JPH03277980A - Magnetoresistance element measuring apparatus - Google Patents
Magnetoresistance element measuring apparatusInfo
- Publication number
- JPH03277980A JPH03277980A JP2079349A JP7934990A JPH03277980A JP H03277980 A JPH03277980 A JP H03277980A JP 2079349 A JP2079349 A JP 2079349A JP 7934990 A JP7934990 A JP 7934990A JP H03277980 A JPH03277980 A JP H03277980A
- Authority
- JP
- Japan
- Prior art keywords
- unit
- magnetic field
- probe
- magnetized
- constant state
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Testing Electric Properties And Detecting Electric Faults (AREA)
- Measuring Magnetic Variables (AREA)
- Measurement Of Resistance Or Impedance (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は磁気抵抗素子(以下MR素子と称す)の電気的
特性を測定する磁気抵抗素子測定装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a magnetoresistive element measuring device for measuring the electrical characteristics of a magnetoresistive element (hereinafter referred to as an MR element).
・〔従来の技術〕
従来の磁気抵抗素子測定装置は、MR素子の表面に形成
された磁性体薄膜パターンの電気抵抗値を測定し、規格
に合致しているか否かによって良否判定を行っている。・[Prior art] Conventional magnetoresistive element measuring devices measure the electrical resistance value of a magnetic thin film pattern formed on the surface of an MR element, and determine whether it meets standards or not. .
上述した従来の磁気抵抗素子測定装置では、MR素子が
製造工程中に各種製造装置等から発生する磁界を受け、
Ni、Fe、Co等及びこれらの合金の磁性体材料で形
成されるMR素子の薄膜パターンか着磁されたままの状
態で電気的特性の測定を行っている。この着磁状態が常
に一定の状態であれば問題はないが、実際にはMR素子
が組立、製造試験、および出荷検査I\と移動する間に
、環境磁界により薄膜パターンの着磁状態が変化する。In the conventional magnetoresistive element measuring device described above, the MR element receives a magnetic field generated from various manufacturing devices during the manufacturing process,
The electrical characteristics of a thin film pattern of an MR element formed of a magnetic material such as Ni, Fe, Co, or an alloy thereof are measured in a magnetized state. There is no problem if this magnetized state is always constant, but in reality, the magnetized state of the thin film pattern changes due to the environmental magnetic field while the MR element moves during assembly, manufacturing testing, and shipping inspection. do.
又、客先へ納入する間に着磁状態が変化する等、あらゆ
る環境でMR素子に対する磁界が生じており、このため
製造試験での電気的特性値と、出荷検査や客先での受入
検査等で測定した特性値との間に差異が生じるという欠
点があった。In addition, magnetic fields are generated for the MR element in various environments such as the magnetization state changing during delivery to the customer, and therefore the electrical characteristic values during manufacturing tests and shipping inspections and acceptance inspections at the customer site are subject to change. There was a drawback that there was a difference between the characteristic values measured by the method and the like.
本発明の磁気抵抗素子測定装置は、一定方向の磁界を発
生して磁気抵抗素子を一定状態に着磁させる磁界印加部
と、前記磁気抵抗素子にプローブを接触させて電気特性
を測定する電気特性測定部とを備えている。The magnetoresistive element measuring device of the present invention includes a magnetic field application unit that generates a magnetic field in a certain direction to magnetize the magnetoresistive element in a fixed state, and an electrical property that measures the electrical property by bringing a probe into contact with the magnetoresistive element. It is equipped with a measuring section.
次に本発明について図面を参照して説明する。 Next, the present invention will be explained with reference to the drawings.
第1図は本発明の一実施例の斜視図であり、第2図はM
R素子との位置関係を示す図である。第1図において、
一定方向の磁界を発生するための磁石2を設けた磁界印
加部1、MR素子の外部リードに接触するようにプロー
ブ4を配設したプローブ部3、プローブ4と接続されて
MR素子の電気特性を測定する測定部5、複数のMR素
子が等間隔に連結されたリードフレームを収納するマガ
ジン6.7、リードフレームに連結されたMR素子をガ
イドレール8に沿って1ピツチずつ移動させる搬送機構
9,10およびマガジン駆動部11゜12を備えている
。第2図において、MR素子21は搬送用孔23を有す
るリードフレーム22に連結されており、搬送機f#1
9,10によって1ピツチずつ磁界印加部1およびプロ
ーブ部3の下を移動・停止を繰返しながらマガジン6か
らマガジン7へ搬送される。磁界印加部1およびプロー
ブ部3は、搬送機構9.10と連動しており、リードフ
レーム22か移動する際は、MR素子21と磁界印加部
1の磁石2との間隙が一定でかつ、同しスピードで移動
・停止し、更にプローブ部3のプローブ4が下降しMR
素子21の4本の外部リード24にそれぞれ接触して測
定を開始するときには、磁石2の磁界がプローブ部3で
測定中のMR素子に影響を与えない高さまで磁界印加部
1が退避する機構となっている。このようにしてMR素
子製造工程中に色々な状態に着磁されたMR素子の磁性
体薄膜材料を、電気特性測定直前に一定状態に着磁して
から測定を行う。FIG. 1 is a perspective view of an embodiment of the present invention, and FIG. 2 is a perspective view of an embodiment of the present invention.
It is a figure which shows the positional relationship with R element. In Figure 1,
A magnetic field applying part 1 is provided with a magnet 2 for generating a magnetic field in a certain direction, a probe part 3 is provided with a probe 4 so as to contact the external lead of the MR element, and is connected to the probe 4 to determine the electrical characteristics of the MR element. a measuring unit 5 for measuring MR elements, a magazine 6.7 for storing a lead frame in which a plurality of MR elements are connected at equal intervals, and a transport mechanism for moving the MR elements connected to the lead frame one pitch at a time along a guide rail 8. 9, 10 and magazine drive sections 11 and 12. In FIG. 2, the MR element 21 is connected to a lead frame 22 having a conveyance hole 23, and the MR element 21 is connected to a conveyor f#1.
9 and 10, each pitch is conveyed from the magazine 6 to the magazine 7 while repeatedly moving and stopping under the magnetic field applying section 1 and the probe section 3. The magnetic field application section 1 and the probe section 3 are linked with a transport mechanism 9.10, and when the lead frame 22 is moved, the gap between the MR element 21 and the magnet 2 of the magnetic field application section 1 is constant and the same. The probe 4 of the probe unit 3 descends and the MR
When contacting each of the four external leads 24 of the element 21 to start measurement, the magnetic field applying part 1 is retracted to a height where the magnetic field of the magnet 2 does not affect the MR element being measured by the probe part 3. It has become. The magnetic thin film material of the MR element, which has been magnetized in various states during the MR element manufacturing process in this way, is magnetized to a constant state immediately before measuring the electrical characteristics, and then the measurement is performed.
第3図(a)、(b)はMR素子の電気的特性の測定再
現性を調査した結果を示す図であり、横軸は第1回目の
測定値、縦軸は第2回目の測定値として相関関係を示し
ている。同図(a)は本発明のMR素子測定装置を使用
した場合であり、同図(b)は従来のMR素子測定装置
を使用した場合である。同図(a)と(b)とを比較す
ると、本発明のMR素子測定装置による測定値の再現性
がよいことがわかる。なお、本実施例では磁界印加部1
に2ケの磁石2を設けているが、これは確実に一定状態
に着磁させるためであり、磁石2は少なくとも1つあれ
ばよい。Figures 3 (a) and (b) are diagrams showing the results of investigating the measurement reproducibility of the electrical characteristics of the MR element, where the horizontal axis is the first measurement value and the vertical axis is the second measurement value. The correlation is shown as . FIG. 4(a) shows the case where the MR element measuring apparatus of the present invention is used, and FIG. 2(b) shows the case when the conventional MR element measuring apparatus is used. Comparing FIGS. 2A and 2B, it can be seen that the reproducibility of the measured values by the MR element measuring apparatus of the present invention is good. Note that in this embodiment, the magnetic field applying section 1
Although two magnets 2 are provided in this case, this is to ensure that the magnets are magnetized in a constant state, and at least one magnet 2 is sufficient.
以上説明したように本発明は、MR素子を一定状態に着
磁させる磁界印加部を備えることによって、製造工程お
よび保管中に環境磁界の影響でMR素子の磁性体薄膜材
料が着磁されていても、一定の状態に着磁してから電気
特性を測定する事が出来るので、MR素子の特性の測定
再現性が向上し品質を安定化できる。As explained above, the present invention includes a magnetic field application unit that magnetizes the MR element in a constant state, thereby preventing the magnetic thin film material of the MR element from being magnetized by the influence of the environmental magnetic field during the manufacturing process and storage. Also, since the electrical characteristics can be measured after magnetizing to a certain state, the reproducibility of measuring the characteristics of the MR element can be improved and the quality can be stabilized.
第1図は本発明の一実施例の斜視図、第2図はMR素子
との位置関係を示す図、第3図(a)。
(b)はMR素子の電気的特性の測定再現性を示す図で
ある。
1・・・磁界印加部、2・・・磁石、3・・・プローブ
部、4・・・プローブ、5・・・測定部、6.7・・・
マガジン、8・・・ガイドレール、9.lO・・・搬送
機構、11゜12・・・マガジン駆動部、21・・・磁
気抵抗素子(MR素子)、22・・・リードフレーム、
23・・・搬送用孔、24・・・MR素子の外部リード
。FIG. 1 is a perspective view of one embodiment of the present invention, FIG. 2 is a diagram showing the positional relationship with an MR element, and FIG. 3(a). (b) is a diagram showing the measurement reproducibility of the electrical characteristics of the MR element. DESCRIPTION OF SYMBOLS 1... Magnetic field application part, 2... Magnet, 3... Probe part, 4... Probe, 5... Measuring part, 6.7...
Magazine, 8... Guide rail, 9. lO...Transportation mechanism, 11°12...Magazine drive unit, 21...Magnetic resistance element (MR element), 22...Lead frame,
23... Conveyance hole, 24... External lead of MR element.
Claims (1)
磁させる磁界印加部と、前記磁気抵抗素子にプローブを
接触させて電気特性を測定する電気特性測定部とを備え
ることを特徴とする磁気抵抗素子測定装置。It is characterized by comprising: a magnetic field application section that generates a magnetic field in a certain direction to magnetize the magnetoresistive element in a fixed state; and an electrical property measuring section that measures the electrical properties by bringing a probe into contact with the magnetoresistive element. Magnetoresistive element measuring device.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2079349A JP2630008B2 (en) | 1990-03-28 | 1990-03-28 | Magnetoresistance element measuring device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2079349A JP2630008B2 (en) | 1990-03-28 | 1990-03-28 | Magnetoresistance element measuring device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH03277980A true JPH03277980A (en) | 1991-12-09 |
JP2630008B2 JP2630008B2 (en) | 1997-07-16 |
Family
ID=13687426
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2079349A Expired - Lifetime JP2630008B2 (en) | 1990-03-28 | 1990-03-28 | Magnetoresistance element measuring device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2630008B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5618738A (en) * | 1994-03-14 | 1997-04-08 | Nippondenso Co., Ltd. | Manufacturing method for magnetoresistance elements |
US7345470B2 (en) * | 2004-07-09 | 2008-03-18 | Yamaha Corporation | Probe card and method for testing magnetic sensor |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03180756A (en) * | 1989-12-08 | 1991-08-06 | Nec Corp | Method for measuring electric resistance of magnetoresistive element on wafer |
-
1990
- 1990-03-28 JP JP2079349A patent/JP2630008B2/en not_active Expired - Lifetime
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03180756A (en) * | 1989-12-08 | 1991-08-06 | Nec Corp | Method for measuring electric resistance of magnetoresistive element on wafer |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5618738A (en) * | 1994-03-14 | 1997-04-08 | Nippondenso Co., Ltd. | Manufacturing method for magnetoresistance elements |
US7345470B2 (en) * | 2004-07-09 | 2008-03-18 | Yamaha Corporation | Probe card and method for testing magnetic sensor |
Also Published As
Publication number | Publication date |
---|---|
JP2630008B2 (en) | 1997-07-16 |
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