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JPH0258348A - Method of handling cleaning wafer of probing machine - Google Patents

Method of handling cleaning wafer of probing machine

Info

Publication number
JPH0258348A
JPH0258348A JP63209702A JP20970288A JPH0258348A JP H0258348 A JPH0258348 A JP H0258348A JP 63209702 A JP63209702 A JP 63209702A JP 20970288 A JP20970288 A JP 20970288A JP H0258348 A JPH0258348 A JP H0258348A
Authority
JP
Japan
Prior art keywords
wafer
cleaning
wafers
handling
box
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP63209702A
Other languages
Japanese (ja)
Other versions
JP2627787B2 (en
Inventor
Kinya Fujimura
藤村 欣也
Yasuyuki Iida
飯田 康行
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Seimitsu Co Ltd
Original Assignee
Tokyo Seimitsu Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Seimitsu Co Ltd filed Critical Tokyo Seimitsu Co Ltd
Priority to JP20970288A priority Critical patent/JP2627787B2/en
Publication of JPH0258348A publication Critical patent/JPH0258348A/en
Application granted granted Critical
Publication of JP2627787B2 publication Critical patent/JP2627787B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

PURPOSE:To enhance the efficiency of cleaning operation by using a cleaning wafer having substantially the same shape as that of a wafer, incorporating it in an elevator placing base, and handling the cleaning wafer according to a wafer supplying and recovering course. CONSTITUTION:As a cleaning wafer, a wafer having substantially the same shape as that of a wafer during handling is employed. A box 7 for containing the cleaning wafer 5 is provided on a placing base 3 of a cassette 2, contains it and is waited. In case of necessitating cleaning, the box 7 of the wafer 5 is lifted to the position of a pressing plate 4 to receive the wafer 5, to feed it to a belt 8, to set it on a wafer table by a suction conveyor 9 through the same route as that of a normal wafer, to then feed it to a position under an inspection contact stylus, and to vertically move it under the stylus, thereby performing the cleaning operation. It is again returned to a wafer supplying position through the route of the normal wafer, and contained in the box 7.

Description

【発明の詳細な説明】 〈産業上の利用分野〉 この発明は半導体製造の工程において、ウェハ上に楕成
された電子回路の性能を検査するプロービング機におい
て、ウェハ上の回路の電極に接触する触針先端をクリー
ニングするため、セラミックの板等、一般にクリーニン
グウェハと称せられるものの取扱方法に係るものである
[Detailed Description of the Invention] <Industrial Application Field> The present invention is applied to a probing machine that tests the performance of an electronic circuit formed on a wafer in the process of semiconductor manufacturing. The present invention relates to a method of handling a ceramic plate or the like, which is generally referred to as a cleaning wafer, in order to clean the tip of a stylus.

〈在米技術〉 触針の接触不良が発生したとき、プロービング機のウェ
ハ搬送経路外の領域に待機させであるクリーニングウェ
ハをウェハ搬送経路に送り出しプロービング部に設置し
、触針先端にクリーニングウェハを押し付けることによ
り針先の97レツシユを行なう。このときには止音の検
査を中止して、人手をもってウェハの代わりにクリーニ
ングウェハをウェハテーブル上に送り出し、触針をクリ
ーニングウェハ上で上下動させるクリーニング繰作を行
ない、操作後はクリーニングウェハの取出しを行なって
いた。クリーニング作業中は通常作業を休止するため、
作業能率が低下していた。
<U.S.-based technology> When a contact failure occurs with the stylus, a cleaning wafer is placed on standby in an area outside the wafer transport path of the probing machine, and the cleaning wafer is sent to the wafer transport path and placed in the probing section, and the cleaning wafer is placed on the tip of the stylus. 97 retrieval of the needle tip is performed by pressing. At this time, stop the sound stop inspection, manually feed a cleaning wafer onto the wafer table instead of the wafer, perform a cleaning operation by moving the stylus up and down on the cleaning wafer, and take out the cleaning wafer after the operation. I was doing it. Normal operations will be suspended during the cleaning process, so
Work efficiency was decreasing.

く本発明における問題解決方法〉 本発明においては、ウェハとほぼ同形のクリーニングウ
ェハを使用し、これをエレベータの載置台に収容してウ
ェハの供給、回収のコースに従ってクリーニングウェハ
を取扱うことにより、クリーング繰作を能率化しようと
するものである。
Method for Solving Problems in the Present Invention In the present invention, cleaning wafers having almost the same shape as the wafers are used, and the cleaning wafers are placed on an elevator platform and handled according to the wafer supply and recovery course. This is an attempt to streamline cropping.

くχ施例〉 第1図において、検査されるウェハはカセット2に多数
枚積にして(JJIに入れられて供給され、70−バの
供給位置のエレベータの載置台3にセットされ、カセッ
トから順次1枚ずつ押出し板によってベルト8の上に送
り出される。なお検査終了のウェハは供給中のカセット
の空の棚に入れられ、1つのカセットが終了するとカセ
ットを人手により、もしくは自動的に交換する方式が取
られている。 本発明においては、クリーニングウェハ
として、取扱中の17エハとほぼ同じ形状のものを使用
する。そしてカセット2の載置台3にクリーニングウェ
ハ5の収容箱7を設けて、この中に横に入れて待機させ
る。
EXAMPLE In FIG. 1, a large number of wafers to be inspected are stacked in a cassette 2 (JJI), set on the platform 3 of the elevator at the 70-bar supply position, and loaded from the cassette. The wafers are sent one by one onto the belt 8 by a pushing plate.The wafers that have been inspected are placed in the empty shelf of the cassette being supplied, and when one cassette is completed, the cassette is replaced manually or automatically. In the present invention, a cleaning wafer having almost the same shape as the 17 wafers being handled is used.A storage box 7 for cleaning wafers 5 is provided on the mounting table 3 of the cassette 2. Place it inside and wait.

そしてクリーニングの必要の際はクリーニングウェハ5
の収容箱7を押出し板4の位置まで上昇させ′C、クリ
ーニングウェハ5を受取りベルト8に送り出し、汁通の
ウェハと同じ経路を通り吸着搬送器9によりウエノ)テ
ーブル上にセットし、検査用触針の下の位置にまで送り
、触針の下でテーブルの上下動を行なってクリーニング
操作を実施する。そして再びウェハ供給位置に、普通の
ウェハの経路によって再びウェハ供給位置に戻してクリ
ーニングウェハ収容箱7に入れる。
And when cleaning is required, the cleaning wafer 5
The storage box 7 is raised to the position of the push-out plate 4'C, and the cleaning wafer 5 is delivered to the receiving belt 8, passed through the same route as the wafer for cleaning, and set on the wafer table by the suction conveyor 9 for inspection. The table is moved up and down under the stylus to carry out the cleaning operation. Then, the wafer is returned to the wafer supply position again through the normal wafer route and placed in the cleaning wafer storage box 7.

ここでクリーニングウェハは収容箱から、ウェハと同じ
コースを通ってテーブルに載せられ、かつ収容のコース
を通って収納されるので、通常のウェハとほぼ同形であ
ることが望ましい。
Here, since the cleaning wafer is placed on the table from the storage box through the same course as the wafer and is stored through the storage course, it is desirable that the cleaning wafer has approximately the same shape as a normal wafer.

く効果〉 これによってクリーニング操作が自動で行なうことが可
能となり、無人化稼動が可能となった。
Effectiveness> This has made it possible to perform cleaning operations automatically, making unmanned operation possible.

又、クリーニングウェハをエレベータのカセット台の下
に収容したため、プロービング磯の作業領域を小さくす
ることが出来た。
Furthermore, since the cleaning wafer was housed under the cassette table of the elevator, the working area of the probing shore could be reduced.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明を実施するための装置の概要を示す説明
図である。 1・・・ウェハ  2・・・カセット  3・・・エレ
ベータの載置台  4・・・押出し板  5・・・クリ
ーニングウェハ  8・・・受取りコンベアベルト  
9・・・ウェハ吸着搬送装置  7・・・クリーニング
ウェハ収容箱 第1図 特許出願人  株式会社 東京精密
FIG. 1 is an explanatory diagram showing an outline of an apparatus for carrying out the present invention. 1... Wafer 2... Cassette 3... Elevator mounting table 4... Extrusion plate 5... Cleaning wafer 8... Receiving conveyor belt
9...Wafer suction transport device 7...Cleaning wafer storage box Figure 1 Patent applicant Tokyo Seimitsu Co., Ltd.

Claims (1)

【特許請求の範囲】[Claims] (1)検査されるべきウェハの収容カセットを載置して
ウェハ供給の上下動を行なうエレベータのカセット台の
下にウェハとほぼ同形のクリーニングウェハを収容する
収容箱を設け、この中のクリーニングウェハを必要に応
じて通常のウェハのテーブルへの取扱コースに従って、
送り出し、検査位置まで進行させてクリーニング操作を
行ない、操作終了後はウェハ収納のコースに従って前記
の収容箱にクリーニングウェハを収納するプロービング
機のクリーニングウェハの取扱方法。
(1) A storage box for storing cleaning wafers of approximately the same shape as the wafers is provided below the cassette table of the elevator on which the storage cassettes for wafers to be inspected are mounted and the wafers are fed up and down, and the cleaning wafers inside If necessary, follow the normal wafer table handling course.
A method for handling cleaning wafers in a probing machine, in which the cleaning wafers are sent out, advanced to an inspection position, and cleaned, and after the operation is completed, the cleaning wafers are stored in the storage box according to the wafer storage course.
JP20970288A 1988-08-24 1988-08-24 Cleaning wafer storage device for probing machine Expired - Fee Related JP2627787B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20970288A JP2627787B2 (en) 1988-08-24 1988-08-24 Cleaning wafer storage device for probing machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20970288A JP2627787B2 (en) 1988-08-24 1988-08-24 Cleaning wafer storage device for probing machine

Publications (2)

Publication Number Publication Date
JPH0258348A true JPH0258348A (en) 1990-02-27
JP2627787B2 JP2627787B2 (en) 1997-07-09

Family

ID=16577222

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20970288A Expired - Fee Related JP2627787B2 (en) 1988-08-24 1988-08-24 Cleaning wafer storage device for probing machine

Country Status (1)

Country Link
JP (1) JP2627787B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6672819B1 (en) 1995-07-19 2004-01-06 Hitachi, Ltd. Vacuum processing apparatus and semiconductor manufacturing line using the same

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58185465A (en) * 1982-04-21 1983-10-29 株式会社豊田中央研究所 Water-resistant inorganic material
JPS6092836U (en) * 1983-11-30 1985-06-25 安藤電気株式会社 Cleaning wafer holding mechanism
JPS61116095A (en) * 1984-11-09 1986-06-03 Hitachi Ltd Electric fan
JPS61228611A (en) * 1985-04-03 1986-10-11 Canon Inc Wafer processing equipment

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58185465A (en) * 1982-04-21 1983-10-29 株式会社豊田中央研究所 Water-resistant inorganic material
JPS6092836U (en) * 1983-11-30 1985-06-25 安藤電気株式会社 Cleaning wafer holding mechanism
JPS61116095A (en) * 1984-11-09 1986-06-03 Hitachi Ltd Electric fan
JPS61228611A (en) * 1985-04-03 1986-10-11 Canon Inc Wafer processing equipment

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6672819B1 (en) 1995-07-19 2004-01-06 Hitachi, Ltd. Vacuum processing apparatus and semiconductor manufacturing line using the same
US6705828B2 (en) 1995-07-19 2004-03-16 Hitachi, Ltd. Vacuum processing apparatus and semiconductor manufacturing line using the same

Also Published As

Publication number Publication date
JP2627787B2 (en) 1997-07-09

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