JP7033215B2 - 電気分解用還元電極の活性層組成物およびそれに由来の還元電極 - Google Patents
電気分解用還元電極の活性層組成物およびそれに由来の還元電極 Download PDFInfo
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- JP7033215B2 JP7033215B2 JP2020560458A JP2020560458A JP7033215B2 JP 7033215 B2 JP7033215 B2 JP 7033215B2 JP 2020560458 A JP2020560458 A JP 2020560458A JP 2020560458 A JP2020560458 A JP 2020560458A JP 7033215 B2 JP7033215 B2 JP 7033215B2
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- 238000005868 electrolysis reaction Methods 0.000 title claims description 82
- 239000000203 mixture Substances 0.000 title claims description 66
- 230000009467 reduction Effects 0.000 title claims description 34
- 229910052751 metal Inorganic materials 0.000 claims description 58
- 239000002184 metal Substances 0.000 claims description 58
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 46
- 239000002243 precursor Substances 0.000 claims description 36
- -1 amine compound Chemical class 0.000 claims description 33
- 238000000034 method Methods 0.000 claims description 29
- 229910052707 ruthenium Inorganic materials 0.000 claims description 24
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 22
- 229910052697 platinum Inorganic materials 0.000 claims description 20
- 239000011248 coating agent Substances 0.000 claims description 19
- 238000000576 coating method Methods 0.000 claims description 19
- 239000000758 substrate Substances 0.000 claims description 18
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 16
- 229910052739 hydrogen Inorganic materials 0.000 claims description 16
- 239000001257 hydrogen Substances 0.000 claims description 16
- IOQPZZOEVPZRBK-UHFFFAOYSA-N octan-1-amine Chemical compound CCCCCCCCN IOQPZZOEVPZRBK-UHFFFAOYSA-N 0.000 claims description 16
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical group [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 claims description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 14
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 13
- 150000003839 salts Chemical class 0.000 claims description 13
- 150000001875 compounds Chemical class 0.000 claims description 12
- 238000004519 manufacturing process Methods 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 10
- 239000003960 organic solvent Substances 0.000 claims description 10
- 238000001179 sorption measurement Methods 0.000 claims description 10
- 125000004432 carbon atom Chemical group C* 0.000 claims description 9
- 229910052684 Cerium Inorganic materials 0.000 claims description 8
- 125000000217 alkyl group Chemical group 0.000 claims description 7
- 125000005233 alkylalcohol group Chemical group 0.000 claims description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 6
- 238000001035 drying Methods 0.000 claims description 5
- 229910000480 nickel oxide Inorganic materials 0.000 claims description 5
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 claims description 5
- 125000003545 alkoxy group Chemical group 0.000 claims description 4
- 229910052799 carbon Inorganic materials 0.000 claims description 4
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims description 4
- QIJIUJYANDSEKG-UHFFFAOYSA-N 2,4,4-trimethylpentan-2-amine Chemical compound CC(C)(C)CC(C)(C)N QIJIUJYANDSEKG-UHFFFAOYSA-N 0.000 claims description 3
- LPULCTXGGDJCTO-UHFFFAOYSA-N 6-methylheptan-1-amine Chemical compound CC(C)CCCCCN LPULCTXGGDJCTO-UHFFFAOYSA-N 0.000 claims description 3
- 150000001412 amines Chemical class 0.000 claims description 3
- 125000001424 substituent group Chemical group 0.000 claims description 3
- QGLWBTPVKHMVHM-KTKRTIGZSA-N (z)-octadec-9-en-1-amine Chemical compound CCCCCCCC\C=C/CCCCCCCCN QGLWBTPVKHMVHM-KTKRTIGZSA-N 0.000 claims description 2
- LZZYPRNAOMGNLH-UHFFFAOYSA-M Cetrimonium bromide Chemical compound [Br-].CCCCCCCCCCCCCCCC[N+](C)(C)C LZZYPRNAOMGNLH-UHFFFAOYSA-M 0.000 claims description 2
- 229910052692 Dysprosium Inorganic materials 0.000 claims description 2
- 229910052691 Erbium Inorganic materials 0.000 claims description 2
- 229910052693 Europium Inorganic materials 0.000 claims description 2
- 229910052689 Holmium Inorganic materials 0.000 claims description 2
- 229910052765 Lutetium Inorganic materials 0.000 claims description 2
- 229910052779 Neodymium Inorganic materials 0.000 claims description 2
- 229910052773 Promethium Inorganic materials 0.000 claims description 2
- 229910052772 Samarium Inorganic materials 0.000 claims description 2
- 229910052771 Terbium Inorganic materials 0.000 claims description 2
- 229910052775 Thulium Inorganic materials 0.000 claims description 2
- KBQHZAAAGSGFKK-UHFFFAOYSA-N dysprosium atom Chemical compound [Dy] KBQHZAAAGSGFKK-UHFFFAOYSA-N 0.000 claims description 2
- UYAHIZSMUZPPFV-UHFFFAOYSA-N erbium Chemical compound [Er] UYAHIZSMUZPPFV-UHFFFAOYSA-N 0.000 claims description 2
- OGPBJKLSAFTDLK-UHFFFAOYSA-N europium atom Chemical compound [Eu] OGPBJKLSAFTDLK-UHFFFAOYSA-N 0.000 claims description 2
- KJZYNXUDTRRSPN-UHFFFAOYSA-N holmium atom Chemical compound [Ho] KJZYNXUDTRRSPN-UHFFFAOYSA-N 0.000 claims description 2
- OHSVLFRHMCKCQY-UHFFFAOYSA-N lutetium atom Chemical compound [Lu] OHSVLFRHMCKCQY-UHFFFAOYSA-N 0.000 claims description 2
- XTAZYLNFDRKIHJ-UHFFFAOYSA-N n,n-dioctyloctan-1-amine Chemical compound CCCCCCCCN(CCCCCCCC)CCCCCCCC XTAZYLNFDRKIHJ-UHFFFAOYSA-N 0.000 claims description 2
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 claims description 2
- VQMWBBYLQSCNPO-UHFFFAOYSA-N promethium atom Chemical compound [Pm] VQMWBBYLQSCNPO-UHFFFAOYSA-N 0.000 claims description 2
- 239000011347 resin Substances 0.000 claims description 2
- 229920005989 resin Polymers 0.000 claims description 2
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 claims description 2
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 claims description 2
- GZCRRIHWUXGPOV-UHFFFAOYSA-N terbium atom Chemical compound [Tb] GZCRRIHWUXGPOV-UHFFFAOYSA-N 0.000 claims description 2
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 claims description 2
- 125000004183 alkoxy alkyl group Chemical group 0.000 claims 2
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 claims 2
- 229910052688 Gadolinium Inorganic materials 0.000 claims 1
- 229910052769 Ytterbium Inorganic materials 0.000 claims 1
- 150000001298 alcohols Chemical class 0.000 claims 1
- UIWYJDYFSGRHKR-UHFFFAOYSA-N gadolinium atom Chemical compound [Gd] UIWYJDYFSGRHKR-UHFFFAOYSA-N 0.000 claims 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 claims 1
- 238000006722 reduction reaction Methods 0.000 description 34
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 16
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 16
- 230000004913 activation Effects 0.000 description 16
- 230000000052 comparative effect Effects 0.000 description 12
- IBMCQJYLPXUOKM-UHFFFAOYSA-N 1,2,2,6,6-pentamethyl-3h-pyridine Chemical compound CN1C(C)(C)CC=CC1(C)C IBMCQJYLPXUOKM-UHFFFAOYSA-N 0.000 description 9
- 230000000694 effects Effects 0.000 description 9
- 150000004687 hexahydrates Chemical class 0.000 description 9
- BIXNGBXQRRXPLM-UHFFFAOYSA-K ruthenium(3+);trichloride;hydrate Chemical compound O.Cl[Ru](Cl)Cl BIXNGBXQRRXPLM-UHFFFAOYSA-K 0.000 description 9
- 239000002585 base Substances 0.000 description 8
- 229910052759 nickel Inorganic materials 0.000 description 8
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 239000000460 chlorine Substances 0.000 description 6
- 239000002245 particle Substances 0.000 description 6
- 238000004832 voltammetry Methods 0.000 description 6
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 239000004480 active ingredient Substances 0.000 description 4
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 230000006872 improvement Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 229910000420 cerium oxide Inorganic materials 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 229910044991 metal oxide Inorganic materials 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 3
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 3
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- 238000004846 x-ray emission Methods 0.000 description 3
- 229910004631 Ce(NO3)3.6H2O Inorganic materials 0.000 description 2
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 239000013543 active substance Substances 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000003411 electrode reaction Methods 0.000 description 2
- 238000005342 ion exchange Methods 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 235000011121 sodium hydroxide Nutrition 0.000 description 2
- 229910001936 tantalum oxide Inorganic materials 0.000 description 2
- 239000012695 Ce precursor Substances 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 229910001128 Sn alloy Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- IPUVGFOIIZHOEL-UHFFFAOYSA-N [Ru+3].[I+] Chemical compound [Ru+3].[I+] IPUVGFOIIZHOEL-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 239000012267 brine Substances 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- XQTIWNLDFPPCIU-UHFFFAOYSA-N cerium(3+) Chemical compound [Ce+3] XQTIWNLDFPPCIU-UHFFFAOYSA-N 0.000 description 1
- MEXSQFDSPVYJOM-UHFFFAOYSA-J cerium(4+);disulfate;tetrahydrate Chemical compound O.O.O.O.[Ce+4].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O MEXSQFDSPVYJOM-UHFFFAOYSA-J 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000003843 chloralkali process Methods 0.000 description 1
- QCDFRRQWKKLIKV-UHFFFAOYSA-M chloroplatinum Chemical compound [Pt]Cl QCDFRRQWKKLIKV-UHFFFAOYSA-M 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000002788 crimping Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000004512 die casting Methods 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 238000005485 electric heating Methods 0.000 description 1
- 238000003487 electrochemical reaction Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 238000001523 electrospinning Methods 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- DKAGJZJALZXOOV-UHFFFAOYSA-N hydrate;hydrochloride Chemical compound O.Cl DKAGJZJALZXOOV-UHFFFAOYSA-N 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 239000003014 ion exchange membrane Substances 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- YNBADRVTZLEFNH-UHFFFAOYSA-N methyl nicotinate Chemical compound COC(=O)C1=CC=CN=C1 YNBADRVTZLEFNH-UHFFFAOYSA-N 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- OQUOOEBLAKQCOP-UHFFFAOYSA-N nitric acid;hexahydrate Chemical compound O.O.O.O.O.O.O[N+]([O-])=O OQUOOEBLAKQCOP-UHFFFAOYSA-N 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- 238000006479 redox reaction Methods 0.000 description 1
- NHWBVRAPBLSUQQ-UHFFFAOYSA-H ruthenium hexafluoride Chemical compound F[Ru](F)(F)(F)(F)F NHWBVRAPBLSUQQ-UHFFFAOYSA-H 0.000 description 1
- OJLCQGGSMYKWEK-UHFFFAOYSA-K ruthenium(3+);triacetate Chemical compound [Ru+3].CC([O-])=O.CC([O-])=O.CC([O-])=O OJLCQGGSMYKWEK-UHFFFAOYSA-K 0.000 description 1
- WYRXRHOISWEUST-UHFFFAOYSA-K ruthenium(3+);tribromide Chemical compound [Br-].[Br-].[Br-].[Ru+3] WYRXRHOISWEUST-UHFFFAOYSA-K 0.000 description 1
- PMMMCGISKBNZES-UHFFFAOYSA-K ruthenium(3+);tribromide;hydrate Chemical compound O.Br[Ru](Br)Br PMMMCGISKBNZES-UHFFFAOYSA-K 0.000 description 1
- YBCAZPLXEGKKFM-UHFFFAOYSA-K ruthenium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[Ru+3] YBCAZPLXEGKKFM-UHFFFAOYSA-K 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000013535 sea water Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 125000004213 tert-butoxy group Chemical group [H]C([H])([H])C(O*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- FBEIPJNQGITEBL-UHFFFAOYSA-J tetrachloroplatinum Chemical compound Cl[Pt](Cl)(Cl)Cl FBEIPJNQGITEBL-UHFFFAOYSA-J 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- KPZSTOVTJYRDIO-UHFFFAOYSA-K trichlorocerium;heptahydrate Chemical compound O.O.O.O.O.O.O.Cl[Ce](Cl)Cl KPZSTOVTJYRDIO-UHFFFAOYSA-K 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
- C25B11/093—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds at least one noble metal or noble metal oxide and at least one non-noble metal oxide
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B1/00—Electrolytic production of inorganic compounds or non-metals
- C25B1/01—Products
- C25B1/34—Simultaneous production of alkali metal hydroxides and chlorine, oxyacids or salts of chlorine, e.g. by chlor-alkali electrolysis
- C25B1/46—Simultaneous production of alkali metal hydroxides and chlorine, oxyacids or salts of chlorine, e.g. by chlor-alkali electrolysis in diaphragm cells
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
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- B—PERFORMING OPERATIONS; TRANSPORTING
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Description
還元電極反応:2H2O+2e-→2OH-+H2(E0=-0.83V)
全体反応:2Cl-+2H2O→2OH-+Cl2+H2(E0=-2.19V)
塩水の電気分解を行うに際し、電解電圧は、理論的な塩水の電気分解に必要な電圧に加えて、酸化電極(陽極、anode)および還元電極(陰極、cathode)のそれぞれの過電圧、イオン交換膜の抵抗による電圧、および電極間の距離による電圧を何れも考慮しなければならず、これらの電圧の中でも、電極による過電圧が重要な変数として作用している。
本明細書で用いられる「還元電極」という用語は、塩水の電気分解において、水素の還元反応が起こって水素気体が発生する電極を意味し、電子を受けて還元反応が起こり、陰の電位を有する電極であるという点から、陰極(cathode)と称されることができる。
1.電気分解用還元電極の活性層組成物
本発明の一実施形態に係る電気分解用還元電極の活性層組成物は、塩水電気分解の還元電極の活性層組成物であって、金属前駆体混合物と、有機溶媒と、を含み、前記金属前駆体混合物は、ルテニウム前駆体、白金前駆体、およびランタン族金属前駆体を含むものである。
本発明の一実施形態に係る活性層組成物は、活性成分として金属前駆体混合物を含み、前記ルテニウム前駆体は、電気分解用還元電極の活性層に活性物質としてルテニウム成分を提供する物質である。
本発明の一実施形態に係る活性層組成物に含まれる前記アミン系化合物は、電極コーティング時に酸化ルテニウム結晶相を小さくする効果を奏することができる。また、アミン系化合物が含まれることにより、ランタン族金属、具体的には、酸化セリウムの針状構造の大きさを増大させることができ、これにより形成された酸化セリウムのネットワーク構造が、酸化ルテニウム粒子をより強固に固定させる役割を果たすことができる。これにより、最終的に電極の耐久性を改善することができる。結果的には、電極が長時間にわたって駆動される際にも、老化などのその他の内外部の要因に起因する剥離現象を著しく低減することができる。
本発明の一実施形態に係る前記電気分解用還元電極の活性層組成物は、有機溶媒としてアルコール系化合物をさらに含んでもよい。
本発明の他の実施形態に係る電気分解用還元電極は、金属基材と、前記金属基材上に位置し、上述の還元電極の活性層組成物に由来の活性層と、を含む。
1)電気分解用還元電極の活性層組成物の製造
ルテニウムクロリドハイドレート(RuCl3・xH2O)(Heraeus製)2.169mmol、クロロ白金酸ヘキサハイドレート(H2PtCl6・6H2O)(喜星金属製)0.241mmol、およびセリウム(III)ニトレートヘキサハイドレート(Ce(NO3)3・6H2O)(Sigma-Aldrich製)0.482mmolを、イソプロピルアルコール(大井化金製)2.375mlおよび2-ブトキシエタノール(大井化金製)2.375mlに十分に溶解させ、n-オクチルアミン(大井化金製)0.25mLを投入して混合することで、電気分解用還元電極の活性層組成物を製造した。
前記電気分解用還元電極の活性層組成物を50℃で24時間撹拌し、溶液1l当たりにルテニウムが100g含まれているコーティング溶液を製造した。
ニッケル基材(厚さ:200μm、純度:99%以上)の表面を、アルミニウムオキサイド(120mesh)で0.4MPaの条件下でサンドブラスト処理し凹凸を形成した。凹凸が形成されたニッケル基材を80℃の硫酸水溶液(5M)に3分間浸漬させて微細凹凸を形成した。次いで、蒸留水で洗浄し、十分に乾燥させて前処理済みのニッケル基材を製造した。
ルテニウムクロリドハイドレート1.928mmol、クロロ白金酸ヘキサハイドレート0.482mmol、およびセリウム(III)ニトレートヘキサハイドレート0.482mmolを溶解させて電気分解用還元電極の活性層組成物を製造したことを除き、実施例1と同様の方法により電気分解用還元電極を製造した。
ルテニウムクロリドハイドレート1.687mmol、クロロ白金酸ヘキサハイドレート0.723mmol、およびセリウム(III)ニトレートヘキサハイドレート0.482mmolを溶解させて電気分解用還元電極の活性層組成物を製造したことを除き、実施例1と同様の方法により電気分解用還元電極を製造した。
ルテニウムクロリドハイドレート2.41mmol、クロロ白金酸ヘキサハイドレート0.0482mmol、およびセリウム(III)ニトレートヘキサハイドレート0.482mmolを溶解させて電気分解用還元電極の活性層組成物を製造したことを除き、実施例1と同様の方法により電気分解用還元電極を製造した。
ルテニウムクロリドハイドレート2.41mmol、クロロ白金酸ヘキサハイドレート0.241mmol、およびセリウム(III)ニトレートヘキサハイドレート0.482mmolを溶解させて電気分解用還元電極の活性層組成物を製造したことを除き、実施例1と同様の方法により電気分解用還元電極を製造した。
ルテニウムクロリドハイドレート2.41mmol、クロロ白金酸ヘキサハイドレート0.482mmol、およびセリウム(III)ニトレートヘキサハイドレート0.482mmolを溶解させて電気分解用還元電極の活性層組成物を製造したことを除き、実施例1と同様の方法により電気分解用還元電極を製造した。
ルテニウムクロリドハイドレート2.41mmol、クロロ白金酸ヘキサハイドレート0.723mmol、およびセリウム(III)ニトレートヘキサハイドレート0.482mmolを溶解させて電気分解用還元電極の活性層組成物を製造したことを除き、実施例1と同様の方法により電気分解用還元電極を製造した。
イソプロピルアルコール(大井化金製)2.45mlおよび2-ブトキシエタノール(大井化金製)2.45mlに十分に溶解させ、n-オクチルアミン(大井化金製)0.1mLを投入し混合して製造したことを除き、実施例6と同様の方法により電気分解用還元電極を製造した。
イソプロピルアルコール(大井化金製)2.25mlおよび2-ブトキシエタノール(大井化金製)2.25mlに十分に溶解させ、n-オクチルアミン(大井化金製)0.5mLを投入し混合して製造したことを除き、実施例6と同様の方法により電気分解用還元電極を製造した。
n-オクチルアミンを投入せずに電気分解用還元電極の活性層組成物を製造したことを除き、実施例1と同様の方法により電気分解用還元電極を製造した。
n-オクチルアミンを投入せずに電気分解用還元電極の活性層組成物を製造したことを除き、実施例2と同様の方法により電気分解用還元電極を製造した。
n-オクチルアミンを投入せずに電気分解用還元電極の活性層組成物を製造したことを除き、実施例3と同様の方法により電気分解用還元電極を製造した。
ルテニウムクロリドハイドレート2.41mmolおよびセリウム(III)ニトレートヘキサハイドレート0.482mmolを、イソプロピルアルコール2.375mlおよび2-ブトキシエタノール2.375mlに十分に溶解させ、n-オクチルアミン0.25mLを投入し混合して電気分解用還元電極の活性層組成物を製造したことを除き、実施例1と同様の方法により電気分解用還元電極を製造した。
n-オクチルアミンを投入せずに電気分解用還元電極の活性層組成物を製造したことを除き、実施例6と同様の方法により電気分解用還元電極を製造した。
実施例および比較例の還元電極、対電極としてPtワイヤ、基準電極としてHg/HgO電極を、NaOH水溶液(32重量%)に浸漬させてハーフセルを製造した。直線走査ボルタンメトリーにより、電流密度-0.62A/cm2の条件で還元電極の初期電圧を測定し、その結果を下記表2~5に記載した。
実験例1で製造されたハーフセルを、直線走査ボルタンメトリーにより、電流密度-0.62A/cm2の条件で還元電極の初期電圧を測定し、その結果を下記表6に記載した。そして、前記ハーフセルを、-6A/cm2の電流密度条件で1時間処理した後、直線走査ボルタンメトリーにより、電流密度-0.62A/cm2の条件で還元電極の電圧を測定し、その結果を下記表6に記載した。
実験例1で製造されたハーフセルを、直線走査ボルタンメトリーにより、電流密度-0.62A/cm2の条件で還元電極の初期電圧を測定し、その結果を下記表7に記載した。そして、前記ハーフセルを、-6A/cm2の電流密度条件で1時間処理した後、直線走査ボルタンメトリーにより、電流密度-0.62A/cm2の条件で還元電極の電圧を測定し、その結果を下記表7に記載した。
実験例1で製造されたハーフセルに対して、Portable XRF(Olympus社、Delta-professional XRF(X-ray Fluorescence spectrometry))を用いて電解前と電解後のRuおよびCeの含量変化を測定し、その結果を下記表8に記載した。
Claims (11)
- 塩水電気分解還元電極の活性層組成物であって、
ルテニウム前駆体、白金前駆体、およびランタン族金属前駆体を含む金属前駆体混合物と、
アルコール系化合物およびアミン系化合物を含む有機溶媒と、を含む、還元電極の活性層組成物。 - 前記アミン系化合物は、前記有機溶媒100体積部に対して0.5~10体積部で含まれる、請求項1に記載の活性層組成物。
- 前記金属前駆体混合物は、前記ルテニウム前駆体1モルに対して、前記白金前駆体を0.01~0.7モルで含む、請求項1または2に記載の活性層組成物。
- 前記金属前駆体混合物は、前記ルテニウム前駆体1モルに対して、前記ランタン族金属前駆体を0.01~0.5モルで含む、請求項1~3のいずれか一項に記載の活性層組成物。
- 前記アミン系化合物は、n-オクチルアミン、t-オクチルアミン、イソオクチルアミン、トリオクチルアミン、オレイルアミン、トリブチルアミン、およびセチルトリメチルアンモニウムブロミドからなる群から選択される1つ以上である、請求項1~4のいずれか一項に記載の活性層組成物。
- 前記ランタン族金属は、セリウム、ネオジム、プロメチウム、サマリウム、ユーロピウム、ガドリニウム、テルビウム、ジスプロシウム、ホルミウム、エルビウム、ツリウム、イッテルビウム、およびルテチウムからなる群から選択される1つ以上を含む、請求項1~5のいずれか一項に記載の活性層組成物。
- 前記ランタン族金属はセリウムを含む、請求項1~6のいずれか一項に記載の活性層組成物。
- 前記アルコール系化合物は、炭素数1~4のアルキル基を有する第一級アルキルアルコール、および炭素数1~4のアルコキシ基が置換基として結合された炭素数1~4のアルキル基を有するアルコキシアルキルアルコールからなる群から選択される1つ以上を含む、請求項1~7のいずれか一項に記載の活性層組成物。
- 前記アルコール系化合物は、炭素数1~4のアルキル基を有する第一級アルキルアルコールと、炭素数1~4のアルコキシ基が置換基として結合された炭素数1~4のアルキル基を有するアルコキシアルキルアルコールと、を含む、請求項1~8のいずれか一項に記載の活性層組成物。
- 金属基材と活性層とを含む還元電極の製造方法であって、
前記金属基材上に、請求項1~9のいずれか一項に記載の活性層組成物を塗布し、乾燥させ、次いで熱処理して活性層を形成する工程を含む製造方法。 - 前記還元電極が、前記活性層上に水素吸着層をさらに含み、
酸化タンタル、酸化ニッケル、および炭素からなる群から選択される1つ以上を前記活性層上に樹脂を用いて固定してコーティングすることにより前記水素吸着層を製造する工程を更に含む、請求項10に記載の還元電極の製造方法。
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WO2020009473A1 (ko) | 2020-01-09 |
JP2021520450A (ja) | 2021-08-19 |
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CN112041482A (zh) | 2020-12-04 |
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