JP7484208B2 - Urethane resin composition and method for producing porous body - Google Patents
Urethane resin composition and method for producing porous body Download PDFInfo
- Publication number
- JP7484208B2 JP7484208B2 JP2020023358A JP2020023358A JP7484208B2 JP 7484208 B2 JP7484208 B2 JP 7484208B2 JP 2020023358 A JP2020023358 A JP 2020023358A JP 2020023358 A JP2020023358 A JP 2020023358A JP 7484208 B2 JP7484208 B2 JP 7484208B2
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- JP
- Japan
- Prior art keywords
- urethane resin
- resin composition
- film
- porous body
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 229920002803 thermoplastic polyurethane Polymers 0.000 title claims description 54
- 239000011342 resin composition Substances 0.000 title claims description 24
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 150000002430 hydrocarbons Chemical class 0.000 claims description 28
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 22
- 150000003077 polyols Chemical class 0.000 claims description 21
- 239000004215 Carbon black (E152) Substances 0.000 claims description 19
- 229930195733 hydrocarbon Natural products 0.000 claims description 19
- 229920005862 polyol Polymers 0.000 claims description 16
- 239000002904 solvent Substances 0.000 claims description 14
- 125000004432 carbon atom Chemical group C* 0.000 claims description 13
- 239000005056 polyisocyanate Substances 0.000 claims description 10
- 229920001228 polyisocyanate Polymers 0.000 claims description 10
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 claims description 5
- 238000006243 chemical reaction Methods 0.000 claims description 5
- 229920005906 polyester polyol Polymers 0.000 claims description 4
- 239000002994 raw material Substances 0.000 claims description 2
- 238000000034 method Methods 0.000 description 22
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 21
- 239000004793 Polystyrene Substances 0.000 description 16
- 229920002223 polystyrene Polymers 0.000 description 16
- 230000006835 compression Effects 0.000 description 14
- 238000007906 compression Methods 0.000 description 14
- 239000004970 Chain extender Substances 0.000 description 11
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 11
- 230000015572 biosynthetic process Effects 0.000 description 11
- 239000000203 mixture Substances 0.000 description 10
- 239000000758 substrate Substances 0.000 description 10
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 9
- 238000005498 polishing Methods 0.000 description 9
- -1 aliphatic polyol compounds Chemical class 0.000 description 8
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 6
- 238000003786 synthesis reaction Methods 0.000 description 6
- 230000015271 coagulation Effects 0.000 description 5
- 238000005345 coagulation Methods 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 238000005227 gel permeation chromatography Methods 0.000 description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 5
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 4
- 125000003277 amino group Chemical group 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 239000000835 fiber Substances 0.000 description 4
- 239000002649 leather substitute Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 239000007795 chemical reaction product Substances 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 2
- FKTHNVSLHLHISI-UHFFFAOYSA-N 1,2-bis(isocyanatomethyl)benzene Chemical compound O=C=NCC1=CC=CC=C1CN=C=O FKTHNVSLHLHISI-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 description 2
- 239000001361 adipic acid Substances 0.000 description 2
- 235000011037 adipic acid Nutrition 0.000 description 2
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- 238000005470 impregnation Methods 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- CKFGINPQOCXMAZ-UHFFFAOYSA-N methanediol Chemical compound OCO CKFGINPQOCXMAZ-UHFFFAOYSA-N 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- DNIAPMSPPWPWGF-VKHMYHEASA-N (+)-propylene glycol Chemical compound C[C@H](O)CO DNIAPMSPPWPWGF-VKHMYHEASA-N 0.000 description 1
- NNOZGCICXAYKLW-UHFFFAOYSA-N 1,2-bis(2-isocyanatopropan-2-yl)benzene Chemical compound O=C=NC(C)(C)C1=CC=CC=C1C(C)(C)N=C=O NNOZGCICXAYKLW-UHFFFAOYSA-N 0.000 description 1
- MTZUIIAIAKMWLI-UHFFFAOYSA-N 1,2-diisocyanatobenzene Chemical compound O=C=NC1=CC=CC=C1N=C=O MTZUIIAIAKMWLI-UHFFFAOYSA-N 0.000 description 1
- ZXHZWRZAWJVPIC-UHFFFAOYSA-N 1,2-diisocyanatonaphthalene Chemical compound C1=CC=CC2=C(N=C=O)C(N=C=O)=CC=C21 ZXHZWRZAWJVPIC-UHFFFAOYSA-N 0.000 description 1
- CYSGHNMQYZDMIA-UHFFFAOYSA-N 1,3-Dimethyl-2-imidazolidinon Chemical compound CN1CCN(C)C1=O CYSGHNMQYZDMIA-UHFFFAOYSA-N 0.000 description 1
- YPFDHNVEDLHUCE-UHFFFAOYSA-N 1,3-propanediol Substances OCCCO YPFDHNVEDLHUCE-UHFFFAOYSA-N 0.000 description 1
- ZFPGARUNNKGOBB-UHFFFAOYSA-N 1-Ethyl-2-pyrrolidinone Chemical compound CCN1CCCC1=O ZFPGARUNNKGOBB-UHFFFAOYSA-N 0.000 description 1
- LFSYUSUFCBOHGU-UHFFFAOYSA-N 1-isocyanato-2-[(4-isocyanatophenyl)methyl]benzene Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=CC=C1N=C=O LFSYUSUFCBOHGU-UHFFFAOYSA-N 0.000 description 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- NSMWYRLQHIXVAP-UHFFFAOYSA-N 2,5-dimethylpiperazine Chemical compound CC1CNC(C)CN1 NSMWYRLQHIXVAP-UHFFFAOYSA-N 0.000 description 1
- JOMNTHCQHJPVAZ-UHFFFAOYSA-N 2-methylpiperazine Chemical compound CC1CNCCN1 JOMNTHCQHJPVAZ-UHFFFAOYSA-N 0.000 description 1
- RNLHGQLZWXBQNY-UHFFFAOYSA-N 3-(aminomethyl)-3,5,5-trimethylcyclohexan-1-amine Chemical compound CC1(C)CC(N)CC(C)(CN)C1 RNLHGQLZWXBQNY-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- NZGQHKSLKRFZFL-UHFFFAOYSA-N 4-(4-hydroxyphenoxy)phenol Chemical compound C1=CC(O)=CC=C1OC1=CC=C(O)C=C1 NZGQHKSLKRFZFL-UHFFFAOYSA-N 0.000 description 1
- 229920002972 Acrylic fiber Polymers 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- 244000025254 Cannabis sativa Species 0.000 description 1
- 235000012766 Cannabis sativa ssp. sativa var. sativa Nutrition 0.000 description 1
- 235000012765 Cannabis sativa ssp. sativa var. spontanea Nutrition 0.000 description 1
- 229920000742 Cotton Polymers 0.000 description 1
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 1
- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 1
- 239000005058 Isophorone diisocyanate Substances 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- OMRDSWJXRLDPBB-UHFFFAOYSA-N N=C=O.N=C=O.C1CCCCC1 Chemical compound N=C=O.N=C=O.C1CCCCC1 OMRDSWJXRLDPBB-UHFFFAOYSA-N 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- 229920000297 Rayon Polymers 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- CZMRCDWAGMRECN-UGDNZRGBSA-N Sucrose Chemical compound O[C@H]1[C@H](O)[C@@H](CO)O[C@@]1(CO)O[C@@H]1[C@H](O)[C@@H](O)[C@H](O)[C@@H](CO)O1 CZMRCDWAGMRECN-UGDNZRGBSA-N 0.000 description 1
- 229930006000 Sucrose Natural products 0.000 description 1
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 1
- KXBFLNPZHXDQLV-UHFFFAOYSA-N [cyclohexyl(diisocyanato)methyl]cyclohexane Chemical compound C1CCCCC1C(N=C=O)(N=C=O)C1CCCCC1 KXBFLNPZHXDQLV-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 230000009102 absorption Effects 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 229920006221 acetate fiber Polymers 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- LHIJANUOQQMGNT-UHFFFAOYSA-N aminoethylethanolamine Chemical compound NCCNCCO LHIJANUOQQMGNT-UHFFFAOYSA-N 0.000 description 1
- 239000003242 anti bacterial agent Substances 0.000 description 1
- 230000003712 anti-aging effect Effects 0.000 description 1
- 230000000844 anti-bacterial effect Effects 0.000 description 1
- 239000003429 antifungal agent Substances 0.000 description 1
- 229940121375 antifungal agent Drugs 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 230000003385 bacteriostatic effect Effects 0.000 description 1
- HIFVAOIJYDXIJG-UHFFFAOYSA-N benzylbenzene;isocyanic acid Chemical class N=C=O.N=C=O.C=1C=CC=CC=1CC1=CC=CC=C1 HIFVAOIJYDXIJG-UHFFFAOYSA-N 0.000 description 1
- VCCBEIPGXKNHFW-UHFFFAOYSA-N biphenyl-4,4'-diol Chemical group C1=CC(O)=CC=C1C1=CC=C(O)C=C1 VCCBEIPGXKNHFW-UHFFFAOYSA-N 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000011088 calibration curve Methods 0.000 description 1
- 235000009120 camo Nutrition 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 235000005607 chanvre indien Nutrition 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 230000008094 contradictory effect Effects 0.000 description 1
- SSJXIUAHEKJCMH-UHFFFAOYSA-N cyclohexane-1,2-diamine Chemical compound NC1CCCCC1N SSJXIUAHEKJCMH-UHFFFAOYSA-N 0.000 description 1
- VKIRRGRTJUUZHS-UHFFFAOYSA-N cyclohexane-1,4-diamine Chemical compound NC1CCC(N)CC1 VKIRRGRTJUUZHS-UHFFFAOYSA-N 0.000 description 1
- 230000001877 deodorizing effect Effects 0.000 description 1
- 235000013681 dietary sucrose Nutrition 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000003480 eluent Substances 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 235000019256 formaldehyde Nutrition 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 239000011487 hemp Substances 0.000 description 1
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- AYLRODJJLADBOB-QMMMGPOBSA-N methyl (2s)-2,6-diisocyanatohexanoate Chemical compound COC(=O)[C@@H](N=C=O)CCCCN=C=O AYLRODJJLADBOB-QMMMGPOBSA-N 0.000 description 1
- GXMIHVHJTLPVKL-UHFFFAOYSA-N n,n,2-trimethylpropanamide Chemical compound CC(C)C(=O)N(C)C GXMIHVHJTLPVKL-UHFFFAOYSA-N 0.000 description 1
- AJFDBNQQDYLMJN-UHFFFAOYSA-N n,n-diethylacetamide Chemical compound CCN(CC)C(C)=O AJFDBNQQDYLMJN-UHFFFAOYSA-N 0.000 description 1
- OVHHHVAVHBHXAK-UHFFFAOYSA-N n,n-diethylprop-2-enamide Chemical compound CCN(CC)C(=O)C=C OVHHHVAVHBHXAK-UHFFFAOYSA-N 0.000 description 1
- 229940088644 n,n-dimethylacrylamide Drugs 0.000 description 1
- YLGYACDQVQQZSW-UHFFFAOYSA-N n,n-dimethylprop-2-enamide Chemical compound CN(C)C(=O)C=C YLGYACDQVQQZSW-UHFFFAOYSA-N 0.000 description 1
- MBHINSULENHCMF-UHFFFAOYSA-N n,n-dimethylpropanamide Chemical compound CCC(=O)N(C)C MBHINSULENHCMF-UHFFFAOYSA-N 0.000 description 1
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- 239000004626 polylactic acid Substances 0.000 description 1
- 229920000166 polytrimethylene carbonate Polymers 0.000 description 1
- 229920006306 polyurethane fiber Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- AOHJOMMDDJHIJH-UHFFFAOYSA-N propylenediamine Chemical compound CC(N)CN AOHJOMMDDJHIJH-UHFFFAOYSA-N 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 239000002964 rayon Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
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- 239000004065 semiconductor Substances 0.000 description 1
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- 239000002002 slurry Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
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- 239000004094 surface-active agent Substances 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
- 210000002268 wool Anatomy 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
- C09D175/04—Polyurethanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J9/00—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
- C08J9/28—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof by elimination of a liquid phase from a macromolecular composition or article, e.g. drying of coagulum
- C08J9/286—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof by elimination of a liquid phase from a macromolecular composition or article, e.g. drying of coagulum the liquid phase being a solvent for the monomers but not for the resulting macromolecular composition, i.e. macroporous or macroreticular polymers
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- C—CHEMISTRY; METALLURGY
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Description
本発明は、ウレタン樹脂組成物、及び、湿式製膜法による多孔体の製造方法に関する。 The present invention relates to a urethane resin composition and a method for producing a porous body by a wet film-forming method.
液晶ガラス、ハードディスクガラス、シリコンウエハ、半導体などの高度な表面平坦性が要求される分野においては、ウレタン樹脂組成物を使用した研磨パッドが広く利用されている。中でも、最終の仕上げ研磨においては、DMF(ジメチルホルムアミド)等の溶剤で希釈したウレタン樹脂を水中で凝固させる湿式成膜法によって加工された軟質な多孔体が使用されている(例えば、特許文献1を参照。)。 Polishing pads using urethane resin compositions are widely used in fields that require high surface flatness, such as liquid crystal glass, hard disk glass, silicon wafers, and semiconductors. In particular, for the final finishing polishing, soft porous bodies are used that are processed by a wet film formation method in which urethane resin diluted with a solvent such as DMF (dimethylformamide) is solidified in water (see, for example, Patent Document 1).
この多孔体による研磨パッドに対して要求される特性としては、例えば、加工体表面の平坦性を保持するための高い体積弾性率を持つこと(=低圧縮率)、表面のスクラッチを抑制する材料としての柔軟性、及び、スラリー(研磨液)の保持と安定的な研磨を担う多孔セルの微細さと均一性(湿式成膜性)等が挙げられる。 The properties required for this porous polishing pad include, for example, a high bulk modulus (= low compressibility) to maintain the flatness of the workpiece surface, flexibility as a material to prevent scratches on the surface, and fineness and uniformity of the porous cells (wet film-forming ability) that are responsible for retaining the slurry (polishing liquid) and stable polishing.
しかしながら、上記の低圧縮率、柔軟性、湿式成膜性は相反する物性であり、例えば平坦性を重視して研磨パッドの低圧縮率化を試みた場合、ウレタン樹脂が硬質化することとなり、スクラッチ性が悪化してしまう。また、スクラッチ性を重視してウレタン樹脂を低硬度化すると、水中での凝固が速やかに進行しなくなることで多孔セルの均一性が失われ、研磨の不安定化が起こる。このようにすべての物性を高いバランスで両立することは困難であった。 However, the above-mentioned low compression ratio, flexibility, and wet film-forming properties are contradictory physical properties. For example, if an attempt is made to reduce the compression ratio of a polishing pad in order to emphasize flatness, the urethane resin will harden, and scratch resistance will deteriorate. Furthermore, if the hardness of the urethane resin is reduced in order to emphasize scratch resistance, coagulation in water will not proceed quickly, resulting in a loss of uniformity in the porous cells and instability in polishing. As such, it has been difficult to achieve a high level of balance between all of these physical properties.
本発明が解決しようとする課題は、優れた湿式成膜性、及び、低圧縮率を有する多孔体を製造する方法を提供することにある。 The problem that the present invention aims to solve is to provide a method for producing a porous body that has excellent wet film-forming properties and a low compression ratio.
本発明は、ウレタン樹脂(A)、溶剤(B)、及び、成膜助剤(C)を含有するウレタン樹脂組成物であって、前記成膜助剤(C)が、炭素原子数が8~18の範囲の炭化水素(c1)を含有することを特徴とするウレタン樹脂組成物を提供するものである。 The present invention provides a urethane resin composition containing a urethane resin (A), a solvent (B), and a film-forming aid (C), characterized in that the film-forming aid (C) contains a hydrocarbon (c1) having 8 to 18 carbon atoms.
また本発明は、前記ウレタン樹脂組成物を湿式成膜することを特徴とする多孔体の製造方法を提供するものである。 The present invention also provides a method for producing a porous body, which is characterized by wet-forming the urethane resin composition.
本発明によれば、特定の成膜助剤を用いることで、湿式成膜法により、低圧縮率で、かつ細かく均一な多孔体を製造することができる。よって、本発明は、研磨パッド、人工皮革・合成皮革の製造に特に好適に使用することができる。 According to the present invention, by using a specific film-forming assistant, a fine and uniform porous body can be produced with a low compression ratio by a wet film-forming method. Therefore, the present invention can be particularly suitably used for the production of polishing pads, artificial leather, and synthetic leather.
なお、本発明において前記「多孔体」とは、ウレタン樹脂組成物を湿式成膜法により凝固させれば自ずと得られる程度の多数の孔を有するものであり、例えば、面の厚さ方向に長い紡錘形または涙滴形の多孔構造を形成しているものをいう。 In the present invention, the "porous body" refers to a body having a large number of pores that can be obtained by solidifying a urethane resin composition using a wet film-forming method, and for example, a body having a spindle-shaped or teardrop-shaped porous structure that is long in the thickness direction of the surface.
本発明は、ウレタン樹脂(A)、溶剤(B)、及び、特定の成膜助剤(C)を含有するウレタン樹脂組成物を湿式成膜して多孔体を製造する方法である。 The present invention is a method for producing a porous body by wet film formation of a urethane resin composition containing a urethane resin (A), a solvent (B), and a specific film-forming aid (C).
本発明においては、成膜助剤(C)として、炭素原子数が8~18の範囲の炭化水素(c1)を含有することが必須である。前記特定の炭素原子数の炭化水素は、適度に疎水性が高いため、ウレタン樹脂の水中での凝固速度を調整し、DMFと水の置換を緩和するとともに、表面凝固を抑制することで湿式成膜による多孔セルの微細化と均一性を実現し、併せて低圧縮率な多孔体が得られる。前記炭化水素として、炭素原子数が8未満の炭化水素を用いた場合には、表面凝固のスピード抑制に効果がなく、低圧縮率に優れる多孔体が得られず、また炭素原子数が18を超える炭化水素を用いた場合には、疎水性が強すぎて多孔セルの均一性が不良となる。更に、前記炭化水素(c1)の代わりに親水性の高い成膜助剤を用いた場合には、多孔セルが肥大化し、湿式成膜性が悪化、及び、圧縮率が上昇してしまう。前記炭化水素(c1)の炭素原子数としては、湿式成膜性と低圧縮率とをより高いレベルで両立することができる点から、9~16の範囲が好ましく、10~14の範囲がより好ましい。 In the present invention, it is essential that the film-forming auxiliary (C) contains a hydrocarbon (c1) having a carbon number in the range of 8 to 18. The hydrocarbon having the specific carbon number is moderately hydrophobic, and therefore adjusts the coagulation speed of the urethane resin in water, reduces the replacement of DMF with water, and suppresses surface coagulation, thereby realizing fine and uniform porous cells by wet film formation, and also obtaining a porous body with a low compression ratio. If a hydrocarbon having less than 8 carbon atoms is used as the hydrocarbon, it is not effective in suppressing the speed of surface coagulation, and a porous body with excellent low compression ratio cannot be obtained, and if a hydrocarbon having more than 18 carbon atoms is used, the hydrophobicity is too strong and the uniformity of the porous cells is poor. Furthermore, if a film-forming auxiliary with high hydrophilicity is used instead of the hydrocarbon (c1), the porous cells will become enlarged, the wet film-forming property will deteriorate, and the compression ratio will increase. The number of carbon atoms of the hydrocarbon (c1) is preferably in the range of 9 to 16, more preferably in the range of 10 to 14, from the viewpoint of achieving a higher level of both wet film-forming property and low compression ratio.
前記炭化水素(c1)は、前記特定の範囲の炭素原子数を有する、炭素原子および水素原子のみで構成されるものであり、例えば、ノルマルパラフィン、イソパラフィン、芳香族化合物、ナフテン化合物等が挙げられる。これらの化合物は単独で用いても2種以上を併用してもよい。これらの中でも、湿式成膜性と低圧縮率とをより高いレベルで両立することができる点から、イソパラフィンが好ましい。 The hydrocarbon (c1) is one that is composed only of carbon atoms and hydrogen atoms and has a number of carbon atoms within the specific range. Examples of the hydrocarbon (c1) include normal paraffins, isoparaffins, aromatic compounds, naphthenic compounds, and the like. These compounds may be used alone or in combination of two or more. Among these, isoparaffins are preferred because they can achieve a higher level of both wet film-forming properties and low compression ratio.
前記炭化水素(c1)の15℃における密度としては、湿式成膜性と低圧縮率とをより高いレベルで両立することができる点から、0.7~0.83g/cm3の範囲が好ましく、0.7~0.8g/cm3の範囲がより好ましい。 The density of the hydrocarbon (c1) at 15° C. is preferably in the range of 0.7 to 0.83 g/ cm3 , and more preferably in the range of 0.7 to 0.8 g/ cm3 , from the viewpoint of achieving both wet film-forming properties and a low compressibility at a higher level.
前記成膜助剤(C)には、前記炭化水素(c1)以外に、他の成膜助剤を併用してもよい。前記成膜助剤(C)中における前記炭化水素(c1)の含有率としては、湿式成膜性と低圧縮率とをより高いレベルで両立することができる点から、30質量%以上が好ましく、70質量%以上がより好ましい。 The film-forming auxiliary (C) may be used in combination with other film-forming auxiliary in addition to the hydrocarbon (c1). The content of the hydrocarbon (c1) in the film-forming auxiliary (C) is preferably 30% by mass or more, and more preferably 70% by mass or more, in order to achieve a higher level of both wet film-forming property and low compression ratio.
また、前記炭化水素(c1)の含有量としては、前記ウレタン樹脂(A)100質量部に対して、0.1~30質量部の範囲が好ましく、1~25質量部の範囲がより好ましい。 The content of the hydrocarbon (c1) is preferably in the range of 0.1 to 30 parts by mass, and more preferably in the range of 1 to 25 parts by mass, per 100 parts by mass of the urethane resin (A).
本発明で用いるウレタン樹脂(A)としては、例えば、ポリオール(a1)とポリイソシアネート(a2)との反応物を用いることができる。 The urethane resin (A) used in the present invention may be, for example, a reaction product of polyol (a1) and polyisocyanate (a2).
前記ポリオール(a1)としては、例えば、ポリエステルポリオール、ポリエーテルポリオール、ポリカーボネートポリオール等を用いることができる。これらのポリオールは単独で用いても2種以上を併用してもよい。 As the polyol (a1), for example, polyester polyol, polyether polyol, polycarbonate polyol, etc. can be used. These polyols may be used alone or in combination of two or more kinds.
前記ポリオール(a1)の数平均分子量としては、多孔体の機械的特性、及び、柔軟性の点から、500~10,000の範囲であることが好ましく、700~8,000の範囲がより好ましい。なお、前記ポリオール(a1)の数平均分子量は、ゲル・パーミエーション・クロマトグラフィー(GPC)法により測定した値を示す。 The number average molecular weight of the polyol (a1) is preferably in the range of 500 to 10,000, more preferably in the range of 700 to 8,000, from the viewpoint of the mechanical properties and flexibility of the porous body. The number average molecular weight of the polyol (a1) is a value measured by gel permeation chromatography (GPC).
前記ポリオール(a1)には、必要に応じて、数平均分子量が500未満の鎖伸長剤(a1-1)を併用してもよい。前記鎖伸長剤(a1-1)としては、例えば、水酸基を有する鎖伸長剤、アミノ基を有する鎖伸長剤等を用いることができる。これらの鎖伸長剤(a1-1)は単独で用いても2種以上を併用してもよい。 The polyol (a1) may be used in combination with a chain extender (a1-1) having a number average molecular weight of less than 500, if necessary. As the chain extender (a1-1), for example, a chain extender having a hydroxyl group, a chain extender having an amino group, etc. may be used. These chain extenders (a1-1) may be used alone or in combination of two or more kinds.
前記水酸基を有する鎖伸長剤としては、例えば、エチレングリコール、ジエチレンリコール、トリエチレングリコール、プロピレングリコール、1,3-プロパンジオール、1,3-ブタンジオール、1,4-ブタンジオール、ヘキサメチレングリコール、サッカロース、メチレングリコール、グリセリン、ソルビトール等の脂肪族ポリオール化合物;ビスフェノールA、4,4’-ジヒドロキシジフェニル、4,4’-ジヒドロキシジフェニルエーテル、4,4’-ジヒドロキシジフェニルスルホン、水素添加ビスフェノールA、ハイドロキノン等の芳香族ポリオール化合物;水などを用いることができる。これらの鎖伸長剤は単独で用いても2種以上を併用してもよい。 Examples of the chain extender having a hydroxyl group include aliphatic polyol compounds such as ethylene glycol, diethylene glycol, triethylene glycol, propylene glycol, 1,3-propanediol, 1,3-butanediol, 1,4-butanediol, hexamethylene glycol, saccharose, methylene glycol, glycerin, and sorbitol; aromatic polyol compounds such as bisphenol A, 4,4'-dihydroxydiphenyl, 4,4'-dihydroxydiphenyl ether, 4,4'-dihydroxydiphenyl sulfone, hydrogenated bisphenol A, and hydroquinone; and water. These chain extenders may be used alone or in combination of two or more.
前記アミノ基を有する鎖伸長剤としては、例えば、エチレンジアミン、1,2-プロパンジアミン、1,6-ヘキサメチレンジアミン、ピペラジン、2-メチルピペラジン、2,5-ジメチルピペラジン、イソホロンジアミン、4,4’-ジシクロヘキシルメタンジアミン、3,3’-ジメチル-4,4’-ジシクロヘキシルメタンジアミン、4,4’-ジフェニルメタンジアミン、3,3’-ジクロロ-4,4’-ジフェニルメタンジアミン、1,2-シクロヘキサンジアミン、1,4-シクロヘキサンジアミン、アミノエチルエタノールアミン、ヒドラジン、ジエチレントリアミン、トリエチレンテトラミン等を用いることができる。これらの鎖伸長剤は単独で用いても2種以上を併用してもよい。 Examples of the chain extender having an amino group include ethylenediamine, 1,2-propanediamine, 1,6-hexamethylenediamine, piperazine, 2-methylpiperazine, 2,5-dimethylpiperazine, isophoronediamine, 4,4'-dicyclohexylmethanediamine, 3,3'-dimethyl-4,4'-dicyclohexylmethanediamine, 4,4'-diphenylmethanediamine, 3,3'-dichloro-4,4'-diphenylmethanediamine, 1,2-cyclohexanediamine, 1,4-cyclohexanediamine, aminoethylethanolamine, hydrazine, diethylenetriamine, and triethylenetetramine. These chain extenders may be used alone or in combination of two or more.
前記ポリイソシアネート(a2)としては、例えば、4,4’-ジフェニルメタンジイソシアネート、2,4’-ジフェニルメタンジイソシアネート、カルボジイミド変性ジフェニルメタンジイソシアネート、クルードジフェニルメタンジイソシアネート、フェニレンジイソシアネート、トルエンジイソシアネート、ナフタレンジイソシアネート、キシリレンジイソシアネート、テトラメチルキシリレンジイソシアネート等の芳香族ポリイソシアネート;ヘキサメチレンジイソシアネート、リジンジイソシアネート等の脂肪族ポリイソシアネート;シクロヘキサンジイソシアネート、水添キシリレンジイソシアネート、イソホロンジイソシアネート、ジシクロヘキシルメタンジイソシアネート等の脂環式ポリイソシアネートなどを用いることができる。これらのポリイソシアネートは単独で用いても2種以上を併用してもよい。 Examples of the polyisocyanate (a2) that can be used include aromatic polyisocyanates such as 4,4'-diphenylmethane diisocyanate, 2,4'-diphenylmethane diisocyanate, carbodiimide-modified diphenylmethane diisocyanate, crude diphenylmethane diisocyanate, phenylene diisocyanate, toluene diisocyanate, naphthalene diisocyanate, xylylene diisocyanate, and tetramethylxylylene diisocyanate; aliphatic polyisocyanates such as hexamethylene diisocyanate and lysine diisocyanate; and alicyclic polyisocyanates such as cyclohexane diisocyanate, hydrogenated xylylene diisocyanate, isophorone diisocyanate, and dicyclohexylmethane diisocyanate. These polyisocyanates may be used alone or in combination of two or more.
前記ウレタン樹脂(A)の製造方法としては、例えば、前記ポリオール(a1)と前記ポリイソシアネート(a2)と必要に応じて前記鎖伸長剤(a1-1)とを仕込み、反応させることによって製造する方法が挙げられる。これらの反応は、50~100℃の温度で概ね3~10時間行うことが好ましい。また、前記反応は、後述する溶剤(B)中で行ってもよい。 The urethane resin (A) can be produced, for example, by reacting the polyol (a1), the polyisocyanate (a2), and, if necessary, the chain extender (a1-1). These reactions are preferably carried out at a temperature of 50 to 100°C for approximately 3 to 10 hours. The reaction may also be carried out in a solvent (B) described below.
前記ポリオール(a1)が有する水酸基並びに前記鎖伸長剤(a1-1)が有する水酸基及びアミノ基の合計と、前記ポリイソシアネート(a2)が有するイソシアネート基とのモル比[(イソシアネート基)/(水酸基及びアミノ基)]としては、0.8~1.2の範囲であることが好ましく、0.9~1.1の範囲であることがより好ましい。 The molar ratio of the sum of the hydroxyl groups of the polyol (a1) and the hydroxyl groups and amino groups of the chain extender (a1-1) to the isocyanate groups of the polyisocyanate (a2) [(isocyanate groups)/(hydroxyl groups and amino groups)] is preferably in the range of 0.8 to 1.2, and more preferably in the range of 0.9 to 1.1.
以上の方法により得られるウレタン樹脂(A)の重量平均分子量としては、多孔体の機械的強度及び柔軟性の点から、5,000~1,000,000の範囲であることが好ましく、10,000~500,000の範囲がより好ましい。なお、前記ウレタン樹脂(A)の重量平均分子量は、前記ポリオール(a1)の数平均分子量と同様に測定して得られた値を示す。 The weight average molecular weight of the urethane resin (A) obtained by the above method is preferably in the range of 5,000 to 1,000,000, and more preferably in the range of 10,000 to 500,000, from the viewpoint of the mechanical strength and flexibility of the porous body. The weight average molecular weight of the urethane resin (A) is a value obtained by measuring in the same manner as the number average molecular weight of the polyol (a1).
前記ウレタン樹脂(A)の含有量としては、例えば、ウレタン樹脂組成物中10~90質量部の範囲が挙げられる。 The content of the urethane resin (A) is, for example, in the range of 10 to 90 parts by mass in the urethane resin composition.
前記溶剤(B)としては、例えば、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド、N-メチルピロリドン、N,N,2-トリメチルプロピオンアミド、N,N-ジメチルアクリルアミド、N,N-ジメチルプロピオンアミド、N,N-ジエチルアセトアミド、N,N-ジエチルアクリルアミド、N-エチルピロリドン、2-ピロリドン、1,3-ジメチル-2-イミダゾリジノン、ジメチルスルホキシド等を用いることができる。これらの有機溶媒は単独で用いても2種以上を併用してもよい。また、必要に応じて、酢酸エチル、酢酸メチル、酢酸ブチル、アセトン、メチルエチルケトン、メチルイソブチルケトン、メタノール、エタノール、イソプロピルアルコール、イソブタノール、sec-ブタノール、ターシャリーブタノール等の有機溶剤を併用してもよい。 As the solvent (B), for example, N,N-dimethylformamide, N,N-dimethylacetamide, N-methylpyrrolidone, N,N,2-trimethylpropionamide, N,N-dimethylacrylamide, N,N-dimethylpropionamide, N,N-diethylacetamide, N,N-diethylacrylamide, N-ethylpyrrolidone, 2-pyrrolidone, 1,3-dimethyl-2-imidazolidinone, dimethyl sulfoxide, etc. can be used. These organic solvents may be used alone or in combination of two or more. In addition, organic solvents such as ethyl acetate, methyl acetate, butyl acetate, acetone, methyl ethyl ketone, methyl isobutyl ketone, methanol, ethanol, isopropyl alcohol, isobutanol, sec-butanol, and tertiary butanol may be used in combination, if necessary.
前記溶剤(B)の含有量としては、例えば、ウレタン樹脂組成物中10~90質量%の範囲が挙げられる。 The content of the solvent (B) is, for example, in the range of 10 to 90 mass % in the urethane resin composition.
前記ウレタン樹脂組成物は、前記ウレタン樹脂(A)、前記溶剤(B)、及び、前記成膜助剤(C)を必須成分として含有するが、必要に応じて、その他の添加剤を含有してもよい。 The urethane resin composition contains the urethane resin (A), the solvent (B), and the film-forming aid (C) as essential components, but may contain other additives as necessary.
前記その他の添加剤としては、例えば、顔料、難燃剤、可塑剤、軟化剤、安定剤、ワックス、消泡剤、分散剤、浸透剤、界面活性剤、フィラー、防黴剤、抗菌剤、紫外線吸収剤、酸化防止剤、耐候安定剤、蛍光増白剤、老化防止剤、増粘剤等を用いることができる。これらの添加剤は単独で用いても2種以上を併用してもよい。 Examples of the other additives that can be used include pigments, flame retardants, plasticizers, softeners, stabilizers, waxes, defoamers, dispersants, penetrants, surfactants, fillers, antifungal agents, antibacterial agents, UV absorbers, antioxidants, weathering stabilizers, fluorescent brighteners, antiaging agents, thickeners, etc. These additives may be used alone or in combination of two or more.
次に、前記ウレタン樹脂組成物を湿式成膜法により多孔体を製造する方法について説明する。 Next, we will explain how to manufacture a porous body using the urethane resin composition by a wet film-forming method.
前記湿式成膜法とは、前記ウレタン樹脂組成物を、基材表面に塗布または含浸し、次いで、該塗布面または含浸面に水や水蒸気等を接触させることによって前記ウレタン樹脂(A)を凝固させ多孔体を製造する方法である。 The wet film-forming method is a method in which the urethane resin composition is applied to or impregnated into the surface of a substrate, and then the applied or impregnated surface is brought into contact with water, water vapor, or the like to solidify the urethane resin (A) and produce a porous body.
前記ウレタン樹脂組成物を塗布する基材としては、例えば、不織布、織布、編み物からなる基材;樹脂フィルム等を用いることができる。前記基材を構成するものとしては、例えば、ポリエステル繊維、ナイロン繊維、アクリル繊維、ポリウレタン繊維、アセテート繊維、レーヨン繊維、ポリ乳酸繊維等の化学繊維;綿、麻、絹、羊毛、これらの混紡繊維などを用いることができる。 As the substrate to which the urethane resin composition is applied, for example, a substrate made of nonwoven fabric, woven fabric, or knitted fabric; a resin film, etc. can be used. As the material constituting the substrate, for example, chemical fibers such as polyester fiber, nylon fiber, acrylic fiber, polyurethane fiber, acetate fiber, rayon fiber, and polylactic acid fiber; cotton, hemp, silk, wool, and blends thereof can be used.
前記基材の表面には、必要に応じて制電加工、離型処理加工、撥水加工、吸水加工、抗菌防臭加工、制菌加工、紫外線遮断加工等の処理が施されていてもよい。 The surface of the substrate may be subjected to antistatic treatment, release treatment, water repellency, water absorption, antibacterial and deodorizing treatment, bacteriostatic treatment, ultraviolet blocking treatment, etc., as necessary.
前記基材表面に前記ウレタン樹脂組成物を塗布または含浸する方法としては、例えば、グラビアコーター法、ナイフコーター法、パイプコーター法、コンマコーター法が挙げられる。その際、ウレタン樹脂組成物の粘度を調整し塗工作業性を向上するため、必要に応じて、有機溶剤(B)の使用量を調節して良い。 Methods for applying or impregnating the urethane resin composition onto the surface of the substrate include, for example, a gravure coater method, a knife coater method, a pipe coater method, and a comma coater method. In this case, the amount of organic solvent (B) used may be adjusted as necessary to adjust the viscosity of the urethane resin composition and improve coating workability.
前記方法により塗布または含浸された前記ウレタン樹脂組成物からなる塗膜の膜厚としては、0.5~5mmの範囲であることが好ましく、0.5~3mmの範囲がより好ましい。 The thickness of the coating film made of the urethane resin composition applied or impregnated by the above method is preferably in the range of 0.5 to 5 mm, and more preferably in the range of 0.5 to 3 mm.
前記ウレタン樹脂組成物が塗布または含浸され形成した塗布面に水または水蒸気を接触させる方法としては、例えば、前記ウレタン樹脂組成物からなる塗布層や含浸層の設けられた基材を水浴中に浸漬する方法;前記塗布面上にスプレー等を用いて水を噴霧する方法などが挙げられる。前記浸漬は、例えば、5~60℃の水浴中に、2~20分間行うことが挙げられる。 Examples of a method for contacting water or water vapor with the coating surface formed by coating or impregnation with the urethane resin composition include a method of immersing a substrate provided with a coating layer or impregnation layer made of the urethane resin composition in a water bath, and a method of spraying water onto the coating surface using a spray or the like. The immersion can be performed, for example, in a water bath at 5 to 60°C for 2 to 20 minutes.
前記方法によって得られた多孔体は、常温の水や温水を用いてその表面を洗浄して溶剤(B)を抽出除去し、次いで乾燥することが好ましい。前記洗浄は、例えば、5~60℃の水で20~120分間行うことが挙げられ、洗浄に用いる水は1回以上入れ替えるか、あるいは、流水で連続して入れ替えるのが好ましい。前記乾燥は、例えば、80~120℃に調整した乾燥機等を使用して、10~60分間行うことが好ましい。 The porous body obtained by the above method is preferably washed on its surface with water at room temperature or hot water to extract and remove the solvent (B), and then dried. The washing can be carried out, for example, with water at 5 to 60°C for 20 to 120 minutes, and it is preferable to replace the water used for washing at least once, or to replace it continuously with running water. The drying is preferably carried out for 10 to 60 minutes, for example, using a dryer adjusted to 80 to 120°C.
以上、本発明によれば、特定の成膜助剤を用いることで、湿式成膜法により、低圧縮率で、かつ細かく均一な多孔体を製造することができる。よって、本発明は、研磨パッド、人工皮革・合成皮革の製造に特に好適に使用することができる。 As described above, according to the present invention, by using a specific film-forming assistant, it is possible to produce a fine and uniform porous body with a low compression ratio by a wet film-forming method. Therefore, the present invention is particularly suitable for use in the manufacture of polishing pads, artificial leather, and synthetic leather.
以下、実施例を用いて、本発明をより詳細に説明する。 The present invention will be explained in more detail below using examples.
[合成例1]ウレタン樹脂(A-1)の合成
攪拌機、還流器、温度計を有する反応装置に、ポリエステルポリオール(1,4-ブタンジオール及びアジピン酸の反応物、数平均分子量;2,000)を100質量部、エチレングリコールを12質量部、N,N-ジメチルホルムアミド(以下、「DMF」と略記する。)を519質量部、及び、4,4’-ジフェニルメタンジイソシアネートを61質量部投入し、撹拌下60℃で6時間反応させ、引き続き、イソプロピルアルコールを1質量部投入して、更に60℃で1時間撹拌することによって、ウレタン樹脂(A-1)組成物を得た。
得られたウレタン樹脂(A-1)組成物は、固形分;25質量%、粘度;600dPa・s、ウレタン樹脂の重量平均分子量は188,100であった。
Synthesis Example 1 Synthesis of Urethane Resin (A-1) 100 parts by mass of polyester polyol (reaction product of 1,4-butanediol and adipic acid, number average molecular weight: 2,000), 12 parts by mass of ethylene glycol, 519 parts by mass of N,N-dimethylformamide (hereinafter abbreviated as "DMF"), and 61 parts by mass of 4,4'-diphenylmethane diisocyanate were added to a reaction apparatus equipped with a stirrer, a reflux condenser, and a thermometer, and reacted at 60°C for 6 hours with stirring. Subsequently, 1 part by mass of isopropyl alcohol was added, and the mixture was further stirred at 60°C for 1 hour to obtain a urethane resin (A-1) composition.
The obtained urethane resin (A-1) composition had a solid content of 25% by mass, a viscosity of 600 dPa·s, and a weight average molecular weight of the urethane resin of 188,100.
[合成例2]ウレタン樹脂(A-2)の合成
攪拌機、還流器、温度計を有する反応装置に、ポリエステルポリオール(エチレングリコール及びアジピン酸の反応物、数平均分子量;2,000)を65質量部、ポリテトラメチレングリコール(数平均分子量;2,000)を35質量部、1,4-ブタンジオールを20質量部、DMFを564質量部、及び、4,4’-ジフェニルメタンジイソシアネートを68質量部投入し、撹拌下60℃で6時間反応させ、引き続き、イソプロピルアルコールを1質量部投入して、更に60℃で1時間撹拌することによって、ウレタン樹脂(A-2)組成物を得た。
得られたウレタン樹脂(A-2)組成物は、固形分;25質量%、粘度;550dPa・s、ウレタン樹脂の重量平均分子量は168,000であった。
Synthesis Example 2 Synthesis of Urethane Resin (A-2) 65 parts by mass of polyester polyol (a reaction product of ethylene glycol and adipic acid, number average molecular weight: 2,000), 35 parts by mass of polytetramethylene glycol (number average molecular weight: 2,000), 20 parts by mass of 1,4-butanediol, 564 parts by mass of DMF, and 68 parts by mass of 4,4'-diphenylmethane diisocyanate were added to a reaction apparatus having a stirrer, a reflux condenser, and a thermometer, and reacted at 60°C for 6 hours with stirring. Subsequently, 1 part by mass of isopropyl alcohol was added, and the mixture was further stirred at 60°C for 1 hour to obtain a urethane resin (A-2) composition.
The obtained urethane resin (A-2) composition had a solid content of 25% by mass, a viscosity of 550 dPa·s, and a weight average molecular weight of the urethane resin of 168,000.
[数平均分子量・重量平均分子量の測定方法]
合成例で用いた原料ポリオールの数平均分子量、及び、ウレタン樹脂(A)の重量平均分子量 は、ゲル・パーミエーション・クロマトグラフィー(GPC)法により、下記の条件で測定した値を示す。
[Method of measuring number average molecular weight and weight average molecular weight]
The number average molecular weight of the raw material polyol and the weight average molecular weight of the urethane resin (A) used in the synthesis examples are values measured by gel permeation chromatography (GPC) under the following conditions.
測定装置:高速GPC装置(東ソー株式会社製「HLC-8220GPC」)
カラム:東ソー株式会社製の下記のカラムを直列に接続して使用した。
「TSKgel G5000」(7.8mmI.D.×30cm)×1本
「TSKgel G4000」(7.8mmI.D.×30cm)×1本
「TSKgel G3000」(7.8mmI.D.×30cm)×1本
「TSKgel G2000」(7.8mmI.D.×30cm)×1本
検出器:RI(示差屈折計)
カラム温度:40℃
溶離液:テトラヒドロフラン(THF)
流速:1.0mL/分
注入量:100μL(試料濃度0.4質量%のテトラヒドロフラン溶液)
標準試料:下記の標準ポリスチレンを用いて検量線を作成した。
Measurement device: High-speed GPC device ("HLC-8220GPC" manufactured by Tosoh Corporation)
Column: The following columns manufactured by Tosoh Corporation were used, connected in series.
"TSKgel G5000" (7.8mm I.D. x 30cm) x 1 "TSKgel G4000" (7.8mm I.D. x 30cm) x 1 "TSKgel G3000" (7.8mm I.D. x 30cm) x 1 "TSKgel G2000" (7.8mm I.D. x 30cm) x 1 Detector: RI (differential refractometer)
Column temperature: 40°C
Eluent: tetrahydrofuran (THF)
Flow rate: 1.0 mL/min Injection volume: 100 μL (sample concentration 0.4% by mass in tetrahydrofuran solution)
Standard sample: A calibration curve was prepared using the following standard polystyrene.
(標準ポリスチレン)
東ソー株式会社製「TSKgel 標準ポリスチレン A-500」
東ソー株式会社製「TSKgel 標準ポリスチレン A-1000」
東ソー株式会社製「TSKgel 標準ポリスチレン A-2500」
東ソー株式会社製「TSKgel 標準ポリスチレン A-5000」
東ソー株式会社製「TSKgel 標準ポリスチレン F-1」
東ソー株式会社製「TSKgel 標準ポリスチレン F-2」
東ソー株式会社製「TSKgel 標準ポリスチレン F-4」
東ソー株式会社製「TSKgel 標準ポリスチレン F-10」
東ソー株式会社製「TSKgel 標準ポリスチレン F-20」
東ソー株式会社製「TSKgel 標準ポリスチレン F-40」
東ソー株式会社製「TSKgel 標準ポリスチレン F-80」
東ソー株式会社製「TSKgel 標準ポリスチレン F-128」
東ソー株式会社製「TSKgel 標準ポリスチレン F-288」
東ソー株式会社製「TSKgel 標準ポリスチレン F-550」
(Standard polystyrene)
"TSKgel Standard Polystyrene A-500" manufactured by Tosoh Corporation
"TSKgel Standard Polystyrene A-1000" manufactured by Tosoh Corporation
"TSKgel Standard Polystyrene A-2500" manufactured by Tosoh Corporation
"TSKgel Standard Polystyrene A-5000" manufactured by Tosoh Corporation
"TSKgel Standard Polystyrene F-1" manufactured by Tosoh Corporation
"TSKgel Standard Polystyrene F-2" manufactured by Tosoh Corporation
"TSKgel Standard Polystyrene F-4" manufactured by Tosoh Corporation
"TSKgel Standard Polystyrene F-10" manufactured by Tosoh Corporation
"TSKgel Standard Polystyrene F-20" manufactured by Tosoh Corporation
"TSKgel Standard Polystyrene F-40" manufactured by Tosoh Corporation
"TSKgel Standard Polystyrene F-80" manufactured by Tosoh Corporation
"TSKgel Standard Polystyrene F-128" manufactured by Tosoh Corporation
"TSKgel Standard Polystyrene F-288" manufactured by Tosoh Corporation
"TSKgel Standard Polystyrene F-550" manufactured by Tosoh Corporation
[実施例1]
合成例1で得られたウレタン樹脂(A-1)組成物100質量部に対し、DMFを40質量部、成膜助剤として、炭素原子数12のイソパラフィン(東亜石油株式会社製「メルベイユ30」、密度;0.77g/cm3、以下「c1-1」と略記する。)を1質量部加えて配合液を作成し、厚さ(Wet)1mmとなるようにポリエチレンテレフタレート(PET)フィルムに塗布した。次いで、凝固浴(25℃の水)へ塗布基材を10分間浸漬させ、ウレタン樹脂を凝固させた。その後、この基材を50℃の水に60分間浸漬させて溶剤を洗浄した。洗浄後、基材を100℃で30分間熱風乾燥させ、多孔体を得た。
[Example 1]
To 100 parts by mass of the urethane resin (A-1) composition obtained in Synthesis Example 1, 40 parts by mass of DMF and 1 part by mass of isoparaffin having 12 carbon atoms ("Merveille 30" manufactured by Toa Oil Co., Ltd., density: 0.77 g/cm 3 , hereinafter abbreviated as "c1-1") as a film-forming aid were added to prepare a blended liquid, which was then applied to a polyethylene terephthalate (PET) film to a thickness (wet) of 1 mm. Next, the applied substrate was immersed in a coagulation bath (water at 25°C) for 10 minutes to coagulate the urethane resin. Thereafter, the substrate was immersed in water at 50°C for 60 minutes to wash off the solvent. After washing, the substrate was dried with hot air at 100°C for 30 minutes to obtain a porous body.
[実施例2]
実施例1において、成膜助剤の種類を、炭素原子数12のイソパラフィン(出光興産株式会社製「IPソルベント1620」、密度;0.76g/cm3、以下「c1-2」と略記する。)に代えた以外は、実施例1と同様にして多孔体を得た。
[Example 2]
In Example 1, the type of the film-forming auxiliary was changed to isoparaffin having 12 carbon atoms ("IP Solvent 1620" manufactured by Idemitsu Kosan Co., Ltd., density: 0.76 g/cm3 , hereinafter abbreviated as "c1-2"). A porous body was obtained in the same manner as in Example 1.
[実施例3]
実施例1において、成膜助剤の種類を、炭素原子数12のイソパラフィン(出光興産株式会社製「IPクリーンLX」、密度;0.74g/cm3、以下「c1-3」と略記する。)に代えた以外は、実施例1と同様にして多孔体を得た。
[Example 3]
A porous body was obtained in the same manner as in Example 1, except that the type of film-forming auxiliary was changed to isoparaffin having 12 carbon atoms ("IP Clean LX" manufactured by Idemitsu Kosan Co., Ltd., density: 0.74 g/cm3 , hereinafter abbreviated as "c1-3").
[実施例4]
実施例1において、成膜助剤の種類を、炭素原子数16のイソパラフィン(出光興産株式会社製「IPソルベント2028」、密度;0.79g/cm3、以下「c1-4」と略記する。)に代えた以外は、実施例1と同様にして多孔体を得た。
[Example 4]
In Example 1, the type of the film-forming auxiliary was changed to isoparaffin having 16 carbon atoms ("IP Solvent 2028" manufactured by Idemitsu Kosan Co., Ltd., density: 0.79 g/cm3 , hereinafter abbreviated as "c1-4"). A porous body was obtained in the same manner as in Example 1.
[実施例5]
実施例1において、ウレタン樹脂(A-1)組成物に代えて、ウレタン樹脂(A-2)組成物を用いた以外は実施例1と同様にして多孔体を得た。
[Example 5]
A porous body was obtained in the same manner as in Example 1, except that the urethane resin (A-1) composition in Example 1 was replaced with a urethane resin (A-2) composition.
[比較例1]
実施例1において、成膜助剤の種類を、ヘキサン(以下「cR1-2」)に代えた以外は、実施例1と同様にして多孔体を得た。
[Comparative Example 1]
A porous body was obtained in the same manner as in Example 1, except that the type of film-forming auxiliary in Example 1 was changed to hexane (hereinafter referred to as "cR1-2").
[比較例2]
実施例1において、成膜助剤の種類を、炭素原子数20のイソパラフィン(出光興産株式会社製「IPソルベント2835」、密度;0.82g/cm3、以下「cR1-1」と略記する。)に代えた以外は、実施例1と同様にして多孔体を得た。
[Comparative Example 2]
In Example 1, the type of the film-forming auxiliary was changed to isoparaffin having 20 carbon atoms ("IP Solvent 2835" manufactured by Idemitsu Kosan Co., Ltd., density: 0.82 g/cm3 , hereinafter abbreviated as "cR1-1"). A porous body was obtained in the same manner as in Example 1.
[湿式成膜性の評価方法]
実施例で得られた多孔体の断面状態を、日本電子株式会社製走査型電子顕微鏡「JSM-IT500」(倍率:100倍)で観察し、セル形状(細さ、均一性)を確認し、最大横幅が70μm以下のセルが全体の60%を占めていれば「○」、それ以外は「×」と評価した。
[Method for evaluating wet film-forming properties]
The cross-sectional state of the porous bodies obtained in the examples was observed with a scanning electron microscope "JSM-IT500" (magnification: 100x) manufactured by JEOL Ltd. to confirm the cell shape (thinness, uniformity). If the cells had a maximum width of 70 μm or less, which accounted for 60% of the total, the cell was evaluated as "○", otherwise it was evaluated as "×".
[圧縮率の評価方法]
実施例で得られた多孔体について、JISL-1021-6に準拠して圧縮率評価を行った。具体的には、初荷重2kPaを30秒間かけた後の「標準圧力下における厚さ:t0」を測定し、次に、最終荷重98kPaの荷重を30秒間かけた後の「一定圧力下における厚さ:t1」を測定し、これを下記の式に適用して圧縮率を算出した。
圧縮率(%)=100×(t0-t1)/t0
これによって求められた圧縮率が20%以下であれば「○」、それ以外は「×」と評価した。
[Method of evaluating compression ratio]
The porous bodies obtained in the examples were evaluated for compressibility in accordance with JIS L-1021-6. Specifically, the "thickness under standard pressure: t0" was measured after applying an initial load of 2 kPa for 30 seconds, and then the "thickness under constant pressure: t1" was measured after applying a final load of 98 kPa for 30 seconds, and the compressibility was calculated by applying this to the following formula.
Compression ratio (%) = 100 × (t0 - t1) / t0
If the compression rate thus obtained was 20% or less, it was evaluated as "◯", otherwise it was evaluated as "×".
本発明のウレタン樹脂組成物により得られた多孔体は、セルが細かく均一であり、低圧縮率性にも優れることが分かった。 It was found that the porous body obtained from the urethane resin composition of the present invention has fine and uniform cells and also has excellent low compressibility.
一方、比較例1は成膜助剤として、本発明で規定する炭素原子数を下回る炭化水素を用いた態様であるが、多孔セル形成が不良であり、低圧縮率性も不良であった。 On the other hand, Comparative Example 1 uses a hydrocarbon with fewer carbon atoms than the number specified in the present invention as a film-forming aid, but the porous cell formation is poor and the low compressibility is also poor.
比較例2は成膜助剤として、本発明で規定する炭素原子数を上回る炭化水素を用いた態様であるが、多孔セル形成が不良であり、低圧縮率性も不良であった。 Comparative Example 2 uses a hydrocarbon with a carbon atom number exceeding the number specified in the present invention as a film-forming aid, but the porous cell formation is poor and the low compressibility is also poor.
Claims (4)
前記ウレタン樹脂(A)が、ポリオール(a1)及びポリイソシアネート(a2)を必須の反応原料とするものであり、
前記ポリオール(a1)が、ポリエステルポリオールを含むものであり、
前記ポリイソシアネート(a2)が、4,4’-ジフェニルメタンジイソシアネートを含むものであり、
前記溶剤(B)が、N,N-ジメチルホルムアミドを含むものであり、
前記成膜助剤(C)が、炭素原子数が8~18の範囲の炭化水素(c1)を含有することを特徴とするウレタン樹脂組成物。 A urethane resin composition comprising a urethane resin (A), a solvent (B), and a film-forming auxiliary (C),
The urethane resin (A) contains polyol (a1) and polyisocyanate (a2) as essential reaction raw materials,
the polyol (a1) comprises a polyester polyol,
The polyisocyanate (a2) contains 4,4'-diphenylmethane diisocyanate,
The solvent (B) contains N,N-dimethylformamide,
The urethane resin composition, wherein the film-forming auxiliary (C) contains a hydrocarbon (c1) having 8 to 18 carbon atoms.
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CN202110143451.0A CN113265138B (en) | 2020-02-14 | 2021-02-02 | Urethane resin composition and method for producing porous body |
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