JP7417507B2 - 樹脂成形装置及び樹脂成形品の製造方法 - Google Patents
樹脂成形装置及び樹脂成形品の製造方法 Download PDFInfo
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- JP7417507B2 JP7417507B2 JP2020187021A JP2020187021A JP7417507B2 JP 7417507 B2 JP7417507 B2 JP 7417507B2 JP 2020187021 A JP2020187021 A JP 2020187021A JP 2020187021 A JP2020187021 A JP 2020187021A JP 7417507 B2 JP7417507 B2 JP 7417507B2
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- resin
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- 239000011347 resin Substances 0.000 title claims description 221
- 229920005989 resin Polymers 0.000 title claims description 221
- 238000000465 moulding Methods 0.000 title claims description 67
- 238000000034 method Methods 0.000 title claims description 11
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 230000007246 mechanism Effects 0.000 claims description 86
- 238000004140 cleaning Methods 0.000 claims description 50
- 239000000428 dust Substances 0.000 claims description 33
- 239000007787 solid Substances 0.000 claims description 21
- 230000007723 transport mechanism Effects 0.000 claims description 7
- 230000032258 transport Effects 0.000 claims 1
- 239000000758 substrate Substances 0.000 description 54
- 239000000843 powder Substances 0.000 description 5
- 238000005520 cutting process Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 230000002950 deficient Effects 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000004806 packaging method and process Methods 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000010365 information processing Effects 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/10—Cleaning by methods involving the use of tools characterised by the type of cleaning tool
- B08B1/12—Brushes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B5/00—Cleaning by methods involving the use of air flow or gas flow
- B08B5/04—Cleaning by suction, with or without auxiliary action
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/70—Maintenance
- B29C33/72—Cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C45/00—Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
- B29C45/02—Transfer moulding, i.e. transferring the required volume of moulding material by a plunger from a "shot" cavity into a mould cavity
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C45/00—Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
- B29C45/17—Component parts, details or accessories; Auxiliary operations
- B29C45/1753—Cleaning or purging, e.g. of the injection unit
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07 e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07 e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
- H01L21/565—Moulds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67126—Apparatus for sealing, encapsulating, glassing, decapsulating or the like
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
- Injection Moulding Of Plastics Or The Like (AREA)
Description
以下、本発明の実施の形態について、図面を参照しながら詳細に説明する。なお、図中同一又は相当部分には同一符号を付してその説明は繰り返さない。
本実施形態の樹脂成形装置100は、トランスファモールド法を使用した樹脂成形装置である。この樹脂成形装置は、例えば、半導体チップが接続された基板を樹脂成形するものであり、樹脂材料として円柱状をなすタブレット状の熱硬化性樹脂(以下、「樹脂タブレット」という。)を使用するものである。
以下、本実施形態の樹脂成形装置100の樹脂成形の基本動作を説明する。
以下、本実施形態のクリーニング機構5の基本構成を説明する。
以下、本実施形態のクリーニング機構5の基本動作を説明する。ここで説明する動作は、制御部COMで制御する。
上記実施形態の思想は、以上で説明された実施の形態に限定されない。以下、上記実施形態の思想を適用できる他の実施の形態の一例について説明する。
上記実施形態のクリーニング機構は、固形樹脂を保持部で保持して樹脂成形部に搬入する搬入機構の前記保持部を吸引する吸引機構と、上下に駆動されるブラシと、前記保持部を覆うカバーとを備える。このクリーニング機構によれば、樹脂の粉塵が周囲に飛散することを低減し、樹脂を保持する保持部の内側に付着した樹脂の粉塵を除去することができる。
1・・・搬入機構(ローダ)
2・・・搬出機構(アンローダ)
5・・・クリーニング機構
51・・・カバー
52・・・吸引機構
53・・・ブラシ
6・・・成形型
A・・・供給モジュール
B・・・樹脂成形モジュール(樹脂成形部)
C・・・搬出モジュール
W・・・基板
T・・・樹脂タブレット
Claims (4)
- 複数の固形樹脂を用いて樹脂成形する樹脂成形部と、
複数の固形樹脂それぞれを保持する複数の保持部を有し、前記保持部が保持した複数の固形樹脂を樹脂成形部に搬入する搬入機構と、
前記複数の保持部をクリーニングするクリーニング機構とを備え、
前記クリーニング機構は、
前記複数の保持部それぞれを覆う筒状の複数のカバーと、
前記複数のカバー内の粉塵を吸引する吸引機構と、
前記複数のカバーそれぞれの内側に配置され、上下に駆動される複数のブラシと、
前記複数のブラシに連結している共通の支持部とを備える樹脂成形装置。 - 前記クリーニング機構は、前記搬入機構が前記樹脂成形部に固形樹脂を搬入した後であって、次の樹脂成形で用いる固形樹脂を保持する前にクリーニングする、請求項1に記載の樹脂成形装置。
- 前記複数の保持部それぞれは、複数のピン状のガイド部材を含む、請求項1又は請求項2に記載の樹脂成形装置。
- 請求項1~3のいずれか1項に記載の樹脂成形装置を用いて樹脂成形品を製造する方法であって、
前記搬入機構が搬入した固形樹脂を用いて樹脂成形する樹脂成形工程と、
前記搬入機構の前記保持部を前記クリーニング機構でクリーニングするクリーニング工程と、
前記クリーニング工程でクリーニングされた前記搬入機構が固形樹脂を保持して成形型に搬入する搬入工程とを含む、樹脂成形品の製造方法。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020187021A JP7417507B2 (ja) | 2020-11-10 | 2020-11-10 | 樹脂成形装置及び樹脂成形品の製造方法 |
KR1020227045298A KR102744671B1 (ko) | 2020-11-10 | 2021-11-08 | 수지 성형 장치 및 수지 성형품의 제조 방법 |
CN202180047146.XA CN115917717A (zh) | 2020-11-10 | 2021-11-08 | 清洁机构、树脂成形装置及树脂成形品的制造方法 |
PCT/JP2021/040943 WO2022102563A1 (ja) | 2020-11-10 | 2021-11-08 | クリーニング機構、樹脂成形装置及び樹脂成形品の製造方法 |
TW110141434A TWI811837B (zh) | 2020-11-10 | 2021-11-08 | 樹脂成形裝置及樹脂成形品的製造方法 |
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JP2020187021A JP7417507B2 (ja) | 2020-11-10 | 2020-11-10 | 樹脂成形装置及び樹脂成形品の製造方法 |
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JP2022076587A JP2022076587A (ja) | 2022-05-20 |
JP7417507B2 true JP7417507B2 (ja) | 2024-01-18 |
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Country Status (5)
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JP (1) | JP7417507B2 (ja) |
KR (1) | KR102744671B1 (ja) |
CN (1) | CN115917717A (ja) |
TW (1) | TWI811837B (ja) |
WO (1) | WO2022102563A1 (ja) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002313829A (ja) | 2001-04-19 | 2002-10-25 | Mitsubishi Electric Corp | 半導体樹脂封止装置用金型のクリーニング装置 |
JP2014083784A (ja) | 2012-10-25 | 2014-05-12 | Apic Yamada Corp | クリーナ装置及びモールド装置 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
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JPS63161710U (ja) * | 1987-04-03 | 1988-10-21 | ||
JP2770074B2 (ja) * | 1990-09-11 | 1998-06-25 | トーワ株式会社 | 樹脂タブレットの搬送供給方法 |
JPH0752187A (ja) * | 1993-08-10 | 1995-02-28 | Fujitsu Miyagi Electron:Kk | 半導体チップ樹脂封止装置 |
JPH07156157A (ja) * | 1993-12-09 | 1995-06-20 | Fujitsu Miyagi Electron:Kk | 樹脂成形金型のクリーニング方法及びクリーニング装置 |
JPH08238644A (ja) * | 1995-03-03 | 1996-09-17 | Toshiba Fa Syst Eng Kk | モールド装置 |
JPH1071627A (ja) * | 1996-08-30 | 1998-03-17 | Nec Kansai Ltd | 樹脂モールド装置 |
TWI327756B (en) * | 2002-11-29 | 2010-07-21 | Apic Yamada Corp | Resin molding machine |
JP5985402B2 (ja) * | 2013-01-08 | 2016-09-06 | Towa株式会社 | 樹脂封止装置及び樹脂封止方法 |
JP6705765B2 (ja) * | 2017-03-23 | 2020-06-03 | ファスフォードテクノロジ株式会社 | ダイボンディング装置および半導体装置の製造方法 |
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- 2020-11-10 JP JP2020187021A patent/JP7417507B2/ja active Active
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2021
- 2021-11-08 WO PCT/JP2021/040943 patent/WO2022102563A1/ja active Application Filing
- 2021-11-08 TW TW110141434A patent/TWI811837B/zh active
- 2021-11-08 CN CN202180047146.XA patent/CN115917717A/zh active Pending
- 2021-11-08 KR KR1020227045298A patent/KR102744671B1/ko active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002313829A (ja) | 2001-04-19 | 2002-10-25 | Mitsubishi Electric Corp | 半導体樹脂封止装置用金型のクリーニング装置 |
JP2014083784A (ja) | 2012-10-25 | 2014-05-12 | Apic Yamada Corp | クリーナ装置及びモールド装置 |
Also Published As
Publication number | Publication date |
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TW202218846A (zh) | 2022-05-16 |
WO2022102563A1 (ja) | 2022-05-19 |
KR20230015449A (ko) | 2023-01-31 |
JP2022076587A (ja) | 2022-05-20 |
KR102744671B1 (ko) | 2024-12-19 |
TWI811837B (zh) | 2023-08-11 |
CN115917717A (zh) | 2023-04-04 |
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