JP7444639B2 - Substrate processing equipment - Google Patents

Description

The present invention relates to a substrate processing apparatus.

A substrate processing apparatus including a processing unit and an exhaust switching device has been proposed (see, for example, Patent Document 1). Exhaust gas discharged from the processing unit flows into the exhaust gas switching device via an upstream exhaust pipe. The exhaust gas switching device is connected to multiple types of exhaust treatment equipment via different downstream exhaust pipes. The exhaust gas switching device discharges exhaust gas to one of multiple types of exhaust treatment equipment. Specifically, the exhaust gas switching device switches the exhaust destination according to the type of exhaust gas.

Japanese Patent Application Publication No. 2014-197592

However, in a substrate processing apparatus equipped with an exhaust switching device, when a process using an acidic chemical solution and a process using an alkaline chemical solution are executed in the processing unit, crystals (salts) accumulate in the upstream exhaust pipe. there is a possibility. If crystals are deposited on the upstream exhaust pipe, the flow of gas in the upstream exhaust pipe is obstructed by the crystals, so the upstream exhaust pipe must be cleaned periodically, and there is room for improvement in convenience.

The present invention has been made in view of the above problems, and an object thereof is to provide a substrate processing apparatus in which crystals (salts) are less likely to be generated in the exhaust pipe.

According to one aspect of the present invention, a substrate processing apparatus processes a substrate. The substrate processing apparatus includes a substrate holding section, a substrate rotation section, a processing liquid supply section, a first guard, an exhaust section, a first cup section, a second cup section, a moving mechanism, and a control section. Equipped with. The substrate holding section holds the substrate horizontally. The substrate rotating section rotates the substrate and the substrate holding section together about a central axis extending in the vertical direction. The processing liquid supply section supplies a processing liquid to the substrate. The first guard receives the processing liquid scattered from the rotating substrate. The exhaust section has a plurality of downstream exhaust ports. The exhaust part is arranged inside the first guard . The first cup part is disposed between the first guard and the exhaust part. The first cup portion receives the processing liquid scattered from the rotating substrate. The second cup part is disposed between the first cup part and the exhaust part. The second cup portion receives the processing liquid scattered from the rotating substrate. The moving mechanism individually raises and lowers the first guard, the first cup portion, and the second cup portion in the vertical direction. The control unit controls the moving mechanism. The first cup portion has a second guard, a first liquid receiving portion , and a first liquid drain port . The second guard receives the processing liquid. The first liquid receiving portion receives the processing liquid received by the first guard. The first liquid drain port is provided in the first liquid receiving portion. The first liquid drain port discharges the processing liquid from the first liquid receiving portion. The second cup portion includes a third guard, a second liquid receiving portion, a second drain port, a third liquid receiving portion, a third drain port, and an opening/closing portion. The third guard receives the processing liquid. The second liquid receiving portion receives the processing liquid received by the second guard. The second liquid drain port is provided in the second liquid receiving portion. The second liquid drain port discharges the processing liquid from the second liquid receiving portion. The third liquid receiving portion receives the processing liquid received by the third guard. The third liquid drain port is provided in the third liquid receiving section. The third liquid drain port discharges the processing liquid from the third liquid receiving portion. The opening/closing section opens and closes the plurality of downstream exhaust ports. The opening/closing part is connected to the third liquid receiving part. The control unit controls the moving mechanism to individually raise and lower the first guard, the first cup portion, and the second cup portion in the vertical direction, thereby moving the first guard, the second guard, and the second cup portion up and down individually. One of the third guards receives the processing liquid and discharges the processing liquid from one of the first drainage port, the second drainage port, and the third drainage port. At the same time, gas generated from the first liquid receiving portion, the second liquid receiving portion, or the third liquid receiving portion is caused to flow into one of the plurality of downstream exhaust ports.

In one embodiment, the control unit controls the moving mechanism to move the second cup unit up and down in the up and down direction while the substrate rotation unit is rotating the substrate, and moves the second cup unit up and down in the up and down direction. Among the exhaust ports, change the downstream exhaust port to be opened.

In one embodiment, the opening/closing section includes a wall section disposed between the third guard and the exhaust section . The wall portion has a plurality of upstream exhaust ports corresponding to the plurality of downstream exhaust ports, respectively. The control section controls the moving mechanism to move the second cup section up and down in the vertical direction , and connects any one of the plurality of downstream exhaust ports to any one of the plurality of upstream exhaust ports. Selectively overlap one another.

In one embodiment, the control unit adjusts an area where the downstream exhaust port and the upstream exhaust port overlap.

In one embodiment, the plurality of downstream exhaust ports are provided at mutually different positions in the circumferential direction, and the plurality of upstream exhaust ports are provided at mutually different positions in the circumferential direction.

In one embodiment, the plurality of downstream exhaust ports are provided at different positions in the up-down direction.

In one embodiment, the exhaust section further includes a plurality of duct members. Each of the plurality of downstream exhaust ports communicates with the plurality of duct members. At least one of the plurality of downstream exhaust ports includes an upper downstream exhaust port and a lower downstream exhaust port. The upper downstream exhaust port and the lower downstream exhaust port are arranged side by side in the vertical direction. The upper downstream exhaust port is provided above the lower downstream exhaust port. The upper downstream exhaust port and the lower downstream exhaust port communicate with one of the plurality of duct members. The control section controls the moving mechanism to move the second cup section up and down in the vertical direction, thereby switching the destination of the gas among the plurality of duct members.

In one embodiment, the exhaust section further includes a plurality of duct members. Each of the plurality of downstream exhaust ports communicates with the plurality of duct members. At least one of the plurality of downstream exhaust ports includes a large downstream exhaust port and a small downstream exhaust port. The large downstream exhaust port has a larger cross-sectional area than the smaller downstream exhaust port. The large downstream exhaust port and the small downstream exhaust port are arranged side by side in the vertical direction. The large downstream exhaust port and the small downstream exhaust port communicate with one of the plurality of duct members. The control section controls the moving mechanism to move the second cup section up and down in the vertical direction, thereby switching the destination of the gas among the plurality of duct members.

According to the present invention, crystals (salts) are less likely to form in the exhaust pipe.

1 is a schematic diagram of a substrate processing apparatus according to Embodiment 1 of the present invention. 1 is a schematic diagram of a processing unit included in a substrate processing apparatus according to Embodiment 1 of the present invention. 1 is a diagram schematically showing a cross section of a part of a processing unit included in a substrate processing apparatus according to Embodiment 1 of the present invention. It is a figure which shows typically the cross section of a 2nd guard part and an exhaust part. FIG. 3 is a developed view of a side wall and a blocking wall of the exhaust section. FIG. 3 is a diagram schematically showing a cross section of another part of the processing unit included in the substrate processing apparatus according to Embodiment 1 of the present invention. FIG. 3 is a diagram schematically showing a cross section of another part of the processing unit included in the substrate processing apparatus according to Embodiment 1 of the present invention. FIG. 7 is another diagram schematically showing a cross section of the second guard part and the exhaust part. FIG. 7 is another developed view of the side wall and the blocking wall of the exhaust section. FIG. 3 is a diagram schematically showing a cross section of another part of the processing unit included in the substrate processing apparatus according to Embodiment 1 of the present invention. FIG. 3 is a diagram schematically showing a cross section of another part of the processing unit included in the substrate processing apparatus according to Embodiment 1 of the present invention. FIG. 7 is another diagram schematically showing a cross section of the second guard part and the exhaust part. FIG. 7 is another developed view of the side wall and the blocking wall of the exhaust section. FIG. 3 is a diagram schematically showing a cross section of another part of the processing unit included in the substrate processing apparatus according to Embodiment 1 of the present invention. It is a figure showing a guard part and an elevating part. FIG. 3 is a developed view of the side wall of the exhaust section. (a) and (b) are diagrams showing the operation of the second guard section. (a) and (b) are diagrams showing the operation of the second guard section. FIG. 7 is a diagram schematically showing a cross section of a part of a processing unit included in a substrate processing apparatus according to Embodiment 4 of the present invention. FIG. 3 is a developed view of a side wall and a blocking wall of the exhaust section. It is a figure which shows typically the cross section of another part of the processing unit with which the substrate processing apparatus based on Embodiment 4 of this invention is equipped. FIG. 7 is another developed view of the side wall and the blocking wall of the exhaust section. It is a figure which shows typically the cross section of another part of the processing unit with which the substrate processing apparatus based on Embodiment 4 of this invention is equipped. FIG. 7 is another developed view of the side wall and the blocking wall of the exhaust section. FIG. 7 is a diagram schematically showing a cross section of the processing unit in another state. FIG. 7 is another developed view of the side wall and the blocking wall of the exhaust section. FIG. 7 is a diagram schematically showing a cross section of the processing unit in another state. FIG. 7 is another developed view of the side wall and the blocking wall of the exhaust section. It is a figure which shows typically the cross section of a part of processing unit with which the substrate processing apparatus based on Embodiment 5 of this invention is equipped. It is a figure which shows typically the cross section of another part of the processing unit with which the substrate processing apparatus based on Embodiment 5 of this invention is equipped. FIG. 7 is a diagram schematically showing a cross section of the processing unit in another state. It is a figure which shows typically the cross section of another part of the processing unit with which the substrate processing apparatus based on Embodiment 5 of this invention is equipped. FIG. 7 is a diagram schematically showing a cross section of the processing unit in another state. FIG. 7 is a diagram schematically showing a cross section of the processing unit in another state. FIG. 7 is a diagram schematically showing a cross section of a part of a processing unit included in a substrate processing apparatus according to Embodiment 6 of the present invention. It is a figure which shows typically the cross section of another part of the processing unit with which the substrate processing apparatus based on Embodiment 6 of this invention is equipped. FIG. 7 is a diagram schematically showing a cross section of the processing unit in another state. It is a figure showing a guard part, an opening-and-closing part, and an elevating part. FIG. 7 is a diagram schematically showing a cross section of a part of a processing unit included in a substrate processing apparatus according to Embodiment 7 of the present invention. FIG. 3 is a developed view of a side wall and a blocking wall of the exhaust section. It is a figure showing a guard part, an opening-and-closing part, an elevating part, and a rotating part. It is a figure which shows typically a part of processing unit with which the substrate processing apparatus based on Embodiment 8 of this invention is equipped.

Hereinafter, embodiments of a substrate processing apparatus according to the present invention will be described with reference to the drawings. However, the present invention is not limited to the following embodiments. Note that the description may be omitted as appropriate for parts where the description overlaps. Further, in the figures, the same or corresponding parts are given the same reference numerals and the description will not be repeated.

[Embodiment 1]
The substrate processing apparatus 100 of this embodiment will be described below with reference to FIGS. 1 to 15. First, with reference to FIG. 1, a substrate processing apparatus 100 of this embodiment will be described. FIG. 1 is a schematic diagram of a substrate processing apparatus 100 of this embodiment. Specifically, FIG. 1 is a schematic plan view of the substrate processing apparatus 100. The substrate processing apparatus 100 processes a substrate W. More specifically, the substrate processing apparatus 100 is a single-wafer type apparatus that processes the substrates W one by one. In this embodiment, the substrate W is a semiconductor wafer. The substrate W has a substantially disk shape.

As shown in FIG. 1, the substrate processing apparatus 100 includes a plurality of processing units 1, a fluid cabinet 100A, a plurality of fluid boxes 100B, a plurality of load ports LP, an indexer robot IR, a center robot CR, A control device 101 is provided. The control device 101 controls the operation of each part of the substrate processing apparatus 100. For example, the control device 101 controls the load port LP, indexer robot IR, and center robot CR. In this embodiment, the control device 101 includes a control section 102 and a storage section 104.

Each of the load ports LP accommodates a plurality of stacked substrates W. The indexer robot IR transports the substrate W between the load port LP and the center robot CR. The center robot CR transports the substrate W between the indexer robot IR and the processing unit 1. Each of the processing units 1 supplies a processing liquid to the substrate W to process the substrate W. Fluid cabinet 100A accommodates processing liquid.

The plurality of processing units 1 form a plurality of towers TW (four towers TW in FIG. 1) arranged so as to surround the center robot CR in plan view. Each tower TW includes a plurality of processing units 1 (three processing units 1 in FIG. 1) stacked one above the other. Each fluid box 100B corresponds to a plurality of towers TW. The processing liquid in the fluid cabinet 100A is supplied to all processing units 1 included in the tower TW corresponding to the fluid box 100B via one of the fluid boxes 100B. The processing unit 1 will be described later with reference to FIG.

Control unit 102 has a processor. The control unit 102 includes, for example, a CPU (Central Processing Unit) or an MPU (Micro Processing Unit). Alternatively, the control unit 102 may include a general-purpose computing machine.

Storage unit 104 stores data and computer programs. The data includes recipe data. The recipe data includes information indicating multiple recipes. Each of the plurality of recipes defines processing contents and processing procedures for the substrate W.

The storage unit 104 has a main storage device. The main storage device is, for example, a semiconductor memory. The storage unit 104 may further include an auxiliary storage device. The auxiliary storage device includes, for example, at least one of a semiconductor memory and a hard disk drive. Storage unit 104 may include removable media. The control section 102 controls the operation of each section of the substrate processing apparatus 100 based on the computer program and data stored in the storage section 104.

Next, the substrate processing apparatus 100 of this embodiment will be further described with reference to FIGS. 1 and 2. FIG. 2 is a schematic diagram of the processing unit 1 included in the substrate processing apparatus 100 of this embodiment. Specifically, FIG. 2 is a schematic cross-sectional view of the processing unit 1.

As shown in FIG. 2, the processing unit 1 includes a chamber 2, a spin chuck 3, a spin motor part 4, a guard part 5, an elevating part 6, an exhaust part 7, a processing liquid supply part 11, and a third part. A first nozzle moving mechanism 110 and a second nozzle moving mechanism 120 are provided. Further, as shown in FIG. 2, the substrate processing apparatus 100 includes a first supply pipe P1, a first valve V1, a second supply pipe P2, a second valve V2, a third supply pipe P3, and a third supply pipe P1. and a valve V3.

The chamber 2 is a substantially box-shaped housing having an internal space, and the inside and outside of the chamber 2 are partitioned. The chamber 2 is provided with a shutter and its opening/closing mechanism (not shown). Normally, the shutter is closed, and as a result, the atmosphere inside and outside the chamber 2 is blocked. The shutter is opened when the substrate W is carried into the chamber 2 by the center robot CR (FIG. 1) or when the substrate W is carried out from the chamber 2 by the center robot CR (FIG. 1). An FFU unit (fan filter unit) (not shown) is installed in the upper part of the chamber 2, and air from which dust has been removed or inert gas is supplied in a downward flow from the upper part of the chamber 2.

The chamber 2 accommodates one substrate W at a time. The processing unit 1 holds the substrates W horizontally within the chamber 2 and processes the substrates W one by one. The chamber 2 accommodates a spin chuck 3, a spin motor section 4, a guard section 5, an elevating section 6, an exhaust section 7, a processing liquid supply section 11, a first nozzle moving mechanism 110, and a second nozzle moving mechanism 120. . Further, the chamber 2 accommodates a portion of each of the first supply pipe P1 to the third supply pipe P3.

The spin chuck 3 holds the substrate W horizontally. The spin chuck 3 is an example of a substrate holding section. Specifically, the spin chuck 3 includes a plurality of chuck members 31 and a spin base 33. A plurality of chuck members 31 are provided on the spin base 33 along the periphery of the substrate W. The plurality of chuck members 31 hold the substrate W in a horizontal position. The spin base 33 has a substantially disk shape and supports the plurality of chuck members 31 in a horizontal position.

The spin motor section 4 rotates the substrate W and the spin chuck 3 together around the rotation axis AX. The rotation axis AX extends in the vertical direction. In this embodiment, the rotation axis AX extends substantially vertically. The rotation axis AX is an example of a central axis, and the spin motor section 4 is an example of a substrate rotation section. Specifically, the spin motor section 4 rotates the spin base 33 around the rotation axis AX. Therefore, the spin base 33 rotates around the rotation axis AX. As a result, the substrate W held by the plurality of chuck members 31 provided on the spin base 33 rotates about the rotation axis AX.

Specifically, the spin motor section 4 includes a motor main body 41 and a shaft 43. Shaft 43 is coupled to spin base 33. The motor body 41 rotates the shaft 43. As a result, the spin base 33 rotates.

The processing liquid supply unit 11 supplies the processing liquid to the substrate W. In this embodiment, the processing liquid supply unit 11 supplies the first processing liquid, the second processing liquid, and the third processing liquid to the substrate W. More specifically, the processing liquid supply section 11 includes a first nozzle 11a, a second nozzle 11b, and a third nozzle 11c.

The first nozzle 11a supplies the first processing liquid to the substrate W. Specifically, the first nozzle 11a discharges the first processing liquid toward the rotating substrate W. In this embodiment, the first treatment liquid is an acidic chemical liquid. The acidic chemical solution (first treatment solution) may be, for example, DHF (diluted hydrofluoric acid).

The first supply pipe P1 supplies the first processing liquid to the first nozzle 11a. The first supply pipe P1 is a tubular member through which the first treatment liquid flows. The first valve V1 is arranged in the first supply pipe P1. The first valve V1 switches between supplying and stopping the supply of the first processing liquid to the first nozzle 11a. Specifically, when the first valve V1 opens, the first processing liquid is discharged toward the substrate W from the first nozzle 11a. On the other hand, when the first valve V1 is closed, the discharge of the first processing liquid is stopped. Further, the first valve V1 controls the flow rate of the first processing liquid flowing downstream from the first valve V1 in the first supply pipe P1. Specifically, the flow rate of the first processing liquid flowing downstream from the first valve V1 is adjusted according to the opening degree of the first valve V1. The first valve V1 is, for example, a motor valve.

The first nozzle moving mechanism 110 moves the first nozzle 11a in a substantially horizontal direction. Specifically, the first nozzle moving mechanism 110 rotates the first nozzle 11a around a rotation axis extending in a substantially vertical direction. The first nozzle 11a discharges the first processing liquid toward the substrate W while moving (turning). The first nozzle 11a is sometimes called a scan nozzle.

Specifically, the first nozzle moving mechanism 110 includes a nozzle arm 111, a first rotating shaft 113, and a first drive section 115. The nozzle arm 111 extends substantially horizontally. A first nozzle 11a is arranged at the tip of the nozzle arm 111. The nozzle arm 111 is coupled to a first rotation shaft 113. The first rotating shaft 113 extends substantially vertically. The first drive unit 115 rotates the first rotation shaft 113 about a rotation axis that runs substantially vertically, and rotates the nozzle arm 111 about the first rotation shaft 113 along a substantially horizontal plane. As a result, the first nozzle 11a moves along a substantially horizontal plane. Specifically, the first nozzle 11a revolves around the first rotation axis 113. The first drive unit 115 includes, for example, a stepping motor.

The second nozzle 11b supplies the second processing liquid to the substrate W. Specifically, the second nozzle 11b discharges the second processing liquid toward the rotating substrate W. In this embodiment, the second treatment liquid is an alkaline chemical liquid. The alkaline chemical solution (second treatment solution) may be, for example, SC1. Note that SC1 is a liquid mixture containing "NH ₄ OH", "H ₂ O ₂ ", and "H ₂ O".

The second supply pipe P2 supplies the second processing liquid to the second nozzle 11b. The second valve V2 is arranged in the second supply pipe P2. The configurations of the second supply pipe P2 and the second valve V2 are substantially the same as those of the first supply pipe P1 and the first valve V1, so a detailed explanation thereof will be omitted.

The second nozzle moving mechanism 120 moves the second nozzle 11b in a substantially horizontal direction. Specifically, the second nozzle moving mechanism 120 rotates the second nozzle 11b around a rotation axis extending in a substantially vertical direction. The second nozzle 11b discharges the second processing liquid toward the substrate W while moving (turning). The second nozzle 11b is sometimes called a scan nozzle.

Specifically, the second nozzle moving mechanism 120 includes a nozzle arm 121, a second rotation shaft 123, and a second drive section 125. The second drive unit 125 rotates the second rotation shaft 123 about the rotation axis along the substantially vertical direction, and rotates the nozzle arm 121 about the second rotation shaft 123 along the substantially horizontal plane. As a result, the second nozzle 11b rotates around the second rotation axis 123. Note that the configuration of the second nozzle moving mechanism 120 is substantially the same as that of the first nozzle moving mechanism 110, so a detailed explanation thereof will be omitted.

The third nozzle 11c supplies the third processing liquid to the substrate W. Specifically, the third nozzle 11c discharges the third processing liquid toward the rotating substrate W. In this embodiment, the third treatment liquid is an organic chemical liquid. The organic chemical solution (third treatment solution) may be, for example, an organic solvent such as IPA (isopropyl alcohol). The third nozzle 11c discharges the third processing liquid in a stationary state. The third nozzle 11c is sometimes referred to as a fixed nozzle.

The third supply pipe P3 supplies the third processing liquid to the third nozzle 11c. The third valve V3 is arranged in the third supply pipe P3. The configurations of the third supply pipe P3 and the third valve V3 are substantially the same as those of the first supply pipe P1 and the first valve V1, so a detailed explanation thereof will be omitted.

Note that the first nozzle 11a may be a fixed nozzle. Similarly, the second nozzle 11b may be a fixed nozzle. Further, the third nozzle 11c may be a scan nozzle.

The guard part 5 is arranged outside the spin chuck 3 and the spin motor part 4. The guard portion 5 has a substantially cylindrical shape. In other words, the guard section 5 surrounds the spin chuck 3 and the spin motor section 4. The guard portion 5 receives processing liquids (first to third processing liquids) scattered from the rotating substrate W.

Specifically, when the processing liquid is supplied to the substrate W while the substrate W is rotating, the processing liquid supplied to the substrate W is thrown around the substrate W. As a result, the processing liquid is scattered around the substrate W, and the processing liquid scattered from the substrate W is received by the guard portion 5. In this embodiment, the guard part 5 includes a first guard 51, a first cup part 52, and a second cup part 53, which will be described later with reference to FIG. The first guard 51 receives the first processing liquid. The first cup portion 52 receives the second processing liquid. The second cup portion 53 receives the third processing liquid. Details of the guard portion 5 will be described later with reference to FIGS. 3 to 14.

The elevating section 6 individually raises and lowers a first guard 51, a first cup section 52, and a second cup section 53, which will be described later with reference to FIG. 3, in the vertical direction. The elevating section 6 is an example of a moving mechanism. Specifically, the elevating section 6 moves the first guard 51, the first cup section 52, and the second cup section 53 up and down between the liquid receiving position and the retracted position, respectively. The liquid receiving position is above the retracted position.

Specifically, when the substrate W is carried into the chamber 2 by the center robot CR (FIG. 1), or when the substrate W is carried out from the chamber 2 by the center robot CR (FIG. 1), The guard 51, the first cup part 52, and the second cup part 53 are arranged at the retracted position. Further, the first guard 51 is arranged at a liquid receiving position when receiving the first processing liquid. The first cup portion 52 is arranged at a liquid receiving position when receiving the second processing liquid. The second cup portion 53 is arranged at a liquid receiving position when receiving the third processing liquid. Details of the elevating section 6 will be described later with reference to FIG. 15.

The exhaust part 7 is arranged inside the guard part 5. Specifically, the exhaust section 7 is arranged between the spin motor section 4 and the guard section 5. The exhaust section 7 has a substantially cylindrical shape. Gas generated from the processing liquids (first to third processing liquids) in the guard section 5 flows into the exhaust section 7 . Details of the exhaust section 7 will be described later with reference to FIGS. 3 to 14.

The gas that has flowed into the exhaust section 7 is sucked by the exhaust mechanism 8. The exhaust mechanism 8 is arranged outside the substrate processing apparatus 100. Therefore, the gas generated from the processing liquids (first to third processing liquids) is discharged to the outside of the chamber 2 (substrate processing apparatus 100) by the exhaust mechanism 8. The exhaust mechanism 8 includes, for example, a suction pump or an exhaust fan.

Next, the guard section 5 and the exhaust section 7 will be explained with reference to FIGS. 2 and 3. FIG. 3 is a diagram schematically showing a cross section of a part of the processing unit 1 included in the substrate processing apparatus 100 of this embodiment. First, the exhaust section 7 will be explained with reference to FIG. As shown in FIG. 3, the exhaust section 7 includes a side wall 71, a ceiling wall 72, and a first duct member 73. The exhaust mechanism 8 includes a first exhaust mechanism 8a. Further, as shown in FIG. 3, the substrate processing apparatus 100 includes a first exhaust pipe P4.

The side wall 71 is annular and extends substantially vertically. The side wall 71 is disposed outside the spin motor section 4 and surrounds the spin motor section 4 . The lower end of the side wall 71 is connected to the bottom wall 21 of the chamber 2 . In other words, the bottom wall 21 of the chamber 2 covers the inner space of the side wall 71 from below.

The ceiling wall 72 covers the inner space of the side wall 71 from above. Specifically, the ceiling wall 72 is connected to the upper end of the side wall 71 and extends inward of the side wall 71. The ceiling wall 72 has an opening 72a through which the shaft 43 of the spin motor section 4 passes.

The first duct member 73 has a substantially tubular shape and extends substantially vertically. More specifically, the first duct member 73 is arranged inside the side wall 71 and extends from the inside of the chamber 2 to the outside. The upper end of the first duct member 73 is connected to the ceiling wall 72. In other words, the ceiling wall 72 covers the opening at the upper end of the first duct member 73.

Gas generated from the first processing liquid described with reference to FIG. 2 flows into the first duct member 73. Specifically, the side wall 71 has a first downstream exhaust port 71a that communicates with the inner space of the first duct member 73. The first downstream exhaust port 71 a is a through hole that penetrates the side wall 71 and faces the first duct member 73 .

The lower end of the first duct member 73 is connected to one end of the first exhaust pipe P4. The first exhaust pipe P4 is a tubular member through which gas flows. The other end of the first exhaust pipe P4 is connected to the first exhaust mechanism 8a. The first exhaust mechanism 8a sucks the gas (gas generated from the first processing liquid) that has flowed into the first duct member 73 via the first exhaust pipe P4. The first exhaust mechanism 8a includes, for example, a suction pump or an exhaust fan. Note that a valve may be disposed in the first exhaust pipe P4.

In this embodiment, the first duct member 73 has a first tubular portion 73a and a second tubular portion 73b. The first tubular portion 73a has a substantially tubular shape, is disposed inside the side wall 71, and is connected to the inner surface of the side wall 71. A lower end portion of the first tubular portion 73 a is embedded in the bottom wall 21 of the chamber 2 . The second tubular portion 73b has a tubular shape, is disposed outside the chamber 2, and is connected to the lower end of the first tubular portion 73a. The first exhaust pipe P4 is connected to the lower end of the second tubular portion 73b.

More specifically, the first tubular portion 73a has an opening extending substantially vertically on the inner surface side of the side wall 71. The first downstream exhaust port 71a is provided at a position communicating with the inner space of the first tubular portion 73a via the opening of the first tubular portion 73a. In this embodiment, a circulation space through which gas flows from the first downstream exhaust port 71a to the first tubular portion 73a is configured by the inner surface of the first tubular portion 73a and the inner surface of the side wall 71.

Next, the guard portion 5 will be explained with reference to FIG. As shown in FIG. 3, the guard section 5 includes a first guard section 5a and a second guard section 5b. The first guard portion 5a receives the processing liquid (the first processing liquid and the second processing liquid) scattered from the rotating substrate W. The second guard part 5b is arranged between the first guard part 5a and the exhaust part 7, and receives the processing liquid (third processing liquid) scattered from the rotating substrate W. The second guard portion 5b is an example of an opening/closing portion.

In this embodiment, the first guard portion 5a includes a first guard 51 and a first cup portion 52. The second guard portion 5b has a second cup portion 53. As described with reference to FIG. 2, the elevating section 6 individually raises and lowers the first guard 51, the first cup section 52, and the second cup section 53 in the vertical direction.

FIG. 3 shows a state in which the first guard 51 is placed at the liquid receiving position, and the first cup portion 52 and the second cup portion 53 are placed at the retracted position. Hereinafter, a state in which the first guard 51 is arranged at the liquid receiving position and the first cup part 52 and the second cup part 53 are arranged at the retracted position may be referred to as a "first state". In the first state, the first processing liquid is discharged toward the substrate W from the first nozzle 11a (FIG. 2).

The first guard 51 has a substantially cylindrical shape and is located outward from the spin chuck 3 . In the first state, when the first processing liquid scatters from the rotating substrate W, the first guard 51 catches the first processing liquid scattering from the substrate W.

Specifically, the first guard 51 extends from the center to the upper part of the first guard 51 in the vertical direction and is inclined upward toward the rotation axis AX. Further, the lower portion of the first guard 51 extends substantially vertically. In the first state, the tip 51a of the first guard 51 is located above the substrate W. On the other hand, in the first state, the first cup part 52 and the second cup part 53 are located below the substrate W. As a result, the first processing liquid splashed from the rotating substrate W is received by the first guard 51. The first processing liquid adhering to the first guard 51 flows along the inner surface 51c of the first guard 51, and flows downward from the lower end 51b of the first guard 51.

The first cup portion 52 is arranged inside the first guard 51. The first cup portion 52 has a substantially cylindrical shape and is located outward from the spin chuck 3 . The first cup portion 52 includes a second guard 521 and a first liquid receiving portion 522. The first liquid receiving portion 522 projects outward from the second guard 521. The first liquid receiving portion 522 is located below the lower end 51b of the first guard 51. The first liquid receiving portion 522 is annular and forms an annular groove (liquid reservoir). The first liquid receiving portion 522 receives the processing liquid (first processing liquid) flowing down from the lower end 51b of the first guard 51. As a result, the processing liquid (first processing liquid) is collected in the first liquid receiving portion 522.

The second cup part 53 is arranged inside the first cup part 52. The second cup portion 53 has a substantially cylindrical shape. The second cup portion 53 includes a third guard 531, a second liquid receiving portion 532, a third liquid receiving portion 533, and a blocking wall portion 54. The blocking wall portion 54 is an example of a wall portion.

The blocking wall portion 54 is annular and extends substantially vertically. The blocking wall portion 54 is arranged between the first guard portion 5a and the exhaust portion 7. In this embodiment, the blocking wall part 54 is arranged between the first cup part 52 and the exhaust part 7. More specifically, the blocking wall part 54 is arranged at a position close to the exhaust part 7.

The blocking wall portion 54 has a first upstream exhaust port 54a corresponding to the first downstream exhaust port 71a. The first upstream exhaust port 54a is a through hole that penetrates the blocking wall portion 54. The first upstream exhaust port 54a and the first downstream exhaust port 71a are substantially aligned in position in the circumferential direction. Further, in the first state, the first upstream exhaust port 54a and the first downstream exhaust port 71a are substantially aligned in the vertical direction. Therefore, in the first state, the first upstream exhaust port 54a and the first downstream exhaust port 71a overlap. In other words, the first upstream exhaust port 54a communicates with the inner space of the first duct member 73 via the first downstream exhaust port 71a.

Next, the second guard part 5b and the exhaust part 7 will be further explained with reference to FIGS. 4 and 5. FIG. 4 is a diagram schematically showing a cross section of the second guard part 5b and the exhaust part 7. FIG. 5 is a developed view of the side wall 71 and the blocking wall portion 54 of the exhaust section 7. As shown in FIG. Specifically, FIGS. 4 and 5 show the second guard part 5b and the exhaust part 7 in the first state.

As shown in FIG. 4, the exhaust section 7 further includes a second duct member 74 and a third duct member 75. The second duct member 74 and the third duct member 75 are arranged inside the exhaust part 7 similarly to the first duct member 73.

As shown in FIG. 5, the side wall 71 of the exhaust section 7 further includes a second downstream exhaust port 71b and a third downstream exhaust port 71c. The blocking wall portion 54 further includes a second upstream exhaust port 54b corresponding to the second downstream exhaust port 71b, and a third upstream exhaust port 54c corresponding to the third downstream exhaust port 71c.

The second upstream exhaust port 54b and the third upstream exhaust port 54c penetrate the blocking wall 54 similarly to the first upstream exhaust port 54a. The first upstream exhaust port 54a, the second upstream exhaust port 54b, and the third upstream exhaust port 54c are provided at different positions in the circumferential direction. Specifically, the second upstream exhaust port 54b is provided at a position facing the second duct member 74. The third upstream exhaust port 54c is provided at a position facing the third duct member 75.

The second downstream exhaust port 71b and the third downstream exhaust port 71c penetrate the side wall 71 of the exhaust section 7, similar to the first downstream exhaust port 71a. The first downstream exhaust port 71a, the second downstream exhaust port 71b, and the third downstream exhaust port 71c are provided at different positions in the circumferential direction.

Specifically, the first downstream exhaust port 71a is provided at substantially the same position as the first upstream exhaust port 54a in the circumferential direction. The second downstream exhaust port 71b is provided at substantially the same position as the second upstream exhaust port 54b in the circumferential direction. The third downstream exhaust port 71c is provided at substantially the same position as the third upstream exhaust port 54c in the circumferential direction. Therefore, the second downstream exhaust port 71b is provided at a position facing the second duct member 74. The third downstream exhaust port 71c is provided at a position facing the third duct member 75.

The first upstream exhaust port 54a, the second upstream exhaust port 54b, and the third upstream exhaust port 54c are substantially aligned in the vertical direction. The first downstream exhaust port 71a, the second downstream exhaust port 71b, and the third downstream exhaust port 71c are provided at different positions in the vertical direction. Specifically, the first downstream exhaust port 71a is provided at a lower position than the second downstream exhaust port 71b, and the second downstream exhaust port 71b is located at a lower position than the third downstream exhaust port 71c. It is provided.

As shown in FIG. 5, in the first state, the first upstream exhaust port 54a overlaps the first downstream exhaust port 71a. On the other hand, the second upstream exhaust port 54b does not overlap with the second downstream exhaust port 71b, but overlaps with the wall surface (outer surface) of the side wall 71 of the exhaust section 7. Similarly, the third upstream exhaust port 54c does not overlap with the third downstream exhaust port 71c, but overlaps with the wall surface (outer surface) of the side wall 71 of the exhaust section 7. Note that in FIG. 5, diagonal lines indicate that the first upstream exhaust port 54a and the first downstream exhaust port 71a overlap.

Therefore, in the first state, as shown in FIG. 4 and FIG. communicates with the inner space of More specifically, the inner space of the second cup portion 53 communicates only with the first duct member 73 among the first to third duct members 73 to 75 in the first state.

Next, with reference to FIG. 3, the flow of gas generated from the first processing liquid will be described. In detail, the flow of gas generated from the first processing liquid adhering to the inner surface 51c of the first guard 51 and the first processing liquid accumulated in the first liquid receiving portion 522 will be described.

While the substrate processing apparatus 100 is in use, suction by the first exhaust mechanism 8a is continuously performed at a constant output. Therefore, the gas generated from the first processing liquid is transmitted from the gap between the first guard 51 and the first cup part 52 to the gap between the tip 521a of the second guard 521 and the spin chuck 3, and the tip of the third guard 531. It flows into the inner space of the second cup portion 53 through the gap between the spin chuck 531a and the spin chuck 3.

As described with reference to FIGS. 4 and 5, in the first state, the inner space of the second cup portion 53 is limited to the first duct member 73 among the first duct member 73 to the third duct member 75. communicate. Therefore, the gas generated from the first processing liquid flows into the inner space of the first duct member 73 via the first upstream exhaust port 54a and the first downstream exhaust port 71a. As a result, the gas generated from the first processing liquid flows into the first exhaust mechanism 8a via the first exhaust pipe P4.

Next, with reference to FIG. 6, the substrate processing apparatus 100 of this embodiment will be further described. FIG. 6 is a diagram schematically showing a cross section of another part of the processing unit 1 included in the substrate processing apparatus 100 of this embodiment. As shown in FIG. 6, the first liquid receiving portion 522 has a first liquid drain port 522a. Further, as shown in FIG. 6, the substrate processing apparatus 100 includes a first drain pipe P5.

The first liquid drain port 522a is provided at the bottom of the first liquid receiving portion 522. The first liquid drain port 522a is a through hole that penetrates the bottom of the first liquid receiving portion 522. One end of the first drain pipe P5 is connected to the first drain port 522a. The other end of the first drain pipe P5 is connected to the first drain section 9a. Note that a valve may be disposed in the first drain pipe P5.

The first processing liquid collected in the first liquid receiving part 522 is discharged to the first liquid drain part 9a via the first liquid drain pipe P5. The first liquid drain section 9a is arranged outside the substrate processing apparatus 100. Therefore, the first processing liquid is discharged to the outside of the chamber 2 (substrate processing apparatus 100). The first processing liquid discharged to the first liquid drainage part 9a is recovered and reused as necessary. The first processing liquid discharged to the first liquid drainage section 9a may be discarded.

Next, the substrate processing apparatus 100 of this embodiment will be further described with reference to FIG. 2 and FIGS. 7 to 10. First, the guard section 5 and the exhaust section 7 will be explained with reference to FIG. FIG. 7 is a diagram schematically showing a cross section of another part of the processing unit 1 included in the substrate processing apparatus 100 of this embodiment. As shown in FIG. 7, the exhaust mechanism 8 includes a second exhaust mechanism 8b. Further, as shown in FIG. 7, the substrate processing apparatus 100 includes a second exhaust pipe P6. First, the exhaust section 7 will be explained with reference to FIG.

The second duct member 74 of the exhaust section 7 has a substantially tubular shape and extends substantially vertically. More specifically, the second duct member 74 is arranged inside the side wall 71 and extends from the inside of the chamber 2 to the outside. The upper end of the second duct member 74 is connected to the ceiling wall 72. In other words, the ceiling wall 72 covers the opening at the upper end of the second duct member 74.

Gas generated from the second processing liquid described with reference to FIG. 2 flows into the second duct member 74. Specifically, gas flows into the inner space of the second duct member 74 via the second downstream exhaust port 71b of the side wall 71.

A lower end of the second duct member 74 is connected to one end of the second exhaust pipe P6. The second exhaust pipe P6 is a tubular member through which gas flows. The other end of the second exhaust pipe P6 is connected to the second exhaust mechanism 8b. The second exhaust mechanism 8b sucks the gas (gas generated from the second processing liquid) that has flowed into the second duct member 74 via the second exhaust pipe P6. The second exhaust mechanism 8b includes, for example, a suction pump or an exhaust fan. Note that a valve may be disposed in the second exhaust pipe P6.

In this embodiment, the second duct member 74 has a first tubular portion 74a and a second tubular portion 74b, similar to the first duct member 73 described with reference to FIG. The second exhaust pipe P6 is connected to the lower end of the second tubular portion 74b of the second duct member 74. Note that the configurations of the first tubular portion 74a and the second tubular portion 74b of the second duct member 74 are substantially the same as those of the first tubular portion 73a and the second tubular portion 73b of the first duct member 73, so detailed description thereof will be omitted. is omitted.

Next, the guard portion 5 will be explained with reference to FIG. FIG. 7 shows a state in which the first guard 51 and the first cup portion 52 are arranged at the liquid receiving position. At this time, the second cup portion 53 (second guard portion 5b) is arranged at an intermediate position between the retracted position and the liquid receiving position. Hereinafter, a state in which the first guard 51 and the first cup part 52 are arranged at the liquid receiving position and the second cup part 53 is arranged at the intermediate position may be referred to as a "second state". In the second state, the second processing liquid is discharged toward the substrate W from the second nozzle 11b (FIG. 2).

The second guard 521 of the first cup portion 52 has a substantially cylindrical shape and is located outward from the spin chuck 3 . In the second state, when the second processing liquid scatters from the rotating substrate W, the second guard 521 catches the second processing liquid scattering from the substrate W. Specifically, the upper part of the second guard 521 in the vertical direction is inclined upward toward the rotation axis AX. Further, the center and lower portions of the second guard 521 extend substantially vertically.

In the second state, the tip 521a of the second guard 521 is located above the substrate W. Further, in the second state, the first cup portion 52 is close to the first guard 51. In other words, in the second state, the gap between the first guard 51 and the first cup portion 52 is smaller than the gap in the first state. On the other hand, in the second state, the second cup portion 53 is located below the substrate W.

Therefore, the second processing liquid scattered from the rotating substrate W is received by the second guard 521. The second processing liquid adhering to the second guard 521 flows along the inner surface 521c of the second guard 521, and flows down from the lower end 521b of the second guard 521.

The second liquid receiving portion 532 of the second cup portion 53 projects outward from the third guard 531 of the second cup portion 53 . The second liquid receiving portion 532 is located below the lower end 521b of the second guard 521. The second liquid receiving portion 532 is annular and forms an annular groove (liquid reservoir). The second liquid receiving portion 532 receives the processing liquid (second processing liquid) flowing down from the lower end 521b of the second guard 521. As a result, the processing liquid (second processing liquid) is collected in the second liquid receiving portion 532.

As described with reference to FIGS. 4 and 5, the second upstream exhaust port 54b of the blocking wall portion 54 and the second downstream exhaust port 71b of the exhaust portion 7 are substantially aligned in the circumferential direction. ing. Further, as shown in FIG. 7, in the second state, the second upstream exhaust port 54b of the blocking wall portion 54 and the second downstream exhaust port 71b of the exhaust section 7 are substantially aligned in the vertical direction. ing. Therefore, in the second state, the second upstream exhaust port 54b and the second downstream exhaust port 71b overlap. In other words, the second upstream exhaust port 54b communicates with the inner space of the second duct member 74 via the second downstream exhaust port 71b.

Next, the second guard part 5b and the exhaust part 7 will be further explained with reference to FIGS. 8 and 9. FIG. 8 is another diagram schematically showing a cross section of the second guard part 5b and the exhaust part 7. As shown in FIG. FIG. 9 is another developed view of the side wall 71 and the blocking wall portion 54 of the exhaust section 7. As shown in FIG. Specifically, FIGS. 8 and 9 show the second guard part 5b and the exhaust part 7 in the second state.

As shown in FIG. 9, in the second state, the second upstream exhaust port 54b overlaps the second downstream exhaust port 71b. On the other hand, the first upstream exhaust port 54a does not overlap with the first downstream exhaust port 71a, but overlaps with the wall surface (outer surface) of the side wall 71 of the exhaust section 7. Similarly, the third upstream exhaust port 54c does not overlap with the third downstream exhaust port 71c, but overlaps with the wall surface (outer surface) of the side wall 71 of the exhaust section 7. Note that in FIG. 9, diagonal lines indicate that the second upstream exhaust port 54b and the second downstream exhaust port 71b overlap.

Therefore, in the second state, as shown in FIG. 8 and FIG. communicates with the inner space of More specifically, the inner space of the second cup portion 53 communicates only with the second duct member 74 among the first to third duct members 73 to 75 in the second state.

Next, with reference to FIG. 7, the flow of gas generated from the second processing liquid will be described. In detail, the flow of gas generated from the second processing liquid adhering to the inner surface 521c of the second guard 521 and the second processing liquid accumulated in the second liquid receiving portion 532 will be described.

While the substrate processing apparatus 100 is in use, suction by the second exhaust mechanism 8b is continuously performed at a constant output. Therefore, the gas generated from the second processing liquid flows from the gap between the second guard 521 and the second cup part 53 to the second cup part 53 through the gap between the tip 531a of the third guard 531 and the spin chuck 3. flows into the inner space of.

As described with reference to FIGS. 8 and 9, in the second state, the inner space of the second cup portion 53 is connected only to the second duct member 74 among the first duct member 73 to the third duct member 75. communicate. Therefore, the gas generated from the second processing liquid flows into the inner space of the second duct member 74 via the second upstream exhaust port 54b and the second downstream exhaust port 71b. As a result, the gas generated from the second processing liquid flows into the second exhaust mechanism 8b via the second exhaust pipe P6.

Next, with reference to FIG. 10, the substrate processing apparatus 100 of this embodiment will be further described. FIG. 10 is a diagram schematically showing a cross section of another part of the processing unit 1 included in the substrate processing apparatus 100 of this embodiment. As shown in FIG. 10, the second liquid receiving portion 532 has a second drain port 532a. Further, as shown in FIG. 10, the substrate processing apparatus 100 includes a second drain pipe P7.

The second liquid drain port 532a is provided at the bottom of the second liquid receiving portion 532. The second liquid drain port 532a is a through hole that penetrates the bottom of the second liquid receiving portion 532. One end of the second drain pipe P7 is connected to the second drain port 532a. The other end of the second drain pipe P7 is connected to the second drain section 9b. Note that a valve may be disposed in the second drain pipe P7.

The second processing liquid collected in the second liquid receiving part 532 is discharged to the second liquid drain part 9b via the second liquid drain pipe P7. The second drain portion 9b is arranged outside the substrate processing apparatus 100. Therefore, the second processing liquid is discharged to the outside of the chamber 2 (substrate processing apparatus 100). The second processing liquid discharged to the second drainage part 9b is recovered and reused as necessary. The second processing liquid discharged to the second drainage part 9b may be discarded.

Next, the substrate processing apparatus 100 of this embodiment will be further explained with reference to FIG. 2 and FIGS. 11 to 14. First, with reference to FIG. 11, the guard section 5 and the exhaust section 7 will be explained. FIG. 11 is a diagram schematically showing a cross section of another part of the processing unit 1 included in the substrate processing apparatus 100 of this embodiment. As shown in FIG. 11, the exhaust mechanism 8 includes a third exhaust mechanism 8c. Further, as shown in FIG. 11, the substrate processing apparatus 100 includes a third exhaust pipe P8. First, the exhaust section 7 will be explained with reference to FIG.

The third duct member 75 of the exhaust section 7 has a substantially tubular shape and extends substantially vertically. More specifically, the third duct member 75 is arranged inside the side wall 71 and extends from the inside of the chamber 2 to the outside. The upper end of the third duct member 75 is connected to the ceiling wall 72. In other words, the ceiling wall 72 covers the opening at the upper end of the third duct member 75.

Gas generated from the third processing liquid described with reference to FIG. 3 flows into the third duct member 75. Specifically, gas flows into the inner space of the third duct member 75 via the third downstream exhaust port 71c of the side wall 71.

The lower end of the third duct member 75 is connected to one end of the third exhaust pipe P8. The third exhaust pipe P8 is a tubular member through which gas flows. The other end of the third exhaust pipe P8 is connected to the third exhaust mechanism 8c. The third exhaust mechanism 8c sucks the gas (gas generated from the third processing liquid) that has flowed into the third duct member 75 via the third exhaust pipe P8. The third exhaust mechanism 8c includes, for example, a suction pump or an exhaust fan. Note that a valve may be disposed in the third exhaust pipe P8.

In this embodiment, the third duct member 75 has a first tubular portion 75a and a second tubular portion 75b, similar to the first duct member 73 described with reference to FIG. The third exhaust pipe P8 is connected to the lower end of the second tubular portion 75b of the third duct member 75. Note that the configurations of the first tubular part 75a and the second tubular part 75b of the third duct member 75 are substantially the same as those of the first tubular part 73a and the second tubular part 73b of the first duct member 73, so detailed description thereof will be omitted. is omitted.

Next, the guard portion 5 will be explained with reference to FIG. FIG. 11 shows a state in which the first guard 51, the first cup part 52, and the second cup part 53 are arranged at the liquid receiving position. Hereinafter, the state in which the first guard 51, the first cup part 52, and the second cup part 53 are arranged at the liquid receiving position may be referred to as a "third state". In the third state, the third processing liquid is discharged toward the substrate W from the third nozzle 11c (FIG. 2).

The third guard 531 of the second cup portion 53 has a substantially cylindrical shape and is located outward from the spin chuck 3 . In the third state, when the third processing liquid scatters from the rotating substrate W, the third guard 531 catches the third processing liquid scattering from the substrate W. Specifically, the upper part of the third guard 531 in the vertical direction is inclined upward toward the rotation axis AX. Further, the center and lower portions of the third guard 531 extend substantially vertically.

The third liquid receiving portion 533 of the second cup portion 53 is connected to the lower end of the third guard 531 and protrudes (expands) inward from the third guard 531. The third liquid receiving portion 533 is annular and forms an annular groove (liquid reservoir). Note that the blocking wall portion 54 is connected to the inner edge (inner upper end portion) of the third liquid receiving portion 533 and extends upward from the inner edge of the third liquid receiving portion 533 .

In the third state, the tip 531a of the third guard 531 is located above the substrate W. Further, in the third state, the first cup portion 52 is close to the first guard 51. In other words, in the third state, the gap between the first guard 51 and the first cup portion 52 is smaller than the gap in the first state. Similarly, in the third state, the second cup portion 53 is close to the first cup portion 52. In other words, in the third state, the gap between the first cup part 52 and the second cup part 53 is smaller than the gap in the first state and the second state.

Therefore, the third processing liquid scattered from the rotating substrate W is received by the third guard 531. The third processing liquid adhering to the third guard 531 flows along the inner surface 531b of the third guard 531 and flows into the third liquid receiving portion 533. The third liquid receiving portion 533 receives the processing liquid (third processing liquid) flowing from the third guard 531. As a result, the processing liquid (third processing liquid) is collected in the third liquid receiving portion 533.

As described with reference to FIGS. 4 and 5, the third upstream exhaust port 54c of the blocking wall portion 54 and the third downstream exhaust port 71c of the exhaust portion 7 are substantially aligned in the circumferential direction. ing. Further, as shown in FIG. 11, in the third state, the third upstream exhaust port 54c of the blocking wall portion 54 and the third downstream exhaust port 71c of the exhaust section 7 are substantially aligned in the vertical direction. ing. Therefore, in the third state, the third upstream exhaust port 54c and the third downstream exhaust port 71c overlap. In other words, the third upstream exhaust port 54c communicates with the inner space of the third duct member 75 via the third downstream exhaust port 71c.

Next, the second guard part 5b and the exhaust part 7 will be further explained with reference to FIGS. 12 and 13. FIG. 12 is another diagram schematically showing a cross section of the second guard part 5b and the exhaust part 7. As shown in FIG. FIG. 13 is another developed view of the side wall 71 and the blocking wall portion 54 of the exhaust section 7. As shown in FIG. Specifically, FIGS. 12 and 13 show the second guard part 5b and the exhaust part 7 in the third state.

As shown in FIG. 13, in the third state, the third upstream exhaust port 54c overlaps the third downstream exhaust port 71c. On the other hand, the first upstream exhaust port 54a does not overlap with the first downstream exhaust port 71a, but overlaps with the wall surface (outer surface) of the side wall 71 of the exhaust section 7. Similarly, the second upstream exhaust port 54b does not overlap with the second downstream exhaust port 71b, but overlaps with the wall surface (outer surface) of the side wall 71 of the exhaust section 7. Note that in FIG. 13, diagonal lines indicate that the third upstream exhaust port 54c and the third downstream exhaust port 71c overlap.

Therefore, in the third state, as shown in FIGS. 12 and 13, the inner space of the second cup part 53 is discharged from the exhaust part 7 through the third upstream exhaust port 54c and the third downstream exhaust port 71c. communicates with the inner space of More specifically, the inner space of the second cup portion 53 communicates only with the third duct member 75 among the first to third duct members 73 to 75 in the third state.

Next, with reference to FIG. 11, the flow of gas generated from the third processing liquid will be described. In detail, the flow of gas generated from the third processing liquid adhering to the inner surface 531b of the third guard 531 and the third processing liquid accumulated in the third liquid receiving portion 533 will be described.

While the substrate processing apparatus 100 is in use, suction by the third exhaust mechanism 8c is continuously performed at a constant output. As described with reference to FIGS. 12 and 13, in the third state, the inner space of the second cup portion 53 is only connected to the third duct member 75 among the first to third duct members 73 to 75. communicate. Therefore, the gas generated from the third processing liquid flows from the inner space of the second cup portion 53 to the inner space of the third duct member 75 via the third upstream exhaust port 54c and the third downstream exhaust port 71c. Inflow. As a result, the gas generated from the third processing liquid flows into the third exhaust mechanism 8c via the third exhaust pipe P8.

Next, with reference to FIG. 14, the substrate processing apparatus 100 of this embodiment will be further described. FIG. 14 is a diagram schematically showing a cross section of another part of the processing unit 1 included in the substrate processing apparatus 100 of this embodiment. As shown in FIG. 14, the third liquid receiving portion 533 has a third drain port 533a. Further, as shown in FIG. 14, the substrate processing apparatus 100 includes a third drain pipe P9.

The third liquid drain port 533a is provided at the bottom of the third liquid receiving portion 533. The third liquid drain port 533a is a through hole that penetrates the bottom of the third liquid receiving portion 533. One end of the third drain pipe P9 is connected to the third drain port 533a. The other end of the third drain pipe P9 is connected to the third drain portion 9c. Note that a valve may be disposed in the third drain pipe P9.

The third processing liquid collected in the third liquid receiving part 533 is discharged to the third liquid drain part 9c via the third liquid drain pipe P9. The third drain portion 9c is arranged outside the substrate processing apparatus 100. Therefore, the third processing liquid is discharged to the outside of the chamber 2 (substrate processing apparatus 100). The third processing liquid discharged to the third drainage part 9c is recovered and reused as necessary. The third processing liquid discharged to the third drainage part 9c may be discarded.

Next, with reference to FIG. 15, the guard section 5 and the elevating section 6 will be explained. FIG. 15 is a diagram showing the guard section 5 and the elevating section 6. As shown in FIG. As shown in FIG. 15, the elevating section 6 includes a first elevating section 61 to a third elevating section 63. The first lifting/lowering section 61 to the third lifting/lowering section 63 are controlled by a control device 101 (control section 102).

The first guard 51 is connected to the first lifting section 61 . The first elevating section 61 is attached to the bottom wall 21 of the chamber 2 . The first lifting section 61 moves the first guard 51 up and down in the vertical direction. The first elevating section 61 has a driving source such as a motor and an elevating mechanism, and the elevating mechanism is driven by the driving source to raise or lower the first guard 51. The lifting mechanism includes, for example, a rack and pinion mechanism or a ball screw.

The first cup part 52 is connected to a second elevating part 62. The second elevating section 62 is attached to the bottom wall 21 of the chamber 2. The second elevating section 62 moves the first cup section 52 up and down in the vertical direction. The second elevating section 62 has a driving source such as a motor and an elevating mechanism, and the elevating mechanism is driven by the driving source to raise or lower the first cup section 52. The lifting mechanism includes, for example, a rack and pinion mechanism or a ball screw.

The second cup part 53 is connected to the third elevating part 63. The third elevating section 63 is attached to the bottom wall 21 of the chamber 2. The third lifting section 63 moves the second cup section 53 up and down in the vertical direction. The third elevating section 63 has a driving source such as a motor and an elevating mechanism, and the elevating mechanism is driven by the driving source to raise or lower the second cup section 53. The lifting mechanism includes, for example, a rack and pinion mechanism or a ball screw.

Embodiment 1 of the present invention has been described above with reference to FIGS. 1 to 15. According to this embodiment, by raising and lowering the second cup portion 53, the first downstream exhaust port 71a to the third downstream exhaust port 71c can be opened and closed. Specifically, the first downstream exhaust port 71a to the third downstream exhaust port 71c are arranged so that the gas generated from the processing liquid flows into one of the first downstream exhaust port 71a to the third downstream exhaust port 71c. The exhaust port 71c can be opened and closed. Specifically, the control unit 102 controls the elevating portion (third elevating portion 63) to raise and lower the second cup portion 53, thereby opening the three downstream exhaust ports (first downstream exhaust port 71a to third elevating portion 63). Any one of the three upstream exhaust ports (first upstream exhaust port 54a to third upstream exhaust port 54c) can be selectively overlapped with any one of the downstream exhaust ports 71c). Therefore, the destination for acidic gas, the destination for alkaline gas, and the destination for gas generated from the organic chemical can be switched.

Further, according to the present embodiment, acidic gas generated from the first processing liquid (acidic chemical liquid) is discharged to the first exhaust pipe P4, and alkaline gas generated from the second processing liquid (alkaline chemical liquid) is discharged. It can be discharged to the second exhaust pipe P6. As a result, crystals (salts) are less likely to form in the exhaust pipe.

Further, according to the present embodiment, while the spin chuck 3 is rotating the substrate W, the vertical movement of the second cup portion 53 causes one of the first downstream exhaust ports 71a to the third downstream exhaust ports 71c to The downstream exhaust port to be opened can be changed from Therefore, while the spin chuck 3 is rotating the substrate W, the destination for acidic gas discharge, the destination for alkaline gas discharge, and the discharge destination for gas generated from the organic chemical solution can be switched.

Furthermore, according to the present embodiment, at the same time as switching the gas discharge destination, it is possible to switch the discharge destination of the acidic chemical solution, the alkaline chemical solution, and the organic chemical solution.

Moreover, according to this embodiment, the first guard 51, the first cup part 52, and the second cup part 53 can be raised and lowered individually. Therefore, the first guard 51 and the first cup portion 52 can be brought close to each other. Further, the first cup portion 52 and the second cup portion 53 can be placed close to each other. As a result, it is possible to suppress the size of the chamber 2 from increasing in the vertical direction. In other words, the chamber 2 can be made smaller.

Moreover, according to this embodiment, the first guard 51, the first cup part 52, and the second cup part 53 can be operated independently of each other. Specifically, the first guard 51, the first cup part 52, and the second cup part 53 can be raised and lowered individually. Therefore, the combination of the liquid drainage destination and the exhaust destination can be changed. For example, in the present embodiment, the acidic chemical solution is discharged from the first drain port 522a and the acidic gas is discharged to the first duct member 73, but the acidic chemical solution is discharged from the first drain port 522a, Acidic gas can be discharged from the second duct member 74.

Furthermore, in the present embodiment, the acidic chemical liquid was discharged from the first nozzle 11a, the alkaline chemical liquid was discharged from the second nozzle 11b, and the organic chemical liquid was discharged from the third nozzle 11c. The type of processing liquid supplied from the nozzle 11c to the substrate W is not particularly limited. For example, an acidic chemical may be ejected from the first nozzle 11a, another acidic chemical may be ejected from the second nozzle 11b, and an alkaline chemical may be ejected from the third nozzle 11c. In this case, while the first processing liquid (acidic chemical solution) is discharged from the first drainage port 522a and the second processing liquid (acidic chemical solution) is discharged from the second drainage port 532a, the first processing liquid The generated gas (acidic gas) and the gas (acidic gas) generated from the second processing liquid can be discharged to the first duct member 73, for example.

Note that in this embodiment, the first to third drainage parts 9a to 9c are arranged outside the substrate processing apparatus 100, but any one of the first to third drainage parts 9a to 9c is It may be placed inside the substrate processing apparatus 100. In other words, the substrate processing apparatus 100 can include any one of the first liquid drain section 9a to the third liquid drain section 9c.

In addition, in the present embodiment, the positions of the first upstream exhaust port 54a to the third upstream exhaust port 54c substantially coincide with each other in the vertical direction, but the first upstream exhaust port 54a to the third upstream exhaust port 54c The ports 54c may have different positions in the vertical direction.

Further, in the present embodiment, the first guard section 5a has two guards (the first guard 51 and the second guard 521), but the first guard section 5a has one guard or three or more guards. It may have.

Moreover, in this embodiment, the first guard part 5a has one cup part (the first cup part 52), but the first guard part 5a may have two or more cup parts.

Further, in the present embodiment, the first guard portion 5a has the first guard 51, but the first guard 51 may be omitted. In this case, the first liquid receiving portion 522 may be omitted.

Further, in the present embodiment, the first guard 51 and the first cup part 52 are raised and lowered individually, but the first guard 51 and the first cup part 52 may be raised and lowered integrally. Specifically, the first guard 51 and the first cup portion 52 may be configured by a single member.

Further, in this embodiment, the second cup portion 53 has the third guard 531, but the third guard 531 may be omitted. In this case, the second liquid receiving part 532 may be provided in the first guard part 5a. In other words, only the member including the blocking wall portion 54 may be arranged inside the first guard portion 5a (guard portion 5).

Further, in the present embodiment, the second cup portion 53 has one guard (the third guard 531), but the second cup portion 53 may have two or more guards.

Further, in the present embodiment, the exhaust section 7 has three duct members (the first duct member 73 to the third duct member 75), but the exhaust section 7 has two duct members or four or more duct members. It may have. Therefore, the exhaust section 7 may have two downstream exhaust ports or four or more downstream exhaust ports. Further, the blocking wall portion 54 may have two upstream exhaust ports or four or more upstream exhaust ports.

[Embodiment 2]
Next, a second embodiment of the present invention will be described with reference to FIGS. 16, 17(a), and 17(b). However, matters that are different from Embodiment 1 will be explained, and explanations of matters that are the same as Embodiment 1 will be omitted. The second embodiment differs from the first embodiment in the side wall 71 of the exhaust section 7.

FIG. 16 is a developed view of the side wall 71 of the exhaust section 7. As shown in FIG. As shown in FIG. 16, in this embodiment, the first downstream exhaust port 71a includes a first small downstream exhaust port 71aS and a first large downstream exhaust port 71aL. Similarly, the second downstream exhaust port 71b includes a second small downstream exhaust port 71bS and a second large downstream exhaust port 71bL. The third downstream exhaust port 71c includes a third small downstream exhaust port 71cS and a third large downstream exhaust port 71cL.

First small downstream exhaust port 71aS, first large downstream exhaust port 71aL, second small downstream exhaust port 71bS, second large downstream exhaust port 71bL, third small downstream exhaust port 71cS, and third large downstream The side exhaust ports 71cL are provided at different positions in the vertical direction. In this embodiment, the first small downstream exhaust port 71aS, the first large downstream exhaust port 71aL, the second small downstream exhaust port 71bS, the second large downstream exhaust port 71bL, the third small downstream exhaust port 71cS, The positions of the third large downstream exhaust port 71cL in the vertical direction become higher in this order.

The first large downstream exhaust port 71aL has a larger cross-sectional area than the first small downstream exhaust port 71aS. The first small downstream exhaust port 71aS and the first large downstream exhaust port 71aL are arranged side by side in the vertical direction. In this embodiment, the first small downstream exhaust port 71aS is provided at a lower position than the first large downstream exhaust port 71aL. However, the first large downstream exhaust port 71aL may be provided at a lower position than the first small downstream exhaust port 71aS.

The second large downstream exhaust port 71bL has a larger cross-sectional area than the second smaller downstream exhaust port 71bS. The second small downstream exhaust port 71bS and the second large downstream exhaust port 71bL are provided side by side in the vertical direction. In this embodiment, the second small downstream exhaust port 71bS is provided at a lower position than the second large downstream exhaust port 71bL. However, the second large downstream exhaust port 71bL may be provided at a lower position than the second small downstream exhaust port 71bS.

The third large downstream exhaust port 71cL has a larger cross-sectional area than the third small downstream exhaust port 71cS. The third small downstream exhaust port 71cS and the third large downstream exhaust port 71cL are provided side by side in the vertical direction. In this embodiment, the third small downstream exhaust port 71cS is provided at a lower position than the third large downstream exhaust port 71cL. However, the third large downstream exhaust port 71cL may be provided at a lower position than the third small downstream exhaust port 71cS.

Next, the second guard portion 5b will be explained with reference to FIGS. 17(a) and 17(b). FIGS. 17(a) and 17(b) are diagrams showing the operation of the second guard portion 5b.

As shown in FIGS. 17(a) and 17(b), the cross-sectional area of the first upstream exhaust port 54a of the blocking wall 54 is approximately equal to the first large downstream exhaust port 71aL, and It is larger than the exhaust port 71aS. Therefore, when the first upstream exhaust port 54a overlaps with the first large downstream exhaust port 71aL, the effective area becomes larger than when the first upstream exhaust port 54a overlaps with the first small downstream exhaust port 71aS. . Therefore, when the first upstream exhaust port 54a overlaps with the first large downstream exhaust port 71aL, the displacement becomes larger than when the first upstream exhaust port 54a overlaps with the first small downstream exhaust port 71aS. .

As shown in FIGS. 17(a) and 17(b), when the gas generated from the processing liquid flows into the inner space of the first duct member 73, the control device 101 (control unit 102) The first upstream exhaust port 54a is overlapped with one of the downstream exhaust port 71aS and the first large downstream exhaust port 71aL. Similarly, when the gas generated from the processing liquid flows into the inner space of the second duct member 74, the control device 101 (control unit 102) controls the second small downstream exhaust port 71bS and the second large downstream exhaust port. 71bL, and when the gas generated from the processing liquid flows into the inner space of the third duct member 75, the control device 101 (control unit 102) controls the third small downstream side exhaust port 54b. The third upstream exhaust port 54c is overlapped with one of the exhaust port 71cS and the third large downstream exhaust port 71cL.

Embodiment 2 of the present invention has been described above with reference to FIGS. 16, 17(a), and 17(b). According to this embodiment, the first downstream exhaust port 71a includes two types of downstream exhaust ports that have different cross-sectional areas. Therefore, it is possible to switch (select) the exhaust amount when the gas generated from the processing liquid flows into the inner space of the first duct member 73. Similarly, the second downstream exhaust port 71b includes two types of downstream exhaust ports with different cross-sectional areas, and the third downstream exhaust port 71c includes two types of downstream exhaust ports with different cross-sectional areas. . Therefore, it is possible to switch (select) the exhaust amount when the gas generated from the processing liquid flows into the inner space of the second duct member 74. Furthermore, the amount of exhaust gas generated from the processing liquid flowing into the inner space of the third duct member 75 can be switched (selectable).

In this embodiment, the first small downstream exhaust port 71aS, the first large downstream exhaust port 71aL, the second small downstream exhaust port 71bS, the second large downstream exhaust port 71bL, and the third small downstream exhaust port 71cS and the third large downstream exhaust port 71cL are located higher in the vertical direction in this order, but the first small downstream exhaust port 71aS, the first large downstream exhaust port 71aL, and the second small downstream exhaust port The arrangement order of the port 71bS, the second large downstream exhaust port 71bL, the third small downstream exhaust port 71cS, and the third large downstream exhaust port 71cL is not limited to this order. First small downstream exhaust port 71aS, first large downstream exhaust port 71aL, second small downstream exhaust port 71bS, second large downstream exhaust port 71bL, third small downstream exhaust port 71cS, and third large downstream The side exhaust ports 71cL may be provided at different positions in the vertical direction.

Furthermore, in this embodiment, the first downstream exhaust port 71a, the second downstream exhaust port 71b, and the third downstream exhaust port 71c all have two types of downstream exhaust ports having different cross-sectional areas. However, one or two of the first downstream exhaust port 71a, the second downstream exhaust port 71b, and the third downstream exhaust port 71c have two types of downstream exhaust ports having different cross-sectional areas. It's okay.

Further, in the present embodiment, the first downstream exhaust port 71a has two types of downstream exhaust ports having different cross-sectional areas, but the first downstream exhaust port 71a has three or more types having different cross-sectional areas. It may have a downstream exhaust port. Similarly, the second downstream exhaust port 71b may include three or more types of downstream exhaust ports having mutually different cross-sectional areas. Similarly, the third downstream exhaust port 71c may include three or more types of downstream exhaust ports having mutually different cross-sectional areas.

[Embodiment 3]
Next, a third embodiment of the present invention will be described with reference to FIGS. 18(a) and 18(b). However, matters that are different from Embodiments 1 and 2 will be explained, and descriptions of matters that are the same as Embodiments 1 and 2 will be omitted. The third embodiment differs from the first and second embodiments in the operation of the second guard portion 5b.

FIGS. 18(a) and 18(b) are diagrams showing the operation of the second guard portion 5b. As shown in FIGS. 18(a) and 18(b), when the control device 101 (control unit 102) causes the gas generated from the processing liquid to flow into the inner space of the first duct member 73, The exhaust amount is adjusted by adjusting the area (effective area) where the side exhaust port 54a and the first downstream exhaust port 71a overlap.

Specifically, as shown in FIG. 18(a), the control device 101 controls the upper and lower portions of the first downstream exhaust port 71a when the gas generated from the processing liquid flows into the inner space of the first duct member 73. The first upstream exhaust port 54a overlaps the first downstream exhaust port 71a such that the position of the first upstream exhaust port 54a in the vertical direction matches the position in the vertical direction. At this time, the displacement becomes maximum. Alternatively, as shown in FIG. 18(b), the control device 101 controls the position of the first downstream exhaust port 71a in the vertical direction when the gas generated from the processing liquid flows into the inner space of the first duct member 73. In contrast, the first upstream exhaust port 54a is overlapped with the first downstream exhaust port 71a such that the position of the first upstream exhaust port 54a in the vertical direction is shifted. At this time, the displacement amount is smaller than the maximum displacement amount.

Similarly, the control device 101 (control unit 102) controls the second upstream exhaust port 54b and the second downstream exhaust port 71b when causing the gas generated from the processing liquid to flow into the inner space of the second duct member 74. The displacement is adjusted by adjusting the area where the two overlap (effective area). Furthermore, when the control device 101 (control unit 102) causes the gas generated from the processing liquid to flow into the inner space of the third duct member 75, the third upstream exhaust port 54c and the third downstream exhaust port 71c are configured to Adjust the displacement by adjusting the overlapping area (effective area).

Embodiment 3 of the present invention has been described above with reference to FIGS. 18(a) and 18(b). According to this embodiment, the amount of exhaust gas generated from the processing liquid flowing into the inner space of the first duct member 73 can be adjusted. Similarly, the amount of exhaust gas generated from the processing liquid flowing into the inner space of the second duct member 74 can be adjusted. Further, the amount of exhaust gas generated from the processing liquid flowing into the inner space of the third duct member 75 can be adjusted.

In addition, in this embodiment, the displacement amount when gas flows into the inner space of the first duct member 73, the displacement amount when gas flows into the inner space of the second duct member 74, and the displacement amount when the gas flows into the inner space of the third duct member 75. Although the exhaust volume when gas flows into the inner space has been adjusted, one or two of these exhaust volumes may be adjusted.

[Embodiment 4]
Next, a fourth embodiment of the present invention will be described with reference to FIGS. 19 to 28. However, matters that are different from Embodiments 1 to 3 will be explained, and descriptions of matters that are the same as Embodiments 1 to 3 will be omitted. The fourth embodiment is different from the first to third embodiments in the side wall 71 of the exhaust section 7.

FIG. 19 is a diagram schematically showing a cross section of a part of the processing unit 1 included in the substrate processing apparatus 100 of this embodiment. Specifically, FIG. 19 shows the processing unit 1 in the first state described with reference to FIG.

As shown in FIG. 19, the first downstream exhaust port 71a includes a first lower downstream exhaust port 71a1 and a first upper downstream exhaust port 71a2. The first lower downstream exhaust port 71a1 and the first upper downstream exhaust port 71a2 are arranged side by side in the vertical direction. Specifically, the first upper downstream exhaust port 71a2 is provided above the first lower downstream exhaust port 71a1.

As shown in FIG. 19, in the first state, the first lower downstream exhaust port 71a1 overlaps the first upstream exhaust port 54a. On the other hand, the first upper downstream exhaust port 71a2 overlaps the wall surface (outer surface) of the side wall 71 of the exhaust section 7. Therefore, the inner space of the second cup portion 53 communicates with the inner space of the first duct member 73 via the first upstream exhaust port 54a and the first lower downstream exhaust port 71a1.

Next, with reference to FIG. 20, the second guard part 5b and the exhaust part 7 will be explained. FIG. 20 is a developed view of the side wall 71 and the blocking wall portion 54 of the exhaust section 7. As shown in FIG. Specifically, FIG. 20 shows the second guard part 5b and the exhaust part 7 in the first state.

As shown in FIG. 20, the second downstream exhaust port 71b includes a second lower downstream exhaust port 71b1 and a second upper downstream exhaust port 71b2. In other words, the side wall 71 includes a first lower downstream exhaust port 71a1, a first upper downstream exhaust port 71a2, a second lower downstream exhaust port 71b1, a second upper downstream exhaust port 71b2, and a third downstream exhaust port 71a1. It has a side exhaust port 71c. The second lower downstream exhaust port 71b1 and the second upper downstream exhaust port 71b2 are arranged side by side in the vertical direction. Specifically, the second upper downstream exhaust port 71b2 is provided above the second lower downstream exhaust port 71b1.

The first lower downstream exhaust port 71a1, the second lower downstream exhaust port 71b1, the third downstream exhaust port 71c, the second upper downstream exhaust port 71b2, and the first upper downstream exhaust port 71a2 are mutually arranged in the vertical direction. located in different locations. In this embodiment, the first lower downstream exhaust port 71a1, the second lower downstream exhaust port 71b1, the third downstream exhaust port 71c, the second upper downstream exhaust port 71b2, and the first upper downstream exhaust port 71a2 are , the position in the vertical direction increases in this order.

As shown in FIG. 20, in the first state, the first upstream exhaust port 54a overlaps with the first lower downstream exhaust port 71a1 and does not overlap with the first upper downstream exhaust port 71a2. The first upper downstream exhaust port 71a2 overlaps the blocking wall portion 54. The second upstream exhaust port 54b does not overlap with either the second lower downstream exhaust port 71b1 or the second upper downstream exhaust port 71b2, but overlaps with the wall surface (outer surface) of the side wall 71 of the exhaust section 7. The third upstream exhaust port 54c does not overlap with the third downstream exhaust port 71c, but overlaps with the wall surface (outer surface) of the side wall 71 of the exhaust section 7. Therefore, in the first state, the inner space of the second cup portion 53 communicates only with the first duct member 73 among the first to third duct members 73 to 75. Note that in FIG. 20, diagonal lines indicate that the first upstream exhaust port 54a and the first lower downstream exhaust port 71a1 overlap.

Next, with reference to FIG. 19, the flow of gas in the first state will be described. As described with reference to FIG. 20, in the first state, the inner space of the second cup portion 53 communicates only with the first duct member 73 among the first to third duct members 73 to 75. Therefore, as shown in FIG. 19, in the first state, gas generated from the first processing liquid is transferred from the inner space of the second cup portion 53 to the first upstream exhaust port 54a and the first lower downstream exhaust port 71a1. It flows into the inner space of the first duct member 73 through the.

Next, with reference to FIGS. 21 and 22, the processing unit 1 included in the substrate processing apparatus 100 of this embodiment will be further described. FIG. 21 is a diagram schematically showing a cross section of another part of the processing unit 1 included in the substrate processing apparatus 100 of this embodiment. Specifically, FIG. 21 shows the processing unit 1 in the second state described with reference to FIG. FIG. 22 is another developed view of the side wall 71 and the blocking wall portion 54 of the exhaust section 7. As shown in FIG. Specifically, FIG. 22 shows the second guard part 5b and the exhaust part 7 in the second state.

As shown in FIGS. 21 and 22, in the second state, the second upstream exhaust port 54b overlaps with the second lower downstream exhaust port 71b1 and does not overlap with the second upper downstream exhaust port 71b2. The second upper downstream exhaust port 71b2 overlaps the blocking wall portion 54. The first upstream exhaust port 54a does not overlap with either the first lower downstream exhaust port 71a1 or the first upper downstream exhaust port 71a2, but overlaps with the wall surface (outer surface) of the side wall 71 of the exhaust section 7. The third upstream exhaust port 54c does not overlap with the third downstream exhaust port 71c, but overlaps with the wall surface (outer surface) of the side wall 71 of the exhaust section 7. Therefore, in the second state, the inner space of the second cup portion 53 communicates only with the second duct member 74 among the first to third duct members 73 to 75. Note that in FIG. 22, diagonal lines indicate that the second upstream exhaust port 54b and the second lower downstream exhaust port 71b1 overlap.

Therefore, as shown in FIG. 21, in the second state, gas generated from the second processing liquid is transferred from the inner space of the second cup portion 53 to the second upstream exhaust port 54b and the second lower downstream exhaust port 71b1. The liquid flows into the inner space of the second duct member 74 through.

Next, with reference to FIGS. 23 and 24, the processing unit 1 included in the substrate processing apparatus 100 of this embodiment will be further described. FIG. 23 is a diagram schematically showing a cross section of another part of the processing unit 1 included in the substrate processing apparatus 100 of this embodiment. Specifically, FIG. 23 shows the processing unit 1 in the third state described with reference to FIG. 11. FIG. 24 is another developed view of the side wall 71 and the blocking wall portion 54 of the exhaust section 7. As shown in FIG. Specifically, FIG. 24 shows the second guard part 5b and the exhaust part 7 in the third state.

As shown in FIGS. 23 and 24, in the third state, the third upstream exhaust port 54c overlaps the third downstream exhaust port 71c. On the other hand, the first upstream exhaust port 54a does not overlap with either the first lower downstream exhaust port 71a1 or the first upper downstream exhaust port 71a2, but overlaps with the wall surface (outer surface) of the side wall 71 of the exhaust section 7. Similarly, the second upstream exhaust port 54b does not overlap with either the second lower downstream exhaust port 71b1 or the second upper downstream exhaust port 71b2, but overlaps with the wall surface (outer surface) of the side wall 71 of the exhaust section 7. Therefore, in the third state, the inner space of the second cup portion 53 communicates only with the third duct member 75 among the first to third duct members 73 to 75. Note that in FIG. 24, diagonal lines indicate that the third upstream exhaust port 54c and the third downstream exhaust port 71c overlap.

Therefore, as shown in FIG. 23, in the third state, gas generated from the third processing liquid flows from the inner space of the second cup portion 53 to the third upstream exhaust port 54c and the third downstream exhaust port 71c. It flows into the inner space of the third duct member 75 through the air.

Next, the guard portion 5 will be explained with reference to FIG. 25. FIG. 25 is a diagram schematically showing a cross section of the processing unit 1 in another state. As shown in FIG. 25, the guard portion 5 further rises from the third state. Specifically, the first guard 51 further rises from the liquid receiving position and is disposed at a first raised position above the liquid receiving position. Similarly, the first cup part 52 and the second cup part 53 are further raised from the liquid receiving position and are arranged at the first raised position above the liquid receiving position. In other words, the guard part 5 is arranged at the first raised position. Hereinafter, the state in which the guard portion 5 is disposed at the first raised position may be referred to as a "fourth state." In the fourth state, the third guard 531 receives the processing liquid.

Next, with reference to FIG. 26, the second guard part 5b and the exhaust part 7 will be explained. FIG. 26 is another developed view of the side wall 71 and the blocking wall portion 54 of the exhaust section 7. As shown in FIG. Specifically, FIG. 26 shows the second guard part 5b and the exhaust part 7 in the fourth state.

As shown in FIG. 26, in the fourth state, the second upstream exhaust port 54b overlaps with the second upper downstream exhaust port 71b2 and does not overlap with the second lower downstream exhaust port 71b1. The second lower downstream exhaust port 71b1 overlaps with the blocking wall portion 54. The first upstream exhaust port 54a does not overlap with either the first lower downstream exhaust port 71a1 or the first upper downstream exhaust port 71a2, but overlaps with the wall surface (outer surface) of the side wall 71 of the exhaust section 7. The third upstream exhaust port 54c does not overlap with the third downstream exhaust port 71c, but overlaps with the wall surface (outer surface) of the side wall 71 of the exhaust section 7. Therefore, in the fourth state, the inner space of the second cup portion 53 communicates only with the second duct member 74 among the first to third duct members 73 to 75. Note that in FIG. 26, diagonal lines indicate that the second upstream exhaust port 54b and the second upper downstream exhaust port 71b2 overlap.

Next, with reference to FIG. 25, the flow of gas in the fourth state will be described. As described with reference to FIG. 26, in the fourth state, the inner space of the second cup portion 53 communicates only with the second duct member 74 among the first to third duct members 73 to 75. Therefore, as shown in FIG. 25, in the fourth state, the processing liquid attached to the inner surface 531b of the third guard 531 and the gas generated from the processing liquid accumulated in the third liquid receiving part 533 are The air flows from the inner space of the portion 53 into the inner space of the second duct member 74 via the second upstream exhaust port 54b and the second upper downstream exhaust port 71b2.

Next, the guard portion 5 will be explained with reference to FIG. 27. FIG. 27 is a diagram schematically showing a cross section of the processing unit 1 in another state. As shown in FIG. 27, the guard portion 5 further rises from the first raised position (fourth state). Specifically, the first guard 51 further rises from the first raised position and is disposed at a second raised position above the first raised position. Similarly, the first cup part 52 and the second cup part 53 are further raised from the first raised position and are arranged at a second raised position above the first raised position. In other words, the guard part 5 is arranged at the second raised position. Hereinafter, the state in which the guard portion 5 is disposed at the second raised position may be referred to as a "fifth state". In the fifth state, the third guard 531 receives the processing liquid.

Next, with reference to FIG. 28, the second guard part 5b and the exhaust part 7 will be explained. FIG. 28 is another developed view of the side wall 71 and the blocking wall portion 54 of the exhaust section 7. As shown in FIG. Specifically, FIG. 28 shows the second guard part 5b and the exhaust part 7 in the fifth state.

As shown in FIG. 28, in the fifth state, the first upstream exhaust port 54a overlaps with the first upper downstream exhaust port 71a2 and does not overlap with the first lower downstream exhaust port 71a1. The first lower downstream exhaust port 71a1 overlaps the blocking wall portion 54. The second upstream exhaust port 54b does not overlap with either the second lower downstream exhaust port 71b1 or the second upper downstream exhaust port 71b2, but overlaps with the wall surface (outer surface) of the side wall 71 of the exhaust section 7. The third upstream exhaust port 54c does not overlap with the third downstream exhaust port 71c, but overlaps with the wall surface (outer surface) of the side wall 71 of the exhaust section 7. Therefore, in the fifth state, the inner space of the second cup portion 53 communicates only with the first duct member 73 among the first to third duct members 73 to 75. Note that in FIG. 28, diagonal lines indicate that the first upstream exhaust port 54a and the first upper downstream exhaust port 71a2 overlap.

Next, with reference to FIG. 27, the flow of gas in the fifth state will be described. As described with reference to FIG. 28, in the fifth state, the inner space of the second cup portion 53 communicates only with the first duct member 73 among the first to third duct members 73 to 75. Therefore, as shown in FIG. 27, in the fifth state, the processing liquid attached to the inner surface 531b of the third guard 531 and the gas generated from the processing liquid accumulated in the third liquid receiving part 533 are The air flows from the inner space of the portion 53 into the inner space of the first duct member 73 via the first upstream exhaust port 54a and the first upper downstream exhaust port 71a2.

Embodiment 4 of the present invention has been described above with reference to FIGS. 19 to 28. According to the present embodiment, the gas generated from the processing liquid attached to the inner surface 531b of the third guard 531 and the processing liquid accumulated in the third liquid receiving portion 533 is discharged from the first duct member 73 to the first duct member 73. It is possible to switch between the three duct members 75.

In this embodiment, the first lower downstream exhaust port 71a1, the second lower downstream exhaust port 71b1, the third downstream exhaust port 71c, the second upper downstream exhaust port 71b2, and the first upper downstream exhaust port 71a2 is located higher in the vertical direction in this order: first lower downstream exhaust port 71a1, second lower downstream exhaust port 71b1, third downstream exhaust port 71c, second upper downstream exhaust port 71b2. , and the first upper downstream exhaust port 71a2 are not limited to this order. The first lower downstream exhaust port 71a1, the second lower downstream exhaust port 71b1, the third downstream exhaust port 71c, the second upper downstream exhaust port 71b2, and the first upper downstream exhaust port 71a2 are mutually arranged in the vertical direction. It is sufficient if they are provided at different positions.

[Embodiment 5]
Next, a fifth embodiment of the present invention will be described with reference to FIGS. 29 to 34. However, matters that are different from Embodiments 1 to 4 will be explained, and descriptions of matters that are the same as Embodiments 1 to 4 will be omitted. Embodiment 5 differs from Embodiments 1 to 4 in the route through which gas flows.

First, the exhaust section 7 will be explained with reference to FIGS. 29, 30, and 32. FIG. 29 is a diagram schematically showing a cross section of a part of the processing unit 1 included in the substrate processing apparatus 100 of this embodiment. Specifically, FIG. 29 shows the processing unit 1 in the first state described with reference to FIG. FIG. 30 is a diagram schematically showing a cross section of another part of the processing unit 1 included in the substrate processing apparatus 100 of this embodiment. Specifically, FIG. 30 shows the processing unit 1 in the second state described with reference to FIG. FIG. 32 is a diagram schematically showing a cross section of another part of the processing unit 1 included in the substrate processing apparatus 100 of this embodiment. Specifically, FIG. 32 shows the processing unit 1 in the third state described with reference to FIG. 11.

As shown in FIG. 29, the first downstream exhaust port 71a includes a first lower downstream exhaust port 71a1 and a first upper downstream exhaust port 71a2. In other words, the side wall 71 of the exhaust section 7 has a first lower downstream exhaust port 71a1 and a first upper downstream exhaust port 71a2. As shown in FIG. 30, the second downstream exhaust port 71b includes a second lower downstream exhaust port 71b1 and a second upper downstream exhaust port 71b2. In other words, the side wall 71 of the exhaust section 7 has a second lower downstream exhaust port 71b1 and a second upper downstream exhaust port 71b2. As shown in FIG. 32, the side wall 71 of the exhaust section 7 has a third downstream exhaust port 71c.

Next, the guard portion 5 will be explained with reference to FIGS. 29 and 30. As shown in FIGS. 29 and 30, a gap is formed between the third liquid receiving portion 533 of the second cup portion 53 and the side wall 71 of the exhaust portion 7. As shown in FIGS. More specifically, a gap is formed between the side wall 71 of the exhaust part 7 and the inner wall part of the third liquid receiving part 533. Note that the inner wall portion of the third liquid receiving portion 533 is a portion of the third liquid receiving portion 533 to which the lower end of the blocking wall portion 54 is connected, and is located below the blocking wall portion 54 . The inner wall portion of the third liquid receiving portion 533 is annular. The inner wall portion of the third liquid receiving portion 533 is inclined with respect to the side wall 71. Specifically, the inner wall portion of the third liquid receiving portion 533 is inclined so that the lower the third liquid receiving portion 533 is, the farther it is from the side wall 71.

Next, the guard portion 5 will be further explained with reference to FIGS. 30 and 31. FIG. 31 is a diagram schematically showing a cross section of the processing unit 1 in another state. Specifically, FIG. 31 shows the processing unit 1 in the second state.

As shown in FIG. 31, the second guard portion 5b includes a closing member 534. As shown in FIG. The closing member 534 is a rod-shaped member. For example, the closure member 534 can be cylindrical. The position of the closing member 534 in the circumferential direction substantially coincides with the first downstream exhaust port 71a (the first lower downstream exhaust port 71a1 and the first upper downstream exhaust port 71a2). The closing member 534 protrudes from the second cup portion 53 toward the side wall 71 of the exhaust portion 7 . More specifically, the closing member 534 is provided on the inner wall of the third liquid receiving portion 533.

Next, the chamber 2 will be explained with reference to FIG. 29. As shown in FIG. 29, the chamber 2 has an outer wall 22. As shown in FIG. The outer wall 22 has a substantially cylindrical shape. The outer wall 22 surrounds the guard part 5 and forms a gap therebetween.

Next, with reference to FIG. 29, the flow of gas in the first state will be described. As shown in FIG. 29, in the first state, the first lower downstream exhaust port 71a1 communicates with the gap (space) between the side wall 71 and the third liquid receiving part 533. On the other hand, the first upper downstream exhaust port 71a2 overlaps the blocking wall portion 54. The first upstream exhaust port 54a does not overlap with either the first lower downstream exhaust port 71a1 or the first upper downstream exhaust port 71a2, but overlaps with the wall surface (outer surface) of the side wall 71 of the exhaust section 7. Note that the second lower downstream exhaust port 71b1 and the second upper downstream exhaust port 71b2 overlap the blocking wall 54, and the second upstream exhaust port 54b overlaps the second lower downstream exhaust port 71b1 and the second upper downstream exhaust port 71b2. It does not overlap with any of the side exhaust ports 71b2, but overlaps with the wall surface (outer surface) of the side wall 71 of the exhaust section 7. The third downstream exhaust port 71c overlaps with the blocking wall 54, and the third upstream exhaust port 54c does not overlap with the third downstream exhaust port 71c, but overlaps with the wall surface (outer surface) of the side wall 71 of the exhaust section 7. .

Therefore, as shown in FIG. 29, in the first state, the processing liquid adhering to the inner surface 51c of the first guard 51 and the gas generated from the processing liquid accumulated in the first liquid receiving part 522 are removed from the chamber 2. After flowing into the gap (space) between the outer wall 22 and the guard part 5, it flows into the gap (space) between the bottom wall 21 of the chamber 2 and the guard part 5. In the first state, the gap (space) between the bottom wall 21 of the chamber 2 and the guard part 5 communicates with the gap (space) between the side wall 71 and the third liquid receiving part 533. Therefore, gas flows into the inner space of the first duct member 73 from the gap (space) between the side wall 71 and the third liquid receiving portion 533 via the first lower downstream exhaust port 71a1.

Next, the flow of gas in the second state will be described with reference to FIGS. 30 and 31. As shown in FIG. 30, in the second state, the second lower downstream exhaust port 71b1 communicates with the gap (space) between the side wall 71 and the third liquid receiving part 533. On the other hand, the second upper downstream exhaust port 71b2 overlaps the blocking wall portion 54. The second upstream exhaust port 54b does not overlap with either the second lower downstream exhaust port 71b1 or the second upper downstream exhaust port 71b2, but overlaps with the wall surface (outer surface) of the side wall 71 of the exhaust section 7.

Further, as shown in FIG. 31, in the second state, the first lower downstream exhaust port 71a1 overlaps with the closing member 534. As a result, the first lower downstream exhaust port 71a1 is closed by the closing member 534. The first upper downstream exhaust port 71a2 overlaps the blocking wall portion 54. The first upstream exhaust port 54a does not overlap with either the first lower downstream exhaust port 71a1 or the first upper downstream exhaust port 71a2, but overlaps with the wall surface (outer surface) of the side wall 71 of the exhaust section 7. Note that the third downstream exhaust port 71c overlaps with the blocking wall 54, the third upstream exhaust port 54c does not overlap with the third downstream exhaust port 71c, and the wall surface (outer surface) of the side wall 71 of the exhaust section 7 overlaps with

Therefore, in the second state, as shown in FIG. After flowing into the gap (space) between the outer wall 22 and the guard part 5, it flows into the gap (space) between the bottom wall 21 of the chamber 2 and the guard part 5. In the second state, the gap (space) between the bottom wall 21 of the chamber 2 and the guard part 5 communicates with the gap (space) between the side wall 71 and the third liquid receiving part 533. Therefore, gas flows into the inner space of the second duct member 74 from the gap (space) between the side wall 71 and the third liquid receiving portion 533 via the second lower downstream exhaust port 71b1.

Next, with reference to FIG. 32, the flow of gas in the third state will be described. As shown in FIG. 32, in the third state, the third upstream exhaust port 54c overlaps the third downstream exhaust port 71c, and the inner space of the second cup portion 53 is connected to the first duct member 73 to the third duct member. 75, only the third duct member 75 communicates with the third duct member 75. Therefore, as shown in FIG. 32, in the third state, the processing liquid adhering to the inner surface 531b of the third guard 531 and the gas generated from the processing liquid accumulated in the third liquid receiving part 533 are removed from the second cup. The air flows from the inner space of the portion 53 into the inner space of the third duct member 75 via the third upstream exhaust port 54c and the third downstream exhaust port 71c.

Next, with reference to FIG. 33, the flow of gas in the fourth state described with reference to FIG. 25 will be described. FIG. 33 is a diagram schematically showing a cross section of the processing unit 1 in another state. Specifically, FIG. 33 shows the processing unit 1 in the fourth state.

As shown in FIG. 33, in the fourth state, the second upstream exhaust port 54b overlaps the second upper downstream exhaust port 71b2, and the inner space of the second cup portion 53 is connected to the first duct member 73 to the third duct member 73. Of the members 75, only the second duct member 74 communicates. Therefore, as shown in FIG. 33, in the fourth state, the processing liquid attached to the inner surface 531b of the third guard 531 and the gas generated from the processing liquid accumulated in the third liquid receiving part 533 are The air flows from the inner space of the portion 53 into the inner space of the second duct member 74 via the second upstream exhaust port 54b and the second upper downstream exhaust port 71b2.

Next, with reference to FIG. 34, the flow of gas in the fifth state described with reference to FIG. 27 will be described. FIG. 34 is a diagram schematically showing a cross section of the processing unit 1 in another state. Specifically, FIG. 34 shows the processing unit 1 in the fifth state.

As shown in FIG. 34, in the fifth state, the first upstream exhaust port 54a overlaps with the first upper downstream exhaust port 71a2, and the inner space of the second cup portion 53 is connected to the first duct member 73 to the third duct member 73. Of the members 75, only the first duct member 73 communicates. Therefore, as shown in FIG. 34, in the fifth state, the processing liquid attached to the inner surface 531b of the third guard 531 and the gas generated from the processing liquid accumulated in the third liquid receiving part 533 are The air flows from the inner space of the portion 53 into the inner space of the first duct member 73 via the first upstream exhaust port 54a and the first upper downstream exhaust port 71a2.

Embodiment 5 of the present invention has been described above with reference to FIGS. 29 to 34. According to the present embodiment, the gas generated from the processing liquid attached to the inner surface 531b of the third guard 531 and the processing liquid accumulated in the third liquid receiving portion 533 is discharged from the first duct member 73 to the first duct member 73. It is possible to switch between the three duct members 75.

[Embodiment 6]
Next, a sixth embodiment of the present invention will be described with reference to FIGS. 35 to 38. However, matters that are different from Embodiments 1 to 5 will be explained, and descriptions of matters that are the same as Embodiments 1 to 5 will be omitted. Embodiment 6 differs from Embodiments 1 to 5 in that the processing unit 1 includes an opening/closing section 54A.

First, the substrate processing apparatus 100 of this embodiment will be described with reference to FIGS. 35 to 37. FIG. 35 is a diagram schematically showing a cross section of a part of the processing unit 1 included in the substrate processing apparatus 100 of this embodiment. FIG. 36 is a diagram schematically showing a cross section of another part of the processing unit 1 included in the substrate processing apparatus 100 of this embodiment. Specifically, FIG. 35 shows the processing unit 1 in the first state described with reference to FIG. FIG. 36 shows the processing unit 1 in the third state described with reference to FIG. 11.

As shown in FIG. 35, the processing unit 1 includes an opening/closing section 54A. The opening/closing part 54A is arranged between the guard part 5 and the exhaust part 7. Specifically, the opening/closing part 54A is arranged inside the second cup part 53. The second cup portion 53 in the sixth embodiment does not have the third liquid receiving portion 533 and the blocking wall portion 54. In this embodiment, the third guard 531 of the second cup portion 53 includes a first cylindrical portion 535a, a second cylindrical portion 535b, and a connecting portion 535c.

The first cylindrical portion 535a has a substantially cylindrical shape. The first cylindrical portion 535a receives the processing liquid scattered from the substrate W. Specifically, the upper portion of the first cylindrical portion 535a in the vertical direction is inclined upward toward the rotation axis AX. Further, the center and lower portions of the first cylindrical portion 535a extend substantially vertically. The second liquid receiving portion 532 of the second cup portion 53 projects outward from the first cylindrical portion 535a.

The second cylindrical portion 535b has a substantially cylindrical shape. Specifically, the second cylindrical portion 535b extends substantially vertically. The second cylindrical portion 535b is arranged inside the first cylindrical portion 535a and away from the first cylindrical portion 535a.

The connecting portion 535c connects the first cylindrical portion 535a and the second cylindrical portion 535b. The connecting portion 535c is annular. In this embodiment, the connecting portion 535c protrudes inward from the inner surface of the first cylindrical portion 535a and connects to the upper end of the second cylindrical portion 535b. More specifically, the connecting portion 535c is inclined diagonally downward with respect to the vertical direction.

The opening/closing portion 54A has a substantially cylindrical shape. The opening/closing section 54A has the blocking wall section 54 described in the first embodiment. Moreover, the opening/closing part 54A has a bottom wall 55 and an outer wall 56. The blocking wall portion 54 has the first upstream exhaust port 54a to the third upstream exhaust port 54c described with reference to FIGS. 4 and 5.

The bottom wall 55 of the opening/closing section 54A is connected to the lower end of the blocking wall section 54. The bottom wall 55 of the opening/closing portion 54A is annular and extends outward from the lower end of the blocking wall portion 54. The outer wall 56 of the opening/closing part 54A is connected to the outer edge of the bottom wall 55 of the opening/closing part 54A. The outer wall 56 of the opening/closing portion 54A is annular and extends substantially upward from the outer edge of the bottom wall 55. The outer wall 56 of the opening/closing part 54A is arranged inside the second cup part 53. Specifically, the outer wall 56 of the opening/closing part 54A is arranged in the gap between the first cylindrical part 535a and the second cylindrical part 535b.

As shown in FIG. 36, the opening/closing section 54A has a third liquid receiving section 533. Specifically, the lower part of the blocking wall part 54, the bottom wall 55, and the lower part of the outer wall 56 constitute the third liquid receiving part 533. The processing liquid scattered from the rotating substrate W is received by the first cylindrical portion 535a of the second cup portion 53. The third processing liquid adhering to the first cylindrical part 535a flows from the first cylindrical part 535a into the third liquid receiving part 533 via the connecting part 535c and the second cylindrical part 535b.

As shown in FIGS. 35 and 36, the opening/closing portion 54A has a position where the first upstream exhaust port 54a overlaps the first downstream exhaust port 71a, and a position where the third upstream exhaust port 54c overlaps with the third downstream exhaust port 71c. Go up and down between the positions that overlap. Therefore, similarly to Embodiments 1 to 5, by raising and lowering the opening/closing part 54A, one of the first to third downstream exhaust ports 71a to 71c can be opened and the remaining ones can be closed. can. As a result, the gas exhaust destination can be switched.

FIG. 37 is a diagram schematically showing a cross section of the processing unit 1 in another state. Specifically, FIG. 37 shows the processing unit 1 in the third state described with reference to FIG. 11. As shown in FIGS. 36 and 37, the opening/closing part 54A can be raised and lowered independently of the guard part 5. Therefore, as shown in FIG. 37, in the third state, the opening/closing part 54A is arranged at a position where the first upstream exhaust port 54a and the first downstream exhaust port 71a overlap, and the removal The liquid and the gas generated from the processing liquid accumulated in the third liquid receiving portion 533 can flow into the first duct member 73.

Next, the substrate processing apparatus 100 of this embodiment will be further explained with reference to FIG. FIG. 38 is a diagram showing the guard part 5, the opening/closing part 54A, and the elevating part 6. As shown in FIG. 38, the elevating section 6 further includes a fourth elevating section 64. The first elevation section 61 to the fourth elevation section 64 are controlled by a control device 101 (control section 102).

The fourth elevating section 64 is attached to the bottom wall 21 of the chamber 2 . The opening/closing section 54A is connected to the fourth elevating section 64. The fourth elevating section 64 raises and lowers the opening/closing section 54A in the vertical direction. Therefore, according to this embodiment, the first guard 51, the first cup part 52, the second cup part 53, and the opening/closing part 54A can be raised and lowered individually.

Specifically, the fourth elevating section 64 has a driving source such as a motor and an elevating mechanism, and the elevating mechanism is driven by the driving source to raise or lower the opening/closing section 54A. The lifting mechanism includes, for example, a rack and pinion mechanism or a ball screw.

Embodiment 6 of the present invention has been described above with reference to FIGS. 35 to 38. According to this embodiment, by raising and lowering the opening/closing part 54A, acidic gas generated from the first processing liquid (acidic chemical liquid) is discharged to the first exhaust pipe P4, and the second processing liquid (alkaline chemical liquid) is discharged to the first exhaust pipe P4. The alkaline gas generated from the exhaust gas can be discharged to the second exhaust pipe P6. As a result, crystals (salts) are less likely to form in the exhaust pipe.

Moreover, according to this embodiment, the first guard 51, the first cup part 52, the second cup part 53, and the opening/closing part 54A can be operated independently from each other. Therefore, similar to Embodiments 1 to 5, the combination of the liquid drainage destination and the exhaust destination can be changed.

[Embodiment 7]
Next, a seventh embodiment of the present invention will be described with reference to FIGS. 39 to 41. However, matters that are different from Embodiments 1 to 6 will be explained, and descriptions of matters that are the same as Embodiments 1 to 6 will be omitted. Embodiment 7 differs from Embodiments 1 to 6 in the positions of first upstream exhaust port 54a to third upstream exhaust port 54c and first downstream exhaust port 71a to third downstream exhaust port 71c. Furthermore, the seventh embodiment differs from the first to sixth embodiments in the operating direction of the opening/closing portion 54B.

First, the substrate processing apparatus 100 of this embodiment will be explained with reference to FIG. FIG. 39 is a diagram schematically showing a cross section of a part of the processing unit 1 included in the substrate processing apparatus 100 of this embodiment. Specifically, FIG. 39 shows the processing unit 1 in the third state described with reference to FIG. 11.

As shown in FIG. 39, the processing unit 1 includes an opening/closing section 54B. The opening/closing part 54B is arranged between the guard part 5 and the exhaust part 7. Specifically, the opening/closing part 54B is arranged inside the second cup part 53. The second cup portion 53 in the seventh embodiment does not have the third liquid receiving portion 533 and the blocking wall portion 54, similarly to the sixth embodiment. The third guard 531 of the second cup portion 53 in the seventh embodiment includes a first cylindrical portion 535a, a second cylindrical portion 535b, and a connecting portion 535c, as in the sixth embodiment. The configurations of the first cylindrical portion 535a, the second cylindrical portion 535b, and the connecting portion 535c are substantially the same as those of the first cylindrical portion 535a, the second cylindrical portion 535b, and the connecting portion 535c described in the sixth embodiment. I will omit the explanation.

The opening/closing portion 54B has a substantially cylindrical shape. The opening/closing section 54B has a blocking wall section 54. Further, the opening/closing section 54B has a bottom wall 55 and an outer wall 56, similar to the opening/closing section 54A described in the sixth embodiment. The blocking wall portion 54 is annular and extends substantially vertically. The blocking wall section 54 is arranged at a position close to the exhaust section 7. The configurations of the bottom wall 55 and outer wall 56 of the opening/closing section 54B are substantially the same as the bottom wall 55 and the outer wall 56 of the opening/closing section 54A described in the sixth embodiment, so a description thereof will be omitted.

Next, referring to FIG. 40, the opening/closing section 54B and the exhaust section 7 will be described. FIG. 40 is a developed view of the side wall 71 and the blocking wall portion 54 of the exhaust section 7. As shown in FIG. Specifically, FIG. 40 shows a state in which the opening/closing portion 54B is arranged at a position where the first upstream exhaust port 54a overlaps the first downstream exhaust port 71a. Note that in FIG. 40, diagonal lines indicate that the first upstream exhaust port 54a and the first downstream exhaust port 71a overlap.

As shown in FIG. 40, in the seventh embodiment, a first upstream exhaust port 54a, a second upstream exhaust port 54b, a third upstream exhaust port 54c, a first downstream exhaust port 71a, a second downstream exhaust port The positions of the third downstream exhaust port 71b and the third downstream exhaust port 71c in the vertical direction are substantially the same. Furthermore, in the seventh embodiment, the first upstream exhaust port 54a, the second upstream exhaust port 54b, and the third upstream exhaust port 54c are provided at unequal angular intervals. The first downstream exhaust port 71a, the second downstream exhaust port 71b, and the third downstream exhaust port 71c are similarly provided at unequal angular intervals.

More specifically, the first upstream exhaust port 54a, the second upstream exhaust port 54b, the third upstream exhaust port 54c, the first downstream exhaust port 71a, the second downstream exhaust port 71b, and the third downstream exhaust port 71c, when the first upstream exhaust port 54a overlaps with the first downstream exhaust port 71a, the second upstream exhaust port 54b does not overlap with the second downstream exhaust port 71b, and the third upstream exhaust port 54c It is provided at a position that does not overlap with the third downstream exhaust port 71c. At this time, the second upstream exhaust port 54b overlaps the wall surface (outer surface) of the side wall 71 of the exhaust section 7. Similarly, the third upstream exhaust port 54c overlaps the wall surface (outer surface) of the side wall 71 of the exhaust section 7.

In addition, the first upstream exhaust port 54a, the second upstream exhaust port 54b, the third upstream exhaust port 54c, the first downstream exhaust port 71a, the second downstream exhaust port 71b, and the third downstream exhaust port 71c are , when the second upstream exhaust port 54b overlaps with the second downstream exhaust port 71b, the first upstream exhaust port 54a does not overlap with the first downstream exhaust port 71a, and the third upstream exhaust port 54c overlaps with the third downstream exhaust port 71b. It is provided at a position that does not overlap with the downstream exhaust port 71c. Further, when the third upstream exhaust port 54c overlaps with the third downstream exhaust port 71c, the first upstream exhaust port 54a does not overlap with the first downstream exhaust port 71a, and the second upstream exhaust port 54b overlaps with the third downstream exhaust port 71c. It is provided at a position that does not overlap with the second downstream exhaust port 71b.

Next, the substrate processing apparatus 100 of this embodiment will be further described with reference to FIG. 41. FIG. 41 is a diagram showing the guard part 5, the opening/closing part 54B, the elevating part 6, and the rotating part 12. As shown in FIG. 41, the processing unit 1 further includes a rotating section 12. The first to third lifting sections 61 to 63 and the rotating section 12 are controlled by a control device 101 (control section 102).

The rotating portion 12 rotates the opening/closing portion 54B around the rotation axis AX described with reference to FIG. Specifically, the rotating section 12 controls the rotational position of the opening/closing section 54B. The rotating part 12 has a drive source such as a motor and a rotating mechanism, and the rotating mechanism is driven by the drive source to rotate the opening/closing part 54B. The rotation mechanism includes, for example, at least one gear.

By controlling the rotational position of the opening/closing part 54B by the rotating part 12, one of the first to third downstream exhaust ports 71a to 71c can be opened and the remaining ones can be closed. Therefore, the gas exhaust destination can be changed.

Embodiment 7 of the present invention has been described above with reference to FIGS. 39 to 41. According to this embodiment, by rotating the opening/closing part 54B, acidic gas generated from the first processing liquid (acidic chemical solution) is discharged to the first exhaust pipe P4, and the second processing liquid (alkaline chemical solution) is discharged to the first exhaust pipe P4. The alkaline gas generated from the exhaust gas can be discharged to the second exhaust pipe P6. As a result, crystals (salts) are less likely to form in the exhaust pipe.

Moreover, according to this embodiment, the first guard 51, the first cup part 52, the second cup part 53, and the opening/closing part 54B can be operated independently from each other. Specifically, the first guard 51, the first cup part 52, and the second cup part 53 can be raised and lowered individually. Moreover, the opening/closing part 54B can be rotated independently of the first guard 51, the first cup part 52, and the second cup part 53. Therefore, similar to Embodiments 1 to 6, the combination of the liquid drainage destination and the exhaust destination can be changed.

[Embodiment 8]
Next, Embodiment 8 of the present invention will be described with reference to FIG. However, matters that are different from Embodiments 1 to 7 will be explained, and descriptions of matters that are the same as Embodiments 1 to 7 will be omitted. Embodiment 8 differs from Embodiments 1 to 7 in that the processing unit 1 includes an opening/closing section 54C.

FIG. 42 is a diagram schematically showing a part of the processing unit 1 included in the substrate processing apparatus 100 according to the present embodiment. Specifically, FIG. 42 shows the side wall 71 of the exhaust section 7, the opening/closing section 54C, and the opening/closing drive section 13.

As shown in FIG. 42, the processing unit 1 includes an opening/closing section 54C. Further, as shown in FIG. 42, the substrate processing apparatus 100 includes an opening/closing drive section 13. In this embodiment, the opening/closing section 54C includes a first opening/closing section 541 to a third opening/closing section 543. Further, the opening/closing drive unit 13 includes a first opening/closing drive unit 13a to a third opening/closing drive unit 13c.

The first opening/closing part 541 to the third opening/closing part 543 correspond to the first downstream exhaust port 71a to the third downstream exhaust port 71c, respectively. Specifically, the position of the first opening/closing portion 541 in the circumferential direction substantially coincides with the first downstream exhaust port 71a. Similarly, the position of the second opening/closing portion 542 in the circumferential direction substantially coincides with the second downstream exhaust port 71b. The position of the third opening/closing portion 543 in the circumferential direction substantially coincides with the third downstream exhaust port 71c.

The first opening/closing section 541 to the third opening/closing section 543 are arranged on the outer surface of the side wall 71 of the exhaust section 7. The first opening/closing section 541 to the third opening/closing section 543 may be attached to the outer surface of the side wall 71 of the exhaust section 7 so as to be slidable in the vertical direction.

The first opening/closing drive section 13a moves the first opening/closing section 541 up and down in the vertical direction. Similarly, the second opening/closing drive section 13b moves the second opening/closing section 542 up and down in the vertical direction. The third opening/closing drive section 13c moves the third opening/closing section 543 up and down in the vertical direction. The first opening/closing drive section 13a to the third opening/closing drive section 13c are controlled by the control device 101 (control section 102).

Specifically, the first opening/closing drive unit 13a has two positions: a closed position where the first opening/closing part 541 overlaps with the first downstream exhaust port 71a, and an open position where the first opening/closing part 541 does not overlap with the first downstream exhaust port 71a. The first opening/closing part 541 is raised and lowered between the positions. By placing the first opening/closing portion 541 in the closed position, the first downstream exhaust port 71a is closed. By placing the first opening/closing portion 541 in the open position, the first downstream exhaust port 71a is opened.

The first opening/closing drive section 13a includes, for example, a cylinder. In this case, the rod of the cylinder is connected to the first opening/closing part 541. Therefore, by driving the cylinder, the first opening/closing section 541 can be raised and lowered.

The configurations of the second opening/closing drive section 13b and the third opening/closing section 543 are substantially the same as those of the first opening/closing drive section 13a, so detailed description thereof will be omitted.

Embodiment 8 of the present invention has been described above with reference to FIG. According to the present embodiment, by raising and lowering the first opening/closing part 541 to the third opening/closing part 543, acidic gas generated from the first processing liquid (acidic chemical solution) is discharged to the first exhaust pipe P4. The alkaline gas generated from the second processing liquid (alkaline chemical solution) can be discharged to the second exhaust pipe P6. As a result, crystals (salts) are less likely to form in the exhaust pipe.

Further, according to the present embodiment, the first guard 51, the first cup part 52, the second cup part 53, and the first opening/closing part 541 to the third opening/closing part 543 can be operated independently of each other. Specifically, the first guard 51, the first cup part 52, the second cup part 53, and the first opening/closing part 541 to the third opening/closing part 543 can be raised and lowered individually. Therefore, similar to Embodiments 1 to 7, the combination of the liquid drainage destination and the exhaust destination can be changed.

In the present embodiment, the opening/closing drive section 13 moves the opening/closing section 54C up and down, but the opening/closing drive section 13 may move the opening/closing section 54C in the circumferential direction.

Further, in this embodiment, the vertical positions of the first downstream exhaust port 71a to the third downstream exhaust port 71c are approximately the same, but the positions of the first downstream exhaust port 71a to the third downstream exhaust port 71c are approximately the same. The positions in the vertical direction may be different from each other.

The embodiments of the present invention have been described above with reference to the drawings (FIGS. 1 to 42). However, the present invention is not limited to the above-described embodiments, and can be implemented in various forms without departing from the spirit thereof. Further, the plurality of components disclosed in the above embodiments can be modified as appropriate. For example, some of the components shown in one embodiment may be added to the components of another embodiment, or some of the components shown in one embodiment may be configured. Elements may be deleted from the embodiment.

The drawings mainly schematically show each component in order to facilitate understanding of the invention, and the thickness, length, number, spacing, etc. of each illustrated component may vary depending on the convenience of drawing. The above image may differ from the actual one. Further, the configuration of each component shown in the above embodiment is an example, and is not particularly limited, and it goes without saying that various changes can be made without substantially departing from the effects of the present invention. .

For example, in the embodiments described with reference to FIGS. 1 to 42, the substrate W is a semiconductor wafer, but the substrate W is not limited to a semiconductor wafer. For example, the substrate W may be a liquid crystal display substrate, a field emission display (FED) substrate, an optical disk substrate, a magnetic disk substrate, a magneto-optical disk substrate, a photomask substrate, a ceramic substrate, or It can be a substrate for solar cells.

Furthermore, in the embodiments described with reference to FIGS. 1 to 42, a clamp-type chuck that clamps the substrate W has been described as a configuration for holding the substrate W, but a vacuum-type chuck has been described as a configuration for holding the substrate W. A chuck may also be employed.

Furthermore, in the embodiment described with reference to FIGS. 1 to 42, the processing liquid supply section 11 has three nozzles (the first nozzle 11a to the third nozzle 11c), but the processing liquid supply section 11 has two nozzles. It may have one nozzle or four or more nozzles.

Further, in the embodiments described with reference to FIGS. 1 to 42, the processing liquid supply section 11 has an upper nozzle that is a nozzle that discharges the processing liquid from above the substrate W toward the substrate W. The liquid supply section 11 may have a lower nozzle in addition to the upper nozzle. The lower nozzle is a nozzle that protrudes upward from the spin base 33 through an opening located at the center of the spin base 33. The upper end of the lower nozzle is located below the substrate W and faces the center of the lower surface of the substrate W. The lower nozzle supplies the processing liquid toward the center of the lower surface of the substrate W.

The present invention is useful in the field of processing substrates.

1: Processing unit 3: Spin chuck 4: Spin motor section 5: Guard section 5a: First guard section 5b: Second guard section 6: Elevating section 7: Exhaust section 11: Processing liquid supply section 12: Rotating section 13: Opening/closing drive section 51: First guard 52: First cup section 53: Second cup section 54: Blocking wall section 54A: Opening/closing section 54B: Opening/closing section 54C: Opening/closing section 54a: First upstream exhaust port 54b: Second upstream side Side exhaust port 54c: Third upstream exhaust port 71a: First downstream exhaust port 71b: Second downstream exhaust port 71c: Third downstream exhaust port 73: First duct member 74: Second duct member 75: First 3 duct member 100: Substrate processing device 101: Control device 521: Second guard 522a: First drain port 531: Third guard 532a: Second drain port 533a: Third drain port W: Substrate

Claims (8)

A substrate processing apparatus that processes a substrate,
a substrate holder that holds the substrate horizontally;
a substrate rotation unit that rotates the substrate and the substrate holding unit together around a central axis extending in the vertical direction;
a processing liquid supply unit that supplies processing liquid to the substrate;
a first guard that catches the processing liquid scattered from the rotating substrate;
an exhaust section having a plurality of downstream exhaust ports and disposed inside the first guard ;
a first cup part that is disposed between the first guard and the exhaust part and receives the processing liquid scattered from the rotating substrate;
a second cup part that is disposed between the first cup part and the exhaust part and receives the processing liquid scattered from the rotating substrate;
a moving mechanism that individually raises and lowers the first guard, the first cup part, and the second cup part in the vertical direction;
a control section that controls the moving mechanism;
Equipped with
The first cup portion is
a second guard that receives the processing liquid;
a first liquid receiving part that receives the processing liquid received by the first guard ;
a first liquid drain port provided in the first liquid receiving part and configured to discharge the processing liquid from the first liquid receiving part;
has
The second cup portion is
a third guard that receives the processing liquid;
a second liquid receiving part that receives the processing liquid received by the second guard;
a second liquid drain port provided in the second liquid receiving part and configured to discharge the processing liquid from the second liquid receiving part;
a third liquid receiving part that receives the processing liquid received by the third guard;
a third liquid drain port provided in the third liquid receiving part and discharging the processing liquid from the third liquid receiving part;
an opening/closing part that opens and closes the plurality of downstream exhaust ports;
has
The opening/closing part is connected to the third liquid receiving part,
The control unit controls the moving mechanism to individually raise and lower the first guard, the first cup portion, and the second cup portion in the vertical direction, thereby moving the first guard, the second guard, and the second cup portion up and down individually. One of the third guards receives the processing liquid and discharges the processing liquid from one of the first drainage port, the second drainage port, and the third drainage port. The substrate processing apparatus further comprises causing gas generated from the first liquid receiving part, the second liquid receiving part, or the third liquid receiving part to flow into one of the plurality of downstream exhaust ports. While the substrate rotating section is rotating the substrate, the control section controls the moving mechanism to move the second cup section up and down in the up and down direction, and from among the plurality of downstream exhaust ports. 2. The substrate processing apparatus according to claim 1, wherein the downstream exhaust port to be opened is changed. The opening/closing part has a wall part disposed between the third guard and the exhaust part ,
The wall portion has a plurality of upstream exhaust ports each corresponding to the plurality of downstream exhaust ports,
The control section controls the moving mechanism to move the second cup section up and down in the vertical direction , and connects any one of the plurality of downstream exhaust ports to any one of the plurality of upstream exhaust ports. The substrate processing apparatus according to claim 1 or 2, wherein the two are selectively overlapped. The substrate processing apparatus according to claim 3, wherein the control unit adjusts an area where the downstream exhaust port and the upstream exhaust port overlap. The plurality of downstream exhaust ports are provided at mutually different positions in the circumferential direction,
5. The substrate processing apparatus according to claim 3, wherein the plurality of upstream exhaust ports are provided at mutually different positions in the circumferential direction. 6. The substrate processing apparatus according to claim 5, wherein the plurality of downstream exhaust ports are provided at mutually different positions in the vertical direction. The exhaust section further includes a plurality of duct members,
Each of the plurality of downstream exhaust ports communicates with the plurality of duct members,
At least one of the plurality of downstream exhaust ports includes an upper downstream exhaust port and a lower downstream exhaust port,
The upper downstream exhaust port and the lower downstream exhaust port are arranged side by side in the vertical direction,
The upper downstream exhaust port is provided above the lower downstream exhaust port,
The upper downstream exhaust port and the lower downstream exhaust port communicate with one of the plurality of duct members,
Claims 1 to 6, wherein the control unit controls the moving mechanism to move the second cup part up and down in the vertical direction, thereby switching the destination of the gas among the plurality of duct members . The substrate processing apparatus according to any one of the above. The exhaust section further includes a plurality of duct members,
Each of the plurality of downstream exhaust ports communicates with the plurality of duct members,
At least one of the plurality of downstream exhaust ports includes a large downstream exhaust port and a small downstream exhaust port,
The large downstream exhaust port has a larger cross-sectional area than the small downstream exhaust port,
The large downstream exhaust port and the small downstream exhaust port are arranged side by side in the vertical direction,
The large downstream exhaust port and the small downstream exhaust port communicate with one of the plurality of duct members,
Claims 1 to 7, wherein the control unit controls the moving mechanism to move the second cup part up and down in the vertical direction, thereby switching the destination of the gas among the plurality of duct members . The substrate processing apparatus according to any one of the above.

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