JP7468520B2 - Liquid Composition - Google Patents
Liquid Composition Download PDFInfo
- Publication number
- JP7468520B2 JP7468520B2 JP2021522768A JP2021522768A JP7468520B2 JP 7468520 B2 JP7468520 B2 JP 7468520B2 JP 2021522768 A JP2021522768 A JP 2021522768A JP 2021522768 A JP2021522768 A JP 2021522768A JP 7468520 B2 JP7468520 B2 JP 7468520B2
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- polymer
- composition
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- powder
- mass
- Prior art date
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- 239000000203 mixture Substances 0.000 title claims description 320
- 239000007788 liquid Substances 0.000 title claims description 216
- 229920000642 polymer Polymers 0.000 claims description 311
- 229920001721 polyimide Polymers 0.000 claims description 166
- 239000004642 Polyimide Substances 0.000 claims description 152
- 239000000843 powder Substances 0.000 claims description 123
- 125000003118 aryl group Chemical group 0.000 claims description 97
- 229920005989 resin Polymers 0.000 claims description 84
- 239000011347 resin Substances 0.000 claims description 84
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 claims description 82
- 239000011230 binding agent Substances 0.000 claims description 73
- 239000002612 dispersion medium Substances 0.000 claims description 67
- 239000004094 surface-active agent Substances 0.000 claims description 67
- -1 alkyl vinyl ether Chemical compound 0.000 claims description 45
- 238000002844 melting Methods 0.000 claims description 26
- 230000008018 melting Effects 0.000 claims description 26
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 24
- 230000009477 glass transition Effects 0.000 claims description 17
- 125000005702 oxyalkylene group Chemical group 0.000 claims description 15
- 230000004580 weight loss Effects 0.000 claims description 15
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 claims description 13
- 239000004962 Polyamide-imide Substances 0.000 claims description 12
- 229920002312 polyamide-imide Polymers 0.000 claims description 12
- 239000002253 acid Substances 0.000 claims description 11
- 150000004984 aromatic diamines Chemical class 0.000 claims description 9
- 125000005647 linker group Chemical group 0.000 claims description 7
- 125000000732 arylene group Chemical group 0.000 claims description 6
- 239000010410 layer Substances 0.000 description 212
- 229910052751 metal Inorganic materials 0.000 description 85
- 239000002184 metal Substances 0.000 description 85
- 239000010408 film Substances 0.000 description 76
- 239000011888 foil Substances 0.000 description 75
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 56
- 239000011889 copper foil Substances 0.000 description 55
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 54
- 239000011248 coating agent Substances 0.000 description 51
- 238000000576 coating method Methods 0.000 description 50
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 43
- 150000001875 compounds Chemical class 0.000 description 42
- 238000000034 method Methods 0.000 description 39
- 230000000704 physical effect Effects 0.000 description 36
- 238000010438 heat treatment Methods 0.000 description 34
- 239000000758 substrate Substances 0.000 description 34
- 238000006243 chemical reaction Methods 0.000 description 31
- 239000011256 inorganic filler Substances 0.000 description 31
- 229910003475 inorganic filler Inorganic materials 0.000 description 31
- 230000005540 biological transmission Effects 0.000 description 23
- 239000002759 woven fabric Substances 0.000 description 22
- 239000006185 dispersion Substances 0.000 description 21
- 125000000524 functional group Chemical group 0.000 description 21
- 229920006015 heat resistant resin Polymers 0.000 description 21
- 239000002245 particle Substances 0.000 description 21
- 238000004519 manufacturing process Methods 0.000 description 20
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 19
- 239000000047 product Substances 0.000 description 19
- 229920001577 copolymer Polymers 0.000 description 17
- 239000002243 precursor Substances 0.000 description 17
- 239000007789 gas Substances 0.000 description 15
- 229920005575 poly(amic acid) Polymers 0.000 description 15
- 229920000728 polyester Polymers 0.000 description 15
- 239000003795 chemical substances by application Substances 0.000 description 14
- 230000000694 effects Effects 0.000 description 14
- 125000005462 imide group Chemical group 0.000 description 14
- 239000000463 material Substances 0.000 description 14
- 239000000945 filler Substances 0.000 description 13
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 13
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 12
- 150000004985 diamines Chemical class 0.000 description 12
- 239000000126 substance Substances 0.000 description 12
- 238000010521 absorption reaction Methods 0.000 description 11
- 229910000679 solder Inorganic materials 0.000 description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 10
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 10
- 230000007547 defect Effects 0.000 description 10
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 10
- 239000004810 polytetrafluoroethylene Substances 0.000 description 10
- 238000012360 testing method Methods 0.000 description 10
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- 239000006087 Silane Coupling Agent Substances 0.000 description 9
- 238000011282 treatment Methods 0.000 description 9
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 8
- 125000004432 carbon atom Chemical group C* 0.000 description 8
- 238000011156 evaluation Methods 0.000 description 8
- 230000003993 interaction Effects 0.000 description 8
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 8
- 239000000178 monomer Substances 0.000 description 8
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 8
- 239000002966 varnish Substances 0.000 description 8
- KAUQJMHLAFIZDU-UHFFFAOYSA-N 6-Hydroxy-2-naphthoic acid Chemical compound C1=C(O)C=CC2=CC(C(=O)O)=CC=C21 KAUQJMHLAFIZDU-UHFFFAOYSA-N 0.000 description 7
- 238000009835 boiling Methods 0.000 description 7
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 7
- 230000007423 decrease Effects 0.000 description 7
- 239000002270 dispersing agent Substances 0.000 description 7
- 229910052731 fluorine Inorganic materials 0.000 description 7
- 238000005259 measurement Methods 0.000 description 7
- 238000012545 processing Methods 0.000 description 7
- 238000007788 roughening Methods 0.000 description 7
- 229920001187 thermosetting polymer Polymers 0.000 description 7
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 6
- FJKROLUGYXJWQN-UHFFFAOYSA-N 4-hydroxybenzoic acid Chemical compound OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 6
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 6
- 150000001408 amides Chemical group 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 238000001035 drying Methods 0.000 description 6
- 150000002148 esters Chemical group 0.000 description 6
- 239000000835 fiber Substances 0.000 description 6
- 239000011737 fluorine Substances 0.000 description 6
- 239000012528 membrane Substances 0.000 description 6
- 238000012856 packing Methods 0.000 description 6
- 238000002360 preparation method Methods 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 5
- 230000001476 alcoholic effect Effects 0.000 description 5
- 239000012298 atmosphere Substances 0.000 description 5
- 239000006227 byproduct Substances 0.000 description 5
- 230000008859 change Effects 0.000 description 5
- 230000001186 cumulative effect Effects 0.000 description 5
- 238000000354 decomposition reaction Methods 0.000 description 5
- 239000000539 dimer Substances 0.000 description 5
- 239000003365 glass fiber Substances 0.000 description 5
- HCDGVLDPFQMKDK-UHFFFAOYSA-N hexafluoropropylene Chemical group FC(F)=C(F)C(F)(F)F HCDGVLDPFQMKDK-UHFFFAOYSA-N 0.000 description 5
- 230000002209 hydrophobic effect Effects 0.000 description 5
- 238000004381 surface treatment Methods 0.000 description 5
- 230000008961 swelling Effects 0.000 description 5
- 229920001169 thermoplastic Polymers 0.000 description 5
- 239000004416 thermosoftening plastic Substances 0.000 description 5
- SYBYTAAJFKOIEJ-UHFFFAOYSA-N 3-Methylbutan-2-one Chemical compound CC(C)C(C)=O SYBYTAAJFKOIEJ-UHFFFAOYSA-N 0.000 description 4
- WVDRSXGPQWNUBN-UHFFFAOYSA-N 4-(4-carboxyphenoxy)benzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1OC1=CC=C(C(O)=O)C=C1 WVDRSXGPQWNUBN-UHFFFAOYSA-N 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 229920000049 Carbon (fiber) Polymers 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
- 238000004220 aggregation Methods 0.000 description 4
- 230000002776 aggregation Effects 0.000 description 4
- 239000003963 antioxidant agent Substances 0.000 description 4
- 239000002216 antistatic agent Substances 0.000 description 4
- 239000004917 carbon fiber Substances 0.000 description 4
- 239000003086 colorant Substances 0.000 description 4
- 239000006258 conductive agent Substances 0.000 description 4
- 229910001873 dinitrogen Inorganic materials 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 239000003063 flame retardant Substances 0.000 description 4
- 230000006870 function Effects 0.000 description 4
- 239000012760 heat stabilizer Substances 0.000 description 4
- 150000003949 imides Chemical group 0.000 description 4
- 239000000314 lubricant Substances 0.000 description 4
- 238000005191 phase separation Methods 0.000 description 4
- 238000009832 plasma treatment Methods 0.000 description 4
- 239000004014 plasticizer Substances 0.000 description 4
- 238000011160 research Methods 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- 239000012756 surface treatment agent Substances 0.000 description 4
- 150000000000 tetracarboxylic acids Chemical class 0.000 description 4
- 229920006259 thermoplastic polyimide Polymers 0.000 description 4
- 229920005992 thermoplastic resin Polymers 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 238000005160 1H NMR spectroscopy Methods 0.000 description 3
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 3
- 229940090248 4-hydroxybenzoic acid Drugs 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- LTPBRCUWZOMYOC-UHFFFAOYSA-N Beryllium oxide Chemical compound O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- IMYZQPCYWPFTAG-UHFFFAOYSA-N Mecamylamine Chemical compound C1CC2C(C)(C)C(NC)(C)C1C2 IMYZQPCYWPFTAG-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 3
- 101150101019 PI21 gene Proteins 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 125000003277 amino group Chemical group 0.000 description 3
- 239000002518 antifoaming agent Substances 0.000 description 3
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- 150000001491 aromatic compounds Chemical class 0.000 description 3
- 150000001732 carboxylic acid derivatives Chemical group 0.000 description 3
- 239000007795 chemical reaction product Substances 0.000 description 3
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- 238000006297 dehydration reaction Methods 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
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- 230000001737 promoting effect Effects 0.000 description 3
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 3
- 235000021122 unsaturated fatty acids Nutrition 0.000 description 3
- 150000004670 unsaturated fatty acids Chemical class 0.000 description 3
- 238000009423 ventilation Methods 0.000 description 3
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- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- LVYXPOCADCXMLP-UHFFFAOYSA-N 3-butoxy-n,n-dimethylpropanamide Chemical compound CCCCOCCC(=O)N(C)C LVYXPOCADCXMLP-UHFFFAOYSA-N 0.000 description 2
- LBVMWHCOFMFPEG-UHFFFAOYSA-N 3-methoxy-n,n-dimethylpropanamide Chemical compound COCCC(=O)N(C)C LBVMWHCOFMFPEG-UHFFFAOYSA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-WFGJKAKNSA-N Dimethyl sulfoxide Chemical compound [2H]C([2H])([2H])S(=O)C([2H])([2H])[2H] IAZDPXIOMUYVGZ-WFGJKAKNSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
- 101001080429 Homo sapiens Proteasome inhibitor PI31 subunit Proteins 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 229920002614 Polyether block amide Polymers 0.000 description 2
- 239000004721 Polyphenylene oxide Substances 0.000 description 2
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- 102100027565 Proteasome inhibitor PI31 subunit Human genes 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 238000007112 amidation reaction Methods 0.000 description 2
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- VCCBEIPGXKNHFW-UHFFFAOYSA-N biphenyl-4,4'-diol Chemical compound C1=CC(O)=CC=C1C1=CC=C(O)C=C1 VCCBEIPGXKNHFW-UHFFFAOYSA-N 0.000 description 2
- 238000005282 brightening Methods 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- UUAGAQFQZIEFAH-UHFFFAOYSA-N chlorotrifluoroethylene Chemical group FC(F)=C(F)Cl UUAGAQFQZIEFAH-UHFFFAOYSA-N 0.000 description 2
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- SDIXRDNYIMOKSG-UHFFFAOYSA-L disodium methyl arsenate Chemical compound [Na+].[Na+].C[As]([O-])([O-])=O SDIXRDNYIMOKSG-UHFFFAOYSA-L 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 2
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- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
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- 125000004430 oxygen atom Chemical group O* 0.000 description 2
- 229920002492 poly(sulfone) Polymers 0.000 description 2
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- 229920001296 polysiloxane Polymers 0.000 description 2
- 238000006798 ring closing metathesis reaction Methods 0.000 description 2
- 238000000790 scattering method Methods 0.000 description 2
- 238000004062 sedimentation Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 150000005846 sugar alcohols Polymers 0.000 description 2
- 239000013008 thixotropic agent Substances 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
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- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- KNDQHSIWLOJIGP-UMRXKNAASA-N (3ar,4s,7r,7as)-rel-3a,4,7,7a-tetrahydro-4,7-methanoisobenzofuran-1,3-dione Chemical compound O=C1OC(=O)[C@@H]2[C@H]1[C@]1([H])C=C[C@@]2([H])C1 KNDQHSIWLOJIGP-UMRXKNAASA-N 0.000 description 1
- OYHQOLUKZRVURQ-NTGFUMLPSA-N (9Z,12Z)-9,10,12,13-tetratritiooctadeca-9,12-dienoic acid Chemical compound C(CCCCCCC\C(=C(/C\C(=C(/CCCCC)\[3H])\[3H])\[3H])\[3H])(=O)O OYHQOLUKZRVURQ-NTGFUMLPSA-N 0.000 description 1
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Description
本発明は、テトラフルオロエチレン系ポリマーのパウダーと所定の芳香族ポリマーを含む液状組成物に関する。The present invention relates to a liquid composition comprising a powder of a tetrafluoroethylene-based polymer and a specified aromatic polymer.
ポリテトラフルオロエチレン(PTFE)等のテトラフルオロエチレン系ポリマーは、耐薬品性、撥水撥油性、耐熱性、電気特性等の物性に優れており、その物性を活用して、種々の産業用途に利用されている。
テトラフルオロエチレン系ポリマーのパウダーを含有する液状組成物は、各種基材の表面に塗布すれば、その表面にテトラフルオロエチレン系ポリマーに基づく物性を有する成形物を形成できる。
このため、かかる液状組成物は、高周波信号を伝送するプリント配線基板に用いる、金属箔の表面に絶縁ポリマー層を有するポリマー層付金属箔の材料として有用である(特許文献1及び2参照)。
Tetrafluoroethylene polymers such as polytetrafluoroethylene (PTFE) are excellent in physical properties such as chemical resistance, water and oil repellency, heat resistance, and electrical properties, and are used in a variety of industrial applications by utilizing these physical properties.
When a liquid composition containing a powder of a tetrafluoroethylene-based polymer is applied to the surface of various substrates, a molded article having physical properties based on the tetrafluoroethylene-based polymer can be formed on the surface.
For this reason, such liquid compositions are useful as materials for polymer-layered metal foils having an insulating polymer layer on the surface of the metal foil, which are used in printed wiring boards that transmit high-frequency signals (see Patent Documents 1 and 2).
また、かかる液状組成物に、機能性材料をさらに配合して、それから形成される成形品の物性を向上させる試みがなされている。しかし、テトラフルオロエチレン系ポリマーは、表面張力が低く、他の成分と相互作用しにくい。
このため、かかる液状組成物に、各種の機能性材料を配合すると、その分散性がさらに低下して、使用に耐えなくなりやすい。
特許文献3、4には、かかる液状組成物にポリイミド前駆体のワニスを主成分として配合する際に、予め、液状組成物に疎水性の高いフッ素系添加剤を配合し、その含水量をコントロールして、ワニス配合後の液状組成物の分散性を向上させる提案がされている。
Attempts have also been made to improve the physical properties of molded articles formed from such liquid compositions by further blending functional materials with them, but tetrafluoroethylene-based polymers have low surface tension and are unlikely to interact with other components.
Therefore, when various functional materials are blended into such a liquid composition, the dispersibility of the material is further reduced, making the composition unsuitable for use.
Patent Documents 3 and 4 propose that when a polyimide precursor varnish is blended as a main component in such a liquid composition, a highly hydrophobic fluorine-based additive is blended in advance in the liquid composition to control the water content, thereby improving the dispersibility of the liquid composition after blending with the varnish.
テトラフルオロエチレン系ポリマーを含むプリント基板の作製に際して、特に、その伝送損失を抑制するために、表面粗さの低い金属箔(低粗化金属箔)の使用が検討されている。その際の絶縁ポリマー層には、電気特性に加え、金属箔との強固な密着性が、後の加工における不具合(剥がれ、膨れ、反り等)を抑制する観点から、一層求められる。 When manufacturing printed circuit boards containing tetrafluoroethylene polymers, the use of metal foils with low surface roughness (low-roughening metal foils) is being considered, particularly to reduce transmission loss. In such cases, the insulating polymer layer is required to have not only good electrical properties, but also strong adhesion to the metal foil in order to reduce defects (peeling, swelling, warping, etc.) during subsequent processing.
テトラフルオロエチレン系ポリマーは、電気特性(低誘電率、低誘電正接等)や耐熱性(そのポリマー層付金属箔を加工する際の半田リフロー工程に耐える耐熱性等)に優れる反面、その表面張力の低さにより、金属との接着性が乏しい。特に、低粗化金属箔を用いたポリマー層付金属箔のポリマー層とする場合、ポリマー層と銅箔との間の物理的な接着効果(アンカー効果)が低下するため、両者を強固に密着させるのが一層むずかしい。さらに、テトラフルオロエチレン系ポリマーの線膨張係数は、金属のそれに比較して概して高く、そのポリマー層付金属箔は、加工における加熱に際して、不具合(剥がれ、膨れ、反り)が発生しやすい。Although tetrafluoroethylene-based polymers have excellent electrical properties (low dielectric constant, low dielectric tangent, etc.) and heat resistance (heat resistance that can withstand the solder reflow process when processing the polymer-layered metal foil), they have poor adhesion to metals due to their low surface tension. In particular, when a low-roughening metal foil is used as the polymer layer of a polymer-layered metal foil, the physical adhesive effect (anchor effect) between the polymer layer and the copper foil decreases, making it even more difficult to firmly adhere the two together. Furthermore, the linear expansion coefficient of tetrafluoroethylene-based polymers is generally higher than that of metals, and the polymer-layered metal foil is prone to defects (peeling, swelling, warping) when heated during processing.
そして、本発明者らは、低粗化金属箔とテトラフルオロエチレン系ポリマーを含む層とをこの順に有するポリマー層付金属箔において、その電気特性を損なわずに両者を強固に密着させ、加熱に対する不具合を抑制するのが、一層困難になる課題を知見している。
本発明は、かかる課題を解決し、ポリマー層付金属箔を容易に製造できる、テトラフルオロエチレン系ポリマーのパウダーを含む液状組成物の提供を目的とする。
The inventors have discovered that in a polymer-layered metal foil having a low-roughening metal foil and a layer containing a tetrafluoroethylene-based polymer in that order, it becomes even more difficult to firmly adhere the two together without impairing their electrical properties and to suppress problems caused by heating.
An object of the present invention is to solve the above problems and to provide a liquid composition containing a tetrafluoroethylene-based polymer powder, which enables a polymer-layered metal foil to be easily produced.
また、本発明者らの検討によれば、特許文献3、4の態様における、ワニス配合後の液状組成物の分散性は未だ充分ではない。特に、テトラフルオロエチレン系ポリマーの量が多いと、その分散性が顕著に低下しやすい。それから形成される成形品中でのテトラフルオロエチレン系ポリマーの分散状態や、その物性も未だ充分ではない。
また、特許文献4の態様の液状組成物から薄い成形品(薄膜等)を形成する場合、欠陥が形成されやすく、緻密な薄膜が得られない。
本発明者らは、イミド化が進行していないポリアミック酸(ポリイミド前駆体)ではなく、イミド化が進行した所定のポリイミドを使用すれば、その液状組成物における分散性が向上する点と、それから形成される層の物性が向上する、特にテトラフルオロエチレン系ポリマーの物性が高度に発現する点とを知見した。
Furthermore, according to the studies of the present inventors, the dispersibility of the liquid composition after blending with the varnish in the embodiments of Patent Documents 3 and 4 is still insufficient. In particular, when the amount of the tetrafluoroethylene-based polymer is large, the dispersibility is likely to decrease significantly. The dispersion state of the tetrafluoroethylene-based polymer in the molded article formed therefrom and the physical properties thereof are also still insufficient.
Furthermore, when a thin molded product (such as a thin film) is formed from the liquid composition of the embodiment of Patent Document 4, defects are likely to be formed and a dense thin film cannot be obtained.
The present inventors have found that by using a specific polyimide in which imidization has progressed rather than a polyamic acid (polyimide precursor) in which imidization has not progressed, the dispersibility in the liquid composition is improved and the physical properties of the layer formed therefrom are improved, in particular the physical properties of the tetrafluoroethylene-based polymer are highly expressed.
また、本発明者らは、親水性が所定の範囲にある界面活性剤を使用すれば、液状組成物の分散性が向上する点と、それから形成される層の物性が向上する、特にテトラフルオロエチレン系ポリマーの物性が高度に発現する点とを知見した。
さらに、本発明者らは、液状組成物に所定量の水を敢えて含有させれば、緻密なポリマー層を形成し得る点と、この場合、テトラフルオロエチレン系ポリマーの物性を強く発現させるために液状組成物に含まれるテトラフルオロエチレン系ポリマーの含有量を高くしても、緻密なポリマー層を形成し得る点とを知見した。
本発明は、かかる知見に基づく発明であり、分散性に優れ、緻密なポリマー層を形成し得る液状組成物の提供を目的とする。
The inventors have also discovered that the use of a surfactant having hydrophilicity within a specified range improves the dispersibility of the liquid composition and improves the physical properties of the layer formed therefrom, in particular the physical properties of the tetrafluoroethylene-based polymer are highly expressed.
Furthermore, the present inventors have found that if a predetermined amount of water is deliberately added to the liquid composition, a dense polymer layer can be formed, and that in this case, a dense polymer layer can be formed even if the content of the tetrafluoroethylene-based polymer in the liquid composition is increased in order to strongly express the physical properties of the tetrafluoroethylene-based polymer.
The present invention is based on such findings, and has an object to provide a liquid composition which has excellent dispersibility and is capable of forming a dense polymer layer.
本発明は、下記の態様を有する。
[1] テトラフルオロエチレン系ポリマーのパウダー、液状分散媒、及び、主鎖にアミド構造、イミド構造又はエステル構造を有する、前記液状分散媒に可溶な芳香族ポリマーを含む、液状組成物。
[2] テトラフルオロエチレン系ポリマーのパウダーと、結着樹脂と、液状分散媒とを含み、前記結着樹脂が、前記液状分散媒に可溶でかつ20%重量減少温度が260℃以上の、芳香族ポリアミドイミド又は芳香族ポリイミドである、液状組成物。
[3] 前記テトラフルオロエチレン系ポリマーの含有量に対する前記結着樹脂の含有量の質量比が、0.05以下である、[2]の液状組成物。
[4] 前記テトラフルオロエチレン系ポリマーが、熱溶融性のテトラフルオロエチレン系ポリマーであり、かつ、前記結着樹脂のガラス転移点が前記テトラフルオロエチレン系ポリマーの溶融温度以下である、[2]又は[3]の液状組成物。
[5] テトラフルオロエチレン系ポリマーのパウダーと、イミド化率が1%以上の芳香族ポリイミドと、非プロトン性極性液状分散媒とを含む、液状組成物。
[6] 前記テトラフルオロエチレン系ポリマーの含有量が10~50質量%であり、前記芳香族ポリイミドの含有量が0.01~50質量%である、[5]の液状組成物。
[7] 前記テトラフルオロエチレン系ポリマーが、テトラフルオロエチレンに基づく単位及びペルフルオロ(アルキルビニルエーテル)に基づく単位を含む、溶融温度が260~320℃のテトラフルオロエチレン系ポリマーである、[5]又は[6]の液状組成物。
[8] 前記芳香族ポリイミドが、芳香族テトラカルボン酸の酸二無水物と、2個以上のアリーレン基が連結基を介して連結された構造を有する芳香族ジアミン、又は、脂肪族ジアミンとに基づく単位を含む、[5]~[7]のいずれかの液状組成物。
[9] テトラフルオロエチレン系ポリマーのパウダーと、芳香族ポリアミドイミド、芳香族ポリイミド及び芳香族ポリエステルからなる群から選ばれる少なくとも1種の芳香族ポリマー又はその前駆体と、水酸基及びオキシアルキレン基を有する界面活性剤と、非プロトン性極性液状分散媒とを含み、前記テトラフルオロエチレン系ポリマーの含有量が前記芳香族ポリマー又はその前駆体の含有量以上であり、前記界面活性剤の水酸基価が100mgKOH/g以下かつ前記オキシアルキレン基の含有量が10質量%以上である、液状組成物。
[10] 前記テトラフルオロエチレン系ポリマーの含有量が10~50質量%であり、前記芳香族ポリマー又はその前駆体の含有量が0.01~50質量%である、[9]の液状組成物。
[11] 前記テトラフルオロエチレン系ポリマーが、テトラフルオロエチレンに基づく単位及びペルフルオロ(アルキルビニルエーテル)に基づく単位を含む、溶融温度が260~320℃のテトラフルオロエチレン系ポリマーである、[9]又は[10]の液状組成物。
[12] 前記界面活性剤が、さらに、ペルフルオロアルキル基又はペルフルオロアルケニル基を有する、[9]~[11]のいずれかの液状組成物。
[13] テトラフルオロエチレン系ポリマーのパウダーと、芳香族ポリイミド又はその前駆体と、非水系液状分散媒とを含み、前記テトラフルオロエチレン系ポリマーの含有量が10質量%以上であり、かつ、含水量が1000~50000ppmである、液状組成物。
[14] 前記芳香族ポリイミド又はその前駆体の含有量が、10質量%以上である、[13]の液状組成物。
[15] 前記テトラフルオロエチレン系ポリマーが、ペルフルオロ(アルキルビニルエーテル)に基づく単位を含むテトラフルオロエチレン系ポリマーである、[13]又は[14]の液状組成物。
The present invention has the following aspects.
[1] A liquid composition comprising a powder of a tetrafluoroethylene-based polymer, a liquid dispersion medium, and an aromatic polymer having an amide structure, an imide structure or an ester structure in its main chain and being soluble in the liquid dispersion medium.
[2] A liquid composition comprising a tetrafluoroethylene-based polymer powder, a binder resin, and a liquid dispersion medium, wherein the binder resin is soluble in the liquid dispersion medium and is an aromatic polyamideimide or aromatic polyimide having a 20% weight loss temperature of 260°C or higher.
[3] The liquid composition according to [2], wherein a mass ratio of the content of the binder resin to the content of the tetrafluoroethylene-based polymer is 0.05 or less.
[4] The liquid composition according to [2] or [3], wherein the tetrafluoroethylene-based polymer is a heat-fusible tetrafluoroethylene-based polymer, and the glass transition point of the binder resin is equal to or lower than the melting temperature of the tetrafluoroethylene-based polymer.
[5] A liquid composition comprising a tetrafluoroethylene-based polymer powder, an aromatic polyimide having an imidization rate of 1% or more, and an aprotic polar liquid dispersion medium.
[6] The liquid composition according to [5], wherein the content of the tetrafluoroethylene-based polymer is 10 to 50 mass % and the content of the aromatic polyimide is 0.01 to 50 mass %.
[7] The liquid composition according to [5] or [6], wherein the tetrafluoroethylene-based polymer is a tetrafluoroethylene-based polymer containing units based on tetrafluoroethylene and units based on perfluoro(alkyl vinyl ether) and having a melting temperature of 260 to 320° C.
[8] The liquid composition according to any one of [5] to [7], wherein the aromatic polyimide contains a unit based on an acid dianhydride of an aromatic tetracarboxylic acid and an aromatic diamine or an aliphatic diamine having a structure in which two or more arylene groups are linked via a linking group.
[9] A liquid composition comprising a powder of a tetrafluoroethylene-based polymer, at least one aromatic polymer or a precursor thereof selected from the group consisting of aromatic polyamideimide, aromatic polyimide, and aromatic polyester, a surfactant having a hydroxyl group and an oxyalkylene group, and an aprotic polar liquid dispersion medium, wherein the content of the tetrafluoroethylene-based polymer is equal to or greater than the content of the aromatic polymer or the precursor thereof, the hydroxyl value of the surfactant is 100 mgKOH/g or less, and the content of the oxyalkylene group is 10 mass% or more.
[10] The liquid composition according to [9], wherein the content of the tetrafluoroethylene-based polymer is 10 to 50 mass % and the content of the aromatic polymer or a precursor thereof is 0.01 to 50 mass %.
[11] The liquid composition according to [9] or [10], wherein the tetrafluoroethylene-based polymer is a tetrafluoroethylene-based polymer containing units based on tetrafluoroethylene and units based on perfluoro(alkyl vinyl ether) and having a melting temperature of 260 to 320° C.
[12] The liquid composition according to any one of [9] to [11], wherein the surfactant further has a perfluoroalkyl group or a perfluoroalkenyl group.
[13] A liquid composition comprising a tetrafluoroethylene-based polymer powder, an aromatic polyimide or a precursor thereof, and a non-aqueous liquid dispersion medium, the content of the tetrafluoroethylene-based polymer being 10 mass% or more and the water content being 1,000 to 50,000 ppm.
[14] The liquid composition according to [13], wherein the content of the aromatic polyimide or a precursor thereof is 10 mass % or more.
[15] The liquid composition according to [13] or [14], wherein the tetrafluoroethylene-based polymer is a tetrafluoroethylene-based polymer containing units based on perfluoro(alkyl vinyl ether).
本発明によれば、分散性に優れ、接着性及び高度なテトラフルオロエチレン系ポリマー物性を具備した緻密な成形物を形成できる、液状組成物が得られる。According to the present invention, a liquid composition is obtained that has excellent dispersibility and is capable of forming dense molded articles that have adhesion and high-grade tetrafluoroethylene-based polymer properties.
以下の用語は、以下の意味を有する。
「パウダーの平均粒子径(D50)」は、レーザー回折・散乱法によって求められる、パウダーの体積基準累積50%径である。すなわち、レーザー回折・散乱法によってパウダーの粒度分布を測定し、その粒子の集団の全体積を100%として累積カーブを求め、その累積カーブ上で累積体積が50%となる点の粒子径である。
「パウダーのD90」は、同様にして求められる、パウダーの体積基準累積90%径である。
パウダーの粒径は、パウダーを水中に分散させ、レーザー回折・散乱式の粒度分布測定装置(堀場製作所社製、LA-920測定器)を用いて測定できる。
「ポリマーの溶融粘度」は、ASTM D 1238に準拠し、フローテスター及び2Φ-8Lのダイを用い、予め測定温度にて5分間加熱しておいたポリマーの試料(2g)を0.7MPaの荷重にて測定温度に保持して測定した値である。
「ポリマーの溶融温度(融点)」は、示差走査熱量測定(DSC)法で測定したポリマーの融解ピークの最大値に対応する温度である。
「ポリマーのガラス転移点」は、動的粘弾性測定(DMA)法でポリマーを分析して測定される値である。
「粘度」は、B型粘度計を用いて、室温下(25℃)で回転数が30rpmの条件下で測定される液の粘度である。測定を3回繰り返し、3回分の測定値の平均値とする。
「チキソ比」とは、回転数が30rpmの条件で測定される液の粘度η1を回転数が60rpmの条件で測定される液の粘度η2で除して算出される値(η1/η2)である。
「十点平均粗さ(Rzjis)」は、JIS B 0601:2013の附属書JAで規定される値である。
ポリマーにおける「単位」は、重合反応によってモノマーから直接形成された原子団であってもよく、重合反応によって得られたポリマーを所定の方法で処理して、構造の一部が変換された原子団であってもよい。ポリマーに含まれる、モノマーAに基づく単位を、単に「モノマーA単位」とも記す。
「(メタ)アクリレート」は、アクリレートとメタクリレートとの総称である。
「重量平均分子量(Mw)」は、ゲル・パーミエーションクロマトグラフィー(GPC)により測定されたポリマーの標準ポリスチレン換算値である。
The following terms have the following meanings.
The "average particle size of a powder (D50)" is the cumulative 50% volumetric diameter of a powder determined by a laser diffraction/scattering method. In other words, the particle size distribution of a powder is measured by a laser diffraction/scattering method, and a cumulative curve is calculated with the total volume of the particle group set as 100%, and the average particle size of the powder (D50) is the particle size at the point on the cumulative curve where the cumulative volume is 50%.
"D90 of powder" is the volume-based cumulative 90% diameter of the powder, determined in the same manner.
The particle size of the powder can be measured by dispersing the powder in water and using a laser diffraction/scattering type particle size distribution measuring device (LA-920 measuring device, manufactured by Horiba, Ltd.).
The "melt viscosity of polymer" is a value measured in accordance with ASTM D 1238 using a flow tester and a 2Φ-8L die, with a polymer sample (2 g) that had been preheated at the measurement temperature for 5 minutes being held at the measurement temperature under a load of 0.7 MPa.
The "melting temperature (melting point) of a polymer" is the temperature corresponding to the maximum value of the melting peak of the polymer as measured by differential scanning calorimetry (DSC).
The "glass transition point of a polymer" is a value measured by analyzing a polymer using a dynamic mechanical analysis (DMA) method.
The "viscosity" is the viscosity of the liquid measured using a Brookfield viscometer at room temperature (25° C.) and a rotation speed of 30 rpm. The measurement is repeated three times, and the average value of the three measured values is used.
The "thixotropy ratio" is a value (η1/η2) calculated by dividing the viscosity η1 of the liquid measured at a rotation speed of 30 rpm by the viscosity η2 of the liquid measured at a rotation speed of 60 rpm.
"Ten-point average roughness (Rzjis)" is a value specified in Annex JA of JIS B 0601:2013.
The "unit" in a polymer may be an atomic group formed directly from a monomer by a polymerization reaction, or may be an atomic group in which a part of the structure is converted by treating a polymer obtained by a polymerization reaction with a predetermined method. A unit based on monomer A contained in a polymer is also simply referred to as a "monomer A unit".
"(Meth)acrylate" is a general term for acrylate and methacrylate.
The "weight average molecular weight (Mw)" is a value of the polymer measured by gel permeation chromatography (GPC) in terms of standard polystyrene.
本発明の液状組成物(本組成物)は、テトラフルオロエチレン系ポリマー(以下、「Fポリマー」とも記す。)のパウダー(以下、「Fパウダー」とも記す。)、液状分散媒、及び、主鎖にアミド構造、イミド構造又はエステル構造を有する、上記液状分散媒に可溶な芳香族ポリマー(以下、「芳香族ポリマー」とも記す。)を含む。
本組成物は、芳香族ポリマーのワニスにFパウダーが高度に分散した分散液であるとも言える。芳香族ポリマーは、Fポリマーとは異なる化合物であり、液状分散媒に対する25℃における溶解度(g/液状分散媒100g)が5以上の化合物であるのが好ましい。なお、芳香族ポリマーの溶解度は、30以下であるのが好ましい。
The liquid composition of the present invention (present composition) comprises a powder (hereinafter also referred to as "F powder") of a tetrafluoroethylene polymer (hereinafter also referred to as "F polymer"), a liquid dispersion medium, and an aromatic polymer (hereinafter also referred to as "aromatic polymer") having an amide structure, imide structure or ester structure in its main chain and soluble in the liquid dispersion medium.
This composition can be said to be a dispersion in which the F powder is highly dispersed in an aromatic polymer varnish. The aromatic polymer is a compound different from the F polymer, and is preferably a compound having a solubility in a liquid dispersion medium at 25° C. (g/100 g of liquid dispersion medium) of 5 or more. The solubility of the aromatic polymer is preferably 30 or less.
本組成物の第1の態様(以下、本組成物(1)とも記す。)としては、Fパウダーと、結着樹脂と、液状分散媒とを含み、上記結着樹脂が、上記液状分散媒に可溶でかつ20%重量減少温度が260℃以上の、芳香族ポリアミドイミド又は芳香族ポリイミドである、態様が挙げられる。
本組成物(1)から形成される層(塗膜)(成形品等の態様を含む。)(以下、単に「層(塗膜)」とも記す。)が、基材密着性及び表面平滑性に優れる理由は、必ずしも明確ではないが、以下の様に考えられる。
A first aspect of the present composition (hereinafter also referred to as the present composition (1)) includes an F powder, a binder resin, and a liquid dispersion medium, in which the binder resin is soluble in the liquid dispersion medium and is an aromatic polyamideimide or aromatic polyimide having a 20% weight loss temperature of 260° C. or higher.
The reason why a layer (coating film) (including embodiments such as molded articles) (hereinafter also simply referred to as a "layer (coating film)") formed from the present composition (1) has excellent adhesion to a substrate and surface smoothness is not necessarily clear, but is thought to be as follows.
本組成物(1)において、層(塗膜)の形成は、Fパウダーのパッキングと、Fポリマーの焼成(通常、260℃以上の温度での加熱)とによって進行する。パッキングに際して、結着樹脂は、Fパウダーに結着して、Fパウダーの粉落ちを抑制する効果を発現する。分子同士の間の相互作用が低いFポリマーを使用する本発明において、かかる効果は大きいと考えられる。
一方、焼成に際して、結着樹脂は、層(塗膜)の性状や物性を低下させ得る。具体的には、結着樹脂の分解に伴う残渣(分解ガス)や結着樹脂自体の反応に伴う副生物(水、炭酸ガス等)が、形成される層(塗膜)の界面を荒らしやすい点を、本発明者らは知見している。特に、層(塗膜)が形成される基材の平滑性が高い場合、かかる荒れが、層(塗膜)と基材との密着性を顕著に低下させる点を、本発明者らは知見している。
本発明者らは、鋭意検討の結果、所定の結着樹脂を用いれば、かかる密着性の低下を抑制しつつ、Fポリマーが有する元来の物性をも損なわずに、容易に層(塗膜)を形成できる点を知見して、本発明を完成したのである。
In the present composition (1), the formation of a layer (coating film) proceeds by packing of the F powder and baking of the F polymer (usually by heating at a temperature of 260° C. or higher). During packing, the binder resin binds to the F powder, exerting the effect of suppressing the powder from falling off. In the present invention, which uses an F polymer with low molecular interactions, such an effect is considered to be significant.
On the other hand, during baking, the binder resin can deteriorate the properties and physical properties of the layer (coating film). Specifically, the present inventors have found that residues (decomposition gases) resulting from the decomposition of the binder resin and by-products (water, carbon dioxide, etc.) resulting from the reaction of the binder resin itself tend to roughen the interface of the layer (coating film) to be formed. In particular, the present inventors have found that when the substrate on which the layer (coating film) is formed has high smoothness, such roughness significantly reduces the adhesion between the layer (coating film) and the substrate.
As a result of intensive research, the present inventors discovered that by using a specific binder resin, it is possible to easily form a layer (coating film) while suppressing such a decrease in adhesion and without impairing the original physical properties of the F polymer, and thus completed the present invention.
本組成物(1)におけるFポリマーは、テトラフルオロエチレン(TFE)に基づく単位(TFE単位)を含むポリマーである。Fポリマーは、TFEのホモポリマーであってもよく、TFEと、TFEと他のコモノマーとのコポリマーであってもよい。また、Fポリマーは、1種を単独で使用してもよく、2種以上を使用してもよい。
Fポリマーは、ポリマーを構成する全単位に対して、TFE単位を90~100モル%含むのが好ましい。また、Fポリマーのフッ素含有量は、70~76質量%が好ましく、72~76質量%がより好ましい。
The F polymer in the composition (1) is a polymer that contains units (TFE units) based on tetrafluoroethylene (TFE).The F polymer may be a homopolymer of TFE, or may be a copolymer of TFE and TFE and other comonomers.F polymer may be used alone or may be used in combination of two or more kinds.
The F polymer preferably contains 90 to 100 mol % of TFE units based on the total units constituting the polymer, and the fluorine content of the F polymer is preferably 70 to 76 mass %, more preferably 72 to 76 mass %.
Fポリマーとしては、ポリテトラフルオロエチレン(PTFE)、TFEとエチレンとのコポリマー(ETFE)、TFEとプロピレンとのコポリマー、TFEとペルフルオロ(アルキルビニルエーテル)(PAVE)とのコポリマー(PFA)、TFEとヘキサフルオロプロピレン(HFP)とのコポリマー(FEP)、TFEとフルオロアルキルエチレン(FAE)とのコポリマー、TFEとクロロトリフルオロエチレン(CTFE)とのコポリマーが挙げられる。コポリマーは、さらに他のコモノマーに基づく単位を含んでいてもよい。
なお、PTFEとしては、フィブリル性を有する高分子量PTFE、低分子量PTFE、変性PTFEが挙げられる。また、低分子量PTFE又は変性PTFEには、TFEと極微量のコモノマー(HFP、PAVE、FAE等)とのコポリマーも包含される。
F polymers include polytetrafluoroethylene (PTFE), copolymers of TFE and ethylene (ETFE), copolymers of TFE and propylene, copolymers of TFE and perfluoro(alkyl vinyl ether) (PAVE) (PFA), copolymers of TFE and hexafluoropropylene (HFP) (FEP), copolymers of TFE and fluoroalkylethylene (FAE), and copolymers of TFE and chlorotrifluoroethylene (CTFE). The copolymers may further contain units based on other comonomers.
In addition, examples of PTFE include high molecular weight PTFE, low molecular weight PTFE, and modified PTFE having fibrillation properties. In addition, the low molecular weight PTFE and modified PTFE also include copolymers of TFE and a very small amount of comonomer (HFP, PAVE, FAE, etc.).
Fポリマーは、TFE単位及び官能基を有するのが好ましい。官能基は、カルボニル基含有基、ヒドロキシ基、エポキシ基、アミド基、アミノ基又はイソシアネート基が好ましい。
官能基は、Fポリマー中の単位に含まれていてもよく、ポリマーの主鎖の末端基に含まれていてもよい。また、Fポリマーを、プラズマ処理や電離線処理して得られる、官能基を有するFポリマーも使用できる。
官能基を有するFポリマーは、本組成物(1)中におけるFパウダーの分散性の観点から、TFE単位及び官能基を有する単位を有するFポリマーが好ましい。官能基を有する単位は、官能基を有するモノマーに基づく単位が好ましく、上述した官能基を有するモノマーに基づく単位がより好ましい。
The F polymer preferably has TFE units and a functional group, preferably a carbonyl-containing group, a hydroxy group, an epoxy group, an amide group, an amino group or an isocyanate group.
The functional group may be contained in a unit in the F polymer or in a terminal group of the main chain of the polymer. In addition, an F polymer having a functional group obtained by subjecting an F polymer to a plasma treatment or ionizing radiation treatment can also be used.
From the viewpoint of dispersibility of F powder in the composition (1), the F polymer having functional group is preferably the F polymer having TFE unit and the unit having functional group.The unit having functional group is preferably the unit based on the monomer having functional group, and more preferably the unit based on the monomer having functional group described above.
官能基を有するモノマーは、酸無水物残基を有するモノマーが好ましく、無水イタコン酸、無水シトラコン酸、5-ノルボルネン-2,3-ジカルボン酸無水物(別称:無水ハイミック酸;以下、「NAH」とも記す。)又は無水マレイン酸がより好ましい。
官能基を有するFポリマーの好適な具体例としては、TFE単位と、HFP単位、PAVE単位又はFAE単位と、官能基を有する単位とを有するFポリマーが挙げられる。
PAVEとしては、CF2=CFOCF3(PMVE)、CF2=CFOCF2CF3、CF2=CFOCF2CF2CF3(PPVE)が挙げられる。
FAEとしては、CH2=CH(CF2)2F、CH2=CH(CF2)3F、CH2=CH(CF2)4F、CH2=CF(CF2)3H、CH2=CF(CF2)4Hが挙げられる。
The monomer having a functional group is preferably a monomer having an acid anhydride residue, and more preferably itaconic anhydride, citraconic anhydride, 5-norbornene-2,3-dicarboxylic anhydride (also called himic anhydride; hereinafter also referred to as "NAH"), or maleic anhydride.
A specific preferred example of the F polymer having a functional group is an F polymer having a TFE unit, an HFP unit, a PAVE unit or an FAE unit, and a unit having a functional group.
Examples of PAVE include CF2 = CFOCF3 (PMVE), CF2 = CFOCF2CF3 , and CF2 = CFOCF2CF2CF3 ( PPVE ) .
Examples of FAE include CH2 =CH( CF2 ) 2F , CH2=CH( CF2 ) 3F , CH2 =CH( CF2 ) 4F , CH2 =CF( CF2 ) 3H , and CH2 =CF( CF2 ) 4H .
かかるFポリマーの具体例として、ポリマーを構成する全単位に対して、TFE単位を90~99モル%、HFP単位、PAVE単位又はFAE単位を0.5~9.97モル%、官能基を有する単位を0.01~3モル%、それぞれ含有するFポリマーが挙げられる。かかるFポリマーの具体例としては、国際公開第2018/16644号に記載されるポリマーが挙げられる。 Specific examples of such F polymers include F polymers containing 90 to 99 mol% TFE units, 0.5 to 9.97 mol% HFP units, PAVE units or FAE units, and 0.01 to 3 mol% units having functional groups, based on the total units constituting the polymer. Specific examples of such F polymers include the polymers described in WO 2018/16644.
Fポリマーは、熱溶融性であるのが好ましい。
Fポリマーの380℃における溶融粘度は、1×102~1×106Pa・sが好ましく、1×103~1×106Pa・sがより好ましい。
Fポリマーの溶融温度は、200~320℃が好ましく、260~320℃がより好ましい。かかるFポリマーを使用すれば、緻密かつ密着性に優れた層(塗膜)が形成されやすい。また、層(塗膜)の形成における加熱において、Fポリマーと結着樹脂とが高度に流動して、層(塗膜)の物性が向上しやすい。
The F polymer is preferably heat meltable.
The melt viscosity of the F polymer at 380° C. is preferably from 1×10 2 to 1×10 6 Pa·s, and more preferably from 1×10 3 to 1×10 6 Pa·s.
The melting temperature of the F polymer is preferably 200 to 320° C., more preferably 260 to 320° C. By using such an F polymer, a dense layer (coating film) having excellent adhesion is easily formed. In addition, during heating in forming the layer (coating film), the F polymer and the binder resin flow to a high degree, and the physical properties of the layer (coating film) are easily improved.
本組成物(1)におけるFパウダーのD50は、0.05~8μmが好ましく、0.1~6.0μmがより好ましく、0.2~3.0μmがさらに好ましい。
FパウダーのD90は、10μm以下が好ましく、8μm以下がより好ましく、6μm以下がさらに好ましい。この範囲のD50及びD90において、Fパウダーの流動性と分散性とが良好となり、層(塗膜)の電気物性や耐熱性がより発現しやすい。
Fパウダーは、Fポリマー以外の樹脂を含んでいてもよいが、Fポリマーを主成分とするのが好ましく、Fポリマーからなるのがより好ましい。パウダーにおけるFポリマーの含有量は、80質量%以上が好ましく、100質量%がより好ましい。
上記樹脂としては、芳香族ポリエステル、ポリアミドイミド、熱可塑性ポリイミド、ポリフェニレンエーテル、ポリフェニレンオキシドが挙げられる。
The D50 of the F powder in the composition (1) is preferably 0.05 to 8 μm, more preferably 0.1 to 6.0 μm, and even more preferably 0.2 to 3.0 μm.
The D90 of the F powder is preferably 10 μm or less, more preferably 8 μm or less, and even more preferably 6 μm or less. With D50 and D90 in this range, the fluidity and dispersibility of the F powder are good, and the electrical properties and heat resistance of the layer (coating film) are more easily exhibited.
The F powder may contain a resin other than the F polymer, but preferably contains the F polymer as a main component, and more preferably consists of the F polymer. The content of the F polymer in the powder is preferably 80% by mass or more, and more preferably 100% by mass.
Examples of the resin include aromatic polyester, polyamideimide, thermoplastic polyimide, polyphenylene ether, and polyphenylene oxide.
本組成物(1)における液状分散媒は、25℃で液状の不活性かつFパウダーと反応しないFパウダーを分散させる液体であり、結着樹脂を溶解する液体(化合物)である。液状分散媒は、本組成物(1)に含まれる液状分散媒の以外の成分よりも低沸点かつ揮発性の液体が好ましい。液状分散媒は、1種を単独で使用してもよく、2種以上を併用して混合液状分散媒としてもよい。
液状分散媒は、極性液状分散媒であってもよく、非極性液状分散媒であってもよく、極性液状分散媒が好ましい。
液状分散媒は、水性であってもよく、非水性であってもよく、非水性が好ましい。
液状分散媒の沸点は、80~275℃が好ましく、125~250℃がより好ましい。この範囲において、本組成物(1)から液状分散媒を揮発させて層(塗膜)を形成させる際に、Fパウダーが効果的に流動して、緻密なパッキングが進行しやすい。
The liquid dispersion medium in the present composition (1) is a liquid that disperses the F powder, is inactive at 25° C., and does not react with the F powder, and is a liquid (compound) that dissolves the binder resin. The liquid dispersion medium is preferably a liquid that has a lower boiling point and is more volatile than the components other than the liquid dispersion medium contained in the present composition (1). The liquid dispersion medium may be used alone or in combination of two or more to form a mixed liquid dispersion medium.
The liquid dispersion medium may be a polar liquid dispersion medium or a non-polar liquid dispersion medium, with a polar liquid dispersion medium being preferred.
The liquid dispersion medium may be aqueous or non-aqueous, preferably non-aqueous.
The boiling point of the liquid dispersion medium is preferably 80 to 275° C., more preferably 125 to 250° C. Within this range, when the liquid dispersion medium is evaporated from the present composition (1) to form a layer (coating film), the F powder flows effectively and dense packing tends to progress.
液状分散媒の具体例としては、水、メタノール、エタノール、1-プロパノール、2-プロパノール、1-ブタノール、1-メトキシ-2-プロパノール、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド、メチルエチルケトン、N-メチル-2-ピロリドン、γ-ブチロラクトン、シクロヘキサノン、シクロペンタノン、ジメチルスルホキシド、ジエチルエーテル、ジオキサン、乳酸エチル、酢酸エチル、酢酸ブチル、メチルエチルケトン、メチルイソプロピルケトン、シクロペンタノン、シクロヘキサノン、エチレングリコールモノイソプロピルエーテル、セロソルブ(メチルセロソルブ、エチルセロソルブ等)が挙げられる。 Specific examples of liquid dispersion media include water, methanol, ethanol, 1-propanol, 2-propanol, 1-butanol, 1-methoxy-2-propanol, N,N-dimethylformamide, N,N-dimethylacetamide, methyl ethyl ketone, N-methyl-2-pyrrolidone, γ-butyrolactone, cyclohexanone, cyclopentanone, dimethyl sulfoxide, diethyl ether, dioxane, ethyl lactate, ethyl acetate, butyl acetate, methyl ethyl ketone, methyl isopropyl ketone, cyclopentanone, cyclohexanone, ethylene glycol monoisopropyl ether, and cellosolve (methyl cellosolve, ethyl cellosolve, etc.).
本組成物(1)における液状分散媒は、本組成物(1)の液物性(粘度、チキソ比等)の調整と、結着樹脂の溶解性との観点から、有機液体(有機化合物)が好ましく、本組成物(1)の分散安定性の観点から、ケトン又はアミドがより好ましく、メチルエチルケトン、シクロヘキサノン又はN-メチル-2-ピロリドンがさらに好ましい。The liquid dispersion medium in composition (1) is preferably an organic liquid (organic compound) from the viewpoint of adjusting the liquid properties (viscosity, thixotropy ratio, etc.) of composition (1) and the solubility of the binder resin, and is more preferably a ketone or amide from the viewpoint of the dispersion stability of composition (1), and is even more preferably methyl ethyl ketone, cyclohexanone or N-methyl-2-pyrrolidone.
本組成物(1)における結着樹脂の20%重量減少温度は、260℃以上であり、300℃以上が好ましく、320℃以上がより好ましい。結着樹脂の20%重量減少温度は、600℃以下が好ましい。結着樹脂の5%重量減少温度は、260℃以上が好ましく、300℃以上がより好ましく、320℃以上がさらに好ましい。結着樹脂の5%重量減少温度は、600℃以下が好ましい。この範囲において、結着樹脂の分解ガス(気泡)や結着樹脂自体の反応に伴う副生物であるガス(気泡)による、層(塗膜)の界面荒れを効果的に抑制でき、層(塗膜)の密着性が一層向上しやすい。The 20% weight loss temperature of the binder resin in the present composition (1) is 260°C or higher, preferably 300°C or higher, and more preferably 320°C or higher. The 20% weight loss temperature of the binder resin is preferably 600°C or lower. The 5% weight loss temperature of the binder resin is preferably 260°C or higher, more preferably 300°C or higher, and even more preferably 320°C or higher. The 5% weight loss temperature of the binder resin is preferably 600°C or lower. Within this range, the interface roughness of the layer (coating film) due to the decomposition gas (bubbles) of the binder resin and the gas (bubbles) that is a by-product associated with the reaction of the binder resin itself can be effectively suppressed, and the adhesion of the layer (coating film) is further improved.
本組成物(1)における結着樹脂は、液状分散媒に可溶なポリマーである。かかる結着樹脂は、本組成物(1)中において他成分(Fポリマー、液状分散媒)との相互作用が高まり、本組成物(1)の分散性が向上しやすい。さらに、層(塗膜)の形成における加熱において、結着樹脂の流動性が高まり、高度に均一なマトリックスが形成されやすい。その結果、電気特性等のFポリマーの元来の物性がそのまま発現しつつ、基材密着性の高い層(塗膜)が形成されたと考えられる。特に、本組成物(1)中の結着樹脂の含有量が少ない場合(特に、Fポリマーの含有量に対する結着樹脂の含有量の質量比が低い場合)、かかる効果が一層亢進しやすい。The binder resin in the present composition (1) is a polymer soluble in a liquid dispersion medium. Such a binder resin enhances the interaction with other components (F polymer, liquid dispersion medium) in the present composition (1), and the dispersibility of the present composition (1) is likely to be improved. Furthermore, during heating in the formation of a layer (coating), the fluidity of the binder resin increases, and a highly uniform matrix is likely to be formed. As a result, it is considered that a layer (coating) with high adhesion to the substrate is formed while the original physical properties of the F polymer, such as electrical properties, are expressed as they are. In particular, when the content of the binder resin in the present composition (1) is low (particularly when the mass ratio of the content of the binder resin to the content of the F polymer is low), such an effect is likely to be further enhanced.
本組成物(1)における結着樹脂は、芳香族ポリアミドイミド又は芳香族ポリイミドであり、芳香族ポリイミドであるのがより好ましい。
結着樹脂は、非反応型の樹脂であってもよく、反応型の樹脂であってもよい。
非反応型の樹脂とは、本組成物(1)の使用条件において反応が生じる反応性基を有しないポリマーを意味する。例えば、非反応型の芳香族ポリイミドとは、既にイミド化が完了した芳香族ポリイミドであり、イミド化反応がさらに生じない芳香族ポリイミドを意味する。
一方、反応型の樹脂とは、上記反応性基を有し、本組成物(1)の使用条件において、反応(縮合反応、付加反応等)が生じるポリマーを意味する。例えば、反応型の芳香族ポリイミドとは、芳香族ポリイミドの前駆体(ポリアミック酸等の部分的にイミド化反応が進行したポリイミド等)であり、本組成物(1)の使用条件(加熱等)においてイミド化反応がさらに生じるポリマーを意味する。
The binder resin in the composition (1) is an aromatic polyamideimide or an aromatic polyimide, and more preferably an aromatic polyimide.
The binder resin may be a non-reactive resin or a reactive resin.
The non-reactive resin means a polymer that does not have a reactive group that undergoes a reaction under the conditions of use of the present composition (1). For example, the non-reactive aromatic polyimide means an aromatic polyimide in which imidization has already been completed and no further imidization reaction occurs.
On the other hand, the reactive resin means a polymer that has the reactive group and undergoes a reaction (condensation reaction, addition reaction, etc.) under the conditions of use of the present composition (1). For example, the reactive aromatic polyimide means a polymer that is a precursor of an aromatic polyimide (such as a polyimide in which a partial imidization reaction of a polyamic acid or the like has progressed) and further undergoes an imidization reaction under the conditions of use of the present composition (such as heating).
結着樹脂は、熱可塑性であってもよく、熱硬化性であってもよい。
結着樹脂が熱可塑性であれば、本組成物(1)から層(塗膜)を形成する際の加熱において、結着樹脂の流動性が亢進し、緻密かつ均一なポリマー層が形成され、層(塗膜)の密着性が向上しやすい。熱可塑性の結着樹脂は、非反応型の熱可塑性樹脂が好ましい。
熱可塑性である結着樹脂のガラス転移点は、500℃以下が好ましい。ガラス転移点は、0℃以上が好ましく、200℃以上がより好ましい。この範囲において、層(塗膜)の形成において、結着樹脂の流動性とFパウダーの緻密なパッキングとが亢進しやすい。
一方、結着樹脂が熱硬化性であれば、層(塗膜)に、その硬化物が含まれることにより、層(塗膜)の線膨張性が一層低下し、反りの発生がより抑制されやすい。熱硬化性の結着樹脂は、反応型の熱硬化性樹脂が好ましい。
結着樹脂は、非反応型の熱可塑性樹脂又は反応型の熱硬化性樹脂が好ましく、非反応型の熱可塑性樹脂がより好ましい。
The binder resin may be either thermoplastic or thermosetting.
If the binder resin is thermoplastic, the fluidity of the binder resin is enhanced during heating when forming a layer (coating film) from the present composition (1), a dense and uniform polymer layer is formed, and the adhesion of the layer (coating film) is likely to be improved. The thermoplastic binder resin is preferably a non-reactive thermoplastic resin.
The glass transition point of the thermoplastic binder resin is preferably 500° C. or lower. The glass transition point is preferably 0° C. or higher, and more preferably 200° C. or higher. Within this range, the fluidity of the binder resin and the dense packing of the F powder are likely to be enhanced in the formation of a layer (coating film).
On the other hand, if the binder resin is thermosetting, the layer (coating film) contains a cured product thereof, which further reduces the linear expansion property of the layer (coating film), and the occurrence of warping is more easily suppressed. The thermosetting binder resin is preferably a reactive thermosetting resin.
The binder resin is preferably a non-reactive thermoplastic resin or a reactive thermosetting resin, and more preferably a non-reactive thermoplastic resin.
結着樹脂の具体例としては、「HPC」シリーズ(日立化成社製)等のポリアミドイミド樹脂、「ネオプリム」シリーズ(三菱ガス化学社製)、「スピクセリア」シリーズ(ソマール社製)、「Q-PILON」シリーズ(ピーアイ技術研究所製)、「WINGO」シリーズ(ウィンゴーテクノロジー社製)、「トーマイド」シリーズ(T&K TOKA社製)、「KPI-MX」シリーズ(河村産業社製)、「ユピア-AT」シリーズ(宇部興産社製)等のポリイミド樹脂が挙げられる。Specific examples of binder resins include polyamide-imide resins such as the "HPC" series (manufactured by Hitachi Chemical Co., Ltd.), and polyimide resins such as the "Neoprim" series (manufactured by Mitsubishi Gas Chemical Co., Ltd.), "Spiccellia" series (manufactured by Somar), "Q-PILON" series (manufactured by PI Technical Research Institute), "WINGO" series (manufactured by Wingo Technology Co., Ltd.), "Tomide" series (manufactured by T&K Toka Corporation), "KPI-MX" series (manufactured by Kawamura Sangyo Co., Ltd.), and "Upia-AT" series (manufactured by Ube Industries, Ltd.).
本組成物(1)におけるFポリマー及び結着樹脂の好適な態様としては、Fポリマーが熱溶融性のFポリマーであり、かつ、結着樹脂のガラス転移点がFポリマーの溶融温度以下である態様が挙げられる。この場合、Fポリマーの溶融温度は、260~320℃が好ましく、280~320℃がより好ましい。また、結着樹脂のガラス転移点は、80~320℃が好ましく、150~320℃がより好ましく、180~300℃がさらに好ましい。A suitable embodiment of the F polymer and binder resin in the composition (1) is one in which the F polymer is a heat-fusible F polymer and the glass transition point of the binder resin is equal to or lower than the melting temperature of the F polymer. In this case, the melting temperature of the F polymer is preferably 260 to 320°C, more preferably 280 to 320°C. The glass transition point of the binder resin is preferably 80 to 320°C, more preferably 150 to 320°C, and even more preferably 180 to 300°C.
上記態様においては、本組成物(1)を加熱してポリマー層を形成する際、Fポリマーが溶融し、結着樹脂が軟化した状態を形成しやすい。その結果、Fポリマーと結着樹脂とが高度に相互流動するため、形成されるポリマー層において、それぞれの物性が顕著に発現しやすい。例えば、結着樹脂が芳香族ポリマーであるため、ポリマー層のUV吸収性もより向上しやすい。また、Fポリマーが、TFE単位及びPAVE単位を有するFポリマー(PFA)、特に、TFE単位、PAVE単位及び官能基を有するFポリマーであれば、電気特性がより向上したポリマー層付金属箔が得られやすい。かかるポリマー層付金属箔を、波長355nm等のUV-YAGレーザーを用いて加工すれば、高周波信号の伝送に適したプリント基板を効率よく製造できる。In the above embodiment, when the composition (1) is heated to form a polymer layer, the F polymer melts and the binder resin is likely to soften. As a result, the F polymer and the binder resin flow mutually to a high degree, and the physical properties of each are likely to be significantly expressed in the formed polymer layer. For example, since the binder resin is an aromatic polymer, the UV absorption of the polymer layer is also likely to be improved. In addition, if the F polymer is an F polymer (PFA) having TFE units and PAVE units, particularly an F polymer having TFE units, PAVE units, and functional groups, a polymer-layered metal foil with improved electrical properties is likely to be obtained. If such a polymer-layered metal foil is processed using a UV-YAG laser with a wavelength of 355 nm or the like, a printed circuit board suitable for transmitting high-frequency signals can be efficiently manufactured.
本組成物(1)は、本組成物(1)中のFパウダーの分散及び結着樹脂との相互作用を促し、層(塗膜)の形成性を向上させる観点から、さらに界面活性剤を含むのが好ましい。なお、界面活性剤は、Fポリマーとも結着樹脂とも異なる成分(化合物)である。
界面活性剤は、親水部位と疎水部位とを有するノニオン性の界面活性剤が好ましい。
親水部位は、ノニオン性の官能基(アルコール性水酸基、ポリオキシアルキレン基等)を含む分子鎖が好ましい。
疎水部位は、親油性基(アルキル基、アセチレン基等)、ポリシロキサン基又は含フッ素基を含む分子鎖が好ましく、含フッ素基を含む分子鎖がより好ましい。
界面活性剤の好適な態様としては、ペルフルオロアルキル基又はペルフルオロアルケニル基とポリオキシアルキレン基又はアルコール性水酸基とをそれぞれ側鎖に有する界面活性剤が挙げられる。
From the viewpoint of promoting the dispersion of the F powder in the composition (1) and the interaction with the binder resin, and improving the formability of the layer (coating film), it is preferable that the composition (1) further contains a surfactant. The surfactant is a component (compound) different from both the F polymer and the binder resin.
The surfactant is preferably a nonionic surfactant having a hydrophilic portion and a hydrophobic portion.
The hydrophilic portion is preferably a molecular chain containing a nonionic functional group (an alcoholic hydroxyl group, a polyoxyalkylene group, etc.).
The hydrophobic portion is preferably a molecular chain containing a lipophilic group (an alkyl group, an acetylene group, etc.), a polysiloxane group, or a fluorine-containing group, and more preferably a molecular chain containing a fluorine-containing group.
A preferred embodiment of the surfactant is a surfactant having a perfluoroalkyl group or a perfluoroalkenyl group and a polyoxyalkylene group or an alcoholic hydroxyl group on the side chain.
界面活性剤は、ノニオン性であるのが好ましい。
界面活性剤の重量平均分子量は、2000~80000が好ましく、6000~20000がより好ましい。
界面活性剤のフッ素含有量は、10~60質量%が好ましく、20~50質量%がより好ましい。
界面活性剤がオキシアルキレン基を有する場合、界面活性剤のオキシアルキレン基の含有量は、10~60質量%が好ましく、20~50質量%がより好ましい。
界面活性剤がアルコール性水酸基を有する場合、界面活性剤の水酸基価は、10~300mgKOH/gが好ましい。
The surfactant is preferably nonionic.
The weight average molecular weight of the surfactant is preferably from 2,000 to 80,000, and more preferably from 6,000 to 20,000.
The fluorine content of the surfactant is preferably from 10 to 60% by mass, more preferably from 20 to 50% by mass.
When the surfactant has an oxyalkylene group, the content of the oxyalkylene group in the surfactant is preferably from 10 to 60% by mass, and more preferably from 20 to 50% by mass.
When the surfactant has an alcoholic hydroxyl group, the hydroxyl value of the surfactant is preferably from 10 to 300 mgKOH/g.
上記ペルフルオロアルキル基又はペルフルオロアルケニル基の炭素数は、4~16が好ましい。また、ペルフルオロアルキル基又はペルフルオロアルケニル基の炭素原子-炭素原子間には、エーテル性酸素原子が挿入されていてもよい。
上記ポリオキシアルキレン基は、1種のポリオキシアルキレン基から構成されていてもよく、2種以上のポリオキシアルキレン基から構成されていてもよい。後者の場合、種類の違うポリオキシアルキレン基は、ランダム状に配置されていてもよく、ブロック状に配置されていてもよい。
ポリオキシアルキレン基は、ポリオキシエチレン基又はポリオキシプロピレン基が好ましく、ポリオキシエチレン基がより好ましい。
界面活性剤の好適な具体例としては、ペルフルオロアルキル基又はペルフルオロアルケニル基を有する(メタ)アクリレートと、ポリオキシアルキレン基又はアルコール性水酸基を有する(メタ)アクリレートとのコポリマーが挙げられる。
The number of carbon atoms in the perfluoroalkyl group or perfluoroalkenyl group is preferably from 4 to 16. In addition, an ether oxygen atom may be inserted between carbon atoms in the perfluoroalkyl group or perfluoroalkenyl group.
The polyoxyalkylene group may be composed of one type of polyoxyalkylene group or two or more types of polyoxyalkylene groups, in which case the different types of polyoxyalkylene groups may be arranged randomly or in blocks.
The polyoxyalkylene group is preferably a polyoxyethylene group or a polyoxypropylene group, and more preferably a polyoxyethylene group.
Specific preferred examples of the surfactant include copolymers of a (meth)acrylate having a perfluoroalkyl group or a perfluoroalkenyl group and a (meth)acrylate having a polyoxyalkylene group or an alcoholic hydroxyl group.
前者の(メタ)アクリレートの具体例としては、CH2=C(CH3)C(O)OCH2CH2(CF2)4F、CH2=CHC(O)OCH2CH2(CF2)6F、CH2=C(CH3)C(O)OCH2CH2(CF2)6F、CH2=CHC(O)OCH2CH2OCF(CF3)C(=C(CF3)2)(CF(CF3)2)、CH2=C(CH3)C(O)OCH2CH2OCF(CF3)C(=C(CF3)2)(CF(CF3)2)、CH2=CHC(O)OCH2CH2CH2CH2OCF(CF3)C(=C(CF3)2)(CF(CF3)2)、CH2=C(CH3)C(O)OCH2CH2CH2CH2OCF(CF3)C(=C(CF3)2)(CF(CF3)2)、CH2=C(CH3)C(O)CH2CF2(OCF2)f1・(OCF2CF2)f2OCF3が挙げられる(ただし、式中のf1とf2とは、それぞれ自然数であり、その和は20である。)。 Specific examples of the former (meth)acrylate include CH2 =C( CH3 )C(O) OCH2CH2 ( CF2 ) 4F , CH2 =CHC(O) OCH2CH2 ( CF2 ) 6F , CH2 =C ( CH3 )C(O ) OCH2CH2 (CF2) 6F , CH2 =CHC(O) OCH2CH2OCF ( CF3 )C(=C( CF3 ) 2 )(CF( CF3 ) 2 ) , CH2 =C( CH3 ) C(O)OCH2CH2OCF( CF3 )C(=C( CF3 ) 2 )(CF( CF3 ) 2 ), CH2 =CHC(O) OCH 2CH2CH2CH2OCF ( CF3 )C(=C( CF3 ) 2 )(CF( CF3 ) 2 ) , CH2 =C ( CH3 )C(O)OCH2CH2CH2CH2OCF( CF3 )C(=C( CF3 ) 2 ) ( CF ( CF3 ) 2 ), CH2 =C( CH3 )C(O ) CH2CF2 ( OCF2 ) f1 . ( OCF2CF2 ) f2OCF3 (where f1 and f2 in the formula are natural numbers and the sum is 20 ).
後者の(メタ)アクリレートの具体例としては、CH2=C(CH3)C(O)OCH2CH2OH、CH2=C(CH3)C(O)OCH2CH2CH2CH2OH、CH2=C(CH3)C(O)(OCH2CH2)4OH、CH2=C(CH3)C(O)(OCH2CH2)9OH、CH2=C(CH3)C(O)(OCH2CH2)23OH、CH2=C(CH3)C(O)(OCH2CH2)9OCH3、CH2=C(CH3)C(O)(OCH2CH2)23OCH3、CH2=C(CH3)C(O)(OCH2CH2)66OCH3、CH2=C(CH3)C(O)(OCH2CH2)120OCH3が挙げられる。
界面活性剤の具体例としては、「フタージェント」シリーズ(ネオス社製)、「サーフロン」シリーズ(AGCセイミケミカル社製)、「メガファック」シリーズ(DIC社製)、「ユニダイン」シリーズ(ダイキン工業社製)が挙げられる。
Specific examples of the latter (meth)acrylate include CH2 =C( CH3 ) C (O)OCH2CH2OH, CH2 =C(CH3)C(O) OCH2CH2CH2CH2OH , CH2 =C ( CH3 ) C (O)( OCH2CH2 ) 4OH , CH2 =C( CH3 ) C(O ) ( OCH2CH2 ) 9OH , CH2 = C ( CH3 ) C(O ) ( OCH2CH2 ) 23OH , CH2 =C( CH3 )C ( O)( OCH2CH2 ) 9OCH3 , CH2 =C ( CH3 )C ( O )(OCH2CH2) 23 ... Examples include ═C( CH3 )C(O)( OCH2CH2 ) 66OCH3 and CH2═C ( CH3 )C(O)( OCH2CH2 ) 120OCH3 .
Specific examples of surfactants include the "Ftergent" series (manufactured by Neos), the "Surflon" series (manufactured by AGC Seimi Chemical Co., Ltd.), the "Megafac" series (manufactured by DIC Corporation), and the "Unidyne" series (manufactured by Daikin Industries, Ltd.).
本組成物(1)は、本発明の効果を損なわない範囲で、チキソ性付与剤、消泡剤、シランカップリング剤、脱水剤、可塑剤、耐候剤、酸化防止剤、熱安定剤、滑剤、帯電防止剤、増白剤、着色剤、導電剤、離型剤、表面処理剤、粘度調節剤、難燃剤を含んでいてもよい。
本組成物(1)の25℃における粘度は、10000mPa・s以下が好ましく、50~5000mPa・sがより好ましく、100~1000mPa・sがさらに好ましい。この場合、本組成物(1)が液物性(分散性及び塗工性)と、異種の材料との相溶性とに優れやすい。
本組成物(1)のチキソ比は、1~2.5が好ましく、1.2~2がより好ましい。この場合、本組成物(1)の液物性に優れるだけでなく、層(塗膜)の均質性がより向上しやすい。
The composition (1) may contain a thixotropy imparting agent, an antifoaming agent, a silane coupling agent, a dehydrating agent, a plasticizer, a weathering agent, an antioxidant, a heat stabilizer, a lubricant, an antistatic agent, a brightening agent, a colorant, a conductive agent, a release agent, a surface treatment agent, a viscosity adjusting agent, or a flame retardant, as long as the effects of the present invention are not impaired.
The viscosity of the present composition (1) at 25° C. is preferably 10,000 mPa·s or less, more preferably 50 to 5,000 mPa·s, and even more preferably 100 to 1,000 mPa·s. In this case, the present composition (1) tends to have excellent liquid properties (dispersibility and coatability) and compatibility with different materials.
The thixotropy ratio of the present composition (1) is preferably from 1 to 2.5, and more preferably from 1.2 to 2. In this case, not only is the present composition (1) excellent in liquid physical properties, but the homogeneity of the layer (coating film) is also likely to be improved.
本組成物(1)中のFポリマーの含有量(割合)は、5~60質量%が好ましく、15~50質量%がより好ましく、30~45質量%がさらに好ましい。この範囲において、電気特性と基材密着性とに優れた層(塗膜)を形成しやすい。
本組成物(1)中の結着樹脂の含有量(割合)は、1質量%以下が好ましく、0.5質量%以下がより好ましい。上記含有量は、0.01質量%以上が好ましい。
本組成物(1)における、Fポリマーの含有量に対する結着樹脂の含有量の質量比は、0.05以下が好ましく、0.02以下がより好ましく、0.01以下がさらに好ましい。上記比は、0.001以上が好ましい。結着樹脂の含有量とFポリマーの含有量とが、かかる範囲にある場合、層(物性)におけるFポリマーが有する元来の物性を損なわずに、本組成物(1)の分散性をより向上させやすい。
本組成物(1)が界面活性剤を含む場合、本組成物(1)中の界面活性剤の含有量(割合)は、1~15質量%が好ましく、3~10質量%がより好ましい。また、この場合、Fポリマーの含有量に対する界面活性剤の含有量の質量比は、0.01~0.25が好ましく、0.05~0.15がより好ましい。この範囲において、層(塗膜)の物性をより向上させやすい。
The content (proportion) of the F polymer in the composition (1) is preferably 5 to 60% by mass, more preferably 15 to 50% by mass, and even more preferably 30 to 45% by mass. Within this range, a layer (coating film) having excellent electrical properties and substrate adhesion is easily formed.
The content (proportion) of the binder resin in the composition (1) is preferably 1% by mass or less, more preferably 0.5% by mass or less, and is preferably 0.01% by mass or more.
In the present composition (1), the mass ratio of the binder resin content to the F polymer content is preferably 0.05 or less, more preferably 0.02 or less, and even more preferably 0.01 or less. The above ratio is preferably 0.001 or more. When the binder resin content and the F polymer content are within this range, the dispersibility of the present composition (1) is more easily improved without impairing the original physical properties of the F polymer in the layer (physical properties).
When the present composition (1) contains a surfactant, the content (ratio) of the surfactant in the present composition (1) is preferably 1 to 15 mass%, more preferably 3 to 10 mass%. In this case, the mass ratio of the content of the surfactant to the content of the F polymer is preferably 0.01 to 0.25, more preferably 0.05 to 0.15. In this range, the physical properties of the layer (coating film) are more likely to be improved.
本組成物(1)は、基材の表面にFポリマーを含む層(塗膜)を形成するコーティング剤として有用である。
基材の材質は、特に限定されず、ガラス又は金属が好ましい。
基材の形状は、特に限定されず、板状、球状、繊維状等のいずれの形状でもよい。
形成する層(塗膜)の厚さは、特に限定されず、0.1~1000μmが好ましい。
本組成物(1)を用いれば、基材の材質及び形状、層(塗膜)の厚さ等によらず、密着性に優れ、Fポリマーが有する元来の物性が充分に発現する、層、塗膜、成形品が得られる。
The composition (1) is useful as a coating agent for forming a layer (coating film) containing an F polymer on the surface of a substrate.
The material of the substrate is not particularly limited, but glass or metal is preferable.
The shape of the substrate is not particularly limited, and may be any shape such as a plate, a sphere, or a fiber.
The thickness of the layer (coating film) to be formed is not particularly limited, but is preferably 0.1 to 1000 μm.
By using the present composition (1), it is possible to obtain a layer, coating film, or molded product that has excellent adhesion and fully exhibits the inherent physical properties of the F polymer, regardless of the material and shape of the substrate, the thickness of the layer (coating film), etc.
本組成物(1)は、フィルム、含浸物(プリプレグ等)、積層板(ポリマー層付金属箔等の金属積層板)等の成形品の製造や、離型性、電気特性、撥水撥油性、耐薬品性、耐候性、耐熱性、滑り性、耐摩耗性等が要求される用途の成形品の製造に使用できる。
また、得られる成形品は、アンテナ部品、プリント基板、航空機用部品、自動車用部品、スポーツ用具、食品工業用品、塗料、化粧品等として有用であり、具体的には、電線被覆材(航空機用電線等)、電気絶縁性テープ、石油掘削用絶縁テープ、プリント基板用材料、分離膜(精密濾過膜、限外濾過膜、逆浸透膜、イオン交換膜、透析膜、気体分離膜等)、電極バインダー(リチウム二次電池用、燃料電池用等)、コピーロール、家具、自動車ダッシュボート、家電製品のカバー、摺動部材(荷重軸受、すべり軸、バルブ、ベアリング、歯車、カム、ベルトコンベア、食品搬送用ベルト等)、工具(シャベル、やすり、きり、のこぎり等)、ボイラー、ホッパー、パイプ、オーブン、焼き型、シュート、ダイス、便器、コンテナ被覆材として有用である。
The present composition (1) can be used for producing molded articles such as films, impregnated articles (prepregs, etc.), and laminates (metal laminates such as polymer-layered metal foils), as well as for producing molded articles for applications requiring releasability, electrical properties, water and oil repellency, chemical resistance, weather resistance, heat resistance, slipperiness, abrasion resistance, etc.
The obtained molded products are useful as antenna parts, printed circuit boards, aircraft parts, automobile parts, sports equipment, food industry products, paints, cosmetics, etc., and specifically, are useful as electric wire covering materials (aircraft electric wires, etc.), electrical insulating tapes, insulating tapes for oil drilling, materials for printed circuit boards, separation membranes (microfiltration membranes, ultrafiltration membranes, reverse osmosis membranes, ion exchange membranes, dialysis membranes, gas separation membranes, etc.), electrode binders (for lithium secondary batteries, for fuel cells, etc.), copy rolls, furniture, automobile dashboards, covers for home appliances, sliding members (load bearings, sliding shafts, valves, bearings, gears, cams, belt conveyors, food transport belts, etc.), tools (shovels, files, saws, saws, etc.), boilers, hoppers, pipes, ovens, baking molds, chutes, dies, toilets, and container covering materials.
本組成物(1)を、表面の十点平均粗さが0.5μm以下の金属箔(以下、「金属箔F」とも記す。)の表面に塗布し、260℃以上の温度に加熱し、金属箔Fの表面にFポリマーを含むポリマー層(以下、「F層」とも記す。)を形成すると、金属箔FとF層とをこの順に有するポリマー層付金属箔を製造できる。
かかるポリマー層付金属箔は、金属箔FとF層との密着性が高く、さらに、それを加工する際の加熱(例えば、ポリマー層付金属箔を加工する際の半田リフロー工程における加熱)において、剥がれ、膨れ及び反りの発生が高度に抑制される。その理由は、必ずしも明確ではないが、以下の様に考えられる。
This composition (1) is applied to the surface of a metal foil (hereinafter also referred to as "metal foil F") having a ten-point average roughness of 0.5 μm or less, and heated to a temperature of 260° C. or higher to form a polymer layer (hereinafter also referred to as "F layer") containing an F polymer on the surface of the metal foil F, thereby producing a metal foil with a polymer layer having the metal foil F and the F layer in this order.
In such a polymer layer-attached metal foil, the metal foil F and the F layer have high adhesion, and further, peeling, swelling, and warping are highly suppressed when heated during processing (for example, heating in a solder reflow process during processing of the polymer layer-attached metal foil). The reason for this is not necessarily clear, but is thought to be as follows.
本組成物(1)は、Fポリマーを焼成する高温領域における重量減少率が所定の低い範囲にある結着樹脂を含む。その結果、焼成の際に生じる可能性がある結着樹脂の分解に伴う残渣や結着樹脂の反応に伴う副生物によるF層の界面荒れが抑制され、表面平滑性が高い金属箔FとF層とが高度に密着したためであると考えられる。
さらに、F層の厚さが所定の範囲にありF層の熱膨張も抑制されるため、加熱における膨れ及び反りの発生が抑制され、電気特性に優れたポリマー層付金属箔が得られたと考えられる。
The composition (1) contains a binder resin whose weight loss rate is in a predetermined low range in the high temperature region where the F polymer is baked. As a result, it is considered that the roughness of the interface of the F layer caused by residues due to the decomposition of the binder resin and by-products due to the reaction of the binder resin that may occur during baking is suppressed, and the metal foil F with high surface smoothness and the F layer are highly adhered to each other.
Furthermore, since the thickness of the F layer is within a predetermined range and the thermal expansion of the F layer is also suppressed, it is believed that the occurrence of swelling and warping due to heating is suppressed, and a metal foil with a polymer layer having excellent electrical properties is obtained.
金属箔Fの表面の十点平均粗さは、0.5μm以下であり、0.2μm以下が好ましく、0.1μm未満がより好ましい。金属箔Fの表面の十点平均粗さは、0.01μm以上が好ましい。
金属箔Fの材質としては、銅、銅合金、ステンレス鋼、ニッケル、ニッケル合金(42合金も含む。)、アルミニウム、アルミニウム合金、チタン、チタン合金等が挙げられる。
金属箔Fは、圧延銅箔又は電解銅箔が好ましい。
金属箔Fの表面は、防錆処理(クロメート等の酸化物皮膜等)がされていてもよい。また、金属箔Fの表面は、シランカップリング剤により処理されていてもよい。その際、金属箔Fの表面の全体がシランカップリング剤により処理されていてもよく、金属箔Fの表面の一部がシランカップリング剤により処理されていてもよい。
金属箔Fの厚さは、0.1~20μmが好ましく、1~20μmがより好ましく、2~5μmがさらに好ましい。
The ten-point average roughness of the surface of the metal foil F is 0.5 μm or less, preferably 0.2 μm or less, and more preferably less than 0.1 μm. The ten-point average roughness of the surface of the metal foil F is preferably 0.01 μm or more.
Examples of the material for the metal foil F include copper, copper alloys, stainless steel, nickel, nickel alloys (including alloy 42), aluminum, aluminum alloys, titanium, and titanium alloys.
The metal foil F is preferably a rolled copper foil or an electrolytic copper foil.
The surface of the metal foil F may be subjected to an anti-rust treatment (such as an oxide film of chromate). The surface of the metal foil F may also be treated with a silane coupling agent. In this case, the entire surface of the metal foil F may be treated with the silane coupling agent, or only a part of the surface of the metal foil F may be treated with the silane coupling agent.
The thickness of the metal foil F is preferably 0.1 to 20 μm, more preferably 1 to 20 μm, and even more preferably 2 to 5 μm.
また、金属箔Fとして、2層以上の金属箔を含むキャリア付金属箔を使用してもよい。キャリア付金属箔としては、キャリア銅箔(厚さ:10~35μm)と、剥離層を介してキャリア銅箔上に積層された極薄銅箔(厚さ:2~5μm)とからなるキャリア付銅箔が挙げられる。かかるキャリア付銅箔のキャリア銅箔のみを剥離すれば、極薄銅箔を有する金属張積層体を容易に形成できる。この金属張積層体を使用すれば、MSAP(モディファイドセミアディティブ)プロセスによる、極薄銅箔層をめっきシード層として利用する、ファインパターンの形成が可能である。
上記剥離層としては、耐熱性の観点から、ニッケル又はクロムを含む金属層か、この金属層を積層した多層金属層が好ましい。かかる剥離層であれば、300℃以上の工程を経ても、キャリア銅箔を容易に極薄銅箔から剥離できる。
キャリア付金属箔の具体例としては、福田金属箔粉工業株式会社製の商品名「FUTF-5DAF-2」が挙げられる。
In addition, a carrier-attached metal foil containing two or more layers of metal foil may be used as the metal foil F. Examples of carrier-attached metal foils include carrier-attached copper foils consisting of a carrier copper foil (thickness: 10 to 35 μm) and an ultra-thin copper foil (thickness: 2 to 5 μm) laminated on the carrier copper foil via a release layer. By peeling off only the carrier copper foil of such a carrier-attached copper foil, a metal clad laminate having an ultra-thin copper foil can be easily formed. By using this metal clad laminate, it is possible to form a fine pattern by using the MSAP (modified semi-additive) process, using the ultra-thin copper foil layer as a plating seed layer.
From the viewpoint of heat resistance, the release layer is preferably a metal layer containing nickel or chromium, or a multi-layer metal layer formed by laminating such metal layers. With such a release layer, the carrier copper foil can be easily peeled off from the ultra-thin copper foil even after a process at 300° C. or higher.
A specific example of the metal foil with a carrier is "FUTF-5DAF-2" manufactured by Fukuda Metal Foil & Powder Co., Ltd.
F層は、本発明の効果を損なわない範囲において、無機フィラーや、Fポリマー及び結着樹脂以外の有機成分を含んでいてもよい。
F層の厚さは、0.1μm以上が好ましく、1μm以上がより好ましい。F層の厚さは、10μm未満が好ましく、8μm以下がより好ましく、5μm以下がさらに好ましい。F層の厚さの好適な態様としては、1~5μmが挙げられる。
かかる構成においても、本組成物(1)からは、表面平滑性が高い低粗化金属箔(金属箔F)と、Fポリマーの元来の物性(低誘電率、低誘電正接、低吸水率等)を損なわない、薄膜状のポリマー層(F層)とをこの順に有し、両者が強固に密着し、加熱における不具合が抑制されたポリマー層付金属箔が得られる。
金属箔Fの厚さに対するF層の厚さの比は、0.1~5.0が好ましく、0.2~2.5がより好ましい。かかる範囲に両者の厚さの比があれば、プリント基板としての伝送特性がさらに向上する。
The F layer may contain an inorganic filler and an organic component other than the F polymer and the binder resin, as long as the effect of the present invention is not impaired.
The thickness of the F layer is preferably 0.1 μm or more, more preferably 1 μm or more. The thickness of the F layer is preferably less than 10 μm, more preferably 8 μm or less, and even more preferably 5 μm or less. A preferred embodiment of the thickness of the F layer is 1 to 5 μm.
Even in such a configuration, the composition (1) can provide a polymer-layered metal foil having a low roughness metal foil (metal foil F) with high surface smoothness and a thin-film polymer layer (F layer) that does not impair the original physical properties of the F polymer (low dielectric constant, low dielectric tangent, low water absorption, etc.), in that order, with the two firmly adhered to each other, thereby suppressing problems during heating.
The ratio of the thickness of the F layer to the thickness of the metal foil F is preferably 0.1 to 5.0, more preferably 0.2 to 2.5. If the ratio of the thicknesses of the two is within this range, the transmission characteristics as a printed circuit board are further improved.
本組成物(1)の塗布方法は、金属箔の表面に安定した液状被膜(ウェット膜)が形成される方法であればよく、スプレー法、ロールコート法、スピンコート法、グラビアコート法、マイクログラビアコート法、グラビアオフセット法、ナイフコート法、キスコート法、バーコート法、ダイコート法、ファウンテンメイヤーバー法、スロットダイコート法、コンマコート法が挙げられる。
本組成物(1)の塗布後、260℃以上の温度に加熱する前に、上記温度未満の温度に加熱して、ウェット膜中の液状分散媒を除去するのが好ましい。この際の加熱温度は、液状分散媒の沸点に応じて設定すればよく、90~250℃が好ましく、100~200℃がより好ましい。また、この際の加熱は、1段階で実施してもよく、異なる温度にて2段階以上で実施してもよい。さらに、この際の加熱時間は、0.1~10分間が好ましく、0.5~5分間がより好ましい。
The method for applying the composition (1) may be any method that can form a stable liquid coating (wet film) on the surface of the metal foil, and examples of such methods include spraying, roll coating, spin coating, gravure coating, microgravure coating, gravure offset, knife coating, kiss coating, bar coating, die coating, fountain-meyer bar, slot die coating, and comma coating.
After application of the composition (1), it is preferable to heat the composition to a temperature lower than the above temperature before heating to a temperature of 260° C. or higher to remove the liquid dispersion medium in the wet film. The heating temperature may be set according to the boiling point of the liquid dispersion medium, and is preferably 90 to 250° C., more preferably 100 to 200° C. In addition, the heating may be performed in one step, or in two or more steps at different temperatures. Furthermore, the heating time in this case is preferably 0.1 to 10 minutes, more preferably 0.5 to 5 minutes.
本組成物(1)の塗布後に加える260℃以上の温度は、Fポリマーが焼成する温度が好ましい。この際の温度は、Fポリマーの種類に応じて設定すればよく、300~400℃が好ましく、310~390℃がより好ましく、320~380℃がさらに好ましい。また、この際の加熱は、1段階で実施してもよく、異なる温度にて2段階以上で実施してもよい。さらに、この際の加熱時間は、1~60分間が好ましく、3~20分間がより好ましい。
両者の加熱における手段としては、オーブンを用いる方法、通風乾燥炉を用いる方法、赤外線等の熱線を照射する方法が挙げられる。
両者の加熱における雰囲気は、常圧下、減圧下のいずれの状態であってよい。また、上記雰囲気は、酸化性ガス(酸素ガス等)雰囲気、還元性ガス(水素ガス等)雰囲気、不活性ガス(ヘリウムガス、ネオンガス、アルゴンガス、窒素ガス等)雰囲気のいずれであってもよく、結着樹脂の分解を抑制する観点から、不活性ガス雰囲気が好ましい。
The temperature of 260°C or more applied after application of the present composition (1) is preferably a temperature at which the F polymer is baked. The temperature at this time may be set according to the type of F polymer, and is preferably 300 to 400°C, more preferably 310 to 390°C, and even more preferably 320 to 380°C. Furthermore, the heating at this time may be performed in one stage, or in two or more stages at different temperatures. Furthermore, the heating time at this time is preferably 1 to 60 minutes, more preferably 3 to 20 minutes.
The means for heating the two include a method using an oven, a method using a ventilated drying furnace, and a method using heat rays such as infrared rays.
The atmosphere in which the two are heated may be either under normal pressure or under reduced pressure. The atmosphere may be any of an oxidizing gas (oxygen gas, etc.), a reducing gas (hydrogen gas, etc.), and an inert gas (helium gas, neon gas, argon gas, nitrogen gas, etc.), and is preferably an inert gas atmosphere from the viewpoint of suppressing decomposition of the binder resin.
ポリマー層付金属箔の製造方法の好適な態様としては、Fポリマーが熱溶融性のFポリマーであり、結着樹脂がFポリマーの溶融温度以下のガラス転移点の結着樹脂である本組成物(1)を用い、Fポリマーを上記溶融温度以上にて焼成させる態様が挙げられる。かかる態様においては、Fポリマーが溶融し、結着樹脂が軟化し、両者が高度に相互流動した状態を経てF層が形成されやすい。その結果、形成されるポリマー層付金属箔のF層において、それぞれのポリマー物性が顕著に発現しやすい。例えば、結着樹脂が芳香族ポリマー(芳香族ポリイミド等)であれば、接着性と耐熱性とに優れるだけでなく、F層のUV吸収性も向上しやすい。また、Fポリマーが、TFE単位及びPAVE単位を有するFポリマー(PFA)、特に、TFE単位、PAVE単位及び官能基を有するFポリマーであれば、電気特性がより向上しやすい。かかる好適なポリマー層付金属箔の製造方法の態様によれば、高周波信号の伝送に適したプリント基板を効率よく製造できる。A preferred embodiment of the method for producing a metal foil with a polymer layer is to use the composition (1) in which the F polymer is a thermally fusible F polymer and the binder resin is a binder resin with a glass transition point below the melting temperature of the F polymer, and to bake the F polymer at a temperature equal to or higher than the melting temperature. In this embodiment, the F polymer melts, the binder resin softens, and the F layer is easily formed through a state in which the two are highly mutually fluidized. As a result, the physical properties of each polymer are easily manifested in the F layer of the formed metal foil with a polymer layer. For example, if the binder resin is an aromatic polymer (such as an aromatic polyimide), not only is the adhesiveness and heat resistance excellent, but the UV absorption of the F layer is also easily improved. In addition, if the F polymer is an F polymer (PFA) having TFE units and PAVE units, especially an F polymer having TFE units, PAVE units, and functional groups, the electrical properties are more easily improved. According to this preferred embodiment of the method for producing a metal foil with a polymer layer, a printed circuit board suitable for transmitting high-frequency signals can be efficiently produced.
ポリマー層付金属箔のF層の最表面は、その熱膨張性や接着性を一層向上させるために、表面処理してもよい。
表面処理の方法としては、アニール処理、コロナ処理、プラズマ処理、オゾン処理、エキシマ処理、シランカップリング処理が挙げられる。
アニール処理における条件は、温度を120~180℃とし、圧力を0.005~0.015MPaとし、時間を30~120分間とするのが好ましい。
プラズマ処理におけるプラズマ照射装置としては、高周波誘導方式、容量結合型電極方式、コロナ放電電極-プラズマジェット方式、平行平板型、リモートプラズマ型、大気圧プラズマ型、ICP型高密度プラズマ型が使用できる。
プラズマ処理に用いるガスとしては、酸素ガス、窒素ガス、希ガス(アルゴン等)、水素ガス、アンモニアガス、酢酸ビニルが挙げられる。これらのガスは、1種を単独で使用してもよく、2種以上を併用して混合ガスとしてもよい。
The outermost surface of the F layer of the polymer layer-coated metal foil may be subjected to a surface treatment in order to further improve its thermal expansion properties and adhesiveness.
Examples of the surface treatment method include annealing treatment, corona treatment, plasma treatment, ozone treatment, excimer treatment, and silane coupling treatment.
The conditions for the annealing treatment are preferably a temperature of 120 to 180° C., a pressure of 0.005 to 0.015 MPa, and a time of 30 to 120 minutes.
As a plasma irradiation device for the plasma treatment, a high frequency induction type, a capacitively coupled electrode type, a corona discharge electrode-plasma jet type, a parallel plate type, a remote plasma type, an atmospheric pressure plasma type, or an ICP type high density plasma type can be used.
Examples of gases used in the plasma treatment include oxygen gas, nitrogen gas, rare gas (such as argon), hydrogen gas, ammonia gas, and vinyl acetate. These gases may be used alone or in combination of two or more to form a mixed gas.
ポリマー層付金属箔のF層の最表面には、さらに他の基板を積層してもよい。
他の基板としては、耐熱性樹脂フィルム、繊維強化樹脂板の前駆体であるプリプレグ、耐熱性樹脂フィルム層を有する積層体、プリプレグ層を有する積層体が挙げられる。
なお、プリプレグは、強化繊維(ガラス繊維、炭素繊維等)の基材(トウ、織布等)に熱硬化性樹脂又は熱可塑性樹脂を含浸させたシート状の基板である。
耐熱性樹脂フィルムは、耐熱性樹脂の1種以上を含むフィルムであり、単層フィルムであっても多層フィルムであってもよい。
耐熱性樹脂としては、ポリイミド、ポリアリレート、ポリスルホン、ポリアリールスルホン、芳香族ポリアミド、芳香族ポリエーテルアミド、ポリフェニレンスルフィド、ポリアリールエーテルケトン、ポリアミドイミド、液晶性ポリエステル、液晶性ポリエステルアミドが挙げられる。
On the outermost surface of the F layer of the polymer layer-coated metal foil, another substrate may be further laminated.
Other substrates include a heat-resistant resin film, a prepreg which is a precursor of a fiber-reinforced resin plate, a laminate having a heat-resistant resin film layer, and a laminate having a prepreg layer.
Note that a prepreg is a sheet-like substrate in which a base material (tow, woven fabric, etc.) of reinforcing fibers (glass fibers, carbon fibers, etc.) is impregnated with a thermosetting resin or a thermoplastic resin.
The heat-resistant resin film is a film containing one or more types of heat-resistant resin, and may be a single-layer film or a multi-layer film.
Examples of the heat-resistant resin include polyimide, polyarylate, polysulfone, polyarylsulfone, aromatic polyamide, aromatic polyetheramide, polyphenylene sulfide, polyaryletherketone, polyamideimide, liquid crystalline polyester, and liquid crystalline polyesteramide.
接合の方法としては、積層体と他の基板とを熱プレスする方法が挙げられる。
他の基板がプリプレグである場合の熱プレスの条件は、温度を120~300℃とし、雰囲気の圧力を20kPa以下の減圧(真空)とし、プレス圧力を0.2~10MPaとするのが好ましい。他の基板が耐熱性樹脂フィルムである場合の熱プレスの条件は、この内の温度を310~400℃とするのが好ましい。
本組成物(1)から形成するポリマー層付金属箔は、上述した通り、電気特性、耐薬品性(エッチング耐性)、耐熱性等の物性に優れた、薄膜状のF層と、低粗化金属箔とを有する。かかるポリマー層付金属箔は、フレキシブル金属張積層板やリジッド金属張積層板としてプリント基板の製造に使用でき、特に、フレキシブル金属張積層板としてフレキシブルプリント基板の製造に好適に使用できる。
The bonding method may be a method of hot pressing the laminate and another substrate.
When the other substrate is a prepreg, the heat pressing conditions are preferably a temperature of 120 to 300° C., a reduced atmospheric pressure (vacuum) of 20 kPa or less, and a pressing pressure of 0.2 to 10 MPa. When the other substrate is a heat-resistant resin film, the heat pressing conditions are preferably a temperature of 310 to 400° C.
The polymer layer-attached metal foil formed from the composition (1) has a thin-film F layer and a low-roughening metal foil, which are excellent in physical properties such as electrical properties, chemical resistance (etching resistance), and heat resistance, as described above. Such a polymer layer-attached metal foil can be used as a flexible metal-clad laminate or a rigid metal-clad laminate for the manufacture of a printed circuit board, and can be particularly suitably used as a flexible metal-clad laminate for the manufacture of a flexible printed circuit board.
ポリマー層付金属箔の金属箔Fをエッチング加工し、伝送回路を形成すると、プリント基板が得られる。具体的には、金属箔Fをエッチング処理して所定の伝送回路に加工する方法や、金属箔Fを電解めっき法(セミアディティブ法(SAP法)、モディファイドセミアディティブ法(MSAP法)等)によって所定の伝送回路に加工する方法によって、上記製造方法により得られたポリマー層付金属箔からプリント基板を製造できる。
本組成物(1)から形成したポリマー層付金属箔から製造されたプリント基板は、金属箔Fから形成された伝送回路とF層とをこの順に有する。プリント基板の構成の具体例としては、伝送回路/F層/プリプレグ層、伝送回路/F層/プリプレグ層/F層/伝送回路が挙げられる。
プリント基板の製造においては、伝送回路上に層間絶縁膜を形成してもよく、伝送回路上にソルダーレジストを積層してもよく、伝送回路上にカバーレイフィルムを積層してもよい。これらの層間絶縁膜、ソルダーレジスト及びカバーレイフィルムの材料として、本組成物(1)を使用してもよい。
A printed circuit board is obtained by etching the metal foil F of the polymer layer-attached metal foil to form a transmission circuit. Specifically, a printed circuit board can be manufactured from the polymer layer-attached metal foil obtained by the above-mentioned manufacturing method by a method of processing the metal foil F into a predetermined transmission circuit by etching the metal foil F or a method of processing the metal foil F into a predetermined transmission circuit by electrolytic plating (semi-additive method (SAP method), modified semi-additive method (MSAP method), etc.).
A printed circuit board produced from a polymer layer-coated metal foil formed from the composition (1) has a transmission circuit and an F layer, in this order, formed from metal foil F. Specific examples of the configuration of the printed circuit board include transmission circuit/F layer/prepreg layer and transmission circuit/F layer/prepreg layer/F layer/transmission circuit.
In the manufacture of a printed circuit board, an interlayer insulating film may be formed on a transmission circuit, a solder resist may be laminated on the transmission circuit, or a coverlay film may be laminated on the transmission circuit. The composition (1) may be used as a material for these interlayer insulating films, solder resists, and coverlay films.
ポリマー層付金属箔から製造されるプリント基板の具体的な態様としては、本発明により得られたプリント基板を多層化した多層プリント回路基板が挙げられる。
多層プリント回路基板の好適な態様としては、多層プリント回路基板の最外層がF層であり、金属箔F又は伝送回路とF層とプリプレグ層とがこの順に積層された構成を1以上有する態様が挙げられる。なお、上記構成の数は複数(2以上)が好ましい。また、F層とプリプレグ層との間に、伝送回路がさらに配置されていてもよい。
かかる態様の多層プリント回路基板は、最外層のF層により、耐熱加工性に特に優れている。具体的には、288℃においても、F層とプリプレグ層との界面膨れや、金属箔F(伝送回路)とF層との界面剥離が発生しにくい。特に、金属箔Fが伝送回路を形成している場合でも、F層が薄膜状であり金属箔(伝送回路)と強固に密着しているため、反りが発生しにくく耐熱加工性に優れている。
A specific embodiment of the printed circuit board produced from the polymer-layered metal foil is a multilayer printed circuit board obtained by multilayering the printed circuit boards obtained by the present invention.
A preferred embodiment of the multilayer printed circuit board is one in which the outermost layer of the multilayer printed circuit board is an F layer, and the multilayer printed circuit board has one or more structures in which a metal foil F or a transmission circuit, an F layer, and a prepreg layer are laminated in this order. The number of the above structures is preferably two or more. A transmission circuit may be further disposed between the F layer and the prepreg layer.
The multilayer printed circuit board of this embodiment has particularly excellent heat resistance and processability due to the outermost F layer. Specifically, even at 288° C., there is little interfacial swelling between the F layer and the prepreg layer, and little interfacial peeling between the metal foil F (transmission circuit) and the F layer. In particular, even when the metal foil F forms a transmission circuit, the F layer is thin and tightly adheres to the metal foil (transmission circuit), so warping is unlikely to occur and the heat resistance and processability are excellent.
多層プリント回路基板の好適な態様としては、多層プリント回路基板の最外層がプリプレグ層であり、金属箔F又は伝送回路とF層とプリプレグ層とがこの順に積層された構成を1以上有する態様も挙げられる。なお、上記構成の数は複数(2以上)が好ましい。また、F層とプリプレグ層との間に、伝送回路がさらに配置されていてもよい。
かかる態様の多層プリント回路基板は、最外層にプリプレグ層を有していても、耐熱加工性に優れている。具体的には、300℃においても、F層とプリプレグ層との界面膨れや金属箔F(伝送回路)とF層との界面剥離が発生しにくい。特に、金属箔Fが伝送回路を形成している場合でも、F層が薄膜状であり金属箔(伝送回路)と強固に密着しているため、反りが発生しにくく耐熱加工性に優れている。
つまり、本組成物(1)を使用すれば、各種表面処理を施さずとも、それぞれの界面が強固に密着し、加熱における界面膨れや界面剥離の発生、特に、最外層における膨れや剥離の発生が抑制された、種々の構成を有するプリント基板が容易に得られる。
A preferred embodiment of the multilayer printed circuit board is one in which the outermost layer of the multilayer printed circuit board is a prepreg layer, and the multilayer printed circuit board has one or more structures in which a metal foil F or a transmission circuit, an F layer, and a prepreg layer are laminated in this order. The number of the above structures is preferably two or more. A transmission circuit may be further disposed between the F layer and the prepreg layer.
The multilayer printed circuit board of this embodiment has excellent heat resistance and processability even if it has a prepreg layer as the outermost layer. Specifically, even at 300° C., the F layer and the prepreg layer do not easily bulge at the interface, and the metal foil F (transmission circuit) and the F layer do not easily peel off at the interface. In particular, even if the metal foil F forms a transmission circuit, the F layer is thin and is firmly attached to the metal foil (transmission circuit), so that the F layer is unlikely to warp and has excellent heat resistance and processability.
In other words, by using the composition (1), it is possible to easily obtain printed circuit boards having various configurations in which the respective interfaces are firmly adhered to each other without the need for various surface treatments, and in which the occurrence of interfacial blistering or interfacial peeling due to heating, particularly blistering or peeling in the outermost layer, is suppressed.
本組成物の第2の態様(以下、本組成物(2)とも記す。)としては、Fパウダーと、イミド化率が1%以上の芳香族ポリイミドと、非プロトン性極性液状分散媒とを含む、態様が挙げられる。
本組成物(2)は、Fパウダーの分散性に優れる。その理由は必ずしも明確ではないが、以下のように考えられる。
A second embodiment of the present composition (hereinafter also referred to as the present composition (2)) includes an embodiment containing F powder, an aromatic polyimide having an imidization rate of 1% or more, and an aprotic polar liquid dispersion medium.
Composition (2) has excellent dispersibility of F powder. The reason for this is not entirely clear, but is thought to be as follows.
本組成物(2)における芳香族ポリイミドは、実質的にイミド化が進行していないポリイミド前駆体であるポリアミック酸(イミド化率:0%)ではなく、ポリマーを構成するカルボン酸二無水物とジアミンとのイミド化反応が所定の割合で進行したポリイミド(イミド化率:1%以上;以下、「PI(2)」とも記す。)である。
かかるポリイミドでは、イミド化反応に伴ってイミド基が形成(閉環)されるため、その極性(解離性プロトン)が低下している。かかるポリイミドは、液状分散媒中での溶解性(又は分散性)が低下する傾向にある一方、Fポリマーとの親和性が上昇する傾向にあると考えられる。
The aromatic polyimide in composition (2) is not a polyamic acid (imidization rate: 0%), which is a polyimide precursor in which imidization has not progressed substantially, but a polyimide in which the imidization reaction between the carboxylic acid dianhydride and the diamine constituting the polymer has progressed to a predetermined ratio (imidization rate: 1% or more; hereinafter, also referred to as "PI(2)").
In such polyimides, imide groups are formed (ring closure) during the imidization reaction, and thus the polarity (dissociable protons) is reduced. It is believed that such polyimides tend to have lower solubility (or dispersibility) in a liquid dispersion medium, while their affinity with the F polymer tends to increase.
本発明者らは、鋭意検討した結果、PI(2)を使用すれば、液状分散媒中での溶解性(又は分散性)の低下効果よりも、Fポリマーとの親和性の上昇効果の方が優位になる点を知見した。PI(2)がFポリマーの分散剤として、パウダーの分散を促し、液状組成物全体での分散性を向上させたと考えられる。さらに、かかるPI(2)の含有により、液状組成物の粘度又はチキソトロピー性が保持され、それぞれの成分の沈降、凝集及び相分離が抑制されたとも考えられる。
その結果、本組成物(2)から形成される成形品(F層(塗膜)等)においては、FポリマーとPI(2)との高度な相互作用により、それぞれのポリマーの物性が高度に発現したと考えられる。例えば、上記成形品は、PI(2)を含むため、その線膨張係数が低く、よって反りが発生しにくく、密着接着性に優れている。また、PI(2)が有する芳香族環の良好なUV吸収性によりUV-YAGレーザー等による加工性にも優れる。そして、上記成形品はFポリマーを含むので、Fポリマーの物性(特に、低誘電率、低誘電正接等の電気特性)が高度に発現する。
以上のような効果は、後述する本組成物(2)の好ましい態様において、より顕著に発現する。
As a result of intensive research, the inventors have found that the use of PI (2) has an effect of increasing affinity with the F polymer, rather than a decrease in solubility (or dispersibility) in the liquid dispersion medium. It is believed that PI (2) acts as a dispersant for the F polymer, promoting the dispersion of the powder and improving the dispersibility of the entire liquid composition. Furthermore, it is believed that the inclusion of such PI (2) maintains the viscosity or thixotropy of the liquid composition, suppressing the settling, aggregation, and phase separation of each component.
As a result, in a molded article (such as an F layer (coating film)) formed from this composition (2), it is believed that the physical properties of each polymer are highly expressed due to the high level of interaction between the F polymer and PI (2). For example, since the molded article contains PI (2), it has a low linear expansion coefficient, and therefore is less likely to warp and has excellent adhesion and bonding properties. In addition, the aromatic ring in PI (2) has good UV absorption properties, so it is also excellent in processability with a UV-YAG laser or the like. And, since the molded article contains the F polymer, the physical properties of the F polymer (particularly electrical properties such as low dielectric constant and low dielectric tangent) are highly expressed.
The above-mentioned effects are more pronounced in the preferred embodiments of the present composition (2) described below.
本組成物(2)におけるFポリマー及びFパウダーの定義は、好適な態様も含めて、本組成物(1)におけるそれらと同様である。なお、本組成物(2)におけるFポリマーは、TFE単位及びPAVE単位を含む、溶融温度が260~320℃のPFAが好ましい。
本組成物(2)におけるFパウダーのD50は、20μm以下が好ましく、10μm以下がより好ましく、3μm以下がさらに好ましい。FパウダーのD50は、0.01μm以上が好ましく、0.1μm以上がより好ましく、1μm以上がさらに好ましい。
また、FパウダーのD90は、40μm以下が好ましく、10μm以下がより好ましい。この範囲のD50及びD90において、Fパウダーの流動性と分散性とが良好となり、得られる成形品の電気特性(低誘電率等)や耐熱性が最も発現しやすい。
Fパウダーの疎充填嵩密度は、0.08~0.5g/mLが好ましい。Fパウダーの密充填嵩密度は、0.1~0.8g/mLが好ましい。疎充填嵩密度又は密充填嵩密度が上記範囲にある場合、Fパウダーのハンドリング性に優れる。
The definitions of the F polymer and the F powder in the present composition (2), including preferred embodiments, are the same as those in the present composition (1). The F polymer in the present composition (2) is preferably a PFA containing TFE units and PAVE units and having a melting temperature of 260 to 320°C.
The D50 of the F powder in the composition (2) is preferably 20 μm or less, more preferably 10 μm or less, and even more preferably 3 μm or less. The D50 of the F powder is preferably 0.01 μm or more, more preferably 0.1 μm or more, and even more preferably 1 μm or more.
Furthermore, the D90 of the F powder is preferably 40 μm or less, more preferably 10 μm or less. With D50 and D90 in this range, the flowability and dispersibility of the F powder are good, and the electrical properties (low dielectric constant, etc.) and heat resistance of the resulting molded product are most easily exhibited.
The loosely packed bulk density of the F powder is preferably 0.08 to 0.5 g/mL. The densely packed bulk density of the F powder is preferably 0.1 to 0.8 g/mL. When the loosely packed bulk density or the densely packed bulk density is within the above range, the F powder has excellent handleability.
また、Fパウダーは、Fポリマー以外の成分を含んでいてもよいが、Fポリマーからなるのが好ましい。FパウダーにおけるFポリマーの含有量は、80質量%以上が好ましく、100質量%がより好ましい。
Fポリマー以外の成分としては、芳香族ポリエステル、ポリアミドイミド、熱可塑性ポリイミド、ポリフェニレンエーテル、ポリフェニレンオキシドが挙げられる。
The F powder may contain components other than the F polymer, but is preferably made of the F polymer. The content of the F polymer in the F powder is preferably 80% by mass or more, and more preferably 100% by mass.
Examples of components other than the F polymer include aromatic polyesters, polyamideimides, thermoplastic polyimides, polyphenylene ethers, and polyphenylene oxides.
本組成物(2)におけるPI(2)は、イミド化率が1%以上の芳香族ポリイミドである。
PI(2)は、カルボン酸二無水物とジアミンとに基づく単位であり、両者の化合物のイミド化反応により形成された単位(イミド構造を有する単位;以下、「イミド単位」とも記す。)を有する。カルボン酸二無水物及びジアミンの少なくとも一方、かつ、その少なくとも一部は、芳香族性の化合物である。
PI(2)は、イミド単位のみからなっていてもよく、イミド単位と上記両者の化合物のアミド化反応により形成された単位(アミック酸構造を有する単位;以下、「アミック酸単位」とも記す。)とを有していてもよい。また、カルボン酸二無水物とジアミンとは、それぞれ1種の化合物を使用してもよく、それぞれ複数の化合物を使用してもよい。カルボン酸二無水物として、少なくとも1種の芳香族カルボン酸二無水物を使用するのが好ましい。
The PI (2) in the composition (2) is an aromatic polyimide having an imidization rate of 1% or more.
PI(2) is a unit based on a carboxylic dianhydride and a diamine, and has a unit (a unit having an imide structure; hereinafter, also referred to as an "imide unit") formed by an imidization reaction between the two compounds. At least one of the carboxylic dianhydride and the diamine, and at least a part of the unit, is an aromatic compound.
PI (2) may be composed of only imide units, or may have imide units and units formed by an amidation reaction of the above-mentioned two compounds (units having an amic acid structure; hereinafter, also referred to as "amic acid units"). In addition, the carboxylic acid dianhydride and the diamine may each be one type of compound, or a plurality of compounds may each be used. As the carboxylic acid dianhydride, it is preferable to use at least one type of aromatic carboxylic acid dianhydride.
PI(2)におけるイミド化率とは、アミック酸単位とイミド単位との合計のモル数に対するイミド単位のモル数の比、すなわち、イミド単位のモル数/(アミック酸単位のモル数+イミド単位のモル数)の式で計算される値である。つまり、PI(2)がイミド単位のみからなる場合には、そのイミド化率は100%となる。
イミド化率の下限は、10%以上が好ましく、25%以上がより好ましく、50%以上がさらに好ましく、75%以上が特に好ましい。かかる下限範囲にイミド化率があれば、PI(2)の極性(解離性プロトン)がより低下して、Fポリマーの分散性をより促しやすい。
The imidization ratio in PI(2) is the ratio of the number of moles of imide units to the total number of moles of amic acid units and imide units, that is, the value calculated by the formula: number of moles of imide units/(number of moles of amic acid units+number of moles of imide units). In other words, when PI(2) is composed only of imide units, the imidization ratio is 100%.
The lower limit of the imidization rate is preferably 10% or more, more preferably 25% or more, even more preferably 50% or more, and particularly preferably 75% or more. If the imidization rate is within this lower limit range, the polarity (dissociable protons) of PI (2) is further reduced, and the dispersibility of the F polymer is more easily promoted.
イミド化率の上限は、100%未満が好ましく、98%以下がより好ましく、96%以下がさらに好ましい。かかる上限範囲にイミド化率があれば、PI(2)が、その極性(解離性プロトン)を充分に保持しつつ、各成分(液状分散媒及びFポリマー)との相互作用を促し、液状組成物の物性(粘度、チキソトロピー性等)をより向上させやすい。
なお、PI(2)のイミド化率は、その製造条件により制御できる。例えば、ディーンスターク等の脱水装置を使用し、水と共沸する液状分散媒(トルエン等)の存在下、副生する水を共沸により除去しながら、カルボン酸二無水物及びジアミンを反応させれば、任意のイミド化率のPI(2)を製造できる。
PI(2)のイミド化率は、PI(2)をNMR分析に供すれば測定できる。
The upper limit of the imidization rate is preferably less than 100%, more preferably 98% or less, and even more preferably 96% or less. If the imidization rate is within this upper limit range, PI (2) can promote interaction with each component (liquid dispersion medium and F polymer) while sufficiently maintaining its polarity (dissociable protons), and the physical properties (viscosity, thixotropy, etc.) of the liquid composition can be more easily improved.
The imidization ratio of PI (2) can be controlled by the production conditions. For example, by using a dehydration apparatus such as a Dean-Stark apparatus, a carboxylic acid dianhydride and a diamine are reacted in the presence of a liquid dispersion medium (e.g., toluene) that forms an azeotropic mixture with water while removing the by-product water, PI (2) with any imidization ratio can be produced.
The imidization rate of PI(2) can be measured by subjecting PI(2) to NMR analysis.
PI(2)は、芳香族テトラカルボン酸の酸二無水物と、2個以上のアリーレン基が連結基を介して連結された連結構造を有する芳香族ジアミン、又は、脂肪族ジアミンとに基づく単位を含むのが好ましい。かかるPI(2)は、Fポリマーとの親和性がより高まる傾向を示し、本組成物(2)の分散性をより高めるだけでなく、それから形成される成形品の密着接着性が向上しやすい。つまり、かかるPI(2)は、本組成物(2)において分散剤としても、成形品における接着成分としても機能しやすい。 PI (2) preferably contains units based on an aromatic tetracarboxylic acid dianhydride and an aromatic diamine or an aliphatic diamine having a linking structure in which two or more arylene groups are linked via a linking group. Such PI (2) tends to have a higher affinity with F polymer, and not only increases the dispersibility of the composition (2), but also tends to improve the adhesion of molded articles formed therefrom. In other words, such PI (2) tends to function both as a dispersant in the composition (2) and as an adhesive component in molded articles.
芳香族テトラカルボン酸の酸二無水物は、下式AN1~AN6で表される化合物が好ましい。
上記芳香族ジアミンにおける連結構造は、2~4個のアリーレン基が連結された構造が好ましい。この場合、PI(2)の極性がバランスして、上記傾向を一層示しやすい。
アリーレン基は、フェニレン基が好ましい。なお、アリーレン基の水素原子は、水酸基、フッ素原子又はトリフルオロメチル基で置換されていてもよい。
上記芳香族ジアミンにおける連結基は、エーテル性酸素原子、プロパン-2,2-ジイル基又はペルフルオロプロパン-2,2-ジイル基が好ましい。連結基は、1種類であってもよく、2種類以上であってもよく、エーテル性酸素原子を必須とするのがより好ましい。この場合、PI(2)は、その立体効果により、上記傾向を一層示しやすい。
The linking structure in the aromatic diamine is preferably a structure in which 2 to 4 arylene groups are linked together, in which case the polarity of PI(2) is balanced, making it easier to exhibit the above tendency.
The arylene group is preferably a phenylene group, in which a hydrogen atom may be substituted with a hydroxyl group, a fluorine atom or a trifluoromethyl group.
The linking group in the aromatic diamine is preferably an ethereal oxygen atom, a propane-2,2-diyl group, or a perfluoropropane-2,2-diyl group. The linking group may be one type or two or more types, and it is more preferable that the linking group is an ethereal oxygen atom. In this case, PI(2) is more likely to exhibit the above tendency due to its steric effect.
上記芳香族ジアミンは、下式DA1~DA6で表される化合物が好ましい。
脂肪族ジアミンとしては、ダイマージアミン、アルキレンジアミン(2-メチル-1,8-オクタンジアミン、2-メチル-1,9-ノナンジアミン、2,7-ジメチル-1,8-オクタンジアミン等)、脂環式ジアミン(1,3-ビス(アミノメチル)シクロヘキサン、1,4-ビス(アミノメチル)シクロヘキサン、1,2-ジアミノシクロヘキサン、ビス(4-アミノシクロヘキシル)メタン、2,2-ビス(4-アミノシクロヘキシル)プロパン、2,2-ビス(4-アミノシクロヘキシル)ヘキサフルオロプロパン、イソホロンジアミン、ノルボルナンジアミン等)が挙げられる。
ダイマージアミンは、不飽和脂肪酸の二量体であるダイマー酸の2個のカルボキシル基がアミノ基又はアミノメチル基に置換された化合物である。不飽和脂肪酸は、炭素数が11~22の不飽和脂肪酸(オレイン酸、リノール酸、リノレン酸等)が好ましい。
脂肪族アミンを使用すると、上記傾向を一層示しやすいだけでなく、成形品におけるFポリマー物性(特に、比誘電率、誘電正接等の電気物性)が高度に発現しやすく、その柔軟性がより向上しやすい。
Examples of aliphatic diamines include dimer diamines, alkylenediamines (2-methyl-1,8-octanediamine, 2-methyl-1,9-nonanediamine, 2,7-dimethyl-1,8-octanediamine, etc.), and alicyclic diamines (1,3-bis(aminomethyl)cyclohexane, 1,4-bis(aminomethyl)cyclohexane, 1,2-diaminocyclohexane, bis(4-aminocyclohexyl)methane, 2,2-bis(4-aminocyclohexyl)propane, 2,2-bis(4-aminocyclohexyl)hexafluoropropane, isophoronediamine, and norbornanediamine).
Dimer diamine is a compound in which two carboxyl groups of a dimer acid, which is a dimer of an unsaturated fatty acid, are substituted with amino groups or aminomethyl groups. The unsaturated fatty acid is preferably an unsaturated fatty acid having 11 to 22 carbon atoms (oleic acid, linoleic acid, linolenic acid, etc.).
When an aliphatic amine is used, not only is the above tendency more likely to be exhibited, but the F polymer properties (particularly electrical properties such as dielectric constant and dielectric loss tangent) in the molded product are more likely to be highly expressed, and the flexibility is more likely to be improved.
市販されているダイマージアミンの具体例としては、バーサミン551(BASFジャパン社製)、バーサミン552(BASFジャパン社製、バーサミン551の水添物)、PRIAMINE1075(クローダジャパン社製)、PRIAMINE1074(クローダジャパン社製)が挙げられる。 Specific examples of commercially available dimer diamines include VERSAMINE 551 (manufactured by BASF Japan), VERSAMINE 552 (manufactured by BASF Japan, a hydrogenated product of VERSAMINE 551), PRIAMINE 1075 (manufactured by Croda Japan), and PRIAMINE 1074 (manufactured by Croda Japan).
なお、PI(2)を構成する、カルボン酸二無水物として、以下に示す、脂環構造を有するカルボン酸二無水物を使用してもよい。PI(2)が含有する単位に、かかる脂環構造が含まれれば、PI(2)と液状分散媒との親和性が高まり、液状組成物全体での分散性がより向上し、液状組成物の塗布性も良好となる。また、それから形成される成形品における着色が抑制されやすい。
本組成物(2)における非プロトン性極性液状分散媒は、Fパウダーの分散媒として機能する、25℃で不活性な液状化合物である。
かかる分散媒としては、本組成物(2)に含まれる液状分散媒以外の成分よりも低沸点かつ揮発性の化合物が好ましい。かかる液状分散媒は、1種を単独で使用してもよく、2種以上を混合してもよい。
かかる液状分散媒の沸点は、125~250℃が好ましい。この場合、本組成物(2)から液状被膜を乾燥して乾燥被膜を形成する際、液状分散媒の揮発に伴う、Fパウダーの流動が効果的に進行して、Fパウダーが緻密にパッキングしやすい。
The aprotic polar liquid dispersion medium in the composition (2) is a liquid compound that is inactive at 25° C. and functions as a dispersion medium for the F powder.
The dispersion medium is preferably a compound having a lower boiling point and volatility than the components other than the liquid dispersion medium contained in the composition (2). The liquid dispersion medium may be used alone or in combination of two or more kinds.
The boiling point of such a liquid dispersion medium is preferably 125 to 250° C. In this case, when a liquid coating is formed from the present composition (2) by drying, the flow of the F powder proceeds effectively with the evaporation of the liquid dispersion medium, and the F powder is likely to be densely packed.
非プロトン性極性液状分散媒の具体例としては、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド、3-メトキシ-N,N-ジメチルプロパンアミド、3-ブトキシ-N,N-ジメチルプロパンアミド、N-メチル-2-ピロリドン、γ-ブチロラクトン、シクロヘキサノン、シクロペンタノン、酢酸ブチル、メチルイソプロピルケトン、シクロペンタノン、シクロヘキサノンが挙げられる。
中でも、非プロトン性極性液状分散媒としては、本組成物(2)の液物性(粘度、チキソ比等)を調整する観点から、アミド又はケトンが好ましく、N,N-ジメチルアセトアミド、3-メトキシ-N,N-ジメチルプロパンアミド、3-ブトキシ-N,N-ジメチルプロパンアミド、N-メチル-2-ピロリドン又はγ-ブチロラクトンがより好ましい。
Specific examples of aprotic polar liquid dispersion media include N,N-dimethylformamide, N,N-dimethylacetamide, 3-methoxy-N,N-dimethylpropanamide, 3-butoxy-N,N-dimethylpropanamide, N-methyl-2-pyrrolidone, γ-butyrolactone, cyclohexanone, cyclopentanone, butyl acetate, methyl isopropyl ketone, cyclopentanone, and cyclohexanone.
Among these, from the viewpoint of adjusting the liquid properties (viscosity, thixotropy ratio, etc.) of the present composition (2), the aprotic polar liquid dispersion medium is preferably an amide or a ketone, and more preferably N,N-dimethylacetamide, 3-methoxy-N,N-dimethylpropanamide, 3-butoxy-N,N-dimethylpropanamide, N-methyl-2-pyrrolidone, or γ-butyrolactone.
本組成物(2)は、親水部分として水酸基とオキシアルキレン基とを有する界面活性剤(以下、「界面活性剤」とも記す。)を含有するのが好ましい。これらの基を有する界面活性剤は、適度な親水性(極性)を有するため、本組成物(2)中でのパウダーの分散を促すのみならず、極性を有するPI(2)とFポリマーとの親和性を高め、本組成物(2)全体での分散性をより向上させやすい。
かかる界面活性剤としては、本組成物(1)における界面活性剤が好ましい。
The present composition (2) preferably contains a surfactant having a hydroxyl group and an oxyalkylene group as a hydrophilic portion (hereinafter, also referred to as "surfactant"). Surfactants having these groups have appropriate hydrophilicity (polarity), and therefore not only promote the dispersion of the powder in the present composition (2), but also increase the affinity between the polar PI (2) and the F polymer, and tend to further improve the dispersibility of the present composition (2) as a whole.
As such a surfactant, the surfactant in the present composition (1) is preferred.
本組成物(2)は、水を50ppm以上で含有するのが好ましい。少量の水は、本組成物(2)に含まれる各成分同士の間での親和性を高める作用が期待できる。水の含有量は、100ppm以上がより好ましい。なお、本組成物(2)における水の含有量(割合)の上限は、5000ppm以下が好ましく、1000ppm以下がより好ましい。
本組成物(2)の粘度は、10000mPa・s以下が好ましく、10~1000mPa・sがより好ましい。
本組成物(2)のチキソ比は、1~2が好ましい。
The composition (2) preferably contains water at 50 ppm or more. A small amount of water is expected to enhance the affinity between the components contained in the composition (2). The water content is more preferably 100 ppm or more. The upper limit of the water content (ratio) in the composition (2) is preferably 5000 ppm or less, more preferably 1000 ppm or less.
The viscosity of the composition (2) is preferably 10,000 mPa·s or less, and more preferably 10 to 1,000 mPa·s.
The thixotropy ratio of the present composition (2) is preferably 1-2.
本組成物(2)は、本発明の効果を損なわない範囲で、Fポリマー及びPI(2)以外のポリマー、無機フィラー、チキソ性付与剤、消泡剤、シランカップリング剤、脱水剤、可塑剤、耐候剤、酸化防止剤、熱安定剤、滑剤、帯電防止剤、増白剤、着色剤、導電剤、離型剤、表面処理剤、粘度調節剤、難燃剤等の他の成分を含んでいてもよい。This composition (2) may contain other components, such as polymers other than F polymer and PI (2), inorganic fillers, thixotropic agents, defoamers, silane coupling agents, dehydrating agents, plasticizers, weathering agents, antioxidants, heat stabilizers, lubricants, antistatic agents, brighteners, colorants, conductive agents, release agents, surface treatment agents, viscosity adjusters, and flame retardants, within the scope of the present invention.
無機フィラーは、本組成物(2)から形成される層に付与する物性に応じて決定すればよい。本組成物(2)は、PI(2)を含み、その液物性(粘度、チキソ比等)に優れ、無機フィラーを含んでも分散性に優れる。また、それから層を形成する際、無機フィラーが粉落ちしにくいだけでなく、それが均一に分布した層が形成されやすい。
無機フィラーとしては、窒化物フィラー、無機酸化物フィラーが挙げられ、窒化ホウ素フィラー、べリリア(ベリリウムの酸化物)、シリカフィラー又は金属酸化物(酸化セリウム、アルミナ、ソーダアルミナ、酸化マグネシウム、酸化亜鉛、酸化チタン等)フィラーが好ましい。
The inorganic filler may be determined according to the properties to be imparted to the layer formed from the composition (2). The composition (2) contains PI (2), has excellent liquid properties (viscosity, thixotropy ratio, etc.), and has excellent dispersibility even when it contains an inorganic filler. In addition, when a layer is formed from the composition, not only is the inorganic filler less likely to fall off, but it is also easy to form a layer in which the inorganic filler is uniformly distributed.
Examples of inorganic fillers include nitride fillers and inorganic oxide fillers, and boron nitride fillers, beryllia (beryllium oxide), silica fillers, and metal oxide (cerium oxide, alumina, soda alumina, magnesium oxide, zinc oxide, titanium oxide, etc.) fillers are preferred.
無機フィラーの形状は、粒状であってもよく、非粒状(鱗片状、層状)であってもよく、繊維状であってもよく、微細構造を有するのが好ましい。
かかる微細構造を有する無機フィラーの具体例としては、球状の無機フィラー、繊維状の無機フィラーが挙げられる。
前者の無機フィラーの平均粒子径は、0.001~3μmが好ましく、0.01~1μmがより好ましい。この場合、無機フィラーは、本組成物(2)中の分散性により優れ、層中においてより均一に分布しやすい。
後者の無機フィラーにおいて、長さは繊維長であり、径は繊維径である。繊維長は、1~10μmが好ましい。繊維径は、0.01~1μmが好ましい。
本組成物(2)が無機フィラーを含む場合、その含有量は、Fポリマーの含有量に対して1以下が好ましい。
The shape of the inorganic filler may be granular, non-granular (scale-like, layer-like), or fibrous, and it is preferable for the inorganic filler to have a fine structure.
Specific examples of inorganic fillers having such a fine structure include spherical inorganic fillers and fibrous inorganic fillers.
The average particle size of the former inorganic filler is preferably 0.001 to 3 μm, more preferably 0.01 to 1 μm, in which case the inorganic filler has better dispersibility in the present composition (2) and is more likely to be distributed uniformly in the layer.
In the latter inorganic filler, the length is the fiber length and the diameter is the fiber diameter. The fiber length is preferably 1 to 10 μm, and the fiber diameter is preferably 0.01 to 1 μm.
When the present composition (2) contains an inorganic filler, the content thereof relative to the content of the F polymer is preferably 1 or less.
無機フィラーは、その表面の少なくとも一部が、有機物、無機物(ただし、無機フィラーを形成する無機物とは異なる無機物である。)、又は、その両方によって、表面処理されていてもよい。
かかる被覆処理に用いられる有機物としては、多価アルコール(トリメチロールエタン、ペンタエリストール、プロピレングリコール等)、飽和脂肪酸(ステアリン酸、ラウリン酸等)、そのエステル、アルカノールアミン、アミン(トリメチルアミン、トリエチルアミン等)、パラフィンワックス、シランカップリング剤、シリコーン、ポリシロキサンが挙げられる。
かかる被覆処理に用いられる無機物としては、アルミニウム、ケイ素、ジルコニウム、スズ、チタニウム、アンチモン等の、酸化物、水酸化物、水和酸化物又はリン酸塩が挙げられる。
At least a portion of the surface of the inorganic filler may be surface-treated with an organic substance, an inorganic substance (however, the inorganic substance is different from the inorganic substance that forms the inorganic filler), or both.
Examples of organic substances used in such coating treatments include polyhydric alcohols (trimethylolethane, pentaerythritol, propylene glycol, etc.), saturated fatty acids (stearic acid, lauric acid, etc.), their esters, alkanolamines, amines (trimethylamine, triethylamine, etc.), paraffin wax, silane coupling agents, silicones, and polysiloxanes.
The inorganic substances used in such coating treatment include oxides, hydroxides, hydrated oxides, or phosphates of aluminum, silicon, zirconium, tin, titanium, antimony, and the like.
本組成物(2)から形成される層のUV加工性を一層向上させつつ、その反りを高度に抑制する場合、本組成物(2)は、球状の無機フィラーを含むのが好ましい。
この場合、球状の無機フィラーの平均粒子径は、Fパウダーの平均粒子径(D50)より小さいのが好ましい。具体的には、Fパウダーの平均粒子径が0.2~3μmであり、球状のシリカフィラーの平均粒子径が0.01~0.1μmであるのが好ましい。また、この場合の球状の無機フィラーの含有量は、Fポリマーの含有量に対して0.01~0.1が好ましい。かかる構成により、層の表面における無機フィラーの露出を抑制しつつ、無機フィラーが均一分散した層を容易に形成できる。
In order to further improve the UV processability of the layer formed from the present composition (2) while highly suppressing warping, the present composition (2) preferably contains a spherical inorganic filler.
In this case, the average particle size of the spherical inorganic filler is preferably smaller than the average particle size (D50) of the F powder. Specifically, the average particle size of the F powder is preferably 0.2 to 3 μm, and the average particle size of the spherical silica filler is preferably 0.01 to 0.1 μm. In addition, the content of the spherical inorganic filler in this case is preferably 0.01 to 0.1 relative to the content of the F polymer. With this configuration, it is possible to easily form a layer in which the inorganic filler is uniformly dispersed while suppressing exposure of the inorganic filler on the surface of the layer.
かかる無機フィラーの好適な具体例としては、アミノシランカップリング剤で表面処理された平均粒子径1μm以下のシリカフィラー(アドマテックス社製の「アドマファイン」シリーズ等)、ジカプリン酸プロピレングリコール等のエステルで表面処理された平均粒子径0.1μm以下の酸化亜鉛(堺化学工業株式会社製の「FINEX」シリーズ等)、平均粒子径0.5μm以下かつ最大粒子径1μm未満の球状溶融シリカ(デンカ社製のSFPグレード等)、多価アルコール及び無機物で被覆処理された平均粒子径0.5μm以下のルチル型酸化チタン(石原産業社製の「タイペーク」シリーズ等)、アルキルシランで表面処理された平均粒子径0.1μm以下のルチル型酸化チタン(テイカ社製の「JMT」シリーズ等)が挙げられる。 Specific examples of suitable inorganic fillers include silica fillers with an average particle size of 1 μm or less that have been surface-treated with an aminosilane coupling agent (such as the "Admafine" series manufactured by Admatechs Co., Ltd.), zinc oxide with an average particle size of 0.1 μm or less that has been surface-treated with an ester such as propylene glycol dicaprylate (such as the "FINEX" series manufactured by Sakai Chemical Industry Co., Ltd.), spherical fused silica with an average particle size of 0.5 μm or less and a maximum particle size of less than 1 μm (such as the SFP grade manufactured by Denka Co., Ltd.), rutile-type titanium oxide with an average particle size of 0.5 μm or less that has been coated with a polyhydric alcohol and an inorganic substance (such as the "Typeque" series manufactured by Ishihara Sangyo Co., Ltd.), and rutile-type titanium oxide with an average particle size of 0.1 μm or less that has been surface-treated with an alkylsilane (such as the "JMT" series manufactured by Teika Corporation).
本組成物(2)におけるFポリマーの含有量(割合)は、PI(2)の含有量(割合)以上であるのが好ましい。この場合、得られる成形品に対して、Fポリマーに基づく特性とPI(2)に基づく特性とを良好なバランスで付与できるだけでなく、Fポリマーの物性が高度に発現しやすい。
具体的には、本組成物(2)におけるFポリマーの含有量は、10質量%以上が好ましく、15質量%以上がより好ましく、20質量%がさらに好ましい。上記含有量は、50質量%以下が好ましく、45質量%以下がより好ましく、40質量%以下がさらに好ましい。この場合、電気特性と基材に対する密着性とに優れた成形品を形成しやすい。
The content (ratio) of the F polymer in the composition (2) is preferably equal to or greater than the content (ratio) of PI (2). In this case, the obtained molded article can be imparted with a good balance of properties based on the F polymer and properties based on PI (2), and the physical properties of the F polymer are easily expressed to a high degree.
Specifically, the content of the F polymer in the composition (2) is preferably 10% by mass or more, more preferably 15% by mass or more, and even more preferably 20% by mass. The content is preferably 50% by mass or less, more preferably 45% by mass or less, and even more preferably 40% by mass or less. In this case, it is easy to form a molded product having excellent electrical properties and adhesion to a substrate.
本組成物(2)におけるPI(2)の含有量は、0.01質量%以上が好ましく、0.1質量%以上がより好ましく、1質量%以上がさらに好ましい。上記含有量は、50質量%以下が好ましく、25質量%以下がより好ましく、10質量%以下がさらに好ましい。この場合、UV加工性がより向上した成形品を形成しやすい。
また、本組成物(2)におけるFポリマーの含有量(割合)に対するPI(2)の含有量(割合)の比は、1以下が好ましく、0.5以下より好ましく、0.1以下がさらに好ましい。
本組成物(2)における非プロトン性極性液状分散媒の含有量(割合)は、40~90質量%が好ましく、50~80質量%がより好ましい。
本組成物(2)が界面活性剤を含む場合、本組成物(2)における界面活性剤の含有量(割合)は、1~15質量%が好ましい。この場合、成形品におけるFポリマーの元来の物性がより向上しやすい。
The content of PI (2) in the composition (2) is preferably 0.01% by mass or more, more preferably 0.1% by mass or more, and even more preferably 1% by mass or more. The content is preferably 50% by mass or less, more preferably 25% by mass or less, and even more preferably 10% by mass or less. In this case, it is easy to form a molded product with improved UV processability.
The ratio of the content (proportion) of PI (2) to the content (proportion) of the F polymer in the composition (2) is preferably 1 or less, more preferably 0.5 or less, and even more preferably 0.1 or less.
The content (proportion) of the aprotic polar liquid dispersion medium in the composition (2) is preferably from 40 to 90 mass %, more preferably from 50 to 80 mass %.
When the present composition (2) contains a surfactant, the content (ratio) of the surfactant in the present composition (2) is preferably 1 to 15 mass %, in which case the inherent physical properties of the F polymer in the molded article are more likely to be improved.
本組成物(2)を、基材の表面に塗布し加熱して、Fポリマーを含むポリマー層(F層)を形成すれば、基材とF層とを、この順で有する積層体が得られる。
かかる積層体の製造において、基材の表面に本組成物(2)を塗布して液状被膜を形成し、この液状被膜を加熱して乾燥した後、さらに焼成して、F層を形成する。つまり、F層は、Fポリマーと芳香族ポリイミド(PI)とを含む層である。F層におけるPIは、本組成物(2)に含まれるPI(2)自体であってもよく、F層の形成における加熱によって、さらにイミド化反応が進行したPIであってもよい。
積層体の製造における、本組成物(2)の塗布方法及び加熱方法は、それらの好適な態様も含めて、上述した本組成物(1)のそれらと同様である。
本組成物(2)を塗布する基材としては、金属箔又は耐熱性樹脂フィルムが好ましい。
かかる金属箔の定義は、それの好適な態様と範囲も含めて、上述した本組成物(1)のそれらと同様である。
This composition (2) is applied to the surface of a substrate and heated to form a polymer layer (F layer) containing an F polymer, thereby obtaining a laminate having the substrate and the F layer in this order.
In the manufacture of such a laminate, the composition (2) is applied to the surface of the substrate to form a liquid coating, which is then heated and dried, and then baked to form an F layer. That is, the F layer is a layer containing an F polymer and an aromatic polyimide (PI). The PI in the F layer may be the PI (2) itself contained in the composition (2), or may be a PI in which the imidization reaction has progressed further by heating in the formation of the F layer.
The application method and heating method of the present composition (2) in the production of the laminate, including the preferred embodiments thereof, are the same as those for the present composition (1) described above.
The substrate to which the composition (2) is applied is preferably a metal foil or a heat-resistant resin film.
The definition of such metal foil, including its preferred embodiments and scope, is the same as that of the present composition (1) described above.
耐熱性樹脂フィルムは、耐熱性樹脂の1種以上を含むフィルムであり、単層フィルムであっても多層フィルムであってもよい。耐熱性樹脂フィルムには、ガラス繊維又は炭素繊維等が埋設されていてもよい。
基材が耐熱性樹脂フィルムである場合は、基材の両面にF層を形成するのが好ましい。この場合、F層が耐熱性樹脂フィルムの両面に形成されるため、積層体の線膨張係数が顕著に低下し、反りが生じにくい。具体的には、かかる態様における積層体の線膨張係数の絶対値は、1~25ppm/℃が好ましい。
The heat-resistant resin film is a film containing one or more types of heat-resistant resin, and may be a single-layer film or a multi-layer film. The heat-resistant resin film may have glass fibers, carbon fibers, or the like embedded therein.
When the substrate is a heat-resistant resin film, it is preferable to form an F layer on both sides of the substrate. In this case, since the F layer is formed on both sides of the heat-resistant resin film, the linear expansion coefficient of the laminate is significantly reduced, and warping is unlikely to occur. Specifically, the absolute value of the linear expansion coefficient of the laminate in this embodiment is preferably 1 to 25 ppm/°C.
耐熱性樹脂としては、ポリイミド、ポリアリレート、ポリスルホン、ポリアリールスルホン、芳香族ポリアミド、芳香族ポリエーテルアミド、ポリフェニレンスルフィド、ポリアリールエーテルケトン、ポリアミドイミド、液晶性ポリエステル、液晶性ポリエステルアミドが挙げられ、ポリイミド(特に、芳香族ポリイミド)が好ましい。
この場合、F層のPIが有する芳香族環及び耐熱性樹脂フィルム(基材)の芳香族ポリイミドが有する芳香族環がスタックするため、F層の耐熱性樹脂フィルムに対する密着性が向上すると考えられる。また、この場合、F層と耐熱性樹脂フィルムとが相溶した一体化物でなく、互いに独立した層として存在するため、Fポリマーの低い吸水性が芳香族ポリイミドの高い吸水性を補完して、積層体は、低い吸水性(高い水バリア性)を発揮すると考えられる。
Examples of the heat-resistant resin include polyimide, polyarylate, polysulfone, polyarylsulfone, aromatic polyamide, aromatic polyetheramide, polyphenylene sulfide, polyaryletherketone, polyamideimide, liquid crystalline polyester, and liquid crystalline polyesteramide, and polyimide (particularly, aromatic polyimide) is preferred.
In this case, the aromatic rings of the PI of the F layer and the aromatic rings of the aromatic polyimide of the heat-resistant resin film (substrate) are stacked, which is believed to improve the adhesion of the F layer to the heat-resistant resin film. In addition, in this case, the F layer and the heat-resistant resin film are not a compatible integrated body, but exist as independent layers, so that the low water absorption of the F polymer complements the high water absorption of the aromatic polyimide, and the laminate exhibits low water absorption (high water barrier properties).
両面にF層を有する耐熱性樹脂フィルムである積層体において、その厚さ(総厚)は、25μm以上が好ましく、50μm以上がより好ましい。上記厚さは、150μm以下が好ましい。
かかる構成において、耐熱性樹脂フィルムの厚さに対する2つのF層の合計での厚さの比は、0.5以上が好ましく、0.8以上がより好ましい。上記比は、5以下が好ましい。
この場合、耐熱性樹脂フィルムの特性(高い降伏強度、難塑性変形性)とF層の特性(低い吸水性)とがバランスよく発揮される。
In the laminate which is a heat-resistant resin film having F layers on both sides, the thickness (total thickness) is preferably 25 μm or more, more preferably 50 μm or more. The thickness is preferably 150 μm or less.
In such a configuration, the ratio of the total thickness of the two F layers to the thickness of the heat-resistant resin film is preferably 0.5 or more, more preferably 0.8 or more. The ratio is preferably 5 or less.
In this case, the properties of the heat-resistant resin film (high yield strength, low plastic deformation property) and the properties of the F layer (low water absorbency) are exhibited in a well-balanced manner.
本組成物(2)から形成される積層体であり、基材が耐熱性樹脂フィルムである積層体の好適な態様としては、耐熱性樹脂フィルムが厚さ20~100μmのポリイミドフィルムであり、F層、ポリイミドフィルム、F層がこの順に直接接触して積層された3層構成のフィルムが挙げられる。かかる態様における、2つのF層の厚さは、同じであり、15~50μmであるのが好ましい。また、ポリイミドフィルムの厚さに対する2つのF層の合計での厚さの比は、0.5~5が好ましい。かかる態様の積層体が、上述した積層体の効果を最も発現しやすい。A preferred embodiment of the laminate formed from composition (2) in which the substrate is a heat-resistant resin film is a three-layer film in which the heat-resistant resin film is a polyimide film having a thickness of 20 to 100 μm, and an F layer, a polyimide film, and an F layer are laminated in this order in direct contact with each other. In this embodiment, the thicknesses of the two F layers are the same, and preferably 15 to 50 μm. The ratio of the total thickness of the two F layers to the thickness of the polyimide film is preferably 0.5 to 5. A laminate in this embodiment is most likely to exhibit the effects of the laminate described above.
積層体のF層の最表面は、その線膨張性や接着性を一層向上させるために、さらに表面処理されてもよい。表面処理方法としては、上述した、本組成物(1)から形成されるポリマー層付金属箔のF層の表面処理方法と同様の方法が挙げられる。The outermost surface of the F layer of the laminate may be further surface-treated to further improve its linear expansion and adhesion. Examples of the surface treatment method include the same method as the surface treatment method of the F layer of the polymer layer-coated metal foil formed from the composition (1) described above.
本組成物(2)から形成される積層体の、F層の最表面には、さらに他の基板を積層してもよい。
他の基板の定義及び積層方法は、それらの好適な態様及び範囲も含めて、本組成物(1)から形成されるポリマー層付金属箔におけるそれらと同様である。
On the outermost surface of the layer F of the laminate formed from the present composition (2), another substrate may be further laminated.
The definitions and lamination methods of other substrates, including their preferred embodiments and ranges, are the same as those of the polymer layer-coated metal foil formed from the present composition (1).
本組成物(2)を、織布に含浸させ加熱すると、Fポリマー及びPIが含浸された含浸織布が得られる。
本組成物(2)の加熱条件は、それらの好適な態様と範囲も含めて、上述した本組成物(1)の加熱条件と同様である。
織布としては、加熱に耐える耐熱性織布が好ましく、ガラス繊維織布、カーボン繊維織布、アラミド繊維織布又は金属繊維織布がより好ましく、ガラス繊維織布又はカーボン繊維織布がさらに好ましい。
特に、含浸織布の電気絶縁性を高める観点からは、織布として、JIS R 3410:2006で定められる電気絶縁用Eガラスヤーンより構成される平織のガラス繊維織布を使用するのが好ましい。この際、織布をシランカップリング剤で処理すれば、Fポリマーとの密着性がより向上する。
When the composition (2) is impregnated into a woven fabric and heated, an impregnated woven fabric is obtained that is impregnated with the F polymer and PI.
The heating conditions for the present composition (2), including their preferred embodiments and ranges, are the same as those for the present composition (1) described above.
The woven fabric is preferably a heat-resistant woven fabric that can withstand heating, more preferably a glass fiber woven fabric, a carbon fiber woven fabric, an aramid fiber woven fabric or a metal fiber woven fabric, and even more preferably a glass fiber woven fabric or a carbon fiber woven fabric.
In particular, from the viewpoint of improving the electrical insulation of the impregnated woven fabric, it is preferable to use, as the woven fabric, a plain-woven glass fiber woven fabric made of an electrically insulating E-glass yarn as specified in JIS R 3410: 2006. In this case, if the woven fabric is treated with a silane coupling agent, the adhesion with the F polymer is further improved.
本組成物の第3の態様(以下、本組成物(3)とも記す。)としては、Fポリマーのパウダー(Fパウダー)と、芳香族ポリアミドイミド、芳香族ポリイミド及び芳香族ポリエステルからなる群から選ばれる少なくとも1種の芳香族ポリマー又はその前駆体(以下、「AR(3)」とも記す。)と、水酸基及びオキシアルキレン基を有する界面活性剤と、非プロトン性極性液状分散媒とを含み、Fポリマーの含有量が芳香族ポリマー又はその前駆体の含有量以上であり、界面活性剤の水酸基価が100mgKOH/g以下かつ上記オキシアルキレン基の含有量が10質量%以上である、態様が挙げられる。
本組成物(3)は、Fパウダーの分散性に優れる。その理由は必ずしも明確ではないが、以下のように考えられる。
A third aspect of the present composition (hereinafter also referred to as composition (3)) includes a powder of an F polymer (F powder), at least one aromatic polymer or a precursor thereof selected from the group consisting of aromatic polyamideimide, aromatic polyimide, and aromatic polyester (hereinafter also referred to as "AR (3)"), a surfactant having a hydroxyl group and an oxyalkylene group, and an aprotic polar liquid dispersion medium, in which the content of the F polymer is equal to or greater than the content of the aromatic polymer or the precursor thereof, the hydroxyl value of the surfactant is 100 mgKOH/g or less, and the content of the oxyalkylene group is 10 mass% or more.
Composition (3) has excellent dispersibility of F powder. The reason for this is not entirely clear, but is thought to be as follows.
低極性のFパウダーと芳香族性の化合物であるAR(3)とを含む液状組成物の液状分散媒が非プロトン性極性液状分散媒である場合、各成分同士の間での相互作用を促す、高度な分散作用を有する界面活性剤を見出すのは容易ではない。例えば、疎水性の高い界面活性剤を使用すれば、Fパウダー自体の分散性は上昇するが、AR(3)と液状分散媒との相互作用は低下するとも考えられる。本発明者らは、液状組成物におけるFポリマーの含有量が増える場合、この現象が顕著となり、Fパウダーの沈降、凝集及び相分離が発生しやすくなる点を知見した。
さらに、本発明者らは、鋭意検討した結果、かかる場合における界面活性剤には、一定の親水性が必要であり、具体的には、水酸基及びAO基を、それぞれ所定量で含有する必要がある点を知見したのである。つまり、界面活性剤が、強親水性の水酸基とマイルドな親水性のAO基とを、それぞれ所定の範囲で含有すれば、その親水性がバランスして、各成分の分散と相互作用とを促す点を知見したのである。
When the liquid dispersion medium of the liquid composition containing the low polarity F powder and the aromatic compound AR (3) is an aprotic polar liquid dispersion medium, it is not easy to find a surfactant with a high dispersing effect that promotes the interaction between each component. For example, if a highly hydrophobic surfactant is used, the dispersibility of the F powder itself increases, but it is also considered that the interaction between AR (3) and the liquid dispersion medium decreases. The present inventors have found that when the content of the F polymer in the liquid composition increases, this phenomenon becomes more pronounced, and sedimentation, aggregation, and phase separation of the F powder are more likely to occur.
Furthermore, as a result of intensive research, the present inventors have found that in such a case, the surfactant needs to have a certain degree of hydrophilicity, specifically, that it needs to contain a predetermined amount of hydroxyl groups and AO groups, respectively. In other words, they have found that if the surfactant contains strong hydrophilic hydroxyl groups and mildly hydrophilic AO groups in respective predetermined ranges, the hydrophilicity is balanced, promoting the dispersion and interaction of each component.
本組成物(3)における界面活性剤は、水酸基量の変化による親水性の極端な変動が、AO含有量の調整により抑制されているとも言える。これにより、界面活性剤の、Fポリマー及びAR(3)の双方に対する親和性がバランスし、本組成物(3)全体での分散性が向上したと考えられる。
その結果、本組成物(3)から形成される成形品(F層(塗膜)等)においては、FポリマーとAR(3)との高度な相互作用により、それぞれのポリマーの物性が高度に発現したと考えられる。例えば、上記成形品は、AR(3)を含むため、その線膨張係数が低く、よって反りが発生しにくく、密着接着性に優れている。また、AR(3)が有する芳香族環の良好なUV吸収性によりUV-YAGレーザー等による加工性にも優れる。そして、上記成形品はFポリマーを含み、Fポリマーの物性(特に、低誘電率、低誘電正接等の電気特性)が顕著に優れている。
以上のような効果は、後述する本発明の好ましい態様において、より顕著に発現する。
It can be said that the extreme change in hydrophilicity of the surfactant in the present composition (3) due to the change in the amount of hydroxyl groups is suppressed by adjusting the AO content, which is considered to balance the affinity of the surfactant to both the F polymer and AR (3), improving the dispersibility of the present composition (3) as a whole.
As a result, in a molded article (such as an F layer (coating film)) formed from this composition (3), it is believed that the high level of interaction between the F polymer and AR (3) results in the high level of physical properties of each polymer. For example, since the molded article contains AR (3), it has a low linear expansion coefficient, and therefore is less prone to warping and has excellent adhesion and bonding properties. In addition, the aromatic ring in AR (3) has good UV absorption properties, and therefore it is also excellent in processability with a UV-YAG laser or the like. And, since the molded article contains an F polymer, the physical properties of the F polymer (particularly electrical properties such as low dielectric constant and low dielectric tangent) are remarkably excellent.
The above-mentioned effects are more pronounced in the preferred embodiments of the present invention described below.
本組成物(3)におけるFポリマー及びFパウダーの定義は、好適な態様も含めて、本組成物(1)又は(2)におけるそれらと同様である。なお、本組成物(3)におけるFポリマーは、TFE単位及びPAVE単位を含む、溶融温度が260~320℃のPFAが好ましい。
本組成物(3)におけるAR(3)は、Fポリマー以外の材料であり、芳香族ポリアミドイミド、芳香族ポリイミド及び芳香族ポリエステルからなる群から選ばれる少なくとも1種の主鎖に芳香環を有するポリマーであるか、上記ポリマーを形成するプレポリマーである。
AR(3)は、芳香族ポリイミド又はその前駆体か、液晶性の芳香族ポリエステルかがより好ましく、芳香族ポリイミド又はその前駆体がさらに好ましい。
The definitions of the F polymer and the F powder in the present composition (3), including preferred embodiments, are the same as those in the present composition (1) or (2). The F polymer in the present composition (3) is preferably a PFA containing TFE units and PAVE units and having a melting temperature of 260 to 320°C.
AR (3) in this composition (3) is a material other than an F polymer, and is at least one polymer having an aromatic ring in the main chain selected from the group consisting of aromatic polyamideimide, aromatic polyimide, and aromatic polyester, or a prepolymer forming the above polymer.
AR(3) is more preferably an aromatic polyimide or a precursor thereof, or a liquid crystalline aromatic polyester, and further preferably an aromatic polyimide or a precursor thereof.
芳香族ポリイミドの態様としては、上述した本組成物(2)におけるPI(2)の態様と同様である。
芳香族ポリエステルの態様としては、液晶ポリエステルが挙げられる。液晶ポリエステルとしては、特開2000-248056号公報の段落[0010]~[0015]に記載されるポリマーが挙げられる。芳香族ポリエステルの具体的な例としては、ジカルボン酸(テレフタル酸、イソフタル酸、ジフェニルエーテル-4,4’-ジカルボン酸、無水酢酸等)、ジヒドロキシ化合物(4,4’-ビフェノール等)、芳香族ヒドロキシカルボン酸(4-ヒドロキシ安息香酸、6-ヒドロキシ-2-ナフトエ酸、2-ヒドロキシ-6-ナフトエ酸等)、芳香族ジアミン、芳香族ヒドロキシアミン、芳香族アミノカルボン酸等の重合物が挙げられる。芳香族ポリエステルのより具体的な例としては、4-ヒドロキシ安息香酸と6-ヒドロキシ-2-ナフトエ酸の反応物、6-ヒドロキシ-2-ナフトエ酸とテレフタル酸とアセトアミノフェンの反応物、4-ヒドロキシ安息香酸、テレフタル酸及び4,4’-ビフェノールの反応物が挙げられる。
The embodiment of the aromatic polyimide is the same as that of PI (2) in the present composition (2) described above.
An example of the aromatic polyester is a liquid crystal polyester. Examples of the liquid crystal polyester include the polymers described in paragraphs [0010] to [0015] of JP-A-2000-248056. Specific examples of aromatic polyesters include polymers of dicarboxylic acids (terephthalic acid, isophthalic acid, diphenyl ether-4,4'-dicarboxylic acid, acetic anhydride, etc.), dihydroxy compounds (4,4'-biphenol, etc.), aromatic hydroxycarboxylic acids (4-hydroxybenzoic acid, 6-hydroxy-2-naphthoic acid, 2-hydroxy-6-naphthoic acid, etc.), aromatic diamines, aromatic hydroxyamines, aromatic aminocarboxylic acids, etc. More specific examples of aromatic polyesters include a reaction product of 4-hydroxybenzoic acid and 6-hydroxy-2-naphthoic acid, a reaction product of 6-hydroxy-2-naphthoic acid, terephthalic acid, and acetaminophen, and a reaction product of 4-hydroxybenzoic acid, terephthalic acid, and 4,4'-biphenol.
本組成物(3)における非プロトン性極性液状分散媒の態様は、上述した本組成物(2)におけるそれと同様である。The form of the aprotic polar liquid dispersion medium in composition (3) is the same as that in composition (2) described above.
本組成物(3)における界面活性剤は、界面活性剤の水酸基価が100mgKOH/g以下かつオキシアルキレン基の含有量が10質量%以上である。
界面活性剤の水酸基価は、100mgKOH/g以下が好ましく、75mgKOH/g以下がより好ましく、50mgKOH/g以下がさらに好ましい。水酸基価の下限は、10mgKOH/g以上が好ましい。
界面活性剤のオキシアルキレン基の含有量は、10質量%以上が好ましく、15質量%以上がより好ましく、20質量%以上がさらに好ましい。オキシアルキレン基の含有量の上限は、50質量%以下が好ましい。
また、界面活性剤における親水部分としての水酸基及びオキシアルキレン基の態様は、その好適な範囲も含めて、本組成物(1)における界面活性剤と同様である。
さらに、界面活性剤は、疎水部分として、ペルフルオロアルキル基又はペルフルオロアルケニル基を有するのが好ましい。
The surfactant in the present composition (3) has a hydroxyl value of 100 mgKOH/g or less and an oxyalkylene group content of 10 mass % or more.
The hydroxyl value of the surfactant is preferably 100 mgKOH/g or less, more preferably 75 mgKOH/g or less, and even more preferably 50 mgKOH/g or less. The lower limit of the hydroxyl value is preferably 10 mgKOH/g or more.
The content of the oxyalkylene group in the surfactant is preferably 10% by mass or more, more preferably 15% by mass or more, and even more preferably 20% by mass or more. The upper limit of the content of the oxyalkylene group is preferably 50% by mass or less.
The embodiments of the hydroxyl group and oxyalkylene group as the hydrophilic portion of the surfactant, including the preferred ranges thereof, are the same as those of the surfactant in the present composition (1).
Furthermore, the surfactant preferably has a perfluoroalkyl group or a perfluoroalkenyl group as the hydrophobic portion.
本組成物(3)における界面活性剤としては、下式(F)で表される化合物と下式(H)で表される化合物とのコポリマーが好ましく、下記コポリマーに含まれる全単位に対する式(F)で表される化合物に基づく単位の量は、60~90モル%が好ましく、70~90モル%がより好ましい。
下記コポリマーに含まれる全単位に対する式(H)で表される化合物に基づく単位の量は、10~40モル%が好ましく、10~30モル%がより好ましい。
下記コポリマーに含まれる全単位に対する、式(F)で表される化合物に基づく単位と式(H)で表される化合物との合計での量は、90~100モル%が好ましく、100モル%がより好ましい。
CH2=CHRF-C(O)O-QF-XF ・・・ (F)
CH2=CHRH-C(O)O-(QH)m-OH ・・・ (H)
RFは、水素原子又はメチル基を表す。
QFは、炭素数1~4のアルキレン基又は炭素数1~4のオキシアルキレン基を表す。
XFは、炭素数4~6のペルフルオロアルキル基又は炭素数4~12のペルフルオロアルケニル基を表す。
RHは、水素原子又はメチル基を表す。
QHは、炭素数2~4のオキシアルキレン基を表す。
mは、1~120の整数を表す。
The surfactant in composition (3) is preferably a copolymer of a compound represented by the following formula (F) and a compound represented by the following formula (H). The amount of units based on the compound represented by formula (F) relative to all units contained in the copolymer is preferably 60 to 90 mol %, more preferably 70 to 90 mol %.
The amount of units based on the compound represented by formula (H) relative to all units contained in the copolymer is preferably from 10 to 40 mol %, more preferably from 10 to 30 mol %.
The total amount of the units based on the compound represented by formula (F) and the compound represented by formula (H) relative to all units contained in the copolymer is preferably 90 to 100 mol %, more preferably 100 mol %.
CH2 =CHR F -C(O)O-Q F -X F ... (F)
CH 2 ═CHR H —C(O)O—(Q H ) m —OH...(H)
R 3 F represents a hydrogen atom or a methyl group.
Q 1 F represents an alkylene group having 1 to 4 carbon atoms or an oxyalkylene group having 1 to 4 carbon atoms.
XF represents a perfluoroalkyl group having 4 to 6 carbon atoms or a perfluoroalkenyl group having 4 to 12 carbon atoms.
R H represents a hydrogen atom or a methyl group.
QH represents an oxyalkylene group having 2 to 4 carbon atoms.
m represents an integer from 1 to 120.
本組成物(3)の粘度、チキソ比、水の含有量の定義は、好適な態様も含めて、本組成物(1)又は(2)におけるそれらと同様である。
本組成物(3)は、Fポリマー及びAR(3)以外のポリマー、無機フィラー、チキソ性付与剤、消泡剤、シランカップリング剤、脱水剤、可塑剤、耐候剤、酸化防止剤、熱安定剤、滑剤、帯電防止剤、増白剤、着色剤、導電剤、離型剤、表面処理剤、粘度調節剤、難燃剤を含んでいてもよい。
本組成物(3)における無機フィラーの好適な態様及び範囲は、本組成物(2)における無機フィラーのそれらと同様である。
The definitions of the viscosity, thixotropy ratio, and water content of the present composition (3), including preferred embodiments thereof, are the same as those of the present composition (1) or (2).
The composition (3) may contain a polymer other than the F polymer and AR (3), an inorganic filler, a thixotropy imparting agent, an antifoaming agent, a silane coupling agent, a dehydrating agent, a plasticizer, a weathering agent, an antioxidant, a heat stabilizer, a lubricant, an antistatic agent, a brightening agent, a colorant, a conductive agent, a release agent, a surface treatment agent, a viscosity adjusting agent, and a flame retardant.
The preferred embodiments and ranges of the inorganic filler in the present composition (3) are the same as those of the inorganic filler in the present composition (2).
本組成物(3)におけるFポリマーの含有量(割合)は、AR(3)の含有量(割合)以上であるのが好ましい。この場合、得られる成形品に対して、Fポリマーに基づく特性とAR(3)に基づく特性とを良好なバランスで付与できるだけでなく、Fポリマーの物性が高度に発現しやすい。
具体的には、本組成物(3)におけるFポリマーの含有量は、10質量%以上が好ましく、15質量%以上がより好ましく、20質量%がさらに好ましい。上記含有量は、50質量%以下が好ましく、45質量%以下がより好ましく、40質量%以下がさらに好ましい。この場合、電気特性と基材に対する密着性とに優れた成形品を形成しやすい。
The content (ratio) of the F polymer in the composition (3) is preferably equal to or greater than the content (ratio) of AR (3). In this case, not only can the properties based on the F polymer and the properties based on AR (3) be imparted to the obtained molded article in a good balance, but also the physical properties of the F polymer are easily expressed to a high degree.
Specifically, the content of the F polymer in the composition (3) is preferably 10% by mass or more, more preferably 15% by mass or more, and even more preferably 20% by mass. The content is preferably 50% by mass or less, more preferably 45% by mass or less, and even more preferably 40% by mass or less. In this case, it is easy to form a molded product having excellent electrical properties and adhesion to a substrate.
本組成物(3)におけるAR(3)の含有量は、0.01質量%以上が好ましく、0.1質量%以上がより好ましく、1質量%以上がさらに好ましい。上記含有量は、50質量%以下が好ましく、25質量%以下がより好ましく、10質量%以下がさらに好ましい。この場合、UV加工性がより向上した成形品を形成しやすい。
また、本組成物(3)におけるFポリマーの含有量(割合)に対するAR(3)の含有量(割合)の質量比は、1以下が好ましく、0.5以下より好ましく、0.1以下がさらに好ましい。
本組成物(3)における非プロトン性極性液状分散媒の含有量(割合)は、40~90質量%が好ましく、50~80質量%がより好ましい。
本組成物(3)における界面活性剤の含有量(割合)は、1~15質量%が好ましい。この場合、成形品におけるFポリマーの元来の物性がより向上しやすい。
The content of AR (3) in the composition (3) is preferably 0.01% by mass or more, more preferably 0.1% by mass or more, and even more preferably 1% by mass or more. The content is preferably 50% by mass or less, more preferably 25% by mass or less, and even more preferably 10% by mass or less. In this case, it is easy to form a molded product with improved UV processability.
The mass ratio of the content (proportion) of AR (3) to the content (proportion) of the F polymer in the composition (3) is preferably 1 or less, more preferably 0.5 or less, and further preferably 0.1 or less.
The content (proportion) of the aprotic polar liquid dispersion medium in the composition (3) is preferably from 40 to 90 mass %, more preferably from 50 to 80 mass %.
The content (ratio) of the surfactant in the composition (3) is preferably 1 to 15% by mass, in which case the inherent physical properties of the F polymer in the molded article are more likely to be improved.
本組成物(3)を、基材の表面に塗布し加熱して、Fポリマー及び芳香族ポリマー(AR)を含むポリマー層(F層)を形成すれば、基材とF層とを、この順で有する積層体が得られる。
また、本組成物(3)を、織布に含浸させ加熱すると、Fポリマー及び芳香族ポリマー(AR)が含浸された含浸織布を得られる。
F層又は含浸織布におけるARは、本組成物(3)に含まれるAR(3)自体であってもよく、F層又は含浸織布の形成における加熱によって、構造変換(例えば、イミド化反応)が進行したARであってもよい。
本組成物(3)から形成される積層体又は含浸織布、並びにその製造方法に関する態様は、その好適な態様も含めて、本組成物(2)のそれらと同様である。
This composition (3) is applied to the surface of a substrate and heated to form a polymer layer (F layer) containing an F polymer and an aromatic polymer (AR), thereby obtaining a laminate having the substrate and the F layer in this order.
Furthermore, when the composition (3) is impregnated into a woven fabric and heated, an impregnated woven fabric impregnated with the F polymer and the aromatic polymer (AR) can be obtained.
The AR in the F layer or the impregnated woven fabric may be the AR (3) itself contained in the composition (3), or may be an AR in which a structural transformation (e.g., an imidization reaction) has progressed due to heating in the formation of the F layer or the impregnated woven fabric.
The laminate or impregnated woven fabric formed from the present composition (3) and the manufacturing method thereof are similar to those of the present composition (2), including the preferred embodiments thereof.
本組成物の第4の態様(以下、本組成物(4)とも記す。)としては、Fポリマーのパウダー(Fパウダー)と、芳香族ポリイミド又はその前駆体(以下、「PI(4)」とも記す。)と、非水系液状分散媒(非水系液状媒体)とを含み、Fポリマーの含有量は、10質量%以上であり、かつ、水の含有量(含水量)が、1000~50000ppmである、態様が挙げられる。
本組成物(4)を用いれば、穴等の欠陥を抑制しつつ、Fポリマーと芳香族ポリイミドとを緻密に(高密度で)含み、Fポリマーの含有量が高く、比較的薄いF層を形成しやすい。その理由は必ずしも明確ではないが、以下のように考えられる。
A fourth aspect of the present composition (hereinafter also referred to as the present composition (4)) includes an aspect that includes an F polymer powder (F powder), an aromatic polyimide or a precursor thereof (hereinafter also referred to as "PI (4)"), and a non-aqueous liquid dispersion medium (non-aqueous liquid medium), in which the F polymer content is 10 mass% or more and the water content (moisture content) is 1000 to 50000 ppm.
By using the composition (4), it is easy to form a relatively thin F layer that contains F polymer and aromatic polyimide densely (at high density), has a high content of F polymer, and suppresses defects such as holes. The reason for this is not necessarily clear, but is thought to be as follows.
本組成物(4)からF層を形成する過程では、加熱により、Fパウダーのパッキング及び溶融焼成とPI(4)の反応とが並行して進行すると考えられる。ここで、PI(4)の反応とは、PI(4)の末端基同士の間での反応(末端基に含まれるアミノ基と、末端基に含まれる酸無水物基又はカルボキシル基とのイミド化反応等)や、ポリイミド又はその前駆体中のアミック酸単位の閉環反応であり、脱水を伴う反応である。PI(4)の反応に伴い発生する水量(水の蒸発量)は、反応基質量と加熱温度とに依存し、加熱初期に特に多くなり、上記過程中に大きく変動してしまう。特に、加熱初期における水の急激な蒸発が、Fパウダーのパッキングを阻害し、F層の欠陥を増大させてしまうと考えられる。In the process of forming the F layer from the composition (4), it is believed that the packing and melting/sintering of the F powder and the reaction of PI (4) proceed in parallel due to heating. Here, the reaction of PI (4) refers to a reaction between the terminal groups of PI (4) (such as an imidization reaction between an amino group contained in the terminal group and an acid anhydride group or a carboxyl group contained in the terminal group) or a ring-closing reaction of an amic acid unit in a polyimide or its precursor, which is a reaction accompanied by dehydration. The amount of water (amount of evaporated water) generated by the reaction of PI (4) depends on the amount of reactant and the heating temperature, and is particularly large at the beginning of heating, and varies greatly during the above process. In particular, it is believed that the rapid evaporation of water at the beginning of heating inhibits the packing of the F powder and increases the defects of the F layer.
そこで、本組成物(4)では、所定量の水を敢えて含有させている。つまり、所定量の水の含有により、加熱初期のPI(4)の反応の進行が抑制され、加熱により水が蒸発するに伴ってPI(4)の反応が漸増することで、加熱過程における水の蒸発量をバランスさせている。これにより、形成されるF層に欠陥が生じなくなったと考えられる。また、PI(4)の反応に伴う発熱や体積変化も加熱過程においてバランスし、形状の安定性の高いF層が形成されるため、F層の欠陥が抑制されるとも考えられる。
さらに、本組成物(4)は、所定量の水を含有するため、その保管に際して、PI(4)の反応による変質を抑制できるので、分散安定性にも優れていると考えられる。
Therefore, in the present composition (4), a certain amount of water is intentionally included. In other words, by including a certain amount of water, the progress of the reaction of PI (4) at the beginning of heating is suppressed, and as the water evaporates due to heating, the reaction of PI (4) gradually increases, thereby balancing the amount of water evaporated during the heating process. It is believed that this prevents defects from occurring in the F layer that is formed. In addition, the heat generation and volume change associated with the reaction of PI (4) are also balanced during the heating process, and an F layer with high shape stability is formed, so that defects in the F layer are suppressed.
Furthermore, since the composition (4) contains a specified amount of water, deterioration due to reaction of PI (4) during storage can be suppressed, and it is considered that the composition (4) also has excellent dispersion stability.
具体的には、本組成物(4)は、比較的多量のPI(4)を含有していても、その粘度又はチキソトロピー性が保持され、それぞれの成分の沈降、凝集及び相分離を抑制できる。その結果、本組成物(4)から形成されるF層(成形品)においては、Fポリマー及びポリイミドのそれぞれの物性が高度に発現すると考えられる。例えば、F層は、芳香族ポリイミドを含むため、その線膨張係数が低く、よって反りが発生しにくく、厚膜化にも有利である。また、芳香族ポリイミドが有する芳香族環の良好なUV吸収性により、UV-YAGレーザー等による加工性にも優れる。さらに、F層は、Fポリマーの物性(特に、低誘電率、低誘電正接等の電気特性)が高度に発現する。
以上のような効果は、後述する本組成物(4)の好ましい態様において、より顕著に発現する。
Specifically, even if the composition (4) contains a relatively large amount of PI (4), the viscosity or thixotropy is maintained, and the sedimentation, aggregation, and phase separation of each component can be suppressed. As a result, it is considered that the physical properties of the F polymer and polyimide are highly expressed in the F layer (molded product) formed from the composition (4). For example, since the F layer contains an aromatic polyimide, it has a low linear expansion coefficient, and therefore is less likely to warp, which is advantageous for thickening. In addition, due to the good UV absorption of the aromatic rings of the aromatic polyimide, it is also excellent in processability with a UV-YAG laser or the like. Furthermore, the F layer highly expresses the physical properties of the F polymer (particularly electrical properties such as low dielectric constant and low dielectric tangent).
The above-mentioned effects are more pronounced in the preferred embodiments of the present composition (4) described below.
本組成物(4)におけるFポリマーの定義は、その好適な態様も含めて、本組成物(1)におけるそれと同様である。なお、本組成物(4)におけるFポリマーは、TFE単位及びPAVE単位を含むPFAが好ましい。
特に、本組成物(4)におけるFポリマーの溶融温度は、280~325℃が好ましく、285~320℃がより好ましい。
また、Fポリマーのガラス転移点は、75~125℃が好ましく、80~100℃がより好ましい。
本組成物(4)におけるFパウダーの定義は、好適な態様及び範囲も含めて、本組成物(2)におけるそれと同様である。
The definition of the F polymer in the present composition (4), including its preferred embodiments, is the same as that in the present composition (1). The F polymer in the present composition (4) is preferably a PFA containing a TFE unit and a PAVE unit.
In particular, the melting temperature of the F polymer in the composition (4) is preferably from 280 to 325°C, more preferably from 285 to 320°C.
The glass transition point of the F polymer is preferably from 75 to 125°C, and more preferably from 80 to 100°C.
The definition of F powder in composition (4) is the same as that in composition (2), including preferred embodiments and ranges.
PI(4)は、芳香族ポリイミド又は芳香族ポリアミック酸であるのが好ましい。
芳香族ポリイミドは、カルボン酸二無水物とジアミンとに基づく単位であり、両者の化合物のイミド化反応により形成された単位(イミド構造を有する単位;以下、「イミド単位」とも記す。)を有する。なお、芳香族ポリイミドは、イミド単位のみからなっていてもよく、イミド単位と上記両者の化合物のアミド化反応により形成された単位(アミック酸構造を有する単位;以下、「アミック酸単位」とも記す。)とを有していてもよい。一方、芳香族ポリアミック酸とは、アミック酸単位のみからなるポリマーである。
PI(4) is preferably an aromatic polyimide or an aromatic polyamic acid.
Aromatic polyimides are units based on carboxylic dianhydrides and diamines, and have units formed by the imidization reaction of the two compounds (units having an imide structure; hereinafter, also referred to as "imide units"). Incidentally, aromatic polyimides may be composed only of imide units, or may have imide units and units formed by the amidation reaction of the two compounds (units having an amic acid structure; hereinafter, also referred to as "amic acid units"). On the other hand, aromatic polyamic acid is a polymer composed only of amic acid units.
かかるPI(4)において、カルボン酸二無水物及びジアミンの少なくとも一方、かつ、その少なくとも一部は、芳香族性の化合物である。また、カルボン酸二無水物とジアミンとは、それぞれ1種の化合物を使用してもよく、それぞれ複数の化合物を使用してもよい。カルボン酸二無水物として、少なくとも1種の芳香族カルボン酸二無水物を使用するのが好ましい。
ただし、PI(4)は、イミド化率が99%未満である芳香族ポリイミド又はポリアミック酸が好ましい。かかるPI類は、反応基質濃度が高く、加熱により反応が急激に進行するため、所定量の水を含有させた本組成物(4)の反応緩和効果が、より顕著に発現しやすい。
なお、本組成物(4)におけるPI(4)のイミド化率の定義、その制御方法及びその測定方法は、上述したPI(2)におけるそれらと同様である。
In the PI (4), at least one of the carboxylic dianhydride and the diamine, and at least a part of the diamine, is an aromatic compound. The carboxylic dianhydride and the diamine may each be one compound or a plurality of compounds. It is preferable to use at least one aromatic carboxylic dianhydride as the carboxylic dianhydride.
However, PI (4) is preferably an aromatic polyimide or polyamic acid having an imidization rate of less than 99%. Such PIs have a high concentration of reactive substrates and undergo rapid reaction upon heating, so that the reaction moderation effect of the present composition (4) containing a specified amount of water is more likely to be exhibited significantly.
The definition of the imidization rate of PI (4) in composition (4), the method of controlling it, and the method of measuring it are the same as those in PI (2) described above.
PI(4)のイミド化率は、10~95%がより好ましく、25~90%がさらに好ましく、50~80%が特に好ましい。所定のイミド化率のPI(4)は、イミド化反応に伴ってイミド基が形成(閉環)され、その極性(解離性プロトン)が低下するため、本組成物(4)への溶解性(又は分散性)が低下する傾向にある一方、Fポリマーとの親和性が上昇する傾向にある。このため、かかるPI(4)は、分散剤として機能して、Fパウダーの分散を促すとも考えられる。また、かかるPI(4)の含有により、本組成物(4)の粘度又はチキソトロピー性が保持され、それぞれの成分の沈降、凝集及び相分離をより抑制しやすい。
なお、芳香族ポリアミック酸のイミド化率は、0%である。
The imidization rate of PI (4) is more preferably 10 to 95%, further preferably 25 to 90%, and particularly preferably 50 to 80%. With a given imidization rate, PI (4) forms an imide group (ring closure) with the imidization reaction, and its polarity (dissociable proton) decreases, so that its solubility (or dispersibility) in the composition (4) tends to decrease, while its affinity with the F polymer tends to increase. For this reason, it is considered that such PI (4) functions as a dispersant to promote the dispersion of the F powder. In addition, the inclusion of such PI (4) maintains the viscosity or thixotropy of the composition (4), making it easier to suppress the precipitation, aggregation, and phase separation of each component.
The imidization rate of the aromatic polyamic acid was 0%.
PI(4)は、芳香族テトラカルボン酸の酸二無水物と、2個以上のアリーレン基が連結基を介して連結された連結構造を有する芳香族ジアミン、又は、脂肪族ジアミンとに基づく単位を含むのが好ましい。かかるPI(4)は、Fポリマーとの親和性がより高まる傾向を示し、本組成物(4)の分散性をより高めるだけでなく、それから形成されるF層の接着性が向上しやすい。つまり、かかるPI(4)は、本組成物(4)において分散剤としても、F層における接着成分としても機能しやすい。
PI(4)における、芳香族テトラカルボン酸の酸二無水物、芳香族ジアミン、脂肪族ジアミンの好適な態様は、上述した本組成物(2)におけるそれらと同様である。
PI (4) preferably contains a unit based on an aromatic tetracarboxylic acid dianhydride and an aromatic diamine or an aliphatic diamine having a linking structure in which two or more arylene groups are linked via a linking group. Such PI (4) shows a tendency to have a higher affinity with the F polymer, and not only increases the dispersibility of the composition (4), but also tends to improve the adhesiveness of the F layer formed therefrom. In other words, such PI (4) tends to function both as a dispersant in the composition (4) and as an adhesive component in the F layer.
The preferred embodiments of the aromatic tetracarboxylic acid dianhydride, aromatic diamine, and aliphatic diamine in PI (4) are the same as those in the present composition (2) described above.
本組成物(4)における非水系液状分散媒は、アミド、ケトン及びエステルからなる群から選ばれる少なくとも1種の液状化合物であるのが好ましい。非水系液状分散媒は、1種を単独で使用してもよく、2種以上を混合してもよい。
非水系液状分散媒の沸点は、125~250℃が好ましい。この場合、本組成物(4)による液状被膜を乾燥して乾燥被膜を形成する際、非水系液状分散媒の揮発に伴う、Fパウダーの流動が効果的に進行して、Fパウダーが緻密にパッキングしやすい。
本組成物(4)における非水系液状分散媒の好適な具体例は、本組成物(2)における非プロトン性極性液状分散媒と同様である。
The non-aqueous liquid dispersion medium in the composition (4) is preferably at least one liquid compound selected from the group consisting of amides, ketones, and esters. The non-aqueous liquid dispersion medium may be used alone or in combination of two or more.
The boiling point of the non-aqueous liquid dispersion medium is preferably 125 to 250° C. In this case, when the liquid coating of the present composition (4) is dried to form a dry coating, the flow of the F powder due to the evaporation of the non-aqueous liquid dispersion medium progresses effectively, and the F powder is likely to be densely packed.
Suitable specific examples of the non-aqueous liquid dispersion medium in the present composition (4) are the same as the aprotic polar liquid dispersion medium in the present composition (2).
本組成物(4)は、親水部分として水酸基又はオキシアルキレン基を有する界面活性剤を含有するのが好ましい。
本組成物(4)における界面活性剤の定義は、好適な態様も含めて、本組成物(1)におけるそれと同様である。
The present composition (4) preferably contains a surfactant having a hydroxyl group or an oxyalkylene group as the hydrophilic portion.
The definition of the surfactant in the present composition (4), including preferred embodiments thereof, is the same as that in the present composition (1).
本組成物(4)の含水量は、1000~50000ppmである。
本組成物(4)の含水量は、5000ppm超が好ましく、7500ppm以上がより好ましい。本組成物(4)の含水量は、30000ppm以下が好ましく、20000ppm以下がより好ましい。本組成物(4)の含水量が上記範囲であれば、PI(4)の反応自体を損わずに、加熱過程における水の蒸発量がよりバランスさせ、形成されるポリマー層に欠陥が一層低減できる。また、本組成物(4)は、分散安定性とハンドリング性とに優れた液状組成物となりやすい。
本組成物(4)の粘度は、10000mPa・s以下が好ましく、10~1000mPa・sがより好ましい。
本組成物(4)のチキソ比は、1~2が好ましい。
The water content of the composition (4) is 1,000 to 50,000 ppm.
The water content of the composition (4) is preferably more than 5000 ppm, more preferably 7500 ppm or more. The water content of the composition (4) is preferably 30000 ppm or less, more preferably 20000 ppm or less. If the water content of the composition (4) is within the above range, the amount of water evaporated during the heating process is more balanced without impairing the reaction of PI (4) itself, and defects in the formed polymer layer can be further reduced. In addition, the composition (4) is likely to become a liquid composition with excellent dispersion stability and handling properties.
The viscosity of the composition (4) is preferably 10,000 mPa·s or less, and more preferably 10 to 1,000 mPa·s.
The thixotropy ratio of the present composition (4) is preferably 1-2.
本組成物(4)の粘度、チキソ比の定義は、好適な態様及び範囲も含め、本組成物(2)におけるそれらと同様である。
本組成物(4)は、Fポリマー及びPI(4)以外のポリマー、無機フィラー、チキソ性付与剤、消泡剤、シランカップリング剤、脱水剤、可塑剤、耐候剤、酸化防止剤、熱安定剤、滑剤、帯電防止剤、増白剤、着色剤、導電剤、離型剤、表面処理剤、粘度調節剤、難燃剤を含んでいてもよい。
本組成物(4)における無機フィラーの好適な態様及び範囲は、本組成物(2)における無機フィラーのそれらと同様である。
The definitions of the viscosity and thixotropy ratio of the present composition (4), including preferred embodiments and ranges, are the same as those of the present composition (2).
The composition (4) may contain a polymer other than the F polymer and PI (4), an inorganic filler, a thixotropic agent, an antifoaming agent, a silane coupling agent, a dehydrating agent, a plasticizer, a weathering agent, an antioxidant, a heat stabilizer, a lubricant, an antistatic agent, a whitening agent, a colorant, a conductive agent, a release agent, a surface treatment agent, a viscosity adjusting agent, and a flame retardant.
The preferred embodiments and ranges of the inorganic filler in the present composition (4) are the same as those of the inorganic filler in the present composition (2).
本組成物(4)におけるFポリマーの含有量は、PI(4)の含有量以上であるのが好ましい。この場合、Fポリマーの物性を高度に具備した緻密なF層が得られやすく、また、得られるF層に対して、Fポリマーに基づく特性とPI(4)に基づく特性とを良好なバランスで付与しやすい。
具体的には、本組成物(4)におけるFポリマーの含有量は、10質量%以上であり、15質量%以上が好ましく、20質量%以上がより好ましい。上記含有量は、50質量%以下が好ましく、45質量%以下がより好ましく、40質量%以下がさらに好ましい。この場合、電気特性と基材に対する密着性とに優れたF層を形成しやすい。
The content of the F polymer in the composition (4) is preferably equal to or greater than the content of PI (4). In this case, a dense F layer having high physical properties of the F polymer is easily obtained, and the obtained F layer is easily imparted with a good balance of properties based on the F polymer and properties based on PI (4).
Specifically, the content of the F polymer in the composition (4) is 10% by mass or more, preferably 15% by mass or more, and more preferably 20% by mass or more. The content is preferably 50% by mass or less, more preferably 45% by mass or less, and even more preferably 40% by mass or less. In this case, it is easy to form an F layer having excellent electrical properties and adhesion to a substrate.
本組成物(4)におけるPI(4)の含有量は、10質量%以上が好ましく、15質量%以上がより好ましく、20質量%以上がさらに好ましい。上記含有量は、50質量%以下が好ましく、45質量%以下がより好ましく、40質量%以下がさらに好ましい。この場合、UV加工性がより向上したF層を形成しやすい。
本組成物(4)における非水系液状分散媒の含有量は、40~90質量%が好ましく、50~80質量%がより好ましい。
本組成物(4)が界面活性剤を含む場合、その含有量は、1~15質量%が好ましい。この場合、F層におけるFポリマーの元来の物性がより向上しやすい。
The content of PI (4) in the composition (4) is preferably 10% by mass or more, more preferably 15% by mass or more, and even more preferably 20% by mass or more. The content is preferably 50% by mass or less, more preferably 45% by mass or less, and even more preferably 40% by mass or less. In this case, it is easy to form an F layer with improved UV processability.
The content of the non-aqueous liquid dispersion medium in the composition (4) is preferably from 40 to 90% by mass, and more preferably from 50 to 80% by mass.
When the composition (4) contains a surfactant, the content thereof is preferably 1 to 15% by mass, in which case the inherent physical properties of the F polymer in the F layer are more likely to be improved.
本組成物(4)を、基材の表面に塗布し加熱して、Fポリマー及び芳香族ポリイミド(PI)を含むF層を形成すれば、基材とF層とを、この順で有する積層体が得られる。
F層におけるPIは、本組成物(4)に含まれるPI(4)自体であってもよく、F層の形成における加熱によって、さらにイミド化反応が進行したPIであってもよい。
本組成物(4)から形成される積層体の定義は、好適な態様及び範囲も含めて、本組成物(2)から形成される積層体それと同様である。
This composition (4) is applied to the surface of a substrate and heated to form an F layer containing an F polymer and an aromatic polyimide (PI), thereby obtaining a laminate having the substrate and the F layer in this order.
The PI in the F layer may be the PI (4) itself contained in the composition (4), or may be a PI in which the imidization reaction has further progressed due to heating during the formation of the F layer.
The definition of the laminate formed from the present composition (4) is the same as that of the laminate formed from the present composition (2), including preferred embodiments and ranges.
以上、本発明の液状組成物と、かかる液状組成物から得られる本発明の積層体又は含浸織布とについて説明したが、本発明は、上述した実施形態の構成に限定されない。
例えば、本発明の液状組成物と、かかる液状組成物から得られる本発明の積層体又は含浸織布とは、それぞれ上記実施形態の構成において、他の任意の構成を追加で有してもよいし、同様の作用を生じる任意の構成と置換されていてよい。
The liquid composition of the present invention and the laminate or impregnated woven fabric obtained from the liquid composition of the present invention have been described above, but the present invention is not limited to the configurations of the above-mentioned embodiments.
For example, the liquid composition of the present invention and the laminate or impregnated woven fabric of the present invention obtained from such a liquid composition may each have any other optional components in addition to the components of the above-mentioned embodiments, or may be replaced with any optional components that produce a similar effect.
以下、実施例を挙げて本発明を具体的に説明するが、本発明はこれらに限定されない。The present invention will be explained in detail below with reference to examples, but the present invention is not limited to these.
1.液状組成物の製造例及びその評価例(その1)
1-1.各成分の準備
[パウダー]
パウダー11:TFE単位、NAH単位及びPPVE単位を、この順に98.0モル%、0.1モル%、1.9モル%含むFポリマー11(溶融温度:300℃)からなるパウダー(D50:1.7μm)
パウダー12:TFE単位及びPPVE単位を、この順に97.5モル%、2.5モル%含むFポリマー12(溶融温度:305℃)からなるパウダー(D50:1.3μm)
[溶媒(液状分散媒)]
NMP:N-メチル-2-ピロリドン
1. Example of production of liquid composition and its evaluation (part 1)
1-1. Preparation of each ingredient [Powder]
Powder 11: Powder (D50: 1.7 μm) made of F polymer 11 (melting temperature: 300° C.) containing 98.0 mol%, 0.1 mol%, and 1.9 mol% of TFE units, NAH units, and PPVE units, in that order.
Powder 12: Powder (D50: 1.3 μm) made of F polymer 12 (melting temperature: 305° C.) containing 97.5 mol % and 2.5 mol % of TFE units and PPVE units, in that order.
[Solvent (liquid dispersion medium)]
NMP: N-methyl-2-pyrrolidone
[結着樹脂]
結着樹脂11:非反応型の熱可塑性ポリイミド(三菱ガス化学社製、「ネオプリム」;20%重量減少温度:300℃以上、5%重量減少温度:300℃以上、ガラス転移点:260℃)
結着樹脂12:非反応型の熱可塑性ポリイミド(ソマール社製、「スピクセリア」;20%重量減少温度:300℃以上、5%重量減少温度:300℃以上)
結着樹脂13:脱水縮合反応型の熱硬化性ポリイミド(ポリアミック酸を含むポリイミド前駆体;20%重量減少温度:300℃以上、5%重量減少温度:300℃以上)
結着樹脂14:非反応型の熱可塑性アクリル樹脂(20%重量減少温度:260℃未満)
なお、上記結着樹脂は、いずれもNMPに可溶な樹脂である。
[Binder resin]
Binder resin 11: Non-reactive thermoplastic polyimide (manufactured by Mitsubishi Gas Chemical Company, Inc., "Neoplum"; 20% weight loss temperature: 300°C or higher, 5% weight loss temperature: 300°C or higher, glass transition point: 260°C)
Binder resin 12: Non-reactive thermoplastic polyimide ("Spixeria" manufactured by Somar; 20% weight loss temperature: 300°C or higher, 5% weight loss temperature: 300°C or higher)
Binder resin 13: Dehydration condensation reaction type thermosetting polyimide (polyimide precursor containing polyamic acid; 20% weight loss temperature: 300° C. or higher, 5% weight loss temperature: 300° C. or higher)
Binder resin 14: Non-reactive thermoplastic acrylic resin (20% weight loss temperature: less than 260°C)
The binder resins are all soluble in NMP.
[分散剤(界面活性剤)]
分散剤11:ペルフルオロアルケニル基と、ポリオキシエチレン基及びアルコール性水酸基とをそれぞれ側鎖に有する、ノニオン性の(メタ)アクリレート系ポリマー(ネオス社製、「フタージェント710FL」)
[金属箔]
銅箔11:低粗化電解銅箔(厚さ:12μm、表面の十点平均粗さ:0.08μm)
[Dispersant (surfactant)]
Dispersant 11: Nonionic (meth)acrylate polymer having a perfluoroalkenyl group, a polyoxyethylene group, and an alcoholic hydroxyl group on the side chain (manufactured by Neos Corporation, "Ftergent 710FL")
[Metal foil]
Copper foil 11: Low-roughening electrolytic copper foil (thickness: 12 μm, ten-point average roughness of surface: 0.08 μm)
1-2.液状組成物の製造
ポットに、NMP(66.7質量部)と分散剤11(3質量部)とを入れて溶液とした後、パウダー11(30質量部)と結着樹脂11(0.3質量部)とを入れた。その後、ジルコニアボールを投入し、150rpmにて1時間、ポットを転がして、パウダー11が分散した液状組成物11を製造した。
なお、液状組成物11は、25℃における粘度が1000mPa・s以下(25mPa・s)であり、25℃にて静置しても顕著な沈降物が発生せず分散性に優れていた。
(液状組成物12~15)
成分の種類と成分の量とを以下の表1に示すように変更した以外は、液状組成物11と同様にして、液状組成物12~15を製造した。
各液状組成物の成分の種類及び量をまとめて表1に示す。なお、表1中、括弧内の数値は使用した量(質量部)を示し、「結着樹脂/Fポリマー」は液状組成物中のFポリマーの含有量に対する結着樹脂の含有量の質量比を示す。
1-2. Production of liquid composition NMP (66.7 parts by mass) and dispersant 11 (3 parts by mass) were added to a pot to prepare a solution, and then powder 11 (30 parts by mass) and binder resin 11 (0.3 parts by mass) were added. Zirconia balls were then added, and the pot was rolled at 150 rpm for 1 hour to produce liquid composition 11 in which powder 11 was dispersed.
Liquid composition 11 had a viscosity of 1000 mPa·s or less (25 mPa·s) at 25° C., and even when left to stand at 25° C., no significant sediment was formed, and the liquid composition had excellent dispersibility.
(Liquid Compositions 12 to 15)
Liquid compositions 12 to 15 were produced in the same manner as liquid composition 11, except that the types and amounts of the components were changed as shown in Table 1 below.
The types and amounts of the components of each liquid composition are shown in Table 1. In Table 1, the numbers in parentheses indicate the amounts used (parts by mass), and "binder resin/F polymer" indicates the mass ratio of the binder resin content to the F polymer content in the liquid composition.
1-3.ポリマー層付銅箔の製造
(ポリマー層付銅箔11)
銅箔11の表面に、液状組成物11を小径グラビアリバース法によりロールツーロールで塗工して、液状被膜を形成した。次いで、この銅箔を、乾燥炉に通し、100℃、120℃、130℃の順で計5分間、加熱して乾燥させた。その後、窒素雰囲気下の遠赤外線オーブン中で、乾燥被膜を340℃にて3分間加熱した。これにより、銅箔11の表面にF層11(厚さ:4μm)が形成されたポリマー層付銅箔11を製造した。
(ポリマー層付銅箔12~15)
液状組成物11に代えて、液状組成物12~15をそれぞれ使用した以外は、ポリマー層付銅箔11と同様にして、ポリマー層付銅箔12~15を製造した。
得られたポリマー層付銅箔について、以下の評価を行った。
1-3. Production of polymer-layered copper foil (polymer-layered copper foil 11)
The liquid composition 11 was applied to the surface of the copper foil 11 by a roll-to-roll method using a small-diameter gravure reverse method to form a liquid coating. The copper foil was then passed through a drying furnace and dried by heating at 100°C, 120°C, and 130°C in that order for a total of 5 minutes. The dried coating was then heated at 340°C for 3 minutes in a far-infrared oven under a nitrogen atmosphere. This produced a polymer-layered copper foil 11 in which an F layer 11 (thickness: 4 μm) was formed on the surface of the copper foil 11.
(Polymer-Layered Copper Foils 12 to 15)
Polymer layer-coated copper foils 12 to 15 were produced in the same manner as polymer layer-coated copper foil 11, except that liquid compositions 12 to 15 were used instead of liquid composition 11, respectively.
The obtained polymer layer-coated copper foil was evaluated as follows.
1-4.ポリマー層付銅箔の評価
<密着性>
ポリマー層付銅箔の断面をSEMにより観察して、銅箔とF層との界面の状態を、以下の基準に従って評価した。
A:界面が全面にわたって緻密に密着している。
B:界面が全面にわたって密着しているが、空隙が存在する部分がある。
C:界面の全面にわたって空隙が存在している。
1-4. Evaluation of polymer-layered copper foil <Adhesion>
The cross section of the polymer layer-attached copper foil was observed by SEM, and the state of the interface between the copper foil and the F layer was evaluated according to the following criteria.
A: The interface is tightly adhered over the entire surface.
B: The interface is in close contact over the entire surface, but there are some areas where voids exist.
C: Voids are present over the entire interface.
<剥離強度>
ポリマー層付銅箔から矩形状(長さ100mm、幅10mm)の試験片に切り出した。そして、試験片の長さ方向の一端から50mmの位置を固定し、引張り速度50mm/分、長さ方向の片端から試験片に対して90°で、銅箔とF層とを剥離させた。この際の最大荷重を剥離強度(N/cm)として測定し、以下の基準に従って評価した。
A:剥離強度が12N/cm以上である。
B:剥離強度が8N/cm以上、12N/cm未満である。
C:剥離強度が8N/cm未満である。
<Peel strength>
A rectangular test piece (length 100 mm, width 10 mm) was cut out from the polymer layer-attached copper foil. The test piece was fixed at a position 50 mm from one end in the longitudinal direction, and the copper foil and the F layer were peeled off from one end in the longitudinal direction at an angle of 90° to the test piece at a pulling speed of 50 mm/min. The maximum load at this time was measured as the peel strength (N/cm) and evaluated according to the following criteria.
A: The peel strength is 12 N/cm or more.
B: The peel strength is 8 N/cm or more and less than 12 N/cm.
C: The peel strength is less than 8 N/cm.
<はんだ耐熱性>
ポリマー層付銅箔を、288℃の半田浴に5秒間浮かべる半田耐熱性試験に供した際、F層から銅箔が浮く現象が発生するかを目視で確認し、以下の基準に従って評価した。
A:試験を繰り返しても、上記現象が発生しない。
B:1回の試験で上記現象は発生しないが、試験を繰り返すと上記現象が発生する。
C:1回の試験で上記現象が発生する。
<Solder heat resistance>
When the polymer layer-coated copper foil was subjected to a solder heat resistance test in which it was floated in a solder bath at 288° C. for 5 seconds, it was visually confirmed whether the copper foil floated from the F layer, and evaluated according to the following criteria.
A: The above phenomenon does not occur even after repeated testing.
B: The above phenomenon does not occur in one test, but occurs when the test is repeated.
C: The above phenomenon occurs in one test.
<反り性>
ポリマー層付銅箔のF層の表面にポリイミドフィルムを重ね、真空熱プレス法(プレス温度:340℃、プレス圧力:4MPa、プレス時間:60分間)によって積層させて、以下の基準に従って評価した。
A:ポリマー層付銅箔とポリイミドフィルムを問題なく積層できる。
B:ポリマー層付銅箔が、一部カールするが、ポリイミドフィルムと問題なく積層できる。
C:ポリマー層付銅箔が、大きくカールして、ポリイミドフィルムと積層できない。
<Warpage>
A polyimide film was placed on the surface of the F layer of the polymer-layered copper foil, and laminated by a vacuum hot press method (press temperature: 340° C., press pressure: 4 MPa, press time: 60 minutes), and evaluated according to the following criteria.
A: The polymer layer-coated copper foil and the polyimide film can be laminated without any problems.
B: The polymer layer-coated copper foil curls in part, but can be laminated with the polyimide film without any problems.
C: The polymer layer-attached copper foil curled significantly and could not be laminated with the polyimide film.
ポリマー層付銅箔11における銅箔11とF層11との界面は、緻密であり空隙が確認されなかった。また、ポリマー層付銅箔11のF層11の最表面をSEMにより観察した結果、その表面は平滑性が高く欠陥が確認されなかった。さらに、ポリマー層付銅箔11の銅箔11の光沢を、F層11側から目視で確認した結果、使用した元の銅箔11の光沢から変化が無かった。そして、ポリマー層付銅箔11の銅箔11をエッチング処理して形成した伝送回路を有するプリント基板は、加熱において反りにくかった。The interface between the copper foil 11 and the F layer 11 in the polymer layer-coated copper foil 11 was dense, and no voids were found. Furthermore, the outermost surface of the F layer 11 of the polymer layer-coated copper foil 11 was observed by SEM, and the surface was found to be highly smooth and with no defects. Furthermore, the gloss of the copper foil 11 of the polymer layer-coated copper foil 11 was visually confirmed from the F layer 11 side, and there was no change in gloss from the original copper foil 11 used. Furthermore, a printed circuit board having a transmission circuit formed by etching the copper foil 11 of the polymer layer-coated copper foil 11 was resistant to warping when heated.
ポリマー層付銅箔11は、分散液11(結着樹脂のガラス転移点がFポリマーの溶融温度より低い、Fポリマー及び結着樹脂を使用した分散液)から製造され、そのF層11は良好なUV吸収性を示し、誘電率と誘電正接(測定周波数:10GHz)とがこの順に2.0、0.0061であり電気特性に優れていた。
なお、表2の結果から、Fポリマー及び結着樹脂の種類の変更に伴って、各評価の結果に変動が確認された。
The polymer layer-attached copper foil 11 was produced from the dispersion 11 (a dispersion using an F polymer and a binder resin, the glass transition point of the binder resin being lower than the melting temperature of the F polymer). The F layer 11 exhibited good UV absorption properties, and had a dielectric constant and a dielectric dissipation factor (measurement frequency: 10 GHz) of 2.0 and 0.0061, respectively, and thus had excellent electrical properties.
It is to be noted that, from the results in Table 2, it was confirmed that the results of each evaluation varied with the change in the type of F polymer and binder resin.
2.液状組成物の製造例及びその評価例(その2)
2-1.各成分の準備
[Fポリマー]
Fポリマー21:TFE単位、NAH単位及びPPVE単位を、この順に98.0モル%、0.1モル%、1.9モル%で含有し、極性官能基を有するポリマー(溶融温度:300℃、ガラス転移点:95℃)
Fポリマー22:TFE単位及びPPVE単位を、この順に97.5モル%、2.5モル%で含有し、極性官能基を有さないポリマー(溶融温度:305℃、ガラス転移点:85℃)
[パウダー]
パウダー21:Fポリマー21からなるパウダー(D50:1.7μm)
パウダー22:Fポリマー22からなるパウダー(D50:3.2μm)
2. Example of production of liquid composition and evaluation thereof (part 2)
2-1. Preparation of each component [F polymer]
F polymer 21: A polymer containing TFE units, NAH units and PPVE units in the order of 98.0 mol%, 0.1 mol% and 1.9 mol% and having a polar functional group (melting temperature: 300° C., glass transition point: 95° C.)
F polymer 22: A polymer containing 97.5 mol% TFE units and 2.5 mol% PPVE units, in that order, and having no polar functional groups (melting temperature: 305° C., glass transition point: 85° C.)
[powder]
Powder 21: Powder made of F polymer 21 (D50: 1.7 μm)
Powder 22: Powder made of F polymer 22 (D50: 3.2 μm)
[PI又はポリアミック酸]
PI21:上記式AN1で表される化合物と、上記式DA5で表される化合物とに基づく単位を含むポリイミド(イミド化率:50%以上)
PI22:上記式AN6で表される化合物と、脂肪族ジアミンとに基づく単位を含むポリイミド(イミド化率:50%以上)
PI23:上記式AN1で表される化合物と、上記式DA5で表される化合物とに基づく単位を含むポリイミド(イミド化率:5%)
PA21:上記式AN1で表される化合物と、上記式DA5で表される化合物とに基づく単位を含むポリアミック酸(イミド化率:0%)
[PI or polyamic acid]
PI21: Polyimide containing units based on the compound represented by the above formula AN1 and the compound represented by the above formula DA5 (imidization rate: 50% or more)
PI22: Polyimide containing a compound represented by the above formula AN6 and a unit based on an aliphatic diamine (imidization rate: 50% or more)
PI23: Polyimide containing units based on the compound represented by the above formula AN1 and the compound represented by the above formula DA5 (imidization rate: 5%)
PA21: Polyamic acid containing units based on the compound represented by the above formula AN1 and the compound represented by the above formula DA5 (imidization rate: 0%)
[非プロトン性極性液状分散媒]
NMP:N-メチル-2-ピロリドン
[界面活性剤]
界面活性剤21:ペルフルオロアルキル基を有するメタクリレートと、水酸基及びオキシメチレン基を有するメタアクリレートのコポリマー
[Aprotic polar liquid dispersion medium]
NMP: N-methyl-2-pyrrolidone [surfactant]
Surfactant 21: Copolymer of methacrylate having a perfluoroalkyl group and methacrylate having a hydroxyl group and an oxymethylene group
なお、PI又はポリアミック酸のイミド化率は、以下の方法にしたがって測定した。
溶媒としてジメチルスルホキシド-d6を用いて、それぞれのPI溶液又はポリアミック酸溶液の1H-NMRを測定し、芳香族プロトンのピークの積分値とカルボン酸プロトンのピークの積分値との比から、下記式(I)に従ってイミド化率を算出した。
イミド化率(%)={1-(Y/Z)×(1/X)}×100 ・・・ (I)
X:モノマーの仕込み量から求められる、イミド化率0%の場合のカルボン酸プロトンピークの積分値/芳香族プロトンピークの積分値
Y:1H-NMR測定から得られるカルボン酸プロトンピークの積分値
Z:1H-NMR測定から得られる芳香族プロトンピークの積分値
The imidization rate of PI or polyamic acid was measured according to the following method.
Using dimethylsulfoxide- d6 as a solvent, 1 H-NMR of each PI solution or polyamic acid solution was measured, and the imidization rate was calculated according to the following formula (I) from the ratio of the integral value of the aromatic proton peak to the integral value of the carboxylic acid proton peak.
Imidization rate (%)={1-(Y/Z)×(1/X)}×100 (I)
X: integral value of carboxylic acid proton peak/integral value of aromatic proton peak when imidization rate is 0%, determined from the amount of monomer charged. Y: integral value of carboxylic acid proton peak obtained from 1 H-NMR measurement. Z: integral value of aromatic proton peak obtained from 1 H-NMR measurement.
2-2.液状組成物の製造
(例21)
ポットに、NMP(64質量部)と界面活性剤21(3質量部)とを入れて溶液とした後、パウダー21(30質量部)及びPI21(3質量部)とを入れた。その後、ジルコニアボールを投入し、150rpmにて1時間、ポットを転がして、パウダー21が分散した液状組成物21を製造した。
(例22)
ポットに、NMPと界面活性剤21とを入れて溶液とした後、パウダー21を入れ、150rpmにて1時間、ポットを転がして、パウダー21が分散した分散液を調製した。この分散液と、PI22のワニスとを混合して、パウダー21及びPI22を、それぞれ30質量%含む、パウダー21が分散した液状組成物22を製造した。
(例23)
PI21に代えてPI23を使用した以外は、液状組成物21と同様にして、液状組成物23を得た。
2-2. Preparation of liquid composition (Example 21)
NMP (64 parts by mass) and surfactant 21 (3 parts by mass) were added to a pot to prepare a solution, and then Powder 21 (30 parts by mass) and PI 21 (3 parts by mass) were added. Zirconia balls were then added, and the pot was rolled at 150 rpm for 1 hour to produce liquid composition 21 in which Powder 21 was dispersed.
(Example 22)
NMP and surfactant 21 were added to a pot to prepare a solution, and then powder 21 was added and the pot was rolled at 150 rpm for 1 hour to prepare a dispersion liquid in which powder 21 was dispersed. This dispersion liquid was mixed with a varnish of PI22 to produce a liquid composition 22 in which powder 21 was dispersed, containing 30 mass% each of powder 21 and PI22.
(Example 23)
Liquid composition 23 was obtained in the same manner as liquid composition 21, except that PI23 was used instead of PI21.
(例24)
パウダー21に代えてパウダー22を使用した以外は、液状組成物21と同様にして、液状組成物24を得た。
(例25)
PI21に代えてPA21を使用した以外は、液状組成物24と同様にして、液状組成物25を得た。
(Example 24)
Liquid composition 24 was obtained in the same manner as liquid composition 21, except that powder 22 was used instead of powder 21.
(Example 25)
Liquid composition 25 was obtained in the same manner as liquid composition 24, except that PA21 was used instead of PI21.
各液状組成物を長期保存後、その分散状態を目視にて確認し、下記の基準に従って、分散性を評価した。
A:軽く撹拌するだけで、均一に再分散した。
B:せん断をかけて撹拌すると、均一に再分散した。
C:せん断をかけて撹拌下では、均一に再分散するが、不均化した。
結果をまとめて、以下の表3に示す。
After long-term storage of each liquid composition, the dispersion state was visually confirmed, and the dispersibility was evaluated according to the following criteria.
A: It was uniformly redispersed with only light stirring.
B: When stirred with shear, it was uniformly redispersed.
C: When stirred with shear, the particles were uniformly redispersed, but were disproportionated.
The results are summarized in Table 3 below.
2-3.積層体の製造
厚さ50μmの芳香族ポリイミドフィルム(SKC Kolon PI社製、品番「FS-200」)を用意した。このフィルムの一方の面に、液状組成物21を小径グラビアリバース法で塗布し、通風乾燥炉(炉温:150℃)に3分間で通過させて、NMPを除去して乾燥被膜を形成した。さらに、フィルムの他方の面にも、同様に、液状組成物21を塗布、乾燥し、乾燥被膜を形成した。
次いで、両面に乾燥被膜が形成されたフィルムを、遠赤外線炉(炉温:380℃)に20分間で通過させて、パウダー(Fポリマー)を溶融焼成した。これにより、両面に、Fポリマー21及びPI21を含むF層(厚さ:25μm)が形成された芳香族ポリイミドフィルム、すなわち積層体21を得た。積層体21の線膨張係数の絶対値は25ppm/℃以下であり、接着性と電気特性(低誘電率性及び低誘電正接性)とを具備していた。
2-3. Manufacturing of Laminate An aromatic polyimide film (manufactured by SKC Kolon PI, product number "FS-200") having a thickness of 50 μm was prepared. Liquid composition 21 was applied to one side of this film by a small diameter gravure reverse method, and the film was passed through a ventilation drying oven (oven temperature: 150° C.) for 3 minutes to remove NMP and form a dry film. Furthermore, liquid composition 21 was similarly applied to the other side of the film and dried to form a dry film.
Next, the film with the dry coating formed on both sides was passed through a far-infrared oven (oven temperature: 380°C) for 20 minutes to melt and bake the powder (F polymer). This resulted in an aromatic polyimide film with F layers (thickness: 25 μm) containing F polymer 21 and PI 21 formed on both sides, i.e., laminate 21. The absolute value of the linear expansion coefficient of laminate 21 was 25 ppm/°C or less, and it had adhesiveness and electrical properties (low dielectric constant and low dielectric loss tangent).
積層体21の両面に銅箔21(厚さが12μmかつ表面の十点平均粗さが0.08μmである低粗化電解銅箔)を配し、340℃にて20分間、真空下でプレスすると、両面銅張積層体21が得られた。両面銅張積層体21は、各層が強固に接着されており、288℃のはんだ浴に60秒間、10回浮かべる、はんだリフロー試験に供しても、上記層の界面に膨れ及び剥離のいずれも発生しなかった。
両面銅張積層体21に対して、UV-YAGレーザー(レーザー出力:1.5W、レーザー焦点径:25μm、円周上の周回回数:16回、発振周波数:40kHz)を照射すると、良好な円形の貫通孔を形成できた。
液状組成物21に代えて液状組成物22を使用しても、同等の両面銅張積層体が得られた。
Copper foil 21 (low-roughening electrolytic copper foil having a thickness of 12 μm and a surface ten-point average roughness of 0.08 μm) was placed on both sides of the laminate 21, and pressed under vacuum at 340° C. for 20 minutes to obtain a double-sided copper-clad laminate 21. Each layer of the double-sided copper-clad laminate 21 was firmly bonded, and even when subjected to a solder reflow test in which the laminate was floated in a solder bath at 288° C. for 60 seconds 10 times, no blistering or peeling occurred at the interface of the layers.
When the double-sided copper-clad laminate 21 was irradiated with a UV-YAG laser (laser output: 1.5 W, laser focal diameter: 25 μm, number of revolutions on the circumference: 16, oscillation frequency: 40 kHz), a good circular through hole could be formed.
When Liquid Composition 22 was used instead of Liquid Composition 21, a similar double-sided copper-clad laminate was obtained.
また、銅箔21の表面に、液状組成物22を塗工して加熱すると、銅箔21及びF層を、この順で有する積層体が得られた。この積層体は、銅箔21の表面にポリマー層が強固に接着積層されるとともに、反りの発生が抑制されており、高い接着性と優れた電気特性(低誘電率性及び低誘電正接性)とを具備していた。Furthermore, when the liquid composition 22 was applied to the surface of the copper foil 21 and heated, a laminate having the copper foil 21 and the F layer in this order was obtained. In this laminate, the polymer layer was firmly adhered to the surface of the copper foil 21, the occurrence of warping was suppressed, and the laminate had high adhesion and excellent electrical properties (low dielectric constant and low dielectric tangent).
3.液状組成物の製造例及びその評価例(その3)
3-1.各成分の準備
[Fポリマー]
Fポリマー31:TFE単位、NAH単位及びPPVE単位を、この順に98.0モル%、0.1モル%、1.9モル%で含有し、極性官能基を有するポリマー(溶融温度:300℃、ガラス転移点:95℃)
Fポリマー32:TFE単位及びPPVE単位を、この順に97.5モル%、2.5モル%で含有し、極性官能基を有さないポリマー(溶融温度:305℃、ガラス転移点:85℃)
[パウダー]
パウダー31:Fポリマー31からなるパウダー(D50:1.7μm)
パウダー32:Fポリマー32からなるパウダー(D50:3.2μm)
3. Example of production of liquid composition and evaluation thereof (part 3)
3-1. Preparation of each component [F polymer]
F polymer 31: A polymer containing 98.0 mol%, 0.1 mol%, and 1.9 mol% of TFE units, NAH units, and PPVE units, in that order, and having a polar functional group (melting temperature: 300° C., glass transition point: 95° C.)
F polymer 32: A polymer containing 97.5 mol% TFE units and 2.5 mol% PPVE units, in that order, and having no polar functional groups (melting temperature: 305° C., glass transition point: 85° C.)
[powder]
Powder 31: Powder made of F polymer 31 (D50: 1.7 μm)
Powder 32: Powder made of F polymer 32 (D50: 3.2 μm)
[AR類]
PI31:上記式AN1で表される化合物と、上記式DA5で表される化合物とに基づく単位を含むポリイミド(イミド化率:50%以上)
PI32:上記式AN6で表される化合物と、脂肪族ジアミンとに基づく単位を含むポリイミド(イミド化率:50%以上)
PA31:上記式AN1で表される化合物と、上記式DA5で表される化合物とに基づく単位を含むポリアミック酸(イミド化率:0%)
PES31:2-ヒドロキシ-6-ナフトエ酸(HNA)、4-ヒドロキシアセトアニリド(APAP)、イソフタル酸(IPA)、ジフェニルエーテル-4,4’-ジカルボン酸(DEDA)及び無水酢酸を反応させて得られる芳香族性ポリエステル(液晶ポリエステル)
[ARs]
PI31: Polyimide containing units based on the compound represented by the above formula AN1 and the compound represented by the above formula DA5 (imidization rate: 50% or more)
PI32: Polyimide containing a unit based on the compound represented by the above formula AN6 and an aliphatic diamine (imidization rate: 50% or more)
PA31: Polyamic acid containing units based on the compound represented by the above formula AN1 and the compound represented by the above formula DA5 (imidization rate: 0%)
PES31: Aromatic polyester (liquid crystal polyester) obtained by reacting 2-hydroxy-6-naphthoic acid (HNA), 4-hydroxyacetanilide (APAP), isophthalic acid (IPA), diphenyl ether-4,4'-dicarboxylic acid (DEDA) and acetic anhydride.
[非プロトン性極性液状分散媒]
NMP:N-メチル-2-ピロリドン
[無機フィラー]
フィラー31:アミノシランカップリング剤で表面処理された平均粒子径が0.5μmのシリカフィラー(アドマテックス社製、商品名「アドマファインSO-C2」)
[Aprotic polar liquid dispersion medium]
NMP: N-methyl-2-pyrrolidone [inorganic filler]
Filler 31: Silica filler having an average particle size of 0.5 μm that has been surface-treated with an aminosilane coupling agent (manufactured by Admatechs Co., Ltd., product name "Admafine SO-C2")
[界面活性剤]
CH2=C(CH3)C(O)OCH2CH2(CF2)6Fと、式CH2=C(CH3)C(O)(OCH2CH2)xOHで表される化合物(ただし、xは、1、10又は23である。)の少なくとも1種とのコポリマーであって、下記表4に示す、フッ素含有量、水酸基価、及びオキシエチレン基の含有量を有する3種類の界面活性剤
[Surfactant]
Three types of surfactants are copolymers of CH2 =C( CH3 )C(O) OCH2CH2 ( CF2 ) 6F and at least one compound represented by the formula CH2 =C( CH3 )C(O)( OCH2CH2 ) xOH (wherein x is 1, 10 or 23), and have the fluorine content, hydroxyl value and oxyethylene group content shown in Table 4 below.
なお、PI又はポリアミック酸のイミド化率は、2-1と同様の方法で測定した。The imidization rate of PI or polyamic acid was measured in the same manner as in 2-1.
また、PES31は、以下の方法によって調製した。
窒素ガス雰囲気下の反応器に、HNA、APAP、IPA、DEDA及び無水酢酸(1.1モル)を、この順に21モル%、13モル%、2モル%、11モル%、52モル%の割合で仕込み、撹拌下に還流保持(150℃、3時間)した。さらに、低沸成分(副生酢酸、未反応の無水酢酸等)を留去しつつ320℃にて反応を継続した(昇温時間:170分)。反応器内のトルクが上昇した時点を反応終了とし、その内容物を取り出し、冷却して粉砕した。粉砕物をさらに、窒素ガス雰囲気下にて、240℃にて3時間保持し、固相反応させてPES31を得た。
In addition, PES31 was prepared by the following method.
In a reactor under a nitrogen gas atmosphere, HNA, APAP, IPA, DEDA and acetic anhydride (1.1 mol) were charged in the following order: 21 mol%, 13 mol%, 2 mol%, 11 mol%, 52 mol%, and refluxed under stirring (150 ° C, 3 hours). Furthermore, the reaction was continued at 320 ° C while distilling off low boiling components (by-product acetic acid, unreacted acetic anhydride, etc.) (temperature rise time: 170 minutes). The reaction was terminated when the torque in the reactor increased, and the contents were removed, cooled and pulverized. The pulverized product was further held at 240 ° C for 3 hours under a nitrogen gas atmosphere and subjected to a solid-phase reaction to obtain PES31.
3-2.液状組成物の製造
(例31)
ポットに、NMP(64質量部)と界面活性剤31(3質量部)とを入れて溶液とした後、パウダー31(30質量部)及びPI31(3質量部)とを入れた。その後、ジルコニアボールを投入し、150rpmにて1時間、ポットを転がして、パウダー31が分散した液状組成物31を製造した。
(例32)
ポットに、NMPと界面活性剤31とを入れて溶液とした後、パウダー31を入れ、150rpmにて1時間、ポットを転がして、パウダー31が分散した分散液を調製した。この分散液と、PI32のワニスと、フィラー31とを混合して、パウダー31、PI32及びフィラー31とを、この順に、30質量%、30質量%、1質量%含む、パウダー31が分散した液状組成物2を製造した。
3-2. Production of liquid composition (Example 31)
NMP (64 parts by mass) and surfactant 31 (3 parts by mass) were added to a pot to prepare a solution, and then Powder 31 (30 parts by mass) and PI 31 (3 parts by mass) were added. Zirconia balls were then added, and the pot was rolled at 150 rpm for 1 hour to produce liquid composition 31 in which Powder 31 was dispersed.
(Example 32)
NMP and surfactant 31 were added to a pot to prepare a solution, and then powder 31 was added and the pot was rolled at 150 rpm for 1 hour to prepare a dispersion liquid in which powder 31 was dispersed. This dispersion liquid, a varnish of PI 32, and filler 31 were mixed to produce liquid composition 2 in which powder 31 was dispersed, containing 30% by mass, 30% by mass, and 1% by mass of powder 31, PI 32, and filler 31, in that order.
(例33)
ポットに、NMPと界面活性剤31とを入れて溶液とした後、パウダー31を入れ、150rpmにて1時間、ポットを転がして、パウダー31が分散した分散液を調製した。この分散液と、PES31のワニス(PES31を10質量%含むNMP溶液)と、フィラー31とを混合して、パウダー31、PES31及びフィラー31を、それぞれ15質量%含む、パウダー31が分散した液状組成物33を製造した。
(例34)
パウダー31に代えてパウダー32を使用した以外は、液状組成物31と同様にして、液状組成物34を得た。
(Example 33)
NMP and surfactant 31 were added to a pot to prepare a solution, and then powder 31 was added and the pot was rolled at 150 rpm for 1 hour to prepare a dispersion in which powder 31 was dispersed. This dispersion, a varnish of PES31 (an NMP solution containing 10% by mass of PES31), and filler 31 were mixed to produce liquid composition 33 in which powder 31 was dispersed, containing 15% by mass each of powder 31, PES31, and filler 31.
(Example 34)
Liquid composition 34 was obtained in the same manner as liquid composition 31, except that powder 32 was used instead of powder 31.
(例35)
PI31に代えてPA31を使用した以外は、液状組成物34と同様にして、液状組成物35を得た。
(例36)
パウダー32の量を30質量部に、PI31の量を30質量部に変更した以外は、液状組成物34と同様にして、液状組成物36を得た。
(例37)
パウダー32の量を20質量部に、PI31の量を40質量部に変更した以外は、液状組成物36と同様にして、液状組成物37を得た。
(Example 35)
Liquid composition 35 was obtained in the same manner as liquid composition 34, except that PA31 was used instead of PI31.
(Example 36)
Liquid composition 36 was obtained in the same manner as liquid composition 34, except that the amount of powder 32 was changed to 30 parts by mass and the amount of PI 31 was changed to 30 parts by mass.
(Example 37)
Liquid composition 37 was obtained in the same manner as liquid composition 36, except that the amount of powder 32 was changed to 20 parts by mass and the amount of PI 31 was changed to 40 parts by mass.
(例38)
界面活性剤31に代えて界面活性剤32を使用した以外は、液状組成物35と同様にして、液状組成物38を得た。
(例39)
界面活性剤31に代えて界面活性剤33を使用した以外は、液状組成物35と同様にして、液状組成物39を得た。
(Example 38)
Liquid composition 38 was obtained in the same manner as liquid composition 35, except that surfactant 32 was used instead of surfactant 31.
(Example 39)
Liquid composition 39 was obtained in the same manner as liquid composition 35, except that surfactant 33 was used instead of surfactant 31.
各液状組成物を長期保存後、その分散状態を目視にて確認し、下記の基準に従って、分散性を評価した。
A:軽く撹拌するだけで、均一に再分散した。
B:せん断をかけた撹拌すると、均一に再分散した。
C:せん断をかけた撹拌下では、均一に再分散するが、不均化した。
D:せん断をかけた撹拌下では、均一に再分散するが、増粘して不均化した。
E:せん断をかけた撹拌下では、ハードケーキ化して、再分散が困難である。
結果をまとめて、以下の表5に示す。
After long-term storage of each liquid composition, the dispersion state was visually confirmed, and the dispersibility was evaluated according to the following criteria.
A: It was uniformly redispersed with only light stirring.
B: When stirred with shear, it was uniformly redispersed.
C: When stirred with shear, the material was uniformly redispersed, but was disproportionated.
D: When stirred with shear, the mixture was uniformly redispersed, but the viscosity increased and the mixture became non-proportionate.
E: When stirred with shear, the mixture turns into a hard cake and is difficult to redisperse.
The results are summarized in Table 5 below.
3-3.剥離強度の測定
厚さ50μmの芳香族ポリイミドフィルム(SKC Kolon PI社製、品番「FS-200」)を用意した。このフィルムの一方の面に、液状組成物31を小径グラビアリバース法で塗布し、通風乾燥炉(炉温:150℃)に3分間で通過させて、NMPを除去して乾燥被膜を形成した。さらに、フィルムの他方の面にも、同様に、液状組成物31を塗布、乾燥し、乾燥被膜を形成した。
次いで、両面に乾燥被膜が形成されたフィルムを、遠赤外線炉(炉温:380℃)に20分間で通過させて、パウダー(Fポリマー)を溶融焼成した。これにより、両面に、Fポリマー31及びPI31を含むF層(厚さ:25μm)が形成された芳香族ポリイミドフィルム、すなわち積層体31を得た。積層体31の線膨張係数の絶対値は25ppm/℃以下であり、接着性と電気特性(低誘電率性及び低誘電正接性)とを具備していた。
3-3. Measurement of peel strength An aromatic polyimide film (manufactured by SKC Kolon PI, product number "FS-200") having a thickness of 50 μm was prepared. The liquid composition 31 was applied to one side of this film by a small diameter gravure reverse method, and the film was passed through a ventilation drying oven (oven temperature: 150° C.) for 3 minutes to remove NMP and form a dry coating. Furthermore, the liquid composition 31 was similarly applied to the other side of the film and dried to form a dry coating.
Next, the film with the dry coating formed on both sides was passed through a far-infrared oven (oven temperature: 380°C) for 20 minutes to melt and bake the powder (F polymer). This resulted in an aromatic polyimide film with F layers (thickness: 25 μm) containing F polymer 31 and PI 31 formed on both sides, i.e., laminate 31. The absolute value of the linear expansion coefficient of laminate 31 was 25 ppm/°C or less, and it had adhesiveness and electrical properties (low dielectric constant and low dielectric loss tangent).
積層体31の両面に銅箔31(厚さが12μmかつ表面の十点平均粗さが0.08μmである低粗化電解銅箔)を配し、340℃にて20分間、真空下でプレスすると、両面銅張積層体31が得られた。両面銅張積層体31は、各層が強固に接着されており、288℃のはんだ浴に60秒間、10回浮かべる、はんだリフロー試験に供しても、上記層の界面に膨れ及び剥離のいずれも発生しなかった。
両面銅張積層体31に対して、UV-YAGレーザー(レーザー出力:1.5W、レーザー焦点径:25μm、円周上の周回回数:16回、発振周波数:40kHz)を照射すると、良好な円形の貫通孔を形成できた。
液状組成物31に代えて液状組成物32を使用しても、同等の両面銅張積層体が得られた。
Copper foil 31 (low-roughening electrolytic copper foil having a thickness of 12 μm and a surface ten-point average roughness of 0.08 μm) was placed on both sides of the laminate 31, and pressed under vacuum at 340° C. for 20 minutes to obtain a double-sided copper-clad laminate 31. Each layer of the double-sided copper-clad laminate 31 was firmly bonded, and even when subjected to a solder reflow test in which the laminate was floated in a solder bath at 288° C. for 60 seconds 10 times, no blistering or peeling occurred at the interface of the layers.
When the double-sided copper-clad laminate 31 was irradiated with a UV-YAG laser (laser output: 1.5 W, laser focal diameter: 25 μm, number of revolutions on the circumference: 16, oscillation frequency: 40 kHz), a good circular through hole could be formed.
When Liquid Composition 32 was used instead of Liquid Composition 31, a similar double-sided copper-clad laminate was obtained.
また、銅箔31の表面に、液状組成物32を塗工して加熱すると、銅箔31及びF層を、この順で有する積層体が得られた。この積層体は、銅箔31の表面にポリマー層が強固に接着積層されるとともに、反りの発生が抑制されており、高い接着性と優れた電気特性(低誘電率性及び低誘電正接性)とを具備していた。Furthermore, when the liquid composition 32 was applied to the surface of the copper foil 31 and heated, a laminate having the copper foil 31 and the F layer in this order was obtained. In this laminate, the polymer layer was firmly adhered to the surface of the copper foil 31, warping was suppressed, and the laminate had high adhesion and excellent electrical properties (low dielectric constant and low dielectric tangent).
4.液状組成物の製造例及びその評価例(その4)
4-1.各成分の準備
[Fポリマー]
Fポリマー41:TFE単位、NAH単位及びPPVE単位を、この順に98.0モル%、0.1モル%、1.9モル%で含有し、極性官能基を有するポリマー(溶融温度:300℃、ガラス転移点:95℃)
Fポリマー42:TFE単位及びPPVE単位を、この順に97.5モル%、2.5モル%で含有し、極性官能基を有さないポリマー(溶融温度:305℃、ガラス転移点:85℃)
[パウダー]
パウダー41:Fポリマー1からなるパウダー(D50:1.7μm)
パウダー42:Fポリマー2からなるパウダー(D50:3.2μm)
4. Example of production of liquid composition and evaluation thereof (part 4)
4-1. Preparation of each component [F polymer]
F polymer 41: A polymer containing 98.0 mol%, 0.1 mol%, and 1.9 mol% of TFE units, NAH units, and PPVE units, in that order, and having a polar functional group (melting temperature: 300° C., glass transition point: 95° C.)
F Polymer 42: A polymer containing 97.5 mol% TFE units and 2.5 mol% PPVE units, in that order, and having no polar functional groups (melting temperature: 305° C., glass transition point: 85° C.)
[powder]
Powder 41: Powder made of F polymer 1 (D50: 1.7 μm)
Powder 42: Powder made of F polymer 2 (D50: 3.2 μm)
[PI類]
PI41:上記式AN1で表される化合物と、上記式DA5で表される化合物とに基づく単位を含むポリイミド
PA41:上記式AN1で表される化合物と、上記式DA5で表される化合物とに基づく単位を含むポリアミック酸
[非水系液状分散媒]
NMP:N-メチル-2-ピロリドン
[界面活性剤]
界面活性剤41:CH2=C(CH3)C(O)OCH2CH2(CF2)6FとCH2=C(CH3)C(O)(OCH2CH2)23OHのコポリマー
[PIs]
PI41: Polyimide containing units based on the compound represented by the above formula AN1 and the compound represented by the above formula DA5 PA41: Polyamic acid containing units based on the compound represented by the above formula AN1 and the compound represented by the above formula DA5 [Non-aqueous liquid dispersion medium]
NMP: N-methyl-2-pyrrolidone [surfactant]
Surfactant 41: Copolymer of CH2 =C( CH3 )C(O) OCH2CH2 ( CF2 ) 6F and CH2 =C( CH3 )C( O )( OCH2CH2 ) 23OH
4-2.液状組成物の製造
(例41)
ポットに、NMPと界面活性剤41とを入れて溶液とした後、パウダー41及びPI41のワニス(溶媒:NMP)とを入れた。その後、ジルコニアボールを投入し、150rpmにて1時間、ポットを転がして、NMP、界面活性剤41、パウダー41及びPI41をこの順に、57質量部、3質量部、25質量部、15質量部含み、パウダー41が分散した液状組成物41を製造した。なお、液状組成物41における含水量は、8000ppmに調整した。
(例42)
パウダー41をパウダー42に変更した以外は、例41と同様にして、液状組成物42を得た。なお、液状組成物42における含水量は、8000ppmに調整した。
4-2. Preparation of liquid composition (Example 41)
NMP and surfactant 41 were added to a pot to prepare a solution, and then powder 41 and a varnish of PI 41 (solvent: NMP) were added. Zirconia balls were then added, and the pot was rolled at 150 rpm for 1 hour to produce a liquid composition 41 containing 57 parts by mass of NMP, surfactant 41, powder 41, and PI 41 in that order, 3 parts by mass, 25 parts by mass, and 15 parts by mass of PI 41, with powder 41 dispersed therein. The water content in the liquid composition 41 was adjusted to 8000 ppm.
(Example 42)
Liquid composition 42 was obtained in the same manner as in Example 41, except that Powder 41 was changed to Powder 42. The water content in Liquid composition 42 was adjusted to 8000 ppm.
(例43)
界面活性剤41を使用しなかった以外は、例42と同様にして、NMP、パウダー42及びPI41をこの順に、60質量部、25質量部、15質量部含み、パウダー42が分散した液状組成物43を製造した。なお、液状組成物43における含水量は、8000ppmに調整した。
(例44)
含水量を60000ppmに調整した以外は、例42と同様にして、液状組成物44を得た。
(Example 43)
A liquid composition 43 containing 60 parts by mass, 25 parts by mass, and 15 parts by mass of NMP, powder 42, and PI 41, in that order, and having powder 42 dispersed therein, was produced in the same manner as in Example 42, except that surfactant 41 was not used. The water content in liquid composition 43 was adjusted to 8000 ppm.
(Example 44)
Liquid composition 44 was obtained in the same manner as in Example 42, except that the water content was adjusted to 60,000 ppm.
(例45)
含水量を800ppmに調整した以外は、例42と同様にして、液状組成物45を得た。
(例46)
PI41をPA41に変更した以外は、例41と同様にして、液状組成物46を得た。なお、液状組成物46における含水量は、20000ppmであった。
(Example 45)
Liquid composition 45 was obtained in the same manner as in Example 42, except that the water content was adjusted to 800 ppm.
(Example 46)
Except for changing PI 41 to PA 41, the same procedure as in Example 41 was followed to obtain Liquid Composition 46. The water content in Liquid Composition 46 was 20,000 ppm.
4-3.液状組成物の評価
各液状組成物を長期間保存した後、その分散状態を目視にて確認し、下記の基準に従って、分散性を評価した。
A:軽く撹拌するだけで、均一に再分散した。
B:せん断をかけて撹拌すると、均一に再分散した。
C:せん断をかけて撹拌下では、均一に再分散するが、不均化した。
結果をまとめて、以下の表6に示す。
4-3. Evaluation of Liquid Compositions After storing each liquid composition for a long period of time, the dispersion state was visually confirmed, and the dispersibility was evaluated according to the following criteria.
A: It was uniformly redispersed with only light stirring.
B: When stirred with shear, it was uniformly redispersed.
C: When stirred with shear, the particles were uniformly redispersed, but were disproportionated.
The results are summarized in Table 6 below.
4-4.積層体の製造
厚さ50μmの芳香族ポリイミドフィルム(SKC Kolon PI社製、品番「FS-200」)を用意した。このフィルムの一方の面に、各液状組成物を小径グラビアリバース法で塗布し、通風乾燥炉(炉温:150℃)に3分間で通過させて、NMPを除去して乾燥被膜を形成した。さらに、フィルムの他方の面にも、同様に、各液状組成物を塗布、乾燥し、乾燥被膜を形成した。
次いで、両面に乾燥被膜が形成されたフィルムを、遠赤外線炉(炉温:380℃)に20分間で通過させて、パウダー(Fポリマー)を溶融焼成した。これにより、両面にポリマー層(厚さ:8μm)が形成された芳香族性ポリイミドフィルム、すなわち積層体41を得た。
4-4. Manufacturing of Laminate An aromatic polyimide film (manufactured by SKC Kolon PI, product number "FS-200") having a thickness of 50 μm was prepared. Each liquid composition was applied to one side of this film by a small diameter gravure reverse method, and the film was passed through a ventilation drying oven (oven temperature: 150° C.) for 3 minutes to remove NMP and form a dry film. Furthermore, each liquid composition was similarly applied to the other side of the film and dried to form a dry film.
Next, the film with the dry coating formed on both sides was passed through a far-infrared oven (oven temperature: 380° C.) for 20 minutes to melt and bake the powder (F polymer). As a result, an aromatic polyimide film with a polymer layer (thickness: 8 μm) formed on both sides, i.e., a laminate 41, was obtained.
4-5.積層体の評価
各積層体が有するポリマー層の表面について、10cm×10cmの範囲に存在する穴の数を目視にてカウントし、下記の基準に従って、欠陥の程度を評価した。
A:穴の数が10個未満であった。
B:穴の数が10個以上25個未満であった。
C:穴の数が25個以上であった。
結果をまとめて、以下の表7に示す。
4-5. Evaluation of Laminates The number of holes present in an area of 10 cm x 10 cm on the surface of the polymer layer of each laminate was visually counted, and the degree of defects was evaluated according to the following criteria.
A: The number of holes was less than 10.
B: The number of holes was 10 or more and less than 25.
C: The number of holes was 25 or more.
The results are summarized in Table 7 below.
本発明の液状組成物は、分散性に優れ、テトラフルオロエチレン系ポリマー及びアミド構造、イミド構造又はエステル構造と芳香族環構造とを主鎖に有するポリマーに基づく特性(電気特性、UV加工性、低吸水率等)に優れる成形物を形成できる。本発明の液状組成物は、プリント基板材料として好適である。The liquid composition of the present invention has excellent dispersibility and can form molded products that have excellent properties (electrical properties, UV processability, low water absorption, etc.) based on tetrafluoroethylene polymers and polymers having an amide structure, an imide structure or an ester structure and an aromatic ring structure in the main chain. The liquid composition of the present invention is suitable as a printed circuit board material.
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JP2015034289A (en) | 2013-07-09 | 2015-02-19 | 宇部興産株式会社 | Aggregates of mixed powder containing polyimide, and molded body using the same |
JP2018002980A (en) | 2016-07-08 | 2018-01-11 | 三菱鉛筆株式会社 | Polyimide precursor solution composition and polyimide film using the same |
JP2018141053A (en) | 2017-02-27 | 2018-09-13 | 味の素株式会社 | Resin composition |
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