
をそれぞれ片持ち支持で設け、その反対側の真空
プラズマ処理槽の壁を開閉自在な開閉扉としたこ
とを特徴とするプラズマ連続処理装置。 ２ 前記真空プラズマ処理槽内の陰電極と陽電極
とを支持した側板を、180゜軸回転できる構造にし
たことを特徴とする特許請求の範囲第１項記載の
プラズマ連続処理装置。 ３ 前記真空プラズマ処理槽を２基直列につな
ぎ、陰電極と陽電極とを支持した側板を他の１基
のそれに対し、180゜軸回転した位置に設定し、こ
の一対の真空プラズマ処理槽を通すことにより、
被処理物を表裏処理できるようにしたことを特徴
とする特許請求の範囲第１項記載のプラズマ連続
処理装置。 ４ 前記真空プラズマ処理槽内の陰電極と陽電極
とに内部冷却機構を設置し、それぞれ温度コント
ロールすることを特徴とする特許請求の範囲第１
項記載のプラズマ連続処理装置。 ５ 前記真空プラズマ処理槽内の一方の側に真空
排気管を設け、他方の側にガス導入分配管を１本
以上設けたことを特徴とする特許請求の範囲第１
項記載のプラズマ連続処理装置。 ６ 巻出装置、巻取装置、被処理物導入用および
被処理物送り出し用予備真空室、真空プラズマ処
理槽等の各駆動系をモーターに直結したラインシ
ヤフトにより変速機を介して駆動することを特徴
とする特許請求の範囲第１項記載のプラズマ連続
処理装置。[Scope of Claims] 1. In a continuous plasma processing apparatus in which a preliminary vacuum chamber for introducing a workpiece and a preliminary vacuum chamber for sending out a workpiece are connected to a vacuum plasma processing tank, the preliminary vacuum chamber for introducing a workpiece and a preliminary vacuum chamber for sending out a workpiece Each of the preliminary vacuum chambers for sending out the processed material is formed by a seal roll and a housing that accommodates the seal roll, and a shadow is provided in a direction intersecting the introduction and delivery direction of the processed material into the vacuum plasma processing tank. A plasma continuous processing apparatus characterized in that an electrode and a positive electrode are each provided with cantilever support, and the wall of the vacuum plasma processing tank on the opposite side is a door that can be opened and closed. 2. The continuous plasma processing apparatus according to claim 1, wherein the side plate supporting the negative electrode and the positive electrode in the vacuum plasma processing tank has a structure capable of rotating around an axis of 180 degrees. 3 Connect two of the vacuum plasma processing tanks in series, set the side plate supporting the negative electrode and the positive electrode at a position rotated by 180 degrees relative to that of the other one, and connect this pair of vacuum plasma processing tanks. By passing
2. The continuous plasma processing apparatus according to claim 1, wherein the plasma continuous processing apparatus is capable of processing both sides of a workpiece. 4. Claim 1, characterized in that an internal cooling mechanism is installed in the negative electrode and the positive electrode in the vacuum plasma processing tank to control the temperature of each.
The plasma continuous processing apparatus described in Section 1. 5. Claim 1, characterized in that a vacuum exhaust pipe is provided on one side of the vacuum plasma processing tank, and one or more gas introduction distribution pipes are provided on the other side.
The plasma continuous processing apparatus described in Section 1. 6. Drive systems such as the unwinding device, the winding device, the preliminary vacuum chamber for introducing and sending out the processed material, the vacuum plasma processing tank, etc., are driven by a line shaft directly connected to a motor via a transmission. A plasma continuous processing apparatus according to claim 1, characterized in that:
JP8492380A 1980-06-21 1980-06-21 Apparatus for continuous plasma treatment Granted JPS5718737A (en)

Priority Applications (12)

Application Number Priority Date Filing Date Title
JP8492380A JPS5718737A (en) 1980-06-21 1980-06-21 Apparatus for continuous plasma treatment
GB8118765A GB2080611B (en) 1980-06-21 1981-06-18 An apparatus for continuous treatment of a continuous-length material with low temperature plasma
NO812087A NO155990C (en) 1980-06-21 1981-06-19 DEVICE FOR CONTINUOUS TREATMENT OF A LOW TEMPERATURE PLASMA MOVIE MATERIAL.
DK270081A DK270081A (en) 1980-06-21 1981-06-19 DEVICE FOR TREATING A MOVIE MATERIAL MATERIAL WITH LOW TEMPERATURE PLASMA
NL8102964A NL8102964A (en) 1980-06-21 1981-06-19 DEVICE FOR CONTINUOUSLY TREATMENT OF LONG-TERM FILM MATERIAL WITH LOW TEMPERATURE PLASMA.
BE0/205154A BE889306A (en) 1980-06-21 1981-06-19 APPARATUS FOR THE CONTINUOUS PROCESSING OF A MATERIAL OF LONG CONTINUOUS LENGTH BY A LOW TEMPERATURE PLASMA
DE19813124280 DE3124280A1 (en) 1980-06-21 1981-06-19 Device for the continuous treatment of a web material in a cold plasma
FR8112155A FR2485319A1 (en) 1980-06-21 1981-06-19 INSTALLATION FOR THE CONTINUOUS PROCESSING OF EQUIPMENT OF UNDEFINED LENGTH WITH LOW TEMPERATURE PLASMA
SU813306857A SU1039438A3 (en) 1980-06-21 1981-06-19 Apparatus for continuous treatment of film material
KR1019810002254A KR840000727B1 (en) 1980-06-21 1981-06-20 An apparatus for continuous treatment of a continuous-length material with low temperature-plasma
AU72046/81A AU547901B2 (en) 1980-06-21 1981-06-22 Treating with low temp. plasma
IT22492/81A IT1136887B (en) 1980-06-21 1981-06-22 EQUIPMENT FOR THE CONTINUOUS TREATMENT OF A MATERIAL OF CONTINUOUS LENGTH WITH LOW TEMPERATURE PLASMA

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8492380A JPS5718737A (en) 1980-06-21 1980-06-21 Apparatus for continuous plasma treatment

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP12386090A Division JPH03267138A (en) 1990-05-14 1990-05-14 Vacuum processing equipment

Publications (2)

Publication Number Publication Date
JPS5718737A JPS5718737A (en) 1982-01-30
JPH0341496B2 true JPH0341496B2 (en) 1991-06-24

Family

ID=13844216

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8492380A Granted JPS5718737A (en) 1980-06-21 1980-06-21 Apparatus for continuous plasma treatment

Country Status (12)

Country Link
JP (1) JPS5718737A (en)
KR (1) KR840000727B1 (en)
AU (1) AU547901B2 (en)
BE (1) BE889306A (en)
DE (1) DE3124280A1 (en)
DK (1) DK270081A (en)
FR (1) FR2485319A1 (en)
GB (1) GB2080611B (en)
IT (1) IT1136887B (en)
NL (1) NL8102964A (en)
NO (1) NO155990C (en)
SU (1) SU1039438A3 (en)

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Also Published As

Publication number Publication date
DK270081A (en) 1981-12-22
NO155990C (en) 1987-07-01
FR2485319A1 (en) 1981-12-24
NO812087L (en) 1981-12-22
GB2080611A (en) 1982-02-03
JPS5718737A (en) 1982-01-30
AU547901B2 (en) 1985-11-14
NO155990B (en) 1987-03-23
GB2080611B (en) 1984-06-20
BE889306A (en) 1981-10-16
KR830006025A (en) 1983-09-17
SU1039438A3 (en) 1983-08-30
IT8122492A0 (en) 1981-06-22
IT1136887B (en) 1986-09-03
AU7204681A (en) 1982-01-07
DE3124280A1 (en) 1982-05-27
NL8102964A (en) 1982-01-18
KR840000727B1 (en) 1984-05-24
FR2485319B1 (en) 1985-01-04

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