JP7475782B2 - 加工装置 - Google Patents
加工装置 Download PDFInfo
- Publication number
- JP7475782B2 JP7475782B2 JP2020111522A JP2020111522A JP7475782B2 JP 7475782 B2 JP7475782 B2 JP 7475782B2 JP 2020111522 A JP2020111522 A JP 2020111522A JP 2020111522 A JP2020111522 A JP 2020111522A JP 7475782 B2 JP7475782 B2 JP 7475782B2
- Authority
- JP
- Japan
- Prior art keywords
- workpiece
- axis
- image
- imaging unit
- groove
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B26—HAND CUTTING TOOLS; CUTTING; SEVERING
- B26D—CUTTING; DETAILS COMMON TO MACHINES FOR PERFORATING, PUNCHING, CUTTING-OUT, STAMPING-OUT OR SEVERING
- B26D5/00—Arrangements for operating and controlling machines or devices for cutting, cutting-out, stamping-out, punching, perforating, or severing by means other than cutting
- B26D5/007—Control means comprising cameras, vision or image processing systems
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B26—HAND CUTTING TOOLS; CUTTING; SEVERING
- B26D—CUTTING; DETAILS COMMON TO MACHINES FOR PERFORATING, PUNCHING, CUTTING-OUT, STAMPING-OUT OR SEVERING
- B26D3/00—Cutting work characterised by the nature of the cut made; Apparatus therefor
- B26D3/06—Grooving involving removal of material from the surface of the work
- B26D3/065—On sheet material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/02—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/12—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving optical means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0082—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67288—Monitoring of warpage, curvature, damage, defects or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
- H01L21/3043—Making grooves, e.g. cutting
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Forests & Forestry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Dicing (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Laser Beam Processing (AREA)
Description
4:基台
4a,4b,4d:開口
4c:支持構造
6:カセット
10:チャックテーブル
11:被加工物
11a:表面
11b:裏面
11c:切削溝
12:保持部材
12a:一面
12b:他面
12c1:第1吸引路
12c2:第2吸引路
12c3:点
12d:開口部
12e:外周吸引路
12f:吸引路
13:分割予定ライン
14:吸引源
15:デバイス
16:枠体
16a:開口部
16b:プーリー部
17:テープ
18:X軸移動テーブル
18a:底板
18b:側板
18c:天板
18d:空間
19:フレーム
20:X軸ガイドレール
20a:X軸リニアスケール
21:被加工物ユニット
22:X軸ボールネジ
23:第1の画像群
23a:第1の画像情報
24:X軸パルスモーター
25:第2の画像群
25a:第2の画像情報
26:X軸移動機構
28:ベルト
30:回転駆動源
30a:プーリー
32:Y軸移動機構
33:第1の画像群
33a:第1の点群(第1の画像情報)
34:Y軸ガイドレール
35:第2の画像群
35a:第2の点群(第2の画像情報)
36:Y軸移動テーブル
38:Y軸ボールネジ
40:Y軸パルスモーター
42:Z軸移動機構
42a:支持構造
44:Z軸ガイドレール
46:Z軸移動プレート
48:Z軸ボールネジ
50:Z軸パルスモーター
52:支持アーム
54:下方撮像ユニット
56:低倍率カメラ
56a:照明装置
58:高倍率カメラ
58a:照明装置
60:加工ユニット移動機構
62:Y軸ガイドレール
64:Y軸移動プレート
66:Y軸ボールネジ
68:Y軸パルスモーター
70:Z軸移動プレート
72:Z軸ガイドレール
74:Z軸ボールネジ
76:Z軸パルスモーター
78:切削ユニット
80:スピンドルハウジング
82a:スピンドル
82b:切削ブレード
84:上方撮像ユニット
86:洗浄ユニット
88:洗浄テーブル
90:ノズル
92:タッチパネル
94:制御部
96:記憶装置
102:レーザー加工装置
104:静止基台
106:Y軸移動テーブル
108:Y軸ガイドレール
108a:Y軸スケール
110:Y軸ボールネジ
112:Y軸パルスモーター
114:Y軸移動機構
116:コラム
118:ケーシング
120:レーザー照射ユニット
120a:レーザー発振器
122:照射ヘッド
122a:集光レンズ
A:領域
L:レーザービーム
Claims (1)
- 表面に設定されている複数の分割予定ラインによって区画された複数の領域の各々にデバイスが設けられている板状の被加工物の該表面側を保持した状態で該被加工物を加工する加工装置であって、
一面と、該一面とは反対側に位置する他面と、を含み、該一面から該他面まで透明材で形成されている所定の領域を有する板状の保持部材を有し、該被加工物の該表面側を保持するチャックテーブルと、
該チャックテーブルで該表面が保持された該被加工物を加工して、該被加工物に加工溝を形成する加工ユニットと、
第1の撮像素子を有し、該チャックテーブルの上方に配置され、該チャックテーブルで保持された該被加工物の裏面側を撮像する第1の撮像ユニットと、
第2の撮像素子を有し、該チャックテーブルの下方に配置され、該第1の撮像ユニットで撮像する領域と該被加工物の厚さ方向で対応する領域において該被加工物の該表面側を、該保持部材を介して撮像する第2の撮像ユニットと、
該第1の撮像ユニット及び該第2の撮像ユニットの少なくともいずれかで取得した該被加工物の画像を表示する表示装置と、
画像処理を実行するプログラムが記憶された記憶装置と、該プログラムに従って画像を処理する処理装置と、を有し、該第1の撮像ユニットの焦点位置を該被加工物の厚さ方向に沿って異なる複数の位置に順次位置付けて該加工溝を撮像することで得られる第1の画像群のうち該加工溝の形状を示す第1の画像情報と、該第2の撮像ユニットの焦点位置を該被加工物の厚さ方向に沿って異なる複数の位置に順次位置付けて該加工溝を撮像することで得られる第2の画像群のうち該加工溝の形状を示す第2の画像情報と、の少なくともいずれかを該被加工物の厚さ方向に沿って並べることにより、該加工溝の3次元画像を作成して該表示装置に表示させる制御部と、
を備え、
該制御部は、該第1の画像情報と、該第2の画像情報との両方を、該被加工物の厚さ方向に沿って並べることにより、該加工溝の3次元画像を作成することを特徴とする加工装置。
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020111522A JP7475782B2 (ja) | 2020-06-29 | 2020-06-29 | 加工装置 |
KR1020210068602A KR20220001451A (ko) | 2020-06-29 | 2021-05-27 | 가공 장치 |
US17/337,544 US11633872B2 (en) | 2020-06-29 | 2021-06-03 | Processing apparatus |
DE102021206466.3A DE102021206466A1 (de) | 2020-06-29 | 2021-06-23 | Bearbeitungsvorrichtung |
CN202110704296.5A CN113927761A (zh) | 2020-06-29 | 2021-06-24 | 加工装置 |
TW110123569A TW202201511A (zh) | 2020-06-29 | 2021-06-28 | 加工裝置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020111522A JP7475782B2 (ja) | 2020-06-29 | 2020-06-29 | 加工装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2022010789A JP2022010789A (ja) | 2022-01-17 |
JP7475782B2 true JP7475782B2 (ja) | 2024-04-30 |
Family
ID=78827246
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2020111522A Active JP7475782B2 (ja) | 2020-06-29 | 2020-06-29 | 加工装置 |
Country Status (6)
Country | Link |
---|---|
US (1) | US11633872B2 (ja) |
JP (1) | JP7475782B2 (ja) |
KR (1) | KR20220001451A (ja) |
CN (1) | CN113927761A (ja) |
DE (1) | DE102021206466A1 (ja) |
TW (1) | TW202201511A (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11615139B2 (en) * | 2021-07-06 | 2023-03-28 | Rovi Guides, Inc. | Generating verified content profiles for user generated content |
JP2023140628A (ja) * | 2022-03-23 | 2023-10-05 | 株式会社ディスコ | 被加工物の加工方法 |
CN114683423A (zh) * | 2022-06-01 | 2022-07-01 | 沈阳和研科技有限公司 | 一种划片机显微镜结构 |
TWI842036B (zh) * | 2022-08-03 | 2024-05-11 | 鈦昇科技股份有限公司 | 雷射加工平台 |
JP2024073156A (ja) * | 2022-11-17 | 2024-05-29 | 株式会社東京精密 | 加工装置 |
JP2024114382A (ja) * | 2023-02-13 | 2024-08-23 | 株式会社東京精密 | 溝形状測定方法、溝形状測定装置、加工装置の制御方法、及び加工装置 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010082644A (ja) | 2008-09-30 | 2010-04-15 | Disco Abrasive Syst Ltd | 加工装置 |
JP2010087141A (ja) | 2008-09-30 | 2010-04-15 | Disco Abrasive Syst Ltd | 加工装置 |
JP2015088515A (ja) | 2013-10-28 | 2015-05-07 | 株式会社ディスコ | 加工装置 |
JP2019136765A (ja) | 2018-02-15 | 2019-08-22 | 株式会社ディスコ | 加工装置 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006140341A (ja) | 2004-11-12 | 2006-06-01 | Disco Abrasive Syst Ltd | ウエーハの分割方法 |
JP6250329B2 (ja) * | 2013-08-19 | 2017-12-20 | 株式会社ディスコ | 加工装置 |
JP6411822B2 (ja) * | 2014-09-09 | 2018-10-24 | 株式会社ディスコ | レーザー加工装置 |
JP6562670B2 (ja) * | 2015-03-23 | 2019-08-21 | 株式会社ディスコ | 被加工物の切削方法 |
JP6521687B2 (ja) * | 2015-03-23 | 2019-05-29 | 株式会社ディスコ | 切削ブレードの検査方法 |
JP6979296B2 (ja) | 2017-07-28 | 2021-12-08 | 株式会社ディスコ | 切削方法 |
-
2020
- 2020-06-29 JP JP2020111522A patent/JP7475782B2/ja active Active
-
2021
- 2021-05-27 KR KR1020210068602A patent/KR20220001451A/ko active Pending
- 2021-06-03 US US17/337,544 patent/US11633872B2/en active Active
- 2021-06-23 DE DE102021206466.3A patent/DE102021206466A1/de active Pending
- 2021-06-24 CN CN202110704296.5A patent/CN113927761A/zh active Pending
- 2021-06-28 TW TW110123569A patent/TW202201511A/zh unknown
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010082644A (ja) | 2008-09-30 | 2010-04-15 | Disco Abrasive Syst Ltd | 加工装置 |
JP2010087141A (ja) | 2008-09-30 | 2010-04-15 | Disco Abrasive Syst Ltd | 加工装置 |
JP2015088515A (ja) | 2013-10-28 | 2015-05-07 | 株式会社ディスコ | 加工装置 |
JP2019136765A (ja) | 2018-02-15 | 2019-08-22 | 株式会社ディスコ | 加工装置 |
Also Published As
Publication number | Publication date |
---|---|
JP2022010789A (ja) | 2022-01-17 |
DE102021206466A1 (de) | 2021-12-30 |
CN113927761A (zh) | 2022-01-14 |
KR20220001451A (ko) | 2022-01-05 |
US11633872B2 (en) | 2023-04-25 |
US20210402635A1 (en) | 2021-12-30 |
TW202201511A (zh) | 2022-01-01 |
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