JPH01242616A - Epoxy resin composition for sealing semiconductor - Google Patents
Epoxy resin composition for sealing semiconductorInfo
- Publication number
- JPH01242616A JPH01242616A JP6724388A JP6724388A JPH01242616A JP H01242616 A JPH01242616 A JP H01242616A JP 6724388 A JP6724388 A JP 6724388A JP 6724388 A JP6724388 A JP 6724388A JP H01242616 A JPH01242616 A JP H01242616A
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- curing accelerator
- curing
- storage stability
- epoxy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Sealing Material Composition (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は硬化性と常温での貯蔵安定性に優れる半導体封
止用エポキシ樹脂組成物に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to an epoxy resin composition for semiconductor encapsulation that has excellent curability and storage stability at room temperature.
一般に半導体封止用エポキシ樹脂組成物においては硬化
性を向上させる為に硬化促進剤を使用している。この為
常温で放置すると流動性が劣る等の欠点があり、通常は
低温での輸送あるいは低温での保管により硬化性と貯蔵
安定性の両立を図ってきた。Generally, in epoxy resin compositions for semiconductor encapsulation, a curing accelerator is used to improve curing properties. For this reason, they have drawbacks such as poor fluidity when left at room temperature, and conventional methods have been to achieve both curability and storage stability by transporting or storing them at low temperatures.
しかしながら、このような低温での輸送あるいは保管は
大幅なコストアップになる。この為硬化性と常温での貯
蔵安定性の両立が強く望まれていた。However, transportation or storage at such low temperatures significantly increases costs. For this reason, it has been strongly desired to have both curability and storage stability at room temperature.
従来、この硬化性と貯蔵安定性の両立を回る為、潜在性
硬化促進剤の研究が盛んに行なわれて来た。Hitherto, in order to achieve both curability and storage stability, research into latent curing accelerators has been actively conducted.
その結果テトラ置換ホスホニウム・テトラ置換ボレート
類(特公昭60−56172号公報)、4級アンモニウ
ムトリアゾレート化合物(特公昭60−235828.
235830号公報)等が堤案された。しかしながらこ
れらはいずれも硬化性と常温での貯蔵安定性の両立が不
可能であった。As a result, tetra-substituted phosphonium/tetra-substituted borates (Japanese Patent Publication No. 60-56172) and quaternary ammonium triazole compounds (Japanese Patent Publication No. 60-235828.
235830) etc. were proposed. However, it was impossible for any of these to achieve both curability and storage stability at room temperature.
本発明は従来技術で不可能であった硬化性と常温での貯
蔵安定性の両立を目的として研究した結果硬化促進剤を
マイクロカプセル化することにより貯蔵安定性が向上す
るとの知見を得、更にこの知見に基ヴき種々の研究を進
めて本発明を完成するに至ったものである。The present invention was developed with the aim of achieving both curability and storage stability at room temperature, which was impossible with conventional technology.As a result of research, we found that storage stability could be improved by microcapsulating the curing accelerator. Based on this knowledge, various studies have been carried out and the present invention has been completed.
[発明の構成〕
本発明は
(A)1分子中にエポキシ基を少なくとも2個以上有す
るエポキシ樹脂
(B) ノボラック型フェノール樹脂硬化剤(C)溶
出温度が100〜l 50 ’Cのエポキシ樹脂硬化物
からなり、M厚が0.1=IIImであり、粒径が5〜
20μ園であるマイクロカプセルに封入した硬化促進剤
(D)照機充填剤
を必須成分とすることを特徴とする半導体封止後エポキ
シ樹脂組成物に関するものである。[Configuration of the Invention] The present invention provides (A) an epoxy resin having at least two epoxy groups in one molecule, (B) a novolac type phenolic resin curing agent, and (C) an epoxy resin curing having an elution temperature of 100 to 150'C. The thickness of M is 0.1=IIIm, and the particle size is 5~
The present invention relates to an epoxy resin composition for semiconductor encapsulation, which is characterized in that it contains as essential components a curing accelerator (D) and a filler encapsulated in microcapsules having a diameter of 20 μm.
本発明でいうところのエポキシ樹脂組成物は、エポキシ
樹脂、硬化剤、マイクロカプセル化した硬化促進剤及び
無機充填剤を必須とし、必要に応じて1111燃剤、処
理剤、11114、離型剤その他添加剤を配合したもの
である。The epoxy resin composition referred to in the present invention essentially contains an epoxy resin, a curing agent, a microencapsulated curing accelerator, and an inorganic filler, and optionally adds 1111 fuel, processing agent, 11114, mold release agent, and others. It is a combination of agents.
エポキシ樹脂とはエポキシ基を有するもの全形のことを
いい、例えばビスフェノール型エポキシ樹脂、ノボラッ
ク型エポキシ樹脂、複素環型エポキシ樹脂といった一般
名を挙げることができる。Epoxy resins refer to all types of resins having epoxy groups, and include common names such as bisphenol type epoxy resins, novolac type epoxy resins, and heterocyclic type epoxy resins.
本発明の硬化促進剤とは次のようなものをいいエポキシ
樹脂硬化物でマイクロカプセル化されていることが必須
である。The curing accelerator of the present invention refers to the following, and it is essential that it is microencapsulated with a cured epoxy resin.
マイクロカプセルについては粒径、殻の厚みが技術的に
ポイントになる。Regarding microcapsules, the particle size and shell thickness are technically important points.
硬化促進剤としては、ジアザビシクロウンデセン、トリ
フェニルホスフィン、2メチルイミダゾール、ジメチル
ベンジルアミン等が挙げられS。Examples of the curing accelerator include diazabicycloundecene, triphenylphosphine, 2methylimidazole, and dimethylbenzylamine.
尚マイクロカプセルの殻を形成する材料としてはエポキ
シ樹脂硬化物からなり溶出温度がlo。The material forming the shell of the microcapsule is a cured epoxy resin and has an elution temperature of lo.
〜150°Cが好ましい。ここでいう溶出温度とは、マ
イクロカプセル化された硬化促進剤が殻を通して外部に
溶出あるいは殻が破壊されることにより外部に溶出する
温度のことを言う、即ち組成物の混合・混練時には硬化
促進剤が溶出せず成形時に溶出することにより硬化促進
剤の触媒作用を引き出すものが好ましい、殻を構成する
材料としては、エポキシ樹脂を用いる。エポキシ樹脂以
外の材料として例えばメラミン樹脂、フェノール樹脂の
ような材料が考えられるがこれらは耐湿性に影響を及ぼ
したり添加量によっては硬化性に影響を及ばず場合があ
るからである。~150°C is preferred. The elution temperature here refers to the temperature at which the microencapsulated curing accelerator elutes to the outside through the shell or elutes to the outside when the shell is destroyed.In other words, curing is accelerated during mixing and kneading of the composition. Epoxy resin is preferably used as the material constituting the shell, and is preferably one in which the curing accelerator does not dissolve out during molding and thereby brings out the catalytic action of the curing accelerator. Materials other than epoxy resin, such as melamine resin and phenol resin, can be considered, but these may affect moisture resistance, or may not affect curability depending on the amount added.
更に、エポキシ樹脂以外の材ギ4であれば、半導体封止
用エポキシ樹脂組成物に対して、異種、異物であり、成
形性及び半導体封止後の物性に悪影響を及ぼしてしまう
恐れがおおきい。Furthermore, if the material 4 is other than epoxy resin, it will be a foreign substance to the epoxy resin composition for encapsulating a semiconductor, and there is a great possibility that it will adversely affect the moldability and physical properties after encapsulating the semiconductor.
さらに壁材の厚みとしては0.1〜1μmが好ましい、
O,l/7m より)1いと混合・混練時に硬化促進剤
が溶出してしまう。又1μmより厚いと成形時に硬化促
進剤が溶出しない、ミ命光」d日又マイクロカプセルの
粒径としては201JIl以下が好ましい。20μ薯よ
り大きいと分散性が悪くなり硬化にむらが生じてしまう
、又更に粒径が大きくなれば必然的にカプセル強度が弱
くなってしまう傾向がある。添加量としては硬化促進剤
量として0.1〜0.5重量%が好ましい、少量あるい
は必要以上に添加すると所望の硬化性が得られないから
である。Furthermore, the thickness of the wall material is preferably 0.1 to 1 μm.
O, l/7m) 1 and the curing accelerator will be eluted during mixing and kneading. Moreover, if the thickness is more than 1 μm, the curing accelerator will not be eluted during molding.The particle size of the microcapsules is preferably 201 JIl or less. When the particle size is larger than 20 μm, dispersibility deteriorates and curing becomes uneven, and when the particle size becomes larger, the capsule strength tends to inevitably become weaker. The amount of curing accelerator to be added is preferably 0.1 to 0.5% by weight, because if it is added in a small amount or more than necessary, the desired curability cannot be obtained.
マイクロカプセル化法としては界面沈澱法、界面重合法
、液中硬化被膜法等を挙げることができる。Examples of the microencapsulation method include an interfacial precipitation method, an interfacial polymerization method, and an in-liquid hardening film method.
(発明の効果〕
本発明に従うと、従来技術をそのまま利用し且つ従来技
術では両立できなかった硬化性と常温での貯蔵安定性に
優れるエポキシ樹脂組成物を得ることができる。特に半
導体封止用途では今後ますますプラスチックパッケージ
化が予想され又そのために硬化性と常温での貯蔵安定性
の両立が望まれている今日においては本発明の産業的意
味役割は非常に大きい。(Effects of the Invention) According to the present invention, it is possible to obtain an epoxy resin composition that is excellent in curability and storage stability at room temperature, which were not compatible with the conventional technology, while utilizing the conventional technology as is.Especially for semiconductor encapsulation applications. Nowadays, it is expected that more and more plastic packaging will be used in the future, and therefore, it is desired to have both hardenability and storage stability at room temperature, and the present invention plays a very important role in industry.
(マイクロカプセルの製造)
硬化促進剤としてトリフェニルホスフィンおよび/また
は2−メチルイミダヅールの粒径が20エポキシ樹脂量
は、硬化促進剤の被覆厚みが0.1〜1. Oμ鰯とな
るように適宜調整を行った。(Manufacture of microcapsules) The particle size of triphenylphosphine and/or 2-methylimidazur as a curing accelerator is 20. The amount of epoxy resin is such that the coating thickness of the curing accelerator is 0.1 to 1. Appropriate adjustments were made to obtain Oμ sardines.
この分散液を、エポキシ樹脂の硬化剤としてフェノール
ノボラ7り樹脂を同様に希釈剤に溶解した溶液に乳化分
散させ撹拌をしなから100°Cに加温し、キシレンを
系外に連発除去し、濾過乾燥しマイクロカプセル化した
ものを得る方法により第1表に示す構成の硬化促進剤の
マイクロカプセルを製造した。This dispersion was emulsified and dispersed in a solution in which phenol novola resin was similarly dissolved in a diluent as a curing agent for epoxy resin, and the mixture was heated to 100°C while stirring to remove xylene from the system. Microcapsules of the curing accelerator having the compositions shown in Table 1 were produced by filtering and drying to obtain microcapsules.
第1表
(実施例1〜3、比較例1〜3)
オルソクレーゾールノボラックエポキシ樹脂20重量部
フェノールノボラック 10重量部溶融シリ
カ 70重量部脂環式エポキシシ
ラン 0.5重量部カーボンブランク
0.5重量部モンタン酸ワックス
0.5重量部上記組成物に第1表に示したマイクロ
カプセル化した硬化促進剤が0.2重量部となるように
添加してブレンダーを用いて均一に混合し、その後10
0°Cの熱ロールで3分間混練し第2表に示す組み合せ
の6種類の半導体封止用エポキシ樹脂組成物を得た。Table 1 (Examples 1 to 3, Comparative Examples 1 to 3) Orthocresol novolak epoxy resin 20 parts by weight Phenol novolac 10 parts by weight Fused silica 70 parts by weight Alicyclic epoxy silane 0.5 parts by weight Carbon blank
0.5 parts by weight Montanic acid wax
0.5 parts by weight The microencapsulated curing accelerator shown in Table 1 was added to the above composition in an amount of 0.2 parts by weight, and mixed uniformly using a blender.
The mixture was kneaded for 3 minutes with a hot roll at 0°C to obtain six types of epoxy resin compositions for semiconductor encapsulation having the combinations shown in Table 2.
これらの成形材料の保存性及び硬化性を試験した結果を
第2表に示す。Table 2 shows the results of testing the storage stability and curing properties of these molding materials.
(比較例4〜6)
実施例の組成において、マイクロカプセル化した硬化促
進剤を用いず第2表に示す硬化促進剤を直接添加し、均
一に混合し、100°C3分間熱ロールで混練し半導体
封止用エポキシ樹脂組成物を得た。(Comparative Examples 4 to 6) In the composition of the example, the curing accelerator shown in Table 2 was directly added without using the microencapsulated curing accelerator, mixed uniformly, and kneaded with a hot roll at 100°C for 3 minutes. An epoxy resin composition for semiconductor encapsulation was obtained.
これらの成形材料の保存性及び硬化性を試験した結果を
第2表に示す。Table 2 shows the results of testing the storage stability and curing properties of these molding materials.
Claims (1)
上有するエポキシ樹脂 (B)ノボラック型フェノール樹脂硬化剤 (C)溶出温度が100〜150℃のエポキシ樹脂硬化
物からなり、殼厚が0.1〜1μmであり、粒径が5〜
20μmであるマイクロカプセルに封入した硬化促進剤 (D)無機充填剤 を必須成分とすることを特徴とする半導体封止用エポキ
シ樹脂組成物。(1) (A) Epoxy resin having at least two or more epoxy groups in one molecule (B) Novolak type phenolic resin curing agent (C) Consisting of a cured epoxy resin with an elution temperature of 100 to 150°C and a shell thickness of 0.1 to 1 μm, and the particle size is 5 to 1 μm.
An epoxy resin composition for semiconductor encapsulation, characterized in that it contains as an essential component a curing accelerator (D) inorganic filler encapsulated in microcapsules having a diameter of 20 μm.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6724388A JPH01242616A (en) | 1988-03-23 | 1988-03-23 | Epoxy resin composition for sealing semiconductor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6724388A JPH01242616A (en) | 1988-03-23 | 1988-03-23 | Epoxy resin composition for sealing semiconductor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01242616A true JPH01242616A (en) | 1989-09-27 |
Family
ID=13339284
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6724388A Pending JPH01242616A (en) | 1988-03-23 | 1988-03-23 | Epoxy resin composition for sealing semiconductor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01242616A (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01287131A (en) * | 1988-03-23 | 1989-11-17 | Sumitomo Bakelite Co Ltd | Epoxy resin composition for semiconductor sealing and curing accelerator |
JPH08301978A (en) * | 1995-05-02 | 1996-11-19 | Nitto Denko Corp | Epoxy resin composition for sealing semiconductor element, and resin-sealed semiconductor device |
US5726222A (en) * | 1994-03-15 | 1998-03-10 | Toray Industries, Inc. | Microcapsule-type curing agent, method for producing the same, thermosetting resin composition, prepreg and fiber reinforced composite material |
US6342309B1 (en) * | 1999-08-19 | 2002-01-29 | Shin-Etsu Chemical Co., Ltd. | Epoxy resin composition and semiconductor device |
EP1184419A3 (en) * | 2000-08-24 | 2003-04-02 | Nitto Denko Corporation | Resin composition for selaing semiconductor, semiconductor device using the same semiconductor wafer and mounted structure of semiconductor device |
KR100592461B1 (en) * | 1999-08-19 | 2006-06-22 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Epoxy resin composition and semiconductor device for semiconductor encapsulation |
JP2008255219A (en) * | 2007-04-04 | 2008-10-23 | Sony Chemical & Information Device Corp | Latent curing agent for epoxy resin and method for producing the same |
JP2014108966A (en) * | 2012-11-30 | 2014-06-12 | Kyocera Chemical Corp | Latent hardening accelerator, method of producing the same and epoxy resin composition |
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JPS5723625A (en) * | 1980-07-17 | 1982-02-06 | Toshiba Corp | Epoxy resin composition and resin-sealed semiconductor device |
JPS58198525A (en) * | 1982-05-14 | 1983-11-18 | Sanyurejin Kk | Epoxy resin composition |
JPS58225121A (en) * | 1982-06-23 | 1983-12-27 | Sanyurejin Kk | Epoxy resin composition and sealing of electronic parts using the same |
JPS60223805A (en) * | 1984-03-23 | 1985-11-08 | ミネソタ マイニング アンド マニユフアクチユアリングコンパニー | Latent lewis acid catalyst concentrate |
JPS6112724A (en) * | 1984-06-27 | 1986-01-21 | Toshiba Corp | Epoxy resin composition |
JPS6189221A (en) * | 1984-10-08 | 1986-05-07 | Sumitomo Bakelite Co Ltd | Epoxy resin composition for encapsulation of semiconductor |
JPH01287131A (en) * | 1988-03-23 | 1989-11-17 | Sumitomo Bakelite Co Ltd | Epoxy resin composition for semiconductor sealing and curing accelerator |
-
1988
- 1988-03-23 JP JP6724388A patent/JPH01242616A/en active Pending
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JPS5723625A (en) * | 1980-07-17 | 1982-02-06 | Toshiba Corp | Epoxy resin composition and resin-sealed semiconductor device |
JPS58198525A (en) * | 1982-05-14 | 1983-11-18 | Sanyurejin Kk | Epoxy resin composition |
JPS58225121A (en) * | 1982-06-23 | 1983-12-27 | Sanyurejin Kk | Epoxy resin composition and sealing of electronic parts using the same |
JPS60223805A (en) * | 1984-03-23 | 1985-11-08 | ミネソタ マイニング アンド マニユフアクチユアリングコンパニー | Latent lewis acid catalyst concentrate |
JPS6112724A (en) * | 1984-06-27 | 1986-01-21 | Toshiba Corp | Epoxy resin composition |
JPS6189221A (en) * | 1984-10-08 | 1986-05-07 | Sumitomo Bakelite Co Ltd | Epoxy resin composition for encapsulation of semiconductor |
JPH01287131A (en) * | 1988-03-23 | 1989-11-17 | Sumitomo Bakelite Co Ltd | Epoxy resin composition for semiconductor sealing and curing accelerator |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01287131A (en) * | 1988-03-23 | 1989-11-17 | Sumitomo Bakelite Co Ltd | Epoxy resin composition for semiconductor sealing and curing accelerator |
US5726222A (en) * | 1994-03-15 | 1998-03-10 | Toray Industries, Inc. | Microcapsule-type curing agent, method for producing the same, thermosetting resin composition, prepreg and fiber reinforced composite material |
JPH08301978A (en) * | 1995-05-02 | 1996-11-19 | Nitto Denko Corp | Epoxy resin composition for sealing semiconductor element, and resin-sealed semiconductor device |
US6342309B1 (en) * | 1999-08-19 | 2002-01-29 | Shin-Etsu Chemical Co., Ltd. | Epoxy resin composition and semiconductor device |
KR100592461B1 (en) * | 1999-08-19 | 2006-06-22 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Epoxy resin composition and semiconductor device for semiconductor encapsulation |
KR100592462B1 (en) * | 1999-08-19 | 2006-06-22 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Epoxy Resin Compositions and Semiconductor Devices |
EP1184419A3 (en) * | 2000-08-24 | 2003-04-02 | Nitto Denko Corporation | Resin composition for selaing semiconductor, semiconductor device using the same semiconductor wafer and mounted structure of semiconductor device |
SG128412A1 (en) * | 2000-08-24 | 2007-01-30 | Nitto Denko Corp | Resin composition for sealing semiconductor, semiconductor device using the same semiconductor waferand mounted structure of semiconductor device |
KR100776959B1 (en) * | 2000-08-24 | 2007-11-27 | 닛토덴코 가부시키가이샤 | Resin composition for sealing semiconductor, semiconductor device using the same, semiconductor wafer and mounted structure of semiconductor device |
JP2008255219A (en) * | 2007-04-04 | 2008-10-23 | Sony Chemical & Information Device Corp | Latent curing agent for epoxy resin and method for producing the same |
JP2014108966A (en) * | 2012-11-30 | 2014-06-12 | Kyocera Chemical Corp | Latent hardening accelerator, method of producing the same and epoxy resin composition |
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