JPH0214833A - Production of silica glass - Google Patents
Production of silica glassInfo
- Publication number
- JPH0214833A JPH0214833A JP16192588A JP16192588A JPH0214833A JP H0214833 A JPH0214833 A JP H0214833A JP 16192588 A JP16192588 A JP 16192588A JP 16192588 A JP16192588 A JP 16192588A JP H0214833 A JPH0214833 A JP H0214833A
- Authority
- JP
- Japan
- Prior art keywords
- gel
- silica glass
- morpholine
- sol
- cracks
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 30
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 claims abstract description 16
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 12
- 239000010703 silicon Substances 0.000 claims abstract description 12
- -1 silicon alkoxide Chemical class 0.000 claims abstract description 12
- 238000001035 drying Methods 0.000 claims abstract description 7
- 238000010304 firing Methods 0.000 claims 1
- 230000003301 hydrolyzing effect Effects 0.000 claims 1
- 239000000499 gel Substances 0.000 abstract description 26
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 10
- 238000000034 method Methods 0.000 abstract description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 abstract description 6
- 238000003980 solgel method Methods 0.000 abstract description 6
- 238000005336 cracking Methods 0.000 abstract description 4
- 238000001704 evaporation Methods 0.000 abstract description 2
- 230000008020 evaporation Effects 0.000 abstract description 2
- 239000000741 silica gel Substances 0.000 abstract description 2
- 229910002027 silica gel Inorganic materials 0.000 abstract description 2
- 239000000377 silicon dioxide Substances 0.000 abstract description 2
- 239000002904 solvent Substances 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 230000007062 hydrolysis Effects 0.000 description 3
- 238000006460 hydrolysis reaction Methods 0.000 description 3
- 239000011148 porous material Substances 0.000 description 3
- 238000005245 sintering Methods 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 238000004031 devitrification Methods 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 238000005187 foaming Methods 0.000 description 2
- 238000001879 gelation Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical class O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 2
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 2
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- OEYIOHPDSNJKLS-UHFFFAOYSA-N choline Chemical compound C[N+](C)(C)CCO OEYIOHPDSNJKLS-UHFFFAOYSA-N 0.000 description 1
- 229960001231 choline Drugs 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 239000003349 gelling agent Substances 0.000 description 1
- 239000012456 homogeneous solution Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000004071 soot Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
- C03C1/006—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Silicon Compounds (AREA)
- Glass Melting And Manufacturing (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は光学用、半導体工業用、電子工業用、理化学用
等に使用されるシリカガラスの製造法に関する。DETAILED DESCRIPTION OF THE INVENTION (Industrial Field of Application) The present invention relates to a method for producing silica glass used for optics, semiconductor industry, electronic industry, physics and chemistry, etc.
(従来の技術)
近年、シリカガラスの新たな製造法として注目をあびて
いるのが、ゾル−ゲル法である。(Prior Art) In recent years, the sol-gel method has been attracting attention as a new method for producing silica glass.
ゾル−ゲル法によるシリカガラスの製造法は次の通りで
ある。The method for producing silica glass using the sol-gel method is as follows.
一般式Si (OR) a (但しRはアルキル基を表
す)で示されるシリコンアルコキシド及び/又はその重
縮合物、例えば
(RO)*5i(O3i(OR))nO5i(OR)+
(n−0〜8 )に水(あらかじめ触媒として酸、アル
カリを加えておいてもよい)を加え、加水分解しシリカ
ヒドロシルとする。この時、シリコンアルコキシドと水
とが均一な系となる様に溶媒として適当なアルコールを
加えてもよい。このシリカゾル溶液を静置、昇温、ゲル
化剤添加等によりゲル化させる。Silicon alkoxide and/or its polycondensate represented by the general formula Si (OR) a (where R represents an alkyl group), such as (RO) *5i (O3i (OR)) nO5i (OR) +
Water (an acid or alkali may be added as a catalyst in advance) is added to (n-0 to 8) to hydrolyze it into silica hydrosil. At this time, an appropriate alcohol may be added as a solvent so that the silicon alkoxide and water form a homogeneous system. This silica sol solution is gelled by standing still, raising the temperature, adding a gelling agent, etc.
その後、ゲルを乾燥することによりシリカゲルとする。Thereafter, the gel is dried to obtain silica gel.
この乾燥ゲルを適当な雰囲気中で焼結することによりシ
リカガラスを得る。Silica glass is obtained by sintering this dried gel in a suitable atmosphere.
このゾル−ゲル法には以下の特長がある。This sol-gel method has the following features.
(113iCIa等を原料とする火炎加水分解等により
生成するスートを焼結してガラス化する従来の気相化学
蒸着法よりも低温で製造できるため、省エネルギーで低
コスト化できる。(Since it can be produced at a lower temperature than the conventional vapor phase chemical vapor deposition method in which the soot produced by flame hydrolysis or the like using 113iCIa as a raw material is sintered and vitrified, it can save energy and reduce costs.
(2)原料として液体状態で使用可能のため、精製が容
易に行え高純度化できる。(2) Since it can be used as a raw material in a liquid state, it can be easily purified and highly purified.
(3)室温で液相混合できるため、他成分と混合した場
合も均質かガラスができる。(3) Since liquid phase mixing is possible at room temperature, homogeneous glass can be produced even when mixed with other components.
このように種々の特長をもつゾル−ゲル法によるシリカ
ガラスの製造にもまだ未解決の問題が残されている。There are still unresolved problems in the production of silica glass by the sol-gel method, which has various advantages as described above.
特にゲルを乾燥する過程でゲルにクランクや割れが発生
し易く、モノリシックな大形の乾燥ゲルを歩留りよく製
造することが困難であるという問題である。クラックや
割れの発生する原因の一つにゲル乾燥時に水やアルコー
ル等の蒸発に伴いゲル中に応力が発生し、この応力がゲ
ルの強度より大きいとゲルはクランクや割れが発生する
と考えられている。またこの応力は次式
%式%
(ΔP一応力、r−表面張力、θ=ぬれ角、r−細孔径
)で表されるように、表面張力が大きい程また細孔径が
小さい程大きくなる。In particular, the problem is that the gel tends to crack or crack during the drying process, making it difficult to produce a large, monolithic dried gel with a high yield. One of the causes of cracks and cracks is that stress is generated in the gel as water, alcohol, etc. evaporate during gel drying, and it is thought that if this stress is greater than the strength of the gel, the gel will crack or crack. There is. Further, this stress increases as the surface tension increases and as the pore diameter decreases, as expressed by the following formula % (ΔP - stress, r - surface tension, θ = wetting angle, r - pore diameter).
そこでこのような割れやクラックを防止する方法として
、ゾル溶液中の水の量を多くしてゲル強度を上げる方法
、加水分解温度を高くして細孔径を大きくする方法など
の方策が講じられている。Therefore, as a method to prevent such cracks and cracks, measures have been taken such as increasing the amount of water in the sol solution to increase the gel strength, and increasing the hydrolysis temperature to increase the pore diameter. There is.
又、特開昭61−183129号公報には、割れやクラ
ンクを防止するため沸点が水より高い溶媒、例えばl−
ブタノール、l−ペンタノール、l−ヘキサノール、ト
ルエンをシリコンアルコキシドに添加する方法が提案さ
れている。In addition, JP-A-61-183129 discloses that a solvent with a boiling point higher than that of water, such as l-
A method has been proposed in which butanol, 1-pentanol, 1-hexanol, and toluene are added to silicon alkoxide.
(発明が解決しようとする課題)
しかしながら上記の方法ではいずれも十分に大きな乾燥
ゲル体を得るのは困難で、シリカガラス体となった時の
寸法があまり大きなものは得られなかった。(Problems to be Solved by the Invention) However, in all of the above methods, it was difficult to obtain a sufficiently large dry gel body, and it was not possible to obtain a silica glass body whose dimensions were very large.
本発明は、クランクや割れの発生しないシリカガラスの
製造を提供するものである。The present invention provides the production of silica glass without cracking or cracking.
(課題を解決するための手段)
本発明は、ゲル乾燥中、水やアルコール等の蒸発に伴っ
て発生する応力がクランクや割れの一因になるものと考
え、このような大きな応力の発生を回避するために、シ
リコンアルコキシドの溶媒として、モルホリン及び/又
はN−モルホリンを用いるものである。(Means for Solving the Problems) The present invention considers that stress generated due to evaporation of water, alcohol, etc. during gel drying is a cause of cracks and cracks, and the present invention aims to prevent the generation of such large stress. In order to avoid this, morpholine and/or N-morpholine is used as a solvent for silicon alkoxide.
本発明に用いるシリコンアルコキシドはシリコンアルコ
キシド単量体のみでなく重縮合物を用いてもよい、例え
ば
(C1130) ssi (OSi (OC113)
z)nO5i (OC113) 2 (n = 0〜8
)を挙げることができる。これらは一種でも複数でも
使用可能である。シリコンアルコキシドのアルキル基と
しては、メチル基、エチル基、プロピル基、ブチル基等
が好ましい。As the silicon alkoxide used in the present invention, not only silicon alkoxide monomers but also polycondensates may be used. For example, (C1130) ssi (OSi (OC113)
z) nO5i (OC113) 2 (n = 0 to 8
) can be mentioned. One or more of these can be used. As the alkyl group of silicon alkoxide, methyl group, ethyl group, propyl group, butyl group, etc. are preferable.
加水分解のために加える水は予め触媒として塩酸、硝酸
などの鉱酸、ギ酸、酢酸などの有機酸、また塩基として
アンモニアばかりでなくエチレンジアミンなどの有機塩
ボを加えておいても良い。To the water added for hydrolysis, mineral acids such as hydrochloric acid and nitric acid, organic acids such as formic acid and acetic acid as catalysts, and not only ammonia but also organic salts such as ethylenediamine as bases may be added in advance.
シリコンアルコキシドに添加するモルホリン及び/又は
N−モルホリンの添加量はシリコンアルコキシドに対し
て0.1〜5.0倍(モル比)が好ましい。また通常使
用されるエタノール等のアルコールを併用することもで
きる。さらにケトン、類、エステル類を併用することも
できる。The amount of morpholine and/or N-morpholine added to silicon alkoxide is preferably 0.1 to 5.0 times (molar ratio) to the amount of silicon alkoxide. Moreover, commonly used alcohols such as ethanol can also be used together. Furthermore, ketones, esters, and esters can also be used in combination.
シリコンアルコキシドとモルホリン及び/又はN−モル
ホリン並びに水とは生成するゾルをできるだけ均一なも
のとするためにスタータなどを用いてよ(混合する。ま
た超音波を照射してもよい。The silicon alkoxide, morpholine and/or N-morpholine, and water may be mixed using a starter or the like to make the resulting sol as uniform as possible. Ultrasonic waves may also be applied.
ゾル調整時にシリカの微粒子を加えても良い。Fine silica particles may be added when preparing the sol.
生成したゾル溶液は手早く他の容器に移してゲル化させ
る。ゲル化時には生成したゲルからの溶媒の発散を防ぐ
ために容器を密封することが好ましく、またゲル化時の
温度は0℃以上が好ましい。The generated sol solution is quickly transferred to another container and allowed to gel. During gelation, it is preferable to seal the container to prevent the solvent from escaping from the generated gel, and the temperature during gelation is preferably 0° C. or higher.
乾燥する工程では穴のある蓋に代えて、適当な雰囲気下
で乾燥収縮固化させて乾燥ゲルとする。In the drying process, instead of using a lid with holes, the gel is dried and shrunk and solidified in an appropriate atmosphere to form a dry gel.
その後ゲル−ゾル法で焼結することによりシリカガラス
を製造する。Thereafter, silica glass is manufactured by sintering using a gel-sol method.
ゲル化する工程、乾燥する工程、焼結する工程は一般に
用いられる条件が使用される。例えばそれぞれ、0℃〜
100℃で数分〜数10日放置、室温〜100℃で数時
間〜数10日放置、適当な雰囲気下で1000〜130
0℃に50〜b
実施例1
モルホリンとテトラメトキシシランを重量比で11対l
Oの割合で混合し均一な溶液を作成し、さらにコリンの
0.01 mol/ 11水溶液をテトラメトキシシラ
ンに対して声量比で0.64倍添加し、充分混合してシ
リカゾルを得た。得られたゾルを直径200 amのテ
フロンをコーティングしたガラスシャーレに深さ10鳳
■まで入れ密封して室温でゲル化させ5日放置した。そ
のa−60℃で7日間乾燥、さらに120℃で1日乾燥
して直径約160顛鶴の乾燥ゲルを得た。こうして得ら
れた乾燥ゲルのかさ密度は0.65 g /cdであり
クラックや割れのないものであった。この乾燥ゲルを空
気中1250℃まで60℃/時間の速度で昇温加熱して
クランクや発泡などのない直径約100mmのシリカガ
ラスを得た。このシリカガラスには失透や気泡はなく品
質の高いものである。又分析の結果、このシリカガラス
は市販のシリカガラスとその特性が一致した。Generally used conditions are used for the gelling step, drying step, and sintering step. For example, each
Leave at 100℃ for a few minutes to several 10 days, leave at room temperature to 100℃ for several hours to several 10 days, 1000 to 130 in an appropriate atmosphere
Example 1 Morpholine and tetramethoxysilane in a weight ratio of 11:1
A homogeneous solution was prepared by mixing in the proportion of O, and further, 0.01 mol/11 aqueous solution of choline was added in a volume ratio of 0.64 times that of tetramethoxysilane, and the mixture was sufficiently mixed to obtain a silica sol. The obtained sol was placed in a Teflon-coated glass Petri dish with a diameter of 200 am to a depth of 10 cm, sealed, and allowed to gel at room temperature for 5 days. The gel was dried at -60°C for 7 days and further dried at 120°C for 1 day to obtain a dried gel with a diameter of about 160 squares. The bulk density of the dry gel thus obtained was 0.65 g/cd, with no cracks or breaks. This dried gel was heated in air to 1250° C. at a rate of 60° C./hour to obtain silica glass with a diameter of about 100 mm without cracks or foaming. This silica glass has no devitrification or bubbles and is of high quality. Further, as a result of analysis, the properties of this silica glass matched those of commercially available silica glass.
実施例2
メタノール:モルホリン=7:3の体積比になるように
した混合溶媒を使用する以外は実施例1と同様にして直
径約120a+の乾燥ゲルを得た。Example 2 A dry gel with a diameter of about 120 a+ was obtained in the same manner as in Example 1, except that a mixed solvent having a volume ratio of methanol:morpholine=7:3 was used.
こうして得られた乾燥ゲルはクラ゛ツクや割れのないも
のであった。この乾燥ゲルを実施例1と同様にして加熱
してクラックや発泡などのない直径約8011IImの
シリカガラスを得た。このシリカガラスには失透や気泡
はなく品質の高いものである。又分析の結果、このシリ
カガラスは市販のシリカガラスとその特性が一致した。The dry gel thus obtained was free of cracks and cracks. This dried gel was heated in the same manner as in Example 1 to obtain a silica glass having a diameter of about 8011 II m without cracks or foaming. This silica glass has no devitrification or bubbles and is of high quality. Further, as a result of analysis, the properties of this silica glass matched those of commercially available silica glass.
(発明の効果)
本発明によれば、大型のシリカガラスをゾル−ゲル法に
よりクラックや割れを発生ずることなく、容易に製造が
可能となる。その大きさは基本的には制約がなく形状も
板状の物に限らず棒状、管状のものも製造可能となり従
来よりも安価に製造することができる。(Effects of the Invention) According to the present invention, large-sized silica glass can be easily manufactured by the sol-gel method without generating cracks or breaks. There are basically no restrictions on its size, and its shape is not limited to plate-like ones, but also rod-like and tubular ones, which can be manufactured at a lower cost than in the past.
Claims (1)
る工程、ゾルをゲル化する工程、ゲルを乾燥する工程及
び焼成する工程とからなるシリカガラスの製造において
、ゾル溶液とする工程でモルホリン及び/又はN−モル
ホリンを添加することを特徴とするシリカガラスの製造
法。1. In the production of silica glass, which consists of the steps of hydrolyzing silicon alkoxide to form a sol solution, gelling the sol, drying the gel, and firing, morpholine and/or A method for producing silica glass, characterized by adding N-morpholine.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16192588A JPH0214833A (en) | 1988-06-29 | 1988-06-29 | Production of silica glass |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16192588A JPH0214833A (en) | 1988-06-29 | 1988-06-29 | Production of silica glass |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0214833A true JPH0214833A (en) | 1990-01-18 |
Family
ID=15744642
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16192588A Pending JPH0214833A (en) | 1988-06-29 | 1988-06-29 | Production of silica glass |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0214833A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5785111A (en) * | 1995-12-15 | 1998-07-28 | Sintokogio, Ltd. | Blow-squeeze molding machine |
-
1988
- 1988-06-29 JP JP16192588A patent/JPH0214833A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5785111A (en) * | 1995-12-15 | 1998-07-28 | Sintokogio, Ltd. | Blow-squeeze molding machine |
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