JPH02122306U - - Google Patents
Info
- Publication number
- JPH02122306U JPH02122306U JP3125289U JP3125289U JPH02122306U JP H02122306 U JPH02122306 U JP H02122306U JP 3125289 U JP3125289 U JP 3125289U JP 3125289 U JP3125289 U JP 3125289U JP H02122306 U JPH02122306 U JP H02122306U
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- measured
- transport mechanism
- calibration
- holding part
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Length Measuring Devices By Optical Means (AREA)
Description
第１図は、本考案に係る光学式膜厚自動測定装
置の実施例を示す一部省略平面図、第２図は、校
正用基板の保持部の正面図、第３図は、光学系の
側面図である。
２……カセツト載置部、３……第１の被測定基
板搬送機構、４……校正用基板の保持部、５……
位置決め部、６……第２の被測定基板搬送機構、
７……Ｘ−Ｙテーブル、８……カセツト、９……
回転搬送機構、校正用基板搬送機構、１０……直
線搬送機構、Ｕ……被測定基板、Ｕａ……校正用
基板。
FIG. 1 is a partially omitted plan view showing an embodiment of the automatic optical film thickness measuring device according to the present invention, FIG. 2 is a front view of the holding part of the calibration substrate, and FIG. FIG. 2...Cassette mounting section, 3...First measured substrate transport mechanism, 4...Calibration substrate holding section, 5...
Positioning unit, 6... second measured substrate transport mechanism,
7...X-Y table, 8...cassette, 9...
Rotary transfer mechanism, calibration substrate transfer mechanism, 10... linear transfer mechanism, U... substrate to be measured, Ua... calibration substrate.
Claims (1)
板上の薄膜の膜厚を測定する光学系と、 前記光学系との相対位置合わせを行うため、前
記被測定基板を載置して２次元方向に移送するＸ
−Ｙテーブルと、 複数個の被測定基板を収納したカセツトを載置
するカセツト載置部と、 前記カセツト載置部と前記Ｘ−Ｙテーブルとに
わたつて前記被測定基板を搬送する被測定基板搬
送機構とを備えた光学式膜厚自動測定装置におい
て、 前記カセツト載置部とは別の箇所に校正用基板
の保持部を配設し、その保持部と前記Ｘ−Ｙテー
ブルとにわたつて校正用基板を搬送する校正用基
板搬送機構が、前記被測定基板搬送機構に兼用さ
れているか、または、前記被測定基板搬送機構と
は別に設けられたことを特徴とする光学式膜厚自
動測定装置。[Claims for Utility Model Registration] An optical system for measuring the thickness of a thin film on a substrate to be measured by processing light from the surface of the substrate to be measured; X to place the measurement board and transfer it in two-dimensional direction
- a Y table, a cassette mounting section on which a cassette containing a plurality of substrates to be measured is placed, and a substrate to be measured on which the substrate to be measured is transported between the cassette mounting section and the X-Y table. In the optical film thickness automatic measuring device equipped with a conveyance mechanism, a holding part for a calibration substrate is provided at a location different from the cassette mounting part, and a holding part for the calibration substrate is provided between the holding part and the X-Y table. Automatic optical film thickness measurement, characterized in that a calibration substrate transport mechanism for transporting a calibration substrate is also used as the measurement target substrate transport mechanism, or is provided separately from the measurement target substrate transport mechanism. Device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3125289U JPH0648328Y2 (en) | 1989-03-17 | 1989-03-17 | Optical film thickness automatic measurement device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3125289U JPH0648328Y2 (en) | 1989-03-17 | 1989-03-17 | Optical film thickness automatic measurement device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02122306U true JPH02122306U (en) | 1990-10-05 |
| JPH0648328Y2 JPH0648328Y2 (en) | 1994-12-12 |
Family
ID=31256980
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3125289U Expired - Lifetime JPH0648328Y2 (en) | 1989-03-17 | 1989-03-17 | Optical film thickness automatic measurement device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0648328Y2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002267419A (en) * | 2001-03-14 | 2002-09-18 | Horiba Ltd | Film thickness measuring instrument |
| KR20160123992A (en) * | 2015-04-16 | 2016-10-26 | 헤라우스 일렉트로-나이트 인터내셔날 엔. 브이. | Spectrometer calibration method and reference material |
-
1989
- 1989-03-17 JP JP3125289U patent/JPH0648328Y2/en not_active Expired - Lifetime
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002267419A (en) * | 2001-03-14 | 2002-09-18 | Horiba Ltd | Film thickness measuring instrument |
| KR20160123992A (en) * | 2015-04-16 | 2016-10-26 | 헤라우스 일렉트로-나이트 인터내셔날 엔. 브이. | Spectrometer calibration method and reference material |
| JP2016206189A (en) * | 2015-04-16 | 2016-12-08 | ヘレーウス エレクトロ−ナイト インターナシヨナル エヌ ヴイＨｅｒａｅｕｓ Ｅｌｅｃｔｒｏ−Ｎｉｔｅ Ｉｎｔｅｒｎａｔｉｏｎａｌ Ｎ．Ｖ． | Spectrometer calibration method and reference material |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0648328Y2 (en) | 1994-12-12 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |