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JPH01235254A - Semiconductor device and its manufacturing method - Google Patents

Semiconductor device and its manufacturing method

Info

Publication number
JPH01235254A
JPH01235254A JP63062552A JP6255288A JPH01235254A JP H01235254 A JPH01235254 A JP H01235254A JP 63062552 A JP63062552 A JP 63062552A JP 6255288 A JP6255288 A JP 6255288A JP H01235254 A JPH01235254 A JP H01235254A
Authority
JP
Japan
Prior art keywords
insulating film
wiring
film
porous insulating
metallic interconnection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63062552A
Other languages
Japanese (ja)
Inventor
Mitsuru Sakamoto
充 坂本
Kuniyuki Hamano
浜野　邦幸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP63062552A priority Critical patent/JPH01235254A/en
Priority to KR1019890003038A priority patent/KR930002670B1/en
Priority to EP19890104509 priority patent/EP0333132A3/en
Publication of JPH01235254A publication Critical patent/JPH01235254A/en
Priority to US07/677,619 priority patent/US5103288A/en
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • H01L23/532—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body characterised by the materials
    • H01L23/5329—Insulating materials
    • H01L23/53295—Stacked insulating layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02296—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer
    • H01L21/02299—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer pre-treatment
    • H01L21/02304—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer pre-treatment formation of intermediate layers, e.g. buffer layers, layers to improve adhesion, lattice match or diffusion barriers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02296—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer
    • H01L21/02318—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment
    • H01L21/02343—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment treatment by exposure to a liquid
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/314—Inorganic layers
    • H01L21/316—Inorganic layers composed of oxides or glassy oxides or oxide based glass
    • H01L21/31695—Deposition of porous oxides or porous glassy oxides or oxide based porous glass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
    • H01L21/7682—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing the dielectric comprising air gaps
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • H01L23/5226—Via connections in a multilevel interconnection structure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • H01L23/532—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body characterised by the materials
    • H01L23/5329—Insulating materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
    • H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
    • H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
    • H01L21/02126—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material containing Si, O, and at least one of H, N, C, F, or other non-metal elements, e.g. SiOC, SiOC:H or SiONC
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
    • H01L21/02203—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being porous
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
    • H01L21/02282—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/46—Manufacturing multilayer circuits
    • H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/4673—Application methods or materials of intermediate insulating layers not specially adapted to any one of the previous methods of adding a circuit layer
    • H05K3/4676—Single layer compositions

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Formation Of Insulating Films (AREA)
  • Local Oxidation Of Silicon (AREA)

Abstract

PURPOSE:To substantially decrease parasitic capacity between metallic interconnection layers and to provide a high-density semiconductor device operable at high speed, by providing an interlayer insulating film of a porous insulating material between multilayer interconnections. CONSTITUTION:On the surface of a semiconductor substrate 101 having a semiconductor element mounted, there is formed a silicon oxide film or silicon nitride film, or inorganic insulating film 102 having passivation effect. A contact hole is formed in the insulating film 102, and a first metallic interconnection 103 is formed of pure aluminum or silicon-containing aluminum. A porous insulating film 104 is deposited so a to cover the first metallic interconnection 103. The porous insulating film 104 may be of an acidic oxide such as SiO2 having a pore volume density of 50-80%, or a basic inorganic insulator such as CaO or Li2O, or an organic insulator such as polyimide or the like. Then, a buried metallic layer 105 is formed in the contact hole by electroless plating or low temperature CVD. A second metallic interconnection 106 is provided in a similar manner to the first metallic interconnection 103.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は半導体装置の配線構造に係り特に配線間の寄生
容量が小さい多層配線の構造に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to the wiring structure of a semiconductor device, and particularly to a multilayer wiring structure with small parasitic capacitance between wirings.

〔従来の技術〕[Conventional technology]

半導体装置の高集積化に伴ない、配線巾、配線間隔の微
細化更には配線の多層化技術の開発がより強く要求され
る。このような中で、この配線技術に於いては、配線抵
抗の低減と共に配線間の寄生容量の低減が重要となって
くる。これは配線ピッチの縮小酸は多層化と共に一般に
配線に浮遊する容量が増大し半導体素子のダイナミック
動作時の消費電力の低減が困難となってくるためである
。更に又この配線間の寄生容量の低減は半導体素子間に
於ける信号伝達のスピード向上をもたらし半導体装置の
高速化に効果的となる。As semiconductor devices become more highly integrated, there is a strong demand for miniaturization of wiring width and wiring spacing, as well as development of multilayer wiring technology. Under these circumstances, in this wiring technology, it is important to reduce the wiring resistance as well as the parasitic capacitance between wirings. This is because when the wiring pitch is reduced, the capacitance floating in the wiring generally increases as the number of layers increases, making it difficult to reduce power consumption during dynamic operation of the semiconductor element. Furthermore, this reduction in parasitic capacitance between wirings improves the speed of signal transmission between semiconductor elements, which is effective in increasing the speed of semiconductor devices.

この寄生容量を低減するためには、配線間の層間絶縁膜
の比誘電率を減少させることが必要となる。従来のこの
種の層間絶縁膜としてシリコン酸化膜のような無機絶縁
膜、ポリイミドのような有機絶縁膜等がある。前者の比
誘電εは〜３．９．後者で３．０程度であり今後の配線
技術に要求される比誘電率ε≦２．０を満足できる絶縁
材料の層間絶縁膜への適用は未だなされていない。更に
その他空中配線といわれる配線技術がある。この配線技
術は金属の配線間に上記のような層間絶縁膜を挿入せず
配線形成するもので配線は空中になされる。In order to reduce this parasitic capacitance, it is necessary to reduce the dielectric constant of the interlayer insulating film between the wirings. Conventional interlayer insulating films of this type include inorganic insulating films such as silicon oxide films, organic insulating films such as polyimide, and the like. The dielectric ε of the former is ~3.9. The latter is about 3.0, and an insulating material that can satisfy the dielectric constant ε≦2.0 required for future wiring technology has not yet been applied to an interlayer insulating film. Furthermore, there is another wiring technique called aerial wiring. This wiring technology forms wiring without inserting an interlayer insulating film as described above between metal wiring, and the wiring is formed in the air.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

上述した従来のシリコン酸化膜、ポリイミド有機膜のよ
うな層間絶縁膜を使用した配線技術では、層間絶縁膜の
比誘電力εは３以上となり今後の配線技術に必要なε≦
２．０を満たすようにすることが困難である。In the above-mentioned conventional wiring technology using an interlayer insulating film such as a silicon oxide film or a polyimide organic film, the relative permittivity ε of the interlayer insulating film is 3 or more, which is required for future wiring technology.
It is difficult to satisfy 2.0.

更に空中配線といわれる配線技術はε＝１．０程度にす
ることが可能となるが配線を支える部分が少ないため配
線金属のたわみ、変形が生じ易く、配線間の短絡あるい
は、配線断線を引きおこし信頼性の乏しい配線となると
いう欠点がある。Furthermore, the wiring technology called aerial wiring makes it possible to set ε = around 1.0, but because there are few parts to support the wiring, the wiring metal is prone to bending and deformation, which can lead to short circuits between wirings or wiring breaks. The disadvantage is that the wiring becomes unreliable.

〔課題を解決するための手段〕[Means to solve the problem]

本発明の半導体装置は、半導体素子を搭載した半導体基
板上の金属配線における複数の金属配線間の絶縁材料と
して多孔質絶縁膜を有している。The semiconductor device of the present invention has a porous insulating film as an insulating material between a plurality of metal wirings on a semiconductor substrate on which a semiconductor element is mounted.

もしくは、金属配線を緻密な絶縁膜で被覆しその上で金
属配線間の絶縁材料として多孔質絶縁膜を有する構造に
する。Alternatively, a structure is adopted in which the metal wiring is covered with a dense insulating film, and then a porous insulating film is used as an insulating material between the metal wirings.

多孔質絶縁膜の細孔の大きさは５ｎｍ〜５０ｎｍ径であ
るが好ましく、多孔質絶縁膜の細孔の体積密度が５０％
〜８０％であることが好ましい。The size of the pores in the porous insulating film is preferably 5 nm to 50 nm in diameter, and the volume density of the pores in the porous insulating film is 50%.
It is preferable that it is 80%.

更に又、上記多孔質絶縁膜の形成工程においては、塩基
性酸化物と酸性酸化物の混合した絶縁膜を堆積し次に熱
処理を施し塩基性酸化物あるいは酸性酸化物のみを析出
し、かくした後、該析出した塩基性酸化物あるいは酸性
酸化物のみを溶出する。かくして溶出した部分に多孔を
形成する。Furthermore, in the step of forming the porous insulating film, an insulating film containing a mixture of basic oxide and acidic oxide is deposited, and then heat treatment is performed to precipitate only the basic oxide or acidic oxide. Thereafter, only the precipitated basic oxide or acidic oxide is eluted. Pores are thus formed in the eluted portion.

混合した絶縁膜が酸化ナトリウムあるいは酸化カルシウ
ムと二酸化硅素あるいは二酸化硅素／酸化ホウ素の混合
物とで構成されていることが好ましく、混合した絶縁膜
中に含まれる酸化ナトリウムあるいは酸化カルシウムの
濃度が１５〜２５モル％であることが好ましく、その後
酸化ナトリウムあるいは酸化カルシウムのみを溶解する
。混合した絶縁膜を熱処理する工程において、処理温度
が３５０℃〜５００℃であることが好ましい。It is preferable that the mixed insulating film is composed of sodium oxide or calcium oxide and silicon dioxide or a mixture of silicon dioxide/boron oxide, and the concentration of sodium oxide or calcium oxide contained in the mixed insulating film is 15 to 25%. It is preferable that the amount is mol %, and then only sodium oxide or calcium oxide is dissolved. In the step of heat treating the mixed insulating film, the treatment temperature is preferably 350°C to 500°C.

本発明は配線間の層間絶縁膜として絶縁膜中に微細な多
数の孔を有する多孔質絶縁物を用いているから層間絶縁
膜の比誘電率εを低減（２以下）にすると共に、信頼性
の高い金属配線技術を提供できる。Since the present invention uses a porous insulator having a large number of fine pores in the insulating film as the interlayer insulating film between wirings, the relative dielectric constant ε of the interlayer insulating film is reduced (2 or less), and reliability is improved. We can provide high quality metal wiring technology.

〔実施例〕〔Example〕

次に、本発明について図面を参照して説明する。 Next, the present invention will be explained with reference to the drawings.

第１図は本発明の第１の実施例の縦断面図であり、第２
図は第２の実施例の縦断面図である。更に第３図乃至第
８図は第１の実施例の製法プロセスの縦断面図であり、
第９図乃至第１７図は第２の実施例の製法プロセスの縦
断面図である。FIG. 1 is a vertical sectional view of the first embodiment of the present invention, and the second embodiment
The figure is a longitudinal sectional view of the second embodiment. Further, FIGS. 3 to 8 are longitudinal sectional views of the manufacturing process of the first embodiment,
9 to 17 are longitudinal sectional views of the manufacturing process of the second embodiment.

第１図に示すように半導体素子を搭載した半導体基板１
０１表面にシリコン酸化膜、シリコン窒化膜あるいはシ
リコン酸化窒化膜のようなパッシベーション効果のある
無機系の絶縁膜１０２を形成する。この絶縁膜１０２に
コンタクト孔を形成した後純アルミニウム、シリコン入
りアルミニウム等で第１の金属配線１０３を形成し、こ
の第１の金属配線１０３を被覆して多孔質絶縁膜１０４
が堆積される。ここでこの多孔質絶縁膜１０４は細孔の
体積密度が５０％〜８０％を有する５ｉ０２のような酸
性酸化物あるいはＣａＯ，ＬｉｚＯのような塩基性の無
機絶縁物、あるいはポリイミドのような有機系絶縁物で
構成される。A semiconductor substrate 1 on which a semiconductor element is mounted as shown in FIG.
An inorganic insulating film 102 having a passivation effect, such as a silicon oxide film, a silicon nitride film, or a silicon oxynitride film, is formed on the surface of the wafer 01. After forming a contact hole in this insulating film 102, a first metal wiring 103 is formed of pure aluminum, silicon-containing aluminum, etc., and the first metal wiring 103 is covered with a porous insulating film 104.
is deposited. Here, the porous insulating film 104 is made of an acidic oxide such as 5i02 having a pore volume density of 50% to 80%, a basic inorganic insulating material such as CaO or LizO, or an organic material such as polyimide. Composed of insulators.

かくして次にコンタクト孔への埋込み金属１０５を無電
界メツキ、あるいは低温ＣＶＤ手法で形成後、第１の金
属配線１０３と同様な方法で第２の金属配線１０６を形
成する。更に同様な手段により、多孔質絶縁膜１０４及
び第３の金属配線１０７を形成し、埋込み金属１０５．
第４の金属配線１０８該第４の金属配線１０８を被覆し
て最上層の多孔質絶縁膜１０４をそれぞれ形成する。Then, after forming the buried metal 105 in the contact hole by electroless plating or low-temperature CVD, the second metal wiring 106 is formed in the same manner as the first metal wiring 103. Further, by similar means, a porous insulating film 104 and a third metal wiring 107 are formed, and a buried metal 105.
Fourth metal wiring 108 A top layer porous insulating film 104 is formed covering the fourth metal wiring 108, respectively.

第２図は本発明の第２の実施例の縦断面図である。本実
施例の場合金属配線間に多孔質絶縁膜２０５を使用する
ことは第１の実施例と同様であるが、第２図に示すよう
に配線金属表面を被覆する姿態に保護絶縁膜２０４を形
成する。この保護絶縁膜２０４はパッシベーション効果
のある緻密な膜例えば膜厚が１００人〜２０００人のシ
リコン酸化窒化膜あるいは低応力のシリコン窒化膜で構
成される。FIG. 2 is a longitudinal sectional view of a second embodiment of the invention. In this embodiment, the porous insulating film 205 is used between the metal wirings as in the first embodiment, but as shown in FIG. Form. The protective insulating film 204 is composed of a dense film having a passivation effect, such as a silicon oxynitride film having a thickness of 100 to 2000 thick, or a low-stress silicon nitride film.

その他の構造は第１の実施例と同様である。即ち半導体
素子を搭載した半導体基板２０１上にコンタクト孔を有
する無機系の絶縁膜２０２を形成し半導体基板２０１と
その上に構成する多層配線層を分離する。かくした後多
層に積層された金属配線２０３及び層間絶縁膜として多
孔質絶縁膜２０５を形成する。The rest of the structure is the same as the first embodiment. That is, an inorganic insulating film 202 having contact holes is formed on a semiconductor substrate 201 on which a semiconductor element is mounted, and the semiconductor substrate 201 is separated from the multilayer wiring layer formed thereon. After this, a multilayered metal wiring 203 and a porous insulating film 205 are formed as an interlayer insulating film.

本実施例の場合多孔質絶縁膜２０５と金属配線２０３０
間を緻密な保護絶縁膜２０４で隔絶することにより配線
の信頼性を大幅に向上させることが容易となる。In this embodiment, the porous insulating film 205 and the metal wiring 2030
By isolating them with a dense protective insulating film 204, it becomes easy to greatly improve the reliability of the wiring.

次に本発明の製法に関し、第３図乃至第８図で第３の実
施例として第１図に示した半導体装置の第１の製法を、
第９図乃至第１７図で第４の実施例として第２図に示し
た半導体装置の製法を説明する。Next, regarding the manufacturing method of the present invention, the first manufacturing method of the semiconductor device shown in FIG. 1 as the third embodiment in FIGS. 3 to 8 is as follows.
A method for manufacturing the semiconductor device shown in FIG. 2 as a fourth embodiment will be explained with reference to FIGS. 9 to 17.

第１の製法に関してはまず第３図に示すように半導体素
子を搭載した半導体基板３０１表面にシリコン酸化膜、
シリコン酸化窒化膜の２層構造をもつ無機系の絶縁膜３
０２を堆積する。ここでシリコン酸化膜はＣＶＤ法にて
膜厚１０００人程度１シリコン酸化窒化膜はプラズマＣ
ＶＤ法にテ膜厚３０００人形成する。Regarding the first manufacturing method, first, as shown in FIG.
Inorganic insulating film 3 with a two-layer structure of silicon oxynitride film
Deposit 02. Here, the silicon oxide film is made using the CVD method to a film thickness of about 1,000. The silicon oxide nitride film is made using plasma C.
Form a film with a thickness of 3000 using the VD method.

引き続き、公知の蝕刻技術例えばドライエツチングによ
りコンタクト孔３０３を形成後、第４図に示すように第
１の金属配線３０４を形成する。Subsequently, a contact hole 303 is formed by a known etching technique such as dry etching, and then a first metal wiring 304 is formed as shown in FIG.

この金属配線は純アルミニウム金属のスパッタリングに
よる堆積と引き続いたドライエツチングによる微細加工
で形成する。The metal wiring is formed by depositing pure aluminum metal by sputtering followed by fine processing by dry etching.

次に第５図に示すように酸化ナトリウム（ＮａｚＯ）と
シリコン酸化物（ＳｉＯｚ）で構成された複合絶縁膜３
０５を膜厚５０００人形成する。ここで、この複合絶縁
膜３０５中の酸化ナトリウムの濃度は１５〜２５モル％
となるようにＣＶＤ法或いは塗布法あるいはスパッタ法
にて堆積する。塗布剤としてはＲｒ　Ｓ　ｉ　（ＯＲ２
）　ｓあるいは５ｉ（ＯＲ２）４とＮａＯＨをメチルセ
ルソルブを溶剤として混合したものを用いる。ここでＲ
ｒ、ＲｔはＣ，Ｈイの炭化水素化合物である。又ＣＶＤ
法による形成の場合にはＳ　ｉＨ４，Ｎ２０．ＮａＯＨ
ガスあるいは有機シラン系ガスを混合して反応炉の中で
堆積する。Next, as shown in FIG. 5, a composite insulating film 3 made of sodium oxide (NazO) and silicon oxide (SiOz) is formed.
05 to a film thickness of 5000 people. Here, the concentration of sodium oxide in this composite insulating film 305 is 15 to 25 mol%.
It is deposited by a CVD method, a coating method, or a sputtering method so that it becomes . As a coating agent, Rr Si (OR2
) A mixture of s or 5i(OR2)4 and NaOH using methylcellosolve as a solvent is used. Here R
r and Rt are C, H hydrocarbon compounds. Also CVD
In the case of formation by SiH4, N20. NaOH
A mixture of gases or organic silane gases is deposited in a reactor.

このような複合絶縁膜３０５を層間絶縁膜として多層配
線を形成していく、４層の金属配線を行なった場合を第
６図に示す。FIG. 6 shows a case where four-layer metal wiring is formed by forming multilayer wiring using such a composite insulating film 305 as an interlayer insulating film.

斯くして第７図に示すように最上層の複合絶縁膜を形成
した後第８図に示すように複合絶縁膜３０５を多孔質絶
縁膜３０６６に変換する、ここでこの変換は次のように
して行なう。即ち、第７図状態の半導体基板を温度が３
００℃〜５００℃、窒素等の不活性ガス或いは酸化雰囲
気中で熱処理する。このような熱処理により複合絶縁膜
３０５がＮａ、ＯとＳｉｎ、に分離する分相現象が生じ
「からみあい型」或いは「液滴型」の微相分離が起る。After forming the uppermost composite insulating film as shown in FIG. 7, the composite insulating film 305 is converted into a porous insulating film 3066 as shown in FIG. 8. Here, this conversion is performed as follows. Let's do it. That is, the temperature of the semiconductor substrate in the state shown in FIG.
Heat treatment is performed at 00°C to 500°C in an inert gas such as nitrogen or an oxidizing atmosphere. Such heat treatment causes a phase separation phenomenon in which the composite insulating film 305 is separated into Na, O, and Sin, resulting in "entanglement type" or "droplet type" microphase separation.

かくした後可溶性のある酸処理例えば塩酸中に浸漬する
とＮ　ａ　ｔ　Ｏのみが溶は出しその溶出した部分に孔
が形成される。この孔の大きさは、微相分離時のＮａｔ
Ｏ析出の大きさによる。上記熱処理条件では、直径１０
ｎｍ程度の大きさの孔が多数形成される。After that, when treated with a soluble acid, for example, immersed in hydrochloric acid, only Na t O is eluted and pores are formed in the eluted portion. The size of this pore is determined by the size of the Nat during microphase separation.
It depends on the size of O precipitation. Under the above heat treatment conditions, the diameter is 10
A large number of pores with a size of about nm are formed.

以上複合絶縁膜として分相現象を生じるＮａ２ｏ／５ｉ
０２の場合について述べたがその他の分相現象を生じる
絶縁膜、例えばＬｉ、Ｏ／５ｉ０２系、　Ｃａ　Ｏ／Ｓ
　ｉ　Ｏｓ系のような塩基性酸化物／酸性酸化物の混合
絶縁膜を使用しても同様の効果がある。Na2o/5i which causes phase separation phenomenon as a composite insulating film
Although the case of 02 has been described, other insulating films that cause phase separation phenomena, such as Li, O/5i02 system, Ca O/S
A similar effect can be obtained by using a mixed insulating film of basic oxide/acidic oxide such as iOs type.

更に又、複合絶縁膜３０５０分相な最終工程での熱処理
で行なう場合について述べたが各複合絶縁膜形成過程で
それぞれ熱処理を施し微相分離してもよい。但し、析出
した絶縁物の溶出は最終工程で行なうものとする。Furthermore, although the case has been described in which the heat treatment is performed in the final step of separating the phases of the composite insulating film 3050, the heat treatment may be performed in each process of forming the composite insulating film to cause microphase separation. However, the elution of the precipitated insulator shall be performed in the final step.

次に第２の製法について説明する。まず、第９図に示す
ように半導体基板４０１表面に無機系の絶縁膜４０２を
堆積後コンタクト孔４０３を形成する。Next, the second manufacturing method will be explained. First, as shown in FIG. 9, an inorganic insulating film 402 is deposited on the surface of a semiconductor substrate 401, and then a contact hole 403 is formed.

次に第１０図に示すように第１の金属配線４０４を形成
する。ここまでは第１の製法と同じである。Next, as shown in FIG. 10, a first metal wiring 404 is formed. The process up to this point is the same as the first manufacturing method.

かくした後第１１図に示すように相間絶縁膜として有機
系の絶縁膜ポリイミド膜４０５を膜厚５０００人形成後
第１２図に示すように２層目の金属配線を形成し更に当
ポリイミド膜、金属配線を層状に形成し多層配線を形成
する。４層の多層配線をしたのが第１３図である。After this, as shown in FIG. 11, an organic insulating film polyimide film 405 is formed to a thickness of 5000 as an interphase insulating film, and then a second layer of metal wiring is formed as shown in FIG. Metal wiring is formed in layers to form multilayer wiring. FIG. 13 shows a four-layer multilayer wiring.

次に第１４図に示すように層間絶縁膜として用いたポリ
イミド膜を０２プラズマ処理で完全に除去する。かくし
だ後第１５図に示すように金属配線４０４を被覆するよ
うにシリコン窒化膜のような緻密な物質で保護絶縁膜４
０６を形成する。この保護絶縁膜はプラズマＣＶＤ法に
て膜厚５００〜１０００人堆積する。Next, as shown in FIG. 14, the polyimide film used as the interlayer insulating film is completely removed by 02 plasma treatment. After hiding, as shown in FIG. 15, a protective insulating film 4 is formed with a dense material such as a silicon nitride film to cover the metal wiring 404.
Form 06. This protective insulating film is deposited to a thickness of 500 to 1,000 layers by plasma CVD.

次に第１６図に示すように複合絶縁膜４０７を第１の製
法で述べたように熱処理で微相分離する塩基性酸化物／
酸性酸化物の混合絶縁物で形成した後、第１７図に示す
ようにこの複合絶縁膜４０７を多孔質絶縁膜に変換する
。Next, as shown in FIG. 16, a composite insulating film 407 is made of basic oxide/
After forming the mixed insulator of acidic oxides, this composite insulating film 407 is converted into a porous insulating film as shown in FIG.

この第２の製法では、金属配線と緻密な保護絶縁物でコ
ーティングするため、第１の製法に比べ、配線の信頼性
が向上する効果がある。In this second manufacturing method, since the metal wiring is coated with a dense protective insulator, the reliability of the wiring is improved compared to the first manufacturing method.

以上第１の製法、第２の製法について概略を述べたが、
プロセス上の変更、あるいは追加は種々考えられる。例
えば多孔質絶縁膜の形成後ベーキングを施し孔側壁に付
着した不純物を除去する工程を追加することや当方法で
多相配線を形成後全体のパッジベージ３ン膜を形成する
こと等も信頼性を高める上で有効となることに言及して
おく。Although the first and second manufacturing methods have been outlined above,
Various changes or additions can be made to the process. For example, adding a step of baking after forming a porous insulating film to remove impurities adhering to the side walls of the holes, or forming an entire padding layer after forming multiphase wiring using this method, can improve reliability. I would like to mention something that will be effective in increasing this.

〔発明の効果〕〔Effect of the invention〕

以上説明したように本発明は多層配線の相間絶縁膜を多
孔質絶縁物質で構成することにより、金属配線間の寄生
容量を大幅に（１／２以下）に低減でき、半導体デバイ
スの高密度化及び高速度化を容易にする効果がある。更
に又、配線技術の高信頼性も確保できる。As explained above, the present invention makes it possible to significantly reduce the parasitic capacitance between metal interconnects (to 1/2 or less) by configuring the interphase insulating film of multilayer interconnects with a porous insulating material, thereby increasing the density of semiconductor devices. This has the effect of facilitating high-speed operation. Furthermore, high reliability of wiring technology can also be ensured.

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は本発明の第１の実施例の縦断面図、第２図は本
発明の第２の実施例の縦断面図、第３図乃至第８図、第
９図乃至第１７図はそれぞれ第１の製法、第２の製法工
程を示す縦断面図である。 １０１．２０１，３０１，４０１・・・・・・半導体基
板、１０２，２０２，３０２，４０２・・・・・・無機
系の絶縁膜、１０３・・・・・・第１の金属配線、１０
４゜２０５．３０６，４０８・・・・・・多孔質絶縁膜
、１０５・・・・・・埋込金属、１０６・・・・・・第
２の金属配線、１０７・・・・・・第３の金属配線、１
０８・・・・・・第４の金属配線、２０３．３０４，４
０４・・・・・・金属配線、２０４゜４０６・・・・・
・保護絶縁膜、３０３，４０３・・・・・・コンタクト
孔、３０５，４０７・・・・・・複合絶縁膜、４０５・
・・・・・ポリイミド膜。 代理人　弁理士　　内　原　　　音 第　１　ｍ 芽　２ｒ５！Ｊ Ｈ３Ｉ！Ｉ！Ｔ草７　ｒＭ 弄５　回 乎６回 ＄／３ｒＸＪFIG. 1 is a vertical cross-sectional view of a first embodiment of the present invention, FIG. 2 is a vertical cross-sectional view of a second embodiment of the present invention, FIGS. 3 to 8, and 9 to 17 are FIG. 3 is a vertical cross-sectional view showing a first manufacturing method and a second manufacturing method, respectively. 101.201,301,401...Semiconductor substrate, 102,202,302,402...Inorganic insulating film, 103...First metal wiring, 10
4゜205.306,408... Porous insulating film, 105... Embedded metal, 106... Second metal wiring, 107...... No. 3 metal wiring, 1
08...Fourth metal wiring, 203.304,4
04...Metal wiring, 204°406...
・Protective insulating film, 303, 403... Contact hole, 305, 407... Composite insulating film, 405.
...Polyimide membrane. Agent Patent Attorney Uchihara Otodai 1m Bud 2r5! JH3I! I! T grass 7 rM play 5 times 6 times $/3rXJ

Claims (2)

【特許請求の範囲】[Claims] （１）半導体素子を形成した半導体基板上に多孔質絶縁
膜を介して多層に金属配線を形成したことを特徴とする
半導体装置(1) A semiconductor device characterized in that metal wiring is formed in multiple layers via a porous insulating film on a semiconductor substrate on which a semiconductor element is formed. （２）塩基性酸化物と酸性酸化物の混合した絶縁膜を第
１の層の金属配線を有する半導体基板上に堆積する工程
と、該混合した絶縁膜を熱処理する工程と、引き続いて
前記塩基性酸化物あるいは前記酸性酸化物のみを選択的
に溶解する薬品液に浸漬して多孔質絶縁膜を形成する工
程と、その後前記多孔質絶縁膜上に第２の層の金属配線
を形成する工程とを含むことを特徴とする半導体装置の
製造方法(2) a step of depositing an insulating film containing a mixture of a basic oxide and an acidic oxide on a semiconductor substrate having a first layer of metal wiring; a step of heat-treating the mixed insulating film; a step of forming a porous insulating film by immersing it in a chemical solution that selectively dissolves only the acidic oxide or the acidic oxide, and then forming a second layer of metal wiring on the porous insulating film. A method for manufacturing a semiconductor device, comprising:
JP63062552A 1988-03-15 1988-03-15 Semiconductor device and its manufacturing method Pending JPH01235254A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP63062552A JPH01235254A (en) 1988-03-15 1988-03-15 Semiconductor device and its manufacturing method
KR1019890003038A KR930002670B1 (en) 1988-03-15 1989-03-13 Semiconductor device and manufacturing method thereof
EP19890104509 EP0333132A3 (en) 1988-03-15 1989-03-14 Semiconductor device having multilayered wiring structure with a small parasitic capacitance
US07/677,619 US5103288A (en) 1988-03-15 1991-03-27 Semiconductor device having multilayered wiring structure with a small parasitic capacitance

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63062552A JPH01235254A (en) 1988-03-15 1988-03-15 Semiconductor device and its manufacturing method

Publications (1)

Publication Number Publication Date
JPH01235254A true JPH01235254A (en) 1989-09-20

Family

ID=13203532

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63062552A Pending JPH01235254A (en) 1988-03-15 1988-03-15 Semiconductor device and its manufacturing method

Country Status (4)

Country Link
US (1) US5103288A (en)
EP (1) EP0333132A3 (en)
JP (1) JPH01235254A (en)
KR (1) KR930002670B1 (en)

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US5073814A (en) * 1990-07-02 1991-12-17 General Electric Company Multi-sublayer dielectric layers
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US5196920A (en) * 1992-04-21 1993-03-23 Mitsubishi Denki Kabushiki Kaisha Semiconductor integrated circuit device for limiting capacitive coupling between adjacent circuit blocks
US5335200A (en) * 1993-01-05 1994-08-02 Texas Instruments Incorporated High voltage negative charge pump with low voltage CMOS transistors
FR2702595B1 (en) * 1993-03-11 1996-05-24 Toshiba Kk Multilayer wiring structure.
US5421958A (en) * 1993-06-07 1995-06-06 The United States Of America As Represented By The Administrator Of The United States National Aeronautics And Space Administration Selective formation of porous silicon
US5470801A (en) * 1993-06-28 1995-11-28 Lsi Logic Corporation Low dielectric constant insulation layer for integrated circuit structure and method of making same
US5393709A (en) * 1993-06-30 1995-02-28 United Microelectronics Corporation Method of making stress released VLSI structure by the formation of porous intermetal layer
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US5486493A (en) * 1994-02-25 1996-01-23 Jeng; Shin-Puu Planarized multi-level interconnect scheme with embedded low-dielectric constant insulators
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US5565384A (en) * 1994-04-28 1996-10-15 Texas Instruments Inc Self-aligned via using low permittivity dielectric
US5641711A (en) * 1994-04-28 1997-06-24 Texas Instruments Incorporated Low dielectric constant insulation in VLSI applications
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US5470802A (en) * 1994-05-20 1995-11-28 Texas Instruments Incorporated Method of making a semiconductor device using a low dielectric constant material
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US5750415A (en) * 1994-05-27 1998-05-12 Texas Instruments Incorporated Low dielectric constant layers via immiscible sol-gel processing
KR950034755A (en) * 1994-05-27 1995-12-28
US5432128A (en) * 1994-05-27 1995-07-11 Texas Instruments Incorporated Reliability enhancement of aluminum interconnects by reacting aluminum leads with a strengthening gas
US5548159A (en) * 1994-05-27 1996-08-20 Texas Instruments Incorporated Porous insulator for line-to-line capacitance reduction
US5461003A (en) * 1994-05-27 1995-10-24 Texas Instruments Incorporated Multilevel interconnect structure with air gaps formed between metal leads
JPH0845936A (en) * 1994-05-31 1996-02-16 Texas Instr Inc <Ti> High-speed lsi semiconductor device using dummy lead and itsreliability improvement method
US5476817A (en) * 1994-05-31 1995-12-19 Texas Instruments Incorporated Method of making reliable metal leads in high speed LSI semiconductors using both dummy leads and thermoconductive layers
US5510293A (en) * 1994-05-31 1996-04-23 Texas Instruments Incorporated Method of making reliable metal leads in high speed LSI semiconductors using thermoconductive layers
JPH0855913A (en) * 1994-06-07 1996-02-27 Texas Instr Inc <Ti> Selective filling method for void in submicron interconnection
US5494858A (en) * 1994-06-07 1996-02-27 Texas Instruments Incorporated Method for forming porous composites as a low dielectric constant layer with varying porosity distribution electronics applications
US5504042A (en) * 1994-06-23 1996-04-02 Texas Instruments Incorporated Porous dielectric material with improved pore surface properties for electronics applications
US5625232A (en) * 1994-07-15 1997-04-29 Texas Instruments Incorporated Reliability of metal leads in high speed LSI semiconductors using dummy vias
US5472913A (en) * 1994-08-05 1995-12-05 Texas Instruments Incorporated Method of fabricating porous dielectric material with a passivation layer for electronics applications
US5525857A (en) * 1994-08-19 1996-06-11 Texas Instruments Inc. Low density, high porosity material as gate dielectric for field emission device
US5807607A (en) * 1995-11-16 1998-09-15 Texas Instruments Incorporated Polyol-based method for forming thin film aerogels on semiconductor substrates
US6380105B1 (en) 1996-11-14 2002-04-30 Texas Instruments Incorporated Low volatility solvent-based method for forming thin film nanoporous aerogels on semiconductor substrates
US6319852B1 (en) 1995-11-16 2001-11-20 Texas Instruments Incorporated Nanoporous dielectric thin film formation using a post-deposition catalyst
US6130152A (en) 1995-11-16 2000-10-10 Texas Instruments Incorporated Aerogel thin film formation from multi-solvent systems
WO1998000862A1 (en) * 1996-06-28 1998-01-08 Advanced Micro Devices, Inc. Solid porous insulated conductive lines
US6054769A (en) * 1997-01-17 2000-04-25 Texas Instruments Incorporated Low capacitance interconnect structures in integrated circuits having an adhesion and protective overlayer for low dielectric materials
EP0963603B1 (en) 1997-01-21 2003-12-03 Georgia Tech Research Corporation Fabrication of a semiconductor device with air gaps for ultra-low capacitance interconnections
US6303488B1 (en) 1997-02-12 2001-10-16 Micron Technology, Inc. Semiconductor processing methods of forming openings to devices and substrates, exposing material from which photoresist cannot be substantially selectively removed
US5818111A (en) * 1997-03-21 1998-10-06 Texas Instruments Incorporated Low capacitance interconnect structures in integrated circuits using a stack of low dielectric materials
JP3202657B2 (en) * 1997-05-23 2001-08-27 日本電気株式会社 Method for manufacturing semiconductor device
US5801092A (en) * 1997-09-04 1998-09-01 Ayers; Michael R. Method of making two-component nanospheres and their use as a low dielectric constant material for semiconductor devices
US6858526B2 (en) * 1998-07-14 2005-02-22 Micron Technology, Inc. Methods of forming materials between conductive electrical components, and insulating materials
US6333556B1 (en) 1997-10-09 2001-12-25 Micron Technology, Inc. Insulating materials
US6251470B1 (en) 1997-10-09 2001-06-26 Micron Technology, Inc. Methods of forming insulating materials, and methods of forming insulating materials around a conductive component
US6350704B1 (en) 1997-10-14 2002-02-26 Micron Technology Inc. Porous silicon oxycarbide integrated circuit insulator
RU2195050C2 (en) 1998-06-05 2002-12-20 Джорджиэ Тек Рисеч Копэрейшн Method for producing porous insulating compound (alternatives), composite used for producing porous insulating material (alternatives), and semiconductor device
US6352940B1 (en) * 1998-06-26 2002-03-05 Intel Corporation Semiconductor passivation deposition process for interfacial adhesion
US6710538B1 (en) * 1998-08-26 2004-03-23 Micron Technology, Inc. Field emission display having reduced power requirements and method
TW429576B (en) * 1998-10-14 2001-04-11 United Microelectronics Corp Manufacturing method for metal interconnect
US6403209B1 (en) 1998-12-11 2002-06-11 Candescent Technologies Corporation Constitution and fabrication of flat-panel display and porous-faced structure suitable for partial or full use in spacer of flat-panel display
US6617772B1 (en) 1998-12-11 2003-09-09 Candescent Technologies Corporation Flat-panel display having spacer with rough face for inhibiting secondary electron escape
US6495468B2 (en) 1998-12-22 2002-12-17 Micron Technology, Inc. Laser ablative removal of photoresist
US6331481B1 (en) 1999-01-04 2001-12-18 International Business Machines Corporation Damascene etchback for low ε dielectric
US6280794B1 (en) * 1999-03-10 2001-08-28 Conexant Systems, Inc. Method of forming dielectric material suitable for microelectronic circuits
US6312793B1 (en) * 1999-05-26 2001-11-06 International Business Machines Corporation Multiphase low dielectric constant material
US6306754B1 (en) * 1999-06-29 2001-10-23 Micron Technology, Inc. Method for forming wiring with extremely low parasitic capacitance
US6350679B1 (en) 1999-08-03 2002-02-26 Micron Technology, Inc. Methods of providing an interlevel dielectric layer intermediate different elevation conductive metal layers in the fabrication of integrated circuitry
US7335965B2 (en) * 1999-08-25 2008-02-26 Micron Technology, Inc. Packaging of electronic chips with air-bridge structures
US7276788B1 (en) 1999-08-25 2007-10-02 Micron Technology, Inc. Hydrophobic foamed insulators for high density circuits
JP3980801B2 (en) * 1999-09-16 2007-09-26 株式会社東芝 Three-dimensional structure and manufacturing method thereof
US6277766B1 (en) 2000-02-03 2001-08-21 Michael Raymond Ayers Method of making fullerene-decorated nanoparticles and their use as a low dielectric constant material for semiconductor devices
US6413827B2 (en) 2000-02-14 2002-07-02 Paul A. Farrar Low dielectric constant shallow trench isolation
US6677209B2 (en) 2000-02-14 2004-01-13 Micron Technology, Inc. Low dielectric constant STI with SOI devices
US6890847B1 (en) * 2000-02-22 2005-05-10 Micron Technology, Inc. Polynorbornene foam insulation for integrated circuits
US6329062B1 (en) 2000-02-29 2001-12-11 Novellus Systems, Inc. Dielectric layer including silicalite crystals and binder and method for producing same for microelectronic circuits
EP1172847A3 (en) * 2000-07-10 2004-07-28 Interuniversitair Micro-Elektronica Centrum Vzw A method to produce a porous oxygen-silicon layer
US6319858B1 (en) * 2000-07-11 2001-11-20 Nano-Architect Research Corporation Methods for reducing a dielectric constant of a dielectric film and for forming a low dielectric constant porous film
US6524944B1 (en) 2000-07-17 2003-02-25 Advanced Micro Devices, Inc. Low k ILD process by removable ILD
TWI226103B (en) * 2000-08-31 2005-01-01 Georgia Tech Res Inst Fabrication of semiconductor devices with air gaps for ultra low capacitance interconnections and methods of making same
US6406964B1 (en) 2000-11-01 2002-06-18 Advanced Micro Devices, Inc. Method of controlling junction recesses in a semiconductor device
US20020076543A1 (en) * 2000-12-19 2002-06-20 Sikonia John G. Layered dielectric nanoporous materials and methods of producing same
US6703324B2 (en) * 2000-12-21 2004-03-09 Intel Corporation Mechanically reinforced highly porous low dielectric constant films
US6533855B1 (en) 2001-02-13 2003-03-18 Novellus Systems, Inc. Dispersions of silicalite and zeolite nanoparticles in nonpolar solvents
US6603204B2 (en) * 2001-02-28 2003-08-05 International Business Machines Corporation Low-k interconnect structure comprised of a multilayer of spin-on porous dielectrics
US6685983B2 (en) 2001-03-14 2004-02-03 International Business Machines Corporation Defect-free dielectric coatings and preparation thereof using polymeric nitrogenous porogens
US6670285B2 (en) * 2001-03-14 2003-12-30 International Business Machines Corporation Nitrogen-containing polymers as porogens in the preparation of highly porous, low dielectric constant materials
DE10112561C2 (en) * 2001-03-15 2003-12-18 Infineon Technologies Ag Process for producing porous organic layers adhering to a substrate
US6984892B2 (en) * 2001-03-28 2006-01-10 Lam Research Corporation Semiconductor structure implementing low-K dielectric materials and supporting stubs
JP2002353307A (en) 2001-05-25 2002-12-06 Toshiba Corp Semiconductor device
KR100796751B1 (en) * 2001-06-07 2008-01-22 삼성전자주식회사 Insulating film for optical device, manufacturing method thereof, liquid crystal display using same and manufacturing method thereof
JP4540885B2 (en) * 2001-06-29 2010-09-08 ローム株式会社 Manufacturing method of semiconductor device
JP2003017485A (en) * 2001-06-29 2003-01-17 Rohm Co Ltd Semiconductor device and method for manufacturing the same
US7075170B2 (en) * 2001-06-29 2006-07-11 Rohm Co., Ltd. Semiconductor device and production method therefor
JP2004103665A (en) * 2002-09-05 2004-04-02 Toshiba Corp Electronic device module
JP4574145B2 (en) * 2002-09-13 2010-11-04 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． Air gap formation
JP4056347B2 (en) * 2002-09-30 2008-03-05 ローム株式会社 Semiconductor light emitting device and manufacturing method thereof
US6943121B2 (en) * 2002-11-21 2005-09-13 Intel Corporation Selectively converted inter-layer dielectric
US7192892B2 (en) 2003-03-04 2007-03-20 Micron Technology, Inc. Atomic layer deposited dielectric layers
US7238604B2 (en) * 2003-04-24 2007-07-03 Intel Corporation Forming thin hard mask over air gap or porous dielectric
EP1521300A1 (en) * 2003-09-30 2005-04-06 STMicroelectronics S.r.l. Circuit structure integrated on a semiconductor substrate and relevant manufacturing method
US20050137882A1 (en) * 2003-12-17 2005-06-23 Cameron Don T. Method for authenticating goods
US7531209B2 (en) * 2005-02-24 2009-05-12 Michael Raymond Ayers Porous films and bodies with enhanced mechanical strength
US7927948B2 (en) 2005-07-20 2011-04-19 Micron Technology, Inc. Devices with nanocrystals and methods of formation
US8055444B2 (en) * 2006-04-04 2011-11-08 Yahoo! Inc. Content display and navigation interface
US7573074B2 (en) 2006-05-19 2009-08-11 Bridgelux, Inc. LED electrode
US7737455B2 (en) 2006-05-19 2010-06-15 Bridgelux, Inc. Electrode structures for LEDs with increased active area
WO2007143029A1 (en) * 2006-05-31 2007-12-13 Roskilde Semiconductor Llc Porous materials derived from polymer composites
US7919188B2 (en) 2006-05-31 2011-04-05 Roskilde Semiconductor Llc Linked periodic networks of alternating carbon and inorganic clusters for use as low dielectric constant materials
US7790234B2 (en) * 2006-05-31 2010-09-07 Michael Raymond Ayers Low dielectric constant materials prepared from soluble fullerene clusters
WO2007143025A2 (en) * 2006-05-31 2007-12-13 Roskilde Semiconductor Llc Porous inorganic solids for use as low dielectric constant materials
FR2910178B1 (en) 2006-12-15 2009-05-15 St Microelectronics Sa METHOD FOR MAKING A POROUS DIELECTRIC ELEMENT AND CORRESPONDING DIELECTRIC ELEMENT

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5910073B2 (en) * 1972-10-27 1984-03-06 株式会社日立製作所 Method for manufacturing silicon gate MOS type semiconductor device
JPS4995591A (en) * 1973-01-12 1974-09-10
JPS551109A (en) * 1978-06-16 1980-01-07 Fujitsu Ltd Manufacture of semiconductor device
JPS5595857A (en) * 1979-01-16 1980-07-21 Nippon Sheet Glass Co Ltd Moisture detection element
JPS5799756A (en) * 1980-12-13 1982-06-21 Toshiba Corp Semiconductor device and its manufacture
JPS57113252A (en) * 1980-12-29 1982-07-14 Seiko Epson Corp Manufacture of semiconductor device
DE3277759D1 (en) * 1981-09-18 1988-01-07 Fujitsu Ltd Semiconductor device having new conductive interconnection structure and method for manufacturing the same
US4460666A (en) * 1981-11-24 1984-07-17 Dinkler Leonard R Coated substrate, preparation thereof, and use thereof
JPS58182546A (en) * 1982-04-21 1983-10-25 Hitachi Ltd Humidity sensor
JPS60234346A (en) * 1984-05-07 1985-11-21 Nec Corp Semiconductor device
JPS6110757A (en) * 1984-06-26 1986-01-18 Nissan Motor Co Ltd Air/fuel ratio sensor
US4582575A (en) * 1984-09-04 1986-04-15 Rockwell International Corporation Electrically conductive composites and method of preparation
US4834034A (en) * 1984-11-26 1989-05-30 John Velencei Internal combustion engines
JPH0715938B2 (en) * 1985-05-23 1995-02-22 日本電信電話株式会社 Semiconductor device and manufacturing method thereof
JPS62188399A (en) * 1986-02-14 1987-08-17 日本電気株式会社 Ceramic wiring board
DE3750205T2 (en) * 1986-08-29 1994-12-08 Hitachi Chemical Co Ltd High frequency circuit substrate and method of manufacturing the same.
JPS63127551A (en) * 1986-11-17 1988-05-31 Toshiba Corp Manufacture of semiconductor device
JPH0612790B2 (en) * 1987-02-24 1994-02-16 日本電気株式会社 Semiconductor device
US4946709A (en) * 1988-07-18 1990-08-07 Mitsubishi Denki Kabushiki Kaisha Method for fabricating hybrid integrated circuit

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5942802A (en) * 1995-10-09 1999-08-24 Matsushita Electric Industrial Co., Ltd. Semiconductor device and method of producing the same
US6171979B1 (en) 1995-10-09 2001-01-09 Matsushita Electric Industrial Co., Ltd. Semiconductor device and method of producing the same
US6200912B1 (en) 1995-10-09 2001-03-13 Matsushita Electric Industrial Co., Ltd. Semiconductor device and method of producing the same
KR19990014019A (en) * 1997-07-22 1999-02-25 이데이 노부유끼 Method of manufacturing dielectric film
US6794754B2 (en) 1998-03-31 2004-09-21 Hiroshi Morisaki Semiconductor device with porous interlayer insulating film
US6812163B2 (en) 1998-03-31 2004-11-02 Semiconductor Technology Academic Research Center Semiconductor device with porous interlayer insulating film
US7265064B2 (en) 1998-03-31 2007-09-04 Semiconductor Technology Academic Research Center Semiconductor device with porous interlayer insulating film
JP2003519924A (en) * 2000-01-05 2003-06-24 アドバンスト・マイクロ・ディバイシズ・インコーポレイテッド Semiconductor device having reduced signal processing time and method of manufacturing the same
JP2012054586A (en) * 2000-05-08 2012-03-15 Denki Kagaku Kogyo Kk METHOD OF PRODUCING LOW DIELECTRIC CONSTANT SiOx FILM
KR100480412B1 (en) * 2002-02-26 2005-04-06 가부시키가이샤 히타치세이사쿠쇼 Thin film transistor and display apparatus with the same
JP2008258488A (en) * 2007-04-06 2008-10-23 Oki Electric Ind Co Ltd Manufacturing method of semiconductor device

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