JP7511584B2 - 被覆切削工具 - Google Patents
被覆切削工具 Download PDFInfo
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- JP7511584B2 JP7511584B2 JP2021570402A JP2021570402A JP7511584B2 JP 7511584 B2 JP7511584 B2 JP 7511584B2 JP 2021570402 A JP2021570402 A JP 2021570402A JP 2021570402 A JP2021570402 A JP 2021570402A JP 7511584 B2 JP7511584 B2 JP 7511584B2
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- 238000005520 cutting process Methods 0.000 title claims description 43
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 51
- 239000000758 substrate Substances 0.000 claims description 46
- 238000000576 coating method Methods 0.000 claims description 44
- 239000011230 binding agent Substances 0.000 claims description 37
- 238000000151 deposition Methods 0.000 claims description 37
- 239000011248 coating agent Substances 0.000 claims description 36
- 230000008021 deposition Effects 0.000 claims description 33
- 238000000034 method Methods 0.000 claims description 31
- 238000005229 chemical vapour deposition Methods 0.000 claims description 23
- 229910052759 nickel Inorganic materials 0.000 claims description 20
- 229910052742 iron Inorganic materials 0.000 claims description 10
- 229910003074 TiCl4 Inorganic materials 0.000 claims description 6
- 238000002441 X-ray diffraction Methods 0.000 claims description 6
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 claims description 6
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 4
- 238000004364 calculation method Methods 0.000 claims description 3
- 230000005855 radiation Effects 0.000 claims description 3
- 229910052593 corundum Inorganic materials 0.000 claims 3
- 229910001845 yogo sapphire Inorganic materials 0.000 claims 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 claims 1
- QYEXBYZXHDUPRC-UHFFFAOYSA-N B#[Ti]#B Chemical compound B#[Ti]#B QYEXBYZXHDUPRC-UHFFFAOYSA-N 0.000 claims 1
- 229910033181 TiB2 Inorganic materials 0.000 claims 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 11
- 239000007789 gas Substances 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- 238000001878 scanning electron micrograph Methods 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 238000005259 measurement Methods 0.000 description 5
- 239000000843 powder Substances 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- 230000036961 partial effect Effects 0.000 description 4
- 150000001247 metal acetylides Chemical class 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052758 niobium Inorganic materials 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- 229910017488 Cu K Inorganic materials 0.000 description 1
- 229910017541 Cu-K Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 238000009672 coating analysis Methods 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 230000002860 competitive effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000007405 data analysis Methods 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000013507 mapping Methods 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000004626 scanning electron microscopy Methods 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C29/00—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides
- C22C29/005—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides comprising a particular metallic binder
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C29/00—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides
- C22C29/02—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides based on carbides or carbonitrides
- C22C29/06—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides based on carbides or carbonitrides based on carbides, but not containing other metal compounds
- C22C29/067—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides based on carbides or carbonitrides based on carbides, but not containing other metal compounds comprising a particular metallic binder
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C29/00—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides
- C22C29/02—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides based on carbides or carbonitrides
- C22C29/06—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides based on carbides or carbonitrides based on carbides, but not containing other metal compounds
- C22C29/08—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides based on carbides or carbonitrides based on carbides, but not containing other metal compounds based on tungsten carbide
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/34—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/36—Carbonitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/044—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material coatings specially adapted for cutting tools or wear applications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
- C23C30/005—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process on hard metal substrates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F5/00—Manufacture of workpieces or articles from metallic powder characterised by the special shape of the product
- B22F2005/001—Cutting tools, earth boring or grinding tool other than table ware
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
- B22F2998/10—Processes characterised by the sequence of their steps
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Vapour Deposition (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
Description
[式中、I(hkl)は、(hkl)反射の測定強度(積分面積)であり、I0(hkl)は、ICDDのPDFカード番号42-1489による標準強度であり、nは反射数であり、計算において使用される反射は、(1 1 1)、(2 0 0)、(2 2 0)、(3 1 1)、(3 3 1)、(4 2 0)、(4 2 2)および(5 1 1)である。]に従って定義される、CuKα線およびθ-2θスキャンを使用するX線回折により測定される集合組織係数TC(hkl)を示し、TC(4 2 2)は≧3.5である。
被覆堆積
以下の例における被覆は、10000個の半インチサイズの切削インサートを収容することができるラジアルIonbond Bernex(商標)タイプCVD装置530サイズ内で堆積された。
層の集合組織を調査するために、PIXcel検出器を備えたPANalytical CubiX3回折計を使用して、切削工具インサートの逃げ面上でX線回折が実施された。切削工具インサートの逃げ面が試料ホルダーの基準面に平行であり、さらに逃げ面が適切な高さにあるように被覆切削工具インサートを試料ホルダー内に取り付けた。Cu-Kα線が、45kVの電圧および40mAの電流で測定のために使用された。1/2度の散乱防止スリットおよび1/4度の発散スリットが使用された。被覆切削工具からの回折強度が範囲20°~140° 2θ内で、すなわち10~70°の入射角θ範囲にわたって測定された。
旋削用ISO型CNMG120408およびISO型SNMA120408の超硬合金基材を製造した。
XRDを使用して、上記で開示した方法にしたがってTiCNのTC値を分析した。光学顕微鏡において倍率1000倍で各被覆の断面を研究することにより層厚さを分析した。結合層および初期TiN層の両方がTiCN層厚さに含まれる(表1参照)。XRDによる結果を表3に示す。
Claims (16)
- 被覆切削工具を作製する方法であって、基材上のTiNの内層およびTiCNの後続層を含む被覆の化学気相堆積を含み、基材は、金属性バインダー中の硬質成分から構成される超硬合金で作られており、金属性バインダーは60~90wt%のNiを含み、TiN層が、850~900℃の温度および300~600mbarの圧力の2つの逐次工程:TiN-1の第1のTiN堆積とTiN-2の第2のTiN堆積において超硬合金基材上に堆積されることを特徴とし、
TiN-1堆積は、1~1.5vol%のTiCl4およびH2およびN2を含む気体中で実施され、体積比H2/N2は、0.05~0.18であり、気体は、0.5~1.5vol%のHClを含み、
TiN-2堆積は、2~3vol%のTiCl4およびH2およびN2を含む気体中で実施され、体積比H2/N2は、0.8~2.5である、方法。 - TiCNの層は、875~895℃の温度および50~70mbarの圧力の2つの逐次工程:TiCNの第1の堆積とTiCNの第2の堆積において堆積され、
第1のTiCN堆積は、55~65vol%のH2、35~40vol%のN2、2.8~3.1vol%のTiCl4および0.4~0.5vol%のCH3CNを含む気体中で実施され、
第2のTiCN堆積は、75~85vol%のH2、6~9vol%のN2、2.3~2.5vol%のTiCl4、0.6~0.7vol%のCH3CNおよび7~9vol%のHClを含む気体中で実施される、請求項1に記載の方法。 - 金属性バインダーが、10~20wt%のFeを含む、請求項1または2に記載の方法。
- 金属性バインダーが、65~88wt%のNiを含む、請求項1から3のいずれか一項に記載の方法。
- 金属性バインダーが、3~8wt%のCoを含む、請求項1から4のいずれか一項に記載の方法。
- 超硬合金中の金属性バインダーの含有量が、3~20wt%である、請求項1から5のいずれか一項に記載の方法。
- 基材および被覆を含む被覆切削工具であって、基材は、金属性バインダー中の硬質成分から構成される超硬合金で作られており、前記金属性バインダーは60~90wt%のNiを含み、被覆は、内側TiN層およびTiCN層を含み、TiCNは結晶粒から構成され、TiN層から1μmの位置で基材の表面に平行な方向の線に沿って測定されるTiCN層の粒径は、0.10~0.30μmである、被覆切削工具。
- 金属性バインダーが、10~20wt%のFeを含む、請求項7に記載の被覆切削工具。
- 金属性バインダーが、65~88wt%のNiを含む、請求項7または8に記載の被覆切削工具。
- 金属性バインダーが、3~8wt%のCoを含む、請求項7から9のいずれか一項に記載の被覆切削工具。
- 超硬合金中の金属性バインダーの含有量が、3~20wt%である、請求項7から10のいずれか一項に記載の被覆切削工具。
- TiN層の厚さが0.3~1μmであり、超硬合金基材上に直接堆積される、請求項7から11のいずれか一項に記載の被覆切削工具。
- TiCN層の厚さが6~12μmである、請求項7から13のいずれか一項に記載の被覆切削工具。
- CVD被覆が、TiN、TiCN、AlTiN、ZrCN、TiB2、Al2O3から選択される1つもしくは複数の層、またはα-Al2O3および/もしくはκ-Al2O3を含む多層をさらに含む、請求項7から14のいずれか一項に記載の被覆切削工具。
- CVD被覆の総厚さが2~20μmである、請求項7から15のいずれか一項に記載の被覆切削工具。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP19176705.2 | 2019-05-27 | ||
EP19176705 | 2019-05-27 | ||
PCT/EP2020/064492 WO2020239718A1 (en) | 2019-05-27 | 2020-05-26 | A coated cutting tool |
Publications (2)
Publication Number | Publication Date |
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JP2022534111A JP2022534111A (ja) | 2022-07-27 |
JP7511584B2 true JP7511584B2 (ja) | 2024-07-05 |
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JP2021570402A Active JP7511584B2 (ja) | 2019-05-27 | 2020-05-26 | 被覆切削工具 |
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US (1) | US20220205109A1 (ja) |
EP (1) | EP3976849B1 (ja) |
JP (1) | JP7511584B2 (ja) |
KR (1) | KR20220012855A (ja) |
CN (1) | CN113874546B (ja) |
BR (1) | BR112021023613A2 (ja) |
WO (1) | WO2020239718A1 (ja) |
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EP4006199A1 (en) * | 2020-11-26 | 2022-06-01 | AB Sandvik Coromant | A coated cutting tool |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2004308008A (ja) | 2003-04-01 | 2004-11-04 | Sandvik Ab | 切削工具及びその製造方法 |
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BR112021023613A2 (pt) | 2022-01-04 |
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